Liquid treatment device

Abstract

To provide a liquid treatment device capable of inhibiting a hydrogen concentration of hydrogen-containing liquid from becoming lower than a predetermined minimum concentration before the liquid reaches a supply destination.SOLUTION: A liquid treatment device 1 includes: a hydrogen dissolving device 30; a reverse osmosis membrane treatment device 40; a bubble generation device 100 for generating bubbles in liquid; and a flow passage S formed by connecting the hydrogen dissolving device 30, the reverse osmosis membrane treatment device 40, and the bubble generation device 100 so as to enable passage of the liquid. The flow passage S includes a liquid passage route R1 that allows the liquid to pass in a route from a supply source of the liquid toward a supply destination of the liquid through the hydrogen dissolving device 30 and the reverse osmosis membrane treatment device 40. The bubble generation device 100 generates bubbles in the liquid flowing through the liquid passage route R1.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a liquid treatment device. [Background technology]

[0002] In recent years, it has been known that oxidative stress occurs in dialysis patients during hemodialysis. This is thought to be caused by active oxygen generated during dialysis, and it has been proposed to reduce oxidative stress by eliminating this active oxygen.

[0003] Based on this knowledge, a method has been proposed for producing a dialysis solution with a high concentration of dissolved hydrogen, for example, by dissolving hydrogen in water (hereinafter referred to as "reverse osmosis water") that has been treated and purified with a reverse osmosis membrane (RO membrane). By using this dialysis solution, hydrogen can be reacted with hydroxyl radicals in the body, thereby suppressing oxidative stress and inflammatory reactions. As an apparatus for producing dialysis water for diluting the powder to produce such a dialysis solution, for example, a dialysis water producing apparatus as disclosed in Patent Document 1 below has been provided. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 9-77672 Summary of the Invention [Problem to be solved by the invention]

[0005] When producing a dialysis fluid containing hydrogen (hereinafter also referred to as "hydrogen-containing dialysis fluid") using a dialysis water production apparatus such as that disclosed in the above Patent Document 1, there is a concern that hydrogen may escape (degass) from the hydrogen-containing liquid, causing the hydrogen concentration to fall below a predetermined minimum concentration before it reaches the destination. Therefore, there is a demand for a liquid treatment apparatus that can prevent such problems as much as possible.

[0006] Therefore, an object of the present invention is to realize a liquid treatment device that can prevent the hydrogen concentration of a hydrogen-containing liquid from falling below a predetermined minimum concentration before it reaches its destination. [Means for solving the problem]

[0007] (1) The liquid treatment device of the present invention, provided to solve the above-mentioned problems, comprises a hydrogen dissolution device that dissolves hydrogen in a liquid, a reverse osmosis membrane treatment device that performs reverse osmosis membrane treatment on the liquid, a bubble generation device that generates bubbles in the liquid, and a flow path formed by connecting the hydrogen dissolution device, the reverse osmosis membrane treatment device, and the bubble generation device in a manner that allows liquid to pass through, wherein the flow path is capable of flowing liquid through a liquid passage path that passes the liquid from a supply source of the liquid through the hydrogen dissolution device and the reverse osmosis membrane treatment device to a destination of the liquid, and the bubble generation device generates bubbles in the liquid flowing through the liquid passage path.

[0008] (2) In the liquid treatment device of the present invention, it is preferable that the bubble generation device is connected to at least one of a position in the flow path between the hydrogen dissolution device and the reverse osmosis membrane treatment device and the hydrogen dissolution device.

[0009] (3) The liquid treatment device of the present invention may further include a degassed hydrogen supply passage for supplying hydrogen degassed from the liquid having dissolved hydrogen to the bubble generation device.

[0010] (4) In the liquid treatment device of the present invention, a filter for selectively extracting hydrogen may be provided in the degassed hydrogen supply path.

[0011] (5) In the liquid treatment device of the present invention, the bubble generation device may generate bubbles formed by breaking down hydrogen contained in the liquid into fine particles.

[0012] (6) The liquid treatment device of the present invention has a pumping device for pumping the liquid through the flow path, and a control device, wherein the bubble generation device generates fine bubbles of hydrogen contained in the liquid by reducing the pressure within the liquid, and the control device controls the output of the pumping device in response to the pressure reduction in the bubble generation device so that the pressure of the liquid discharged from the bubble generation device satisfies specified pressure conditions. Effect of the Invention

[0013] According to the present invention, it is possible to realize a liquid treatment device that can prevent the hydrogen concentration of a liquid containing hydrogen from becoming lower than a predetermined minimum concentration before the liquid reaches a supply destination. [Brief description of the drawings]

[0014] [Figure 1] 1 is an explanatory diagram showing a configuration of a water treatment device according to an embodiment of the present invention; [Diagram 2] 2 is a cross-sectional view showing a schematic diagram of a hydrogen dissolving device constituting the water treatment device of FIG. 1. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0015] A liquid treatment device 1 according to one embodiment of the present invention will be described in detail below with reference to the drawings. Although the liquid treatment device 1 can treat various liquids, the liquid treatment device 1 of this embodiment is illustrated as being water. In the following description, the configuration of each part of the liquid treatment device 1 will first be described, followed by the configuration of the flow path S and the arrangement of the bubble generation device 100 in the liquid treatment device 1.

[0016] <Configuration of liquid treatment device 1> As shown in FIG. 1, the liquid treatment device 1 includes a tank 20, a hydrogen dissolving device 30, a reverse osmosis membrane treatment device 40, and a bubble generating device 100, which are connected by piping to form a flow path S. In addition to these components, the liquid treatment device 1 includes a pre-treatment device 10 as a component upstream of the tank 20 in the flow path S. Furthermore, the liquid treatment device 1 includes an electrolytic water tank 50, a pump 60, a heating device 80, a chemical solution supplying device 90, a bubble generating device 100, and the like as components downstream of the tank 20 in the flow path S. The liquid treatment device 1 also includes a control device 200. The configurations of the components that make up the liquid treatment device 1 will be described in more detail below.

[0017] The pretreatment unit 10 pretreats water (raw water 2), such as tap water, well water, or groundwater, supplied from the outside, before it is supplied to the hydrogen dissolution device 30. As pretreatment, the pretreatment unit 10 removes impurities from the raw water 2 and softens the raw water 2. The pretreatment unit 10 includes a prefilter 12, a water softener 14, an activated carbon treatment device 16, and the like.

