Solid body, optical member, method for manufacturing solid body, surface forming method, glasses, touch panel, smartphone, and tablet terminal

Abstract

To provide a solid body and a laminate excellent in both scratch resistance and soil resistance for a long period, a method for manufacturing these objects, a material for surface formation, a surface forming method, an optical member, glasses, a touch panel, a smartphone, and a tablet terminal.SOLUTION: A solid body has a layer containing silicon oxide, and a polymer brush on the layer containing silicon oxide. The polymer brush forms a surface of the solid body. The polymer brush has a portion having an alkyl group having 14 or more and 65 or less carbon atoms. The alkyl group is directly coupled to the silicon oxide with only oxygen atoms or only oxyalkylene groups therebetween.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present disclosure relates to a solid object excellent in scratch resistance and long-term antifouling properties, a method for producing the same, an optical member having the solid object, and glasses, a touch panel, a smartphone, and a tablet terminal having the optical member. The present disclosure relates to a laminate excellent in scratch resistance and long-term antifouling properties, a method for producing the same, an optical member having the laminate, and glasses, a touch panel, a smartphone, and a tablet terminal having the optical member. Further, the present disclosure relates to a surface-forming material and a surface-forming method for forming a surface excellent in scratch resistance and long-term antifouling properties.

Background Art

[0002] Optical members such as optical filters and spectacle lenses, and articles such as touch panels and smartphones are formed with an antifouling film on the outermost layer in order to facilitate prevention of adhesion and removal of dirt such as fingerprints, sebum, sweat, and cosmetics. The antifouling film is required to be excellent in antifouling properties (water repellency, oil repellency) and scratch resistance, and organic fluorine compounds (PFAS) represented by perfluorooctanoic acid (PFOA) and perfluorosulfonic acid (PFOS) are often used. However, since PFAS is a substance that may affect the environment and ecosystem, studies for regulation are underway in various countries, and there is a possibility that it will not be available for use in antifouling films in the future. Therefore, an antifouling film not containing PFAS is required.

[0003] As an antifouling film not containing PFAS, an antifouling coating agent containing a quaternary ammonium chloride of an amino-modified silicone compound and an aliphatic amine alkylene oxide adduct is disclosed (Patent Document 1). Patent Document 1 discloses that a hard surface obtained by using the antifouling coating agent has excellent properties in terms of antifouling properties.

[0004] On the other hand, it is generally known that a surface with excellent durability can be obtained if a string-like polymer is grown on the material surface to form a molecular structure (polymer brush) like a toothbrush. A polymer brush can be formed by applying a base layer having a function of a polymerization initiator on the material surface and forming it on the base layer by a polymerization reaction. Patent Document 2 discloses a substrate for forming a polymer brush provided with a polymerization initiation layer and a precursor solution for manufacturing the substrate for forming a polymer brush.

Prior Art Documents

Patent Documents

[0005]

Patent Document 1

Patent Document 2

Summary of the Invention

Problems to be Solved by the Invention

[0006] As a result of investigations by the present inventors, the silicone-based antifouling film disclosed in Patent Document 1 had excellent characteristics in terms of antifouling properties. However, it had low scratch resistance, was scratched when repeatedly wiping off dirt, and had a problem that the antifouling property decreased when used over a long period of time. Further, Patent Document 2 discloses a substrate for forming a polymer brush provided with a polymerization initiation layer and a precursor solution for manufacturing the substrate for forming a polymer brush. However, the present inventors considered that in Patent Document 2, since a polymerization reaction is used, it is difficult to control the molecular weight of the formed polymer brush, etc., and there is a problem that it is difficult to control the structure of the polymer brush. In addition, Patent Document 2 does not mention the scratch resistance and long-term antifouling property of the formed polymer brush. The solutions described in Patent Document 1 and Patent Document 2 are not sufficient in terms of achieving both scratch resistance and long-term antifouling property in an antifouling film, and a surface excellent in both scratch resistance and long-term antifouling property is desired.

[0007] The present disclosure provides a solid object excellent in both scratch resistance and long-term antifouling properties, a method for producing the same, an optical member, glasses, a touch panel, a smartphone, and a tablet terminal. The present disclosure provides a laminate excellent in both scratch resistance and long-term antifouling properties, a method for producing the same, an optical member, and glasses, a touch panel, a smartphone, and a tablet terminal. Further, a surface forming material and a surface forming method for forming a surface excellent in scratch resistance and long-term antifouling properties are provided.

Means for Solving the Problems

[0008] The solid object of the present disclosure is a solid object having a layer containing silicon oxide and a polymer brush on the layer containing silicon oxide, wherein the polymer brush constitutes the surface of the solid object, the polymer brush has a site having an alkyl group having 14 to 65 carbon atoms, and the site having the alkyl group is bonded to the silicon oxide via an oxygen atom. Also, the optical member of the present disclosure is an optical member having the above solid object. Furthermore, the glasses of the present disclosure are glasses having the above optical member. In addition, the touch panel of the present disclosure is a touch panel having the above optical member. Furthermore, the smartphone of the present disclosure is a smartphone having the above optical member. Also, the tablet terminal of the present disclosure is a tablet terminal having the above optical member.

[0009] Also, the method for producing a solid object of the present disclosure includes a first vapor deposition step of vapor-depositing a first vapor deposition material containing silicon oxide to form the layer containing silicon oxide, and a second vapor deposition step of vapor-depositing a second vapor deposition material containing a first compound having a site having an alkyl group having 14 to 65 carbon atoms and a hydroxyl group to form the polymer brush, in this order.

[0010] The laminate of the present disclosure is a laminate having a first layer and a polymer brush layer on the first layer, wherein the first layer contains silicon oxide, the polymer brush layer constitutes the surface of the laminate, the polymer brush contained in the polymer brush layer has a site having an alkyl group with 14 to 65 carbon atoms, and the site having the alkyl group is bonded to the silicon oxide via an oxygen atom. Further, the optical member of the present disclosure is an optical member having the above laminate. Furthermore, the glasses of the present disclosure are glasses having the above optical member. In addition, the touch panel of the present disclosure is a touch panel having the above optical member. Furthermore, the smartphone of the present disclosure is a smartphone having the above optical member. Also, the tablet terminal of the present disclosure is a tablet terminal having the above optical member.

[0011] Also, the method for manufacturing the laminate of the present disclosure includes a first vapor deposition step of forming the first layer by vacuum vapor deposition of a first vapor deposition material containing silicon oxide, and a second vapor deposition step of forming the polymer brush layer by vacuum vapor deposition of a second vapor deposition material containing a first compound having a site having an alkyl group with 14 to 65 carbon atoms and a hydroxyl group, in this order.

