analyzer

Abstract

To improve analysis accuracy of an analyzer that uses primary electromagnetic waves and secondary electromagnetic waves.SOLUTION: An analysis observation device A comprises: an electromagnetic wave emitting unit 71 that emits primary electromagnetic waves; a reflection type objective lens 74 that has a primary mirror 11 provided with a primary reflection surface 11b reflecting secondary electromagnetic waves and a secondary mirror 12 provided with a secondary reflection surface 12b receiving and reflecting the secondary electromagnetic waves; first and second detectors 77A, 77B that each receive the secondary electromagnetic waves and generate an intensity distribution spectrum; and a control unit 21 that performs component analysis of a sample SP on the basis of, the intensity distribution spectra. The secondary mirror 12 is provided at its center part with a transmission area 12a through which the primary electromagnetic waves transmit. The transmission area 12a transmits primary electromagnetic waves emitted from the electromagnetic wave emitting unit 71 and passing through an opening 11a of the primary mirror 11 to emit the primary electromagnetic waves along an analysis optical axis Aa of the reflection type objective lens 74.SELECTED DRAWING: Figure 8A

Description

[Technical Field]

[0001] The technology disclosed herein relates to an analytical device. [Background technology]

[0002] For example, Patent Document 1 discloses an analytical device (spectrometer) for analyzing the components of a sample. Specifically, the spectrometer disclosed in Patent Document 1 includes a focusing lens for focusing a primary electromagnetic wave (ultraviolet laser light) and a collection head for collecting a secondary electromagnetic wave (plasma) generated on the sample surface in response to the primary electromagnetic wave, in order to perform component analysis using Laser Induced Breakdown Spectroscopy (LIBS). According to Patent Document 1, by measuring the spectral peak of the sample from the signal of the secondary electromagnetic wave, it is possible to perform chemical analysis of the sample based on the measured peak.

[0003] In addition, the collection head according to Patent Document 1 is connected to a detector (spectrometer) via an optical fiber, and the secondary electromagnetic wave (plasma) generated on the sample surface is configured to be guided to the detector (spectrometer) via the optical fiber. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Application Publication No. 2020-113569 Summary of the Invention [Problem to be solved by the invention]

[0005] However, in the analytical device disclosed in Patent Document 1, the secondary electromagnetic waves guided to the detector are easily attenuated, which is inconvenient in terms of improving analytical accuracy.

[0006] The technology disclosed herein has been made in consideration of these points, and its purpose is to improve the analytical accuracy of an analytical device that uses primary and secondary electromagnetic waves. [Means for solving the problem]

[0007] A first aspect of the present disclosure relates to an analyzer that performs component analysis of an analysis target. This analytical device comprises an electromagnetic wave emitting section that emits primary electromagnetic waves for analyzing the object to be analyzed, a primary mirror having an opening in its radial center and a primary reflecting surface provided around the opening that reflects secondary electromagnetic waves generated in the object to be analyzed in response to the emission of the primary electromagnetic waves, and a secondary mirror having a secondary reflecting surface that receives the secondary electromagnetic waves reflected by the primary reflecting surface and further reflects them, a reflective objective lens that collects the secondary electromagnetic waves using the primary mirror and secondary mirror and directs them to the opening, a detector that receives the secondary electromagnetic waves generated in the object to be analyzed and collected by the reflective objective lens and generates an intensity distribution spectrum which is the intensity distribution for each wavelength of the secondary electromagnetic waves, and a processing section that performs component analysis of the object to be analyzed based on the intensity distribution spectrum generated by the detector, wherein the secondary reflecting surface is provided on the outer edge of the secondary mirror and a transmission area through which the primary electromagnetic waves pass is provided in the center of the secondary mirror.

[0008] According to the first aspect of the present disclosure, the transmission region is configured to transmit the primary electromagnetic wave that is emitted from the electromagnetic wave emitting portion and passes through the opening, thereby emitting the primary electromagnetic wave along the optical axis of the reflective objective lens.

[0009] According to the first aspect, the primary electromagnetic wave is irradiated onto the object to be analyzed in a state where it is coaxial with the optical axis of the reflective objective lens, i.e., at no angle. This allows the secondary electromagnetic wave generated in the object to be collected as fully as possible by the primary mirror. This increases the intensity of the secondary electromagnetic wave reaching the detector, thereby improving the detection accuracy of the analytical device.

[0010] Furthermore, according to a second aspect of the present disclosure, the analysis device may include a parabolic mirror that reflects the secondary electromagnetic waves focused by the reflective objective lens, and the parabolic mirror may be configured to focus the secondary electromagnetic waves reflected by the parabolic mirror onto the detector.

[0011] According to the second aspect, the secondary electromagnetic wave reaches the detector via a parabolic mirror. By configuring the secondary electromagnetic wave to be guided by a reflection system in this way, a fiberless configuration can be realized, eliminating the need for optical fibers. This minimizes loss of the secondary electromagnetic wave, which is advantageous for improving the detection accuracy of the analytical device.

[0012] Furthermore, according to a third aspect of the present disclosure, the analysis device may include a spectroscopic element made of a material having a higher transmittance for a second component belonging to a wavelength range equal to or greater than a predetermined wavelength compared to a first component belonging to a wavelength range less than the predetermined wavelength, and the spectroscopic element is configured to receive the secondary electromagnetic waves focused by the reflective objective lens, and to reflect the secondary electromagnetic waves corresponding to the first component among the secondary electromagnetic waves, while transmitting the secondary electromagnetic waves corresponding to the second component, and the detector may include a first detector onto which the secondary electromagnetic waves reflected by the spectroscopic element are incident, and a second detector onto which the secondary electromagnetic waves transmitted through the spectroscopic element are incident.

[0013] According to the third aspect, the analyzer is configured to guide a first ultraviolet component, which is subject to loss due to transmission through the glass material, to a first detector without transmitting through the glass material, while a second infrared component, which is less affected by loss than the first component, is transmitted through the glass material and guided to a second detector. This configuration makes it possible to achieve detection using multiple detectors while minimizing loss of secondary electromagnetic waves. Detection using multiple detectors contributes to improving wavelength resolution. This contributes to improving measurement accuracy by reducing loss of secondary electromagnetic waves and improving wavelength resolution.

[0014] Furthermore, according to a fourth aspect of the present disclosure, the analysis device may include a deflection element onto which the primary electromagnetic wave emitted from the electromagnetic wave emitting portion is incident and which deflects the primary electromagnetic wave in the optical axis direction of the reflective objective lens, and the deflection element may have a reflection region arranged opposite the transmission region so as to reflect the primary electromagnetic wave along the optical axis direction of the reflective objective lens, and a hollow region which allows the secondary electromagnetic wave focused by the reflective objective lens to pass through.

[0015] According to the fourth aspect, the deflection element reflects the primary electromagnetic wave by the reflective region and guides it to the reflective objective lens, while passing the secondary electromagnetic wave through the hollow region. By passing the secondary electromagnetic wave through the hollow region, loss of the secondary electromagnetic wave can be suppressed. Therefore, the fifth aspect is effective in achieving both coaxialization of the primary electromagnetic wave by the reflective region and improved measurement accuracy by suppressing loss of the secondary electromagnetic wave.

[0016] Furthermore, according to a fifth aspect of the present disclosure, the analysis device may include an analysis housing that houses the deflection element, and the deflection element may include a plate-shaped element support member that is attached to the analysis housing and has a through hole, a mirror member that is positioned in the center of the through hole and forms the reflection area, and a first support leg that extends radially from the outer surface of the mirror member and is connected to the inner surface of the through hole, and the hollow area may be defined by the inner surface of the through hole and the outer surface of the mirror member.

[0017] According to the fifth aspect, a single deflection element can simultaneously provide a reflective area and a hollow area. This configuration is effective in achieving both coaxial alignment of the primary electromagnetic wave by the reflective area and improved measurement accuracy by suppressing loss of the secondary electromagnetic wave.

[0018] Furthermore, according to a sixth aspect of the present disclosure, the secondary mirror may be arranged around the secondary reflecting surface and connected to the analysis housing via an annular mirror support member attached to the analysis housing and second support legs extending radially from the outer edge of the secondary reflecting surface and connected to the inner surface of the mirror support member, and the first and second support legs may be arranged to overlap each other when viewed along the optical axis direction of the reflective objective lens.

[0019] According to the sixth aspect, the secondary electromagnetic wave that has passed through the region near the first support leg can pass through the deflection element without being blocked by the second support leg, which is effective in suppressing loss of the secondary electromagnetic wave and ultimately improving the measurement accuracy of the analyzer.

[0020] Furthermore, according to a seventh aspect of the present disclosure, the element support member may be attached to the analysis housing in an attitude in which its thickness direction is inclined with respect to the optical axis direction of the reflective objective lens, and the through hole may be formed so as to pass through the element support member along the optical axis direction of the reflective objective lens.

[0021] According to the seventh aspect, the through-hole defining the hollow region is formed to extend along the optical axis direction of the reflective objective lens. This allows the through-hole to be configured to be rotationally symmetric about the optical axis. This ensures a certain distance between the inner circumferential surface of the through-hole and the secondary electromagnetic wave passing through the hollow region, thereby suppressing interference between the through-hole and the secondary electromagnetic wave. This is effective in suppressing loss of the secondary electromagnetic wave and contributes to improving measurement accuracy.

[0022] Furthermore, according to an eighth aspect of the present disclosure, the analysis device may include an imaging unit that collects reflected light reflected by the object to be analyzed via the reflective objective lens and detects the amount of received reflected light, and the imaging unit may collect the reflected light via a common optical path with the secondary electromagnetic wave focused by the reflective objective lens.

[0023] With this configuration, the optical axis of the imaging unit, as well as the primary electromagnetic wave, is made coaxial with the reflective objective lens, which allows a single reflective objective lens to perform three functions without interfering with each other: irradiating the object to be analyzed with the primary electromagnetic wave, collecting the secondary electromagnetic wave from the object to be analyzed, and capturing an image of the object to be analyzed by the imaging unit.

[0024] Furthermore, according to a ninth aspect of the present disclosure, an optical thin film that blocks reflected light reflected by the object to be analyzed may be interposed between the transmission region and the mounting surface on which the object to be analyzed is placed, and the imaging unit may collect reflected light reflected by the primary reflection surface and the secondary reflection surface.

[0025] According to the ninth aspect, collection of reflected light through the transmission region is suppressed, and reflected light can be collected only by the primary and secondary reflection surfaces, which suppresses the risk of double imaging of reflected light in the imaging unit and is advantageous for improving measurement accuracy.

[0026] Furthermore, according to a tenth aspect of the present disclosure, the analysis device may include a coaxial illuminator that irradiates illumination light onto the object to be analyzed, and the coaxial illuminator may irradiate the illumination light via an optical path that is coaxial with the primary electromagnetic wave emitted from the electromagnetic wave emitting unit.

[0027] With this configuration, the illumination device is coaxial with the reflective objective lens, in addition to the optical axis of the imaging unit, so that a single reflective objective lens can perform four functions without interfering with each other: irradiating the object to be analyzed with primary electromagnetic waves, collecting secondary electromagnetic waves from the object to be analyzed, capturing an image of the object to be analyzed with the imaging unit, and irradiating the object with illumination light.

[0028] Furthermore, according to an eleventh aspect of the present disclosure, the electromagnetic wave emitting unit may be configured by a laser light source that emits laser light as the primary electromagnetic wave, the reflective objective lens may collect light generated in the object to be analyzed in response to irradiation with the laser light emitted from the electromagnetic wave emitting unit, and the detector may generate an intensity distribution spectrum that is an intensity distribution for each wavelength of the light generated in the object to be analyzed and collected by the reflective objective lens. [Effects of the Invention]

[0029] As described above, according to the present disclosure, it is possible to improve the analytical accuracy of an analytical device that uses a primary electromagnetic wave and a secondary electromagnetic wave. [Brief explanation of the drawings]

[0030] [Figure 1] FIG. 1 is a schematic diagram illustrating the overall configuration of an analytical observation device. [Figure 2] FIG. 2 is a perspective view illustrating an optical system assembly. [Figure 3] FIG. 3 is a side view illustrating an optical system assembly. [Figure 4] FIG. 4 is a front view illustrating an optical system assembly. [Figure 5] FIG. 5 is an exploded perspective view illustrating an optical system assembly. [Figure 6] FIG. 6 is a side view showing a schematic configuration of the optical system assembly. [Figure 7] FIG. 7 is a schematic diagram illustrating the configuration of the analytical optical system. [Figure 8A] FIG. 8A is a longitudinal sectional view illustrating the configuration of a reflective objective lens and side illumination. [Figure 8B] FIG. 8B is a longitudinal cross-sectional view illustrating the configuration of the reflective objective lens and side illumination. [Figure 9] FIG. 9 is a diagram for explaining the mounting structure of the first and second detectors. [Figure 10]FIG. 10 is a bottom view illustrating the configuration of the reflective objective lens and side illumination. [Figure 11] FIG. 11 is a perspective view illustrating the configuration of the secondary mirror. [Figure 12] FIG. 12 is a perspective view illustrating the configuration of a deflection element. [Figure 13] FIG. 13 is a plan view illustrating the positional relationship between the secondary mirror and the deflection element. [Figure 14] FIG. 14 is a vertical cross-sectional view illustrating the positional relationship between the primary mirror, the secondary mirror, and the deflection element. [Figure 15] FIG. 15 is a schematic diagram illustrating the configuration of the slide mechanism. [Figure 16A] FIG. 16A is a diagram for explaining horizontal movement of the head portion. [Figure 16B] FIG. 16B is a diagram for explaining the horizontal movement of the head portion. [Figure 17A] FIG. 17A is a diagram for explaining the operation of the tilting mechanism. [Figure 17B] FIG. 17B is a diagram for explaining the operation of the tilting mechanism. [Figure 18] FIG. 18 is a block diagram illustrating the configuration of the controller main body. [Figure 19] FIG. 19 is a block diagram illustrating the configuration of the control unit. [Figure 20] FIG. 20 is a flowchart illustrating the basic operation of the analytical observation device. [Figure 21] FIG. 21 is a flowchart illustrating a procedure for setting illumination conditions by the illumination setting unit. [Figure 22] FIG. 22 is a flowchart illustrating a procedure for analyzing a sample by the analytical optical system and a procedure for controlling the lighting state by the illumination control unit. [Figure 23] FIG. 23 is a diagram illustrating an example of a display screen of the analytical observation device. [Figure 24] FIG. 24 is a diagram illustrating image data generated using side illumination in the second mode. [Figure 25]FIG. 25 is a diagram illustrating image data generated using coaxial illumination in the second mode. [Figure 26] FIG. 26 is a diagram illustrating image data generated using coaxial illumination in the first mode. [Figure 27] FIG. 27 is a diagram illustrating image data generated using side illumination in the first mode. [Figure 28] FIG. 28 is a bottom view showing a modified example of side illumination. DETAILED DESCRIPTION OF THE INVENTION

[0031] Hereinafter, embodiments of the present disclosure will be described with reference to the accompanying drawings. Note that the following description is for illustrative purposes only.

[0032] <Overall configuration of analytical observation device A> Fig. 1 is a schematic diagram illustrating the overall configuration of an analytical observation device A as an analytical device according to an embodiment of the present disclosure. The analytical observation device A illustrated in Fig. 1 performs magnified observation of a sample SP as an observation target and an analysis target, and can also perform component analysis of the sample SP.

[0033] In detail, the analytical observation device A according to this embodiment magnifies and images a sample SP made up of, for example, a specimen such as a minute object, an electronic component, a workpiece, etc., and is thereby able to search for a portion of the sample SP where component analysis is to be performed, and to inspect and measure its appearance, etc. When focusing on its observation function, the analytical observation device A can be called a magnification observation device, or simply a microscope, or a digital microscope.

[0034] The analytical observation device A can also perform techniques called laser induced breakdown spectroscopy (LIBS), laser induced plasma spectroscopy (LIPS), etc., when analyzing the components of the sample SP. When focusing on its analytical function, the analytical observation device A can also be called a component analysis device, simply an analysis device, or a spectroscopic device.

[0035] As shown in FIG. 1, the analytical observation device A according to this embodiment comprises, as main components, an optical system assembly (optical system main body) 1, a controller main body 2, and an operation unit 3.

[0036] Of these, the optical system assembly 1 is capable of capturing and analyzing the sample SP, and outputting electrical signals corresponding to the capturing and analysis results to the outside.

[0037] The controller main body 2 has a control unit 21 for controlling various components that make up the optical system assembly 1, such as the first camera 81. The controller main body 2 can cause the optical system assembly 1 to observe and analyze the sample SP via the control unit 21. The controller main body 2 also has a display unit 22 that can display various information. This display unit 22 can display images captured by the optical system assembly 1, data showing the analysis results of the sample SP, and the like.

[0038] The operation unit 3 has a mouse 31 that accepts operation inputs from the user, a console 32, and a keyboard 33 (the keyboard 33 is only shown in FIG. 18). By operating buttons, adjustment knobs, etc. on the console 32, it is possible to instruct the controller main body 2 to import image data, adjust brightness, focus the first camera 81, etc.

[0039] The operation unit 3 does not need to have all three of the mouse 31, the console 32, and the keyboard 33, and may have any one or two of them. Furthermore, a touch panel input device, a voice input device, or the like may be used in addition to or instead of the mouse 31, the console 32, and the keyboard 33. In the case of a touch panel input device, it can be configured to be able to detect any position on the screen displayed on the display unit 22.

[0040] <Details of Optical Assembly 1> 2 to 4 are respectively a perspective view, a side view, and a front view illustrating the optical system assembly 1. In addition, Fig. 5 is an exploded perspective view of the optical system assembly 1, and Fig. 6 is a side view showing a schematic configuration of the optical system assembly 1.

[0041] As shown in FIGS. 1 to 6, the optical system assembly 1 includes a stage 4 that supports various devices and on which a sample SP is placed, and a head unit 6 that is attached to the stage 4. Here, the head unit 6 is configured by attaching an observation housing 90 that houses an observation optical system 9 to an analysis housing 70 that houses an analysis optical system 7. Here, the analysis optical system 7 is an optical system for analyzing the components of the sample SP. The observation optical system 9 is an optical system for performing magnified observation of the sample SP. The head unit 6 is configured as a group of devices that combine the functions of analyzing the sample SP and magnified observation.