[0018] The prefilter 12 is for removing impurities from water (raw water 2), such as tap water, well water, or groundwater, supplied from outside the liquid treatment device 1. The prefilter 12 can be composed of an appropriate filter, and is intended to remove impurities such as iron rust and sand particles from hardness components (dissolved solids such as calcium ions and magnesium ions) contained in the raw water 2, for example.

[0019] The water softener 14 is for removing hardness components contained in the raw water 2 through a substitution reaction by ion exchange, thereby performing a process to produce soft water. In the flow path S, the water softener 14 is connected by piping downstream of the prefilter 12. Therefore, the water softener 14 can further remove hardness components from the raw water 2 from which impurities have been removed by the prefilter 12, thereby softening the raw water 2.

[0020] The activated carbon treatment device 16 is connected by piping to the downstream side of the water softener 14 in the flow path S. The raw water 2 that has been softened by the water softener 14 is supplied to the activated carbon treatment device 16. The activated carbon treatment device 16 uses activated carbon, which is a porous adsorbent material, to perform treatment to remove residual chlorine, chloramine, organic matter, and the like contained in the raw water 2 by physical adsorption.

[0021] The tank 20 is connected by piping to the downstream side of the activated carbon treatment device 16 in the flow path S. Therefore, the raw water 2 from which impurities have been removed in the prefilter 12, which has been softened in the water softener 14, and from which substances such as residual chlorine have been removed in the activated carbon treatment device 16 is supplied to and stored in the tank 20.

[0022] The hydrogen dissolving device 30 is connected by piping to the downstream side of the tank 20 in the flow path S. The hydrogen dissolving device 30 produces hydrogen dissolved in the raw water 2 introduced from the tank 20 (dissolved hydrogen water 3). The hydrogen dissolving device 30 may be any device capable of dissolving hydrogen in the raw water 2 to produce the dissolved hydrogen water 3. In this embodiment, the hydrogen dissolving device 30 used is one capable of producing the dissolved hydrogen water 3 having hydrogen dissolved therein by performing an electrolysis process.

[0023] More specifically, as shown in Fig. 2, the hydrogen dissolving apparatus 30 may include a solid polymer membrane 32 and an electrolytic cell 34. The electrolytic cell 34 has an electrolytic cell body 34a, an inlet channel 34b, a water supply channel 34c, and a drainage channel 34d. The hydrogen dissolving apparatus 30 further includes the solid polymer membrane 32, an anode 35, a cathode 36, and a dielectric layer 38 inside the electrolytic cell body 34a.

[0024] The electrolytic cell main body 34a is in the form of a tank capable of storing raw water 2 to be electrolyzed. The inlet passage 34b is for introducing the raw water 2 supplied from the tank 20 into the electrolytic cell main body 34a. The water supply passage 34c is a passage for sending the dissolved hydrogen water 3 generated by the hydrogen dissolving device 30 to the downstream side of the flow path S. The drain passage 34d is a passage for discharging wastewater (dissolved oxygen water) generated by the treatment in the hydrogen dissolving device 30 to the outside.

[0025] The solid polymer membrane 32 functions as an electrolyte in the hydrogen dissolving device 30. The solid polymer membrane 32 is disposed in the approximate center of the electrolytic cell 34 in the short-side direction so as to extend in the longitudinal direction of the electrolytic cell 34. As a result, the internal space of the electrolytic cell 34 is separated into one space and the other space via the solid polymer membrane 32. The solid polymer membrane 32 absorbs oxonium ions (HO) generated on the anode 35 side by electrolysis. + ) toward the cathode 36. The solid polymer membrane 32 may be preferably made of, for example, a fluorine-based resin material having a sulfonic acid group. More specifically, Nafion (manufactured by DuPont), Flemion (manufactured by Asahi Glass Co., Ltd.), Aciplex (manufactured by Asahi Glass Co., Ltd.), or the like may be preferably used as the solid polymer membrane 32.

[0026] The anode 35 and the cathode 36 function as power supplying bodies that supply power to the electrolytic cell 34. The anode 35 and the cathode 36 are arranged to face each other with the solid polymer membrane 32 interposed therebetween. The anode 35 and the cathode 36 are formed using a material such as titanium or platinum. The anode 35 and the cathode 36 are electrically connected to each other.

[0027] The dielectric layer 38 is disposed in the space formed between the solid polymer membrane 32 and the anode 35, and in the space formed between the solid polymer membrane 32 and the cathode 36. The dielectric layer 38 is formed using a material such as titanium or platinum.

[0028] When the raw water 2 is electrolyzed in the hydrogen dissolving device 30, the following reactions occur on the anode 35 side and the cathode 36 side. Anode side: 6H2O → 4H3O + +O2+4e - Cathode side: 4H3O + +4e - →2H2+4H2O

[0029] In the hydrogen dissolving device 30, oxonium ions (HO) are used as a source of hydrogen at the cathode 36. + ) is used, and OH is used during the electrolysis process. - No ions are generated. Therefore, even when the hydrogen dissolving apparatus 30 performs electrolysis at a high current value to increase the amount of dissolved hydrogen, the pH of the treated water does not change. Therefore, the hydrogen dissolving apparatus 30 does not have the inconvenience of suppressing the dissolved hydrogen concentration of the treated water due to the upper limit of pH, and it is possible to perform electrolysis at a desired high current value and improve the dissolved hydrogen concentration of the treated water. As a result, it is possible to obtain treated water having the required dissolved hydrogen concentration.

[0030] The hydrogen dissolving device 30 can output the dissolved hydrogen water 3 generated by the electrolysis process described above to the reverse osmosis membrane treatment device 40 side through the water supply channel 34c formed on the cathode 36 side of the electrolysis cell body 34a. In the flow path S of this embodiment, an electrolytic water tank 50 is provided between the hydrogen dissolving device 30 and the reverse osmosis membrane treatment device 40. Therefore, the dissolved hydrogen water 3 output from the water supply channel 34c of the hydrogen dissolving device 30 is temporarily introduced into and stored in the electrolytic water tank 50 before reaching the reverse osmosis membrane treatment device 40. Meanwhile, the dissolved oxygen water 4 generated on the anode 35 side by the electrolysis process is discharged to the outside of the electrolysis cell body 34a through the drainage channel 34d formed on the anode 35 side.

