Heat tolerance-inducing agent for plants and method for inducing heat tolerance of plants

Abstract

To provide a heat tolerance-inducing agent for plants and a method for inducing heat tolerance of plants, characterized by superior persistence of effectiveness.SOLUTION: This heat tolerance-inducing agent for plants comprises a carrier in which an active ingredient including one or more compounds having a boiling point or sublimation point of 200°C or lower is supported on a porous material. This method for inducing heat tolerance of plants involves applying the heat tolerance-inducing agent to plants.SELECTED DRAWING: None

Description

[Technical field]

[0001] The present invention relates to an agent for inducing heat tolerance in plants and a method for inducing heat tolerance in plants. This application claims priority to Patent Application No. 2021-174292, filed in Japan on October 26, 2021, the contents of which are incorporated herein by reference. [Background technology]

[0002] When agricultural and horticultural plants are exposed to high temperatures, the quality and yield of the plants decrease due to heat damage. Conventionally, measures to prevent heat damage have been taken such as installing sunshades and ventilation fans in agricultural and horticultural greenhouses, but these measures are very expensive and difficult to implement. Therefore, as a measure that can be easily implemented in many agricultural fields, the application of high-temperature tolerance inducers to plants has been considered. Known examples of high-temperature tolerance inducers include unsaturated carbonyl compounds such as hydroxyacrolein, ethyl vinyl ketone, and 2-hexenal (Patent Document 1). In addition, a tablet product in which 2-hexenal is supported on a sublimable carrier, 2,4,6-triisopropyl-1,3,5-trioxane, is commercially available. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2011-157307 A Summary of the Invention [Problem to be solved by the invention]

[0004] However, according to the study by the present inventors, when the high-temperature resistance inducer has a boiling point or sublimation point of 200°C or less, it may evaporate rapidly after application, and the duration of the effect may be short. If the duration of the effect is short, the high-temperature resistance inducer will be applied frequently, which increases the effort and cost. If 2-hexenal is supported on a sublimation carrier, the duration of the effect will be extended, but the effect is not sufficient.

[0005] The present invention provides a heat tolerance inducer in plants, which has excellent long-lasting effect, and a method for inducing heat tolerance in plants. [Means for solving the problem]

[0006] The present invention has the following aspects. [1] A plant high temperature resistance inducer comprising a support in which an active ingredient, the active ingredient including one or more compounds having a boiling point or sublimation point of 200°C or lower, is supported on a porous material. [2] The high temperature resistance inducer of [1], wherein the porous material comprises silica. [3] The high-temperature resistance inducer according to [2] above, wherein the silica is at least one selected from the group consisting of porous silica, zeolite and montmorillonite. [4] The high-temperature resistance inducer according to [2], wherein the silica is silica gel. [5] The high temperature resistance inducer according to any one of [1] to [4] above, wherein the content of the silica is 95 to 100 mass % based on the total mass of the porous material. [6] The specific surface area of ​​the porous material is 100 to 1,000 m 2 / g. [7] The high-temperature tolerance inducer according to any one of [1] to [6] above, wherein the compound is an unsaturated carbonyl compound. [8] The high temperature tolerance inducer according to any one of [1] to [6] above, wherein the compound is 2-hexenal. [9] A method for inducing high temperature tolerance in a plant, comprising applying any one of the high temperature tolerance inducers [1] to [8] to the plant. Effect of the Invention

[0007] The plant heat tolerance inducer and the method for inducing heat tolerance in a plant of the present invention have excellent durability of effect. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0008] In the present invention, the "boiling point" and the "sublimation point" are values ​​at normal pressure (1 atm). The symbol "~" indicating a range of numerical values ​​means that the numerical values ​​before and after it are included as the lower limit and upper limit.

[0009] A plant heat tolerance inducer according to one embodiment of the present invention includes a support in which an active ingredient is supported on a porous material.

[0010] (Active ingredient) The active ingredient has the effect of inducing high temperature resistance in plants. In this embodiment, the active ingredient includes a compound (hereinafter, also referred to as "compound A") having a boiling point or sublimation point of 200° C. or less. The active ingredient may contain one type of compound A or two or more types of compound A.

