UV light source status monitoring and reporting

Abstract

A computing device including a display screen is at a photolithography exposure facility, the facility including one or more photolithography exposure tools. The computing device is configured to display on the display screen: a status area including one or more status indicators, each status indicator associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure tool of the one or more photolithography tools; a graph area including one or more graphs, each graph displaying information related to the one or more status indicators; and a filtering area including one or more menu items selectable to control information displayed in the status area and / or in the one or more graphs.

Description

[Technical field]

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application claims priority to U.S. Application No. 63 / 318,749, filed March 10, 2022, and entitled "STATUS MONITORING AND REPORTING FOR ULTRAVIOLET LIGHT SOURCES," and U.S. Application No. 63 / 488,085, filed March 2, 2023, and entitled "STATUS MONITORING AND REPORTING FOR ULTRAVIOLET LIGHT SOURCES," both of which are incorporated by reference in their entireties herein.

[0002] This disclosure relates to monitoring and reporting the status of ultraviolet light sources, in particular ultraviolet light sources that provide light to lithographic apparatus. [Background technology]

[0003]

[0003] The light used in semiconductor photolithography may be laser radiation and is typically supplied by a system referred to as a light source. These light sources generate ultraviolet light as a series of pulses at a particular repetition rate, for example in the range of about 500 Hz to about 6 kHz. Given the high values ​​imparted during steps such as the lithography step of the semiconductor manufacturing process, performance and uptime are important to users of such light sources in photolithography exposure facilities. Summary of the Invention

[0004] In some general aspects, a computing device is in a photolithography exposure facility, the facility including one or more photolithography exposure apparatus. The computing device includes a display screen. The computing device is configured to display on the display screen: a status area including one or more status indicators, each status indicator being associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure apparatus of the one or more photolithography apparatus; a graph area including one or more graphs, each graph displaying information related to the one or more status indicators; and a filtering area including one or more menu items selectable to control information displayed in the status area and / or in the one or more graphs.

[0005]

[0005] Embodiments may include one or more of the following features. For example, the computing device may be configured to display status indicators including a first status indicator configured to indicate that an associated UV light source does not require action, a second status indicator configured to indicate that performance of the associated UV light source should be monitored, and a third status indicator configured to indicate that the associated UV light source requires maintenance. The computing device may be configured to display status indicators including a fourth status indicator configured to indicate that a status of the associated UV light source cannot be assessed.

[0006]

[0006] The computing device may be configured to display, in a status area on the display screen, a selectable set of subsystem status indicators for each of the one or more light source status indicators, the subsystem status indicators being associated with a respective subsystem of the respective UV light source. As used herein, "selectable" means actuable or "selectable" by a user on the computing device. An example of "selectable" may include a touch screen having touch-activated icons or other symbols, such as those activated by pressing with a finger, a stylus, or other tool. Another example of "selectable" may include icons or other symbols on a display that are selectable and actuable by an input device such as a mouse, a touch pad, or the like. The selectable items and the display screen may even take the form of buttons or similar user input devices, including, for example, an array of buttons that can display and / or change the icons or symbols displayed thereon. The computing device may be configured to display, in a filtering area on the display screen, one or more additional menu items that are selectable to control which subsystem status indicators are included in the selectable set of subsystem status indicators. The computing device may be further configured to selectably display on the display screen additional detailed data relating to the one or more light sources or to the one or more photolithography tools in response to a user selection of the one or more menu items. The additional detailed data may comprise exposure data for the one or more light sources or the one or more photolithography tools. The additional detailed data may comprise exposure data including sub-wafer level exposure data for the one or more light sources or the one or more photolithography tools. The UV light source may be a deep ultraviolet (DUV) light source.The computing device may be configured to display subsystem status indicators including a first subsystem status indicator configured to indicate that an associated subsystem does not require action, a second subsystem status indicator configured to indicate that performance of the associated subsystem should be monitored, and a third subsystem status indicator configured to indicate that the associated subsystem requires maintenance. The computing device may be configured to display subsystem status indicators including a fourth subsystem status indicator configured to indicate that a status of the associated subsystem cannot be assessed.

[0007]

[0007] The facility may include two or more photolithography exposure tools and the status area includes two or more status indicators.

[0008] In another general aspect, a computing device is in a photolithography exposure facility, the facility including one or more photolithography exposure apparatus. The computing device includes a display screen. The computing device is configured to display, on the display screen, a status area including one or more light source status indicators, each light source status indicator being associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure apparatus of the one or more photolithography apparatus.

[0009]

[0009] Embodiments may include one or more of the following features. For example, the computing device may be configured to display, on the display screen, a graph area including one or more graphs, each graph displaying information related to one or more light source status indicators. The computing device may be configured to display, on the display screen, a filtering area including one or more menu items selectable to control information displayed in one of the one or more graphs. The one or more light source status indicators may be a selected set of light source status indicators, and the one or more menu items may be selectable to control which light source status indicators are included in the selected set of light source status indicators.

[0010] The computing device may be configured to display in a status area on the display screen a selectable set of subsystem status indicators for each of the one or more light source status indicators, the subsystem status indicators being associated with a respective subsystem of a respective UV light source. The computing device may be configured to display in a filtering area on the display screen one or more menu items selectable to control which subsystem status indicators are included in the selectable set of subsystem status indicators.

[0011]

[0011] In another general aspect, a computer-implemented procedure includes displaying a first status indicator within a first view of a user interface, the first status indicator configured to indicate that an ultraviolet (UV) light source does not require action, the status indicator indicating operation of a UV light source configured to provide UV light to a photolithography exposure apparatus; changing a display within the first view of the user interface from the first status indicator to a second status indicator in response to a first prediction using data related to one or more subsystems of the UV light source, the first prediction related to performance of the UV light source, the second status indicator configured to indicate that performance of the UV light source should be monitored; and changing a display within the first view of the user interface from the first status indicator or the second status indicator to a third status indicator in response to a second prediction using data related to one or more subsystems of the UV light source, the second prediction related to performance of the UV light source, the third status indicator configured to indicate that the UV light source requires maintenance.

[0012]

[0012] Embodiments may include one or more of the following features. For example, the procedure may include, in response to a status change related to one or more subsystems of the UV light source, changing a display within a first view of the user interface from a first status indicator, a second status indicator, or a third status indicator to a fourth status indicator, the fourth status indicator configured to indicate that a status of the UV light source is not assessable. The procedure may include displaying two or more first status indicators within the first view of the user interface, each of the two or more first status indicators configured to indicate that an associated UV light source of one of the two or more UV light sources does not require action, each of the first status indicators indicating operation of the associated UV light source, each associated UV light source configured to provide UV light to an associated UV lithography apparatus; and, in response to a first prediction using data related to one or more subsystems of each of the two or more UV light sources, the first prediction related to a performance of the respective UV light source, displaying within the first view of the user interface from the first status indicator associated with the respective UV light source to a second status indicator associated with the respective UV light source. and in response to a second prediction using data related to one or more subsystems of each UV light source of the two or more UV light sources, the second prediction related to performance of the respective UV light source, changing a display within the first view of the user interface from the first status indicator associated with the respective UV light source or the second status indicator associated with the respective UV light source to a third status indicator, the third status indicator associated with the respective UV light source and configured to indicate that the respective UV light source requires maintenance.The procedure may include, in response to a status change relating to one or more subsystems of each UV light source of the two or more UV light sources, changing a display within a first view of the user interface from a first status indicator of the respective UV light source, a second status indicator of the respective UV light source, or a third status indicator of the respective UV light source to a fourth status indicator associated with the respective UV light source and configured to indicate that a status of the respective UV light source is not assessable.

[0013]

[0013] The UV light source may be a deep ultraviolet (DUV) light source. The DUV wavelength range typically includes wavelengths, for example, from about 100 nanometers (nm) to about 400 nm. The UV light source may optionally be an extreme ultraviolet (EUV) light source including a wavelength in the range of 4 to 20 nm, for example, in the range of 13 to 14 nm, such as at or about 13.5 nm. The EUV radiation may alternatively have a wavelength in the range of 4 to 10 nm, such as a wavelength of less than 10 nm, for example, 6.7 nm or 6.8 nm.

