Plasma device for powder surface treatment using a horizontal electrode

Abstract

The plasma device for powder surface treatment using a horizontal electrode according to the present invention is arranged in the horizontal direction, and by placing powder on a flat plate-shaped horizontal electrode and performing plasma treatment, there is an advantage that almost no powder loss occurs and surface treatment can be performed more quickly and uniformly. Further, by applying vibration to the horizontal electrode during plasma treatment to give the effect of hitting the horizontal electrode, the positions of the powder located relatively closer to the surface of the horizontal electrode and the powder located farther away are repeatedly changed with each other, and there is an advantage that the powder can be surface-treated more uniformly. Further, by stacking a plurality of horizontal electrodes in the vertical direction, the capacity that can be processed at one time can be adjusted.

Description

Technical Field

[0001] The present invention relates to a plasma device for powder surface treatment using a horizontal electrode. More specifically, the present invention relates to a plasma device for powder surface treatment using a horizontal electrode that applies vibration to the horizontal electrode to more uniformly surface-treat nano- or micro-sized powder on the horizontal electrode.

Background Art

[0002] Generally, carbon nano-powder materials such as carbon nanotubes and graphene are likely to aggregate with each other despite their excellent physical properties. Therefore, for industrialization, a dispersion technology for uniformly mixing them into a base material or a solvent is essential.

[0003] Conventional dispersion technologies are classified into mechanical methods such as ultrasonic waves and milling, wet methods using chemical reactions of strong acids and surfactants, and dry methods using plasma.

[0004] Mechanical methods and wet methods have problems such as complex processes, long process times, damage to materials, residual impurities, and generation of wastewater.

[0005] On the other hand, the dry plasma method is a preferred method when considering mass productivity and environmental friendliness. However, in order to perform plasma surface treatment on nano-powder, a powder rotation and stirring device is essential to uniformly process the nano-powder. As the size of the powder becomes smaller, it becomes very difficult to perform uniform surface treatment, the efficiency of functionalization is low, and the processing time is long.

[0006] Recently, a technology for mixing powder using a mechanical method such as rotation or stirring in an environmentally friendly dry plasma method has been adopted. However, there is a problem that the efficiency of functionalization is low, and even if rotation or stirring is performed, it is very difficult to uniformly process a large amount of powder floating in the chamber.

Summary of the Invention

Problems to be Solved by the Invention

[0007] An object of the present invention is to provide a plasma device for powder surface treatment using a horizontal electrode that can reduce costs and improve mass productivity.

Means for Solving the Problems

[0008] The plasma device for powder surface treatment using a horizontal electrode according to the present invention includes: a chamber that forms a space where plasma is generated; a horizontal electrode that is provided horizontally inside the chamber and is formed in a flat plate shape so that powder can be placed on the upper surface, and generates plasma when a power source is applied to surface-treat and functionalize the powder; and a vibration generator that applies vibration to the horizontal electrode so that the positions of the powders change relative to each other on the upper surface of the horizontal electrode to uniformly surface-treat the powder.

[0009] The horizontal electrode includes a porous filter electrode in which a large number of holes are formed.

[0010] The plasma device further includes an adsorption means for reducing the internal pressure of the filter electrode to adsorb the powder on the upper surface of the filter electrode.

[0011] The vibration generator applies vibration to the horizontal electrode so that at least one of vertical, horizontal, rotational, and gyroscopic motions of the horizontal electrode is possible.

[0012] The vibration generator includes a vibration motor that is connected to the horizontal electrode and applies vibration to the horizontal electrode by a rotational force when a power source is applied.

[0013] The vibration generator includes an air knocker that is provided below the horizontal electrode and moves a piston by compressed air to apply vibration to the horizontal electrode.

[0014] The vibration generator includes an electronic hammer that is provided below the horizontal electrode and applies vibration to the horizontal electrode using electromagnetic force generated when a power source is applied.

[0015] The vibration generator is provided below the horizontal electrode and includes an ultrasonic vibrator that applies vibration to the horizontal electrode using ultrasonic waves generated when power is applied.

[0016] The vibration generator is connected to the lower part of the horizontal electrode by a connecting member, includes an acoustic vibration module that generates and resonates sound to apply acoustic vibration to the horizontal electrode.

[0017] A plurality of the horizontal electrodes are arranged in a stacked manner, spaced apart from each other in the vertical direction.

[0018] The plasma device for powder surface treatment using a horizontal electrode according to the present invention includes a powder supply unit that supplies the powder onto the upper surface of the horizontal electrode, and further includes a control unit that controls the vibration intensity of the vibration generator according to the amount of the powder supplied from the powder supply unit.

[0019] The plasma device for powder surface treatment using a horizontal electrode according to the present invention includes a chamber that forms a space where plasma is generated; a horizontal electrode that is provided horizontally inside the chamber, a plurality of which are arranged in a stacked manner, spaced apart from each other in the vertical direction, and are formed in a flat plate shape so that powder can be placed on each upper surface, and generates plasma when power is applied to surface-treat and functionalize the powder; a vibration generator that applies mechanical vibration to the horizontal electrode so that the positions of the powders on the upper surface of the horizontal electrode change relative to each other to uniformly surface-treat the powder; a powder supply unit that supplies the powder onto the upper surface of the horizontal electrode; and includes a control unit that controls the vibration intensity of the vibration generator according to the amount of the powder supplied from the powder supply unit.

Advantages of the Invention

[0020] The plasma device for powder surface treatment using a horizontal electrode according to the present invention is arranged horizontally, and by placing powder on a flat plate-shaped horizontal electrode and performing plasma treatment, there is almost no phenomenon that the powder detaches from the surface of the horizontal electrode and floats in the air, and the powder is treated while being in contact with the surface of the horizontal electrode, so there is almost no loss of powder, and there is an advantage that surface treatment can be performed more quickly and uniformly.

[0021] Also, by applying vibration to the horizontal electrode during plasma treatment to give the effect of hitting the horizontal electrode, the positions of the powder located relatively closer and farther from the surface of the horizontal electrode are repeatedly changed, and there is an advantage that the powder can be surface-treated more uniformly.

[0022] Also, by stacking a plurality of horizontal electrodes in the vertical direction, the capacity that can be processed at one time can be adjusted.

[0023] Also, heat can be applied to the horizontal electrode during plasma treatment using a heater to remove the residual moisture of the powder and enhance the reactivity.

[0024] Also, in order to apply vibration while applying heat to the horizontal electrode, during the removal of the residual moisture of the powder, the phenomenon of reagglomeration is prevented, and even after drying, the state in which the powder is uniformly dispersed is maintained.

