Method and apparatus for manufacturing hydrogen storage medium, and hydrogen storage device

Abstract

To provide a technology of manufacturing a hydrogen storage medium in which hydrogen is stored.SOLUTION: A method for manufacturing a hydrogen storage medium includes: a decompression step of reducing internal pressure of a chamber by evacuating a gas from the chamber; a film deposition step of forming a hydrogen storage film on a substrate with dry treatment in the chamber in a decompression state where the chamber is decompressed; and a hydrogen supply step of supplying a hydrogen gas into the chamber in the decompression state.SELECTED DRAWING: Figure 4

Description

Technical Field

[0001] The present disclosure relates to a method for manufacturing a hydrogen storage medium, an apparatus for manufacturing a hydrogen storage medium, and a hydrogen storage apparatus.

Background Art

[0002] Conventionally, hydrogen storage media capable of storing hydrogen have been proposed (for example, Patent Document 1). In Patent Document 1, the hydrogen storage medium includes an aluminum plate and a thin film of a hydrogen storage alloy formed on the plate. The thin film can be formed, for example, by sputtering.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] In Patent Document 1, a thin film of a hydrogen storage alloy is formed to manufacture a hydrogen storage medium. However, in the technique described in Patent Document 1, hydrogen is not stored in the hydrogen storage medium during manufacturing.

[0005] Therefore, an object of the present disclosure is to provide a technique for manufacturing a hydrogen storage medium that stores hydrogen.

Means for Solving the Problems

[0006] A first aspect is a method for manufacturing a hydrogen storage medium, including a pressure reduction step of discharging gas in a chamber to reduce the pressure in the chamber, a film formation step of forming a hydrogen storage film on a substrate by a dry process in the chamber in a pressure-reduced state where the chamber is pressure-reduced, and a hydrogen supply step of supplying hydrogen gas into the chamber in the pressure-reduced state.

[0007] The second aspect is a method for manufacturing a hydrogen storage medium according to the first aspect, wherein the hydrogen supply step is executed in parallel with the film formation step, and the hydrogen gas is supplied to the hydrogen storage film being formed in the hydrogen supply step.

[0008] The third aspect is a method for manufacturing a hydrogen storage medium according to the first aspect, wherein the hydrogen supply step is executed after the film formation step, and the hydrogen gas is supplied to the hydrogen storage film after film formation in the hydrogen supply step.

[0009] The fourth aspect is a method for manufacturing a hydrogen storage medium according to any one of the first to third aspects, wherein in the hydrogen supply step, active species of hydrogen generated by plasmaizing the hydrogen gas are supplied to the hydrogen storage film.

[0010] The fifth aspect is a method for manufacturing a hydrogen storage medium according to the first or second aspect, wherein in the film formation step, the hydrogen storage film is formed on the substrate by sputtering, the hydrogen supply step is executed in parallel with the film formation step, and the hydrogen gas is supplied between the target and the substrate in sputtering to plasmaize the hydrogen gas.

[0011] The sixth aspect is a method for manufacturing a hydrogen storage medium according to any one of the first to fifth aspects, wherein the substrate is cooled in at least one of the hydrogen supply step and the film formation step.

[0012] The seventh aspect is a method for manufacturing a hydrogen storage medium according to any one of the first to sixth aspects, wherein in the film formation step, while winding up the film-like substrate unwound from the unwinding roller by the winding roller, the hydrogen storage film is formed on the substrate between the unwinding roller and the winding roller.

[0013] The eighth aspect is a method for manufacturing a hydrogen storage medium according to the seventh aspect, wherein in the film formation step, the hydrogen storage film is formed on the substrate having a main surface with irregularities.

[0014] A ninth aspect is a manufacturing apparatus for a hydrogen storage medium, comprising a chamber, a pressure reducing section for discharging the gas in the chamber, a film forming section for forming a hydrogen storage film on a substrate in the chamber by dry processing, and a hydrogen gas supply section for supplying hydrogen gas into the chamber.

[0015] A tenth aspect is a manufacturing apparatus for a hydrogen storage medium according to the ninth aspect, wherein the hydrogen gas supply section supplies the hydrogen gas to the hydrogen storage film during film formation by the film forming section.

[0016] An eleventh aspect is a manufacturing apparatus for a hydrogen storage medium according to the ninth aspect, wherein the hydrogen gas supply section supplies the hydrogen gas to the hydrogen storage film after film formation.

[0017] A twelfth aspect is a manufacturing apparatus for a hydrogen storage medium according to any one of the ninth to eleventh aspects, further comprising a plasma generator for generating active species of hydrogen by plasmaizing the hydrogen gas and causing the active species to act on the hydrogen storage film.

[0018] A thirteenth aspect is a manufacturing apparatus for a hydrogen storage medium according to the ninth or tenth aspect, wherein the film forming section includes a cathode including a target provided at a position facing the substrate in the chamber, a sputtering power supply for applying a sputtering voltage to the cathode, and a sputtering gas supply section for supplying a sputtering gas between the target and the substrate, and the hydrogen gas supply section supplies the hydrogen gas between the target and the substrate.

[0019] A fourteenth aspect is a manufacturing apparatus for a hydrogen storage medium according to any one of the ninth to thirteenth aspects, further comprising a cooling section for cooling the substrate.

[0020] The 15th aspect is a manufacturing apparatus for a hydrogen storage medium according to any one of the 9th to 14th aspects, further comprising an unwinding roller around which the base material is wound, and a winding roller for winding up the base material unwound from the unwinding roller, wherein the film forming portion forms the hydrogen storage film on the base material between the unwinding roller and the winding roller.

[0021] The 16th aspect is a manufacturing apparatus for a hydrogen storage medium according to the 15th aspect, wherein the chamber includes a film forming chamber, a hydrogen chamber, and a passage connecting the film forming chamber and the hydrogen chamber, the film forming portion forms the hydrogen storage film on the base material in the film forming chamber under a reduced pressure state, the winding roller is provided in the hydrogen chamber, winds up the base material formed with the hydrogen storage film introduced from the film forming chamber through the passage, and the hydrogen gas supply portion supplies the hydrogen gas into the hydrogen chamber under a reduced pressure state.

[0022] The 17th aspect is a hydrogen storage apparatus, comprising a container having an inlet / outlet for hydrogen gas, a film-like base material, and a hydrogen storage medium including a hydrogen storage film formed on the base material, and the hydrogen storage medium is housed in the container in a wound state wound around a winding axis passing through the inlet / outlet.

[0023] The 18th aspect is a hydrogen storage apparatus according to the 17th aspect, wherein the base material includes at least one of a porous film and a non-woven fabric.

[0024] The 19th aspect is a hydrogen storage apparatus according to the 17th or 18th aspect, wherein the outer peripheral side or the inner peripheral side surface of the wound hydrogen storage medium has an uneven shape for forming a gap between the Nth (N is an integer of 2 or more) turn portion and the (N - 1)th turn portion of the hydrogen storage medium.

[0025] The 20th aspect is a hydrogen storage apparatus according to any one of the 17th to 19th aspects, further comprising a hollow winding core around which the hydrogen storage medium is wound, and the winding core has a plurality of holes penetrating the winding core in the radial direction with respect to the winding axis.

[0026] The 21st aspect is a hydrogen storage device according to any one of the 17th to 20th aspects, further comprising a pressing portion that presses the hydrogen storage medium in a pressing direction intersecting the winding axis.

Advantages of the Invention

[0027] According to the 1st, 3rd, 9th, and 11th aspects, a hydrogen storage medium in a state where hydrogen is stored can be manufactured.

[0028] According to the 2nd and 10th aspects, since the hydrogen storage films are sequentially laminated while hydrogen is being stored, a hydrogen storage medium with a larger hydrogen content can be manufactured.

[0029] According to the 4th and 12th aspects, since highly reactive hydrogen active species act on the hydrogen storage film, the amount of hydrogen stored in the hydrogen storage film can be improved.

[0030] According to the 5th and 13th aspects, hydrogen gas can also be made into plasma by using a plasma generator in sputtering.

[0031] According to the 6th and 14th aspects, the hydrogen storage reaction by the hydrogen storage film is an exothermic reaction, and the heat generation of the hydrogen storage film can be efficiently performed. Therefore, more hydrogen can be stored in the hydrogen storage medium.

[0032] According to the 7th and 15th aspects, a wound hydrogen storage medium can be manufactured.

[0033] According to the 8th aspect, in the hydrogen storage medium in the wound state, a gap can be formed between the (N - 1)th turn portion and the Nth turn portion. Therefore, hydrogen gas can be supplied to or taken out from the hydrogen storage film through the gap.

[0034] According to the 16th aspect, it is possible to remove moisture in the hydrogen storage medium in the hydrogen chamber while allowing the hydrogen storage membrane to store hydrogen.

[0035] According to the 17th aspect, the hydrogen gas introduced into the container from the introduction port can move along the winding axis through the gaps in each circumference of the spiral-shaped hydrogen storage medium. Therefore, the hydrogen gas can be supplied to the entire surface of the hydrogen storage membrane more quickly. Thus, the hydrogen storage device can store hydrogen with high efficiency. Conversely, the hydrogen gas released from the hydrogen storage membrane can move toward the introduction port through the gaps between the circumferences of the hydrogen storage medium. Therefore, the hydrogen storage device can release hydrogen with high efficiency.

[0036] According to the 18th aspect, the hydrogen storage membrane can release hydrogen gas through the base material and can also store the hydrogen gas that has passed through the base material.

[0037] According to the 19th aspect, hydrogen gas can pass through the gaps. For this reason, the hydrogen gas introduced from the introduction port can be quickly supplied to the hydrogen storage membrane through the gaps. Also, the hydrogen gas released from the hydrogen storage membrane can be quickly moved to the introduction port through the gaps.

[0038] According to the 20th aspect, the hydrogen gas introduced from the introduction port can be quickly supplied to the hydrogen storage membrane through the hollow portion of the core and the plurality of holes. Also, the hydrogen gas released from the hydrogen storage membrane can be quickly moved to the introduction port through the plurality of holes and the hollow portion of the core.

[0039] According to the 21st aspect, by pressing the hydrogen storage medium, hydrogen gas can be efficiently released from the hydrogen storage medium.

Brief Description of the Drawings

[0040]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Figure 9

Figure 10

Figure 11

Figure 12

Figure 13

Embodiments for Carrying Out the Invention

[0041] Hereinafter, embodiments will be described in detail with reference to the drawings. In the drawings, for the purpose of easy understanding, the dimensions and numbers of each part are exaggerated or simplified as necessary. Also, parts having the same configuration and function are denoted by the same reference numerals, and duplicate explanations are omitted in the following description.