[0014]

[0014] In another general aspect, a computer program product includes at least one non-transitory computer readable storage medium having computer executable program code instructions stored thereon, the computer executable program code instructions, when executed by a processor of a computing system, configured to cause the computing system to display within a first view of a user interface a first status indicator of the group of status indicators indicating operation of an ultraviolet (UV) light source, the UV light source being configured to provide UV light to a photolithography exposure apparatus, and a second status indicator indicating that performance of the UV light source should be monitored. the program code instructions are configured to: change a display within a first view of the user interface from a first status indicator of a group of status indicators to a second status indicator in response to receiving a first prediction using data related to one or more subsystems of the UV light source, the first prediction related to performance of the UV light source, and the third status indicator is configured to indicate that the UV light source requires maintenance; and change a display within the first view of the user interface from the first status indicator or the second status indicator to a third status indicator in response to receiving a second prediction using data related to one or more subsystems of the UV light source, the second prediction related to performance of the UV light.

[0015]

[0015] Implementations may include one or more of the following features: The program code instructions, when executed by a processor of a computing system, may be configured to cause the computing system to change a display, within a first view of a user interface, from a first status indicator, a second status indicator, or a third status indicator of a group of status indicators to a fourth status indicator in response to receiving information representing a status change related to one or more subsystems of the UV light source, where the fourth status indicator is configured to indicate that a status of the UV light source is not assessable. The UV light source may be a deep ultraviolet (DUV) light source.

[0016]

[0016] In an additional aspect, a system includes a computing device of a photolithography exposure facility, the facility including one or more photolithography exposure tools, the computing device including a display screen, the computing device configured to display on the display screen: a status area including one or more status indicators, each status indicator being associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure tool of the one or more photolithography tools; a graph area including one or more graphs, each graph displaying information related to the one or more status indicators; and a filtering area including one or more menu items selectable to control information displayed in the status area and / or in the one or more graphs, and configured for communication related to the computing device of the photolithography exposure facility. The system also includes a computing device at the maintenance provider facility, the computing device being configured to display on the display screen a status area equivalent to the status area including one or more status indicators associated with an ultraviolet (UV) light source configured to provide light to each photolithography exposure device of the one or more photolithography devices, a graph area equivalent to the graph area including one or more graphs displaying information related to the one or more status indicators, and a filtering area equivalent to the filtering area including one or more menu items selectable to control information displayed in the status area and / or in the one or more graphs.

[0017]

[0017] The computing device at the photolithography exposure facility may be further configured to, in response to a user selection of one or more menu items, selectably display on the display screen additional detailed data relating to the one or more light sources or to the one or more photolithography devices, including sub-wafer level exposure data for the one or more light sources or the one or more photolithography devices. The computing device at the maintenance provider facility may be configured not to receive or display sub-wafer level exposure data for the one or more light sources or the one or more photolithography devices. The UV light source may be a deep ultraviolet (DUV) light source.

[0018]

[0018] The details of one or more implementations are set forth in the accompanying drawings and the description below. Other features will be apparent from the description and drawings, and from the claims. [Brief description of the drawings]

[0019] [Figure 1A]

[0019] FIG. 1 is a block diagram of a computing device having a display screen, as well as one or more light sources and one or more associated photolithographic exposure apparatus in a photolithographic exposure facility. [Figure 1B]

[0020] FIG. 1B is a diagram of items displayed on a display screen of the computing device of FIG. 1A. [Figure 1C]

[0021] 1B is a diagram of a status area displayed on a display screen of the computing device of FIG. 1A. [Diagram 2]

[0022] 1D is a diagram of a light source status indicator that may be displayed in the status area of ​​FIG. 1C. [Diagram 3]

[0023] 1D illustrates a light source subsystem status indicator that may be displayed in the status area of ​​FIG. 1C. [Figure 4]

[0024] 1B is a schematic diagram of a light source and associated photolithography apparatus having a light source subsystem that provides signals and / or data to an intermediate processor that provides status information to the computing device of FIG. 1A. [Diagram 5]

[0025] FIG. 1B is a schematic diagram of one embodiment of the light source of FIG. 1A. [Figure 6]

[0026] 1B is a schematic diagram of one embodiment of the photolithography exposure apparatus of FIG. 1A. [Figure 7]

[0027] FIG. 1B is a schematic diagram of one embodiment of the computing device of FIG. 1A. [Figure 8]

[0028] FIG. 1C is a flow chart illustrating a process for implementing aspects of a status area. [Figure 8A] FIG. 1C is a flowchart illustrating a process for implementing aspects of a status area. [Figure 9A]

[0029] 1D is an example of a status area of ​​FIG. 1C showing an example of a status indicator. [Figure 9B]

[0030] 9B is an example of a graph displaying information related to the status indicator of FIG. 9A. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0020]

[0031] In one aspect of the present disclosure, a display screen on a computing device in a photolithography exposure facility is disclosed, the facility including one or more photolithography exposure tools, the computing device configured to display, on the display screen, information regarding a status of one or more ultraviolet (UV) light sources configured to provide light to the photolithography exposure tools.

[0021]

[0032] 1A, 1B, and 1C, computing device 110 is located in or at photolithography exposure facility 160. Computing device 110 may be in the form of a desktop computer, laptop computer, or handheld device including a mobile phone, paddle, tablet computer, server, or other processor, etc. Computing device 110 may be integrated into equipment or other fixtures (not shown) in facility 160, may be located in a central location, and / or may be located at each one (or each of one or more) of the photolithography apparatus or light sources described below. Computing device 110 may have wired and / or wireless communication capabilities.

[0022]

[0033] Facility 160 includes one or more photolithography exposure tools 162-i, where "i" is a collection of numbers 1, 2, ...I, and "I" here represents a total number of one or more tools 162-i. Although four photolithography exposure tools 162-1, 162-2, 162-3, 162-I are shown in Figure 1A, facility 160 may include fewer than four or more than four tools 162-i. The computing device 110 includes a display screen 120, and the computing device 110 is configured to display on the display screen, as part of a graphical user interface (GUI) 122, (1) a status area 130 including one or more status indicators 132-i (see FIG. 1C), where each status indicator 132-i is associated with an ultraviolet (UV) light source 164-i configured to provide light to a respective photolithography exposure tool 162-i of one or more photolithography tools 162-i; (2) a graph area 140 including one or more graphs 142a, 142b (see FIG. 1B), where each graph 142a, 142b displays information related to the one or more status indicators 132-i; and (3) a filtering area 150 including one or more menu items 152-k selectable to control information displayed in the status area 130 and / or in the one or more graphs 142a, 142b (see FIG. 1B). "k" herein represents a set of numbers 1, 2, ....K, and "K" herein represents a total number of one or more menu items 152-k. The selectable menu items 152-k may be selected through a direct touch on the GUI 122 by a user of the computing device 110. In other embodiments, the selectable menu items 152-k may be selected through a button press or other physical interaction with the computing device 110 by a user of the computing device 110. If desired, a status indicator column heading 131 may be included above the status indicators 132-i using the word "Status" or some other designation, such as "light source state" or "light source score."The light provided by each light source 164-i is used by a respective associated photolithography exposure tool 162-i to expose a pattern in or on a respective wafer or series of wafers (not shown in FIG. 1A, but see FIG. 6 and related discussion below).

[0023]

[0034] As shown in FIG. 1B, the filtering area 150 may display a menu item target indicator 153-k associated with one or more menu items 152-k adjacent to the menu items. The menu item target indicator 153-k and the associated one or more menu items 152-k may be a grouping and / or a characteristic of the light sources 164-i. Selecting from the menu items 152-k controls which one or more of the one or more light sources 164-i at or within the facility 160 will cause the associated status indicator 132-i to be displayed in the status area 130. The menu item target indicator 153-k (displayed in the filtering area 150) may correspond to a column header 154-k displayed above the column of light source identification information items 163-ik in the status area 130. Items 163-ik may be items such as user-defined light source groups, user or manufacturer assigned light source names or numbers, light source serial numbers, light source model names and / or numbers, light source software type and / or version, light source operating wavelengths, lithography equipment identifiers for associated lithography equipment, and even the last update times of the respective light source status indicators 132-i, and symbols or other indicators of these groups or categories may be used in the menu item target indications 153-k and column headings 154-k.

