Electronic beam irradiation device

Abstract

To provide an electronic beam irradiation device in which a conductive path having a bent shape can be easily assembled to a pressure vessel.SOLUTION: An electron beam irradiation device 10 comprises: a power supply unit 14; an acceleration unit 13 that accelerates an electron beam Eb based on power supplied from the power supply unit 14; a conductive path 30 that electrically connects the power supply unit 14 and the acceleration unit 13; and a pressure vessel 20 that houses the power supply unit 14, the acceleration unit 13, and the conductive path 30. The conductive path 30 comprises: a first divided conductive path 31 that is electrically connected to the power supply unit 14; a second divided conductive path 32 that is electrically connected to the acceleration unit 13; and a connection part 33 that connects the first divided conductive path 31 and the second divided conductive path 32. The conductive path 30 has a bent shape in which an extension direction of the first divided conductive path 31 and an extension direction of the second divided conductive path 32 intersect each other.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present invention relates to an electron beam irradiation device. [Background technology]

[0002] An electron beam irradiation device is a device that irradiates a workpiece with an electron beam. Electron beam irradiation devices are used for purposes such as improving the properties of the material of the workpiece, adding functions, and sterilizing / sterilizing it. The electron beam irradiation device includes a power supply unit, an acceleration unit that accelerates the electron beam based on power supplied from the power supply unit, a conductive path that electrically connects the power supply unit and the acceleration unit, and a pressure vessel that houses the power supply unit, acceleration unit, and conductive path (see, for example, Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent No. 7428929 Summary of the Invention [Problem to be solved by the invention]

[0004] In the pressure vessel of the electron beam irradiation device described above, the portion housing the conductive path can be made smaller by making the shape and size of the portion corresponding to the conductive path. However, if the conductive path is configured to be significantly bent due to the relative positions of the power supply unit and the acceleration unit, it becomes difficult to assemble the conductive path into the pressure vessel if the portion housing the conductive path in the pressure vessel is made the shape and size corresponding to the conductive path. [Means for solving the problem]

[0005] [1] An electron beam irradiation device that solves the above problem is an electron beam irradiation device comprising: a power supply unit; an acceleration unit that accelerates an electron beam based on power supply from the power supply unit; a conductive path electrically connecting the power supply unit and the acceleration unit; and a pressure vessel that accommodates the power supply unit, the acceleration unit, and the conductive path, wherein the conductive path comprises a first divided conductive path electrically connected to the power supply unit, a second divided conductive path electrically connected to the acceleration unit, and a connection portion that connects the first divided conductive path and the second divided conductive path, and the conductive path has a curved shape in which the extension direction of the first divided conductive path and the extension direction of the second divided conductive path intersect each other.

[0006] According to this configuration, the first and second divided conductive paths form a bent shape for the conductive path, and therefore, by assembling the first and second divided conductive paths separately, the bent conductive path can be easily assembled inside the pressure vessel.

[0007] [2] In the electron beam irradiation device described in [1] above, the pressure vessel is provided with a conductive path accommodating portion that accommodates the conductive path, and the conductive path accommodating portion has a shape that follows the curved shape of the conductive path.

[0008] With this configuration, even if the conductive path accommodating portion of the pressure vessel has a curved shape that follows the curved shape of the conductive path, the conductive path can be easily assembled inside the pressure vessel by assembling the first divided conductive path and the second divided conductive path separately.

[0009] [3] In the electron beam irradiation device described in [2] above, the first split conductive path has a first end which is one end of the first split conductive path in the extension direction and is connected to the power supply unit, and a second end which is an end opposite to the first end in the extension direction of the first split conductive path and is connected to the connection unit, the second split conductive path has a third end which is one end of the second split conductive path in the extension direction and is connected to the acceleration unit, and a fourth end which is an end opposite to the third end in the extension direction of the second split conductive path and is connected to the connection unit, and the conductive path accommodating portion has a first window portion located on an extension of the second end of the first split conductive path and for inserting the first split conductive path into the conductive path accommodating portion, and a second window portion located on an extension of the fourth end of the second split conductive path and for inserting the second split conductive path into the conductive path accommodating portion.

[0010] With this configuration, the first divided conductive path can be inserted into the conductive path housing through the first window, and the second divided conductive path can be inserted into the conductive path housing through the second window. Also, the first divided conductive path and the second divided conductive path can be connected through at least one of the first window and the second window.

[0011] [4] The electron beam irradiation apparatus according to any one of [1] to [3] above, further comprising a support portion that connects the pressure vessel and the conductive path to support the conductive path.

[0012] According to this configuration, the conductive path having a bent shape can be supported by the support portion relative to the pressure vessel. [5] In the electron beam irradiation device described in [4] above, the support portion includes a plurality of resistors connected to the conductive path and connected in series with each other.