[0042] In the following description, the same reference numerals are used to denote the same components, and their names and functions are also assumed to be the same. Therefore, detailed descriptions thereof may be omitted to avoid duplication.

[0043] In the following description, even when ordinal numbers such as "first" or "second" are used, these terms are used for convenience in order to facilitate understanding of the content of the embodiments, and are not limited to the order that may be caused by these ordinal numbers.

[0044] When expressions indicating relative or absolute positional relationships (such as "in one direction", "along one direction", "parallel", "orthogonal", "center", "concentric", "coaxial", etc.) are used, unless otherwise specified, the expression not only represents the positional relationship strictly, but also represents a state in which the angle or distance is displaced within a range where the same tolerance or the same function can be obtained. When an expression indicating an equal state (such as "identical", "equal", "homogeneous", etc.) is used, unless otherwise specified, the expression not only represents a quantitatively strictly equal state, but also represents a state in which there is a difference within a range where the same tolerance or the same function can be obtained. When an expression indicating a shape (such as "quadrangular shape" or "cylindrical shape", etc.) is used, unless otherwise specified, the expression not only represents the shape geometrically strictly, but also represents a shape having, for example, unevenness or chamfers within a range where the same effect can be obtained. When an expression such as "comprises", "has", "includes", or "owns" is used for one component, the expression is not an exclusive expression excluding the existence of other components. When an expression such as "at least any one of A, B, and C" is used, the expression includes only A, only B, only C, any two of A, B, and C, and all of A, B, and C.

[0045] <First Embodiment> FIG. 1 is a diagram schematically showing an example of the configuration of a hydrogen storage medium manufacturing apparatus 100 according to the first embodiment. The manufacturing apparatus 100 is a manufacturing apparatus for manufacturing a hydrogen storage medium 200. FIG. 2 is a cross-sectional view showing an example of the configuration of the hydrogen storage medium 200 according to the first embodiment. As shown in FIG. 2, the hydrogen storage medium 200 includes a base material 210 and a hydrogen storage film 220.

[0046] The base material 210 functions as a support for supporting the hydrogen storage film 220. The base material 210 has, for example, a film-like (which can also be said to be sheet-like) shape. The base material 210 has a first main surface 211 and a second main surface 212 on the side opposite to the first main surface 211. The first main surface 211 and the second main surface 212 of the base material 210 may have a rectangular shape that is long in a predetermined longitudinal direction. In the example of FIG. 2, although the base material 210 is shown in a state of extending along the horizontal, the base material 210 can be wound into a roll shape. That is, the base material 210 may have a degree of deformability (for example, flexibility or elasticity) that allows it to be wound. For example, the base material 210 can be formed of a resin such as PET (polyethylene terephthalate) or a metal. For the metal, for example, copper or aluminum can be applied. When the base material 210 is formed of a metal, it can also be said that the base material 210 is a metal foil.

[0047] The hydrogen storage film 220 is formed on the first main surface 211 of the base material 210. The hydrogen storage film 220 is formed of a hydrogen storage alloy. A hydrogen storage alloy is an alloy that can contain hydrogen inside, for example, by at least one of a solid solution phenomenon and a chemical bond. The hydrogen storage film 220 contains, for example, at least one element among titanium, manganese, zirconium, nickel, cobalt, aluminum, iron, vanadium, magnesium, palladium, calcium, lanthanum, lithium, potassium, uranium, sodium, copper, and cadmium. The thickness of the hydrogen storage film 220 may be, for example, 100 μm or less, 10 μm or less, or 1 μm or less. The hydrogen storage medium 200 may have a degree of deformability that allows it to be wound.

[0048] The manufacturing apparatus 100 is a film forming apparatus that forms a hydrogen storage film 220 on the first main surface 211 of a substrate 210. As shown in FIG. 1, the manufacturing apparatus 100 includes a chamber 1, a hydrogen gas supply unit 2, a film forming unit 3, a pressure reducing unit 7, and a control unit 9. Hereinafter, after giving an overview of each unit, an example thereof will be described in detail.

[0049] The chamber 1 has a box shape. The internal space of the chamber 1 corresponds to a processing chamber for forming the hydrogen storage film 220 on the first main surface 211 of the substrate 210. The chamber 1 is provided so that the substrate 210 can be carried in and out.

[0050] The pressure reducing unit 7 sucks the gas in the chamber 1 to reduce the pressure in the chamber 1. Specifically, the pressure reducing unit 7 adjusts the pressure in the chamber 1 within a pressure range suitable for the film forming process. The chamber 1 may also be referred to as a vacuum chamber.

[0051] The film forming unit 3 forms the hydrogen storage film 220 on the first main surface 211 of the substrate 210 in the chamber 1. For example, the film forming unit 3 forms the hydrogen storage film 220 on the first main surface 211 of the substrate 210 by a dry process. For the dry process, for example, vapor deposition or sputtering can be applied. Here, as an example, the film forming unit 3 forms the hydrogen storage film 220 on the first main surface 211 of the substrate 210 by sputtering. An example of the specific configuration of the film forming unit 3 will be described in detail later.

[0052] The hydrogen gas supply unit 2 supplies hydrogen gas into the chamber 1. At least a part of the hydrogen gas supplied into the chamber 1 is occluded in the hydrogen storage film 220. Thereby, the manufacturing apparatus 100 can manufacture the hydrogen storage medium 200 that occludes hydrogen.

[0053] The control unit 9 controls various components of the manufacturing apparatus 100. Specifically, the control unit 9 can control the hydrogen gas supply unit 2, the film forming unit 3, and the pressure reducing unit 7. FIG. 3 is a block diagram schematically showing an example of the configuration of the control unit 9. The control unit 9 is an electronic circuit and has, for example, a data processing unit 91 and a storage unit 92. The data processing unit 91 may be an arithmetic processing device such as a CPU (Central Processor Unit). The storage unit 92 may have a non-temporary storage unit (e.g., ROM (Read Only Memory)) 921 and a temporary storage unit (e.g., RAM (Random Access Memory)) 922. The non-temporary storage unit 921 may store, for example, a program that defines the processes executed by the control unit 90. By the data processing unit 91 executing this program, the control unit 9 can execute the processes defined in the program. Of course, part or all of the processes executed by the control unit 9 may be executed by hardware such as a dedicated logic circuit.

[0054] In the example of FIG. 1, the pressure reducing unit 7 includes a discharge pipe 71 and a suction drive unit 72. The upstream end of the discharge pipe 71 is connected to the chamber 1 and leads to the internal space of the chamber 1. The suction drive unit 72 may include, for example, a pump (specifically, a vacuum pump). The suction drive unit 72 is connected to the downstream end of the discharge pipe 71 and sucks the gas in the chamber 1 through the discharge pipe 71. The suction drive unit 72 is controlled by the control unit 9. The suction drive unit 72 adjusts the pressure in the chamber 1 within a pressure range suitable for the film forming process.

[0055] As shown in FIG. 1, the manufacturing apparatus 100 can be a so-called roll-to-roll type manufacturing apparatus. In the example of FIG. 1, the manufacturing apparatus 100 further includes a substrate conveyance unit 4. In the example of FIG. 1, the substrate conveyance unit 4 is provided in the chamber 1. The substrate conveyance unit 4 is controlled by the control unit 9 and sends out the substrate 210 to the film forming unit 3. As a specific example, the substrate conveyance unit 4 includes an unwinding roller 41, a winding roller 42, a processing roller 43, and relay rollers 44. In the example of FIG. 1, relay rollers 44a and 44b are shown as the relay rollers 44. The substrate conveyance unit 4 includes a rotation driving unit (not shown) that rotates these rollers. The rotation driving unit is controlled by the control unit 9. The rotation driving unit includes, for example, a motor.

[0056] The unwinding roller 41 has a cylindrical outer peripheral surface and can be provided in a posture where its central axis is along the horizontal direction. The untreated substrate 210 is wound around the unwinding roller 41. The unwinding roller 41 is rotatably provided in the chamber 1 around the central axis, and the substrate 210 is unwound as the unwinding roller 41 rotates.

[0057] The substrate 210 unwound from the unwinding roller 41 is wound around the winding roller 42 via the relay roller 44a, the processing roller 43, and the relay roller 44b in this order. The winding roller 42 has a cylindrical outer peripheral surface. The winding roller 42 can be provided such that its central axis is along the horizontal direction (specifically, the central axis of the unwinding roller 41). Also, the winding roller 42 is rotatably provided in the chamber 1 around the central axis. As the winding roller 42 rotates, the substrate 210 is wound around the winding roller 42.

[0058] The processing roller 43 and the relay roller 44 are provided between the unwinding roller 41 and the winding roller 42 in the conveyance path of the base material 210. Each of the processing roller 43 and the relay roller 44 has a cylindrical outer peripheral surface, and can be provided such that their respective central axes are along the horizontal direction (specifically, the central axis of the unwinding roller 41). Each of the processing roller 43 and the relay roller 44 is provided in the chamber 1 so as to be rotatable about its own central axis. The processing roller 43 is located between the unwinding roller 41 and the winding roller 42 in the conveyance path of the base material 210. In the example of FIG. 1, the relay roller 44a is located between the unwinding roller 41 and the processing roller 43 in the conveyance path, and the relay roller 44b is located between the processing roller 43 and the winding roller 42. The base material 210 is stretched over the relay roller 44a, the processing roller 43, and the relay roller 44b, and is wound around the winding roller 42.

[0059] In the example of FIG. 1, the diameter of the processing roller 43 is larger than the diameters of the unwinding roller 41 and the winding roller 42. The base material 210 is in contact with the outer peripheral surface of the processing roller 43 in a posture where the first main surface 211 faces the outside in the radial direction with respect to the processing roller 43. That is, the second main surface 212 of the base material 210 is in contact with the outer peripheral surface of the processing roller 43. In the example of FIG. 1, the base material 210 is in contact with the outer peripheral surface of the processing roller 43 in an area larger than half of the circumference of the processing roller 43.

[0060] The film forming unit 3 forms a hydrogen storage film 220 on the base material 210 between the unwinding roller 41 and the winding roller 42. Specifically, the film forming unit 3 performs a film forming process on the portion of the base material 210 that is in contact with the outer peripheral surface of the processing roller 43, and forms a hydrogen storage film 220 on the first main surface 211 of the base material 210. In such a structure, it can be said that the base material conveyance unit 4 supplies the base material 210 to the film forming unit 3.

