Liquid treatment device

Abstract

To provide a liquid treatment device capable of washing a sub-flow passage sufficiently, which is equipped with a main flow passage that allows liquid to pass through a route in which the liquid passes through a hydrogen dissolving device, etc., for dissolving hydrogen, and the sub-flow passage that allows water to pass in a route deviated from the main flow passage.SOLUTION: A liquid treatment device 1 includes: a hydrogen dissolving device 30; a reverse osmosis membrane treatment device 40; a bubble generation device 100 for generating bubbles in liquid; and a flow passage S formed by connecting the hydrogen dissolving device 30, the reverse osmosis membrane treatment device 40, and the bubble generation device 100 so as to enable passage of the liquid. The flow passage S includes a main flow passage S1 that allows liquid to pass in a route passing through both the hydrogen dissolving device 30 and the reverse osmosis membrane treatment device 40, and a sub-flow passage S2 that allows liquid to pass in a route deviated from the main flow passage S1. The liquid containing bubbles generated by the bubble generation device 100 is allowed to pass through the sub-flow passage S2.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a liquid treatment device. [Background technology]

[0002] In recent years, it has been known that oxidative stress occurs in dialysis patients during hemodialysis. This is thought to be caused by reactive oxygen species generated during dialysis, and it has been proposed to reduce oxidative stress by eliminating this reactive oxygen species.

[0003] Based on this knowledge, a method has been proposed for producing a dialysis solution with a high concentration of dissolved hydrogen, for example, by dissolving hydrogen in purified water (hereinafter referred to as "reverse osmosis water") that has been treated with a reverse osmosis membrane (RO membrane). By using this dialysis solution, the hydrogen can react with hydroxyl radicals in the body, suppressing oxidative stress and inflammatory reactions. As an apparatus for producing dialysis water by diluting a powder to produce such a dialysis solution, for example, a dialysis water production apparatus as disclosed in Patent Document 1 listed below has been provided. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 9-77672 Summary of the Invention [Problem to be solved by the invention]

[0005] The present inventors have studied a configuration for performing cleaning for maintenance in a dialysis water production apparatus such as that disclosed in Patent Document 1. In the dialysis water production apparatus of Patent Document 1, cleaning operation can be performed by circulating cleaning water or chemicals in a flow path (main flow path) composed of devices and equipment such as an electrolytic cell and pipes connected to these devices. However, with such a configuration, the inventors have found that cleaning water and chemicals do not flow in a sub-flow path that passes water via a route outside the main flow path, such as a pipe for discharging water with dissolved oxygen from an electrolytic cell, and therefore cleaning may be more difficult in this sub-flow path than in the main flow path.

[0006] Therefore, the present invention aims to realize a liquid treatment device that is equipped with a main flow path that passes through a hydrogen dissolving device or the like to dissolve hydrogen, and a secondary flow path that passes through a path that deviates from the main flow path and allows water to pass, while also being able to thoroughly clean the secondary flow path. [Means for solving the problem]

[0007] (1) The liquid treatment device of the present invention comprises a hydrogen dissolution device that dissolves hydrogen in a liquid, a reverse osmosis membrane treatment device that performs reverse osmosis membrane treatment on the liquid, a bubble generation device that generates bubbles in the liquid, and a flow path formed by connecting the hydrogen dissolution device, the reverse osmosis membrane treatment device, and the bubble generation device so that the liquid can pass through, wherein the flow path has a main flow path that passes the liquid through both the hydrogen dissolution device and the reverse osmosis membrane treatment device, and a sub-flow path that passes the liquid through a path that deviates from the main flow path, and the liquid containing the bubbles generated by the bubble generation device can be passed through the sub-flow path.

[0008] (2) In the liquid treatment device of the present invention, the main flow path is capable of forming a circulation flow in which the liquid circulates through a path that passes through both the hydrogen dissolution device and the reverse osmosis membrane treatment device, and by circulating the liquid through the main flow path to form the circulation flow, a main flow path cleaning operation can be performed in which the configuration including the main flow path, the hydrogen dissolution device, and the reverse osmosis membrane treatment device is cleaned, and a sub-flow path cleaning operation can be performed in which the configuration including the sub-flow path is cleaned by passing a liquid containing bubbles generated by the bubble generation device through the sub-flow path.

[0009] (3) The liquid treatment device of the present invention is preferably such that the bubble generation device is provided in the main flow path, and when the main flow path and the secondary flow path are connected, the main flow path cleaning operation and the secondary flow path cleaning operation can be performed by flowing a liquid containing bubbles generated by the bubble generation device into the main flow path and the secondary flow path.

[0010] (4) In the liquid treatment device of the present invention, the bubble generation device may be connected to the sub-channel.

[0011] (5) In the liquid treatment device of the present invention, it is preferable that the bubble generation device is connected to at least one of a position in the flow path between the hydrogen dissolution device and the reverse osmosis membrane treatment device and the hydrogen dissolution device.

[0012] (6) The liquid treatment device of the present invention may preferably have a degassed hydrogen supply passage for supplying hydrogen degassed from the liquid having dissolved hydrogen to the bubble generation device.

[0013] (7) In the liquid treatment device of the present invention, it is preferable that a filter for selectively extracting hydrogen is provided in the degassed hydrogen supply path.

[0014] (8) In the liquid treatment device of the present invention, the bubble generating device may generate bubbles formed by breaking down hydrogen contained in the liquid into fine particles.

[0015] (9) The liquid treatment device of the present invention preferably includes a pumping device that pumps the liquid through the flow path and a control device, wherein the bubble generation device generates bubbles of finely divided hydrogen contained in the liquid by reducing the pressure within the liquid, and the control device controls the output of the pumping device in response to the pressure reduction in the bubble generation device so that the pressure of the liquid discharged from the bubble generation device satisfies predetermined pressure conditions. [Effects of the Invention]

[0016] According to the present invention, a liquid treatment device can be realized that has a main flow path through which liquid passes, passing through a hydrogen dissolving device or the like for dissolving hydrogen, and a secondary flow path through which water passes, leaving the main flow path, and that can thoroughly clean the secondary flow path. [Brief explanation of the drawings]

[0017] [Figure 1] 1 is an explanatory diagram showing a configuration of a water treatment device according to an embodiment of the present invention. [Figure 2] FIG. 2 is a cross-sectional view schematically showing a hydrogen dissolving device that constitutes the water treatment device of FIG. DETAILED DESCRIPTION OF THE INVENTION

[0018] A liquid treatment device 1 according to one embodiment of the present invention will be described in detail below with reference to the drawings. Although the liquid treatment device 1 can treat various types of liquid, the liquid treatment device 1 of this embodiment will be described as treating water as an example. In the following description, the configuration of each part of the liquid treatment device 1 will first be described, followed by the configuration of the flow path S and the arrangement of the bubble generation device 100 in the liquid treatment device 1.