[0013] With this configuration, since the voltage of the conductive path is divided by the multiple resistors, it is possible to configure the support part without using insulating insulators even if the conductive path is at a high voltage, which contributes to the miniaturization of the support part. Also, by measuring the current value flowing through the resistors in the support part, it is possible to obtain the voltage value of the conductive path based on the current value.

[0014] [6] In the electron beam irradiation device according to the above [4] or [5], the support part supports the conductive path by suspending it. According to this configuration, the conductive path can be favorably supported by the support portion.

[0015] [7] In the electron beam irradiation device described in [6] above, the second divided conductive path is elongated and extends vertically, and the support portion is connected to the upper end of the second divided conductive path to suspend and support the second divided conductive path.

[0016] According to this configuration, the second divided conductive path is suspended and supported by the support, which allows the conductive path to be appropriately supported by the support. Furthermore, if the conductive path accommodating portion of the pressure vessel has a second window portion for inserting the second divided conductive path, the support portion can be accommodated in the conductive path accommodating portion through the second window portion.

[0017] [8] In the electron beam irradiation device described in any one of [1] to [7] above, the first divided conductive path includes a first tubular conductor electrically connected to the power supply unit and a first electric wire electrically connected to the power supply unit and inserted inside the first tubular conductor, and the second divided conductive path includes a second tubular conductor electrically connected to the acceleration unit and a second electric wire electrically connected to the acceleration unit and inserted inside the second tubular conductor, and the first tubular conductor and the second tubular conductor are electrically connected to each other at the connection portion, and the first electric wire and the second electric wire are electrically connected to each other at the connection portion.

[0018] According to this configuration, in a configuration in which each of the first and second divided conductive paths includes an electric wire and a tubular conductor, the conductive paths can be easily assembled inside the pressure vessel. [Effects of the Invention]

[0019] According to the electron beam irradiation device of the present invention, the conductive path having a bent shape can be easily assembled to the pressure vessel. [Brief explanation of the drawings]

[0020] [Figure 1] FIG. 1 is a schematic diagram including an electrical configuration of an electron beam irradiation device according to an embodiment. [Figure 2] FIG. 2 is a schematic diagram showing the configuration of the electron beam irradiation device in this embodiment. [Figure 3] FIG. 3 is a schematic perspective view showing the conductive paths and the support portion in the embodiment. [Figure 4] FIG. 4 is a schematic cross-sectional view illustrating a conductive path in the embodiment. [Figure 5] FIG. 5 is a schematic diagram for explaining an assembly mode of the conductive path in the electron beam irradiation device of the same embodiment. [Figure 6] FIG. 6 is a schematic diagram for explaining an assembly mode of the conductive path in the electron beam irradiation device of the embodiment. [Figure 7] FIG. 7 is a schematic diagram for explaining an assembly mode of the conductive path in the electron beam irradiation apparatus of the same embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0021] An embodiment of an electron beam irradiation apparatus will be described below with reference to the drawings. Note that for the sake of convenience, some of the components may be exaggerated or simplified in the drawings. Furthermore, the dimensional ratios of the various components may differ from the actual ratios.

[0022] (Electrical configuration of the electron beam irradiation device 10) The electron beam irradiation device 10 of this embodiment shown in FIG. 1 is, for example, a scanning irradiation type electron beam irradiation device. The electron beam irradiation device 10 includes a filament 11 made of, for example, tungsten that emits thermoelectrons. The acceleration tube 12 is a device that converges and accelerates the electrons emitted from the filament 11. The acceleration tube 12 of this embodiment is disposed with its tube axis L1 oriented, for example, in the vertical direction. The acceleration tube 12 includes multiple acceleration electrodes 12a arranged side by side at equal intervals in the vertical direction. The acceleration tube 12 has a layered structure in which cylindrical glass cylinders 12b are inserted between the acceleration electrodes 12a. The filament 11 is installed at the upper end of the acceleration tube 12. That is, the electron beam irradiation device 10 includes an acceleration section 13 in which the filament 11 is integrally attached to the acceleration tube 12. The acceleration section 13 may also include peripheral components (not shown) of the acceleration tube 12 and the filament 11.

[0023] The acceleration unit 13 is driven based on power supplied from the power supply unit 14. The filament 11 of the acceleration unit 13 receives power from a filament power supply 14a of the power supply unit 14. The filament 11 emits electrons by heating itself based on the predetermined power supply. Each acceleration electrode 12a of the acceleration tube 12 receives power from an acceleration electrode power supply 14b of the power supply unit 14. Based on the predetermined power supply to each location, each acceleration electrode 12a generates an electric field within the acceleration tube 12 that converges the electrons emitted from the filament 11 onto the tube axis L1 and accelerates them downward. In other words, in the acceleration tube 12, the electric field generated by each acceleration electrode 12a generates a downward electron flow, i.e., an electron beam Eb.