[0042] In the following description, the front-rear direction and left-right direction of the optical system assembly 1 are defined as shown in Figures 1 to 4. That is, the side facing the user is the front side of the optical system assembly 1, and the opposite side is the rear side of the optical system assembly 1. When a user faces the optical system assembly 1, the right side as seen from the user is the right side of the optical system assembly 1, and the left side as seen from the user is the left side of the optical system assembly 1. The definitions of the front-rear direction and left-right direction are intended to facilitate understanding of the description and do not limit the actual state of use. Either direction may be used as the front.

[0043] In the following description, the left-right direction of the optical system assembly 1 is defined as the "X direction," the front-to-back direction of the optical system assembly 1 as the "Y direction," the up-and-down direction of the optical system assembly 1 as the "Z direction," and the direction of rotation around an axis parallel to the Z axis as the "φ direction." The X and Y directions are perpendicular to each other on the same horizontal plane, and the direction along this horizontal plane is defined as the "horizontal direction." The Z axis is the direction of the normal perpendicular to the horizontal plane. These definitions can also be changed as appropriate.

[0044] As will be described in detail later, the head unit 6 can move along and swing around a central axis Ac shown in Figures 2 to 6. As shown in Figure 6 and other figures, the central axis Ac is configured to extend in the horizontal direction, particularly in the front-to-rear direction.

[0045] (Stage 4) The stage 4 has a base 41 that is placed on a workbench or the like, a stand 42 connected to the base 41, and a mounting table 5 that is supported by the base 41 or the stand 42. The stage 4 is a member that determines the relative positional relationship between the mounting table 5 and the head unit 6, and is configured so that at least the observation optical system 9 and the analysis optical system 7 of the head unit 6 can be attached.

[0046] The base 41 constitutes approximately the lower half of the stage 4, and is formed in the shape of a pedestal whose front-to-rear dimension is longer than its left-to-right dimension, as shown in Fig. 2. The base 41 has a bottom surface that is placed on a workbench or the like. A mounting table 5 is attached to the front portion of the base 41.

[0047] 6 and other figures, a first support portion 41a and a second support portion 41b are provided in a rear portion of the base 41 (particularly, a portion located rearward of the mounting table 5) in a state where they are lined up in order from the front side. The first and second support portions 41a, 41b are both provided so as to protrude upward from the base 41. A circular bearing hole (not shown) is formed in the first and second support portions 41a, 41b and is arranged so as to be concentric with the central axis Ac.

[0048] The stand 42 constitutes the upper half of the stage 4, and is formed in a columnar shape extending vertically perpendicular to the base 41 (particularly the bottom surface of the base 41) as shown in Figures 2, 3, 6, etc. The head unit 6 is attached to the front surface of the upper part of the stand 42 via a separate mounting fixture 43.

[0049] 6 and other figures, a first mounting portion 42a and a second mounting portion 42b are provided on the lower portion of the stand 42, lined up in order from the front. The first and second mounting portions 42a, 42b are configured to correspond to the first and second support portions 41a, 41b described above. Specifically, the first and second support portions 41a, 41b and the first and second mounting portions 42a, 42b are laid out so that the first support portion 41a is sandwiched between the first mounting portion 42a and the second mounting portion 42b, and the second mounting portion 42b is sandwiched between the first support portion 41a and the second support portion 41b.

[0050] Additionally, the first and second mounting portions 42a and 42b are formed with circular bearing holes (not shown) that are concentric and have the same diameter as the bearing holes formed in the first and second support portions 41a and 41b. A shaft member 44 is inserted into these bearing holes via bearings (not shown), such as cross roller bearings. The shaft member 44 is positioned so that its axis is concentric with the aforementioned central axis Ac. By inserting the shaft member 44, the base 41 and the stand 42 are connected so as to be able to swing relative to each other. The shaft member 44, together with the first and second support portions 41a and 41b and the first and second mounting portions 42a and 42b, constitute a tilting mechanism 45 in this embodiment.

[0051] By connecting the base 41 and the stand 42 via the tilting mechanism 45, the stand 42 is supported by the base 41 in a state in which it can swing about the central axis Ac. By swinging the stand 42 about the central axis Ac, it tilts left and right with respect to a predetermined reference axis As (see FIGS. 17A and 17B). In the non-tilted state shown in FIG. 4 and the like, this reference axis As can be an axis extending perpendicular to the upper surface (mounting surface 51a) of the mounting table 5. Furthermore, the central axis Ac functions as the central axis (center of rotation) of the swing caused by the tilting mechanism 45.

[0052] Specifically, the tilting mechanism 45 according to this embodiment can tilt the stand 42 approximately 90° to the right with respect to the reference axis As, or approximately 60° to the left with respect to the reference axis As. As described above, the head unit 6 is attached to the stand 42, and therefore the head unit 6 can also be tilted left and right with respect to the reference axis As. Tilting the head unit 6 is equivalent to tilting the analysis optical system 7 and the observation optical system 9, and ultimately tilting the analysis optical axis Aa and observation optical axis Ao, which will be described later.

[0053] The mounting fixture 43 has a rail portion 43a that guides the head unit 6 along the longitudinal direction of the stand 42 (which coincides with the up-down direction when not tilted; hereinafter, this will be referred to as the "substantially up-down direction"), and a lock lever 43b that locks the position of the head unit 6 relative to the rail portion 43a. The rear surface portion of the head unit 6 (specifically, the head mounting member 61) is inserted into the rail portion 43a, allowing it to move substantially in the up-down direction. The head unit 6 can be fixed in the desired position by operating the lock lever 43b with the head unit 6 set at the desired position. The position of the head unit 6 can also be adjusted by operating the first operating dial 46 shown in FIGS. 2 and 3.

[0054] Furthermore, the stage 4 or the head unit 6 has a built-in head driver 47 for moving the head unit 6 in a substantially vertical direction. The head driver 47 includes an actuator (e.g., a stepping motor) (not shown) controlled by the controller main body 2, and a motion conversion mechanism that converts rotation of the output shaft of the stepping motor into linear motion in a substantially vertical direction, and moves the head unit 6 based on drive pulses input from the controller main body 2. By moving the head unit 6 with the head driver 47, the head unit 6, and therefore the analysis optical axis Aa and the observation optical axis Ao, can be moved substantially vertically.

[0055] The mounting table 5 is disposed forward of the center of the base 41 in the front-rear direction and is attached to the upper surface of the base 41. The mounting table 5 is configured as an electric mounting table provided in an open space, and can move the sample SP placed on its mounting surface 51a in the horizontal direction, raise and lower it in the up-down direction, and rotate it in the φ direction.

[0056] Specifically, the mounting table 5 of this embodiment has a mounting table main body 51 having a mounting surface 51a for placing the sample SP, a mounting table support part 52 arranged between the base 41 and the mounting table main body 51 and displacing the mounting table main body 51, and a mounting table drive part 53 shown in Figure 18 described below.

[0057] The upper surface of the mounting table main body 51 constitutes a mounting surface 51a. The mounting surface 51a is formed to extend substantially horizontally. A sample SP is placed on the mounting surface 51a in an open-to-air state, i.e., without being contained in a vacuum chamber or the like.

[0058] The mounting table support part 52 is a member that connects the base 41 and the mounting table main body 51, and is formed in a generally cylindrical shape that extends in the vertical direction. The mounting table support part 52 can accommodate a mounting table drive part 53.

[0059] The mounting table driving unit 53 includes a plurality of actuators (for example, stepping motors) (not shown) controlled by the controller main body 2, and a motion conversion mechanism that converts the rotation of the output shaft of the stepping motor into linear motion, and moves the mounting table main body 51 based on drive pulses input from the controller main body 2. By the mounting table driving unit 53 moving the mounting table main body 51, the mounting table main body 51, and therefore the sample SP placed on the mounting surface 51a, can be moved in the horizontal and vertical directions.

[0060] Similarly, the mounting table driving unit 53 can also rotate the mounting table main body 51 in the φ direction based on a driving pulse input from the controller main body 2. By the mounting table driving unit 53 rotating the mounting table main body 51, the sample SP placed on the mounting surface 51a can also be rotated in the φ direction.

[0061] Moreover, the stage main body 51 can be manually moved and rotated by operating the second operation dial 54, etc., as shown in Fig. 2. Details of the second operation dial 54 will be omitted.

[0062] Returning to the explanation of the base 41 and the stand 42, the base 41 described above has a first tilt sensor Sw3 built in. This first tilt sensor Sw3 can detect the tilt of a reference axis As perpendicular to the mounting surface 51a with respect to the direction of gravity. Meanwhile, a second tilt sensor Sw4 is attached to the stand 42. This second tilt sensor Sw4 can detect the tilt of the analysis optical system 7 with respect to the direction of gravity (more specifically, the tilt of the analysis optical axis Aa with respect to the direction of gravity). The detection signals of the first tilt sensor Sw3 and the second tilt sensor Sw4 are both input to the control unit 21.

[0063] (Head part 6) The head unit 6 has an analytical optical system 7 housed in an analytical housing 70, an observation optical system 9 housed in an observation housing 90, a head mounting member 61, a housing connector 64, and a slide mechanism (horizontal drive mechanism) 65. The head mounting member 61 is a member for connecting the analytical housing 70 to the stand 42. The housing connector 64 is a member for connecting the observation housing 90 to the analytical housing 70. The slide mechanism 65 is a mechanism for sliding the analytical housing 70 relative to the stand 42.

[0064] More specifically, the head mounting member 61 according to this embodiment is disposed on the rear side of the head unit 6, and is configured as a plate-like member for mounting the head unit 6 to the stand 42. As described above, the head mounting member 61 is fixed to the mounting fixture 43 of the stand 42.

[0065] The head mounting member 61 has a plate body 61a extending substantially parallel to the rear surface of the head unit 6, and a cover member 61b protruding forward from the lower end of the plate body 61a. In a first mode (first state) described below in which the reflective objective lens 74 faces the sample SP, the plate body 61a is spaced apart from the rear surface of the head unit 6 in the front-to-rear direction. In a second mode (second state) described below in which the objective lens 92 faces the sample SP, the plate body 61a is in close contact with or close to the rear surface of the head unit 6.

[0066] 15, a guide rail 65a constituting a slide mechanism 65 is attached to the left end of the head mounting member 61. The guide rail 65a connects the head mounting member 61 to other elements in the head unit 6 (specifically, the analysis optical system 7, the observation optical system 9, and the housing connector 64) so ​​that they can be displaced relative to each other in the horizontal direction.

[0067] The configurations of the analytical optical system 7 and the analytical housing 70, the observation optical system 9 and the observation housing 90, the housing connector 64, and the slide mechanism 65 will be described in order below.

[0068] -Analysis optical system 7- Fig. 7 is a schematic diagram illustrating the configuration of the analytical optical system 7. Figs. 8A and 8B are vertical cross-sectional views illustrating the configuration of the reflective objective lens 74 and the side illumination 84. Fig. 10 is a bottom view illustrating the configuration of the reflective objective lens 74 and the side illumination 84.

[0069] 11 is a perspective view illustrating the configuration of the secondary mirror 12, FIG. 12 is a perspective view illustrating the configuration of the deflection element 73, FIG. 13 is a plan view illustrating the positional relationship between the secondary mirror 12 and the deflection element 73, and FIG. 14 is a vertical cross-sectional view illustrating the positional relationship between the primary mirror 11, the secondary mirror 12, and the deflection element 73.

[0070] The analytical optical system 7 is a collection of components for analyzing a sample SP as an analysis target, and each component is accommodated in an analytical housing 70. The components that make up the analytical optical system 7 include an electromagnetic wave emitter 71, a collection head composed of a reflective objective lens 74, and a detector composed of a first detector 77A and a second detector 77B. At least these components are accommodated in the analytical housing 70. The elements for analyzing the sample SP also include a control unit 21 as a processing unit.

[0071] The analytical optical system 7 can perform analysis using, for example, the LIBS method. A communication cable C1 is connected to this analytical optical system 7 for sending and receiving electrical signals between the analytical optical system 7 and the controller main body 2. This communication cable C1 is not essential, and the analytical optical system 7 and the controller main body 2 may be connected via wireless communication.

[0072] The term "optical system" is used in a broad sense. That is, the analytical optical system 7 is defined as a system that includes not only optical elements such as lenses, but also a light source, an image sensor, etc. The same applies to the observation optical system 9.

[0073] As shown in Fig. 7, the analytical optical system 7 according to this embodiment includes an electromagnetic wave emitter 71, an output adjuster 72, a deflector 73, a reflective objective lens 74 as a collection head, a spectroscopic element 75 as a wavelength selection element, a first parabolic mirror 76A, a first detector 77A, a first beam splitter 78A, a second parabolic mirror 76B, a second detector 77B, a second beam splitter 78B, a coaxial illuminator 79, an imaging lens 80, a first camera 81 as an imaging unit, and a side illuminator 84. Some of the components of the analytical optical system 7 are also shown in Fig. 6. The side illuminator 84 is shown only in Figs. 8A, 8B, and 10 (omitted from Fig. 7).

[0074] The electromagnetic wave emitting section 71 emits a primary electromagnetic wave for analyzing the sample SP. In particular, the electromagnetic wave emitting section 71 according to this embodiment is configured by a laser light source that emits laser light as the primary electromagnetic wave.

[0075] Although detailed illustration is omitted, the electromagnetic wave emitting unit 71 according to this embodiment has an excitation light source constituted by a laser diode (LD) or the like, a focusing lens that focuses the laser output from the excitation light source and emits it as laser excitation light, a laser medium that generates a fundamental wave based on the laser excitation light, a Q switch for pulse oscillation of the fundamental wave, a rear mirror and output mirror for resonating the fundamental wave, and a wavelength conversion element that converts the wavelength of the laser light output from the output mirror.

[0076] Here, it is preferable to use, for example, a rod-shaped Nd:YAG as the laser medium in order to obtain high energy per pulse. In this embodiment, the wavelength (so-called fundamental wavelength) of photons emitted from the laser medium by stimulated emission is set to 1064 nm in the infrared region.

[0077] Furthermore, a passive Q-switch can be used as the Q-switch, which increases transmittance when the intensity of the fundamental wave exceeds a predetermined threshold. The passive Q-switch is composed of a saturable absorber such as Cr:YAG. By using a passive Q-switch, it becomes possible to automatically generate pulses when a predetermined amount of energy or more is accumulated in the laser medium. Alternatively, a so-called active Q-switch, whose attenuation rate can be controlled externally, can also be used.

[0078] The wavelength conversion element is configured using two nonlinear optical crystals such as LBO (LiBO). By using two crystals, a third harmonic wave can be generated from the fundamental wave. In this embodiment, the wavelength of the third harmonic wave is set to 355 nm in the ultraviolet range.

[0079] That is, the electromagnetic wave emitting unit 71 according to this embodiment can output laser light consisting of ultraviolet light as the primary electromagnetic wave. This allows analysis by the LIBS method to be performed on optically transparent samples SP such as glass. In addition, the percentage of laser light in the ultraviolet range that reaches the human retina is very low. By configuring the laser light so that it does not form an image on the retina, the safety of the device can be improved.

[0080] The output adjustment means 72 is disposed on the optical path connecting the electromagnetic wave emitting unit 71 and the deflection element 73, and is capable of adjusting the output of the laser light (primary electromagnetic wave). Specifically, the output adjustment means 72 according to this embodiment includes a half-wave plate 72a and a polarizing beam splitter 72b. The half-wave plate 72a is configured to rotate relative to the polarizing beam splitter 72b, and by controlling the angle of rotation, the amount of light passing through the polarizing beam splitter 72b can be adjusted.

[0081] The laser light (primary electromagnetic wave) whose output has been adjusted by the output adjustment means 72 is reflected by a mirror (not shown) and enters the optical base 700.

[0082] As shown in FIG. 7 , the optical base 700 is disposed inside the analytical housing 70 and defines a space for accommodating the optical elements constituting the analytical optical system 7. Specifically, the optical base 700 according to this embodiment accommodates a deflection element 73, a spectroscopic element 75, a first parabolic mirror 76A, a first beam splitter 78A, a second parabolic mirror 76B, a second beam splitter 78B, an optical element 79b constituting a coaxial illumination 79, and an imaging lens 80. The optical base 700 is disposed adjacent to the electromagnetic wave emission unit 71 in the internal space of the analytical housing 70. The optical base 700 corresponds to a "second housing" provided inside the analytical housing 70.

[0083] The deflection element 73 receives the laser light (primary electromagnetic wave) emitted from the electromagnetic wave emitting portion 71 and deflects the laser light (primary electromagnetic wave) in the optical axis direction of the reflective objective lens 74 (the direction along the analysis optical axis Aa).

[0084] Specifically, deflection element 73 is laid out so as to reflect the primary electromagnetic wave that has been output from electromagnetic wave output unit 71 and passed through output adjustment means 72, and direct it to sample SP via reflective objective lens 74, while also passing a secondary electromagnetic wave (light emitted as plasma is generated on the surface of sample SP, hereinafter also referred to as "plasma light") that is generated in sample SP in response to this primary electromagnetic wave, and direct this to first detector 77A and second detector 77B. Deflection element 73 is also laid out so as to pass visible light that has been collected for imaging, and direct most of it to first camera 81.

[0085] The reflective objective lens 74 functions as a collection head that collects secondary electromagnetic waves generated in the sample SP in response to the emission of primary electromagnetic waves from the electromagnetic wave emission unit 71. In particular, the reflective objective lens 74 according to this embodiment is configured to collect laser light as the primary electromagnetic waves and irradiate the sample SP with the laser light (primary electromagnetic waves), as well as to collect plasma light (secondary electromagnetic waves) generated in the sample SP in response to the laser light (primary electromagnetic waves) irradiated onto the sample SP. In this case, the secondary electromagnetic waves correspond to electromagnetic waves emitted in association with the plasma generation occurring on the surface of the sample SP.