[0024]

[0035] 2, the status indicators 132-i that the computing device 110 is configured to display on the display screen 120 may be selected from a group including a first status indicator 232a, a second status indicator 232b, and a third status indicator 232c. For example, the first status indicator 232a is configured to indicate that the associated UV light source 164-i does not require action, the second status indicator 232b is configured to indicate that the performance of the associated UV light source 164-i should be monitored, and the third status indicator 232c is configured to indicate that the associated UV light source 164-i requires maintenance. The status indicators 132-i may indicate their respective status by displaying different symbols representing each status, such as by color coding as shown in the shading of FIG. 2 or by using numbers or letters. In one embodiment, color coding may be used, such as green for no action (232a), yellow or amber for monitoring (232b), red or orange for maintenance (232c), etc. In some embodiments, text blocks T-232a, T-232b, or T-232c may be used to spell out the colors used for greater accessibility of the displayed information. The status indicators 132-i that the computing device 110 is configured to display on the display screen 120 may also include a fourth status indicator 232d configured to indicate that the status of the associated UV light source 164-i is not assessable. For example, if color coding is used, the fourth status indicator 232d may be displayed as gray and text block T-232d may also be used. The fourth status indicator 232d may be used when the UV light source 164-i or its subsystems have recently undergone a sudden change in performance or physical condition, such as when maintenance or significant adjustments have recently been performed. The fourth status indicator 232d may then revert to one of the first, second, or third status indicators 232a, 232b, 232c after a sufficient amount of time has passed and / or after sufficient performance stability has been achieved.

[0025]

[0036] 1A, 1B, and 1C, the computing device 110 may be configured to display in the status region 130 on the display screen 120, for each of one or more light source status indicators 132-i, a selectable set 173 of subsystem status indicators 172-ij (see FIG. 1C) associated with a respective subsystem (not shown in FIGS. 1A-1C, but see FIGS. 4 and 5 below) of each UV light source 164-i, where "j" is a collection of numbers 1, 2, ... J, where "J" here represents the total number of subsystem status indicators 172-ij in the selectable set 173.

[0026]

[0037] The computing device 110 may also be configured to display in the filtering area 150 on the display screen 120 one or more additional menu items 155-j that can be selected to control which subsystem status indicators 172-ij are included in the selectable set 173. The menu items 155-j may be arranged in two areas: a "selected" area S and a non-selected area NS. A menu item 155-j in the selected area S may be moved to the non-selected area by highlighting the item and then selecting, such as by clicking or pressing, an "add" icon AI. A menu item 155-j in the non-selected area NS may be moved to the selected area by highlighting the item and then selecting, such as by clicking or pressing, an "remove" icon RI. The set currently in the selected area S may be applied to the status area 130 by selecting, such as by clicking or pressing, an "apply" icon 159. A default setting for all items 155-j included in the selected area S and displayed in the status area 130 may be accessed by selecting, such as by pressing or clicking, a default icon 161. When considered across both regions S and NS, “j” is a set of numbers 1, 2, ... J, where “J” here represents the total number of additional menu items available for selection by the user to include in the selectable set 173.

[0027]

[0038] Additional menu items 155-j may correspond to respective light source subsystems for which status indicators 132-i are or may be displayed. Thus, a user may select (1) one or more light sources 164-i for which status indicators 132-i are or may be displayed (via menu item 152-k) and (2) those light source subsystems (not shown in FIGS. 1A-1C) for which status indicators 172-ij are displayed. Subsystem status indicator column headings 156-1 through 156-K correspond to the selected menu item 155-j and serve to identify the subsystem type for which subsystem status indicators 172-ij are displayed in the respective columns below.

[0028]

[0039] Additional menu items 155-j, which may be used to select the subsystem for which status is to be displayed, may be paired with status selectors 158-j, which may select which status indicator is to be displayed for a given selected item 155-j, among the first, second, third, and fourth status indicators.

[0029]

[0040] 3, the status indicators 172-ij that the computing device 110 is configured to display for the selectable set 173 may include a first status indicator 372a configured to indicate that the associated UV light source subsystem is taking no action, a second status indicator 372b configured to indicate that the performance of the associated UV light source subsystem should be monitored, and a third status indicator 372c configured to indicate that the associated UV light source subsystem requires maintenance. The status indicators 372a, 372b, 372c may indicate their respective status by displaying different symbols representing each status, such as by color coding as shown in the shading of the figure, or by using numbers or letters. In one embodiment, color coding may be used, such as green (372a) for no action, yellow or amber (372b) for monitoring, red or orange (372c) for maintenance, etc. Text blocks T-372a, T-372b, or T-372c may be used to spell out the colors used for greater accessibility of the displayed information. The status indicators 172-j that the computing device 110 is configured to display for the selectable set 173 may also include a fourth status indicator 372d configured to indicate that the status of the associated UV light source subsystem is not assessable. For example, if color coding is used, the fourth status indicator 372d may be displayed as gray and a text block T- 372d may also be used. The fourth status indicator 372d may be used when the UV light source subsystem has recently undergone a sudden change in performance or physical condition, such as when maintenance or significant adjustments have recently been performed. The status indicator 372d may then revert to one of the first, second, or third status indicators after a sufficient amount of time has passed and / or after sufficient performance stability has been achieved.

[0030]

[0041] 1A-1C, in summary, a computing device 110 is provided in a photolithography exposure facility 100 that includes one or more photolithography exposure tools 162-i. The computing device 110 includes a display screen 120, where the computing device 110 is configured to display, on the display screen, a status area 130 that includes one or more status indicators 132-i, where each status indicator 132-i is associated with an ultraviolet (UV) light source 164-i configured to provide light to a respective photolithography exposure tool of the one or more photolithography tools 162-i.

[0031]

[0042] The computing device 110 may be configured to display, on the display screen 120, a graph region 140 including one or more graphs 142a, 142b. The computing device 110 may be configured to display, on the display screen 120, a filtering region 150 including one or more menu items 152-k selectable to control information displayed in the one or more graphs 142a, 142b and / or in the status region 130. One or more light source state indicators 132-i may be a selected set 133 of light source state indicators, and one or more menu items 152-k may be selectable to control which light source state indicators 132-i are included in the selected set 133.

[0032]

[0043] The computing device 110 may be configured to display, on the display screen 120, in the status area 130, a selectable set 173 of subsystem status indicators 172-ij for each of one or more light source status indicators 132-i, the subsystem status indicators 172-ij being associated with a respective subsystem (not shown in Figures 1A to 1C, but see Figures 4 and 5 below) of each UV light source 164-i.

[0033]

[0044] The computing device 110 may be configured to display on the display screen 120 and in the filtering area 150 one or more additional menu items 155-j that are selectable to control which subsystem status indicators 172-ij are included in the selectable set 173 of subsystem status indicators.

[0034]

[0045] The display screen 120 provides a graphical user interface (GUI) 122 at the photolithography exposure facility 160. This GUI 122 provides users (e.g., engineers) of the facility 160 with easy access to curated data about the UV light sources 164-i in an easily digested form. The GUI 122 may also inform users of the facility 160 how each UV light source 164-i is operating, including allowing the user to view prioritized information that includes an analysis of information that is useful to the user in making decisions regarding the operation of each photolithography exposure tool 162-i. The light source status indicators 132-i allow the user to essentially instantly recognize the presence of any significant light source performance problems. The selectable subsystem status indicators 172-ij allow the user to quickly see which one or more subsystems may be contributing to the problem.

[0035]

[0046] In an embodiment, the status area 130, or the GUI 122 including the status area 130, the graph area 140, and the filtering area 150, may be a "landing page" or initial (e.g., "home") screen that provides all types of data related to one or more light sources 164-i upon opening or initializing the system, and thus provides an overview of the relative performance of the health of all or any desired light sources 164-i before more detailed data is accessed, such as by selecting a tab from among tabs 113-1 through 113-M or from among tabs 115-1 through 115-N. Thus, a user may better see the "big picture" of the overall operation of one or more light sources 164-i. More detailed data available through GUI 122 and shown on screens selectable by tabs, such as tabs 113-1 through 113-M or 115-1 through 115-N, or by other means, may include, among other things, exposure data (not shown) provided from each light source 164-i or each associated lithography tool 162-i. The exposure data (not shown) may include wafer level exposure data (exposure data for each wafer) and / or sub-wafer level exposure data (defined as individual exposure data for individual sub-areas of a wafer).

[0036]

[0047] 4 is a schematic diagram showing a representation of a light source 164-i in the form of a light source 464-i having a light source subsystem 457-j. With reference to FIG. 4, the subsystem 457-j or its associated sensor or system (not shown) provides signals and / or data 481-j useful for determining the performance and / or health status of the subsystem 457-j. An intermediate processor 480, which may be separate as shown in the figure or may optionally be incorporated in the computing device 110, and may optionally be distributed across multiple physical processors and / or devices, includes a subsystem evaluator 482-j associated with each subsystem 457-j and the corresponding signals and / or data 481-j. The subsystem evaluator 482-j uses the signals and / or data by combining, comparing, weighting, etc. to determine the status of the associated subsystem 457-j and outputs status information 483-j related to the associated subsystem 457-j to the light source evaluator 486-i. The light source evaluator uses the status information 483-j by combining, comparing, weighting, etc. to determine the status of the associated light source 464-i and outputs status information 488-i to the computing device 110 and / or to a status region 130 of the GUI 122 displayed on its display area 120. The status information 483-j associated with each light source subsystem 457-j may also be passed directly to the computing device 110 and / or to its status region 130 to provide an indication of the subsystem status indicators 172-11-172-1J, if desired, or when selected by a user.