[0025] Also, by arranging a magnet on the horizontal electrode to generate additional movement of electrons and increase the plasma density, there is an advantage of improving the surface treatment speed.

[0026] Also, by forming a texture pattern on the surface of the horizontal electrode, when the powder moves due to the vibration of the horizontal electrode, the collision energy can be further utilized while colliding with the pattern layer, and the effect of plasma treatment is improved.

[0027] Also, by applying a power supply to the horizontal electrode which is the first electrode part and grounding the rack which is the second electrode part, plasma is formed between the first electrode part and the second electrode part, and the efficiency and uniformity of the surface treatment of the powder can be improved.

[0028] Also, by grounding the second electrode part, the energy effect of the ions colliding with the first electrode part can be increased, and the effect of the surface treatment of the powder can be further improved.

[0029] In addition, the second electrode part includes a cover electrode coupled to the rack and arranged to face the upper surface of the horizontal electrode. As a result, plasma is concentrated in the space between the horizontal electrode and the cover electrode, so that the effect of surface treatment of the powder on the upper surface of the horizontal electrode is further improved.

[0030] In addition, by providing the first electrode part and the second electrode part, there is an advantage that an AC power source can be used in addition to the RF power source.

[0031] In addition, by supplying both the plasma reaction gas and the coating source in a gaseous state, there is an advantage that the coating source is more uniform and strongly coated on the surface of the powder by plasma polymerization.

[0032] In addition, by mixing and supplying a grinding medium together with the powder to the horizontal electrode, the powder is more finely ground while colliding with the grinding medium during plasma surface treatment of the powder while applying vibration to the horizontal electrode. Therefore, the size of the powder becomes smaller and the efficiency of surface treatment is further improved.

Brief Description of the Drawings

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Embodiments for Carrying Out the Invention

[0034] Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings as follows.

[0035] FIG. 1 is a configuration diagram schematically showing a plasma device for powder surface treatment using a horizontal electrode according to a first embodiment of the present invention. FIG. 2 is a side view showing the filter electrode shown in FIG. 1.

[0036] Referring to FIGS. 1 and 2, a plasma device for powder surface treatment according to a first embodiment of the present invention will be described by way of example as being a porous filter electrode 20 (hereinafter referred to as a filter electrode) in which a large number of holes are formed in a horizontal electrode.

[0037] The powder includes nano- or micro-sized powders such as carbon nanotubes and graphene.

[0038] The plasma device for powder surface treatment includes a chamber 10, a filter electrode 20, an adsorption means 30, and a vibration generator.

[0039] The chamber 10 houses the plurality of filter electrodes 20 and forms a space where plasma is generated inside. A power supply device (not shown) and a gas supply unit (not shown) for supplying external gas are connected to the chamber 10. The chamber 10 is grounded and serves as a ground electrode.

[0040] Inside the chamber 10, a rack 25 into which the plurality of filter electrodes 20 are inserted is provided. However, it is not limited to this, and it is also possible to stack the plurality of filter electrodes 20 vertically at a predetermined interval from each other without using the rack 25.

[0041] The rack 25 may be fixedly provided inside the chamber 10, or may be provided so as to be pullable out of the chamber 10. After inserting the plurality of filter electrodes 20, it is also possible to pull it in again.

[0042] The filter electrode 20 is a power electrode to which power is applied from the power supply device (not shown). When power is applied to the filter electrode 20 from the power supply device (not shown) and gas is supplied into the chamber 10 from the gas supply unit (not shown), plasma is generated inside the chamber 10. In this embodiment, the chamber 10 is described by way of example as being a ground electrode, but it is not limited thereto, and it may be configured such that the plasma is generated by being composed of mutually different electrodes having a potential difference between one side and the other side of the filter electrode 20.

[0043] The plasma generated by the filter electrode 20 surface-treats and functionalizes the powder. The surface functionalization of the powder disperses the powders so that they do not aggregate without a decrease in existing physical properties, but the interfacial bonding force of different materials different from the powder can be improved.

[0044] The filter electrode 20 is arranged horizontally in the chamber 10 and is formed in a flat plate shape so that the powder can be placed on the upper surface. The filter electrode 20 is described by way of example as being in the shape of a square plate, but it is not limited thereto, and it may also be in the shape of a disc.

[0045] A plurality of the filter electrodes 20 are stacked and arranged so as to have a space therebetween in the vertical or horizontal direction. In this embodiment, the plurality of filter electrodes 20 are described by way of example as being ten inserted into the rack 25 with a space therebetween in the vertical direction. The number of stacked filter electrodes 20 can be adjusted according to the processing capacity.

[0046] The filter electrode 20 is a porous filter electrode in which a large number of holes are formed. The filter electrode 20 includes a filter part 20a made of a porous body or a porous mesh, and a vacuum part 20b formed below the filter part 20a and brought into a vacuum state by a vacuum pump 32 described later. The filter electrode 20 can also be formed so as to have a porous structure only on the upper surface. The large number of holes are processed to a nano or micro unit size, and are desirably formed smaller than the size of the powder, or are provided with a nano nonwoven fabric so that the powder cannot pass through. In the present embodiment, the holes will be described by way of example as having a size of about 100 to 1000 nm. Further, the filter electrode 20 will be described by way of example as being made of stainless steel (SUS, Stain use stainless) in which the holes can be formed.

[0047] The adsorption means 30 is a device for reducing the internal pressure of the filter electrode 20 and adsorbing the powder on the surface of the filter electrode 20.

[0048] The adsorption means 30 includes a vacuum pump 32, a vacuum flow path 33, and a powder blocking part (not shown) for filtering the powder.

[0049] The vacuum pump 32 is provided outside the chamber 10, sucks air from inside the plurality of filter electrodes 20, and forms a vacuum state inside the plurality of filter electrodes 20.

[0050] The vacuum flow path 33 is a flow path connecting the lower parts of the vacuum pump 32 and the plurality of filter electrodes 20. One end of the vacuum flow path 33 is connected to the lower parts of the plurality of filter electrodes 20 respectively, and the other end is connected to the vacuum pump 32. The vacuum flow path 33 is connected to the vacuum part 20b of the filter electrode 20.

[0051] However, it is not limited thereto, and the vacuum pump 32 may be provided for each lower part of the filter electrode 20, or may be provided on the rack 25.

[0052] The vibration generator is a device for applying vibration to the filter electrode 20 so that the positions of the powders on the upper surface of the filter electrode 20 change relative to each other, thereby uniformly surface-treating the powders. The vibration generator can generate vibration like the effect of hitting the lower part of the filter electrode 20, and can change the positions of the powders located relatively close to and far from the surface of the filter electrode 20 relative to each other. Therefore, the powders placed on the upper surface of the filter electrode 20 are uniformly surface-treated.