[0061] In the example of FIG. 1, the film forming unit 3 includes at least one cathode 5, a sputtering power supply 55, and a sputtering gas supply unit 6.

[0062] The cathode 5 includes a target 51. The target 51 is provided at a position facing the processing roller 43 with a space therebetween on the radially outer side of the processing roller 43. The cathode 5 may be a so-called planar cathode. In this case, the target 51 has a flat plate shape. In the example of FIG. 1, a flat plate-shaped target 51 is shown. Note that the cathode 5 may be a so-called rotary cathode. In this case, the target 51 has a cylindrical shape and is provided rotatably about its central axis. Hereinafter, it is assumed that the cathode 5 is a planar cathode.

[0063] The cathode 5 may further include a target holding portion (not shown). The target holding portion is provided in the chamber 1 and holds the target 51. Specifically, the target holding portion holds the target 51 in a state where the main surface of the target 51 on the side of the processing roller 43 is exposed in the chamber 1. The target holding portion may be formed of a conductive material (for example, metal).

[0064] As shown in FIG. 1, the film forming portion 3 may include a plurality of cathodes 5. The plurality of cathodes 5 are provided at intervals in the conveyance direction of the base material 210. In other words, the plurality of cathodes 5 are arranged at intervals in the circumferential direction with respect to the processing roller 43.

[0065] The target 51 of the adjacent cathodes 5 is formed of mutually different materials. Specifically, each target 51 is formed of at least one of the components (elements) constituting the hydrogen storage film 220. As a specific example, when the hydrogen storage film 220 is formed of M (M is plural) types of components, M targets 51 formed of each component may be provided. In the example of FIG. 1, two types of cathodes 5a and 5b are provided. Hereinafter, the target 51 of the cathode 5a is also referred to as the target 51a, and the target 51 of the cathode 5b is referred to as the target 51b. Here, as an example, it is assumed that the hydrogen storage film 220 is an alloy containing two types of elements (the first element and the second element). The target 51a is formed of, for example, the metal of the first element, and the target 51b is formed of, for example, the metal of the second element.

[0066] In the example of FIG. 1, a plurality of sets including the cathode 5a and the cathode 5b (hereinafter referred to as the cathode set 50) are arranged at intervals in the conveyance direction of the base material 210. For this reason, in the example of FIG. 1, the cathodes 5a and 5b are alternately arranged in the conveyance direction of the base material 210. In the example of FIG. 1, three cathode sets 50 are arranged.

[0067] The sputter gas supply unit 6 supplies sputter gas into the chamber 1. More specifically, the sputter gas supply unit 6 supplies sputter gas into the space between the base material 210 and each target 51. The sputter gas is a rare gas such as argon gas, for example. In the example of FIG. 1, the sputter gas supply unit 6 includes a nozzle 61, a supply pipe 62, a supply valve 63, and a flow rate adjustment valve 64. The nozzle 61 is provided in the chamber 1 and discharges sputter gas. In the example of FIG. 1, the nozzle 61 is provided between two adjacent cathode sets 50. In the example of FIG. 1, as the nozzle 61, a nozzle 61a and a nozzle 61b are provided. The nozzle 61a is provided between the upstream cathode set 50 and the central cathode set 50, and the nozzle 61b is provided between the central cathode set 50 and the downstream cathode set 50.

[0068] Note that the nozzle 61 may be provided corresponding to the cathode set 50. For example, two nozzles 61 may be provided for one cathode set 50. In this case, one nozzle 61 may be provided upstream of the corresponding cathode set 50, and the other nozzle 61 may be provided downstream of the corresponding cathode set 50.

[0069] In the example of FIG. 1, the nozzle 61 discharges the sputter gas toward the processing roller 43. In other words, the nozzle 61 has a discharge port at a position facing the processing roller 43 in the radial direction of the processing roller 43. The nozzle 61 may discharge the sputter gas along the radial direction. The sputter gas discharged from the discharge port of the nozzle 61 spreads in the chamber 1 and is supplied between each target 51 and the base material 210.

[0070] The nozzle 61 is connected to the sputter gas supply source through the supply pipe 62. In the example of FIG. 1, the supply pipe 62 includes a branch pipe 62a, a branch pipe 62b, and a common pipe 62c. The nozzle 61a is connected to the downstream end of the branch pipe 62a, the nozzle 61b is connected to the downstream end of the branch pipe 62b, the upstream ends of the branch pipe 62a and the branch pipe 62b are connected to the downstream end of the common pipe 62c, and the upstream end of the common pipe 62c is connected to the sputter gas supply source. The supply valve 63 is provided in the supply pipe 62 and switches the discharge and stop of the sputter gas from the nozzle 61. In the example of FIG. 1, the supply valve 63 is provided in the common pipe 62c. The flow rate adjustment valve 64 adjusts the flow rate of the sputter gas flowing through the supply pipe 62. In the example of FIG. 1, the flow rate adjustment valve 64 is provided in the common pipe 62c. The supply valve 63 and the flow rate adjustment valve 64 are controlled by the control unit 9.

[0071] The sputtering power supply 55 applies a sputtering voltage (hereinafter referred to as the sputtering voltage) to the cathode 5. The sputtering power supply 55 is controlled by the control unit 9. The sputtering power supply 55 has an output terminal 551 and an output terminal 552. The output terminal 551 is electrically connected to the target holding portion of each cathode 5, and the output terminal 552 is grounded, for example. The sputtering power supply 55 includes a power supply circuit such as a switching power supply circuit, and applies a sputtering voltage including a negative voltage to the cathode 5. That is, the potential of the output terminal 551 of the sputtering power supply 55 is lower than the potential of the output terminal 552. The sputtering voltage may be a constant negative voltage or a pulse voltage. Alternatively, the sputtering power supply 55 may output an alternating voltage as the sputtering voltage. The sputtering voltage is also referred to as a target voltage, a cathode applied voltage, or a bias voltage as another expression. Note that when the target 51 has conductivity, the target holding portion does not have to have conductivity. In this case, the output terminal 551 of the sputtering power supply 55 is electrically connected to the target 51. Also, as shown in FIG. 1, the sputtering power supply 55 may be provided for each type of cathode 5 (that is, each type of target 51).

[0072] When the sputtering voltage is applied to the cathode 5, the sputtering gas between the base material 210 and each target 51 is turned into plasma. Ions (for example, argon ions) in the plasma move toward the target 51 due to the negative voltage of the cathode 5 and collide with the main surface of the target 51. Due to this collision, sputtering particles (for example, atoms) jump out from the main surface of the target 51 and move toward the base material 210 side. For example, particles of the first element jump out from the target 51a, and particles of the second element jump out from the target 51b. These sputtering particles are laminated on the first main surface 211 of the base material 210.

[0073] Since the sputtering particles are sequentially laminated on the first main surface 211 of the base material 210 during the conveyance of the base material 210, particles of the first element and particles of the second element are alternately laminated on the first main surface 211 of the base material 210. Thereby, a hydrogen storage film 220 is formed on the first main surface 211 of the base material 210.

[0074] As shown in FIG. 1, the film forming unit 3 may further include a magnet unit 53. The magnet unit 53 is provided one-to-one with respect to the target 51. The magnet unit 53 is provided on the side opposite to the processing roller 43 with respect to the corresponding target 51. The magnet unit 53 forms a magnetic field in the space facing the main surface on the processing roller 43 side of the corresponding target 51. Since the magnetic field can enclose electrons, plasma with a high electron density can be generated inside the magnetic field.

[0075] The magnet unit 53 includes a magnet 53a and a magnet 53b. The magnet 53a has, for example, an elongated shape that is long in the horizontal direction, and is arranged in a posture where its longitudinal direction is along the horizontal direction (for example, the central axis of the processing roller 43). The magnet 53a has a first magnetic pole surface facing the target 51. The magnet 53b has an annular shape surrounding the magnet 53a when viewed in a state where the line of sight is along the radial direction with respect to the processing roller 43. The magnet 53b has a second magnetic pole surface facing the target 51. The polarity of the second magnetic pole surface (for example, N pole) is different from the polarity of the first magnetic pole surface (for example, S pole). In the example of FIG. 1, the magnet unit 53 also includes a yoke 53c. The yoke 53c is provided on the side opposite to the target 51 with respect to the magnet 53a and the magnet 53b, and magnetically couples the magnet 53a and the magnet 53b.

[0076] The hydrogen gas supply unit 2 supplies hydrogen gas, for example, to the space between each target 51 and the base material 210. In the example of FIG. 1, a part of the nozzle 61 and the supply pipe 62 is shared by the hydrogen gas supply unit 2 and the sputter gas supply unit 6. That is, the hydrogen gas supply unit 2 includes the nozzle 61 and the said part of the supply pipe 62. The hydrogen gas supply unit 2 further includes a supply pipe 22, a supply valve 23, and a flow rate adjustment valve 24. In the example of FIG. 1, the downstream end of the supply pipe 22 is connected to a part of the common pipe 62c that is downstream of both the supply valve 63 and the flow rate adjustment valve 64. The upstream end of the supply pipe 22 is connected to a hydrogen gas supply source (not shown). The supply valve 23 is provided in the supply pipe 22 and switches the discharge and stop of the hydrogen gas from the nozzle 61. The flow rate adjustment valve 24 adjusts the flow rate of the hydrogen gas flowing through the supply pipe 22. The supply valve 23 and the flow rate adjustment valve 24 are controlled by the control unit 9.

[0077] In the example of FIG. 1, the hydrogen gas supply unit 2 supplies hydrogen gas in parallel with the supply of the sputter gas by the sputter gas supply unit 6. Specifically, when the control unit 9 opens both the supply valve 23 and the supply valve 63, a mixed gas of sputter gas and hydrogen gas is discharged from the nozzle 61. The hydrogen gas discharged from the nozzle 61 spreads in the chamber 1 and is supplied between each target 51 and the base material 210. For this reason, the hydrogen gas is also plasmaized, and highly reactive hydrogen active species such as hydrogen ions and hydrogen radicals are generated. By the action of this hydrogen active species on the hydrogen storage film 220 on the first main surface 211 of the base material 210, hydrogen is stored in the hydrogen storage film 220 during film formation with higher efficiency.

[0078] In this way, the hydrogen gas is plasmaized by the cathode 5 and the sputtering power source 55. Therefore, it also functions as a plasma generator 25 that plasmaizes the cathode 5, the sputtering power source 55, and the hydrogen gas to generate hydrogen active species and causes the active species to act on the hydrogen storage film 220.