[0012] Furthermore, the surface forming material of the present disclosure is a surface forming material containing a first compound having a site having an alkyl group with 14 to 65 carbon atoms and a hydroxyl group. In addition, the surface forming method of the present disclosure is a surface forming method using a vacuum vapor deposition method, a first vapor deposition step of forming a layer containing silicon oxide by vacuum vapor deposition of a first vapor deposition material containing silicon oxide, and A surface formation method including, in this order, a second vapor deposition step of vapor depositing a second vapor deposition material including a first compound having a site having an alkyl group with 14 or more and 65 or less carbon atoms and a hydroxyl group.

Advantages of the Invention

[0013] According to the present disclosure, it is possible to provide a solid object having a surface excellent in both scratch resistance and long-term antifouling property, a method for manufacturing the same, a laminate and a method for manufacturing the same, an optical member, glasses, a touch panel, a smartphone, and a tablet terminal. Further, the present disclosure can provide a surface forming material and a surface forming method for forming a surface excellent in both scratch resistance and long-term antifouling property.

Brief Description of the Drawings

[0014]

Figure 1

Embodiments for Carrying Out the Invention

[0015] Hereinafter, embodiments of the solid object and its manufacturing method, laminate and its manufacturing method, optical member, glasses, smartphone, tablet terminal, and surface forming material and surface forming method according to the present disclosure will be described with reference to preferred embodiments. Further, the present disclosure is not limited to the following embodiments. In the present disclosure, the description of "XX or more and YY or less" or "XX to YY" representing a numerical range means a numerical range including the lower limit and the upper limit which are the endpoints, unless otherwise specified. Further, when the numerical ranges are described stepwise, the upper limit and the lower limit of each numerical range can be arbitrarily combined. In the present disclosure, a polymer brush refers to a structure in which a string-like polymer is immobilized on the surface of a substrate, for example, a molecular structure in which a string-like polymer is arranged on the surface of the substrate like a brush. In the present disclosure, a site having an alkyl group and a site having a dimethyl silicone chain correspond to the string-like polymer.

[0016] In the method for producing a substrate for forming a polymer brush described in Patent Document 2, a monomer is applied to the substrate or the substrate is immersed in the monomer, and a polymer brush is formed by performing a polymerization reaction. When a polymer brush is formed by such a polymerization reaction, it is considered difficult to control the structure of the polymer brush because it is difficult to control the molecular weight of the polymer brush. Therefore, it is presumed that the antifouling film described in Patent Document 2 does not necessarily have sufficient scratch resistance and long-term antifouling properties.

[0017] According to the present disclosure, it is considered that the polymer brush has a site having an alkyl group with a specific number of carbon atoms, thereby forming a high-density and uniform brush-like molecular structure and becoming a solid having a surface excellent in scratch resistance and long-term antifouling properties. Further, according to the production method of the present disclosure, by vacuum-depositing a vapor deposition material containing a first compound having a site having an alkyl group with a specific number of carbon atoms and a hydroxyl group to form a polymer brush, the molecular length control of the polymer brush becomes easy, and a high-density and uniform brush-like molecular structure is easily formed. It is considered that a solid having a surface excellent in scratch resistance and long-term antifouling properties can be produced.

[0018] According to the present disclosure, it is considered that the polymer brush contained in the polymer brush layer has a site having an alkyl group with a specific number of carbon atoms, thereby forming a high-density and uniform brush-like molecular structure and becoming a laminate excellent in scratch resistance and long-term antifouling properties. Further, according to the production method of the present disclosure, by vacuum-depositing a vapor deposition material containing a first compound having a site having an alkyl group with a specific number of carbon atoms and a hydroxyl group to form a polymer brush layer, the molecular length control of the polymer brush becomes easy, and a high-density and uniform brush-like molecular structure is easily formed.

[0019] <Solid> A solid having the surface according to the present disclosure will be described. The solid has a layer containing silicon oxide and a polymer brush on the layer containing silicon oxide. Further, the polymer brush constitutes the surface of the solid. Furthermore, the polymer brush has a site having an alkyl group with 14 or more and 65 or less carbon atoms. Still further, the site having an alkyl group with 14 or more and 65 or less carbon atoms is bonded to the silicon oxide via an oxygen atom.

[0020] The polymer brush has a site having an alkyl group with 14 or more and 65 or less carbon atoms. The number of carbon atoms of the alkyl group is preferably 16 or more and 60 or less, more preferably 18 or more and 60 or less, and still more preferably 18 or more and 40 or less. The alkyl group may be linear or branched, but is preferably a linear alkyl group. Further, the site having the alkyl group preferably has a linear aliphatic structure, and more preferably is a linear alkyl group. With such a structure, a high-density and uniform brush-like molecular structure is formed, and the solid has a surface excellent in scratch resistance and long-term antifouling property.

[0021] The site having an alkyl group is a site having a structure represented by the general formula: [C n H 2n+1 -. In the formula, n represents the number of carbon atoms of the alkyl group, and the preferred range of n is 14 or more and 65 or less, the more preferred range is 16 or more and 60 or less, the still more preferred range is 18 or more and 60 or less, and the particularly preferred range is 18 or more and 40 or less. When the number of carbon atoms of the alkyl group is within the above range, a high-density and uniform brush-like molecular structure is formed, and the solid has a surface excellent in scratch resistance and long-term antifouling property. When the number of carbon atoms is less than 14, it becomes difficult to form a high-density and uniform brush-like molecular structure, so the scratch resistance and antifouling property decrease. When the number of carbon atoms exceeds 65, it becomes difficult to form a high-density and uniform brush-like molecular structure, so the scratch resistance and antifouling property decrease. The number of carbon atoms of the alkyl group can be adjusted by changing the type of the first compound having a site having an alkyl group and a hydroxyl group.

[0022] The moiety having an alkyl group may further have an oxyalkylene group such as an oxyethylene group -(CH2)2-O- or an oxypropylene group -(CH(CH3)CH2)-O-, and preferably has an oxyethylene group. The moiety having an alkyl group and an oxyethylene group has a structure represented by the general formula: [C n’ H 2n’+1 -O-[(CH2)2O] m -. In the formula, n' represents the number of carbon atoms in the alkyl group, and m represents the degree of polymerization of the oxyethylene group. The preferable range of n'+2m, which represents the total number of carbon atoms of the alkyl group and the carbon atoms of the oxyethylene group in the moiety having an alkyl group and an oxyethylene group, is 14 or more and 65 or less, a more preferable range is 16 or more and 60 or less, a further preferable range is 18 or more and 60 or less, and a particularly preferable range is 18 or more and 40 or less. Also, the alkyl group may be linear or branched, but is preferably a linear alkyl group. Further, the moiety having the alkyl group and the oxyethylene group is preferably a linear alkyl group having an oxyethylene group.

