Colored photosensitive composition, cured product, color filter, solid-state imaging element, and image display device

Abstract

To provide a colored photosensitive composition excellent in development residue suppression.SOLUTION: The present invention provides: a colored photosensitive composition which contains a pigment, an amine compound having two or more cyclic amino groups in the molecule, a resin, and a photopolymerization initiator, the content of the pigment being 40 mass% or more based on the total solid content in the colored photosensitive composition: a cured product of the colored photosensitive composition; or a color filter, a solid-state imaging element or an image display device including the cured product.SELECTED DRAWING: None

Description

[Technical field]

[0001] The present disclosure relates to a colored photosensitive composition, a cured product, a color filter, a solid-state imaging device, and an image display device. [Background technology]

[0002] Color filters are essential components of solid-state imaging devices or image display devices. In some cases, noise occurs in solid-state imaging devices and image display devices due to the reflection of visible light. To prevent this, light-shielding films are provided in solid-state imaging devices and image display devices to suppress the generation of noise. As a method for producing such a color filter or a light-shielding film, a method is known in which a colored photosensitive composition layer is formed using a colored photosensitive composition containing a colorant, a polymerizable compound, a photopolymerization initiator, and an alkali-soluble resin, and the colored photosensitive composition layer is exposed and developed to form a pattern. As a conventional colored photosensitive composition, the composition described in Patent Document 1 is known.

[0003] Patent Document 1: JP 2015-30781 A Summary of the Invention [Problem to be solved by the invention]

[0004] An object of the present disclosure is to provide a colored photosensitive composition that is excellent in suppressing development residues. Another problem to be solved by the embodiments of the present disclosure is to provide a cured product of the colored photosensitive composition, a color filter including the cured product, or a solid-state imaging device or an image display device including the color filter. [Means for solving the problem]

[0005] Means for solving the above problems include the following aspects. <1> A colored photosensitive composition comprising a pigment, an amine compound having two or more cyclic amino groups in the molecule, a resin, and a photopolymerization initiator, wherein the content of the pigment is 40 mass% or more based on the total solid content of the colored photosensitive composition. <2> The molecular weight of the amine compound is 6,000 or less. <1> 2. The colored photosensitive composition according to claim 1 . <3> The amine compound is a compound represented by the following formula 1: <1> or <2> 2. The colored photosensitive composition according to claim 1 .

[0006] [ka]

[0007] In formula 1, X represents an n-valent organic group, each L independently represents a single bond or a divalent linking group, each R independently represents a group having a cyclic amino group, and n represents an integer of 2 to 20.

[0008] <4> The amine compound has a hindered amine structure as the cyclic amino group. <1> ~ <3> 10. The colored photosensitive composition according to any one of the above. <5> The amine compound is a compound having 3 to 8 cyclic amino groups in the molecule. <1> ~ <4> 10. The colored photosensitive composition according to claim 9 . <6> The amine compound is a compound having 4 to 8 cyclic amino groups in the molecule. <1> ~ <5> 10. The colored photosensitive composition according to claim 9 . <7> The photopolymerization initiator includes an oxime-based photopolymerization initiator. <1> ~ <6> 10. The colored photosensitive composition according to claim 9 . <8> The resin content M P and the content M of the amine compound A The mass ratio of P :M A =40:60~95:5 <1> ~ <7> 10. The colored photosensitive composition according to claim 9 . <9> Further comprising a polymerizable compound <1> ~ <8> 10. The colored photosensitive composition according to claim 9 . <10> <1> ~ <9> 2. A cured product obtained by curing the colored curable composition according to claim 1. <11> <10> A color filter comprising the cured product according to claim 1. <12> <11> A solid-state imaging device having the color filter according to claim 1. <13> <11> An image display device comprising the color filter according to claim 1. Effect of the Invention

[0009] According to an embodiment of the present disclosure, there is provided a colored photosensitive composition that is excellent in suppressing development residues. Further, another embodiment according to the present disclosure provides a cured product of the colored photosensitive composition, a color filter including the cured product, or a solid-state imaging device or an image display device including the color filter. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] The contents of the present disclosure will be described in detail below. The following description of the components may be based on a representative embodiment of the present disclosure, but the present disclosure is not limited to such an embodiment. In the present disclosure, the use of "to" indicating a numerical range means that the numerical values ​​before and after it are included as the lower limit and upper limit. In the numerical ranges described in the present disclosure in stages, the upper or lower limit value described in one numerical range may be replaced with the upper or lower limit value of another numerical range described in stages. In addition, in the numerical ranges described in the present disclosure, the upper or lower limit value of the numerical range may be replaced with a value shown in the examples. Furthermore, in the present disclosure, when a plurality of substances corresponding to each component are present in the composition, the amount of each component in the composition means the total amount of the corresponding substances present in the composition, unless otherwise specified. In addition, in the description of groups (atomic groups) in the present disclosure, descriptions that do not indicate whether they are substituted or unsubstituted include those that have no substituents as well as those that have a substituent. For example, an "alkyl group" includes not only an alkyl group that has no substituents (unsubstituted alkyl groups) but also an alkyl group that has a substituent (substituted alkyl groups). In this disclosure, unless otherwise specified, "Me" represents a methyl group, "Et" represents an ethyl group, "Pr" represents a propyl group, "Bu" represents a butyl group, and "Ph" represents a phenyl group. In the present disclosure, "(meth)acrylic" is a term used as a concept that includes both acrylic and methacrylic, and "(meth)acryloyl" is a term used as a concept that includes both acryloyl and methacryloyl. In addition, in the present disclosure, the term "process" refers not only to an independent process, but also to a process that cannot be clearly distinguished from other processes, as long as the intended purpose of the process is achieved. In the present disclosure, the term "total solid content" refers to the total mass of the components excluding the solvent from the entire composition of the composition. Also, as described above, the "solid content" refers to the components excluding the solvent, and may be, for example, solid or liquid at 25°C. In the present disclosure, "mass %" and "weight %" are synonymous, and "parts by mass" and "parts by weight" are synonymous. Furthermore, in the present disclosure, combinations of two or more preferred embodiments are more preferred embodiments. In addition, unless otherwise specified, the weight average molecular weight (Mw) and number average molecular weight (Mn) in the present disclosure are molecular weights detected by a gel permeation chromatography (GPC) analyzer using columns of TSKgel GMHxL, TSKgel G4000HxL, or TSKgel G2000HxL (all product names manufactured by Tosoh Corporation) in a solvent of THF (tetrahydrofuran) and a differential refractometer, and converted using polystyrene as a standard substance. In this specification, a pigment means a compound that is poorly soluble in a solvent. In this specification, a dye means a compound that is easily soluble in a solvent. The present disclosure will be described in detail below.

[0011] (Colored photosensitive composition) The colored photosensitive composition according to the present disclosure comprises a pigment, an amine compound having two or more cyclic amino groups in the molecule, a resin, and a photopolymerization initiator, and the content of the pigment is 40 mass% or more with respect to the total solid content in the colored photosensitive composition.

[0012] In recent years, the trend toward finer and thinner patterns has been progressing with the increasing number of pixels in image sensors, which has resulted in a relatively increased pigment concentration in color filters and a reduced amount of curable and developable components. As a result of detailed investigations, the present inventors have found that in conventional colored photosensitive compositions in which the pigment content is 40 mass % or more relative to the total solid content in the colored photosensitive composition, the developer does not penetrate easily due to a high content of pigment insoluble in the developer, and the amount of developable components is not small, which may result in poor development or a large amount of development residue. As a result of extensive investigations, the present inventors have found that the adoption of the above-mentioned configuration provides excellent suppression of development residues. It is presumed that by containing an amine compound having two or more cyclic amino groups in the molecule and having a pigment content of 40% or more by mass relative to the total solid content in the colored photosensitive composition, even in a colored photosensitive composition having a high pigment concentration as described above, the amine compound is easily adsorbed to the pigment surface due to the cyclic structure of the amine, and further, the resin moderately interacts with the amino groups of the amine compound that are not coordinated to the pigment, forming a pigment particle-amine compound-resin structure, thereby suppressing adsorption and aggregation between pigment particles contained in the colored photosensitive composition, thereby imparting developability and providing excellent suppression of development residues.

[0013] <Amine compound having two or more cyclic amino groups in the molecule> The colored photosensitive composition according to the present disclosure contains an amine compound having two or more cyclic amino groups in the molecule. The molecular weight of the amine compound having two or more cyclic amino groups in the molecule is preferably 6,000 or less, more preferably 100 to 4,000, even more preferably 200 to 3,000, and particularly preferably 500 to 2,500, from the viewpoints of suppression of development residues, dispersion stability, and adhesion of the resulting cured product (hereinafter also simply referred to as "adhesion").

[0014] The cyclic amino group in the amine compound having two or more cyclic amino groups in the molecule is Although a primary to tertiary cyclic amino group or a salt thereof may be used, from the viewpoints of suppression of development residues, dispersion stability, and adhesion, a tertiary cyclic amino group or a salt thereof is preferred. The counter anion of the salt that may be formed by the cyclic amino group is not particularly limited and may be a monovalent anion or a polyvalent anion, and examples thereof include halide ions, hydroxide ions, carboxylate anions, sulfonate anions, sulfate ions, arylborate anions, alkylborate anions, perchlorate ions, PF6 - , etc. In addition, when the cyclic amino group forms a salt, the cyclic amino group is preferably a protonated cation.

[0015] The cyclic amino group in the amine compound having two or more cyclic amino groups in the molecule may be an aliphatic cyclic amino group such as a piperidino group, or an aromatic cyclic amino group such as a pyridyl group. Among these, the cyclic amino group in the amine compound having two or more cyclic amino groups in the molecule is preferably a cyclic amino group having a 5-membered or 6-membered ring structure, more preferably a cyclic amino group having a 6-membered ring structure, and even more preferably an aliphatic cyclic amino group having a 6-membered ring structure, from the viewpoints of suppression of development residues, dispersion stability, and adhesion. In addition, the amine compound having two or more cyclic amino groups in the molecule preferably has a hindered amine structure as the cyclic amino group, from the viewpoints of suppressing development residues, dispersion stability, and adhesion, and particularly preferably has a six-membered hindered amine structure. The hindered amine structure preferably has a substituent such as an alkyl group on two carbon atoms in the ring structure adjacent to the nitrogen atom of the cyclic amino group.Preferred examples of the cyclic amino group having a hindered amine structure include a 1,2,2,6,6-pentamethylpiperidyl group, a 2,2,6,6-tetramethylpiperidyl group, a 1,2,6,6-trimethylpiperidyl group, a 2,6-dimethylpiperidyl group, a 1-methyl-2,6-di(t-butyl)piperidyl group, a 2,6-di(t-butyl)piperidyl group, a 1,2,2,5,5-pentamethylpyrrolidyl group, and a 2,2,5,5-tetramethylpyrrolidyl group. Of these, a 1,2,2,6,6-pentamethylpiperidyl group or a 2,2,6,6-tetramethylpiperidyl group is preferable, and a 1,2,2,6,6-pentamethylpiperidyl group is more preferable.

[0016] The number of cyclic amino groups in the amine compound having two or more cyclic amino groups in the molecule is preferably 2 to 20, more preferably 2 to 8, even more preferably 3 to 8, and particularly preferably 4 to 8, from the viewpoints of suppression of development residues, dispersion stability, and adhesion.

[0017] The amine compound having two or more cyclic amino groups in the molecule is preferably a compound represented by the following formula 1, from the viewpoints of suppression of development residues, dispersion stability, and adhesion.

[0018] [ka]

[0019] In formula 1, X represents an n-valent organic group, each L independently represents a single bond or a divalent linking group, each R independently represents a group having a cyclic amino group, and n represents an integer of 2 to 20.

[0020] From the viewpoints of suppression of development residues, dispersion stability, and adhesion, X in formula 1 is preferably an n-valent aliphatic group or a group having an n-valent aromatic ring or heteroaromatic ring, more preferably an n-valent aliphatic group, and particularly preferably an n-valent aliphatic hydrocarbon group which may have an ether bond and an ester bond. Moreover, the molecular weight (formula weight) of X in formula 1 is preferably 4,000 or less, more preferably 100 to 3,000, further preferably 200 to 2,500, and particularly preferably 200 to 2,000, from the viewpoints of suppression of development residues, dispersion stability, and adhesion. Furthermore, from the viewpoints of suppressing development residues, dispersion stability, and adhesion, X in formula 1 preferably has 4 to 400 carbon atoms (also referred to as "number of carbon atoms"), more preferably has 5 to 200 carbon atoms, and particularly preferably has 8 to 150 carbon atoms. In formula 1, each L is preferably independently a single bond, an ether bond or an ester bond, and more preferably an ether bond or an ester bond. Each R in formula 1 is preferably independently a cyclic amino group or a group in which an alkylene group is bonded to a cyclic amino group, and more preferably a cyclic amino group. In addition, preferred embodiments of the cyclic amino group in R of formula 1 are the same as the preferred embodiments of the cyclic amino group described above. In formula 1, n is preferably an integer of 2 to 8, more preferably an integer of 3 to 8, and particularly preferably an integer of 4 to 8.

[0021] Specific examples of X include alkylene groups having 4 to 12 carbon atoms, and the groups shown below. The wavy line portion represents the bonding position with L, and the double wavy line portions each represent L. AHrepresents a bonding position to either of the structures shown on either side of the formula (1). In addition, nAH is preferably an integer of 1 to 3, and more preferably 1 or 2.

[0022] [ka]

[0023] Specific examples of the amine compound having two or more cyclic amino groups in the molecule are shown below. The wavy lines in the following compounds indicate the bonding positions with other corresponding structures.

[0024] [ka]

[0025] [ka]

[0026] [ka]

[0027] [ka]

[0028] [ka]

[0029] [ka]

[0030] As examples of the amine compound having two or more cyclic amino groups in the molecule, commercially available products include ADK STAB LA-52 (Tetrakis(1,2,2,6,6-pentamethyl-4-piperidyl) butane-1,2,3,4-tetracarboxylate), ADK STAB LA-57 (Tetrakis(2,2,6,6-tetramethyl-4-piperidyl) butane-1,2,3,4-tetracarboxylate), LA-63P (1,2,3,4-Butanetetracarboxylic acid, tetramethyl ester, reaction products with 1,2,2,6,6-pentamethyl-4-piperidinol and β,β,β',β'-tetramethyl-2,4,8,10-tetraoxaspiro[5.5]undecane-3,9-diethanol), and ADK STAB LA-68 (1,2,3,4-Butanetetracarboxylic acid, tetramethyl ester, reaction products with 2,2,6,6-tetramethyl-4-piperidinol and β,β,β',β'-tetramethyl-2,4,8,10-tetraoxaspiro[5.5]undecane-3,9-diethanol), ADK STAB LA-72 (Bis(1,2,2,6,6-pentamethyl-4-piperidyl) sebacate (main component )), ADK STAB LA-77Y (Bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate) , ADK STAB LA-77G (Bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate) (Manufactured by ADEKA Corporation)

[0031] The colored photosensitive composition according to the present disclosure may contain one type of amine compound having two or more cyclic amino groups in the molecule, or may contain two or more types of amine compounds. The content of the amine compound having two or more cyclic amino groups in the molecule in the colored photosensitive composition according to the present disclosure is, from the viewpoints of suppression of development residues, dispersion stability, and adhesion, preferably from 0.05% by mass to 20% by mass, more preferably from 1% by mass to 16% by mass, and particularly preferably from 2% by mass to 10% by mass, relative to the total solid content of the colored photosensitive composition.

[0032] In the colored photosensitive composition according to the present disclosure, the content M P and the content M of the amine compound A The mass ratio of M to M is determined from the viewpoints of suppression of development residue, dispersion stability, and adhesion. P :M A = 40:60 to 95:5 is preferable, P :M A More preferably, M = 50:50 to 95:5. P :M A More preferably, M = 75:25 to 95:5. P :M A It is particularly preferable that the ratio is 75:25 to 90:10.

[0033] <Pigments> The colored photosensitive composition according to the present disclosure comprises a pigment. The pigment may be either an inorganic pigment or an organic pigment, but is preferably an organic pigment. In addition, the pigment may be a material in which a part of an inorganic pigment or an organic-inorganic pigment is replaced with an organic chromophore. By replacing an inorganic pigment or an organic-inorganic pigment with an organic chromophore, it becomes easier to design the hue. The colored photosensitive composition according to the present disclosure can be preferably used as a colored photosensitive composition for forming colored pixels in a color filter. Examples of the colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels. Among them, green pixels are preferred.

[0034] The average primary particle diameter of the pigment is preferably 1 nm to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. If the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the colored photosensitive composition is good. In the present disclosure, the primary particle diameter of the pigment can be obtained by observing the primary particles of the pigment with a transmission electron microscope and obtaining an image photograph. Specifically, the projected area of ​​the primary particles of the pigment is obtained, and the corresponding circle equivalent diameter is calculated as the primary particle diameter of the pigment. In the present disclosure, the average primary particle diameter is the arithmetic average value of the primary particle diameters of 400 primary particles of the pigment. In addition, the primary particles of the pigment refer to independent particles without aggregation.

[0035] The amount of the pigment that dissolves in 100 g of propylene glycol methyl ether acetate at 25° C. is preferably less than 0.01 g, more preferably less than 0.005 g, and even more preferably less than 0.001 g.

[0036] Examples of organic pigments include phthalocyanine pigments, dioxazine pigments, quinacridone pigments, anthraquinone pigments, perylene pigments, azo pigments, diketopyrrolopyrrole pigments, pyrrolopyrrole pigments, isoindoline pigments, quinophthalone pigments, triarylmethane pigments, xanthene pigments, methine pigments, and quinoline pigments. Specific examples of organic pigments include the following:

[0037] Color Index (CI) Pigment Yellow 1,2,3,4,5,6,10,11,12,13,14,15,16,17,18,20,24,31,32,34,35,35:1,36,36:1,37,37:1,40,42,43,53,55,60,61,62,63,65,73,74,77,81,83,86,93,94,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137,13 8,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228,231,232 (methine type), 233 (quinoline type), 234 (amino ketone type), 235 (amino ketone type), 236 (amino ketone type), etc. (above, yellow pigments), CI Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, etc. (orange pigments) CIPigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2 ,53:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149, 150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,270,272,279,294 (xanthene, Organo Ultramarine, Bluish Red), 295 (monoazo), 296 (diazo), 297 (aminoketone), etc. (above, red pigments), CI Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine type), 65 (phthalocyanine type), 66 (phthalocyanine type), etc. (above, green pigments), CI Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane type), 61 (xanthene type), etc. (purple pigments) CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (all blue pigments).