[0086] The reflective objective lens 74 is configured to coaxially arrange an optical system related to the emission of the primary electromagnetic wave from the electromagnetic wave emission unit 71 and an optical system related to the reception of the reflected light by the first camera 81 and the reception of the secondary electromagnetic wave by the first and second detectors 77A, 77B. In other words, the reflective objective lens 74 is shared by the two types of optical systems.

[0087] In this embodiment, a single reflective objective lens 74 can achieve three functions, namely, irradiating a primary electromagnetic wave onto the sample SP, collecting a secondary electromagnetic wave from the sample SP, and imaging the sample SP using the first camera 81, without interfering with each other.

[0088] Furthermore, in this embodiment, the focal depth at which the primary electromagnetic wave emitted from the analytical optical system 7 is focused is deeper than the depth of field at which the first camera 81 is focused. With this configuration, even if the primary electromagnetic wave is irradiated onto the sample SP while the sample SP is being observed using the first camera 81 of the analytical optical system 7, there is no need to readjust the focus of the primary electromagnetic wave. This makes it possible to automatically adjust the focus of the primary electromagnetic wave emitted from the analytical optical system 7 to the position observed by the first camera 81.

[0089] Furthermore, the focal depth at which the primary electromagnetic waves are focused may be deeper than the focal depth at which the secondary electromagnetic waves guided to the detectors 77A and 77B are focused. That is, in order to increase the focusing efficiency of the secondary electromagnetic waves, the numerical aperture of the focusing optical system of the reflective objective lens 74 may be increased so that the focal depth is shallower than the focal depth of the primary electromagnetic waves.

[0090] The reflective objective lens 74 has an analytical optical axis Aa extending substantially in the vertical direction. The analytical optical axis Aa is arranged so as to be parallel to the observation optical axis Ao of the objective lens 92 of the observation optical system 9. In the following description, the "radial direction" refers to a direction that is perpendicular to the unit vector extending along the analytical optical axis Aa and extends radially from the analytical optical axis Aa. Similarly, the "circumferential direction" refers to a direction that is perpendicular to the unit vector extending along the analytical optical axis Aa and the radial direction and that circumferentially surrounds the analytical optical axis Aa. Furthermore, the "optical axis direction" of the analytical optical system 7 refers to a direction that extends along the analytical optical axis Aa.

[0091] 7, 8A, and 8B, the reflective objective lens 74 according to this embodiment is a Schwarzschild objective lens consisting of two mirrors. The reflective objective lens 74 includes a connecting member 74a attached to the analyzing housing 70, a mirror housing 74b connected to the analyzing housing 70 via the connecting member 74a, a primary mirror 11 having an annular shape and a relatively large diameter, a secondary mirror 12 having a disk shape and a relatively small diameter, and a support member 14 for connecting the secondary mirror 12 to the mirror housing 74b.

[0092] The connecting member 74a is formed in a pedestal shape with a through-hole coaxial with the analysis optical axis Aa. The connecting member 74a is fastened to the lower end of the optical base 700 in a circumferentially fixed state (unrotatable state). This fastening fixes the angular position of the reflective objective lens 74. The connecting member 74a is also arranged so that the through-hole of the connecting member 74a and the through-hole provided in the lower end of the optical base 700 communicate with each other.

[0093] The mirror housing 74b is formed in a cylindrical shape with a tapered diameter that decreases toward the bottom. The mirror housing 74b is fixed to the lower surface of the connecting member 74a in a circumferentially fixed state. The inner peripheral surface of the mirror housing 74b supports the primary mirror 11 and the secondary mirror 12, respectively.

[0094] Both the primary mirror 11 and the secondary mirror 12 are formed to be rotationally symmetric about the analysis optical axis Aa. The reflective objective lens 74 is configured to collect the secondary electromagnetic wave by the primary mirror 11 and the secondary mirror 12 and to guide the collected secondary electromagnetic wave to the opening 11a of the primary mirror 11.

[0095] The primary mirror 11 is configured as a cylindrical member having a central axis coaxial with the analysis optical axis Aa and a through-hole provided in the radial center. As shown in FIGS. 8A and 8B, the through-hole of the primary mirror 11 forms an opening 11a for passing the primary electromagnetic wave and the secondary electromagnetic wave. A mirror finish is applied to the lower end surface of the primary mirror 11, forming a primary reflecting surface 11b. The cylindrically formed primary mirror 11 is supported by a mirror housing 74b.

[0096] More specifically, the primary mirror 11 has an opening 11a at the center in the radial direction, and a primary reflecting surface 11b that reflects a secondary electromagnetic wave generated in the sample SP in response to the emission of the primary electromagnetic wave. The primary reflecting surface 11b is provided around the opening 11a.

[0097] The secondary mirror 12 is composed of a lens having an optical axis coaxial with the analysis optical axis Aa. As shown in FIGS. 8A, 8B, and 11, the lens constituting the secondary mirror 12 has a secondary reflecting surface 12b formed by mirror-finishing its upper end surface, and a transmission area 12a that is not mirror-finished and is configured to transmit the primary electromagnetic wave. Furthermore, a support member 14 that supports the lens in the secondary mirror 12 defines a hollow space for the passage of the secondary electromagnetic wave. The secondary mirror 12 is supported by a mirror housing 74b via the support member 14. The secondary mirror 12 is connected to the analysis housing 70 via the support member 14, the mirror housing 74b, the connecting member 74a, and the optical base 700.

[0098] More specifically, the secondary reflecting surface 12b is provided on the outer edge of the secondary mirror 12, and receives and further reflects the secondary electromagnetic wave reflected by the primary reflecting surface 11b of the primary mirror 11. The secondary reflecting surface 12b is formed in a substantially donut shape. The transmission area 12a is provided in the center of the secondary mirror 12, and is arranged so that the primary electromagnetic wave passes through it. The transmission area 12a is formed in a substantially circular plate shape.

[0099] 8A and 8B, a concave meniscus lens with its convex surface facing upward and its concave surface facing downward can be used as the lens constituting the secondary mirror 12. The secondary reflecting surface 12b is provided on the periphery of the lens and is formed in an annular shape with its mirror surface facing approximately upward.

[0100] The transmission area 12a is provided at the center in the radial direction of the lens (for example, a concave meniscus lens). The primary electromagnetic wave that passes through the transmission area 12a propagates while expanding its beam diameter.

[0101] 11, the support member 14 has an annular mirror support member 14a and a second support leg 14b connected to the mirror support member 14a. The support member 14 supports the secondary mirror 12, which is composed of a transmission area 12a and a secondary reflection surface 12b provided around the transmission area 12a, and can connect the secondary mirror 12 to the inner wall of the mirror housing 74b.

[0102] The mirror support member 14a is disposed around the secondary reflecting surface 12b and is formed in an annular shape coaxial with the analysis optical axis Aa. The mirror support member 14a is attached to the inner circumferential surface of the mirror housing 74b in an unrotatable manner. The mirror support member 14a is attached to the analysis housing 70 via the mirror housing 74b and the connecting member 74a. A space through which the secondary electromagnetic wave passes is defined by the inner circumferential surface of the mirror support member 14a and the outer circumferential surface of a cylindrical body that houses the concave meniscus lens and the tertiary lens 13 described below.

[0103] The second support legs 14b extend radially from the outer edge of the secondary reflecting surface 12b and are connected to the inner circumferential surface of the mirror housing 74b. More specifically, the second support legs 14b are configured to extend radially from the cylindrical body. In this embodiment, three second support legs 14b are provided at approximately 120° intervals in the circumferential direction.

[0104] Furthermore, a tertiary lens 13 is disposed between the transmission area 12a and the placement surface 51a in the approximately vertical direction. This tertiary lens 13 transmits and condenses the primary electromagnetic wave that has passed through the transmission area 12a.

[0105] The tertiary lens 13 has a lens body 13a and an optical thin film 13b. The tertiary lens 13 is arranged so as to be coaxial with the primary mirror 11 and the secondary mirror 12.

[0106] Lens body 13a may be formed of a biconvex lens having a diameter smaller than the outer diameter of the entire concave meniscus lens that constitutes secondary mirror 12 and larger than the outer diameter of transmission region 12a alone in the concave meniscus lens. The primary electromagnetic wave that passes through lens body 13a propagates while being focused in the radial direction.

[0107] The focal position of the optical system formed by the transmission area 12a and the lens body 13a coincides with the focal position of the optical system formed by the primary mirror 11 and the secondary mirror 12 (see black dot f in FIGS. 8A and 8B).

[0108] The optical thin film 13b is provided on the lower surface of the lens body 13a and is interposed between the transmissive region 12a and the mounting surface 51a. The optical thin film 13b blocks reflected light, such as visible light, reflected by the sample SP. As a result, the first camera 81 serving as an imaging unit collects reflected light reflected by the primary reflecting surface 11b and the secondary reflecting surface 12b. The optical thin film 13b may be provided on the concave surface opposite the transmissive region 12a of the concave meniscus lens constituting the secondary mirror 12. The optical thin film 13b may be disposed between the transmissive region 12a and the mounting surface 51a in the optical axis direction. Instead of or in addition to the optical thin film 13b on the tertiary lens 13, the deflector 73 may block visible light, or a light-blocking member for blocking visible light may be provided in the optical path connecting the deflector 73 and the tertiary lens 13.

[0109] In the reflective objective lens 74 configured as described above, the primary mirror 11 passes the primary electromagnetic wave through its opening 11a. The primary electromagnetic wave that has passed through the opening 11a passes through the transmission region 12a of the secondary mirror 12 and the lens body 13a of the tertiary lens 13 in this order, and is then irradiated onto the sample SP (see optical path L1 in FIGS. 8A and 14).

[0110] At this time, the secondary mirror 12 expands the beam diameter of the laser light (primary electromagnetic wave) passing through its transmission region 12a, and the tertiary lens 13 focuses the laser light expanded by the transmission region 12a at a predetermined focal position f. The laser light focused by the tertiary lens 13 converges at a focal length corresponding to the focal position f. This laser light diverges conically as it moves away from the predetermined focal length or further. If the reflective objective lens 74 were not fastened to the optical base 700, the laser light would propagate as parallel light without converging, as shown by the optical path L1 in FIG. 14.

[0111] The tertiary lens 13 is not essential. Instead of providing the tertiary lens 13, the secondary mirror 12 may be configured by a convex lens.

[0112] When the sample SP is irradiated with laser light (primary electromagnetic waves), plasma light (secondary electromagnetic waves) corresponding to the primary electromagnetic waves is generated and returns toward the reflective objective lens 74. The plasma light collected by the reflective objective lens 74 is guided to the primary mirror 11.

[0113] The primary mirror 11 reflects the secondary electromagnetic wave returning from the sample SP by its primary reflecting surface 11b. The secondary electromagnetic wave reflected by the primary reflecting surface 11b is guided to the secondary reflecting surface 12b of the secondary mirror 12.

[0114] The secondary mirror 12 receives the secondary electromagnetic wave reflected by the primary reflecting surface 11b with the secondary reflecting surface 12b and emits it substantially upward. The secondary electromagnetic wave reflected by the secondary reflecting surface 12b propagates along a cylindrical (hollow, cylindrical) optical path. At this time, the optical path formed by the secondary electromagnetic wave is configured to surround the optical path of the cylindrically propagating primary electromagnetic wave, as shown in FIG. 8A. In other words, the primary electromagnetic wave propagates through the hollow cylindrical portion of the optical path of the secondary electromagnetic wave so as to be coaxial with the secondary electromagnetic wave.

[0115] The secondary electromagnetic wave propagating along the cylindrical optical path is coaxial with the primary electromagnetic wave and emerges from opening 11a of primary mirror 11. The secondary electromagnetic wave emerging from opening 11a is guided to deflection element 73 as shown in Fig. 14 (see optical path L2 in Fig. 8A and Fig. 14).

[0116] Both the primary electromagnetic wave input to the reflective objective lens 74 and the secondary electromagnetic wave output from the reflective objective lens 74 are optically connected to other elements via a deflection element 73. This deflection element 73 has a configuration suitable for the reflective objective lens 74 described above.

[0117] Specifically, the deflection element 73 according to this embodiment is configured by a partial mirror having a reflective region 731 and a hollow region 732. Of these, the reflective region 731 is disposed opposite the transmissive region 12a so as to reflect the primary electromagnetic wave along the optical axis direction of the reflective objective lens 74. The hollow region 732 allows the secondary electromagnetic wave focused by the reflective objective lens 74 to pass through.

[0118] Specifically, the deflection element 73 includes a plate-shaped element support member 73a having a through-hole 73b, a mirror member 73c disposed in the center of the through-hole 73b and constituting a reflective area 731, and first support legs 73d extending radially from the outer surface of the mirror member 73c and connected to the inner surface of the through-hole 73b. The through-hole 73b passes through the element support member 73a in the optical axis direction.

[0119] Of these, the element support member 73a is formed in the shape of a rectangular thin plate, and is disposed in the optical axis direction between the spectroscopic element 75 and the opening 11a of the reflective objective lens 74. The element support member 73a is attached to the analysis housing 70 with its plate thickness direction tilted with respect to the optical axis direction.

[0120] 14, the through-hole 73b is formed to penetrate the element support member 73a along the optical axis direction of the reflective objective lens 74. In other words, the through-hole 73b extends in a direction inclined with respect to the thickness direction of the element support member 73a.

[0121] 13, the through hole 73b is formed to have a circular cross section with a constant inner diameter when viewed along the optical axis direction of the reflective objective lens 74. In this case, the central axis of the through hole 73b coincides with the optical axis of the reflective objective lens 74, i.e., the analytical optical axis Aa. In other words, the through hole 73b is formed to appear elliptical when viewed along the plate thickness direction of the element support member 73a, and is configured to have a substantially perfect circular projection surface when projected onto a plane perpendicular to the analytical optical axis Aa.

[0122] The mirror member 73c is composed of an optical mirror arranged with its mirror surface facing diagonally downward. The mirror surface of the mirror member 73c forms a reflective area 731. The reflective area 731 is aligned with the transmissive area 12a in the optical axis direction and can reflect the primary electromagnetic wave and guide it to the transmissive area 12a.

[0123] 13, the mirror member 73c is formed to have a circular shape with a certain inner diameter when viewed along the optical axis direction of the reflective objective lens 74. In this case, the central axis of the mirror member 73c coincides with the central axis of the through-hole 73b and the analysis optical axis Aa. That is, the mirror member 73c is formed to have an elliptical shape when viewed along a direction perpendicular to its mirror surface, and is configured to have a substantially perfect circular projection surface when projected onto a plane perpendicular to the analysis optical axis Aa.

[0124] The inner surface of through-hole 73b and the outer surface of mirror member 73c define hollow region 732. Hollow region 732 is disposed radially outward of reflection region 731, and allows the secondary electromagnetic wave to pass through.

[0125] 13, when the secondary mirror 12, the support member 14, and the deflection element 73 are viewed in plan along the analysis optical axis Aa, the outer diameter of the mirror member 73c is smaller than the inner diameter of the secondary reflecting surface 12b. Therefore, as shown by optical path L2 in FIG. 14, the secondary electromagnetic wave reflected by the secondary reflecting surface 12b and propagating in a cylindrical shape passes through the hollow region 732 without being blocked by the reflecting region 731.

[0126] The first support legs 73d extend radially from the outer surface of the mirror member 73c and are connected to the inner surface of the through-hole 73b. Specifically, three first support legs 73d are provided at approximately 120° intervals in the circumferential direction.

[0127] 13, the first and second support legs 73d and 14b are arranged to overlap each other when viewed along the optical axis. Here, the thickness of the first support leg 73d in the circumferential direction is approximately the same as the thickness of the second support leg 14b in the circumferential direction. The secondary electromagnetic waves outputted to weave between the second support legs 14b can pass through the hollow region 732 without being blocked by the first support leg 73d.

[0128] The secondary electromagnetic waves that pass through hollow region 732 without being blocked by reflection region 731 and first support leg 73d reach spectroscopic element 75. Spectroscopic element 75 is disposed between deflection element 73 and first beam splitter 78A in the optical axis direction of reflective objective lens 74, and guides a portion of the secondary electromagnetic waves generated in sample SP to first detector 77A and another portion to second detector 77B, etc. Most of the latter plasma light is guided to second detector 77B, but the remainder reaches first camera 81.

[0129] Specifically, the secondary electromagnetic waves returning from the sample SP contain various wavelength components in addition to the wavelength corresponding to the laser light as the primary electromagnetic waves. Therefore, the spectroscopic element 75 according to this embodiment reflects electromagnetic waves in a short wavelength band among the secondary electromagnetic waves returning from the sample SP and guides them to the first detector 77A. The spectroscopic element 75 also transmits electromagnetic waves in other bands and guides them to the second detector 77B.

[0130] More specifically, the spectroscopic element 75 is made of a material that has a higher transmittance for a second infrared component that belongs to a wavelength range equal to or greater than a predetermined wavelength than for a first ultraviolet component that belongs to a wavelength range less than the predetermined wavelength. Such materials include glass materials, synthetic resins, etc.

[0131] For example, when a glass material is used, since the glass itself has a low reflectivity for electromagnetic waves, an optical thin film that reflects electromagnetic waves belonging to the first component can be deposited on the glass surface to reflect electromagnetic waves belonging to the ultraviolet wavelength region and guide them to the first detector 77A.

[0132] The spectroscopic element 75 according to this embodiment receives the secondary electromagnetic waves collected by the reflective objective lens 74. This spectroscopic element 75 is a so-called dichroic mirror that reflects the secondary electromagnetic waves corresponding to the first component on the ultraviolet side of the incident secondary electromagnetic waves, while transmitting the secondary electromagnetic waves corresponding to the second component on the infrared side. As described above, the material that constitutes the spectroscopic element 75 has a relatively low transmittance for the first component and a relatively high transmittance for the second component. Therefore, the spectroscopic element 75 can minimize the overall loss of the secondary electromagnetic waves due to absorption by materials such as glass, compared to when the spectroscopic element 75 transmits the first component on the ultraviolet side.