[0023] When the total number of carbon atoms of the alkyl group and the carbon atoms of the oxyethylene group is within the above range, a high-density and uniform brush-like molecular structure is formed, and it is likely to become a solid having a surface excellent in scratch resistance and long-term antifouling property. If the number of carbon atoms is less than 14, it becomes difficult to form a high-density and uniform brush-like molecular structure, and the scratch resistance and antifouling property are likely to decrease. Also, if the number of carbon atoms exceeds 65, it becomes difficult to form a high-density and uniform brush-like molecular structure, so the scratch resistance and antifouling property are likely to decrease.

[0024] The degree of polymerization of the oxyethylene group is not particularly limited and may be 1 to 20, may be 1 to 15, or may be 1 to 10.

[0025] The number of carbon atoms in the alkyl group, the total number of carbon atoms in the oxyalkylene group, and the degree of polymerization of the oxyalkylene group can be adjusted by changing the type of the first compound having a site with an alkyl group and an oxyalkylene group and a hydroxyl group.

[0026] In the layer containing silicon oxide, the silicon oxide refers to a compound represented by SiO x (where x is, for example, 1 to 2), SiO2 in a composite inorganic oxide such as SiO2·Al2O3, etc. Here, the layer containing silicon oxide is bonded via an oxygen atom to the site having an alkyl group forming the polymer brush. That is, the site having an alkyl group is bonded to silicon oxide via an oxygen atom. Thereby, the durability of the polymer brush can be improved, and the scratch resistance of the solid matter can be improved. Here, the mode of bonding is a covalent bond. Also, the mode of bonding via an oxygen atom may be a mode in which the site having an alkyl group forming the polymer brush and the layer containing silicon oxide are directly bonded, or may be a mode in which they are indirectly bonded via another linking group. Also, by having a layer containing silicon oxide, active sites can be formed on the silicon oxide contained in the layer. As a result, the site having an alkyl group in the polymer brush becomes more likely to be bonded to silicon oxide via an oxygen atom. That is, it becomes easier to form the polymer brush on the surface of the solid matter. Examples of methods for forming such active sites include a method of forming a layer containing silicon oxide by the first vapor deposition process described later, and a method of modifying the surface by irradiating the substrate with ultraviolet rays, plasma, or ion beams. Examples of compounds that can be contained in the layer containing silicon oxide include SiO2 (silicon dioxide), SiO2 with Al2O3 added (silicon dioxide with alumina added), etc. However, the compounds containing silicon oxide are not limited to these. Also, the layer containing silicon oxide may contain inorganic oxides such as ITO (indium tin oxide), TiO2 (titanium dioxide), etc. The inorganic oxide may be a composite oxide.

[0027] <Laminate> A laminate according to the present disclosure will be described. The laminate has a first layer and a polymer brush layer on the first layer. Further, the first layer contains silicon oxide. Furthermore, the polymer brush layer constitutes the surface of the laminate. In addition, the polymer brush contained in the polymer brush layer has a site having an alkyl group with 14 or more and 65 or less carbon atoms. Furthermore, the site having an alkyl group with 14 or more and 65 or less carbon atoms is bonded to the silicon oxide via an oxygen atom.

[0028] The polymer brush contained in the polymer brush layer has a site having an alkyl group with 14 or more and 65 or less carbon atoms. Also, the carbon number of the alkyl group is preferably 16 or more and 60 or less, more preferably 18 or more and 60 or less, and even more preferably 18 or more and 40 or less. Further, the alkyl group may be linear or branched, but a linear alkyl group is preferred. Furthermore, the site having the alkyl group preferably has a linear aliphatic structure, and more preferably is a linear alkyl group. With such a structure, a high-density and uniform brush-like molecular structure is formed, resulting in a laminate excellent in scratch resistance and long-term antifouling properties. The site having an alkyl group preferably has a structure represented by the general formula: [C

[0029] H n - where n represents the carbon number of the alkyl group, and the preferred range of n is 14 or more and 65 or less, more preferably 16 or more and 60 or less, even more preferably 18 or more and 60 or less, and particularly preferably 18 or more and 40 or less. 2n+1 When the carbon number of the alkyl group is within the above range, a high-density and uniform brush-like molecular structure is formed, resulting in a laminate excellent in scratch resistance and long-term antifouling properties. When the carbon number is less than 14, it becomes difficult to form a high-density and uniform brush-like molecular structure, so the scratch resistance and antifouling properties decrease. Also, when the carbon number exceeds 65, it becomes difficult to form a high-density and uniform brush-like molecular structure, so the scratch resistance and antifouling properties decrease. ​The number of carbon atoms in the alkyl group can be adjusted by changing the type of the first compound having a site with an alkyl group and a hydroxyl group.

[0030] The site having an alkyl group may further have an oxyalkylene group such as an oxyethylene group -(CH2)2-O- or an oxypropylene group -(CH(CH3)CH2)-O-, and preferably has an oxyethylene group. The site having an alkyl group and an oxyethylene group has a structure represented by the general formula: [C n’ H 2n’+1 -O-[(CH2)2O] m -. In the formula, n' represents the number of carbon atoms in the alkyl group, and m represents the degree of polymerization of the oxyethylene group. The preferable range of n'+2m, which represents the total number of carbon atoms in the alkyl group and the carbon atoms in the oxyethylene group in the site having an alkyl group and an oxyethylene group, is 14 or more and 65 or less, a more preferable range is 16 or more and 60 or less, a further preferable range is 18 or more and 60 or less, and a particularly preferable range is 18 or more and 40 or less. Also, the alkyl group may be linear or branched, but is preferably a linear alkyl group. Furthermore, the site having the alkyl group and the oxyethylene group is preferably a linear alkyl group having an oxyethylene group.

[0031] When the total number of carbon atoms in the alkyl group and the carbon atoms in the oxyethylene group is within the above range, a high-density and uniform brush-like molecular structure is formed, resulting in a laminate excellent in scratch resistance and long-term antifouling property. When the number of carbon atoms is less than 14, it becomes difficult to form a high-density and uniform brush-like molecular structure, and the scratch resistance and antifouling property decrease. Also, when the number of carbon atoms exceeds 65, it becomes difficult to form a high-density and uniform brush-like molecular structure, so the scratch resistance and antifouling property decrease.

[0032] The degree of polymerization of the oxyethylene group is not particularly limited and may be 1 to 20, may be 1 to 15, or may be 1 to 10.

[0033] The number of carbon atoms in the alkyl group, the total number of carbon atoms in the oxyalkylene group, and the degree of polymerization of the oxyalkylene group can be adjusted by changing the type of the first compound having a site with an alkyl group and an oxyalkylene group and a hydroxyl group.