[0011] Compound A has a boiling point or sublimation point of 200° C. or lower, and can therefore vaporize (evaporate or sublime) in the plant's growing environment (for example, 0 to 50° C.). The boiling point or sublimation point of compound A is preferably 175° C. or lower, more preferably 150° C. or lower. The lower the boiling point or sublimation point, the easier it is to evaporate after application, and the greater the usefulness of the present invention. The boiling point or sublimation point of compound A is preferably 80° C. or higher, more preferably 100° C. or higher, in terms of the duration of the effect. Compound A may be either a liquid or a solid at 25°C.

[0012] Compound A can be appropriately selected from compounds known to have a high-temperature tolerance-inducing effect in plants, and has a boiling point or sublimation point of 200° C. or less. Examples of compounds that induce high temperature resistance in plants include unsaturated carbonyl compounds such as unsaturated aldehydes and unsaturated ketones. Specific examples of unsaturated carbonyl compounds include those described in JP 2011-157307 A and WO 2016 / 031775 A.

[0013] The unsaturated carbonyl compound is preferably a compound represented by the following formula 1. R 1 -CH=CH-C(=O)-R 2 ...Formula 1 However, R 1 is a hydrogen atom, a hydroxyl group, or an alkyl group having 1 to 9 carbon atoms, and R 2 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. R 1 , R 2 The alkyl group in each of these may be linear or branched. Among the compounds represented by formula 1, R 1 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, and R 2 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and R 1 and R 2 A compound in which the sum of the carbon numbers of is 6 or less (total carbon number is 9 or less) is preferred.

[0014] Examples of unsaturated carbonyl compounds having a boiling point or sublimation point of 200°C or lower include 2-hexenal (boiling point 146°C), 2-butenal (boiling point 105°C), 2-pentenal (boiling point 126 to 130°C), 2-heptenal (boiling point 166°C), 1-penten-3-one (boiling point 81°C), 3-penten-2-one (boiling point 123°C), 4-hexen-3-one (boiling point 137°C), 3-hepten-2-one (boiling point 156°C), and 2-octen-4-one (boiling point 178°C).

[0015] Other examples of compounds that induce high temperature tolerance in plants include branched-chain amino acids and intermediates in their biosynthetic and consumption pathways (hereinafter, these are also collectively referred to as "branched-chain amino acids"). Specific examples of branched-chain amino acids include those described in JP 2012-197249 A. Examples of branched-chain amino acids having a boiling point or sublimation point of 200° C. or lower include leucine (sublimation point 145 to 148° C.) and α-ketoisovaleric acid (boiling point 171° C.).

[0016] The active ingredient may further contain a compound other than compound A that has the effect of inducing high temperature tolerance in plants, within the scope of not impairing the effects of the present invention. The proportion of compound A relative to the total mass of the active ingredients is not particularly limited, but is, for example, 1% by mass or more, further 10% by mass or more, and may be 100% by mass. When the proportion of compound A is within the above range, the effect of inducing high temperature resistance in plants can be sufficiently exerted.

[0017] (porous material) The porous material is a carrier that carries the active ingredient. The porous material may contain silica. In this specification, silica means a compound containing silicon oxide. Examples of silica include porous silica such as silica gel, diatomaceous earth, mesoporous silica, zeolite, montmorillonite, boiling stone, porous glass, kaolinite, sericite, illite, glauconite, chlorite, and talc. The silica is preferably at least one selected from the group consisting of porous silica, zeolite, and montmorillonite, more preferably porous silica, and even more preferably silica gel.

[0018] The porous material may contain other components besides silica. The content of silica is preferably 50% by mass or more, more preferably 80% by mass or more, even more preferably 90% by mass or more, particularly preferably 95% by mass or more, and may be 100% by mass, based on the total mass of the porous material. When the content of silica is within the above range, the sustained release property and the stability of the active ingredient tend to be more excellent.

[0019] The specific surface area of ​​the porous material is, for example, 1 to 3,000 m 2 / g, and even 100-1,000m 2 / g. The specific surface area of ​​porous materials is 200 to 1,000 m 2 / g, and 420 to 1,000m 2 / g. It is more preferable that the specific surface area of ​​the porous material is 1 to 3,000 m 2 When the specific surface area of ​​the porous material is 420 to 1,000 m / g, the residual rate of compound A is high, and the effect can be sustained. 2 / g, the residual rate of compound A is higher, and the effect can be further improved. The specific surface area is measured by a gas adsorption method. Specifically, a specific surface area measuring device (manufactured by Shimadzu Corporation, product name 3Flex) is used, 100 mg of a sample is set, and the specific surface area is measured under cryogenic conditions.

