Exposure device, adjustment method and manufacturing method of article

Abstract

To provide an exposure device capable of adjusting a size or a divergence angle of a light flux incident on an illumination optical system while reducing a size increase of the device.SOLUTION: An exposure device includes: an illumination optical system configured to illuminate an original plate with light from a light source; and a detector configured to detect a light volume. The illumination optical system includes: a first optical element disposed at a light path between the light source and the original plate; a change part capable of changing at least one of an incident position and an incident angle of a light flux incident on the first optical element; and an optical unit capable of changing a size and a divergence angle of the light flux incident on the first optical element. The detector detects a light volume of the light flux via the first optical element each time the change part has changed the incident position or the incident angle of the light flux incident on the first optical element a plurality of times. According to a detection result by the detector, the optical unit adjusts the size and the divergence angle of the light flux incident on the first optical element.SELECTED DRAWING: Figure 9

Description

[Technical Field]

[0001] The present invention relates to an exposure apparatus, an adjustment method, and a method for manufacturing an article. [Background technology]

[0002] In an exposure apparatus that illuminates an original (reticle or mask) with light from a light source and transfers the pattern of the original onto a substrate by exposure, the relative position between the light source and the illumination optical system may change, which may change the size and divergence angle (degree of divergence) of the light beam incident on the illumination optical system and affect the performance of the illumination optical system.

[0003] Patent Document 1 describes a method in which a light beam is guided to a monitor-type beam analysis module by a mirror, and the light beam is adjusted based on the results of the beam analysis module detecting the size and divergence angle of the light beam. Here, the divergence angle is a parameter that indicates the degree of spread of the light beam. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Laid-Open No. 2007-194600 Summary of the Invention [Problem to be solved by the invention]

[0005] However, providing an exposure tool with a monitor-type beam analysis module increases the size of the tool.

[0006] SUMMARY OF THE INVENTION It is therefore an object of the present invention to provide an exposure apparatus that is capable of adjusting the size and divergence angle of a light beam incident on an illumination optical system while reducing the size of the apparatus. [Means for solving the problem]

[0007] In order to achieve the above-mentioned object, an exposure apparatus according to one aspect of the present invention comprises an illumination optical system that illuminates an original with light from a light source, and a detection unit that detects a light amount, wherein the illumination optical system includes a first optical element arranged in an optical path between the light source and the original, a change unit that can change at least one of the incident position and incident angle of the light beam incident on the first optical element, and an optical unit that can change the size and divergence angle of the light beam incident on the first optical element, wherein the detection unit detects the light amount of the light beam that passes through the first optical element each time the incident position or incident angle of the light beam incident on the first optical element is changed multiple times by the change unit, and adjusts the size and divergence angle of the light beam incident on the first optical element by the optical unit based on the detection result of the detection unit.

[0008] Further objects and other aspects of the present invention will become apparent from the following description of the embodiments with reference to the accompanying drawings. [Effects of the Invention]

[0009] According to the present invention, it is possible to provide an exposure apparatus that is capable of adjusting the size and divergence angle of a light beam incident on an illumination optical system while reducing the size of the apparatus. [Brief explanation of the drawings]

[0010] [Figure 1] FIG. 1 is a diagram showing the configuration of an exposure apparatus in a first embodiment. [Figure 2] FIG. [Figure 3] FIG. 1 is a schematic diagram of an adjustment (changing) mechanism for a mirror and a plane-parallel plate for adjusting the position and angle of a light beam. [Figure 4] 10 is a schematic diagram of an adjustment mechanism of an optical element for adjusting the size and divergence angle of a light beam. [Figure 5] 10 is an example of the distance between optical elements and the light flux. [Figure 6] 10 is an example of a light intensity distribution formed on a Fourier transform plane. [Figure 7]10 is an example of detecting the divergence angle of a light beam in the first embodiment, and is an example of the amount of light detected by the detection unit when the incident angle of the light beam incident on the diffractive optical element is changed sequentially (changed multiple times). [Figure 8] 10 is an example of detecting the size of a light beam in the first embodiment, and is an example of the amount of light detected by the detection unit when the incident position of the light beam incident on the diffractive optical element is changed sequentially (changed multiple times). [Figure 9] 5 is a flowchart showing a method for adjusting a light beam incident on a diffractive optical element in the first embodiment. [Figure 10] FIG. 10 is a flowchart showing a method for manufacturing an article according to a second embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0011] Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that the following embodiments do not limit the scope of the invention claimed. Although multiple features are described in the embodiments, not all of these multiple features are necessarily essential to the invention, and the embodiments may be combined in any manner. Furthermore, in the drawings, the same reference numerals are used to designate the same or similar components, and redundant explanations will be omitted.

[0012] Specific configurations of each embodiment will be described below.

[0013] First Embodiment 1 is a diagram showing the configuration of an exposure apparatus 100 in this embodiment. The exposure apparatus 100 has an illumination optical system 60 that illuminates an original 18 (mask, reticle) with light (light beam) from a light source 1, a projection optical system 19 that projects the pattern of the original 18 onto a substrate 20 (wafer, liquid crystal substrate), and a controller 50. The exposure apparatus 100 of this embodiment may be a step-and-scan exposure apparatus or a step-and-repeat exposure apparatus. The exposure apparatus 100 also has an adjustment unit 30 and an adjustment unit (change unit) 40, which will be described later.

[0014] Light source 1 includes, for example, an excimer laser, a mercury lamp, or an extreme ultraviolet (EUV) light source. The light beam from light source 1 is ultraviolet (UV) radiation (having a wavelength of, for example, 365 nm, 248 nm, 193 nm, 157 nm, or 126 nm) or extreme ultraviolet (EUV) radiation (having a wavelength in the range of, for example, 5 to 20 nm). Control unit 50 is configured by, for example, a computer including CPU 51 and memory 52, and CPU 51 controls each part of exposure apparatus 100 in accordance with a program stored in memory 52, etc.

[0015] The illumination optical system 60 includes an optical unit 2, a deflection optical system 3, a mirror 4, a plane-parallel plate 5, a diffractive optical element (first optical element) 6, a condenser lens 7, an aperture 9, a prism unit 10, and a zoom lens unit 11. The illumination optical system 60 further includes a multi-beam forming unit 12, an aperture 13, a condenser lens 14, a half mirror 15, a detection unit 21 that detects the beam emitted from the condenser lens 14, a turret 90, and an actuator 91. The half mirror 15 is disposed between the condenser lens 14 and the original 18. The detection unit 21 includes a measurement optical system 16 and a sensor 17. Light passing through the diffractive optical element 6 is reflected by the half mirror 15 and enters the measurement optical system 16. Light emitted from the measurement optical system 16 enters the sensor 17, and the sensor 17 detects (measures) the amount of light received. The control unit 50 controls the exposure amount during exposure, for example, based on the detection result of the detection unit 21. In this embodiment, an example is shown in which the deflection optical system 3 is included in the illumination optical system 60 of the exposure apparatus 100 , but the deflection optical system 3 may be separate from the exposure apparatus 100 .

