Conductive film

Abstract

To reduce the influence of conductive foreign matters generated in production process of a conductive film.SOLUTION: Each electrode (each reception electrode 12) of a conductive film 10 includes a dummy pattern 40 configured by a plurality of first dummy thin-lines 41. The plurality of first dummy thin-lines 41 are disposed so that each end part faces each other while leaving at least a first space D1 with respect to a thin-line 20 configuring a cell 13. In the cells 13, 13 adjacent to each other, the end part of the first dummy thin-line 41 located in one cell 13, and the end part of the first dummy thin-line 41 located in the other cell 13 are disposed while leaving a second space D2 in an extending direction of a boundary line of the cells 13, 13.SELECTED DRAWING: Figure 12

Description

[Technical field]

[0001] The present disclosure relates to conductive films. [Background technology]

[0002] Conventionally, for example, a conductive film applicable to a touch sensor is known as shown in Patent Document 1. Specifically, Patent Document 1 discloses an electrode member 3 for a touch panel that corresponds to the conductive film.

[0003] The electrode member 3 for a touch panel has a transparent insulating substrate 5, a second electrode layer 6B formed on the transparent insulating substrate 5, a transparent insulating member 7B formed on the second electrode layer 6B, and a first electrode layer 6A arranged to overlap the second electrode layer 6B via the transparent insulating member 7B.

[0004] The first electrode layer 6A is provided with a plurality of first strip-shaped electrodes 11. Each of the first strip-shaped electrodes 11 has a plurality of first electrode lines EW1 formed of thin metal wires MW1.

[0005] The second electrode layer 6B is provided with a plurality of second strip-shaped electrodes 21. The second strip-shaped electrodes 21 have a plurality of second electrode lines EW2 each formed of the fine metal wires MW2, and a plurality of second unconnected lines NW2 each formed of the fine metal wires MW2.

[0006] The second unconnected lines NW2 are elements for making the second electrode lines EW2 less noticeable. The second unconnected lines NW2 are arranged in a rectangular area (inside the second unit cell C22) surrounded by four of the second electrode lines EW2. The second unconnected lines NW2 are arranged in the second unit cell C22 with a predetermined gap (gap G4) between them and the second electrode lines EW2 constituting the second unit cell C22. That is, the second unconnected lines NW2 are electrically insulated from the second electrode lines EW2. [Prior art documents] [Patent documents]

[0007] [Patent Document 1] Patent Publication No. 2022-10750 Summary of the Invention [Problem to be solved by the invention]

[0008] Incidentally, in the electrode member 3 for a touch panel disclosed in Patent Document 1, in an intersection region between each first strip electrode 11 and each second strip electrode 21 (for example, intersection region A1 shown in FIG. 4 of Patent Document 1), the capacitance value in the intersection region is determined by the number of intersections between the multiple first electrode wires EW1 and the multiple second electrode wires EW2.

[0009] On the other hand, in the manufacturing process of a conductive film such as the electrode member for a touch panel 3, conductive foreign matter generated in the manufacturing process may adhere to the electrode member for a touch panel 3. For example, when the conductive foreign matter adheres to the gap (gap G4) between the second electrode wire EW2 and the second unconnected wire NW2 in the second electrode layer 6B, the conductive foreign matter may cause an electrical short circuit between the second electrode wire EW2 and the second unconnected wire NW2. In particular, when the conductive foreign matter adheres to the boundary between the adjacent second unit cells C22, C22 so as to straddle the boundary, there is a risk of an electrical short circuit between the second electrode wire EW2 corresponding to the boundary and the second unconnected wires NW2, NW2 facing each other across the second electrode wire EW2.

[0010] In the intersecting region A1, when the conductive foreign matter is attached, the number of intersections between the first electrode wires EW1 and the second electrode wires EW2 and the unconnected lines NW2 (i.e., the unconnected lines NW2 electrically short-circuited with the second electrode wires EW2 by the conductive foreign matter) increases compared to the number of intersections when the conductive foreign matter is not attached. Specifically, in the location where the conductive foreign matter is attached, the capacitance value may increase locally in the intersecting region A1. As a result, for example, in the touch panel electrode member of Patent Document 1, there is a risk of localized reduction in sensor sensitivity to touch operations by a user's finger or a touch pen.

[0011] Thus, in the configuration of the conventional technology, there is a risk that the inherent function of the conductive film may be impaired due to conductive foreign matter generated during the manufacturing process of the conductive film.

[0012] The present disclosure has been made in view of the above points, and has an object to reduce the influence of conductive foreign matter that occurs during the manufacturing process of a conductive film. [Means for solving the problem]

[0013] In order to achieve the above object, a conductive film according to an embodiment of the present disclosure includes a plurality of electrodes, each of which is configured by a mesh pattern formed by arranging a plurality of cells each made of a plurality of conductive thin wires. Each of the plurality of electrodes includes a dummy pattern electrically insulated from the plurality of thin wires. The dummy pattern is configured by a plurality of first dummy thin wires arranged in a cell region. The plurality of first dummy thin wires are arranged such that each end faces the thin wire constituting the cell with at least a first gap therebetween. In addition, in the vicinity of the boundary between adjacent cells, an end of the first dummy thin wire located in one cell and an end of the first dummy thin wire located in the other cell are arranged with a second gap therebetween in the extension direction of the boundary between the cells. Effect of the Invention

[0014] According to the present disclosure, it is possible to reduce the effects of conductive foreign matter that occurs during the manufacturing process of a conductive film. [Brief description of the drawings]

[0015] [Figure 1] FIG. 1 is an overall perspective view of a touch sensor to which a conductive film according to an embodiment of the present disclosure is applied. [Diagram 2] FIG. 2 is a cross-sectional view taken along line II-II in FIG. [Diagram 3] FIG. 3 is a perspective view showing a schematic view of the conductive film as viewed from the front surface side. [Figure 4] FIG. 4 is a schematic diagram showing the transmitting electrodes, the first wiring portion, and the pads as viewed from the rear surface side of the substrate. [Diagram 5] FIG. 5 is a schematic diagram showing the receiving electrodes, the second wiring portion, and the pads as viewed from the front surface side of the substrate. [Figure 6] FIG. 6 is a partial enlarged view of portion VI shown in FIG. [Figure 7] FIG. 7 is a diagram illustrating a schematic configuration of a mesh pattern in a transmitting electrode. [Figure 8] FIG. 8 is a diagram showing a schematic configuration of the mesh pattern, dummy pattern, and dummy electrodes of the receiving electrodes. [Figure 9] FIG. 9 is a partial enlarged view of portion IX shown in FIG. [Figure 10] FIG. 10 is a cross-sectional view that illustrates a schematic cross-sectional state of a thin wire. [Figure 11] FIG. 11 is a partially enlarged view that shows, in outline, one arbitrarily selected cell from among a plurality of cells that constitute the receiving electrode, and a dummy pattern located within the cell. [Figure 12] FIG. 12 is a partially enlarged view that shows a schematic relationship between the boundary lines between adjacent cells and the first dummy thin lines located in the vicinity of the boundary lines. [Figure 13] FIG. 13 is a partial enlarged view that shows a schematic relationship between a plurality of first dummy thin wires located in a cell adjacent to a dummy electrode and a plurality of second dummy thin wires that constitute the dummy electrode. [Figure 14] FIG. 14 is a partial enlarged view that shows a schematic relationship between the thin lines corresponding to the boundary lines between the cells shown in FIG. 12 and the first dummy thin lines that face each other across the thin lines. [Figure 15] FIG. 15 is a diagram corresponding to FIG. 12 and illustrating a schematic relationship between the boundary lines between adjacent cells and each of the first dummy thin lines located in the vicinity of the boundary lines in the first modification. [Figure 16] FIG. 16 is a partial enlarged view that illustrates a schematic relationship between a plurality of first dummy thin wires located in a cell adjacent to a dummy electrode and a plurality of second dummy thin wires that constitute the dummy electrode in the first modification. [Figure 17] FIG. 17 is a diagram corresponding to FIG. 12 and illustrating a schematic relationship between the boundary lines between adjacent cells and each of the first dummy thin lines located in the vicinity of the boundary lines in the second modification. [Figure 18] FIG. 18 is a partial enlarged view illustrating a schematic relationship between a plurality of first dummy thin wires located in a cell adjacent to a dummy electrode and a plurality of second dummy thin wires constituting the dummy electrode in the second modification. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0016] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The following description of the embodiments is merely illustrative in nature and is not intended to limit the present disclosure, its application, or its uses.