[0031] The reverse osmosis membrane treatment device 40 is disposed downstream of the hydrogen dissolution device 30 in the flow path S. In this embodiment, the reverse osmosis membrane treatment device 40 is connected by piping downstream of the hydrogen dissolution device 30 via an electrolytic water tank 50. The reverse osmosis membrane treatment device 40 is a device for performing reverse osmosis membrane treatment using a reverse osmosis membrane 42. As shown in FIG. 1, the reverse osmosis membrane treatment device 40 includes a reverse osmosis membrane 42, a reverse osmosis water tank 44, and a reverse osmosis water pump 46.

[0032] The reverse osmosis membrane 42 is for performing reverse osmosis treatment on the dissolved hydrogen water 3 produced by the hydrogen dissolving device 30. When there are solutions with different concentrations with the semipermeable membrane as a boundary, a phenomenon (osmosis) occurs in which water moves from the low-concentration solution to the high-concentration solution. In response to this, by applying pressure to the high-concentration solution with the semipermeable membrane as a boundary, water can be moved from the high-concentration solution to the low-concentration solution, and a phenomenon (reverse osmosis) in which water permeates into the low-concentration solution can be generated. The reverse osmosis membrane 42 is provided for performing a process (reverse osmosis membrane process) to obtain water that has been reverse osmosis (reverse osmosis water) in the reverse osmosis membrane processing device 40.

[0033] The reverse osmosis membrane treatment device 40 can remove impurities such as trace metals by reverse osmosis of the supplied water. The reverse osmosis membrane treatment device 40 can further remove impurities such as trace metals from the dissolved hydrogen water 3 supplied from the hydrogen dissolving device 30 side (electrolyzed water tank 50 in this embodiment). In the liquid treatment device 1 of this embodiment, as described above, at the stage of generating the dissolved hydrogen water 3 in the hydrogen dissolving device 30, impurities have already been removed in the prefilter 12, the water has been softened in the water softener 14, and substances such as residual chlorine have been removed in the activated carbon treatment device 16. Therefore, the liquid treatment device 1 can obtain water (reverse osmosis water) that meets the water quality standard specified in ISO13959 (water standard for dialysis) by performing reverse osmosis treatment on the dissolved hydrogen water 3 using the reverse osmosis membrane treatment device 40. In the liquid treatment device 1, the dissolved hydrogen water 3 generated in the hydrogen dissolving device 30 is also subjected to reverse osmosis treatment by the reverse osmosis membrane treatment device 40. Therefore, the liquid treatment device 1 can obtain reverse osmosis water having hydrogen dissolved therein (reverse osmosis dissolved hydrogen water 5) by performing reverse osmosis treatment in the reverse osmosis membrane treatment device 40.

[0034] The reverse osmosis water tank 44 is provided in the flow path S downstream of the reverse osmosis membrane 42. The reverse osmosis water tank 44 is for storing reverse osmosis water (reverse osmosis dissolved hydrogen water 5) that has been subjected to reverse osmosis membrane treatment by the reverse osmosis membrane 42. The reverse osmosis water pump 46 is for pumping the reverse osmosis dissolved hydrogen water 5 stored in the reverse osmosis water tank 44 toward the dissolution device 110 and the dialysis fluid supply device 120 provided outside the system of the flow path S.

[0035] The reverse osmosis water pump 46 operates at a predetermined timing when the reverse osmosis dissolved hydrogen water 5 is used in the dissolving device 110 and the dialysis fluid supplying device 120, and supplies the water to the dissolving device 110 and the dialysis fluid supplying device 120. As a result, a predetermined dialysis fluid is produced in the dissolving device 110, and the produced dialysis fluid is supplied to the dialysis fluid supplying device 120. The dialysis fluid is supplied from the dialysis fluid supplying device 120 to each patient monitoring device (not shown) and is used to purify the patient's blood.

[0036] The electrolyzed water tank 50 is a tank provided between the hydrogen dissolving device 30 and the reverse osmosis membrane treatment device 40 in the flow path S. The electrolyzed water tank 50 stores the dissolved hydrogen water 3 discharged from the hydrogen dissolving device 30 in preparation for supplying it to the reverse osmosis membrane treatment device 40.

[0037] The pump 60 pumps water through the flow path S. The pump 60 may be provided at any position in the flow path S, but is preferably provided upstream of the reverse osmosis membrane 42 of the reverse osmosis membrane treatment device 40. In this embodiment, the pump 60 is provided downstream of the electrolytic water tank 50 (preferably immediately downstream of the electrolytic water tank 50) and upstream of the reverse osmosis membrane treatment device 40 (preferably immediately upstream of the reverse osmosis membrane treatment device 40). This allows accurate control of the introduction of the water (raw water 2) stored in the tank 20 into the hydrogen dissolution device 30 at a required flow rate. The pump 60 can be output-controllable by an applied current value or the like. In this embodiment, the pump 60 is output-controllable by duty ratio control.

[0038] The liquid treatment device 1 includes a heating device 80 and a chemical liquid supply device 90 as components for cleaning the flow path S that is configured by piping the above-mentioned tank 20, hydrogen dissolving device 30, reverse osmosis membrane treatment device 40, etc.

[0039] The temperature raising device 80 heats and raises the temperature of cleaning liquid (e.g., raw water 2 or a liquid obtained by adding a chemical solution to raw water) supplied to the flow path S during cleaning operation. The liquid treatment device 1 can sterilize or eliminate hydrogen bacteria and the like by supplying the cleaning liquid heated by the temperature raising device 80 to the flow path S. The temperature raising device 80 may be installed in either or both of the tank 20 and the reverse osmosis water tank 44. In the example shown in FIG. 1, a first temperature raising device 80 (first temperature raising device 80a) is provided in the tank 20, and a second temperature raising device 80 (second temperature raising device 80b) is provided in the reverse osmosis water tank 44.

[0040] By providing the first heating device 80a in the tank 20, a large amount of water can be heated at once when heating the water used for cleaning the flow path S, so that the cleaning operation can be performed efficiently. In addition, when the raw water 2 has a high silica content, clogging with silica occurs when the water is passed through the reverse osmosis membrane 42 while the water temperature is low. Therefore, by providing the first heating device 80a in the tank 20, the raw water 2 heated by the first heating device 80a can be supplied for cleaning, and clogging of the reverse osmosis membrane 42 by silica as described above can be suppressed. In addition, by providing the second heating device 80b in the reverse osmosis water tank 44, the water can be kept at an appropriate temperature while stored in the reverse osmosis water tank 44 so that the water used by the patient does not become too low in temperature. Furthermore, by providing the second heating device 80b in the reverse osmosis water tank 44, it is possible to use it to heat cleaning water when flowing cleaning water to clean only the portion of the flow path S downstream of the tank 20, or to use the second heating device 80b to additionally heat the water heated in the first heating device 80a for cleaning, as necessary, when it reaches the reverse osmosis water tank 44.