[0024] A scan tube 15 is connected to the lower end of the accelerating tube 12. The accelerating tube 12 and the scan tube 15 communicate with each other through an internal space 16. In the internal space 16, the electron beam Eb travels from the accelerating tube 12 toward the scan tube 15. The scan tube 15 has a shape that widens from its upper end toward its lower end. A scan coil 17 is provided at the upper end of the scan tube 15. The scan coil 17 deflects the direction of the electron beam Eb in the internal space 16, i.e., scans the electron beam Eb, based on a predetermined power supply thereto.

[0025] An opening window 15a having, for example, a substantially rectangular shape is provided at the lower end of the scan tube 15. A window foil 18 is attached to the opening window 15a. The window foil 18 is made of, for example, a titanium-based metal foil. The window foil 18 has the function of sealing the opening window 15a while allowing the electron beam Eb to pass through. In other words, the internal space 16 spanning the accelerating structure 12 and the scan tube 15 is configured as an airtight space. A vacuum pump 19 is connected to the scan tube 15. The vacuum pump 19 creates a vacuum in the internal space 16 where the electron beam Eb is generated by its own drive.

[0026] The control unit CU controls the filament power supply 14a, the accelerating electrode power supply 14b, the scan coil 17, and the vacuum pump 19. The control unit CU adjusts the output of the electron beam Eb through the filament power supply 14a and the accelerating electrode power supply 14b, controls the scanning of the electron beam Eb through the scan coil 17, and adjusts the vacuum of the internal space 16 of the accelerating tube 12 and the scan tube 15 through the vacuum pump 19.

[0027] The electron beam Eb emitted through the window foil 18 attached to the opening window 15a is irradiated onto the irradiation object W being transported by, for example, the transport device WC. In this case, the electron beam irradiation device 10 is arranged so that the longitudinal direction of the approximately rectangular opening window 15a is oriented perpendicular to the transport direction of the transport device WC. By performing a predetermined scan of the electron beam Eb, the electron beam Eb is irradiated onto an approximately rectangular irradiation area A corresponding to the opening window 15a. The irradiation effect of the electron beam Eb onto the irradiation object W can be expected to be, for example, improvement of the material's properties, addition of functions, sterilization, etc.

[0028] (Device configuration of electron beam irradiation device 10) 2, the electron beam irradiation device 10 includes a pressure vessel 20, a conductive path 30 that electrically connects the power supply unit 14 and the acceleration unit 13, and a support unit 50 that supports the conductive path 30 relative to the pressure vessel 20. The pressure vessel 20 accommodates the power supply unit 14, the acceleration unit 13, the conductive path 30, and the support unit 50, and is filled with insulating gas (not shown). That is, the power supply unit 14, the acceleration unit 13, the conductive path 30, and the support unit 50 are placed in an atmosphere of insulating gas.

[0029] (Configuration of pressure vessel 20) The pressure vessel 20 includes a power supply housing 21 that primarily houses the power supply unit 14, an acceleration unit housing 22 that primarily houses the acceleration unit 13, and a conductive path housing 23 that houses the conductive path 30. The power supply housing 21 is installed on a first installation floor FL1 that has a horizontal plane perpendicular to the vertical direction D1. The acceleration unit housing 22 is installed on a second installation floor FL2 that has a horizontal plane perpendicular to the vertical direction D1. The second installation floor FL2 is located lower in the vertical direction D1 than the first installation floor FL1. In other words, the acceleration unit housing 22 is located lower in the vertical direction D1 than the power supply housing 21.

[0030] The conductive path accommodating section 23 of the pressure vessel 20 serves as a passageway that connects the power supply accommodating section 21 and the acceleration section accommodating section 22 to each other. The conductive path accommodating section 23 has a curved shape that follows the curved shape of the conductive path 30, which will be described later. The conductive path accommodating section 23 includes a first window 24 and a second window 25 that are used when assembling the conductive path 30, a first lid 26 that covers the first window 24, and a second lid 27 that covers the second window 25.

[0031] In the pressure vessel 20, the power supply housing 21 is sized and shaped to correspond to the power supply 14, the acceleration unit housing 22 is sized and shaped to correspond to the acceleration unit 13, and the conductive path housing 23 is sized and shaped to correspond to the conductive path 30. By configuring in this way, it is possible to make the overall external dimensions of the pressure vessel 20 small.

[0032] A scan tube 15 is installed on the underside of the second installation floor FL2 on which the acceleration unit housing 22 of the pressure vessel 20 is installed. The scan tube 15 is disposed outside the pressure vessel 20 and is connected to the acceleration unit 13 housed in the acceleration unit housing 22. A transport device WC is installed below the scan tube 15. The electron beam Eb generated in the acceleration unit 13 is emitted downward from the scan tube 15 and irradiated onto the irradiation object W being transported on the transport device WC.

