Systems, devices, and methods for beam position monitoring and beam imaging

Abstract

To provide systems, devices and methods for suitable beam position monitoring and beam imaging.SOLUTION: Embodiments of systems, devices, and methods relate to fast beam position monitoring for detecting beam misalignment in a beam line. In an example, a fast beam position monitor includes a plurality of electrodes extending into an interior of a component of the beam line. The fast beam position monitor is configured to detect a position of a beam passing through the component of the beam line based on a beam halo current. The present embodiments of the system, device, and method further relate to noninvasively monitoring parameters of beams advancing along the beam line. According to examples, gas is puffed into a pumping chamber along the beam line. One or more beam parameters are measured from fluorescence resulting from collisions of energetic beam particulates of the beam advancing through the beam line.SELECTED DRAWING: Figure 1A

Description

[Technical field]

[0001] (CROSS REFERENCE TO RELATED APPLICATIONS) This application is a continuation of U.S. Provisional Application No. 63 / 065,448, entitled "SYSTEMS, DEVICES, AND METHODS FOR FAST BEAM POSITION MONITORING," filed August 13, 2020; U.S. Provisional Application No. 63 / 065,442, entitled "SYSTEMS, DEVICES, AND METHODS FOR GAS PUFF BEAM IMAGING," filed August 13, 2020; and U.S. Provisional Application No. 62 / 894,290, entitled "SYSTEMS, DEVICES, AND METHODS FOR FAST BEAM POSITION MONITORING," filed August 30, 2019, all of which are incorporated herein by reference in their entireties. This application claims priority to U.S. Provisional Application No. 62 / 894,220, filed August 30, 2019, entitled "IMAGING."

[0002] The subject matter described herein relates generally to beam systems, and more particularly to beam diagnostics for charged particle beamlines of beam systems, and more particularly to systems and methods for facilitating high speed beam position monitoring for detection of beam misalignment within a beamline. The subject matter further relates to systems and methods for facilitating non-invasive beam diagnostics. [Background technology]

[0003] Boron neutron capture therapy (BNCT) is a modality for the treatment of various types of cancer, including some of the most difficult types. BNCT is a technique that uses boron compounds to selectively target tumor cells to treat them while sparing normal cells. A substance containing boron is injected into the bloodstream, and the boron concentrates in the tumor cells. The patient then undergoes radiation therapy with neutrons (e.g., in the form of a neutron beam). The neutrons react with the boron, killing the tumor cells while reducing or eliminating harm to normal cells. Long-term clinical studies have demonstrated that a beam of neutrons with an energy spectrum within 3-30 kiloelectron volts (keV) may be preferable to achieve more efficient cancer treatment while reducing the radiation burden to the patient. This energy spectrum or range is frequently referred to as epithermal.

[0004] Most conventional methods for the generation of epithermal neutrons (eg, epithermal neutron beams) are based on nuclear reactions of protons (eg, a proton beam) with either beryllium or lithium (eg, a beryllium target or a lithium target).

[0005] For electrostatic accelerator-based solutions, beam diagnostics are an inherent part of the charged particle beamline design. A key task in beam transport is to ensure that the beam is correctly positioned inside the beamline (e.g., there is no direct beam interaction with beamline components and walls). Any impact of installing or using such beam diagnostics may be proportional to the beam energy, as the destructive power of the beam rises with beam energy. This is especially true for the transport of direct current (DC) beams, where irreversible damage to beamline components can be produced on millisecond timescales. Therefore, continuous monitoring of the beam position is critical for the success of beam transport in accelerator-based solutions.

[0006] Conventional beam position monitors (BPMs) based on arrays of secondary emission monitors have demonstrated reliable operation with millimeter resolution. However, conventional BPMs have a relatively low beam power acceptance threshold due to the direct interaction of the beam with its probe (a thin foil). Therefore, beam monitoring based on arrays of secondary emission monitors is not preferred for beams up to 3.5 megawatts (MW).

[0007] Non-destructive beam position monitors (BPMs) are typically based on the detection of beam impedance. Such non-destructive BPMs are primarily capacitive type BPMs (e.g., linear disconnect, button type, and stripline BPMs). The principle of operation of such beam impedance detection devices results in their use being limited to pulsed beams.

[0008] Conventional systems are considered to 1) be unable to operate properly with DC beams, 2) lack millisecond response times, 3) be unable to accommodate beams having powers up to 2.5 MegaelectronV (MeV) per nucleus, 4) lack simplicity, and 5) lack reliability.

[0009] With respect to accelerator-based solutions, the accomplishments of such beam diagnostics also include providing information about beam parameters and characteristics that are widely used for beamline element alignment and control, beam shaping, beam focusing, beam bending, beamline element cleaning and rotation, beam monitoring and statistics, etc. To date, most developed and utilized beam diagnostics can be referred to as invasive diagnostics, whose effects on the beam (e.g., during the process of measurement) generally result in undesired perturbations of one or more beam parameters.

[0010] Conventional invasive beam diagnostics for measuring beam size and cross-sectional profile include slit grid and Allison emittance scanners, wire beam profilers, and the like. However, such invasive beam diagnostics are less suitable for real-time beam tracking because they a) typically perturb the beam in a way that results in undesired termination of the beam after a short duration, and b) are limited in terms of acceptable beam power due to direct interaction with beam particles.

[0011] The use of conventional beam wire scanners is limited by the probe collection beam power. Thus, direct current (DC) beams can only be probed in the region of low beam energy (e.g., 30 kiloelectron volts (keV) in a relatively low energy beamline at 15 milliamps (mA) current). To overcome this limitation, pulsed beams can be used, which allows the use of wire scanners with higher energy beams (determined by the beam pulse duration). However, both approaches (e.g., with or without pulsed beams) are not suitable for continuous monitoring of beam parameters (location and size) due to beam distortion during the measurement.

[0012] It is important to note that the interaction of the energy beam particles with the probe typically involves various phenomena, some of which can significantly complicate the signal interpretation. For example, the secondary electron emission (SEE) phenomenon modifies the measured current on the probe (signal). The common approach of SEE suppression via probe biasing does not ensure reducing the SEE contribution to the signal for arbitrary energies of beam particles. Furthermore, possible plasma formation in the vicinity of the probe surface and fast heating of the probe are processes that affect the signal as well. The contribution of these phenomena is difficult to predict and take into account.

[0013] Truly non-invasive beam diagnostics are desirable to monitor high-power DC beams (up to 5 kilowatts (kW)) and deliver basic beam characteristics such as beam position, size, and profile. Additionally, the availability of such non-invasive beam diagnostics could facilitate real-time feedback loops for beam control systems.

[0014] For these and other reasons, there is a need for improved, efficient and compact systems, devices and methods for monitoring beam position in a beam system, as well as improved, efficient and compact systems, devices and methods for providing non-invasive beam diagnostics in neutron beam systems. Summary of the Invention [Means for solving the problem]

[0015] Exemplary embodiments of systems, devices, and methods for beam systems, and more specifically, systems and methods for facilitating high speed beam position monitoring for detection of beam misalignment in a beamline, are described herein. In an exemplary embodiment, a beam position monitor (BPM) (e.g., also referred to herein as a fast beam position monitor or FBPM) is provided for an exemplary beam system configured as a neutron beam system (NBS).

[0016] In certain exemplary embodiments, the beam position monitor (BPM) can include a plurality of electrodes extending into the interior of the beamline of the beam system. In these embodiments, the beam position monitor (BPM) can operate by collecting beam halo current with the electrodes. The electrodes can be galvanically isolated from the walls of the BPM and biased with respect to the BPM walls, which can reduce the contribution of secondary electron emission (SEE) current to the signal and can increase the beam halo current collected from the beam-generated plasma.

[0017] The Beam Position Monitor (BPM) can include a detection sensitivity level associated with reducing or eliminating beam induced damage to beamline components while minimizing disturbances to the beam progressing through the beamline, i.e., a minimum amount of beam current of the beam passing through the beamline components can be reduced due to electrodes.

[0018] The system, device, and method embodiments further relate to accelerator-based beam systems, and more particularly to systems and methods for facilitating non-invasive beam diagnostics. In an exemplary embodiment, the non-invasive beam diagnostics system includes a gas-infused beam imaging (GPBI) diagnostics system suitable for beamlines, such as beamlines serving as part of a neutron beam system (NBS). The gas-infused beam imaging (GPBI) diagnostics system can be adapted to deliver information about beam position and size in real time without substantial beam perturbation. The non-invasive beam diagnostics system is time-resolved and spatially resolved, and works over a wide range of different beam powers. Furthermore, the present gas-infused beam imaging (GPBI) diagnostics system is suitable for high energy beamlines (HEBLs) or in or near tandem accelerators as part of a neutron beam system (NBS).

[0019] The exemplary embodiments overcome the aforementioned limitations associated with conventional invasive beam monitoring solutions by enabling non-invasive continuous monitoring of the beam and access to key beam parameters (size, location, profile) for the beam control system without restrictions on upper beam power limits. In addition, both the time and space resolution of the present GPBI diagnostic system is improved over conventional diagnostics. For example, the time resolution of the present GPBI diagnostic system is on the order of hundreds of milliseconds, which is a significant improvement over the measurement time scale (several seconds) of wire scanners.

[0020] In an exemplary embodiment, the fluorescence of residual (background) or aspirated gas produced due to collisions with energetic beam particles is used as part of a non-destructive diagnostic technique to measure transverse beam size (profile) and beam position. To measure beam parameters (e.g., transverse size, location, tilt), the amount of fluorescence emission from the beam-gas interaction region is recorded by a recording device or imaging component (e.g., camera) of the beam imaging diagnostic, providing data regarding beam transverse size, beam location, and tilt.