[0079] As shown in FIG. 1, the manufacturing apparatus 100 may further include a cooling unit 8. The cooling unit 8 is controlled by a control unit 9 to cool the base material 210. In the example of FIG. 1, the cooling unit 8 cools the processing roller 43 to cool the base material 210 in contact with the outer peripheral surface of the processing roller 43. In the example of FIG. 1, the cooling unit 8 includes a cooling source 81 and a refrigerant flow path 82. The refrigerant flow path 82 is a path through which the refrigerant flows. As the refrigerant, water or a fluorocarbon refrigerant can be applied. The refrigerant flow path 82 can be constituted by piping. The upstream end and the downstream end of the refrigerant flow path 82 are connected to the cooling source 81. A part of the refrigerant flow path 82 extends inside the processing roller 43. When the low-temperature refrigerant flows through the refrigerant flow path 82 inside the processing roller 43, heat exchange occurs between the refrigerant and the processing roller 43. Thereby, the refrigerant can take heat from the processing roller 43, and the processing roller 43 is cooled. Since heat exchange also occurs between the cooled processing roller 43 and the base material 210, the base material 210 is cooled. The cooling source 81 cools the refrigerant flowing in from the downstream end of the refrigerant flow path 82 and supplies the cooled refrigerant to the upstream end of the refrigerant flow path 82. The cooling source 81 may be, for example, a heat pump unit. Thus, by circulating the refrigerant through the cooling source 81 and the refrigerant flow path 82, the cooling unit 8 can cool the base material 210 via the processing roller 43.

[0080] Next, an example of the operation of the manufacturing apparatus 100 will be described. FIG. 4 is a flowchart showing an example of the operation of the manufacturing apparatus 100. The operation of FIG. 4 is realized by the control of each part of the manufacturing apparatus 100 by the control unit 9. Here, it is assumed that initially, the base material 210 has been carried into the manufacturing apparatus 100. The loading of the base material 210 into the manufacturing apparatus 100 can be performed by a loading device (not shown).

[0081] First, the pressure reduction unit 7 reduces the pressure in the chamber 1 (step S1: pressure reduction process). Specifically, the suction drive unit 72 sucks the gas in the chamber 1 through the discharge pipe 71. The suction drive unit 72 sucks the gas in the chamber 1 so that the pressure in the chamber 1 falls within the pressure range suitable for the film formation process. The pressure reduction unit 7 adjusts the pressure in the chamber 1 until the film formation process on the substrate 210 is completed. The pressure in the chamber 1 in the pressure reduction state may be, for example, one-tenth or less of the standard atmospheric pressure, or one-hundredth or less, or one-thousandth or less, or one-ten-thousandth or less.

[0082] Next, the film formation unit 3 forms a hydrogen storage film 220 on the substrate 210 by a dry process in the pressure reduction state where the chamber 1 is under reduced pressure (step S2: film formation process). In the example of FIG. 4, in parallel with step S2, the hydrogen gas supply unit 2 supplies hydrogen gas into the chamber 1 in the pressure reduction state where the chamber 1 is under reduced pressure (step S3: hydrogen supply process). As a more specific example, while the substrate conveyance unit 4 winds up the substrate 210 unwound from the unwinding roller 41 by the winding roller 42, the film formation unit 3 forms the hydrogen storage film 220 on the substrate 210 between the unwinding roller 41 and the winding roller 42. That is, the control unit 9 opens the supply valve 63, the sputtering power supply 55 applies a sputtering voltage to the cathode 5, and the substrate conveyance unit 4 conveys the substrate 210. Further, the cooling unit 8 cools the substrate 210. Furthermore, when the control unit 9 opens the supply valve 23, hydrogen gas is discharged from the nozzle 61.

[0083] Here, a part of the substrate 210 will be described in detail. Due to the conveyance by the substrate conveyance unit 4, this part of the substrate 210 moves from the upstream side of the film forming unit 3 across the film forming unit 3 to the downstream side of the film forming unit 3. For this reason, this part of the substrate 210 sequentially crosses a plurality (three in FIG. 1) of cathode sets 50. That is, this part of the substrate 210 alternately crosses the target 51a and the target 51b. When this part of the substrate 210 crosses the target 51a, the particles of the first element scattered from the target 51a are laminated on the first main surface 211 of this part. When it crosses the target 51b, the particles of the second element scattered from the target 51b are laminated on the first main surface 211 of this part. For this reason, the first element and the second element are alternately laminated on the first main surface 211 of this part of the substrate 210. Therefore, by this part of the substrate 210 crossing the film forming unit 3 (specifically, a plurality of cathode sets 50), a hydrogen storage film 220, which is an alloy of the first element and the second element, is formed with a specified film thickness on the first main surface 211 of the substrate 210. The specified film thickness is, for example, a film thickness within a preset specified range. The specified film thickness is also the film thickness required for the hydrogen storage medium 200 as a product. Then, the substrate 210 on which the hydrogen storage film 220 is formed by the film forming unit 3 is wound up by the winding roller 42.

[0084] As described above, the manufacturing apparatus 100 forms the hydrogen storage film 220 on the first main surface 211 of the substrate 210 to manufacture the hydrogen storage medium 200. Moreover, in the manufacturing apparatus 100, since the hydrogen gas supply unit 2 supplies hydrogen gas into the chamber 1, it is possible to manufacture the hydrogen storage medium 200 that stores hydrogen.

[0085] Further, in the above example, the film forming unit 3 (specifically, the plasma generator 25) generates plasma of hydrogen gas in the space between the base material 210 and each target 51. For this reason, active species of hydrogen (ions or radicals) are generated, and these active species of hydrogen act on the hydrogen storage film 220 during film formation. Therefore, while each sputtering particle of the first element and the second element is being laminated on the first main surface 211 of the base material 210, the active species of hydrogen are incorporated into the hydrogen storage film 220. Since the active species of hydrogen are highly reactive and are incorporated into the hydrogen storage film 220, hydrogen can be more easily stored inside the hydrogen storage film 220. For this reason, the manufacturing apparatus 100 can manufacture the hydrogen storage medium 200 storing hydrogen more efficiently. In other words, the manufacturing apparatus 100 can manufacture the hydrogen storage medium 200 storing hydrogen with a larger hydrogen content.

[0086] As described above, the manufacturing apparatus 100 can store hydrogen to some extent when forming the hydrogen storage film 220. For this reason, the step of incorporating hydrogen into the hydrogen storage film 220 thereafter can be shortened. Further, since the reducing power of hydrogen gas is high, oxidation of the hydrogen storage film 220 during film formation by the manufacturing apparatus 100 can be suppressed, and a higher quality hydrogen storage film 220 can be formed on the base material 210.

[0087] Further, in the above example, the plasma generator 25 generates plasma of hydrogen gas to generate active species of hydrogen (ions or radicals). Since these highly reactive active species of hydrogen act on the hydrogen storage film 220, the manufacturing apparatus 100 can store hydrogen in the hydrogen storage film 220 more efficiently even when the chamber 1 is in a reduced pressure state.

[0088] Further, in the above example, hydrogen gas is also made into plasma using the cathode 5 and the sputtering power source 55 that make argon gas into plasma. For this reason, compared with the case where a plasma generator 25 dedicated to hydrogen gas is provided, the configuration of the manufacturing apparatus 100 can be simplified.

[0089] The hydrogen storage medium 200 is housed in a predetermined container to constitute a hydrogen storage device. Since the release of hydrogen from the hydrogen storage membrane 220 is an endothermic reaction, for example, hydrogen can be taken out from the hydrogen storage device by heating the hydrogen storage membrane 220 while reducing the pressure inside the container. On the other hand, since the storage of hydrogen is an exothermic reaction, for example, hydrogen gas may be supplied to the hydrogen storage device while cooling the hydrogen storage device. According to this, hydrogen can be stored in the hydrogen storage device more efficiently.

[0090] Incidentally, with the storage and release of hydrogen, the volume of the hydrogen storage membrane 220 changes. In the present embodiment, the hydrogen storage membrane 220 is formed on the first main surface 211 of the base material 210. Since the base material 210 has flexibility or elasticity to such an extent that it can be wound, it can be deformed according to the volume change of the hydrogen storage membrane 220. Therefore, the stress associated with the volume change of the hydrogen storage membrane 220 can be reduced, and the pulverization of the hydrogen storage membrane 220 can be suppressed.

[0091] Moreover, in the above example, the manufacturing apparatus 100 supplies hydrogen gas to the hydrogen storage membrane 220 during film formation. According to this, in the chamber 1, since the particles of the first element and the second element are sequentially laminated on the base material 210 while storing hydrogen, the manufacturing apparatus 100 can manufacture the hydrogen storage medium 200 with a larger hydrogen content. Here, the initial hydrogen amount, which is the hydrogen content of the hydrogen storage membrane 220 immediately after film formation, is smaller than the maximum amount of hydrogen that the hydrogen storage membrane 220 can store. The hydrogen storage membrane 220 that has stored hydrogen with this initial hydrogen amount is taken out from the chamber 1 and housed in a container to produce a hydrogen storage device. Then, when hydrogen gas is supplied to the hydrogen storage device to store hydrogen in the hydrogen storage membrane 220 up to the maximum amount of hydrogen, it is considered that a volume change corresponding to the difference between the maximum amount of hydrogen and the initial hydrogen amount occurs in the hydrogen storage membrane 220, and a first stress corresponding to the first volume change amount occurs.

[0092] For comparison, consider the case where a hydrogen storage film is formed on the substrate 210 in a state where hydrogen is not occluded. When hydrogen gas is supplied to the hydrogen storage device including this hydrogen storage film and the hydrogen storage film is allowed to occlude hydrogen up to the maximum amount of hydrogen, a volume change corresponding to the maximum amount of hydrogen occurs in this hydrogen storage film. For this reason, it is considered that a second stress corresponding to the second volume change amount occurs in the hydrogen storage film. Since the second volume change amount corresponds to the volume change from when the amount of hydrogen is zero to the maximum amount of hydrogen, the second stress is relatively large and tends to cause pulverization.

[0093] On the other hand, since the first volume change amount corresponds to the volume change from the initial amount of hydrogen to the maximum amount of hydrogen, it is smaller than the second volume change amount. For this reason, it is considered that the first stress is also smaller than the second stress. Therefore, it is considered that pulverization of the hydrogen storage film 220 can be further suppressed. The initial amount of hydrogen may be within a predetermined range including, for example, 1 / 2 of the maximum amount of hydrogen. The width of the predetermined range may be, for example, 1 / 10 of the maximum amount of hydrogen. The initial amount of hydrogen can be adjusted by various conditions such as the flow rate of hydrogen gas and the temperature of the substrate 210 by the cooling unit 8, for example.