[0037]

[0048] 4 illustrates for convenience that each subsystem 457-j of light source 464-i has a one-to-one relationship with a corresponding signal or data 481-j, in some embodiments the corresponding signal or data 481-j of each subsystem 457-j may originate from multiple sources, including, for example, other subsystems other than and / or in addition to the respective subsystem 457-j, and in other embodiments an individual signal and / or data source may contribute to or be included in more than one of the corresponding signals or data 481-1 through 481-J.

[0038]

[0049] Also, while only one light source 464-i and only one corresponding light source evaluator 486-i are shown in Figure 4 for convenience, for a photolithography exposure facility 160 having several light sources I, in some or most or all embodiments, there will also be I light source evaluators used, each receiving multiple feeds of subsystem status information corresponding to multiple subsystem evaluators associated with the subsystems 457-i of the respective light source 464-i, and each generating and transmitting respective status information 488-i to the computing device 110 and / or to the status area 130 to enable the display of I rows of light source status indicators 132-i. Additional rows of status indicators 132-i beyond the first row are shown in dashed outline to reflect the fact that the corresponding light source 464-i and light source evaluators and their associated devices and communications are not shown in Figure 4 on the display screen 120. Similarly, multiple rows of subsystem status indicators 172-ij beyond the first row are shown on the display screen 120 to reflect the fact that the corresponding light source 464-i is not shown in FIG. 4 along with its associated subsystem 457-j and subsystem evaluator 482-j.

[0039]

[0050] As further shown in FIG. 4, photolithography tool 462-i configured to receive light from light source 464-i may provide data stream 462-i-ds-1 to intermediate processor 480. Data stream 462-i-ds-1 may be used as input by one or more of subsystem evaluators 482-1 through 482-J and / or by light source evaluator 486-i in processor 480. Data stream 462-i-ds-1 may include, for example, wafer-level (defined as individual exposure data related to an individual wafer exposed by photolithography tool 462-i and not related to a sub-region of the wafer) and higher (aggregated or less specific) level exposure data. As an alternative to data stream 462-i-ds-1 from light source 462-i, data stream 464-i-ds-1 from light source 464-i (partially represented by a dashed line in FIG. 4) may be configured to provide equivalent data. Photolithography tools 462-i configured to receive light from light sources 464-i may also or alternatively provide data stream 462-i-ds-2 to computing device 110. Data stream 462-i-ds-2 may include exposure data at, for example, wafer level (defined as individual exposure data related to an individual wafer exposed by photolithography tool 462-i and not related to sub-areas of the wafer) and / or other levels including sub-wafer level. This data may be made available on selectable screens (not shown) selectable by tabs, such as tabs 113-1 through 113-M or tabs 115-1 through 115-N, or by other means in GUI 122, as described and illustrated above with respect to FIGS. 1B and 1C. As an alternative to data stream 462-i-ds-2 from light source 462-i, data stream 464-i-ds-2 from light source 464-i (partially represented by a dashed line in FIG. 4) may be configured to provide equivalent data.

[0040]

[0051] As further shown in the diagram of FIG. 4, in accordance with an additional aspect of the present disclosure, a computing device 110 in a photolithography exposure facility, the facility comprising one or more photolithography exposure tools 464-i, the computing device comprising a display screen 120, the computing device displaying on the display screen 120 a status area 130 (FIG. 1B) including one or more status indicators 132-1 through 132-I, each status indicator 132-1 through 132-I associated with an ultraviolet (UV) light source 464-1 through 464-I (only one of which 464-i is shown in FIG. 4; see FIG. 1A) configured to provide light to a respective photolithography exposure tool 464-i of the one or more photolithography exposure tools 464-1 through 464-I (see FIG. 1A). A system may be provided that includes a computing device configured to display a GUI 122 including a status area, a graph area 140 (not shown in FIG. 4, see FIG. 1B) including one or more graphs 142a, 142b (FIG. 1B), each graph displaying information related to one or more status indicators 131-1 to 132-I (FIG. 1C), and a filtering area 150 (not shown in FIG. 4, see FIG. 1B) including one or more menu items 152-1 to 152-K and / or 155-1 to 155-J (FIG. 1B) selectable to control information displayed in the status area 130 and / or in the one or more graphs 142a, 142b, and a computing device 110p at a maintenance provider facility 160p. The maintenance provider facility 160p may be a central facility or database, etc., where performance of light sources in a photolithography exposure facility 160 or in a plurality of such facilities is monitored. The maintenance provider facility 160p may be as simple as a work location for a personal maintenance person who owns a computing device 110p, which may be a portable computing device. In this context, portable means having a weight, size, and construction suitable for being hand-carried by a user at the maintenance provider facility 160p.The maintenance provider facility 160p may be a location or station or one or more stations or locations within the photolithography exposure facility 160, such as stations and / or interfaces attached to individual light sources or photolithography equipment, for example, the location of a "paddle" attached to an individual light source or photolithography equipment. The computing device 110p may be in the form of a desktop computer, laptop computer, or handheld device including a mobile phone, paddle, tablet computer, server, or other processor, etc. The computing device 110p may be integrated into equipment or other fixtures and may have wireless and / or wired communication capabilities. The computing device 110p of the maintenance provider facility 160p includes on a display screen 120 a status area 130p equivalent to the status area 130 of the photolithography facility computer 110, i.e., one or more status indicators 132-1 to 132-I, each of which is associated with a respective UV light source 164-i of a UV light source 164-1 to 164-I (FIG. 1A) configured to provide light to a respective photolithography exposure apparatus 162-i of one or more photolithography apparatuses 162-1 to 162-I (FIG. 1A) (see status area 130 of FIGS. 1A to 1C for further details below). and a GUI 122p having a status area 130p equivalent to the one or more status indicators 132-1 to 132-I, a graph area 140p equivalent to the graph area 140 (FIGS. 1A, 1B) including one or more graphs 142a and 142b (FIG. 1B) displaying information related to one or more status indicators 132-1 to 132-I, and a filtering area 150p equivalent to the filtering area 150 (FIG. 1B) including one or more menu items 152-1 to 152-K and / or 155-1 to 155-J (FIG. 1B) selectable to control information displayed in the status area 130p and / or in the one or more graphs 142a, 142b. Note that, as used herein, "equivalent to" encompasses "the same as". Examples may include one or more of the following.

[0041]

[0052] The data required to provide a GUI 122p in computer 110p equivalent to GUI 122 in computer 110 may be transmitted via a data link DL, which may include any useful data transmission infrastructure and / or method. Other arrangements are possible. The data link DL may alternatively run, for example, between intermediate processor 480 and computer 110p, rather than between GUI 122 and GUI 122p as shown. The data link may be unidirectional or bidirectional. Also, for example, both computers 110 and 110p may receive relevant data in parallel from a source, such as intermediate computer 480 or some other intermediate source. What is important in this aspect is that computer 110p at the maintenance provider facility is configured, such as in one of the above-mentioned ways, for communication related to a computing device at the photolithography exposure facility, so that GUI 122p having a status area equivalent to status area 130 of GUI 122 is displayed on the screen 120p of computing device 110p at the maintenance provider facility. The maintenance provider can then simultaneously, or essentially simultaneously, view the same status indications and status data as is shown at the photolithography facility, allowing for easier communication and coordination regarding the performance of one or more light sources and / or easier planning and scheduling of potential maintenance actions. The maintenance provider facility computer may be a maintenance shop or maintenance center computer, a maintenance station, cart, or vehicle computer or laptop or cell phone, a maintenance technician's local laptop or cell phone, etc.

[0042]

[0053] The computing device 110 at the photolithography exposure facility may further be configured to selectably display, on the display screen 120, additional detailed data relating to one or more light sources 464-i or one or more photolithography equipment 462-i, including sub-wafer level exposure data of the one or more light sources or one or more photolithography equipment, as part of the GUI 122. Because the sub-wafer level exposure data may be maintained as proprietary data by an operator of a photolithography exposure facility, such as photolithography exposure facility 160 (FIG. 1A), or by a customer of the operator of facility 160, the computing device 110p at the maintenance provider facility 160p may be configured not to receive or display the sub-wafer level exposure data of one or more light sources 464-i or one or more photolithography equipment 462-i, for example, by not receiving data stream 462-i-ds2 or by not receiving corresponding data from data stream 464-i-ds2 or data link DL.