[0034] The first layer contains silicon oxide. The silicon oxide refers to a compound represented by SiO x (where x is, for example, 1 to 2), or SiO2 in a composite inorganic oxide such as SiO2·Al2O3. Here, the first layer is a layer containing silicon oxide that is bonded via an oxygen atom to a site having an alkyl group forming a polymer brush. That is, the site having an alkyl group is bonded to silicon oxide via an oxygen atom. Thereby, the durability of the polymer brush can be improved, and the scratch resistance of the laminate can be improved. Here, the mode of bonding is a covalent bond. Also, the mode of bonding via an oxygen atom may be a mode in which a site having an alkyl group forming a polymer brush and a layer containing silicon oxide are directly bonded, or a mode in which they are indirectly bonded via another linking group. Also, by having a layer containing silicon oxide, active sites can be formed on the silicon oxide contained in the layer. As a result, the site having an alkyl group in the polymer brush is likely to be bonded to silicon oxide via an oxygen atom. That is, it becomes easier to form the polymer brush on the surface of the solid. Examples of such a method of forming active sites include a method of forming a layer containing silicon oxide by the first vapor deposition process described later, and a method of modifying the surface by irradiating the substrate with ultraviolet rays, plasma, or an ion beam. Examples of the compound that can be contained in the first layer include SiO2 (silicon dioxide), Al2O3 (alumina), SiO2 with Al2O3 added (silicon dioxide with alumina added), and the like. However, the compound containing silicon oxide is not limited to these. Also, the first layer may contain an inorganic oxide such as ITO (indium tin oxide) or TiO2 (titanium dioxide). The inorganic oxide may be a composite oxide.

[0035] ​In the solid matter and laminate of the present disclosure, the polymer brush preferably further contains a site having a dimethyl silicone chain with a silicon number of 3 or more and 110 or less. By containing a site having a dimethyl silicone chain, it becomes possible to further enhance water repellency and oil repellency (antifouling property). The site having a dimethyl silicone chain has a structure represented by the general formula: -[Si(CH3)2O] i - and is a site having a structure represented by the formula. In the formula, i represents the degree of polymerization of the dimethyl silicone chain, that is, the number of silicon atoms in the dimethyl silicone chain. The preferred range of i is 3 or more and 110 or less, the more preferred range is 3 or more and 100 or less, and the even more preferred range is 3 or more and 50 or less.

[0036] The site having a dimethyl silicone chain may further have an alkylene group such as a methylene group or an ethylene group. The number of carbon atoms of the alkylene group is not particularly limited, and may be, for example, 1 to 6, 1 to 3, or 1 to 2. By the site having a dimethyl silicone chain further having an alkylene group, the water repellency and lipophilicity can be adjusted.

[0037] Also, the molecular weight of the site having a dimethyl silicone chain is preferably 200 or more and 8000 or less, more preferably 240 or more and 7600 or less, and even more preferably 300 or more and 7600 or less. Also, it may be 300 or more and 8000 or less. By the molecular weight being in the above range, it becomes possible to further enhance the water repellency and lipophilicity of the dimethyl silicone chain. By changing the type of the second compound having a site having a dimethyl silicone chain and a reactive functional group, the number of silicon atoms of the dimethyl silicone chain can be adjusted, an alkylene group can be made to be contained in the site having a dimethyl silicone chain, and the molecular weight of the site having a dimethyl silicone chain can be adjusted.

[0038] In the solid matter and laminate of the present disclosure, the ratio of the mass of the site having a dimethyl silicone chain to the site having the alkyl group in the polymer brush is based on the peak intensity derived from the site having the alkyl group when the surface of the solid matter or laminate is measured with a microscopic Raman spectrometer as P A and the peak intensity derived from the site having a dimethyl silicone chain is P B When it is, P B / P A It is represented by. P B / P A Is preferably 0.0 to 1.1, more preferably 0.1 or more and 1.0 or less, and even more preferably 0.1 or more and 0.5 or less. By being in the above range, the scratch resistance can be made more excellent. Also, P B / P A May be 0.3 to 0.7, and within this range, the antifouling property of the solid matter or laminate can be made more excellent. P B / P A Can be adjusted by the mass ratio of the content of the second compound having a dimethyl silicone chain and a reactive functional group to the content of the first compound having an alkyl group and a hydroxyl group in the surface forming material.

[0039] P B / P A Can be obtained by the following method. Determine the area to be measured on the surface of the solid matter or laminate with a microscopic Raman spectrometer. The area is determined by the magnification of the objective lens attached to the apparatus, the wavelength of the excitation laser, and the aperture diameter. Hereinafter, the determined area is also referred to as the measurement area. Next, the scattered light generated by irradiating the measurement area with the excitation laser light is measured to obtain a peak. The measurement conditions are as follows. · Measuring device: Microscopic Raman spectrometer manufactured by Thermo Fisher Scientific · Objective lens magnification: 10 times · Excitation laser wavelength: 532 nm · Aperture diameter: 25 μm · Measurement area: 2 μm Among the peaks in the obtained Raman spectrum, the peak derived from the C-C bond is regarded as the peak derived from the site having an alkyl group, and the peak intensity of the peak is defined as P A Among the peaks in the obtained Raman spectrum, the peak derived from the Si-C bond is regarded as the peak derived from the site having a dimethyl silicone chain, and the peak intensity of the peak is defined as P B The obtained P A and P B From P B / P A is calculated.

[0040] <Method for manufacturing solid substance> Next, the method for manufacturing a solid substance according to the present disclosure will be described. The method for manufacturing a solid substance includes, in this order, a first vapor deposition step of vapor depositing a first vapor deposition material containing silicon oxide to form a layer containing the silicon oxide, and a second vapor deposition step of vapor depositing a second vapor deposition material containing a first compound having a site having an alkyl group with 14 or more and 65 or less carbon atoms and a hydroxyl group to form the polymer brush.

[0041] In the first vapor deposition step, a first vapor deposition material containing silicon oxide is vapor deposited to form a layer containing silicon oxide. By performing such a first vapor deposition step, a layer containing silicon oxide can be used as an underlayer. Further, by forming a layer containing silicon oxide in the first vapor deposition step, active sites can be formed in the silicon oxide contained in the layer. As the substrate for vapor deposition, known materials can be used. The first vapor deposition material is not particularly limited as long as it contains silicon oxide, and examples thereof include SiO2 and SiO2 with Al2O3 added. Further, the first vapor deposition material may further contain inorganic oxides such as Al2O3, ITO, and TiO2. Here, silicon oxide refers to a compound represented by SiO x (where x is, for example, 1 to 2), and SiO2 in a composite inorganic oxide such as SiO2·Al2O3. The conditions for vacuum deposition in the first deposition step are not particularly limited, and known conditions can be used.