[0017] 1 shows a touch sensor 1 to which a conductive film 10 (see FIGS. 2 to 5) according to an embodiment of the present disclosure is applied. The touch sensor 1 is a capacitance-type sensor-type input device that is applied to a display 100 (see FIG. 2). The touch sensor 1 is used as an input device for, for example, in-vehicle devices such as car navigation systems, display devices for personal computers, mobile phones, personal digital assistants, portable game machines, copy machines, ticket machines, automated teller machines, watches, and the like.

[0018] In the following description, the side on which an operation surface 2b (see FIGS. 1 and 2) of a cover member 2 described later is located is defined as the "front side" of the touch sensor 1, and the opposite side is defined as the "back side" of the touch sensor 1, and the positional relationship of each element constituting the touch sensor 1 is defined. Furthermore, in this embodiment, for convenience of description, the direction from the left side to the right side of the paper in FIG. 3 is defined as the "first direction X," while the direction from the bottom to the top of the paper in FIG. 3 is defined as the "second direction Y."

[0019] (Cover material) As shown in Fig. 1 and Fig. 2, the touch sensor 1 includes a cover member 2 having optical transparency. The cover member 2 is made of, for example, a cover glass or a plastic cover lens. The cover member 2 is formed, for example, in the shape of a rectangular plate in a plan view. The cover member 2 is fixed to a second layer 5 (see Fig. 10) of a substrate 3 described later.

[0020] A generally frame-shaped decorative portion 2a is formed in a dark color such as black by screen printing or the like on the periphery of the rear surface of the cover member 2. The rectangular area inside surrounded by this decorative portion 2a is a light-transmitting view area Va. That is, the user can obtain visual information from the display arranged on the rear side of the touch sensor 1 through this view area Va. The surface of the cover member 2 in the view area Va is configured as an operation surface 2b that the user's fingers come into contact with when performing a touch operation.

[0021] (Conductive film) 2 to 6, the touch sensor 1 includes a conductive film 10. The conductive film 10 can be attached to the back surface side of the cover member 2 (see FIG. 2). The conductive film 10 includes a substrate 3, a plurality of sensor electrodes (a plurality of electrodes) using a capacitance method, a plurality of wiring portions, a first ground portion 34, a second ground portion 35, and a plurality of dummy electrodes 42. Details of the substrate 3, the plurality of sensor electrodes, the plurality of wiring portions, the first ground portion 34, the second ground portion 35, and the plurality of dummy electrodes 42 will be described later.

[0022] (Adhesive layer) As shown in Fig. 2, the touch sensor 1 includes an adhesive layer 7. The adhesive layer 7 is laminated between the cover member 2 and the substrate 3. The adhesive layer 7 is an optical clear adhesive (OCA) having optical transparency. The thickness of the adhesive layer 7 is, for example, 25 µm or more and 250 µm or less.

[0023] (Flexible wiring board) 1, the touch sensor 1 includes a flexible wiring board 8. The flexible wiring board 8 is configured to have flexibility and to have electrical characteristics that do not change even when deformed. The flexible wiring board 8 is made of a flexible insulating film such as PI (polyimide), PET (polyethylene terephthalate), or PEN (polyethylene naphthalate).

[0024] (substrate) 10, the substrate 3 has a first layer 4 and a second layer 5. Each of the first layer 4 and the second layer 5 is formed, for example, in a substantially rectangular shape in a plan view.

[0025] The first layer 4 is made of a transparent resin material, such as PET (polyethylene terephthalate), PC (polycarbonate), COP (cycloolefin polymer), and COC (cycloolefin copolymer).

[0026] The second layer 5 is laminated on the surface of the first layer 4. Although not shown, in this embodiment, the second layer 5 is also laminated on the back surface of the first layer 4. The second layer 5 is a layer for forming a plurality of grooves 6, which will be described later. The second layer 5 is made of a resin material having insulating properties and transparency. The thickness of the second layer 5 is set to, for example, 1.0 μm or more and 10.0 μm or less in order to ensure flexibility. The thickness of the second layer 5 is formed to be greater than the depth of the grooves 6, which will be described later.

[0027] A plurality of grooves 6 are provided on the surface of the second layer 5. Although not shown, a plurality of grooves 6 are also provided on the back surface of the second layer 5. Each groove 6 has a bottom that is recessed in the thickness direction of the substrate 3. The depth of each groove 6 is set to, for example, not less than 0.9 μm and not more than 3.0 μm.

[0028] (sensor electrode) The multiple sensor electrodes (multiple electrodes) are composed of multiple transmitting electrodes 11 and multiple receiving electrodes 12 (see Figs. 3 to 6). The multiple transmitting electrodes 11 and multiple receiving electrodes 12 are arranged in positions on the substrate 3 corresponding to the view area Va (see Fig. 1). The touch sensor 1 is capable of detecting a touch operation by a user's finger (detection target) that touches the operation surface 2b through the multiple transmitting electrodes 11 and multiple receiving electrodes 12 located within the view area Va.

[0029] Each transmitting electrode 11 is connected to a drive circuit (not shown) via a flexible wiring board 8. Each transmitting electrode 11 is configured to radiate an electric field to the surroundings by this drive circuit. Meanwhile, each receiving electrode 12 is connected to a detection circuit (not shown) via a flexible wiring board 8. Each receiving electrode 12 is configured to receive the electric field radiated from each transmitting electrode 11.

[0030] As shown in Fig. 3 and Fig. 6, the transmitting electrodes 11 and the receiving electrodes 12 are arranged to intersect (orthogonally) with each other in a plan view. A node is formed in an area where each transmitting electrode 11 and each receiving electrode 12 overlap. This node is configured as an area capable of generating capacitance. In addition, the capacitance value of the node is determined by the number of intersections between the multiple thin wires 20 constituting each transmitting electrode 11 and the multiple thin wires 20 constituting each receiving electrode 12. Details of the multiple thin wires 20 will be described later.

