Antireflection film

The anti-reflection film addresses flickering and visibility issues in high-definition displays by using a hard coat layer with reactive nanosilica and hydrophobic silica, and a low refractive index layer with hollow nanosilica, achieving improved visibility and fingerprint resistance.

JP2025130116APending Publication Date: 2025-09-08AICA KOGYO CO LTD
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Patent Information

Application Number
JP2024027073
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-02-27
Publication Date
2025-09-08

AI Technical Summary

Technical Problem

Existing anti-glare films for high-definition displays suffer from significant flickering due to diffuse reflection of image light, impairing visibility, and there is a demand for improved visibility, anti-reflection properties, and fingerprint resistance.

Method used

An anti-reflection film comprising a hard coat layer with reactive nanosilica and hydrophobic silica, and a low refractive index layer with hollow nanosilica and nano-inorganic fine particles, optimized for haze and refractive index to reduce reflection and enhance visibility and fingerprint resistance.

Benefits of technology

The film provides good visibility, low fingerprint recognizability, and effective anti-reflection properties, suitable for touch panels.

✦ Generated by Eureka AI based on patent content.

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Abstract

To provide an antireflection film that excels in texture and low fingerprint recognition, and has good visibility and antireflection characteristic.SOLUTION: The antireflection film is characterized in that a hard coat layer and a low refractive index layer are laminated in the order stated on a base film having light permeability, that the hard coat layer includes a reactive nano-silica and hydrophobic silica as essential components, and the average grain size of the hydrophobic silica is 1 to 5 μm and 1.1 to 2.0 times the thickness of the hard coat layer, and that the low refractive index layer includes, as essential components, hollow nano-silica, a nano-inorganic particulate, and a leveling agent, and the haze of the laminate is 30-60%.SELECTED DRAWING: None
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Description

[Technical Field]

[0001] The present invention relates to an antireflection film in which a hard coat layer and a low refractive index layer are laminated. [Background technology]

[0002] In recent years, touch panels, which combine display devices and input means, have come to be used in a wide range of fields. Typical examples of touch panels include car navigation systems and smartphones, which use anti-glare film with finely textured surfaces to improve image visibility. These films scatter reflected light from fluorescent lights and sunlight, making glare less noticeable.

[0003] The applicant previously invented an anti-glare film suitable for such applications, which was prepared by curing a resin composition containing a multifunctional (meth)acrylate, a fluorine-modified resin with a specific structure, translucent fine particles, and two or more types of leveling agents (Patent Document 1). This invention was excellent in that it was less susceptible to fingerprints and less prone to diffuse reflection of external light, resulting in excellent visibility. However, in the case of high-definition displays with a significantly increased number of pixels compared to conventional displays, using existing anti-glare films has become apparent, resulting in significant flickering caused by diffuse reflection of image light, significantly impairing image visibility. There has also been a strong demand for fingerprint resistance.

[0004] In addition to the demand for improved visibility against such flickering, there has recently been a growing demand for further improvement in visibility by adding anti-reflection properties that reduce reflection from external light sources such as fluorescent lights. There was room for improvement in order to realize a hard coat film that combines high definition, low flickering, good visibility, excellent fingerprint resistance (low fingerprint recognizability), and anti-reflection performance. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Patent No. 5602999 Summary of the Invention [Problem to be solved by the invention]

[0006] An object of the present invention is to provide an anti-reflection film that has excellent feel and low fingerprint visibility, as well as good visibility and anti-reflection properties. [Means for solving the problem]

[0007] In order to solve the above problems, the invention of claim 1 provides an anti-reflection film comprising a hard coat layer and a low refractive index layer laminated in this order on a light-transmitting substrate film, the hard coat layer containing reactive nanosilica (A) and hydrophobic silica (B) as essential components, the average particle diameter of (B) being 1 to 5 μm and 1.1 to 2.0 times the thickness of the hard coat layer, the low refractive index layer containing hollow nanosilica (C), nano-inorganic fine particles (D) (excluding (A) and (C)), and a leveling agent (E) as essential components, and the haze of the laminate being 30 to 60%.

[0008] A second aspect of the present invention provides the anti-reflection film according to the first aspect, characterized in that the blending amount of (A) is 10 to 30% by weight based on the total amount of the hard coat layer.