[0042] In the second deposition step, a second deposition material containing a first compound having a moiety with an alkyl group having 14 or more and 65 or less carbon atoms and a hydroxyl group is vacuum-deposited to form a polymer brush. By performing such a second deposition step after the first deposition step, the polymer brush can be formed on the layer containing silicon oxide, and further, the moiety having an alkyl group having 14 or more and 65 or less carbon atoms contained in the polymer brush can be bonded to the silicon oxide contained in the first layer via an oxygen atom. This oxygen atom is presumed to be derived from the hydroxyl group contained in the first compound. Here, the mode of bonding is a covalent bond. The first compound having a moiety with an alkyl group and a hydroxyl group contained in the second deposition material is not particularly limited, and examples thereof include linear aliphatic alcohols and aliphatic alcohols having a branched structure. It is preferably a linear alkyl alcohol represented by the general formula: [C H n H 2n+1 -OH. The hydroxyl group in the formula may be located at the end of the alkyl group or inside the alkyl group, but is preferably located at the end. Since the first compound has a hydroxyl group, it can bond to the silicon oxide contained in the layer containing silicon oxide. In the formula, n represents the number of carbon atoms in the alkyl group. The preferred range of n is 14 or more and 65 or less, more preferably 16 or more and 60 or less, still more preferably 18 or more and 60 or less, and particularly preferably 18 or more and 40 or less. Specific examples of the first compound having a moiety with an alkyl group and a hydroxyl group include the compounds A-1, A-2, A-3, and A-4 shown in Table 1.

[0043] <Method for manufacturing a laminate> Next, a method for manufacturing a laminate according to the present disclosure will be described. The method for manufacturing the laminate includes, in this order, a first vapor deposition step of forming the first layer by vapor-depositing a first vapor deposition material containing silicon oxide, and a second vapor deposition step of forming the polymer brush layer by vapor-depositing a second vapor deposition material containing a first compound having a site having an alkyl group with 14 or more and 65 or less carbon atoms and a hydroxyl group.

[0044] In the first vapor deposition step, a first vapor deposition material containing silicon oxide is vapor-deposited to form the first layer. By performing such a first vapor deposition step, silicon oxide can be included in the first layer. Further, by forming a layer containing silicon oxide by the first vapor deposition step, active sites can be formed on the silicon oxide contained in the layer. As the substrate for vapor deposition, known materials can be used. The first vapor deposition material is not particularly limited as long as it contains silicon oxide, and examples thereof include SiO2 and SiO2 with Al2O3 added. Further, the first vapor deposition material may further contain inorganic oxides such as Al2O3, ITO, and TiO2. Here, silicon oxide refers to a compound represented by SiO x (where x is, for example, 1 to 2), or SiO2 in a composite inorganic oxide such as SiO2·Al2O3. The conditions for vapor deposition in the first vapor deposition step are not particularly limited, and known conditions can be used.

[0045] In the second vapor deposition step, a second vapor deposition material containing a first compound having a site having an alkyl group with 14 or more and 65 or less carbon atoms and a hydroxyl group is vapor-deposited to form a polymer brush layer. By performing such a second vapor deposition step after the first vapor deposition step, the polymer brush layer can be formed on the first layer, and further, the site having an alkyl group with 14 or more and 65 or less carbon atoms contained in the polymer brush can be bonded to the silicon oxide contained in the first layer via an oxygen atom. This oxygen atom is presumed to be derived from the hydroxyl group contained in the first compound. Here, the mode of bonding is a covalent bond. The first compound having a moiety with an alkyl group and a hydroxyl group contained in the second vapor deposition material is not particularly limited, and examples thereof include linear aliphatic alcohols and aliphatic alcohols having a branched structure. The general formula is: [C n H 2n+1 -OH, and it is preferably a linear alkyl alcohol. The hydroxyl group in the formula may be located at the end of the alkyl group or inside the alkyl group, but it is preferably located at the end. Since the first compound has a hydroxyl group, it can bind to the silicon oxide contained in the first layer. In the formula, n represents the number of carbon atoms in the alkyl group. The preferred range of n is 14 or more and 65 or less, the more preferred range is 16 or more and 60 or less, the further preferred range is 18 or more and 60 or less, and the particularly preferred range is 18 or more and 40 or less. Specific examples of the first compound having a moiety with an alkyl group and a hydroxyl group include the compounds A-1, A-2, A-3, and A-4 shown in Table 1.

[0046] In the method for producing a solid and the method for producing a laminate, the first compound may be a linear alcohol alkoxylate or an alcohol alkoxylate having a branched structure. The general formula is: [C n’ H 2n’+1 -O-[(CH2)2O] m -H, and it is preferably a linear alcohol ethoxylate. Since the alkoxylate has a hydroxyl group at the end, it can bind to the silicon oxide contained in the layer containing silicon oxide or the silicon oxide contained in the first layer. In the formula, n'represents the number of carbon atoms in the alkyl group, and m in the formula represents the degree of polymerization of the oxyethylene group. The preferred range of n'+2m, which represents the total number of carbon atoms in the linear alcohol ethoxylate, is 14 or more and 65 or less, the more preferred range is 16 or more and 60 or less, the further preferred range is 18 or more and 60 or less, and the particularly preferred range is 18 or more and 40 or less. The degree of polymerization of the oxyethylene group is not particularly limited, and it may be 1 to 20, 1 to 15, or 1 to 10. Specific examples of the linear alcohol alkoxylate include the compounds A-11, A-12, A-13, and A-14 shown in Table 1.

[0047] In the method for producing a solid and the method for producing a laminate, only one type of the first compound may be used, or two or more types of compounds may be used in combination. That is, the first compound includes at least one selected from the group consisting of linear aliphatic alcohols, aliphatic alcohols having a branched structure, linear alcohol alkoxylates, and alcohol alkoxylates having a branched structure. For example, examples of the linear aliphatic alcohol include 1-stearyl alcohol, 1-icosanol, 1-triacontanol, and 1-hexacosanol, and examples of the linear alcohol ethoxylate include ethylene glycol monohexadecyl ether, ethylene glycol monooctadecyl ether, ethylene glycol monooctacosyl ether, and decaethylene glycol tetracontyl ether.

[0048] In the method for producing a solid and the method for producing a laminate, the second vapor deposition material may further include a second compound having a site having a dimethyl silicone chain and a reactive functional group in addition to the first compound. The second compound having a site having a dimethyl silicone chain and a reactive functional group is not particularly limited, but is preferably a compound having a structure represented by the general formula: R-[Si(CH3)2O] i -R’. In the formula, i represents the degree of polymerization of the dimethyl silicone chain, that is, the number of silicon atoms in the dimethyl silicone chain. The preferred range of i is 3 or more and 110 or less, the more preferred range is 3 or more and 100 or less, and the even more preferred range is 3 or more and 50 or less. At least one selected from the group consisting of R and R’ in the formula is a reactive functional group capable of bonding via an oxygen atom to a layer containing silicon oxide or a first layer containing silicon oxide. Here, it is presumed that this oxygen atom is derived from the reactive functional group contained in the second compound. That is, the reactive functional group is not limited as long as it can bond to silicon oxide, and examples include alkoxy groups such as methoxy group and ethoxy group, and hydroxyl group. Among them, the methoxy group is preferred. Since at least one selected from the group consisting of R and R’ is a reactive functional group capable of bonding via an oxygen atom to a layer containing silicon oxide or a first layer containing silicon oxide, the second compound can bond to the silicon oxide contained in the layer containing silicon oxide or the silicon oxide contained in the first layer. Here, the mode of bonding is a covalent bond.