[0031] As shown in Fig. 4, the multiple transmitting electrodes 11 are provided on the back surface side of the substrate 3. Each transmitting electrode 11 extends along the long side direction (first direction X) of the substrate 3. The multiple transmitting electrodes 11 are arranged at intervals from one another in the short side direction (second direction Y) of the substrate 3. As shown in Fig. 9, the interval ES between the transmitting electrodes 11, 11 is set to, for example, not less than 1 µm and not more than 20 µm.

[0032] 5, the multiple receiving electrodes 12 are provided on the front surface side of the substrate 3. That is, the multiple receiving electrodes 12 are arranged on the substrate 3 on the viewing side of the touch sensor 1 (the side on which the operation surface 2b of the cover member 2 is located). The multiple receiving electrodes 12 are insulated from the multiple transmitting electrodes 11 via the substrate 3. Each receiving electrode 12 extends along the short side direction of the substrate 3 (second direction Y). The multiple receiving electrodes 12 are arranged at intervals from one another in the long side direction of the substrate 3 (first direction X).

[0033] As shown in FIG. 6, the pitch EP between the receiving electrodes 12, 12 in the first direction X is, for example, 3 mm or more and 7 mm or less. The electrode width EW2 of the receiving electrodes 12 is configured to be smaller than the pitch EP between the receiving electrodes 12, 12. Specifically, the electrode width EW2 of the receiving electrodes 12 is, for example, 0.5 mm or more. The electrode width EW2 of the receiving electrodes 12 is configured to be smaller than the electrode width EW1 of the transmitting electrode 11. In FIG. 6, dot hatching is applied only to each receiving electrode 12 in order to make it easier to see the overlapping state between each transmitting electrode 11 and each receiving electrode 12. In FIG. 6, for convenience of illustration, the first and second ground parts 34, 35 and the first and second ground parts 34, 35 are omitted.

[0034] As shown in Fig. 7 and Fig. 8, each of the transmitting electrodes 11 and each of the receiving electrodes 12 includes a mesh pattern 14. The mesh pattern 14 is formed so that a plurality of cells 13 each consisting of a plurality of fine wires 20 is arranged in an array. The mesh pattern 14 constituting each of the transmitting electrodes 11 and the mesh pattern 14 constituting each of the receiving electrodes 12 are arranged so as to overlap each other in the thickness direction of the substrate 3. In Fig. 8, in order to clearly show the outer edge of the receiving electrode 12, the position corresponding to the outer edge of the receiving electrode 12 is indicated by a virtual line V.

[0035] Each of the fine wires 20 has electrical conductivity. The fine wires 20 extend in a direction oblique to each of the first direction X and the second direction Y. The cross-sectional structure of the fine wires 20 will be described later.

[0036] The line width of each of the thin wires 20 constituting the transmitting electrode 11 and the receiving electrode 12 is, for example, 1 μm or more and 3 μm or less. The transmitting electrode 11 is configured so that the distance LD1 (see FIG. 6) between adjacent thin wires 20, 20 is in the range of 100 μm to 500 μm. Note that the distance LD1 is preferably approximately the same as each of the distances LD2 and LD3 described below.

[0037] Each cell 13 has a quadrangular shape. The quadrangular shape is formed by imaginary first and second diagonals d1 and d2. The second diagonal d2 is set to be longer than the first diagonal d1. In this embodiment, the quadrangular shape is a rhombus. The acute angle θ of the rhombus is set in the range of 50° to 70°, for example. A more preferable range of the acute angle θ is 50° to 58°. In this embodiment, each cell 13 (see FIG. 8) constituting the receiving electrode 12 is formed to be larger than each cell 13 (see FIG. 7) constituting the transmitting electrode 11.

[0038] Each sensor electrode is configured such that the second diagonal d2 of each cell 13 extends along the extension direction of each sensor electrode.

[0039] 7, in the transmitting electrode 11, the second diagonal d2 of each cell 13 extends along the first direction X. That is, in the transmitting electrode 11, the relatively long second diagonal d2 of each cell 13 is arranged along the first direction X.

[0040] 8, in the receiving electrode 12, the second diagonal d2 of each cell 13 extends along the second direction Y. That is, in the receiving electrode 12, the relatively long second diagonal d2 of each cell 13 is arranged along the second direction Y.

[0041] Here, Fig. 11 shows a schematic diagram of one cell 13 arbitrarily selected from the multiple cells 13 that constitute the receiving electrode 12. One cell 13 is composed of four thin wires 20. In Fig. 11, in order to distinguish each of the four thin wires 20, for the sake of convenience of explanation, these thin wires are denoted by the reference characters 20a, 20b, 20c, and 20d.

[0042] As shown in Fig. 11, thin wire 20a and thin wire 20c are disposed in positions facing each other. Thin wire 20a and thin wire 20c extend in parallel to each other. Thin wire 20b and thin wire 20d are disposed in positions facing each other. Thin wire 20b and thin wire 20d extend in parallel to each other. Thin wire 20a and thin wire 20c each intersect with thin wire 20b and thin wire 20d, respectively.

[0043] (Electrode connection part) As shown in FIG. 8 , each of the transmitting electrode 11 and the receiving electrode 12 includes an electrode connection portion 15. The electrode connection portion 15 has a cross-sectional structure similar to that of the thin wires 20. The electrode connection portion 15 is disposed on the end side of each of the transmitting electrode 11 and the receiving electrode 12. The electrode connection portion 15 is electrically connected to the multiple thin wires 20 that constitute each cell 13. The line width of the electrode connection portion 15 is formed to be thicker than the line width of the multiple thin wires 20 that constitute each cell 13.

[0044] (Cross-sectional structure of thin wire) Each of the thin wires 20 includes a conductive material embedded in each of the grooves 6. As shown in Fig. 10, each of the thin wires 20 is composed of an adhesion layer 21, a seed layer 22, a conductive layer 23, and a blackening layer 24. Note that each of the first dummy thin wires 41 and each of the second dummy thin wires 43 described later are also composed of the adhesion layer 21, the seed layer 22, the conductive layer 23, and the blackening layer 24, similar to each of the thin wires 20. For this reason, illustrations of the cross-sectional structures of each of the first dummy thin wires 41 and each of the second dummy thin wires 43 are omitted.

[0045] The adhesion layer 21 is an element for ensuring adhesion of the seed layer 22 to the groove portion 6. The adhesion layer 21 has a function of making the thin wires 20 less visible when a user views from the operation surface 2b side.

[0046] The adhesion layer 21 is a metal layer made of a metal nitride or a metal oxide containing at least one metal selected from the group consisting of Ti, Al, V, W, Ta, Si, Cr, Ag, Mo, Cu, and Zn. The adhesion layer 21 may be a single layer or a laminate of multiple layers having different compositions. The adhesion layer 21 is disposed in a thin film state on the groove portion 6 by, for example, deposition or sputtering.

[0047] The seed layer 22 has a function of bonding the conductive layer 23 to the adhesion layer 21. Specifically, the seed layer 22 functions as a cathode for depositing a plating solution containing copper (Cu) or the like, which will be described later, on the adhesion layer 21 in this embodiment, for example, during an electroplating process for forming the conductive layer 23. The seed layer 22 is disposed in a thin film state on the adhesion layer 21 by, for example, deposition or sputtering.