[0094] In the above example, the manufacturing apparatus 100 manufactures the hydrogen storage medium 200 by a roll-to-roll method. According to this, the manufacturing apparatus 100 can manufacture the hydrogen storage medium 200 in a wound state.

[0095] By the way, when the wound hydrogen storage medium 200 is viewed along its winding axis, a spiral-shaped void can be formed between the spiral-shaped hydrogen storage media 200 (see also FIG. 6). When the diameter of the wound hydrogen storage medium 200 is reduced and the number of turns is increased, the ratio of the hydrogen storage film 220 to the space within the diameter of the hydrogen storage medium 200 can be increased. According to this, from the viewpoint of the ratio occupied by the hydrogen storage film 220, the maximum amount of hydrogen that the hydrogen storage medium 200 can occlude can be improved to some extent.

[0096] On the other hand, the spiral voids of the hydrogen storage medium 200 become smaller. Since the hydrogen storage film 220 expands in volume by hydrogen storage, the maximum amount of hydrogen that the hydrogen storage film 220 can store may also depend on the radial width of the voids. This is because when the hydrogen storage film 220 expands by the volume of the voids due to hydrogen storage, further volume expansion is restricted, and thus hydrogen cannot be stored any more.

[0097] According to the manufacturing apparatus 100 according to this embodiment, as described above, the hydrogen storage medium 200 storing hydrogen is wound up by the winding roller 42. That is, the hydrogen storage film 220 is wound in a state of volume expansion. For this reason, the maximum amount of hydrogen that the hydrogen storage film 220 can store can be the sum of the hydrogen content corresponding to the volume of the spiral voids and the initial amount of hydrogen.

[0098] Here, for comparison, consider the case where the hydrogen storage medium 200 is wound without storing hydrogen. In this case, the hydrogen content of the hydrogen storage film (that is, the initial amount of hydrogen) is zero immediately after winding. For this reason, the maximum amount of hydrogen in the hydrogen storage film 220 can be limited to the amount corresponding to the volume of the spiral voids. In contrast, in this embodiment, as described above, the maximum amount of hydrogen is the sum of the amount corresponding to the volume of the voids and the initial amount of hydrogen. That is, the manufacturing apparatus 100 can manufacture the hydrogen storage medium 200 with an improved maximum amount of hydrogen that can be stored.

[0099] <Cooling unit> The hydrogen storage reaction by the hydrogen storage membrane 220 is an exothermic reaction. Since the cooling unit 8 cools the base material 210, the heat generation of the hydrogen storage membrane 220 can be efficiently carried out, and thus the storage reaction can be efficiently carried out. Since the hydrogen storage efficiency by this hydrogen storage membrane 220 depends on the temperature of the hydrogen storage membrane 220, the cooling unit 8 may cool the base material 210 so that the temperature of the hydrogen storage membrane 220 is within a temperature range with high storage efficiency. This temperature range can be set in advance, for example, by experiments or simulations. The cooling unit 8 may adjust the temperature of the base material 210 to, for example, 30 degrees Celsius or less, 10 degrees Celsius or less, or 0 degrees Celsius or less. Thereby, the manufacturing apparatus 100 can store hydrogen in the hydrogen storage membrane 220 more efficiently even when the chamber 1 is in a reduced pressure state.

[0100] <Hydrogen storage device> FIG. 5 is a side view schematically showing an example of the configuration of a hydrogen storage device 300 including a hydrogen storage medium 200, and FIG. 6 is a cross-sectional view schematically showing an example of the configuration of the hydrogen storage device 300. FIG. 6 shows a cross-section taken along line VI-VI of FIG. 5. The hydrogen storage device 300 includes a container 310, a hydrogen storage medium 200, and an inlet / outlet unit 320. The container 310 has, for example, a bottomed cylindrical shape.

[0101] The inlet / outlet unit 320 is attached to the container 310 and can switch the communication / blocking between the internal space and the external space of the container 310. The inlet / outlet unit 320 functions as an inlet / outlet for hydrogen gas. Therefore, it can be said that the container 310 has an inlet / outlet. In the example of FIG. 5, the inlet / outlet unit 320 is provided at the end of the container 310. Specifically, the container 310 has a cylindrical side wall portion, and the inlet / outlet unit 320 is attached to the end of the container 310 on the central axis of the cylinder. Further, the container 310 has a bottom at the end of the side wall portion on the side opposite to the inlet / outlet unit 320. When the inlet / outlet unit 320 blocks the inside and the outside of the container 310, the container 310 is sealed.

[0102] The hydrogen storage medium 200 is stored in the container 310 in a wound state around the winding axis Q1. Specifically, the hydrogen storage medium 200 is stored in the container 310 in a posture where its winding axis Q1 is along the central axis of the container 310. That is, at the winding axis Q1, the hydrogen storage medium 200 and the lead-in / lead-out portion 320 are arranged side by side. Put another way, the winding axis Q1 passes through the lead-in / lead-out portion 320 (the lead-in / lead-out port).

[0103] The hydrogen storage device 300 may be provided with a temperature adjustment unit (not shown). The temperature adjustment unit adjusts the temperature of the hydrogen storage medium 200. The temperature adjustment unit may be, for example, a heater such as an electric resistance type, or a cooling unit such as air cooling.

[0104] In such a hydrogen storage device 300, storage and extraction of hydrogen gas can be performed through the lead-in / lead-out portion 320. For example, by introducing hydrogen gas into the container 310 through the lead-in / lead-out portion 320, hydrogen can be stored in the hydrogen storage film 220. If the temperature adjustment unit cools the hydrogen storage medium 200, hydrogen can be stored in the hydrogen storage film 220 more efficiently. Also, by reducing the pressure inside the container 310 or raising the temperature of the hydrogen storage device 300, hydrogen can be released from the hydrogen storage medium 200. The hydrogen gas released from the hydrogen storage medium 200 is taken out to the outside through the lead-in / lead-out portion 320.

[0105] In the example of FIG. 1, as described above, the inlet / outlet portion 320 is provided at a position aligned with the hydrogen storage medium 200 on the winding axis Q1. When the wound hydrogen storage medium 200 is viewed along the winding axis Q1, a spiral gap may be formed between each circumference of the hydrogen storage medium 200 (see also FIG. 6). Therefore, the hydrogen gas introduced from the inlet / outlet portion 320 can move along the winding axis Q1 through the gaps between the circumferences of the spiral. Thus, the hydrogen gas is supplied to the entire surface of the hydrogen storage film 220 more quickly. Therefore, the hydrogen storage film 220 can store hydrogen in the hydrogen storage film 220 with high efficiency. Conversely, the hydrogen gas released from the hydrogen storage film 220 can move toward the inlet / outlet portion 320 through the gaps between the circumferences of the hydrogen storage medium 200. Therefore, the hydrogen storage device 300 can release hydrogen gas with high efficiency.

[0106] Further, in the hydrogen storage device 300, the hydrogen storage medium 200 is stored in the container 310 in a wound state. The manufacturing device 100 for manufacturing the hydrogen storage medium 200 in a wound state is suitable for this hydrogen storage device 300. That is, the hydrogen storage medium 200 wound around the take-up roller 42 can be taken out from the manufacturing device 100 and stored in the container 310 as it is. Thereby, the hydrogen storage device 300 can be easily manufactured.

[0107] <Second Embodiment> FIG. 7 is a diagram schematically showing a first example of the configuration of the manufacturing device 100 according to the second embodiment. Hereinafter, the manufacturing device 100 in FIG. 7 is also referred to as the manufacturing device 100A. The manufacturing device 100A has the same configuration as the manufacturing device 100 according to the first embodiment, except for the specific configuration of the hydrogen gas supply unit 2. Specifically, in the first embodiment, the hydrogen gas supply unit 2 supplies hydrogen gas to the hydrogen storage film 220 during film formation, whereas in the manufacturing device 100A, the hydrogen gas supply unit 2 supplies hydrogen gas to the hydrogen storage film 220 after film formation. Specifically, the hydrogen gas supply unit 2 may supply hydrogen gas to the hydrogen storage film 220 being wound by the take-up roller 42.

[0108] In the example of FIG. 7, the hydrogen gas supply unit 2 includes a nozzle 21 different from the nozzle 61. That is, in the example of FIG. 7, the nozzle 61 is a nozzle for sputter gas and is not used by the hydrogen gas supply unit 2. The nozzle 21 is provided downstream of the film forming unit 3 in the conveyance direction within the chamber 1. For this reason, the nozzle 21 is provided downstream of the most downstream target 51. As a more specific example, the nozzle 21 is provided outside the radial direction of the take-up roller 42. The nozzle 21 may have a discharge port at a position facing the take-up roller 42 in the radial direction. The nozzle 21 discharges hydrogen gas toward the base material 210 being wound by the take-up roller 42. The nozzle 21 may discharge hydrogen gas along the radial direction.

[0109] The nozzle 21 is connected to the downstream end of the supply pipe 22, and the upstream end of the supply pipe 22 is connected to a hydrogen gas supply source. When the supply valve 23 provided in the supply pipe 22 opens, the nozzle 21 discharges hydrogen gas, and when the supply valve 23 closes, the nozzle 21 stops discharging hydrogen gas.

[0110] Also in this manufacturing apparatus 100A, the conveyance of the base material 210 by the base material conveyance unit 4, the formation of the hydrogen storage film 220 by the film forming unit 3, and the supply of hydrogen gas by the hydrogen gas supply unit 2 are performed in parallel with each other. That is, while the base material conveyance unit 4 conveys the base material 210, the film forming unit 3 forms the hydrogen storage film 220 on the first main surface 211 of the base material 210 between the unwind roller 41 and the take-up roller 42, and the hydrogen gas supply unit 2 supplies hydrogen gas to the hydrogen storage film 220. However, in the second embodiment, since the base material 210 is subjected to the treatment by the hydrogen gas supply unit 2 after being subjected to the treatment by the film forming unit 3, the hydrogen gas supply unit 2 supplies hydrogen gas to the hydrogen storage film 220 after film formation (that is, the hydrogen storage film 220 having a specified film thickness).