[0049] Among the group consisting of R and R’, the functional groups that are not reactive functional groups are not particularly limited, and examples include alkyl groups such as methyl group and ethyl group, hydrogen, etc. Among them, the methyl group is preferred.

[0050] The method for producing the solid matter and the method for producing the laminate may have a third vapor deposition step of vapor depositing the second compound before or after the second vapor deposition step.

[0051] Also, the molecular weight of the second compound is preferably 200 or more and 8000 or less, more preferably 240 or more and 7600 or less, and even more preferably 300 or more and 7600 or less. Also, it may be 300 or more and 8000 or less. Specific examples of the second compound include the compounds B-1, B-2, and B-3 shown in Table 1.

[0052] In the second vapor deposition material, the value of the mass ratio of the content of the second compound to the content of the first compound is preferably 0.0 or more and 1.1 or less, more preferably 0.1 or more and 1.0 or less, and even more preferably 0.1 or more and 0.5 or less. Further, the value of the mass ratio of the content of the second compound to the content of the first compound may be 0.3 to 0.7. By setting it within the above range, P B / P A can be easily set within the above range.

[0053] <Surface formation method> Next, the surface formation method according to the present disclosure will be described. The surface formation method is a surface formation method using a vacuum vapor deposition method. The surface formation method includes, in this order, a first vapor deposition step of vacuum vapor depositing a first vapor deposition material containing silicon oxide to form a layer containing silicon oxide, and a second vapor deposition step of vacuum vapor depositing a second vapor deposition material containing a first compound having a site having an alkyl group having 14 or more and 65 or less carbon atoms and a hydroxyl group.

[0054] In the first vapor deposition step, a first vapor deposition material containing silicon oxide is vacuum vapor deposited to form a layer containing silicon oxide. By performing such a first vapor deposition step, a layer containing silicon oxide can be formed. Further, by forming a layer containing silicon oxide by the first vapor deposition step, active sites can be formed on the silicon oxide contained in the layer. As the substrate for vacuum vapor deposition, a known material can be used. The first vapor deposition material is not particularly limited as long as it contains silicon oxide, and examples thereof include SiO2 and SiO2 with Al2O3 added. Further, the first vapor deposition material may further contain inorganic oxides such as Al2O3, ITO, and TiO2. Here, silicon oxide refers to a compound represented by SiO x (where x is, for example, 1 to 2), or SiO2 in a composite inorganic oxide such as SiO2·Al2O3. The conditions for vacuum vapor deposition in the first vapor deposition step are not particularly limited, and known conditions can be used.

[0055] In the second vapor deposition step in the surface formation method, a second vapor deposition material containing a first compound having a site with an alkyl group having 14 or more and 65 or less carbon atoms and a hydroxyl group is vacuum-deposited. By performing such a second vapor deposition step after the first vapor deposition step, the surface of the obtained solid becomes excellent in scratch resistance and long-term antifouling properties. As the first compound, the first compound described in the column of the method for producing a solid or the method for producing a laminate can be cited.

[0056] The second vapor deposition material in the surface formation method may further contain a second compound having a site with a dimethyl silicone chain and a reactive functional group in addition to the first compound. As the second compound, the second compound described in the column of the method for producing a solid or the method for producing a laminate can be used. Further, the surface formation method may have a third vapor deposition step of vapor-depositing the second compound before or after the second vapor deposition step. By vapor-depositing the second compound, the surface of the obtained solid becomes more excellent in water repellency and oil repellency (antifouling property).

[0057] In the second vapor deposition material, the value of the mass-based ratio of the content of the second compound to the content of the first compound is preferably 0.0 or more and 1.1 or less, more preferably 0.1 or more and 1.0 or less, and even more preferably 0.1 or more and 0.5 or less. By setting the ratio within the above range, the surface of the obtained solid becomes more excellent in scratch resistance. Further, the value of the mass-based ratio of the content of the second compound to the content of the first compound may be 0.3 to 0.7, and within this range, the antifouling property of the surface of the obtained solid becomes more excellent.

[0058] <Material for surface formation> Next, the material for surface formation according to the present disclosure will be described. The surface-forming material contains a first compound having a site with an alkyl group having 14 to 65 carbon atoms and a hydroxyl group. As the first compound, the first compound described in the column of the method for producing a solid or the method for producing a laminate can be used. By including the first compound in the surface-forming material, the surface obtained by subjecting the surface of the substrate to surface treatment using the surface-forming material is excellent in both scratch resistance and long-term antifouling properties. The surface-forming material can be used as the second vapor deposition material in the column of the method for producing a solid, the method for producing a laminate, or the surface-forming method.

[0059] The surface-forming material may contain a second compound having a site with a dimethyl silicone chain and a reactive functional group. As the second compound, the second compound described in the column of the method for producing a solid or the method for producing a laminate can be used. By including the second compound in the surface-forming material, the surface obtained by subjecting the surface of the substrate to surface treatment using the surface-forming material is more excellent in water repellency and oil repellency (antifouling properties).

[0060] In the surface-forming material, the value of the mass-based ratio of the content of the second compound to the content of the first compound is preferably 0.0 or more and 1.1 or less, more preferably 0.1 or more and 1.0 or less, and even more preferably 0.1 or more and 0.5 or less. By setting the ratio within the above range, the surface obtained by subjecting the surface of the substrate to surface treatment using the surface-forming material is more excellent in scratch resistance. Also, the value of the mass-based ratio of the content of the second compound to the content of the first compound may be 0.3 to 0.7, and within this range, the antifouling properties of the surface obtained by subjecting the surface of the substrate to surface treatment using the surface-forming material can be made more excellent.

[0061] <Optical member> The optical member is an optical member including the solid or laminate of the present disclosure. Examples of the optical member include an optical filter, an optical lens, an eyeglass lens, a photographic lens, a cover glass for a display, and various films.

[0062] <Glasses> The glasses are glasses having the optical member of the present disclosure. The glasses include all instruments worn around the eyes, and are not limited to ordinary vision correction glasses, and include novelty glasses, protective goggles, head-mounted displays, sunglasses, smart glasses, and the like. <Touch panel> The touch panel is a touch panel having the optical member of the present disclosure. The touch panel according to the present disclosure is used for all devices having a touch panel. Examples of devices having a touch panel include smartphones, tablet terminals, and the like. That is, the smartphone has the optical member of the present disclosure. Further, the tablet terminal has the optical member of the present disclosure.