[0133] The first parabolic mirror 76A is a so-called parabolic mirror, and is disposed between the spectroscopic element 75 and the first detector 77A. The first parabolic mirror 76A collects the secondary electromagnetic waves reflected by the spectroscopic element 75, and causes the collected secondary electromagnetic waves to be incident on the first detector 77A.

[0134] More specifically, the first parabolic mirror 76A reflects the ultraviolet secondary electromagnetic waves including the visible light band that are collected by the reflective objective lens 74, pass through the deflection element 73, and then are reflected by the spectroscopic element 75. The first parabolic mirror 76A is configured to collect the secondary electromagnetic waves reflected by the first parabolic mirror 76A onto the first detector 77A.

[0135] Here, first detector 77A generates an intensity distribution spectrum, which is an intensity distribution for each wavelength of plasma light (secondary electromagnetic waves) generated in sample SP. In particular, first detector 77A is configured to receive ultraviolet secondary electromagnetic waves reflected by spectroscopic element 75, and has entrance slit 77a for receiving the secondary electromagnetic waves.

[0136] The focal position of the first parabolic mirror 76A may be positioned so as to coincide with the entrance slit 77a, or may not coincide with the entrance slit 77a. The latter position corresponds to a layout that is shifted from just focus. This layout is effective in cases where the energy of the returning laser light is strong and could damage the entrance slit 77a.

[0137] 7 and 9. This first plate 701 is connected to the upper surface of the optical base 700. The first detector 77A is connected to the optical base 700 via the first plate 701. This connection makes it possible to stabilize the positioning of the entrance slit 77a relative to the light-guiding optical system 7a, such as the first parabolic mirror 76A.

[0138] Further, a first adjustment mechanism 771 (shown only in FIG. 7) is provided near the first detector 77A to adjust the relative position of the first detector 77A with respect to the first plate 701. By using this first adjustment mechanism 771, the relative position of the entrance slit 77a with respect to the light-guiding optical system 7a can be adjusted.

[0139] It should be noted that the configuration in which the first plate 701 is connected to the optical base 700 is not essential. For example, the first plate 701 may be configured to be connected to the inner wall of the analyzing housing 70. In such a configuration, the first adjustment mechanism 771 adjusts the relative position of the first detector 77A with respect to the analyzing housing 70.

[0140] The first detector 77A receives secondary electromagnetic waves generated in the sample SP and collected by the reflective objective lens 74, and generates an intensity distribution spectrum, which is the intensity distribution for each wavelength of the secondary electromagnetic waves. The first detector 77A is configured to receive the secondary electromagnetic waves dispersed upstream of the second detector 77B in the optical path of the secondary electromagnetic waves starting from the reflective objective lens 74. Of the plasma light generated in the sample SP, the first component on the ultraviolet side is guided to the first detector 77A by being reflected multiple times without passing through a lens or the like. That is, the first component on the ultraviolet side is guided to the first detector 77A via the reflective objective lens 74 and the reflective optical system, such as the first parabolic mirror 76A, without passing through a transmission optical system. Since chromatic aberration does not occur, the analytical accuracy can be improved.

[0141] In particular, when the electromagnetic wave emitter 71 is configured with a laser light source and the reflective objective lens 74 is configured to collect light generated in response to the irradiation of the laser light, the first detector 77A separates the light by reflecting the light at different angles for each wavelength and causes each of the separated light beams to enter an image sensor having multiple pixels. This allows the wavelength of light received by each pixel to differ and the received light intensity to be obtained for each wavelength. In this case, the intensity distribution spectrum corresponds to the intensity distribution for each wavelength of light.

[0142] The first detector 77A may be, for example, a Czerny-Turner detector. The first detector 77A is configured to be suitable for detecting the first component in the ultraviolet region. The entrance slit of the first detector 77A is aligned to coincide with the focal position of the first parabolic mirror 76A. The intensity distribution spectrum generated by the first detector 77A is input to the control unit 21 of the controller main body 2.

[0143] First beam splitter 78A reflects a portion of the light transmitted through spectroscopic element 75 (secondary electromagnetic waves in the infrared region including the visible light band) and guides it to second detector 77B, while transmitting the other portion (part of the visible light band) and directing it to second beam splitter 78B. Of the plasma light belonging to the visible light band, a relatively large amount of plasma light is directed to second detector 77B, and a relatively small amount of plasma light is directed to first camera 81 via second beam splitter 78B.

[0144] The second parabolic mirror 76B is a so-called parabolic mirror, and is disposed between the first beam splitter 78A and the second detector 77B. The second parabolic mirror 76B collects the secondary electromagnetic wave reflected by the first beam splitter 78A, and causes the collected secondary electromagnetic wave to be incident on the second detector 77B.

[0145] More specifically, the second parabolic mirror 76B reflects the infrared secondary electromagnetic waves that have passed through the deflection element 73, transmitted through the spectroscopic element 75, and then reflected by the first beam splitter 78A. The second parabolic mirror 76B is configured to collect the secondary electromagnetic waves reflected by the second parabolic mirror 76B onto the second detector 77B.

[0146] Here, similar to first detector 77A, second detector 77B generates an intensity distribution spectrum, which is an intensity distribution for each wavelength of plasma light (secondary electromagnetic waves) generated in sample SP when laser light (primary electromagnetic waves) is irradiated onto sample SP placed on mounting table 5 from analytical housing 70 as a housing. In particular, second detector 77B is configured to receive plasma light in the infrared region that has passed through spectroscopic element 75, and has entrance slit 77a for receiving the plasma light.

[0147] The focal position of the second parabolic mirror 76B may be positioned to coincide with the entrance slit 77a of the second detector 77B, or may not coincide with the entrance slit 77a. The latter position corresponds to a layout that is shifted from just focus. This layout is effective in cases where the energy of the returning laser light is strong and could damage the entrance slit 77a.

[0148] 7 and 9. This second plate 702 is connected to the upper surface of the optical base 700. The second detector 77B is connected to the optical base 700 via the second plate 702. This connection makes it possible to stabilize the positioning of the entrance slit 77a relative to the light-guiding optical system 7a, such as the second parabolic mirror 76B.

[0149] Further, a second adjustment mechanism 772 is provided near the second detector 77B to adjust the relative position of the second detector 77B with respect to the second plate 702. By using this second adjustment mechanism 772, the relative position of the entrance slit 77a with respect to the light-guiding optical system 7a can be adjusted.

[0150] It should be noted that the configuration in which the second plate 702 is connected to the optical base 700 is not essential. For example, the second plate 702 may be configured to be connected to the inner wall of the analyzing housing 70. In such a configuration, the second adjustment mechanism 772 adjusts the relative position of the second detector 77B with respect to the analyzing housing 70.

[0151] The second detector 77B receives the secondary electromagnetic waves generated in the sample SP and collected by the reflective objective lens 74, and generates an intensity distribution spectrum, which is the intensity distribution for each wavelength of the secondary electromagnetic waves. The second detector 77B is configured to receive the secondary electromagnetic waves dispersed downstream of the first detector 77A in the optical path of the secondary electromagnetic waves starting from the reflective objective lens 74. The second infrared component of the plasma light generated in the sample SP is guided to the second detector 77B through multiple reflections, except for passing through the spectroscopic element 75. That is, the second infrared component is guided to the first detector 77A via the reflective objective lens 74 and a reflection optical system, such as the first parabolic mirror 76A. Since chromatic aberration can be minimized, analytical accuracy can be improved.

[0152] In particular, when the electromagnetic wave emitter 71 is configured with a laser light source and the reflective objective lens 74 is configured to collect light generated in response to the irradiation of the laser light, the second detector 77B separates the light by reflecting the light at different angles for each wavelength and causes each of the separated light beams to enter an image sensor having multiple pixels. This allows the wavelength of light received by each pixel to differ and the received light intensity to be obtained for each wavelength. In this case, the intensity distribution spectrum corresponds to the intensity distribution for each wavelength of light.

[0153] The second detector 77B may be, for example, a Czerny-Turner type detector. The second detector 77B is configured to be suitable for detecting the second component in the infrared region. The entrance slit of the second detector 77B is aligned to coincide with the focal position of the second parabolic mirror 76B. The intensity distribution spectrum generated by the second detector 77B is input to the control unit 21 of the controller main body 2, similar to the intensity distribution spectrum generated by the first detector 77A.

[0154] The control unit 21 receives the ultraviolet intensity distribution spectrum generated by the first detector 77A and the infrared intensity distribution spectrum generated by the second detector 77B. Based on these intensity distribution spectra, the control unit 21 performs a component analysis of the sample SP using the basic principles described below. By using a combination of the ultraviolet intensity distribution spectrum and the infrared intensity distribution spectrum, the control unit 21 can perform a component analysis using a wider frequency range.

[0155] The second beam splitter 78B reflects the illumination light (visible light) emitted from the LED light source 79a and passed through the optical element 79b, and irradiates the sample SP with this light via the first beam splitter 78A, the spectroscopic element 75, the deflection element 73, and the reflective objective lens 74. The reflected light (visible light) reflected by the sample SP returns to the analytical optical system 7 via the reflective objective lens 74.

[0156] The second beam splitter 78B further transmits the reflected light that has returned to the analysis optical system 7, including the reflected light that has passed through the first beam splitter 78A and the plasma light that has passed through the first beam splitter 78A without reaching the first and second detectors 77A and 77B, and causes them to enter the first camera 81 via the imaging lens 80.

[0157] The coaxial illuminator 79 includes an LED light source 79a that emits illumination light and an optical element 79b through which the illumination light emitted from the LED light source 79a passes. The coaxial illuminator 79 functions as a so-called "coaxial epi-illuminator." The illumination light emitted from the LED light source 79a propagates coaxially with the laser light (primary electromagnetic wave) output from the electromagnetic wave emitting unit 71 and irradiated onto the sample SP, and with the light (secondary electromagnetic wave) returning from the sample SP.

[0158] More specifically, the coaxial illumination 79 irradiates illumination light via an optical path that is coaxial with the primary electromagnetic wave emitted from the electromagnetic wave emitting unit 71. Specifically, the portion of the optical path of the illumination light that connects the deflection element 73 and the reflective objective lens 74 is coaxial with the optical path of the primary electromagnetic wave. Furthermore, the portion of the optical path of the illumination light that connects the first beam splitter 78A and the reflective objective lens 74 is coaxial with the optical path of the secondary electromagnetic wave.

[0159] 7, the coaxial illumination 79 is built into the analysis housing 70, but the present disclosure is not limited to such a configuration. For example, a light source may be laid out outside the analysis housing 70, and the light source may be coupled to the analysis optical system 7 via an optical fiber cable.

[0160] The lateral illuminator 84 is arranged to surround the reflective objective lens 74 serving as a collection head. The lateral illuminator 84 irradiates illumination light from the side of the sample SP (in other words, from a direction tilted with respect to the analysis optical axis Aa).

[0161] Specifically, the side illuminator 84 is disposed so as to surround the outer periphery of the reflective objective lens 74. More specifically, the side illuminator 84 is configured as an annular illuminator that annularly surrounds the reflective objective lens 74. The central axis of the annulus corresponding to the side illuminator 84 (the central axis when the side illuminator 84 is considered as a ring) is disposed so as to be coaxial with the analysis optical axis Aa.

[0162] Specifically, the side lighting 84 according to this embodiment has a housing 84a, an LED light source (light source) 84b that emits illumination light, a light-guiding member 84c that transmits the illumination light emitted from the LED light source 84b, and a diffusion plate 84d.

[0163] The housing 84a is formed in a generally cylindrical shape with a larger diameter than the connecting member 74a and mirror housing 74b that constitute the reflective objective lens 74. The housing 84a covers the outer periphery of the reflective objective lens 74 (the connecting member 74a and the mirror housing 74b). As shown in FIGS. 8A and 8B, the housing 84a according to this embodiment is supported by the analysis housing 70, not the reflective objective lens 74. The inner peripheral surface of the housing 84a is spaced radially from the outer peripheral surface of the reflective objective lens 74.

[0164] The housing 84a accommodates the LED light source 84b, the light guide member 84c, and the diffuser plate 84d. The LED light source 84b, the light guide member 84c, and the diffuser plate 84d are disposed radially between the outer peripheral surface of the reflective objective lens 74 and the inner peripheral surface of the housing 84a.

[0165] The LED light source 84b is supported by the inner peripheral surface of the housing 84a. The LED light source 84b is arranged in a ring shape along the circumferential direction and can emit ring-shaped illumination light. As shown in FIG. 10, when the reflective objective lens 74 is viewed from the bottom along the analysis optical axis Aa, the LED light source 84b is divided into multiple blocks (four blocks in the illustrated example) along the circumferential direction. The LED light source 84b is configured to be able to individually light each of the divided blocks. In the example shown in FIG. 10, when the circumferential direction is considered as a clock, illumination light can be emitted from one block located at the 3 o'clock position, or from multiple blocks located at the 6 o'clock and 9 o'clock positions, etc. The illumination light emitted from the LED light source 84b is irradiated onto the sample SP via the light-guiding member 84c and the diffuser plate 84d.

[0166] Specifically, the LED light source 84b according to this embodiment is disposed radially closer to the inner circumferential surface of the housing 84a than to the outer circumferential surface of the reflective objective lens 74. The LED light source 84b is disposed radially outward from the primary mirror 11 and the secondary mirror 12. The LED light source 84b can also be disposed, for example, between the primary mirror 11 and the secondary mirror 12, so as to be closer to the analysis housing 70 than the secondary mirror 12 in the direction along the analysis optical axis Aa (the optical axis direction of the reflective objective lens 74) (in other words, so as to be farther from the sample SP than the secondary mirror 12).

[0167] 8A and 8B, the LED light source 84b is positioned away from the outer peripheral surface of the reflective objective lens 74, in other words, in a non-contact state with respect to the reflective objective lens 74. The side illumination 84 is configured to be connected to the reflective objective lens 74 via an optical base 700, and is not directly connected to the reflective objective lens 74. Furthermore, as shown in FIGS. 8A and 8B, an air vent 84e is provided above the LED light source 84b. This air vent 84e opens to the side surface of the housing 84a.

[0168] The reflective objective lens 74 is configured by combining multiple lenses into one objective lens, and is more sensitive to temperature changes than an objective lens configured from a single lens. Therefore, it is desirable to take measures to suppress heat transfer to the reflective objective lens 74 so that the measurement accuracy does not decrease due to temperature changes.

[0169] Therefore, as described above, by connecting the LED light source 84b to the reflective objective lens 74 in a non-contact manner and providing an air vent 84e in the housing 84a, heat transfer from the LED light source 84b to the reflective objective lens 74 can be suppressed.

[0170] The light guide member 84c diffuses the illumination light emitted from the LED light source 84b in the radial direction. The illumination light diffused by the light guide member 84c is emitted while expanding in the radial direction (see light path L3 in FIG. 8B).

[0171] Specifically, the light-guiding member 84c according to this embodiment is made of an annular member having an inner circumferential surface whose diameter continuously decreases in the radial direction along the analysis optical axis Aa toward the mounting surface 51a, and an outer circumferential surface whose diameter also continuously decreases in the radial direction.

[0172] Here, the inner circumferential surface of the light-guiding member 84c tapers more steeply in diameter than the outer circumferential surface toward the mounting surface 51a along the analysis optical axis Aa, so that the plate thickness of the light-guiding member 84c in the radial direction gradually increases toward the mounting surface 51a along the analysis optical axis Aa.

[0173] The illumination light that passes through the light-guiding member 84c is expanded in accordance with the angle θl between the inner and outer circumferential surfaces of the light-guiding member 84c. By adjusting the magnitude of the angle θl, the expansion of the illumination light emitted from the side illuminator 84 can be controlled. In particular, the angle θl according to this embodiment is configured so that the illumination light that passes through the light-guiding member 84c is irradiated onto an area that includes at least the focal position f of the primary electromagnetic wave. The illumination light that has been expanded by the light-guiding member 84c passes through the diffuser plate 84d and is irradiated onto the placement surface 51a.

[0174] Compared to the coaxial illumination 79 described above, the side illumination 84 irradiates illumination light via an optical path that is inclined with respect to the primary electromagnetic wave emitted from the electromagnetic wave emitting unit 71. The analytical observation device A can use the coaxial illumination 79 and the side illumination 84 selectively.

[0175] To this end, the control unit 21 (specifically, the illumination control unit 27 described later) as a processing unit inputs a control signal to at least one of the lateral illumination 84 and the coaxial illumination 79 so as to irradiate illumination light from at least one of the lateral illumination 84 and the coaxial illumination 79.

[0176] As described above, each block constituting the LED light source 84b can be individually turned on by adjusting the control signal generated by the control unit 21. In addition, the control unit 21 can control the lighting state of each illuminator, such as the light intensity of the coaxial illuminator 79 or the lateral illuminator 84.

[0177] The first camera 81 is housed in the analysis housing 70 and is connected to the upper end of the optical base 700 as shown in FIGS. 7 and 9. The first camera 81 collects light reflected by the sample SP via the reflective objective lens 74. The first camera 81 captures an image of the sample SP by detecting the amount of collected reflected light. The optical axis of the first camera 81 is coaxial with the primary electromagnetic wave, the secondary electromagnetic wave, and the illumination light. The reflected light collected by the first camera 81 includes both reflected light caused by the illumination light emitted from the lateral illumination 84 and reflected light caused by the illumination light emitted from the coaxial illumination 79. In other words, the first camera 81 as an imaging unit is shared by both the coaxial illumination 79 and the lateral illumination 84.

[0178] More specifically, the first camera 81 serving as an imaging unit receives reflected light collected by the reflective objective lens 74 serving as a collection head. Here, the first camera 81 collects the reflected light via a common optical path with the secondary electromagnetic waves collected by the reflective objective lens 74. Here, the common optical path corresponds to the optical path of the reflected light that connects the reflective objective lens 74 and the spectroscopic element 75. This optical path is split by the spectroscopic element 75.

