Integrated processing equipment

The integrated processing equipment addresses the limitations of existing development devices by incorporating a tilt angle adjustment unit and a flow conducting device, enabling efficient processing of varied workpiece sizes and shapes with improved quality and reduced costs.

JP2025515275AActive Publication Date: 2025-05-14CHENGDU SOAR SMART TECH CO LTD
View PDF 5 Cites 0 Cited by

Patent Information

Application Number
JP2024560871
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Priority Date
2022-04-18
Filing Date
2023-06-13
Publication Date
2025-05-14
Estimated Expiration
2043-06-13

AI Technical Summary

Technical Problem

Existing development devices in the photolithography process have a narrow range of application and are costly, making them inefficient for processing workpieces of various sizes.

Method used

An integrated processing equipment is designed with a base, a rotary device, and a flow conducting device. The rotary device includes a tilt angle adjustment unit and a rotating unit, allowing the workpiece to be rotated about two axes with adjustable tilt angles. The flow conducting device includes a frame, a liquid reservoir, and a flow conduction portion, enabling fluid to flow onto the workpiece from various angles.

Benefits of technology

The integrated processing equipment can efficiently process workpieces of different sizes and shapes by adjusting the tilt angle and distance of the workpiece relative to the fluid flow, reducing damage and improving development quality while reducing costs.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure 2025515275000001_ABST
    Figure 2025515275000001_ABST
Patent Text Reader

Abstract

The integrated processing equipment includes a base (100), a rotation device (200) and a flow guide device (300). The rotation device (200) includes a tilt angle adjustment unit (210) and a rotation unit (220), the tilt angle adjustment unit (210) is installed on the base (100), the rotation unit (220) is connected to the tilt angle adjustment unit (210), the rotation unit (220) is configured to mount a workpiece and rotate the workpiece around a first axis (001), and the tilt angle adjustment unit (210) is configured to drive the rotation unit (220) to rotate the workpiece around a second axis (002) having an included angle with respect to the first axis (001). The flow guide device (300) includes a frame (310), a liquid storage section (320), and a flow guide section (330), the frame (310) is connected to the tilt angle adjustment unit (210), the liquid storage section (320) and the flow guide section (330) are both connected to the frame (310), the liquid storage section (320) is configured to transport the liquid to the flow guide section (330), and the liquid can flow through the flow guide section (330) to the workpiece located on the rotation unit (220). The integrated processing equipment can adjust the distance from the fluid to the workpiece surface and reduce the impact force by adjusting the tilt angle of the workpiece relative to the horizontal plane as needed, and can also adjust the speed of the fluid flowing on the workpiece surface, which makes it easier to control the processing quality and improves the yield of the final product.
Need to check novelty before this filing date? Find Prior Art

Description

[Technical field]

[0001] [CROSS REFERENCE TO RELATED APPLICATIONS] This application claims priority to a Chinese patent application entitled "Integrated Processing Equipment" filed with the China Patent Office on April 18, 2022, with Chinese Application No. 202210406069.9, the entire contents of which are incorporated herein by reference. The present invention relates to the field of processing technology, and more particularly to integrated processing equipment. [Background technology]

[0002] The development process is an intermediate process in the photolithography process, whose purpose is to remove parts of the photoresist on the wafer to form a three-dimensional physical pattern, thereby accurately copying the circuit structure on the mask onto the photoresist layer of the silicon wafer. In the development process, the fluid and the photoresist in the exposed area undergo an acid-base neutralization reaction, and after development, the residue from the reaction is removed by deionized water. The point of development is to ensure that the feature size (the minimum line width of a semiconductor device in integrated circuit manufacturing) meets the requirements, and if the feature size meets the requirements, all the geometric features generated during processing are considered to meet the requirements. There are three types of development processes in the conventional development process: immersion development, continuous spray development, and rotational immersion development. In the conventional continuous spray development, the wafer is rotated at a speed of 100r / min to 500r / min while spraying a mist-like fluid onto the wafer.