[0043]

[0054] 5 shows a schematic diagram of one embodiment 564 of any of the light sources 164-i or 464-i. The light source 564 is a dual stage pulsed light source that generates a pulsed light beam 505 that is directed to a photolithography exposure tool 662 that corresponds to the respective photolithography exposure tool 162-i associated with that particular light source 164-i or 464-i. The light source 564 includes a solid-state or gas discharge master oscillator (MO) system 590, a power amplification (PA) system 595, such as a power ring amplifier (PRA) system, relay optics 570, and a light output subsystem 575. The light source 564 is a deep UV (DUV) light source 564, and the pulsed light beam 505 has a wavelength in the DUV wavelength range, including, for example, wavelengths from about 100 nanometers (nm) to about 400 nm.

[0044]

[0055] The MO system 590 may include, for example, an MO chamber module 591 in which an electrical discharge between electrodes (not shown) may cause a laser gas discharge in a lasing gas to create a population inversion of energetic molecules, such as argon, krypton, or xenon, to generate a relatively broadband emission that may be line narrowed in a line narrowing module ("LNM") 592 to a relatively ultra-narrow bandwidth and center wavelength selected. The MO system 590 may also include an MO output coupler (MO OC) 593, which may include a partially reflective mirror that, together with a reflective grating (not shown) in the LNM 592, forms an oscillator cavity in which the MO system 590 oscillates to form a seed laser output pulse. The MO system 590 may also include a line center analysis module (LAM) 594. The LAM 594 may include, for example, an etalon spectrometer for fine wavelength measurement and a grating spectrometer for coarser resolution. LAM 594 may be, for example, a source of one or more of the signals and / or data among corresponding signals or data 481-1 through 481-J of FIG.

[0045]

[0056] The relay optics 570 shown in FIG. 5 may include an MO wavefront engineering box (WEB) 571 that serves to redirect the output of the MO system 590 towards the PA system 595, and may include beam expansion, for example by a multi-prism beam expander (not shown), and coherence breaking, for example in the form of an optical delay path (not shown).

[0046]

[0057] The PA system 595 includes a PRA chamber module 596, which may be, for example, an oscillator formed by injection of the output light beam from the MO system 590 and output coupling optics (not shown), which may be incorporated into a PRA WEB 597 and redirected back through a gain medium in the chamber 596 by a beam reverser 598. The PRA WEB 597 may incorporate a partially reflective input / output coupler (not shown), a maximally reflective mirror for the nominal operating wavelength (which may be around 193 nm for an ArF system), and one or more prisms. The PA system 595 optically amplifies the output light beam from the MO system 590.

[0047]

[0058] The optical output subsystem 575 may include a bandwidth analysis module (BAM) 576 that receives the output light beam of pulses from the PA system 595 and picks off a portion of the light beam for metrology purposes, for example, to measure the output bandwidth and pulse energy at the output of the PA system 595. The output light beam of pulses then passes through an optical pulse stretcher module (OPuS) 577 and an output composite autoshutter metrology module (CASMM) 578, which may also be the location of a pulse energy meter that may also be the source of one or more of the corresponding signals or data 481-1 to 481-J of FIG. 4. One purpose of the OPuS 577 may be to convert the single output pulse into a pulse train. Secondary pulses created from the original single output pulse may be delayed with respect to each other. By distributing the original laser pulse energy into a train of secondary pulses, the effective pulse length of the light beam may be expanded while the peak pulse intensity may be reduced.

[0048]

[0059] Light source 564 is composed of subsystems 457-j. Each of the components of light source 564 (MO chamber 591, LNM 592, MO WEB 571, PRA chamber 596, PRA WEB 597, OPuS 577, BAM 576, etc.) is a subsystem 457-j. The overall performance of light source 564 is a result of the performance and combined performance of each of these individual subsystems 457-j that make up light source 564.

[0049]

[0060] FIG. 6 shows a schematic diagram of one embodiment 660 of photolithography exposure facility 160 that includes a single photolithography exposure tool 662 (corresponding to one of photolithography exposure tools 162-i of FIG. 1A). Facility 660 includes a light source 664 (corresponding to any of light sources 164i) that provides a light beam 641 to photolithography exposure tool 662. Photolithography exposure tool 662 processes a wafer 647 that is held in a wafer holder or stage 643. Light beam 641 is a pulsed light beam that includes pulses of light that are separated from one another in time. Photolithography exposure tool 662 includes a projection optical system 644 through which light beam 641 passes before reaching wafer 647, and a metrology system 645. The metrology system 645 may include, for example, a camera or other device capable of capturing an image of the wafer 647 and / or the light beam 641 at the wafer 647, or a light detector capable of capturing data describing characteristics of the light beam 641, such as the intensity of the light beam 641 in an xy plane at the wafer 647. The photolithography exposure tool 662 may be an immersion system or a dry system. The facility 660 may also include a control system 646 associated with the light source 664 and the photolithography exposure tool 662, the control system 646 being configured to control the light source 664 and / or the photolithography exposure tool 662.

[0050]

[0061] Microelectronic features are formed on the wafer 647, for example, by exposing a layer of radiation-sensitive photoresist material on the wafer 647 to the light beam 641. In some embodiments, the projection optical system 644 includes a projection objective including a slit, a mask, and a lens. The light beam 641 enters the projection optical system and strikes the slit, with at least some of the beam 641 passing through the slit. In one example, the slit is rectangular and shapes the light beam 641 into an elongated rectangular light beam. A pattern is formed on the mask, which determines which portions of the shaped light beam 641 are transmitted and which are blocked by the mask. The design of the pattern is determined by the specific microelectronic circuit design to be formed on the wafer 647. The portion of the shaped light beam that is transmitted by the mask forms an aerial image in the xy plane of the wafer 647. The aerial image is the intensity pattern formed by the light that reaches the wafer 647 after interacting with the mask.

[0051]

[0062] 7 shows a schematic diagram of one embodiment 710 of computing device 110. Computing device 710 includes an electronic processor 765, electronic storage 766, and an I / O interface 767. Electronic processor 765 includes one or more processors suitable for executing computer programs, such as general purpose or special purpose microprocessors, as well as any one or more processors of any type of digital computer. Typically, an electronic processor receives instructions and data from a read-only memory, a random access memory, or both. Electronic processor 765 may be any type of electronic processor.

[0052]

[0063] Electronic storage 766 may be volatile memory, such as RAM, or may be non-volatile memory. In some embodiments, electronic storage 766 includes non-volatile and volatile portions or components. Electronic storage 766 may store data and information used in the operation of computing device 710, components of computing device 710, and / or systems controlled by computing device 710. Information may be stored, for example, in a look-up table or database.

[0053]

[0064] The electronic storage device 766 may store instructions, for example computer programs, that, when executed, cause the processor 765 to communicate with components within the computing device 710 or with other processors internal or external to the computing device 710 .

[0054]

[0065] I / O interface 767 is any type of electronic interface that allows computing device 710 to receive and / or provide data and signals to an operator and processor 765. I / O interface 767 includes display area 120, and may include one or more additional display areas, keyboards, and other communication interfaces.

[0055]

[0066] Referring to FIG. 8 , in one aspect of the disclosure, a computer-implemented process 800 includes: (1) displaying a first status indicator within a first view of a user interface (802), the first status indicator being configured to indicate that an ultraviolet (UV) light source requires no action, the first status indicator indicating operation of a UV light source configured to provide UV light to a photolithography exposure apparatus; and (2) in response to a first prediction using data related to one or more subsystems of the UV light source, the first prediction relating to performance of the respective UV light source (804), displaying a first status indicator within the first view of the user interface. (3) in response to a second prediction using data related to one or more subsystems of the UV light source, the second prediction related to performance of the respective UV light source (808), changing a display within the first view of the user interface from the first or second status indicator to a third status indicator (812), the third status indicator configured to indicate that the UV light source requires maintenance. The predictions in 804 and / or 808 may be made by light source evaluator 486-i described above with reference to FIG.