[0038] Moreover, from the viewpoint of further exerting the effects of the present disclosure, the colored photosensitive composition according to the present disclosure preferably contains, as a pigment, a green pigment, and more preferably contains a green pigment and a yellow pigment. Furthermore, from the viewpoints of sensitivity and spectral characteristics, the pigment preferably contains a phthalocyanine pigment, and more preferably contains a green phthalocyanine pigment.

[0039] Known green pigments can be used, such as phthalocyanine compounds having Color Index (CI) Pigment Green 7, 10, 36, 37, 58, 59, 62, and 63. In addition, as the green pigment, a halogenated zinc phthalocyanine compound having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms in one molecule can also be used. Specific examples include the compounds described in International Publication No. 2015 / 118720, the compounds described in Chinese Patent Publication No. 106909027, and phthalocyanine compounds having a phosphoric acid ester as a ligand. can. In addition, as the green pigment, the green pigment described in JP-A-2019-8014 or JP-A-2018-180023 may be used. Among these, the green pigment preferably contains at least one compound selected from the group consisting of CI Pigment Green 58 and CI Pigment Green 36, and more preferably contains CI Pigment Green 58, because this makes it easier to form a film having spectral characteristics suitable for green pixels.

[0040] The green pigment may be used alone or in combination of two or more kinds. The content of the green pigment in the total solid content of the colored photosensitive composition is preferably 10% by mass to 80% by mass. The lower limit is more preferably 15% by mass or more, and particularly preferably 20% by mass or more. The upper limit is more preferably 70% by mass or less, and particularly preferably 60% by mass or less.

[0041] Examples of yellow pigments include azo compounds, quinophthalone compounds, isoindolinone compounds, isoindoline compounds, anthraquinone compounds, etc. Among them, isoindoline compounds are preferred because they are easy to form a film having spectral characteristics suitable for green pixels.

[0042] Yellow pigments include Color Index (CI) Pigment Yellow (hereinafter simply referred to as "PY") 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 12 7,128,129,137,138,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214,215,228 (direct-linked quinophthalone dimers described in WO 2013 / 098836), 231,232 (methine / polymethine system), and the like.

[0043] In addition, as the yellow pigment, the pigments described in JP 2017-201003 A and the pigments described in JP 2017-197719 A can be used. In addition, as the yellow pigment, a metal azo pigment containing at least one anion selected from the group consisting of azo compounds represented by the following formula (Y) and azo compounds having a tautomeric structure thereof, two or more metal ions, and a melamine compound can also be used.

[0044] [ka]

[0045] In formula (Y), R Y1 and R Y2 each independently represents -OH or -NR Y5 R Y6 R Y3 and R Y4 each independently represents ═O or ═NRY7 R Y5 ~R Y7 each independently represents a hydrogen atom or an alkyl group. R Y5 ~R Y7 The alkyl group represented by the formula (I) preferably has 1 to 10 carbon atoms, more preferably 1 to 6 carbon atoms. Preferably, 1 to 4 are more preferred. The alkyl group may be linear, branched or cyclic, preferably linear or branched, more preferably linear. The alkyl group may have a substituent. Preferred examples of the substituent include a halogen atom, a hydroxy group, an alkoxy group, a cyano group and an amino group.

[0046] For the above metal azo pigments, reference can be made to paragraphs 0011 to 0062, 0137 to 0276 of JP 2017-171912 A, paragraphs 0010 to 0062, 0138 to 0295 of JP 2017-171913 A, paragraphs 0011 to 0062, 0139 to 0190 of JP 2017-171914 A, and paragraphs 0010 to 0065, 0142 to 0222 of JP 2017-171915 A, the contents of which are incorporated herein by reference.

[0047] As the yellow pigment, a quinophthalone dimer represented by the following formula (Q) can also be suitably used. Furthermore, the quinophthalone dimer described in Japanese Patent No. 6443711 can also be suitably used.

[0048] [ka]

[0049] In formula (Q), X1~X 16 each independently represents a hydrogen atom or a halogen atom, and Z represents an alkylene group having 1 to 3 carbon atoms.

[0050] As yellow pigments, JP 2018-203798 A, JP 2018-62578 A, Patent No. 6432077 A, Patent No. 6432076 A, JP 2018-155881 A, JP 2018-111757 A, JP 2018-40835 A, JP 2017-197640 A, JP 2016-145282 A, JP 2014-85565 A, JP 2014-21139 A, JP 2013-209614 A Publication No. 2013-209435, No. 2013-181015, No. 2013-61622, No. 2013-54339, No. 2013-32486, No. 2012-226110, No. 2008-74987, No. 2008-81565, No. 2008-74986, No. 2008-74985, No. 2008-50420, No. 2008-31281, or The quinophthalone pigments described in JP-B-48-32765 can also be suitably used.

[0051] In addition, as the yellow pigment, the quinophthalone compound described in paragraphs 0011 to 0034 of JP-A-2013-54339, the quinophthalone compound described in paragraphs 0013 to 0058 of JP-A-2014-26228, the yellow pigment described in JP-A-2019-8014, the quinophthalone compound described in Japanese Patent No. 6607427, the compound described in Korean Patent Publication No. 10-2014-0034963, the compound described in JP-A-2017-095706, the compound described in Taiwan Patent Application Publication No. 201920495, the compound described in Japanese Patent No. 6607427, and the like can also be used. In addition, the compound described in JP-A-2018-62644 can also be used as a yellow pigment. This compound can also be used as a pigment derivative. Furthermore, as described in JP 2018-155881 A, CI Pigment Yellow 129 may be added for the purpose of improving weather resistance.

[0052] As the red pigment, a diketopyrrolopyrrole compound in which at least one bromine atom is substituted in the structure described in JP 2017-201384 A, a diketopyrrolopyrrole compound described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838 A, a diketopyrrolopyrrole compound described in WO 2012 / 102399 A, a diketopyrrolopyrrole compound described in WO 2012 / 117965 A, a naphthol azo compound described in JP 2012-229344 A, a red pigment described in Japanese Patent No. 6516119 A, a red pigment described in Japanese Patent No. 6525101 A, etc. can also be used. In addition, as the red pigment, a compound having a structure in which an aromatic ring group in which a group in which an oxygen atom, a sulfur atom or a nitrogen atom is bonded to an aromatic ring is introduced and bonded to a diketopyrrolopyrrole skeleton can also be used.

[0053] In addition, an aluminum phthalocyanine compound having a phosphorus atom can also be used as a blue pigment. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

[0054] Examples of the white pigment include titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, hollow resin particles, and zinc sulfide. The white pigment is preferably a particle having a titanium atom, and more preferably titanium oxide. The white pigment is preferably a particle having a refractive index of 2.10 or more for light with a wavelength of 589 nm. The refractive index is preferably 2.10 to 3.00, and more preferably 2.50 to 2.75.

[0055] In addition, the titanium oxide described in "Titanium Oxide: Physical Properties and Application Technology, by Manabu Seino, pages 13-45, published June 25, 1991, by Gihodo Publishing Co., Ltd." can also be used as the white pigment.

[0056] The white pigment may be not only a single inorganic substance, but also a particle composited with other materials. For example, it is preferable to use a particle having a void or other material inside, a particle having a large number of inorganic particles attached to a core particle, or a core-shell composite particle composed of a core particle composed of a polymer particle and a shell layer composed of inorganic nanoparticles. For the core-shell composite particle composed of a core particle composed of a polymer particle and a shell layer composed of inorganic nanoparticles, the description in paragraphs 0012 to 0042 of JP 2015-047520 A can be referred to, and the contents of this specification are incorporated herein.

[0057] The white pigment may be a hollow inorganic particle. A hollow inorganic particle is an inorganic particle having a structure with a cavity inside, and has a cavity surrounded by an outer shell. Examples of inorganic particles include hollow inorganic particles described in JP 2011-075786 A, WO 2013 / 061621 A, JP 2015-164881 A, and the like, the contents of which are incorporated herein by reference.

[0058] The black pigment is not particularly limited, and known pigments can be used. Examples include carbon black, titanium black, graphite, etc., with carbon black and titanium black being preferred, and titanium black being more preferred. Titanium black is a black particle containing titanium atoms, and low-order titanium oxide or titanium oxynitride is preferred. Titanium black can be surface-modified as necessary for the purpose of improving dispersibility, suppressing aggregation, etc. For example, the surface of titanium black can be coated with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide, or zirconium oxide. In addition, treatment with a water-repellent substance such as that shown in JP-A-2007-302836 can also be performed. Examples of black pigments include Color Index (CI) Pigment Black 1,7, etc. It is preferable that both the primary particle size and the average primary particle size of the individual particles of titanium black are small. Specifically, the average primary particle size is preferably 10 to 45 nm. Titanium black can also be used as a dispersion. For example, a dispersion containing titanium black particles and silica particles, and the ratio of Si atoms to Ti atoms in the dispersion is adjusted to a range of 0.20 to 0.50, can be mentioned. For the above dispersion, the description in paragraphs 0020 to 0105 of JP 2012-169556 A can be referred to, and the contents thereof are incorporated herein. Examples of commercially available titanium black products include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R-N, and 13M-T (trade names: manufactured by Mitsubishi Materials Corporation), Tilack D (trade name: manufactured by Ako Kasei Co., Ltd.), and the like.

[0059] In addition, the pigment used in the present disclosure is preferably a pigment having a specific X-ray diffraction pattern by CuKα radiation.Specific examples thereof include the phthalocyanine pigment described in Japanese Patent No. 6561862, the diketopyrrolopyrrole pigment described in Japanese Patent No. 6413872, and the azo pigment (CI Pigment Red 269) described in Japanese Patent No. 6281345.

[0060] The colored photosensitive composition according to the present disclosure may contain one type of pigment alone, or two or more types of pigments. The content of the pigment is 40% by mass or more based on the total solid content in the colored photosensitive composition, and from the viewpoints of suppression of development residue, dispersion stability, and adhesion, it is preferably 45% by mass or more, more preferably 50% by mass or more, and particularly preferably 60% by mass or more. The upper limit is preferably 80% by mass or less.

[0061] <Resin> The colored photosensitive composition according to the present disclosure contains a resin. The resin is blended, for example, for dispersing particles such as pigments in the colored photosensitive composition and for use as a binder. Note that a resin used mainly for dispersing particles such as pigments is also called a dispersant. However, such uses of the resin are merely examples, and the resin may be used for purposes other than these uses.

[0062] The weight average molecular weight (Mw) of the resin is preferably 3,000 to 2,000,000. The upper limit is more preferably 1,000,000 or less, and particularly preferably 500,000 or less. The lower limit is more preferably 4,000 or more, and particularly preferably 5,000 or more.

[0063] Examples of the resin include (meth)acrylic resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, etc. Examples of the resin include polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, and styrene resin. One of these resins may be used alone, or two or more may be mixed and used. In addition, resins described in paragraphs 0041 to 0060 of JP2017-206689A, resins described in paragraphs 0022 to 007 of JP2018-010856A, resins described in JP2017-057265A, resins described in JP2017-032685A, resins described in JP2017-075248A, and resins described in JP2017-066240A may also be used.

[0064] The colored photosensitive composition according to the present disclosure preferably contains a resin having an acid group as a resin. According to this embodiment, the developability of the colored photosensitive composition can be improved, pixels with excellent rectangularity can be easily formed, and the composition interacts with the amine compound to function favorably as a dispersant, resulting in superior pigment dispersibility. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group, and the carboxy group is preferred. The resin having an acid group can be used, for example, as an alkali-soluble resin.

[0065] The resin having an acid group preferably contains a repeating unit having an acid group on a side chain, and more preferably contains 5 mol% to 70 mol% of the repeating units having an acid group on a side chain in all repeating units of the resin. The upper limit of the content of the repeating units having an acid group on a side chain is preferably 50 mol% or less, and more preferably 30 mol% or less. The lower limit of the content of the repeating units having an acid group on a side chain is preferably 10 mol% or more, and more preferably 20 mol% or more.

[0066] It is also preferable that the resin having an acid group contains a repeating unit derived from a monomer component containing at least one monomer selected from the group consisting of a compound represented by the following formula (ED1) and a compound represented by the following formula (ED2) (hereinafter, these compounds may be referred to as "ether dimers").

[0067] [ka]

[0068] In formula (ED1), R 1 and R 2 each independently represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.

[0069] [ka]

[0070] In formula (ED2), R represents a hydrogen atom or an organic group having a carbon number of 1 to 30. For details of formula (ED2), the disclosure of JP-A-2010-168539 can be referred to, the contents of which are incorporated herein by reference.

[0071] Specific examples of the ether dimer include those described in JP-A-2013-029760, The disclosure of US Pat. No. 6,317,317 may be referred to, the contents of which are incorporated herein by reference.

[0072] The resin used in the present disclosure also preferably contains a repeating unit derived from a compound represented by the following formula (X):

[0073] [ka]

[0074] In formula (X), R1 represents a hydrogen atom or a methyl group, R2 represents an alkylene group having 2 to 10 carbon atoms, and R3 represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms which may contain a benzene ring. n represents an integer of 1 to 15.

[0075] For the resin having an acid group, the description in paragraphs 0558 to 0571 of JP 2012-208494 A (corresponding to paragraphs 0685 to 0700 of U.S. Patent Application Publication No. 2012 / 0235099 A) and the description in paragraphs 0076 to 0099 of JP 2012-198408 A can be referred to, the contents of which are incorporated herein by reference. In addition, a commercially available product can be used as the resin having an acid group.

[0076] The acid value of the resin having an acid group is preferably 30 mgKOH / g to 500 mgKOH / g. The lower limit is more preferably 40 mgKOH / g or more, and particularly preferably 50 mgKOH / g or more. The upper limit is more preferably 400 mgKOH / g or less, further preferably 300 mgKOH / g or less, and particularly preferably 200 mgKOH / g or less. The weight average molecular weight (Mw) of the resin having an acid group is preferably 5,000 to 100,000. The number average molecular weight (Mn) of the resin having an acid group is preferably 1,000 to 20,000.

[0077] The method for introducing an acidic functional group into the resin is not particularly limited, but may be, for example, the method described in Japanese Patent No. 6349629. Furthermore, examples of methods for introducing acidic functional groups into resins include a method in which an acid anhydride is reacted with a hydroxy group generated by a ring-opening reaction of an epoxy group in a dispersant (particularly a dispersant having an ethylenically unsaturated group) or an alkali-soluble resin to introduce an acid group.

[0078] In the present disclosure, it is preferable to use a resin having a basic group as the resin. According to this embodiment, the developability of the colored photosensitive composition can be improved, and pixels having excellent rectangularity can be easily formed. Examples of the basic group include an amino group and a heteroaryl group having a nitrogen atom, and an amino group is preferable, and a tertiary amino group is more preferable. The resin having a basic group can be used as, for example, an alkali-soluble resin.

[0079] The amine value of the resin having an amino group as a basic group is preferably 30 mgKOH / g to 200 mgKOH / g. The lower limit is more preferably 40 mgKOH / g or more, and particularly preferably 50 mgKOH / g or more. The upper limit is more preferably 250 mgKOH / g or less, further preferably 200 mgKOH / g or less, and particularly preferably 150 mgKOH / g or less. The weight average molecular weight (Mw) of the resin having an amino group is preferably 5,000 to 100,000. The number average molecular weight (Mn) of the resin having an amino group is preferably 1,000 to 20,000.

[0080] The colored photosensitive composition according to the present disclosure may also contain a resin as a dispersant. Examples of the dispersant include an acidic dispersant (acidic resin) and a basic dispersant (basic resin). The acidic dispersant (acidic resin) refers to a resin in which the amount of acid groups is greater than the amount of basic groups. The acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups is 70 mol% or more when the total amount of the acid groups and the basic groups is taken as 100 mol%, and more preferably a resin consisting essentially of acid groups. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxy group. The acid value of the acidic dispersant (acidic resin) is preferably 40 mgKOH / g to 105 mgKOH / g, more preferably 50 mgKOH / g to 105 mgKOH / g, and even more preferably 60 mgKOH / g to 105 mgKOH / g. The basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acid groups. The basic dispersant (basic resin) is preferably a resin in which the amount of basic groups is greater than 50 mol% when the total amount of the acid groups and the basic groups is taken as 100 mol%. The basic group contained in the basic dispersant is preferably an amino group.

[0081] The resin used as the dispersant preferably contains a repeating unit having an acid group. By containing a repeating unit having an acid group in the resin used as the dispersant, the generation of development residues can be further suppressed when forming a pattern by a photolithography method.

[0082] The resin used as the dispersant is preferably a graft resin. For details of the graft resin, refer to paragraphs 0025 to 0094 of JP2012-255128A, the contents of which are incorporated herein by reference.

[0083] The resin used as the dispersant is preferably a polyimine-based dispersant containing nitrogen atoms in at least one of the main chain and the side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure having a functional group with a pKa of 14 or less, a side chain with an atomic number of 40 to 10,000, and having a basic nitrogen atom in at least one of the main chain and the side chain. There is no particular limitation on the basic nitrogen atom as long as it is a nitrogen atom that exhibits basicity. For the polyimine-based dispersant, the description in paragraphs 0102 to 0166 of JP 2012-255128 A can be referred to, and the contents thereof are incorporated herein.

[0084] The resin used as the dispersant is preferably a resin having a structure in which a plurality of polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP2013-043962A.

[0085] Furthermore, the above-mentioned resin having an acid group (alkali-soluble resin) can also be used as a dispersant.

[0086] The resin used as the dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated group in a side chain. The content of the repeating unit having an ethylenically unsaturated group in a side chain is preferably 10 mol % or more, more preferably 10 mol % to 80 mol %, and even more preferably 20 mol % to 70 mol %, of all the repeating units of the resin.