[0009] A third aspect of the present invention provides the antireflection film according to either the first or second aspect, characterized in that the average particle size of (A) is 1 to 100 nm.

[0010] A fourth aspect of the present invention provides the anti-reflection film according to either the first or second aspect, characterized in that the hard coat layer further contains a leveling agent.

[0011] The invention of claim 5 provides the antireflection film according to either one of claims 1 or 2, characterized in that the blending amount of (D) is 1.0 to 15.0% by weight based on the total amount of the low refractive index layer. [Effects of the Invention]

[0012] The anti-reflection film of the present invention has a good feel and low fingerprint recognizability, as well as good visibility and anti-reflection properties, and is therefore useful as an anti-reflection film for use on the surface of a touch panel. BEST MODE FOR CARRYING OUT THE INVENTION

[0013] The anti-reflection film of the present invention comprises a substrate film and a hard coat layer (hereinafter referred to as an HC layer) and a low refractive index layer (hereinafter referred to as a low refractive index layer) laminated in this order. The HC layer contains reactive nanosilica (A) and hydrophobic silica (B) as essential components, and the low refractive index layer contains hollow nanosilica (C), nano-inorganic fine particles (D), and a leveling agent (E). In this specification, (meth)acrylate includes both acrylate and methacrylate.

[0014] The HC layer of the present invention is formed by curing an HC resin composition (hereinafter referred to as HC resin) containing reactive nanosilica (A) and hydrophobic silica (B) as essential components. The curing method is not particularly limited, and examples include ultraviolet curing, electron beam curing, and heat curing, but ultraviolet curing is preferred from the viewpoints of productivity and versatility.

[0015] The reactive nanosilica (A) used in the present invention is formulated for the purpose of improving pencil hardness. It is surface-treated with a reactive functional group that can suppress silica particle shedding from the cured coating by chemical bonding with the binder component. Treatment with a reactive functional group also has the effect of reducing tack and stabilizing it. Specific functional groups include acrylic groups, methacrylic groups, epoxy groups, isocyanate groups, and vinyl groups. Among these, nanosilica with (meth)acrylic groups is preferred because of its good reactivity and easy availability, and nanosilica with methacrylic groups is even more preferred.

[0016] The average particle size of the (A) is preferably 1 to 100 nm, more preferably 3 to 50 nm, and particularly preferably 5 to 30 nm. By making it 1 nm or more, it is possible to expect an improvement in pencil hardness, and by making it 100 nm or less, it is possible to reduce the influence on optical properties. The average particle size is determined by the specific surface area (m 2 ) is the value calculated from

[0017] The blending amount of (A) is preferably 10 to 30% by weight, more preferably 15 to 25% by weight, and particularly preferably 16 to 24% by weight, based on the total solid content of the HC resin (total amount of the HC layer). By making it 10% by weight or more, sufficient pencil hardness can be ensured, and by making it 30% by weight or less, sufficient optical properties can be ensured.

[0018] The hydrophobic silica (B) used in the present invention is incorporated to form irregularities on the surface of the cured layer, diffusely reflecting incident light, reducing glare from external light sources, and improving visibility. The average particle size used is 1.0 to 5.0 μm, preferably 1.5 to 4.0 μm. The average particle size is 1.1 to 2.0 times the thickness of the HC layer, preferably 1.15 to 1.8 times, and more preferably 1.2 to 1.6 times. If the average particle size is less than 1.0 μm, the surface irregularities may not be formed properly, resulting in reduced anti-glare properties. If the average particle size is greater than 5.0 μm, the irregularities become too large, and the structure acts as a lens, causing uneven brightness and increasing the risk of flickering. The tactile feel also tends to be reduced. The average particle size is the median diameter (d=50) measured by the laser diffraction / scattering method in accordance with JIS Z 8825-1 after dispersing the silica in MEK at 10% solids.

[0019] The blending amount of (B) is preferably 0.5 to 5.0% by weight, more preferably 1.0 to 4.0% by weight, and particularly preferably 1.2 to 3.5% by weight, based on the total of (A) and (B) contained in the HC resin composition. By making it 0.5% by weight or more, sufficient antiglare properties can be ensured, and by making it 5.0% by weight or less, sufficient total light transmittance can be ensured.

