Pressurizing system

The pressurizing system addresses the inefficiencies of existing devices by allowing the chamber unit to move between execution areas for various processes, reducing processing time and preventing oxidation, thereby enhancing efficiency and productivity.

JP2025066387AActive Publication Date: 2025-04-23NIKKISO CO LTD
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Patent Information

Application Number
JP2023175928
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2023-10-11
Publication Date
2025-04-23
Estimated Expiration
2043-10-11

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Abstract

To provide a pressurizing system capable of reducing a time between pressurizing processes and of performing a process related to the pressurizing processes.SOLUTION: Pressurizing systems 1, 1B to 1D execute a pressurizing process and a related process of a workpiece W. The pressurizing systems have: a plurality of execution areas A2 where one of a plurality of processes is executed; and chamber units 20 which house the workpiece and is conveyed between the execution areas. The execution areas are arranged in an order in which the processes are executed. The chamber units include: ceiling parts 26 which are arranged above the workpiece and function as upper pressurizing units 6U pressurizing the workpiece from above in the pressurizing process; floor parts 21 which are disposed below the workpiece and function as lower pressurizing units 6D pressurizing the workpiece from below in the pressurizing process; and peripheral wall parts 27 which are disposed to encircle the workpiece in the horizontal direction and zone housing chambers 20R housing the workpiece together with the ceiling part and the floor part.SELECTED DRAWING: Figure 1
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Description

[Technical field]

[0001] The present invention relates to a pressurization system. [Background technology]

[0002] Conventionally, a pressurizing device has been used to pressurize an object to be pressurized (such as an electronic component). For example, a pressurizing device disclosed in Patent Document 1 includes an upper pressurizing unit and a lower pressurizing unit, and the object to be pressurized is clamped and pressed by the upper pressurizing unit and the lower pressurizing unit, and the object to be pressurized is heated by a heat unit included in the lower pressurizing unit. In this pressurizing device, after the pressurization and heating of the object to be pressurized are completed, the workpiece is cooled while still in the pressurized state, and the object to be pressurized is removed after cooling. In this pressurizing device, the object to be pressurized is heated and cooled by one heat unit. Therefore, it takes time to switch between heating and cooling by the heat unit, which lengthens the processing time for each pressurization process.

[0003] In the pressurizing device disclosed in Patent Document 2, the lower pressurizing unit includes a heating unit that is preheated and a cooling unit that is precooled. The heating unit and the cooling unit are configured to be movable relative to the upper pressurizing unit that holds the object to be pressurized, and are appropriately switched depending on the progress of the pressurizing process. Therefore, the time required for switching between heating and cooling by the lower pressurizing unit is shortened, and the processing time is also shortened. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] JP 2007-896 A [Patent Document 2] JP 2017-199812 A Summary of the Invention [Problem to be solved by the invention]

[0005] However, in the pressurizing devices disclosed in Patent Documents 1 and 2, while each treatment (heating, pressurizing, cooling) is being performed on the pressurized object, the pressurized object is sandwiched between the upper pressurizing unit and the lower pressurizing unit. Therefore, from the start to the end of each treatment, the pressurizing device is a dedicated machine that handles only the pressurized object being treated. As a result, during a pressurizing treatment, a pressurized object for the next pressurizing treatment cannot be set in the pressurizing device. In other words, a long time is required between one pressurizing treatment and the next pressurizing treatment.

[0006] Here, the processing time can be shortened by performing a preliminary heating process on the pressurized object as a pre-processing of the pressurized object. The processing time can also be shortened by separating a cooling process from the pressurized object and performing a cooling process on the pressurized object as a post-processing of the pressurized object. In this way, the processing time in the pressurized object can be shortened and the time between pressurized objects can be shortened by making it possible to perform processes related to the pressurized object (hereinafter referred to as "related processes") in the pressurized object. However, it is not easy to perform the related processes in the pressurized object. Even if the related processes can be performed, the pressurized object is sealed only during the pressurized object in the pressurized object, so that the pressurized object is exposed to the atmosphere during the related processes and may be oxidized. Therefore, a chamber for the related processes and a large amount of inert gas (e.g., nitrogen gas) to fill the chamber are required.

[0007] An object of the present invention is to provide a pressurizing system that can shorten the time between pressurizing treatments and can perform processes related to the pressurizing treatments. [Means for solving the problem]

[0008] A pressurization system in one embodiment of the present invention is a pressurization system that performs a pressurization treatment of a workpiece and an associated treatment related to the pressurization treatment, and includes a plurality of execution areas in which one of a plurality of treatments including the pressurization treatment and the associated treatment is performed, and a chamber unit that accommodates the workpiece and is transported between the plurality of execution areas, the plurality of execution areas being arranged according to the order in which the treatments are performed, and the chamber unit includes a ceiling portion that is arranged above the workpiece and functions as an upper pressurization unit that pressurizes the workpiece from above in the pressurization treatment, a floor portion that is arranged below the workpiece and functions as a lower pressurization unit that pressurizes the workpiece from below in the pressurization treatment, and a peripheral wall portion that is arranged to surround the entire circumference of the workpiece in the horizontal direction, and that, together with the ceiling portion and the floor portion, defines a storage chamber in which the workpiece is stored. Effect of the Invention

[0009] According to the present invention, it is possible to provide a pressurizing system capable of shortening the time between pressurizing treatments and executing treatments related to the pressurizing treatments. [Brief description of the drawings]

[0010] [Figure 1] 1 is a schematic perspective view showing an embodiment of a pressurizing system according to the present invention; [Diagram 2] FIG. 2 is a functional block diagram of the pressurizing system of FIG. 1. [Diagram 3] 2 is a schematic cross-sectional view showing the main configuration of each device arranged in each execution area of ​​the pressurizing system of FIG. 1. [Figure 4] FIG. 2 is a schematic plan view of the pressurizing system of FIG. 1. [Diagram 5] 2 is a schematic plan view of a chamber unit included in the pressurizing system of FIG. 1. [Figure 6] 2 is a flowchart showing an example of the operation of the pressurizing system of FIG. 1. [Figure 7] 2 is a schematic cross-sectional view showing a state in which a mounting table included in the pressurizing system of FIG. 1 is carried into a containing device included in the pressurizing system. [Figure 8] 8 is a schematic cross-sectional view showing a state in which the mounting table in FIG. 7 is in contact with an upper unit included in the chamber unit in FIG. 5. [Figure 9] 6 is a schematic cross-sectional view showing a state in which a workpiece is accommodated in the chamber unit of FIG. 5. [Figure 10] 6 is a schematic cross-sectional view showing a state in which the chamber unit of FIG. 5 is transferred to an area where a preliminary heating process is performed. [Figure 11] 6 is a schematic cross-sectional view showing the chamber unit of FIG. 5 in which a preliminary heating process is being performed. [Figure 12] 6 is a schematic cross-sectional view showing a state in which the chamber unit of FIG. 5 is transferred to an area where a pressurization process is performed. [Figure 13] 6 is a schematic cross-sectional view showing the chamber unit of FIG. 5 in which a pressurizing process is being performed. [Figure 14] 6 is a schematic cross-sectional view showing a state in which the chamber unit of FIG. 5 is transferred to an area where a primary cooling process is performed. FIG. [Figure 15] 6 is a schematic cross-sectional view showing the chamber unit of FIG. 5 in which a primary cooling process is being performed. [Figure 16] 6 is a schematic cross-sectional view showing a state in which the chamber unit of FIG. 5 is transferred to an area where a secondary cooling process is performed. [Figure 17] 6 is a schematic cross-sectional view showing the chamber unit of FIG. 5 after the secondary cooling process is completed. FIG. [Figure 18] 9 is a schematic cross-sectional view showing a state in which the mounting table in FIG. 8 is removed from the upper unit in FIG. 8. [Figure 19] 19 is a schematic cross-sectional view showing a state in which the upper unit in FIG. 18 has been transported to an execution area where maintenance processing can be performed. FIG. [Figure 20]6 is a schematic plan view showing the positions of multiple chamber units of FIG. 5 in chronological order, where (a) shows the position at time "T1", (b) shows the position at time "T2", (c) shows the position at time "T3", (d) shows the position at time "T4", (e) shows the position at time "T5", and (f) shows the position at time "T6". [Figure 21] FIG. 11 is a schematic cross-sectional view of a chamber unit in a first modified example. [Figure 22] 13A is a schematic plan view of a pressurizing system according to a second modified example, FIG. 13B is a schematic plan view of a pressurizing system according to a third modified example, and FIG. 13C is a schematic plan view of a pressurizing system according to a fourth modified example. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] An embodiment of a pressurizing system (hereinafter referred to as "this system") according to the present invention will be described below. In the following description, the drawings will be referred to as appropriate. In each drawing, the same members and elements are given the same reference numerals, and duplicated explanations will be omitted. Furthermore, the dimensional ratios of each element may be exaggerated for the sake of convenience of explanation, and are not limited to the ratios shown in each drawing.

[0012] In the following description and drawings, unless otherwise specified, when three mutually orthogonal axes in space are the X-axis, the Y-axis, and the Z-axis, respectively, the "X-axis direction" is a direction along the X-axis, for example, the left-right direction. The "Y-axis direction" is a direction along the Y-axis, for example, the front-back direction. The "Z-axis direction" is a direction along the Z-axis, for example, the up-down direction. In addition, the "+X-axis direction" is the left, the "-X-axis direction" is the right, the "+Y-axis direction" is the front, the "-Y-axis direction" is the rear, the "+Z-axis direction" is the up, and the "-Z-axis direction" is the down. In the following description, the X-axis direction (+X-axis direction, -X-axis direction) and the Y-axis direction (+Y-axis direction, -Y-axis direction) are mainly used to specify directions other than the up-down directions.

[0013] In the present invention, a function for performing a process related to the pressurizing process (hereinafter referred to as "related process") is added to the pressurizing device, and the present system is configured to perform multiple processes including the pressurizing process. Also, a chamber unit in which the workpiece is accommodated is formed by a part of the upper pressurizing unit that pressurizes the workpiece in the pressurizing process and a part of the lower pressurizing unit. The chamber unit moves between multiple execution areas arranged in the present system, and a process corresponding to each execution area is executed on the workpiece. As a result, the present invention is capable of performing multiple related processes on the workpiece by moving the chamber unit. Also, the present invention is capable of shortening the time between pressurizing processes by moving the chamber unit after execution of the pressurizing process. Explanations of each term and specific configurations of each element will be described later.

[0014] "Pressure processing" refers to processing in which pressure is applied to a workpiece from above and below to perform a predetermined processing on the workpiece (e.g., compression, pressure welding, sintering bonding, etc.). Pressure processing includes processing in which only pressure is applied, and processing in which pressure and heat are applied.

[0015] The "workpiece" is the object to be pressurized in this system (i.e., the object to be pressurized), and is, for example, a sheet-like base material (such as a ceramic green sheet), or a substrate on which electronic components, circuits, etc. are mounted.

[0016] "Related processes" are processes related to the pressurization process in this system, and include pre-processing required for the workpiece in order to perform the pressurization process (e.g., assembling the chamber unit, storing the workpiece in the chamber unit, pre-heating the workpiece, etc.), and post-processing required for the workpiece after performing the pressurization process (e.g., cooling the workpiece, removing the workpiece from the chamber unit, etc.). In this embodiment, the related processes include storing process and pre-heating process as pre-processing for the pressurization process, and primary cooling process, secondary cooling process, and removal process as post-processing for the pressurization process. In addition, since the state of the chamber unit is related to the success or failure of the pressurization process, maintenance processes for the chamber unit (the upper unit, described below) are also included in the related processes.

[0017] ●Pressurization system● Composition of the pressurizing system FIG. 1 is a schematic perspective view showing an embodiment of the present system 1. As shown in FIG. FIG. 2 is a functional block diagram of the system 1. In FIG. 1, the boundaries of each area, which will be described later, are indicated by thick dashed dotted lines.

[0018] This system 1 performs pressurization and related processes on the workpiece W. This system 1 includes a housing 2, a control device 3, a storage device 4, a preheating device 5, a pressurizing device 6, a primary cooling device 7, an unloading device 8, a transport device 9, an atmosphere adjusting device 10, a carry-in device 11, an unloading device 12, and a plurality of chamber units 20 (five in this embodiment).

[0019] The housing 2 houses the control device 3, the storage device 4, the preheating device 5, the pressurizing device 6, the primary cooling device 7, the removal device 8, the transport device 9, the atmosphere adjustment device 10, the carry-in device 11, the carry-out device 12, and the chamber unit 20. In a plan view, the shape of the housing 2 is a rectangular shape along the X-axis direction and the Y-axis direction (hereinafter referred to as the "XY-axis direction"), and is a hollow rectangular parallelepiped. The housing 2 is placed on a horizontal floor surface. In the following description, the "horizontal direction" is a direction parallel to the floor surface and a direction parallel to the XY-axis direction. The horizontal direction includes not only a completely horizontal direction, but also a slight inclination of the floor surface and an error (slight inclination) due to the manufacturing tolerance and assembly tolerance of each part constituting the present system 1.

[0020] When viewed from above, the space inside the housing 2 is divided into a carry-in area A1, a plurality of execution areas A2, and an unloading area A3. In other words, the system 1 has a carry-in area A1, a plurality of execution areas A2, and an unloading area A3. In this specification, when the carry-in area A1, the plurality of execution areas A2, and the unloading area A3 are not particularly distinguished from each other, they are simply referred to as "areas."

[0021] The "carry-in area A1" is an area where a carrying-in process is carried out in which the workpiece W is carried in toward the execution area A2.

[0022] The "execution area A2" is an area in which one of the pressurizing process and the related process is executed. The execution area A2 includes a plurality of execution areas A21 to A26 corresponding to the pressurizing process and the related processes, respectively.