[0021] Other systems, devices, methods, features, and advantages of the subject matter described herein will be, or will become, apparent to one of ordinary skill in the art upon examination of the following figures and detailed description. All such additional systems, methods, features, and advantages are intended to be included within this description, be within the scope of the subject matter described herein, and be protected by the accompanying claims. Features of the example embodiments should not be construed as limiting the appended claims in any way, even if an explicit recitation of those features is absent in the claims. The present invention provides, for example, the following: (Item 1) A beam position monitor comprising a plurality of electrodes extending into an interior of a beamline component, the beam position monitor configured to detect a position of a beam passing through the beamline component based on a halo current of the beam. (Item 2) 2. The beam position monitor of item 1, further comprising a cooling device. (Item 3) 2. The beam position monitor of claim 1, wherein each electrode of the plurality of electrodes is associated with a current threshold value. (Item 4) 2. The beam position monitor of claim 1, wherein at least one electrode of the plurality of electrodes is associated with a different current threshold than one or more other electrodes of the plurality of electrodes. (Item 5) 2. The beam position monitor of claim 1, wherein each electrode of the plurality of electrodes is associated with a plurality of current thresholds. (Item 6) 5. The beam position monitor of claim 3 or 4, wherein the beam position monitor is configured to transmit a signal to a control system when a current measured by one or more of the plurality of electrodes exceeds its associated current threshold. (Item 7) 6. The beam position monitor of claim 5, wherein the beam position monitor is configured to transmit a signal to a control system when a current measured by an adjacent electrode of the plurality of electrodes exceeds a lower threshold of the plurality of current thresholds associated with each electrode of the adjacent electrodes. (Item 8) 2. The beam position monitor of claim 1, wherein each electrode of the plurality of electrodes is associated with an electrode extension distance. (Item 9) 9. The beam position monitor of claim 8, wherein the electrode extension distance represents the distance within the interior of the component that the electrode extends. (Item 10) 10. The beam position monitor of claim 8 or 9, wherein each electrode extension distance is adjustable. (Item 11) 2. The beam position monitor of claim 1, wherein the plurality of electrodes are galvanically isolated from a wall of the beam position monitor. (Item 12) 2. The beam position monitor of claim 1, wherein the plurality of electrodes are configured to be biased by an external power supply. (Item 13) 2. The beam position monitor of claim 1, wherein the beam position monitor is configured to transmit a signal to a control system when the beam advancing through the beamline becomes off-axis. (Item 14) 14. The beam position monitor of claim 13, wherein a minimal amount of beam current of the beam passing through a component of the beamline is reduced due to the multiple electrodes. (Item 15) 1. A beam system comprising: a beam position monitor configured to detect a position of the beam passing through a beamline component based on a halo current of the beam; and a control system configured to adjust beamline parameters based on a position of the beam; and A beam system comprising: (Item 16) 16. The beam system of claim 15, wherein the beam position monitor comprises a plurality of electrodes extending into an interior of a component of the beamline. (Item 17) The control system includes at least one processor and at least one memory, the at least one memory storing instructions that, when executed by the at least one processor, cause the control system to: receiving one or more signals from the beam position monitor; transmitting a command to discontinue operation of the beam system based on the one or more signals; 17. The beam system according to item 16, (Item 18) The control system includes at least one processor and at least one memory, the at least one memory storing instructions that, when executed by the at least one processor, cause the control system to: receiving one or more signals from the beam position monitor; transmitting, based on the one or more signals, data representative of the one or more signals to a computing device; 17. The beam system according to item 16, (Item 19) The control system includes at least one processor and at least one memory, the at least one memory storing instructions that, when executed by the at least one processor, cause the control system to: receiving one or more signals from the beam position monitor; determining that the beam is off-axis based on the one or more signals; and transmitting an adjustment signal to one or more beamline components to adjust the position of the beam back to the desired axis; 17. The beam system according to item 16, (Item 20) The control system includes at least one processor and at least one memory, the at least one memory storing instructions that, when executed by the at least one processor, cause the control system to: receiving one or more signals from the beam position monitor; determining a desired off-axis beam deflection based on the one or more signals; transmitting an adjustment signal to one or more beamline components to compensate for the desired off-axis beam deflection; 17. The beam system according to item 16, (Item 21) 21. The beam system of any of items 19 or 20, wherein the one or more beamline components comprise one or more beam-steering magnets. (Item 22) 22. The beam system of claim 21, wherein the adjustment signal adjusts the position of the one or more beam-steering magnets. (Item 23) 23. A beam system according to any of items 17-22, wherein the one or more signals represent a current measured by one or more of the plurality of electrodes. (Item 24) A beam system described in any of items 17-22, wherein the one or more signals represent a current measured by one or more electrodes of the plurality of electrodes that exceeds a current threshold associated with the one or more electrodes. (Item 25) 23. A beam system according to any of items 17-22, wherein the one or more signals represent a current measured by an adjacent electrode of the plurality of electrodes that exceeds a current threshold associated with the adjacent electrode. (Item 26) A beam system described in any of items 15-25, wherein the beam position monitor is provided with a beam position monitor described in any of items 1-14. (Item 27) an ion source configured to generate ions; a tandem accelerator configured to accelerate ions propagating from the ion source; Further equipped with 27. The beam system of any of items 15-26, wherein one or more beam position monitors are positioned upstream of the tandem accelerator or downstream of the tandem accelerator. (Item 28) 1. A neutron beam system comprising: a preaccelerator system configured to accelerate ions from the ion source; a tandem accelerator configured to accelerate ions from the preaccelerator system; A beam position monitor according to any one of Items 1 to 14. A neutron beam system comprising: (Item 29) Item 30. The neutron beam system of item 28, wherein the ion source is configured to generate ions. (Item 30) 30. The neutron beam system of claim 29, further comprising a beamline coupled to an outlet of the tandem accelerator, the preaccelerator system being coupled to an entrance of the tandem accelerator. (Item 31) 30. The neutron beam system of claim 29, wherein the preaccelerator system comprises one or more of an Einzel lens, a preaccelerator tube, a magnetic focusing element, or a pumping chamber. (Item 32) 1. A method for monitoring a position of a beam advancing through a beamline, the method comprising: 11. A method comprising: measuring a magnitude of current at one or more individual electrodes of a plurality of electrodes positioned in a beamline as the beam advances through the beamline. (Item 33) 33. The method of claim 32, wherein each individual electrode of the plurality of electrodes is associated with one or more current thresholds. (Item 34) 34. The method of claim 33, further comprising determining whether the beam advancing through the beamline is off-axis by comparing a magnitude of the current in one or more of the one or more individual electrodes against one or more current thresholds. (Item 35) 34. The method of claim 33, further comprising determining whether the beam advancing through the beamline is off-axis by comparing a first magnitude of current in a first electrode of the one or more individual electrodes to a first current threshold and a second magnitude of current in a second electrode of the one or more individual electrodes to a second current threshold, wherein the first electrode and the second electrode are positioned adjacent to one another. (Item 36) 35. The method of claim 34, further comprising signaling to a control system that the beam is off-axis when the magnitude of the current in one or more of the one or more individual electrodes exceeds or falls below the one or more current thresholds. (Item 37) 36. The method of claim 35, further comprising signaling to a control system that the beam is off-axis when a first magnitude of the current in the first electrode exceeds or falls below the first current threshold and a second magnitude of the current in the second electrode exceeds or falls below the second current threshold. (Item 38) 33. The method of claim 32, further comprising biasing the plurality of electrodes using an external power supply. (Item 39) 33. The method of claim 32, further comprising water-cooling the plurality of electrodes. (Item 40) 33. The method of claim 32, wherein each individual electrode of the plurality of electrodes is associated with an electrode extension distance. (Item 41) 40. The method of claim 39, wherein the electrode extension distance represents the distance within the interior of the beamline component over which the electrode extends. (Item 42) 33. The method of claim 32, wherein each individual electrode is associated with a unique predetermined threshold current. (Item 43) 1. A method for controlling a position of a beam advancing through a beamline of a beam system, the method comprising: receiving one or more signals from a beam position monitor; determining whether a beam advancing through the beamline is off-axis based on the one or more signals; A method comprising: (Item 44) Item 44. The method of item 43, wherein the beam position monitor comprises a plurality of electrodes extending into an interior of the beamline component. (Item 45) 45. The method of claim 44, further comprising transmitting a command to discontinue operation of the beam system based on the one or more signals. (Item 46) Item 45. The method of item 44, further comprising transmitting data representing the one or more signals to a computing device based on the one or more signals. (Item 47) Item 45. The method of item 44, further comprising, in response to determining that the beam is off a desired axis, transmitting an adjustment signal to one or more beamline components to adjust a position of the beam back onto the desired axis. (Item 48) determining a desired off-axis beam deflection based on the one or more signals; transmitting an adjustment signal to one or more beamline components to compensate for the desired off-axis beam deflection; 45. The method of claim 44, further comprising: (Item 49) 49. The method of any of items 47 or 48, wherein the one or more beamline components comprise one or more beam-steering magnets. (Item 50) 50. The method of claim 49, wherein the adjustment signal adjusts a position of the one or more beam-steering magnets. (Item 51) 51. The method of any of items 44-50, wherein the one or more signals represent a current measured by one or more of the plurality of electrodes. (Item 52) 51. The method of any of items 44-50, wherein the one or more signals represent a current measured by one or more electrodes of the plurality of electrodes that exceeds a current threshold associated with the one or more electrodes. (Item 53) 51. The method of any of items 44-50, wherein the one or more signals represent a current measured by an adjacent electrode of the plurality of electrodes that exceeds a current threshold associated with the adjacent electrode. (Item 54) Item 49. The method of item 48, wherein the degree of beam deflection quantifies the off-axis distance the beam has traveled. (Item 55) A beam imaging diagnostic system comprising two or more imaging components coupled to and extending into a pumping chamber and oriented orthogonal to a beam propagation axis of the pumping chamber. (Item 56) Item 56. The beam imaging diagnostic system of item 55, wherein the pumping chamber is positionable along the beamline. (Item 57) Item 57. The beam imaging diagnostic system of item 56, wherein the two or more imaging components are configured to substantially non-invasively monitor the beam advancing through the beamline using gas injection. (Item 58) Item 58. The beam imaging diagnostic system of item 57, wherein the beam imaging diagnostic system is configured to monitor beam parameters of a beam advancing through the beamline. (Item 59) Item 59. The beam imaging diagnostic system of item 58, wherein the beam parameters comprise one or more of size, location, tilt, or profile. (Item 60) Item 56. The beam imaging diagnostic system of item 55, further comprising a gas insufflation port extending from the pumping chamber and providing a passageway into the pumping chamber. (Item 61) Item 56. The beam imaging diagnostic system of item 55, wherein the two or more imaging components comprise a camera coupled to a lens. (Item 62) Item 62. The beam imaging diagnostic system of item 61, wherein an optical tube is coupled to the lens by one or more of indirectly or directly. (Item 63) Item 63. The beam imaging diagnostic system of item 62, wherein an end of the optical tube furthest from the camera includes an aperture having a specifically shaped opening. (Item 64) Item 64. The beam imaging diagnostic system of item 63, wherein the aperture is aligned with the camera and configured to block a majority of background light that might otherwise reach a camera sensor of the camera. (Item 65) Item 63. The beam imaging diagnostic system of item 62, wherein the two or more imaging components further comprise an interference bandpass filter positioned between the optical tube and the lens. (Item 66) Item 61. The beam imaging diagnostic system of item 60, wherein the gas insufflation port is actuated by a gas valve. (Item 67) Item 56. The beam imaging diagnostic system of item 55, wherein the two or more imaging components comprise adjustable detector exposure times. (Item 68) Item 68. The beam imaging diagnostic system of item 67, wherein the adjustable detector exposure time is adjustable to provide as much signal accumulation as possible while maintaining the highest possible signal-to-noise ratio (SNR). (Item 69) Item 67. The beam imaging diagnostic system of item 66, wherein the gas valve is configured to control an amount of gas insufflated and a time that the amount of gas is insufflated into the pumping chamber. (Item 70) 70. The beam imaging diagnostic system of claim 69, wherein the gas valve is further configured to control a location of gas insufflated into the pumping chamber such that a uniform distribution of gas is achieved within the field of view of the two or more imaging components. (Item 71) Item 62. The beam imaging diagnostic system of item 61, wherein the camera has one or more of a time resolution, a signal to noise ratio, or a size. (Item 72) Item 72. The beam imaging diagnostic system of item 71, wherein the time resolution is 2 milliseconds or less. (Item 73) Item 72. The beam imaging diagnostic system of item 71, wherein the signal to noise ratio is greater than 40:1. (Item 74) 1. A beam system comprising: a beam imaging diagnostic system positioned along the beam system, the beam imaging diagnostic system configured to non-invasively monitor a beam traveling through the beam system; and a control system configured to receive one or more signals from the beam imaging diagnostic system; A beam system comprising: (Item 75) Item 75. The beam system of item 74, wherein the beam imaging diagnoser system comprises a beam imaging diagnoser system of any one of items 55-73. (Item 76) The control system includes at least one processor and at least one memory, the at least one memory storing instructions that, when executed by the at least one processor, cause the control system to: determining one or more beam parameters comprising one or more of a size, a location, a tilt, or a profile based on the one or more signals; 76. A beam system according to any of items 74 or 75, which performs (Item 77) The control system includes at least one processor and at least one memory, the at least one memory storing instructions that, when executed by the at least one processor, cause the control system to: transmitting a control signal to one or more of a gas valve or one or more imaging components of the beam imaging diagnostic system based on the one or more signals. 77. The beam system according to any one of items 74-76, (Item 78) Item 78. The beam system of item 77, further comprising a low energy beam line (LEBL). (Item 79) 80. The beam system of claim 78, wherein the LEBL comprises one or more of a negative ion source, beam optics, a preaccelerator system, a beam diagnostics, or a pumping chamber. (Item 80) Item 79. The beam system of item 78, further comprising an accelerator downstream of the LEBL. (Item 81) 81. The beam system of claim 80, wherein a first beam imaging diagnostic system of any of claims 55-73 is positioned upstream of the accelerator. (Item 82) 82. The beam system of claim 81, wherein a second beam imaging diagnostic system of any of claims 55-73 is positioned downstream of the accelerator. (Item 83) 1. A neutron beam system comprising: a preaccelerator system configured to accelerate ions from the ion source; a tandem accelerator configured to accelerate ions from the preaccelerator system; A beam imaging diagnostic system according to any one of items 1 to 19. A neutron beam system comprising: (Item 84) Item 84. The neutron beam system of item 83, wherein the ion source is configured to generate ions. (Item 85) Item 84. The neutron beam system of item 83, further comprising a high energy beam line (HEBL) coupled to an outlet of the tandem accelerator, and the preaccelerator system is coupled to an entrance of the tandem accelerator. (Item 86) Item 84. The neutron beam system of item 83, wherein the preaccelerator system comprises one or more of an Einzel lens, a preaccelerator tube, a magnetic focusing element, or a pumping chamber. (Item 87) 87. The neutron beam system of any of items 83-86, further comprising a control system configured to receive one or more signals from the beam imaging diagnostic system. (Item 88) The control system includes at least one processor and at least one memory, the at least one memory storing instructions that, when executed by the at least one processor, cause the control system to: determining one or more beam parameters comprising one or more of a size, a location, a tilt, or a profile based on the one or more signals; 88. The neutron beam system of claim 87, (Item 89) The control system includes at least one processor and at least one memory, the at least one memory storing instructions that, when executed by the at least one processor, cause the control system to: transmitting a control signal to one or more of a gas valve or one or more imaging components of the beam imaging diagnostic system based on the one or more signals. 88. The neutron beam system of claim 87, (Item 90) 1. A method for non-invasively monitoring parameters of a beam traveling along a beamline, the method comprising: insufflating a gas into a pumping chamber; measuring one or more beam parameters based on fluorescence resulting from impact of energetic beam particles of the beam advancing through the beamline; A method comprising: (Item 91) 91. The method of claim 90, further comprising insufflating the gas into the pumping chamber while the beam advances through the beamline. (Item 92) Item 91. The method of item 90, further comprising insufflating the gas into the pumping chamber along the beamline such that disturbance to the beam proceeding through the beamline is minimized. (Item 93) Item 91. The method of item 90, further comprising measuring the one or more beam parameters such that disturbances to the beam proceeding through the beamline are minimized. (Item 94) 91. The method of claim 90, further comprising insufflating the gas into the pumping chamber prior to the beam pulse advancing through the beamline. (Item 95) Item 91. The method of item 90, wherein the one or more beam parameters comprise one or more of a lateral beam size (profile) or a beam position. (Item 96) 96. The method of claim 95, wherein said measuring comprises recording the amount of fluorescent light emitted from the beam-gas interaction region. (Item 97) 97. The method of claim 96, wherein recording the amount of fluorescent light emission comprises recording using two or more orthogonally oriented imaging configurations. (Item 98) Item 98. The method of item 97, further comprising delaying a trigger for the two or more orthogonally oriented imaging components relative to a pulse of the beam. (Item 99) 99. The method of claim 98, wherein the trigger is delayed to accommodate one or more of a beam equilibration time or a fluorescent emission delay. (Item 100) Item 91. The method of item 90, further comprising transferring one or more beam parameters to a control system. (Item 101) Item 101. The method of item 100, wherein the one or more beam parameters comprise beam position, lateral size, and beam tilt. (Item 102) 102. The method of claim 101, further comprising transferring the one or more beam parameters to the control system in real time. (Item 103) Calculating the beam centroid along the beam propagation; Comparing the beam centroid with the beamline axis coordinate; Item 91. The method of item 90, further comprising: (Item 104) Item 104. The method of item 103, further comprising acquiring the beamline axis coordinates during calibration of a beam imaging diagnostic system. (Item 105) 91. The method of claim 90, further comprising measuring the one or more beam parameters before, during, or after treatment. (Item 106) Item 106. The method of item 105, wherein the gas comprises one or more of argon or xenon. [Brief description of the drawings]