[0048] The conductive layer 23 is formed by, for example, electroplating. When electroplating is performed, the seed layer 22 and the conductive layer 23 are formed integrally. As a result, the interface between the seed layer 22 and the conductive layer 23 becomes indistinguishable.

[0049] The blackened layer 24 is laminated on the surface of the conductive layer 23. The blackened layer 24 is formed by substituting palladium for copper crystal grains located at the boundaries between copper crystal grains located on the surface of the conductive layer 23 (blackening treatment). The thickness of the blackened layer 24 is, for example, 7 nm or more and 10 nm or less. The blackened layer 24 has the function of making the thin wires 20 less visible when viewed by a user from the operation surface 2b side.

[0050] (Wiring section) The wiring portions are elements for electrically connecting the transmitting electrodes 11 and the receiving electrodes 12 to external circuits (not shown) (the driving circuit and the detection circuit described above). Each wiring portion is made of a thin wire similar to the thin wire 20.

[0051] As shown in Figs. 3 to 5, the multiple wiring parts are composed of multiple first wiring parts 31 and multiple second wiring parts 32. The multiple first wiring parts 31 and multiple second wiring parts 32 are arranged outside the view area Va (see Fig. 1). Specifically, the multiple first wiring parts 31 and multiple second wiring parts 32 are arranged at positions overlapping with the decorative part 2a (see Figs. 1 and 2) in a plan view seen from the operation surface 2b side. That is, the multiple first wiring parts 31 and multiple second wiring parts 32 are made invisible from the operation surface 2b side by the decorative part 2a.

[0052] 4, the multiple first wiring portions 31 are formed on the back surface of the substrate 3. One end of each of the first wiring portions 31 is electrically connected to an end of each transmitting electrode 11 (i.e., the electrode connection portion 15). The multiple first wiring portions 31 are arranged such that the other end of each of them converges at approximately the center of the lower side of the substrate 3.

[0053] The second wiring parts 32 are formed on the surface of the substrate 3. One end of each of the second wiring parts 32 is electrically connected to an end of each receiving electrode 12 (i.e., the electrode connection part 15 shown in FIG. 8). The second wiring parts 32 are arranged such that the other end of each of them converges at approximately the center of the lower side of the substrate 3.

[0054] (pad) 3 to 5, the other end of each wiring portion is provided with a pad 33 for electrical connection to flexible wiring board 8. Each pad 33 has the same cross-sectional structure as thin wire 20.

[0055] (First and second gland parts) The first and second ground parts 34, 35 shown in Figures 4 and 5 are set to ground potential. The first and second ground parts 34, 35 are electrically insulated from the multiple sensor electrodes and the multiple wiring parts. The first and second ground parts 34, 35 are arranged outside the view area Va (see Figure 1). Specifically, the first and second ground parts 34, 35 are arranged to surround the outer periphery of the view area Va.

[0056] 4, the first ground portion 34 is formed on the back surface of the substrate 3. The first ground portion 34 is disposed at a position closer to the peripheral edge of the back surface of the substrate 3. The pads 33, 33 described above are provided in a midsection of the first ground portion 34 (a midsection located approximately toward the center of the lower side of the substrate 3).

[0057] 5, the second ground portion 35 is formed on the surface of the substrate 3. The second ground portion 35 is disposed at a position closer to the peripheral edge of the surface of the substrate 3. Both ends of the first ground portion 34 are located closer to the approximate center of the lower side of the substrate 3. The pads 33, 33 described above are provided on both ends of the first ground portion 34.

[0058] (Dummy pattern) 8 and 11, the receiving electrode 12 includes a dummy pattern 40. The dummy pattern 40 is disposed within the region of each cell 13 that constitutes the receiving electrode 12 in a plan view.

[0059] The dummy pattern 40 is composed of a plurality of (six in the illustrated example) first dummy thin wires 41. Specifically, the dummy pattern 40 is configured as a mesh pattern made up of a plurality of first dummy thin wires 41. Note that, for convenience of illustration, the illustration of a plurality of first dummy thin wires 41 located outside the cells 13 is omitted in FIG. 11.

[0060] The distance LD2 (see FIG. 11) between the adjacent first dummy thin wires 41, 41 is set to, for example, a range of 100 μm to 500 μm. Each first dummy thin wire 41 extends continuously along a predetermined direction. Specifically, each first dummy thin wire 41 extends linearly from one side constituting a quadrangle of each cell 13 constituting the receiving electrode 12 to the other side opposite the side.

[0061] The dummy pattern 40 is electrically insulated from the multiple thin wires 20 constituting each cell 13 of the receiving electrode 12. Specifically, the end of each first dummy thin wire 41 is disposed at a first interval D1 from each thin wire 20 constituting each cell 13 of the receiving electrode 12 (see FIGS. 11 and 12). That is, each first dummy thin wire 41 constituting the dummy pattern 40 does not intersect with the multiple thin wires 20 constituting the receiving electrode 12.

[0062] Preferably, the lower limit of the first interval D1 is 5 μm. If the first interval D1 is smaller than 5 μm, the thin wires 20 and the first dummy thin wires 41 are likely to be short-circuited by conductive foreign matter (see symbol Fm illustrated in FIG. 14) that may occur during the manufacturing process of the conductive film 10. In other words, there is a risk that the insulation between the cells 13 and the dummy patterns 40 will be impaired. A more preferable lower limit of the first interval D1 is 10 μm.

[0063] Preferably, the upper limit of the first interval D1 is 15 μm. At this upper limit, the thin wires 20 and the first dummy thin wires 41 are less likely to short-circuit, and the thin wires 20 are less noticeable. Note that a case in which the first interval D1 exceeds the upper limit will be described in Modification 1 (see FIG. 15).

[0064] In this manner, by setting the second distance D2 to be equal to or greater than 5 μm and equal to or less than 15 μm, the insulation state between the cells 13 and the dummy patterns 40 is less likely to be impaired, and the visibility of the touch sensor 1 is improved.

[0065] 13, each of the first dummy thin wires 41 is electrically insulated from the electrode connection portion 15. Specifically, an end of each of the first dummy thin wires 41 is disposed at a position away from the electrode connection portion 15.

[0066] Next, as shown in FIG. 11, the first dummy thin wire 41 is inclined at a reference angle θr with respect to the thin wire 20 of the cell 13 positioned in a direction perpendicular to the extension direction of the first dummy thin wire 41.

[0067] The reference angle θr will be specifically described below using auxiliary lines A1 to A6 shown in Fig. 11. Each of the auxiliary lines A1 to A6 is a virtual line extending parallel to each of the thin wires 20 corresponding to each side of the quadrangular shape of one cell 13 arbitrarily selected from the multiple cells 13 constituting the receiving electrode 12. In Fig. 11, in order to distinguish each of the six first dummy thin wires 41, for convenience of description, these first dummy thin wires 41 are indicated by the reference characters 41a, 41b, 41c, 41d, 41e, and 41f.

[0068] In this embodiment, the auxiliary lines A1 to A3 are arranged at equal intervals between the thin wires 20a and 20c. Similarly, the auxiliary lines A4 to A6 are arranged at equal intervals between the thin wires 20b and 20d. The auxiliary lines A1 to A3 do not have to be arranged at equal intervals. The auxiliary lines A4 to A6 do not have to be arranged at equal intervals either.