[0016] The optical unit 2 is, for example, a beam expander (variable magnification optical system), and is arranged closer to the light source 1 than the diffractive optical element 6. The mirror 4 is arranged between the deflection optical system 3 and the diffractive optical element 6, and reflects the light beam from the light source 1 and guides it to the diffractive optical element 6. The plane-parallel plate 5 is arranged in the optical path between the mirror 4 and the diffractive optical element 6. By adjusting the mirror 4 and the plane-parallel plate 5, the angle and position of the light beam incident on the diffractive optical element 6 can be adjusted.

[0017] The diffractive optical element 6 is disposed between the deflection optical system 3 and the condenser lens 7, on a plane conjugate with the original 18, which is the illuminated surface, or on a plane that has a Fourier transform relationship with the pupil plane of the illumination optical system. The diffractive optical element 6 uses diffraction to convert the light intensity distribution of the light beam from the light source 1 onto the pupil plane of the illumination optical system 60, which is a plane conjugate with the pupil plane of the projection optical system 19, or onto a plane conjugate with the pupil plane of the illumination optical system 60, thereby forming a desired light intensity distribution. This diffractive optical element 6 is, for example, a computer-generated hologram designed by a computer so that a desired diffraction pattern is obtained on the diffraction pattern plane. Alternatively, it may be a diffuser plate or metalens capable of diffusing the light beam. The light source shape formed on the pupil plane of the projection optical system 19 is called an effective light source shape.

[0018] The diffractive optical element 6 may be a diffractive optical element selected from a plurality of diffractive optical elements each forming a different effective light source shape. For example, each of the plurality of diffractive optical elements may be mounted in a corresponding one of a plurality of slots on a turret (not shown). The plurality of effective light source shapes may include a small circular shape (a relatively small circular shape), a large circular shape (a relatively large circular shape), an annular shape, a dipole shape, a quadrupole shape, and other shapes. The method of illumination using an annular, dipole, or quadrupole effective light source shape is called modified illumination.

[0019] The condenser lens 7, which is disposed between the diffractive optical element 6 and the prism unit 10, is a focusing optical system that focuses the light beam emitted from the diffractive optical element 6. The condenser lens 7 focuses the light beam diffracted by the diffractive optical element 6 and forms a diffraction pattern on a Fourier transform surface 8. The Fourier transform surface 8 is located between the diffractive optical element 6 and a multi-beam forming unit (optical integrator) 12, and is a surface that has an optical Fourier transform relationship with the diffractive optical element 6. The shape of the diffraction pattern formed on the Fourier transform surface 8 can be changed by replacing the diffractive optical element 6 positioned on the optical path.

[0020] The aperture 9 is positioned at or near a predetermined plane (Fourier transform plane 8) in the optical path where the condenser lens 7 (light-collecting optical system) focuses the light beam, and is configured to be removably inserted. The aperture 9 can be, for example, a blade or a filter. In this embodiment, this removably inserted configuration is realized by a turret 90 on which multiple different apertures are formed. FIG. 2 is a diagram showing the details of the aperture. An aperture 9a (details will be described later) with an appropriate aperture diameter is mounted in a corresponding slot among multiple slots in the turret 90. The turret 90 may also mount other apertures. For example, the turret 90 may include a large aperture aperture 9b with a large aperture diameter, a quadrupole aperture 9c for quadrupole illumination, and a ring-shaped aperture 9d for annular illumination. The turret 90, which serves as a selector, is driven by the rotation of an actuator 91 under the control of the control unit 50. From the multiple apertures, an aperture 9 corresponding to the diffractive optical element 6 is selected and positioned on the optical path. In particular, the aperture 9a is used in a process for adjusting the angle, position, size, and divergence angle (degree of divergence) of the light beam incident on the diffractive optical element 6, which will be described later. Here, the divergence angle (beam divergence) is a parameter that indicates the degree of spread of the light beam. In other words, the divergence angle is a parameter that indicates the degree to which the light beam spreads at a sufficiently distant point. Note that, although the present embodiment shows an example in which the turret 90 is used to position a desired aperture 9a from among a plurality of apertures with different aperture diameters, an iris aperture with a variable aperture diameter may also be used.

[0021] Prism unit 10 and zoom lens unit 11 are disposed between aperture 9 and multi-beam forming unit 12, and function as a zoom optical system that expands the light intensity distribution formed on Fourier transform plane 8. Prism unit 10 can guide the diffraction pattern (light intensity distribution) formed on Fourier transform plane 8 to zoom lens unit 11 by adjusting the annular ratio, etc. Zoom lens unit 11 includes, for example, two lenses and one mirror, and can guide the diffraction pattern formed on Fourier transform plane 8 to multi-beam forming unit 12 by adjusting the σ value based on the ratio between the numerical aperture NA of illumination optical system 60 and the numerical aperture NA of the projection optical system.

[0022] The multi-beam forming unit 12 is disposed between the zoom lens unit 11 and the condenser lens 14, and forms a number of secondary light sources according to a diffraction pattern in which the annular ratio, aperture angle, and σ value have been adjusted, and directs the light to the condenser lens 14. The multi-beam forming unit 12 may be an optical integrator constituted by a fly-eye lens, an optical pipe, a diffractive optical element, a microlens array, or the like. A diaphragm 13 is disposed between the multi-beam forming unit 12 and the condenser lens 14.

[0023] The condenser lens 14 is disposed between the multi-beam forming unit 12 and the original 18, and the multiple beams guided from the multi-beam forming unit 12 are condensed by the condenser lens 14 to illuminate the original 18 in a superimposed manner, thereby enabling the original 18 to be uniformly illuminated.

[0024] The original 18 is disposed between the condenser lens 14 and the projection optical system 19, and has a pattern (e.g., a circuit pattern) to be transferred to the substrate 20. The original 18 is supported and driven by an original stage (not shown). The projection optical system 19 projects an image of the pattern of the original 18 onto the substrate 20. The projection optical system 19 is disposed between the original 18 and the substrate 20, and maintains them in an optically conjugate relationship. The substrate 20 is supported and driven by a substrate stage (not shown).

[0025] During exposure, the illumination optical system 60 illuminates the original 18, and the projection optical system 19 projects the pattern of the original 18 onto the substrate 20. The shape of the effective light source affects the resolution of the pattern of the original 18 projected onto the substrate 20. Therefore, by forming an appropriate effective light source distribution, the resolution of the pattern can be improved.