[0179] In other words, the spectroscopic element 75 according to this embodiment receives the secondary electromagnetic wave and the reflected light via a common optical path, and can disperse the light along the common optical path so as to guide the secondary electromagnetic wave to a detector (first detector 77A) and the reflected light to an imaging unit (first camera 81). Here, the first optical path corresponds to the optical path connecting the spectroscopic element 75, the first parabolic mirror 76A, and the entrance slit 77a. The second optical path corresponds to the optical path connecting the spectroscopic element 75 and the first camera 81.

[0180] In this way, the portion of the optical path of the reflected light that connects the first beam splitter 78A and the reflective objective lens 74 is coaxial with the optical path of the secondary electromagnetic wave. Also, the portion of the optical path of the reflected light that connects the deflection element 73 and the reflective objective lens 74 is coaxial with the optical path of the primary electromagnetic wave. Also, the portion of the optical path of the reflected light that connects the second beam splitter 78B and the reflective objective lens 74 is coaxial with the optical path of the illumination light.

[0181] The first camera 81 according to this embodiment photoelectrically converts light incident through the imaging lens 80 using a plurality of pixels arranged on its light receiving surface, and converts the light into an electrical signal corresponding to an optical image of the subject (sample SP).

[0182] The first camera 81 may have a plurality of light receiving elements arranged along the light receiving surface. In this case, each light receiving element corresponds to a pixel, and an electrical signal can be generated based on the amount of light received by each light receiving element. Specifically, the first camera 81 according to this embodiment is configured with an image sensor made of a CMOS (Complementary Metal Oxide Semiconductor), but is not limited to this configuration. The first camera 81 may also be configured with an image sensor made of, for example, a CCD (Charged-Coupled Device).

[0183] First camera 81 then inputs electrical signals generated by detecting the amount of light received by each light receiving element to control unit 21 of controller main body 2. Control unit 21 generates image data corresponding to the optical image of the subject based on the input electrical signals.

[0184] The light returning from the sample SP is split and incident on the first detector 77A, the second detector 77B, and the first camera 81. Therefore, the amount of light received by the first camera 81 is smaller than that of a second camera 93 (described later) in the observation optical system 9. As a result, the image data (second image data I2) based on the electrical signal input from the first camera 81 tends to have a different brightness from the image data (first image data I1) based on the electrical signal input from the second camera 93. Therefore, the first camera 81 adjusts its exposure time to ensure brightness similar to that of the image data generated by the second camera 93.

[0185] The optical components described so far are housed in the aforementioned analysis housing 70. A through-hole 70a is provided in the bottom surface of the analysis housing 70. The reflective objective lens 74 faces the mounting surface 51a via this through-hole 70a.

[0186] A shielding member 83 shown in Fig. 7 may be disposed inside the analyzing housing 70. This shielding member 83 is disposed between the through-hole 70a and the reflective objective lens 74, and can be inserted into the optical path of the laser light based on an electrical signal input from the controller main body 2 (see the dotted line in Fig. 7). The shielding member 83 is configured so as to be impermeable to at least the laser light.

[0187] By inserting the shielding member 83 into the optical path, it is possible to restrict the emission of laser light from the analyzing housing 70. The shielding member 83 may be disposed between the electromagnetic wave emitting part 71 and the output adjusting means 72.

[0188] 15, the analyzing housing 70 defines a space for accommodating the analytical optical system 7 as well as a space for accommodating the slide mechanism 65. In that sense, the analyzing housing 70 can also be considered as one element of the slide mechanism 65.

[0189] Specifically, the analyzing casing 70 according to this embodiment is formed in a box shape with a shorter front-rear dimension than its left-right dimension. The left portion of the front surface 70b of the analyzing casing 70 protrudes forward to ensure a movement margin for the guide rail 65a in the front-rear direction. Hereinafter, this protruding portion will be referred to as the "protruding portion" and will be denoted by the reference numeral 70c. This protruding portion 70c is located in the lower half of the front surface 70b in the up-down direction (in other words, only the lower half of the left portion of the front surface 70b protrudes).

[0190] -About the relationship between optical paths- The analysis optical system 7 causes a primary electromagnetic wave to be incident on the sample SP via the output adjustment means 72, the reflection region 731 of the deflection element 73, the opening 11a of the primary mirror 11, and the transmission region 12a of the secondary mirror 12. Here, as shown in Fig. 14, the reflection region 731, the opening 11a, and the transmission region 12a are arranged in this order along the analysis optical axis Aa. Therefore, the transmission region 12a according to this embodiment transmits the primary electromagnetic wave that has been emitted from the electromagnetic wave emitting unit 71 and passed through the opening 11a, thereby allowing the primary electromagnetic wave to be emitted along the analysis optical axis Aa.

[0191] The primary electromagnetic wave emitted along the analytical optical axis Aa is irradiated onto the sample SP and scattered or absorbed. In the sample SP, secondary electromagnetic waves are generated by the irradiation of the primary electromagnetic wave. The generated secondary electromagnetic waves return to the analytical optical system 7 via the reflective objective lens 74. Generally, the returned secondary electromagnetic waves will contain a variety of wavelengths.

[0192] Therefore, the analytical optical system 7 causes the ultraviolet secondary electromagnetic wave to be incident on the first detector 77A via the primary reflecting surface 11b of the primary mirror 11, the secondary reflecting surface 12b of the secondary mirror 12, the opening 11a of the primary mirror 11, the hollow region 732 of the deflection element 73, the spectroscopic element 75, and the first parabolic mirror 76A.

[0193] The analytical optical system 7 also causes the infrared secondary electromagnetic wave to be incident on the second detector 77B via the primary reflecting surface 11b of the primary mirror 11, the secondary reflecting surface 12b of the secondary mirror 12, the opening 11a of the primary mirror 11, the hollow region 732 of the deflection element 73, the spectroscopic element 75, the first beam splitter 78A, and the second parabolic mirror 76B.

[0194] In this way, the analytical optical system 7 causes the secondary electromagnetic waves to be incident on the detectors 77A and 77B without the intervention of optical fibers. In other words, the analytical optical system 7 according to this embodiment guides the secondary electromagnetic waves to the detectors 77A and 77B without passing them through optical fibers. The analytical optical system 7 has a so-called fiberless configuration with respect to the optical path of the secondary electromagnetic waves.

[0195] Furthermore, the analytical optical system 7 according to this embodiment guides the ultraviolet secondary electromagnetic wave to the first detector 77A by using only the reflection of the electromagnetic wave without transmitting it through a glass material. The analytical optical system 7 is configured as a fiberless, all-reflection system (an optical system that uses only the reflection of the electromagnetic wave) with respect to the optical path of the ultraviolet secondary electromagnetic wave.

[0196] Furthermore, when guiding the infrared secondary electromagnetic waves to the second detector 77B, the analytical optical system 7 transmits only the spectroscopic element 75. The analytical optical system 7 is configured so that the optical path of the infrared secondary electromagnetic waves is fiberless and suppresses transmission of the electromagnetic waves as much as possible.

[0197] The analytical optical system 7 according to this embodiment irradiates the first electromagnetic wave in a straight line by passing the first electromagnetic wave through the reflective region 731, the opening 11a, and the transmissive region 12a, which are arranged along the analytical optical axis Aa, in that order. Meanwhile, the secondary reflective surface 12b is disposed closer to the mounting surface 51a than the primary reflective surface 11b in the optical axis direction of the reflective objective lens 74.

[0198] Therefore, the secondary electromagnetic waves generated in the sample SP, after being reflected by the primary reflecting surface 11b, propagate from the primary reflecting surface 11b to the secondary reflecting surface 12b, and then temporarily propagate in a direction approaching the mounting surface 51a. After that, the secondary electromagnetic waves reflected by the secondary reflecting surface 12b turn back their propagation direction and propagate in a direction away from the mounting surface 51a.

[0199] In this way, the secondary electromagnetic wave propagates after undergoing multiple reflections. The optical path of the secondary electromagnetic wave has a longer length due to the folding caused by the multiple reflections, compared to the case where the secondary electromagnetic wave propagates in a straight line, for example, like the primary electromagnetic wave.

[0200] Furthermore, as described above, when a concave meniscus lens is used as the secondary mirror 12 and a convex lens is used as the tertiary lens 13, or when a convex lens is used as the secondary mirror 12 without using the tertiary lens 13, the ultraviolet laser light incident on the reflective objective lens 74 is condensed by either of the convex lenses and comes to a focus at a predetermined focal length Df. In either configuration, the reflective objective lens 74 can diffuse the ultraviolet laser light in a conical shape by gradually decreasing the energy density of the ultraviolet laser light as the distance from the objective lens 74 exceeds the focal length Df.

[0201] -Basic principles of analysis using analytical optical system 7- The control unit 21, particularly the spectrum analysis unit 213 described below, performs a component analysis of the sample SP based on the intensity distribution spectra input from the first detector 77A and the second detector 77B. As a specific analysis method, the LIBS method can be used, as described above. The LIBS method is a method for analyzing components contained in the sample SP at the elemental level (a so-called elemental analysis method).

[0202] Generally, when high energy is applied to a substance, electrons are separated from the atomic nucleus, and the substance enters a plasma state. The electrons that are separated from the atomic nucleus temporarily enter a high-energy and unstable state, but by losing energy from that state, they are captured by the atomic nucleus again and transition to a low-energy and stable state (in other words, they return from a plasma state to a non-plasma state).

[0203] Here, the energy lost from the electrons is emitted as electromagnetic waves, but the magnitude of the energy of these waves is determined by the energy levels based on the shell structure specific to each element. In other words, the energy of the electromagnetic waves emitted when electrons return from plasma to a non-plasma state has a value specific to each element (or more precisely, the orbit of the electron bound to the atomic nucleus). The magnitude of the energy of the electromagnetic waves is determined by their wavelength. Therefore, by analyzing the wavelength distribution of the electromagnetic waves emitted from the electrons, that is, the wavelength distribution of the light emitted from a substance when it becomes plasma, it is possible to analyze the components contained in that substance at the elemental level. This method is generally called atomic emission spectroscopy (AES).

[0204] The LIBS method is an analytical technique that belongs to the AES method. Specifically, in the LIBS method, energy is imparted to a substance (sample SP) by irradiating it with a laser (primary electromagnetic waves). Here, the area irradiated with the laser is locally converted into plasma, and by analyzing the intensity distribution spectrum of the light (secondary electromagnetic waves) emitted as a result of this plasma conversion, it is possible to analyze the components of the substance.

[0205] That is, as described above, the wavelength of each plasma light (secondary electromagnetic wave) has a unique value for each element, so when the intensity distribution spectrum forms a peak at a specific wavelength, the element corresponding to that peak is a component of the sample SP. When the intensity distribution spectrum contains multiple peaks, the component ratio of each element can be calculated by comparing the intensities (amounts of received light) of each peak.

[0206] The LIBS method does not require vacuuming and allows component analysis to be performed in an open-air state. Furthermore, although it is a destructive test of the sample SP, it does not require processing such as dissolving the entire sample SP, and the positional information of the sample SP remains (it is merely a locally destructive test).

[0207] -Observation Optical System 9- The observation optical system 9 is a collection of parts for observing a sample SP as an observation target, and each part is accommodated in an observation housing 90. The parts that make up the observation optical system 9 include an objective lens 92 and a second camera 93 as a second imaging unit. At least these parts are accommodated in the observation housing 90. The elements for observing the sample SP also include a control unit 21 as a processing unit.

[0208] The observation optical system 9 includes an observation unit 9a having an objective lens 92. As shown in FIG. 3 and other figures, this observation unit 9a corresponds to a cylindrical lens barrel arranged at the lower end side of the observation housing 90. The observation unit 9a is held by the analysis housing 70. The observation unit 9a can be removed from the observation housing 90 as a single unit.

[0209] A communication cable C2 for transmitting and receiving electrical signals to and from the controller main body 2, and an optical fiber cable C3 for guiding illumination light from the outside, are connected to the observation housing 90. Note that the communication cable C2 is not essential, and the observation optical system 9 and the controller main body 2 may be connected via wireless communication.

[0210] Specifically, as shown in Figure 6, the observation optical system 9 includes a group of mirrors 91, an objective lens 92, a second camera 93 as a second imaging unit, a second coaxial illumination 94, and a second lateral illumination 95.

[0211] The objective lens 92 has an observation optical axis Ao extending substantially vertically, and collects illumination light to illuminate the sample SP placed on the mounting stage main body 51, while also collecting light (reflected light) from the sample SP. The observation optical axis Ao is arranged so as to be parallel to the analysis optical axis Aa of the reflective objective lens 74 of the analysis optical system 7. The reflected light collected by the objective lens 92 is received by the second camera 93.

[0212] The mirror group 91 transmits the reflected light collected by the objective lens 92 and guides it to the second camera 93. The mirror group 91 according to this embodiment can be configured using a total reflection mirror, a beam splitter, and the like, as exemplified in FIG. 6. The mirror group 91 also reflects illumination light emitted from a second coaxial illumination 94 and guides it to the objective lens 92.

[0213] The second camera 93 collects the reflected light focused by the objective lens 92 and captures an image of the sample SP by detecting the amount of received reflected light. Specifically, the second camera 93 according to this embodiment photoelectrically converts the light incident from the sample SP through the objective lens 92 using a plurality of pixels arranged on its light receiving surface, converting it into an electrical signal corresponding to an optical image of the subject (sample SP).

[0214] The second camera 93 may have a plurality of light receiving elements arranged along its light receiving surface. In this case, each light receiving element corresponds to a pixel, and an electrical signal can be generated based on the amount of light received by each light receiving element. The second camera 93 according to this embodiment is configured with a CMOS image sensor, similar to the first camera 81, but a CCD image sensor can also be used.

[0215] The second camera 93 then inputs electrical signals generated by detecting the amount of light received by each light receiving element to the control unit 21 of the controller main body 2. The control unit 21 generates image data corresponding to the optical image of the subject based on the input electrical signals.

[0216] The second coaxial illuminator 94 emits illumination light guided through the optical fiber cable C3. The second coaxial illuminator 94 emits illumination light through a common optical path with the reflected light collected through the objective lens 92. In other words, the second coaxial illuminator 94 functions as a "coaxial epi-illuminator" that is coaxial with the observation optical axis Ao of the objective lens 92. Note that instead of guiding illumination light from the outside through the optical fiber cable C3, a light source may be built into the observation unit 9a. In this case, the optical fiber cable C3 is not necessary.

[0217] As shown in FIG. 6, the second side illuminator 95 is configured by a ring illuminator arranged to surround the objective lens 92. Similar to the side illuminator 84 in the analysis optical system 7, the second side illuminator 95 irradiates illumination light from diagonally above the sample SP. Although detailed illustration is omitted, when the second side illuminator 95 is considered to be a ring, its central axis coincides with the observation optical axis Ao. Furthermore, similar to the side illuminator 84, the second side illuminator 95 is divided into multiple blocks in the circumferential direction, and each block can be individually illuminated.

[0218] In the example shown in FIG. 10, the second side illumination 95, like the side illumination 84 of the analytical optical system 7, is divided into four blocks located at the 0 o'clock position, the 3 o'clock position, the 6 o'clock position, and the 9 o'clock position when the circumferential direction is considered as a clock, and illumination light can be emitted from one block located at the 3 o'clock position, or from multiple blocks such as the 6 o'clock and 9 o'clock positions.

[0219] The analytical observation device A can selectively use the second coaxial illuminator 94 and the second side illuminator 95. To this end, a control unit (specifically, an illumination control unit 216 described below) 21 serving as a processing unit inputs a control signal to at least one of the second side illuminator 95 and the second coaxial illuminator 94 so as to irradiate illumination light from at least one of the second side illuminator 95 and the second coaxial illuminator 94.

[0220] As described above, each block constituting the second side lighting 95 can be individually turned on by adjusting the control signal generated by the control unit 21. In addition, the lighting state of each illuminator, such as the light intensity of the second coaxial illuminator 94 or the second side lighting illuminator 95, can be controlled by the control unit 21.

[0221] -Housing connector 64- The housing connector 64 is a member for connecting the observation housing 90 to the analysis housing 70. By connecting the two housings 70, 90 with the housing connector 64, the analysis optical system 7 and the observation optical system 9 move integrally.

[0222] The housing connector 64 can be attached to the inside or outside of the analytical housing 70, i.e., to the inside or outside of the analytical housing 70, or to the stand 42. In particular, in this embodiment, the housing connector 64 is adapted to be attached to the outer surface of the analytical housing 70.

[0223] Specifically, the housing connector 64 according to this embodiment is configured to be attachable to the aforementioned protrusion 70c of the analyzing housing 70, and is configured to hold the observation unit 9a to the right of the protrusion 70c.

[0224] 3, when the observation housing 90 is connected to the analysis housing 70 by the housing connector 64, the front surface of the protrusion 70c protrudes further forward than the front portions of the housing connector 64 and the observation housing 90. Thus, in this embodiment, when the housing connector 64 holds the observation housing 90, the observation housing 90 and at least a portion of the analysis housing 70 (the protrusion 70c in this embodiment) are laid out so as to overlap each other when viewed from the side (when viewed from a direction perpendicular to the direction of movement of the observation optical system 9 and the analysis optical system 7 by the slide mechanism 65).

[0225] The housing connector 64 according to this embodiment can fix the relative position of the analysis optical axis Aa with respect to the observation optical axis Ao by fixing the observation housing 90 to the analysis housing 70.

[0226] 15, the housing connector 64 holds the observation housing 90, so that the observation optical axis Ao and the analysis optical axis Aa are arranged to be aligned along the direction (front-to-back direction in this embodiment) in which the observation optical system 9 and the analysis optical system 7 move relatively to the mounting table 5 by the slide mechanism 65. Particularly in this embodiment, the observation optical axis Ao is arranged to be positioned forward of the analysis optical axis Aa.

[0227] Furthermore, as shown in FIG. 15, when the housing connector 64 holds the observation housing 90, the observation optical axis Ao and the analysis optical axis Aa are arranged so that their positions coincide in a non-moving direction (left-right direction in this embodiment) that is along the horizontal direction and perpendicular to the aforementioned moving direction (front-back direction in this embodiment).