[0020] The binder used in the HC resin of the present invention is preferably an ultraviolet-curable resin. Examples of oligomers include acrylic resin binders such as urethane (meth)acrylate (hereinafter referred to as ureac), epoxy (meth)acrylate, polyester (meth)acrylate, polycarbonate (meth)acrylate, acrylic (meth)acrylate, and diene (meth)acrylate, and these can be used alone or in combination of two or more. Among these, it is preferable to use a polyfunctional urethane (meth)acrylate (hereinafter referred to as polyfunctional ureac) because of its high reactivity and low shrinkage upon curing.

[0021] The polyfunctional urea preferably contained in the HC resin has excellent scratch resistance due to the cohesive force of hydrogen bonds derived from urethane bonds. For example, it can be obtained by reacting a polyisocyanate with a (meth)acrylate having a hydroxyl group. Examples of polyisocyanates that can be used include hexamethylene diisocyanate (hereinafter referred to as HDI), isophorone diisocyanate, diphenylmethane diisocyanate, tolylene diisocyanate, dicyclohexylmethane-4,4'-diisocyanate, hydrogenated xylylene diisocyanate, methylcyclohexylene diisocyanate, HDI isocyanurate, and IPDI isocyanurate. These may be used alone or in combination of two or more. Among these, aliphatic and alicyclic diisocyanates are preferred because they have high weather resistance and are resistant to yellowing. HDI, which has high stretchability, is particularly preferred.

[0022] Examples of (meth)acrylates having a hydroxyl group used in the synthesis reaction of the polyfunctional urea include, for example, bifunctional trimethylolpropane di(meth)acrylate, glycerin di(meth)acrylate, pentaerythritol di(meth)acrylate, diglycerin di(meth)acrylate, ditrimethylolpropane di(meth)acrylate, and dipentaerythritol di(meth)acrylate, and trifunctional or higher functional diglycerin tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol tetra(meth)acrylate, and dipentaerythritol penta(meth)acrylate. Among these, the trifunctional, highly curable pentaerythritol triacrylate (hereinafter referred to as PETA) is preferred.

[0023] A low molecular weight binder may be used as a component other than the oligomer. Examples include (meth)acrylates and acrylamide compounds having aliphatic, alicyclic, or polyether skeletons, or functional groups such as hydroxyl groups and amino groups, which can be used alone or in combination of two or more. Regarding the number of functional groups, polyfunctionality is preferred in terms of reactivity. Examples include pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate (hereinafter referred to as DPHA).

[0024] When the HC layer of the present invention is formed from an ultraviolet-curable HC resin, it is preferable to use a photopolymerization initiator. Photopolymerization initiators generate radicals when irradiated with ultraviolet light or an electron beam, and these radicals trigger a polymerization reaction. General-purpose photopolymerization initiators such as benzyl ketal, acetophenone, and phosphine oxide can be used. By arbitrarily selecting the light absorption wavelength of the polymerization initiator, it is possible to impart curability over a wide wavelength range from the ultraviolet region to the visible light region. Specifically, benzyl ketals include 2,2-dimethoxy-1,2-diphenylethan-1-one, α-hydroxyacetophenones include 1-hydroxy-cyclohexyl-phenyl-ketone and 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propan-1-one, α-aminoacetophenones include 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one, and acylphosphine oxides include 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide and bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, and these can be used alone or in combination of two or more.

[0025] Among these, α-hydroxyacetophenone-based initiators that are less likely to yellow are preferred. The amount of the photopolymerization initiator blended is preferably 1 to 10 parts by weight, more preferably 3 to 8 parts by weight, per 100 parts by weight of the radically polymerizable component in the resin composition.

[0026] If necessary, a leveling agent (E), an ultraviolet absorber, an antioxidant, an adhesion promoter, a bluing agent, an antifoaming agent, a thickener, an anti-suspending agent, an antistatic agent, an antibacterial agent, organic fine particles, etc. may be added to the HC resin of the present invention within a range that does not impair the performance.