[0069] The thin wires 20a and 20c of the cell 13 are positioned in a direction perpendicular to the extension direction of each of the first dummy thin wires 41a, 41b, and 41c. Each of the auxiliary lines A1 to A3 extends in a direction parallel to the extension direction of the thin wires 20a and 20c.

[0070] The first dummy thin wire 41a is inclined at the reference angle θr in the clockwise direction with respect to the auxiliary line A1. The first dummy thin wire 41b is inclined at the reference angle θr in the clockwise direction with respect to the auxiliary line A2. The first dummy thin wire 41c is inclined at the reference angle θr in the clockwise direction with respect to the auxiliary line A3. In other words, the first dummy thin wires 41a, 41b, and 41c are inclined at the reference angle θr in the clockwise direction with respect to the thin wires 20a and 20c located in a direction perpendicular to the extension direction of each of them.

[0071] The thin wires 20b and 20d of the cell 13 are positioned in a direction perpendicular to the extension direction of each of the first dummy thin wires 41d, 41e, and 41f. Each of the auxiliary lines A4 to A6 extends in a direction parallel to the extension direction of the thin wires 20b and 20d.

[0072] The first dummy thin wire 41d is inclined at the reference angle θr in the counterclockwise direction with respect to the extension direction of the auxiliary line A4. The first dummy thin wire 41e is inclined at the reference angle θr in the counterclockwise direction with respect to the extension direction of the auxiliary line A5. The first dummy thin wire 41f is inclined at the reference angle θr in the counterclockwise direction with respect to the extension direction of the auxiliary line A6. That is, the first dummy thin wires 41d, 41e, and 41f are inclined at the reference angle θr in the counterclockwise direction with respect to the thin wires 20b and 20d located in a direction perpendicular to each extension direction.

[0073] Preferably, the lower limit of the reference angle θr is 1° or more. If the reference angle θr is smaller than 1°, the second interval D2 described later becomes smaller. Also, preferably, the upper limit of the reference angle θr is 3° or more. If the reference angle θr is larger than 3°, the second interval D2 described later becomes larger. In this way, by setting the reference angle θr to be between 1° and 3°, it becomes possible to set the second interval D2 described later to an appropriate size.

[0074] 12, in the vicinity of the boundary line between adjacent cells 13, 13, an end of the first dummy thin wire 41 located in one cell 13 and an end of the first dummy thin wire 41 located in the other cell 13 are arranged with a second distance D2 in the extension direction of the boundary line between the cells 13, 13. By providing the second distance D2, the end of the first dummy thin wire 41 located in one cell 13 and the end of the first dummy thin wire 41 located in the other cell 13 are separated from each other in the extension direction of the boundary line. In this embodiment, the second distance D2 is formed by setting the above-mentioned reference angle θr.

[0075] Fig. 12 shows two cells 13, 13 arbitrarily selected from the multiple cells 13 constituting the receiving electrode 12. For convenience of explanation, the two cells 13, 13 are denoted by reference characters 13A and 13B in Fig. 12 in order to distinguish between the two cells 13, 13. Cell 13B is located on the upper left side of the paper surface of Fig. 12 with respect to cell 13A.

[0076] The boundary between the cell 13A and the cell 13B corresponds to the thin wire 20a of the cell 13A and corresponds to the thin wire 20c of the cell 13B. The first dummy thin wire 41d located in the cell 13A and the first dummy thin wire 41d located in the cell 13B are arranged with a second interval D2 between them in the extension direction of the boundary. The first dummy thin wire 41e located in the cell 13A and the first dummy thin wire 41e located in the cell 13B are arranged with a second interval D2 between them in the extension direction of the boundary. The first dummy thin wire 41f located in the cell 13A and the first dummy thin wire 41f located in the cell 13B are arranged with a second interval D2 between them in the extension direction of the boundary.

[0077] Here, for example, in relation to a cell 13 (not shown) adjacent to the cell 13A with the thin wire 20b of the cell 13A as a boundary line, the first dummy thin wire 41a located in the cell 13A and the first dummy thin wire 41a located in the cell 13 (not shown) are disposed at a second interval D2 in the extension direction of the boundary line. The same is true for the first dummy thin wires 41b and 41c.

[0078] Preferably, the lower limit of the second interval D2 is 10 μm. If the second interval D2 is smaller than 10 μm, the thin wire 20 and the first dummy thin wire 41 are likely to be short-circuited by conductive foreign matter. In other words, there is a risk that the insulation between the adjacent cells 13, 13 and the dummy pattern 40 may be impaired. A more preferable lower limit of the second interval D2 is 15 μm.

[0079] (dummy electrode) The dummy electrode 42, like the receiving electrode 12, is provided on the front surface side of the substrate 3. As shown in Fig. 8, the dummy electrode 42 is disposed at a position adjacent to the receiving electrode 12 in the X direction.

[0080] 13, the dummy electrode 42 is composed of a plurality of second dummy thin wires 43. Specifically, the dummy electrode 42 is configured as a mesh pattern made up of a plurality of second dummy thin wires 43. The dummy electrode 42 is electrically insulated from each receiving electrode 12.

[0081] 13, the dummy electrode 42 is configured so that the distance LD3 between adjacent second dummy thin wires 43, 43 is in the range of 100 μm to 500 μm. Note that the distance LD3 is preferably approximately the same as each of the distances LD2.

[0082] An end of each second dummy thin wire 43 is disposed at a first distance D1 from each thin wire 20 constituting the cell 13 of the receiving electrode 12. That is, each second dummy thin wire 43 does not intersect with the multiple thin wires 20 constituting the receiving electrode 12. Note that the preferable lower and upper limits of the first distance D1 are the same as the first distance D1 shown in FIG.

[0083] Further, each of the second dummy thin wires 43 is electrically insulated from the electrode connection portion 15. Specifically, an end of each of the second dummy thin wires 43 is disposed away from the electrode connection portion 15 with a gap therebetween.

[0084] 13, the second dummy thin wire 43 is inclined at a reference angle θr with respect to the thin wire 20 located in the vicinity of the dummy electrode 42 of the cell 13 adjacent to the dummy electrode 42, with respect to the thin wire 20 located in a direction perpendicular to the extension direction of the second dummy thin wire 43. Hereinafter, with reference to FIG. 13, details of the reference angle θr will be specifically described based on the relationship between the second dummy thin wires 43a to 43f and the virtual auxiliary lines B1 to B6.

[0085] The thin wires 20a and 20c of the cell 13 are positioned in a direction perpendicular to the extension direction of each of the second dummy thin wires 43a, 43b, and 43c. Each of the auxiliary lines B1 to B3 extends in a direction parallel to the extension direction of the thin wires 20a and 20c.

[0086] The second dummy thin wire 43a is inclined at the reference angle θr in the clockwise direction with respect to the auxiliary line B1. The second dummy thin wire 43b is inclined at the reference angle θr in the clockwise direction with respect to the auxiliary line B2. The second dummy thin wire 43c is inclined at the reference angle θr in the clockwise direction with respect to the auxiliary line B3. In other words, the second dummy thin wires 43a, 43b, and 43c are inclined at the reference angle θr in the clockwise direction with respect to the extension direction of the thin wires 20a and 20c.

[0087] The thin wires 20b and 20d of the cell 13 are positioned in a direction perpendicular to the extension direction of each of the second dummy thin wires 43d, 43e, and 43f. Each of the auxiliary lines B4 to B6 extends in a direction parallel to the extension direction of the thin wires 20b and 20d.