[0111] FIG. 8 is a flowchart showing the order of processes that the base material 210 undergoes by the manufacturing apparatus 100A according to the second embodiment. As shown in FIG. 8, a film forming step (step S2) and a hydrogen supply step (step S3) are performed on the base material 210 in this order. That is, the hydrogen supply step for the base material 210 is performed after the film forming step. That is, a hydrogen storage film 220 is formed with a predetermined film thickness on the portion of the base material 210 that has passed through the film forming portion 3 (film forming step), and then hydrogen gas is supplied to that portion (hydrogen supply step). In other words, hydrogen gas is supplied to the portion where the formation of the hydrogen storage film 220 is completed. In the example of FIG. 7, the hydrogen gas supply unit 2 supplies hydrogen gas to the hydrogen storage film 220 wound around the winding roller 42 during the winding operation of the winding roller 42. For this reason, the hydrogen gas supply unit 2 can supply hydrogen gas to each circumferential portion of the hydrogen storage film 220 wound by the winding roller 42.

[0112] As described above, also by the manufacturing apparatus 100A, since hydrogen gas is supplied to the hydrogen storage film 220 on the base material 210, the hydrogen storage film 220 stores hydrogen. For this reason, the manufacturing apparatus 100A can manufacture the hydrogen storage medium 200 that has stored hydrogen. Further, the manufacturing apparatus 100 can suppress the oxidation of the hydrogen storage film 220 and manufacture a higher-quality hydrogen storage medium 200.

[0113] Further, the hydrogen gas supply unit 2 supplies hydrogen gas to the hydrogen storage medium 200 during the winding operation from the radially outer side. For this reason, hydrogen gas can be appropriately supplied to each circumferential portion of the hydrogen storage medium 200.

[0114] Further, the hydrogen storage film 220 may be wound around the winding roller 42 in a posture facing the radially outer side with respect to the base material 210. According to this, the hydrogen gas supply unit 2 can supply hydrogen gas directly to the hydrogen storage film 220 by supplying hydrogen gas from the radially outer side of the winding roller 42 toward the winding roller 42.

[0115] Also in the example of FIG. 7, the cooling unit 8 of the manufacturing apparatus 100A cools the base material 210 by cooling the processing roller 43. However, the cooling unit 8 may cool the base material 210 wound around the winding roller 42 by cooling the winding roller 42. For example, the refrigerant flow path may extend inside the winding roller 42. Thereby, the portion of the base material 210 to which hydrogen gas is supplied can be cooled more efficiently. Further, the cooling unit 8 may cool both the processing roller 43 and the winding roller 42.

[0116] As shown in FIG. 7, the hydrogen gas supply unit 2 of the manufacturing apparatus 100A may further include a plasma generator 25. The plasma generator 25 generates hydrogen active species by plasmaizing hydrogen gas, and supplies the active species to the hydrogen storage film 220 downstream of the film forming unit 3. In the example of FIG. 7, the plasma generator 25 may be provided at a position adjacent to the nozzle 21 in the circumferential direction of the winding roller 42. The plasma generator 25 includes a conductive member (not shown) to which a voltage for plasma generation is applied, and the conductive member can be provided at a position adjacent to the nozzle 21 in the chamber 1. The plasma generator 25 may be, for example, a capacitively coupled or inductively coupled plasma generator. In the former case, the conductive member is a pair of electrodes, and in the latter case, the conductive member is an inductively coupled antenna.

[0117] FIG. 9 is a diagram schematically showing a second example of the configuration of the manufacturing apparatus 100 according to the second embodiment. Hereinafter, the manufacturing apparatus 100 of FIG. 9 is also referred to as the manufacturing apparatus 100B. The manufacturing apparatus 100B has the same configuration as the manufacturing apparatus 100A except for the configuration of the chamber 1.

[0118] In the manufacturing apparatus 100B, the chamber 1 includes a film formation chamber 11 and a hydrogen chamber 12. The internal space of the film formation chamber 11 corresponds to a processing chamber for forming the hydrogen storage film 220 on the substrate 210. The hydrogen chamber 12 corresponds to a processing chamber for supplying hydrogen gas to the hydrogen storage medium 200 after film formation. The volume of the hydrogen chamber 12 may be smaller than the volume of the film formation chamber 11. In the example of FIG. 9, the film formation chamber 11 and the hydrogen chamber 12 are connected to each other through the passage 13. Since the passage 13 is narrow, it is difficult for the gas to move between the film formation chamber 11 and the hydrogen chamber 12.

[0119] In the example of FIG. 9, the unwinding roller 41 and the processing roller 43 are provided in the film formation chamber 11, and the winding roller 42 is provided in the hydrogen chamber 12. Also, in the example of FIG. 9, relay rollers 44a to 44e are provided as relay rollers 44. The relay roller 44a, the relay roller 44b, the relay roller 44c, and the relay roller 44d are provided in the film formation chamber 11, and the relay roller 44e is provided in the hydrogen chamber 12. The substrate 210 unwound from the unwinding roller 41 is wound up by the winding roller 42 after passing through the relay roller 44a, the processing roller 43, and the relay rollers 44b to 44e in this order. In such a structure, the substrate 210 is conveyed from the film formation chamber 11 to the hydrogen chamber 12 through the passage 13.

[0120] The film formation unit 3 forms the hydrogen storage film 220 on the first main surface 211 of the substrate 210 in the film formation chamber 11. For example, each cathode 5 is provided in the film formation chamber 11, and the sputter gas supply unit 6 supplies sputter gas between each target 51 and the substrate 210 in the film formation chamber 11.

[0121] In the example of FIG. 9, the upstream end of the discharge pipe 71 is connected to the film forming chamber 11. Thereby, the suction driving unit 72 mainly sucks the gas in the film forming chamber 11 through the discharge pipe 71. As shown in FIG. 9, the decompression unit 7 may include a discharge pipe 73 and a suction driving unit 74. The upstream end of the discharge pipe 73 is connected to the hydrogen chamber 12, and the downstream end of the discharge pipe 73 is connected to the suction driving unit 74. The suction driving unit 74 sucks the gas in the hydrogen chamber 12 through the discharge pipe 73. An example of the configuration of the suction driving unit 74 is the same as that of the suction driving unit 72 and is controlled by the control unit 9. The decompression unit 7 may adjust the pressure in the hydrogen chamber 12 to be lower than the pressure in the film forming chamber 11.

[0122] Note that the decompression unit 7 does not necessarily have to include the suction driving unit 72 and the suction driving unit 74. For example, the downstream end of the discharge pipe 73 may be connected to an intermediate portion of the discharge pipe 71. In this case, the suction driving unit 72 sucks the gas from the film forming chamber 11 and the hydrogen chamber 12.

[0123] The hydrogen gas supply unit 2 supplies hydrogen gas into the hydrogen chamber 12. As shown in FIG. 9, the nozzle 21 of the hydrogen gas supply unit 2 is provided in the hydrogen chamber 12 and is provided at a position facing the base material 210. In the example of FIG. 9, the nozzle 21 is provided outside the radial direction of the winding roller 42 and has a discharge port at a position facing the winding roller 42 in the radial direction. The nozzle 21 discharges hydrogen gas toward the winding roller 42. In the example of FIG. 9, a plurality (for example, two) of nozzles 21 are provided. The plurality of nozzles 21 are arranged at intervals in the circumferential direction of the winding roller 42. Note that in the example of FIG. 9, for ease of illustration, components other than the nozzle 21 such as the supply pipe 22 are omitted.

[0124] Also in the manufacturing apparatus 100B, after the substrate 210 is subjected to the treatment by the film forming unit 3, it is subjected to the treatment by the hydrogen gas supply unit 2. Moreover, in the manufacturing apparatus 100B, the treatment by the hydrogen gas supply unit 2 is performed in the hydrogen chamber 12. That is, the hydrogen supply process is performed in a hydrogen chamber 12 different from the film forming chamber 11 in which the treatment by the film forming unit 3 is performed. Therefore, in the hydrogen supply process, it is possible to reduce the possibility that gases, plasma, and particles other than hydrogen act on the substrate 210.

[0125] Further, since a reduced pressure state is maintained also in the hydrogen chamber 12, moisture can be removed more efficiently from the hydrogen storage medium 200 in the hydrogen chamber 12. When the pressure of the hydrogen chamber 12 is lower than that of the film forming chamber 11, moisture can be removed even more efficiently from the hydrogen storage medium 200.

[0126] <Third Embodiment> In the third embodiment, various examples of the hydrogen storage medium 200 will be described. The hydrogen storage medium 200 can be manufactured by the manufacturing apparatus 100 according to the first or second embodiment. However, it is not necessarily manufactured by the manufacturing apparatus 100 according to the first or second embodiment. For example, the hydrogen storage medium 200 may be manufactured by a manufacturing apparatus obtained by removing the hydrogen gas supply unit 2 from the manufacturing apparatus 100.

[0127] <Substrate> <Air Permeability> The base material 210 may be a porous film. A porous film is a film having a plurality of pores inside. The plurality of pores can communicate with each other as appropriate. Since such a porous film has air permeability, hydrogen gas can pass through the base material 210. Conversely, the porous film has a plurality of pores having a size that allows hydrogen gas to pass through. The porous film may be, for example, an organic porous film, and as a specific example, it may be a porous PET (polyethylene terephthalate) or a porous polyester. The porosity of the porous film may be, for example, 20% or more, 40% or more, 60% or more, or 80% or more. Alternatively, a non-woven fabric (for example, a polyester non-woven fabric) may be applied to the base material 210. The non-woven fabric also has air permeability. Alternatively, the base material 210 may have a laminated structure in which a non-woven fabric is laminated on the porous film. In other words, the base material 210 may include at least one of the porous film and the non-woven fabric.

[0128] The base material 210 may have, for example, higher air permeability than the air permeability of the hydrogen storage film 220. If the base material 210 has air permeability, in the radial direction with respect to the winding axis Q1, hydrogen gas can pass through the base material 210. For this reason, the hydrogen gas released from the hydrogen storage film 220 to the base material 210 side can pass through the base material 210. Therefore, the hydrogen storage film 220 can release hydrogen gas from both main surfaces thereof. Conversely, hydrogen gas can pass through the base material 210 and be stored in the hydrogen storage film 220. Thereby, the hydrogen storage film 220 can store hydrogen gas from both main surfaces. Therefore, in the hydrogen storage device 300, the storage and extraction of hydrogen gas can be performed with higher efficiency.

[0129] <Thermal conductivity> The base material 210 may be formed of a heat-conductive material. For example, the base material 210 may be formed of a metal having high thermal conductivity. That is, the base material 210 may be a metal foil. The thermal conductivity of the base material 210 may be higher than the thermal conductivity of the hydrogen storage film 220. As the metal for forming the base material 210, for example, copper or aluminum can be applied. When the thermal conductivity of the base material 210 is high, heat transfer between the hydrogen storage film 220 and the base material 210 can be efficiently performed. Therefore, the heat generated by the hydrogen storage film 220 during hydrogen storage is easily released to the outside through the base material 210, and when hydrogen gas is released, the hydrogen storage film 220 easily absorbs heat from the base material 210. Thereby, in the hydrogen storage device 300, storage and extraction of hydrogen gas can be performed with higher efficiency.