[0019] <Configuration of liquid treatment device 1> As shown in FIG. 1 , liquid treatment device 1 includes tank 20, hydrogen dissolving device 30, reverse osmosis membrane treatment device 40, and bubble generation device 100, which are connected by piping to form flow path S. In addition to these components, liquid treatment device 1 also includes pre-treatment device 10 as a component upstream of tank 20 in flow path S. Liquid treatment device 1 also includes electrolyzed water tank 50, pump 60, heating device 80, chemical solution supply device 90, bubble generation device 100, etc. as components downstream of tank 20 in flow path S. Liquid treatment device 1 also includes control device 200. The configuration of each component of liquid treatment device 1 will be described in more detail below.

[0020] The pretreatment unit 10 pretreats water (raw water 2) supplied from outside, such as tap water, well water, or groundwater, before supplying it to the hydrogen dissolution device 30. As pretreatment, the pretreatment unit 10 removes impurities from the raw water 2 and softens the raw water 2. The pretreatment unit 10 includes a prefilter 12, a water softener 14, an activated carbon treatment device 16, and the like.

[0021] Prefilter 12 is used to remove impurities from water (raw water 2), such as tap water, well water, or groundwater, supplied from outside liquid treatment device 1. Prefilter 12 can be configured with an appropriate filter, but is intended to be capable of removing impurities such as iron rust and sand particles from hardness components (dissolved solids such as calcium ions and magnesium ions) contained in raw water 2, for example.

[0022] The water softener 14 is used to remove hardness components contained in the raw water 2 through a substitution reaction by ion exchange, thereby producing soft water. In the flow path S, the water softener 14 is connected by piping downstream of the prefilter 12. Therefore, the water softener 14 can further remove hardness components from the raw water 2 from which impurities have been removed by the prefilter 12, thereby softening the raw water 2.

[0023] The activated carbon treatment device 16 is connected to the flow path S downstream of the water softener 14. The raw water 2 that has been softened by the water softener 14 is supplied to the activated carbon treatment device 16. The activated carbon treatment device 16 uses activated carbon, which is a porous adsorbent material, to perform treatment to remove residual chlorine, chloramine, organic matter, and the like contained in the raw water 2 through physical adsorption.

[0024] The tank 20 is connected by piping to the downstream side of the activated carbon treatment device 16 in the flow path S. Therefore, the raw water 2 from which impurities have been removed in the prefilter 12, which has been softened in the water softener 14, and from which substances such as residual chlorine have been removed in the activated carbon treatment device 16 is supplied to and stored in the tank 20.

[0025] The hydrogen dissolving device 30 is connected to the flow path S downstream of the tank 20. The hydrogen dissolving device 30 produces hydrogen-dissolved water 3 by dissolving hydrogen in the raw water 2 introduced from the tank 20. The hydrogen dissolving device 30 may be any device that can dissolve hydrogen in the raw water 2 to produce the dissolved hydrogen water 3. In this embodiment, the hydrogen dissolving device 30 is one that can produce the dissolved hydrogen water 3 by performing electrolysis processing.

[0026] 2, the hydrogen dissolving apparatus 30 may include a solid polymer membrane 32 and an electrolytic cell 34. The electrolytic cell 34 includes an electrolytic cell body 34a, an inlet channel 34b, a water supply channel 34c, and a drainage channel 34d. The hydrogen dissolving apparatus 30 also includes the solid polymer membrane 32, an anode 35, a cathode 36, and a dielectric layer 38 inside the electrolytic cell body 34a.

[0027] The electrolytic cell main body 34a is a tank-shaped body capable of storing raw water 2 to be electrolyzed. The inlet path 34b is for introducing the raw water 2 supplied from the tank 20 into the electrolytic cell main body 34a. The water supply path 34c is a path for sending the dissolved hydrogen water 3 produced by the hydrogen dissolution device 30 to the downstream side of the flow path S. The drainage path 34d is a path for discharging wastewater (dissolved oxygen water) produced by the treatment in the hydrogen dissolution device 30 to the outside.

[0028] The solid polymer membrane 32 functions as an electrolyte in the hydrogen dissolving device 30. The solid polymer membrane 32 is disposed in the approximate center of the electrolytic cell 34 in the lateral direction so as to extend in the longitudinal direction of the electrolytic cell 34. As a result, the internal space of the electrolytic cell 34 is separated into a space on one side and a space on the other side via the solid polymer membrane 32. The solid polymer membrane 32 absorbs oxonium ions (HO) generated on the anode 35 side by electrolysis. + ) toward the cathode 36. The solid polymer membrane 32 can be suitably made of, for example, a fluorine-based resin material having a sulfonic acid group. More specifically, Nafion (manufactured by DuPont), Flemion (manufactured by Asahi Glass Co., Ltd.), Aciplex (manufactured by Asahi Glass Co., Ltd.), or the like can be suitably used as the solid polymer membrane 32.

[0029] The anode 35 and the cathode 36 function as power supply elements that supply power to the electrolytic cell 34. The anode 35 and the cathode 36 are arranged to face each other with the solid polymer membrane 32 interposed therebetween. The anode 35 and the cathode 36 are made of a material such as titanium or platinum. The anode 35 and the cathode 36 are electrically connected.

[0030] The dielectric layer 38 is disposed in the space formed between the solid polymer membrane 32 and the anode 35, and in the space formed between the solid polymer membrane 32 and the cathode 36. The dielectric layer 38 is formed using a material such as titanium or platinum.

[0031] When the raw water 2 is electrolyzed in the hydrogen dissolving device 30, the following reactions occur on the anode 35 side and the cathode 36 side. Anode side: 6H2O → 4H3O + +O2+4e - Cathode side: 4H3O + +4e - →2H2+4H2O

[0032] In the hydrogen dissolving device 30, oxonium ions (HO) are used as a source of hydrogen at the cathode 36. + ) is used, and OH is used during the electrolysis process. - No ions are generated. Therefore, even when the hydrogen dissolving device 30 performs electrolysis at a high current value to increase the amount of dissolved hydrogen, the pH of the treated water does not change. Therefore, the hydrogen dissolving device 30 does not have the inconvenience of suppressing the dissolved hydrogen concentration of the treated water due to the upper pH limit, and it is possible to perform electrolysis at a desired high current value and increase the dissolved hydrogen concentration of the treated water. As a result, it is possible to obtain treated water with the required dissolved hydrogen concentration.