[0027] The (E) is blended to orient on the coating surface during the coating film curing process, uniformize the surface tension of the coating film, and prevent defects such as cissing, dents, pinholes, and keratinoids. Examples include acrylic compounds and acrylic resins such as modified polyacrylates, vinyl compounds having a double bond in the molecular skeleton, silicone compounds having an alkyloxysilyl group and / or a polysiloxane skeleton, fluorine compounds having a fluorinated alkyl group and / or a fluorinated phenyl group, and fluorine silicone compounds. Among these, fluorine compounds are preferred because of their strong ability to reduce surface tension.

[0028] The HC resin of the present invention preferably contains (E) because it can improve the appearance of the coating film. The amount of (E) added is preferably 0.1 to 1.0% by weight, more preferably 0.2 to 0.8% by weight, based on the total solid content of the HC resin (total amount of the HC layer).

[0029] The low refractive index layer of the present invention is formed by curing a low refractive index resin composition (hereinafter referred to as low refractive index resin) containing hollow nanosilica (C), nano-inorganic fine particles (D), and a leveling agent (E) as essential components. The curing method is not particularly limited, and examples thereof include ultraviolet curing, electron beam curing, and heat curing, but ultraviolet curing is preferred from the viewpoint of productivity and versatility.

[0030] The hollow nanosilica (C) used in the present invention is blended for the purpose of lowering the refractive index of the low refractive index layer. These silica particles have air-filled cavities with a refractive index of 1 inside, and can lower the refractive index of the low refractive index layer while maintaining its coating strength. While the refractive index of solid silica particles is about 1.45, the refractive index of (C) decreases as the occupancy rate of the internal cavities increases, to about 1.20 to 1.40.

[0031] The primary particle diameter of (C) is preferably 5 to 150 nm, more preferably 10 to 100 nm, and particularly preferably 40 to 80 nm. By setting it within this range, good dispersibility can be obtained without impairing the transparency of the low refractive index layer. In particular, if it is 40 to 80 nm, the void occupancy rate can be increased to lower the refractive index while ensuring a shell thickness that does not result in insufficient strength. An example of a commercially available product is Sururia 4320 (trade name: manufactured by JGC Catalysts and Chemicals, solid content 20%, average primary particle diameter 60 nm).

[0032] The amount of (C) in the low refractive index resin is preferably 40 to 60% by weight, more preferably 45 to 55% by weight, based on the total solid content. By making it 40% by weight or more, it is possible to sufficiently reduce the minimum reflectance and ensure sufficient total light transmittance, and by making it 60% by weight or less, it is possible to ensure sufficient scratch resistance.

[0033] The nano-inorganic fine particles (D) used in the present invention are blended for the purpose of increasing the hardness of the cured layer and improving scratch resistance. Examples include tin oxide, indium oxide, antimony oxide, alumina, titania, zirconia, etc., which can be used alone or in combination of two or more. Among these, alumina is preferred because it has a high effect of improving scratch resistance and is easily available.

[0034] The average primary particle size of (D) is preferably 1 to 100 nm, more preferably 5 to 50 nm, and particularly preferably 10 to 30 nm. By making it 1 nm or more, improved scratch resistance can be expected, and by making it 100 nm or less, sufficient total light transmittance can be ensured without increasing haze.

[0035] The blending amount of (D) in the low refractive index layer is preferably 1.0 to 15.0 wt % of the total solid content, more preferably 1.5 to 12.0 wt %, and particularly preferably 2.0 to 10.0 wt %. By making it 1.0 wt % or more, improved scratch resistance can be expected, and by making it 15.0 wt % or less, reflectance can be kept sufficiently low. Commercially available products include ALMIBK30WT%-M47 (trade name: CIK Nanotech Co., Ltd., solid content 30%, average particle size 20 nm).

[0036] The leveling agent (E) used in the low-refractive index resin is blended to improve the leveling properties during coating and to improve the slip properties of the cured layer, thereby improving scratch resistance. Examples of (E) include the aforementioned silicone-based, fluorine-based, and fluorine-silicone-based compounds, which can be used alone or in combination of two or more. Among these, fluorine-based compounds are preferred because they have low surface free energy and therefore tend to segregate on the coating surface after coating and drying. Fluorine-based silicone compounds are particularly preferred because they can stabilize abrasion resistance and stain resistance over long periods of time.

[0037] The amount of (E) in the low refractive index resin is preferably 5 to 20% by weight, more preferably 10 to 15% by weight, based on the total solid content. By making it 5% by weight or more, it is expected that the abrasion resistance and stain resistance will be improved, and by making it 20% by weight or less, sufficient curability will be ensured.