[0023] "Execution area A21" is an area where the storage process is performed, and is an example of a storage area in the present invention. "Execution area A22" is an area where the pre-heating process is performed, and is an example of a pre-heating area in the present invention. "Execution area A23" is an area where the pressurizing process is performed, and is an example of a pressurizing area in the present invention. "Execution area A24" is an area where the primary cooling process is performed, and is an example of a cooling area in the present invention. "Execution area A25" is an area where the secondary cooling process and removal process are performed, and are examples of a cooling area and removal area in the present invention. "Execution area A26" is an area where the maintenance process is performed, and is an example of a maintenance area in the present invention.

[0024] The "unloading area A3" is an area where a unloading process is performed in which the workpiece W after the pressurization process is unloaded from the execution area.

[0025] In a top view, the execution area A2 is disposed between the carry-in area A1 and the carry-out area A3. The execution areas A21 to A26 are disposed in a rectangular ring shape in a clockwise direction in a top view according to the order in which the processes for the workpiece W and the upper unit 22 (see FIG. 5; the same applies below) are executed. Specifically, the execution area A21 is disposed adjacent to the carry-in area A1 on the +X-axis direction side, the execution area A22 is disposed adjacent to the +Y-axis direction side of the execution area A21, the execution area A23 is disposed adjacent to the +X-axis direction side of the execution area A22, the execution area A24 is disposed adjacent to the +X-axis direction side of the execution area A23, the execution area A25 is disposed adjacent to the -Y-axis side of the execution area A24, the execution area A26 is disposed adjacent to the -X-axis side of the execution area A25 and the +X-axis side of the execution area A21, and the carry-out area A3 is disposed adjacent to the +X-axis side of the execution area A25. That is, in the X-axis direction, execution area A23 is disposed between execution areas A22 and A24, and execution area A26 is disposed between execution areas A21 and A25.

[0026] The control device 3 controls the overall operation of the system 1. The control device 3 includes, for example, a processor such as a CPU (Central Processing Unit) 3a, a volatile memory such as a RAM (Random Access Memory) 3b that functions as a working area for the CPU 3a, and a non-volatile memory such as a ROM (Read Only Memory) 3c that stores various information such as a control program.

[0027] FIG. 3 is a schematic cross-sectional view showing the main configuration of each device arranged in each of the execution areas A21 to A26. The figure shows a schematic cross-sectional view of each device as viewed in a direction (X-axis direction or Y-axis direction) in which rail members R1 to R16 (described later) arranged in each of the execution areas A21 to A26 are oriented.

[0028] The accommodation device 4 assembles the chamber unit 20 by attaching the mounting table 21, on which the workpiece W is placed, to the upper unit 22, and accommodates the workpiece W in the chamber unit 20. The accommodation device 4 includes a table 40 and a lifting device 41. The accommodation device 4 is disposed in the execution area A21. The mounting table 21 and the upper unit 22 will be described in detail later.

[0029] The table 40 is a table on which the mounting base 21 is placed. The shape of the table 40 is, for example, a rectangular plate along the X-axis direction and the Y-axis direction (hereinafter referred to as the "XY-axis direction") when viewed from above. The upper surface 40a of the table 40 is a flat surface parallel to the horizontal direction.

[0030] The lifting device 41 lifts and lowers the table 40. The lifting device 41 is, for example, a known cylinder.

[0031] The preheating device 5 heats the workpiece W accommodated in the chamber unit 20 to a preheating temperature, which will be described later. The preheating device 5 includes a table 50, a preheating unit 51, and a lifting device 53. The preheating device 5 is disposed in the execution area A22.

[0032] The table 50 is a platform on which the preheating unit 51 is placed. The shape of the table 50 is, for example, a rectangular plate shape aligned along the XY axis direction when viewed from above.

[0033] The preheating unit 51 is disposed above the table 50 and attached to the table 50. The preheating unit 51 includes a main body 51a, a heat insulating member 51b, and a plurality of heaters H1. The main body 51a protects the heaters H1. The main body 51a is made of, for example, a metal (for example, a copper alloy) having high thermal conductivity. The shape of the main body 51a is, for example, a rectangular shape along the XY axis direction when viewed from above, and a rectangular parallelepiped shape. The heat insulating member 51b covers the periphery of the main body 51a (the entire periphery in the horizontal direction and the downward direction; the same applies below) and suppresses leakage of heat from the heaters H1 to the surroundings. The heaters H1 are disposed inside the main body 51a. The upper surface 51c of the preheating unit 51 is flat and parallel to the horizontal direction.

[0034] The lifting device 52 lifts and lowers the table 50 and the preheating unit 51. The lifting device 52 is, for example, a known cylinder.

[0035] The pressurizing device 6 applies pressure to the workpiece W accommodated in the chamber unit 20. The pressurizing device 6 includes a lower base member 60, a heat unit 61, and a lifting device 62. The pressurizing device 6 is disposed in the execution area A23.

[0036] The lower base member 60 supports the thermal unit 61. The lower base member 60 is made of, for example, a metal having high rigidity (for example, stainless steel). The shape of the lower base member 60 is, for example, a rectangular shape along the XY axis direction when viewed in the up-down direction, and a rectangular parallelepiped shape.

[0037] The thermal unit 61 is disposed above the lower base member 60 and attached to the lower base member 60. The thermal unit 61 includes a main body 61a, a heat insulating member 61b, a plurality of heaters H2, and a plurality of refrigerant flow paths C1. The main body 61a protects the heaters H2 and the refrigerant flow paths C1. The main body 61a is made of, for example, a metal having high rigidity (for example, carbon steel). The shape of the main body 61a is a rectangular shape along the XY axis direction when viewed from the top and bottom, and is a rectangular parallelepiped shape. The heat insulating member 61b covers the periphery of the main body 61a and is disposed so as to divide the main body 61a into two, upper and lower. The heat insulating member 61b suppresses leakage of heat from the heater H2 to the surroundings and condensation on the main body 61a. The heater H2 heats the workpiece W when the workpiece W is pressurized. The heater H2 is disposed in the upper half of the main body 61a. The refrigerant flow path C1 is a flow path through which a refrigerant (not shown, same below) flows to cool the lower half of the main body 61a. The refrigerant is cooled by a cooling device (not shown, same below) and circulates between the refrigerant flow path C1 and the cooling device. The refrigerant flow path C1 is disposed within the lower half of the main body 61a. The heat unit 61 is attached on top of the lower base member 60. The heat unit 61 is an example of the pressing unit and heating unit of the present invention. The upper surface 61c of the heat unit 61 is flat and parallel to the horizontal direction.

[0038] The lifting device 62 lifts and lowers the lower base member 60 and the heat unit 61. The lifting device 62 is, for example, a known hydraulic cylinder.

[0039] The primary cooling device 7 cools the heated workpiece W housed in the chamber unit 20. The primary cooling device 7 includes a table 70, a primary cooling unit 71, and a lifting device 72. The primary cooling device 7 is disposed in the execution area A24.

[0040] The table 70 is a platform on which the primary cooling unit 71 is placed. The shape of the table 70 is, for example, a rectangular plate shape aligned along the XY axis direction when viewed from above.

[0041] The primary cooling unit 71 is disposed above the table 70 and attached to the table 70. The primary cooling unit 71 includes a main body 71a, a heat insulating member 71b, and a plurality of refrigerant flow paths C2. The main body 71a protects the refrigerant flow paths C2. The main body 71a is made of, for example, a metal (for example, a copper alloy) having high thermal conductivity. The shape of the main body 71a is, for example, a rectangular shape along the XY axis direction when viewed from above, and is a rectangular parallelepiped shape. The heat insulating member 71b covers the periphery of the main body 71a and suppresses condensation on the main body 71a. The refrigerant flow paths C2 are flow paths through which the refrigerant flows. The refrigerant is cooled by a cooling device and circulated between the refrigerant flow paths C2 and the cooling device. An upper surface 71c of the primary cooling unit 71 is a flat surface parallel to the horizontal direction. The primary cooling unit 71 is an example of a cooling unit in the present invention.

[0042] The lifting device 72 lifts and lowers the table 70 and the primary cooling unit 71. The lifting device 72 is, for example, a known cylinder.

[0043] The take-out device 8 cools the workpiece W accommodated in the chamber unit 20 and takes out the workpiece W from the chamber unit 20. The take-out device 8 includes a table 80, a secondary cooling unit 81, and a lifting device 82. The take-out device 8 is disposed in the execution area A25.

[0044] The table 80 is a platform on which the secondary cooling unit 81 is placed. The shape of the table 80 is, for example, a rectangular plate shape aligned along the XY axis direction when viewed from above.

[0045] The secondary cooling unit 81 is disposed above the table 80 and attached to the table 80. The secondary cooling unit 81 includes a main body 81a, a heat insulating member 82b, and a plurality of refrigerant flow paths C3. The main body 81a protects the refrigerant flow paths C3. The main body 81a is made of, for example, a metal (for example, a copper alloy) having high thermal conductivity. The shape of the main body 81a is, for example, a rectangular shape along the XY axis direction when viewed from above, and is a rectangular parallelepiped shape. The heat insulating member 81b covers the periphery of the main body 81a and suppresses condensation on the main body 81a. The refrigerant flow paths C3 are flow paths through which the refrigerant flows. The refrigerant is cooled by a cooling device and circulated between the refrigerant flow paths C3 and the cooling device. An upper surface 81c of the secondary cooling unit 81 is a flat surface parallel to the horizontal direction. The secondary cooling unit 81 is an example of a cooling unit in the present invention.

[0046] The lifting device 82 lifts and lowers the table 80 and the secondary cooling unit 81. The lifting device 82 is, for example, a known cylinder.

[0047] FIG. 4 is a schematic plan view of the system 1. As shown in FIG. For ease of explanation, the figure mainly shows a transfer device 9, a carry-in device 11, and an unloading device 12. In the figure, base members B1 to B8, which will be described later, are shown in a semi-transparent state, and a chamber unit 20 is shown by a two-dot chain line. In the following explanation, Figures 1 to 3 will also be referred to as appropriate.

[0048] The transport device 9 transports the chamber unit 20 and the upper unit 22. The transport device 9 includes a plurality of (16 in this embodiment) rail members R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, R14, R15, and R16, a plurality of (8 in this embodiment) base members B1, B2, B3, B4, B5, B6, B7, and B8, a plurality of rollers Ro, a drive device 90, and four rotation mechanisms 91, 92, 93, and 94. The rotation mechanisms 91 to 94 are examples of the conversion mechanisms of the present invention.

[0049] The rail members R1 to R16 support the chamber unit 20 so that the chamber unit 20 can move in the horizontal direction (X-axis direction or Y-axis direction). The rail members R1 to R16 are, for example, elongated along the X-axis direction or Y-axis direction. The lower ends of the rail members R1 to R16 protrude to one side in the short side direction, and the rail members R1 to R16 are "L" shaped when viewed in the longitudinal direction of the rail members R1 to R16. The rail members R1 to R16 are designed to have a strength capable of supporting the chamber unit 20, which is a heavy object. In the following description, when the rail members R1 to R16 are not particularly distinguished, the rail members R1 to R16 are simply referred to as "rail member R". When the longitudinal direction of the rail member R is along the X-axis direction, the rail member R is oriented in the X-axis direction, and when the longitudinal direction is along the Y-axis direction, the rail member R is oriented in the Y-axis direction.

[0050] The base members B1 to B8 support the corresponding rail members R1 to R16. The base members B1 to B8 have a rectangular shape along the XY axis direction when viewed from above, and are cuboid-like. The rail members R1 to R16 are attached to the underside of two of the four parallel sides of the corresponding base members B1 to B8 so that their protruding portions face each other.

[0051] The base member B1 supports the rail members R1 and R2. The base member B1 is disposed above the table 40 in the execution area A21, i.e., in the upper space in the execution area A21. The base member B1 is attached to the ceiling (not shown; the same applies below) of the housing 2 via a rotation mechanism 91.

[0052] The base member B2 supports the rail members R3 and R4. The base member B2 is disposed above the pre-heating unit 51 in the execution area A22, i.e., in the upper space in the execution area A22. The base member B2 is attached to the ceiling of the housing 2 via a rotation mechanism 92.

[0053] The base member B3 supports the rail members R5 and R6. The base member B3 is disposed above the primary cooling unit 71 in the execution area A24, i.e., in the upper space in the execution area A24. The base member B3 is attached to the ceiling of the housing 2 via a rotation mechanism 93.

[0054] The base member B4 supports the rail members R7 and R8. The base member B4 is disposed above the secondary cooling unit 81 in the execution area A25, i.e., in the upper space in the execution area A25. The base member B4 is attached to the ceiling of the housing 2 via a rotation mechanism 94.

[0055] The base member B5 supports the rail members R9 and R10. The base member B5 is disposed between the base members B1 and B2 in the execution areas A21 and A22. That is, the base member B5 is disposed in the upper space in the execution areas A21 and A22. The base member B5 is attached to the ceiling of the housing 2.

[0056] The base member B6 supports the rail members R11 and R12. The base member B6 is disposed above the heat unit 61 in the execution area A23, i.e., in the upper space in the execution area A23. The base member B6 is attached to the ceiling of the housing 2. As described later, a predetermined pressure is applied to the base member B6 during the pressurization process, and the base member B6 is designed to have the strength to withstand the pressure. During the pressurization process, the base member B6 constitutes an upper pressurization unit 6U (see FIG. 13; the same applies below) together with a part of the upper unit 22.

[0057] The base member B7 supports the rail members R13 and R14. The base member B7 is disposed between the base members B3 and B4 in the execution areas A24 and A25. That is, the base member B7 is disposed in the upper space in the execution areas A24 and A25. The base member B7 is attached to the ceiling of the housing 2.

[0058] The base member B8 supports the rail members R15 and R16. The base member B8 is disposed between the base members B1 and B4 in the execution area A26. That is, the base member B8 is disposed in the upper space in the execution area A26. The base member B8 is attached to the ceiling of the housing 2.