[0033] The hydrogen dissolving device 30 can deliver the dissolved hydrogen water 3 produced by the electrolysis process described above to the reverse osmosis membrane treatment device 40 side through a water supply channel 34c formed on the cathode 36 side of the electrolytic cell main body 34a. In the flow path S of this embodiment, an electrolyzed water tank 50 is provided between the hydrogen dissolving device 30 and the reverse osmosis membrane treatment device 40. Therefore, the dissolved hydrogen water 3 delivered from the water supply channel 34c of the hydrogen dissolving device 30 is temporarily introduced into and stored in the electrolyzed water tank 50 before reaching the reverse osmosis membrane treatment device 40. Meanwhile, the dissolved oxygen water 4 produced on the anode 35 side by the electrolysis process is discharged to the outside of the electrolytic cell main body 34a through a drainage channel 34d formed on the anode 35 side.

[0034] The reverse osmosis membrane treatment device 40 is disposed downstream of the hydrogen dissolution device 30 in the flow path S. In this embodiment, the reverse osmosis membrane treatment device 40 is connected to a pipe downstream of the hydrogen dissolution device 30 via an electrolytic water tank 50. The reverse osmosis membrane treatment device 40 is a device for performing reverse osmosis membrane treatment using a reverse osmosis membrane 42. As shown in FIG. 1 , the reverse osmosis membrane treatment device 40 includes a reverse osmosis membrane 42, a reverse osmosis water tank 44, and a reverse osmosis water pump 46.

[0035] The reverse osmosis membrane 42 is used to perform reverse osmosis treatment on the dissolved hydrogen water 3 produced by the hydrogen dissolution device 30. When solutions of different concentrations exist with a semipermeable membrane as a boundary, a phenomenon (osmosis) occurs in which water moves from the low-concentration solution to the high-concentration solution. In response to this, by applying pressure to the high-concentration solution with the semipermeable membrane as a boundary, water can be moved from the high-concentration solution to the low-concentration solution, thereby causing the phenomenon (reverse osmosis) in which water permeates into the low-concentration solution. The reverse osmosis membrane 42 is provided to perform a process (reverse osmosis membrane treatment) in the reverse osmosis membrane treatment device 40 to obtain water that has been subjected to reverse osmosis (reverse osmosis water).

[0036] The reverse osmosis membrane treatment device 40 can remove impurities such as trace metals by reverse osmosis of the supplied water. The reverse osmosis membrane treatment device 40 can further remove impurities such as trace metals from the dissolved hydrogen water 3 supplied from the hydrogen dissolution device 30 (the electrolyzed water tank 50 in this embodiment). In the liquid treatment device 1 of this embodiment, as described above, before the dissolved hydrogen water 3 is produced in the hydrogen dissolution device 30, impurities have already been removed in the prefilter 12, the water has been softened in the water softener 14, and substances such as residual chlorine have been removed in the activated carbon treatment device 16. Therefore, the liquid treatment device 1 can obtain water (reverse osmosis water) that meets the water quality standards specified in ISO 13959 (standards for dialysis water) by performing reverse osmosis treatment on the dissolved hydrogen water 3 using the reverse osmosis membrane treatment device 40. Furthermore, in the liquid treatment device 1, the dissolved hydrogen water 3 produced in the hydrogen dissolution device 30 is subjected to reverse osmosis treatment using the reverse osmosis membrane treatment device 40. Therefore, the liquid treatment device 1 can obtain reverse osmosis water having hydrogen dissolved therein (reverse osmosis dissolved hydrogen water 5) by performing reverse osmosis treatment in the reverse osmosis membrane treatment device 40.

[0037] The reverse osmosis water tank 44 is provided in the flow path S downstream of the reverse osmosis membrane 42. The reverse osmosis water tank 44 is provided for storing reverse osmosis water (reverse osmosis dissolved hydrogen water 5) that has been subjected to reverse osmosis membrane treatment using the reverse osmosis membrane 42. The reverse osmosis water pump 46 is provided for pumping the reverse osmosis dissolved hydrogen water 5 stored in the reverse osmosis water tank 44 toward the dissolving device 110 and the dialysis fluid supplying device 120, which are provided outside the flow path S system.

[0038] The reverse osmosis water pump 46 operates at a predetermined timing when the reverse osmosis dissolved hydrogen water 5 is used in the dissolving device 110 and the dialysate supplying device 120, and supplies the water to the dissolving device 110 and the dialysate supplying device 120. As a result, a predetermined dialysate is produced in the dissolving device 110, and the produced dialysate is supplied to the dialysate supplying device 120. The dialysate is supplied from the dialysate supplying device 120 to each patient monitoring device (not shown) and is used to purify the patient's blood.

[0039] The electrolyzed water tank 50 is a tank provided in the flow path S between the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40. The electrolyzed water tank 50 stores the dissolved hydrogen water 3 discharged from the hydrogen dissolution device 30 in preparation for supply to the reverse osmosis membrane treatment device 40.

[0040] The pump 60 pumps water through the flow path S. The pump 60 may be located anywhere in the flow path S, but is preferably located upstream of the reverse osmosis membrane 42 included in the reverse osmosis membrane treatment device 40. In this embodiment, the pump 60 is located downstream of the electrolyzed water tank 50 in the flow path S (preferably immediately downstream of the electrolyzed water tank 50) and upstream of the reverse osmosis membrane treatment device 40 (preferably immediately upstream of the reverse osmosis membrane treatment device 40). This allows for accurate control of the introduction of the water (raw water 2) stored in the tank 20 into the hydrogen dissolution device 30 at a required flow rate. The pump 60 can be configured so that its output can be controlled by an applied current value, etc. In this embodiment, the pump 60's output can be controlled by duty ratio control.

[0041] The liquid treatment device 1 is equipped with a heating device 80 and a chemical liquid supply device 90 as components for cleaning the flow path S, which is formed by piping the above-mentioned tank 20, hydrogen dissolution device 30, reverse osmosis membrane treatment device 40, etc.

[0042] The temperature raising device 80 heats and raises the temperature of cleaning liquid (e.g., raw water 2 or a liquid obtained by adding a chemical solution to raw water) supplied to the flow path S during cleaning operation. The liquid treatment device 1 can sterilize or eliminate hydrogen bacteria and the like by supplying the cleaning liquid heated by the temperature raising device 80 to the flow path S. The temperature raising device 80 may be installed in either or both of the tank 20 and the reverse osmosis water tank 44. In the example shown in FIG. 1, a first temperature raising device 80 (first temperature raising device 80a) is provided in the tank 20, and a second temperature raising device 80 (second temperature raising device 80b) is provided in the reverse osmosis water tank 44.