[0020] The pore volume of the porous material is, for example, 0.01 to 10 mL / g, 0.05 to 3 mL / g, or even 0.1 to 1.7 mL / g. The pore volume is measured by the Barrett-Joyner-Halenda (BJH) method. Specifically, a pore distribution measuring device (e.g., Shimadzu Corporation, 3Flex) is used, 100 mg of a sample is set, and the pore volume is measured under cryogenic conditions. The pore diameter of the porous material is, for example, 0.5 to 1,000 nm, further 0.5 to 100 nm, further 1 to 25 nm. The pore diameter is measured by a gas adsorption method. Specifically, a specific surface area measuring device (for example, Shimadzu Corporation, 3Flex) is used, 100 mg of a sample is set, and the pore diameter is measured under a cryogenic condition. The oil absorption of the porous material is, for example, 1 to 1,000 mL / 100 g, further 10 to 500 mL / 100 g, further 40 to 300 mL / 100 g. The oil absorption is measured by the boiled linseed oil method. Specifically, the porous material and boiled linseed oil are mixed in small amounts, and when the mixture can be rolled into a spiral shape using a spatula, the amount of boiled linseed oil used per 100 g of the porous material is measured and used as the oil absorption.

[0021] The shape of the porous material is not particularly limited, and examples thereof include particulate, block, film, pellet, and honeycomb shapes. From the viewpoint of availability, particulate shapes are preferred. Examples of the particle shape include spherical shapes such as perfect spheres and oval spheres, needle shapes, scale shapes, and irregular shapes. When the porous material is particulate, the average particle size of the porous material is, for example, 0.1 to 1,000 μm, 4 to 1,000 μm, or even 0.5 to 300 μm. The average particle size is measured by a Coulter counter (for example, Multisizer 4e manufactured by Beckman Coulter, Inc.).

[0022] As the porous material, among porous silica, silica gel is preferable from the viewpoint of safety. The average particle size of silica gel is, for example, 0.5 to 300 μm, or further 4 to 70 μm. The average particle size of silica gel is the 50% cumulative volume particle size measured under solution conditions using a particle size distribution meter (Multisizer 4e, manufactured by Beckman Coulter, Inc.). The specific surface area of ​​silica gel is, for example, 30 to 1,000 m 2 / g, 100-1,000m 2 / g, 150-1,000m 2 / g, 200-1,000m 2 / g, and even 420-1,000m 2 / g. The pore volume of the silica gel is, for example, 0.05 to 3 mL / g, 0.2 to 2.5 mL / g, or further 0.5 to 1.7 mL / g. The pore diameter of the silica gel is, for example, 0.5 to 100 nm, 2 to 50 nm, or further 3 to 25 nm. The oil absorption of the silica gel is, for example, 10 to 500 mL / 100 g, 50 to 450 mL / 100 g, or further 100 to 300 mL / 100 g.

[0023] (Support) The loading rate of the active ingredient in the support is, for example, 0.01 to 1,000 mass %, or preferably 0.1 to 10 mass %, based on the total amount of the support. The support rate of the active ingredient can be determined by extracting the active ingredient from the support with a solvent capable of dissolving the active ingredient, and analyzing the obtained extract by gas chromatography (eg, Agilent 7890A).

[0024] (Other ingredients) The high temperature resistance inducer may further contain other components other than the active ingredient and the porous material, as necessary, within the range that does not impair the effects of the present invention. When the high temperature resistance inducer contains other components, the other components may or may not be supported on a support. Other components include, for example, antioxidants, coupling agents and binders.

[0025] (Method of producing high temperature resistance inducer) The high temperature resistance inducer can be obtained by supporting an active ingredient containing one or more types of compound A on a porous material.

[0026] The method for supporting the carrier is not particularly limited, and any known method can be appropriately adopted. For example, the support can be obtained by a method in which the active ingredient is contacted with a porous material together with a liquid medium having a boiling point lower than the boiling point or sublimation point of compound A, and then dried (to remove the liquid medium) at a temperature lower than the boiling point or sublimation point of compound A. The liquid medium may be any medium capable of dissolving or dispersing the active ingredient. The amount of the liquid medium used is, for example, 10 to 10,000 parts by mass, or even 100 to 1,000 parts by mass, per 100 parts by mass of the support. The method for contacting the active ingredient and the liquid medium with the porous material is not particularly limited, and known methods such as immersion and spraying can be applied. The contact time is sufficient to allow the active ingredient to be sufficiently impregnated into the porous material, and can be appropriately adjusted depending on the size, material, etc. of the porous material. When the active ingredient is a liquid, a support can also be obtained by a method in which only the active ingredient is brought into contact with a porous material.