[0003] As a result of extensive research, the present inventors have discovered that existing developing devices have the drawbacks of being narrow in scope of application and high in cost. Summary of the Invention [Problem to be solved by the invention]

[0004] SUMMARY OF THE PRESENT EMBODIMENT The present invention aims to provide an integrated processing equipment which can process workpieces of various sizes and has the advantages of high adaptability, wide application range and low cost. [Means for solving the problem]

[0005] An embodiment of the present invention is implemented as follows. The present invention provides an integrated processing equipment, A base, a rotating device, and a flow guide device are included. the rotation device includes a tilt angle adjustment unit and a rotation unit, the tilt angle adjustment unit is installed on the base, the rotation unit is connected to the tilt angle adjustment unit, the rotation unit is configured to mount a workpiece and rotate the workpiece around a first axis, and the tilt angle adjustment unit is configured to drive the rotation unit to rotate the workpiece around a second axis having an included angle with respect to the first axis; The flow guide device includes a frame body, a liquid storage portion and a flow guide portion, the frame body is connected to the tilt angle adjustment unit, the liquid storage portion and the flow guide portion are both connected to the frame body, the liquid storage portion is configured to transport liquid to the flow guide portion, and the liquid can flow through the flow guide portion to a workpiece located on the rotation unit.

[0006] In a possible embodiment, the tilt angle adjustment unit includes a first drive unit and a mounting base, the first drive unit is connected to the base, the mounting base is connected to the first drive unit, and the first drive unit is configured to drive the mounting base to rotate about the first axis; Both the rotation unit and the frame are connected to the mounting base.

[0007] In a possible embodiment, the mounting base is provided with a liquid collection tank and a liquid outlet communicating with the liquid collection tank, the base is provided with a liquid collection chamber, the liquid outlet communicates with the liquid collection chamber, the rotating unit is provided within the liquid collection tank, and the liquid collection tank is configured to collect liquid falling from the workpiece and direct the fallen liquid from the liquid outlet into the liquid collection chamber.

[0008] In a possible embodiment, the rotation unit includes a second drive, a rotating disk, and a positioning component, the second drive connected to the mounting base, the rotating disk connected to the second drive, the second drive configured to drive the rotating disk to rotate about the second axis, the positioning component connected to the rotating disk, and the positioning component configured to position a workpiece on the rotating disk.

[0009] In a possible embodiment, the positioning component includes a plurality of clamp blocks, all of which are connected to the rotating disk, the plurality of clamp blocks collectively defining a clamping area for clamping a workpiece, and at least one of the plurality of clamp blocks configured to move relative to the rotating disk to adjust a size of the clamping area.

[0010] In a possible embodiment, the flow guide section is provided with a liquid discharge side, which is movably connected to the frame body and is used to adjust the distance between the liquid discharge side and the frame body, thereby adjusting the distance between the liquid discharge side and the workpiece located on the rotating unit.

[0011] In a possible embodiment, the flow guide portion is connected to the frame body so as to be slidable in the extension direction of the second axis so as to adjust the distance between the liquid discharge side and the frame body.

[0012] In a possible embodiment, the flow guide device also includes a locking unit, which is simultaneously connected to the flow guide portion and the frame body, and which has a switchable locked state and an unlocked state, and in the locked state, the flow guide portion is fixed in the extension direction of the second axis relative to the frame body, and in the unlocked state, the flow guide portion is slidable in the extension direction of the second axis relative to the frame body.

[0013] In a possible embodiment, the liquid storage portion is connected to the frame body so as to be slidable in the extension direction of the second axis so as to adjust the distance of the liquid storage portion from the flow guiding portion.

[0014] In a possible embodiment, the liquid storage section has a first chamber and a second chamber independent of each other, the first chamber having a first outlet and configured to store a fluid, and the second chamber having a second outlet and configured to store a cleaning liquid. Effect of the Invention

[0015] The beneficial effects of the present invention are as follows: In summary, the integrated processing equipment provided by the present invention can be applied to a development scenario, specifically, when developing a workpiece, the workpiece is placed on the rotating unit, and the tilt angle of the workpiece relative to the horizontal plane is adjusted by the tilt angle adjustment unit according to the thickness and size of the workpiece, that is, the tilt angle of the workpiece relative to the guiding part is adjusted, so that the fluid flowing from the guiding part to the workpiece surface has a small impact force on the workpiece surface, is less likely to damage the workpiece surface, and has high development quality. Since the angle between the workpiece and the guiding part can be adjusted as needed according to the thickness and size of the workpiece, it can adapt to the development work of workpieces of different sizes, ensure the development quality, and have a wide range of application, and there is no need to design dedicated development devices for workpieces of different sizes, which can reduce costs. [Brief description of the drawings]

[0016] In order to more clearly describe the technical solutions of the embodiments of the present invention, the drawings that need to be used in the embodiments are briefly described below, and it should be understood that the following drawings only show certain embodiments of the present invention, and therefore should not be construed as limiting the scope. Those skilled in the art can also obtain other related drawings based on these drawings without creative efforts.