[0043] By installing the first heating device 80a in the tank 20, a large amount of water can be heated at once when heating the water used for cleaning the flow path S, allowing for efficient cleaning operations. Furthermore, when the raw water 2 has a high silica content, clogging with silica occurs when the water passes through the reverse osmosis membrane 42 while still at a low temperature. Therefore, by installing the first heating device 80a in the tank 20, the raw water 2 heated by the first heating device 80a can be supplied for cleaning, preventing clogging of the reverse osmosis membrane 42 with silica, as described above. Furthermore, by providing the second heating device 80b in the reverse osmosis water tank 44, the water can be kept at an appropriate temperature while stored in the reverse osmosis water tank 44, preventing the water used by the patient from becoming too cold. Furthermore, by providing the second heating device 80b in the reverse osmosis water tank 44, it can be used to heat the cleaning water when flowing cleaning water to clean only the portion of the flow path S downstream of the tank 20, or the water heated in the first heating device 80a for cleaning can be additionally heated by the second heating device 80b as needed when it reaches the reverse osmosis water tank 44.

[0044] The chemical liquid supplying device 90 supplies a chemical liquid used for cleaning the flow path S. The chemical liquid supplying device 90 can be disposed at an appropriate position, for example, by being connected to the tank 20 by piping. For example, as shown in FIG. 1, the chemical liquid supplying device 90 can be connected such that a pipe connected to the tank 20 is provided separately from the pipe forming the flow path S, and the chemical liquid can be introduced into the tank 20 via the pipe.

[0045] The air bubble generator 100 is a device that generates air bubbles in the water to be treated. The air bubble generator 100 can be a device that generates ultrafine bubbles (diameter less than 1 μm), a device that generates microbubbles (diameter 1 μm to 100 μm), a device that generates submillibubbles (diameter 100 μm to 1 mm), a device that generates millibubbles (diameter 1 mm or more), or the like. The air bubble generator 100 may be configured as any device selected from these, but is preferably configured as an ultrafine bubble generator or a microbubble generator.

[0046] When the bubble generator 100 is configured as a microbubble generator, suitable examples include those that generate microbubbles by gas-phase dispersion due to liquid flow shear, those that generate microbubbles by cavitation, those that generate microbubbles by changing the solubility of a gas in a liquid, and those that generate microbubbles by a phase change of a dispersed phase. As a microbubble generator that generates microbubbles by gas-phase dispersion due to liquid flow shear, suitable examples include swirling liquid flow types, static mixer types, and micropore types. As a microbubble generator that generates microbubbles by cavitation, suitable examples include ejector types and Venturi types. As a microbubble generator that generates microbubbles by changing the solubility of a gas in a liquid, suitable examples include pressurized dissolution types (vacuum precipitation types) and cooled dissolution types (heat precipitation types). As a microbubble generator that generates microbubbles by changing the phase of a dispersed phase, suitable examples include mixed vapor condensation types.

[0047] When the bubble generator 100 is configured as an ultra-fine bubble generator, suitable devices include those that generate ultra-fine bubbles by reducing interfacial tension, those that generate ultra-fine bubbles by gas-phase dispersion and mixing due to strong liquid shear flow, and those that generate ultra-fine bubbles by changing the solubility of gas in liquid. Suitable devices for generating ultra-fine bubbles by reducing interfacial tension include micropore-type devices. Suitable devices for generating ultra-fine bubbles by gas-phase dispersion and mixing due to strong liquid shear flow include static mixer-type and swirling liquid flow-type devices. Suitable devices for generating mixed vapor condensation include pressurized dissolution-type (vacuum precipitation-type) devices.

[0048] Among the ultra-fine bubble generators or microbubble generators based on the various principles and methods described above, those that generate fine bubbles made from gas contained in a liquid (water) can be suitably used as the bubble generator 100. In this embodiment, the bubble generator 100 is configured to generate fine bubbles made from gas (hydrogen) contained in a liquid (water) by reducing the pressure in the liquid (water), such as the ejector type or Venturi type described above.

[0049] The bubble generator 100 is provided so as to generate bubbles in the water flowing through the flow path S. As will be described in detail later, the bubble generator 100 can be installed at an appropriate location, such as midway along the pipeline that forms the flow path S, on devices such as the hydrogen dissolving device 30 and reverse osmosis membrane treatment device 40 provided in the flow path S, or on various components provided in the flow path S such as the tank 20 and the electrolyzed water tank 50, depending on the purpose and the expected effect.

[0050] The control device 200 controls the operation of the liquid treatment device 1. In addition to a water treatment operation for producing dissolved hydrogen water 5 from raw water 2 by reverse osmosis using the liquid treatment device 1, the control device 200 can also cause a cleaning operation for cleaning the flow path S by passing a cleaning liquid through the flow path S. Under the control of the control device 200, the liquid treatment device 1 of this embodiment can perform an operation for cleaning the components present in the main flow path S1 that constitutes the flow path S (main flow path cleaning operation), and an operation for cleaning the sub-flow path S2 that constitutes the flow path S (sub-flow path cleaning operation), as will be described in detail later.

[0051] <About Flow Path S> The liquid treatment device 1 has a flow path S formed by connecting components such as the tank 20, hydrogen dissolution device 30, reverse osmosis membrane treatment device 40, and bubble generation device 100 using pipes. The flow path S has a main flow path S1 and a sub-flow path S2. The main flow path S1 is connected using pipes so that a liquid passage path R1 and a circulation path R2 can be formed. The main flow path S1 is equipped with a switching valve 48, and by switching the switching valve 48, the path through which water flows can be switched between the liquid passage path R1 and the circulation path R2.

[0052] The liquid passage path R1 is a path through which the liquid passes from the supply source of the raw water 2 through the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40 toward the liquid destinations, that is, the dissolution device 110 and the dialysis fluid supply device 120. By operating the pump 60 with the switching valve 48 switched so that water flows through the liquid passage path R1, the liquid treatment device 1 can perform an operation (water treatment operation) in which the pumped water is treated in the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40, and reverse osmosis dissolved hydrogen water 5 is produced from the raw water 2 and supplied.