[0041] The chemical liquid supplying device 90 supplies a chemical liquid used for cleaning the flow path S. The chemical liquid supplying device 90 can be disposed at an appropriate position, for example, by being connected to the tank 20 via a pipe. For example, as shown in Fig. 1, the chemical liquid supplying device 90 can be connected such that a pipe line connected to the tank 20 is provided separately from the pipe line forming the flow path S, and the chemical liquid can be introduced into the tank 20 via the pipe line.

[0042] The air bubble generator 100 is a device that generates air bubbles in the water to be treated. The air bubble generator 100 can be a device that generates ultra-fine bubbles (diameter less than 1 μm), a device that generates microbubbles (diameter 1 μm to 100 μm), a device that generates submillibubbles (diameter 100 μm to 1 mm), a device that generates millibubbles (diameter 1 mm or more), or the like. The air bubble generator 100 may be configured by any device selected from these, but is preferably configured by an ultra-fine bubble generator or a microbubble generator.

[0043] When the air bubble generator 100 is configured by a microbubble generator, for example, a microbubble generator that generates microbubbles by gas phase dispersion caused by liquid flow shear, a microbubble generator that generates microbubbles by cavitation, a microbubble generator that generates microbubbles by a change in gas solubility in liquid, a microbubble generator that generates microbubbles by a phase change of the dispersed phase, etc. can be preferably used. As a microbubble generator that generates microbubbles by gas phase dispersion caused by liquid flow shear, for example, a swirling liquid flow type, a static mixer type, or a micropore type can be preferably used. Also, as a microbubble generator that generates microbubbles by cavitation, an ejector type, a Venturi type, etc. can be preferably used. As a microbubble generator that generates microbubbles by a change in gas solubility in liquid, a pressurized dissolution type (reduced pressure precipitation type) or a cooled dissolution type (heated precipitation type) can be preferably used. As a microbubble generator that generates microbubbles by a phase change of the dispersed phase, a mixed vapor condensation type can be preferably used.

[0044] When the bubble generator 100 is constituted by an ultra-fine bubble generator, for example, one that generates ultra-fine bubbles by reducing interfacial tension, one that generates ultra-fine bubbles by gas-phase dispersion and mixing due to strong liquid shear flow, one that generates ultra-fine bubbles by changing the solubility of gas in liquid, etc. can be suitably used. As one that generates ultra-fine bubbles by reducing interfacial tension, a micropore type can be suitably used. As one that generates ultra-fine bubbles by gas-phase dispersion and mixing due to strong liquid shear flow, a static mixer type or a swirling liquid flow type can be suitably used. As one that generates ultra-fine bubbles by gas-phase dispersion and mixing due to strong liquid shear flow, a pressurized dissolution type (reduced pressure precipitation type) can be suitably used.

[0045] Among the ultra-fine bubble generators or microbubble generators based on the above-mentioned various principles and methods, those that generate fine bubbles from gas contained in liquid (water) can be suitably used as the bubble generator 100. In this embodiment, the bubble generator 100 is configured to generate fine bubbles from gas (hydrogen) contained in liquid (water) by reducing the pressure in the liquid (underwater), such as the above-mentioned ejector type or Venturi type.

[0046] The air bubble generating device 100 is provided so as to generate air bubbles in the water flowing through the flow path S. As will be described in detail later, the air bubble generating device 100 can be installed at an appropriate location, such as midway through the pipeline forming the flow path S, in devices such as the hydrogen dissolving device 30 and the reverse osmosis membrane treatment device 40 provided in the flow path S, or in various members provided in the flow path S such as the tank 20, the electrolytic water tank 50, etc., depending on the purpose and the expected effect.

[0047] The control device 200 controls the operation of the liquid treatment device 1. In addition to a water treatment operation for producing dissolved hydrogen water 5 by reverse osmosis from raw water 2 by the liquid treatment device 1, the control device 200 can also cause a cleaning operation for cleaning the flow path S by passing a cleaning liquid through the flow path S. Under the control of the control device 200, the liquid treatment device 1 of this embodiment can perform an operation for cleaning each part present in the main flow path S1 that mainly constitutes the flow path S (main flow path cleaning operation) and an operation for cleaning the sub-flow path S2 that mainly constitutes the flow path S (sub-flow path cleaning operation), as will be described in detail later.

[0048] <About Flow Path S> The liquid treatment device 1 has a flow path S formed by connecting components such as the tank 20, hydrogen dissolving device 30, reverse osmosis membrane treatment device 40, and air bubble generation device 100 through piping. The flow path S has a main flow path S1 and a sub-flow path S2. The main flow path S1 is connected through piping so as to form a liquid passage path R1 and a circulation path R2. The main flow path S1 is provided with a switching valve 48, and the path through which water flows can be switched between the liquid passage path R1 and the circulation path R2 by switching the switching valve 48.

[0049] The liquid passage path R1 is a path through which liquid passes from a supply source of raw water 2 through the hydrogen dissolving device 30 and the reverse osmosis membrane treatment device 40 toward the liquid destinations, that is, the dissolving device 110 and the dialysis fluid supply device 120. By operating the pump 60 with the switching valve 48 switched so that water flows through the liquid passage path R1, the liquid treatment device 1 can perform an operation (water treatment operation) in which the pumped water is treated in the hydrogen dissolving device 30 and the reverse osmosis membrane treatment device 40 and reverse osmosis dissolved hydrogen water 5 is generated from the raw water 2 and supplied.

[0050] The circulation path R2 is a path through which water passes so as to form a circulation flow in which water circulates through both the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40. The liquid treatment device 1 can perform an operation (main flow path cleaning operation) in which water is circulated through the circulation path R2 and each part in the main flow path S1 is cleaned by operating the pump 60 while the switching valve 48 is switched so that water flows through the circulation path R2. During a maintenance operation, the liquid treatment device 1 can improve the cleaning effect of each part by appropriately supplying a chemical solution from the chemical solution supply device 90 or operating the temperature raising device 80 to raise the temperature of the water. In addition, the connection point downstream of the main path S1 and the circulation path R2 is not limited to the upstream point of the pretreatment device 10 shown in FIG. 1, and can be connected to any point of the main path S1 as appropriate, and the circulation path R2 can be branched and connected to multiple points of the main path S1.