[0026] In the exposure apparatus 100, the relative position between the light source 1 and the illumination optical system 60 may change. For example, if the light source 1 is large, the exposure apparatus 100 may be placed on the second floor and the light source 1 on the first floor. In such a case, if vibrations or the floor sinking occur, the relative position between the light source 1 and the illumination optical system 60 (exposure apparatus 100) will change. This will change the position and angle of the light beam incident on the illumination optical system 60, affecting the performance of the illumination optical system 60. Therefore, it is necessary to adjust the light beam in accordance with the change in the position and angle of the light beam incident on the illumination optical system 60.

[0027] If the angle of the light beam incident on the diffractive optical element 6 is shifted, the distribution formed on the Fourier transform plane 8 will shift, the center of gravity of the effective light source will change, and telecentricity and overlay performance during exposure may be impaired. Furthermore, if the position of the light beam incident on the diffractive optical element 6 is shifted, vignetting (blocking of part of the light beam) will occur in the optical system subsequent to the diffractive optical element 6, resulting in a decrease in the illuminance of the light illuminating the original 18. Therefore, it is necessary to adjust the position and angle of the light beam incident on the diffractive optical element 6.

[0028] 3 is a schematic diagram of an adjustment (changing) mechanism for the mirror 4 and the plane-parallel plate 5 to adjust the position and angle of the light beam. The control unit 50 controls the adjustment unit 40 to adjust the mirror 4 and the plane-parallel plate 5, thereby adjusting at least one of the incident position and incident angle of the light beam incident on the diffractive optical element 6. The adjustment unit 40 may include an actuator 41 (first changing mechanism), an actuator 42 (second changing mechanism), and an actuator 43 (third changing mechanism).

[0029] The actuator 41 rotates the mirror 4 around an axis extending along the plane of the paper in FIG. 3 (direction A in FIG. 3) and around an axis extending perpendicular to the plane of the paper (direction B in FIG. 3). The actuator 42 drives the mirror 4 to change its position along the plane of the paper in FIG. 3 (direction C in FIG. 3). The actuator 43 rotates the plane-parallel plate 5 around an axis along the plane of the paper in FIG. 3 (direction D in FIG. 3). This makes it possible to adjust the tilt angle of the plane-parallel plate 5 with respect to the optical axis. When the plane-parallel plate 5 is rotationally driven, light incident on the plane-parallel plate 5 is emitted in a state of being translated parallel to the optical axis of the incident light. By adjusting the mirror 4 and the plane-parallel plate 5 using the adjustment unit 40 in this way, it is possible to adjust the position and angle deviation of the light beam incident on the diffractive optical element 6.

[0030] Furthermore, if the size of the light beam incident on the diffractive optical element 6 exceeds the allowable size due to individual differences in the light source 1 or a long optical path length of the optical system 3, vignetting occurs in the optical system following the diffractive optical element 6, reducing the illuminance of the light illuminating the original 18. On the other hand, if the size of the light beam incident on the diffractive optical element 6 exceeds the allowable size, the light energy density in the optical system following the diffractive optical element 6 increases, making it more likely that the transmittance of the glass material will decrease due to damage caused by light irradiation. Furthermore, the size of the light beam changes over time. Therefore, it is necessary to adjust the size of the light beam incident on the diffractive optical element 6 so that it falls within a predetermined allowable range. Furthermore, if the divergence angle of the light beam incident on the diffractive optical element 6 differs from device to device due to individual differences in the light source 1, the distribution formed on the Fourier transform surface 8 will differ from device to device, and the shape of the effective light source will also differ from device to device. Furthermore, the divergence angle of the light beam changes over time. Therefore, it is necessary to adjust the divergence angle of the light beam incident on the diffractive optical element 6 so that it falls within a predetermined allowable range.

[0031] FIG. 4 is a schematic diagram of an adjustment mechanism of the optical unit 2 for adjusting the size and divergence angle of the light beam. The optical unit 2 includes an optical unit 2a having negative refractive power and an optical unit 2b having positive refractive power. The optical unit 2 may be a cylindrical lens having curvature only in one direction perpendicular to the optical axis of the deflection optical system 3. The adjustment unit 30 includes an actuator (adjustment mechanism) and adjusts the distance between the optical units 2a and 2b, i.e., the spacing in the optical axis direction (direction E shown in FIG. 4). Note that FIG. 4 shows an example in which the adjustment unit 30 drives the optical unit 2b, but the adjustment unit 30 may drive the optical unit 2a or both the optical units 2a and 2b. The size and divergence angle of the light beam from the light source 1 can be adjusted by adjusting the distance between the optical units 2a and 2b using the adjustment unit 30.

[0032] FIG. 5 shows an example of the distance between optical unit 2a and optical unit 2b and the light beam. In FIG. 5(a), the distance between optical unit 2a and optical unit 2b is Ea, and in FIG. 5(b), the distance between optical unit 2a and optical unit 2b is Eb, where Ea is longer than Eb. When the distance between optical unit 2a and optical unit 2b is long as shown in FIG. 5(a), the light beam emitted from optical unit 2b tends to point inward (toward the optical axis) as it moves away from the optical axis, and the size of the light beam incident on diffractive optical element 6 becomes smaller. When the distance between optical unit 2a and optical unit 2b is short as shown in FIG. 5(b), the light beam emitted from optical unit 2b tends to point outward (away from the optical axis) as it moves away from the optical axis, and the size of the light beam incident on diffractive optical element 6 becomes larger. Utilizing this tendency, the size of the light beam from light source 1 can be adjusted by adjusting the distance between optical unit 2a and optical unit 2b using adjustment unit 30. In other words, for example, if you want to increase the size of the light beam, you can adjust the distance between optical unit 2a and optical unit 2b to be shorter, and if you want to decrease the size of the light beam, you can adjust the distance between optical unit 2a and optical unit 2b to be longer.

[0033] Next, adjustment of the divergence angle of the light beam incident on the diffractive optical element 6 will be described. Adjustment of the divergence angle differs depending on whether the light beam emitted from the optical unit 2b is directed inward (toward the optical axis) as it moves away from the optical axis, or outward (away from the optical axis). For example, if you want to increase the divergence angle, and the light beam emitted from the optical unit 2b is directed inward (toward the optical axis) as it moves away from the optical axis, as shown in FIG. 5(a), you can adjust the distance between the optical units 2a and 2b to be longer. On the other hand, if you want to increase the divergence angle, and the light beam emitted from the optical unit 2b is directed outward (away from the optical axis) as it moves away from the optical axis, as shown in FIG. 5(b), you can adjust the distance between the optical units 2a and 2b to be shorter. Conversely, if you want to reduce the divergence angle, and the light beam emitted from optical unit 2b is directed inward (toward the optical axis) the further it is from the optical axis, as shown in Figure 5(a), you can adjust the distance between optical unit 2a and optical unit 2b to be shorter.If you want to reduce the divergence angle, and the light beam emitted from optical unit 2b is directed outward (away from the optical axis) the further it is from the optical axis, as shown in Figure 5(b), you can adjust the distance between optical unit 2a and optical unit 2b to be longer.