[0053] Circulation path R2 is a path through which water passes to form a circulating flow that passes through both the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40. By operating pump 60 with selector valve 48 switched to allow water to flow through circulation path R2, liquid treatment device 1 can perform an operation (main path cleaning operation) to circulate water through circulation path R2 and clean each component in main path S1. During maintenance operation, liquid treatment device 1 can enhance the cleaning effect of each component by appropriately supplying a chemical solution from chemical solution supply device 90 or operating temperature raising device 80 to raise the temperature of the water. Furthermore, the downstream connection point between main path S1 and circulation path R2 is not limited to the upstream point of pretreatment device 10 shown in FIG. 1 , but can be connected to any location on main path S1 as appropriate. Furthermore, circulation path R2 may branch and be connected to multiple locations on main path S1.

[0054] The sub-flow path S2 is a flow path that allows water to pass through a path that deviates from the main flow path S1. In this embodiment, the sub-flow path S2 includes a first sub-flow path S21 that forms a first discharge path D1 for discharging the dissolved oxygen water 4 from the hydrogen dissolution device 30, and a second sub-flow path S22 that forms a second discharge path D2 for discharging the concentrated water 6 that is discharged as a residue after impurities are removed from the dissolved hydrogen water 3 in the reverse osmosis membrane treatment device 40. The first sub-flow path S21 and the second sub-flow path S22 are provided with a first on-off valve 39 and a second on-off valve 49, respectively. The dissolved oxygen water 4 can be discharged from the hydrogen dissolution device 30 by opening the first on-off valve 39. The concentrated water 6 can be discharged from the reverse osmosis membrane treatment device 40 by opening the second on-off valve 49.

[0055] A degassed hydrogen supply channel G is also connected to the flow path S. The degassed hydrogen supply channel G supplies hydrogen degassed from the water flowing through the flow path S to the bubble generation device 100. One end of the degassed hydrogen supply channel G is connected to the hydrogen dissolving device 30, or to a downstream side of the hydrogen dissolving device 30 in the flow path S in the direction of water flow. The other end of the degassed hydrogen supply channel G is connected to a location where hydrogen flowing through the degassed hydrogen supply channel G can be supplied to the bubble generation device 100, such as the bubble generation device 100 or a position upstream of the bubble generation device 100 in the flow path S. In the example shown in FIG. 1, one end of the degassed hydrogen supply channel G is directly connected to the hydrogen dissolving device 30, and the other end is directly connected to the bubble generation device 100. In the example shown in FIG. 1, the degassed hydrogen supply channel G is provided with a filter 104 that selectively extracts hydrogen.

[0056] <<Regarding the arrangement of the bubble generation device 100>> The bubble generator 100 can be provided in the pipelines forming the liquid passage R1, circulation passage R2, first discharge passage D1, and second discharge passage D2 in the main flow passage S1 and the sub-flow passage S2, or in devices and instruments provided on these passages. For example, the bubble generator 100 can be provided in the portion forming the liquid passage R1 of the flow passage S (main flow passage S1), in devices and instruments such as the pretreatment section 10, the tank 20, the hydrogen dissolution device 30, the reverse osmosis membrane treatment device 40 (reverse osmosis water tank 44), and the electrolytic water tank 50, at a position X1 upstream of the pretreatment section 10, at a position X2 between the pretreatment section 10 and the tank 20, at a position X3 between the tank 20 and the hydrogen dissolution device 30, at a position X4 between the hydrogen dissolution device 30 and the electrolytic water tank 50, and at a position X5 between the electrolytic water tank 50 and the pump 60. The bubble generation device 100 can be provided at position X5, position X6 between the pump 60 and the reverse osmosis membrane 42, position X7 between the reverse osmosis membrane 42 and the reverse osmosis water tank 44, position X8 between the reverse osmosis water tank 44 and the reverse osmosis water pump 46, position X9 of the piping connected downstream of the reverse osmosis membrane treatment device 40 (pump 60), etc. The bubble generation device 100 can also be provided at position X10 on the pipe connecting the reverse osmosis membrane treatment device 40 and the pretreatment device 10 in the portion forming the circulation path R2 of the flow path S (main flow path S1). The bubble generation device 100 can also be provided at position Y1 on the pipe forming the first discharge path D1 of the flow path S (sub-flow path S2), position Y2 on the pipe forming the second discharge path D2, etc. The bubble generation device 100 can be provided in only one location or in multiple locations.

[0057] As described above, the bubble generator 100 can be installed in an appropriate location depending on the purpose and expected effect in the liquid treatment device 1. Specifically, the bubble generator 100 can be installed in the flow path S for the purpose of preventing the hydrogen concentration of the reverse osmosis dissolved hydrogen water 5, in which hydrogen has been added to water, from falling below a predetermined minimum concentration before it reaches the dissolving device 110 or the dialysis fluid supply device 120, which are its supply destinations (hydrogen concentration reduction prevention effect). When the bubble generator 100 is installed for the purpose of preventing the hydrogen concentration reduction, it is preferable that the bubble generator 100 be installed in a pipe constituting the liquid passage path R1 through which water flows during water treatment operation, or in a device or instrument installed along the liquid passage path R1. Specifically, when the objective is to suppress the reduction in hydrogen concentration, the bubble generator 100 should be provided in at least one of the devices and equipment such as the pretreatment unit 10, the tank 20, the hydrogen dissolving unit 30, the reverse osmosis membrane treatment unit 40 (reverse osmosis water tank 44), and the electrolyzed water tank 50, and in the above-mentioned positions X1 to X9. Furthermore, when the objective is to suppress the reduction in hydrogen concentration, the bubble generator 100 should be provided in the hydrogen dissolving unit 30 that dissolves hydrogen in the raw water 2, or even more preferably downstream of this.

[0058] Furthermore, when the bubble generation device 100 is of the ejector type or Venturi type described above, which generates fine bubbles from gas (hydrogen) contained in the liquid (water) by reducing the pressure in the liquid (underwater), a pressure drop occurs in the bubble generation device 100. To compensate for the pressure drop in the bubble generation device 100 (pressure drop compensation effect), it is preferable to install the bubble generation device 100 upstream of the water flow direction relative to a pumping device such as the pump 60 or the reverse osmosis water pump 46. Specifically, to compensate for the pressure drop, the bubble generation device 100 is preferably installed at position X5 upstream of the pump 60, or immediately before the pump 60 in the water flow direction, such as an electrolyzed water tank 50 connected to the pump 60 through a pipe. Therefore, if the objective is to both inhibit hydrogen concentration reduction during water treatment operation and compensate for pressure drops, the bubble generator 100 may be provided at position X5, immediately preceding the pump 60 in the water flow direction, as shown in FIG. 1 , and / or at the hydrogen dissolution device 30. To accurately detect pressure drops in a timely manner, a device capable of measuring flow rate or water pressure may be provided somewhere along the main flow path S1. Alternatively, a configuration may be adopted in which the flow rate or water pressure measured by the dissolution device 110, the dialysis fluid supply device 120, or another external device can feed back the measured flow rate or water pressure to the control device 200 (not shown). In this case, the control device 200 compares the measured value with a predetermined reference value for flow rate or water pressure and controls the pumping device so that the measured value always approximates the reference value, thereby achieving a more timely compensation effect for pressure drops.