[0051] The sub-flow passage S2 is a flow passage that allows water to pass through a route that is different from the main flow passage S1. In this embodiment, the sub-flow passage S2 includes a first sub-flow passage S21 that constitutes a first discharge path D1 for discharging the dissolved oxygen water 4 from the hydrogen dissolving device 30, and a second sub-flow passage S22 that constitutes a second discharge path D2 for discharging the concentrated water 6 discharged as a residue after removing impurities from the dissolved hydrogen water 3 in the reverse osmosis membrane treatment device 40. The first sub-flow passage S21 and the second sub-flow passage S22 are provided with a first opening / closing valve 39 and a second opening / closing valve 49, respectively. The dissolved oxygen water 4 can be discharged from the hydrogen dissolving device 30 by opening the first opening / closing valve 39. The concentrated water 6 can be discharged from the reverse osmosis membrane treatment device 40 by opening the second opening / closing valve 49.

[0052] A degassed hydrogen supply channel G is connected to the flow path S. The degassed hydrogen supply channel G supplies hydrogen degassed from the water flowing through the flow path S to the bubble generator 100. One end of the degassed hydrogen supply channel G is connected to the hydrogen dissolving device 30, or downstream of the hydrogen dissolving device 30 in the flow path S in the water flow direction. The other end of the degassed hydrogen supply channel G is connected to a location where hydrogen flowing through the degassed hydrogen supply channel G can be supplied to the bubble generator 100, such as the bubble generator 100 or a position upstream of the bubble generator 100 in the flow path S. In the example shown in FIG. 1, one end of the degassed hydrogen supply channel G is directly connected to the hydrogen dissolving device 30, and the other end is directly connected to the bubble generator 100. In the example shown in FIG. 1, the degassed hydrogen supply channel G is provided with a filter 104 that selectively extracts hydrogen.

[0053] <Regarding the arrangement of the air bubble generation device 100> The bubble generating device 100 can be provided in the pipelines constituting the liquid passage path R1, the circulation path R2, the first discharge path D1, and the second discharge path D2 in the main flow path S1 and the sub-flow path S2, and in devices and instruments provided in these paths. For example, the bubble generating device 100 can be provided in the portion constituting the liquid passage path R1 of the flow path S (main flow path S1), in devices and instruments such as the pretreatment device 10, the tank 20, the hydrogen dissolving device 30, the reverse osmosis membrane treatment device 40 (reverse osmosis water tank 44), and the electrolytic water tank 50, at a position X1 upstream of the pretreatment device 10, at a position X2 between the pretreatment device 10 and the tank 20, at a position X3 between the tank 20 and the hydrogen dissolving device 30, at a position X4 between the hydrogen dissolving device 30 and the electrolytic water tank 50, at a position X5 between the electrolytic water tank 50 and the pump 60, and in the pipelines constituting the liquid passage path R1 of the flow path S (main flow path S1). The bubble generating device 100 can be provided at a position X5, a position X6 between the pump 60 and the reverse osmosis membrane 42, a position X7 between the reverse osmosis membrane 42 and the reverse osmosis water tank 44, a position X8 between the reverse osmosis water tank 44 and the reverse osmosis water pump 46, a position X9 of the pipe connected to the downstream side of the reverse osmosis membrane treatment device 40 (pump 60), etc. Also, the bubble generating device 100 can be provided at a position X10 on the pipe connecting the reverse osmosis membrane treatment device 40 and the pretreatment device 10 in the part forming the circulation path R2 of the flow path S (main flow path S1). Also, the bubble generating device 100 can be provided at a position Y1 on the pipe forming the first discharge path D1 of the flow path S (sub-flow path S2), a position Y2 on the pipe forming the second discharge path D2, etc. Also, the bubble generating device 100 can be provided at only one location or at multiple locations.

[0054] As described above, in the liquid treatment device 1, the bubble generator 100 can be installed at an appropriate location depending on the purpose and the expected effect. Specifically, the bubble generator 100 can be installed in the flow path S for the purpose of suppressing the hydrogen concentration of the reverse osmosis dissolved hydrogen water 5, in which hydrogen is contained in water, from becoming lower than a predetermined minimum concentration before it reaches the supply destination, the dissolution device 110 or the dialysis fluid supply device 120 (hydrogen concentration reduction suppression effect). When the bubble generator 100 is provided for the purpose of suppressing the hydrogen concentration reduction, it is preferable that the bubble generator 100 is provided in a pipe constituting the liquid passage path R1 through which water flows during water treatment operation, and in a device or instrument provided midway along the liquid passage path R1. Specifically, when the objective is to suppress the reduction in hydrogen concentration, the bubble generation device 100 should be provided in devices and equipment such as the pretreatment device 10, the tank 20, the hydrogen dissolution device 30, the reverse osmosis membrane treatment device 40 (reverse osmosis water tank 44), the electrolytic water tank 50, and at least one of the above-mentioned positions X1 to X9. Furthermore, when the objective is to suppress the reduction in hydrogen concentration, the bubble generation device 100 should be provided in the hydrogen dissolution device 30 that dissolves hydrogen in the raw water 2, or further downstream of this.

[0055] Furthermore, when the bubble generation device 100 is of the above-mentioned ejector type or Venturi type, which generates bubbles by reducing the pressure in the liquid (underwater) to produce fine bubbles from the gas (hydrogen) contained in the liquid (water), a pressure drop occurs in the bubble generation device 100. To achieve a compensation effect for the pressure drop in the bubble generation device 100 (pressure drop compensation effect), it is preferable to provide the bubble generation device 100 upstream in the water flow direction relative to a pump 60 or a pumping device such as a reverse osmosis water pump 46. Specifically, to achieve a pressure drop compensation effect, the bubble generation device 100 is preferably provided at a position X5 located upstream of the pump 60, or immediately before the pump 60 in the water flow direction, such as an electrolytic water tank 50 connected to the pump 60 by piping. Therefore, when the objective is to obtain both the effect of suppressing the hydrogen concentration decrease during the water treatment operation and the effect of compensating for the pressure drop, the bubble generating device 100 may be provided at either or both of the position X5 immediately before the pump 60 in the water flow direction and the hydrogen dissolving device 30 as shown in the example of FIG. 1. In addition, in order to detect the pressure drop accurately and in a timely manner, a device capable of measuring the flow rate or water pressure may be provided at any point in the main flow path S1, or a configuration may be adopted in which the measured values ​​of the flow rate or water pressure detected by the dissolving device 110, the dialysis fluid supplying device 120, or other external devices can be fed back to the control device 200 (not shown). In this case, the control device 200 compares the measured values ​​with a predetermined reference value of the flow rate or water pressure, and controls the pumping device so that the measured values ​​are always close to the reference values, thereby obtaining the effect of compensating for the pressure drop in a more timely manner.