[0053] The vibration generator can generate at least one of mechanical vibration, acoustic vibration, and ultrasonic vibration to apply vibration to the filter electrode 20. Further, the vibration generator (not shown) can apply vibration so that the filter electrode 20 performs various behaviors such as up and down, left and right, rotation, and gyro motion. Further, the vibration generator (not shown) can also apply vibration discontinuously or periodically.

[0054] In the present embodiment, the vibration generator will be described by taking, for example, an ultrasonic vibrator 40.

[0055] Referring to FIG. 2, the ultrasonic vibrator 40 is provided below the filter electrode 20, generates ultrasonic waves by the power supplied from the power supply device (not shown), and uses the ultrasonic waves to apply vibration to the filter electrode 20.

[0056] On the other hand, the plasma device for powder surface treatment includes a powder supply unit (not shown) for supplying the powders to the upper surface of the filter electrode 20.

[0057] The powder supply unit (not shown) is provided separately from the chamber 10, and after supplying the powder onto the upper surface of the filter electrode 20 before disposing the filter electrode 20 into the chamber 10, an example will be given to describe that the filter electrode 20 on which the powder is placed is disposed into the chamber 10. However, it is not limited thereto, and the powder supply unit (not shown) may be provided inside the chamber 10 to supply the powder onto the upper surface of the filter electrode 20 in a state where the filter electrode 20 is disposed in the chamber 10. The powder supply unit (not shown) may be disposed for each of the spaced-apart spaces between the plurality of filter electrodes 20 to inject the powder into the spaced-apart spaces all at once, or one powder injector (not shown) may be provided to be movable in the vertical direction and continuously inject while moving for each of the spaced-apart spaces between the filter electrodes 20. Further, the powder injector (not shown) may also inject powder inside the chamber 10.

[0058] Since the filter electrode 20 is formed in a flat plate shape, it is easy to place powder on the upper surface of the filter electrode 20 through the powder supply unit (not shown).

[0059] The operation of the plasma device according to the first embodiment of the present invention configured as described above will be described as follows.

[0060] After placing powder on the upper surface of each of the plurality of filter electrodes 20, the filter electrodes 20 are inserted into the rack 25 and stacked.

[0061] In this embodiment, an example will be given to describe that the plurality of filter electrodes 20 are inserted into the rack 25 and stacked, but it is not limited thereto, and it is also possible to stack the plurality of filter electrodes 20 with a predetermined interval therebetween without using the rack 25.

[0062] Further, without being limited to the above-described embodiment, it is also possible to supply powder to each of the plurality of filter electrodes 20 pre-mounted inside the chamber 10.

[0063] When the vacuum pump 32 is operated, the internal pressure of the vacuum portion 20b of the filter electrode 20 decreases due to the suction pressure of the vacuum pump 32.

[0064] When the inside of the vacuum portion 20b of the filter electrode 20 becomes a vacuum state, the powder is adsorbed on the surface of the filter electrode 20. That is, an adsorption force (B) acts on the powder in a direction toward the surface of the filter electrode 20.

[0065] Also, when the ultrasonic vibrator 40 is operated, vibration is applied to the filter electrode 20 by the ultrasonic vibrator 40.

[0066] When vibration is applied to the lower part of the filter electrode 20, the powder is uniformly dispersed while the position of the powder changes on the upper surface of the filter electrode 20. Since the ultrasonic vibrator 40 generates an effect of hitting the filter electrode 20, the positions of the powder located relatively close to the surface of the filter electrode 20 and the powder located far away from each other change.

[0067] That is, referring to FIG. 2, an adsorption force (B) in a direction toward the surface of the filter electrode 20 and a dispersion force (A) in a direction of bouncing off the surface of the filter electrode 20 act on the powder placed on the filter electrode 20. At this time, the adsorption force (B) and the dispersion force (A) can be adjusted by the suction force of the vacuum pump 30 and the vibration intensity of the ultrasonic vibrator 40. The adsorption force (B) and the dispersion force (A) can be calculated to have optimal values through experiments and the like. By appropriately adjusting the adsorption force (B) and the dispersion force (A), the powder can only move relative to each other without flying off the surface of the filter electrode 20, and the entire powder can be uniformly subjected to plasma surface treatment.

[0068] In addition, when a plurality of the filter electrodes 20 are stacked in the vertical direction, the filter electrodes 20 are separated by a predetermined minimum interval, and the vibration intensity of the vibration generator (not shown) is set to be higher than a predetermined intensity, if vibration is applied to the filter electrodes 20, the powder bounced from the lower electrode among the filter electrodes 20 may be surface-treated while being in contact with the surface of the upper electrode.

[0069] In addition, the accumulation of powder on a specific portion of the surface of the filter electrode 20 beyond a certain thickness is prevented.

[0070] In addition, by applying an effect of hitting the filter electrode 20 using the ultrasonic vibrator 40, after completely removing the powder from the surface of the filter electrode 20, floating and dispersing it, it is not necessary to adsorb it again. Therefore, compared with the case of floating the powder, the processing time is shortened.

[0071] Therefore, the powder can be moved while being adsorbed on the surface of the filter electrode 20, is uniformly mixed, and the powder is uniformly surface-treated by plasma.

[0072] The step of surface treatment by the plasma is performed for a predetermined set time. When the set time has elapsed, the plasma treatment is interrupted and the powder is recovered.

[0073] As described above, the plasma device for powder surface treatment according to the first embodiment of the present invention has a simple structure because powder is placed on a plurality of horizontal electrodes, and since the number of stacked horizontal electrodes is increased, the capacity that can be processed at one time can be maximized.

[0074] In addition, since the structure is such that powder is placed on the surface of the horizontal electrode, compared with the case of floating the powder and then adsorbing it, the powder that is discarded without being processed is minimized. Therefore, there is no need for a repetitive process of repeatedly removing the powder from the surface of the filter electrode 20 and then dispersing it, and the processing efficiency is improved.

[0075] Further, by applying vibration to the filter electrode 20 using the vibration generator and appropriately adjusting the adsorption force (B) and the dispersion force (A), the powders can move relative to each other without being ejected from the surface of the filter electrode 20, and the entire powders can be uniformly subjected to plasma surface treatment.

[0076] On the other hand, FIG. 3 is a cross-sectional view showing a horizontal electrode according to the second embodiment of the present invention.

[0077] Referring to FIG. 3, in the second embodiment of the present invention, the horizontal electrode will be described by way of example as a porous filter electrode 220. Different from the first embodiment, the filter electrode 220 includes an upper filter portion 220a, a lower filter portion 220b, and a vacuum portion 220c. Since the remaining configurations and operations are similar, the description will focus on the different configurations, and the detailed description of the similar configurations will be omitted.