[0087] As the dispersant, a resin having an aromatic carboxy group (hereinafter, referred to as "resin B") is preferably used. In resin B, the aromatic carboxy group may be contained in the main chain of the repeating unit, or may be contained in the side chain of the repeating unit. For reasons of excellent developability and color fastness, the aromatic carboxy group is preferably contained in the main chain of the repeating unit. Although the details are unclear, it is presumed that the presence of the aromatic carboxy group near the main chain further improves these properties. In this specification, the aromatic carboxy group refers to a group having a structure in which one or more carboxyl groups are bonded to an aromatic ring. In the aromatic carboxy group, the number of carboxy groups bonded to the aromatic ring is preferably 1 to 4, and is preferably 1 to 2. It is more preferable that

[0088] Resin B used in the present disclosure is preferably a resin containing at least one repeating unit selected from the repeating unit represented by formula (b-1) and the repeating unit represented by formula (b-10).

[0089] [ka]

[0090] In formula (b-1), Ar 1 represents a group containing an aromatic carboxyl group, L 1 represents -COO- or -CONH-; L 2 represents a divalent linking group. In formula (b-10), Ar 10 represents a group containing an aromatic carboxyl group, L 11 represents -COO- or -CONH-; L 12 represents a trivalent linking group, P 10 represents a polymer chain.

[0091] First, formula (b-1) will be described. In formula (b-1), Ar 1 Aromatic carbamates represented by Examples of the group containing a carboxy group include a structure derived from an aromatic tricarboxylic anhydride, a structure derived from an aromatic tetracarboxylic anhydride, etc. Examples of the aromatic tricarboxylic anhydride and the aromatic tetracarboxylic anhydride include compounds having the following structures.

[0092] [ka]

[0093] In the above formula, Q 1 represents a single bond, -O-, -CO-, -COOCH2CH2OCO-, -SO2-, -C(CF3)2-, a group represented by the following formula (Q-1) or a group represented by the following formula (Q-2).

[0094] [ka]

[0095] Specific examples of aromatic tricarboxylic anhydrides include benzenetricarboxylic anhydride (1,2,3-benzenetricarboxylic anhydride, trimellitic anhydride [1,2,4-benzenetricarboxylic anhydride], etc.), naphthalenetricarboxylic anhydride (1,2,4-naphthalenetricarboxylic anhydride, 1,4,5-naphthalenetricarboxylic anhydride, 2,3,6-naphthalenetricarboxylic anhydride, 1,2,8-naphthalenetricarboxylic anhydride, etc.), 3,4,4'-benzophenonetricarboxylic anhydride, 3,4,4'-biphenylethertricarboxylic anhydride, 3,4,4'-biphenyltricarboxylic anhydride, 2,3,2'-biphenyltricarboxylic anhydride, 3,4,4'-biphenylmethanetricarboxylic anhydride, and 3,4,4'-biphenylsulfonetricarboxylic anhydride.Specific examples of aromatic tetracarboxylic acid anhydrides include pyromellitic dianhydride, ethylene glycol ditrimellitic anhydride ester, propylene glycol ditrimellitic anhydride ester, butylene glycol ditrimellitic anhydride ester, 3,3',4,4'-benzophenone tetracarboxylic acid dianhydride, 3,3',4,4'-biphenylsulfone tetracarboxylic acid dianhydride, 1,4,5,8-naphthalene tetracarboxylic acid dianhydride, 2,3,6,7-naphthalene tetracarboxylic acid dianhydride, 3,3',4,4'-biphenyl ether tetracarboxylic acid dianhydride, 3,3',4,4'-dimethyldiphenylsilane tetracarboxylic acid dianhydride, 3,3',4,4'-tetraphenylsilane tetracarboxylic acid dianhydride, 1,2,3,4-furan tetracarboxylic acid dianhydride, 4,4'-bis(3,4-dicarbamic acid dianhydride), 1,2,3,4-furan tetracarboxylic acid dianhydride, ... 4,4'-bis(3,4-dicarboxyphenoxy)diphenyl sulfide dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenyl sulfone dianhydride, 4,4'-bis(3,4-dicarboxyphenoxy)diphenylpropane dianhydride, 3,3',4,4'-perfluoroisopropylidenediphthalic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, bis(phthalic acid)phenylphosphine oxide dianhydride, p-phenylene-bis(triphenylphthalic acid) dianhydride, m-phenylene-bis(triphenylphthalic acid) dianhydride, bis(triphenylphthalic acid)-4,4'-diphenyl ether dianhydride, bis(triphenylphthalic acid)-4,4'-diphenylmethane dianhydride, 9,9-bis(3,4-dicarboxyphenyl)fluorene dianhydride, 9,9-bis[4-(3,4-dicarbo. xyphenoxy)phenyl]fluorene dianhydride, 3,4-dicarboxy-1,2,3, Examples thereof include 4-tetrahydro-1-naphthalene succinic dianhydride and 3,4-dicarboxy-1,2,3,4-tetrahydro-6-methyl-1-naphthalene succinic dianhydride.

[0096] Ar 1 Specific examples of the aromatic carboxyl group-containing group represented by formula (Ar-1) include Examples of the groups include a group represented by the formula (Ar-1), a group represented by the formula (Ar-2), and a group represented by the formula (Ar-3).

[0097] [ka]

[0098] In formula (Ar-1), n1 represents an integer of 1 to 4, preferably an integer of 1 or 2, and more preferably 2. In formula (Ar-2), n2 represents an integer of 1 to 8, preferably an integer of 1 to 4, more preferably 1 or 2, and further preferably 2. In formula (Ar-3), n3 and n4 each independently represent an integer of 0 to 4, and are preferably an integer of 0 to 2, more preferably 1 or 2, and further preferably 1. However, at least one of n3 and n4 is an integer of 1 or greater. In formula (Ac-3), Q 1 represents a single bond, -O-, -CO-, -COOCH2CH2OCO-, -SO2-, -C(CF3)2-, a group represented by the above formula (Q-1) or a group represented by the above formula (Q-2).

[0099] In formula (b-1), L 1 represents -COO- or -CONH-, and preferably represents -COO-.

[0100] In formula (b-1), L 2 Examples of the divalent linking group represented by include an alkylene group, an arylene group, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and a group combining two or more of these. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 15. The alkylene group may be linear, branched, or cyclic. The number of carbon atoms in the arylene group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 10. The alkylene group and the arylene group may have a substituent. Examples of the substituent include a hydroxy group. L 2 The divalent linking group represented by is -OL 2aIt is preferable that L is a group represented by -O-. 2a Examples of the alkylene group include an alkylene group; an arylene group; a group obtained by combining an alkylene group with an arylene group; and a group obtained by combining at least one selected from an alkylene group and an arylene group with at least one selected from the group consisting of -O-, -CO-, -COO-, -OCO-, -NH-, and -S-. The number of carbon atoms in the alkylene group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 15. The alkylene group may be linear, branched, or cyclic. The alkylene group and the arylene group may have a substituent. Examples of the substituent include a hydroxyl group.

[0101] Next, formula (b-10) will be described. In formula (b-10), Ar 10 The aromatic carboxyl group-containing group represented by the formula (b-1) is Ar 1 The same definition and preferred range are also the same.

[0102] In formula (b-10), L 11 represents -COO- or -CONH-, and preferably represents -COO-.

[0103] In formula (b-10), L 12 Examples of the trivalent linking group represented by include a hydrocarbon group, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and a group combining two or more of these. Examples of the hydrocarbon group include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 15. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The number of carbon atoms in the aromatic hydrocarbon group is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 10. The hydrocarbon group may have a substituent. Examples of the substituent include a hydroxy group. L 12 The trivalent linking group represented by is preferably a group represented by the following formula (L12-1), and more preferably a group represented by formula (L12-2).

[0104] [ka]

[0105] L 12a and L 12b each independently represents a trivalent linking group; X 1 represents S, and *1 represents L in formula (b-10). 11 *2 represents the bond position with P in formula (b-10). 10 represents the bonding position with

[0106] L 12a and L 12b Examples of the trivalent linking group represented by the formula (I) include a hydrocarbon group; and a group formed by combining a hydrocarbon group with at least one selected from the group consisting of -O-, -CO-, -COO-, -OCO-, -NH-, and -S-.

[0107] In formula (b-10), P 10 represents a polymer chain. P 10 The polymer chain represented by the formula (I) preferably has at least one repeating unit selected from a poly(meth)acrylic repeating unit, a polyether repeating unit, a polyester repeating unit, and a polyol repeating unit. 10 The weight average molecular weight of is preferably 500 to 20,000. The lower limit is more preferably 500 or more, and particularly preferably 1,000 or more. The upper limit is more preferably 10,000 or less, further preferably 5,000 or less, and particularly preferably 3,000 or less. 10 If the weight average molecular weight is within the above range, the pigment has good dispersibility in the composition. When the resin B is a resin having a repeating unit represented by formula (b-10), the resin B is preferably used as a dispersant.

[0108] In formula (b-10), P 10 The polymer chain represented by formula (P-1) is preferably a polymer chain containing repeating units represented by formula (P-1) to formula (P-5) below, and more preferably a polymer chain containing a repeating unit represented by formula (P-5).

[0109] [ka]

[0110] In the above formula, R P1 and R P2 Each of R represents an alkylene group. P1 and R P2 The alkylene group represented by the formula (I) is preferably a linear or branched alkylene group having 1 to 20 carbon atoms, more preferably a linear or branched alkylene group having 2 to 16 carbon atoms, and even more preferably a linear or branched alkylene group having 3 to 12 carbon atoms. In the above formula, R P3 represents a hydrogen atom or a methyl group. In the above formula, L P1 represents a single bond or an arylene group; L P2 represents a single bond or a divalent linking group. P1 is preferably a single bond. P2 Examples of the divalent linking group represented by the formula (I) include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), -NH-, -SO-, -SO2-, -CO-, -O-, -COO-, -OCO-, -S-, -NHCO-, -CONH-, and groups formed by combining two or more of these. R P4represents a hydrogen atom or a substituent. Examples of the substituent include a hydroxyl group, a carboxyl group, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthioether group, an arylthioether group, a heteroarylthioether group, a (meth)acryloyl group, an oxetanyl group, and a blocked isocyanate group. In the present disclosure, the blocked isocyanate group is a group capable of generating an isocyanate group by heat, and a preferred example of the blocked isocyanate group is a group in which a blocking agent and an isocyanate group are reacted to protect the isocyanate group. Examples of the blocking agent include an oxime compound, a lactam compound, a phenol compound, an alcohol compound, an amine compound, an active methylene compound, a pyrazole compound, a mercaptan compound, an imidazole compound, and an imide compound. Examples of the blocking agent include the compounds described in paragraphs 0115 to 0117 of JP 2017-067930 A, the contents of which are incorporated herein by reference. Moreover, the blocked isocyanate group is preferably a group capable of generating an isocyanate group by heat at 90°C to 260°C.

[0111] P 10 The polymer chain represented by the formula (I) preferably has at least one group selected from the group consisting of a (meth)acryloyl group, an oxetanyl group, a blocked isocyanate group, and a t-butyl group (hereinafter also referred to as "functional group A"). It is more preferable that the functional group A is at least one group selected from the group consisting of a (meth)acryloyl group, an oxetanyl group, and a blocked isocyanate group. When the polymer chain contains the functional group A, it is easy to form a film having excellent solvent resistance. In particular, when the polymer chain contains at least one group selected from a (meth)acryloyl group, an oxetanyl group, and a blocked isocyanate group, the above effect is remarkable. In addition, the functional group When A has a t-butyl group, it is preferable to include a compound having an epoxy group or an oxetanyl group in the composition.When the functional group A has a blocked isocyanate group, it is preferable to include a compound having a hydroxy group in the composition.

[0112] Also, P10 The polymer chain represented by P is more preferably a polymer chain having a repeating unit containing the functional group A in the side chain. 10 The proportion of repeating units containing the functional group A in the side chain among all repeating units constituting the polymer is preferably 5% by mass or more, more preferably 10% by mass or more, and even more preferably 20% by mass or more. The upper limit can be set to 100% by mass, and is preferably 90% by mass or less, and more preferably 60% by mass or less.

[0113] Also, P 10 It is also preferable that the polymer chain represented by has a repeating unit containing an acid group. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. According to this embodiment, the dispersibility of the pigment in the composition can be further improved. Furthermore, the developability can also be further improved. The proportion of the repeating unit containing an acid group is preferably 1% by mass to 30% by mass, more preferably 2% by mass to 20% by mass, and even more preferably 3% by mass to 10% by mass.

[0114] Resin B can be produced by reacting at least one acid anhydride selected from the group consisting of aromatic tetracarboxylic anhydrides and aromatic tricarboxylic anhydrides with a hydroxyl group-containing compound. Examples of aromatic tetracarboxylic anhydrides and aromatic tricarboxylic anhydrides include those mentioned above. The hydroxyl group-containing compound is not particularly limited as long as it has a hydroxyl group in the molecule, but is preferably a polyol having two or more hydroxyl groups in the molecule. It is also preferable to use a compound having two hydroxyl groups and one thiol group in the molecule as the hydroxyl group-containing compound. Examples of compounds having two hydroxyl groups and one thiol group in the molecule include 1-mercapto-1,1-methanediol, 1-mercapto-1,1-ethanediol, 3-mercapto-1,2-propanediol (thioglycerin), 2-mercapto-1,2-propanediol, 2-mercapto-2-methyl-1,3-propanediol, 2-mercapto-2-ethyl-1,3-propanediol, 1-mercapto-2,2-propanediol, 2-mercaptoethyl-2-methyl-1,3-propanediol, or 2-mercaptoethyl-2-ethyl-1,3-propanediol. Other hydroxyl group-containing compounds include those described in paragraphs 0084 to 0095 of JP 2018-101039 A, the contents of which are incorporated herein by reference.

[0115] The molar ratio of the acid anhydride group in the acid anhydride to the hydroxy group in the hydroxy group-containing compound (acid anhydride group / hydroxy group) is preferably 0.5 to 1.5.

[0116] Moreover, the resin containing the repeating unit represented by the above formula (b-10) can be synthesized by the following synthesis methods (1) and (2), or the like.

[0117] [Synthesis method (1)] This method comprises the steps of: radically polymerizing a polymerizable monomer having an ethylenically unsaturated group in the presence of a hydroxyl group-containing thiol compound (preferably a compound having two hydroxyl groups and one thiol group in the molecule) to synthesize a vinyl polymer having two hydroxyl groups at one terminal region; and reacting this synthesized vinyl polymer with one or more aromatic acid anhydrides selected from the group consisting of aromatic tetracarboxylic acid anhydrides and aromatic tricarboxylic acid anhydrides.

[0118] [Synthesis method (2)] Hydroxy group-containing compound (preferably containing two hydroxy groups and one thiol group in the molecule) (a compound having the above formula (I)) is reacted with one or more aromatic acid anhydrides selected from the group consisting of aromatic tetracarboxylic acid anhydrides and aromatic tricarboxylic acid anhydrides, and then, in the presence of the resulting reactant, a polymerizable monomer having an ethylenically unsaturated group is radically polymerized. In the synthesis method (2), after the polymerizable monomer having a hydroxyl group is radically polymerized, it may be further reacted with a compound having an isocyanate group (for example, a compound having an isocyanate group and the above-mentioned functional group A). ​​This produces a polymer chain P 10 A functional group A can be introduced into

[0119] Resin B can also be synthesized according to the method described in paragraphs 0120 to 0138 of JP2018-101039A.

[0120] The weight average molecular weight of resin B is preferably 2,000 to 35,000. The upper limit is more preferably 25,000 or less, even more preferably 20,000 or less, and particularly preferably 15,000 or less. The lower limit is more preferably 4,000 or more, even more preferably 6,000 or more, and particularly preferably 7,000 or more. When the weight average molecular weight of resin B is within the above range, the effects of the present disclosure can be more significantly obtained. In addition, the storage stability of the colored photosensitive composition can be improved.

[0121] Dispersants are also available as commercially available products, and specific examples thereof include the DISPERBYK series (e.g., DISPERBYK-111, 161, etc.) manufactured by BYKChemie and the Solsperse series (e.g., Solsperse 76500, etc.) manufactured by Lubrizol Japan Co., Ltd. In addition, pigment dispersants described in paragraphs 0041 to 0130 of JP-A-2014-130338 can also be used, the contents of which are incorporated herein by reference. The resins described as dispersants above can also be used for purposes other than dispersants. For example, they can also be used as binders.

[0122] In the colored photosensitive composition according to the present disclosure, only one type of resin may be used, or two or more types may be used in combination. When two or more types are used in combination, the total amount thereof is preferably within the following range. From the viewpoints of suppression of development residues, dispersion stability, and adhesion, the content of the resin is preferably from 5% by mass to 40% by mass, more preferably from 10% by mass to 30% by mass, and particularly preferably from 10% by mass to 25% by mass, based on the total solid content of the colored photosensitive composition.

[0123] <Pigment derivatives> The colored photosensitive composition according to the present disclosure may contain a pigment derivative. Examples of the pigment derivative include compounds having a structure in which a portion of the chromophore is substituted with an acid group or a basic group. Examples of the chromophore constituting the pigment derivative include a quinoline skeleton, a benzimidazolone skeleton, a diketopyrrolopyrrole skeleton, an azo skeleton, a phthalocyanine skeleton, an anthraquinone skeleton, a quinacridone skeleton, a dioxazine skeleton, a perinone skeleton, a perylene skeleton, a thioindigo skeleton, an isoindoline skeleton, an isoindolinone skeleton, a quinophthalone skeleton, a threne skeleton, and a metal complex skeleton. Among these, a quinoline skeleton, a benzimidazolone skeleton, a diketopyrrolopyrrole skeleton, an azo skeleton, a quinophthalone skeleton, an isoindoline skeleton, and a phthalocyanine skeleton are preferred, and an azo skeleton and a benzimidazolone skeleton are more preferred. Examples of the acid group include a sulfo group, a carboxy group, a phosphate group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li + , Na + , K + etc.), alkaline earth metal ions Ca 2+ , Mg 2+ Examples of the basic group include an amino group, a pyridinyl group and its salts, an ammonium group salt, and a phthalimidomethyl group. Examples of the atom or atomic group that constitutes the salt include a hydroxide ion, a halogen ion, and a carboxylate ion. , sulfonate ion, and phenoxide ion.