[0228] -Slide mechanism 65- Fig. 15 is a schematic diagram illustrating the configuration of the slide mechanism 65. Figs. 16A and 16B are diagrams illustrating the horizontal movement of the head unit 6.

[0229] The slide mechanism 65 is configured to move the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table main body 51 in the horizontal direction so that imaging of the sample SP by the observation optical system 9 and irradiation of electromagnetic waves (laser light) when generating an intensity distribution spectrum by the analysis optical system 7 (in other words, irradiation of electromagnetic waves by the electromagnetic wave emitting section 71 of the analysis optical system 7) can be performed on the same location on the sample SP as the object to be observed.

[0230] The direction of movement of the relative positions by the slide mechanism 65 can be the direction in which the observation optical axis Ao and the analysis optical axis Aa are aligned. As shown in Fig. 15, the slide mechanism 65 according to this embodiment moves the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table main body 51 in the front-rear direction.

[0231] The slide mechanism 65 according to this embodiment displaces the analysis casing 70 relative to the stand 42 and the head mounting member 61. Because the analysis casing 70 and the observation unit 9a are connected by the casing connector 64, displacing the analysis casing 70 also displaces the observation unit 9a integrally.

[0232] Specifically, the slide mechanism 65 according to this embodiment has a guide rail 65a and an actuator 65b. Of these, the guide rail 65a is configured to protrude forward from the front surface of the head mounting member 61.

[0233] More specifically, the base end of the guide rail 65a is fixed to the head mounting member 61. Meanwhile, the tip end portion of the guide rail 65a is inserted into a storage space defined within the analysis housing 70, and is attached in a state in which it can be inserted into or removed from the analysis housing 70. The insertion and removal direction of the analysis housing 70 relative to the guide rail 65a is equal to the direction in which the head mounting member 61 and the analysis housing 70 are moved away from or closer to each other (the front-to-rear direction in this embodiment).

[0234] The actuator 65b can be, for example, a linear motor or a stepping motor that operates based on an electrical signal from the control unit 21. By driving this actuator 65b, the analysis housing 70, and therefore the observation optical system 9 and the analysis optical system 7, can be displaced relative to the stand 42 and the head mounting member 61. When a stepping motor is used as the actuator 65b, a motion conversion mechanism that converts the rotational motion of the output shaft of the stepping motor into linear motion in the forward and backward directions is further provided.

[0235] The slide mechanism 65 further has a movement amount sensor Sw2 for detecting the movement amount of the observation optical system 9 and the analysis optical system 7. The movement amount sensor Sw2 can be configured with, for example, a linear scale (linear encoder) or a photointerrupter.

[0236] The movement amount sensor Sw2 detects the relative distance between the analysis casing 70 and the head mounting member 61, and inputs an electrical signal corresponding to the relative distance to the controller main body 2. The controller main body 2 determines the amount of displacement of the observation optical system 9 and the analysis optical system 7 by calculating the amount of change in the relative distance input from the movement amount sensor Sw2.

[0237] 16A and 16B, operation of the slide mechanism 65 causes the head unit 6 to slide horizontally, and the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table 5 are moved (horizontally moved). This horizontal movement causes the head unit 6 to switch between a first mode in which the reflective objective lens 74 faces the sample SP, and a second mode in which the objective lens 92 faces the sample SP. The slide mechanism 65 can slide the analysis housing 70 and the observation housing 90 between the first mode and the second mode.

[0238] 16A and 16B, in the first mode, the head unit 6 is in a relatively advanced state, and in the second mode, the head unit 6 is in a relatively retreated state. The first mode is an operation mode for performing component analysis of the sample SP using the analytical optical system 7, and the second mode is an operation mode for performing magnified observation of the sample SP using the observation optical system 9.

[0239] In particular, the analytical observation device A according to this embodiment is configured so that the location at which the reflective objective lens 74 is pointed in the first mode and the location at which the objective lens 92 is pointed in the second mode are the same. Specifically, the analytical observation device A is configured so that the location at which the analytical optical axis Aa and the sample SP intersect in the first mode and the location at which the observation optical axis Ao and the sample SP intersect in the second mode are the same (see FIG. 16B).

[0240] To achieve this configuration, the amount of movement D2 of the head unit 6 when the slide mechanism 65 is actuated is set to be the same as the distance D1 between the observation optical axis Ao and the analysis optical axis Aa (see FIG. 15). In addition, the alignment direction of the observation optical axis Ao and the analysis optical axis Aa is set to be parallel to the movement direction of the head unit 6, as shown in FIG.

[0241] Furthermore, in this embodiment, by adjusting the dimension of the housing connector 64 in the approximately vertical direction, the distance between the sample SP and the center of the reflective objective lens 74 in the first mode (first state) (more specifically, the location where the analysis optical axis Aa and the reflective objective lens 74 intersect) is set to match the distance between the sample SP and the center of the objective lens 92 in the second mode (second state) (more specifically, the location where the observation optical axis Ao and the objective lens 92 intersect). This setting can also be performed by determining the focus position using autofocus. By setting it in this manner, the focus position can be matched between the first mode, in which the sample SP is analyzed, and the second mode, in which the sample SP is observed. Matching the focus position in both modes makes it possible to maintain a focused state before and after switching modes.

[0242] It is also possible to design the focal position to roughly match between the first mode and the second mode by adjusting the dimensions of the housing connector 64, and then adjust the focal position more precisely by autofocus when switching modes. In this way, the time required for autofocus can be shortened because the focal positions are designed to roughly match in advance.

[0243] Usually, the WD of the reflective objective lens 74 is shorter than that of a general objective lens such as the objective lens 92. Therefore, in this embodiment, the lens diameter of the reflective objective lens 74 is set to be larger than that of the objective lens 92, so that the WD of the reflective objective lens 74 is configured to be longer than usual.

[0244] By configuring as described above, before and after switching between the first mode and the second mode, it becomes possible to perform image generation of the sample SP by the observation optical system 9 and generation of an intensity distribution spectrum by the analysis optical system 7 (specifically, irradiation of a primary electromagnetic wave by the analysis optical system 7 when an intensity distribution spectrum is generated by the analysis optical system 7) on the same location in the sample SP from the same direction.

[0245] Furthermore, as shown in Figure 16B, the aforementioned cover member 61b of the head mounting member 61 is positioned so as to cover (shield) the reflective objective lens 74 that constitutes the analytical optical system 7 in the first mode in which the head portion 6 is relatively retracted, and is positioned so as to be spaced away from (non-shield) the reflective objective lens 74 in the second mode in which the head portion 6 is relatively advanced.

[0246] In the former shielded state, even if a laser beam is unintentionally emitted, the laser beam can be blocked by the cover member 61b, thereby improving the safety of the device.

[0247] (Details of tilt mechanism 45) 17A and 17B are diagrams for explaining the operation of the tilting mechanism 45. Hereinafter, the tilting mechanism 45, including its relationship with the housing connector 64, will be further explained with reference to FIGS. 17A and 17B.

[0248] The tilting mechanism 45 is a mechanism constituted by the aforementioned shaft member 44 and the like, and is capable of tilting at least the observation optical system 9 out of the analysis optical system 7 and the observation optical system 9 with respect to a reference axis As perpendicular to the mounting surface 51a.

[0249] As described above, in this embodiment, the relative position of the observation optical axis Ao with respect to the analysis optical axis Aa is maintained by integrally connecting the analysis housing 70 and the observation housing 90 with the housing connector 64. Therefore, when the observation optical system 9 having the observation optical axis Ao is tilted, the analysis optical system 7 having the analysis optical axis Aa will tilt integrally with the observation optical system 9, as shown in Figures 17A and 17B.

[0250] In this way, the tilting mechanism 45 according to this embodiment tilts the analytical optical system 7 and the observation optical system 9 together while maintaining the relative position of the observation optical axis Ao with respect to the analytical optical axis Aa.

[0251] Furthermore, the operation of the slide mechanism 65 and the operation of the tilt mechanism 45 are independent of each other, and a combination of the two operations is permitted. Therefore, the slide mechanism 65 can move the relative positions of the observation optical system 9 and the analytical optical system 7 while maintaining at least the tilted attitude of the observation optical system 9 by the tilt mechanism 45. That is, in the analytical observation device A according to this embodiment, the head unit 6 can slide back and forth while the observation optical system 9 remains tilted, as shown by the double-headed arrow A1 in Fig. 17B.

[0252] In particular, in this embodiment, the analytical optical system 7 and the observation optical system 9 are configured to tilt integrally, and therefore the slide mechanism 65 moves the relative positions of the observation optical system 9 and the analytical optical system 7 while maintaining the tilted state of both the observation optical system 9 and the analytical optical system 7 by the tilt mechanism 45.

[0253] Furthermore, the analytical observation device A is configured to be able to perform eucentric observation. That is, in the analytical observation device A, a three-dimensional coordinate system specific to the device is defined, which is formed by three axes parallel to the X direction, the Y direction, and the Z direction. The storage device 21b of the control unit 21 further stores the coordinates of an intersection position, which will be described later, in the three-dimensional coordinate system of the analytical observation device A. The coordinate information of the intersection position may be stored in the storage device 21b in advance when the analytical observation device A is shipped from the factory. Furthermore, the coordinate information of the intersection position stored in the storage device 21b may be updatable by the user of the analytical observation device A.

[0254] 17A and 17B, if the angle of the analytical optical axis Aa with respect to the reference axis As is referred to as the "tilt θ," the analytical observation device A is configured to allow the emission of laser light when the tilt θ is below a predetermined first threshold θmax, for example. To keep the tilt θ below the first threshold θmax, a hardware constraint can be imposed on the tilt mechanism 45. For example, the operating range of the tilt mechanism 45 may be physically limited by providing a brake mechanism (not shown) in the tilt mechanism 45.

[0255] The observation optical axis Ao, which is the optical axis of the objective lens 92, intersects with the central axis Ac. When the objective lens 92 oscillates around the central axis Ac, the intersection position of the observation optical axis Ao and the central axis Ac is maintained constant, while the angle (tilt θ) of the observation optical axis Ao with respect to the reference axis As changes. In this way, when the user oscillates the objective lens 92 around the central axis Ac using the tilting mechanism 45, for example, if the observation target portion of the sample SP is at the above-mentioned intersection position, even if the objective lens 92 is tilted, a eucentric relationship is maintained in which the center of the field of view of the second camera 93 does not move from the same observation target portion. Therefore, it is possible to prevent the observation target portion of the sample SP from deviating from the field of view of the second camera 93 (the field of view of the objective lens 92).

[0256] In particular, in this embodiment, the analytical optical system 7 and the observation optical system 9 are configured to tilt integrally, so that the analytical optical axis Aa, which is the optical axis of the reflective objective lens 74, intersects with the central axis Ac, just like the observation optical axis Ao. When the reflective objective lens 74 oscillates around the central axis Ac, the angle (tilt θ) of the analytical optical axis Aa with respect to the reference axis As changes while the intersection position between the analytical optical axis Aa and the central axis Ac remains constant.

[0257] As described above, the tilting mechanism 45 can tilt the stand 42 by approximately 90° to the right with respect to the reference axis As, or by approximately 60° to the left with respect to the reference axis As. However, if the analytical optical system 7 and the observation optical system 9 are configured to tilt integrally, tilting the stand 42 excessively may result in the laser light emitted from the analytical optical system 7 being directed toward the user.

[0258] Therefore, if the tilt of the observation optical axis Ao and the analysis optical axis Aa relative to the reference axis As is denoted by θ, it is desirable that the tilt θ be within a range that satisfies a predetermined safety standard, at least under conditions in which laser light can be emitted. Specifically, in this embodiment, the tilt θ is adjustable within a range below the predetermined first threshold θmax, as described above.

[0259] <Details of controller body 2> Fig. 18 is a block diagram illustrating an example of the configuration of the controller main body 2. Fig. 19 is a block diagram illustrating an example of the configuration of the control unit 21. In this embodiment, the controller main body 2 and the optical system assembly 1 are configured as separate entities, but the present disclosure is not limited to such a configuration. At least a part of the controller main body 2 may be provided in the optical system assembly 1.

[0260] As described above, the controller main body 2 according to this embodiment includes a control unit 21 that performs various processes, and a display unit 22 that displays information related to the processes performed by the control unit 21. The control unit 21 includes a processing unit 21a including a CPU, a system LSI, a DSP, etc., a storage unit 21b including a volatile memory, a non-volatile memory, etc., and an input / output bus 21c.

[0261] The control unit 21 is configured to be able to perform both the generation of image data of the sample SP based on the amount of light received from the sample SP and the analysis of substances contained in the sample SP based on the intensity distribution spectrum.

[0262] In detail, as illustrated in FIG. 18, the control unit 21 is electrically connected to at least the mouse 31, the console 32, the keyboard 33, the head driving unit 47, the mounting table driving unit 53, the electromagnetic wave emitting unit 71, the output adjustment means 72, the LED light source 79a, the first camera 81, the shielding member 83, the LED light source 84b, the second camera 93, the second coaxial lighting (second coaxial lighting) 94, the second lateral lighting (second lateral lighting) 95, the actuator 65b, the lens sensor Sw1, the movement amount sensor Sw2, the first tilt sensor Sw3 and the second tilt sensor Sw4.

[0263] The control unit 21 electrically controls the head drive unit 47, the mounting table drive unit 53, the electromagnetic wave emitter 71, the output adjustment means 72, the LED light source 79a, the first camera 81, the shielding member 83, the LED light source 84b, the second camera 93, the second coaxial light 94, the second lateral light 95 and the actuator 65b.

[0264] Furthermore, output signals from the first camera 81, the second camera 93, the lens sensor Sw1, the movement amount sensor Sw2, the first tilt sensor Sw3, and the second tilt sensor Sw4 are input to the control unit 21. The control unit 21 performs calculations based on the input output signals, and executes processing based on the calculation results.

[0265] For example, the control unit 21 calculates the tilt θ of the analytical optical system 7 with respect to the reference axis As perpendicular to the mounting surface 51a based on the detection signal of the first tilt sensor Sw3 and the detection signal of the second tilt sensor Sw4. If the tilt exceeds a predetermined threshold, the control unit 21 notifies the user with a warning or the like.

[0266] Furthermore, the control unit 21 can identify at least the type of objective lens 92 among the types of observation optical system 9 corresponding to the observation unit 9a fixed to the analysis optical system 7 by the housing connector 64, and can execute processing related to imaging of the sample SP based on the identification result. Here, the type of objective lens 92 can be identified based on the detection signal of the lens sensor Sw1. The control unit 21 can execute processing related to imaging of the sample SP, such as adjusting the exposure time of the second camera 93 and adjusting the brightness of the illumination light.

[0267] 19, the control unit 21 according to this embodiment includes a mode switching unit 211, a spectrum acquisition unit 212, a spectrum analysis unit 213, an image processing unit 214, an illumination setting unit 215, and an illumination control unit 216. These elements may be realized by a logic circuit or by executing software.

[0268] -Mode switching unit 211- The mode switching unit 211 switches from the first mode to the second mode or from the second mode to the first mode by moving the analysis optical system 7 and the observation optical system 9 forward and backward in the horizontal direction (in this embodiment, the front-to-back direction).

[0269] Specifically, the mode switching unit 211 according to this embodiment reads in advance the distance between the observation optical axis Ao and the analysis optical axis Aa, which is stored in advance in the storage device 21b. Next, the mode switching unit 211 operates the actuator 65b of the slide mechanism 65 to move the analysis optical system 7 and the observation optical system 9 forward and backward.

[0270] Here, the mode switching unit 211 compares the displacement of the observation optical system 9 and the analytical optical system 7 detected by the movement amount sensor Sw2 with a distance read in advance to determine whether the former displacement amount has reached the latter distance. Then, when the displacement amount reaches a predetermined distance, the mode switching unit 211 stops the advancement and retraction of the analytical optical system 7 and the observation optical system 9. Note that the predetermined distance may be set in advance, or may be configured so that the predetermined distance coincides with the maximum movable range of the actuator 65b.

[0271] After switching to the second mode by the mode switching unit 211, the head unit 6 can also be tilted.

[0272] -Spectrum Acquisition Unit 212- The spectrum acquisition unit 212 acquires an intensity distribution spectrum by emitting laser light from the analytical optical system 7 in the first mode. Specifically, the spectrum acquisition unit 212 according to this embodiment emits laser light (ultraviolet laser light) as a primary electromagnetic wave from the electromagnetic wave emitting unit 71, and irradiates the sample SP with this laser light via the reflective objective lens 74. When the sample SP is irradiated with laser light, the surface of the sample SP is locally converted into plasma, and when the sample returns from the plasma state to a gas or the like, light (secondary electromagnetic wave) having energy corresponding to the width between energy levels is emitted from the electrons. The emitted secondary electromagnetic wave returns to the analytical optical system 7 via the reflective objective lens 74 and reaches the first camera 81, the first detector 77A, and the second detector 77B.

[0273] An image processing unit 214 generates image data based on the light returned to the first camera 81. Furthermore, a spectrum acquisition unit 212 separates the amount of received light for each wavelength based on the light returned to the first and second detectors 77A and 77B to generate an intensity distribution spectrum. The intensity distribution spectrum generated by the spectrum acquisition unit 212 is input to a spectrum analysis unit 213.

[0274] The spectrum acquiring unit 212 synchronizes the light reception timing of the first and second detectors 77A and 77B with the emission timing of the laser light. By setting in this way, the spectrum acquiring unit 212 can acquire the intensity distribution spectrum in accordance with the emission timing of the laser light.

[0275] -Spectral Analysis Unit 213- The spectrum analysis unit 213 performs a component analysis of the sample SP based on the intensity distribution spectrum generated by the spectrum acquisition unit 212. As already explained, when the LIBS method is used, the surface of the sample SP is locally converted into plasma, and the peak wavelength of the light emitted when the plasma state returns to a gas or the like has a unique value for each element (more precisely, the electron orbital of the electrons bound to the atomic nucleus). Therefore, by identifying the peak position of the intensity distribution spectrum, it is possible to determine that the element corresponding to that peak position is a component contained in the sample SP. Furthermore, by comparing the magnitudes of the peaks (peak heights), it is possible to determine the component ratio of each element, and also to estimate the composition of the sample SP based on the determined component ratio.