[0034] The relationship between the change in the distance between optical unit 2a and optical unit 2b and the change in the size and divergence angle of the light beam depends on the design values ​​(curvature, thickness) of optical unit 2, the optical path length from optical unit 2 including the routing optical system 3 to diffractive optical element 6, etc.

[0035] Next, a method for determining whether the light beam emitted from the optical unit 2b is emitted so as to face the inner side (the optical axis side) as it moves away from the optical axis or the outer side (the side away from the optical axis) will be described. The size of the light beam immediately after passing through the optical unit 2 can be calculated from the design values. Further, the size S0 of the light beam incident on the diffractive optical element 6 when the light beam is emitted from the optical unit 2 in parallel can be calculated from information such as the length of the transfer optical system 3. Also, let S be the size of the detected light beam incident on the diffractive optical element 6. When the relationship between the size S0 and the size S of the light beam satisfies Equation (1), it can be determined that the light beam emitted from the optical unit 2b is emitted so as to face the inner side (the optical axis side) as it moves away from the optical axis. On the other hand, when the relationship between the size S0 and the size S of the light beam satisfies Equation (2), it can be determined that the light beam emitted from the optical unit 2b is emitted so as to face the outer side (the side away from the optical axis) as it moves away from the optical axis. S < S0 ··· Equation (1) S > S0 ··· Equation (2)

[0036] Based on the determined result, the control unit 50 adjusts the divergence angle of the light beam incident on the diffractive optical element 6.

[0037] Conventionally, a monitoring type beam analysis module may be used to detect changes in the size and divergence angle of the light beam from the light source 1. However, providing a monitoring type beam analysis module in the exposure apparatus 100 has the problem that the apparatus becomes large. Therefore, the exposure apparatus 100 of the present embodiment does not provide a monitoring type beam analysis module, and detects and adjusts the size and divergence angle of the light beam from the light source 1 while reducing the size increase of the exposure apparatus 100.

[0038] 6 shows an example of the light intensity distribution formed on the Fourier transform surface 8. Graph 61, shown by a solid line, is the light intensity distribution formed on the Fourier transform surface 8 when the divergence angle of the light beam incident on the diffractive optical element 6 is within the allowable range. Graph 62, shown by a dashed line, is the light intensity distribution formed on the Fourier transform surface 8 when the divergence angle of the light beam incident on the diffractive optical element 6 is greater than the allowable range. When the divergence angle of the light beam incident on the diffractive optical element 6 is greater than the allowable range, as shown in graph 62, the effective light source distribution differs from the desired distribution, resulting in device differences in the shape of the effective light source and changes in the performance of the illumination optical system 60 over time.

[0039] In this embodiment, the aperture 9a is inserted when the detector 21 detects the light beam incident on the diffractive optical element 6. The aperture diameter of the aperture 9a is important in detecting and adjusting the angle and divergence angle of the light beam incident on the diffractive optical element 6. The aperture diameter of the aperture 9a is set so that the amount of light detected by the detector 21 decreases when the angle and divergence angle of the light beam incident on the diffractive optical element 6 are outside the allowable range. For example, the aperture diameter of the aperture 9a is set to be approximately the same as the width of the light intensity distribution formed on a predetermined surface (Fourier transform surface 8). If the aperture of the aperture 9a is too large or too small compared to the size of the light intensity distribution formed on the Fourier transform surface 8 by the diffractive optical element 6, the decrease in light intensity when the angle and divergence angle of the light beam incident on the diffractive optical element 6 are outside the allowable range will be small. Therefore, it becomes difficult to determine whether the angle and divergence angle of the light beam incident on the diffractive optical element 6 are outside the allowable range. Therefore, it is preferable that the aperture diameter of the diaphragm 9a is set to be approximately the same as the width of the light quantity distribution formed on a predetermined plane (Fourier transform plane 8).

[0040] In Figure 6, width 63 represents the opening diameter of diaphragm 9a. Because diaphragm 9a blocks part of the light beam, the amount of light when the angle and divergence angle of the light beam are larger than the allowable range is reduced compared to the amount of light when the angle and divergence angle of the light beam are within the allowable range. In other words, the amount of light in graph 62 is reduced compared to the amount of light in graph 61.

[0041] 7 shows an example of detecting the divergence angle of a light beam in this embodiment, and is an example of the amount of light detected by the detection unit 21 when the incident angle of the light beam incident on the diffractive optical element 6 is changed sequentially (changed multiple times). In the example of FIG. 7, the incident angle of the light beam incident on the diffractive optical element 6 is changed sequentially between −5 (mrad) and +5 (mrad).

[0042] In this embodiment, the detection unit 21 detects the amount of light while the angle of incidence at which the light beam is incident on the diffractive optical element 6 is sequentially changed. In Fig. 7, a graph 71 shown by a solid line indicates the amount of light detected by the detection unit 21 when the angle of incidence at which the light beam is incident on the diffractive optical element 6 is sequentially changed when the divergence angle of the light beam incident on the diffractive optical element 6 is within the allowable range. Also, in Fig. 7, a graph 72 shown by a dashed line indicates the amount of light detected by the detection unit 21 when the angle of incidence at which the light beam is incident on the diffractive optical element 6 is sequentially changed when the divergence angle of the light beam incident on the diffractive optical element 6 is greater than the allowable range. If the deviation in the angle of incidence is large, the amount of vignetting (light blocking) at the diaphragm 9a increases when the divergence angle of the light beam incident on the diffractive optical element 6 is greater than the allowable range, as shown in graph 72. As a result, the amount of light detected by the detecting unit 21 is smaller when the divergence angle of the light beam incident on the diffractive optical element 6 is larger than the allowable range as shown in graph 72 than when the divergence angle of the light beam incident on the diffractive optical element 6 is within the allowable range as shown in graph 71. Therefore, in this embodiment, the divergence angle of the light beam incident on the diffractive optical element 6 is detected and adjusted by utilizing the amount of light detected by the detecting unit 21 when the incident angle of the light beam incident on the diffractive optical element 6 is sequentially changed.

[0043] A specific method for detecting the divergence angle of a light beam incident on the diffractive optical element 6 using the light amount detected by the detection unit 21 will be described below. The light amount at the incident angle at which the light amount is maximum in the light amount (light amount distribution) detected by the detection unit 21 is set to 1 (100%). Then, a slice level is set, which is an arbitrary ratio of the light amount to the maximum light amount. In this embodiment, the slice level is set to 0.98 (98%).