[0056]

[0067] In one embodiment, the process 800 may further include, in response to determining 814 a status change related to one or more subsystems of the UV light source, such as a sudden change in performance or a physical change such as performance of a maintenance operation or significant adjustment of the subsystem, changing 816 a display within the first view of the user interface from the first status indicator, the second status indicator, or the third status indicator to a fourth status indicator, the fourth status indicator configured to indicate that the status of the UV light source cannot be assessed.

[0057]

[0068] In an embodiment as depicted in FIG. 8A , procedure 800 or procedure 802a may include (1) displaying two or more first status indicators within a first view of a user interface (802a), where each of the two or more first status indicators is configured to indicate that an associated UV light source of one of the two or more UV light sources requires no action, where each of the first status indicators indicates operation of the associated UV light source, where each of the associated UV light sources is configured to provide UV light to an associated UV lithography apparatus; and (2) in response to a first prediction using data related to one or more subsystems of each UV light source of the two or more UV light sources, the first prediction related to performance of the respective UV light source (804a), displaying the first status indicators associated with each UV light source within the first view of the user interface. and (3) in response to a second prediction using data related to one or more subsystems of each of the two or more UV light sources, the second prediction related to performance of the respective UV light source (808a), changing a display within the first view of the user interface from the first status indicator associated with the respective UV light source or the second status indicator associated with the respective UV light source to a third status indicator (812a), the third status indicator associated with the respective UV light source and configured to indicate that the respective UV light source requires maintenance. According to additional aspects of this procedure 800a, even more than two light sources may be used.

[0058]

[0069] In some embodiments, procedure 802a may also include, in response to detecting 814a a status change relating to one or more subsystems of a respective UV light source of the two or more UV light sources, changing (816a) a display within a first view of the user interface from a first status indicator of the respective UV light source, a second status indicator of the respective UV light source, or a third status indicator of the respective UV light source to a fourth status indicator, the fourth status indicator associated with the respective UV light source and configured to indicate that a status of the respective UV light source cannot be assessed.

[0059]

[0070] In another aspect of the present disclosure, a computer program product includes at least one computer-readable storage medium, such as electronic storage medium 766, in a non-transitory form having computer-executable program code instructions stored thereon.

[0060]

[0071] The computer executable program code instructions, when executed by a processor, such as processor 765, of a computing system, such as computing device 710, cause the computing system to: (1) display a first status indicator 232a of the group of status indicators 232a-232c within a first view of a user interface (e.g., on display 120 of GUI 122), where first status indicator 232a is configured to indicate that an ultraviolet (UV) light source 164-i, 464-i requires no action, and where status indicators 232a-232c indicate operation of an UV light source 164-i, 464-i configured to provide UV light to a photolithography exposure tool 162-i, 662; and (2) display a second status indicator 232b configured to indicate that performance of the UV light source should be monitored, where a second status indicator 232c is configured to display a second status indicator 232a of the group of status indicators 232a-232c within a first view of a user interface (e.g., on display 120 of GUI 122), where performance of the UV light source 164-i, 464-i requires no action, and where status indicators 232a-232c indicate operation of an UV light source 164-i, 464-i configured to provide UV light to a photolithography exposure tool 162-i, 662. and (3) in response to a second prediction using data related to one or more subsystems 457-i of the UV light source 164-i, 464-i (808), the second prediction related to the performance of the UV light source 164-i, 464-i (808), causing a change in display within the first view of the user interface (e.g., on the display 120 of the GUI 122) from the first status indicator 232a to the second status indicator 232b, where the third status indicator is configured to indicate that the UV light source 164-i, 464-i requires maintenance.

[0061]

[0072] In some embodiments of the computer program product, the program code instructions, when executed by a processor, such as processor 765, of a computing system, such as computing device 710, are configured to cause the computing system (such as computing device 110) to change the display within a first view of the user interface (such as on display 120 of GUI 122) from the first status indicator 232a, the second status indicator 232b, or the third status indicator 232c to a fourth status indicator 232d in response to receiving information representing a status change related to one or more subsystems 457-i of the UV light source 164-i, 464-i, where the fourth status indicator 232d is configured to indicate that the status of the UV light source 164-i, 464-i is not assessable.

[0062]

[0073] In any of the above procedures and computing devices or systems, the UV light source may specifically be a deep UV (DUV) light source, such as the DUV light source shown in FIG.

[0063]

[0074] 9A is an example of the status area of ​​FIG. 1C , showing example status indicators 132-i (of selected set 133) and subsystem status indicators 172-ij (of selected set 173), both in the form of various shaded or colored areas as described above with respect to FIGS. 2 and 3. Status indicator column heading 131 is in the form of a label "Light Source Status," to the right of which are various column headings 154-k of light source identification information items 163-ik, with columns of example items shown below. Column headings 154-k include "Light Source Serial No." (with an example serial number displayed in the column below), "Light Source Model" (with a light source model designation such as "TRS-1," "TRS-2," etc. displayed in the column below), and "Last Update Time" (with the time displayed in the column below, in this case in the format "HH:MM:SS ST," where H represents the hour digits in a 24-hour format, MM represents the minutes digits, and SS represents the seconds digits). Optics, PRA, MO Voltage, λlength, and BW are exemplary subsystem status indicator column headings 156-i for each subsystem for which a respective subsystem status indicator 172-ij is displayed in a column below the heading. For example, the "λlength" heading of the subsystem status indicator column headings 156-i heads a column of status indicators that display the status of the wavelength of each pulsed light beam generated by each light source identified by a respective light source identification item 163-ik in a respective row, while the "BW" heading 156-i heads a column of status indicators that display the status of one or more bandwidths of each pulsed light beam generated by each light source identified by a respective light source identification item 163-ik in a respective row.

[0064]

[0075] FIG. 9B is an example of a graph displaying information related to the status indicators 132-i of FIG. 9A. Specifically, in this case, as shown in FIG. 9B, a pie chart representation 942a of the relative proportions of each type of status indicated by the status indicators 132-i of the selected set 133 of FIG. 9A is displayed. Three status indicators 132-i are shown in this example of FIG. 9A. The three status indicators 132-i are a dark shaded indicator, a medium shaded indicator, and a light shaded indicator. These status indicators may correspond to, for example, red, amber, and green colors, or may correspond to various shadings or symbols that may be used to indicate conditions such as, for example, no action required, monitoring required, and maintenance required. The total number of status indicators shown in FIG. 9A is six. Each of the three status indicators shown in FIG. 9A occurs twice, so that each of the three status indicators represents one-third of the total. This is represented in the displayed pie chart by shading or coloring sections of the pie chart to match the shading or coloring of the status indicators, and by proportionally sizing the sections to match each status indicator's proportion of the total status indicator. In the illustrated case, the pie chart has been arbitrarily divided into three equal sections, one of each shading.

[0065]