Table 1

[0063] Hereinafter, the analysis method of the present disclosure will be described. <Method for confirming that the site having an alkyl group is bonded to silicon oxide via an oxygen atom> That the site having an alkyl group is bonded to silicon oxide via an oxygen atom can be confirmed by the following procedure. A first vapor deposition material containing silicon oxide is vacuum-deposited on a base material A made of borosilicate glass and a base material B made of borosilicate glass, respectively, to form a layer containing silicon oxide. By forming a layer containing silicon oxide by such a first vapor deposition step, active points can be formed on the silicon oxide contained in the layer. Thereafter, after the formation of the layer containing silicon oxide, the base material A is continuously vacuum-deposited with a second vapor deposition material while maintaining the vacuum state to obtain the solid matter of the present disclosure. The base material B is taken out of the vacuum vapor deposition apparatus after the formation of the layer containing silicon oxide and exposed to atmospheric pressure and air to perform a treatment for eliminating the active points of the silicon oxide contained in the layer, and then the second vapor deposition material is vacuum-deposited.

[0064] The second vapor deposition material was vacuum-deposited, and substrates A and B were heated in a vacuum. By comparing the temperatures at which sites having an alkyl group are detected using a mass spectrometer (trade name: infiTOF-DUO, manufactured by Nippon Kanomax Co., Ltd.), it can be confirmed that the sites having an alkyl group are bonded to silicon oxide via an oxygen atom. Since the sites having an alkyl group in substrate A are bonded to silicon oxide via an oxygen atom, the temperature at which the sites having an alkyl group are detected is higher than that of substrate B. The measurement conditions are as follows. · Temperature range: room temperature to 1000 °C · Heating rate: 10 °C / min · Atmosphere: reduced pressure state (5×10-7 Pa or less) · Measurement mass range: m / z 1 to 1000 Also, the fact that the sites having an alkyl group are bonded to silicon oxide via an oxygen atom by the above method indicates that the solid has a polymer brush on the layer containing silicon oxide.

[0065] ≪First Embodiment≫ FIG. 1 is a schematic diagram showing the configuration of a solid or laminate according to a first embodiment of the present disclosure, and shows a configuration example of a solid or laminate in which a first layer (layer containing silicon oxide) 12 containing silicon oxide is formed on a substrate 11, and a polymer brush 13 is formed on the first layer 12. Note that FIG. 1 is a simulated representation of the configuration having a polymer brush, and does not represent the actual thicknesses of the substrate 11, the first layer 12, and the polymer brush 13 in an accurate ratio.

[0066] (Substrate 11) The substrate 11 may be a solid and capable of forming the first layer 12 containing silicon oxide and the polymer brush 13. Examples thereof include glass, ceramics, resin, metal, or a film made of glass, resin, etc. When using the above as the substrate of an optical member having the solid or laminate of the present disclosure, it is preferable that the substrate can transmit visible light or light of a specific wavelength. The thickness of the substrate is not particularly limited and can be appropriately set according to the application.

[0067] (First layer 12 containing silicon oxide) The first layer 12 containing silicon oxide is the first layer containing silicon oxide of the present disclosure. There is no particular limitation on the thickness of layer 12, and examples thereof include 2 nm to 50 nm and 4 nm to 20 nm.

[0068] (Polymer brush 13) The polymer brush 13 is a polymer brush on the first layer containing silicon oxide of the present disclosure. There is no particular limitation on the thickness of the polymer brush 13, and examples thereof include 1 nm to 10 nm and 1 to 5 nm. By being within the above range, a solid or laminate excellent in scratch resistance and long-term antifouling properties can be easily obtained.

Examples

[0069] The present disclosure will be described more specifically with reference to the following examples, but the present disclosure is not limited by the following examples.

[0070] [Example 1] (Preparation of surface-forming material) Table 2 shows the combination of component A (first compound) and component B (second compound), and the mass ratio of component B to component A. Table 1 shows the structures of the substances corresponding to the symbols in Table 2. In Example 1, 30 mg of 1-triacontanol (manufactured by Tokyo Chemical Industry Co., Ltd., product name: 1-Triacontanol), which is A-3 in Table 1, was used as the surface-forming material and put into a metal container (Production Example 1).

[0071] (Preparation of layer containing silicon oxide) SiO2 (manufactured by Canon Optron Co., Ltd., product name: SiO2-E-1-2) was used as the first vapor deposition material, and a first layer 12 containing silicon oxide with a thickness of 10 nm made of SiO2 was formed on a borosilicate glass substrate 11 with a thickness of 3 mm by vapor deposition using a vacuum vapor deposition apparatus (dome diameter Φ900 mm, vapor deposition distance 890 mm). The thickness of the first layer 12 containing silicon oxide was measured using spectroscopic ellipsometry (manufactured by JA WOLLAM - ESM300) and was found to be 10 nm.

[0072] (Fabrication of Polymer Brush) The surface - forming material according to Production Example 1 was used as the second vapor deposition material, and a polymer brush 13 was formed on the first layer 12 containing silicon oxide by vapor deposition using a vacuum vapor deposition apparatus (dome diameter Φ900 mm, vapor deposition distance 890 mm) to obtain an optical member. The thickness of the polymer brush 13 was measured using spectroscopic ellipsometry (manufactured by JA WOLLAM - ESM300) and was found to be 3 nm.

[0073] (Evaluation of Scratch Resistance) The scratch resistance of the surface of the fabricated optical member was evaluated according to the following method. First, the contact angle with water of the surface of the fabricated optical member was measured by the method described below. After that, steel wool (manufactured by Nippon Steel Wool Co., Ltd., grade #0000, wire diameter: approximately 0.012 mm) cut into 1 cm 2 was used, and the steel wool was brought into contact with the surface of the optical member and reciprocated to conduct a friction test. At this time, the applied load was adjusted so that the load applied to the surface was 9.8 kgf, and the friction was performed under the conditions of a reciprocating speed of 60 reciprocations / min and a moving distance of 15 mm. The number of friction times was set to 1000 reciprocations. After that, the contact angle with water was measured. The water contact angle is the angle formed between the tangent to the water droplet surface and the solid surface at the point where the solid and the water droplet are in contact. Here, the smaller the difference in the water contact angle before and after friction, the fewer scratches on the surface. That is, the smaller the difference in the water contact angle before and after friction, the higher the scratch resistance. Also, when the difference in the water contact angle before and after friction is small and the antifouling property evaluation described below is good, it can be determined that the long-term antifouling property is excellent.