[0027] If necessary, the obtained carrier may be extruded into any dosage form together with other ingredients as necessary. When the carrier is extruded into any dosage form, the dosage form is not particularly limited, and examples thereof include tablets, granules, films, and blocks. As the extrusion method, a known method can be applied.

[0028] If necessary, the resulting heat tolerance inducer may be placed in a container for application to plants. After application of the high-temperature tolerance inducer, compound A vaporizes and diffuses through the air to reach the plant, thereby inducing high-temperature tolerance. Therefore, the container is preferably gas-permeable or has one or more openings that communicate between the inside and outside of the container, so that the vaporized compound A can be released outside the container. The container may include attachment members for attaching the container to a plant or any support.

[0029] (Application) The high temperature tolerance inducer is applied to a plant to induce high temperature tolerance in the plant. By applying the high temperature tolerance inducer to the plant, high temperature tolerance in the plant can be induced. High temperature injury refers to the adverse effect that high temperatures have on plant growth. High temperature damage to horticultural plants reduces their quality and yield, and specific damage includes, for example, small size, insufficient thickening, insufficient sugar content, and short stems in head-forming horticultural plants, as well as malformed and poor colored flowers.

[0030] The plant to which the high-temperature tolerance inducer is applied is not particularly limited as long as it is capable of inducing high-temperature tolerance by compound A. In this embodiment, the plant to which the high-temperature tolerance inducer is applied is typically a plant having stomata, and is preferably an agricultural or horticultural plant. Specific plants (particularly, agricultural or horticultural plants) include, for example, cereals (rice, barley, wheat, rye, oats, corn, etc.), beans (soybeans, adzuki beans, broad beans, peas, peanuts, etc.), fruit trees and fruits (apples, citrus fruits, pears, grapes, peaches, plums, cherries, walnuts, almonds, bananas, strawberries, etc.), vegetables (cabbage, tomato, eggplant, spinach, broccoli, lettuce, onion, green onion, green pepper, etc.), root vegetables (carrots, potatoes, sweet potatoes, radishes, turnips, etc.), and spices (scallions, cucumbers, radishes, cucumber ... Examples of such crops include industrial crops (cotton, hemp, paper mulberry, mitsumata, rapeseed, beets, hops, sugar cane, sugar beet, olives, rubber, coffee, tobacco, and tea), melons (pumpkin, cucumber, watermelon, melon, etc.), pasture grasses (orchard grass, sorghum, timothy, clover, alfalfa, etc.), turfgrass (Korean grass and bentgrass, etc.), flowers (chrysanthemums, roses, orchids, etc.), and crops for aromatic purposes (lavender, rosemary, thyme, parsley, pepper, ginger, etc.).

[0031] The high-temperature tolerance induction method of the present invention includes applying the high-temperature tolerance inducer of the present invention to a plant. Known methods can be used to apply the high-temperature tolerance inducer to a plant. For example, a method can be used in which silica gel carrying an active ingredient is filled into a gas-permeable bag and placed around the plant. When the high-temperature tolerance inducer is contained in a container having the above-mentioned opening, the container may be placed on the ground or the like around the plant. When the container has the above-mentioned mounting member, the container may be attached to the plant or any support. The application amount of the high temperature tolerance inducer can be appropriately set depending on the type of active ingredient, temperature, humidity, atmospheric pressure, and the optimal concentration for the target plant. For example, in the case of 2-hexenal, the application amount is set to about 0.001 to 0.1 ppm of 2-hexenal in the atmosphere. EXAMPLES

[0032] The present invention will be described in detail below with reference to examples, but the present invention is not limited to the description of the following examples. "%" indicates "% by mass". Examples 1 to 10 and 13 are working examples, and Examples 11 to 12 and 14 to 15 are comparative examples.