[0059] The driving device 90 generates power for transporting the chamber unit 20 and transmits it to the rollers Ro. The driving device 90 includes, for example, one or more power sources (e.g., motors) and a plurality of power transmission mechanisms (e.g., gears, ball screws, etc.).

[0060] The rotation mechanisms 91 to 94 rotate the corresponding base members B1 to B4. The rotation mechanisms 91 to 94 are each configured to be rotatable about the Z axis, for example, and include a motor and a plurality of gears.

[0061] The rotation mechanism 91 is disposed between the ceiling of the housing 2 and the base member B1. The rotation mechanism 91 rotates the base member B1 so that the rail members R1, R2 are oriented in either the X-axis direction or the Y-axis direction. In other words, the rotation mechanism 91 converts the movement direction of the chamber unit 20 guided by the rail members R1, R2 between the X-axis direction and the Y-axis direction.

[0062] The rotation mechanism 92 is disposed between the ceiling of the housing 2 and the base members B1 and B2. The rotation mechanism 92 rotates the base member B2 so that the rail members R3 and R4 are oriented in either the X-axis direction or the Y-axis direction. In other words, the rotation mechanism 92 converts the movement direction of the chamber unit 20 guided by the rail members R3 and R4 between the X-axis direction and the Y-axis direction.

[0063] The rotation mechanism 93 is disposed between the ceiling of the housing 2 and the base member B3. The rotation mechanism 93 rotates the base member B3 so that the rail members R5, R6 are oriented in either the X-axis direction or the Y-axis direction. In other words, the rotation mechanism 93 converts the movement direction of the chamber unit 20 guided by the rail members R5, R6 between the X-axis direction and the Y-axis direction.

[0064] The rotation mechanism 94 is disposed between the ceiling of the housing 2 and the base member B4. The rotation mechanism 94 rotates the base member B4 so that the rail members R7, R8 are oriented in either the X-axis direction or the Y-axis direction. In other words, the rotation mechanism 94 converts the movement direction of the chamber unit 20 guided by the rail members R7, R8 between the X-axis direction and the Y-axis direction.

[0065] In this way, the base members B1 to B4 are rotatable base members that can rotate about the Z axis, whereas the base members B5 to B8 are fixed base members that cannot rotate.

[0066] In the present invention, the configuration of the transfer device 9 is not limited to this embodiment as long as it is capable of transferring the chamber unit 20 and the upper unit 22 between the execution areas A21 to A26.

[0067] The atmosphere adjustment device 10 adjusts the atmosphere of the accommodation chamber 20R, which will be described later. The atmosphere adjustment device 10 includes a vacuum pump P, a reduced pressure system pipe Lp, a gas system pipe Lg, a plurality of (five in this embodiment) valves V1, V2, V3, V4, and V5, and a plurality of (five in this embodiment) fixed connectors Cs1, Cs2, Cs3, Cs4, and Cs5. The atmosphere adjustment device 10 is configured to be able to adjust the atmosphere of the accommodation chamber 20R to a reduced pressure atmosphere (vacuum atmosphere) or an inert gas atmosphere.

[0068] The vacuum pump P adjusts the atmosphere in the accommodation chamber 20R to a reduced pressure atmosphere (vacuum atmosphere). The vacuum pump P is a known vacuum pump. The vacuum pump P is connected to the fixed connectors Cs1 to Cs5 via the reduced pressure system piping Lp and the valves V1 to V5.

[0069] The decompression system pipe Lp is a pipe connected to a vacuum pump P. The gas system pipe Lg is a pipe connected to a supply pipe (not shown, same below) for an inert gas (e.g., nitrogen gas). The decompression system pipe Lp and the gas system pipe Lg are branched into a plurality of branch pipes (at least five in this embodiment), and each branch pipe is connected to a corresponding fixed connector Cs1 to Cs5 via a corresponding valve V1 to V5. The valves V1 to V5 are known solenoid valves that switch the connection of the decompression system pipe Lp and the gas system pipe Lg to the fixed connectors Cs1 to Cs5.

[0070] The fixed connectors Cs1 to Cs5 are piping joints to which the movable connector Cp described below is connected. The fixed connectors Cs1 to Cs5 are, for example, sockets of a known coupler with a check valve. The fixed connector Cs1 is disposed in the execution area A21, the fixed connector Cs2 is disposed in the execution area A22, the fixed connector Cs3 is disposed in the execution area A23, the fixed connector Cs4 is disposed in the execution area A24, and the fixed connector Cs5 is disposed in the execution area A25. The fixed connectors Cs1 to Cs5 are configured to close even in a reduced pressure atmosphere when the connection with the movable connector Cp is released.

[0071] In the present invention, the fixed connectors Cs1 to Cs5 may be disposed in the execution areas A21 to A25 via a mechanism (e.g., a floating mechanism) that absorbs or reduces the impact from the movable connector Cp accompanying the transportation of the chamber unit 20. Furthermore, the fixed connectors Cs1 to Cs5 may be disposed in the execution areas A21 to A25 so as to be able to advance and retreat toward the movable connector Cp after the transportation of the chamber unit 20 is completed.

[0072] The carry-in device 11 carries the placement table 21 on which the workpiece W is placed, into the accommodation device 4 (table 40) in the execution area A21. The carry-in device 11 includes, for example, a slide rail and a motor for operating the slide rail.

[0073] The unloading device 12 unloads the mounting table 21 on which the pressurized workpiece W is placed from the unloading device 8 (secondary cooling unit 81) in the execution area A25. The unloading device 12 includes, for example, a slide rail and a motor for operating the slide rail.

[0074] Chamber unit configuration FIG. 5 is a schematic cross-sectional view of the chamber unit 20. As shown in FIG.

[0075] The chamber unit 20 accommodates the workpiece W and is transported among the execution areas A21 to A25. The chamber unit 20 includes a mounting table 21, an upper unit 22, and an accommodation chamber 20R.

[0076] The mounting table 21 transports the workpiece W and defines the accommodation chamber 20R. As described later, the mounting table 21 functions as a transport plate for the workpiece W and also functions as a lower pressurizing unit 6D (see FIG. 13, the same applies below) when the workpiece W is pressurized. The mounting table 21 is made of, for example, a metal (for example, a copper alloy) having high thermal conductivity. The shape of the mounting table 21 is a rectangular shape along the XY axis direction when viewed from above, and is a plate shape. The mounting table 21 has a strength sufficient to withstand the force applied in the operation of the present system 1 described later, and has a thickness such that the heat capacity of the mounting table 21 during heating / cooling of the workpiece W is relatively small. The shapes of the upper surface 21a and the lower surface 21b of the mounting table 21 are flat and parallel to the horizontal direction. The mounting table 21 is configured to be detachable from the upper unit 22 (side member 27).

[0077] The upper unit 22 covers the workpiece W from above. The upper unit 22 includes a base member 23, an upper die 24, a frame member 25, a pressure pad 26, a side member 27, a first spring member 28, a second spring member 29, two seal members 30 and 31, and a movable connector Cp. As described below, the base member 23, the upper die 24, and the pressure pad 26 function as an upper pressure unit 6U when the workpiece W is pressed.

[0078] The base member 23 supports the upper mold 24, the first spring member 28, and the second spring member 29. The base member 23 is made of, for example, a metal having high rigidity (for example, stainless steel). The shape of the base member 23 is a rectangle along the XY axis direction when viewed from above, and a rectangular parallelepiped that is flattened in the up-down direction.

[0079] The upper die 24 presses the workpiece W from above via a pressure pad 26. The upper die 24 is made of, for example, a metal having high rigidity (for example, stainless steel). The upper die 24 is disposed below the base member 23 and attached to the lower surface 23a of the base member 23. The shape of the upper die 24 is a rectangular parallelepiped that is smaller than the base member 23 and aligned along the XY axis directions when viewed from below. The lower surface 24a of the upper die 24 is flat and parallel to the horizontal direction.

[0080] In the present invention, the upper die 24 may be molded integrally with the base member 23 .

[0081] The frame member 25 holds the pressure pad 26. The frame member 25 is made of, for example, a metal (for example, stainless steel) having high rigidity. When viewed from below, the frame member 25 has a rectangular frame shape along the XY axis direction. That is, when viewed from below, a rectangular internal space is formed in the center of the frame member 25. In the horizontal direction, the frame member 25 is disposed so as to surround the upper mold 24. That is, the upper mold 24 is disposed in the internal space. In the vertical direction, the lower end portion 25a of the frame member 25 is located below the lower surface 24a of the upper mold 24. The frame member 25 is supported by the base member 23 via the first spring member 28 so as to be movable relative to the upper mold 24 in the vertical direction. The frame member 25 has a groove portion 25c formed so as to go around the outer circumferential surface 25b of the frame member 25.

[0082] When the workpiece W is pressed, the pressure pad 26 deforms to follow the shape of the surface of the workpiece W, uniformly pressurizing the workpiece W and defining the accommodation chamber 20R. The pressure pad 26 is held by the lower end portion 25a of the frame member 25 and disposed below the upper die 24. The pressure pad 26 includes a flexible layer 26a and a heat insulating layer 26b.

[0083] When the workpiece W is pressurized, the flexible layer 26a transmits the pressure from the upper die 24 evenly to the workpiece W. The flexible layer 26a is made of, for example, a known elastic material having high fluidity and low resilience. The flexible layer 26a is filled, for example, between two membrane members (not shown; the same applies below) arranged above and below the flexible layer 26a. The outer edge of the membrane members is held by the lower end 25a of the frame member 25 over the entire circumference, so that the flexible layer 26a is surrounded by the lower end 25a of the frame member 25 in the horizontal direction.

[0084] When the workpiece W is pressurized, the insulating layer 26b uniformly transmits the pressure from the upper die 24 to the workpiece W and suppresses the transmission of heat from the heat unit 61 to the flexible layer 26a. The insulating layer 26b is made of, for example, a known fiber material having high flexibility and low thermal conductivity. The insulating layer 26b is disposed below the flexible layer 26a and adjacent to the flexible layer 26a. The insulating layer 26b is filled, for example, between two membrane members (not shown; the same applies below) disposed above and below the insulating layer 26b. The outer edge of the membrane member is held by the lower end 25a of the frame member 25 over the entire circumference, so that the insulating layer 26b is surrounded by the lower end 25a of the frame member 25 in the horizontal direction.

[0085] In the present invention, when the temperature of the main heating described below is lower than the heat-resistant temperature of the soft layer 26a, the pressure pad 26 does not need to include the heat insulating layer 26b.

[0086] The side member 27 defines the storage chamber 20R. The side member 27 is made of, for example, a metal (for example, stainless steel) having high rigidity. When viewed from below, the side member 27 has a rectangular frame shape along the XY axis direction. That is, when viewed from below, a rectangular internal space is formed in the center of the side member 27. In the horizontal direction, the side member 27 is disposed so as to surround the frame member 25. That is, the frame member 25 (upper mold 24, pressure pad 26) is disposed in the internal space. The side member 27 is supported by the base member 23 via the second spring member 29 so as to be movable in the up-down direction relative to the upper mold 24 and the frame member 25. The side member 27 includes a groove portion 27b formed in a lower surface 27a of the side member 27, and a through hole 27c opening on the inner surface and outer surface of the side member 27. The through hole 27c is an example of a communication path in the present invention.

[0087] The first spring member 28 supports the frame member 25 so as to be movable in the vertical direction relative to the upper mold 24. The first spring member 28 is disposed between the base member 23 and the frame member 25, and is attached to the lower surface 23a of the base member 23 and the upper surface 25d of the frame member 25.

[0088] The second spring member 29 supports the side member 27 so as to be movable in the up and down direction relative to the upper mold 24 and the frame member 25. The second spring member 29 is disposed between the base member 23 and the side member 27, and is attached to the lower surface 23a of the base member 23 and the upper surface 27d of the side member 27.

[0089] The seal members 30 and 31 hermetically seal between the frame member 25 and the side member 27, and between the mounting table 21 and the side member 27. The seal members 30 and 31 are, for example, known O-rings. The seal member 30 is disposed in the groove portion 25c and abuts against the frame member 25 and the side member 27. The seal member 31 is disposed in the groove portion 27b and abuts against the mounting table 21 and the side member 27.

[0090] The movable connector Cp is a piping joint connected to the fixed connectors Cs1 to Cs5. The movable connector Cp is, for example, a plug of a known coupler with a check valve. The movable connector Cp is attached, for example, to the outer surface of the side member 27 so as to communicate with the through hole 27c. The movable connector Cp is configured to be detachable from the fixed connectors Cs1 to Cs5. The check valve of the movable connector Cp is configured to close when the connection with the fixed connectors Cs1 to Cs5 is released, even if the accommodation chamber R20 is in a reduced pressure atmosphere.

[0091] The accommodation chamber 20R is a space in which the workpiece W formed in the chamber unit 20 is accommodated. The accommodation chamber 20R is a sealed space partitioned by the mounting table 21, the frame member 25, the pressure pad 26, the side member 27, and the seal members 30 and 31. The accommodation chamber 20R is connected to the movable connector Cp via the through hole 27c. The mounting table 21 functions as a floor portion that partitions the accommodation chamber 20R, the pressure pad 26 functions as a ceiling portion that partitions the accommodation chamber 20R, and the side member 27 functions as a peripheral wall portion that partitions the accommodation chamber 20R. That is, the mounting table 21 is an example of a floor portion in the present invention, the pressure pad 26 is an example of a ceiling portion in the present invention, and the side member 27 is an example of a peripheral wall portion in the present invention.