[0038] When the low-refractive index layer of the present invention is formed from an ultraviolet-curable low-refractive index resin, it is preferable to use a photopolymerization initiator. Alpha-hydroxyacetophenone-based initiators are preferred because the cured product is less likely to yellow. However, since the low-refractive index layer is a thin film, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propionyl)-benzyl]-phenyl}-2-methyl-propan-1-one (e.g., Omnirad 127D) is particularly preferred because it is less susceptible to polymerization inhibition by oxygen. The amount of photopolymerization initiator in the low-refractive index resin composition is preferably 5 to 20 parts by weight, more preferably 10 to 15 parts by weight, per 100 parts by weight of the photopolymerizable component.

[0039] To the low refractive index resin of the present invention, ultraviolet absorbers, adhesion promoters, antioxidants, bluing agents, pigments, antifoaming agents, anti-suspending agents, antistatic agents, antibacterial agents, waxes, matting agents, organic fine particles, etc. may be added as needed within a range that does not impair performance.

[0040] An anti-reflection film can be obtained by further laminating the low refractive index layer of the present invention on an HC layer that is laminated on a light-transmitting substrate film.

[0041] When coating the HC resin and low refractive index resin on a transparent support, they may be diluted with a solvent to improve coating properties. Examples of dilution solvents include alcohol-based solvents such as ethanol, n-propyl alcohol, isopropyl alcohol (hereinafter referred to as IPA), n-butyl alcohol, isobutyl alcohol, and diacetone alcohol; ketone-based solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone (hereinafter referred to as MIBK), and cyclohexanone; ester-based solvents such as ethyl acetate and butyl acetate; and ether-based solvents such as PGM, diethyl ether, and diisopropyl ether. These solvents may be used alone or in combination of two or more.

[0042] The solid content when diluted is not particularly specified, and can be appropriately set to obtain a viscosity that is easy to apply. In the case of HC resin, the solid content is exemplified as 10 to 50 wt%, and a mixed solvent of ethyl acetate and PGM is preferred because it has a good balance between volatility and compatibility and can form a film with a good appearance. In the case of low refractive index resin, the solid content is exemplified as 0.5 to 10 wt%, and PGM is preferred because it has a good balance between volatility and compatibility and can form a film with a good appearance.

[0043] Examples of light-transmitting substrate films onto which HC resins are applied include polyester films, triacetyl cellulose films, polycarbonate (hereinafter referred to as PC) films, polysulfone films, nylon films, cycloolefin films, acrylic (hereinafter referred to as PMMA) films, polyimide films, ABS films, polyolefin films, PVC films, and PVA films. Among these, biaxially stretched polyester films are preferred in terms of weather resistance, processability, dimensional stability, and the like. The film thickness may be approximately 20 μm to 500 μm.

[0044] The method for applying the HC resin and the low refractive index resin is not particularly limited, and they can be formed by known coating methods such as spray coating, roll coating, die coating, air knife coating, blade coating, spin coating, reverse coating, gravure coating, and wire bar coating, or by printing methods such as gravure printing, screen printing, offset printing, and inkjet printing.

[0045] The thickness of the HC layer is preferably 1.1 to 10 μm, more preferably 1.5 to 5.0 μm, and particularly preferably 1.5 to 3.0 μm. The thickness of the low refractive index resin applied onto the HC resin layer is preferably 50 to 200 nm, more preferably 80 to 150 nm, when dried. If the thickness of the low refractive index layer is within this range, it is possible to sufficiently reduce the reflectance.

[0046] The light source for UV irradiation used to cure HC resins and low-refractive resins includes low-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, carbon arc lamps, xenon lamps, metal halide lamps, LED lamps, and electrodeless UV lamps. The irradiation atmosphere can be air or an inert gas such as nitrogen or argon. Furthermore, the curing property can be further improved by heating the back roll or the coating film with an IR heater during UV irradiation. The irradiation condition is an irradiation intensity of 500 mW / cm. 2 ~3000mW / cm 2 , exposure dose 50-400mJ / cm 2 are exemplified, but are not limited to these.