[0074] The water contact angle was measured using a contact angle meter (manufactured by Kyowa Interface Science Co., Ltd., CA-X150). The specific measurement procedure is as follows. 2.5 μL of ion-exchanged water was dropped onto the surface of the optical member. From the image obtained 5 seconds after the drop, the angle formed between the tangent to the water droplet surface and the optical member surface at the point where the water droplet and the optical member surface were in contact was measured. The evaluation results of the scratch resistance are shown in Table 3.

[0075] (Evaluation of antifouling property) The antifouling property of the surface of the fabricated optical member was evaluated according to the following method. As an index indicating the antifouling property, the bounce condition and ease of wiping of the ink of the fluorescent pen were used as evaluation indices, and the evaluation was performed based on the following criteria. The results are shown in Table 3. (Evaluation criteria) A: After attaching the pen tip to the surface, the ink becomes spherical and bounces off within 5 seconds or less, and all the ink can be wiped off with a lint-free paper. B: After attaching the pen tip to the surface, the ink does not bounce off even after more than 5 seconds, and all the ink can be wiped off by rubbing with a lint-free paper. C: After attaching the pen tip to the surface, the ink does not bounce off even after more than 5 seconds, and the ink cannot be wiped off even by rubbing with a lint-free paper.

[0076] [Examples 2 to 21] The compound described in Table 1 as Component A and Component B was used in the same manner as in Example 1 except that it was used in the combination described in Table 2 and the mass ratio of Component B to Component A, and a surface-forming material was produced, which was designated as Production Examples 2 to 21. Using the obtained Production Examples 2 to 21, an optical member was obtained. Further, evaluation of scratch resistance and antifouling property was performed in the same manner as in Example 1. The results are shown in Table 3. In addition, P in the obtained solid or laminate B / P A When measured with a microscopic Raman spectrometer, it was in agreement with the mass ratio of Component B to Component A in the surface-forming material.

[0077] [Example 22] As the first vapor deposition material, an optical member was obtained in the same manner as in Example 1 except that SiO2 (manufactured by Canon Optron Co., Ltd., product name: SiO2 -E-1-2) and Al2O3 (manufactured by Canon Optron Co., Ltd., product name: Al2O3-A-1-2) were used. The mass ratio of Al2O3 was adjusted to 0.01 with respect to the mass of SiO2. Further, evaluation of scratch resistance and antifouling property was performed in the same manner as in Example 1. The results are shown in Table 3.

[0078] [Comparative Examples 1 to 3] The compound described in Table 1 as Component A and Component B was used in the same manner as in Example 1 except that it was used in the combination described in Table 2 and the mass ratio of Component B to Component A, and a surface-forming material was produced, which was designated as Production Comparative Examples 1 to 3. Using the obtained Production Comparative Examples 1 to 3, an optical member was obtained. Further, evaluation of scratch resistance and antifouling property was performed in the same manner as in Example 1. The results are shown in Table 3.

[0079] [Comparative Example 4] To a mixed solution of 0.01M HCl aqueous solution (1 volume part), tetraethoxysilane (2.8 volume parts), and ethanol (8 volume parts), chloromethylphenylethyltrimethoxysilane (0.564 volume parts) was added, and the mixture was stirred at room temperature for 24 hours to prepare a precursor solution. This precursor solution was dropped onto a silicon wafer and spin-coated (2000 rpm / 10 seconds), and then dried at room temperature for 24 hours to form a polymerization initiation layer on the surface of the silicon wafer. 2-(Dimethylamino)ethyl methacrylate (5.5 parts by volume), copper(II) chloride (4 parts by volume), N,N,N’,N’’,N’’-pentamethyldiethylenetriamine (7 parts by volume), sodium ascorbate (1 part by volume), and water (1 part by volume) were mixed to form a polymerization solution. The silicon wafer having the polymerization initiation layer formed thereon was immersed in this polymerization solution for 2 hours to form a polymer brush on the surface of the silicon wafer serving as a substrate, thereby obtaining an optical member. Further, evaluation of scratch resistance and antifouling property was performed in the same manner as in Example 1. As a result, the contact angle before friction was 65°, and the contact angle after 1000 times of friction was 7°. The evaluation result of the antifouling property was C.

Table 2

Table 3

Explanation of Reference Numerals

[0080] 11 Substrate 12 First layer containing silicon oxide (layer containing silicon oxide) 13 Polymer brush

Claims

1. A solid having a layer containing silicon oxide and a polymer brush on the layer containing silicon oxide, wherein the polymer brush constitutes the surface of the solid, the polymer brush has a moiety having an alkyl group with 14 to 65 carbon atoms, and the solid is characterized in that the alkyl group is directly bonded to the silicon oxide only through an oxygen atom or only through an oxyalkylene group.

2. The site having the alkyl group further has an oxyethylene group-(CH ２ ), ２ -O-. The solid according to claim 1.

3. The solid according to claim 1 or 2, wherein the moiety having the alkyl group has a linear aliphatic structure.

4. The site having the alkyl group is a linear alkyl group having an oxyethylene group-(CH ２ ) ２ -O-, and the solid according to claim 1 or 2.

5. An optical member comprising the solid according to claim 1 or 2.

6. Glasses having the optical member according to claim 5.

7. A touch panel having the optical member according to claim 5.

8. A smartphone having the optical member according to claim 5.

9. A tablet terminal having the optical member according to claim 5.

10. A method for producing the solid according to claim 1 or 2, comprising a first vapor deposition step of forming the layer containing silicon oxide by vacuum vapor deposition of a first vapor deposition material containing silicon oxide, and a second vapor deposition step of forming the polymer brush by vacuum vapor deposition of a second vapor deposition material containing a first compound having a moiety having an alkyl group with 14 to 65 carbon atoms and a hydroxyl group, in this order.

11. The method for producing a solid according to claim 10, wherein the first compound is a linear aliphatic alcohol.

12. The method for producing a solid according to claim 10, wherein the first compound is a linear alcohol ethoxylate.

13. A surface formation method using a vacuum vapor deposition method, comprising a first vapor deposition step of forming a layer containing silicon oxide by vacuum vapor deposition of a first vapor deposition material containing silicon oxide, and a second vapor deposition step of vacuum vapor depositing a second vapor deposition material containing a first compound having a moiety having an alkyl group with 14 to 65 carbon atoms and a hydroxyl group, in this order.

14. The surface formation method according to claim 13, wherein the first compound is a linear aliphatic alcohol.

15. The surface formation method according to claim 13, wherein the first compound is a linear alcohol ethoxylate.

16. A solid having a surface formed by the surface formation method according to claim 13 or 14.

17. An optical member comprising the solid according to claim 16.

18. Glasses having the optical member according to claim 17.

19. A touch panel having the optical member according to claim 17.

20. A smartphone having the optical member according to claim 17.

21. A tablet terminal having the optical member according to claim 17.

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