Piping washing equipment

The pipe cleaning device addresses unstable pig movement by using an outlet-side pump to manage pressure loss and flow direction, ensuring stable operation and preventing acceleration during cleaning.

JP2025108164APending Publication Date: 2025-07-23TOYOTA JIDOSHA KK +1
View PDF 1 Cites 0 Cited by

Patent Information

Application Number
JP2024001895
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-01-10
Publication Date
2025-07-23

AI Technical Summary

Technical Problem

Existing pipe cleaning devices experience a decrease in outlet-side pressure loss as the pig advances, leading to unstable pig movement due to rapid speed increases.

Method used

A pipe cleaning device equipped with a pump on the outlet side to adjust fluid pressure, allowing for stable pig movement by suppressing pressure loss and controlling fluid flow direction.

Benefits of technology

The device effectively stabilizes pig movement by managing pressure loss and flow direction, preventing acceleration and runaway, ensuring stable operation during cleaning processes.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure 2025108164000001_ABST
    Figure 2025108164000001_ABST
Patent Text Reader

Abstract

To provide piping washing equipment capable of stably moving a pig by suppressing a reduction in discharge-side pressure loss associated with the movement of the pig.SOLUTION: Piping washing equipment 100 comprises: a pig gas compressor 111 for pressure-feeding a pig when in-pipe washing is performed; a pig launcher 110 for inserting the pig into a liquid within piping when the in-pipe washing is performed; and a pump 105 which is provided on the discharge side of the piping and which can control a discharge rate and pressure.SELECTED DRAWING: Figure 1
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The present invention relates to a pipe cleaning device.

Background Art

[0002] Patent Document 1 describes a cleaning device that cleans inside a pipe using a cleaning pig pumped by a cleaning liquid.

Prior Art Document

Patent Document

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] However, in the cleaning device of Patent Document 1, as the pig advances, the product liquid (electrode slurry) inside the pipe is discharged, resulting in a decrease in the outlet-side pressure loss and a possible rapid increase in the pig speed, making it impossible to stably move the pig.

Means for Solving the Problems

[0005] A pipe cleaning device according to an embodiment is provided with a pump on the outlet side of the pipe and adjusts the pressure of the fluid located on the outlet side of the pig.

Effects of the Invention

[0006] According to the pipe cleaning device of the present disclosure, it is possible to suppress a decrease in the outlet-side pressure loss accompanying the movement of the pig and stably move the pig.

Brief Description of the Drawings

[0007]

Figure 1

Figure 2

Figure 3

Figure 4

Embodiments for Carrying Out the Invention

[0008] Embodiment 1

[0009] Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a cross-sectional view showing a schematic configuration of a pipe cleaning device according to Embodiment 1. In FIG. 1, the pipe cleaning device 100 includes a post-defoaming buffer tank 101, a valve 102, a waste liquid tank 103, a valve 104, a mono pump 105, a pressure gauge 106, a pig catcher 107, a pig position sensor 108, a pipe 109, a pig launcher 110, a pig feeder 111, a pressure gauge 112, a coating tank 113, a valve 114, and a valve 115.

[0010] The post-defoaming buffer tank 101 is a tank for storing the vacuum-defoamed liquid. Specifically, the post-defoaming buffer tank 101 stores the liquid in the kneading process. Further, the post-defoaming buffer tank 101 is provided with a liquid level sensor (not shown). The liquid level sensor is a sensor for measuring the height of the liquid level in the post-defoaming buffer tank.

[0011] The valve 102 is a valve attached to the pipe connecting the post-defoaming buffer tank 101 and the mono pump 105. And the valve 102 can stop the flow of the liquid between the post-defoaming buffer tank 101 and the mono pump 105.

[0012] The waste liquid tank 103 is a tank for storing waste liquid.

[0013] The valve 104 is a valve attached to the pipe connecting the waste liquid tank 103 and the mono pump 105. And the valve 104 can stop the flow of the liquid between the waste liquid tank 103 and the mono pump 105.

[0014] The mono pump 105 is a pump that sends the liquid in the buffer tank 101 after defoaming to the coating tank 113 via the pipe 109. Also, the mono pump 105 sends the liquid sent through the pipe 109 to the waste liquid tank 103.

[0015] The pressure gauge 106 measures the pressure when the mono pump 105 sends liquid to the coating tank 113 via the pipe 109. Also, the pressure gauge 106 measures the pressure when the mono pump 105 sends liquid from the pipe 109 to the buffer tank 101 and the waste liquid tank 103 after defoaming.

[0016] The pig catcher 107 recovers the pig from inside the pipe 109. The pig position sensor 108 is a sensor that measures whether the pig is at a predetermined position inside the pipe 109. The pipe 109 is a pipe that connects the buffer tank 101 after defoaming and the coating tank 113.

[0017] The pig launcher 110 sends a pig into the pipe 109. The pig pump 111 is a pump that sends air (i.e., the pig) with variable pressure and a fixed quantity.

[0018] The pressure gauge 112 measures the pressure when the pig pump 111 sends liquid to the buffer tank 101 and the waste liquid tank 103 via the pipe 109.