[0276] The analysis results from the spectrum analysis unit 213 can be displayed on the display unit 22 or stored in the storage device 21b in a predetermined format.

[0277] -Image processing unit 214- The image processing unit 214 can control the display mode on the display unit 22 based on image data generated by the second camera 93 in the observation optical system 9 (first image data I1 described below), image data generated by the first camera 81 in the analysis optical system 7 (second image data I2 described below), and the analysis results by the spectral analysis unit 213, etc.

[0278] In particular, image processing unit 214 according to this embodiment matches the area (for example, the center position of the area) captured by second camera 93 with the area (for example, the center position of the area) captured by first camera 81 before and after switching between the first mode and the second mode. Image processing unit 214 can adjust the display modes of first and second cameras 81, 93, and therefore first and second image data I1, I2 generated by each camera 81, 93, so as to match the areas.

[0279] In addition, the image processing unit 214 can also superimpose an index P1 indicating the irradiation position of the laser light (more generally, the area irradiated with electromagnetic waves) on the second image data I2, as shown in Figures 26 and 27 described below.

[0280] -Lighting Settings Section 215- When switching from the first mode to the second mode or from the second mode to the first mode, the illumination setting unit 215 stores the illumination conditions before the mode switching, and sets the illumination conditions after the mode switching based on the stored illumination conditions.

[0281] In detail, the illumination setting unit 215 according to this embodiment sets the illumination conditions after switching between the first mode and the second mode so as to reproduce the illumination conditions referred to before switching, among the illumination conditions related to the coaxial illumination 79 and the lateral illumination 84 in the first mode and the illumination conditions related to the second coaxial illumination 94 and the second lateral illumination 95 in the second mode.

[0282] Here, the lighting conditions refer to the control parameters related to the first camera 81, coaxial lighting 79, and lateral lighting 84, and the control parameters related to the second camera 93, second coaxial lighting 94, and second lateral lighting 95. The lighting conditions include the light intensity of each lighting, the lighting state of each lighting, etc. The lighting conditions consist of multiple items that can be changed.

[0283] The control parameters related to the light intensity of each lighting include the magnitude of the current flowing through the LED light source 79a, the timing of current flow, the duration of current flow, etc. For example, the light intensity of the coaxial lighting 79 can be controlled by the magnitude of the current flowing through the LED light source 79a. The control parameters also include the exposure times of the first camera 81, the second camera 93, etc.

[0284] The control parameters related to the lighting state of each illuminator include, for example, information indicating which of the blocks constituting each of the side lighting illuminator 84 and the second side lighting illuminator 95 should be lit.

[0285] The lighting setting unit 215 compares the current lighting conditions, which are made up of a plurality of setting items, i.e., the items that were referenced before the mode switching, with the items that can be set after the mode switching, and extracts common items.

[0286] The illumination setting unit 215 sets illumination conditions for the extracted common items so that the settings before the mode switch are reused, and stores the settings in the storage device 21b. For example, consider a case where, when switching from the second mode to the first mode, the second side illumination 95 was used in the second mode before the switch, and the side illumination 84 is used in the first mode after the switch. In this case, the illumination setting unit 215 stores the light intensity of the second side illumination 95 and, of the four blocks of the second side illumination 95, which blocks were turned on in the second mode before the switch. The illumination setting unit 215 sets illumination conditions including the light intensity and the blocks that were turned on, and stores the settings in the storage device 21b.

[0287] If there is a unique item in one of the lighting conditions before and after switching, for example, if there is an item that can only be set in the state after switching and the setting item before switching cannot be referenced, the lighting setting unit 215 can set the current lighting condition by reading the initial setting of the lighting condition or the lighting condition used in the previous use. That is, the storage device 21b stores the lighting conditions referenced in the past use in the order of use, and the lighting setting unit 215 can set the lighting condition item that cannot be reused based on the stored contents.

[0288] Furthermore, after switching modes, the lighting conditions can be manually changed via the operation unit 3.

[0289] In addition, when initially setting and adjusting the lighting conditions, consideration may be given to the visible light transmittance of the optical elements of the analysis optical system 7, such as the spectroscopic element 75 and the imaging lens 80, through which light reflected by the sample SP passes before returning to the first camera 81, the light sensitivity of the image sensor that constitutes the first camera 81, the visible light transmittance of the optical elements that constitute the observation optical system 9, such as the mirror group 91, and the light sensitivity of the image sensor that constitutes the second camera 93.

[0290] In addition, when switching from the first mode to the second mode, or from the second mode to the first mode, the exposure time of the first camera 81 and the second camera 93 can be made the same by adjusting the amount of light from the lighting so as to keep the brightness of the image data displayed on the display unit 22 constant.

[0291] This allows the first camera 81 and the second camera 93 to have the same frame rate. Note that the brightness of the image data can be kept constant, for example, by controlling the product of the visible light transmittance and the light sensitivity associated with each of the first camera 81 and the second camera 93 to be constant.

[0292] -Lighting control unit 216- The illumination control unit 216 reads the illumination conditions set by the illumination setting unit 215 from the storage device 21b, and controls the coaxial illuminator 79, the side illuminator 84, the second coaxial illuminator 94, or the second side illuminator 95 so as to reflect the read illumination conditions. Through this control, it is possible to turn on one or both of the coaxial illuminator 79 and the side illuminator 84, or to turn on one or both of the second coaxial illuminator 94 and the second side illuminator 95.

[0293] When emitting laser light in the first mode, the illumination control unit 216 also temporarily turns off all of the coaxial illumination 79 and the side illumination 84 regardless of the illumination conditions.

[0294] Before turning off the coaxial illuminator 79 or the lateral illuminator 84, the illumination control unit 216 also stores the illumination conditions that were being referenced at the time of turning off the illuminator in the storage device 21b.

[0295] The illumination control unit 216 resumes the extinguishing of the coaxial illumination 79 and the side illumination 84 at a timing after the completion of the emission of the laser light (for example, at a timing before or after the analysis by the spectrum analysis unit 213). At this time, the illumination control unit 216 reads the illumination conditions stored in the storage device 21b before turning off the lights, and reflects them in the turning on of the coaxial illumination 79 or the side illumination 84.

[0296] <Specific example of control flow> Fig. 20 is a flowchart illustrating the basic operation of the analytical observation device A. Also, Fig. 21 is a flowchart illustrating the procedure for setting illumination conditions by the illumination setting unit 215, and Fig. 22 is a flowchart illustrating the procedure for analyzing the sample SP by the analytical optical system 7 and the procedure for controlling the lighting state by the illumination control unit 216. Furthermore, Fig. 23 is a diagram illustrating the display screen of the analytical observation device A.

[0297] 20, a search for an analysis target is performed by the observation optical system 9 in the second mode. In this step S1, based on an operational input by the user, the control unit 21 searches for a portion (analysis target) to be analyzed by the analysis optical system 7 among the portions of the sample SP while adjusting conditions such as the exposure time of the second camera 93, the illumination light guided by the optical fiber cable C3, and the brightness of the image data (first image data I1) generated by the second camera 93. At this time, the control unit 21 stores the first image data I1 generated by the second camera 93 as necessary.

[0298] The adjustment of the exposure time of the second camera 93 and the adjustment of the brightness of the illumination light can also be configured to be performed automatically by the control unit 21 based on the detection signal of the lens sensor Sw1, without requiring any operational input by the user.

[0299] 23 illustrates an example of a display screen when an image of a sample SP placed on the placement surface 51a is captured obliquely from above in the second mode. As shown in Fig. 23, a groove M1 representing the letter "A" is provided on the top surface of the sample SP.

[0300] 24 illustrates an example of the display screen when the sample SP is imaged from directly above (θ=±0°) using the second lateral illumination 95 in the second mode. In this case, the first image data I1 generated by the image processing unit 214 based on the detection signal of the second camera 93 is displayed on the display unit 22.

[0301] 25 illustrates an example of the display screen when the sample SP is imaged from directly above (θ=±0°) using the second coaxial illumination 94 in the second mode. In this case, the first image data I1 generated by the image processing unit 214 based on the detection signal of the second camera 93 is displayed on the display unit 22.

[0302] 24 and 25, when the second lateral illumination 85 is used and when the second coaxial illumination 94 is used, an image is obtained in which the light-dark contrast of the first image data I1 is inverted. More specifically, for example, when a sample SP with a uniform surface such as metal is used, a large amount of specularly reflected light is emitted from the metal surface, and when the second coaxial illumination 94 is used, a relatively large amount of reflected light is collected by the objective lens 92, resulting in a relatively bright image. On the other hand, when the second lateral illumination 85 is used for the same sample SP, a relatively small amount of specularly reflected light is collected by the objective lens 92, resulting in a relatively dark image.

[0303] In this way, by varying the brightness of the image depending on the type of lighting, information that is difficult to see when using one type of lighting (for example, the surface condition of the sample SP) may become easier to see when using the other type of lighting.

[0304] For example, in the examples shown in FIGS. 24 and 25, in addition to the groove M1, the brightness of minute uneven structures such as scratches Sc1 and Sc2 present on the surface of the sample SP changes. In FIG. 24, the groove M1 is easy to see, but the scratches Sc1 and Sc2 are difficult to see. Furthermore, the scratch Sc3 is even more difficult to see in FIG. 24. On the other hand, in FIG. 25, the groove M1 is difficult to see, but the scratches Sc1 and Sc2 are easy to see. Furthermore, the scratch Sc3 is clearly visible in FIG. 25. In this way, by changing the lighting depending on the type of sample SP, the user can more appropriately grasp the surface condition of the sample SP.

[0305] In the following step S2, the control unit 21 receives an instruction to switch from the second mode to the first mode based on an operation input by the user. At this point, the operation of the slide mechanism 65 by the mode switching unit 211 has not yet been executed.

[0306] Next, in step S3, before the mode is switched, the illumination setting unit 215 sets the illumination conditions. The process performed in step S3 is as shown in Fig. 21. That is, step S3 in Fig. 20 is made up of steps S31 to S40 in Fig. 21.

[0307] First, in step S31 of FIG. 21, the illumination setting unit 215 acquires each item that constitutes the current illumination conditions (illumination conditions being referred to in the second mode).

[0308] In the following step S32, the illumination setting unit 215 acquires items that can be used in the first mode from among the items that make up the illumination conditions to be referred to in the first mode.

[0309] In the following step S33, the illumination setting unit 215 compares each item of the current illumination conditions acquired in step S31 with the usable items acquired in step S32, and extracts items that are common to both.

[0310] In the following step S34, the lighting setting unit 215 determines whether or not a common item was extracted in step S33 (whether or not a common item exists), and if the determination is YES, the process proceeds to step S35, whereas if the determination is NO, the process proceeds to step S36.

[0311] In step S35, the illumination setting unit 215 reuses the current illumination conditions for the common items extracted in step S33 among the illumination conditions consisting of multiple items (items that can be used in both the first mode and the second mode, such as which direction blocks are to be lit in the side illumination 84 and the second side illumination 95).On the other hand, for items not extracted in step S33 (for example, setting items specific to the first mode related to the configuration of the analytical optical system 7), the illumination setting unit 215 reads the previously used settings, initial settings, etc.When the illumination setting unit 215 has completed setting each item, it advances the control process to step S39 and stores the settings in the storage device 21b as illumination conditions for the first mode.

[0312] On the other hand, in step S36, the illumination setting unit 215 determines whether or not the previously used settings exist, and if this determination is YES, the process proceeds to step S37, whereas if this determination is NO, the process proceeds to step S38. In step S37, the illumination setting unit 215 reads the previously used settings as the illumination conditions and proceeds to step S39, where the read illumination conditions are stored in the storage device 21b as the illumination conditions for the first mode. Also, in step S38, the illumination setting unit 215 reads the initial settings as the illumination conditions and proceeds to step S39, where the read illumination conditions are stored in the storage device 21b as the illumination conditions for the first mode.

[0313] In step S40 following step S39, the illumination control unit 216 turns off the illumination for observation (the second coaxial illumination 94 or the second lateral illumination 95) and ends the flow shown in Fig. 21. Thereafter, the control process proceeds from step S3 to step S4 in Fig. 20.

[0314] In step S4, the mode switching unit 211 activates the slide mechanism 65 to slide the observation optical system 9 and the analysis optical system 7 together, thereby switching from the second mode to the first mode.

[0315] In the following step S5, after the mode switching is completed, the illumination control unit 216 controls the illumination, and the spectrum acquisition unit 212 and the spectrum analysis unit 213 analyze the components of the sample SP. The processing performed in step S5 is as shown in Fig. 22. That is, step S5 in Fig. 20 is made up of steps S51 to S61 in Fig. 22.

[0316] First, in step S51, the illumination control unit 216 reads from the storage device 21b the illumination conditions set by the illumination setting unit 215. In the following step S52, the illumination control unit 216 turns on the analysis illumination (coaxial illumination 79 or lateral illumination 84) so ​​as to reflect the illumination conditions read in step S51. As a result, each control parameter related to the analysis illumination, such as the exposure time of the first camera 81 and the amount of illumination light emitted from the LED light source 79a, reproduces the control parameters in the second mode as much as possible.

[0317] In this embodiment, the reflective objective lens 74 for component analysis has a shallower depth of field during observation than the observation objective lens 92. Therefore, in step S53 following step S52, the illumination control unit 216 performs autofocus at each point in the second image data I2 to generate an all-in-focus image.

[0318] In addition, when the magnification of the objective lens 92 is lower than that of the reflective objective lens 74, the image processing unit 214 can use the first image data I1 saved when switching from the second mode to the first mode as a mapping image, and display on the display unit 22 which part of the mapping image is captured as the second image data I2.

[0319] 25 illustrates an example of the display screen when, in the first mode, the sample SP is imaged from directly above (θ=±0°) using the coaxial illumination 79. In this case, the second image data I2 generated by the image processing unit 214 based on the detection signal of the first camera 81 is displayed on the display unit 22.

[0320] 26 illustrates an example of the display screen when, in the second mode, the sample SP is imaged from directly above (θ=±0°) using side illumination 84. In this case, the second image data I2 generated by image processing unit 214 based on the detection signal of first camera 81 is displayed on display unit 22.

[0321] Comparing the case where the coaxial illumination 79 is used with the case where the lateral illumination 84 is used, similar to the comparison between the second lateral illumination 95 and the second coaxial illumination 94, an image is obtained in which the contrast between light and dark of the second image data I2 is inverted. As mentioned above, by using two types of illumination, the brightness of the minute uneven structures such as scratches Sc1 and Sc2 on the surface of the sample SP changes in addition to the groove M1. By changing the illumination depending on the type of sample SP, the user can more appropriately grasp the surface condition of the sample SP.

[0322] The image processing unit 214 can also overlay a mark P1 indicating the irradiation position of the laser light (laser irradiation point) on the second image data I2. This mark P1 indicates the aim of the laser light. By checking the position of the mark P1, the user can confirm whether the analysis target has been set appropriately. The image processing unit 214 can proceed with the control process based on an operation input (e.g., manual input by the user) indicating the confirmation result.

[0323] If the analysis target is not set appropriately, the head unit 6 drives the mounting table driving unit 53 based on, for example, an operation input by the user to adjust the position of the mounting table main body 51. This makes it possible to correct the relative position of the sample SP with respect to the mark P1.

[0324] In the following step S54, the control unit 21 determines whether or not an instruction to irradiate laser light has been received. This determination is made based on, for example, an operation input by the user. The control unit 21 repeats step S54 until this determination becomes YES.

[0325] In the following step S55, the image processing unit 214 stores the second image data I2 immediately before irradiating the laser light in the storage device 21b. In the following step S56, the illumination control unit 216 stores the illumination state at that time (illumination conditions immediately before emitting the laser light) in the storage device 21b. In the following step S57, the illumination control unit 216 turns off the illumination for analysis (coaxial illumination 79 or lateral illumination 84).

[0326] Then, in step S58, the spectrum acquisition unit 212 emits laser light from the analytical optical system 7 toward the sample SP. In this step S58, the first and second detectors 77A and 77B receive light (secondary electromagnetic waves) emitted as a result of the sample SP becoming plasma. At this time, the timing of receiving light by the first and second detectors 77A and 77B is set to be synchronized with the timing of emitting the laser light. The spectrum acquisition unit 212 acquires an intensity distribution spectrum in accordance with the timing of emitting the laser light.

[0327] In the following step S59, the illumination control unit 216 turns on the illumination for analysis (the coaxial illumination 79 or the lateral illumination 84). In the following step S60, the illumination control unit 216 reads the illumination conditions stored in the storage device 21b and controls the illumination for analysis to reflect the illumination conditions. This reproduces the illumination state immediately before the emission of the laser light. Note that the order of steps S59 and S60 may be reversed, or both steps may be configured to be executed simultaneously.

[0328] In the next step S61, the spectrum analysis unit 213 analyzes the intensity distribution spectrum to analyze the components and component ratios of elements contained in the sample SP and estimate the material based on the component ratios. The estimated material results are displayed, for example, on the display unit 22. This completes step S5 in FIG. 20, and the flow shown in FIG. 20 ends.

[0329] <Main features of the analytical observation device A> (Features that contribute to improved measurement accuracy) As described above, as illustrated in FIGS. 8A and 14 , the transmission region 12a according to this embodiment transmits the primary electromagnetic wave that has been emitted from the electromagnetic wave emitting unit 71 and passed through the opening 11a, thereby causing the primary electromagnetic wave to be emitted along the analysis optical axis Aa of the reflective objective lens 74. The primary electromagnetic wave is irradiated onto the sample SP in a state where it is coaxial with the analysis optical axis Aa. This allows the secondary electromagnetic wave generated in the sample SP to be collected as fully as possible by the primary mirror 11. This increases the intensity of the secondary electromagnetic waves that reach the first and second detectors 77A and 77B, thereby improving the detection accuracy of the analytical observation device A.