[0033] (Examples 1 to 10) A silica-containing porous material having the properties shown in Table 1 was weighed in a range of 20 to 30 g into a 200 mL recovery flask, and 0.35 mass% of 2-hexenal (trans isomer) was added to the mass of the silica-containing porous material. 100 g of dichloromethane was further added, stirred for 1 minute, and the dichloromethane was evaporated using a rotary evaporator to obtain a powdered high-temperature resistant inducer (support). 1.00 to 1.20 g of the obtained high temperature tolerance inducer was placed in a 20 mL vial as a sample and subjected to the following evaluation. The results are shown in Table 1.

[0034] <Evaluation 1a: Measurement of 2-hexenal loading rate> 5 g of a mixed solvent of chloroform:methanol = 9:1 (volume ratio) was added to the vial containing the sample and stirred for 1 minute to extract the supported 2-hexenal. Hexadecane was added as an internal standard substance, and the resulting mixture was filtered. The resulting filtrate (extract containing the internal standard substance) was analyzed by gas chromatography, and the amount of 2-hexenal supported (mg) was calculated using a calibration curve previously prepared using hexadecane as the internal standard. The support rate (%) of 2-hexenal in 100% of the sample was calculated from the calculated support amount (mg) and the mass of the sample placed in the vial.

[0035] <Evaluation 1b: Measurement of 2-hexenal residual rate> The vial containing the sample was left uncapped for 7 days in an environment of 23° C. or 50° C. After leaving it still, the support rate (%) of 2-hexenal was determined in the same manner as in "Evaluation 1a" above. From the measurement results, the 2-hexenal residual rate was calculated by the following formula for each of the cases of standing at 23° C. and standing at 50° C. The "initial 2-hexenal content" in the formula is the value obtained in the "measurement of 2-hexenal support rate" above. 2-Hexenal remaining rate (%) = 2-hexenal supported rate after standing (%) / initial 2-hexenal supported rate (%) × 100

[0036] (Example 11) A commercially available tablet in which 2-hexenal is supported on 2,4,6-triisopropyl-1,3,5-trioxane (hereinafter simply referred to as "trioxane") was used as the high temperature resistance inducer of Example 11. The high-temperature tolerance inducer was placed in a 20 mL vial as a sample and subjected to the following evaluation. The results are shown in Table 1.

[0037] <Evaluation 2a: Measurement of 2-hexenal loading rate> Chloroform was added to the vial containing the sample to dissolve the sample, and hexadecane was added to the resulting solution as an internal standard substance. The procedure was repeated in the same manner as in "Evaluation 1a" above, except that the sample was analyzed by gas chromatography (Agilent, 7890A), and the support rate (%) of 2-hexenal in 100% of the sample was determined.

[0038] <Evaluation 2b: Measurement of 2-hexenal residual rate> The vial containing the sample was allowed to stand for 7 days in an environment at 23° C. or 50° C. After standing, the support rate (%) of 2-hexenal was determined in the same manner as in "Evaluation 2a" above. From the measurement results, the residual rate (%) of 2-hexenal was calculated in the same manner as in "Evaluation 1b" above.

[0039] (Example 12) 2-Hexenal was used as the high temperature tolerance inducer in Example 12 as it was. The high-temperature tolerance inducer was placed in a 20 mL vial as a sample and subjected to the following evaluation. The results are shown in Table 1.

[0040] <Evaluation 3b: Measurement of 2-hexenal residual rate> The vial containing the sample was allowed to stand for 7 days in an environment at 23° C. or 50° C. After standing, the mass (mg) of the sample remaining in the vial was measured, and this value was taken as the 2-hexenal support rate after standing. From the measurement results, the residual rate (%) of 2-hexenal was calculated in the same manner as in "Evaluation 1b" above. In Example 12, 2-hexenal was used as it was, and therefore the initial 2-hexenal supporting rate was set to 100%.

[0041] [Table 1]

[0042] (Example 13) The evaluation was carried out in the same manner as in Example 1, except that the active ingredient was 3-hepten-2-one instead of 2-hexenal. The results are shown in Table 2.

[0043] (Example 14) A mixture of trioxane and 3-heptene-2-one (100:0.35 mass ratio) was dried to solid and used as a high temperature resistance inducer, which was evaluated in the same manner as in Example 11. The results are shown in Table 2.

[0044] (Example 15) 3-Hepten-2-one was used as the high temperature resistance inducer in Example 15 as it was. Evaluation was carried out in the same manner as in Example 12. The results are shown in Table 2.