[0044] Then, an angular slice width is calculated, which is the width between two points in the light intensity distribution where the ratio of the light intensity to the maximum light intensity (100%) is 0.98 (98%). In the example of FIG. 7 , an angular slice width 73 when the divergence angle of the light beam incident on the diffractive optical element 6 is within the allowable range as shown in graph 71 is larger than an angular slice width 74 when the divergence angle of the light beam incident on the diffractive optical element 6 is larger than the allowable range as shown in graph 72. In this way, the angular slice width in the light intensity (light intensity distribution) detected by the detecting unit 21 when the angle of incidence of the light beam incident on the diffractive optical element 6 is sequentially changed changes depending on the divergence angle of the light beam incident on the diffractive optical element 6. Specifically, when the divergence angle of the light beam incident on the diffractive optical element 6 is large, the angular slice width in the light intensity distribution detected by the detecting unit 21 becomes smaller, whereas when the divergence angle of the light beam incident on the diffractive optical element 6 is small, the angular slice width in the light intensity distribution detected by the detecting unit 21 becomes larger. Therefore, the angle of divergence of the light beam incident on the diffractive optical element 6 can be detected by calculating the angle slice width from the light intensity distribution obtained by the detection unit 21 detecting the light intensity while sequentially changing the incident angle at which the light beam is incident on the diffractive optical element 6.

[0045] 8 shows an example of detecting the size of a light beam in this embodiment, and is an example of the amount of light detected by the detection unit 21 when the incident position of the light beam incident on the diffractive optical element 6 is changed sequentially (changed multiple times). In the example of FIG. 8, the incident position of the light beam incident on the diffractive optical element 6 is changed sequentially between -5 (mm) and +5 (mm).

[0046] In this embodiment, the detection unit 21 detects the amount of light while the incident position of the light beam incident on the diffractive optical element 6 is sequentially changed. In FIG. 8 , a solid line graph 81 indicates the amount of light detected by the detection unit 21 when the incident position of the light beam incident on the diffractive optical element 6 is sequentially changed when the size of the light beam incident on the diffractive optical element 6 is within the allowable range. Also, a dashed line graph 82 in FIG. 8 indicates the amount of light detected by the detection unit 21 when the incident position of the light beam incident on the diffractive optical element 6 is sequentially changed when the size of the light beam incident on the diffractive optical element 6 is greater than the allowable range. Increasing the deviation of the incident position increases the amount of vignetting (light blocking) in the optical system subsequent to the diffractive optical element 6 when the size of the light beam incident on the diffractive optical element 6 is greater than the allowable range, as in graph 82. As a result, the amount of light detected by the detection unit 21 is smaller when the size of the light beam incident on the diffractive optical element 6 is greater than the allowable range, as in graph 82, than when the size of the light beam incident on the diffractive optical element 6 is within the allowable range, as in graph 81. Therefore, in this embodiment, the size of the light beam incident on the diffractive optical element 6 is detected and adjusted by utilizing the amount of light detected by the detection unit 21 when the incident position of the light beam incident on the diffractive optical element 6 is sequentially changed.

[0047] A specific method for detecting the size of a light beam incident on the diffractive optical element 6 using the light amount detected by the detection unit 21 will be described below. The light amount at the incident angle at which the light amount is maximum in the light amount (light amount distribution) detected by the detection unit 21 is set to 1 (100%). Then, a slice level is set, which is an arbitrary ratio of the light amount to the maximum light amount. In this embodiment, the slice level is set to 0.98 (98%).

[0048] Then, a position slice width is calculated, which is the width between two points in the light intensity distribution where the ratio of the light intensity to the maximum light intensity (100%) is 0.98 (98%). In the example of FIG. 8 , a position slice width 83 when the size of the light beam incident on the diffractive optical element 6 is within the allowable range as shown in graph 81 is larger than a position slice width 84 when the size of the light beam incident on the diffractive optical element 6 is larger than the allowable range as shown in graph 82. In this way, the position slice width in the light intensity (light intensity distribution) detected by the detecting unit 21 when the incident position of the light beam incident on the diffractive optical element 6 is sequentially changed changes depending on the size of the light beam incident on the diffractive optical element 6. Specifically, when the size of the light beam incident on the diffractive optical element 6 is large, the position slice width in the light intensity distribution detected by the detecting unit 21 becomes smaller, and when the size of the light beam incident on the diffractive optical element 6 is small, the position slice width in the light intensity distribution detected by the detecting unit 21 becomes larger. Therefore, the size of the light beam incident on the diffractive optical element 6 can be detected by determining the position slice width from the light intensity distribution obtained by the detection unit 21 detecting the light intensity while sequentially changing the incident position at which the light beam enters the diffractive optical element 6.

[0049] By adjusting the distance between the optical units 2a and 2b so that the position slice width and angle slice width obtained by the above-described method are within predetermined tolerance ranges, the size and divergence angle of the light beam incident on the diffractive optical element 6 can be adjusted.

[0050] 9 is a flowchart showing a method for adjusting the light beam incident on the diffractive optical element 6 in this embodiment. First, the control unit 50 adjusts (sets) the angle of the mirror 4, the position of the mirror 4, the position of the plane-parallel plate 5, and the spacing between the optical units 2 to their initial positions, and controls the diaphragm 9a to be placed on the optical path (S110). At this time, the diffractive optical elements 6 may be switched so that one of the multiple diffractive optical elements 6 for a small circular shape is placed on the optical path.

[0051] Next, the control unit 50 synchronously changes the angle of the mirror 4 in the A direction and the angle of the plane-parallel plate 5 in the D direction, controlling the sequential change of the incident angle so as to minimize the change in the incident position of the light beam incident on the diffractive optical element 6. When the incident angle is sequentially changed in this manner, the control unit 50 controls the detection unit 21 to detect the light intensity (S120, first detection step). Rotating the mirror 4 in the A direction shifts the incident position of the light beam incident on the diffractive optical element 6, causing a portion of the light beam to be eclipsed by the diffractive optical element 6, reducing the amount of light detected by the detection unit 21. Therefore, the shift in the incident position of the light beam incident on the diffractive optical element 6, which is caused by rotating the mirror 4 in the A direction, is reduced by rotating the plane-parallel plate 5 in the D direction. When the incident angle incident on the diffractive optical element 6 is sequentially changed, the detection unit 21 detects (measures) the light intensity at each of the sequentially changed incident angles.