[0033] (Configuration of the conductive path 30) The conductive path 30 includes a first divided conductive path 31, a second divided conductive path 32, and a connection portion 33 connecting the first divided conductive path 31 and the second divided conductive path 32. The conductive path 30 is divided into the first divided conductive path 31 and the second divided conductive path 32 at the connection portion 33. The first divided conductive path 31 is electrically connected to the power supply unit 14. The first divided conductive path 31 is configured to extend linearly, for example, along a horizontal plane perpendicular to the vertical direction D1. The second divided conductive path 32 is electrically connected to the acceleration unit 13. The second divided conductive path 32 is configured to extend linearly, for example, along the vertical direction D1. That is, the conductive path 30 has a bent shape in which the extending direction of the first divided conductive path 31 and the extending direction of the second divided conductive path 32 intersect with each other.

[0034] (Configuration of the first divided conductive path 31) The first divided conductive path 31 includes a first tubular conductor 41 and a first electric wire 42 inserted inside the first tubular conductor 41. The first tubular conductor 41 and the first electric wire 42 are each electrically connected to the power supply unit 14. The first tubular conductor 41 is formed into a cylindrical shape using, for example, a metal material. The first tubular conductor 41 extends linearly, for example, along a horizontal plane perpendicular to the vertical direction D1.

[0035] The first divided conductive path 31 has a first end 31a which is one end of the first divided conductive path 31 in the extension direction, and a second end 31b which is the other end of the first divided conductive path 31 in the extension direction. At the first end 31a of the first divided conductive path 31, the first tubular conductor 41 and the first electric wire 42 are each electrically connected to the power supply unit 14. On the other hand, at the second end 31b of the first divided conductive path 31, the first tubular conductor 41 and the first electric wire 42 are each electrically connected to the second divided conductive path 32. At the first end 31a of the first divided conductive path 31, the first tubular conductor 41 is supported by the housing of the power supply unit 14. The first tubular conductor 41 and the first electric wire 42 are, for example, at the same potential. The first tubular conductor 41 not only supports the first electric wire 42 but also alleviates the electric field with respect to the pressure vessel 20.

[0036] (Configuration of second divided conductive path 32) The second divided conductive path 32 includes a second tubular conductor 43 and a second electric wire 44 inserted inside the second tubular conductor 43. The second tubular conductor 43 and the second electric wire 44 are each electrically connected to the acceleration section 13. The second tubular conductor 43 is formed into a cylindrical shape using, for example, a metal material. The second tubular conductor 43 extends linearly along, for example, the vertical direction D1. The first tubular conductor 41 and the second tubular conductor 43 are electrically connected to each other at the connection section 33. Furthermore, the first electric wire 42 and the second electric wire 44 are electrically connected to each other at the connection section 33.

[0037] The second divided conductive path 32 has a third end 32a which is one end of the second divided conductive path 32 in the extension direction, and a fourth end 32b which is the other end of the second divided conductive path 32 in the extension direction. At the third end 32a of the second divided conductive path 32, the second tubular conductor 43 and the second electric wire 44 are each electrically connected to the acceleration unit 13. Meanwhile, at the fourth end 32b of the second divided conductive path 32, the second tubular conductor 43 and the second electric wire 44 are electrically connected to the first tubular conductor 41 and the first electric wire 42, respectively. The second tubular conductor 43 and the second electric wire 44 are, for example, at the same potential. The second tubular conductor 43 not only supports the second electric wire 44 but also alleviates the electric field with respect to the pressure vessel 20.

[0038] At the fourth end 32b of the second divided conductive path 32, the second tubular conductor 43 has a fixing portion 45 that is fixed to a support portion 50 (described later). The fixing portion 45 is provided, for example, at the upper end of the second tubular conductor 43. The fixing portion 45 is, for example, flange-shaped.

[0039] The conductive path 30 electrically connects the power supply unit 14 and the acceleration unit 13. That is, the conductive path 30 supplies a predetermined amount of power from the power supply unit 14 to the filament 11 of the acceleration unit 13 and each acceleration electrode 12a of the acceleration tube 12. The upper end of the acceleration unit 13, including the filament 11 and the third end 32a of the second divided conductive path 32, is covered with a cover member 13x.

[0040] (Configuration of support part 50) The support part 50 supports the conductive path 30 by connecting the pressure vessel 20 and the conductive path 30. The support part 50 of this embodiment has an elongated shape as a whole, for example, along the vertical direction D1. The support part 50 supports the conductive path 30, for example, by suspending it along the vertical direction D1.

[0041] 2 and 3, the support portion 50 includes, for example, a base portion 51, a first flange portion 52, a second flange portion 53, a hoop portion 54, and a covering portion 55. The base portion 51 has, for example, a plate shape extending along the vertical direction D1. The first flange portion 52 is provided at the upper end portion of the base portion 51. The first flange portion 52 is fixed, for example, to the inner surface of the second cover body 27 (see FIG. 2).

[0042] The second flange portion 53 of the support portion 50 is provided at the lower end portion of the base portion 51. The second flange portion 53 is fixed to the fixing portion 45 of the second tubular conductor 43 by, for example, bolting. As a result, the support portion 50 is connected to the fourth end portion 32b (the upper end portion in this embodiment) of the second divided conductive path 32 and supports the second divided conductive path 32 in a suspending manner.