[0017] [Figure 1] 1 is a structural schematic diagram of an integrated processing equipment according to an embodiment of the present invention viewed from a certain viewpoint; [Diagram 2] FIG. 2 is a structural schematic diagram of the integrated processing equipment according to the embodiment of the present invention seen from another perspective. [Diagram 3] 1 is a schematic diagram showing a partial structure of an integrated processing equipment according to an embodiment of the present invention; [Figure 4] FIG. 2 is a structural schematic diagram of a rotating disk and a positioning component according to an embodiment of the present invention. [Diagram 5] 3 is a structural schematic diagram of a frame and a lock unit according to an embodiment of the present invention. FIG. [Figure 6] 1 is a structural schematic diagram of a lock unit according to an embodiment of the present invention; [Figure 7] 2 is a structural schematic diagram of a flow guide according to an embodiment of the present invention; FIG. [Figure 8] 2 is a structural schematic diagram of a liquid storage part according to an embodiment of the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0018] In order to make the objectives, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention are described below clearly and completely in conjunction with the drawings of the embodiments of the present invention, obviously, the described embodiments are some but not all of the embodiments of the present invention. Typically, the components of the embodiments of the present invention described and shown in the drawings can be arranged and designed in various different configurations.

[0019] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but is intended to merely represent selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the scope of protection of the present invention.

[0020] In the following figures, like reference numbers and letters represent like items, so it should be understood that once an item is defined in one figure, no further definition or explanation is required in subsequent figures.

[0021] In the description of this application, the directions or positional relationships indicated by terms such as "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", and "outer" are directions or positional relationships indicated based on the drawings, and directions or positional relationships in which the product of the application is usually placed when used, and are only for the purpose of conveniently explaining the present invention and simplifying the description, and do not indicate or imply that the mentioned devices or elements must be oriented in a specific direction or constructed and operated in a specific direction, and therefore cannot be understood as limiting the present invention. In addition, terms such as "first", "second", and "third" are only for distinguishing the description, and should not be construed as indicating or implying relative importance.

[0022] Additionally, terms such as "horizontal", "vertical", etc. do not mean that a part must be perfectly horizontal or hanging, but may be slightly tilted. For example, "horizontal" only means that the orientation is more horizontal than "vertical", but does not mean that the structure must be perfectly horizontal, but may be slightly tilted.

[0023] In the description of the present invention, and unless otherwise expressly stated and limited, the terms "installation", "mounting", "interconnection" and "connection" should be understood in a broad sense, for example, and may be a fixed connection, a removable connection, or an integral connection, may be a mechanical connection, an electrical connection, a direct connection, an indirect connection via an intermediary, or an internal connection between two components. Those skilled in the art will be able to understand the specific meaning of the above terms in the present invention on a case-by-case basis.

[0024] At present, in the field of semiconductor processing, when developing a workpiece, the workpiece is generally placed on a rotating disk, and then the fluid is applied to the surface of the workpiece, and the workpiece is rotated continuously to achieve full-circumference development. After the workpiece is positioned on the rotating disk, the angle of the rotating disk is fixed, and the angle of the workpiece relative to the horizontal plane is fixed and cannot be adjusted, so that different workpiece sizes will cause different heights between the workpiece and the fluid outlet side, and the impact force will change when the fluid reaches the workpiece surface, and the workpiece is easily damaged by the impact force, resulting in a reduction in the yield of the final product.

[0025] Taking this into consideration, and referring to Figures 1 to 8, the present inventors have designed an integrated processing equipment that can be used in the development field, and by adjusting the inclination angle of the workpiece relative to the horizontal plane as necessary, the distance from the fluid to the workpiece surface can be adjusted to reduce the impact force, and the speed of the developer flowing over the workpiece surface can be adjusted, which makes it easier to control the development quality and improves the yield of the final product.