[0056] Furthermore, when the objective is to improve the cleaning effect of each part of the liquid treatment device 1 by the bubbles generated in the bubble generation device 100, the bubble generation device 100 may be provided in each part constituting the main flow path S1 or in the sub-flow path S2. Specifically, when the objective is to improve the cleaning effect when water is circulated in the circulation route R2 and an operation (main flow path cleaning operation) is performed to clean each part in the main flow path S1, the bubble generation device 100 may be provided in devices and instruments such as the pretreatment device 10, the tank 20, the hydrogen dissolving device 30, the reverse osmosis membrane treatment device 40 (reverse osmosis water tank 44), the electrolytic water tank 50, and at least one of the above-mentioned positions X1 to X10.

[0057] Furthermore, in the case where the purpose is to perform an operation (sub-flow path cleaning operation) for cleaning the sub-flow path S2 that cannot be reached by simply circulating cleaning water or a chemical solution in the circulation path R2 by the main flow path cleaning operation, the bubble generator 100 may be provided at a position Y1 on the first discharge path D1, a position Y2 on the pipe constituting the second discharge path D2, etc. In the case where the liquid treatment device 1 can communicate between the main flow path S1 and the sub-flow path S2 by opening the first on-off valve 39 and the second on-off valve 49, etc., it is preferable to provide the bubble generator 100 at a position upstream of the communication point between the main flow path S1 and the sub-flow path S2 in the main flow path S1, so that water containing bubbles generated in the main flow path S1 can be supplied to the sub-flow path S2, thereby enabling the sub-flow path cleaning operation to be performed. 1, in this embodiment, the air bubble generation device 100 is provided at position X5, and a bypass flow path 102 is provided to bypass the air bubble generation device 100 or a pipeline downstream of the air bubble generation device 100 and the pipeline of the sub-flow path S2 (first sub-flow path S21) constituting the first discharge path D1. This makes it possible to supply water containing air bubbles generated in the air bubble generation device 100 provided at position X5 to the first discharge path D1 for cleaning.

[0058] 1 shows an example in which the bypass flow path 102 is provided so as to reach the first discharge path D1, but the present invention is not limited to this. For example, the liquid treatment device 1 may be configured so that the sub-path cleaning operation can be performed by providing the bypass flow path 102 so as to reach the second discharge path D2 instead of the first discharge path D1, by providing a plurality of bypass flow paths 102 and connecting them to both the first discharge path D1 and the second discharge path D2, by branching the bypass flow path 102 and connecting it to both the first discharge path D1 and the second discharge path D2, or the like.

[0059] <About the effects> Considering the above-described embodiment and each example, the present invention has the characteristic configurations as shown in (1) to (8) below, and provides effects unique to the present invention.

[0060] (a) The above-mentioned liquid treatment device 1 comprises a hydrogen dissolution device 30 that dissolves hydrogen in the liquid, a reverse osmosis membrane treatment device 40 that performs reverse osmosis membrane treatment on the liquid, a bubble generation device 100 that generates bubbles in the liquid, and a flow path S formed by connecting the hydrogen dissolution device 30, the reverse osmosis membrane treatment device 40, and the bubble generation device 100 in a manner that allows liquid to pass through. The flow path S has a liquid passage path R1 that allows liquid to pass from a liquid source through the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40 to a liquid destination, and the bubble generation device 100 generates bubbles in the liquid flowing through the liquid passage path R1.

[0061] Since the liquid treatment device 1 is configured as described above in (a), the hydrogen dissolved in the liquid by the hydrogen dissolving device 30 can be retained in the liquid by using the bubble generating device 100 to generate bubbles in the liquid (water in the above embodiment; the same applies below) flowing through the liquid passage R1. This allows the liquid treatment device 1 to prevent the hydrogen dissolved in the liquid by the hydrogen dissolving device 30 from being degassed and lost, and to maintain the hydrogen concentration in the liquid high for a long time. Therefore, the liquid treatment device 1 can prevent the hydrogen concentration of the hydrogen-containing liquid from becoming lower than a predetermined minimum concentration before it reaches the supply destination.

[0062] (b) In the above-mentioned liquid treatment device 1, the bubble generation device 100 is connected to at least one of a position between the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40 in the flow path S (positions X4 to X6 in the example shown in Figure 1) and the hydrogen dissolution device 30.

[0063] Since the liquid treatment device 1 is configured as described above in (b), the hydrogen dissolved in the liquid by the hydrogen dissolving device 30 can be bubbled immediately after dissolution. This allows the liquid treatment device 1 to more efficiently suppress degassing of the hydrogen dissolved in the liquid by the hydrogen dissolving device 30, and maintain the hydrogen concentration in the liquid high for a long period of time.

[0064] (c) The liquid treatment device 1 described above has a degassed hydrogen supply passage G that supplies the hydrogen degassed from the liquid having hydrogen dissolved therein to the gas bubble generation device 100.

[0065] Since the liquid treatment device 1 is configured as described above in (c), it can use hydrogen degassed from the liquid to generate bubbles containing hydrogen in the liquid in the bubble generation device 100. This allows the liquid treatment device 1 to suppress a decrease in the hydrogen concentration in the liquid that accompanies degassing.

[0066] (d) In the liquid treatment device 1 described above, the filter 104 for selectively extracting hydrogen is provided in the degassed hydrogen supply path G.

[0067] Since the liquid treatment device 1 is configured as described above in (d), it can selectively extract hydrogen from the gas that has flowed into the degassed hydrogen supply passage G and supply it to the bubble generation device 100. This allows the liquid treatment device 1 to more reliably maintain and promote an increase in the hydrogen concentration in the liquid.