[0078] The filter electrode 220 is formed to have a porous structure, and a plurality of the filter electrodes 220 are stacked and arranged so as to have a space therebetween in the vertical direction.

[0079] The upper filter portion 220a and the lower filter portion 220b are made of a porous body or a porous mesh. The upper filter portion 220a and the lower filter portion 220b are processed to have a nano or micro unit size, and it is desirable that the holes are formed smaller than the size of the powders or that the upper filter portion 220a and the lower filter portion 220b are provided with a nano nonwoven fabric so that the powders cannot pass therethrough.

[0080] The vacuum portion 220c is formed between the upper filter portion 220a and the lower filter portion 220b and is brought into a vacuum state by the vacuum pump 32. A vacuum flow path 33 is connected to the vacuum portion 220c.

[0081] When the vacuum pump 32 operates, the vacuum pump 32 sucks in the internal air of the vacuum portion 220c, and the inside of the vacuum portion 220c becomes a vacuum state.

[0082] If the inside of the vacuum part 220c is in a vacuum state, the powder supplied to the inside of the chamber 10 or the periphery of the filter electrode 220 is adsorbed on the surfaces of the upper surface filter part 220a and the lower surface filter part 220b.

[0083] Therefore, since powder is adsorbed on both the upper and lower surfaces of the filter electrode 220 and plasma surface treatment is performed, the plasma treatment capacity increases.

[0084] On the other hand, FIG. 4 is a drawing schematically showing a plasma device for powder surface treatment using a horizontal electrode according to the third embodiment of the present invention.

[0085] Referring to FIG. 4, in the plasma device for powder treatment using a horizontal electrode according to the third embodiment of the present invention, the horizontal electrode is exemplified as a porous filter electrode 320 and will be described. The chamber 310, the filter electrode 320, the adsorption means 330, and the vibration generator are included. However, different from the first embodiment, the vibration generator is an acoustic vibration module 355. Since the remaining configurations and operations are similar, the description will focus on the different configurations, and the detailed description of the similar configurations will be omitted.

[0086] The acoustic vibration module 355 is an acoustic resonance oscillator that generates sound, resonates, and generates acoustic vibration in the filter electrode 320.

[0087] The upper part of the acoustic vibration module 355 is connected to the filter electrode 320 by a connecting member 352.

[0088] In this embodiment, the filter electrode 320 is exemplified as being arranged singly, but it is not limited thereto. A plurality of filter electrodes 320 are arranged at a predetermined interval from each other in the vertical or horizontal direction.

[0089] A vacuum flow path 333 connected to a vacuum pump (not shown) is connected inside the filter electrode 320.

[0090] Also, a rack is provided inside the chamber and formed so that the filter electrode 320 can be inserted. An impact absorbing member (not shown) that absorbs impact may be provided between the rack and the filter electrode 320 when the filter electrode 320 vibrates.

[0091] In the plasma device for powder treatment according to the third embodiment of the present invention, the vibration generator has been described by taking as an example the case where the horizontal electrode is the porous filter electrode 320, but it is not limited thereto, and it is also possible to use a flat plate electrode that is not porous. When using the flat plate electrode, the adsorption means can be omitted.

[0092] On the other hand, FIG. 5 is a drawing schematically showing a plasma device for powder surface treatment using a horizontal electrode according to the fourth embodiment of the present invention.

[0093] Referring to FIG. 5, in the plasma device for powder treatment using a horizontal electrode according to the fourth embodiment of the present invention, the horizontal electrode is described by taking as an example the case where it is the porous filter electrode 420. The plurality of filter electrodes 420 are arranged at a predetermined interval in the vertical direction. Different from the third embodiment, the filter electrode 420 includes an upper surface filter portion 420a, a lower surface filter portion 420b, and a vacuum portion 420c. Since the remaining configurations and operations are similar, the description will focus on the different configurations, and the detailed description of the similar configurations will be omitted.

[0094] A plurality of the filter electrodes 420 are stacked and arranged so as to have a space therebetween in the vertical direction. The number of stacked filter electrodes 420 can be adjusted according to the processing capacity.

[0095] The upper filter part 420a and the lower filter part 420b are made of a porous body or a porous mesh. The upper filter part 420a and the lower filter part 420b are processed into nano or micro unit sizes, and holes are formed smaller than the size of the powder so that the powder cannot pass through.

[0096] The vacuum part 420c is formed between the upper filter part 420a and the lower filter part 420b and is evacuated by the vacuum pump 432. A vacuum flow path 433 is connected to the vacuum part 420c.

[0097] When the vacuum pump 432 operates, the vacuum pump 432 sucks in the internal air of the vacuum part 420c, and the inside of the vacuum part 420c becomes a vacuum state.

[0098] When the inside of the vacuum part 420c becomes a vacuum state, the powder supplied inside the chamber 310 or around the filter electrode 420 is adsorbed on the surfaces of the upper filter part 420a and the lower filter part 420b.

[0099] Therefore, since powder is adsorbed on both the upper and lower surfaces of the filter electrode 420 and plasma surface treatment is performed, the plasma treatment capacity increases.

[0100] In the above embodiment, the vacuum part 420c of the plurality of filter electrodes 420 is described by taking as an example that it is evacuated by one vacuum pump 432, but it is not limited thereto, and it is also possible that a vacuum flow path and a vacuum pump are respectively connected for each vacuum part 420c of the plurality of filter electrodes 420.

[0101] Also, a powder injector (not shown) for injecting and supplying powder is provided in the separation space between the plurality of filter electrodes 420.

[0102] The powder injector (not shown) can be arranged for each of the spaced-apart spaces between the plurality of filter electrodes 420 and inject in a batch into the spaced-apart spaces, or one powder injector (not shown) can be provided so as to be movable in the vertical direction and continuously inject for each of the spaced-apart spaces between the filter electrodes 420 while moving. Further, the powder injector (not shown) can also inject powder inside the chamber 310.

[0103] In the plasma device for powder treatment using a horizontal electrode according to the fourth embodiment of the present invention, the vibration generator can be of any type as long as it can generate at least one of mechanical vibration, acoustic vibration, and ultrasonic vibration and apply the vibration to the filter electrode 420.

[0104] On the other hand, FIG. 6 is a drawing schematically showing a plasma device for powder surface treatment using a horizontal electrode according to the fifth embodiment of the present invention. FIG. 7 is a side view showing the horizontal electrode shown in FIG. 6.