[0026] 1 to 3, in this embodiment, the integrated processing equipment includes a base 100, a rotation device 200, and a flow guide device 300. The base 100 is for being fixed on a supporting surface such as a workbench or the ground. The rotation device 200 includes an inclination angle adjustment unit 210 and a rotation unit 220, the inclination angle adjustment unit 210 is installed on the base 100, the rotation unit 220 is connected to the inclination angle adjustment unit 210, the rotation unit 220 is configured to place a workpiece thereon and rotate the workpiece around a first axis 001, and the inclination angle adjustment unit 210 is configured to drive the rotation unit 220 to rotate the workpiece around a second axis 002 having an included angle with respect to the first axis 001. The flow guide device 300 comprises a frame body 310, a liquid storage section 320, and a flow guide section 330, the frame body 310 being connected to the tilt angle adjustment unit 210, the liquid storage section 320 and the flow guide section 330 being both connected to the frame body 310, the liquid storage section 320 being configured to transport liquid to the flow guide section 330, so that the liquid can flow through the flow guide section 330 to a workpiece positioned on the rotation unit 220.

[0027] In this embodiment, the first axis 001 is perpendicular to the second axis 002, and the second axis 002 essentially coincides with a horizontal plane, obviously, in other embodiments, the first axis 001 and the second axis 002 may have other included angles other than 0° and 90°, and at the same time, the second axis 002 may have other included angles with respect to the horizontal plane other than 0°.

[0028] In this embodiment, as an optional configuration, the base 100 is set as a square base, the base 100 has a first plate surface and a second plate surface facing each other, the first plate surface is for fixing to a support surface, the second plate surface faces upward, and two mounting blocks 130 are set on the second plate surface, both of which are square blocks, and the two mounting blocks 130 are arranged at a distance from each other. Each mounting block 130 is provided with a bearing hole, and the two bearing holes of the two mounting blocks 130 are coaxially arranged. In addition, the base 100 is provided with a liquid collecting chamber 110, which has an opening located on the second plate surface, and the water pump 120 is installed in the liquid collecting chamber 110.

[0029] Referring to FIG. 2, in this embodiment, as a selectable configuration, the tilt angle adjustment unit 210 includes a first driving unit 211, a mounting base 212, and a bearing (not shown), the first driving unit 211 is configured as a motor, the first driving unit 211 is fixed on the second plate surface, the number of bearings is two, the two bearings are fitted into the bearing holes of the two mounting blocks 130, respectively, the output shaft of the first driving unit 211 is inserted into the inner rings of the two bearings at the same time, and thus the output shaft of the first driving unit 211 is rotatably connected to the two mounting blocks 130 through the two bearings around the second axis 002. The mounting base 212 is fixed to the output shaft of the first driving unit 211 and can rotate together with the output shaft. That is, after the mounting base 212 is attached to the output shaft, the mounting base 212 and the output shaft are relatively fixed in the circumferential direction of the output shaft. For example, the mounting base 212 can be fixedly connected to the output shaft through a spline or a pin. Further, the mounting base 212 includes a base body 2121 and a plate body 2122 connected together, and the base body 2121 is fitted onto the outside of the output shaft and fixedly connected to the output shaft. The plate body 2122 is provided with a liquid collection tank 2123 and a liquid outlet 2124 communicating with the liquid collection tank 2123, and a through hole is provided in the center of the liquid collection tank 2123, the through hole being a cylindrical hole, and a bearing with a seal is provided in the through hole. The liquid in the liquid collection tank 2123 can be discharged into the liquid collection chamber 110 through the liquid outlet 2124.

[0030] In another embodiment, as an optional configuration, the tilt angle adjustment unit 210 also includes an angle measuring device, which is connected to the first drive unit 211 and configured to detect the rotation angle of the output shaft of the first drive unit 211, so as to obtain the rotation angle of the mounting base 212, and further the angle of the mounting base 212 relative to the horizontal plane, and finally the angle of the workpiece relative to the horizontal plane.

[0031] 1 and 4, in this embodiment, as an optional configuration, the rotating unit 220 includes a second driving part 221, a rotating disk 222, and a positioning component 223, and the second driving part 221 is configured as a motor. The second driving part 221 is fixed on the base body 2121, and the output shaft of the second driving part 221 is inserted into a seal bearing, and the output shaft of the second driving part 221 extends into the liquid collecting tank 2123. The rotating disk 222 may be a circular disk. The rotating disk 222 is disposed in the liquid collecting tank 2123. The rotating disk 222 is fixedly connected to the output shaft. The axis of the rotating disk 222 is in line with the axis of the output shaft. The positioning component 223 is disposed on the rotating disk 222, and the positioning component 223 is for positioning the workpiece on the rotating disk 222 so that the workpiece does not move relative to the rotating disk 222 during the development process.