[0019] The coating tank 113 is a tank that stores liquid. Specifically, the coating tank 113 stores the liquid for the coating process. Also, the coating tank 113 is equipped with a liquid level sensor (not shown). The liquid level sensor is a sensor that measures the height of the liquid level of the liquid stored in the coating tank 113.

[0020] The valve 114 is a valve attached to the pipe connecting the coating tank 113 and the pig launcher 110. And the valve 102 can stop the flow of liquid between the coating tank 113 and the pig launcher 110.

[0021] Valve 115 is a valve attached to the pipe connecting the pig pump 111 and the pig launcher 110. And valve 102 can stop the flow of liquid between the pig pump 111 and the pig launcher 110.

[0022] Next, the operation of the pipe cleaning device 100 will be described. FIG. 2 is a cross-sectional view showing the operation of the pipe cleaning device according to the first embodiment.

[0023] As shown in the upper diagram of FIG. 2, in normal operation, the mono pump 105 sends out liquid from the defoamed buffer tank 101 to the coating tank 113 (that is, in the forward direction: the direction of the arrow in the liquid delivery path).

[0024] And as shown in the lower diagram of FIG. 2, during cleaning, the pig pump 111 and the mono pump 105 send out liquid from the coating tank 113 to the defoamed buffer tank 101 (that is, in the reverse direction: the direction of the arrow in the cleaning path).

[0025] Next, the results of experiments on the pressure during liquid delivery in normal operation are shown. Table 1 is a table showing the pump conditions in liquid delivery and the pressure in the pipe. Also, FIG. 3 is a graph showing the relationship between the volume flow rate and the pipe pressure loss. The pipe pressure loss means the difference in pressure at the position shown in the upper diagram of FIG. 4. Note that FIG. 4 is a diagram for explaining the pressure difference in the pipe.

Table 1

[0026] As shown in Table 1, the pipe pressure loss during liquid delivery is below the pressure resistance of the pipe, and the target flow rate range can be satisfied.

[0027] Next, the results of experiments on the pressure during liquid delivery in cleaning are shown. Table 2 is a table showing the pump conditions in liquid delivery and the pressure in the pipe. The pipe pressure loss and the pig pressure loss are as shown in the lower diagram of FIG. 4.

Table 2

[0028] As shown in Table 2, the cleaning operation can be enabled when the pumping pressure P is higher than the pig pressure loss from which the pumping pressure is estimated.

[0029] Specifically, the pig pumping pressure P kPa > ΔP1 (pressure loss of the liquid) + ΔP2 (pressure loss of the pig) ※ Here, in order to configure the device in a general non-pressure vessel (<1 MPa or less), by reducing the pressure loss ΔP2 of the pig or reducing the flow rate during pig cleaning to reduce the hydraulic pressure loss ΔP1, the pig can be advanced at a small discharge pressure of 1 MPa or less even in long-distance piping.

[0030] Thus, according to the pipeline cleaning device of Embodiment 1, by adjusting the pressure of the fluid located on the outlet side of the pig, a decrease in the outlet side pressure loss accompanying the movement of the pig can be suppressed, and the pig can be stably moved.

[0031] Further, according to the pipeline cleaning device of Embodiment 1, by feeding the liquid in the reverse direction during cleaning and normal operation, the generation of bubbles in the slurry and the acceleration and runaway of the pig can be suppressed. Specifically, since it is necessary to discharge at a positive pressure for liquid feeding, a pump is installed on the kneading process side which is the previous process (the differential pressure can only be generated up to -100 kPa absolute vacuum for sucking the liquid at a negative pressure). Then, by using that pump as a mono pump and utilizing its characteristics, "constant flow rate control" can be performed at the pump section on the outlet side when pushing out the pig with air, and the liquid can be stably recovered (without generating bubbles in the slurry or causing the pig to accelerate and run away).

[0032] Further, according to the pipeline cleaning device of Embodiment 1, by performing pressure control on the outlet side of the pipeline, the force applied to the pig can be increased without limit, and the runaway of the pig can be suppressed.

[0033] Note that the present disclosure is not limited to the above-described embodiments and can be appropriately modified without departing from the spirit thereof. For example, the pipe cleaning device of the present disclosure may be applied when cleaning a pipe in a case where the kneading process and the coating process are separated by a distance. In this kneading process, the active material of the main material is kneaded into a liquid slurry, and then the slurry is applied to the foil in the coating process.

Description of Reference Numerals

[0034] 100 Pipe cleaning device 101 Buffer tank after defoaming 102, 104, 114, 115 Valves 103 Waste liquid tank 105 Mono pump 106 Pressure gauge 107 Pig catcher 108 Pig position sensor 109 Pipe 110 Pig launcher 111 Pig feeder 112 Pressure gauge 113 Coating tank

Claims

1. When performing in-pipe cleaning, a pig pusher for pushing a pig, When performing in-pipe cleaning, a pig launcher for inserting a pig into the liquid in the pipe, A pipe cleaning device provided on the outlet side of the pipe and equipped with a pump capable of controlling the discharge amount and pressure.

2. The pipe cleaning device according to claim 1, wherein the pump is operated in a direction opposite to that during normal liquid feeding when performing in-pipe cleaning.

Citation Information

Patent Citations

  • Pipeline washing equipment and pipeline washing method

    JP2018061951A