[0124] As the pigment derivative, a pigment derivative with excellent visible transparency (hereinafter also referred to as a transparent pigment derivative) can be used. The maximum molar absorption coefficient (εmax) of the transparent pigment derivative in the wavelength range of 400 nm to 700 nm is 3,000 L·mol -1 ·cm -1 It is preferable that the concentration is less than 1,000 L·mol -1 ·cm -1 It is more preferable that it is less than 100 L·mol -1 ·cm -1 The lower limit of εmax is, for example, 1 L mol -1 ·cm-1 is greater than or equal to 10 L mol -1 ·cm -1 More than that is fine.

[0125] Specific examples of pigment derivatives include those described in JP-A-56-118462, JP-A-63-264674, JP-A-01-217077, JP-A-03-009961, JP-A-03-026767, JP-A-03-153780, JP-A-03-045662, JP-A-04-285669, JP-A-06-145546, JP-A-06-212088, JP-A-06-240158, JP-A-10-030063, JP-A-10-195326, paragraphs 0086 to 0098 of International Publication No. 2011 / 024896, and the like. Examples of the compounds described in paragraphs 0063 to 0094 of International Publication No. 2012 / 102399, paragraph 0082 of International Publication No. 2017 / 038252, paragraph 0171 of JP 2015-151530 A, paragraphs 0162 to 0183 of JP 2011-252065 A, JP 2003-081972 A, Japanese Patent No. 5299151 A, JP 2015-172732 A, JP 2014-199308 A, JP 2014-085562 A, JP 2014-035351 A, JP 2008-081565 A, and JP 2019-109512 A are mentioned.

[0126] The colored photosensitive composition according to the present disclosure may contain one type of pigment derivative alone, or may contain two or more types of pigment derivatives. The content of the pigment derivative is preferably 1 to 30 parts by mass, and more preferably 3 to 20 parts by mass, relative to 100 parts by mass of the pigment. Only one type of pigment derivative may be used, or two or more types may be used in combination.

[0127] <Photopolymerization initiator> The colored photosensitive composition according to the present disclosure contains a photopolymerization initiator. In particular, when the colored photosensitive composition according to the present disclosure contains a polymerizable compound, it is preferable that the colored photosensitive composition according to the present disclosure further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light rays in the ultraviolet region to the visible light region is preferable. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0128] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a compound selected from the group consisting of trihalomethyltriazine compounds, benzyldimethylketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, triarylimidazole dimers, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyloxadiazole compounds, and 3-aryl-substituted coumarin compounds, and is preferably a compound selected from the group consisting of oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds, and acylphosphine compounds. It is more preferable that it is an oxime compound, that is, an oxime-based photopolymerization initiator. In addition, as the photopolymerization initiator, the compounds described in paragraphs 0065 to 0111 of JP 2014-130173 A and JP Patent No. 6301489 A, the peroxide-based photopolymerization initiator described in MATERIAL STAGE 37 to 60p, vol. 19, No. 3, 2019, the photopolymerization initiator described in WO 2018 / 221177 A, the photopolymerization initiator described in WO 2018 / 110179 A, ​​the photopolymerization initiator described in JP 2019-043864 A, the photopolymerization initiator described in JP 2019-044030 A, and the organic peroxide described in JP 2019-167313 A can be mentioned, the contents of which are incorporated herein.

[0129] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (manufactured by IGM Resins BV), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (manufactured by BASF), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (manufactured by IGM Resins BV), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (both manufactured by IGM Resins BV), Irgacure 819, Irgacure TPO (both manufactured by BASF), and the like.

[0130] Examples of the oxime compound include compounds described in JP-A-2001-233842, compounds described in JP-A-2000-080068, compounds described in JP-A-2006-342166, compounds described in J.C.S. Perkin II (1979, pp. 1653-1660), compounds described in J.C.S. Perkin II (1979, pp. 156-162), and compounds described in Journal of Photopolymer Science. and Technology (1995, pp. 202-232), compounds described in JP-A-2000-066385, compounds described in JP-A-2000-080068, compounds described in JP-T-2004-534797, compounds described in JP-A-2006-342166, compounds described in JP-A-2017-019766, compounds described in Japanese Patent No. 6065596, compounds described in WO 2015 / 152153, compounds described in WO 2017 / 051680, compounds described in JP-A-2017-198865, compounds described in paragraphs 0025 to 0038 of WO 2017 / 164127, compounds described in WO 2013 / 167515, and the like. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, and 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one. Examples of commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (all manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Strong Electronic New Materials Co., Ltd.), and Adeka Optomer N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP 2012-014052 A). In addition, it is also preferable to use a compound that is not colorable or a compound that is highly transparent and does not easily discolor as the oxime compound. Examples of commercially available products include Adeka Arcles NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA Corporation).

[0131] As the photopolymerization initiator, an oxime compound having a fluorene ring can also be used. Specific examples of the oxime compound having a fluorene ring include the compounds described in JP2014-137466A.

[0132] As the photopolymerization initiator, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring can also be used. Specific examples of such oxime compounds include the compounds described in WO 2013 / 083505.

[0133] As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include the compounds described in JP-A-2010-262028, compounds 24, 36 to 40 described in JP-A-2014-500852, and compound (C-3) described in JP-A-2013-164471.

[0134] As the photopolymerization initiator, an oxime compound having a nitro group can be used. It is also preferable that the oxime compound having a nitro group is a dimer. Specific examples of the oxime compound having a nitro group include the compounds described in paragraphs 0031 to 0047 of JP 2013-114249 A, paragraphs 0008 to 0012, and 0070 to 0079 of JP 2014-137466 A, the compounds described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071 A, and Adeka Arcles NCI-831 (manufactured by ADEKA Corporation).

[0135] As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in WO 2015 / 036910.

[0136] As the photopolymerization initiator, an oxime compound in which a substituent having a hydroxyl group is bonded to a carbazole skeleton can also be used. Examples of such photopolymerization initiators include the compounds described in WO 2019 / 088055.

[0137] Specific examples of oxime compounds preferably used in the present disclosure are shown below, but the present disclosure is not limited thereto.

[0138] [ka]

[0139] [ka]

[0140] The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 nm to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 nm to 480 nm. From the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1,000 to 300,000, even more preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, a spectrophotometer (Varian Cary-5 spec It is preferable to measure the concentration of ethyl acetate at 0.01 g / L using a trophotometer.

[0141] As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, so that good sensitivity can be obtained. In addition, when a compound with an asymmetric structure is used, the crystallinity is reduced and the solubility in a solvent or the like is improved, so that precipitation is less likely to occur over time, and the stability over time of the colored photosensitive composition can be improved. Specific examples of bifunctional or trifunctional or higher functional photoradical polymerization initiators include dimers of oxime compounds described in JP-T-2010-527339, JP-T-2011-524436, WO-2015 / 004565, paragraphs 0407 to 0412 of JP-T-2016-532675, and paragraphs 0039 to 0055 of WO-2017 / 033680; compounds (E) and (G) described in JP-T-2013-522445; Examples of the photoinitiator include Cmpd1 to 7 described in JP 2016 / 034963 A, the oxime ester photoinitiator described in paragraph 0007 of JP 2017-523465 A, the photoinitiator described in paragraphs 0020 to 0033 of JP 2017-167399 A, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of JP 2017-151342 A, and the oxime ester photoinitiator described in Japanese Patent No. 6,469,669 A.

[0142] When the colored photosensitive composition according to the present disclosure contains a photopolymerization initiator, the content of the photopolymerization initiator in the total solid content of the colored photosensitive composition is preferably 0.1% by mass to 30% by mass. The lower limit is more preferably 0.5% by mass or more, and particularly preferably 1% by mass or more. The upper limit is more preferably 20% by mass or less, and particularly preferably 15% by mass or less. In the colored photosensitive composition according to the present disclosure, only one type of photopolymerization initiator may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0143] <Polymerizable compound> The colored photosensitive composition according to the present disclosure preferably contains a polymerizable compound. As the polymerizable compound, a known compound capable of being crosslinked by a radical, an acid, or heat can be used. In the present disclosure, the polymerizable compound is preferably, for example, a compound having an ethylenically unsaturated group. Examples of the ethylenically unsaturated group include a vinyl group, a (meth)allyl group, and a (meth)acryloyl group. The polymerizable compound used in the present disclosure is preferably a radically polymerizable compound.

[0144] The polymerizable compound may be in any chemical form such as a monomer, a prepolymer, or an oligomer, but is preferably a monomer. The molecular weight of the polymerizable compound is preferably 100 to 3,000. The upper limit is more preferably 2,000 or less, and even more preferably 1,500 or less. The lower limit is more preferably 150 or more, and even more preferably 250 or more.

[0145] The polymerizable compound is preferably a compound containing 3 or more ethylenically unsaturated groups, more preferably a compound containing 3 to 15 ethylenically unsaturated groups, and even more preferably a compound containing 3 to 6 ethylenically unsaturated groups. The polymerizable compound is preferably a trifunctional to 15-functional (meth)acrylate compound, and more preferably a trifunctional to 6-functional (meth)acrylate compound. Specific examples of the polymerizable compound include compounds described in paragraphs

[0095] to

[0108] of JP 2009-288705 A, paragraph

[0227] of JP 2013-029760 A, paragraph

[0254] to

[0257] of JP 2008-292970 A, paragraph

[0034] to

[0038] of JP 2013-253224 A, paragraph

[0477] of JP 2012-208494 A, JP 2017-048367 A, Japanese Patent No. 6057891 A, and Japanese Patent No. 6031807 A. The contents of which are incorporated herein.

[0146] Preferred polymerizable compounds include dipentaerythritol triacrylate (commercially available product: KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (commercially available product: KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds having a structure in which these (meth)acryloyl groups are bonded via ethylene glycol and / or propylene glycol residues (e.g., SR454 and SR499, commercially available from Sartomer). In addition, examples of the polymerizable compound that can be used include diglycerol EO (ethylene oxide) modified (meth)acrylate (commercially available product is M-460; manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., NK Ester A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), and light acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.).

[0147] As the polymerizable compound, it is also preferable to use a trifunctional (meth)acrylate compound such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propyleneoxy-modified tri(meth)acrylate, trimethylolpropane ethyleneoxy-modified tri(meth)acrylate, isocyanuric acid ethyleneoxy-modified tri(meth)acrylate, or pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

[0148] As the polymerizable compound, a polymerizable compound having an acid group can also be used. By using a polymerizable compound having an acid group, the colored photosensitive composition in the unexposed area can be easily removed during development, and the generation of development residues can be suppressed. Examples of the acid group include a carboxy group, a sulfo group, and a phosphate group, and a carboxy group is preferred. Examples of commercially available polymerizable compounds having an acid group include ARONIX M-510, M-520, and ARONIX TO-2349 (manufactured by Toagosei Co., Ltd.). The preferred acid value of the polymerizable compound having an acid group is 0.1 mgKOH / g to 40 mgKOH / g, and more preferably 5 mgKOH / g to 30 mgKOH / g. If the acid value of the polymerizable compound is 0.1 mgKOH / g or more, the solubility in the developer is good, and if it is 40 mgKOH / g or less, it is advantageous in terms of production and handling.

[0149] As the polymerizable compound, a polymerizable compound having a caprolactone structure can also be used. Polymerizable compounds having a caprolactone structure are commercially available as the KAYARAD DPCA series from Nippon Kayaku Co., Ltd., and examples thereof include DPCA-20, DPCA-30, DPCA-60, and DPCA-120.

[0150] As the polymerizable compound, a polymerizable compound having an alkyleneoxy group can also be used. The polymerizable compound having an alkyleneoxy group is an ethyleneoxy group and / or a propyleneoxy group. A polymerizable compound having an alkyleneoxy group is preferred, a polymerizable compound having an ethyleneoxy group is more preferred, and a trifunctional to hexafunctional (meth)acrylate compound having 4 to 20 ethyleneoxy groups is even more preferred. Commercially available polymerizable compounds having an alkyleneoxy group include, for example, SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer Corporation, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups.

[0151] As the polymerizable compound, a polymerizable compound having a fluorene skeleton can also be used. Commercially available polymerizable compounds having a fluorene skeleton include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0152] It is also preferable to use a polymerizable compound that does not substantially contain environmentally regulated substances such as toluene. Examples of commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

[0153] As the polymerizable compound, it is also preferable to use urethane acrylates described in JP-B-48-041708, JP-A-51-037193, JP-B-02-032293, and JP-B-02-016765, urethane compounds having an ethylene oxide skeleton described in JP-B-58-049860, JP-B-56-017654, JP-B-62-039417, and JP-B-62-039418, and polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-01-105238. In addition, commercially available products such as UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, and LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.) can also be used as the polymerizable compound.

[0154] When the colored photosensitive composition according to the present disclosure contains a polymerizable compound, the content of the polymerizable compound in the total solid content of the colored photosensitive composition is preferably 0.1% by mass to 50% by mass. The lower limit is more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is more preferably 45% by mass or less, and even more preferably 40% by mass or less.

[0155] The total content of the polymerizable compound and the resin in the total solid content of the colored photosensitive composition is preferably 10% by mass to 65% by mass from the viewpoints of curability, developability and film formability. The lower limit is more preferably 15% by mass or more, even more preferably 20% by mass or more, and particularly preferably 30% by mass or more. The upper limit is more preferably 60% by mass or less, even more preferably 50% by mass or less, and particularly preferably 40% by mass or less. It is preferable that the resin is contained in an amount of 30 parts by mass to 300 parts by mass per 100 parts by mass of the polymerizable compound. The lower limit is more preferably 50 parts by mass or more, and particularly preferably 80 parts by mass or more. The upper limit is more preferably 250 parts by mass or less, and particularly preferably 200 parts by mass or less.

[0156] In the colored photosensitive composition according to the present disclosure, the polymerizable compound may be used alone or in combination with two or more kinds. When two or more kinds are used, the total amount thereof is preferably within the above range.

[0157] <Compounds having a cyclic ether group> The colored photosensitive composition according to the present disclosure may contain a compound having a cyclic ether group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. The compound having a cyclic ether group is preferably a compound having an epoxy group. Examples of the compound having a group include a compound having one or more epoxy groups in one molecule, and a compound having two or more epoxy groups is preferred. The number of epoxy groups is preferably 1 to 100 in one molecule. The upper limit of the epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the epoxy groups is preferably 2 or more. As the compound having an epoxy group, the compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, paragraphs 0147 to 0156 of JP-A-2014-043556, paragraphs 0085 to 0092 of JP-A-2014-089408, and the compounds described in JP-A-2017-179172 can also be used. The contents of these are incorporated herein by reference.

[0158] The compound having an epoxy group may be either a low molecular weight compound (e.g., a molecular weight of less than 2,000, or even less than 1,000) or a high molecular weight compound (macromolecule) (e.g., a molecular weight of 1,000 or more, and in the case of a polymer, a weight average molecular weight of 1,000 or more). The weight average molecular weight of the compound having an epoxy group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is more preferably 10,000 or less, particularly preferably 5,000 or less, and most preferably 3,000 or less.

[0159] As the compound having an epoxy group, an epoxy resin can be preferably used. Examples of the epoxy resin include an epoxy resin which is a glycidyl ether of a phenolic compound, an epoxy resin which is a glycidyl ether of various novolac resins, an alicyclic epoxy resin, an aliphatic epoxy resin, a heterocyclic epoxy resin, a glycidyl ester epoxy resin, a glycidyl amine epoxy resin, an epoxy resin obtained by glycidylating halogenated phenols, a condensate of a silicon compound having an epoxy group and another silicon compound, a copolymer of a polymerizable unsaturated compound having an epoxy group and another polymerizable unsaturated compound, and the like. The epoxy equivalent of the epoxy resin is preferably 310g / eq to 3,300g / eq, more preferably 310g / eq to 1,700g / eq, and even more preferably 310g / eq to 1,000g / eq.

[0160] Examples of commercially available compounds having a cyclic ether group include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (all manufactured by NOF Corporation, epoxy group-containing polymers).

[0161] When the colored photosensitive composition according to the present disclosure contains a compound having a cyclic ether group, the content of the compound having a cyclic ether group in the total solid content of the colored photosensitive composition is preferably 0.1% by mass to 20% by mass. The lower limit is more preferably 0.5% by mass or more, and particularly preferably 1% by mass or more. The upper limit is more preferably 15% by mass or less, and particularly preferably 10% by mass or less. In the colored photosensitive composition according to the present disclosure, only one type of compound having a cyclic ether group may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0162] <Silane coupling agent> The colored photosensitive composition according to the present disclosure may contain a silane coupling agent. According to this embodiment, the adhesion of the obtained film to the support can be further improved. In the present disclosure, the silane coupling agent means a silane compound having a hydrolyzable group and other functional groups. The hydrolyzable group means a substituent that is directly bonded to a silicon atom and can generate a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group. Alkoxy group is preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, as the functional group other than the hydrolyzable group, for example, vinyl group, (meth)allyl group, (meth)acryloyl group, mercapto group, epoxy group, oxetanyl group, amino group, ureido group, sulfide group, isocyanate group, phenyl group, etc. are included, and amino group, (meth)acryloyl group and epoxy group are preferred. Specific examples of the silane coupling agent include N-β-aminoethyl-γ-aminopropylmethyldimethoxysilane (Shin-Etsu Chemical Co., Ltd., trade name KBM-602), N-β-aminoethyl-γ-aminopropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., trade name KBM-603), N-β-aminoethyl-γ-aminopropyltriethoxysilane (Shin-Etsu Chemical Co., Ltd., trade name KBE-602), γ-aminopropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., trade name KBM-903), γ-aminopropyltriethoxysilane (Shin-Etsu Chemical Co., Ltd., trade name KBE-903), 3-methacryloxypropylmethyldimethoxysilane (Shin-Etsu Chemical Co., Ltd., trade name KBM-502), and 3-methacryloxypropyltrimethoxysilane (Shin-Etsu Chemical Co., Ltd., trade name KBM-503). Specific examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of JP-A No. 2009-288703 and the compounds described in paragraphs 0056 to 0066 of JP-A No. 2009-242604, the contents of which are incorporated herein by reference.