[0076] Aspects and embodiments can be further described with the aid of the following recited examples. 1. A computing device in a photolithography exposure facility, the facility including one or more photolithography exposure tools, the computing device including a display screen, the computing device displaying on the display screen: a status area including one or more status indicators, each status indicator being associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure device of the one or more photolithography devices; a graph area including one or more graphs, each graph displaying information related to one or more status indicators; a filtering area including one or more menu items selectable to control the information displayed in the status area and / or in one or more graphs; A computing device configured to display. 2. The computing device of example 1, wherein the computing device is configured to display status indicators including a first status indicator configured to indicate that the associated UV light source does not require action, a second status indicator configured to indicate that performance of the associated UV light source should be monitored, and a third status indicator configured to indicate that the associated UV light source requires maintenance. 3. The computing device of example 2, wherein the computing device is configured to display a status indicator comprising a fourth status indicator configured to indicate that a status of the associated UV light source is not assessable. 4. The computing device of example 1, wherein the computing device is configured to display, in a status area on the display screen, a selectable set of subsystem status indicators for each of the one or more light source status indicators, the subsystem status indicators being associated with each subsystem of each UV light source. 5. The computing device of example 4, wherein the computing device is configured to display, on the display screen, in a filtering area, one or more additional menu items selectable to control which subsystem status indicators are included in the selectable set of subsystem status indicators. 6. The computing device of example 4, wherein the computing device is configured to display subsystem status indicators comprising a first subsystem status indicator configured to indicate that an associated subsystem does not require action, a second subsystem status indicator configured to indicate that performance of the associated subsystem should be monitored, and a third subsystem status indicator configured to indicate that the associated subsystem requires maintenance. 7. The computing device of example 6, wherein the computing device is configured to display a subsystem status indicator comprising a fourth subsystem status indicator configured to indicate that a status of the associated subsystem is not assessable. 8. The computing device of example 1, wherein the facility includes two or more photolithography exposure tools and the status area includes two or more status indicators. 9. A computing device in a photolithography exposure facility, the facility including one or more photolithography exposure tools, the computing device including a display screen, the computing device displaying on the display screen: a status area including one or more light source status indicators, each light source status indicator being associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure device of the one or more photolithography devices; A computing device configured to display. 10. The computing device of example 9, wherein the computing device is configured to display, on the display screen, a graph area including one or more graphs, each graph displaying information related to one or more light source status indicators. 11. The computing device of example 10, wherein the computing device is configured to display, on the display screen, a filtering area including one or more menu items selectable to control information displayed in one of the one or more graphs. 12. The computing device of example 11, wherein the one or more light source state indicators are a selected set of light source state indicators, and the one or more menu items are selectable to control which light source state indicators are included in the selected set of light source state indicators. 13. The computing device of example 9, wherein the computing device is configured to display, on the display screen in a status area, a selectable set of subsystem status indicators for each of the one or more light source status indicators, the subsystem status indicators being associated with a respective subsystem of a respective UV light source. 14. The computing device of example 13, wherein the computing device is configured to display, on the display screen, in a filtering area, one or more menu items selectable to control which subsystem status indicators are included in the selectable set of subsystem status indicators. 15. The computing device of Example 1, wherein the computing device is further configured to selectably display additional detailed data relating to one or more light sources or one or more photolithography apparatus on the display screen in response to user selection of one or more menu items. 16. The computing device of example 15, wherein the additional detailed data comprises exposure data for one or more light sources or one or more photolithography tools. 17. The computing device of example 15, wherein the additional detailed data comprises exposure data including sub-wafer level exposure data for one or more light sources or one or more photolithography tools. 18. The computing device of example 1, wherein the UV light source is a deep ultraviolet (DUV) light source. 19. Displaying a first status indicator within a first view of a user interface, the first status indicator configured to indicate that an ultraviolet (UV) light source does not require action, the status indicator indicating operation of a UV light source configured to provide UV light to a photolithography exposure apparatus; changing a display within a first view of the user interface from a first status indicator to a second status indicator in response to a first prediction using data related to one or more subsystems of the UV light source, the first prediction related to performance of the UV light source, the second status indicator being configured to indicate that performance of the UV light source should be monitored; In response to a second prediction using data related to one or more subsystems of the UV light source, the second prediction related to performance of the UV light source, changing a display within a first view of the user interface from the first status indicator or the second status indicator to a third status indicator, the third status indicator being configured to indicate that the UV light source requires maintenance; A computer-implemented procedure comprising: 20. The procedure of example 19, further comprising changing a display within a first view of the user interface from the first status indicator, the second status indicator, or the third status indicator to a fourth status indicator in response to a status change relating to one or more subsystems of the UV light source, the fourth status indicator being configured to indicate that a status of the UV light source is not assessable. 21. Displaying two or more first status indicators within a first view of a user interface, each of the two or more first status indicators configured to indicate that an associated UV light source of the two or more UV light sources does not require action, each of the first status indicators indicating operation of the associated UV light source, each associated UV light source configured to provide UV light to an associated UV lithography apparatus; in response to a first prediction using data related to one or more subsystems of each UV light source of the two or more UV light sources, the first prediction related to performance of the respective UV light source, changing a display within a first view of the user interface from a first status indicator associated with the respective UV light source to a second status indicator, the second status indicator being associated with the respective UV light source and configured to indicate that performance of the respective UV light source should be monitored; In response to a second prediction using data related to one or more subsystems of each UV light source of the two or more UV light sources, the second prediction related to performance of the respective UV light source, changing a display within a first view of the user interface from a first status indicator associated with the respective UV light source or a second status indicator associated with the respective UV light source to a third status indicator, the third status indicator being associated with the respective UV light source and configured to indicate that the respective UV light source requires maintenance; The procedure of Example 19, further comprising: 22. The procedure of example 21, further comprising: in response to a status change relating to one or more subsystems of each UV light source of the two or more UV light sources, changing a display within a first view of the user interface from a first status indicator of the respective UV light source, a second status indicator of the respective UV light source, or a third status indicator of the respective UV light source to a fourth status indicator, the fourth status indicator being associated with the respective UV light source and configured to indicate that a status of the respective UV light source is not assessable. 23. The procedure of example 19, wherein the UV light source is a deep ultraviolet (DUV) light source. 24. A computer program product comprising at least one non-transitory computer-readable storage medium having computer-executable program code instructions stored thereon, the computer-executable program code instructions, when executed by a processor of a computing system, causing the computing system to: displaying a first status indicator of the group of status indicators within a first view of the user interface, where a first status indicator is configured to indicate that an ultraviolet (UV) light source requires no action and a status indicator of the group of status indicators indicates operation of the UV light source, the UV light source being configured to provide UV light to the photolithography exposure apparatus; in response to receiving a first prediction using data related to one or more subsystems of the UV light source, the first prediction related to performance of the UV light source, causing a change in display within a first view of the user interface from a first status indicator of a group of status indicators to a second status indicator, wherein the second status indicator is configured to indicate that performance of the UV light source should be monitored; and in response to receiving a second prediction using data related to one or more subsystems of the UV light source, the second prediction related to performance of the UV light, causing a change in display within a first view of the user interface from the first status indicator or the second status indicator to a third status indicator, the third status indicator being configured to indicate that the UV light source requires maintenance. A computer program product comprising configured program code instructions. 25. The computer program product of Example 24, wherein the program code instructions, when executed by a processor of the computing system, are configured to cause the computing system to change the display, within a first view of a user interface, from a first status indicator, a second status indicator, or a third status indicator of a group of status indicators to a fourth status indicator in response to receiving information representing a status change relating to one or more subsystems of the UV light source, wherein the fourth status indicator is configured to indicate that a status of the UV light source is not assessable. 26. The computer program product of example 24, wherein the UV light source is a deep ultraviolet (DUV) light source. 27. A computing device in a photolithography exposure facility, the facility including one or more photolithography exposure tools, the computing device including a display screen, the computing device displaying on the display screen: a status area including one or more status indicators, each status indicator being associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure device of the one or more photolithography devices; a graph area including one or more graphs, each graph displaying information related to one or more status indicators; a filtering area including one or more menu items selectable to control information displayed in the status area and / or in the one or more graphs, the filtering area being configured for communications related to a computing device of the photolithography exposure facility; a computing device configured to display a computing device at the maintenance provider facility, said computing device having on a display screen: a status area equivalent to the status area including one or more status indicators associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure device of the one or more photolithography devices; a graph area equivalent to the graph area that includes one or more graphs displaying information related to one or more status indicators; a filtering area equivalent to the filtering area, the filtering area including one or more menu items selectable to control the information displayed in the status area and / or in one or more graphs; a maintenance provider facility operation configured to display A system comprising: 28. The system of Example 27, wherein the computing device of the photolithography exposure facility is further configured to, in response to a user selection of one or more menu items, selectably display on the display screen additional detailed data relating to the one or more light sources or to the one or more photolithography devices, including sub-wafer level exposure data for the one or more light sources or the one or more photolithography devices. 29. The system of example 28, wherein the computing device at the maintenance provider facility is not configured to receive or display sub-wafer level exposure data for the one or more light sources or the one or more photolithography devices. 30. The system of example 27, wherein the UV light source is a deep ultraviolet (DUV) light source.

[0066]

[0077] These and other embodiments are within the scope of the following claims.

Claims

1. 1. A computing device in a photolithography exposure facility, the facility including one or more photolithography exposure tools, the computing device including a display screen, the computing device displaying on the display screen: a status area including one or more status indicators, each status indicator being associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure device of the one or more photolithography devices; a graph area including one or more graphs, each graph displaying information related to said one or more status indicators; a filtering area including one or more menu items selectable to control the information displayed in the status area and / or in the one or more graphs; A computing device configured to display.

2. 2. The computing device of claim 1, wherein the computing device is configured to display status indicators comprising a first status indicator configured to indicate that the associated UV light source does not require action, a second status indicator configured to indicate that performance of the associated UV light source should be monitored, and a third status indicator configured to indicate that the associated UV light source requires maintenance.

3. The computing device of claim 2 , wherein the computing device is configured to display status indicators, the status indicator comprising a fourth status indicator configured to indicate that a status of the associated UV light source is not assessable.

4. 2. The computing device of claim 1, wherein the computing device is configured to display in the status area on the display screen a selectable set of subsystem status indicators for each of the one or more light source status indicators, the subsystem status indicators being associated with a respective subsystem of the respective UV light source.