[0043] As shown in FIG. 3 , the support portion 50 includes a plurality of resistors 56 connected in series to one another. The plurality of resistors 56 are provided, for example, on both sides of the base portion 51. The resistor 56 located at the bottom of the plurality of resistors 56 is electrically connected to the conductive path 30 at the connection portion 33. The resistor 56 located at the top of the plurality of resistors 56 is electrically connected to a field-through terminal (not shown) that penetrates the second cover 27. The value of the current flowing through the plurality of resistors 56 can be measured through the field-through terminal, and the voltage value of the conductive path 30 can be obtained based on the current value.

[0044] The hoop portion 54 of the support portion 50 is formed, for example, in a ring shape and made of a conductor such as metal. The hoop portion 54 is provided in the middle of the support portion 50 in the longitudinal direction so as to surround the periphery of the base portion 51. The hoop portion 54 serves to regulate the electric field around the support portion 50. The covering portion 55 is formed, for example, in a cylindrical shape and made of an insulating material such as synthetic resin. Note that in FIG. 3, the covering portion 55 is indicated by a two-dot chain line so that the internal configuration of the base portion 51 and the resistors 56 can be seen. The covering portion 55 covers the periphery of the base portion 51 and the plurality of resistors 56.

[0045] The conductive path 30 includes, for example, a conductive cover 57 that covers the connection portion 33. The conductive cover 57 is made of a conductor such as metal. The conductive cover 57 has a divided shape, for example, divided into two parts. The conductive cover 57 is supported by at least one of the second tubular conductor 43 and the support portion 50, for example.

[0046] FIG. 4 is a schematic cross-sectional view of the structure around the connection portion 33 of the conductive path 30, as viewed in the vertical direction D1. As shown in FIG. 4, the connection portion 33 of the conductive path 30 has a cover fixing portion 58 to which a conductive cover 57 is fixed. For example, a pair of cover fixing portions 58 are provided. Each cover fixing portion 58 is provided on either the second flange portion 53 of the support portion 50 or the second tubular conductor 43. The conductive cover 57 is fixed to each cover fixing portion 58 by, for example, a screw S1. In addition, the connection portion 33 has a fitting portion 59 provided on either the second flange portion 53 of the support portion 50 or the second tubular conductor 43. The conductive cover 57 has a positioning protrusion 57a ​​provided on the inner surface of the conductive cover 57. The positioning protrusion 57a ​​is fitted into the fitting portion 59, thereby positioning the conductive cover 57 in the vertical direction D1.

[0047] (Configuration of the conductive path accommodating portion 23) As shown in Figure 2, the conductive path accommodating section 23 in the pressure vessel 20 has a first accommodating section 61 that mainly accommodates the first divided conductive path 31, a second accommodating section 62 that mainly accommodates the second divided conductive path 32, and a third accommodating section 63 that mainly accommodates the support section 50.

[0048] The first housing portion 61 has a cylindrical shape extending, for example, along the extending direction (horizontal direction in this embodiment) of the first divided conductive path 31. The first tubular conductor 41 that is passed through the inside of the first housing portion 61 is supported at an appropriate distance from the inner circumferential surface of the first housing portion 61.

[0049] The second housing portion 62 has a cylindrical shape extending, for example, along the extending direction (vertical direction D1 in this embodiment) of the second divided conductive path 32. The second tubular conductor 43 that is passed through the inside of the second housing portion 62 is supported at an appropriate distance from the inner circumferential surface of the second housing portion 62.

[0050] The third housing portion 63 has a cylindrical shape that extends, for example, along the extension direction of the support portion 50 (vertical direction D1 in this embodiment). The support portion 50 that passes through the inside of the third housing portion 63 is supported at an appropriate distance from the inner circumferential surface of the third housing portion 63.

[0051] The first window 24 in the conductive path accommodating portion 23 is an opening for inserting the first divided conductive path 31 into the conductive path accommodating portion 23. The first window 24 is located on an extension of the second end 31b of the first divided conductive path 31 in the conductive path accommodating portion 23. This makes it possible to insert the first divided conductive path 31 into the first accommodating portion 61 of the conductive path accommodating portion 23 in the horizontal direction through the first window 24. The second window 25 in the conductive path accommodating portion 23 is an opening for inserting the second divided conductive path 32 into the conductive path accommodating portion 23. The second window 25 is located on an extension of the fourth end 32b of the second divided conductive path 32 in the conductive path accommodating portion 23. Note that the second window 25 in this embodiment is provided at the upper end of the third accommodating portion 63 in the conductive path accommodating portion 23.