[0047] The haze of the antireflection film of the present invention is 30 to 60%, preferably 35 to 59%, more preferably 38 to 57%, and particularly preferably 40 to 55%. If it is 30% or less, the visibility may be reduced due to the difficulty in diffusely reflecting external light, while if it exceeds 60%, the total light transmittance is reduced, which may also reduce the visibility.

[0048] The present invention will be described in detail below with reference to examples and comparative examples, but these are intended to be specific examples and are not intended to limit the scope of the present invention. Unless otherwise specified, measurements were taken at a room temperature of 25°C and a relative humidity of 65%. The units in the recipes are expressed as parts by weight on a solid basis. [Example]

[0049] Examples 1 to 8 (HC resin) PGM-AC-2140Y (trade name: manufactured by Nissan Chemical Industries, Ltd., solid content 47%, average particle size 10 to 15 nm) was used as (A), Nipsil SS-50A (trade name: manufactured by Tosoh Silica Corporation, average particle size 3 μm) was used as (B), ureac (a hexafunctional urethane acrylate obtained by reacting HDI and PETA) was used as a binder, Omnirad184 (trade name: manufactured by IGM Resins, α-hydroxyacetophenone-based) was used as a photopolymerization initiator, and a fluorine-based leveling agent was used as a leveling agent, as shown in Table 1, and the mixture was further diluted with PGM to a solid content of 40 wt %, and stirred until uniformly dissolved and dispersed, thereby obtaining HC resins that would form the HC layers of Examples 1 to 8.

[0050] Comparative examples 1 to 9 (HC resin) In addition to the materials used in the examples, Nipsil SS-50B (trade name: manufactured by Tosoh Silica Corporation, average particle size 2 μm) as (B) and Mizukasil C-543 (trade name: manufactured by Mizusawa Industrial Chemicals, average particle size 7 μm) as hydrophobic silica were blended as shown in Table 2, and the mixture was further diluted with PGM to a solid content of 40 wt % and stirred until uniformly dissolved and dispersed to obtain HC resins that form the HC layers of Comparative Examples 1 to 9.

[0051] Examples and Comparative Examples (Low Refractive Index Resin) As the (C), Sururia 4320 (trade name: manufactured by JGC Catalysts and Chemicals, solid content 20%, average primary particle size 60 nm), as the (D), ALMIBK30WT%-M47 (trade name: manufactured by CIK Nanotech, solid content 30%, average particle size 20 nm), as the (E), X-71-1203M (trade name: manufactured by Shin-Etsu Chemical Co., Ltd., solid content 20%, fluorine-based silicone compound having a reactive functional group), DPHA as a binder, and Omnirad 127D (trade name: manufactured by IGM Resins, α-hydroxyacetophenone-based) as a photopolymerization initiator were blended as shown in Tables 1 and 2, and further diluted with PGM to a solid content of 3.0 wt%, and stirred until uniformly dissolved and dispersed to obtain a low-refractive index resin for forming a low-refractive index layer.

[0052] Table 1 JPEG2025130116000001.jpg105152

[0053] Table 2 JPEG2025130116000002.jpg99156

[0054] The evaluation method was as follows.

[0055] Creating HC film Using the HC resin compositions listed in Tables 1 and 2, photocurable resin was applied to PET film A4360 (product name: Toyobo Co., Ltd., thickness 38 μm, double-sided easy adhesion) so that the dry film thickness was 2.0 μm and 2.5 μm, and after drying at 80°C for 1 minute, it was exposed to a high-pressure mercury lamp with an output of 1300 mW / cm. 2 The coating was cured under the condition of an integrated light dose of 200 mJ to form an HC film.

[0056] Creating anti-reflective film The low refractive index resin compositions listed in Tables 1 and 2 were applied to the HC layer prepared above so that the film thickness after drying was 100 nm. After drying at 80°C for 1 minute, the film was exposed to a high-pressure mercury lamp with an output of 1300 mW / cm under a nitrogen atmosphere. 2 The coating was cured under conditions of an accumulated light amount of 200 mJ to form an anti-reflection film.

[0057] Haze: The anti-reflection film was measured in accordance with JIS K7136 using a haze meter Haze-GARD2 manufactured by Toyo Seiki Seisaku-sho, Ltd. The evaluation method was as follows: 40 to 55% was rated as ⊚, 30 to less than 40% and over 55 to 60% were rated as ◯, and anything outside these ranges was rated as ×.