5. 5. The computing device of claim 4, wherein the computing device is configured to display in the filtering area on the display screen one or more additional menu items selectable to control which subsystem status indicators are included in the selectable set of subsystem status indicators.

6. 5. The computing device of claim 4, wherein the computing device is configured to display subsystem status indicators comprising a first subsystem status indicator configured to indicate that the associated subsystem does not require action, a second subsystem status indicator configured to indicate that performance of the associated subsystem should be monitored, and a third subsystem status indicator configured to indicate that the associated subsystem requires maintenance.

7. 7. The computing device of claim 6, wherein the computing device is configured to display subsystem status indicators, comprising a fourth subsystem status indicator configured to indicate that a status of the associated subsystem is not assessable.

8. The computing device of claim 1 , wherein the facility comprises two or more photolithography exposure tools, and the status area includes two or more status indicators.

9. 1. A computing device in a photolithography exposure facility, the facility including one or more photolithography exposure tools, the computing device including a display screen, the computing device displaying on the display screen: a status area including one or more light source status indicators, each light source status indicator being associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure device of the one or more photolithography devices. A computing device configured to display.

10. 10. The computing device of claim 9, wherein the computing device is configured to display on the display screen a graph area including one or more graphs, each graph displaying information related to the one or more light source condition indicators.

11. 11. The computing device of claim 10, wherein the computing device is configured to display on the display screen a filtering area including one or more menu items selectable to control the information displayed in one of the one or more graphs.

12. 12. The computing device of claim 11, wherein the one or more light source state indicators are a selected set of light source state indicators, and the one or more menu items are selectable to control which light source state indicators are included in the selected set of light source state indicators.

13. 10. The computing device of claim 9, wherein the computing device is configured to display in the status area on the display screen a selectable set of subsystem status indicators for each of the one or more light source status indicators, the subsystem status indicators being associated with a respective subsystem of the respective UV light source.

14. 14. The computing device of claim 13, wherein the computing device is configured to display in the filtering area on the display screen one or more menu items selectable to control which subsystem status indicators are included in the selectable set of subsystem status indicators.

15. 11. The computing device of claim 1, further configured to selectably display on the display screen additional detailed data relating to the one or more light sources or to the one or more photolithography apparatuses in response to user selection of the one or more menu items.

16. The computing device of claim 15 , wherein the additional detailed data comprises exposure data for the one or more light sources or the one or more photolithography tools.

17. The computing device of claim 15 , wherein the additional detailed data comprises exposure data including sub-wafer level exposure data for the one or more light sources or the one or more photolithography tools.

18. The computing device of claim 1 , wherein the UV light source is a deep ultraviolet (DUV) light source.

19. displaying a first status indicator within a first view of a user interface, the first status indicator configured to indicate that an ultraviolet (UV) light source does not require action, the status indicator indicating operation of a UV light source configured to provide UV light to a photolithography exposure apparatus; changing the display within the first view of the user interface from the first status indicator to a second status indicator in response to a first prediction using data related to one or more subsystems of the UV light source, the first prediction related to a performance of the UV light source, the second status indicator being configured to indicate that the performance of the UV light source should be monitored; changing the indication within the first view of the user interface from the first status indicator or the second status indicator to a third status indicator in response to a second prediction using data related to one or more subsystems of the UV light source, the second prediction related to the performance of the UV light source, the third status indicator being configured to indicate that the UV light source requires maintenance; A computer-implemented procedure comprising:

20. 20. The method of claim 19, further comprising: in response to a status change relating to one or more subsystems of the UV light source, changing the display within the first view of the user interface from the first status indicator, the second status indicator, or the third status indicator to a fourth status indicator, the fourth status indicator configured to indicate that a status of the UV light source cannot be assessed.

21. displaying two or more first status indicators within the first view of a user interface, each of the two or more first status indicators configured to indicate that an associated UV light source of two or more UV light sources does not require action, each of the first status indicators indicating the operation of the associated UV light source, each associated UV light source configured to provide UV light to an associated UV lithography apparatus; and in response to a first prediction using data related to one or more subsystems of a respective UV light source of the two or more UV light sources, the first prediction related to the performance of the respective UV light source, changing the display within the first view of the user interface from the first status indicator associated with the respective UV light source to a second status indicator, the second status indicator associated with the respective UV light source and configured to indicate that the performance of the respective UV light source should be monitored; and in response to a second prediction using data related to one or more subsystems of a respective UV light source of the two or more UV light sources, the second prediction related to the performance of the respective UV light source, changing the display within the first view of the user interface from the first status indicator associated with the respective UV light source or the second status indicator associated with the respective UV light source to a third status indicator, the third status indicator being associated with the respective UV light source and configured to indicate that the respective UV light source requires maintenance; 20. The procedure of claim 19 further comprising:

22. 22. The method of claim 21, further comprising: in response to a status change relating to one or more subsystems of a respective UV light source of the two or more UV light sources, changing the display within the first view of the user interface from the first status indicator of the respective UV light source, the second status indicator of the respective UV light source, or the third status indicator of the respective UV light source to a fourth status indicator associated with the respective UV light source and configured to indicate that the status of the respective UV light source is not assessable.

23. 20. The process of claim 19, wherein the UV light source is a deep ultraviolet (DUV) light source.

24. 1. A computer program product comprising at least one non-transitory computer readable storage medium having computer executable program code instructions stored thereon, the computer executable program code instructions, when executed by a processor of a computing system, for causing the computing system to: displaying, within a first view of a user interface, a first status indicator of the group of status indicators, the first status indicator being configured to indicate that an ultraviolet (UV) light source requires no action, and a status indicator of a group of status indicators indicating operation of the UV light source, the UV light source being configured to provide UV light to a photolithography exposure apparatus; in response to receiving a first prediction using data related to one or more subsystems of the UV light source, the first prediction related to performance of the UV light source, causing a change in the display from the first status indicator of the group of status indicators to the second status indicator within the first view of the user interface, wherein a second status indicator is configured to indicate that the performance of the UV light source should be monitored; and and in response to receiving a second prediction using data related to one or more subsystems of the UV light source, the second prediction related to the performance of the UV light, causing the indication to change within the first view of the user interface from the first status indicator or the second status indicator to the third status indicator, wherein a third status indicator is configured to indicate that the UV light source requires maintenance. A computer program product comprising configured program code instructions.

25. 25. The computer program product of claim 24, wherein the program code instructions, when executed by a processor of a computing system, are configured to cause the computing system to, in response to receiving information representing a status change relating to one or more subsystems of the UV light source, change a display within the first view of the user interface from the first status indicator, the second status indicator, or the third status indicator of the group of status indicators to a fourth status indicator, the fourth status indicator configured to indicate that a status of the UV light source cannot be assessed.

26. 25. The computer program product of claim 24, wherein the UV light source is a deep ultraviolet (DUV) light source.

27. 1. A computing device in a photolithography exposure facility, the facility including one or more photolithography exposure tools, the computing device including a display screen, the computing device displaying on the display screen: a status area including one or more status indicators, each status indicator being associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure device of the one or more photolithography devices; a graph area including one or more graphs, each graph displaying information related to said one or more status indicators; a filtering area including one or more menu items selectable to control the information displayed in the status area and / or in the one or more graphs, the filtering area being configured for communications related to the computing device of the photolithography exposure facility; a computing device configured to display a computing device at the maintenance provider facility, said computing device having on a display screen: a status area equivalent to the status area, the status area including the one or more status indicators associated with an ultraviolet (UV) light source configured to provide light to a respective photolithography exposure device of the one or more photolithography devices; a graph area equivalent to said graph area including one or more graphs displaying information related to said one or more status indicators; a filtering area equivalent to the filtering area, the filtering area including one or more menu items selectable to control the information displayed in the status area and / or in the one or more graphs; a computing device at the maintenance provider facility configured to display A system comprising:

28. 28. The system of claim 27, wherein the computing device of the photolithography exposure facility is further configured to, in response to a user selection of the one or more menu items, selectably display on the display screen additional detailed data relating to the one or more light sources or the one or more photolithography devices, including sub-wafer level exposure data for the one or more light sources or the one or more photolithography devices.

29. 30. The system of claim 28, wherein the computing device at the maintenance provider facility is not configured to receive or display sub-wafer level exposure data for the one or more light sources or the one or more photolithography tools.

30. 30. The system of claim 27, wherein the UV light source is a deep ultraviolet (DUV) light source.

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