[0045] [Table 2]

[0046] In the high temperature tolerance inducers of Examples 12 and 15, which did not use a carrier, no active ingredient remained after 7 days in either the case of leaving the agent at 23°C or at 50°C. In the high-temperature tolerance inducers of Examples 11 and 14, which used trioxane as a carrier, a small amount of 2-hexenal remained after 7 days when left standing at 23°C, but none remained when left standing at 50°C. In contrast, in the high temperature tolerance inducers of Examples 1 to 10 and 13, 2-hexenal remained after 7 days both when left standing at 23° C. and when left standing at 50° C. In addition, the residual rate when left standing at 23° C. was significantly higher than that of Examples 11 and 14. [Industrial Applicability]

[0047] The plant heat tolerance inducer of the present invention has excellent durability of its effect. Therefore, by storing the inducer in a container with an opening and placing the container on the ground or the like around a plant having stomata, or by attaching the container to the plant or any support, it is possible to prevent a decrease in the quality and yield of the plant.

Claims

1. A plant high temperature resistance inducer comprising a support in which an active ingredient including one or more unsaturated carbonyl compounds having a boiling point or sublimation point of 80°C or more and 200°C or less is supported on a porous material, the porous material is silica gel; The specific surface area of ​​the porous material is 200 to 1,000 m 2 / g; High temperature resistance inducer.

2. The high temperature resistance inducer according to claim 1, wherein the content of the silica gel is 95 to 100 mass% based on the total mass of the porous material.

3. The high temperature resistance inducer described in claim 1, wherein the compound is a compound represented by formula 1. R 1 -CH=CH-C(=O)-R 2 ...Formula 1 Here, R 1 is a hydrogen atom, a hydroxyl group or an alkyl group having 1 to 9 carbon atoms, and R 2 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.

4. The high temperature resistance inducer described in claim 2, wherein the compound is a compound represented by formula 1. R 1 -CH=CH-C(=O)-R 2 ...Formula 1 Here, R 1 is a hydrogen atom, a hydroxyl group or an alkyl group having 1 to 9 carbon atoms, and R 2 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.

5. The high temperature resistance inducer according to claim 1, wherein the compound is at least one selected from 2-hexenal, 2-butenal, 2-pentenal, 2-heptenal, 1-penten-3-one, 3-penten-2-one, 4-hexen-3-one, 3-hepten-2-one and 2-octen-4-one.

6. The high temperature resistance inducer described in claim 2, wherein the compound is at least one selected from 2-hexenal, 2-butenal, 2-pentenal, 2-heptenal, 1-penten-3-one, 3-penten-2-one, 4-hexen-3-one, 3-hepten-2-one and 2-octen-4-one.

7. The high temperature resistance inducer described in claim 3, wherein the compound is at least one selected from 2-hexenal, 2-butenal, 2-pentenal, 2-heptenal, 1-penten-3-one, 3-penten-2-one, 4-hexen-3-one, 3-hepten-2-one and 2-octen-4-one.

8. The high temperature resistance inducer according to claim 1, wherein the compound is 2-hexenal or 3-hepten-2-one.

9. The high temperature resistance inducer of claim 2, wherein the compound is 2-hexenal or 3-hepten-2-one.

10. A high-temperature resistance inducer described in any one of claims 1 to 9, wherein the loading rate of the active ingredient is 0.01 to 1,000 mass% based on the total amount of the carrier.

11. The high temperature resistance inducer described in any one of claims 1 to 9, wherein the carrier is formed into any one of the following dosage forms: tablets, granules, films, and blocks.

12. A high-temperature resistance inducer described in any one of claims 1 to 9, wherein the loading rate of the active ingredient is 0.01 to 1,000 mass% relative to the total amount of the carrier, and the carrier is formed into any one of the following dosage forms: tablets, granules, films, and blocks.

13. A method for inducing high temperature tolerance in a plant, comprising applying the high temperature tolerance inducer according to any one of claims 1 to 9 to the plant.

14. A method for inducing high-temperature tolerance in a plant, comprising applying a high-temperature tolerance inducer described in any one of claims 1 to 9 to the plant, wherein the loading rate of the active ingredient is 0.01 to 1,000 mass% relative to the total amount of the carrier.

15. A method for inducing high-temperature resistance in a plant, comprising applying a high-temperature resistance inducer according to any one of claims 1 to 9 to the plant, wherein the loading rate of the active ingredient is 0.01 to 1,000 mass% relative to the total amount of the carrier, and the carrier is formed into any one of the following dosage forms: a tablet, granules, a film, and a block.