[0052] Next, the control unit 50 determines the angle of the mirror 4 in the direction A based on the detection result of step S120, and controls the mirror 4 to be adjusted to the determined angle (S130, first adjustment step). For example, the control unit 50 determines the angle at which the light amount detected by the detection unit 21 in the first detection step is the maximum as the angle of the mirror 4 in the direction A. Alternatively, the control unit 50 determines the center angle of two angles at which the light amount is, for example, 0.98 (98%) of the maximum light amount 1 (100%) of the light amount detected by the detection unit 21 in the first detection step as the angle of the mirror 4 in the direction A. The control unit 50 may also control the mirror 4 to notify the user of the determined angle of incidence (the angle of the mirror 4 in the direction A). This notification can be performed, for example, by displaying the information on a display (not shown).

[0053] Next, the control unit 50 synchronizes the angle of the mirror 4 in the B direction and the position of the mirror 4 in the C direction, controlling the sequential change of the incident angle so as to minimize the change in the incident position of the light beam incident on the diffractive optical element 6. When the incident angle is sequentially changed in this manner, the control unit 50 controls the detection unit 21 to detect the light intensity (S140, second detection step). Rotating the mirror 4 in the B direction shifts the incident position of the light beam incident on the diffractive optical element 6, resulting in a partial vignetting of the light beam by the diffractive optical element 6 and a decrease in the light intensity detected by the detection unit 21. Therefore, the shift in the incident position of the light beam incident on the diffractive optical element 6 caused by rotating the mirror 4 in the B direction is reduced by adjusting the position of the mirror 4 in the C direction. When the incident angle incident on the diffractive optical element 6 is sequentially changed, the detection unit 21 detects (measures) the light intensity at each sequentially changed incident angle. The detection results in steps S120 and S140 are stored in memory 52.

[0054] Next, the control unit 50 determines the angle of the mirror 4 in the direction B based on the detection result of step S140, and controls the mirror 4 to be adjusted to the determined angle (S150, second adjustment step). For example, the control unit 50 determines the angle at which the light amount detected by the detection unit 21 in the second detection step is maximized as the angle of the mirror 4 in the direction B. Alternatively, the control unit 50 determines the center angle of two angles at which the light amount is, for example, 0.98 (98%) of the maximum light amount 1 (100%) of the light amount detected by the detection unit 21 in the first detection step as the angle of the mirror 4 in the direction B. The control unit 50 may also control the mirror 4 to notify the user of the determined angle of incidence (the angle of the mirror 4 in the direction B). This notification can be performed, for example, by displaying the information on a display (not shown). The processing of steps S120 to S150 determines (adjusts) the angle of incidence of the light beam incident on the diffractive optical element 6.

[0055] Next, the control unit 50 changes the position of the mirror 4 in the C direction to sequentially change the incident position of the light beam incident on the diffractive optical element 6, and controls the detection unit 21 to detect the light amount (S160, third detection step). When the incident position on the diffractive optical element 6 is sequentially changed, the detection unit 21 detects (measures) the light amount at each of the sequentially changed incident positions.

[0056] Next, the control unit 50 determines the position of the mirror 4 in the C direction based on the detection result of step S160, and controls the mirror 4 to be adjusted to the determined position (S170, third adjustment step). For example, the control unit 50 determines the position where the light amount detected by the detection unit 21 in the third detection step is the maximum as the position of the mirror 4 in the C direction. Alternatively, the control unit 50 determines the center position of two positions where the light amount detected by the detection unit 21 in the third detection step is, for example, 0.98 (98%) of the maximum light amount 1 (100%) as the position of the mirror 4 in the C direction. The control unit 50 may also control the mirror 4 to notify the user of the determined incident position (the position of the mirror 4 in the C direction). This notification can be performed, for example, by displaying the information on a display (not shown).

[0057] Next, the control unit 50 changes the angle of the plane-parallel plate 5 in the D direction to sequentially change the incident position of the light beam incident on the diffractive optical element 6, and controls the detection unit 21 to detect the light amount (S180, fourth detection step). When the incident position on the diffractive optical element 6 is sequentially changed, the detection unit 21 detects (measures) the light amount at each of the sequentially changed incident positions. In addition, the detection results in steps S160 and S180 are stored in memory 52.

[0058] Next, the control unit 50 determines the angle of the plane-parallel plate 5 in the D direction based on the detection result of step S180, and controls the adjustment of the angle of the plane-parallel plate 5 to the determined angle (S190, fourth adjustment step). For example, the control unit 50 determines the angle at which the light amount detected by the detection unit 21 in the fourth detection step is the maximum as the angle of the plane-parallel plate 5 in the D direction. Alternatively, the control unit 50 determines the center angle between two angles at which the light amount is, for example, 0.98 (98%) of the maximum light amount 1 (100%) of the light amount detected by the detection unit 21 in the fourth detection step as the angle of the plane-parallel plate 5 in the D direction. The control unit 50 may also control the user to be notified of the determined incident position (angle of the plane-parallel plate 5 in the D direction). This notification can be performed, for example, by displaying it on a display (not shown). The incident position of the light beam incident on the diffractive optical element 6 is determined (adjusted) by the processing of steps S160 to S190.

[0059] Next, the control unit 50 determines whether the size and divergence angle of the light beam incident on the diffractive optical element 6 are within a predetermined tolerance range based on the detection results obtained in the first to fourth detection steps (S200, determination step). Specifically, based on a predetermined slice level, the control unit 50 calculates an angular slice width A from the light intensity distribution obtained in the first detection step and an angular slice width B from the light intensity distribution obtained in the second detection step. Also, based on the predetermined slice level, the control unit 50 calculates a position slice width C from the light intensity distribution obtained in the third detection step and a position slice width D from the light intensity distribution obtained in the fourth detection step. Then, the control unit 50 determines whether the angular slice width A, the angular slice width B, the position slice width C, and the position slice width D are each within a predetermined tolerance range. Determining whether the angular slice width A and the angular slice width B are within the tolerance range is the same as determining whether the divergence angle of the light beam incident on the diffractive optical element 6 is within the tolerance range. Furthermore, determining whether the position slice width C and the position slice width D are within the allowable range is the same as determining whether the size of the light beam incident on the diffractive optical element 6 is within the allowable range. The control unit 50 is a determination unit that determines whether the size and divergence angle of the light beam incident on the diffractive optical element 6 are within the allowable range.

[0060] If it is determined in the determination process of step S200 that the size and divergence angle of the light beam incident on the diffractive optical element 6 are within the predetermined tolerance range, the process ends. If it is determined in the determination process of step S200 that the size and divergence angle of the light beam incident on the diffractive optical element 6 are not within the predetermined tolerance range, the optical unit 2 is adjusted (S210, fifth adjustment process), and the process returns to step S120. In the fifth adjustment process, the control unit 50 controls the adjustment unit 30 to adjust the distance between the optical units 2a and 2b so that the size and divergence angle of the light beam incident on the diffractive optical element 6 are within the predetermined tolerance range. Specifically, the control unit 50 adjusts the distance between the optical units 2a and 2b based on the detection results of the angular slice width A, the angular slice width B, the position slice width C, and the position slice width D. This adjustment is performed to ensure that the angular slice width A, the angular slice width B, the position slice width C, and the position slice width D are within the tolerance range. The relationship between the amount of change in the distance between optical unit 2a and optical unit 2b and the amount of change in the size and divergence angle of the light beam depends on the design values ​​(curvature, thickness) of optical unit 2, the optical path length from optical unit 2 including the routing optical system 3 to diffractive optical element 6, etc. Therefore, optical unit 2 is adjusted taking these conditions into consideration.