[0022] Details of the subject matter described herein, both as to its structure and operation, may become apparent by inspection of the accompanying drawings, in which like reference numerals refer to like parts. The components in the figures are not necessarily to scale, and emphasis may instead be placed on illustrating the principles of the subject matter. Moreover, all illustrations are intended to convey concepts, and relative sizes, shapes, and other detailed attributes may be depicted diagrammatically, rather than literally or precisely.

[0023] [Figure 1A] FIG. 1A is a schematic diagram of an exemplary embodiment of a neutron beam system for use with embodiments of the present disclosure.

[0024] [Figure 1B] FIG. 1B is a schematic diagram of an exemplary embodiment of a neutron beam system for use in boron neutron capture therapy (BNCT).

[0025] [Diagram 2] FIG. 2 illustrates an exemplary preaccelerator system or ion beam implanter for use with embodiments of the present disclosure.

[0026] [Diagram 3] FIG. 3 is a perspective view of an exemplary embodiment of a beam position monitor (BPM) of the ion beam implanter system shown in FIG.

[0027] [Figure 4] FIG. 4 is a graphical image illustrating an example waveform of current collected on an example beam position monitor (BPM) electrode during an artificial misalignment.

[0028] [Diagram 5] FIG. 5 is a perspective view of an embodiment of a pumping chamber of the ion beam implanter system shown in FIG. 2 along with a beam imaging (eg, GPBI) diagnostic system.

[0029] [Figure 6] FIG. 6 is a perspective view of the imaging components of a pulsed beam imaging (GPBI) diagnostic system.

[0030] [Figure 7] FIG. 7 illustrates an example timing scheme for use with embodiments of the present disclosure.

[0031] [Figure 8] FIG. 8 is an exemplary beam image acquired by a gas-infused beam imaging (GPBI) diagnostic system.

[0032] [Figure 9] FIG. 9 is an example of the post-processed image shown in FIG.

[0033] [Figure 10]FIG. 10 is a graph showing an example of a measured beamline integral profile.

[0034] [Figure 11A] 11A and 11B illustrate block diagrams depicting an example embodiment of a control system with which embodiments of the present disclosure may operate. [Figure 11B] 11A and 11B illustrate block diagrams depicting an example embodiment of a control system with which embodiments of the present disclosure may operate.

[0035] [Figure 12] FIG. 12 is a block diagram depicting an exemplary embodiment of a computing device that may be used with embodiments of the present disclosure. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0036] Detailed Description Before the present subject matter is described in detail, it is to be understood that the present disclosure is not limited to particular embodiments described, which may, of course, vary. It is also to be understood that the terminology used herein is for the purpose of describing particular embodiments only, and is not intended to be limiting, as the scope of the present disclosure will be limited only by the appended claims.

[0037] The term "particle" is used broadly herein, and unless otherwise limited, may be used to describe an electron, a proton (or an H+ ion), or a neutron, as well as species having more than one electron, proton, and / or neutron (e.g., other ions, atoms, and molecules).

[0038] Exemplary embodiments of systems, devices, and methods for diagnostics in beam systems (including, for example, particle accelerators) are described herein. The embodiments described herein can be used in conjunction with any type of particle accelerator or in any particle accelerator application involving the production of a charged particle beam at a defined energy to feed the particle accelerator. The embodiments herein can be used in a number of applications, an example of which is as a neutron beam system for the generation of a neutron beam for use in boron neutron capture therapy (BNCT). For ease of explanation, many of the embodiments described herein will be so performed in the context of a neutron beam system for use in BNCT, although the embodiments are not limited to neutron beam generation or BNCT applications in particular.

[0039] 1A is a schematic diagram of an exemplary embodiment of a beam system for use with embodiments of the present disclosure. Here, the beam system 10 includes a source 22, a low energy beam line (LEBL) 190, an accelerator 40 coupled to the low energy beam line (LEBL) 190, and a high energy beam line (HEBL) 50 extending from the accelerator 40 to a target assembly housing a target 196. The LEBL 190 is configured to transfer the beam from the source 22 to the accelerator 40, which is configured to accelerate the beam. The HEBL 50 transports the beam from the output of the accelerator 40 to the target 196.

[0040] Exemplary embodiments of systems, devices, and methods for facilitating fast beam position monitoring for detection of beam misalignment in a beamline of a beam system 10 are described herein. In the exemplary embodiments, a simple and reliable beam position monitor (BPM) is provided. In certain exemplary embodiments, the beam position monitor (BPM) can include multiple electrodes that extend into the interior of a beamline of a neutron beam system (NBS). In these embodiments, the beam position monitor (BPM) can operate by collecting beam halo current with the electrodes. The electrodes can be galvanically isolated from the walls of the BPM and biased using an external power supply. The bias on the BPM walls can reduce the contribution of secondary electron emission (SEE) current to the signal and can increase the beam halo current collected from the beam-generated plasma.