[0092] The chamber unit 20 thus configured is transported between the execution areas A21 to A25 by the transport device 9. At this time, the outer peripheral edge of the base member 23 is placed on the rail members R1 to R16, and the rollers Ro are in contact with the outer peripheral surface 23b of the base member 23. As the rollers Ro rotate, the base member 23 slides on the rail members R1 to R16, and the chamber unit 20 is transported. As described above, since the base members B1 to B8 are attached to the ceiling of the housing 2, the chamber unit 20 passes through the upper spaces in the execution areas A21 to A25 and is transported (moved) between the execution areas A21 to A25.

[0093] Pressurization system operation Next, the operation of the present system 1 will be described below, taking as an example the transportation of one workpiece W. In the following description, FIGS. 1 to 5 will be referred to as appropriate.

[0094] FIG. 6 is a flowchart showing an example of the operation of the system 1. The figure shows the operation of the present system 1 for one work W.

[0095] First, the workpiece W is prepared (ST1). The workpiece W is placed on the corresponding placement table 21 by, for example, a device such as a robot arm or a user of the system 1. The placement tables 21 are stored in a container such as a cassette (not shown, same below), and one placement table 21 is transported from the container to the carry-in device 11. At this time, a sticking prevention sheet (not shown, same below) is placed on the workpiece W. The sticking prevention sheet is a sheet that prevents the workpiece W from sticking to the pressure pad 26 after the heat treatment. The sticking prevention sheet is, for example, a sheet made of a synthetic resin (for example, PTFE (polytetrafluoroethylene)) that has heat resistance to the main heating temperature described later.

[0096] FIG. 7 is a schematic cross-sectional view showing a state in which the mounting table 21 is carried into the accommodation device 4. As shown in FIG. The figure shows a schematic cross section of each device in the execution area A21 as viewed in the direction in which the rail members R1 and R2 are facing. The figure also shows a part of the atmosphere adjustment device 10. The same applies to Figures 8 and 9 described later.

[0097] Next, the control device 3 controls the operation of the carry-in device 11 to carry the mounting table 21 on which the workpiece W is placed from the carry-in area A1 to the execution area A21 (ST2). Specifically, the carry-in device 11 carries the mounting table 21 on which the workpiece W is placed onto the table 40. At this time, the mounting table 21 functions as a transport pallet that transports (carries) the workpiece W to the execution area A21. The upper unit 22 is supported by rail members R1 and R2 oriented in the X-axis direction and is disposed above the mounting table 21 (table 40). The movable connector Cp is connected to the fixed connector Cs1. In the vertical direction, the lower end 27e of the side member 27 is located lower than the pressure pad 26 due to the elastic force of the second spring member 29.

[0098] FIG. 8 is a schematic cross-sectional view showing a state in which the mounting table 21 abuts against the upper unit 22. As shown in FIG. FIG. 9 is a schematic cross-sectional view showing a state in which the workpiece W is accommodated in the chamber unit 20. As shown in FIG.

[0099] Next, the control device 3 controls the operations of the accommodation device 4 and the atmosphere adjustment device 10 to accommodate the workpiece W in the chamber unit 20 (ST3). That is, the accommodation process is performed.

[0100] The "accommodating process" is a process in which the chamber unit 20 is assembled and the workpiece W is accommodated in the chamber unit 20. Since the pressurizing process is performed on the workpiece W accommodated in the chamber unit 20, the accommodating process is a process for preparing for the pressurizing process, that is, a pre-processing for the pressurizing process.

[0101] Specifically, the lifting device 41 raises the table 40 until the mounting table 21 on which the workpiece W is placed is in close contact with the upper unit 22 (seal member 31). At this time, a storage chamber 20R is formed between the mounting table 21 and the upper unit 22, and the workpiece W is stored in the storage chamber 20R. Next, the atmosphere adjustment device 10 operates the vacuum pump P and the valve V1 to replace the atmosphere in the storage chamber 20R with an inert gas, and then makes the atmosphere in the storage chamber 20R a reduced pressure atmosphere. At this time, the mounting table 21 is in close contact with (attached to) the side member 27 due to the vacuum pressure (pressure difference between the storage chamber 20R and the external space of the chamber unit 20), and the second spring member 29 contracts, causing the mounting table 21 and the side member 27 to rise. That is, in the vertical direction, the frame member 25 and the pressure pad 26 approach the mounting table 21 (workpiece W). In other words, the frame member 25 and the pressure pad 26 are lowered relative to the mounting table 21. Finally, the pressure pad 26 comes into contact with the workpiece W, and the workpiece W is pre-pressurized by a pressure force corresponding to the vacuum pressure. The frame member 25 is also in contact with the mounting table 21. The pre-pressurization causes the pressure pad 26 to deform according to the shape of the surface of the workpiece W, and the workpiece W is held by the mounting table 21 and the pressure pad 26. Here, the pressure force applied to the workpiece W in the pre-pressurization is sufficiently smaller than the pressure force applied to the workpiece W in the pressurization process. Next, the lifting device 41 lowers the table 40. In this way, in the execution area A21, the mounting table 21 is attached to the upper unit 22, whereby the chamber unit 20 is assembled, and the workpiece W is accommodated in the chamber unit 20 (the accommodation process is performed). When the chamber unit 20 is assembled, the mounting table 21 is positioned below the workpiece W, the pressure pad 26 is positioned above the workpiece W, and the side members 27 are positioned so as to surround the entire circumference of the workpiece W in the horizontal direction.

[0102] Next, the control device 3 controls the operation of the transfer device 9 to move the chamber unit 20 from the execution area A21 to the execution area A22 (ST4). Specifically, the rotation mechanism 91 rotates the base member B1 by 90° in a clockwise direction when viewed from above. At this time, the orientation of the rail members R1 and R2 is converted from the X-axis direction to the Y-axis direction. That is, the movement direction of the chamber unit 20 is converted from the X-axis direction to the Y-axis direction. That is, the execution area A21 also functions as a conversion area in the present invention. Next, the rollers Ro corresponding to the rail members R1 to R4, R9, and R10 rotate, so that the chamber unit 20 is transferred to the execution area A22 via the rail members R9 and R10. At this time, the orientation of the rail members R3 and R4 is oriented in the Y-axis direction. Next, the rotation mechanism 92 rotates the base member B2 by 90° in a clockwise direction when viewed from above. At this time, the orientation of the rail members R3 and R4 is converted from the Y-axis direction to the X-axis direction. That is, the movement direction of the chamber unit 20 is changed from the Y-axis direction to the X-axis direction. That is, the execution area A22 also functions as a change area in the present invention. Next, the rotation mechanism 91 rotates the base member B1 by 90° in the counterclockwise direction when viewed from above.

[0103] When the chamber unit 20 moves from the execution area A21, the connection between the movable connector Cp and the fixed connector Cs1 is released. At this time, the check valve of the movable connector Cp is closed, so that the accommodation chamber 20R is sealed and the reduced pressure atmosphere in the accommodation chamber 20R is maintained.

[0104] FIG. 10 is a schematic cross-sectional view showing a state in which the chamber unit 20 has been transferred to the execution area A22 where the preliminary heating process is performed. FIG. 11 is a schematic cross-sectional view showing the chamber unit 20 in which a preliminary heating process is being performed. These figures show schematic cross sections of each device in the execution area A22 as viewed in the direction in which the rail members R3 and R4 are oriented. These figures also show a part of the atmosphere adjustment device 10.

[0105] Next, the control device 3 controls the operation of the preheating device 5 to perform a preheating process on the workpiece W (ST5).

[0106] The "preheating process" is a process for heating the workpiece W to a predetermined preheating temperature before the pressure treatment. The preheating process is a pretreatment performed before the pressure treatment in order to shorten the heating time of the workpiece W in the pressure treatment. The preheating temperature is a temperature (e.g., about 200°C) lower than the main heating temperature described below.

[0107] Specifically, the lifting device 52 raises the table 50 and the preheating unit 51 until the upper surface 51c of the preheating unit 51 abuts against the chamber unit 20 (the lower surface 21b of the mounting table 21). Next, the lifting device 52 maintains the state in which the preheating unit 51 abuts against the mounting table 21 for a predetermined time. Here, the preheating unit 51 is heated in advance to a predetermined preheating temperature. Therefore, the heat from the preheating unit 51 is transferred to the workpiece W via the mounting table 21. After the predetermined time has elapsed, the lifting device 52 lowers the table 50 to end the preheating process.

[0108] When the chamber unit 20 is located in the execution area A22, the movable connector Cp is connected to the fixed connector Cs2. The atmosphere adjustment device 10 operates the vacuum pump P and the valve V2 to maintain the atmosphere of the accommodation chamber 20R in the execution area A22 at a reduced pressure.

[0109] Next, the control device 3 controls the operation of the transfer device 9 to move the chamber unit 20 from the execution area A22 to the execution area A23 (ST6). Specifically, the rollers Ro corresponding to the rail members R3, R4, R11, and R12 rotate to transfer the chamber unit 20 to the execution area A23. Next, the rotation mechanism 92 rotates the base member B2 by 90° in the counterclockwise direction when viewed from above.

[0110] When the chamber unit 20 moves from the execution area A22, the connection between the movable connector Cp and the fixed connector Cs2 is released. At this time, the check valve of the movable connector Cp is closed, so that the accommodation chamber 20R is sealed and the reduced pressure atmosphere in the accommodation chamber 20R is maintained.

[0111] FIG. 12 is a schematic cross-sectional view showing a state in which the chamber unit 20 has been transferred to the execution area A23 where the pressurization process is performed. FIG. 13 is a schematic cross-sectional view showing the chamber unit 20 in which a pressurizing process is being performed. These figures show schematic cross sections of each device in the execution area A23 as viewed in the direction in which the rail members R11 and R12 are oriented. These figures also show a part of the atmosphere adjustment device 10.

[0112] Next, the control device 3 controls the operation of the pressurizing device 6 to perform a pressurizing process on the workpiece W (ST7).

[0113] Specifically, the lifting device 62 raises the lower base member 60 and the heat unit 61 until the upper surface 61c of the heat unit 61 abuts against the chamber unit 20 (the lower surface 21b of the mounting table 21). Next, the lifting device 62 raises the lower base member 60 and the heat unit 61 until a predetermined pressure force (hereinafter referred to as "main pressure force") is applied to the workpiece W. At this time, the mounting table 21 rises together with the frame member 25 and the side member 27, and the upper mold 24 descends relative to the frame member 25 and the side member 27. Therefore, the upper mold 24 presses the pressure pad 26 downward, and the pressure pad 26 deforms so as to follow the shape of the surface of the workpiece W, uniformly pressurizing the workpiece W. As a result, the workpiece W is pressed against the mounting table 21 from below, and pressed against the pressure pad 26 (upper mold 24) from above.

[0114] When the workpiece W is pressurized, the base member 23 is lifted from the rail members R11 and R12 by the lifting device 62 and abuts against the base member B6. That is, the base member B6 restricts the upward movement of the chamber unit 20, and the chamber unit 20 is sandwiched between the heat unit 61 and the base member B6. At this time, the base member B6 and the lower base member 60 function as a so-called bolster that receives the main pressurizing force by the lifting device 62. As a result, the main pressurizing force is applied to the workpiece W, and the main pressurizing force applied to the workpiece W is stable. In this way, by receiving the main pressurizing force in the pressurizing process not only by the base member 23 alone but also by the two base members 23 and B6, the thickness of the base member 23 can be designed to be thinner than when the main pressurizing force is received by the base member 23 alone. Therefore, the weight of the chamber unit 20 and the upper unit 22 can be reduced, and the power required for transporting them can be reduced. Furthermore, since the main pressure force is not applied to the rail members R11 and R12, no load based on the main pressure force is applied to the rail members R11 and R12.

[0115] Next, the lifting device 62 maintains the state in which the main pressure force is applied to the workpiece W for a predetermined time. Here, the upper half of the heat unit 61 is heated in advance to a predetermined heating temperature (hereinafter referred to as the "main pressure temperature"; for example, about 300°C). Therefore, the heat from the heat unit 61 is transferred to the workpiece W through the mounting table 21. At this time, the heat from the heat unit 61 is also transferred to the pressure pad 26 through the frame member 25 and the workpiece W. As described above, since the heat insulating layer 26b is arranged below the flexible layer 26a, the heat from the heat unit 61 is difficult to transfer to the flexible layer 26a by the heat insulating layer 26b. In other words, the flexible layer 26a is thermally protected by the heat insulating layer 26b. After the predetermined time has elapsed, the lifting device 62 lowers the lower base member 60 and the heat unit 61 to end the pressurization process. At this time, the chamber unit 20 is supported by the rail members R11 and R12.

[0116] Here, when the chamber unit 20 is located in the execution area A23, the movable connector Cp is connected to the fixed connector Cs3. The atmosphere adjustment device 10 operates the vacuum pump P and the valve V3 to maintain the atmosphere of the accommodation chamber 20R in the execution area A23 at a reduced pressure. Therefore, the workpiece W during the pressurization process is not exposed to the outside air and is not oxidized.

[0117] In this manner, in the pressurization process, the base member 23, the upper mold 24, and the pressurization pad 26 of the chamber unit 20 function together with the base member B6 as an upper pressurization unit 6U that pressurizes the workpiece W from above. Also, in the chamber unit 20, the mounting table 21 functions together with the lower base member 60 and the heat unit 61 as a lower pressurization unit 6D that pressurizes the workpiece W from below.

[0118] Next, the control device 3 controls the operation of the transport device 9 to move the chamber unit 20 from the execution area A23 to the execution area A24 (ST8). Specifically, the rollers Ro corresponding to the rail members R5, R6, R11, and R12 rotate, so that the chamber unit 20 is transported to the execution area A24. At this time, the rail members R5 and R6 are oriented in the X-axis direction. Next, the rotation mechanism 93 rotates the base member B3 by 90° in the clockwise direction when viewed from above. At this time, the orientation of the rail members R5 and R6 is changed from the X-axis direction to the Y-axis direction. That is, the movement direction of the chamber unit 20 is changed from the X-axis direction to the Y-axis direction. That is, the execution area A24 also functions as a change area in the present invention.