[0088] The second dummy thin wire 43d is inclined at the reference angle θr in the counterclockwise direction with respect to the auxiliary line B4. The second dummy thin wire 43e is inclined at the reference angle θr in the counterclockwise direction with respect to the auxiliary line B5. The second dummy thin wire 43f is inclined at the reference angle θr in the counterclockwise direction with respect to the auxiliary line B6. That is, the second dummy thin wires 43d, 43e, and 43f are inclined at the reference angle θr in the counterclockwise direction with respect to the extension direction of the thin wires 20b and 20d.

[0089] 13, in the thin wire 20 located near the dummy electrode 42 of the cell 13 adjacent to the dummy electrode 42, an end of a first dummy thin wire 41 located in the cell 13 and facing the thin wire 20 and an end of a second dummy thin wire 43 facing the thin wire 20 are arranged with a second distance D2 in the extension direction of the thin wire 20. By providing the second distance D2, in the thin wire 20 of the cell 13 located near the dummy electrode 42, the end of the first dummy thin wire 41 and the end of the second dummy thin wire 43 are separated from each other in the extension direction of the thin wire 20. Note that a preferable lower limit value of the second distance D2 is the same as the lower limit value of the second distance D2 shown in FIG.

[0090] 13, the first dummy thin wire 41a and the second dummy thin wire 43a are arranged at a second distance D2 from each other in the extension direction of the thin wire 20c. The first dummy thin wire 41b and the second dummy thin wire 43b are arranged at a second distance D2 from each other in the extension direction of the thin wire 20c. The first dummy thin wire 41c and the second dummy thin wire 43c are arranged at a second distance D2 from each other in the extension direction of the thin wire 20c.

[0091] The first dummy thin wire 41d and the second dummy thin wire 43d are arranged at a second interval D2 in the extension direction of the thin wire 20a. The first dummy thin wire 41e and the second dummy thin wire 43e are arranged at a second interval D2 in the extension direction of the thin wire 20a. The first dummy thin wire 41f and the second dummy thin wire 43f are arranged at a second interval D2 in the extension direction of the thin wire 20a.

[0092] [Problems with the prior art] Regarding the configuration of the above-mentioned conventional technology (Patent Document 1), in the electrode member for a touch panel disclosed in Patent Document 1, in an intersection region between each first strip electrode and each second strip electrode (for example, the intersection region shown in Figure 4 of Patent Document 1), the capacitance value in the intersection region is determined by the number of intersections between a plurality of first electrode lines and a plurality of second electrode lines.

[0093] On the other hand, in the manufacturing process of the conductive film, conductive foreign matter generated in the manufacturing process may adhere to the touch panel electrode member. For example, when the conductive foreign matter adheres to the gap between the second electrode line and the second unconnected line in the second electrode layer (corresponding to the gap shown in FIG. 4 of Patent Document 1), the conductive foreign matter may cause an electrical short circuit between the second electrode line and the second unconnected line.

[0094] In particular, in the touch panel electrode member of Patent Document 1, in adjacent second unit cells, an end of the second unconnected line located in one second unit cell and an end of the second unconnected line located in the other second unit cell are arranged so as not to generate a gap in the extension direction of the boundary line between the second unit cells. With this arrangement, if the conductive foreign matter adheres to the boundary line between adjacent second unit cells so as to straddle the boundary line, there is a risk of an electrical short circuit between the second electrode line corresponding to the boundary line and the second unconnected lines facing each other across the second electrode line.

[0095] In the intersection region, when the conductive foreign matter is attached, the number of intersections between the multiple first electrode wires and the multiple second electrode wires and the unconnected lines (i.e., the unconnected lines electrically short-circuited with the second electrode wires by the conductive foreign matter) increases compared to the number of intersections when the conductive foreign matter is not attached. Specifically, in the location where the conductive foreign matter is attached, the capacitance value may increase locally in the intersection region. As a result, in the configuration of the conventional technology (for example, the electrode member for a touch panel in Patent Document 1), there was a risk of localized reduction in sensor sensitivity to touch operations by a user's finger or a touch pen.

[0096] As described above, in the configurations of the conventional technology, there was a risk that the inherent function of the conductive film (corresponding to the above-mentioned sensor sensitivity in the case of the electrode member 3 for a touch panel of Patent Document 1) would be impaired due to conductive foreign matter generated during the manufacturing process.

[0097] [Effects of the embodiment] In contrast to the above-described configuration of the conventional art, in the conductive film 10 according to the embodiment of the present disclosure, in the vicinity of the boundary line between the adjacent cells 13, 13, an end of the first dummy thin wire 41 located in one cell 13 and an end of the first dummy thin wire 41 located in the other cell 13 are disposed with a second distance D2 in the extension direction of the boundary line between the cells 13, 13. By providing this second distance D2, even if a conductive foreign matter (see reference symbol Fm shown in FIG. 14) generated during the manufacturing process of the conductive film 10 is attached so as to straddle the boundary line between the adjacent cells 13A and 13B, as shown in FIG. 14, the conductive foreign matter is unlikely to come into contact with the first dummy thin wire 41 located in the vicinity of the boundary line (thin wire 20). In other words, even if a conductive foreign matter is attached as described above, the thin wire 20 corresponding to the boundary line and the first dummy thin wires 41, 41 facing each other across the thin wire 20 are unlikely to be electrically short-circuited. This makes it possible to prevent the conductive film 10 from being affected by conductive foreign matter. As a result, in the touch sensor 1 to which the conductive film 10 is applied, when a touch operation is performed with a user's finger or a touch pen, the sensor sensitivity to the touch operation does not decrease locally. Therefore, in the conductive film 10 according to the embodiment of the present disclosure, it is possible to reduce the influence of conductive foreign matter generated during the manufacturing process of the conductive film 10.

[0098] Furthermore, in the touch sensor 1 to which the conductive film 10 is applied, the dummy pattern 40 makes it difficult for a user of the touch sensor 1 to distinguish between the multiple thin wires 20 constituting each receiving electrode 12 (sensor electrode) and the multiple first dummy thin wires 41 constituting the dummy pattern 40 when viewed from the operation surface 2b side. That is, the multiple thin wires 20 constituting each receiving electrode 12 become less noticeable from the operation surface 2b side. As a result, the appearance of the touch sensor 1 can be improved.

[0099] Moreover, the first dummy thin wire 41 is inclined at the reference angle θr with respect to the thin wire 20 of the cell 13 located in a direction perpendicular to the extension direction of the first dummy thin wire 41. This configuration makes it easier to provide the second interval D2 described above. As a result, the end of the first dummy thin wire 41 located in one cell 13 and the end of the first dummy thin wire 41 located in the other cell 13 are separated from each other in the extension direction of the boundary line between the cells 13, 13. As a result, as described above, the influence of conductive foreign matter generated during the manufacturing process of the conductive film 10 can be reduced.