[0105] In the plasma device for powder surface treatment using a horizontal electrode according to the fifth embodiment of the present invention, the horizontal electrode is a panel-shaped flat electrode 520 in which no holes are formed, and the vibration generator 540 is a mechanical vibrator, which is different from the first embodiment. Since the remaining configurations and operations are similar, the different configurations will be described in detail below.

[0106] At least one or more of the flat electrodes 520 are provided horizontally inside the chamber 510 and are flat plate-shaped so that powder can be placed on the upper surface of the flat electrode 520. In this embodiment, the flat electrode 520 has been described by way of example as being flat plate-shaped, but is not limited thereto, and any shape in which powder can be placed on the upper surface, such as a container, can be applied to the flat electrode 520.

[0107] Since the flat electrode 520 is not a porous structure, it can be manufactured from a variety of materials such as metals, polymers, and ceramics. The flat electrode 520 can also be manufactured from aluminum among metals, and is lighter than other metals such as stainless steel, reducing costs.

[0108] The vibration generator (not shown) is provided on the flat electrode 520 and is a device for uniformly surface-treating the powder by changing the positions of the powders relative to each other on the upper surface of the flat electrode 520.

[0109] The vibration generator (not shown) will be described by way of example as generating mechanical vibrations when power is applied by the power supply device. However, it is not limited thereto, and the vibration generator (not shown) can also use an ultrasonic vibrator or an acoustic vibration module.

[0110] The vibration generator (not shown) includes at least one of a vibration motor (not shown) that applies vibration to the flat electrode 520 by a rotational force, an air knocker (not shown) that moves a piston by compressed air to apply vibration to the flat electrode 520, and an electronic hammer (not shown) that applies vibration to the flat electrode 520 using the electromagnetic force generated when power is applied, when power is applied. However, it is not limited thereto, and the vibration generator (not shown) can apply vibration so that the flat electrode 520 performs various behaviors such as up and down, left and right, rotation, and gyro motion. Also, the vibration generator (not shown) can apply vibration discontinuously or periodically.

[0111] The vibration motor is a device that generates vibration by eccentric rotational motion by connecting an eccentric shaft to the rotational shaft of the motor, and is connected to the flat electrode 520 by a connecting member.

[0112] The air knocker is a device that moves a piston forward by compressed air supplied inside a housing, transmits the impact force caused by the forward movement of the piston to the flat plate electrode 520, and generates vibration in the horizontal electrode 520. The air knocker is arranged so as to abut against the flat plate electrode 520.

[0113] The electronic hammer is a device that includes an E-core and an I-core inside, and uses the electromagnetic force generated between the E-core and the I-core when power is applied to generate vibration in the flat plate electrode 520.

[0114] In addition, the plasma device for powder surface treatment includes a control unit (not shown) that controls the operation of the vibration generator (not shown) according to the amount of powder placed on the flat plate electrode 520 to adjust the intensity of the vibration applied to the flat plate electrode 520.

[0115] The amount of powder placed on the flat plate electrode 520 is measured from the amount of powder supplied from a powder supply unit (not shown). The vibration intensity of the vibration generator (not shown) can be set higher as the amount of powder placed on the flat plate electrode 520 is larger.

[0116] When a plurality of the flat plate electrodes 520 are stacked in the vertical direction, the flat plate electrodes 520 are separated by a predetermined minimum distance, and the vibration intensity of the vibration generator (not shown) is set to be higher than a predetermined intensity, when vibration is applied to the flat plate electrodes 520, the powder bounced from the lower electrode among the flat plate electrodes 520 is surface-treated while being in contact with the surface of the upper electrode.

[0117] FIG. 8 is a graph comparing oxygen functionalization when the powder is carbon nanotubes and when it is a porous filter electrode and a non-porous flat plate electrode during the carbon nanotube oxygen functionalization experiment.

[0118] Referring to FIG. 8, it can be seen that the presence or absence of porosity has little effect on the oxygen functionalization of carbon nanotubes.

[0119] Therefore, when the flat electrode 520 uses a non-porous aluminum flat plate, compared with the case of using a filter electrode, there is an advantage that the weight is reduced and the manufacturing cost is saved.

[0120] In addition, when using the flat electrode 520 that is not porous as described above, no separate adsorption means is required, so the device can be made more compact and the cost can be saved.

[0121] On the other hand, FIG. 9 is a drawing schematically showing a plasma device for powder surface treatment using a horizontal electrode according to the sixth embodiment of the present invention. FIG. 10 is a drawing schematically showing the horizontal electrode shown in FIG. 9.

[0122] Referring to FIGS. 9 and 10, the plasma device for powder surface treatment according to the sixth embodiment of the present invention includes a chamber 610, a horizontal electrode 620, a vibration generator 630, and a heater 640.

[0123] The powder includes nano- or micro-sized powders such as carbon nanotubes and graphene.

[0124] The chamber 610 houses the horizontal electrode 620 therein and forms a space where plasma is generated. A gas supply unit (not shown) for supplying external gas is connected to the chamber 610.

[0125] The description will be given by way of example that a rack 611 into which the horizontal electrode 620 is inserted is provided inside the chamber 610.

[0126] The rack 611 may be fixedly installed inside the chamber 610, or may be provided so as to be pullable out of the chamber 610. After inserting the horizontal electrode 620, it is also possible to pull it in again.

[0127] The horizontal electrode 620 is a power electrode to which power is applied from a power supply device (not shown). When RF power is applied to the horizontal electrode 620 from the power supply device (not shown) and gas is supplied into the chamber 610 from the gas supply unit (not shown), plasma is generated inside the chamber 610.

[0128] In this embodiment, an example will be given with the chamber 610 or the rack 611 being the ground electrode. However, it is not limited thereto, and the two sides of the horizontal electrode 620 may be composed of different electrodes having a potential difference therebetween and configured to generate plasma.

[0129] The plasma generated by the horizontal electrode 620 surface-treats and functionalizes the powder. The surface functionalization of the powder disperses the powders so that they do not aggregate without reducing the existing physical properties, but can improve the interfacial bonding force with different materials different from the powder.

[0130] The horizontal electrode 620 is arranged horizontally in the chamber 610, and at least a part of the upper surface is formed in a flat plate shape so that the powder can be placed thereon. The horizontal electrode 620 will be described by taking a rectangular plate shape as an example.

[0131] However, it is not limited thereto. The horizontal electrode 620 can be variously modified and applied as long as it has a shape on which the powder can be placed, such as a disc or a container shape. For example, as shown in FIG. 12, the horizontal electrode 620' can also be formed flat only in at least a part.

[0132] Also, the horizontal electrode 620 can be manufactured from various materials such as metal, polymer, and ceramic. Among metals, the horizontal electrode 620 can also be manufactured by aluminum, which is lighter than other metals such as stainless steel and can reduce costs.