[0119] When the chamber unit 20 moves from the execution area A23, the connection between the movable connector Cp and the fixed connector Cs3 is released. At this time, the check valve of the movable connector Cp is closed, so that the accommodation chamber 20R is sealed and the reduced pressure atmosphere in the accommodation chamber 20R is maintained.

[0120] FIG. 14 is a schematic cross-sectional view showing a state in which the chamber unit 20 has been transferred to the execution area A24 where the primary cooling process is executed. FIG. 15 is a schematic cross-sectional view showing the chamber unit 20 in which the primary cooling process is being performed. These figures show schematic cross sections of each device in the execution area A24 as viewed in the direction in which the rail members R5 and R6 are oriented. These figures also show a part of the atmosphere adjustment device 10.

[0121] Next, the control device 3 controls the operation of the primary cooling device 7 to perform a primary cooling process on the workpiece W after the pressure treatment (ST9).

[0122] The "primary cooling process" is a process for cooling the workpiece W after the pressure treatment to a predetermined temperature (e.g., about 100°C). The primary cooling process is a post-pressure treatment process that is performed after the heating process in order to cool the workpiece W after the pressure treatment. In the pressure treatment, not only the workpiece W but also the chamber unit 20 (the mounting table 21, the frame member 25, and the side member 27) are heated. Since the heat capacity of these is relatively large, it takes time to cool the workpiece W. In particular, the rate at which the temperature decreases slows down once a predetermined temperature (e.g., about 100°C) is reached. Therefore, in this system 1, in order to shorten the cooling time, the cooling process of the workpiece W is performed in two stages, a primary cooling process and a secondary cooling process, based on the predetermined temperature.

[0123] Specifically, the lifting device 72 raises the table 70 and the primary cooling unit 71 until the upper surface 71c of the primary cooling unit 71 abuts against the chamber unit 20 (the lower surface 21b of the mounting table 21). Next, the lifting device 72 maintains the state in which the primary cooling unit 71 abuts against the mounting table 21 for a predetermined time. Here, the primary cooling unit 71 is cooled in advance to a predetermined primary cooling temperature (e.g., about 20°C). Therefore, the workpiece W is cooled to about a predetermined temperature (e.g., about 100°C) by the primary cooling unit 71 via the mounting table 21. After the predetermined time has elapsed, the lifting device 72 lowers the table 70 to end the primary cooling process.

[0124] Here, when the chamber unit 20 is located in the execution area A24, the movable connector Cp is connected to the fixed connector Cs4. The atmosphere adjustment device 10 operates the vacuum pump P and the valve V4 to maintain the atmosphere in the accommodation chamber 20R during the primary cooling process at a reduced pressure. Therefore, the workpiece W during the primary cooling process is not exposed to the outside air and is not oxidized.

[0125] Next, the control device 3 controls the operation of the transport device 9 to move the chamber unit 20 from the execution area A24 to the execution area A25 (ST10). Specifically, the rollers Ro corresponding to the rail members R5 to R8, R13, and R14 rotate, and the chamber unit 20 is transported to the execution area A24 via the rail members R13 and R14. At this time, the rail members R7 and R8 are oriented in the Y-axis direction. Next, the rotation mechanism 94 rotates the base member B4 by 90° in the clockwise direction when viewed from above. At this time, the orientation of the rail members R7 and R8 is changed from the Y-axis direction to the X-axis direction. That is, the movement direction of the chamber unit 20 is changed from the Y-axis direction to the X-axis direction. That is, the execution area A25 also functions as a switching area in the present invention. Next, the rotation mechanism 93 rotates the base member B3 by 90° in the counterclockwise direction when viewed from above.

[0126] When the chamber unit 20 moves from the execution area A24, the connection between the movable connector Cp and the fixed connector Cs4 is released. At this time, the check valve of the movable connector Cp is closed, so that the accommodation chamber 20R is sealed and the reduced pressure atmosphere in the accommodation chamber 20R is maintained.

[0127] FIG. 16 is a schematic cross-sectional view showing a state in which the chamber unit 20 has been transferred to the execution area A25 where the secondary cooling process is executed. FIG. 17 is a schematic cross-sectional view showing the chamber unit 20 after the secondary cooling process is completed. These figures show schematic cross sections of each device in the execution area A25 as viewed in the direction in which the rail members R7 and R8 are facing. These figures also show a part of the atmosphere adjustment device 10. The same applies to FIG. 18 described later.

[0128] Next, the control device 3 controls the operation of the take-out device 8 and the atmosphere adjusting device 10 to perform a secondary cooling process on the workpiece W (ST11), and then performs a take-out process on the workpiece W.

[0129] The "secondary cooling process" is a process for cooling the workpiece W after the primary cooling process to a temperature at which it can be removed (for example, about 60°C or less). The secondary cooling process is a post-pressure process process that is performed after the heating process in order to cool the workpiece W after the pressurization process together with the primary cooling process.

[0130] The "removal process" is a process in which the chamber unit 20 is disassembled (the mounting table 21 is removed from the upper unit 22) and the workpiece W is removed from the chamber unit 20. The removal of the workpiece W from the chamber unit 20 completes a series of processes for the workpiece W, and therefore the removal process is a post-processing of the pressurization process.

[0131] Specifically, the lifting device 82 raises the table 80 and the secondary cooling unit 81 until the upper surface 81c of the secondary cooling unit 81 abuts against the chamber unit 20 (the lower surface 21b of the mounting table 21). Next, the lifting device 82 maintains the state in which the secondary cooling unit 81 abuts against the mounting table 21 for a predetermined time. Here, the secondary cooling unit 81 is cooled in advance to a predetermined secondary cooling temperature (e.g., about 20°C). Therefore, the workpiece W is cooled to a predetermined temperature (e.g., about 60°C or less) by the secondary cooling unit 81 via the mounting table 21. After the predetermined time has elapsed, the primary cooling process ends.

[0132] Here, when the chamber unit 20 is located in the execution area A25, the movable connector Cp is connected to the fixed connector Cs5. The atmosphere adjustment device 10 operates the vacuum pump P and the valve V5 to maintain the atmosphere of the accommodation chamber 20R in the execution area A25 at a reduced pressure. Therefore, the workpiece W during the secondary cooling is not exposed to the outside air and is not oxidized.

[0133] FIG. 18 is a schematic cross-sectional view showing a state in which the mounting table 21 is detached from the upper unit 22. As shown in FIG.

[0134] Next, the atmosphere adjustment device 10 operates the vacuum pump P and the valve V5 to purge the atmosphere in the accommodation chamber 20R with inert gas, and the atmosphere in the accommodation chamber 20R becomes an inert gas atmosphere (atmospheric pressure). At this time, the vacuum pressure disappears, the second spring member 29 expands, and the mounting table 21 and the side member 27 descend. That is, in the vertical direction, the frame member 25 and the pressure pad 26 move away from the mounting table 21. In other words, the frame member 25 and the pressure pad 26 rise relative to the mounting table 21. Then, the mounting table 21 becomes removable from the upper unit 22. Next, the lifting device 82 lowers the table 80 and the secondary cooling unit 81 to remove the mounting table 21 from the upper unit 22 and take out the workpiece W from the chamber unit 20 (ST12). In this manner, in the execution area A25, the mounting table 21 is removed from the upper unit 22, whereby the chamber unit 20 is disassembled and the workpiece W is removed from the chamber unit 20 (the removal process is executed).

[0135] In the present invention, the accommodation chamber R20 may be purged with air.

[0136] Next, the control device 3 controls the operation of the unloading device 12 to unload the mounting table 21 on which the workpiece W after the secondary cooling process is placed from the execution area A25 to the unloading area A3 (ST13). Specifically, the unloading device 12 unloads the mounting table 21 on which the workpiece W is placed from above the secondary cooling unit 81 to the unloading position in the unloading area A3. That is, the mounting table 21 functions as a transport pallet that transports (unloads) the pressurized workpiece W from the execution area A25 to the unloading area A3.

[0137] Next, the control device 3 controls the operation of the transfer device 9 to move the upper unit 22 (in other words, the chamber unit 20 from which the mounting table 21 has been removed) from the execution area A25 to the execution area A26, and then from the execution area A26 to the execution area A21 (ST14). Specifically, the upper unit 22 is transferred to the execution area A26 by rotation of the rollers Ro corresponding to the rail members R7, R8, R15, and R16. Next, the rotation mechanism 94 rotates the base member B4 by 90° counterclockwise when viewed from above.

[0138] FIG. 19 is a schematic cross-sectional view showing a state in which the upper unit 22 has been transported to an execution area A26 where a maintenance process can be performed. The figure shows a schematic cross-sectional view of each device in the execution area A26 as viewed in the direction in which the rail members R15 and R16 are oriented.

[0139] A "maintenance process" is, for example, a process in which a user of the system 1 performs maintenance (e.g., checking the state of the pressure pad 26 and the sealing members 30, 31, replacing the pressure pad 26, etc.) on the upper unit 22 (in other words, the chamber unit 20 from which the mounting table 21 has been removed). The maintenance process is not directly related to the pressurization process, but is indirectly related to the pressurization process. Therefore, in this embodiment, the maintenance process is considered to be an example of a related process.

[0140] As described above, the lifting devices 41, 52, 62, 72, 82 are not arranged in the execution area A26 as in the other execution areas A21 to A25. That is, when the upper unit 22 is located in the execution area A26, a relatively large space (hereinafter referred to as "maintenance space MR") in which maintenance of the upper unit 22 can be performed is secured below the upper unit 22, compared to the other execution areas A21 to A25. A user of the present system 1 performs maintenance processing of the upper unit 22 as necessary.

[0141] In the present invention, a part or all of the maintenance process may be performed automatically. That is, for example, an imaging device that images the upper unit 22 from below may be disposed in the execution area A26, and the state of the pressure pad 26 may be automatically determined based on the image. Also, for example, a device (mechanism) that replaces the pressure pad 26 may be disposed in the execution area A26, and the pressure pad 26 may be automatically replaced.

[0142] Next, the rollers Ro corresponding to the rail members R1, R2, R15, and R16 rotate, and the upper unit 22 is transported to the execution area A21. At this time, the rail members R1 and R2 are oriented in the X-axis direction.

[0143] In this manner, the chamber unit 20 is transported between the execution areas A21 to A25, and the upper unit 22 (the chamber unit 20 from which the mounting table 21 has been removed) is transported between the execution areas AA25, A26, and A21. That is, the upper unit 22 makes one revolution between the execution areas A21 to A26. Then, in the execution area A21, the next mounting table 21 is attached to the upper unit 22, and the chamber unit 20 containing the next workpiece W is assembled, and is transported again between the execution areas A21 to A25. In other words, in this system 1, the chamber unit 20 is formally (apparently) transported around the execution areas A21 to A25. Then, each time the chamber unit 20 makes a revolution, the pressurization process and related processes are sequentially performed on one workpiece W. In this configuration, after the corresponding process is completed in a certain execution area A21 to A25, the chamber unit 20 is transported to the execution area A21 to A25 where the next process is performed. Therefore, as will be described below, in the execution areas A21 to A25 where the processing has been completed, the same processing can be executed on another chamber unit 20.

[0144] Next, the operation of the system 1 will be described below, taking as an example the transportation of a plurality of workpieces W (that is, a plurality of chamber units 20). In the following description, FIGS. 1 to 18 will be referred to as appropriate.

[0145] FIG. 20 is a schematic plan view showing the positions of multiple chamber units 20 (some of which are upper units 22) in chronological order, where (a) shows the position at time "T1", (b) shows the position at time "T2", (c) shows the position at time "T3", (d) shows the position at time "T4", (e) shows the position at time "T5", and (f) shows the position at time "T6".

[0146] Here, it is assumed that time has passed in the order of "T1," "T2," "T3," "T4," "T5," and "T6" in chronological order. For ease of explanation, the figure only shows execution areas A21 to A26 (dotted lines) and chamber units 20 (solid lines). The black circles in the figure indicate the orientation of the chamber units 20 (upper units 22), and the gray circles in the figure indicate the orientation of the chamber units 20 immediately after the accommodation process. In the figure, in order to distinguish between the five chamber units 20 and for ease of explanation, the letters (A) to (E) are added to the chamber units 20 and the upper units 22.

[0147] At time "T1", chamber unit 20(A) is located in execution area A25, chamber unit 20(B) is located in execution area A24, chamber unit 20(C) is located in execution area A23, chamber unit 20(D) is located in execution area A22, and chamber unit 20(E) is located in execution area A21. The workpieces W accommodated in each of chamber units 20(A-E) are undergoing the corresponding processes.

[0148] At time "T2", the upper unit 22(A) is located in the execution area A26, the chamber unit 20(B) is located in the execution area A25, the chamber unit 20(C) is located in the execution area A24, the chamber unit 20(D) is located in the execution area A23, and the chamber unit 20(E) is located in the execution area A22. The workpieces W accommodated in each of the chamber units 20(B-E) are undergoing corresponding processes. Also, the upper unit 22(A) is undergoing a maintenance process.

[0149] At time "T3", chamber unit 20(A) is located in execution area A21, upper unit 22(B) is located in execution area A26, chamber unit 20(C) is located in execution area A25, chamber unit 20(D) is located in execution area A24, and chamber unit 20(E) is located in execution area A23. Each corresponding process is being performed on the workpiece W accommodated in each chamber unit 20(A,C-E). Also, a maintenance process is being performed on upper unit 22(B).

[0150] At time "T4", chamber unit 20(A) is located in execution area A22, chamber unit 20(B) is located in execution area A21, upper unit 22(C) is located in execution area A26, chamber unit 20(D) is located in execution area A25, and chamber unit 20(E) is located in execution area A24. Each corresponding process is being performed on the workpiece W accommodated in each chamber unit 20(A,B,D,E). Also, a maintenance process is being performed on the upper unit 22(C).