[0041] In an exemplary embodiment, a beam position monitor (BPM) is configured to signal or indicate to a control system when the beam progressing through the beamline is off-axis.

[0042] The Beam Position Monitor (BPM) can include a detection sensitivity level associated with reducing or eliminating beam-induced damage to beamline components while minimizing disturbances to the beam advancing through the beamline. That is, a minimum amount of beam current of the beam passing through the beamline components can be reduced as a result of current collection by the electrodes. Exemplary embodiments of the BPM advantageously operate with direct current (DC) beams, have millisecond (or faster) response times, and / or can accommodate 2.5 MeV (and higher) beam powers per nucleus.

[0043] In some exemplary embodiments, the BPM can be part of a beam system configured to produce a neutron beam from an ion beam. The beam system can include a LEBL serving as an ion beam injector system, a high voltage (HV) tandem accelerator coupled to the ion beam injector system, and a HEBL extending from the tandem accelerator to a neutron target assembly housing a neutron production target. In these exemplary embodiments, the ion beam injector can include an ion source, beam optics integrated into a low energy beamline extending from the ion source, a preaccelerator tube, beam diagnostics, and a pumping chamber coupled to the tandem accelerator. The ion source can generate charged particles in a plasma volume that can be extracted, accelerated, conditioned, and ultimately used to produce neutrons when delivered to a neutron production target. Such improved, efficient, and compact systems, devices, and methods of monitoring beam position allow for the conservation of neutron beam system equipment while maintaining operational effectiveness.

[0044] The system 10 can also include a gas-based or substantially non-invasive beam diagnostic system. The diagnostic system can include a gas-infused beam imaging (GPBI) suitable for LEBL, which serves as a beam injector of the beam system, and the GPBI is adapted to deliver information about the beam position and size in real time without beam perturbation. Furthermore, the GPBI diagnostic system is suitable for high energy beamlines (HEBLs) or in or near accelerators. The non-invasive beam diagnostic system is time and space resolved and has no upper limit on the beam power.

[0045] In an exemplary embodiment, the fluorescence of residual (background) or blown gas produced due to collisions with energetic beam particles is used as part of a non-destructive diagnostic technique to measure the transverse beam size (profile) and beam position. The propagation of charged particles through the gas environment leads to the emission of light due to collisional excitation of gas atoms and molecules. To measure the beam parameters (transverse size, location, inclination), the amount of fluorescence emission from the beam-gas interaction region is recorded by a recording device or imaging component (e.g., a camera), which provides data on the beam transverse size, beam location, and inclination. The acquired images can be further correlated with the actual beam profile via Abelian inversion (under certain assumptions, e.g., beam axial symmetry) or using tomography techniques.

[0046] In an exemplary embodiment, the GPBI diagnostic system includes one or more imaging components, in many embodiments at least two orthogonally oriented imaging components, coupled to and extending into the pumping chamber, and a gas insufflation port extending from the pumping chamber and providing a passageway into the pumping chamber.

[0047] The gas insufflation ports are controllable such that some neutrons introduced into the GPBI diagnostic system are tuned to avoid interaction with the beam to be measured or observed, i.e., the beam passing through the beamline passes through the group of neutrons substantially unobstructed while being observed by the GPBI diagnostic system. In an embodiment of the present disclosure, the insufflated gas comprises one or more of argon or xenon.

[0048] FIG. 1B is a schematic diagram illustrating an exemplary neutron beam system 10 for use in boron neutron capture therapy (BNCT) according to an embodiment of the present disclosure. The neutron beam system 10 includes a preaccelerator system 20 forming at least a portion of a LEBL, serving as a charged particle beam injector as shown in FIG. 2, a high voltage (HV) tandem accelerator 40 coupled to the preaccelerator system 20, and a high energy beam line 50 extending from the tandem accelerator 40 to a neutron target assembly 200 housing a neutron production target. In this embodiment, the beam source 22 is an ion source, and the charged particle beam is a negative ion beam prior to conversion to a proton beam in the tandem accelerator 40. It should be understood that the neutron beam system 10 as well as the preaccelerator system 20 can also be used for other applications such as cargo inspection and others, and are not limited to BNCT.

[0049] The preaccelerator system 20 (also referred to herein as a charged particle beam implanter or ion beam implanter) is configured to transport an ion beam from the ion source 22 to an input (e.g., an input aperture) of the tandem accelerator 40.

[0050] Powered by a high voltage power supply 42 coupled thereto, the tandem accelerator 40 is capable, in many embodiments, of producing a proton beam with an energy generally equal to twice the voltage applied to acceleration electrodes positioned within the tandem accelerator 40. The proton beam energy level is achieved by accelerating a beam of negative hydrogen ions from the input of the tandem accelerator 40 to the innermost high potential electrode, stripping two electrons from each ion, and then accelerating the resulting protons downstream through the same voltages encountered in reverse order.

[0051] The high energy beamline 50 transports the proton beam from the output of the tandem accelerator 40 to a neutron generating target in a neutron target assembly 200 located at the end of a beamline branch 70 that extends into a patient treatment room. The system 10 can be configured to direct the proton beam to any number of one or more targets and associated treatment areas. In this embodiment, the high energy beamline 50 includes three branches 70, 80, and 90 and extends into three different patient treatment rooms. The high energy beamline 50 includes a pumping chamber 51, quadrupole magnets 52 and 72 to prevent out-focusing of the beam, dipole or bending magnets 56 and 58 to steer the beam into the treatment room, a beam corrector 53, diagnostics such as current monitors 54 and 76, a high speed beam position monitor 55 section, and a scanning magnet 74.

[0052] The design of the high energy beam line 50 may depend on the configuration of the treatment facility (e.g., one-storey treatment facility, two-storey treatment facility, and the like). The beam may be delivered to the target assembly 200 (e.g., located near the treatment room) using the bending magnet 56. A quadrupole magnet 72 may then be included to focus the beam to a certain size at the target. The beam then passes through one or more scanning magnets 74, which provide lateral movement of the beam on the target surface in a desired pattern (e.g., spiral, curved, stepped in rows and columns, combinations thereof, and others). The beam lateral movement may help to achieve a smooth and uniform time-averaged distribution of the proton beam on the lithium target, prevent overheating, and make neutron generation as uniform as possible within the lithium layer.

[0053] After entering the scanning magnet 74, the beam can be delivered into a current monitor 76, which measures the beam current. The measured beam current value can be used to operate a safety interlock. The target assembly 200 can be physically separated from the high energy beamline volume using a gate valve 77. The main function of the gate valve is to separate the vacuum volume of the beamline from the target during target exchange / loading. In an embodiment, the beam does not have to be bent 90 degrees by the bending magnet 56, but rather goes straight to the right and then enters the quadrupole magnet 52, located in the horizontal beamline. The beam can then be bent by another bending magnet 58 to the angle required depending on the room configuration. Otherwise, the bending magnet 58 can be replaced with a Y-shaped magnet to split the beamline into two directions for two different treatment rooms located on the same floor.

[0054] 2 illustrates an example of a preaccelerator system or ion beam implanter for use with embodiments of the present disclosure. In this example, the preaccelerator system 20 includes an Einzel lens (not shown), a preaccelerator tube 26, and a solenoid 510, and is configured to accelerate a negative ion beam implanted from an ion source 22. The preaccelerator system 20 is configured to provide acceleration of the beam particles to the required energy for the tandem accelerator 40 and to provide overall focusing of the negative ion beam to match the input aperture area at the input aperture or entrance of the tandem accelerator 40. The preaccelerator system 20 is further configured to minimize or out-focus backflow as it passes from the tandem accelerator 40 through the preaccelerator system to reduce damage to the ion source and / or the possibility of backflow reaching the filament of the ion source.

[0055] In an embodiment, the ion source 22 is configured to provide a negative ion beam downstream of an Einzel lens (not shown), where the negative ion beam continues to pass through the preaccelerator tube 26 and a solenoid 510. The solenoid 510 is positioned between the preaccelerator tube and the tandem accelerator and is electrically connectable to a power supply. The negative ion beam passes through the solenoid 510 to the tandem accelerator 40.

[0056] The preaccelerator system 20 may also include an ion source vacuum box 24 and a pumping chamber 28, which, along with a preaccelerator tube 26 and other elements described above, are part of a relatively low energy beamline leading to a tandem accelerator 40. The ion source vacuum box 24, in which an Einzel lens (not shown) is positioned, extends from the ion source 22. The preaccelerator tube 26 may be coupled to the ion source vacuum box 24, and a solenoid 510 may be coupled to the preaccelerator tube 26. The pumping chamber 28 may be coupled to the solenoid 510 and to the tandem accelerator 40. The ion source 22 serves as a source of charged particles, which may be accelerated, conditioned, and ultimately used to produce neutrons when delivered to a neutron producing target. Although exemplary embodiments will be described herein with reference to an ion source producing a negative hydrogen ion beam, the embodiments are not limited as such and other positive or negative particles may also be produced by the source.

[0057] The preaccelerator system 20 can have zero, one, or multiple magnetic elements for purposes such as focusing the beam and / or adjusting its alignment. For example, any such magnetic elements can be used to align the beam with the beamline axis and acceptance angle of the tandem accelerator 40. The ion vacuum box 24 may have ion optics positioned therein.

[0058] There are two types of negative ion sources 22, namely, surface type and volume type, which differ in the mechanism of generation of negative ions. The surface type generally requires the presence of cesium (Cs) on a specific internal surface. The volume type relies on the formation of negative ions within the volume of a high current discharge plasma. Although both types of ion sources can deliver the desired negative ion current for applications related to tandem accelerators, the surface type negative ion source is not desirable for modulation. That is, for modulation of negative ion beams in the embodiments described herein, a volume type negative ion source (e.g., not employing cesium (Cs)) is preferred.

[0059] Turning to FIG. 3 , an exemplary beam position monitor (BPM) (e.g., or fast beam position monitor) 30 includes a cylindrical wall 32 extending between a pair of flanges 34 adapted to mount the beam position monitor (BPM) 30 along a beamline (e.g., a low energy beamline (LEBL), including the preaccelerator system 20, the accelerator 40, and the high energy beamline (HEBL) 50). In an example where the beam position monitor (BPM) 30 is mounted along the low energy beamline (LEBL), the beam position monitor (BPM) may be mounted between the preaccelerator tube 26 and the pumping chamber 28. Operation of the beam position monitor (BPM) 30 may be based on collection of beam halo current by an electrode 36 protruding from the wall 32 and extending into the interior of the beamline. In an exemplary embodiment, the electrode 36 may be cooled using one or more cooling devices 41. In an exemplary embodiment, the one or more cooling devices may comprise a water cooling device.