[0163] When the colored photosensitive composition according to the present disclosure contains a silane coupling agent, the content of the silane coupling agent in the total solid content of the colored photosensitive composition is preferably 0.1% by mass to 5% by mass. The upper limit is more preferably 3% by mass or less, and particularly preferably 2% by mass or less. The lower limit is more preferably 0.5% by mass or more, and particularly preferably 1% by mass or more. In the colored photosensitive composition according to the present disclosure, only one type of silane coupling agent may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0164] <Organic solvent> The colored photosensitive composition according to the present disclosure preferably contains an organic solvent. Examples of the organic solvent include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. For details, see paragraph 0223 of International Publication No. 2015 / 166779, the contents of which are incorporated herein by reference. In addition, ester-based solvents substituted with a cyclic alkyl group and ketone-based solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, etc. However, aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents may be reduced for environmental reasons (for example, the amount of the organic solvent may be 50 mass ppm (parts per million) or less, 10 mass ppm or less, or 1 mass ppm or less).

[0165] In the present disclosure, it is preferable to use an organic solvent with a low metal content, and the metal content of the organic solvent is preferably 10 mass ppb (parts per billion) or less, for example. If necessary, an organic solvent with a mass ppt (parts per trillion) level may be used, and such an organic solvent is provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0166] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter. The filter used for filtration has a filter pore size of preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0167] The organic solvent may contain isomers (compounds having the same number of atoms but different structures). In addition, the organic solvent may contain only one type of isomer or multiple types of isomers.

[0168] In the present disclosure, the peroxide content in the organic solvent is preferably 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0169] The content of the organic solvent in the colored photosensitive composition is preferably from 10 to 95% by mass, more preferably from 20 to 90% by mass, and even more preferably from 30 to 90% by mass.

[0170] In addition, from the viewpoint of environmental regulations, it is preferable that the colored photosensitive composition according to the present disclosure is substantially free of environmentally restricted substances. In the present disclosure, "substantially free of environmentally restricted substances" means that the content of environmentally restricted substances in the colored photosensitive composition is 50 mass ppm or less, preferably 30 mass ppm or less, more preferably 10 mass ppm or less, and particularly preferably 1 mass ppm or less. Examples of environmentally restricted substances include benzene; alkylbenzenes such as toluene and xylene; and halogenated benzenes such as chlorobenzene. These are listed in the REACH (Registration Evaluation Authorization and Restriction of CHemicals) regulations, PRTR (Pollutant Release and The substances are registered as environmentally regulated substances under the Transfer Register (EPA) Act, Volatile Organic Compounds (VOC) regulations, etc., and the amount of use and the handling method are strictly regulated. These compounds may be used as solvents when producing each component used in the colored photosensitive composition according to the present disclosure, and may be mixed into the colored photosensitive composition as a residual solvent. It is preferable to reduce these substances as much as possible from the viewpoint of human safety and environmental consideration. Examples of methods for reducing environmentally regulated substances include a method in which the system is heated or depressurized to a temperature above the boiling point of the environmentally regulated substance, and the environmentally regulated substance is distilled off from the system to reduce the amount. In addition, when a small amount of environmentally regulated substance is distilled off, it is also useful to perform azeotropy with a solvent having a boiling point equivalent to the corresponding solvent in order to increase efficiency. In addition, when a compound having radical polymerizability is contained, a polymerization inhibitor or the like may be added and distilled off under reduced pressure in order to suppress crosslinking between molecules caused by the progress of a radical polymerization reaction during distillation under reduced pressure. These distillation methods can be used at any stage, such as the stage of the raw materials, the stage of the product obtained by reacting the raw materials (for example, a resin solution or a polyfunctional monomer solution after polymerization), or the stage of a colored photosensitive composition prepared by mixing these compounds.

[0171] From the viewpoint of environmental regulations, the use of perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt may be restricted. In the photosensitive composition according to the present disclosure, when the content of the above-mentioned compounds is reduced, the content of perfluoroalkylsulfonic acid (particularly perfluoroalkylsulfonic acid having a perfluoroalkyl group with 6 to 8 carbon atoms) and its salt, and perfluoroalkylcarboxylic acid (particularly perfluoroalkylcarboxylic acid having a perfluoroalkyl group with 6 to 8 carbon atoms) and its salt is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, based on the total solid content of the photosensitive composition. The photosensitive composition according to the present disclosure implements perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt. It may not be qualitatively contained. For example, a photosensitive composition that is substantially free of perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt may be selected by using a compound that can be a substitute for perfluoroalkylsulfonic acid and its salt, and a compound that can be a substitute for perfluoroalkylcarboxylic acid and its salt. Examples of compounds that can be a substitute for regulated compounds include compounds that are excluded from the scope of regulation due to the difference in the number of carbon atoms in the perfluoroalkyl group. However, the above content does not prevent the use of perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt. The photosensitive composition according to the present disclosure may contain perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt within the maximum allowable range.

[0172] <Polymerization inhibitor> The colored photosensitive composition according to the present disclosure may contain a polymerization inhibitor. Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.). Among these, p-methoxyphenol is preferred. The content of the polymerization inhibitor in the total solid content of the colored photosensitive composition is preferably 0.0001% by mass to 5% by mass.

[0173] <Surfactant> The colored photosensitive composition according to the present disclosure may contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone surfactants may be used. As the surfactant, the surfactants described in paragraphs 0238 to 0245 of WO 2015 / 166779 may be mentioned, the contents of which are incorporated herein by reference.

[0174] In the present disclosure, the surfactant is preferably a fluorosurfactant. By including a fluorosurfactant in the colored photosensitive composition, the liquid properties (particularly, fluidity) can be further improved, and the liquid saving property can be further improved. In addition, a film with less unevenness in thickness can be formed.

[0175] The fluorine content in the fluorine-based surfactant is preferably 3% by mass to 40% by mass, more preferably 5% by mass to 30% by mass, and particularly preferably 7% by mass to 25% by mass. A fluorine-based surfactant having a fluorine content within this range is effective in terms of uniformity of the thickness of the coating film and liquid saving, and also has good solubility in the colored photosensitive composition.

[0176] Examples of fluorine-based surfactants include those described in paragraphs

[0060] to

[0064] of JP2014-041318A (corresponding to paragraphs

[0060] to

[0064] of WO2014 / 017669), and those described in paragraphs

[0117] to

[0132] of JP2011-132503A, the contents of which are incorporated herein by reference. Commercially available fluorine-based surfactants include, for example, Megafac F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, EXP, and MFS-330 (all manufactured by DIC Corporation), Fluorad FC430, FC431, and FC171 (all manufactured by Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, and KH-40 (all manufactured by AGC Corporation), and PolyFox. Examples include PF636, PF656, PF6320, PF6520, and PF7002 (all manufactured by OMNOVA).

[0177] In addition, the fluorosurfactant may be an acrylic compound that has a molecular structure with a functional group containing a fluorine atom, and when heat is applied, the functional group containing the fluorine atom is broken and the fluorine atom volatilizes. Examples of such fluorosurfactants include the Megafac DS series manufactured by DIC Corporation (The Chemical Daily (February 22, 2016), Nikkei Business Daily (February 23, 2016)), such as Megafac DS-21.

[0178] In addition, it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorine-based surfactant. For such a fluorine-based surfactant, the description in JP 2016-216602 A can be referred to, and the contents of this specification are incorporated herein.

[0179] The fluorosurfactant may be a block polymer. For example, the compounds described in JP-A-2011-089090 may be mentioned. As the fluorosurfactant, a fluorine-containing polymer compound containing a repeating unit derived from a (meth)acrylate compound having a fluorine atom and a repeating unit derived from a (meth)acrylate compound having two or more (preferably five or more) alkyleneoxy groups (preferably ethyleneoxy groups, propyleneoxy groups) may also be preferably used. In addition, the fluorine-containing surfactants described in paragraphs 0016 to 0037 of JP-A-2010-032698 and the following compounds are also exemplified as the fluorosurfactant used in the present disclosure.

[0180] [ka]

[0181] The weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, 14,000. In the above compound, % indicating the proportion of repeating units is mol %.

[0182] In addition, the fluorine-based surfactant may be a fluorine-containing polymer having an ethylenically unsaturated group in a side chain. Specific examples include compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of JP 2010-164965 A, such as Megafac RS-101, RS-102, RS-718K, and RS-72-K manufactured by DIC Corporation. In addition, the fluorine-based surfactant may be compounds described in paragraphs 0015 to 0158 of JP 2015-117327 A.

[0183] Examples of nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (e.g., glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid esters, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF), Solsperse 20000 (manufactured by Lubrizol Nippon Co., Ltd.), NCW-101, NCW-1001, NCW-1002 (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), Paionin D-6112, D-6112-W, D-6315 (manufactured by Takemoto Oil Co., Ltd.), Olfine E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Industry Co., Ltd.), and the like.

[0184] Examples of silicone surfactants include Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, Toray Silicone SH8400 (all manufactured by Toray Dow Corning Co., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials, Inc.), KP-341, KF-6001, KF-6002 (all manufactured by Shin-Etsu Silicone Co., Ltd.), BYK307, BYK323, BYK330 (all manufactured by BYK-Chemie).

[0185] The content of the surfactant in the total solid content of the colored photosensitive composition is preferably 0.001% by mass to 5.0% by mass, more preferably 0.005% by mass to 3.0% by mass. In the colored photosensitive composition according to the present disclosure, only one type of surfactant may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0186] <Ultraviolet absorbing agent> The colored photosensitive composition according to the present disclosure may contain an ultraviolet absorber. Examples of ultraviolet absorbers that can be used include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, and triazine compounds. For details, compounds described in paragraphs 0052-0072 of JP 2012-208374 A, paragraphs 0317-0334 of JP 2013-068814 A, and paragraphs 0061-0080 of JP 2016-162946 A are included, the contents of which are incorporated herein by reference. Examples of commercially available ultraviolet absorbers include UV-503 (manufactured by Daito Chemical Co., Ltd.). Examples of benzotriazole compounds include the MYUA series (The Chemical Daily, February 1, 2016) manufactured by Miyoshi Oil & Fat Co., Ltd. Moreover, the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 can also be used as the ultraviolet absorbing agent.

[0187] The content of the ultraviolet absorbent in the total solid content of the colored photosensitive composition is preferably 0.01% by mass to 10% by mass, more preferably 0.01% by mass to 5% by mass. In the colored photosensitive composition according to the present disclosure, only one type of ultraviolet absorbent may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0188] <Antioxidants> The colored photosensitive composition according to the present disclosure may contain an antioxidant. Examples of the antioxidant include a phenolic compound, a phosphite compound, and a thioether compound. As the phenolic compound, any phenolic compound known as a phenolic antioxidant may be used. A preferred phenolic compound is a hindered phenolic compound. A compound having a substituent at the site (ortho position) adjacent to the phenolic hydroxy group is preferred. As the aforementioned substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. In addition, as the antioxidant, a compound having a phenolic group and a phosphite group in the same molecule is also preferred. In addition, as the antioxidant, a phosphorus-based antioxidant may also be suitably used. As the phosphorus-based antioxidant, tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphos Examples of the antioxidants include tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethylbis(2,4-di-tert-butyl-6-methylphenyl)phosphite, etc. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, and ADK STAB AO-330 (all manufactured by ADEKA CORPORATION). In addition, the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, the compounds described in Korean Patent Publication No. 10-2019-0059371, and the like can also be used as the antioxidant.

[0189] The content of the antioxidant in the total solid content of the colored photosensitive composition is preferably 0.01% by mass to 20% by mass, and more preferably 0.3% by mass to 15% by mass. In the colored photosensitive composition according to the present disclosure, only one type of antioxidant may be used, or two or more types may be used. When two or more types are used, the total amount thereof is preferably within the above range.

[0190] <Other ingredients> The colored photosensitive composition according to the present disclosure may contain, as necessary, a sensitizer, a curing accelerator, a filler, a heat curing accelerator, a plasticizer, and other auxiliaries (for example, conductive particles, fillers, defoamers, flame retardants, leveling agents, peeling accelerators, fragrances, surface tension adjusters, chain transfer agents, etc.). By appropriately incorporating these components, it is possible to adjust properties such as film properties. For these components, for example, the description in paragraphs 0183 and after of JP-A-2012-003225 (corresponding to paragraph 0237 of the specification of US Patent Application Publication No. 2013 / 0034812) and the description in paragraphs 0101 to 0104, 0107 to 0109, etc. of JP-A-2008-250074 can be referred to, and the contents of these are incorporated herein. In addition, the colored composition according to the present disclosure may contain, as necessary, a latent antioxidant. Examples of latent antioxidants include compounds in which the site functioning as an antioxidant is protected with a protecting group, and the protecting group is removed by heating at 100°C to 250°C or at 80°C to 200°C in the presence of an acid / base catalyst, thereby functioning as an antioxidant. Examples of latent antioxidants include compounds described in International Publication No. 2014 / 021023, International Publication No. 2017 / 030005, and JP-A-2017-008219. Examples of commercially available latent antioxidants include Adeka Arcles GPA-5001 (manufactured by ADEKA Corporation). In addition, as described in JP-A-2018-155881, CI Pigment Yellow 129 may be added for the purpose of improving weather resistance.

[0191] The colored photosensitive composition according to the present disclosure may contain a metal oxide to adjust the refractive index of the resulting film. Examples of the metal oxide include TiO2, ZrO2, Al2O3, and SiO2. The primary particle size of the metal oxide is preferably 1 nm to 100 nm, more preferably 3 nm to 70 nm, and particularly preferably 5 nm to 50 nm. The metal oxide may have a core-shell structure. In this case, the core may be hollow.

[0192] The colored photosensitive composition according to the present disclosure may also include a light resistance improver. Examples of the light resistance improver include compounds described in paragraphs 0036 to 0037 of JP-A-2017-198787, compounds described in paragraphs 0029 to 0034 of JP-A-2017-146350, compounds described in paragraphs 0036 to 0037 and 0049 to 0052 of JP-A-2017-129774, compounds described in paragraphs 0031 to 0034 and 0058 to 0059 of JP-A-2017-129674, compounds described in paragraphs 0036 to 0037 and 0051 to 0054 of JP-A-2017-122803, compounds described in paragraphs 0025 to 0039 of WO 2017 / 164127, and compounds described in paragraphs 0034 to 0047 of JP-A-2017-186546. Compounds described in paragraphs 0019 to 0041 of JP-A-2015-025116, compounds described in paragraphs 0101 to 0125 of JP-A-2012-145604, compounds described in paragraphs 0018 to 0021 of JP-A-2012-103475, compounds described in paragraphs 0015 to 0018 of JP-A-2011-257591, compounds described in paragraphs 0017 to 0021 of JP-A-2011-191483, compounds described in paragraphs 0108 to 0116 of JP-A-2011-145668, compounds described in paragraphs 0103 to 0153 of JP-A-2011-253174, and the like.

[0193] In the colored photosensitive composition according to the present disclosure, the content of free metal that is not bonded or coordinated to a pigment or the like is preferably 100 ppm or less, more preferably 50 ppm or less, even more preferably 10 ppm or less, and particularly preferably substantially free. According to this embodiment, effects such as stabilization of pigment dispersibility (suppression of aggregation), improvement of spectral characteristics due to improved dispersibility, stabilization of curable components, suppression of conductivity fluctuation due to elution of metal atoms and metal ions, and improvement of display characteristics can be expected. In addition, the effects described in JP 2012-153796 A, JP 2000-345085 A, JP 2005-200560 A, JP 08-043620 A, JP 2004-145078 A, JP 2014-119487 A, JP 2010-083997 A, JP 2017-090930 A, JP 2018-025612 A, JP 2018-025797 A, JP 2017-155228 A, JP 2018-036521 A, etc. can be obtained. The types of the free metals include Na, K, Ca, Sc, Ti, Mn, Cu, Zn, Fe, Cr, Co, Mg, Al, Sn, Zr, Ga, Ge, Ag, Au, Pt, Cs, Ni, Cd, Pb, Bi, etc. In addition, the colored photosensitive composition according to the present disclosure preferably has a content of free halogens not bonded or coordinated with pigments or the like of 100 ppm or less, more preferably 50 ppm or less, even more preferably 10 ppm or less, and particularly preferably substantially free. Examples of halogens include F, Cl, Br, I, and anions thereof. Methods for reducing free metals and halogens in the colored photosensitive composition include washing with ion-exchanged water, filtration, ultrafiltration, purification with ion-exchange resin, and the like.

[0194] The colored photosensitive composition according to the present disclosure may contain a dye. As the dye, known dyes can be used. Examples of dyes include pyrazole azo compounds, anilino azo compounds, triarylmethane compounds, anthraquinone compounds, anthrapyridone compounds, benzylidene compounds, oxonol compounds, pyrazolotriazole azo compounds, pyridone azo compounds, cyanine compounds, phenothiazine compounds, pyrrolopyrazole azomethine compounds, xanthene compounds, phthalocyanine compounds, benzopyran compounds, indigo compounds, and pyrromethene compounds. Examples of the dye include the methine dyes described in JP-A-2019-73695, the methine dyes described in JP-A-2019-073696, the methine dyes described in JP-A-2019-73697, and the methine dyes described in JP-A-2019-73698. The colored photosensitive composition according to the present disclosure may also use a dye multimer. The dye multimer is preferably a dye dissolved in a solvent before use. The dye multimer may also form particles. When the dye multimer is in the form of particles, it is usually used in a state of being dispersed in a solvent. The dye multimer in a particulate state can be obtained, for example, by emulsion polymerization, and specific examples of the compounds and manufacturing methods described in JP-A-2015-214682 include those described in JP-A-2015-214682. The dye multimer has two or more dye structures in one molecule, and preferably has three or more dye structures. The upper limit is not particularly limited, but may be 100 or less. The multiple dye structures in one molecule may be the same dye structure or different dye structures. The weight average molecular weight (Mw) of the dye multimer is preferably 2,000 to 50,000. The lower limit is , more preferably 3,000 or more, and even more preferably 6,000 or more. The upper limit is more preferably 30,000 or less, and even more preferably 20,000 or less. As the dye multimer, compounds described in JP-A-2011-213925, JP-A-2013-041097, JP-A-2015-028144, JP-A-2015-030742, WO 2016 / 031442, etc. can also be used. The content of the dye is preferably less than the content of the pigment.

[0195] The colored photosensitive compositions according to this disclosure are also preferably substantially free of terephthalic acid esters.

[0196] The water content of the colored photosensitive composition according to the present disclosure is preferably 3% by mass or less, more preferably 0.01% by mass to 1.5% by mass, and particularly preferably 0.1% by mass to 1.0% by mass. The water content can be measured by the Karl Fischer method.