[0151] At time "T5", chamber unit 20(A) is located in execution area A23, chamber unit 20(B) is located in execution area A22, chamber unit 20(C) is located in execution area A21, upper unit 22(D) is located in execution area A26, and chamber unit 20(E) is located in execution area A25. Each corresponding process is being performed on the workpiece W accommodated in each chamber unit 20(A-C,E). Also, a maintenance process is being performed on the upper unit 22(D).

[0152] At time "T6", chamber unit 20(A) is located in execution area A24, chamber unit 20(B) is located in execution area A23, chamber unit 20(C) is located in execution area A22, chamber unit 20(D) is located in execution area A26, and upper unit 22(E) is located in execution area A26. Each corresponding process is being performed on the workpiece W accommodated in each chamber unit 20(A-D). Also, a maintenance process is being performed on upper unit 22(E).

[0153] Here, the transfer of the chamber units 20 (A to E) is performed based on the completion of the process with the longest processing time (in this embodiment, the pressurization process). That is, for example, the transfer of the chamber units 20 (A to E) is performed so that the pressurization process in the execution area A23 ends when the transfer of the chamber unit 20 (A to E) located in the execution area A24 to the execution area A25 ends.

[0154] In addition, in this embodiment, among the execution areas A21 to A26, the execution areas A21, A22, A24, and A25 also function as conversion areas. In this configuration, there is no need to arrange a conversion area separately from the execution areas A21 to A26, and the execution areas A21 to A26 do not need to be arranged in a straight line, so the floor area of ​​the housing 2 can be reduced. In the conversion areas, the direction of the rail members R1 to R8 cannot be changed unless the chamber unit 20 or the upper unit 22 is carried out from the conversion area. Therefore, the transport device 9 cannot transport all the chamber units 20 and the upper units 22 at the same time, and must transport them in order. Therefore, the total number of the chamber units 20 and the upper units 22 is set to a number that is "1" or more less than the number of the execution areas A21 to A26.

[0155] In the present invention, when the execution areas A21 to A26 are configured so as not to include a conversion area (for example, the second to fourth modified examples described below), or when a waiting area in which the chamber units 20 or the upper units 22 can wait is disposed between the execution areas A21 to A26, the total number of the chamber units 20 and the upper units 22 may be the same as the number of the execution areas A21 to A26.

[0156] In this way, the chamber units 20 (A to E) formally rotate among the execution areas A21 to A25 by moving to the execution area A26 as the upper units 22 (A to E). Therefore, the present system 1 can simultaneously execute different processes on the multiple chamber units 20 (A to E). As a result, in the present system 1, the time required between the pressurization process for one workpiece W and the pressurization process for the next workpiece W (the time between pressurization processes) is significantly shorter than the same time in a conventional pressurization device. In addition, in the present system 1, pre-processing and post-processing (related processes) of the pressurization process can also be executed simultaneously with the pressurization process.

[0157] The workpiece W is transported to the execution areas A21-A25 while being accommodated in a sealed accommodation room 20R (chamber unit 20) with a reduced pressure atmosphere, and undergoes a series of processes (preheating process, pressurization process, primary cooling process, and secondary cooling process). That is, the workpiece W is not exposed to the outside air during each of the series of processes. Therefore, oxidation of the workpiece W due to heat and the outside air is prevented during each process, and the risk of contamination of the workpiece W by foreign matter (e.g., dirt, dust, etc.) from outside the chamber unit 20 is reduced.

[0158] Furthermore, in the present system 1, a preliminary heating process is performed as a pre-processing before the pressurizing process. Therefore, the pressurizing process in the present system 1 can be performed in a shorter time than the pressurizing process in a conventional pressurizing device that cannot perform a preliminary heating process.

[0159] Furthermore, the pressurization process and the cooling process are separated in the present system 1. Therefore, the pressurization process in the present system 1 can be performed in a shorter time than the pressurization process in a conventional pressurizing device in which the pressurization process and the cooling process cannot be separated.

[0160] Furthermore, in the present system 1, the cooling process is divided into a primary cooling process and a secondary cooling process. Therefore, the workpieces W are efficiently cooled in the present system 1. Also, in the present system 1, the cooling time for each workpiece W is shorter than that of a conventional pressurizing device that cannot separate the cooling processes.

[0161] In this way, in the present system 1, the preheating process, the primary cooling process, and the secondary cooling process can be performed as the associated processes. Therefore, in the present system 1, the total time required from carrying in to carrying out the workpiece W is shorter than the total time required for a conventional pressurizing device. In other words, in the present system 1, by performing a plurality of associated processes, the time between pressurizing processes is shorter than the same time in a conventional pressurizing device in which the associated processes cannot be performed.

[0162] Furthermore, the chamber unit 20 is rotated 90° in the same direction (clockwise as viewed from above in this embodiment) a total of four times in the execution areas A21, A22, A24, and A25 (conversion areas) between the execution areas A21 to A25. As a result, the orientation of the chamber unit 20 relative to the movement direction of the chamber unit 20 is always the same. In this configuration, the orientation of the workpiece W when it is located in the carry-in area A1 is the same as the orientation of the workpiece W when it is located in the carry-out area A3. That is, the orientation of the workpiece W is the same before and after the processing by the present system 1.

[0163] Furthermore, in this system 1, when the chamber unit 20 is located in the execution areas A21 to A25, the movable connector Cp is connected to the fixed connectors Cs1 to Cs5, and the accommodation chamber 20R can be connected to the reduced pressure system pipe Lp or the gas system pipe Lg via the through hole 27c, the movable connector Cp, the fixed connectors Cs1 to Cs5, and the valves V1 to V5. When the chamber unit 20 is being transported, the check valve of the movable connector Cp is closed, and the accommodation chamber 20R is sealed. In this configuration, even if the degree of vacuum in the accommodation chamber 20R decreases during the transportation of the chamber unit 20, the reduced pressure atmosphere in the accommodation chamber 20R is maintained in each of the execution areas A21 to A25. Therefore, oxidation of the workpiece W due to heat and outside air is prevented.

[0164] Furthermore, in the present system 1, the chamber unit 20 includes members (the mounting table 21, the base member 23, the upper mold 24, and the pressure pad 26) that function as the upper and lower pressurizing units 6U and 6D, and is transported between the execution areas A21 to A25. Among these members, the base member 23, the upper mold 24, and the pressure pad 26 are transported between the execution areas A21 to A26. That is, these members are not installed in the execution area A23, and are also transported to the other execution areas A21, A22, A24 to A26. Therefore, maintenance of the chamber unit 20 and the upper unit 22 is possible in the other execution areas A21, A22, A24 to A26, improving the maintainability.

[0165] Furthermore, in the present system 1, each process is performed with one (one set) of workpieces W accommodated in one chamber unit 20 (accommodation room 20R). That is, one chamber unit 20 is associated with one (one set) of workpieces W. That is, one set of mounting table 21 and pressure pad 26 is associated with one (one set) of workpieces W. Therefore, it is possible to track the mounting table 21 and pressure pad 26 used for each workpiece W when each process is performed.

[0166] Furthermore, the system 1 includes a plurality of chamber units 20 each having a member that functions as the upper and lower pressurizing units 6U, 6D. Therefore, even if a malfunction occurs in any of these members, each process for another workpiece W can be continued by simply removing (or replacing) the chamber unit 20.

[0167] Furthermore, the system 1 includes an execution area A26 for maintenance processing, separate from the execution area A23. Therefore, no space for maintenance (mainly replacement of components) is required in the execution area A23. Therefore, the height of the execution area A23 (housing 2) can be reduced.

[0168] Summary According to the embodiment described above, the system 1 includes a plurality of execution areas A21 to A26 and a chamber unit 20. The execution areas A21 to A26 are arranged in the order in which the processes are performed. The chamber unit 20 accommodates the workpiece W and is transported between the execution areas A21 to A25. The chamber unit 20 includes a mounting table 21, a pressure pad 26, and a side member 27. The mounting table 21 is disposed below the workpiece W and functions as a lower pressure unit 6D. The pressure pad 26 is disposed above the workpiece W and functions as an upper pressure unit 6U. The side member 27 is disposed so as to surround the entire circumference of the workpiece W in the horizontal direction, and defines the accommodation chamber R20 together with the mounting table 21 and the pressure pad 26. According to this configuration, in the execution areas A21 to A25 in which a process has been completed, the same process can be performed on another chamber unit 20. That is, in the system 1, the time between pressure processes is shortened. In addition, in the present system 1, the mounting table 21 functions as the lower pressurizing unit 6D, and the pressurizing pad 26 functions as the upper pressurizing unit 6U. Therefore, the pressurizing process can be performed on the workpiece W accommodated in the chamber unit 20 (accommodation room 20R). Furthermore, the chamber unit 20 functioning as the upper and lower pressurizing units 6U and 6D is not installed in the execution area A23 where the pressurizing process is performed, and is transported to the other execution areas A21, A22, A24 to A26. Therefore, in the present system 1, the maintainability of the pressurizing pad 26 is improved. Furthermore, in the present system 1, it is possible to track the mounting table 21 and the pressurizing pad 26 used when performing each process for each workpiece W. Furthermore, in the present system 1, the chamber unit 20 is transported between each execution area A21 to A25, so that multiple related processes can be performed. Furthermore, the risk of contamination of the workpiece W by foreign matter (e.g., dust, dirt, etc.) from outside the chamber unit 20 is reduced.

[0169] Furthermore, according to the embodiment described above, the chamber unit 20 passes through the upper spaces in the execution areas A21 to A26 and is transferred between the execution areas A21 to A25. In this configuration, each process can be easily performed by lifting the members required for each process from below for each of the execution areas A21 to A25.

[0170] Furthermore, according to the embodiment described above, the pressure pad 26 is vertically movable relative to the mounting table 21. That is, the pressure pad 26 defining the accommodation chamber 20R of the chamber unit 20 is vertically movable relative to the mounting table 21. According to this configuration, it is possible to reliably apply pressure to the workpiece W accommodated in the chamber unit 20 (accommodation chamber 20R).

[0171] Furthermore, according to the embodiment described above, the pressure pad 26 has a flexible layer 26a that deforms to follow the shape of the surface of the workpiece W during the pressure treatment. The chamber unit 20 has an upper mold 24 that is arranged above the pressure pad 26 and functions as an upper pressure unit 6U by pressing the pressure pad 26 downward during the pressure treatment. With this configuration, alignment of the pressure pad 26 with respect to the upper mold 24 for each chamber unit 20 is not required during the pressure treatment. Also, alignment of the upper mold 24 and the pressure pad 26 with respect to the workpiece W is not required. Furthermore, most of the upper pressure units 6U are transported as the chamber units 20. Therefore, it is easy to transport the chamber units 20 to the execution area A23, and the number of members functioning as the upper pressure units 6U arranged in the upper space of the execution area A23 is reduced.

[0172] Furthermore, according to the embodiment described above, the pressurizing device 6 includes a heat unit 61 that rises from below the chamber unit 20 to abut against the mounting table 21 during pressurizing treatment and functions as the lower pressurizing unit 6D. In this configuration, the upper space of the execution area A23 can be used only for transporting the chamber unit 20, and the member configuration in the upper space can be simplified. Also, since most of the mechanisms for applying the main pressurizing force to the workpiece W (particularly the lifting device 62) are disposed below the chamber unit 20, the height of the housing 2 can be reduced.

[0173] Furthermore, according to the embodiment described above, the atmosphere in the accommodation chamber 20R is a reduced pressure atmosphere in which the internal pressure of the accommodation chamber 20R is lower than the external pressure of the external space of the chamber unit 20. The mounting table 21 is disposed below the side member 27 and is attached to the side member 27 by the pressure difference. According to this configuration, a separate member for mounting the mounting table 21 to the side member 27 is not required. That is, the number of parts of the chamber unit 20 is reduced. Furthermore, the workpiece W is not exposed to the outside air during each process. Therefore, oxidation of the workpiece W due to heat and the outside air is prevented.

[0174] Furthermore, according to the embodiment described above, the mounting table 21 functions as a transport pallet that carries the workpiece W into the execution area A21 and carries the pressurized workpiece W out of the execution area A25. According to this configuration, each process of the present system 1 from carrying in the workpiece W to carrying it out can be completed on a single mounting table 21.

[0175] Furthermore, according to the embodiment described above, the system 1 includes an execution area A26. This configuration enables maintenance of the upper unit 22 during the series of processes of the pressurization process and related processes. Also, the height of the execution area A23 (housing 2) can be reduced.

[0176] Furthermore, according to the embodiment described above, the system 1 includes the preheating unit 51, the heat unit 61, the primary cooling unit 71, and the secondary cooling unit 81. When the preheating process is performed in the execution area A22, the preheating unit 51 rises from below the chamber unit 20 to abut against the mounting table 21 and preheat the workpiece W. When the primary cooling process is performed in the execution area A24, the primary cooling unit 71 rises from below the chamber unit 20 to abut against the mounting table 21 and cool the workpiece. When the secondary cooling process is performed in the execution area A25, the secondary cooling unit 81 rises from below the chamber unit 20 to abut against the mounting table 21 and cool the workpiece. According to this configuration, the pressurization process can be performed in a short time. Therefore, the time between pressurization processes is shortened.

[0177] Furthermore, according to the embodiment described above, the system 1 includes a plurality of chamber units 20. The number of chamber units 20 is smaller than the number of execution areas A21 to A26. With this configuration, the time between not only the pressurization processes but also the related processes is shortened. Also, since it is not necessary to transport all the chamber units 20 at the same time, the transport of the chamber units 20 (A to E) can be performed based on the completion of the process with the longest processing time.