[0133] A plurality of the horizontal electrodes 620 are stacked and arranged such that there are spaces between them in the vertical or horizontal direction. In the present embodiment, the plurality of horizontal electrodes 620 will be described by way of example as being inserted into the rack 611 with a plurality of them spaced apart in the vertical direction. The number of stacked horizontal electrodes 620 can be adjusted according to the processing capacity.

[0134] The vibration generator 630 is a device for applying vibration to the horizontal electrode 620 so that the positions of the powders relative to each other change on the upper surface of the horizontal electrode 620, thereby uniformly surface-treating the powders. The vibration generator 630 generates vibrations such as the effect of hitting the lower part of the horizontal electrode 20, and can change the positions of the powders located relatively close to and far from the surface of the horizontal electrode 620 relative to each other. Therefore, the powders placed on the upper surface of the horizontal electrode 620 are uniformly surface-treated. In the present embodiment, the vibration generator 630 is connected to the rack 611, and will be described by way of example as being such that when vibration is applied to the rack 611, vibration is applied to the horizontal electrode 620 due to the vibration of the rack 611.

[0135] The vibration generator 630 can apply vibration to the horizontal electrode 620 by generating at least one of mechanical vibration, acoustic vibration, and ultrasonic vibration. Further, the vibration generator 630 can apply vibration so that the horizontal electrode 620 performs various behaviors such as vertical, horizontal, rotational, and gyro motions. Further, the vibration generator 630 can also apply vibration discontinuously or periodically.

[0136] The vibration generator 630 will be described by way of example as generating mechanical vibration when power is applied by the power supply device. However, it is not limited thereto, and the vibration generator can also use an ultrasonic vibrator or an acoustic vibration module.

[0137] The vibration generator 630 includes at least one of a vibration motor (not shown) that applies vibration to the horizontal electrode 620 by a rotational force when power is applied, an air knocker (not shown) that moves a piston by compressed air to apply vibration to the horizontal electrode 620, and an electronic hammer (not shown) that applies vibration to the horizontal electrode 620 using electromagnetic force generated when power is applied. However, it is not limited thereto, and the vibration generator 630 can apply vibration so that the horizontal electrode 620 performs various behaviors such as vertical, horizontal, rotational, and gyro motions. Also, the vibration generator 630 can apply vibration discontinuously or periodically.

[0138] The vibration motor (not shown) is a device that connects an eccentric shaft to the rotation shaft of the motor to generate vibration by eccentric rotational motion, and is connected to the horizontal electrode 620 by a connecting member.

[0139] The air knocker (not shown) is a device that moves a piston forward by compressed air supplied inside a housing, transmits the impact force caused by the forward movement of the piston to the horizontal electrode 620, and generates vibration in the horizontal electrode 620. The air knocker (not shown) is arranged to be abutted against the horizontal electrode 620.

[0140] The electronic hammer (not shown) includes an E-core and an I-core inside, and is a device that generates vibration in the horizontal electrode 620 using the electromagnetic force generated between the E-core and the I-core when power is applied.

[0141] On the other hand, the heater 640 is a device for removing residual moisture of the powder by applying heat to the horizontal electrode 620. If the powder dispersed from the wet process is dried, a phenomenon occurs in which the moisture escapes due to capillary action and then re-aggregates. Therefore, in this embodiment, in order to add vibration while heating the horizontal electrode 620, the powder cannot aggregate and the dispersed state is maintained. Accordingly, the powder dispersed from the wet process can be used in the dry process.

[0142] The heater 640 will be described by way of example as using an electric heater, but is not limited thereto, and can be variously modified and applied as long as it can heat the horizontal electrode 620.

[0143] The heater 640 will be described by way of example as being disposed at a position spaced a predetermined distance from the horizontal electrode 620 below the horizontal electrode 620 and being detachably coupled to the rack 611. In the present embodiment, the heater 640 will be described by way of example as being provided for each lower part of the plurality of horizontal electrodes 620.

[0144] However, it is not limited thereto, and as shown in FIG. 12, it is also possible to use a heater 641 mounted below the horizontal electrode 620'.

[0145] Also, as shown in FIG. 13, it is also possible to use a cylindrical lamp heater 642 disposed so as to surround the horizontal electrode 620'. The lamp heater 642 is also cylindrical, and other shapes are possible as long as it surrounds the horizontal electrode 620'.

[0146] The plasma device for powder surface treatment also includes a control unit (not shown) that controls the operation of the vibration generator 630 according to the amount of powder placed on the horizontal electrode 620 to adjust the intensity of the vibration applied to the horizontal electrode 620.

[0147] The control unit (not shown) also controls the operation of the heater 640.

[0148] FIG. 11 is a drawing showing an example in which the plasma device for powder surface treatment according to the sixth embodiment of the present invention is performed in a semi - continuous process.

[0149] Referring to FIG. 11, the plasma device for powder surface treatment will be described by way of example as being performed in a semi - continuous process, and further includes a loading conveyor 661, an unloading conveyor 662, rack lifting means (not shown), a powder supply unit 663, and a powder recovery unit 664.

[0150] The loading conveyor 661 is a moving device that moves the horizontal electrode 620 mounted on the moving jig 665 toward the inside of the chamber 610.

[0151] The unloading conveyor 662 is a moving device that pulls out and moves the horizontal electrode 620 whose powder surface treatment has been completed from the chamber 610.

[0152] The rack lifting means (not shown) is a device for lifting or lowering the horizontal electrode 620 whose powder surface treatment has been completed among the plurality of horizontal electrodes 620 mounted on the rack 611 to the height of the unloading conveyor 662.

[0153] The powder supply unit 663 is a device that supplies the powder to the upper surface of the horizontal electrode 620. The powder supply unit 663 is provided separately from the chamber 610 and supplies the powder to the upper surface of the horizontal electrode 620 before the horizontal electrode 620 enters the chamber 610. That is, the powder supply unit 663 will be described by way of example as being provided above the loading conveyor 661. However, it is not limited thereto, and the powder supply unit 663 may be provided inside the chamber 610 and supply the powder to the upper surface of the horizontal electrode 620 in a state where the horizontal electrode 620 is arranged in the chamber 610. Further, the powder supply unit 663 may be arranged for each of the separation spaces between the plurality of horizontal electrodes 620 and spray the powder into the separation spaces all at once. It is also possible that one powder injector (not shown) is provided so as to be movable in the vertical direction and continuously spray for each of the separation spaces between the horizontal electrodes 620 while moving. Further, the powder injector (not shown) may also spray the powder inside the chamber 610.