[0059] Furthermore, when the objective is to improve the cleaning effect of each part of the liquid treatment device 1 by the bubbles generated in the bubble generator 100, the bubble generator 100 may be provided in each part constituting the main flow path S1 or in the sub-flow path S2. Specifically, when the objective is to improve the cleaning effect when water is circulated in the circulation route R2 and an operation is performed to clean each part in the main flow path S1 (main flow path cleaning operation), the bubble generator 100 may be provided in devices and equipment such as the pretreatment unit 10, the tank 20, the hydrogen dissolving device 30, the reverse osmosis membrane treatment device 40 (reverse osmosis water tank 44), and the electrolyzed water tank 50, and at least one of the above-mentioned positions X1 to X10.

[0060] Furthermore, when the objective is to perform an operation (sub-flow path cleaning operation) for cleaning the sub-flow path S2, which is not reached by water or a chemical solution simply by circulating cleaning water or a chemical solution in the circulation path R2 during the main flow path cleaning operation, the bubble generator 100 may be provided at position Y1 on the first discharge path D1, position Y2 on the pipe constituting the second discharge path D2, etc. Furthermore, when the liquid treatment device 1 is capable of connecting the main flow path S1 and the sub-flow path S2 by opening the first on-off valve 39 or the second on-off valve 49, for example, the bubble generator 100 may be provided at a position on the main flow path S1 upstream of the point at which the main flow path S1 and the sub-flow path S2 communicate with each other, thereby enabling the sub-flow path cleaning operation to be performed by supplying water containing bubbles generated in the main flow path S1 to the sub-flow path S2. 1, the present embodiment provides a bubble generation device 100 at position X5, and a bypass flow path 102 that bypasses the bubble generation device 100 or a downstream pipeline thereof and the pipeline of the sub-flow path S2 (first sub-flow path S21) that forms the first discharge path D1. This allows water containing bubbles generated in the bubble generation device 100 provided at position X5 to be supplied to the first discharge path D1 for cleaning.

[0061] 1 shows an example in which the bypass flow path 102 is provided so as to reach the first discharge path D1, but the present invention is not limited to this. For example, the liquid treatment device 1 may be configured so that the sub-path cleaning operation can be performed by providing the bypass flow path 102 so as to reach the second discharge path D2 instead of the first discharge path D1, by providing multiple bypass flow paths 102 and connecting them to both the first discharge path D1 and the second discharge path D2, or by branching the bypass flow path 102 and connecting it to both the first discharge path D1 and the second discharge path D2.

[0062] <About the effects> Considering the above-described embodiment and each example, the present invention has the following characteristic configurations (1) to (8), and provides effects unique to the present invention.

[0063] (a) The liquid treatment device 1 described above comprises a hydrogen dissolution device 30 that dissolves hydrogen in a liquid, a reverse osmosis membrane treatment device 40 that performs reverse osmosis membrane treatment on the liquid, a bubble generation device 100 that generates bubbles in the liquid, and a flow path S formed by connecting the hydrogen dissolution device 30, the reverse osmosis membrane treatment device 40, and the bubble generation device 100 so that a liquid can pass through. The flow path S has a liquid passage path R1 that allows the liquid to pass from a liquid supply source through the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40 to a liquid destination, and the bubble generation device 100 generates bubbles in the liquid flowing through the liquid passage path R1.

[0064] Because the liquid treatment device 1 is configured as described above in (a), the bubble generation device 100 generates bubbles in the liquid (water in the above embodiment; the same applies below) flowing through the liquid passage R1, allowing the hydrogen dissolved in the liquid by the hydrogen dissolution device 30 to remain in the liquid. This prevents the hydrogen dissolved in the liquid by the hydrogen dissolution device 30 from being degassed and lost, allowing the hydrogen concentration in the liquid to be maintained high and for a long time. Therefore, the liquid treatment device 1 can prevent the hydrogen concentration of the hydrogen-containing liquid from falling below a predetermined minimum concentration before it reaches its destination.

[0065] (b) In the liquid treatment device 1 described above, the bubble generation device 100 is connected to at least one of a position in the flow path S between the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40 (positions X4 to X6 in the example shown in Figure 1) and the hydrogen dissolution device 30.

[0066] Because the liquid treatment device 1 is configured as described in (b) above, it can bubble the hydrogen dissolved in the liquid by the hydrogen dissolving device 30 immediately after dissolution. This allows the liquid treatment device 1 to more efficiently suppress degassing of the hydrogen dissolved in the liquid by the hydrogen dissolving device 30, and maintain a high hydrogen concentration in the liquid for a long period of time.

[0067] (c) The liquid treatment device 1 described above has a degassed hydrogen supply path G that supplies hydrogen degassed from a liquid in which hydrogen has been dissolved to the bubble generation device 100.

[0068] Since the liquid treatment device 1 is configured as described above in (c), it can use hydrogen degassed from the liquid to generate bubbles containing hydrogen in the liquid in the bubble generation device 100. This allows the liquid treatment device 1 to suppress a decrease in the hydrogen concentration in the liquid that occurs due to degassing.

[0069] (d) In the liquid treatment device 1 described above, the filter 104 for selectively extracting hydrogen is provided in the degassed hydrogen supply path G.

[0070] Since the liquid treatment device 1 is configured as described above in (d), it can selectively extract hydrogen from the gas that has flowed into the degassed hydrogen supply channel G and supply it to the bubble generation device 100. This allows the liquid treatment device 1 to more reliably maintain and promote an increase in the hydrogen concentration in the liquid.

[0071] (e) In the liquid treatment device 1 described above, the bubble generation device 100 generates bubbles made by breaking down hydrogen contained in the liquid into fine particles.

[0072] Since the liquid treatment device 1 is configured as described above in (e), it can atomize the hydrogen dissolved in the liquid by the hydrogen dissolution device 30, thereby maintaining and promoting an increase in the hydrogen concentration in the liquid.