[0178] Furthermore, according to the embodiment described above, the execution areas A21 to A26 are arranged in a ring shape in the order in which the processes are performed. The chamber units 20 and the upper units 22 are each transported in a circle between the execution areas A21 to A26. With this configuration, the system 1 can continuously load the workpieces W, continuously perform each process on each loaded workpiece W, and simultaneously perform different processes on different workpieces W. As a result, continuous processing of multiple workpieces W can be efficiently performed.

[0179] Furthermore, according to the embodiment described above, the system 1 includes rotation mechanisms 91-94 that change the moving direction of the chamber unit 20 so that the orientation of the chamber unit 20 in the moving direction of the chamber unit 20 is always the same. The execution areas A21-A26 include a change area in which the rotation mechanisms 91-94 are arranged. With this configuration, it is possible to adjust the orientation of the workpiece W in processing before and after processing by the system 1. Also, the floor area of ​​the housing 2 can be reduced.

[0180] Furthermore, according to the embodiment described above, the system 1 includes the atmosphere adjustment device 10. The atmosphere adjustment device 10 includes a vacuum pump P, a reduced pressure system pipe Lp, a gas system pipe Lg, and fixed connectors Cs1 to Cs5. The chamber unit 20 includes a movable connector Cp and a through hole 27c. When the chamber unit 20 is located in the execution areas A21 to A25 in which the fixed connectors Cs1 to Cs5 are located, the movable connector Cp is connected to the fixed connectors Cs1 to Cs5, and the accommodation chamber 20R can be communicated with the reduced pressure system pipe Lp or the gas system pipe Lg. When the chamber unit 20 is being transferred, the accommodation chamber 20R is sealed. According to this configuration, even if the degree of vacuum in the accommodation chamber 20R decreases during the transfer of the chamber unit 20, the reduced pressure atmosphere in the accommodation chamber 20R is maintained in each of the execution areas A21 to A25.

[0181] ●Variations● Next, modified examples of the present system 1 will be described below, focusing on the differences from the previously described embodiment (hereinafter referred to as the "first embodiment"). In the following modified examples, for ease of explanation, the same components as in the first embodiment and components having common functions are given the same reference numerals as in the first embodiment. In the following modified examples, reference will be made as appropriate to Figs. 1 to 5.

[0182] First modified example In the first modified example, the configuration of the chamber unit and the atmosphere in the accommodation chamber are different from those in the first embodiment.

[0183] FIG. 21 is a schematic cross-sectional view of a chamber unit 20A in the first modified example.

[0184] The chamber unit 20A includes a mounting table 21, an upper unit 22A, and a storage chamber 20R. The upper unit 22A includes a base member 23, an upper mold 24, a frame member 25, a pressure pad 26, a side member 27, a first spring member 28, a second spring member 29, two seal members 30 and 31, a plurality of fixing members 32, and a movable connector Cp.

[0185] The fixing member 32 fixes the mounting table 21 to the side member 27 (upper unit 22A). The fixing member 32 is attached to the outer peripheral surface 27f of the lower part of the side member 27. The fixing member 32 includes, for example, a support portion 32a, a main body portion 32b, and a known ratchet mechanism (not shown, the same applies below). The support portion 32a supports the main body portion 32b rotatably between a fixed position and an open position. For example, the shape of the main body portion 32b is L-shaped when viewed from the side. For example, the main body portion 32b is rotatable toward the open position side and cannot be rotated toward the fixed position side by the ratchet mechanism, and can be rotated to the fixed position when the ratchet mechanism is released. When the main body portion 32b is located at the fixed position, a part of the main body portion 32b is located below the mounting table 21 and the side member 27 and can support the mounting table 21. When the main body portion 32b is in the released position, a part of the main body portion 32b is located on the side of the side member 27 and is unable to support the mounting table 21.

[0186] When the workpiece W is accommodated in the chamber unit 20A, the atmosphere in the accommodation chamber 20R is adjusted to an inert gas atmosphere by the atmosphere adjustment device 10. That is, the accommodation chamber 20R is filled with an inert gas so that the internal pressure of the accommodation chamber 20R is the same as the external pressure (atmospheric pressure). In this case, since no vacuum pressure is generated, the mounting table 21 is fixed to the side member 27 (upper unit 22A) by the fixing member 32 rotated to a fixed position. As described above, the movable connector Cp is connected to each of the fixed connectors Cs1 to Cs5, and the atmosphere in the accommodation chamber 20R can be maintained in each of the execution areas A21 to A25. Therefore, a slight gap may be generated between the mounting table 21 and the seal member 31.

[0187] In this configuration, since the atmosphere in the accommodation chamber 20R is an inert gas atmosphere, the workpiece W is not exposed to the outside air during the preliminary heating process, the pressurizing process, and the primary cooling process, and is not oxidized. Also, the amount of inert gas required is limited to the volume of the accommodation chamber R20 (if replacement is performed several times, the volume is multiplied by the number of replacements).

[0188] In the first modified example, when the workpiece W is made of a material that does not oxidize (is difficult to oxidize), the accommodation chamber 20R may be filled with air.

[0189] In addition, in the first modified example, the configuration of the fixing member 32 is not limited to the support portion 32a, the main body portion 32b, and a known ratchet mechanism. That is, for example, the fixing member 32 may be a rectangular "C" shape in a side view. In this case, for example, a recess or a protrusion into which the fixing member 32 is fitted is formed on the outer circumferential surface 27f of the lower end portion 27e of the side member 27, and the fixing member 32 sandwiches the lower end portion 27e of the side member 27 and the outer edge portion of the mounting table 21. Also, for example, the fixing member 32 may be a bolt that fastens the outer edge portion of the mounting table 21 and the side member 27. The storage device 4 may be provided with an attachment mechanism for the fixing member 32, and the removal device 8 may be provided with a removal mechanism for the fixing member 32.

[0190] Second to fourth modified examples In the second to fourth modified examples, the layout of the execution areas and the configuration of the transport device are different from those of the first embodiment.

[0191] Figure 22(a) is a schematic plan view of a pressurization system 1B (hereinafter referred to as "this system 1B") related to a second modified example, (b) is a schematic plan view of a pressurization system 1C (hereinafter referred to as "this system 1C") related to a third modified example, and (c) is a schematic plan view of a pressurization system 1D (hereinafter referred to as "this system 1D") related to a fourth modified example. For ease of explanation, only the execution areas A21 to A25 (A26) are shown by dashed lines in the figure. In the figure, arrows indicate the transfer path of the chamber unit 20 or the upper unit 22. For members not shown in Fig. 22, refer to Figs. 1 to 5.

[0192] As shown in FIG. 22(a), in the present system 1B, the execution areas A21-A25 are arranged in a straight line, and the execution area A26 is arranged to the side of the execution areas A21-A25. The transport device 9B includes the second rail members R21-R24, and does not include the rotation mechanisms 91-94. The second rail members R21, R22 are arranged in the execution areas A21, A26, and the second rail members R23, R24 are arranged in the execution areas A25, A26. The base member B1 is supported by the second rail members R21, R22, and configured to be able to move in parallel between the execution areas A21, A26. The base member B4 is supported by the second rail members R23, R24, and configured to be able to move in parallel between the execution areas A25, A26. In this configuration, even if the transport device 9B does not include the rotation mechanisms 91-94, the orientation of the workpiece W is the same before and after the processing by the present system 1B. Furthermore, in this configuration, since a plurality of upper units 22 can be stored in the execution area A26, the total number of chamber units 20 and upper units 22 can be set to be equal to or greater than the number of the execution areas A21 to A26.

[0193] In the second modified example, the execution area A26 may be disposed above the execution areas A21 to A25. That is, for example, the execution areas A21 to A26 may be disposed in a three-dimensional shape like a caterpillar.

[0194] As shown in FIG. 22(b), in the present system 1C, the execution areas A21-A26 are arranged in a circular ring shape. The transport device 9C does not include the rotation mechanisms 91-94. When viewed from above, the rail members R1-R16 are arranged in a circular ring shape. In this configuration, even if the transport device 9C does not include the rotation mechanisms 91-94, the orientation of the workpiece W is the same before and after the processing by the present system 1C. In addition, in this configuration, a waiting area for the chamber units 20 can be arranged between the execution areas A21-A26. Therefore, the total number of the chamber units 20 and the upper units 22 can be set to be equal to or greater than the number of the execution areas A21-A26.

[0195] As shown in FIG. 22(c), in this system 1D, the execution areas A21 to A25 are arranged in a straight line. In the execution area A21, the upper unit 22 is set on the rail members R1 and R2 by, for example, a user. In the execution area A25, the upper unit 22 is removed from the rail members R7 and R8 by, for example, a user of this system 1D. The removed upper unit 22 is transported to the vicinity of the execution area A21 by the user or a transport robot. In this configuration, the entire periphery of the execution areas A21 to A25 can function as a maintenance area (execution area A26).

[0196] ●Other embodiments● In the present invention, the number of execution areas A2 may be more than one, and the type of execution area A2 may be set according to the type of related process, and the number and type of execution areas A2 are not limited to those in the first embodiment. That is, for example, the number of execution areas A2 may be "2" or more. Specifically, for example, when the preliminary heating process is not performed in the present system 1, the present system 1 may not have the execution area A22 and the preliminary heating device 5. Also, for example, when the cooling process is not divided into two stages in the present system 1, the present system 1 may not have the execution area A24 and the primary cooling device 7. Furthermore, for example, a plurality of processes (for example, the accommodation process and the preliminary heating process, the removal process and the maintenance process, etc.) may be performed in the same execution area A2. Furthermore, for example, the accommodation process and / or the removal process may be performed outside the present system 1, and the chamber unit 20 may be carried in / out of the present system 1. Furthermore, the execution area A2 may include a transfer path (the above-mentioned waiting area) on which one or more chamber units 20 can be arranged between the execution areas A21 to A26.

[0197] Furthermore, in the present invention, the arrangement of the execution area A2 is not limited to that in the first embodiment, as exemplified in the second to fourth modified examples.

[0198] Furthermore, in the present invention, only the workpiece W may be carried in / out of the system 1. That is, for example, in the execution area A25, only the workpiece W may be carried out, and the mounting table 21 on which the workpiece W is not placed may be attached to the upper unit 22 to assemble the chamber unit 20, and the chamber unit 20 may be transported to the execution area A21. In this case, in the execution area A21, the mounting table 21 is removed from the upper unit 22, and only the workpiece W is carried in to the mounting table. Also, in this example, the mounting table 21 in the execution area A25 may be transported to the execution area A21 via a route different from the upper unit 22, and the upper unit 22 may be transported to the execution area A21 via the execution area A26. Furthermore, in this example, the system 1 may not have the carry-in area A1 and the carry-out area A3.

[0199] Furthermore, in the present invention, as described above, the system 1 does not need to include the preheating device 5 and / or the primary cooling device 7 (and / or the secondary cooling unit 81). Specifically, for example, the cooling process may also be performed during the pressurizing process. Even in this case, the storage process, removal process, and maintenance process can be performed in parallel with the pressurizing process, and the processing time between pressurizing processes can be shorter than that of conventional pressurizing devices.

[0200] Furthermore, in the present invention, the pressurizing device 6 does not necessarily have to include the heat unit 61 .

[0201] Furthermore, in the present invention, the configuration of the transport device 9 is not limited to the first embodiment as long as the chamber unit 20 and the upper unit 22 are configured to be capable of transporting the upper spaces of the respective execution areas A21 to A26. That is, for example, the chamber unit 20 (upper unit 22) may be provided with a power source and drive wheels capable of rolling on the rail members R1 to R16. Also, for example, the rail members R1 to R16 may be provided with a plurality of rollers capable of abutting against the lower surface 23a of the base member 23. Furthermore, for example, the transport device 9 may be provided with a locking member configured to be detachable from the base member 23, and a moving mechanism for moving the locking member between the adjacent execution areas A21 to A26.

[0202] Furthermore, in the present invention, the number of chamber units 20 is preferably equal to or less than the number of execution areas A2, and is not limited to "five". That is, for example, in the present invention, the number of chamber units 20 may be "one". In this case, the remarkable effect of the first embodiment is not obtained, but the total time from loading to unloading is shortened compared to a conventional pressurizing device that performs heating to cooling in a single pressurizing process. Therefore, the time between pressurizing processes is shorter than that of a conventional pressurizing device.

[0203] Furthermore, in the present invention, the number and rotation directions of the rotation mechanisms 91-94 are not limited to those in the first embodiment. That is, for example, in the case where the orientation of the workpiece W may be different before and after the processing by the present system 1, some or all of the rotation mechanisms 91-94 may be rotated by 90° in the counterclockwise direction as viewed from above.

[0204] Furthermore, in the present invention, the rail members R1 to R8 may be configured to be accessible only from one side in the longitudinal direction in order to reduce the risk of the chamber unit 20 (upper unit 22) falling off during rotation.

[0205] Furthermore, in the present invention, the system 1 does not necessarily have to include some or all of the fixed connectors Cs2 to Cs5.

[0206] Furthermore, in the present invention, the system 1 does not necessarily have to include the fixed connectors Cs1 to Cs5 and the movable connector Cp. In this case, the accommodation room R20 is filled with the outside air (air) of the chamber unit 20.

[0207] Furthermore, in the present invention, the workpiece W does not need to be covered with an anti-stick sheet.

[0208] Furthermore, in each drawing, for convenience of explanation, the shape of the workpiece W accommodated in the chamber unit 20 is shown as a single flat plate, but is not limited to this. That is, for example, the chamber unit 20 may accommodate one set of workpieces W composed of multiple pressurized objects. Also, for example, the shapes of the pressurized objects constituting one set of workpieces W may be the same or different.

[0209] ●Embodiments of the present invention● Next, the embodiments of the present invention that can be understood from the above-described embodiments will be described below, using the terms and symbols described in the respective embodiments.