[0197] The colored photosensitive composition according to the present disclosure can be used with its viscosity adjusted for the purpose of adjusting the film surface state (flatness, etc.), adjusting the film thickness, etc. The value of the viscosity can be appropriately selected as necessary, and is preferably 0.3 mPa·s to 50 mPa·s, and more preferably 0.5 mPa·s to 20 mPa·s at 23°C. The viscosity can be measured, for example, using a viscometer RE85L (rotor: 1°34'×R24, measurement range 0.6 to 1,200 mPa·s) manufactured by Toki Sangyo Co., Ltd., with the temperature adjusted to 23°C.

[0198] When the colored photosensitive composition according to the present disclosure is used as a color filter for a liquid crystal display device, the voltage holding ratio of the liquid crystal display element having the color filter is preferably 70% or more, more preferably 90% or more. Known means for obtaining a high voltage holding ratio can be appropriately incorporated, and typical means include the use of a material with high purity (e.g., reduction of ionic impurities) and control of the amount of acid groups in the composition. The voltage holding ratio can be measured, for example, by the method described in paragraph 0243 of JP2011-008004A and paragraphs 0123 to 0129 of JP2012-224847A.

[0199] <Containment Container> The container for storing the colored photosensitive composition according to the present disclosure is not particularly limited, and a known container can be used. In addition, it is also preferable to use a multi-layer bottle whose inner wall is made of six types of six-layer resin or a bottle with a seven-layer structure made of six types of resin as the container, in order to suppress the incorporation of impurities into the raw materials or the colored photosensitive composition. Examples of such containers include the containers described in JP-A-2015-123351. In addition, it is also preferable that the inner wall of the colored photosensitive composition is made of glass or stainless steel, in order to prevent metal elution from the inner wall of the container, increase the storage stability of the composition, and suppress the deterioration of the components. The storage conditions for the colored photosensitive composition according to the present disclosure are not particularly limited, and a conventionally known method can be used. In addition, the method described in JP-A-2016-180058 can also be used.

[0200] <Method for preparing colored photosensitive composition> The colored photosensitive composition according to the present disclosure can be prepared by mixing the above-mentioned components. When preparing the colored photosensitive composition, all the components may be simultaneously dissolved and / or dispersed in a solvent to prepare the colored photosensitive composition, or, if necessary, each component may be appropriately prepared as two or more solutions or dispersions, which are mixed at the time of use (at the time of application) to prepare the colored photosensitive composition.

[0201] In addition, it is also preferable to include a process of dispersing a pigment in the preparation of the colored photosensitive composition. In the process of dispersing the pigment, the mechanical force used for dispersing the pigment may be compression, Examples of such processes include squeezing, impact, shearing, and cavitation. Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high-speed impellers, sand grinders, flow jet mixers, high-pressure wet atomization, and ultrasonic dispersion. In addition, in the grinding of pigments in a sand mill (bead mill), it is preferable to use small-diameter beads, increase the bead packing rate, and perform processing under conditions that increase grinding efficiency. In addition, it is preferable to remove coarse particles by filtration, centrifugation, or the like after the grinding process. In addition, the process and dispersing machine for dispersing pigments can be suitably used as described in "Dispersion Technology Encyclopedia, published by Information Machine Co., Ltd., July 15, 2005" and "Dispersion Technology and Industrial Application Practice Centered on Suspension (Solid / Liquid Dispersion System) Comprehensive Data Collection, published by Management Development Center Publishing Department, October 10, 1978", and paragraph 0022 of JP2015-157893A. In addition, in the process of dispersing the pigment, a particle size reduction treatment may be performed in a salt milling process. The materials, equipment, and treatment conditions used in the salt milling process can be found in, for example, JP-A-2015-194521 and JP-A-2012-046629.

[0202] In preparing the colored photosensitive composition, it is preferable to filter the colored photosensitive composition with a filter for the purpose of removing foreign matter and reducing defects. As the filter, any filter that has been used for filtering purposes can be used without any particular limitation. For example, there are filters using materials such as fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (e.g., nylon-6, nylon-6,6), and polyolefin resins such as polyethylene and polypropylene (PP) (including high-density and ultra-high-molecular-weight polyolefin resins). Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.

[0203] The pore size of the filter is preferably 0.01 μm to 7.0 μm, more preferably 0.01 μm to 3.0 μm, and even more preferably 0.05 μm to 0.5 μm. When the pore size of the filter is within the above range, fine foreign matter can be removed more reliably. The nominal value of the filter manufacturer can be referred to for the pore size value of the filter. Various filters provided by Nippon Pall Corporation (DFA4201NIEY, etc.), Advantech Toyo Co., Ltd., Nippon Integris Co., Ltd. (formerly Nippon Microlith Co., Ltd.), Kitz Microfilter Co., Ltd., etc. can be used.

[0204] It is also preferable to use a fibrous filter medium as the filter. Examples of fibrous filter medium include polypropylene fiber, nylon fiber, glass fiber, etc. Commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD.

[0205] When using a filter, different filters (for example, a first filter and a second filter, etc.) may be combined. In this case, filtration with each filter may be performed only once or two or more times. Filters having different pore sizes within the above-mentioned range may be combined. Filtration with the first filter may be performed only on the dispersion liquid, and filtration with the second filter may be performed after mixing with other components.

[0206] (cured product) The cured product according to the present disclosure is a cured product obtained by curing the colored photosensitive composition according to the present disclosure. The cured product according to the present disclosure can be suitably used for color filters, etc. Specifically, it can be suitably used as a colored layer (pixel) of a color filter, and more specifically, it can be suitably used as a red colored layer (red pixel) of a color filter. The cured product according to the present disclosure is preferably a film-like cured product, and the film thickness may vary depending on the purpose. For example, the film thickness is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and even more preferably 0.3 μm or more.

[0207] (Color filter) Next, the color filter according to the present disclosure will be described. The color filter according to the present disclosure includes the cured product according to the present disclosure described above. More preferably, the color filter has the cured film according to the present disclosure as a pixel. The color filter according to the present disclosure can be used in solid-state imaging devices such as CCD (charge-coupled device) and CMOS (complementary metal-oxide semiconductor), image display devices, and the like.

[0208] In the color filter according to the present disclosure, the thickness of the film according to the present disclosure can be appropriately adjusted according to the purpose. The thickness is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and even more preferably 0.3 μm or more.

[0209] In the color filter according to the present disclosure, the pixel width is preferably 0.5 μm to 20.0 μm. The lower limit is more preferably 1.0 μm or more, and particularly preferably 2.0 μm or more. The upper limit is more preferably 15.0 μm or less, and particularly preferably 10.0 μm or less. The pixel Young's modulus is preferably 0.5 GPa to 20 GPa, and more preferably 2.5 GPa to 15 GPa.

[0210] Each pixel included in the color filter according to the present disclosure preferably has high flatness. Specifically, the surface roughness Ra of the pixel is preferably 100 nm or less, more preferably 40 nm or less, and even more preferably 15 nm or less. Although the lower limit is not specified, it is preferably 0.1 nm or more, for example. The surface roughness of the pixel can be measured, for example, using an AFM (atomic force microscope) Dimension3100 manufactured by Veeco. In addition, the contact angle of water on the pixel can be set to an appropriate preferred value, but is typically in the range of 50° to 110°. The contact angle can be measured, for example, using a contact angle meter CV-DT·A type (manufactured by Kyowa Interface Science Co., Ltd.). In addition, the volume resistance value of the pixel is preferably high. Specifically, the volume resistance value of the pixel is 10 9 It is preferable that the resistance is Ω·cm or more. 0 11 It is more preferable that the resistivity is Ω·cm or more. There is no upper limit, but for example, 10 14 The volume resistance of the pixel can be measured, for example, by using an ultra-high resistance meter 5410 (manufactured by Advantest Corporation).

[0211] Furthermore, the color filter according to the present disclosure may have a protective layer on the surface of the film according to the present disclosure. By providing a protective layer, various functions such as oxygen blocking, low reflection, hydrophilicity / hydrophobicity, and blocking of light of a specific wavelength (ultraviolet rays, near infrared rays, etc.) can be imparted. The thickness of the protective layer is preferably 0.01 μm to 10 μm, more preferably 0.1 μm to 5 μm. Methods for forming the protective layer include a method of forming the protective layer by applying a resin composition dissolved in an organic solvent, a chemical vapor deposition method, and a method of attaching a molded resin with an adhesive. Examples of components constituting the protective layer include (meth)acrylic resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, polyol resins, polyvinylidene chloride resins, melamine resins, urethane resins, aramid resins, polyamide resins, alkyd resins, epoxy resins, modified silicone resins, fluorine resins, polycarbonate resins, polyacrylonitrile resins, cellulose resins, Si, C, W, Al2O3, Mo, SiO2, and Si2N4, and these components may be contained in combination of two or more. For example, in the case of a protective layer intended to block oxygen, the protective layer may be a polyol. It preferably contains a resin, SiO2, and Si2N4. In the case of a protective layer intended for low reflection, the protective layer preferably contains a (meth)acrylic resin and a fluorine resin.

[0212] When the protective layer is formed by applying a resin composition, known methods such as spin coating, casting, screen printing, and inkjet can be used as the method for applying the resin composition. Known organic solvents (e.g., propylene glycol 1-monomethyl ether 2-acetate, cyclopentanone, ethyl lactate, etc.) can be used as the organic solvent contained in the resin composition. When the protective layer is formed by chemical vapor deposition, known chemical vapor deposition methods (thermal chemical vapor deposition, plasma chemical vapor deposition, photochemical vapor deposition) can be used as the chemical vapor deposition.

[0213] The protective layer may contain additives such as organic particles, inorganic particles, absorbents of light of a specific wavelength (e.g., ultraviolet rays, near infrared rays, etc.), refractive index adjusters, antioxidants, adhesives, and surfactants, as necessary. Examples of organic particles and inorganic particles include polymer particles (e.g., silicone resin particles, polystyrene particles, melamine resin particles), titanium oxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, titanium nitride, titanium oxynitride, magnesium fluoride, hollow silica, silica, calcium carbonate, and barium sulfate. Known absorbents can be used as absorbents of light of a specific wavelength. The content of these additives can be appropriately adjusted, but is preferably 0.1% by mass to 70% by mass, and more preferably 1% by mass to 60% by mass, based on the total mass of the protective layer.

[0214] In addition, as the protective layer, the protective layers described in paragraphs 0073 to 0092 of JP2017-151176A can also be used.

[0215] The color filter may have an underlayer. The underlayer may be formed, for example, by using a composition obtained by removing a colorant such as a pigment from the colored photosensitive composition according to the present disclosure. The surface contact angle of the underlayer is preferably 20° to 70° when measured with diiodomethane. Also, it is preferably 30° to 80° when measured with water. If the surface contact angle of the underlayer is within the above range, the resin composition has good wettability. The surface contact angle of the underlayer can be adjusted, for example, by adding a surfactant.

[0216] <Manufacturing method of color filters> Next, a method for producing a color filter using the colored photosensitive composition according to the present disclosure will be described. The color filter can be produced through a step of forming a colored photosensitive composition layer on a support using the colored photosensitive composition according to the present disclosure described above, and a step of forming a pattern on the colored photosensitive composition layer by a photolithography method or a dry etching method. The colored photosensitive composition according to the present disclosure can also suppress the generation of development residues, so it is particularly effective in the case of producing a color filter by forming a pattern on the colored photosensitive composition layer by a photolithography method.

[0217] -Photolithography method- First, a case of manufacturing a color filter by forming a pattern by photolithography will be described. This manufacturing method preferably includes a step of forming a colored photosensitive composition layer on a support using the colored photosensitive composition according to the present disclosure, a step of exposing the colored photosensitive composition layer in a pattern, and a step of developing and removing the unexposed part of the colored photosensitive composition layer to form a pattern (pixel). If necessary, a step of baking the colored photosensitive composition layer (pre-baking step) and a step of baking the developed pattern (pixel) (post-baking step) may be provided.

[0218] In the step of forming a colored photosensitive composition layer, the colored photosensitive composition according to the present disclosure is used. A colored photosensitive composition layer is formed on a support. The support is not particularly limited and can be appropriately selected depending on the application. For example, a glass substrate, a silicon substrate, etc. can be mentioned, and a silicon substrate is preferable. A charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, etc. may be formed on the silicon substrate. A black matrix for isolating each pixel may be formed on the silicon substrate. A base layer may be provided on the silicon substrate to improve adhesion with the upper layer, prevent diffusion of substances, or flatten the substrate surface. The base layer may be formed using a composition obtained by removing the colorant from the colored photosensitive composition described herein, or a composition containing the resin, polymerizable compound, surfactant, etc. described herein.

[0219] The colored photosensitive composition can be applied by any known method, including, for example, a dropping method (drop casting), a slit coating method, a spray method, a roll coating method, a rotary coating method (spin coating), a casting coating method, a slit and spin method, a pre-wetting method (for example, a method described in JP-A-2009-145395), various printing methods such as ejection printing such as inkjet (for example, on-demand method, piezo method, thermal method) and nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, and metal mask printing, a transfer method using a mold, and a nanoimprint method. The application method in inkjet is not particularly limited, and examples thereof include the method shown in "Expanding and Usable Inkjet - Infinite Possibilities Seen in Patents -, published in February 2005, Sumibe Techno Research" (particularly pages 115 to 133), and the methods described in JP 2003-262716 A, JP 2003-185831 A, JP 2003-261827 A, JP 2012-126830 A, JP 2006-169325 A, etc. In addition, for the application method of the colored photosensitive composition, the descriptions in WO 2017 / 030174 A and WO 2017 / 018419 A can be referred to, and the contents of these are incorporated herein.

[0220] The colored photosensitive composition layer formed on the support may be dried (prebaked). When the film is produced by a low-temperature process, prebaking may not be performed. When prebaking is performed, the prebaking temperature is preferably 150° C. or lower, more preferably 120° C. or lower, and even more preferably 110° C. or lower. The lower limit can be, for example, 50° C. or higher, and can also be 80° C. or higher. The prebaking time is preferably 10 seconds to 300 seconds, more preferably 40 seconds to 250 seconds, and even more preferably 80 seconds to 220 seconds. Prebaking can be performed using a hot plate, an oven, or the like.

[0221] <<Exposure process>> Next, the colored photosensitive composition layer is exposed to light in a pattern (exposure step). For example, the colored photosensitive composition layer can be exposed to light in a pattern by using a stepper exposure machine or a scanner exposure machine through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0222] Examples of radiation (light) that can be used for exposure include g-line and i-line. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 nm to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), with KrF line (wavelength 248 nm) being preferred. Long-wave light sources with wavelengths of 300 nm or more can also be used.

[0223] In addition, the exposure may be performed by irradiating the light continuously or by irradiating the light in pulses (pulse exposure). Pulse exposure is an exposure method in which light irradiation and pauses are repeated in a short cycle (for example, on the order of milliseconds or less).

[0224] The irradiation amount (exposure amount) is, for example, 0.03 J / cm 2 ~2.5J / cm 2 is preferred, and 0.05 J / cm 2 ~1.0J / cm 2 is more preferable. The oxygen concentration during exposure can be appropriately selected. In addition to exposure in air, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19 volume% or less (e.g., 15 volume%, 5 volume%, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21 volume% (e.g., 22 volume%, 30 volume%, or 50 volume%). The exposure illuminance can be appropriately set, and is preferably 1,000 W / m 2 ~100,000W / m 2 (For example, 5,000 W / m 2 , 15,000W / m 2 , or 35,000 W / m 2The oxygen concentration and exposure illuminance may be appropriately combined. For example, the oxygen concentration is 10% by volume and the illuminance is 10,000 W / m 2 , oxygen concentration 35% by volume, illuminance 20,000 W / m 2 etc.

[0225] Next, the unexposed parts of the colored photosensitive composition layer are developed and removed to form a pattern (pixels). The unexposed parts of the colored composition layer can be developed and removed using a developer. As a result, the colored photosensitive composition layer in the unexposed parts in the exposure step is dissolved into the developer, and only the photocured parts remain. The developer is preferably an organic alkaline developer that does not cause damage to the underlying elements or circuits. The temperature of the developer is preferably, for example, 20°C to 30°C. The development time is preferably 20 seconds to 180 seconds. In order to improve the removability of residues, the process of shaking off the developer every 60 seconds and supplying new developer may be repeated several times.

[0226] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. As the alkaline developer, an alkaline aqueous solution (alkaline developer) obtained by diluting an alkaline agent with pure water is preferred. Examples of the alkaline agent include organic alkaline compounds such as ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, and 1,8-diazabicyclo[5.4.0]-7-undecene, and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium silicate, and sodium metasilicate. As the alkaline agent, compounds with a large molecular weight are preferred in terms of the environment and safety. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001% by mass to 10% by mass, more preferably 0.01% by mass to 1% by mass. The developer may further contain a surfactant. Examples of the surfactant include the surfactants described above, and nonionic surfactants are preferred. The developer may be produced as a concentrated solution once and diluted to a required concentration when used, from the viewpoint of convenience of transportation and storage. The dilution ratio is not particularly limited, but can be set in the range of, for example, 1.5 to 100 times. It is also preferred to wash (rinse) with pure water after development. It is also preferred to rinse by supplying a rinsing liquid to the developed colored photosensitive composition layer while rotating the support on which the developed colored photosensitive composition layer is formed. It is also preferred to perform the rinsing by moving the nozzle for ejecting the rinsing liquid from the center of the support to the periphery of the support. In this case, the nozzle may be moved while gradually decreasing the moving speed when moving the nozzle from the center of the support to the periphery. By performing the rinsing in this manner, the in-plane variation of the rinsing can be suppressed.The same effect can also be obtained by gradually decreasing the rotation speed of the support while moving the nozzle from the center to the periphery of the support.