[0130] <Laminated structure> The base material 210 may have a laminated structure of a film-like breathable base material including at least one of a porous film and a non-woven fabric that allows hydrogen gas to pass through, and a film-like heat-transfer base material (for example, a metal foil) having high thermal conductivity. The thermal conductivity of the heat-transfer base material is higher than the thermal conductivity of the breathable base material. Also, in this case, the metal foil may have a plurality of through-holes penetrating itself in the thickness direction. The through-holes allow hydrogen gas to pass through. Specifically, each through-hole of the metal foil is larger than each pore of the breathable base material. Thereby, the base material 210 can have both air permeability and thermal conductivity with respect to hydrogen gas.

[0131] <Hydrogen storage medium> <Concave-convex shape> The main surface of the hydrogen storage medium 200 may have a concave-convex shape. FIG. 10 is a cross-sectional view schematically showing an example of a part of the configuration of the wound hydrogen storage medium 200. In the example of FIG. 10, the hydrogen storage medium 200 includes a plurality of granular materials 230 for forming a concave-convex shape. In the example of FIG. 10, the plurality of granular materials 230 are included in the base material 210. As a specific example, the base material 210 includes a support material 213, a plurality of granular materials 230, and an adhesive layer 214.

[0132] The support material 213 includes, for example, at least one of a porous film, a non-woven fabric, and a metal foil. The support material 213 may have a laminated structure including at least two of a porous film, a non-woven fabric, and a metal foil. The plurality of particulate matters 230 are arranged, for example, on one main surface of the support material 213. The plurality of particulate matters 230 may be two-dimensionally dispersed. The plurality of particulate matters 230 may be arranged entirely on one main surface of the support material 213. When viewed in a state where the line of sight is along the thickness direction of the support material 213, the ratio occupied by the plurality of particulate matters 230 with respect to the main surface of the support material 213 may be 60% or less, may be 40% or less, or may be 20% or less.

[0133] In the example of FIG. 10, each particulate matter 230 has a spherical shape. The diameter of the particulate matter 230 may be, for example, 0.5 μm or more, may be 1 μm or more, may be 10 μm or more, or may be 100 μm or more. Each particulate matter 230 may be formed of, for example, at least one of resin, metal, and glass. When the particulate matter 230 is glass, the particulate matter 230 may also be called glass beads.

[0134] The adhesive layer 214 fixes the plurality of particulate matters 230 to the main surface of the support material 213. The adhesive layer 214 may be, for example, a naturally drying adhesive, a thermosetting adhesive, or a photocurable adhesive. As shown in FIG. 10, a part of the particulate matter 230 may be exposed from the adhesive layer 214. In this case, the adhesive layer 214 contacts the portion of the surface of the particulate matter 230 on the support material 213 side and the main surface of the support material 213.

[0135] In such a structure, the first major surface 211 of the base material 210 is formed by the surface of the adhesive layer 214 on the side opposite to the support material 213 and the surface of the plurality of granular materials 230 exposed from the adhesive layer 214. Therefore, the first major surface 211 of the base material 210 has an uneven shape. The height (for example, the maximum value or the average value) of the convex portions of the first major surface 211 may be greater than, for example, 0.5 μm, may be 1 μm or more, may be 10 μm or more, or may be 100 μm or more. The interval (for example, the average value) between the convex portions on the first major surface 211 may be, for example, 100 μm or more, may be 1 mm or more, or may be 10 mm or more. On the other hand, as shown in FIG. 10, the second major surface 212 of the base material 210 may be flat. In other words, the flatness of the second major surface 212 may be higher than the flatness of the first major surface 211.

[0136] The hydrogen storage film 220 is formed on the uneven first major surface 211 of the base material 210. Therefore, the major surface of the hydrogen storage film 220 also has an uneven shape depending on the unevenness of the first major surface 211. The height of the convex portions in the uneven shape of the major surface of the hydrogen storage film 220 may be greater than, for example, 0.5 μm, may be 1 μm or more, may be 10 μm or more, or may be 100 μm or more. Also, the interval (for example, the average value) between the convex portions may be, for example, 100 μm or more, may be 1 mm or more, or may be 10 mm or more.

[0137] In the example of FIG. 10, the hydrogen storage medium 200 is wound. In this wound state, a gap H1 is formed between the inner peripheral surface of the Nth (N is a natural number of 2 or more) turn portion of the hydrogen storage medium 200 and the outer peripheral surface of the (N - 1)th turn portion (that is, the second main surface 212). In the example of FIG. 10, since the concavo-convex surface of the hydrogen storage medium 200 is the inner peripheral surface, the tip portions of the convex portions of the inner peripheral surface of the Nth turn portion of the hydrogen storage medium 200 contact the outer peripheral surface of the (N - 1)th turn portion. Thereby, a gap H1 is formed between the convex portions. A plurality of gaps H1 between the Nth turn portion and the (N - 1)th turn portion of the hydrogen storage medium 200 communicate with each other as appropriate. In other words, the spaces on both sides of the hydrogen storage medium 200 on the winding axis Q1 are connected through the gap H1. Specifically, when viewed in a state where the line of sight is along the radial direction with respect to the winding axis Q1, the plurality of gaps H1 communicate with each other, and hydrogen gas can pass through the gap H1 between the Nth turn portion and the (N - 1)th turn portion on the winding axis Q1. The volume of the gap H1 increases as the height of the convex portion of the hydrogen storage medium 200 increases.

[0138] Note that in FIG. 10, although the concavo-convex surface of the hydrogen storage medium 200 is the inner peripheral surface, it may be the outer peripheral surface. Even in this case, a plurality of gaps H1 are formed between the Nth turn portion and the (N - 1)th turn portion of the hydrogen storage medium 200. In short, the outer peripheral side or the inner peripheral side surface of the wound hydrogen storage medium 200 has a concavo-convex shape for forming a gap between the Nth turn portion and the (N - 1)th turn portion of the hydrogen storage medium 200.

[0139] Since the gap H1 is formed in this way, as will be described below, the supply and extraction of hydrogen gas to and from the hydrogen storage membrane 220 can be performed more efficiently inside the container 310 of the hydrogen storage device 300. For example, the hydrogen gas released from the inner peripheral surface of the N-th circumferential portion of the hydrogen storage medium 200 can easily move toward the introduction / extraction portion 320 through the gap H1 between the N-th circumferential portion and the (N - 1)-th circumferential portion. That is, since the volume of the gap H1 is larger than the volume of the gap H1 when both main surfaces of the hydrogen storage medium 200 are flat, the hydrogen gas can easily move inside the gap H1. Therefore, hydrogen can be extracted from the hydrogen storage device 300 with even higher efficiency. Conversely, the hydrogen gas supplied into the container 310 from the introduction / extraction portion 320 can quickly act on the main surface of the hydrogen storage membrane 220 through the gap H1. For this reason, the hydrogen storage in the hydrogen storage device 300 can also be performed with even higher efficiency.

[0140] In the example of FIG. 10, a part of the granular material 230 is exposed from the adhesive layer 214 and is in contact with the hydrogen storage medium 200. However, it is not necessarily limited to this, and the granular material 230 may be covered by the adhesive layer 214.

[0141] <Fourth Embodiment> In the fourth embodiment, various examples of the hydrogen storage device 300 will be described. FIG. 11 is a diagram schematically showing a first example of the configuration of the hydrogen storage device 300 according to the fourth embodiment. In the example of FIG. 11, the hydrogen storage device 300 has the same configuration as the hydrogen storage device 300 according to the first embodiment, except for the presence or absence of the pressing portion 340. The hydrogen storage medium 200 can be manufactured by the manufacturing device 100 according to the first or second embodiment. Alternatively, the hydrogen storage medium 200 may be manufactured by a manufacturing device obtained by removing the hydrogen gas supply portion 2 from the manufacturing device 100.

[0142] The pressing portion 340 presses the hydrogen storage medium 200 in the container 310 in a pressing direction that intersects the winding axis Q1. More specifically, the pressing portion 340 switches between a state where the hydrogen storage medium 200 is pressed and a state where the hydrogen storage medium 200 is not pressed. In the example of FIG. 11, the pressing portion 340 includes a first U-shaped member 341, a second U-shaped member 342, and a pressing drive portion 343.

[0143] The first U-shaped member 341 has a U-shaped inner peripheral surface. In the example of FIG. 11, the inner peripheral surface of the first U-shaped member 341 has a semi-circular shape. The first U-shaped member 341 may have a plate-like and U-shaped configuration, and may extend uniformly in the axial direction along the winding axis Q1. The length of the first U-shaped member 341 in the axial direction may be at least one-half, at least three-fourths, at least four-fifths of the length of the hydrogen storage medium 200 in the axial direction, or may be longer than the hydrogen storage medium 200.

[0144] The second U-shaped member 342 has a U-shaped inner peripheral surface when viewed in a state where the line of sight is along the winding axis Q1. In the example of FIG. 11, the inner peripheral surface of the second U-shaped member 342 has a semi-circular shape. The second U-shaped member 342 is located on the opposite side of the first U-shaped member 341 with the winding axis Q1 interposed therebetween. The second U-shaped member 342 may have a plate-like and U-shaped configuration, and may extend uniformly in the axial direction. The length of the second U-shaped member 342 in the axial direction may be at least one-half, at least three-fourths, at least four-fifths of the length of the hydrogen storage medium 200 in the axial direction, or may be longer than the hydrogen storage medium 200. The diameter of the second U-shaped member 342 may be larger than the diameter of the first U-shaped member 341. The hydrogen storage medium 200 is sandwiched in the pressing direction between the first U-shaped member 341 and the second U-shaped member 342.

[0145] The pressing drive unit 343 moves at least one of the first U-shaped member 341 and the second U-shaped member 342 to change the distance between the first U-shaped member 341 and the second U-shaped member 342. In the example of FIG. 11, the pressing drive unit 343 moves the second U-shaped member 342. That is, the second U-shaped member 342 is movably attached to the container 310 by the pressing drive unit 343. It can be said that the second U-shaped member 342 is a movable member. The first U-shaped member 341 may be fixed to the container 310. It can be said that the first U-shaped member 341 is a fixed member. The pressing drive unit 343 has a drive source such as a motor. Here, the pressing drive unit 343 moves the second U-shaped member 342 in a direction orthogonal to the winding axis Q1.