[0073] (f) The above-mentioned liquid treatment device 1 has a pump 60 (pressure-transfer device) that pressurizes the liquid through the flow path S, and a control device 200, and the bubble generation device 100 generates bubbles that are finer versions of the hydrogen contained in the liquid by reducing the pressure within the liquid, and the control device 200 controls the output of the pump 60 (pressure-transfer device) in response to the pressure reduction in the bubble generation device 100 so that the pressure of the liquid discharged from the bubble generation device 100 satisfies predetermined pressure conditions.

[0074] Because the liquid treatment device 1 is configured as described in (f) above, even if the pressure in the liquid drops due to atomization of the hydrogen dissolved in the liquid by the hydrogen dissolving device 30, the drop in pressure in the liquid can be restored by the pump 60 (pressure-feeding device). This allows the liquid treatment device 1 to supply the liquid (reverse osmosis dissolved hydrogen water 5) to the liquid supply destination (in the above embodiment, the dissolving device 110 or the dialysis fluid supply device 120) while maintaining a predetermined pressure level.

[0075] (g) The liquid treatment device 1 described above comprises a hydrogen dissolution device 30 that dissolves hydrogen in a liquid, a reverse osmosis membrane treatment device 40 that performs reverse osmosis membrane treatment on the liquid, a bubble generation device 100 that generates bubbles in the liquid, and a flow path S formed by connecting the hydrogen dissolution device 30, the reverse osmosis membrane treatment device 40, and the bubble generation device 100 so that the liquid can pass through. The flow path S has a main flow path S1 that passes the liquid through a path that passes through both the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40, and a sub-flow path S2 that passes the liquid through a path that deviates from the main flow path S1, and the liquid containing the bubbles generated by the bubble generation device 100 can pass through the sub-flow path S2.

[0076] The liquid treatment device 1 is configured as described in (g) above, and therefore can pass the liquid generated by the bubble generation device 100 not only through the main flow path S1 but also through the sub-flow path S2. As a result, when performing a cleaning operation using water, a chemical solution, or the like, the liquid treatment device 1 can use bubbles generated by the bubble generation device 100 to perform cleaning not only in an operation for cleaning the various parts present in the main flow path S1 (main flow path cleaning operation) but also in an operation for cleaning the sub-flow path S2 (sub-flow path cleaning operation).

[0077] (h) The above-mentioned liquid treatment device 1 has a main flow path S1 that is capable of forming a circulation flow in which liquid circulates through a path that passes through both the hydrogen dissolution device 30 and the reverse osmosis membrane treatment device 40, and by circulating liquid through the main flow path S1 to form a circulation flow, it is possible to perform a main flow path cleaning operation in which the configuration including the main flow path S1, the hydrogen dissolution device 30, and the reverse osmosis membrane treatment device 40 is cleaned, and a sub-flow path cleaning operation in which the configuration including the sub-flow path S2 is cleaned by passing liquid containing bubbles generated by the bubble generation device 100 through the sub-flow path S2.

[0078] Since the liquid treatment device 1 is configured as described above in (h), it not only cleans the main flow path S1 by performing the main flow path cleaning operation, but also performs the sub-flow path cleaning operation, thereby utilizing the liquid containing bubbles generated by the bubble generation device 100 to clean the sub-flow path S2, which is difficult to clean by performing only the main flow path cleaning operation.

[0079] (i) The liquid treatment device 1 described above has a bubble generation device 100 provided in the main flow path S1, and when the main flow path S1 and the sub-flow path S2 are connected, a liquid containing bubbles generated by the bubble generation device 100 is flowed into the main flow path S1 and the sub-flow path S2, thereby enabling main flow path cleaning operation and sub-flow path cleaning operation to be performed.

[0080] The liquid treatment device 1 is configured as described above in (i), and therefore can perform both main flow path cleaning operation and sub-flow path cleaning operation using a liquid containing bubbles generated in the bubble generation device 100 provided in the main flow path S1. Therefore, by configuring the liquid treatment device 1 as described above in (i), the bubble generation device 100 can be used to clean both the main flow path S1 and the sub-flow path S2.

[0081] (j) In the liquid treatment device 1 described above, the bubble generation device 100 is connected to the sub-channel S2.

[0082] As described in the above embodiment, the liquid treatment device 1 can be configured as in (j) above by being provided at position Y1 on the pipe constituting the first discharge path D1 of the flow path S (sub-flow path S2), position Y2 on the pipe constituting the second discharge path D2, etc. By employing the configuration (j) above, the liquid treatment device 1 can generate liquid containing bubbles generated by the bubble generation device 100 in the sub-flow path S2, thereby further improving the cleaning efficiency of the sub-flow path S2.

[0083] The liquid treatment device 1 described above merely illustrates one embodiment of the present invention, and the configuration can be appropriately modified, omitted, or added without departing from the spirit of the present invention. When configured as shown in Figure 1, the liquid treatment device 1 can achieve both the objectives of preventing the hydrogen concentration of the hydrogen-containing liquid from falling below a predetermined minimum concentration before it reaches the supply destination and of enabling cleaning of the sub-flow path S2. However, if it is sufficient to achieve only one of these objectives, it is possible to have a configuration that does not satisfy either of the above-mentioned (a) or (g).

[0084] Furthermore, in the above embodiment, as in (b) above, an example is shown in which the bubble generating device 100 is connected to at least one of a position in the flow path S between the hydrogen dissolving device 30 and the reverse osmosis membrane processing device 40 (positions X4 to X6 in the example shown in Figure 1) and the hydrogen dissolving device 30, but the present invention is not limited to this, and it is also possible to configure it to be installed at other positions (X1 to X3, X7 to X10, Y1, Y2 in the example shown in Figure 1), etc.

[0085] In the liquid treatment device 1 of the above embodiment, a configuration in which a degassed hydrogen supply path G is provided as shown in (c) above is exemplified, but the present invention is not limited to this, and it is also possible to have a configuration in which a degassed hydrogen supply path G is not provided.

[0086] In the above embodiment, as in (d) above, the filter 104 for selectively extracting hydrogen is provided in the degassed hydrogen supply path G, but the present invention is not limited to this. The liquid treatment device 1 may not be provided with the filter 104 in the degassed hydrogen supply path G.

[0087] In the above embodiment, as in (e) above, the bubble generation device 100 is used to generate bubbles made by breaking down hydrogen contained in the liquid, but the present invention is not limited to this. For example, as exemplified in the above embodiment, the liquid treatment device 1 can also be a bubble generation device 100 that generates bubbles in the liquid using other principles or methods.