[0227] After development, it is preferable to perform additional exposure treatment or heat treatment (post-baking) after drying. The additional exposure treatment or post-baking is a hardening treatment after development to complete hardening. The heating temperature in the post-baking is preferably, for example, 100°C to 240°C, and more preferably 20 The temperature is more preferably 0 to 240° C. The post-baking can be performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater so that the developed film meets the above conditions. When additional exposure processing is performed, the light used for exposure is preferably light with a wavelength of 400 nm or less. The additional exposure processing may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0228] -Dry etching method- Next, a case where a pattern is formed by a dry etching method to manufacture a color filter will be described. The pattern formation by the dry etching method preferably includes a step of forming a colored photosensitive composition layer on a support using the colored photosensitive composition according to the present disclosure, curing the entire colored photosensitive composition layer to form a cured layer, a step of forming a photoresist layer on the cured layer, a step of exposing the photoresist layer in a pattern shape and developing it to form a resist pattern, and a step of dry etching the cured layer using an etching gas with the resist pattern as a mask. In the formation of the photoresist layer, it is preferable to further perform a pre-bake treatment. In particular, as a process for forming the photoresist layer, a form in which a heat treatment after exposure and a heat treatment after development (post-bake treatment) are performed is desirable. For the pattern formation by the dry etching method, the description in paragraphs 0010 to 0067 of JP 2013-064993 A can be referred to, and the contents thereof are incorporated herein.

[0229] (Solid-state imaging element) The solid-state imaging device according to the present disclosure preferably has the cured product according to the present disclosure and the color filter according to the present disclosure described above. The configuration of the solid-state imaging device according to the present disclosure is not particularly limited as long as it has the film according to the present disclosure and functions as a solid-state imaging device, and examples thereof include the following configurations.

[0230] The substrate has a plurality of photodiodes constituting a light receiving area of ​​a solid-state imaging device (such as a CCD (charge-coupled device) image sensor or a CMOS (complementary metal oxide semiconductor) image sensor) and a transfer electrode made of polysilicon or the like, a light shielding film having an opening only for the light receiving portion of the photodiode on the photodiode and the transfer electrode, a device protection film made of silicon nitride or the like formed on the light shielding film so as to cover the entire light shielding film and the light receiving portion of the photodiode, and a color filter on the device protection film. Furthermore, the device protection film may have a light collecting means (e.g., a microlens, etc., the same applies below) on the device protection film and below the color filter (on the side closer to the substrate), or a light collecting means on the color filter. The color filter may have a structure in which each colored pixel is embedded in a space partitioned by partitions, for example, in a lattice shape. In this case, it is preferable that the partitions have a lower refractive index than each colored pixel. Examples of imaging devices having such a structure include those described in JP 2012-227478 A, JP 2014-179577 A, WO 2018 / 043654 A, and U.S. Patent Application Publication No. 2018 / 0040656 A. An imaging device including a solid-state imaging element according to the present disclosure is used in digital cameras and electronic devices having an imaging function. In addition to devices (such as mobile phones), it can also be used for car cameras and surveillance cameras. In addition, as described in JP 2019-211559 A, the solid-state imaging element according to the present disclosure may have an ultraviolet absorbing layer (UV cut filter) in the structure of the solid-state imaging element, thereby improving the light resistance of the color filter.

[0231] (Image display device) The image display device according to the present disclosure preferably has the cured product according to the present disclosure and the color filter according to the present disclosure. Examples of the image display device include a liquid crystal display device and an organic electroluminescence display device. The definition of the image display device and the characteristics of each image display device are as follows: Details are described in, for example, "Electronic Display Devices (by Sasaki Akio, published by Kogyo Chosakai Co., Ltd. in 1990)" and "Display Devices (by Ibuki Yoshiaki, published by Sangyo Tosho Co., Ltd. in 1989)". Liquid crystal display devices are described in, for example, "Next Generation Liquid Crystal Display Technology (edited by Uchida Tatsuo, published by Kogyo Chosakai Co., Ltd. in 1994)". There are no particular limitations on the liquid crystal display devices to which the present disclosure can be applied, and the present disclosure can be applied to, for example, various types of liquid crystal display devices described in the above "Next Generation Liquid Crystal Display Technology". EXAMPLES

[0232] The present disclosure will be described in detail below with reference to examples, but the present disclosure is not limited to these examples. In the present examples, "%" and "parts" mean "% by mass" and "parts by mass", respectively, unless otherwise specified. In addition, in polymer compounds, unless otherwise specified, the molecular weight is the weight average molecular weight (Mw), and the ratio of the constitutional units is the mole percentage. The weight average molecular weight (Mw) is a value measured in terms of polystyrene by gel permeation chromatography (GPC).

[0233] <Preparation of Dispersion G1> 8.75 parts by mass of CI Pigment Green 58 as a green pigment (G pigment), 3.85 parts by mass of CI Pigment Yellow 185 as a yellow pigment (Y pigment), 1.26 parts by mass of AM-1 as an amine compound, 12.6 parts by mass of D-1 (solid content 30%) as a resin (equivalent to 3.78 parts by mass of solid content), and 67.3 parts by mass of propylene glycol monomethyl ether acetate (PGMEA) as a solvent were mixed, and then 230 parts by mass of zirconia beads having a diameter of 0.3 mm were added, and the mixture was dispersed for 5 hours using a paint shaker. The beads were separated by filtration to produce dispersion G1 (green dispersion).

[0234] <Preparation of Dispersions G2 to G56 and Comparative Dispersions G1 and G2> Each dispersion was produced in the same manner as in the preparation of Dispersion G1, except that the type and amount of amine compound, the type and amount of resin, and the type of solvent were changed as shown in Table 1 below.

[0235] [Table 1]

[0236] Details of the abbreviations listed in Table 1 are shown below. <Amine compounds> AM-1 to AM-20: AM-1 to AM-20 mentioned above AM-9 to AM-14 are ADEKA STAB LA-52 manufactured by ADEKA Corporation. , LA-57, LA-63P, LA-68, LA-72, and LA-77Y were used. AM-21: A compound produced by the following production method AM-22: A compound produced by the following production method CAM-1: The following compound CAM-2: The following compound

[0237] [ka]

[0238] <Preparation of <AM-21> (block copolymer having a hindered amine structure)> Into a reactor equipped with a gas inlet tube, a condenser, a stirring blade, and a thermometer, 30 parts of methyl methacrylate, 30 parts of n-butyl methacrylate, 20 parts of hydroxyethyl methacrylate, and 13.2 parts of tetramethylethylenediamine were charged. While flowing nitrogen, the mixture was stirred at 50 °C for 1 hour, and the system was purged with nitrogen. Next, 9.3 parts of ethyl bromoisobutyrate, 5.6 parts of cuprous chloride, and 133 parts of methoxypropyl acetate were charged. Under a nitrogen stream, the temperature was raised to 110 °C to initiate the polymerization of the first block (B block). After 4 hours of polymerization, the polymerization solution was sampled for solid content measurement, and it was confirmed that the polymerization conversion rate was 98% or more in terms of non-volatile content. Next, 61 parts of methoxypropyl acetate and 20 parts of 1,2,2,6,6-pentamethylpiperidyl methacrylate (manufactured by Hitachi Chemical Co., Ltd., Funcrile FA-711MM) as the second block (A block) monomer were added to this reactor, and the mixture was stirred while maintaining the temperature at 110 °C and a nitrogen atmosphere, and the reaction was continued. Two hours after the addition of 1,2,2,6,6-pentamethylpiperidyl methacrylate, the polymerization solution was sampled for solid content measurement, and it was confirmed that the polymerization conversion rate of the second block (A block) was 98% or more in terms of non-volatile content. The reaction solution was cooled to room temperature (25 °C, the same hereinafter) to stop the polymerization. As a result of GPC measurement, the Mw of the polymer was 9,200 and Mw / Mn = 1.5, and the reaction conversion rate was 98.5%. In this way, a block copolymer (CAM-1) having a hindered amine structure with an amine value of 57 mgKOH / g per solid content was obtained. After cooling to room temperature, about 2 g of the resin solution was sampled and dried by heating at 180 °C for 20 minutes to measure the non-volatile content. Propylene glycol monomethyl ether acetate was added to the previously synthesized block copolymer solution so that the non-volatile content became 40% by weight to prepare a block copolymer (AM-21) solution.

[0239] <Preparation of <AM-22> (resin type dispersant)> In a four-necked separable flask equipped with a thermometer, a stirrer, a distillation tube, and a condenser, 70 parts of methyl ethyl ketone (MEK), 76.0 parts of n-butyl acrylate, 2.8 parts of sparteine, and 1.9 parts of ethyl bromoisobutyrate were charged and heated to 40°C under a nitrogen stream. 1.1 parts of cuprous chloride were added, and the temperature was raised to 75°C to initiate polymerization. After polymerization for 3 hours, the polymerization solution was sampled, and it was confirmed that the polymerization yield was 95% or more based on the solid content of the polymerization, and 24.0 parts of N,N-dimethylaminoethyl methacrylate and 30.0 parts of MEK were added, and polymerization was further carried out. After 2 hours, it was confirmed that the polymerization yield was 97% or more based on the solid content of the polymerization solution, and the polymerization was stopped by cooling to room temperature. 100 parts of the obtained resin solution were diluted with 100 parts of MEK, 60 parts of cation exchange resin "Diaion PK228LH (Mitsubishi Chemical Co., Ltd.)" was added, and the mixture was stirred at room temperature for 1 hour. Furthermore, 1 part of "Kyoward 500SN (Kyowa Chemical Industry Co., Ltd.)" was added as a neutralizing agent, and the mixture was stirred for 30 minutes. The cation exchange resin and adsorbent were removed by filtration, and the polymerization catalyst residue was removed. Furthermore, the resin solution was concentrated and ethylene glycol monomer was added. The solvent was replaced with ethyl ether acetate to obtain a solution of AM-22 (resin-type dispersant, Mn = 10,200, Mw = 12,200, amine value 86 mgKOH / g) with a non-volatile content of 40 mass %.

[0240] <Resin> D-1: PGMEA solution of the following resin (solid content 30%) D-2: PGMEA solution of the following resin (solid content 30%) D-3: PGMEA solution of the following resin (solid content 30%) D-4: PGMEA solution (solid content 30%) of resin prepared by the following method D-5: PGMEA solution (solid content 30%) of resin prepared by the following method D-6: PGMEA solution (solid content 30%) of resin prepared by the following method D-7: PGMEA solution of the following resin (solid content 30%) D-8: PGMEA solution of the following resin (solid content 30%)

[0241] [ka]

[0242] <Preparation of Resin D-4> (1) Synthesis of Macromonomer B 380 parts by mass of propylene glycol monomethyl ether acetate (PGMEA) was introduced into a three-neck flask, and the temperature was raised to 75° C. while nitrogen was flowing into the flask. Separately, 200 parts by mass of methyl methacrylate, 200 parts by mass of butyl acrylate, 6-mercapto- A dropping solution was prepared by mixing 29.8 parts by mass of 1-hexanol, 2.25 parts by mass of V-601 (2,2'-azobis(isobutyrate) dimethyl, Fujifilm Wako Pure Chemical Industries, Ltd.), and 254 parts by mass of PGMEA. This dropping solution was dropped into the three-neck flask over 2 hours. After completion of the dropping, the mixture was heated and stirred at the same temperature for another hour. After adding 2.25 parts by mass of V-601, the mixture was heated at the same temperature for 2 hours. After adding 2.25 parts by mass of V-601, the mixture was heated to 90°C and heated for 3 hours to complete the polymerization reaction. Next, 35.4 parts by mass of 2-isocyanatoethyl methacrylate (Showa Denko K.K., Karenz MOI) was added to the obtained polymerization reaction product, and after cooling to 0°C, 0.860 parts by mass of zirconium (IV) acetylacetonate and 0.127 parts by mass of dibutylhydroxytoluene (BHT) were added, and the mixture was stirred at the same temperature for 2 hours and then at 30°C for 3 hours. To the obtained MOI reaction product, 53.0 parts by mass of PGMEA was added to obtain a 40% by mass solution of macromonomer B in PGMEA.

[0243] (2) Synthesis of Resin D-4 Into a three-neck flask, 300 parts by mass of the PGMEA 40% by mass solution of the macromonomer B synthesized above, 26.4 parts by mass of methacrylic acid, 93.6 parts by mass of benzyl methacrylate, and 379 parts by mass of PGMEA were introduced, and the mixture was heated to 75 ° C. while flowing nitrogen into the flask. Furthermore, 4.17 parts by mass of dodecyl mercaptan and 0.790 parts by mass of V-601 were added, and the mixture was heated at the same temperature for 2 hours. Further, 0.790 parts by mass of V-601 was added, and the mixture was heated at the same temperature for 2 hours. Further, 0.790 parts by mass of V-601 was added, and the mixture was heated at 90 ° C. for 3 hours, and the polymerization reaction was terminated to synthesize a resin, and PGMEA was added to adjust the solid concentration to 30% by mass to obtain resin D-4 (PGMEA 30% by mass solution). The weight average molecular weight of the obtained resin D-4 was 18,000 and the acid value was 73 mgKOH / g.

[0244] <Preparation of Resin D-5> 40.0 parts of dipentaerythritol hexakis (3-mercaptopropionate) [DPMP; Sakai Chemical Industry Co., Ltd.] and 26.6 parts of itaconic acid were dissolved in 28.90 parts of 1-methoxy-2-propanol and heated to 80°C under a nitrogen stream. 0.235 parts of V-601 were added to this and heated for 3 hours. Furthermore, 0.235 parts of V-601 were added and reacted at 70°C for 3 hours under a nitrogen stream. The solution was cooled to room temperature to obtain a resin D-5 precursor solution. 100 parts of resin D-5 precursor solution, 88.0 parts of methyl methacrylate, 88.0 parts of butyl acrylate, and 80.0 parts of propylene glycol monomethyl ether acetate (PGMEA) were heated to 80°C under a nitrogen stream. 0.139 parts of V-601 were added to this and heated for 3 hours, after which 0.139 parts of V-601 was added again and reacted at 80°C for 3 hours under a nitrogen stream. PGMEA was added to adjust the solid concentration to 30% to obtain resin D-5. The weight average molecular weight of the obtained resin D-5 was 13,000 and the acid value was 50 mgKOH / g.

[0245] <Preparation of Resin D-6> A reaction vessel equipped with a gas inlet tube, a thermometer, a condenser, and a stirrer was charged with 75 parts by mass of methyl methacrylate, 75 parts by mass of n-butyl acrylate, and 68.1 parts by mass of propylene glycol monomethyl ether acetate (PGMEA), and the inside of the reaction vessel was replaced with nitrogen gas. The inside of the reaction vessel was heated to 70 ° C, 9 parts by mass of 3-mercapto-1, 2-propanediol was added, and 0.18 parts by mass of AIBN (azobisisobutyronitrile) was further added, and the reaction was allowed to proceed for 12 hours. It was confirmed that 95% had reacted by measuring the solid content. Subsequently, 14.6 parts by mass of pyromellitic anhydride, 105.5 parts by mass of PGMEA, and 0.3 parts by mass of 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) as a reaction catalyst were added, and the reaction was allowed to proceed for 7 hours at 120 ° C. It was confirmed by measuring the acid value that 98% or more of the acid anhydride had been half-esterified, and the reaction was terminated. PGMEA was added to adjust the solid concentration to 30%, to obtain Resin D-6 having an acid value of 41 mgKOH / g and a weight average molecular weight of 8,800.

[0246] <Solvent> PGMEA: Propylene glycol monomethyl ether acetate PGME: Propylene glycol monomethyl ether

[0247] <Preparation of Dispersions G57 to G72> Each dispersion was prepared in the same manner as for Dispersion G9, except that the types and amounts of G and Y pigments were changed as shown in Table 2 below.

[0248] [Table 2]

[0249] Details of the abbreviations listed in Table 2 are shown below. <Green pigment (G pigment)> PG36: CI Pigment Green 36 PG58: CI Pigment Green 58 PG7: CI Pigment Green 7 PG59: CI Pigment Green 59 PG62: CI Pigment Green 62 PG63: CI Pigment Green 63

[0250] <Yellow pigment (Y pigment)> PY129: CI Pigment Yellow 129 PY139: CI Pigment Yellow 139 PY150: CI Pigment Yellow 150 PY185: CI Pigment Yellow 185 PY215: CI Pigment Yellow 215

[0251] <Preparation of Dispersions R1 to R14, Y1, and Comparative Dispersions R1 and R2> The mixture of the components shown in Table 3 in the amounts shown in Table 3 was further mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.3 mm in diameter). After that, the mixture was mixed at 2,000 kg / cm using a high-pressure disperser NANO-3000-10 equipped with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.). 3 Dispersion treatment was carried out at a flow rate of 500 g / min under a pressure of 1000 g / min. This dispersion treatment was repeated 10 times to obtain dispersions R1 to R12 (red dispersions), dispersion Y1 (yellow dispersion), and comparative dispersions R1 to R3 (red dispersions).

[0252] [Table 3]

[0253] The units of values ​​in the component columns of Table 3 are parts by mass. Details of the abbreviations listed in Table 3 other than those mentioned above are shown below. PR254: CI Pigment Red 254 PR264: CI Pigment Red 264 PR272: CI Pigment Red 272 PR122: CI Pigment Red 122 PO71: CI Pigment Orange 71

[0254] <Preparation of Dispersions B1 to B5 and Comparative Dispersions B1 and B2> The mixture of the components shown in Table 4 in the amounts shown in Table 4 was further mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.3 mm in diameter). After that, the mixture was further mixed and dispersed at 2,000 kPa using a high-pressure disperser NANO-3000-10 equipped with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.). g / cm 3 Dispersion treatment was carried out at a flow rate of 500 g / min under a pressure of 1000 g / min. This dispersion treatment was repeated 10 times to obtain each of dispersions B1 to B3 (blue dispersions) and comparative dispersions B1 to B3 (blue dispersions).

[0255] [Table 4]

[0256] The units of values ​​in the component columns of Table 4 are parts by mass. Details of the abbreviations listed in Table 4 other than those mentioned above are shown below. PB15:6:CI Pigment Blue 15:6 PV23: CI Pigment Violet 23

[0257] (Examples G1 to G56 and Comparative Examples G1 and G2) <Preparation of Colored Photosensitive Composition> The following materials were mixed to prepare a colored photosensitive composition. Dispersion liquid described in Table 5 below: 39.4 parts by weight Resin C1: 0.58 parts by mass Polymerizable compound E1: 0.54 parts by mass Photopolymerization initiator F3: 0.33 parts by mass Surfactant H1: 4.17 parts by mass p-Methoxyphenol: 0.0006 parts by mass Propylene glycol monomethyl ether acetate (PGMEA): 7.66 parts by mass The pigment content in each of the colored photosensitive compositions of Examples G1 to G53 and Comparative Examples G1 to G3 was 62.6 mass % relative to the total solid content of the photosensitive composition.