[0060] In FIG. 3, the beam position monitor (BPM) 30 is shown to include four electrodes 36, but the embodiment is not limited to four electrodes (e.g., any number of electrodes may be employed within the scope of the present disclosure). The electrodes 36 are preferably shaped as cylinders and made from one or more of tantalum (Ta) or tungsten (W) to increase resistance to heat flux. The electrodes 36 may also be made from composite materials that are capable of withstanding the thermal load generated by the beam. The insertion length of the electrodes 36 (e.g., electrode extension distance within the interior of the beamline) can be adjusted separately for each electrode 36 (e.g., using a control system not shown in FIG. 3), allowing a user to tailor the beam position monitor (BPM) 30 for beams of arbitrary dimensions. The electrodes 36 are intended to be exposed to the beam halo current, and therefore the collected power flux is expected to be much less. Additionally, the plasma formed near the region of beam-residual gas interaction extends to the outer beam boundary and creates an additional signal for the beam position monitor (BPM) 30 .

[0061] The electrode 36 is galvanically isolated from the BPM walls 32 and can be biased using an external power supply. The bias on the BPM walls 32 can a) reduce the secondary electron emission (SEE) current contribution to the signal and b) increase the beam halo current collected from the beam-generated plasma.

[0062] While the beam system is operating and the beam is extracted from the source (e.g., 22) and propagated through the components (e.g., 190, 40, 50, 196) of the exemplary beam system (e.g., 10), the beam position monitor (BPM) 30 allows the control system to actively monitor the beam position. Each electrode 36 may have a current threshold (e.g., signal threshold) associated with it. When the current (e.g., or signal) collected by a given electrode exceeds its current threshold, the beam may be considered to be deflected too far toward that electrode and therefore off-axis. The beam position monitor (30) may provide an indication to the control system that the current collected by the electrode has exceeded its current threshold, and the control system may adjust parameters of one or more components throughout the beam system (e.g., 10) to bring the beam back on-axis. Examples of adjustable parameters may include inputs provided to the beam steering magnets such that the position of the beam steering magnets is altered to bring the beam back on-axis. Thus, the beam position monitor (BPM) 30, together with the control system, provides continuous / repeated and real-time feedback to the beam-steering magnets and / or other components of the beam system.

[0063] In an embodiment, the current threshold associated with a given electrode may be different than the current threshold associated with another electrode of the beam position monitor (30). Additionally, a given electrode may have multiple current thresholds associated with it for more granular detection of beam position. That is, multiple current thresholds can be used in conjunction with an electrode of a beam position monitor (e.g., 30). Detection of off-axis movement of the beam in the direction between the electrodes may be based on multiple current thresholds associated with adjacent electrodes.

[0064] For example, both adjacent electrodes of a pair may register an increase in signal level (e.g., collected current), however, the increase in signal level may exceed a second lower current threshold associated with each electrode of the adjacent electrodes of the pair. In such an embodiment, a signal level that exceeds a second lower current threshold associated with each electrode of the adjacent electrodes of the pair may indicate that the beam is in an off-axis direction between the electrodes.

[0065] Thus, the control system may adjust the beam-steering magnets based on an indication that the signal level exceeds a single threshold for a single electrode of the beam position monitor (BPM) 30, or based on an indication that the signal level exceeds two lower thresholds for adjacent electrodes.

[0066] Additionally, the control system may monitor the magnitude of the signal on each of the electrodes and extrapolate the degree of beam deflection in a particular direction based on the signal magnitude (e.g., independently or in combination with one or more current thresholds associated with the electrodes). The control system may then adjust the beam-steering magnets or other parameters based on the extrapolated degree of beam deflection to compensate for the beam deflection and return the beam to its desired axis. In such an embodiment, the control system may adjust beamline parameters, such as the position of the beam-steering magnets, based on the minimum amount of detected deflection (e.g., a deflection threshold) on a continuous and real-time basis.

[0067] In an embodiment, it may be difficult to predict the signal level on the BPM electrodes 36. Therefore, prior to operation, a calibration of the BPM 30 may be desired and performed. Calibration may be accomplished by controllably and safely deviating the beam off the beamline axis and collecting the current on the BPM electrodes 36.

[0068] A pulsed mode of beam operation may be preferred to reduce the total beam deposited energy on the BPM 30 and other beamline components during calibration of the BPM 30. Other beam position diagnostics (e.g., gas-infused beam imaging) may also be involved in conjunction with BPM calibration to meet safety or other regulations.

[0069] In an example embodiment, the operation of the exemplary BPM 30 was tested on an exemplary low energy beamline (LEBL) (e.g., 190, including preaccelerator system 20) of the exemplary neutron beam system (NBS) 10. In the test, the total negative hydrogen ion beam current in the LEBL was about 12 milliamps (mA). To demonstrate the performance of the BPM 30, the beam was intentionally deviated from the beamline using axial X- and Y-steering magnets. The current waveforms collected by each BPM electrode 36 are shown in FIG. 4. As shown in FIG. 4, the BPM electrodes 36 collect a larger current when the beam is intentionally misaligned using the X- and Y-steering magnets. The maximum current value is displayed along with the minimum current value. Based on the results illustrated in FIG. 4, a threshold current for each FBPM electrode 36 may be defined to signal to a control system that the beam is misaligned. The response time of the BPM 30 was 4 microseconds (μs) in the test used to generate the results depicted in FIG. 4.

[0070] The small magnitude of the beam current collected by the BPM electrodes 36 during normal operation advantageously ensures a long life of the BPM 30. That is, due to the small magnitude of the beam current collected by the BPM electrodes 36, beam-induced damage resulting in expiration of one or more components of the BPM 30 may be avoided or significantly delayed.

[0071] The exemplary BPM advantageously enables detection of anomalous beam behavior with microsecond resolution. In an embodiment, the response time of the BPM may be based on the availability of the reading electronics. The BPM advantageously provides fast alarm / notification of beam misalignment to the control system.

[0072] The BPM 30 advantageously allows independent adjustment of the insertion length (e.g., the extension distance of the electrode into the interior of the beamline) of each electrode 36 so that small beam deviations can be detected faster (e.g., with reduced response time) with a larger signal. This improves the response time of the BPM for beams of arbitrary shapes (including fairly complex ones).

[0073] Each electrode 36 may be associated with a unique electrode position within a beam position monitor (BPM), and each unique electrode position may be adjustable. Thus, a pair of electrodes may be separated by a given distance, but such distance may also be adjustable.

[0074] The BPM 30 is not limited to use in the specific embodiments described herein, and may be used in beam systems implemented in industrial or manufacturing processes such as semiconductor chip manufacturing, material property modification (such as surface treatment), food irradiation, and pathogen destruction in medical sterilization. The BPM 30 may also be used in imaging applications such as cargo or container inspection. As another non-exhaustive example, the BPM 30 may also be used in particle accelerators for medical applications such as medical diagnostic systems, medical imaging systems, or other non-BNCT radiation therapy systems.

[0075] Turning to FIG. 5, the pumping chamber 28 may have multiple sets (e.g., two, as depicted in FIG. 5) of beam imaging diagnostics 500 arranged in a transverse (e.g., orthogonal) direction to the beam propagation axis B. Such an arrangement of the beam imaging diagnostics 500 allows for beam characterization transverse to that of the beam propagation. A gas insufflation port 31 (partially shown) extends from the pumping chamber 28 and provides a passageway into the interior of the pumping chamber 28. A turbomolecular pump 29 at the top of the pumping chamber 28 may be used to pump the gas to be insufflated through the gas insufflation port 31. The turbomolecular pump 29 may also maintain a desired or required background gas pressure in the low energy beamline 20.

[0076] FIG. 6 illustrates an exemplary embodiment of a beam imaging diagnoser system 500. In an embodiment, a recording device or imaging component 33 (e.g., a camera) may be coupled with a lens 35. The lens 35 may be used to determine the field of view and spatial resolution of the beam imaging diagnoser system 500. An aperture 39 at the end of the optical tube 38 may be matched or aligned with the recording device (e.g., camera) 33 and the lens 35 and may be used to block most of the background light that may otherwise reach the sensor (not shown) of the recording device or imaging component (e.g., camera). To further reduce background noise (e.g., background light), an interference bandpass filter (not shown) can be optionally disposed inside the filter holder 37, which may be positioned between the optical tube 38 and the lens 35.

[0077] Gas insufflation may be driven by a gas valve (not shown) that is coupled to gas insufflation valve 31 (shown in FIG. 5 ). The gas valve (not shown) may drive gas insufflation with a controlled duration of the gas valve open state, allowing control of the amount of gas insufflated into pumping chamber 28 as well as control or selection of the time that gas is insufflated into pumping chamber 28.

[0078] The gas valves, recording devices and other components of the beam imaging diagnostic system 500 may be controlled using a control system (not shown, but an example of which is depicted in FIGS. 11A and 11B).

[0079] It may be desirable to select the location of the gas insufflation and nozzle structure to achieve a uniform distribution of gas within the field of view of the recording device or imaging component 33 (e.g., a camera). This can significantly improve the linearity of the collected signal and simplify data analysis.

[0080] In an exemplary embodiment, the exemplary beam imaging diagnostic system 500 may be configured to track the charged particle beam of a beam system operating in both DC and pulsed modes. This may be implemented according to the exemplary timing scheme shown in FIG. 7. The trigger of the beam imaging diagnostic system 500 may be arbitrary for DC beams. In the case of pulsed beam generation, a gas valve may be triggered prior to the beam pulse to ensure the presence of gas and uniformity of the gas within the diagnostic field of view of the beam diagnostic system 500. The recording device or imaging component (e.g., camera) trigger may be delayed relative to the beam pulse to accommodate the beam equilibration time as well as the fluorescence emission delay. The camera detector exposure time may be adjusted to accumulate as much signal as possible while keeping the signal-to-noise (SNR) ratio at the highest level.

[0081] A raw image acquired by an exemplary recording device (e.g., a camera) of the exemplary beam imaging diagnostic system 500 is shown in FIG. 8. The beam is visible in the center of the image; i.e., 30 keV, 12 mA negative hydrogen ions propagate from left to right in the image of FIG. 8. A uniform black background is formed by a viewing dump (not shown) disposed inside the vacuum chamber. A post-processed image, with the background subtracted and artificially rescaled to highlight the beam, showing a beam length of approximately 10 millimeters (mm), is presented in FIG. 9.

[0082] The image in FIG. 9, cleared from background light, may further be used to obtain the beam position, lateral size, and beam tilt inside the LEBL, which is transferred in real time to the control system (see, e.g., FIG. 11A, 11B). The beam size is estimated at 90% of the beam current. This level can be adjusted depending on either the assumed or measured beam current distribution. The image SNR can be further improved by using a bandpass filter (see, e.g., FIG. 6) to limit the collection to the useful signal, allowing for more effective blocking of the background light.