[0154] The powder recovery unit 664 is a device for recovering the powder that has been surface-treated on the upper surface of the horizontal electrode 620. The powder recovery unit 664 is provided separately from the chamber 610 and recovers the powder from the horizontal electrode 620 that has exited the chamber 610. That is, the powder recovery unit 664 will be described by way of example as being provided above the unloading conveyor 662. However, it is not limited thereto, and the powder recovery unit 664 may be provided inside the chamber 610.

[0155] The operation of the plasma device for powder surface treatment using a horizontal electrode according to the sixth embodiment of the present invention configured as described above will be as follows.

[0156] Referring to FIG. 11, when the horizontal electrode 620 is placed on the loading conveyor 661, the powder supply unit 663 supplies powder onto the upper surface of the horizontal electrode 620.

[0157] The loading conveyor 661 moves the horizontal electrode 620 on which the powder is placed into the chamber 610.

[0158] The horizontal electrode 620 that has moved inside the chamber 610 is inserted into the rack 611.

[0159] At this time, the rack lifting means (not shown) raises or lowers the rack 611 so that the empty slot where the horizontal electrode 620 is to be mounted comes to a predetermined loading position. The loading position is set in advance to be the same as the height of the loading conveyor 661.

[0160] The horizontal electrode 620 is coupled to the rack 611 in a cartridge manner.

[0161] When the horizontal electrode 620 is coupled to the rack 611, the rack lifting means (not shown) returns the rack 611 to its original position where surface treatment is possible.

[0162] Thereafter, the vibration generator 630 and the heater 640 are operated.

[0163] When the vibration generator 630 is operated, vibration is applied to the horizontal electrode 620 through the rack 611.

[0164] When vibration is applied to the horizontal electrode 620, the powder is uniformly surface-treated while the positions of the powder on the upper surface of the horizontal electrode 620 change relative to each other due to the vibration. That is, since the vibration generator 630 generates an effect of hitting the horizontal electrode 620, the positions of the powder relatively close to the surface of the horizontal electrode 620 and the powder relatively far from the surface of the horizontal electrode 620 repeatedly change relative to each other.

[0165] That is, referring to FIG. 10, an adsorption force (B) in a direction toward the surface of the horizontal electrode 620 and a dispersion force (A) in a direction of bouncing outward from the surface of the horizontal electrode 620 act on the powder placed on the horizontal electrode 620. At this time, the adsorption force (B) and the dispersion force (A) can be adjusted according to the vibration intensity of the vibration generator 630. The adsorption force (B) and the dispersion force (A) can be calculated to obtain optimal values through experiments or the like. By appropriately adjusting the adsorption force (B) and the dispersion force (A), the powder can only move relative to each other without flying off from the surface of the horizontal electrode 620, and the entire powder can be uniformly subjected to plasma surface treatment.

[0166] Therefore, since the powder is dispersed while moving in the vertical and horizontal directions by the vibration generator 630, it is possible to prevent the powder from accumulating to a thickness greater than a certain thickness in a specific portion of the surface of the horizontal electrode 620.

[0167] In addition, in order to give the effect of hitting the horizontal electrode 620 by the vibration generator 630, it is not necessary to completely remove the powder from the surface of the horizontal electrode 620, float it, disperse it, and then adsorb it again. Therefore, compared with the case of floating the powder, the processing time is shortened and the loss of the powder is prevented.

[0168] In addition, since the powder can be moved while adsorbed on the surface of the horizontal electrode 620, the powder is uniformly surface-treated by plasma.

[0169] Also, when the heater 640 operates, the residual moisture of the powder is removed and the reactivity is increased.

[0170] That is, in the case of carbon nano materials such as the carbon nanotubes, since they are sensitive to moisture, the efficiency of the surface treatment is improved by removing the residual moisture during the plasma surface treatment.

[0171] In the present invention, in order to apply vibration while heating the horizontal electrode 620, a state of being dispersed while being dried is maintained. That is, if only the powder is dried, a side effect occurs in which the material re-aggregates again while water escapes due to capillary action. However, since vibration is applied while heating, the powder does not aggregate and is uniformly dispersed. Therefore, the powder dispersed by the wet process can be applied to the dry process.

[0172] The step of surface treatment by the plasma is performed for a preset time.

[0173] If there is a horizontal electrode 620 on which the surface treatment is completed among the plurality of horizontal electrodes 620 mounted on the rack 611, the rack lifting means (not shown) moves the horizontal electrode 620 on which the surface treatment is completed to a preset unloading position. The unloading position is preset to the height of the unloading conveyor 662.

[0174] The horizontal electrode 620 on which the surface treatment is completed is removed from the rack 611 by the moving jig 665.

[0175] The unloading conveyor 662 moves the horizontal electrode 620 removed from the rack 611 to the outside of the chamber 610.

[0176] The powder recovery unit 664 recovers the powder surface-treated on the surface of the horizontal electrode 620.

[0177] The horizontal electrode 620 from which the powder has been recovered moves to the loading conveyor 661 and is re-loaded.

[0178] As described above, since the plasma device for powder surface treatment according to the present invention has a structure in which a plurality of the horizontal electrodes 620 are stacked, the structure is very simple, and the capacity that can be processed at one time can be maximized depending on the number of stacked horizontal electrodes 620.

[0179] In addition, since the surface treatment is performed with the powder placed on the upper surface of the horizontal electrode 620, the powder that is discarded without being processed is minimized compared to the case where the powder is floated and then adsorbed. Further, since the step of repeatedly removing the powder completely from the surface of the horizontal electrode 620, floating it, and dispersing it is unnecessary, the processing efficiency is improved.

[0180] In addition, by applying vibration to the horizontal electrode 620 using the vibration generator 630, the adsorption force (B) adsorbed on the surface of the horizontal electrode 620 and the dispersion force (A) leaving the horizontal electrode 620 can be appropriately adjusted. Therefore, the powder can move relative to each other without being blown off from the surface of the horizontal electrode 620, and the entire powder can be uniformly subjected to plasma surface treatment.

[0181] On the other hand, FIG. 14 is a drawing schematically showing a plasma device for powder surface treatment using a horizontal electrode according to the seventh embodiment of the present invention. FIG. 15 is a drawing schematically showing the horizontal electrode shown in FIG. 14.

[0182] Referring to FIGS. 14 and 15, the plasma device for powder surface treatment according to the seventh embodiment of the present invention includes a chamber 710, a horizontal electrode 720, a vibration generator 730, and a magnetic force generator 740.

[0183] The powder includes nano- or micro-sized powders such as carbon nanotubes and graphene.