[0052] (Action of this embodiment) Hereinafter, the assembly of the conductive path 30 in the electron beam irradiation device 10 of this embodiment will be described with reference to Figs. 5 to 7. For ease of explanation, the first electric wire 42 and the second electric wire 44 are omitted from the first divided conductive path 31 and the second divided conductive path 32 in Figs. 5 to 7, respectively.

[0053] 5, the first divided conductive path 31 is first inserted horizontally into the conductive path housing portion 23 through the first window portion 24. Then, the first end portion 31a of the first divided conductive path 31 is connected to the power supply unit 14.

[0054] Next, as shown in Fig. 6, the second divided conductive path 32 is inserted into the conductive path housing portion 23 from the second window portion 25 along the vertical direction D1. At this time, the second divided conductive path 32 is inserted into the second housing portion 62 through the third housing portion 63 in the conductive path housing portion 23. Thereafter, the third end portion 32a of the second divided conductive path 32 is connected to the acceleration portion 13 (see Fig. 2).

[0055] Next, as shown in Fig. 7, for example, the support part 50 fixed to the second cover 27 is inserted into the conductive path housing part 23 in the vertical direction D1 through the second window 25. Thereafter, the second window 25 is closed with the second cover 27 fixed to the support part 50, and the second cover 27 is fixed to the pressure vessel 20 by, for example, bolting. Thereafter, by working through the first window 24, the second flange part 53 of the support part 50 is fixed to the fixing part 45 of the second tubular conductor 43, and the first divided conductive path 31 is electrically connected to the second divided conductive path 32. The fixing part 45 of the upper end part (fourth end part 32b) of the second tubular conductor 43 is fixed to the second flange part 53 of the support part 50, and the second tubular conductor 43 is thereby suspended and supported by the support part 50 relative to the second cover 27 of the pressure vessel 20. Furthermore, the first divided conductive path 31 and the second divided conductive path 32 are electrically connected, thereby electrically connecting the power supply unit 14 and the acceleration unit 13 via the first divided conductive path 31 and the second divided conductive path 32. Thereafter, a conductor cover 57 is attached to the connection portion 33 between the first divided conductive path 31 and the second divided conductive path 32. This completes the assembly of the conductive path 30 inside the pressure vessel 20. Thereafter, the first window portion 24 is closed with the first lid body 26, and the first lid body 26 is fixed to the pressure vessel 20 by, for example, bolting. The first lid body 26 may be configured to be rotatably connected to the pressure vessel 20 by a hinge, or may be configured to be separable from the pressure vessel 20.

[0056] (Effects of this embodiment) The effects of this embodiment will be described below. (1) The conductive path 30 includes a first divided conductive path 31 electrically connected to the power supply unit 14, a second divided conductive path 32 electrically connected to the acceleration unit 13, and a connection portion 33 connecting the first divided conductive path 31 and the second divided conductive path 32. The conductive path 30 has a bent shape in which the extending direction of the first divided conductive path 31 and the extending direction of the second divided conductive path 32 intersect with each other. With this configuration, the bent shape of the conductive path 30 is formed by the first divided conductive path 31 and the second divided conductive path 32. Therefore, by separately assembling the first divided conductive path 31 and the second divided conductive path 32, the bent conductive path 30 can be easily assembled inside the pressure vessel 20.

[0057] (2) The pressure vessel 20 includes a conductive path accommodating portion 23 that accommodates the conductive path 30. The conductive path accommodating portion 23 has a shape that follows the curved shape of the conductive path 30. With this configuration, the conductive path accommodating portion 23 can be set to a shape and size that corresponds to the conductive path 30, making it possible to configure the external dimensions of the conductive path accommodating portion 23 to be small. Furthermore, even if the conductive path accommodating portion 23 is configured to be small in size to follow the curved shape of the conductive path 30, the conductive path 30 can be easily assembled inside the pressure vessel 20 by separately assembling the first divided conductive path 31 and the second divided conductive path 32.

[0058] (3) The first divided conductive path 31 has a first end 31a, which is one end of the first divided conductive path 31 in the extension direction and is connected to the power supply unit 14, and a second end 31b, which is the end opposite the first end 31a in the extension direction of the first divided conductive path 31 and is connected to the connection unit 33. The second divided conductive path 32 has a third end 32a, which is one end of the second divided conductive path 32 in the extension direction and is connected to the acceleration unit 13, and a fourth end 32b, which is the end opposite the third end 32a in the extension direction of the second divided conductive path 32 and is connected to the connection unit 33. The conductive path accommodating portion 23 is located on an extension of the second end 31b of the first divided conductive path 31 and has a first window 24 for inserting the first divided conductive path 31 into the conductive path accommodating portion 23. This allows the first divided conductive path 31 to be inserted into the conductive path accommodating portion 23 through the first window 24. Furthermore, the conductive path accommodating portion 23 is provided with a second window 25 located on an extension of the fourth end 32b of the second divided conductive path 32, for inserting the second divided conductive path 32 into the conductive path accommodating portion 23. This allows the second divided conductive path 32 to be inserted into the conductive path accommodating portion 23 through the second window 25. Furthermore, the first divided conductive path 31 and the second divided conductive path 32 can be connected through the first window 24.