[0068] (e) In the liquid treatment device 1 described above, the bubble generation device 100 generates bubbles made by breaking down hydrogen contained in the liquid into fine particles.

[0069] Since the liquid treatment device 1 is configured as described above in (e), it is possible to break down the hydrogen dissolved in the liquid by the hydrogen dissolution device 30 into fine particles, thereby promoting the maintenance and increase of the hydrogen concentration in the liquid.

[0070] (f) The above-mentioned liquid treatment device 1 has a pump 60 (pressure-feeding device) that pressurizes the liquid through a flow path S, and a control device 200, and the bubble generation device 100 generates fine bubbles of hydrogen contained in the liquid by reducing the pressure in the liquid, and the control device 200 controls the output of the pump 60 (pressure-feeding device) in response to the pressure reduction in the bubble generation device 100 so that the pressure of the liquid discharged from the bubble generation device 100 satisfies specified pressure conditions.

[0071] Since the liquid treatment device 1 is configured as described above in (f), even if the pressure in the liquid is reduced by atomizing the hydrogen dissolved in the liquid by the hydrogen dissolving device 30, the reduced pressure in the liquid can be restored by the pump 60 (pressure-feeding device). This allows the liquid treatment device 1 to supply the liquid (reverse osmosis dissolved hydrogen water 5) to the liquid supply destination (the dissolving device 110 or the dialysis fluid supply device 120 in the above embodiment) while maintaining a predetermined pressure level.

[0072] (g) The above-mentioned liquid treatment device 1 comprises a hydrogen dissolution device 30 which dissolves hydrogen in the liquid, a reverse osmosis membrane treatment device 40 which performs reverse osmosis membrane treatment on the liquid, a bubble generation device 100 which generates bubbles in the liquid, and a flow path S formed by connecting the hydrogen dissolution device 30, the reverse osmosis membrane treatment device 40, and the bubble generation device 100 in a liquid-permeable manner, the flow path S having a main flow path S1 which passes the liquid through both the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40, and a sub-flow path S2 which passes the liquid through a path away from the main flow path S1, and the liquid containing bubbles generated by the bubble generation device 100 can be passed through the sub-flow path S2.

[0073] Since the liquid treatment device 1 is configured as described above in (g), the liquid generated by the bubble generation device 100 can pass not only through the main flow path S1 but also through the sub-flow path S2. As a result, when performing a cleaning operation using water, a chemical solution, etc., the liquid treatment device 1 can perform cleaning by utilizing bubbles generated by the bubble generation device 100 not only in an operation for cleaning the various parts present in the main flow path S1 (main flow path cleaning operation) but also in an operation for cleaning the sub-flow path S2 (sub-flow path cleaning operation).

[0074] (h) The above-mentioned liquid treatment device 1 has a main flow path S1 capable of forming a circulation flow in which liquid circulates through a path that passes through both the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40, and is capable of performing a main flow path cleaning operation in which the configuration including the main flow path S1, the hydrogen dissolution device 30, and the reverse osmosis membrane treatment device 40 is cleaned by circulating liquid through the main flow path S1 to form a circulating flow, and a sub-flow path cleaning operation in which the configuration including the sub-flow path S2 is cleaned by passing liquid containing bubbles generated by the bubble generation device 100 through the sub-flow path S2.

[0075] Since the liquid treatment device 1 is configured as described above in (h), it not only cleans the main flow path S1 by performing a main flow path cleaning operation, but also performs a sub-flow path cleaning operation, which makes it possible to clean the sub-flow path S2, which is difficult to clean by performing only the main flow path cleaning operation, by utilizing liquid containing bubbles generated by the bubble generation device 100.

[0076] (i) The above-mentioned liquid treatment device 1 has a bubble generation device 100 provided in the main flow path S1, and when the main flow path S1 and the sub-flow path S2 are connected, a liquid containing bubbles generated by the bubble generation device 100 is caused to flow into the main flow path S1 and the sub-flow path S2, thereby enabling main flow path cleaning operation and sub-flow path cleaning operation to be performed.

[0077] The liquid treatment device 1 is configured as described above in (i), and therefore can perform both main flow path cleaning operation and sub-flow path cleaning operation using liquid containing bubbles generated in the bubble generation device 100 provided in the main flow path S1. Therefore, by configuring the liquid treatment device 1 as described above in (i), the bubble generation device 100 can be used for both cleaning the main flow path S1 and cleaning the sub-flow path S2.

[0078] (j) In the liquid treatment device 1 described above, the air bubble generation device 100 is connected to the sub-channel S2.

[0079] As described in the above embodiment, the liquid treatment device 1 can be configured as in (j) above by being provided at position Y1 on the pipe constituting the first discharge path D1 of the flow path S (sub-flow path S2), position Y2 on the pipe constituting the second discharge path D2, etc. By employing the configuration (j) above, the liquid treatment device 1 can generate liquid containing bubbles generated by the bubble generation device 100 in the sub-flow path S2, thereby further improving the cleaning efficiency of the sub-flow path S2.

[0080] The above-described liquid treatment device 1 merely shows one embodiment of the present invention, and the configuration can be appropriately changed, omitted, added, etc., without departing from the spirit of the present invention. When the liquid treatment device 1 is configured as shown in Fig. 1, it can achieve both the purpose of preventing the hydrogen concentration of the hydrogen-containing liquid from becoming lower than a predetermined minimum concentration before it reaches the supply destination, and the purpose of enabling cleaning of the sub-flow path S2. However, if it is sufficient to achieve only one of these purposes, for example, it is possible for the liquid treatment device 1 not to satisfy either one of the above configurations (a) and (g).

[0081] In the above embodiment, as in (b) above, an example has been shown in which the bubble generating device 100 is connected to at least one of a position in the flow path S between the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40 (positions X4 to X6 in the example shown in Figure 1) and to the hydrogen dissolution device 30, but the present invention is not limited to this, and it is also possible to configure the bubble generating device 100 to be provided at other positions (X1 to X3, X7 to X10, Y1, Y2 in the example shown in Figure 1), etc.

[0082] In the liquid treatment device 1 of the above embodiment, a configuration in which a degassed hydrogen supply path G is provided as shown in (c) above is exemplified, but the present invention is not limited to this, and it is also possible to have a device that does not include a degassed hydrogen supply path G.