[0032] In an optional configuration, the positioning component 223 includes a plurality of positioning blocks, each of which is connected to the rotating disk 222, and at least one of the plurality of positioning blocks is slidable relative to the rotating disk 222 along a radial direction of the rotating disk 222, thereby adjusting a position of the positioning block relative to the rotating disk 222. The plurality of positioning blocks are configured to clamp a workpiece together, and the plurality of positioning blocks collectively define a clamping area. It should be understood that when the positioning block moves relative to the rotating disk 222, the size of the clamping area changes, thereby adapting to clamping various workpieces, achieving a wide range of applications and low cost.

[0033] Each of the positioning blocks can be slidably installed relative to the rotating disk 222, and can be flexibly adjusted with a wide adjustment range, so that more types of workpieces can be clamped. Of course, in other embodiments, only one of the positioning blocks can be configured to be movable relative to the rotating disk 222, and the function of adjusting the size of the clamping area can also be achieved.

[0034] In addition, the positioning block can be fixed to the rotating disk 222 by screws, and the rotating disk can be provided with a number of screw holes. When the screws are screwed into different screw holes, the position of the positioning block relative to the rotating disk 222 in the radial direction of the rotating disk 222 can be changed, so that after adjusting the size of the clamping area, the workpiece can be stably clamped without changing the size of the clamping area.

[0035] Referring to FIG. 5, in this embodiment, as a selectable configuration, the frame body 310 includes a fixed plate 311, a fixed rod 312, and an adjustment rod 313. The fixed plate 311 is configured in a rectangular plate shape, and is fixed to the base body 2121 by a screw. One end of the fixed rod 312 is connected to the fixed plate 311, and the other end is connected to the adjustment rod 313, and the number of the fixed rods 312 and the adjustment rods 313 is two. One end of each of the two fixed rods 312 is connected to the base body 2121, and the other ends of the two fixed rods 312 are fixedly connected to the two adjustment rods 313, respectively. The two adjustment rods 313 are both perpendicular to the second axis 002, and are arranged at an interval in the extension direction of the second axis 002.

[0036] Furthermore, each adjustment rod 313 is slidably connected to a corresponding fixed rod 312. The sliding direction of the adjustment rod 313 and the fixed rod 312 is parallel to the guiding direction of the flow guide 330 that guides the liquid to flow onto the workpiece. In this way, when the size of the workpiece positioned on the rotating disk 222 is small, the position of the adjustment rod 313 relative to the fixed rod 312 can be adjusted to move the flow guide 330 closer to or farther away from the workpiece, so that the liquid flowing out from the flow guide 330 can smoothly fall onto the workpiece.

[0037] In this embodiment, as an optional configuration, the flow guiding portion 330 is slidably fitted to the frame body 310 via the lock unit 340. The lock unit 340 has a lock state and an unlock state that can be switched between each other. In the lock state, the flow guiding portion 330 is fixed in the extension direction of the second axis 002 relative to the frame body 310, and in the unlock state, the flow guiding portion 330 is slidable in the extension direction of the second axis 002 relative to the frame body 310. In this manner, the flow guiding portion 330 can move relative to the frame body 310, and thereby can move relative to the rotating disk 222, and the distance between the flow guiding portion 330 and the rotating disk 222 is adjusted, and finally, the distance between the flow guiding portion 330 and the workpiece surface located on the rotating disk 222 is adjusted. When designed in this manner, the position of the flow guiding section 330 can be adjusted according to workpieces of different thicknesses, so that the distance between the flow guiding section 330 and the workpiece is always maintained within a reasonable distance range, and the liquid guided by the flow guiding section 330 and flowing from the liquid discharge side 331 of the flow guiding section 330 to the surface of the workpiece can uniformly cover the surface of the workpiece, thereby improving the work quality.

[0038] 6, as an optional configuration, the locking unit 340 includes a plurality of fastening rods 341, and at least one fastening rod 341 is provided on each adjustment rod 313, and each fastening rod 341 is provided with annular protrusions 342 equally spaced in the axial extension direction of the fastening rod 341. The number of fastening rods 341 on each adjustment rod 313 may be one, two, three, etc.