[0061] In this embodiment, a monitor-type beam analysis module is not provided, and a detection unit 21 (for example, a simple light amount detection sensor) capable of detecting the amount of light is used to adjust the size and divergence angle of the light beam by sequentially changing the angle of incidence or the position of incidence of the light beam incident on the diffractive optical element 6. Therefore, with a simple configuration, it is possible to detect and adjust the size and divergence angle of the light beam from the light source 1 while reducing the size of the exposure apparatus 100.

[0062] 1 may further include an optical integrator on the light source 1 side of the diffractive optical element 6. Even if the characteristics of the light beam from the light source 1 vary within the allowable angle range of the optical integrator, the light beam will be incident on the diffractive optical element 6 with a constant angular distribution. When such an optical integrator is included, it is not necessary to adjust the divergence angle of the light beam incident on the diffractive optical element 6.

[0063] Second Embodiment This embodiment relates to a method for manufacturing an article, characterized in that the article is manufactured using the exposure apparatus 100 described above.

[0064] 10 is a flowchart showing the method for manufacturing an article according to this embodiment. First, a detection step (S310) is performed in which the incident position or incident angle of the light beam incident on the diffractive optical element (first optical element) 6 included in the illumination optical system 60, which illuminates the original with light from a light source, is changed multiple times, and the amount of light of the light beam that has passed through the diffractive optical element 6 is detected.

[0065] Next, an adjustment step (S320) is performed to adjust the size and divergence angle of the light beam incident on the diffractive optical element 6 based on the detection results of the detection step. After the adjustment step, a formation step (S330) is performed to form a pattern on the substrate 20 using the illumination optical system 60. Then, a manufacturing step (S340) is performed to manufacture an article from the substrate 20 on which the pattern has been formed in the formation step.

[0066] Products manufactured by this manufacturing method include, for example, semiconductor IC elements, liquid crystal display elements, color filters, MEMS, and the like.

[0067] In the forming step, for example, a substrate (silicon wafer, glass plate, etc.) coated with a photosensitive material is exposed by an exposure apparatus (lithography apparatus) to form a pattern on the substrate.

[0068] The manufacturing process includes, for example, developing a substrate (photosensitive material) on which a pattern has been formed, etching the developed substrate, removing the resist, dicing, bonding, and packaging. This manufacturing method makes it possible to manufacture products of higher quality than conventional methods.

[0069] The disclosure of the present specification includes the following exposure apparatus, adjustment method, and article manufacturing method.

[0070] [Item 1] an illumination optical system that illuminates the original with light from a light source; a detection unit that detects the amount of light, The illumination optical system includes: a first optical element provided in an optical path between the light source and the original; a changer that can change at least one of an incident position and an incident angle of a light beam incident on the first optical element; an optical unit capable of changing the size and divergence angle of a light beam incident on the first optical element; the detecting unit detects the amount of light of the light beam that has passed through the first optical element each time the incident position or the incident angle of the light beam that is incident on the first optical element is changed a plurality of times by the changing unit; adjusting the size and divergence angle of the light beam incident on the first optical element by the optical unit based on the detection result of the detection unit; An exposure apparatus characterized by:

[0071] [Item 2] the optical unit includes a second optical element and a third optical element; 2. The exposure apparatus according to item 1, wherein the distance between the second optical element and the third optical element is adjusted based on the detection result of the detection unit.

[0072] [Item 3] 3. The exposure apparatus according to item 2, further comprising an adjustment unit that can adjust the distance between the second optical element and the third optical element.

[0073] [Item 4] The exposure apparatus described in item 3, characterized in that the adjustment unit adjusts the distance between the second optical element and the third optical element to be shorter when increasing the size of the light beam incident on the first optical element, and adjusts the distance between the second optical element and the third optical element to be longer when decreasing the size of the light beam incident on the first optical element.

[0074] [Item 5] 5. The exposure apparatus according to any one of items 1 to 4, wherein the detection result is a distribution of light amounts detected when the incident position or the incident angle is changed multiple times, and the optical unit is adjusted based on the width of the distribution.

[0075] [Item 6] 6. The exposure apparatus according to item 5, wherein the width is a width between two points in the distribution when the amount of light is a predetermined value.

[0076] [Item 7] 7. The exposure apparatus according to any one of items 1 to 6, wherein the optical unit is a beam expander.

[0077] [Item 8] 5. The exposure apparatus according to any one of items 2 to 4, wherein the second optical element is an optical element having a negative refractive power, and the third optical element is an optical element having a positive refractive power.

[0078] [Item 9] 9. The exposure apparatus according to any one of items 1 to 8, wherein the first optical element is a diffractive optical element including at least one of a computer-generated hologram designed by a computer, a diffuser plate capable of diffusing a light beam, and a metalens.

[0079] [Item 10] a focusing optical system that focuses the light beam from the first optical element; a stop disposed near a surface on which the light beam is focused by the focusing optical system; The exposure apparatus according to any one of items 1 to 9, characterized in that the amount of light detected by the detection unit when the divergence angle of the light beam incident on the first optical element is larger than a predetermined tolerance range is reduced by the aperture compared to the amount of light detected by the detection unit when the divergence angle of the light beam incident on the first optical element is within a predetermined tolerance range.

[0080] [Item 11] 11. The exposure apparatus according to any one of items 1 to 10, further comprising a determination unit that determines the size of the light beam incident on the first optical element based on the detection result of the detection unit when the incident position of the light beam incident on the first optical element is changed.

[0081] [Item 12] 12. The exposure apparatus according to any one of items 1 to 11, further comprising a determination unit that determines the divergence angle of the light beam incident on the first optical element based on the detection result of the detection unit when the incident angle of the light beam incident on the first optical element is changed.

[0082] [Item 13] 13. The exposure apparatus according to any one of items 1 to 12, wherein the detection result is information obtained when adjusting the incident position and incident angle of the light beam incident on the first optical element.

[0083] [Item 14] a mirror that guides light from the light source to the first optical element; a plane-parallel plate provided in an optical path between the mirror and the first optical element, The change unit a first change mechanism that changes the angle of the mirror; a second change mechanism for adjusting the position of the mirror; 14. The exposure apparatus according to any one of items 1 to 13, further comprising: a third change mechanism that adjusts the angle of the plane-parallel plate.