[0088] In the above embodiment, as in (f) above, the bubble generator 100 is employed, which generates bubbles made by dispersing hydrogen contained in the liquid by reducing the pressure in the liquid, and the control device 200 controls the output of the pump 60 (pressure-feeding device) in response to the pressure drop in the bubble generator 100 so that the pressure of the liquid delivered from the bubble generator 100 satisfies a predetermined pressure condition, but the present invention is not limited to this. For example, in cases where the supply pressure of the liquid to the dissolving device 110 and the dialysis fluid supply device 120 can be sufficiently ensured without controlling the output of the pump 60, where a drop in supply pressure is not a problem, or where the liquid can be pressurized and pumped in another device provided downstream of the liquid treatment device 1, the configuration as in (f) above may not be provided.

[0089] The liquid treatment device 1 of the above embodiment utilizes a liquid containing bubbles generated by the bubble generator 100 in both the main flow path cleaning operation for cleaning the main flow path S1 and the sub-flow path cleaning operation for cleaning the sub-flow path S2, as described above in (h). However, the present invention is not limited to this. For example, the liquid treatment device 1 can be configured to supply the liquid containing bubbles generated by the bubble generator 100 only to the main flow path S1, but not to the sub-flow path S2, if the objective of preventing the hydrogen concentration of the hydrogen-containing liquid from falling below a predetermined minimum concentration before reaching the supply destination can be achieved, and if the objective of being able to clean the sub-flow path S2 does not need to be achieved. Furthermore, if the objective of being able to clean the sub-flow path S2 using the bubbles generated by the bubble generator 100 can be achieved, and if the bubbles generated by the bubble generator 100 do not need to be used in cleaning the main flow path S1, the liquid treatment device 1 can be configured to supply the liquid containing bubbles generated by the bubble generator 100 only to the sub-flow path S2.

[0090] In the above embodiment, as in (i) above, an example was shown in which the bubble generator 100 provided in the main flow path S1 is configured to be able to perform both the main flow path cleaning operation and the sub-flow path cleaning operation using a liquid containing bubbles generated in the bubble generator 100 provided in the main flow path S1, but the liquid treatment device 1 does not necessarily have to be configured in this way. For example, the liquid treatment device 1 can also perform the main flow path cleaning operation using the bubble generator 100 provided in the main flow path S1, and also perform the sub-flow path cleaning operation using a bubble generator 100 provided separately in the sub-flow path S2.

[0091] In the above embodiment, as in (j) above, an example was shown in which the bubble generation device 100 can be connected to the sub-channel S2, but the present invention is not limited to this. As in the example shown in Figure 1 etc., it is also possible to have only the bubble generation device 100 connected to the main channel S1, without having the bubble generation device 100 connected to the sub-channel S2.

[0092] The present invention is not limited to the configurations described in the above-described embodiments, etc., and design modifications, etc., are possible as appropriate within the scope of the technical concept of the present invention. The components of the above-described embodiments and variations may be arbitrarily selected and combined. Furthermore, any component of each embodiment or variation may be arbitrarily combined with any component described in the means for solving the problems, the detailed description, etc., or any component embodying any component described in the means for solving the problems, the detailed description, etc. The present invention also intends to obtain rights to these in this application or in divisional applications based on this application. [Industrial Applicability]

[0093] The present invention can be suitably used in all water treatment devices that include a hydrogen dissolving device and a reverse osmosis membrane treatment device. [Explanation of symbols]

[0094] 1: Liquid treatment equipment 5: Reverse osmosis dissolved hydrogen water 30: Hydrogen dissolving device 40: Reverse osmosis membrane treatment device 60: Pump 100: Bubble generator 104: Filter 110: Melting equipment 120: Dialysate supply device 200: Control device D1: First excretion pathway D2:Second discharge route G: Degassed hydrogen supply channel R1: Liquid passage R2: Circulation route S: Flow path S1:Main flow path S2: Sub-channel

Claims

1. A hydrogen dissolving device for dissolving hydrogen in a liquid; a reverse osmosis membrane treatment device that performs reverse osmosis membrane treatment on the liquid; A bubble generating device for generating bubbles in the liquid; a flow path formed by connecting the hydrogen dissolution device, the reverse osmosis membrane treatment device, and the air bubble generation device in a liquid-passable manner; having The flow path is a main flow path through which the liquid passes through both the hydrogen dissolution device and the reverse osmosis membrane treatment device; a sub-flow path for passing the liquid through a path that deviates from the main flow path; having A liquid treatment device, characterized in that the liquid containing the bubbles generated by the bubble generation device can be passed through the sub-flow path.

2. the main flow path is capable of forming a circulation flow in which the liquid circulates through a path passing through both the hydrogen dissolution device and the reverse osmosis membrane treatment device, a main flow path cleaning operation for cleaning a configuration including the main flow path, the hydrogen dissolution device, and the reverse osmosis membrane treatment device by circulating a liquid through the main flow path so as to form the circulation flow; a sub-flow passage cleaning operation for cleaning a configuration including the sub-flow passage by passing a liquid containing bubbles generated by the bubble generating device through the sub-flow passage; The liquid treatment device according to claim 1, further comprising:

3. The air bubble generating device is provided in the main flow path, The liquid treatment device according to claim 2, characterized in that, when the main flow path and the secondary flow path are connected, the main flow path cleaning operation and the secondary flow path cleaning operation can be performed by flowing a liquid containing bubbles generated by the bubble generation device into the main flow path and the secondary flow path.

4. 3. The liquid treatment device according to claim 1, wherein the bubble generating device is connected to the sub-flow path.

5. 3. The liquid treatment device according to claim 1 or 2, characterized in that the bubble generating device is connected to at least one of a position in the flow path between the hydrogen dissolution device and the reverse osmosis membrane treatment device and the hydrogen dissolution device.

6. 3. The liquid treatment device according to claim 1, further comprising a degassed hydrogen supply passage for supplying hydrogen degassed from the liquid having dissolved therein to the bubble generation device.

7. 7. The liquid treatment device according to claim 6, wherein a filter for selectively extracting hydrogen is provided in the degassed hydrogen supply path.

8. 3. The liquid treatment device according to claim 1, wherein the bubble generating device generates bubbles formed by breaking down hydrogen contained in the liquid into fine particles.

9. a pumping device that pumps the liquid through the flow path; A control device; having The bubble generating device generates fine bubbles of hydrogen contained in the liquid by reducing the pressure in the liquid, 3. A liquid treatment device as described in claim 1 or 2, characterized in that the control device controls the output of the pressure-feeding device in response to a pressure drop in the bubble generation device so that the pressure of the liquid discharged from the bubble generation device satisfies a predetermined pressure condition.

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