[0039] 7, as an optional configuration, the flow guide portion 330 is set as a square plate, and one side of the flow guide portion 330 is a liquid discharge side 331. The flow guide portion 330 is provided with a clamp hole 332 penetrating the flow guide portion 330 in the thickness direction, and the clamp hole 332 includes a first hole portion 3321 and a second hole portion 3322 that are communicated with each other, and the first hole portion 3321 and the second hole portion 3322 are both arc-shaped holes, and the hole diameter of the first hole portion 3321 is larger than the space of the second hole portion 3322. The number of clamp holes 332 on the flow guide portion 330 is designed according to the number of the fastening rods 341, and the number of the clamp holes 332 is equal to the number of the fastening rods 341, and there is a one-to-one correspondence, and each fastening rod 341 can be inserted into the corresponding clamp hole 332. The engaging rod 341 can move between the first hole 3321 and the second hole 3322. When the engaging rod 341 is located in the first hole 3321, the locking unit 340 is in an unlocked state, and the engaging rod 341 can move relative to the flow guide 330 in the axial direction of the first hole 3321, so that the position of the flow guide 330 can be adjusted. After moving to a set position, the engaging rod 341 slides into the second hole 3322 and engages with the flow guide 330 using the annular protrusion 342. At this time, the locking unit 340 is in a locked state, and the flow guide 330 and the engaging rod 341 are kept fixed along the axial direction of the engaging rod 341. The adjustment operation of the position of the flow guide 330 relative to the frame 310 is convenient and flexible.

[0040] Obviously, in other embodiments, the flow guide 330 can also be set to rotate with the frame 310, and the distance between the liquid discharge side 331 and the workpiece can also be adjusted.

[0041] Referring to FIG. 8, in this embodiment, as an optional configuration, the liquid storage section 320 is provided with a first chamber and a second chamber independent of each other, the first chamber has a first outlet 321 and a first inlet, the first chamber is configured to store a fluid, the fluid may be a developer, etc. The second chamber has a second outlet 322 and a second inlet, the second chamber is configured to store a cleaning liquid. During actual work, when development is required, the fluid is replenished into the first chamber through the first inlet, the fluid is discharged from the first outlet 321 and falls onto the flow guide section 330, and flows onto the workpiece surface from the liquid discharge side 331 of the flow guide section 330. When the workpiece needs to be washed after development is completed, the cleaning liquid in the second chamber is discharged from the second outlet 322 and flows onto the workpiece surface through the flow guide section 330.

[0042] Furthermore, both the first outlet 321 and the second outlet 322 are strip-shaped openings, and both the first outlet 321 and the second outlet 322 extend along the extension direction of the second axis 002. This allows the liquid flowing out from the first outlet 321 and the second outlet 322 to be in the form of a water curtain, and to flow more uniformly toward the flow guiding section 330.

[0043] In this embodiment, the integrated processing equipment operates, for example, as follows. The workpiece is placed on the rotating disk 222, and the positioning block is moved to clamp the workpiece on the rotating disk 222. Then, the tilt angle adjustment unit 210 is used to rotate the mounting base 212, thereby changing the tilt angle with respect to the horizontal plane while moving the rotating disk 222, the workpiece, the rotation unit 220, and the flow guide device 300. After the tilt angle adjustment is completed, the height of the flow guide plate with respect to the workpiece is adjusted, and then developed and washed. Of course, in other steps, it is also possible to adjust the distance between the flow guide plate and the workpiece first, and then adjust the tilt angle of the workpiece.

[0044] The integrated processing equipment provided by this embodiment can process workpieces of different shapes and sizes, the size of the workpiece includes the outer size and thickness of the workpiece, the shape of the workpiece can be circular, rectangular, etc., with a wide processing range, wide application range, and low cost. At the same time, the inclination angle and distance of the workpiece relative to the flow plate can be adjusted according to the requirements of the workpiece to meet various processing needs, and the processing quality is high.

[0045] The integrated processing equipment can also be used in other work scenarios such as acid coating and coating.