[0059] (4) The electron beam irradiation device 10 includes a support portion 50 that connects the pressure vessel 20 and the conductive path 30 to support the conductive path 30. With this configuration, the conductive path 30, which has a bent shape, can be supported relative to the pressure vessel 20 by the support portion 50.

[0060] (5) The support part 50 includes a plurality of resistors 56 that are connected to the conductive path 30 and are connected in series with each other. With this configuration, the voltage of the conductive path 30 is divided by the plurality of resistors 56. This makes it possible to configure the support part 50 without using insulating insulators even if the conductive path 30 is at a high voltage, thereby contributing to the miniaturization of the support part 50. Furthermore, by measuring the value of the current flowing through the resistors 56 of the support part 50, it is possible to obtain the voltage value of the conductive path 30 based on the current value.

[0061] (6) The support portion 50 suspends and supports the conductive path 30. With this configuration, the support portion 50 can support the conductive path 30 in an appropriate manner. (7) The second divided conductive path 32 has an elongated shape extending in the vertical direction D1. The support part 50 is connected to the upper end part (fourth end part 32b) of the second divided conductive path 32 to suspend and support the second divided conductive path 32. With this configuration, the second divided conductive path 32 is suspendably supported by the support part 50, which allows the conductive path 30 to be suitably supported by the support part 50. Furthermore, if the conductive path accommodating part 23 of the pressure vessel 20 has a second window part 25 for inserting the second divided conductive path 32, the support part 50 can be accommodated in the conductive path accommodating part 23 through the second window part 25.

[0062] (8) The first divided conductive path 31 includes a first tubular conductor 41 electrically connected to the power supply unit 14 and a first electric wire 42 electrically connected to the power supply unit 14 and inserted inside the first tubular conductor 41. The second divided conductive path 32 includes a second tubular conductor 43 electrically connected to the acceleration unit 13 and a second electric wire 44 electrically connected to the acceleration unit 13 and inserted inside the second tubular conductor 43. The first tubular conductor 41 and the second tubular conductor 43 are electrically connected to each other at the connection portion 33. The first electric wire 42 and the second electric wire 44 are electrically connected to each other at the connection portion 33. With this configuration, in a configuration in which the first divided conductive path 31 and the second divided conductive path 32 include tubular conductors (the first tubular conductor 41 and the second tubular conductor 43) and electric wires (the first electric wire 42 and the second electric wire 44), respectively, the conductive path 30 can be easily assembled inside the pressure vessel 20.

[0063] (Other embodiments) The above embodiment can be modified as follows: The above embodiment and the following modifications can be combined with each other within the scope of technical compatibility.

[0064] In the conductive path 30 of the above embodiment, the extension direction of the first divided conductive path 31 and the extension direction of the second divided conductive path 32 are perpendicular to each other, i.e., the angle formed by each extension direction is set to 90 degrees, but this is not limited to this, and the angle formed by each extension direction may be set to an angle other than 90 degrees.

[0065] In the conductive path 30 of the above embodiment, the extending direction of the first divided conductive path 31 may be set obliquely downward or obliquely upward with respect to the horizontal direction. In the conductive path 30 of the above embodiment, the extension direction of the second divided conductive path 32 is not limited to the direction along the vertical direction D1, and may be, for example, a direction oblique to the vertical direction D1 or a direction along the horizontal direction. Note that in a configuration in which the extension direction of the second divided conductive path 32 is not along the vertical direction D1, when the second divided conductive path 32 is supported by being suspended from above by the support part 50, a third window part may be provided for inserting the support part 50 into the pressure vessel 20.

[0066] In the electron beam irradiation device 10 of the above embodiment, the acceleration unit 13 is installed so that the tube axis L1 direction of the acceleration structure 12 is parallel to the vertical direction D1, but this is not particularly limited. For example, the acceleration unit 13 may be installed so that the tube axis L1 direction of the acceleration structure 12 is oblique to the vertical direction D1 or so that the tube axis L1 direction of the acceleration structure 12 is parallel to the horizontal direction.

[0067] In the assembly procedure for the conductive path 30 of the above embodiment, the support part 50 that is not fixed to the second cover 27 may be inserted into the conductive path accommodating part 23 through the second window 25. This makes it possible to prevent the second window 25 from being blocked by the second cover 27 at the same time as inserting the support part 50 into the second window 25. Therefore, it becomes possible to connect the first divided conductive path 31 and the second divided conductive path 32 and to fix the second flange part 53 of the support part 50 to the fixing part 45 of the second tubular conductor 43 not only through the first window 24 but also through the second window 25.

[0068] In the above embodiment, the first divided conductive path 31 is linear, but this is not limited to this, and the first divided conductive path 31 may be slightly bent as long as it does not make it difficult to insert the first divided conductive path 31 into the first accommodating portion 61 of the conductive path accommodating portion 23.