[0083] In the above embodiment, as in (d) above, the filter 104 for selectively extracting hydrogen is provided in the degassed hydrogen supply path G, but the present invention is not limited to this. The liquid treatment device 1 may not be provided with the filter 104 in the degassed hydrogen supply path G.

[0084] In the above embodiment, as in (e) above, the bubble generation device 100 that generates bubbles made by breaking down hydrogen contained in the liquid is used as an example, but the present invention is not limited to this. For example, as exemplified in the above embodiment, the liquid treatment device 1 can also be a bubble generation device 100 that generates bubbles in the liquid using other principles or methods.

[0085] In the above embodiment, as in (f) above, the bubble generating device 100 is used to generate bubbles of fine hydrogen contained in the liquid by reducing the pressure in the liquid, and the control device 200 controls the output of the pump 60 (pressure-feeding device) so that the pressure of the liquid sent from the bubble generating device 100 satisfies a predetermined pressure condition in response to the pressure reduction in the bubble generating device 100, but the present invention is not limited to this. For example, in cases where the supply pressure of the liquid to the dissolving device 110 and the dialysis fluid supplying device 120 can be sufficiently secured without controlling the output of the pump 60, where a reduction in the supply pressure is not a problem, or where the liquid can be pressurized and pumped in another device provided downstream of the liquid processing device 1, the configuration as in (f) above may not be provided.

[0086] The liquid treatment device 1 of the above embodiment utilizes the liquid containing bubbles generated by the bubble generating device 100 in both the main flow path cleaning operation for cleaning the main flow path S1 and the sub-flow path cleaning operation for cleaning the sub-flow path S2 as described above in (h), but the present invention is not limited thereto. For example, if the liquid treatment device 1 can achieve the purpose of suppressing the hydrogen concentration of the hydrogen-containing liquid from becoming lower than a predetermined minimum concentration before it reaches the supply destination, and if it is not necessary to achieve the purpose of cleaning the sub-flow path S2, it is possible to configure the liquid treatment device 1 to supply the liquid containing bubbles generated by the bubble generating device 100 only to the main flow path S1 and not to the sub-flow path S2. Also, if the liquid treatment device 1 can achieve the purpose of cleaning the sub-flow path S2 by utilizing the bubbles generated by the bubble generating device 100, and if it is not necessary to utilize the bubbles generated by the bubble generating device 100 in cleaning the main flow path S1, it is preferable to configure the liquid treatment device 1 to supply the liquid containing bubbles generated by the bubble generating device 100 only to the sub-flow path S2.

[0087] In the above embodiment, as in (i) above, an example has been shown in which the air bubble generation device 100 provided in the main flow path S1 is configured to perform both the main flow path cleaning operation and the sub-flow path cleaning operation using the liquid containing bubbles generated in the air bubble generation device 100 provided in the main flow path S1, but the liquid treatment device 1 does not necessarily have to be configured in this way. For example, the liquid treatment device 1 can also perform the main flow path cleaning operation using the air bubble generation device 100 provided in the main flow path S1, and also perform the sub-flow path cleaning operation using a separate air bubble generation device 100 provided in the sub-flow path S2.

[0088] In the above embodiment, as in (j) above, an example was shown in which the air bubble generation device 100 can be connected to the sub-channel S2, but the present invention is not limited to this. As in the example shown in Fig. 1 etc., it is also possible to have only the air bubble generation device 100 connected to the main channel S1 without having the air bubble generation device 100 connected to the sub-channel S2.

[0089] The present invention is not limited to the configurations described in the above-mentioned embodiments, etc., and can be appropriately modified in design, etc., within the scope of the technical idea of ​​the present invention. The components of the above-mentioned embodiments and modifications may be arbitrarily selected and combined. Any component of each embodiment or modification may be arbitrarily combined with any component described in the means for solving the problems, the mode for carrying out the invention, etc., or any component that embodies any component described in the means for solving the problems, the mode for carrying out the invention, etc. The present invention also intends to obtain rights to these in this application or in a divisional application based on this application, etc. [Industrial Applicability]

[0090] The present invention can be suitably used in all water treatment devices including a hydrogen dissolving device and a reverse osmosis membrane treatment device. [Explanation of symbols]

[0091] 1: Liquid treatment equipment 5: Reverse osmosis dissolved hydrogen water 30: Hydrogen dissolving device 40: Reverse osmosis membrane treatment device 60: Pump 100: Bubble generating device 104: Filter 110: Melting equipment 120: Dialysate supply device 200: Control device D1: First excretion route D2:Second discharge route G: Degassed hydrogen supply channel R1: Liquid passage R2: Circulation route S: Flow path S1:Main flow path S2: Sub-channel

Claims

1. A hydrogen dissolving device for dissolving hydrogen in a liquid; a reverse osmosis membrane treatment device that performs reverse osmosis membrane treatment on the liquid; A bubble generating device for generating bubbles in the liquid; a flow path formed by connecting the hydrogen dissolution device, the reverse osmosis membrane treatment device, and the air bubble generation device in a liquid-passable manner; having the flow path is a liquid passage that allows the liquid to flow through a path from a supply source of the liquid through the hydrogen dissolution device and the reverse osmosis membrane treatment device toward a supply destination of the liquid, The liquid treatment device, characterized in that the air bubble generating device generates air bubbles in the liquid flowing through the liquid passage.

2. The liquid treatment device according to claim 1 , characterized in that the bubble generation device is connected to at least one of a position in the flow path between the hydrogen dissolution device and the reverse osmosis membrane treatment device and the hydrogen dissolution device.

3. 3. The liquid treatment device according to claim 1, further comprising a degassed hydrogen supply passage for supplying hydrogen degassed from the liquid having dissolved therein to the bubble generation device.

4. 4. The liquid treatment device according to claim 3, wherein a filter for selectively extracting hydrogen is provided in the degassed hydrogen supply path.

5. 3. The liquid treatment device according to claim 1, wherein the bubble generating device generates bubbles formed by breaking down hydrogen contained in the liquid into fine particles.

6. a pumping device that pumps the liquid through the flow path; A control device; having The bubble generating device generates fine bubbles of hydrogen contained in the liquid by reducing the pressure in the liquid, 3. A liquid treatment device as described in claim 1 or 2, characterized in that the control device controls the output of the pressure-feeding device in response to a pressure drop in the bubble generation device so that the pressure of the liquid discharged from the bubble generation device satisfies a predetermined pressure condition.

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