[0046] The above description is merely a preferred embodiment of the present invention, and is not intended to limit the present invention. Those skilled in the art can make various modifications and variations to the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention. [Explanation of symbols]

[0047] 001-1st axis 002-Second axis 100-Base 110-Liquid collection chamber 120-Water Pump 130-Mounting block 200-Rotating Device 210-Tilt angle adjustment unit 211-First Drive Unit 212-Mounting stand 2121-Base body 2122-Plate 2123-Liquid Collection Tank 2124-Liquid outlet 220-Rotating Unit 221-Second Drive Unit 222-Rotating disk 223-Positioning Component 300-Direction device 310-frame body 311-Fixing plate 312-Fixed Rod 313-Adjusting rod 320-Liquid storage section 321-Exit 1 322-Second Exit 330-Direction section 331-Liquid discharge side 332-Clamp hole 3321-1st hole 3322-Second hole 340-Lock Unit 341 - Attachment rod 342-Ring protrusion

Claims

1. An integrated processing facility, A base, a rotating device, and a flow guide device are included. the rotation device includes a tilt angle adjustment unit and a rotation unit, the tilt angle adjustment unit is installed on the base, the rotation unit is connected to the tilt angle adjustment unit, the rotation unit is configured to mount a workpiece and rotate the workpiece around a first axis, and the tilt angle adjustment unit is configured to drive the rotation unit to rotate the workpiece around a second axis having an included angle with respect to the first axis; The flow guide device includes a frame body, a liquid storage section and a flow guide section, the frame body is connected to the inclination angle adjustment unit, the liquid storage section and the flow guide section are both connected to the frame body, the liquid storage section is configured to transport liquid to the flow guide section, and the liquid can flow through the flow guide section to a workpiece positioned in the rotation unit.

2. the tilt angle adjustment unit includes a first drive unit and a mounting base, the first drive unit is connected to the base, the mounting base is connected to the first drive unit, and the first drive unit is configured to drive the mounting base to rotate around the first axis; 2. The integrated processing equipment according to claim 1, wherein the rotary unit and the frame are both connected to the mounting base.

3. The integrated processing equipment of claim 2, characterized in that the mounting base is provided with a liquid collection tank and a liquid outlet communicating with the liquid collection tank, the base is provided with a liquid collection chamber, the liquid outlet communicates with the liquid collection chamber, the rotating unit is installed in the liquid collection tank, and the liquid collection tank is configured to collect liquid falling from the workpiece and direct the fallen liquid from the liquid outlet into the liquid collection chamber.

4. 3. The integrated processing equipment of claim 2, wherein the rotation unit includes a second drive, a rotating disk, and a positioning component, the second drive connected to the mounting base, the rotating disk connected to the second drive, the second drive configured to drive the rotating disk to rotate about the second axis, the positioning component connected to the rotating disk, and the positioning component configured to position a workpiece on the rotating disk.

5. 5. The integrated processing equipment of claim 4, wherein the positioning component includes a plurality of clamp blocks, all of which are connected to the rotating disk, the plurality of clamp blocks collectively defining a clamping area for clamping a workpiece, and at least one of the plurality of clamp blocks configured to move relative to the rotating disk to adjust a size of the clamping area.

6. The flow guide portion is provided with a liquid discharge side, The integrated processing equipment according to any one of claims 1 to 5, characterized in that the flow guide section is movably connected to the frame body, and adjusts the distance between the liquid discharge side and the frame body, thereby adjusting the distance between the liquid discharge side and the workpiece positioned on the rotation unit.

7. The integrated processing equipment according to claim 6, characterized in that the flow guide portion is connected to the frame body so as to be slidable in the extension direction of the second axis so as to adjust the distance between the liquid discharge side and the frame body.

8. The integrated processing equipment according to claim 7, characterized in that the flow guide device also includes a locking unit, the locking unit being simultaneously connected to the flow guide portion and the frame body, the locking unit having a switchable locked state and an unlocked state, in the locked state, the flow guide portion is fixed relative to the frame body in the extension direction of the second axis, and in the unlocked state, the flow guide portion is slidable relative to the frame body in the extension direction of the second axis.

9. The integrated processing equipment according to claim 6, characterized in that the liquid storage portion is connected to the frame body so as to be slidable in the extension direction of the second axis so as to adjust the distance of the liquid storage portion from the flow guide portion.

10. 10. The integrated processing equipment of claim 9, wherein the liquid storage section is provided with a first chamber and a second chamber independent of each other, the first chamber having a first outlet and configured to store a fluid, and the second chamber having a second outlet and configured to store a cleaning liquid.

Citation Information

Patent Citations

  • Developing unit

    CN104076622A

  • Developer and developing method

    JP2006060084A

  • Development apparatus and development method

    JP2016115785A

  • Apparatus of exposure, method of exposure and fabrication method of pattern thereof

    KR1020090092412A

  • Substrate treating apparatus and substrate treating method

    WO2007083358A1