[0210] The first embodiment of the present invention is a pressurization system (e.g., pressurization systems 1, 1B to 1D) that performs a pressurization process of a work (e.g., work W) and an associated process related to the pressurization process, and includes a plurality of execution areas (e.g., execution areas A21 to A26) in which any one of a plurality of processes including the pressurization process and the associated process is executed, and a chamber unit (e.g., chamber unit 20, 20A) that accommodates the work and transports it between the plurality of execution areas, and the plurality of execution areas are arranged according to the order in which the processes are executed, and the chamber unit is configured to transport the work. a ceiling portion (e.g., pressure pad 26) that is arranged above the work and functions as an upper pressure unit (e.g., upper pressure unit 6U) that pressurizes the work from above during the pressurization process, a floor portion (e.g., mounting table 21) that is arranged below the work and functions as a lower pressure unit (e.g., lower pressure unit 6D) that pressurizes the work from below during the pressurization process, and a peripheral wall portion (e.g., side member 27) that is arranged to surround the entire periphery of the work in the horizontal direction and that, together with the ceiling portion and floor portion, defines a storage chamber (e.g., storage chamber 20R) in which the work is stored. According to this configuration, the time between pressure treatments can be shortened and a process related to the pressure treatment can be carried out.

[0211] A second embodiment of the present invention is a pressurized system according to the first embodiment, wherein the chamber unit passes through an upper space in the execution area and is transported between the execution areas. According to this configuration, each process can be easily executed.

[0212] A third embodiment of the present invention is a pressurization system according to the first embodiment, wherein the ceiling portion is relatively movable in the vertical direction with respect to the floor portion. According to this configuration, it is possible to reliably perform a pressurization process on the workpiece accommodated in the chamber unit (accommodation chamber).

[0213] A fourth embodiment of the present invention is a pressure system in which, in the third embodiment, the ceiling portion is provided with a pressure pad (e.g., pressure pad 26) having a flexible layer (e.g., flexible layer 26a) that deforms to follow the shape of the surface of the workpiece during the pressure treatment, and the chamber unit is provided with an upper mold (e.g., upper mold 24) that is arranged above the pressure pad and functions as the upper pressure unit by pressing the pressure pad downward during the pressure treatment. According to this configuration, the chamber unit can be easily transported to the execution area (pressurizing area), and the number of members that function as the upper pressurizing unit and are arranged in the upper space of the execution area can be reduced.

[0214] A fifth embodiment of the present invention is a pressurization system according to the first embodiment, which comprises a pressurization device (e.g., pressurization device 6) that is arranged in a pressurization area (e.g., execution area A23) where the pressurization treatment is performed and performs the pressurization treatment, the execution area including the pressurization area, and the pressurization device is provided with a pressing unit (e.g., heat unit 61) that rises from below the chamber unit to abut against the floor during the pressurization treatment and functions as the lower pressurization unit during the pressurization treatment. According to this configuration, the configuration of members in the space above the execution area (pressure area) can be simplified, and the height of the housing can be reduced.

[0215] A sixth embodiment of the present invention is a pressurized system in which, in the first embodiment, the atmosphere of the storage chamber is a reduced pressure atmosphere in which the internal pressure of the storage chamber is lower than the external pressure of an external space of the chamber unit, and the floor portion is disposed below the peripheral wall portion and attached to the peripheral wall portion by a pressure difference between the internal pressure and the external pressure. According to this configuration, the workpiece is not exposed to the outside air during each treatment.

[0216] A seventh embodiment of the present invention is a pressurized system in which, in the first embodiment, the atmosphere of the storage chamber is a gas atmosphere filled with gas so that the internal pressure of the storage chamber is the same as the external pressure of the external space of the chamber unit, and the chamber unit (e.g., chamber unit 20A) is provided with a fixing member (e.g., fixing member 32) that fixes the floor portion to the peripheral wall portion. According to this configuration, since an inert gas is used as the gas, the workpiece is not exposed to the outside air during each process.

[0217] An eighth embodiment of the present invention is a pressurization system in which, in the first embodiment, the floor is detachable from the peripheral wall, and the multiple execution areas include a storage area (e.g., execution area A21) in which the floor on which the work is placed is attached to the peripheral wall, and a storage process in which the work is placed in the chamber unit is performed as the associated process, and an removal area (e.g., execution area A25) in which the floor on which the pressurized work is placed is detached from the peripheral wall, and an removal process in which the work is removed from the chamber unit is performed as the associated process, and the floor functions as a transport pallet that transports the work into the storage area and transports the pressurized work from the removal area. According to this configuration, each process in the system, from carrying in the workpiece to carrying it out, can be completed on a single mounting table.

[0218] A ninth embodiment of the present invention is a pressurized system comprising, in the eighth embodiment, a maintenance area (e.g., execution area A26) disposed between the storage area and the removal area, in which maintenance processing is performed on the chamber unit (e.g., upper unit 22) from which the floor portion has been removed. According to this configuration, maintenance of the upper unit is possible, and the height of the execution area (pressurizing area) can be reduced.

[0219] A tenth embodiment of the present invention is the first embodiment, and includes a heating unit (e.g., heat unit 61) arranged in a pressurizing area where the pressurizing process is performed, and heating the workpiece, a preheating unit (e.g., preheating unit 51) that preheats the workpiece, and / or a cooling unit (e.g., primary cooling unit 71, secondary cooling unit 81) that cools the workpiece after pressurization, and the plurality of execution areas include a preheating area (e.g., execution area 11) where the preheating unit is arranged and the preheating process of the workpiece is performed as the related process. a pre-heating area (e.g., a pre-heating unit rear A22), and / or a cooling area (e.g., execution areas A24, A25) in which the cooling unit is arranged and the cooling process of the workpiece after pressurization is performed as the related process, and when the pre-heating process is performed in the pre-heating area, the pre-heating unit rises from below the chamber unit to abut against the floor, and / or when the cooling process is performed in the cooling area, the cooling unit rises from below the chamber unit to abut against the floor. With this configuration, the time between pressure treatments is reduced.

[0220] An 11th embodiment of the present invention is a pressurized system comprising a plurality of the chamber units in any one of the first to tenth embodiments, wherein the number of the chamber units is less than or equal to the number of the execution areas. With this configuration, the time between pressure treatments as well as between related treatments is reduced.

[0221] A twelfth embodiment of the present invention is a pressurized system in which, in the eleventh embodiment, the multiple execution areas are arranged in a circular shape according to the order in which the processes are performed, and each of the multiple chamber units is transported circularly between the multiple execution areas. According to this configuration, continuous processing of a plurality of works can be efficiently executed.

[0222] A thirteenth embodiment of the present invention is a pressurization system (e.g., pressurization system 1) in the twelfth embodiment, which has a conversion mechanism (e.g., rotation mechanisms 91-94) that converts the direction of movement of the chamber unit so that the orientation of the chamber unit in the direction of movement of the chamber unit is always the same, and the multiple execution areas include conversion areas (e.g., execution areas A21, A22, A24, A25) in which the conversion mechanism is arranged. This configuration allows the orientation of the workpiece to be adjusted before and after processing by the system, and also reduces the floor space required for the housing.

[0223] A fourteenth embodiment of the present invention is a pressurization system according to any one of the sixth or seventh embodiment, comprising a vacuum pump (e.g., vacuum pump P), a reduced pressure system pipe (e.g., reduced pressure system pipe Lp) connected to the vacuum pump, a gas system pipe (e.g., gas system pipe Lg) connected to a pipe of an inert gas supply system, and a plurality of fixed connectors (e.g., fixed connectors Cs1 to Cs5) arranged in two or more of the execution areas and connected to the reduced pressure system pipe and the gas system pipe, the chamber unit is provided with a movable connector (e.g., movable connector Cp) that is detachable from the fixed connector, and a communication passage (e.g., through hole 27c) that communicates the storage chamber with the movable connector, and when the chamber unit is located in the execution area in which the fixed connector is arranged, the movable connector is connected to the fixed connector, and the storage chamber can be communicated with the reduced pressure system pipe or the gas system pipe, and when the chamber unit is transported, the storage chamber is sealed. According to this configuration, the reduced pressure atmosphere in the containing chamber is maintained in each execution area. [Explanation of symbols]

[0224] 1 Pressurized System 20 Chamber unit 20R Containment Room 21 Placement table (floor) 24 Upper mold 26 Pressure pad (ceiling) 26a Flexible layer 27 Side member (peripheral wall) 51 Preheating unit 61 Heat unit (pressure unit, heating unit) 71 Primary cooling unit (cooling unit) 81 Secondary cooling unit (cooling unit) 91~94 Rotation mechanism (conversion mechanism) A21 Execution area (storage area, conversion area) A22 Execution area (preheating area, conversion area) A23 Execution area (pressure area) A24 Execution area (cooling area, conversion area) A25 Execution area (cooling area, removal area, conversion area) Cp Mobile Connector Cs1~Cs5 fixed connector Lp Pressure reducing piping Lg gas piping

Claims

1. A pressurizing system that performs a pressurizing process for a workpiece and a related process related to the pressurizing process, a plurality of execution areas in which any one of a plurality of processes including the pressurizing process and the related process is executed; a chamber unit that accommodates the work and is transported between the execution areas; and The execution areas are arranged according to the order in which the processes are executed, The chamber unit includes: A ceiling portion is disposed above the workpiece and functions as an upper pressurizing unit that pressurizes the workpiece from above during the pressurizing treatment; A floor portion is disposed below the workpiece and functions as a lower pressurizing unit that pressurizes the workpiece from below during the pressurizing treatment; A peripheral wall portion that is arranged to surround the entire circumference of the workpiece in the horizontal direction and that, together with the ceiling portion and the floor portion, defines a storage chamber in which the workpiece is stored; Equipped with Pressurized system.

2. The chamber unit is transported between the execution areas by passing through an upper space in the execution area. The pressurization system of claim 1 .

3. The ceiling portion is movable relative to the floor portion in the up and down direction. The pressurization system of claim 1 .

4. The ceiling portion is a pressure pad having a flexible layer that deforms in accordance with the shape of the surface of the workpiece during the pressure treatment; With The chamber unit includes: an upper mold that is disposed above the pressure pad and functions as the upper pressure unit by pressing the pressure pad downward during the pressure treatment; Equipped with The pressurization system of claim 3.

5. a pressurizing device that is disposed in a pressurizing area where the pressurizing treatment is performed and that performs the pressurizing treatment; and The execution area is: The pressurized area, Including, The pressurizing device is a pressing unit that rises from below the chamber unit and comes into contact with the floor during the pressurization process, and functions as the lower pressurizing unit; Equipped with The pressurization system of claim 1 .

6. the atmosphere in the accommodation chamber is a reduced pressure atmosphere in which the internal pressure of the accommodation chamber is lower than the external pressure of the external space of the chamber unit, The floor portion is disposed below the peripheral wall portion and is attached to the peripheral wall portion by a pressure difference between the internal pressure and the external pressure. The pressurization system of claim 1 .

7. the atmosphere of the accommodation chamber is a gas atmosphere filled with a gas such that the internal pressure of the accommodation chamber is the same as the external pressure of the external space of the chamber unit; The chamber unit includes: A fixing member that fixes the floor portion to the peripheral wall portion; Equipped with The pressurization system of claim 1 .

8. The floor portion is detachable from the peripheral wall portion, The execution areas include: a storage area in which a storage process in which the workpiece is stored in the chamber unit is performed as the associated process by attaching the floor portion on which the workpiece is placed to the peripheral wall portion; a removal area in which a removal process is performed as the associated process, in which the floor portion on which the pressurized workpiece is placed is removed from the peripheral wall portion, thereby removing the workpiece from the chamber unit; Including, The floor portion functions as a transport pallet for carrying the workpiece into the storage area and carrying the pressurized workpiece out of the removal area. The pressurization system of claim 1 .

9. a maintenance area disposed between the accommodation area and the removal area, in which a maintenance process is performed on the chamber unit from which the floor portion has been removed; It is made of The pressurization system of claim 8.

10. a heating unit disposed in a pressurizing area where the pressurizing process is performed and configured to heat the workpiece; A preheating unit that preheats the workpiece, and / or a cooling unit that cools the workpiece after pressurization; and The execution areas include: a preheating area in which the preheating unit is disposed and a preheating process of the workpiece is performed as the associated process, and / or a cooling area in which the cooling unit is disposed and a cooling process of the workpiece after pressurization is performed as the associated process; Including, When the preheating process is performed in the preheating area, the preheating unit is raised from below the chamber unit to abut against the floor portion, and / or When the cooling process is performed in the cooling area, the cooling unit rises from below the chamber unit to come into contact with the floor. The pressurization system of claim 1 .

11. A plurality of the chamber units; and The number of the plurality of chamber units is equal to or less than the number of the plurality of execution areas. A pressurization system according to any one of claims 1 to 10.

12. The execution areas are arranged in a circular manner according to the order in which the processes are executed, Each of the plurality of chamber units is transported circulating between the plurality of execution areas. The pressurization system of claim 11.

13. a change mechanism that changes the moving direction of the chamber unit so that the orientation of the chamber unit in the moving direction of the chamber unit is always the same; and The execution areas include: a switching area in which the switching mechanism is located; Including, The pressurization system of claim 12.

14. A vacuum pump; A decompression system pipe connected to the vacuum pump; A gas system pipe connected to a pipe of an inert gas supply system; a plurality of fixed connectors arranged in two or more of the execution areas, respectively, and connected to the decompression system piping and the gas system piping; and The chamber unit includes: a movable connector that is detachable from the fixed connector; a communication passage that communicates the accommodation chamber with the movable connector; With when the chamber unit is located in the execution area in which the fixed connector is arranged, the movable connector is connected to the fixed connector, and the accommodation chamber can be communicated with the decompression system piping or the gas system piping; When the chamber unit is being transported, the accommodation chamber is sealed. A pressurization system according to claim 6 or 7.

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