[0100] In addition, with respect to the dummy electrode 42, in the thin wire 20 located near the dummy electrode 42 of the cell 13 adjacent to the dummy electrode 42, an end of the first dummy thin wire 41 located in the cell 13 and facing the thin wire 20 and an end of the second dummy thin wire 43 facing the thin wire 20 are disposed with a second distance D2 in the extension direction of the thin wire 20 (see FIG. 13). By providing this second distance D2, even if a conductive foreign object adheres to the thin wire 20 of the cell 13 located near the dummy electrode 42, the conductive foreign object is unlikely to come into contact with the first dummy thin wire 41 and the second dummy thin wire 43 facing each other across the thin wire 20. That is, even if a conductive foreign object adheres as described above, the thin wire 20 of the cell 13 located near the dummy electrode 42 is unlikely to be electrically short-circuited with the first dummy thin wire 41 and the second dummy thin wire 43. This makes it possible to prevent the influence of the conductive foreign object from occurring. Therefore, the influence of the conductive foreign object can also be reduced in the relationship between the sensor electrode (the receiving electrode 12 in this embodiment) and the dummy electrode 42.

[0101] In addition, the second dummy thin wire 43 is inclined by a reference angle θr with respect to the thin wire 20 located in the direction perpendicular to the extension direction of the second dummy thin wire 43 in the cell 13 adjacent to the dummy electrode 42 and located near the dummy electrode 42 (see FIG. 13). This configuration makes it easier to provide the second interval D2. As a result, in the thin wire 20 of the cell 13 located near the dummy electrode 42, the end of the first dummy thin wire 41 located in the cell 13 and facing the thin wire 20, and the end of the second dummy thin wire 43 facing the thin wire 20 are separated from each other in the extension direction of the thin wire 20. As a result, the influence of conductive foreign matter can be reduced in the relationship between the sensor electrode (the receiving electrode 12 in this embodiment) and the dummy electrode 42.

[0102] [First Modification of the Embodiment] In the above embodiment, the end of each first dummy thin wire 41 is disposed with the first distance D1 from the thin wire 20 constituting each cell 13, but the present invention is not limited to this.

[0103] For example, as in Modification 1 shown in Fig. 15, the end of each first dummy thin wire 41 may be disposed at a third distance D3 from the thin wire 20 constituting each cell 13 of the receiving electrode 12. The third distance D3 is larger than the first distance D1 shown in Fig. 11 and Fig. 12. That is, the third distance D3 is set to be larger than the upper limit value of the first distance D1 described above.

[0104] A preferable upper limit value of the third distance D3 is 25 μm. A more preferable upper limit value of the third distance D3 is 20 μm.

[0105] In this modification, even if a relatively large conductive foreign object adheres across the boundary between adjacent cells 13, 13, the conductive foreign object is unlikely to come into contact with the end of the first dummy thin wire 41 located near the boundary (thin wire 20). In other words, even if a relatively large conductive foreign object adheres as described above, the thin wire 20 corresponding to the boundary and the first dummy thin wires 41, 41 facing each other across the thin wire 20 are unlikely to be electrically short-circuited. Therefore, in modification 1, the influence of the conductive foreign object can be avoided in advance.

[0106] In the above embodiment, in the relationship between the receiving electrode 12 and the dummy electrode 42, the end of each second dummy thin wire 43 is disposed at a first distance D1 from each thin wire 20 constituting the cell 13 of the receiving electrode 12, but the present invention is not limited to this. That is, as shown in Fig. 16, the end of each second dummy thin wire 43 may be disposed to face the thin wire 20 of the cell 13 adjacent to the dummy electrode 42 with a third distance D3 larger than the first distance D1.

[0107] [Modification 2 of the embodiment] In the above embodiment, the first dummy thin wires 41 extend continuously in a predetermined direction, but the present invention is not limited to this. For example, as in Modification 2 shown in FIG. 17, the first dummy thin wires 41 may be formed in an intermittent shape.

[0108] 17, the first dummy thin wire 41 is provided with at least one slit portion 44. Each slit portion 44 is configured such that the middle portion of the first dummy thin wire 41 is partially interrupted. Preferably, the slit portion 44 is disposed near the boundary line between the adjacent cells 13, 13.

[0109] In this modification, by providing at least one slit portion 44 in the first dummy thin wire 41, even if a conductive foreign object adheres to straddle the boundary between adjacent cells 13, 13 and contacts an end of the first dummy thin wire 41 located near the boundary (thin wire 20), it is possible to minimize the range of electrical short circuit. In other words, the influence of the conductive foreign object can be suppressed.

[0110] In order to minimize the area where the receiving electrode 12 and the dummy electrode 42 are electrically shorted, a slit portion 44 may be disposed in the vicinity of the dummy electrode 42 in each thin wire 20 of the cell 13 adjacent to the dummy electrode 42. Furthermore, at least one slit portion 44 may be provided in each second dummy thin wire 43 of the dummy electrode 42, as shown in FIG.

[0111] [Other embodiments] In the above embodiment, the view area Va has a substantially rectangular shape, but is not limited to this shape. The view area Va may have a polygonal shape such as a substantially circular shape or a pentagonal shape in a plan view.

[0112] In the above embodiment, a configuration using one substrate 3 has been shown, but the present invention is not limited to this configuration. That is, a configuration using two substrates (not shown) may also be used. Although not shown, two substrates may be used in which the second layer 5 is laminated on the front or back surface of the first layer 4.

[0113] In the above embodiment, the substrate 3 has the first layer 4 and the second layer 5, but the present invention is not limited to this. For example, the substrate 3 may have only the first layer 4. In such a case, it is sufficient that the plurality of grooves 6 are formed on at least one of the front and back surfaces of the first layer 4.

[0114] In the above embodiment, the direction from the left side to the right side on the paper surface of FIG. 3 is defined as the first direction X, while the direction from the bottom side to the top on the paper surface of FIG. 3 is defined as the second direction Y, but this is not limited thereto. That is, the direction from the bottom side to the top on the paper surface of FIG. 3 may be defined as the first direction X, while the direction from the left side to the right side on the paper surface of FIG. 3 may be defined as the second direction Y. In this case, although not shown, the extension direction of each transmitting electrode 11 and the second diagonal line d2 of each cell 13 constituting each transmitting electrode 11 are directed from the bottom side to the top on the paper surface of FIG. 3. On the other hand, the extension direction of each receiving electrode 12 and the second diagonal line d2 of each cell 13 constituting each receiving electrode 12 are directed from the left side to the right side on the paper surface of FIG. 3.

[0115] In the above embodiment, the multiple transmitting electrodes 11, the multiple first wiring portions 31, and the first ground portion 34 are provided on the rear surface side of the substrate 3, while the multiple receiving electrodes 12, the multiple second wiring portions 32, and the second ground portion 35 are provided on the front surface side of the substrate 3. However, the present invention is not limited to this embodiment. For example, although not shown, the multiple transmitting electrodes 11, the multiple first wiring portions 31, and the first ground portion 34 may be provided on the front surface side of the substrate 3, while the multiple receiving electrodes 12, the multiple second wiring portions 32, and the second ground portion 35 may be provided on the rear surface side of the substrate 3. Even in such a configuration, each dummy pattern 40 and each dummy electrode 42 are arranged on the front surface side of the substrate 3 (the visible side of the touch sensor 1).