[0069] In the above embodiment, the second divided conductive path 32 is linear, but this is not limited to this, and the second divided conductive path 32 may be slightly bent as long as it does not make it difficult to insert the second divided conductive path 32 into the second accommodating portion 62 of the conductive path accommodating portion 23.

[0070] In the above embodiment, the conductive path 30 is configured to be divided into two blocks, the first divided conductive path 31 and the second divided conductive path 32, but this is not limited to this and it may also be configured to be divided into three or more blocks.

[0071] The configuration of the support portion 50 is not limited to the above embodiment and may be changed as appropriate depending on the configuration of the conductive path 30. For example, the support portion 50 may be configured not to include the plurality of resistors 56, the hoop portion 54, or the covering portion 55.

[0072] In the electron beam irradiation device 10 of the above embodiment, the support portion 50 may be connected to the first divided conductive path 31 to support the first divided conductive path 31 . The support portion 50 in the above embodiment is configured to support the conductive path 30 by suspending it from above, but may also be configured to support the conductive path 30 from below or from a horizontal side, for example.

[0073] In the above embodiment, the electron beam irradiation device 10 is of the scanning irradiation type, but the present invention is not limited to this and can also be applied to electron beam irradiation devices other than the scanning irradiation type, such as an area irradiation type.

[0074] The embodiments and modifications disclosed herein are illustrative in all respects, and the present invention is not limited to these examples. That is, the scope of the present invention is defined by the claims, and it is intended to include all modifications within the meaning and scope of the claims. [Explanation of symbols]

[0075] 10...Electron beam irradiation device 13...Acceleration part 14...Power supply section 20...Pressure vessel 23...Conductive path housing 24...First window section 25...Second window section 30...Conductive path 31...First divided conductive path 31a...first end 31b…Second end 32...Second divided conductive path 32a...Third end 32b...Fourth end 33...Connection 41...First tubular conductor 42...First electric wire 43...Second tubular conductor 44...Second electric wire 50...Support part 56...Resistor D1: Vertical direction Eb…electron beam

Claims

1. A power supply unit; an acceleration unit that accelerates the electron beam based on power supplied from the power supply unit; a conductive path electrically connecting the power supply unit and the acceleration unit; a pressure vessel that accommodates the power supply unit, the acceleration unit, and the conductive path; An electron beam irradiation apparatus comprising: the conductive path includes a first divided conductive path electrically connected to the power supply unit, a second divided conductive path electrically connected to the acceleration unit, and a connection portion connecting the first divided conductive path and the second divided conductive path, The conductive path has a bent shape in which the extending direction of the first divided conductive path and the extending direction of the second divided conductive path intersect with each other. Electron beam irradiation equipment.

2. the pressure vessel includes a conductive path accommodating portion that accommodates the conductive path, The conductive path accommodating portion has a shape that follows the curved shape of the conductive path. The electron beam irradiation device according to claim 1 .

3. the first divided conductive path has a first end portion which is one end portion of the first divided conductive path in an extension direction and is connected to the power supply unit, and a second end portion which is an end portion of the first divided conductive path opposite to the first end portion in the extension direction and is connected to the connection portion, the second divided conductive path has a third end portion which is one end portion of the second divided conductive path in an extension direction and is connected to the acceleration portion, and a fourth end portion which is an end portion of the second divided conductive path opposite to the third end portion in the extension direction and is connected to the connection portion, the conductive path accommodating portion includes a first window portion located on an extension of the second end portion of the first divided conductive path, for inserting the first divided conductive path into the conductive path accommodating portion, and a second window portion located on an extension of the fourth end portion of the second divided conductive path, for inserting the second divided conductive path into the conductive path accommodating portion. The electron beam irradiation device according to claim 2 .

4. a support portion that connects the pressure vessel and the conductive path to support the conductive path, The electron beam irradiation device according to claim 1 .

5. The support portion is connected to the conductive path and includes a plurality of resistors connected in series with each other.

5. The electron beam irradiation device according to claim 4.

6. The support portion supports the conductive path by suspending it.

5. The electron beam irradiation device according to claim 4.

7. the second divided conductive path has an elongated shape extending in the vertical direction, the support portion is connected to an upper end of the second divided conductive path to suspend and support the second divided conductive path. The electron beam irradiation device according to claim 6 .

8. the first divided conductive path includes a first tubular conductor electrically connected to the power supply unit, and a first electric wire electrically connected to the power supply unit and inserted into the first tubular conductor, the second divided conductive path includes a second tubular conductor electrically connected to the acceleration section, and a second electric wire electrically connected to the acceleration section and inserted into the second tubular conductor, the first tubular conductor and the second tubular conductor are electrically connected to each other at the connection portion, The first electric wire and the second electric wire are electrically connected to each other at the connection portion. The electron beam irradiation device according to claim 1 .

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