[0083] An example of a measured beamline integral profile is shown in Figure 10, illustrating a Gaussian-like beam current distribution and showing that the beam size is about 10 mm, calculated at the 90% level of beam current. The radial distance in Figure 10 is forced to zero at the beam centroid (compare Figure 9). The actual beam profile can be reconstructed from Figure 10, for example, using an Abel inversion algorithm (based on the symmetry of the beam) or using tomography techniques.

[0084] To estimate the beam tilt with respect to the axis of the low energy beamline (LEBL), the beam centroid is calculated along the beam propagation and compared with the beamline axis coordinates obtained during calibration of the beam imaging diagnostic system.

[0085] The beam imaging diagnostic system 500 can be installed in any desired location of the beamline, either on the lower energy side of the accelerator, within the accelerator itself, or on the higher energy side. The system 500 is not limited to use in the specific embodiment described herein, and can also be used in beam systems implemented in industrial or manufacturing processes such as semiconductor chip manufacturing, material property modification (such as surface treatment), food irradiation, and pathogen destruction in medical sterilization. The system 500 can also be used in imaging applications such as cargo or container inspection. As another non-exhaustive embodiment, the system 500 can also be used in particle accelerators for medical applications such as medical diagnostic systems, medical imaging systems, or other non-BNCT radiotherapy systems.

[0086] 11A and 11B are block diagrams depicting an exemplary embodiment of a control system with which embodiments of the present disclosure may operate. For example, the exemplary system shown includes a beam system 10 and one or more computing devices 3002. In an embodiment, the beam system 10 may be part of an exemplary neutron beam system (e.g., system 10 described above). In such an embodiment, the beam system 10 may employ one or more control systems 3001A with which the one or more computing devices 3002 may communicate to interact with systems and components of the beam system 10 (e.g., neutron beam system 10). Each of these devices and / or systems may be configured to communicate with each other directly or via a local network, such as network 3004.

[0087] The computing devices 3002 may be embodied by a variety of user devices, systems, computing apparatus, and the like. For example, a first computing device 3002 may be a desktop computer associated with a particular user, while another computing device 3002 may be a laptop computer associated with a particular user, and yet another computing device 3002 may be a mobile device (e.g., a tablet or smart device). Each computing device 3002 may be configured to communicate with the beam system 10, for example, through a user interface accessible via the computing device. For example, a user may run a desktop application on the computing device 3002, which is configured to communicate with the beam system 10.

[0088] By communicating with the beam system 10 using the computing device 3002, a user may provide operating parameters (e.g., operating voltages and the like) for the beam system 10 according to embodiments described herein. In an embodiment, the beam system 10 may include a control system 3001A, whereby the beam system 10 may receive and apply operating parameters from the computing device 3002.

[0089] The control system 3001A may be configured to receive measurements, signals, or other data from components of the beam system 10. For example, the control system 3001A may receive a signal from an exemplary beam position monitor (BPM) 30 (e.g., FIG. 11A) indicative of the position of the beam passing through the beam system 10. The control system 3001A may provide adjustments to the inputs of one or more beamline components 3006, such as beam steering magnets, to alter the position of the beam in accordance with methods described herein in response to the position of the beam passing through the beam system. The control system 3001A may also provide information collected from any of the components of the beam system 10, including the beam position monitor (BPM) 30 (e.g., FIG. 11A), to the computing device 3002, either directly or via the communication network 3004.

[0090] For example, the control system 3001A may receive signals from the exemplary beam diagnostics system 500 (e.g., FIG. 11B) indicative of the beam position, lateral size, tilt, current distribution, and the like, of the beam passing through the beam system 10. In response to the received signals, the control system 3001A may provide adjustments to the inputs of one or more beamline components 3006 to alter the position or other parameters of the beam according to methods described herein. For example, the control system 3001A may trigger a gas valve prior to a beam pulse to ensure the presence of gas and uniformity of the gas within the diagnostics field of view of the beam diagnostics system 500 (e.g., FIG. 11B). The control system 3001A may further delay the triggering of a recording device or imaging component (e.g., a camera) relative to the beam pulse to accommodate beam equilibration times as well as fluorescence emission delays. The control system 3001A may also adjust the camera detector exposure time to accumulate as much signal as possible while maintaining the highest signal-to-noise (SNR) ratio.

[0091] The control system 3001A may also provide information collected from any of the components of the beam system 10, including the beam diagnostic system 500 (e.g., FIG. 11B), to the computing device 3002, either directly or via a communication network 3004.

[0092] The communications network 3004 may include any wired or wireless communications network, including, for example, a wired or wireless local area network (LAN), a personal area network (PAN), a metropolitan area network (MAN), a wide area network (WAN), or the like, as well as any hardware, software, and / or firmware required to implement the same (e.g., network routers, etc.). For example, the communications network 3004 may include 802.11, 802.16, 802.20, and / or WiMax networks. Additionally, the communications network 3004 may include a public network, such as the Internet, a private network, such as an intranet, or a combination thereof, and may utilize a variety of currently available or later developed networking protocols, including, but not limited to, TCP / IP-based networking protocols.

[0093] The computing device 3002 and the control system 3001A may be embodied by one or more computing systems, such as the apparatus 3100 shown in FIG. 12. As illustrated in FIG. 12, the apparatus 3100 may include a processor 3102, a memory 3104, input and / or output circuitry 3106, and a communication device or circuitry 3108. It should also be understood that some of these components 3102-3108 may include similar hardware. For example, two components may both utilize the use of the same processor, network interface, storage medium, or the like to perform their associated functions, such that duplicate hardware is not required for each device. The use of the terms "device" and / or "circuitry" as used herein with respect to components of an apparatus may thus encompass specific hardware configured with software to perform the functions associated with that particular device as described herein.

[0094] The terms "device" and / or "circuitry" should be understood to broadly include hardware, and in some embodiments, the device and / or circuitry may also include software for configuring the hardware. For example, in some embodiments, the device and / or circuitry may include processing circuitry, storage media, network interfaces, input / output devices, and the like. In some embodiments, other elements of the apparatus 3100 may provide or complement the functionality of a particular device. For example, the processor 3102 may provide processing functionality, the memory 3104 may provide storage functionality, the communication device or circuitry 3108 may provide network interface functionality, etc.

[0095] In some embodiments, the processor 3102 (and / or a co-processor or any other processing circuitry that assists or is otherwise associated with the processor) may communicate with the memory 3104 via a bus to pass information between components of the device. The memory 3104 may be non-transitory and may include, for example, one or more volatile and / or non-volatile memories. In other words, for example, the memory may be an electronic storage device (e.g., a computer-readable storage medium). The memory 3104 may be configured to store information, data, content, applications, instructions, or the like to enable the device to perform various functions according to exemplary embodiments of the present disclosure.

[0096] The processor 3102 may be embodied in a number of different ways, and may, for example, include one or more processing devices configured to perform independently. Additionally or alternatively, the processor may include one or more processors configured to interface via a bus and enable independent execution of instructions, pipelines, and / or multi-threading. Use of the terms "processing device" and / or "processing circuitry" may be understood to include a single-core processor, a multi-core processor, multiple processors, and / or a remote or "cloud" processor internal to an apparatus.

[0097] In an exemplary embodiment, the processor 3102 may be configured to execute instructions stored in the memory 3104 or otherwise accessible to the processor. Alternatively, or in addition, the processor may be configured to execute hard-coded functionality. Thus, whether configured by hardware or software methods, or by a combination of hardware and software, the processor may represent an entity (e.g., physically embodied in circuitry) that, while appropriately configured, is capable of performing operations according to certain embodiments of the present disclosure. Alternatively, as another example, when the processor is embodied as an executor of software instructions, the instructions, when executed, may specifically configure the processor to perform the algorithms and / or operations described herein.

[0098] In some embodiments, the apparatus 3100 may include input / output devices 3106, which in turn may communicate with the processor 3102 and provide output to a user and, in some embodiments, may receive input from a user. The input / output devices 3106 may include a device display, such as a user device display, which may include a user interface and may include a web user interface, a mobile application, a client device, or the like. In some embodiments, the input / output devices 3106 may also include a keyboard, a mouse, a joystick, a touch screen, a touch area, soft keys, a microphone, a speaker, or other input / output mechanisms. The processor and / or user interface circuitry including the processor may be configured to control one or more functions of one or more user interface elements through computer program instructions (e.g., software and / or firmware) stored on a memory (e.g., memory 3104 and / or the like) accessible to the processor.

[0099] The communications device or circuitry 3108 may be any means, such as a device or circuitry, embodied in either hardware or a combination of hardware and software, configured to receive and / or transmit data from and / or to a network and / or any other device or circuitry in communication with the apparatus 3100. In this regard, the communications device or circuitry 3108 may include, for example, a network interface for enabling communication with a wired or wireless communication network. For example, the communications device or circuitry 3108 may include one or more network interface cards, antennas, buses, switches, routers, modems, and supporting hardware and / or software, or any other devices suitable for enabling communication over a network. Additionally or alternatively, the communications interface may include circuitry for interacting with an antenna and causing transmission of signals via the antenna or handling reception of signals received via the antenna. These signals may be transmitted by device 3100 using any of a number of wireless personal area network (PAN) technologies, such as current and future Bluetooth® standards (including Bluetooth® and Bluetooth® Low Energy (BLE)), infrared radio (e.g., IrDA), FREC, ultra-wideband (UWB), inductive radio transmission, or the like. In addition, it should be appreciated that these signals may be transmitted using Wi-Fi, Near Field Communication (NFC), Worldwide Interoperability for Microwave Access (WiMAX), or other proximity-based communication protocols.

[0100] As will be appreciated, any such computer program instructions and / or other types of code may be loaded onto a computer, processor, or other programmable device circuitry that executes the code on the machine to produce a machine, such that the computer, processor, or other programmable circuitry creates means for implementing various functions, including those described herein.

[0101] As described above and as will be understood based on the present disclosure, the embodiments of the present disclosure may be configured as a system, a method, a mobile device, a back-end network device, and the like. Thus, the embodiments may comprise a variety of means, including fully hardware or any combination of software and hardware. Furthermore, the embodiments may take the form of a computer program product on at least one non-transitory computer-readable storage medium having computer-readable program instructions (e.g., computer software) embodied in the storage medium. Any suitable computer-readable storage medium may be utilized, including non-transitory hard disks, CD-ROMs, flash memories, optical storage devices, or magnetic storage devices.