[0258] Resin C1: Resin shown below, Mw 10,000, the numbers added to the main chain are molar ratios, and the numbers in parentheses to the right of the ethyleneoxy units represent the average number of repetitions.

[0259] [ka]

[0260] Polymerizable compound E1: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.) Photopolymerization initiator F3: a compound having the following structure.

[0261] [ka]

[0262] Surfactant H1: 1 mass % PGMEA solution of the following mixture (Mw=14,000): In the following formula, % indicating the proportion of repeating units is mol %.

[0263] [ka]

[0264] The colored photosensitive compositions thus obtained were subjected to the following evaluations. The evaluation results are shown in Table 5.

[0265] <Dispersion stability> The initial viscosity (V0) of the dispersion obtained above was measured using "RE-85L" manufactured by Toki Sangyo Co., Ltd. Next, this dispersion was left to stand at 45°C for 3 days, and the viscosity after standing (V1) was measured. The viscosity increase rate (%) of the dispersion after standing was calculated using the following formula, and the dispersion stability was evaluated according to the following evaluation criteria. The smaller the viscosity increase rate (%), the better the dispersion stability. The viscosity of the dispersion was measured at a temperature adjusted to 25°C. Viscosity increase rate (%) = [(viscosity after standing (V1) - initial viscosity (V0)) / initial viscosity (V0)] x 100 A: 0≦Viscosity increase rate≦3% B:3%<viscosity increase rate≦5% C:5%<viscosity increase rate≦10% D: 10%< Viscosity increase rate≦15% E: 15%< Viscosity increase rate

[0266] <Adhesion> CT-4000 (manufactured by Fujifilm Electronic Materials Co., Ltd.) was applied to a silicon wafer by spin coating so that the film thickness was 0.1 μm, and heated at 220° C. for 1 hour using a hot plate to form an undercoat layer. Each colored photosensitive composition was applied to the silicon wafer with the undercoat layer by spin coating, and then heated at 100° C. for 2 minutes using a hot plate to obtain a composition layer with a film thickness of 0.5 μm. An i-line stepper FPA-3000i5+ (manufactured by Canon Inc.) was used to apply light with a wavelength of 365 nm at 500 mJ / cm2 to this composition layer through a mask pattern in which square pixels with sides of 1.1 μm were arranged in an area of ​​4 mm×3 mm on the substrate. 2The composition layer after exposure was paddle-developed at 23°C for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide. Thereafter, the composition layer was rinsed with water using a spin shower, and then washed with pure water. Thereafter, the water droplets were blown off with high-pressure air, the silicon wafer was naturally dried, and then post-baked at 220°C for 300 seconds using a hot plate to form a pattern. The obtained pattern was observed using an optical microscope, and the number of patterns that were in close contact among all patterns was counted to evaluate the adhesion. A: All patterns are tightly attached. B: The percentage of closely-contacted patterns is 95% or more but less than 100% of all patterns. C: The percentage of closely-contacted patterns is 90% or more but less than 95% of all patterns. D: The percentage of closely-contacted patterns is 85% or more but less than 90% of all patterns. E: Less than 85% of all patterns are in close contact.

[0267] <Developability (Development residue suppression)> CT-4000 (manufactured by Fujifilm Electronic Materials Co., Ltd.) was applied to a silicon wafer by spin coating so that the film thickness was 0.1 μm, and heated at 220° C. for 1 hour using a hot plate to form an undercoat layer. Each colored photosensitive composition was applied to the silicon wafer with the undercoat layer by spin coating, and then heated at 100° C. for 2 minutes using a hot plate to obtain a composition layer with a film thickness of 1 μm. An i-line stepper FPA-3000i5+ (manufactured by Canon Inc.) was used to apply light having a wavelength of 365 nm at 200 mJ / cm2 to this composition layer through a mask pattern in which square pixels with sides of 1.1 μm were arranged in an area of ​​4 mm×3 mm on the substrate. 2The composition layer after exposure was paddle-developed at 23°C for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide. After that, the composition layer was rinsed with water using a spin shower, and then washed with pure water. After that, the water droplets were blown off with high-pressure air, the silicon wafer was naturally dried, and then post-baked at 200°C for 300 seconds using a hot plate to form a pattern. The presence or absence of residuals between the patterns was observed to evaluate the developability. The area outside the pattern formation area (unexposed area) was observed with a scanning electron microscope (SEM) (magnification 10,000 times), and residues with a diameter of 0.1 μm or more per 5 μm × 5 μm area (1 area) of the unexposed area were counted and evaluated according to the following evaluation criteria. A: Absolutely no residue per area. B: The number of residues per area is less than 10. C: The number of residues per area is 10 or more and less than 20. D: The number of residues per area is greater than or equal to 20 and less than 30. E: The number of residues per area is 30 or more. F: Development was not possible at all.

[0268] [Table 5]

[0269] (Examples G57 to G72) Colored photosensitive compositions were prepared and the above evaluations were carried out in the same manner as in Example G1, except that the dispersion liquid was changed to one shown in Table 6. The evaluation results are shown in Table 6. The pigment content in each of the colored photosensitive compositions of Examples G57 to G72 was 63 mass % relative to the total solid content of the photosensitive composition.

[0270] [Table 6]

[0271] (Examples G73 to G90) A colored photosensitive composition was prepared in the same manner as in Example G1, except that the types and amounts of the dispersion, resin, polymerizable compound, photopolymerization initiator, and solvent were changed to those shown in Table 7, and the above evaluations were performed. The pigment content in each of the colored photosensitive compositions of Examples G73 to G90 was 62.6% by mass relative to the total solid content of the photosensitive composition. The performance evaluation results were equivalent to those of Example G9.

[0272] [Table 7]

[0273] Details of the abbreviations listed in Table 7 other than those mentioned above are shown below. Resin D7: D-7 above (solid content 30%) Resin D9: PGMEA solution of the following resin (solid content 30%)

[0274] [ka]

[0275] E2: Compound with the following structure

[0276] [ka]

[0277] E3: Compound with the following structure

[0278] [ka]

[0279] E4: Compound having the following structure

[0280] [ka]

[0281] E5: Aronix TO-2349 (manufactured by Toagosei Co., Ltd.) F1: IRGACURE-OXE01 (manufactured by BASF), a compound having the following structure. F2: IRGACURE-OXE02 (manufactured by BASF), a compound having the following structure. F4: IRGACURE 369 (manufactured by BASF), a compound having the following structure. F5: A compound having the following structure.

[0282] [ka]

[0283] (Examples G91 to G120) A colored photosensitive composition was prepared in the same manner as in Example G1, except that the types and amounts of the dispersion, resin, polymerizable compound, photopolymerization initiator, and solvent were changed to those shown in Table 8, and the adhesion evaluation and developability evaluation were performed. The evaluation results are shown in Table 8.

[0284] [Table 8]

[0285] In addition, the "pigment content" in Table 8 represents the pigment content relative to the total solid content of the colored photosensitive composition.

[0286] (Examples R1 to R14, Example Y1, and Comparative Examples R1 and R2) Colored photosensitive compositions were prepared and the above evaluations were carried out in the same manner as in Example G1, except that the dispersion liquid was changed to one shown in Table 9. The evaluation results are shown in Table 9. The pigment content in the colored photosensitive compositions of Examples R1 to R14, Example Y1, and Comparative Examples R1 and R2 was 63 mass % relative to the total solid content of the photosensitive composition.

[0287] [Table 9]

[0288] (Examples B1 to B5, and Comparative Examples B1 and B2) Colored photosensitive compositions were prepared and the above evaluations were carried out in the same manner as in Example G1, except that the dispersion liquid was changed to one shown in Table 10. The evaluation results are shown in Table 10. The pigment content in each of the colored photosensitive compositions of Examples B1 to B5 and Comparative Examples B1 and B2 was 63 mass % relative to the total solid content of the photosensitive composition.

[0289] [Table 10]

[0290] As shown in Tables 5 to 10, the colored photosensitive compositions of the Examples were superior in suppressing development residues compared to the colored photosensitive compositions of the Comparative Examples. Furthermore, as shown in Tables 5 to 10 above, the colored photosensitive compositions of the Examples were also excellent in the dispersion stability of the pigment dispersion and the adhesion of the resulting cured product.

[0291] (Examples G201 to G279 and Examples R101 to R110) -Green composition 201- The following components were mixed and stirred, and then filtered through a nylon filter having a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to prepare a Green composition. Green pigment dispersion 201: 64.2 parts by mass Yellow pigment dispersion 2: 17.6 parts by mass Resin D-7: 1.2 parts by mass Polymerizable compound E1: 0.5 parts by mass Polymerizable compound E6: 0.5 parts by mass Photopolymerization initiator F2: 0.5 parts by mass Surfactant H1: 0.01 parts by mass Polymerization inhibitor (p-methoxyphenol): 0.01 parts by mass PGMEA: 15.5 parts by mass Cyclohexanone: 1.0 parts by mass

[0292] Polymerizable compound E6: the following structure

[0293] [ka]

[0294] Green compositions 202 to 279 were prepared by changing the Green pigment dispersion 201 to the following Green pigment dispersions 202 to 279.

[0295] Preparation of Green Pigment Dispersion 201 10.0 parts by mass of CI Pigment Green 58 and 10.0 parts by mass of Resin D-1 (solid content) A mixture of 2.5 parts by mass of dimethylformamide, 0.15 parts by mass of AM-9 as an amine compound, 0.15 parts by mass of AM-23, and 87.19 parts by mass of PGMEA was mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.3 mm in diameter) to prepare a pigment dispersion. Then, the mixture was mixed and dispersed at 2,000 kg / cm using a high-pressure disperser NANO-3000-10 equipped with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.). 3 The dispersion treatment was carried out under a pressure of 1000 g / min and a flow rate of 500 g / min. This dispersion treatment was repeated 10 times to obtain a Green pigment dispersion 201.

[0296] Preparation of Green Pigment Dispersion 202-279 Green pigment dispersions 202 to 279 were each prepared in the same manner as green pigment dispersion 201, except that the amine compound AM-23 in green pigment dispersion 201 was changed to an amine compound in Table 11, the resin D-1 was changed to a resin in Table 11, and PGMEA was changed to a solvent in Table 11.

[0297] [Table 11]

[0298] In Examples G201 to G279, colored photosensitive compositions were prepared in the same manner as in Example G1, and the above evaluations were carried out. All the evaluation results were equivalent to those of Example G51.

[0299] Yellow pigment dispersion 2 A mixture consisting of 11.8 parts by mass of CI Pigment Yellow 185, 1.3 parts by mass of amine compound CAM-14, 4.6 parts by mass of resin D-2 in solid content, 78.2 parts by mass of PGMEA, and 4.1 parts by mass of PGME was mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.3 mm diameter) to prepare a pigment dispersion. Thereafter, the mixture was mixed and dispersed at 2,000 kg / cm using a high-pressure disperser NANO-3000-10 equipped with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.). 3 The dispersion treatment was carried out under a pressure of 1000 g / min and a flow rate of 500 g / min. This dispersion treatment was repeated 10 times to obtain Yellow pigment dispersion liquid 2.

[0300] -Preparation of Red Composition 101- The following components were mixed and stirred, and then filtered through a nylon filter having a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to prepare a Red composition. Red pigment dispersion 101: 36.8 parts by weight Yellow pigment dispersion 3: 26.8 parts by mass Resin D-10: 1.2 parts by mass Polymerizable compound E1: 0.5 parts by mass Photopolymerization initiator F2: 0.3 parts by mass Thermosetting resin (EHPE3150, manufactured by Daicel Chemical Industries, Ltd.): 0.06 parts by mass Surfactant H1: 1.3 parts by weight Polymerization inhibitor (p-methoxyphenol): 0.0005 parts by mass PGMEA: 32.1 parts by mass Cyclohexanone: 1.0 parts by mass

[0301] -Preparation of Red Compositions 102 to 110- Red Compositions 102 to 110 were prepared in the same manner as Red Composition 101, except that Red Pigment Dispersion 101 was changed to the following Red Pigment Dispersions 102 to 110.

[0302] Preparation of Red Pigment Dispersion 101 5.6 parts by weight of CI Pigment Red 254 and CI Pigment A mixture of 5.6 parts by mass of Red 272, 0.8 parts by mass of AM-9 and 0.4 parts by mass of CAM-13 as amine compounds, 4.4 parts by mass of resin D-6, and 83.2 parts by mass of PGMEA was mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.3 mm in diameter) to prepare a pigment dispersion. After that, the mixture was mixed and dispersed at 2,000 kg / cm using a high-pressure disperser NANO-3000-10 equipped with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.). 3 The dispersion treatment was carried out at a flow rate of 500 g / min under a pressure of 1000 g / min. This dispersion treatment was repeated 10 times to obtain a red pigment dispersion liquid.

[0303] Preparation of Red pigment dispersions 102-110 Red pigment dispersions 102 to 110 were each prepared in the same manner as Red pigment dispersion 101, except that the amine compound CAM-13 in Red pigment dispersion 201 was changed to an amine compound in Table 12, and the resin D-6 was changed to a resin in Table 12.

[0304] [Table 12]

[0305] Preparation of Yellow pigment dispersion 3 A mixture of 10.3 parts by mass of CI Pigment Yellow 139, 1.8 parts by mass of amine compound CAM-14, 2.0 parts by mass of resin D-1, 2.0 parts by mass of resin D-14, and 83.9 parts by mass of PGMEA was mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.3 mm in diameter) to prepare a pigment dispersion. Then, the mixture was mixed at 2,000 kg / cm using a high-pressure disperser NANO-3000-10 equipped with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.). 3 The dispersion treatment was carried out at a flow rate of 500 g / min under a pressure of 1000 g / min. This dispersion treatment was repeated 10 times to obtain a yellow pigment dispersion.

[0306] In Examples R101 to R110, colored photosensitive compositions were prepared in the same manner as in Example G1, and the above evaluations were carried out. All evaluation results were equivalent to those of Example R1.

[0307] Tables 13 to 16 below show details of the compounds used in Examples G201 to G279 and Examples R101 to R110 other than those mentioned above.

[0308] [Table 13]

[0309] [Table 14]

[0310] [Table 15]

[0311] [Table 16]

[0312] (Example 301: Preparation of solid-state imaging device) The Green composition 201 was applied onto a silicon wafer by spin coating so that the film thickness after formation would be 0.4 μm. Then, the wafer was heated at 100° C. for 2 minutes using a hot plate. Then, an i-line stepper exposure apparatus FPA-3000i5+ (Canon Inc.) was used to apply 1,000 mJ / cm 2 The silicon wafer was exposed to light through a mask with a dot pattern of 1.0 μm square at 200° C. Then, paddle development was performed for 60 seconds at 23° C. using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). After that, rinsing was performed with a spin shower and further washing with pure water. Next, the silicon wafer was heated at 200° C. for 5 minutes using a hot plate to pattern the green composition on the silicon wafer. Similarly, the red composition 101 and the blue composition 1 were patterned in sequence to form a red, green and blue colored pattern (Bayer pattern). The Bayer pattern is a pattern having one red element, two green elements, and one blue element, as disclosed in U.S. Pat. No. 3,971,065. The pattern is a repeating 2×2 array of color filter elements having a color (Blue) element. The obtained color filter was incorporated into a solid-state imaging device according to a known method. It was confirmed that, regardless of which colored photosensitive composition prepared in the Examples was used, the solid-state imaging device had excellent adhesion in the cured film and had suitable image recognition capabilities.

[0313] The disclosure of Japanese Patent Application No. 2020-055020, filed on March 25, 2020, is incorporated herein by reference in its entirety. All publications, patent applications, and technical standards mentioned in this specification are herein incorporated by reference to the same extent as if each individual publication, patent application, or technical standard was specifically and individually indicated to be incorporated by reference.

Claims

1. Pigments, an amine compound having two or more cyclic amino groups in the molecule; Resin, and Contains a photopolymerization initiator, The content of the pigment is 40% by mass or more based on the total solid content in the colored photosensitive composition, The pigment is C. I. Pigment Green 36, C. I. Pigment Green 58, C. I. Pigment Green 7, C. I. Pigment Green 59, C. I. Pigment Green 62, C. I. Pigment Green 63, C. I. Pigment Yellow 129, C. I. Pigment Yellow 139, C. I. Pigment Yellow 150, C. I. Pigment Yellow 185, C. I. Pigment Yellow 215, C. I. Pigment Red 254, C. I. Pigment Red 264, C. I. Pigment Red 272, C. I. Pigment Red 122, C. I. Pigment Orange 71, C. I. Pigment Blue 15:6, and C.I. Pigment Violet 23; The amine compound is represented by the following formula 1, and includes a compound having a hindered amine structure as the cyclic amino group, the content of the amine compound is 2% by mass to 10% by mass based on the total solid content of the colored photosensitive composition; The resin is a resin having a carboxy group. Colored photosensitive composition. 【Chemistry 1】 In formula 1, X represents an n-valent organic group, each L independently represents a single bond or a divalent linking group, each R independently represents a group having a cyclic amino group, and n represents an integer of 2 to 20.

2. 2. The colored photosensitive composition according to claim 1, wherein the molecular weight of the amine compound is 6,000 or less.

3. 3. The colored photosensitive composition according to claim 1, wherein the amine compound is a compound having 3 to 8 cyclic amino groups in the molecule.

4. 4. The colored photosensitive composition according to claim 1, wherein the amine compound is a compound having 4 to 8 cyclic amino groups in the molecule.

5. 5. The colored photosensitive composition according to claim 1, wherein the photopolymerization initiator comprises an oxime-based photopolymerization initiator.

6. The resin content M Ｐ and the content M of the amine compound Ａ The mass ratio of Ｐ : M Ａ 6. The colored photosensitive composition according to claim 1, wherein the ratio of the molecular weight of the polymer to the molecular weight of the photosensitive composition is from 40:60 to 95:

5.

7. The colored photosensitive composition according to any one of claims 1 to 6, further comprising a polymerizable compound.

8. A cured product obtained by curing the colored curable composition according to any one of claims 1 to 7.

9. A color filter comprising the cured product according to claim 8.

10. A solid-state imaging device comprising the color filter according to claim 9.

11. An image display device comprising the color filter according to claim 9.

Images