[0058] Minimum reflectance: The surface opposite the coated surface of the anti-reflection film was scratched with sandpaper, covered with a black pigment marker, and then a black PET film was attached to set the reflectance of the opposite surface to 0%. The reflectance of the coated surface was then plotted in 1-nm increments in the range of 380 nm to 780 nm using a spectrophotometer, and the minimum reflectance was measured. A reflectance of 0.5% or less was evaluated as ◯, and a reflectance of more than 0.5% was evaluated as ×.

[0059] Pencil hardness: The anti-reflection film was measured under a load of 750 g using a pencil scratch coating hardness tester (Model P) manufactured by Toyo Seiki Seisakusho Co., Ltd. in accordance with JIS K5600-5-4 (1999 edition). The evaluation method was rated as ◯ for 3H or more and × for 2H or less.

[0060] Fingerprint visibility: A finger was pressed against the anti-reflection film to leave a fingerprint, and the fingerprint was visually observed at a 45° angle under a fluorescent light source. If the fingerprint was not very noticeable, it was marked with a circle, and if it was very noticeable, it was marked with an X.

[0061] Anti-glare property: A fluorescent lamp was irradiated onto the anti-reflection film, and the reflection of the fluorescent lamp was visually confirmed at an angle of 45°. Weak reflection was marked with ◯, and strong reflection was marked with ×.

[0062] Coating film feel: The surface of the anti-reflection film was traced with a finger. If the finger could be traced smoothly, it was rated as ◯, and if there was any feeling of friction, it was rated as x.

[0063] Appearance of coating film: The appearance of the surface of the anti-reflection film was visually inspected, and if it was evenly coated without waviness, uneven coating, pits, etc., it was marked as ◯, and if not, it was marked as x.

[0064] Scratch resistance: A load of 150 g / cm2 was placed on steel wool #0000 and moved back and forth 10 times. Visual observation revealed that no scratches were observed, △, and multiple scratches were observed.

[0065] Evaluation results Table 3 JPEG2025130116000003.jpg84135

[0066] Table 4 JPEG2025130116000004.jpg76135

[0067] The examples were satisfactory with no problems in all respects such as haze, minimum reflectance, pencil hardness, fingerprint recognition, anti-glare properties, coating film feel, coating film appearance, and scratch resistance.

[0068] On the other hand, Comparative Examples 1 and 3, in which the particle size / film thickness ratio was greater than 2.0, exhibited poor coating film feel, and Comparative Examples 2 and 4, in which the particle size / film thickness ratio was 1.1 or less, exhibited poor fingerprint recognizability. Furthermore, Comparative Example 5, which did not contain (A), exhibited low pencil hardness, and Comparative Example 6, which did not contain (B), exhibited low haze and poor fingerprint recognizability and antiglare properties. Furthermore, Comparative Example 7, which did not contain (C), exhibited poor minimum reflectance, Comparative Example 8, which did not contain (C), exhibited poor scratch resistance, and Comparative Example 9, which did not contain (E), exhibited poor coating film appearance and scratch resistance, all of which were unsuitable for the present invention.

Claims

1. a hard coat layer and a low refractive index layer laminated in this order on a light-transmitting substrate film; the hard coat layer contains, as essential components, reactive nanosilica (A) and hydrophobic silica (B), the average particle size of (B) being 1 to 5 μm and being 1.1 to 2.0 times the thickness of the hard coat layer; the low refractive index layer contains, as essential components, hollow nanosilica (C), nano-inorganic fine particles (D) (excluding (A) and (C)), and a leveling agent (E); An anti-reflection film characterized in that the haze of the laminate is 30 to 60%.

2. 2. The anti-reflection film according to claim 1, wherein the blending amount of said (A) is 10 to 30% by weight based on the total amount of the hard coat layer.

3. 3. The anti-reflection film according to claim 1, wherein the average particle size of the (A) is 1 to 100 nm.

4. 3. The anti-reflection film according to claim 1, wherein the hard coat layer further contains a leveling agent.

5. 3. The anti-reflection film according to claim 1, wherein the blending amount of said (D) is 1.0 to 15.0% by weight based on the total amount of the low refractive index layer.

Citation Information

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