[0102] The processing circuitry for use with the embodiments of the present disclosure can include one or more processors, microprocessors, controllers, and / or microcontrollers, each of which can be a discrete chip or distributed among several different chips (and parts thereof). The processing circuitry for use with the embodiments of the present disclosure can include a digital signal processor, which can be implemented in the hardware and / or software of the processing circuitry for use with the embodiments of the present disclosure. The processing circuitry for use with the embodiments of the present disclosure can be communicatively coupled to other components of the figures herein. The processing circuitry for use with the embodiments of the present disclosure can execute software instructions stored on memory that cause the processing circuitry to perform different sets of actions and control other components of the figures herein.

[0103] Memory for use with embodiments of the present disclosure can be shared by one or more of the various functional units, or can be distributed among two or more of them (e.g., as separate memories residing in different chips). The memory can also be its own separate chip. The memory can be non-transient, and can be volatile (e.g., RAM, etc.) and / or non-volatile memory (e.g., ROM, Flash memory, F-RAM, etc.).

[0104] Computer program instructions for performing operations in accordance with the described subject matter may be written in any combination of one or more programming languages, including object-oriented programming languages, such as Java, Javascript, Smalltalk, C++, C#, Transact-SQL, XML, PHP, or the like, and conventional procedural programming languages, such as the "C" programming language or a similar programming language.

[0105] Various aspects of the subject matter are described below as a review of and / or complement to the previously described embodiments, with emphasis placed on the interrelationships and interchangeability of the following embodiments, in other words, emphasizing the fact that each feature of the embodiments can be combined with every other feature, unless expressly stated otherwise or logically possible.

[0106] In some embodiments, the beam position monitor includes a plurality of electrodes extending into an interior of the beamline component. In some of these embodiments, the beam position monitor is configured to detect a position of the beam passing through the beamline component based on a halo current of the beam. In some of these embodiments, the beam position monitor further includes a cooling device.

[0107] In some of these embodiments, each electrode of the plurality of electrodes is associated with a current threshold. In some of these embodiments, at least one electrode of the plurality of electrodes is associated with a different current threshold than one or more other electrodes of the plurality of electrodes. In some of these embodiments, each electrode of the plurality of electrodes is associated with multiple current thresholds.

[0108] In some of these embodiments, the beam position monitor is configured to transmit a signal to the control system when a current measured by one or more of the plurality of electrodes exceeds its associated current threshold. In some of these embodiments, the beam position monitor is configured to transmit a signal to the control system when a current measured by an adjacent electrode of the plurality of electrodes exceeds a lower threshold of a plurality of current thresholds associated with each of the adjacent electrodes.

[0109] In some of these embodiments, each electrode of the plurality of electrodes is associated with an electrode extension distance. In some of these embodiments, the electrode extension distance represents the distance within the interior of the component that the electrode extends. In some of these embodiments, each electrode extension distance is adjustable.

[0110] In some of these embodiments, the electrodes are galvanically isolated from a wall of the beam position monitor. In some of these embodiments, the electrodes are configured to be biased by an external power supply.

[0111] In some of these embodiments, the beam position monitor is configured to transmit a signal to a control system when the beam advancing through the beamline becomes off-axis. In some of these embodiments, a minimum amount of beam current of the beam passing through a component of the beamline is reduced due to the multiple electrodes.

[0112] In some embodiments, the beam system includes a beam position monitor configured to detect a position of the beam passing through the beamline components based on the halo current of the beam. In some of these embodiments, the beam system further includes a control system configured to adjust beamline parameters based on the position of the beam.

[0113] In some of these embodiments, the beam position monitor includes a plurality of electrodes that extend into the interior of the beamline component.

[0114] In some of these embodiments, the control system includes at least one processor and at least one memory that stores instructions that, when executed by the at least one processor, cause the control system to receive one or more signals from the beam position monitor and, based on the one or more signals, transmit an instruction to interrupt operation of the beam system.

[0115] In some of these embodiments, the control system includes at least one processor and at least one memory that stores instructions that, when executed by the at least one processor, cause the control system to receive one or more signals from the beam position monitor and, based on the one or more signals, transmit data representing the one or more signals to a computing device.

[0116] In some of these embodiments, the control system includes at least one processor and at least one memory storing instructions that, when executed by the at least one processor, cause the control system to receive one or more signals from the beam position monitor. In some of these embodiments, the control system is caused to determine that the beam is off-axis based on the one or more signals and to transmit an adjustment signal to one or more beamline components to adjust the position of the beam back onto the desired axis.

[0117] In some of these embodiments, the control system includes at least one processor and at least one memory storing instructions that, when executed by the at least one processor, cause the control system to receive one or more signals from the beam position monitor. In some of these embodiments, the control system is further caused to determine a desired off-axis beam deflection based on the one or more signals and transmit adjustment signals to one or more beamline components to compensate for the desired off-axis beam deflection.

[0118] In some of these embodiments, the one or more beamline components include one or more beam-steering magnets. In some of these embodiments, the adjustment signal adjusts a position of the one or more beam-steering magnets.

[0119] In some of these embodiments, the one or more signals represent a current measured by one or more of the multiple electrodes.

[0120] In some of these embodiments, the one or more signals represent a current measured by one or more electrodes of the multiple electrodes that exceeds a current threshold associated with the one or more electrodes.

[0121] In some of these embodiments, the one or more signals represent currents measured by adjacent electrodes of the plurality of electrodes that exceed a current threshold associated with the adjacent electrode.

[0122] In some of these embodiments, the beam system includes a beam position monitor as described in any of the previous embodiments.

[0123] In some of these embodiments, the beam system includes an ion source configured to generate ions and a tandem accelerator configured to accelerate ions propagated from the ion source, In some of these embodiments, the one or more beam position monitors are positioned one or more of upstream of the tandem accelerator or downstream of the tandem accelerator.

[0124] In some embodiments, the neutron beam system includes a preaccelerator system configured to accelerate ions from an ion source, a tandem accelerator configured to accelerate ions from the preaccelerator system, and a beam position monitor according to any of the previous embodiments. In some of these embodiments, the ion source is configured to generate ions.

[0125] In some of these embodiments, the neutron beam system further includes a beamline coupled to an outlet of the tandem accelerator, and the preaccelerator system is coupled to an entrance of the tandem accelerator.

[0126] In some of these embodiments, the preaccelerator system includes one or more of an Einzel lens, a preaccelerator tube, a magnetic focusing element, or a pumping chamber.

[0127] In some embodiments, a method of monitoring a position of a beam advancing through a beamline includes measuring a magnitude of a current at one or more individual electrodes of a plurality of electrodes positioned in the beamline as the beam advances through the beamline. In some of these embodiments, each individual electrode of the plurality of electrodes is associated with one or more current thresholds.

[0128] In some of these embodiments, the method further includes determining whether the beam advancing through the beamline is off-axis by comparing a magnitude of the current in one or more of the one or more individual electrodes against one or more current thresholds.

[0129] In some of these embodiments, the method further includes determining whether the beam advancing through the beamline is off-axis by comparing a first magnitude of the current in a first electrode of the one or more individual electrodes to a first current threshold and a second magnitude of the current in a second electrode of the one or more individual electrodes to a second current threshold. In some of these embodiments, the first electrode and the second electrode are positioned adjacent to one another.

[0130] In some of these embodiments, the method further includes signaling to the control system that the beam is off-axis when the magnitude of the current in one or more of the one or more individual electrodes exceeds or falls below one or more current thresholds.

[0131] In some of these embodiments, the method further includes signaling to the control system that the beam is off-axis when a first magnitude of the current at the first electrode exceeds or falls below a first current threshold and a second magnitude of the current at the second electrode exceeds or falls below a second current threshold.

[0132] In some of these embodiments, the method further includes biasing the plurality of electrodes using an external power supply. In some of these embodiments, the method further includes water-cooling the plurality of electrodes.

[0133] In some of these embodiments, each individual electrode of the plurality of electrodes is associated with an electrode extension distance, which in some of these embodiments represents the distance within the interior of the beamline component that the electrode extends.

[0134] In some of these embodiments, each individual electrode is associated with a unique, predetermined threshold current.

[0135] In some embodiments, a method for controlling a position of a beam advancing through a beamline of a beam system includes receiving one or more signals from a beam position monitor and determining whether a beam advancing through the beamline is off-axis based on the one or more signals.

[0136] In some of these embodiments, the beam position monitor includes a plurality of electrodes that extend into the interior of the beamline component.

[0137] In some of these embodiments, the method further includes transmitting, based on the one or more signals, a command to interrupt operation of the beam system. In some of these embodiments, the method further includes transmitting, based on the one or more signals, data representative of the one or more signals to a computing device. In some of these embodiments, the method further includes, in response to determining that the beam is off-axis, transmitting an adjustment signal to one or more beamline components to adjust a position of the beam back onto the desired axis.

[0138] In some of these embodiments, the method further includes determining a desired off-axis beam deflection based on the one or more signals, and transmitting an adjustment signal to one or more beamline components to compensate for the desired off-axis beam deflection.

[0139] In some of these embodiments, the one or more beamline components comprise one or more beam-steering magnets. In some of these embodiments, the adjustment signal adjusts a position of the one or more beam-steering magnets.

[0140] In some of these embodiments, the one or more signals represent a current measured by one or more electrodes of the plurality of electrodes. In some of these embodiments, the one or more signals represent a current measured by one or more electrodes of the plurality of electrodes that exceeds a current threshold associated with the one or more electrodes. In some of these embodiments, the one or more signals represent a current measured by an adjacent electrode of the plurality of electrodes that exceeds a current threshold associated with the adjacent electrode.

[0141] In some of these embodiments, the degree of beam deflection quantifies the off-axis distance that the beam travels.

[0142] In some embodiments, the beam imaging diagnostic system includes two or more imaging components coupled to and extending into the pumping chamber and oriented orthogonal to the beam propagation axis of the pumping chamber. In some of these embodiments, the pumping chamber is positionable along the beamline. In some of these embodiments, the two or more imaging components are configured to substantially non-invasively monitor the beam advancing through the beamline using gas injection. In some of these embodiments, the beam imaging diagnostic system is configured to monitor beam parameters of the beam advancing through the beamline. In some of these embodiments, the beam parameters comprise one or more of size, location, tilt, or profile.

[0143] In some of these embodiments, the beam imaging diagnostic system further includes a gas insufflation port extending from the pumping chamber and providing a passageway into the pumping chamber. In some of these embodiments, the two or more imaging components include a camera coupled to the lens. In some of these embodiments, an optical tube is coupled to the lens by one or more of indirectly or directly. In some of these embodiments, the end of the optical tube farthest from the camera includes an aperture having a specifically shaped opening. In some of these embodiments, the aperture is matched with the camera and configured to block a large portion of background light that would otherwise reach the camera sensor of the camera. In some of these embodiments, the two or more imaging components further include an interference bandpass filter positioned between the optical tube and the lens.

[0144] In some of these embodiments, the gas insufflation port is actuated by a gas valve.