[0146] When the pressing drive unit 343 moves the second U-shaped member 342 toward the first U-shaped member 341, the inner peripheral surfaces of the first U-shaped member 341 and the second U-shaped member 342 come into contact with the wound hydrogen storage medium 200 and press the hydrogen storage medium 200 in the pressing direction. By pressing the hydrogen storage medium 200, the efficiency of hydrogen release can be improved. Therefore, the pressing drive unit 343 presses the hydrogen storage medium 200 when extracting hydrogen gas from the hydrogen storage device 300. Conversely, when the pressing drive unit 343 moves the second U-shaped member 342 to the side opposite to the first U-shaped member 341, the pressing on the hydrogen storage medium 200 is released. Thereby, the pressing unit 34 does not interfere with the hydrogen storage in the hydrogen storage film 220. Therefore, the pressing drive unit 343 releases the pressing of the hydrogen storage medium 200 when storing hydrogen gas in the hydrogen storage device 300. The pressing drive unit 343 can be controlled by a control unit (not shown).

[0147] FIG. 12 is a cross-sectional view schematically showing a second example of the configuration of the hydrogen storage device 300 according to the fourth embodiment. In the example of FIG. 12, the hydrogen storage medium 200 is wound around a hollow core 240. FIG. 13 is a perspective view schematically showing an example of a part of the configuration of the core 240. The core 240 has a columnar outer peripheral surface 241 and an inner peripheral surface 242 centered on the winding axis Q1. The hydrogen storage medium 200 is wound around the outer peripheral surface 241 of the core 240. The inner diameter (diameter) of the core 240 is larger than, for example, the radial width (e.g., maximum value) of the gap between the N-th turn portion and the (N - 1)-th turn portion of the hydrogen storage medium 200.

[0148] The core 240 has air permeability. For example, the core 240 has a plurality of holes 243 extending from the outer peripheral surface 241 to the inner peripheral surface 242. That is, the core 240 has a plurality of holes 243 penetrating itself in the radial direction. The plurality of holes 243 may have, for example, a circular shape, and the diameter thereof may be set to about several millimeters, for example. The plurality of holes 243 may be distributed and arranged in the circumferential direction of the core 240 and in the axial direction along the winding axis Q1. That is, the plurality of holes 243 may be formed over the entire circumference of the core 240 and over the entire axial direction of the core 240.

[0149] Alternatively, the core 240 may be formed of a porous body. Even when the core 240 is a porous body, it can be said that a plurality of minute pores extending from the outer peripheral surface 241 to the inner peripheral surface 242 are formed in the core 240. As a specific example, the core 240 may be a foam. The minute pores in the foam can be said to be minute through-holes penetrating the core 240 in the radial direction.

[0150] As described above, the hydrogen storage medium 200 is wound around a hollow core 240 having air permeability. Therefore, for example, when the first turn portion of the hydrogen storage film 220 releases hydrogen gas, the hydrogen gas passes through the plurality of holes 243 of the core 240 in the radial direction and passes through the hollow portion of the core 240 along the axial direction. Thus, the hydrogen gas released from the hydrogen storage medium 200 can be efficiently moved to the inlet / outlet portion 320. Therefore, the extraction of hydrogen gas from the hydrogen storage device 300 can be performed more efficiently. Conversely, the hydrogen gas introduced into the container 310 from the inlet / outlet portion 320 moves through the hollow portion of the core 240 and passes through the plurality of holes 243 of the core 240 in the radial direction, and is supplied to at least the first turn portion of the hydrogen storage medium 200. Therefore, the hydrogen storage in the hydrogen storage device 300 can be performed more efficiently.

[0151] As described above, the manufacturing apparatus 100 of the hydrogen storage medium 200, the manufacturing method of the hydrogen storage medium 200, and the hydrogen storage device 300 have been described in detail. However, the above descriptions are illustrative in all aspects, and this disclosure is not limited thereto. Also, the various modifications described above can be applied in combination as long as they do not conflict with each other. And a number of modifications not illustrated can be assumed without departing from the scope of this disclosure.

Explanation of Reference Numerals

[0152] 1 Chamber 11 Film Formation Chamber 12 Hydrogen Chamber 13 Passage 2 Hydrogen Gas Supply Unit 200 Hydrogen Storage Medium 210 Base Material 220 Hydrogen Storage Film 240 Core 243 Hole 25 Plasma Generator 3 Film Formation Unit 300 Hydrogen Storage Device 310 Container 340 Pressing Unit 41 Unwinding Roller 42 Winding Roller 5 Cathode 51 Target 55 Sputtering power supply 6 Sputtering gas supply unit 7 Pressure reducing unit 8 Cooling unit S1 Pressure reducing process (step) S2 Film forming process (step) S3 Hydrogen supply process (step)

Claims

1. a pressure reducing step of discharging the gas in the chamber to reduce the pressure in the chamber; a film forming step of forming a hydrogen storage film on a substrate by dry processing in the chamber in a pressure reduced state where the chamber is under reduced pressure; a hydrogen supply step of supplying hydrogen gas into the chamber in the pressure reduced state A method for manufacturing a hydrogen storage medium, comprising:

2. A method for manufacturing a hydrogen storage medium according to Claim 1, wherein the hydrogen supply step is executed in parallel with the film forming step, and the hydrogen gas is supplied to the hydrogen storage film being formed in the film forming step in the hydrogen supply step. A method for manufacturing a hydrogen storage medium.

3. A method for manufacturing a hydrogen storage medium according to Claim 1, wherein the hydrogen supply step is executed after the film forming step, and the hydrogen gas is supplied to the hydrogen storage film after film formation in the hydrogen supply step. A method for manufacturing a hydrogen storage medium.

4. A method for manufacturing a hydrogen storage medium according to any one of Claims 1 to 3, wherein in the hydrogen supply step, active species of hydrogen generated by plasmaizing the hydrogen gas are supplied to the hydrogen storage film. A method for manufacturing a hydrogen storage medium.

5. A method for manufacturing a hydrogen storage medium according to Claim 1 or Claim 2, wherein in the film forming step, the hydrogen storage film is formed on the substrate by sputtering, the hydrogen supply step is executed in parallel with the film forming step, and the hydrogen gas is supplied between the target and the substrate in sputtering to plasmaize the hydrogen gas. A method for manufacturing a hydrogen storage medium.

6. A method for manufacturing a hydrogen storage medium according to any one of Claims 1 to 3, wherein the substrate is cooled in at least one of the hydrogen supply step and the film forming step. A method for manufacturing a hydrogen storage medium.

7. A method for manufacturing a hydrogen storage medium according to any one of Claims 1 to 3, wherein in the film forming step, while winding up the film-shaped substrate unwound from an unwinding roller by a winding roller, the hydrogen storage film is formed on the substrate between the unwinding roller and the winding roller. A method for manufacturing a hydrogen storage medium.

8. A method for manufacturing a hydrogen storage medium according to Claim 7, wherein in the film forming step, the hydrogen storage film is formed on the substrate having a main surface with irregularities. A method for manufacturing a hydrogen storage medium.

9. a chamber; a pressure reducing unit for discharging the gas in the chamber; A film forming section for forming a hydrogen storage film on a substrate in the chamber by a dry process, A hydrogen gas supply section for supplying hydrogen gas into the chamber A manufacturing apparatus for a hydrogen storage medium, comprising the above.

10. A manufacturing apparatus for a hydrogen storage medium according to claim 9, wherein the hydrogen gas supply section supplies the hydrogen gas to the hydrogen storage film during film formation by the film forming section.

11. A manufacturing apparatus for a hydrogen storage medium according to claim 9, wherein the hydrogen gas supply section supplies the hydrogen gas to the hydrogen storage film after film formation.

12. A manufacturing apparatus for a hydrogen storage medium according to any one of claims 9 to 11, further comprising a plasma generator for generating active species of hydrogen by plasmaizing the hydrogen gas and causing the active species to act on the hydrogen storage film.

13. A manufacturing apparatus for a hydrogen storage medium according to claim 9 or claim 10, wherein the film forming section includes a cathode including a target provided at a position facing the substrate in the chamber, a sputtering power supply for applying a sputtering voltage to the cathode, and a sputtering gas supply section for supplying a sputtering gas between the target and the substrate, and the hydrogen gas supply section supplies the hydrogen gas between the target and the substrate.

14. A manufacturing apparatus for a hydrogen storage medium according to any one of claims 9 to 11, further comprising a cooling section for cooling the substrate.

15. A manufacturing apparatus for a hydrogen storage medium according to any one of claims 9 to 11, further comprising an unwinding roller around which the substrate is wound, and a winding roller for winding up the substrate unwound from the unwinding roller, and the film forming section forms the hydrogen storage film on the substrate between the unwinding roller and the winding roller.

16. A manufacturing apparatus for a hydrogen storage medium according to claim 15, wherein the chamber includes a film forming chamber, a hydrogen chamber, and a passage connecting the film forming chamber and the hydrogen chamber, and the film forming section forms the hydrogen storage film on the substrate in the film forming chamber under a reduced pressure state. The take-up roller is provided in the hydrogen chamber, and takes up the substrate on which the hydrogen storage film has been formed, which has been introduced from the film-forming chamber through the passage. The hydrogen gas supply unit is a manufacturing apparatus for a hydrogen storage medium that supplies the hydrogen gas into the hydrogen chamber in a reduced-pressure state.

17. A container having an inlet / outlet for hydrogen gas, A hydrogen storage medium including a film-like substrate and a hydrogen storage film formed on the substrate, and stored in the container in a wound state wound around a winding axis passing through the inlet / outlet A hydrogen storage device comprising:

18. The hydrogen storage device according to claim 17, wherein the substrate includes at least one of a porous film and a non-woven fabric.

19. The hydrogen storage device according to claim 17 or claim 18, wherein the outer peripheral side or the inner peripheral side surface of the wound hydrogen storage medium has an uneven shape for forming a gap between the Nth (N is an integer of 2 or more) turn portion and the (N - 1)th turn portion of the hydrogen storage medium.

20. The hydrogen storage device according to claim 17 or claim 18, further comprising a hollow winding core around which the hydrogen storage medium is wound, wherein the winding core has a plurality of holes penetrating the winding core in the radial direction with respect to the winding axis.

21. The hydrogen storage device according to claim 17 or claim 18, further comprising a pressing portion that presses the hydrogen storage medium in a pressing direction intersecting the winding axis.

Images