[0084] [Item 15] 1. A method for adjusting an illumination optical system that illuminates an original with light from a light source, comprising: a detecting step of detecting the amount of light of the light beam that has passed through a first optical element included in the illumination optical system when the incident position or the incident angle of the light beam that is incident on the first optical element is changed a plurality of times; an adjusting step of adjusting the size and divergence angle of the light beam incident on the first optical element based on the detection result of the detecting step; An adjustment method comprising:

[0085] [Item 16] Item 16. The adjustment method according to item 15, wherein the adjustment in the adjustment step is adjustment of an optical unit arranged closer to the light source than the first optical element.

[0086] [Item 17] Item 17. The adjustment method according to item 15 or 16, further comprising a determination step of determining whether or not the size and divergence angle of the light beam incident on the first optical element are within a predetermined tolerance range based on the detection result obtained in the detection step.

[0087] [Item 18] 18. The adjustment method according to any one of items 15 to 17, wherein the detection result obtained in the detection step is also used to adjust the incident position or incident angle of the light beam incident on the first optical element.

[0088] [Item 19] a detection step of detecting the amount of light of a light beam that has passed through a first optical element included in an illumination optical system that illuminates an original with light from a light source, when the incident position or incident angle of the light beam that is incident on the first optical element is changed a plurality of times; an adjusting step of adjusting the size and divergence angle of the light beam incident on the first optical element based on the detection result of the detecting step; a forming step of forming a pattern on a substrate using the illumination optical system after the adjusting step; a manufacturing process for manufacturing an article from the substrate on which the pattern is formed in the forming process; A method for manufacturing an article, comprising:

[0089] The invention is not limited to the above-described embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the following claims are appended to apprise the public of the scope of the invention.

Claims

1. an illumination optical system that illuminates the original with light from a light source; a detection unit that detects the amount of light, The illumination optical system includes: a first optical element provided in an optical path between the light source and the original; a changer that can change at least one of an incident position and an incident angle of a light beam incident on the first optical element; an optical unit capable of changing the size and divergence angle of a light beam incident on the first optical element, the detecting unit detects the amount of light of the light beam that has passed through the first optical element each time the incident position or the incident angle of the light beam that is incident on the first optical element is changed a plurality of times by the changing unit; adjusting the size and divergence angle of the light beam incident on the first optical element by the optical unit based on the detection result of the detection unit; An exposure apparatus characterized by:

2. the optical unit includes a second optical element and a third optical element; 2. The exposure apparatus according to claim 1, wherein the distance between the second optical element and the third optical element is adjusted based on the detection result of the detection unit.

3. 3. The exposure apparatus according to claim 2, further comprising an adjustment unit that can adjust the distance between the second optical element and the third optical element.

4. 4. The exposure apparatus according to claim 3, wherein the adjustment unit adjusts the distance between the second optical element and the third optical element to be shorter when increasing the size of the light beam incident on the first optical element, and adjusts the distance between the second optical element and the third optical element to be longer when decreasing the size of the light beam incident on the first optical element.

5. 2. The exposure apparatus according to claim 1, wherein the detection result is a distribution of light amounts detected when the incident position or the incident angle is changed multiple times, and the optical unit is adjusted based on the width of the distribution.

6. 6. An exposure apparatus according to claim 5, wherein the width is a width between two points in the distribution when the amount of light is a predetermined value.

7. 2. The exposure apparatus according to claim 1, wherein the optical unit is a beam expander.

8. 3. The exposure apparatus according to claim 2, wherein the second optical element is an optical element having a negative refractive power, and the third optical element is an optical element having a positive refractive power.

9. 2. The exposure apparatus according to claim 1, wherein the first optical element is a diffractive optical element including at least one of a computer-generated hologram designed by a computer, a diffuser plate capable of diffusing a light beam, and a metalens.

10. a focusing optical system that focuses the light beam from the first optical element; a stop disposed near a surface on which the light beam is focused by the focusing optical system; 2. The exposure apparatus according to claim 1, wherein the aperture causes the amount of light detected by the detection unit when the divergence angle of the light beam incident on the first optical element is greater than a predetermined tolerance range to be reduced compared to the amount of light detected by the detection unit when the divergence angle of the light beam incident on the first optical element is within a predetermined tolerance range.

11. 2. The exposure apparatus according to claim 1, further comprising a determination unit that determines the size of the light beam incident on the first optical element based on the detection result of the detection unit when the incident position of the light beam incident on the first optical element is changed.

12. 2. The exposure apparatus according to claim 1, further comprising a determination unit that determines the divergence angle of the light beam incident on the first optical element based on the detection result of the detection unit when the incident angle of the light beam incident on the first optical element is changed.

13. 2. The exposure apparatus according to claim 1, wherein the detection result is information obtained when adjusting the incident position and incident angle of the light beam incident on the first optical element.

14. a mirror that guides light from the light source to the first optical element; a plane-parallel plate provided in an optical path between the mirror and the first optical element, The change unit a first change mechanism for changing the angle of the mirror; a second change mechanism for adjusting the position of the mirror; 2. The exposure apparatus according to claim 1, further comprising: a third change mechanism that adjusts the angle of the plane-parallel plate.

15. 1. A method for adjusting an illumination optical system that illuminates an original with light from a light source, comprising: a detecting step of detecting the amount of light of the light beam that has passed through a first optical element included in the illumination optical system when the incident position or the incident angle of the light beam that is incident on the first optical element is changed a plurality of times; an adjusting step of adjusting the size and divergence angle of the light beam incident on the first optical element based on the detection result of the detecting step; An adjustment method comprising:

16. 16. The adjusting method according to claim 15, wherein the adjustment in the adjusting step is adjustment of an optical unit that is disposed closer to the light source than the first optical element.

17. 16. The adjustment method according to claim 15, further comprising a determination step of determining whether or not a size and a divergence angle of the light beam incident on the first optical element are within a predetermined tolerance range based on the detection result obtained in the detection step.

18. 16. The adjustment method according to claim 15, wherein the detection result obtained in the detection step is also used to adjust the incident position or incident angle of the light beam incident on the first optical element.

19. a detection step of detecting the amount of light of a light beam that has passed through a first optical element included in an illumination optical system that illuminates an original with light from a light source, when the incident position or incident angle of the light beam that is incident on the first optical element is changed a plurality of times; an adjusting step of adjusting the size and divergence angle of the light beam incident on the first optical element based on the detection result of the detecting step; a forming step of forming a pattern on a substrate using the illumination optical system after the adjusting step; a manufacturing process for manufacturing an article from the substrate on which the pattern is formed in the forming process; A method for manufacturing an article, comprising:

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