[0145] In some of these embodiments, two or more imaging components include an adjustable detector exposure time, which in some of these embodiments is adjustable to provide as much signal accumulation as possible while maintaining the highest possible signal-to-noise ratio (SNR).

[0146] In some of these embodiments, the gas valve is configured to control the amount of gas insufflated and the time the amount of gas is insufflated into the pumping chamber, In some of these embodiments, the gas valve is further configured to control the location of the gas insufflated into the pumping chamber such that a uniform distribution of gas is achieved within the field of view of two or more imaging components.

[0147] In some of these embodiments, the camera includes one or more of a time resolution, a signal to noise ratio, or a size. In some of these embodiments, the time resolution is 2 milliseconds or less. In some of these embodiments, the signal to noise ratio is greater than 40:1.

[0148] In some embodiments, the beam system includes a beam imaging diagnoser system positioned along the beam system. In some of these embodiments, the beam imaging diagnoser system is configured to non-invasively monitor the beam advancing through the beam system. In some of these embodiments, the beam system further includes a control system configured to receive one or more signals from the beam imaging diagnoser system.

[0149] In some of these embodiments, the beam imaging diagnoser system includes the beam imaging diagnoser system described in any of the previous embodiments.

[0150] In some of these embodiments, the control system includes at least one processor and at least one memory that stores instructions that, when executed by the at least one processor, cause the control system to determine one or more beam parameters comprising one or more of size, location, tilt, or profile based on the one or more signals.

[0151] In some of these embodiments, the control system includes at least one processor and at least one memory that stores instructions that, when executed by the at least one processor, cause the control system to transmit control signals to one or more of the gas valves or one or more imaging components of the beam imaging diagnostic system based on the one or more signals.

[0152] In some of these embodiments, the beam system further includes a low energy beam line (LEBL). In some of these embodiments, the LEBL includes one or more of a negative ion source, beam optics, a preaccelerator system, a beam diagnostics, or a pumping chamber. In some of these embodiments, the beam system further includes an accelerator downstream of the LEBL. In some of these embodiments, a first beam imaging diagnostics system as described in any of the previous embodiments is positioned upstream of the accelerator. In some of these embodiments, a second beam imaging diagnostics system as described in any of the previous embodiments is positioned downstream of the accelerator.

[0153] In some embodiments, the neutron beam system includes a preaccelerator system configured to accelerate ions from an ion source, a tandem accelerator configured to accelerate ions from the preaccelerator system, and a beam imaging diagnostic system as described in any of the previous embodiments.

[0154] In some of these embodiments, the neutron beam system further includes an ion source configured to generate ions. In some of these embodiments, the neutron beam system further includes a high energy beam line (HEBL) coupled to an outlet of the tandem accelerator, and the preaccelerator system is coupled to an inlet of the tandem accelerator. In some of these embodiments, the preaccelerator system includes one or more of an Einzel lens, a preaccelerator tube, a magnetic focusing element, or a pumping chamber.

[0155] In some of these embodiments, the neutron beam system further includes a control system configured to receive one or more signals from the beam imaging diagnostic system.

[0156] In some of these embodiments, the control system includes at least one processor and at least one memory that stores instructions that, when executed by the at least one processor, cause the control system to determine one or more beam parameters comprising one or more of size, location, tilt, or profile based on the one or more signals.

[0157] In some of these embodiments, the control system includes at least one processor and at least one memory that stores instructions that, when executed by the at least one processor, cause the control system to transmit control signals to one or more of the gas valves or one or more imaging components of the beam imaging diagnostic system based on the one or more signals.

[0158] In some embodiments, a method for non-invasively monitoring parameters of a beam advancing along a beamline includes insufflating a gas into a pumping chamber and measuring one or more beam parameters based on fluorescence resulting from collisions of energetic beam particles of the beam advancing through the beamline.

[0159] In some of these embodiments, the method further includes insufflating a gas into the pumping chamber while the beam advances through the beamline.

[0160] In some of these embodiments, the method further includes insufflating a gas into the pumping chamber along the beamline such that disturbance to the beam advancing through the beamline is minimized.

[0161] In some of these embodiments, the method further includes measuring one or more beam parameters such that disturbances to the beam progressing through the beamline are minimized.

[0162] In some of these embodiments, the method further includes insufflating a gas into the pumping chamber prior to advancing the pulse of the beam through the beamline.

[0163] In some of these embodiments, the one or more beam parameters include one or more of lateral beam size (profile) or beam position.

[0164] In some of these embodiments, measuring includes recording the amount of fluorescence emission from the beam-gas interaction region. In some of these embodiments, recording the amount of fluorescence emission includes recording using two or more orthogonally oriented imaging components. In some of these embodiments, the method further includes delaying a trigger for the two or more orthogonally oriented imaging components relative to the pulse of the beam. In some of these embodiments, the trigger is delayed to accommodate one or more of a beam equilibration time or a fluorescence emission delay.

[0165] In some of these embodiments, the method further includes transferring one or more beam parameters to a control system. In some of these embodiments, the one or more beam parameters include beam position, lateral size, and beam tilt. In some of these embodiments, the method further includes transferring one or more beam parameters to the control system in real time.

[0166] In some of these embodiments, the method further includes calculating the beam centroid along the beam propagation and comparing the beam centroid to the beamline axis coordinates. In some of these embodiments, the method further includes obtaining the beamline axis coordinates during calibration of the beam imaging diagnostic system.

[0167] In some of these embodiments, the method further includes measuring one or more beam parameters before, during, or after the treatment.

[0168] In some of these embodiments, the gas includes one or more of argon or xenon.

[0169] It should be noted that all features, elements, components, functions, and steps described with respect to any embodiment provided herein are intended to be freely combinable and substituted with those from any other embodiment. If a feature, element, component, function, or step is described with respect to only one embodiment, it should be understood that the feature, element, component, function, or step can be used with all other embodiments described herein, unless expressly stated otherwise. This paragraph therefore serves as a premise and description aid for the introduction of claims combining features, elements, components, functions, and steps from different embodiments or substituting features, elements, components, functions, and steps from one embodiment with those from another embodiment, wherever applicable, even if the following description does not expressly state that such combinations or substitutions are possible in a particular case. In particular, it is expressly recognized that it would be unduly burdensome to list all possible combinations and substitutions, given that the permissibility of all such combinations and substitutions would be readily recognized by those skilled in the art.

[0170] To the extent that the embodiments disclosed herein include or operate in association with a memory, storage device, and / or computer-readable medium, the memory, storage device, and / or computer-readable medium are non-transitory. Thus, to the extent that the memory, storage device, and / or computer-readable medium are covered by one or more claims, the memory, storage device, and / or computer-readable medium are only non-transitory.

[0171] As used in this specification and the appended claims, the singular forms "a," "an," and "the" include plural references unless the context clearly dictates otherwise.

[0172] While the embodiments are susceptible to various modifications and alternative forms, specific examples thereof are shown in the drawings and described in detail herein. However, it is to be understood that these embodiments are not limited to the particular forms disclosed, but on the contrary, these embodiments cover all modifications, equivalents, and alternatives falling within the spirit of the present disclosure. Furthermore, any feature, function, step, or element of the embodiments may be recited in or added to the claims with a negative limitation that defines the scope of the invention of the claims by the feature, function, step, or element that does not fall within its scope.

Claims

1. A beam imaging diagnostic system, comprising: two or more imaging components coupled to a pumping chamber, extending into an interior of the pumping chamber and oriented perpendicular to a beam propagation axis of the pumping chamber, the pumping chamber being positionable along a beamline, the two or more imaging components configured to substantially non-invasively monitor a beam advancing through the beamline using gas injection; a gas insufflation port extending from the pumping chamber and providing a passageway into the pumping chamber; A beam imaging diagnostic system comprising:

2. The beam imaging diagnoser system of claim 1, wherein the beam imaging diagnoser system is configured to monitor beam parameters of the beam advancing through the beamline, the beam parameters comprising one or more of size, location, tilt, or profile.

3. The beam imaging diagnostic system of claim 1, wherein the two or more imaging components comprise one or more of an adjustable detector exposure time, or a camera coupled with a lens.

4. A beam imaging diagnostic system as described in claim 3, wherein an optical tube is indirectly or directly coupled to the lens or more than one thereof, and an end of the optical tube farthest from the camera has an opening.

5. The beam imaging diagnostic system of claim 4, wherein the opening is aligned with the camera and configured to block a majority of background light that might otherwise reach a camera sensor of the camera.

6. The beam imaging diagnostic system of claim 4, wherein the two or more imaging components further comprise an interference bandpass filter positioned between the optical tube and the lens.

7. The beam imaging diagnostic system of claim 3, wherein the adjustable detector exposure time is adjustable to provide as much signal accumulation as possible while maintaining the highest possible signal-to-noise ratio (SNR).

8. The beam imaging diagnostic system of claim 1, wherein the gas blowing port is actuated by a gas valve, the gas valve configured to control the amount of gas blown and the time the amount of gas is blown into the pressure blowing chamber.

9. The beam imaging diagnostic system of claim 8, wherein the gas valve is further configured to control the location of gas blown into the pumping chamber so that uniform distribution of gas is achieved within the field of view of the two or more imaging components.

10. The beam imaging diagnostic system of claim 3, wherein the camera has one or more of the following: time resolution, signal to noise ratio, or size.

11. The beam imaging diagnostic system of claim 10, wherein the time resolution is 2 milliseconds or less.

12. The beam imaging diagnostic system of claim 10, wherein the signal-to-noise ratio is greater than 40:

1.

13. A method for non-invasively monitoring parameters of a beam traveling along a beamline, the method comprising: insufflating a gas into a pumping chamber; measuring one or more beam parameters based on fluorescence resulting from the collision of energetic beam particles of the beam advancing through the beamline; A method comprising:

14. The method of claim 13, further comprising blowing the gas into the pumping chamber along the beamline such that disturbance to the beam advancing through the beamline is minimized.

15. The method of claim 13, further comprising measuring the one or more beam parameters such that disturbances to the beam advancing through the beamline are minimized.

16. The method of claim 13, further comprising blowing the gas into the pumping chamber either while the beam advances through the beamline or prior to a pulse of the beam advancing through the beamline.

17. The method of claim 13, wherein the one or more beam parameters comprise one or more of lateral beam size (profile), beam tilt, or beam position.

18. The method of claim 17, wherein measuring includes recording the amount of fluorescent light emitted from the beam-gas interaction region using two or more orthogonally oriented imaging components.

19. The method of claim 18, further comprising delaying a trigger for the two or more orthogonally oriented imaging components relative to the pulse of the beam, the trigger being delayed to accommodate one or more of a beam equilibrium time or a fluorescent emission delay.

20. The method of claim 13, wherein the gas comprises one or more of argon or xenon.

Images