[0330] 7, the secondary electromagnetic waves collected by the reflective objective lens 74 reach the first or second detector 77A, 77B via the first or second parabolic mirror 76A, 76B. Thus, by using only the reflective system to guide the secondary electromagnetic waves, a fiberless configuration can be realized, eliminating the need for optical fibers. This minimizes loss of the secondary electromagnetic waves, which is advantageous for improving the detection accuracy of the analytical observation device A.

[0331] 7, by aligning the focal positions of the first and second parabolic mirrors 76A and 76B with the entrance slits 77a and 77a of the first and second detectors 77A and 77B, respectively, it is possible to maximize the gain of the secondary electromagnetic waves received by the first and second detectors 77A and 77B. This is effective in improving the detection accuracy of the analytical observation device A.

[0332] As shown in FIG. 7, the analytical observation device A is configured so that a first ultraviolet component, which is subject to loss due to transmission through glass material, is guided to a first detector 77A without passing through a spectroscopic element 75 made primarily of glass material, while a second infrared component, which is less affected by loss than the first component, is guided through the spectroscopic element 75 to a second detector 77B. This configuration makes it possible to achieve detection using multiple detectors while minimizing loss of secondary electromagnetic waves. Detection using multiple detectors contributes to improving wavelength resolution. Therefore, this configuration contributes to improving measurement accuracy by reducing loss of secondary electromagnetic waves and improving wavelength resolution.

[0333] 14, deflection element 73 reflects the primary electromagnetic wave by reflection region 731 and guides it to reflective objective lens 74, while passing the secondary electromagnetic wave through hollow region 732. By passing the secondary electromagnetic wave through hollow region 732, loss of the secondary electromagnetic wave can be suppressed. Therefore, this configuration is effective in achieving both coaxialization of the primary electromagnetic wave by reflection region 731 and improved measurement accuracy by suppressing loss of the secondary electromagnetic wave.

[0334] 12, it is possible to simultaneously establish a reflective region 731 and a hollow region 732 using one deflection element 73. Such a configuration is effective in achieving both coaxialization of the primary electromagnetic wave by reflective region 731 and improved measurement accuracy due to suppression of loss of the secondary electromagnetic wave.

[0335] 14, the secondary electromagnetic waves that have passed through the region near the first support leg 73d are not blocked by the second support leg 14b and can pass through the deflection element 73. This is effective in suppressing the loss of the secondary electromagnetic waves and, in turn, in improving the measurement accuracy of the analytical observation device A.

[0336] 13, through-hole 73b defining hollow region 732 is formed to extend along the direction of analysis optical axis Aa of reflective objective lens 74. By forming through-hole 73b in this manner, it is possible to configure through-hole 73b to be rotationally symmetric (three-fold symmetry in the illustrated example) in a plan view when it is rotated by a predetermined angle around analysis optical axis Aa. This ensures a distance between the inner circumferential surface of through-hole 73b and the secondary electromagnetic wave passing through hollow region 732, thereby suppressing interference between through-hole 73b and the secondary electromagnetic wave. This is effective in suppressing loss of the secondary electromagnetic wave and contributes to improving measurement accuracy.

[0337] 7, in addition to the primary electromagnetic wave, the optical axis of the first camera 81 is also coaxial with the reflective objective lens 74. This allows the single reflective objective lens 74 to achieve three functions, namely, irradiating the sample SP with the primary electromagnetic wave, collecting the secondary electromagnetic wave from the sample SP, and capturing an image of the sample SP by the first camera 81, without interfering with each other.

[0338] Furthermore, by interposing optical thin film 13b between transmission area 12a and mounting surface 51a, collection of reflected light via transmission area 12a is suppressed, and reflected light can be collected only by primary reflection surface 11b and secondary reflection surface 12b. This suppresses the risk of reflected light being imaged twice by first camera 81, which is advantageous for improving measurement accuracy.

[0339] 7, in addition to the optical axis of the first camera 81, the coaxial illumination 79 is also coaxial with the reflective objective lens 74. This allows the single reflective objective lens 74 to achieve four functions without interfering with each other: irradiating the sample SP with primary electromagnetic waves, collecting secondary electromagnetic waves from the sample SP, capturing an image of the sample SP with the first camera 81, and irradiating the sample SP with illumination light.

[0340] (Features that contribute to improved usability) The analytical observation device A according to this embodiment is equipped with a first camera 81 as an analytical imaging unit, and as an illumination device used for imaging by the first camera 81, a side illumination device 84 is provided, as shown in FIGS. 8A and 8B, which irradiates the analysis target with illumination light from diagonally above. In this way, by providing the side illumination device 84 around the reflective objective lens 74 as the collection head, the user can grasp the surface condition that would be difficult to grasp using other illumination devices such as coaxial illumination. This improves usability in component analysis.

[0341] Furthermore, by arranging the side illumination 84 on the outer periphery of the reflective objective lens 74, it is possible to irradiate illumination light over a wider area without compromising the compactness of the reflective objective lens 74. This makes it possible to generate image data with excellent visibility, allowing the user to more clearly grasp the surface condition of the sample SP.

[0342] 10, the side illumination 84 according to this embodiment can irradiate illumination light in a rotationally symmetric manner around the analysis optical axis Aa of the reflective objective lens 74. This is advantageous in that the illumination light can be sufficiently irradiated onto the area imaged by the first camera 81.

[0343] Furthermore, as shown in FIG. 8B, by emitting the illumination light through the light-guiding member 84c, the illumination light can be irradiated over a wider area. This makes it possible to suppress vignetting that may occur due to the secondary mirror 12, the second support leg 14b, etc. By suppressing the occurrence of vignetting, it is possible to suppress shading in the image data. This makes it possible to generate image data with better visibility, allowing the user to more clearly grasp the surface condition of the sample SP.

[0344] 8A and 8B, by configuring the side illumination 84 and the reflective objective lens 74 so as not to be directly connected, thermal connection between the LED light source 84b and the primary mirror 11 and secondary mirror 12 is suppressed. This makes it possible to suppress the thermal influence on the primary mirror 11 and secondary mirror 12 caused by heat generated from the LED light source 84b. By suppressing the thermal influence on the primary mirror 11 and secondary mirror 12, it is possible to suppress misalignment of the two mirrors 11 and 12. This is effective in ensuring the accuracy of the component analysis by the control unit 21.

[0345] Furthermore, as shown in FIGS. 8A and 8B, by arranging the LED light source 84b between the primary mirror 11 and the secondary mirror 12 in the optical axis direction, the LED light source 84b can be configured not to be closer than necessary to the mounting surface 51a. This ensures sufficient space for accommodating the light-guiding member 84c in the optical axis direction. Furthermore, by configuring the LED light source 84b not to be farther away from the mounting surface 51a than necessary, the inclination angle of the side illuminator 84 relative to the reflective objective lens 74 can be ensured without excessively increasing the diameter of the side illuminator 84. This allows the illumination light to be irradiated to an appropriate area, resulting in the generation of image data with excellent visibility. As a result, the user can more clearly grasp the surface condition of the sample SP.

[0346] 10, the side lighting 84, which is made up of multiple blocks, can be individually turned on to irradiate illumination light from various angles, allowing the user to more clearly grasp the surface condition of the sample SP.

[0347] Furthermore, the analytical observation device A according to this embodiment can use two types of illumination devices with different irradiation directions, which allows for the generation of a wider variety of image data, which is advantageous in allowing the user to understand the surface condition of the sample SP.

[0348] Furthermore, the analytical observation device A can use two types of illumination devices with different irradiation directions not only in the analytical optical system 7 but also in the observation optical system 9. This makes it possible to generate a wider variety of image data, which is advantageous in helping the user understand the surface condition of the sample SP.

[0349] 21 and 22, the control unit 21 as a processing unit can generate image data under the same conditions as possible when observing and analyzing the sample SP. This makes it possible to switch between the image data generated during observation (first image data I1) and the image data generated during analysis (second image data I2) without causing the user any discomfort, which is advantageous in improving usability.

[0350] Furthermore, the analytical observation device A according to this embodiment is configured to match the focal length during observation and analysis of the sample SP. This makes it possible to generate image data under conditions as similar as possible during observation and analysis of the sample SP. As a result, it becomes possible to switch between image data generated during observation (first image data I1) and image data generated during analysis (first image data I1) without causing the user any discomfort, which is advantageous in improving usability.

[0351] Other Embodiments (Modifications related to hardware configuration) FIG. 28 is a bottom view showing a modified example of side illumination.

[0352] In the above embodiment, the side illuminator 84 is configured as an annular illuminator capable of emitting annular illumination light, but the present disclosure is not limited to such a configuration. The side illuminator according to the present disclosure includes a general illumination device that is arranged to surround the reflective objective lens 74 as a collection head and that irradiates illumination light from obliquely above the sample SP. In other words, the side illuminator is not limited to the side illuminator 84 as an annular illuminator as exemplified in the upper part of FIG. 28 , but may also be a rectangular illuminator 84′ as exemplified in the middle part of FIG. 28 or a cross-shaped illuminator 84″ as exemplified in the lower part of FIG. 28 .

[0353] Furthermore, in the above embodiment, the observation housing 90 is configured to be supported by the outer surface of the analysis housing 70, but the present disclosure is not limited to such a configuration. The observation housing 90 or the observation unit 9a may be configured to be supported by the inner surface of the analysis housing 70. In this case, the observation housing 90 or the observation unit 9a will be housed in the analysis housing 70, similar to the analysis optical system 7.

[0354] In the above embodiment, the observation optical axis Ao and the analysis optical axis Aa are configured to be parallel to each other, but the present disclosure is not limited to such a configuration. The analysis optical system 7 and the observation optical system 9 can also be arranged so that the observation optical axis Ao and the analysis optical axis Aa are skewed relative to each other.

[0355] (Variations of the analysis method) The analytical observation device A according to the embodiment is configured to perform component analysis using the LIBS method by emitting laser light as a primary electromagnetic wave from the electromagnetic wave emitting section 71, but the present disclosure is not limited to such a configuration.

[0356] For example, infrared spectroscopy may be used instead of LIBS by using infrared light as the primary electromagnetic wave. Specifically, the chemical structure of the molecules contained in the object of observation may be analyzed by irradiating the object with infrared light and measuring the transmitted or reflected light (secondary electromagnetic wave). Raman spectroscopy may be used to examine the physical properties of the object of observation, such as its crystallinity, using monochromatic light as the electromagnetic wave and the Raman scattered light generated by irradiating the object of observation with monochromatic light. Furthermore, ultraviolet-visible-near-infrared spectroscopy may be used by using ultraviolet, visible, and infrared light in the wavelength range of approximately 180 to 3000 nm as the electromagnetic wave. Specifically, qualitative and quantitative analysis of target components contained in the object of observation may be performed by irradiating the object of observation with electromagnetic waves and measuring the transmitted or reflected light. Furthermore, spectroscopic analysis in the X-ray region may be performed by using X-rays as the electromagnetic wave. Specifically, fluorescent X-ray analysis may be performed by irradiating an object (sample) with X-rays and analyzing the elements of the object based on the energy and intensity of fluorescent X-rays, which are specific X-rays generated by the irradiation. Alternatively, an electron beam may be used instead of electromagnetic waves, and the surface of the object may be analyzed based on the energy and intensity of reflected electrons generated by irradiating the object. The configuration according to the present disclosure can also be applied to these spectroscopy cases. [Explanation of symbols]

[0357] A. Analysis and observation equipment (analysis equipment) 1 Optical Assembly 2 Controller body 21 Control section (processing section) 215 Lighting Settings 216 Lighting control unit 64 Housing connector 65 Slide mechanism 7 Analytical optical system 70 Analysis cabinet 71 Electromagnetic wave emission part 73 Deflection element 731 Reflection area 732 Hollow area 73a Element support member 73b Through hole 73c Mirror material 73d First support leg 74 Reflective Objective Lens (Collecting Head) 11 Primary mirror 11a opening 11b Primary reflective surface 12 Secondary mirror 12a Transparent area 12b Secondary reflective surface 13 Tertiary lens 13b Optical thin film 14 Support member 14a Mirror support member 14b Second support leg 75 Spectroscopic element 76A First Parabolic Mirror (Parabolic Mirror) 76B Second Parabolic Mirror (Parabolic Mirror) 77A First detector (detector) 77B Second detector (detector) 77a Entrance slit (light receiving part) 79 Coaxial lighting 81 First camera (imaging unit) 84 Side lighting 84a case 84b LED light source (light source) 84d Diffuser 9 Observation optical system 90 Observation enclosure 92 Objective Lens 93 Second camera (second imaging unit) 94 Second Coaxial Lighting (Second Coaxial Lighting) 95 Second Side Lighting (Second Side Lighting) Aa Analysis optical axis (optical axis of reflective objective lens) Ao Observation optical axis I1 First image data I2 Second image data SP sample (analyte)

Claims

1. An analytical device for performing component analysis of an analyte, an electromagnetic wave emitting unit that emits a primary electromagnetic wave for analyzing the object to be analyzed; a primary mirror having an opening at the center in the radial direction and a primary reflection surface provided around the opening that reflects secondary electromagnetic waves generated in the object to be analyzed by the emission of the primary electromagnetic waves, and a secondary mirror having a secondary reflection surface that receives the secondary electromagnetic waves reflected by the primary reflection surface and further reflects them, the reflective objective lens collecting the secondary electromagnetic waves by the primary mirror and the secondary mirror and directing them to the opening; a detector that receives the secondary electromagnetic waves generated in the object to be analyzed and collected by the reflective objective lens, and generates an intensity distribution spectrum that is an intensity distribution for each wavelength of the secondary electromagnetic waves; a processing unit that performs component analysis of the analyte based on the intensity distribution spectrum generated by the detector; It is disposed on an optical path connecting the detector and the reflective objective lens, the primary electromagnetic wave emitted from the electromagnetic wave emitting portion is incident on the reflecting objective lens, and the primary electromagnetic wave is deflected in the optical axis direction of the reflecting objective lens; a deflection element that passes the secondary electromagnetic wave collected by the reflective objective lens and directs it toward the detector, the secondary reflection surface is provided on the outer edge of the secondary mirror, and a transmission area through which the primary electromagnetic wave passes is provided in the center of the secondary mirror; The transmission region is configured to transmit the primary electromagnetic wave that has been emitted from the electromagnetic wave emission portion and passed through the opening, thereby causing the primary electromagnetic wave to exit along the optical axis of the reflective objective lens. An analytical device characterized by:

2. 2. The analytical device according to claim 1, a parabolic mirror that reflects the secondary electromagnetic wave collected by the reflective objective lens, The parabolic mirror is configured to focus the secondary electromagnetic waves reflected by the parabolic mirror onto the detector. An analytical device characterized by:

3. 3. The analyzer according to claim 1, a spectroscopic element made of a material having a higher transmittance for a second component belonging to a wavelength range equal to or greater than a predetermined wavelength than for a first component belonging to a wavelength range less than the predetermined wavelength, the spectroscopic element is configured to receive the secondary electromagnetic waves collected by the reflective objective lens, and to reflect the secondary electromagnetic waves corresponding to the first component among the secondary electromagnetic waves, while transmitting the secondary electromagnetic waves corresponding to the second component, The detector comprises: a first detector onto which the secondary electromagnetic wave reflected by the spectroscopic element is incident; a second detector onto which the secondary electromagnetic wave transmitted through the spectroscopic element is incident; An analytical device characterized by:

4. The analyzer according to any one of claims 1 to 3, The deflection element is a reflection region disposed opposite the transmission region so as to reflect the primary electromagnetic wave along an optical axis direction of the reflective objective lens; a hollow region through which the secondary electromagnetic wave collected by the reflective objective lens passes. An analytical device characterized by:

5. 5. The analytical device according to claim 4, an analysis housing that houses the deflection element; The deflection element is a plate-shaped element support member attached to the analysis housing and having a through hole; a mirror member disposed in a center portion of the through hole and constituting the reflective area; a first support leg portion extending radially from an outer surface of the mirror member and connected to an inner surface of the through hole; The hollow region is defined by an inner surface of the through hole and an outer surface of the mirror member. An analytical device characterized by:

6. 6. The analytical device according to claim 5, The secondary mirror is an annular mirror support member disposed around the secondary reflection surface and attached to the analysis housing; a second support leg extending radially from an outer edge of the secondary reflection surface and connected to an inner circumferential surface of the mirror support member, the second support leg being connected to the analyzing housing; The first and second support legs are arranged so as to overlap each other when viewed along the optical axis direction of the reflective objective lens. An analytical device characterized by:

7. 7. The analytical device according to claim 5 or 6, the element support member is attached to the analysis housing in a position in which the thickness direction of the element support member is inclined with respect to the optical axis direction of the reflective objective lens, The through-hole is formed so as to penetrate the element support member along the optical axis direction of the reflective objective lens. An analytical device characterized by:

8. The analytical device according to any one of claims 1 to 7, an imaging unit that collects reflected light reflected by the object to be analyzed via the reflective objective lens and detects the amount of received reflected light; The imaging unit collects the reflected light via a common optical path with the secondary electromagnetic wave that has been condensed by the reflective objective lens and passed through the deflection element. An analytical device characterized by:

9. 9. The analytical device according to claim 8, an optical thin film that blocks light reflected by the object to be analyzed is interposed between the transmission region and a mounting surface on which the object to be analyzed is mounted; The imaging unit collects reflected light reflected by the primary reflection surface and the secondary reflection surface. An analytical device characterized by:

10. 10. The analytical device according to claim 8 or 9, a coaxial illumination unit that irradiates the analysis target with illumination light; The coaxial illumination emits the illumination light through an optical path that is coaxial with the primary electromagnetic wave emitted from the electromagnetic wave emitting unit. An analytical device characterized by:

11. The analytical device according to any one of claims 1 to 10, the electromagnetic wave emitting unit is configured by a laser light source that emits laser light as the primary electromagnetic wave, the reflective objective lens collects light generated in the analysis subject in response to irradiation with the laser light emitted from the electromagnetic wave emission unit; The detector generates an intensity distribution spectrum, which is an intensity distribution for each wavelength of light generated in the object to be analyzed and collected by the reflective objective lens. An analytical device characterized by:

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