[0116] In the above embodiment, the touch sensor 1 is shown in a state in which the cover member 2 and the flexible wiring board 8 are attached to the substrate 3, but is not limited to this form. In other words, the concept of the touch sensor 1 according to the present disclosure includes a state before the cover member 2 and the flexible wiring board 8 are attached to the substrate 3. Furthermore, the concept of the touch sensor 1 according to the present disclosure also includes a configuration in which the above-mentioned transmitting electrodes 11, receiving electrodes 12, first wiring portions 31, second wiring portions 32, and multiple pads 33 are formed on a long base material (for example, a long hoop-shaped member not shown) in a state before the substrates 3 are individually formed.

[0117] In the above embodiment, the shape of each cell 13 is a rhombus, but the shape is not limited to this. That is, each cell 13 may have a quadrangle shape formed by an imaginary first diagonal d1 and an imaginary second diagonal d2 that is longer than the first diagonal d1.

[0118] In the above embodiment, the second diagonal line d2 of each cell 13 constituting the transmitting electrode 11 extends along the first direction X (see FIG. 7), but is not limited to this. Although not shown, the second diagonal line d2 of each cell 13 in the transmitting electrode 11 may be configured to extend along the second direction Y.

[0119] In the above embodiment, the second diagonal line d2 of each cell 13 constituting the receiving electrode 12 extends along the second direction Y (see FIG. 8), but is not limited to this. Although not shown, the second diagonal line d2 of each cell 13 in the receiving electrode 12 may be configured to extend along the first direction X.

[0120] In the above embodiment, the first dummy thin wires 41 extend linearly, but the present invention is not limited to this. For example, the first dummy thin wires 41 may be configured to extend in a curved or zigzag shape (not shown). Similarly, the second dummy thin wires 43 may be configured to extend in a curved or zigzag shape (not shown) instead of in a linear shape.

[0121] In the above embodiment, the transmitting electrode 11 does not include the dummy pattern 40, but the present invention is not limited to this embodiment. Although not shown, the transmitting electrode 11 may include a dummy pattern similar to the dummy pattern 40 described in the above embodiment. In this case, the dummy pattern on the transmitting electrode 11 side is composed of a plurality of dummy thin lines (not shown), similar to the dummy pattern 40 on the receiving electrode 12 side. Moreover, the dummy pattern on the transmitting electrode 11 side is arranged within the region of each cell 13 constituting the transmitting electrode 11 in a plan view.

[0122] In the above embodiment, a configuration in which the dummy electrode 42 is not provided between the transmitting electrodes 11, 11 has been shown, but the present invention is not limited to this configuration. For example, when the electrode width EW1 of the transmitting electrode 11 is relatively small, a dummy electrode (not shown) may be provided between the transmitting electrodes 11, 11. The dummy electrode is composed of a plurality of dummy thin wires (not shown) similar to the dummy electrode 42 shown in FIG. 8.

[0123] In the above embodiment, the multiple transmitting electrodes 11, the multiple first wiring portions 31, and the first ground portion 34 are provided on the rear surface side of the substrate 3, while the multiple receiving electrodes 12, the multiple second wiring portions 32, and the second ground portion 35 are provided on the front surface side of the substrate 3. However, the present invention is not limited to this embodiment. For example, although not shown, the multiple transmitting electrodes 11, the multiple first wiring portions 31, and the first ground portion 34 may be provided on the front surface side of the substrate 3, while the multiple receiving electrodes 12, the multiple second wiring portions 32, and the second ground portion 35 may be provided on the rear surface side of the substrate 3. Even in such a configuration, each dummy pattern 40 and each dummy electrode 42 will be disposed on the front surface side of the substrate 3 (the visible side of the touch sensor 1).

[0124] In the above embodiment, the plating solution contains copper (Cu) as a main component, but is not limited thereto. For example, the plating solution may contain silver, gold, or a copper alloy.

[0125] In the above embodiment, the touch sensor 1 to which the conductive film 10 according to the embodiment of the present disclosure is applied has been illustrated, but the present invention is not limited thereto. For example, the conductive film 10 according to the embodiment of the present disclosure can be widely applied to technical fields other than the touch sensor 1 (for example, various technical fields such as liquid crystal display devices, organic electroluminescence display devices (OLEDs), micro LED display devices, solar cell devices, heater devices, antenna devices, and electromagnetic wave shielding sheets). [Industrial Applicability]

[0126] The present disclosure has industrial applicability as a conductive film used in various products such as touch sensors. [Explanation of symbols]

[0127] 1: Touch sensor 2: Cover material 3: Substrate 10: Conductive film 11: Transmitting electrode (electrode) 12: Receiving electrode (electrode) 13: Cell 14: Mesh pattern 15: Electrode connection part 20: Thin line 31:First wiring section 32:Second wiring section 33: Pad 34: First Grand Section 35: Second Grand Section 40: Dummy pattern 41: First dummy thin wire 42: Dummy electrode 43: Second dummy thin wire 44: Slit section D1: First interval D2: Second interval D3: The third interval θr: Reference angle

Claims

1. A conductive film comprising a plurality of electrodes, Each of the plurality of electrodes is configured with a mesh pattern formed by arranging a plurality of cells each of which is made of a plurality of conductive thin wires; each of the plurality of electrodes includes a dummy pattern electrically insulated from the plurality of fine wires; the dummy pattern is composed of a plurality of first dummy thin lines arranged in the cell region, the first dummy thin wires are arranged such that each end faces the thin wire constituting the cell with at least a first gap therebetween; A conductive film, wherein, in the vicinity of the boundary line between adjacent cells, an end of the first dummy thin wire located in one of the cells and an end of the first dummy thin wire located in the other of the cells are arranged at a second interval in the extension direction of the boundary line between the cells.

2. 2. The conductive film according to claim 1 , The conductive film, wherein the first dummy thin wire is inclined at a reference angle with respect to the thin wire of the cell located in a direction perpendicular to the extension direction of the first dummy thin wire.

3. 2. The conductive film according to claim 1 , A conductive film, wherein the plurality of first dummy thin lines are arranged so that their respective ends face the thin lines constituting the cells with a third gap therebetween that is larger than the first gap.

4. 2. The conductive film according to claim 1 , The electrodes are spaced apart from one another, Further comprising a dummy electrode provided between adjacent electrodes, the dummy electrode is composed of a plurality of second dummy thin wires electrically insulated from the plurality of thin wires, the second dummy thin wires are arranged such that an end of each of the second dummy thin wires faces the thin wire of the cell adjacent to the dummy electrode with at least the first interval therebetween; A conductive film, in which, in the thin wire located near the dummy electrode of the cell adjacent to the dummy electrode, an end of the first dummy thin wire located within the cell and facing the thin wire, and an end of the second dummy thin wire facing the thin wire are arranged with the second gap in the extension direction of the thin wire.

5. The conductive film according to claim 4 , A conductive film, wherein the second dummy thin wire is inclined at a reference angle with respect to the thin wire located in a direction perpendicular to the extension direction of the second dummy thin wire in relation to the thin wire located near the dummy electrode of the cell adjacent to the dummy electrode.

6. The conductive film according to claim 4 , A conductive film, wherein the plurality of second dummy thin wires are arranged so that their respective ends face the thin wires of the cell adjacent to the dummy electrode at a third interval that is larger than the first interval.

7. 2. The conductive film according to claim 1 , The first dummy thin wire has at least one slit portion.

8. The conductive film according to claim 4 , The second dummy thin wire has at least one slit portion.

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