[0184] The chamber 710 houses the horizontal electrode 720 therein and forms a space where plasma is generated. A gas supply unit (not shown) for supplying external gas is connected to the chamber 710.

[0185] For example, the chamber 710 is described with an example in which a rack 711 into which the horizontal electrode 720 is inserted is provided inside.

[0186] The rack 711 may be fixedly provided inside the chamber 710, or may be provided so as to be pullable out from the chamber 710. After inserting the horizontal electrode 720, it is also possible to pull it in again.

[0187] The horizontal electrode 720 is a power electrode to which power is applied from a power supply device (not shown). When RF power is applied to the horizontal electrode 720 from the power supply device (not shown) and gas is supplied into the chamber 710 from the gas supply unit (not shown), plasma is generated inside the chamber 710.

[0188] In this embodiment, the chamber 710 or the rack 711 is described with an example as being a ground electrode. However, it is not limited thereto, and it may be configured such that the one side and the other side of the horizontal electrode 720 are different electrodes having a potential difference to generate plasma.

[0189] The plasma generated by the horizontal electrode 720 surface-treats and functionalizes the powder. The surface functionalization of the powder disperses the powders so that they do not aggregate without reducing the existing physical properties, but can improve the interfacial bonding force with different materials different from the powder.

[0190] The horizontal electrode 720 is arranged horizontally in the chamber 710, and at least a part of the upper surface is formed in a flat plate shape so that the powder can be placed thereon.

[0191] However, without being limited thereto, the horizontal electrode 720 can be variously modified and applied as long as it has a shape on which the powder can be placed, such as a disc or a container shape. For example, as shown in FIG. 17, the horizontal electrode 720' can be formed flat only in at least a part thereof.

[0192] In addition, the horizontal electrode 720 can be manufactured from various materials such as metal, polymer, and ceramic. The horizontal electrode 720 can be manufactured from aluminum among metals, and is lighter than other metals such as stainless steel, and the cost is reduced.

[0193] A plurality of the horizontal electrodes 720 are stacked and arranged so as to have a space apart from each other in the vertical direction or the horizontal direction. In the present embodiment, a plurality of the horizontal electrodes 720 will be described by way of example as being inserted into the rack 711 with a space therebetween in the vertical direction. The number of stacked layers of the horizontal electrode 720 can be adjusted according to the processing capacity.

[0194] The vibration generator 730 is a device for applying vibration to the horizontal electrode 720 so that the positions of the powders on the upper surface of the horizontal electrode 720 are changed relative to each other, and for uniformly surface-treating the powders. The vibration generator 730 can generate vibration such as the effect of hitting the lower part of the horizontal electrode 20, and can change the positions of the powders located relatively close to the surface of the horizontal electrode 720 and the powders located far from the surface of the horizontal electrode 720 relative to each other. Therefore, the powders placed on the upper surface of the horizontal electrode 720 are uniformly surface-treated. In the present embodiment, the vibration generator 730 will be described by way of example as being connected to the rack 711 and applying vibration to the rack 711, so that the vibration is applied to the horizontal electrode 720 by the vibration of the rack 711.

[0195] The vibration generator 730 can generate at least one of mechanical vibration, acoustic vibration, and ultrasonic vibration, and apply vibration to the horizontal electrode 720. Further, the vibration generator 730 can apply vibration so that the horizontal electrode 720 performs various behaviors such as up and down, left and right, rotation, and gyro motion. Further, the vibration generator 730 can also apply vibration discontinuously or periodically.

[0196] The vibration generator 730 will be described by way of example as generating mechanical vibration when power is applied by the power supply device. However, it is not limited thereto, and the vibration generator can also use an ultrasonic vibrator or an acoustic vibration module.

[0197] The vibration generator 730 includes at least one of a vibration motor (not shown) that applies vibration to the horizontal electrode 720 by a rotational force when power is applied, an air knocker (not shown) that moves a piston by compressed air and applies vibration to the horizontal electrode 720, and an electronic hammer (not shown) that applies vibration to the horizontal electrode 720 using the electromagnetic force generated when power is applied. However, it is not limited thereto, and the vibration generator 730 can apply vibration so that the horizontal electrode 720 performs various behaviors such as up and down, left and right, rotation, and gyro motion. Further, the vibration generator 730 can also apply vibration discontinuously or periodically.

[0198] The vibration motor (not shown) is a device that connects an eccentric shaft to the rotation shaft of the motor to generate vibration by eccentric rotational motion, and is connected to the horizontal electrode 720 by a connecting member.

[0199] The air knocker (not shown) is a device that advances a piston by compressed air supplied inside a housing, transmits the impact force caused by the forward movement of the piston to the horizontal electrode 720, and generates vibration in the horizontal electrode 720. The air knocker (not shown) is arranged so as to be abutted against the horizontal electrode 720.

[0200] The foregoing electronic hammer (not shown) includes an E-core and an I-core inside, and is a device that generates vibrations in the horizontal electrode 720 by using the electromagnetic force generated between the E-core and the I-core when power is applied.

[0201] On the other hand, the magnetic force generator 740 generates a magnetic force around the horizontal electrode 720 to generate additional movement of electrons and increase the plasma density.

[0202] The magnetic force generator 740 includes at least one or more magnets having different polarities, and the plurality of magnets are arranged at a predetermined interval from each other. The shape and arrangement of the magnets can be variously changed and applied, but it is desirable that a magnetic force is uniformly formed around the horizontal electrode 720 to uniformly generate the plasma density.

[0203] In this embodiment, the magnetic force generator 740 will be described by way of example as a magnet inserted inside the horizontal electrode 720. However, it is not limited thereto, and the magnetic force generator 740 may be attached to the horizontal electrode 720. Also, the magnetic force generator 740 can use an electromagnet.

[0204] At least a part of the horizontal electrode 720 is formed with a magnet insertion portion 720a into which the magnetic force generator 740 can be inserted.

[0205] The plasma device for powder surface treatment also includes a control unit (not shown) that controls the operation of the vibration generator 730 according to the amount of powder placed on the horizontal electrode 720 to adjust the intensity of the vibration applied to the horizontal electrode 720.

[0206] FIG. 16 is a drawing showing an example in which the plasma device for powder surface treatment according to the seventh embodiment of the present invention is performed in a semi-continuous process.

[0207] Referring to FIG. 16, the plasma device for powder surface treatment will be described by way of example as being performed in a semi - continuous process, and further includes a loading conveyor 761, an unloading conveyor 762, a rack lifting means (not shown), a powder supply unit 763, and a powder recovery unit 764.

[0208] The loading conveyor 761 is a moving device that moves the horizontal electrode 720 mounted on the moving jig 765 toward the inside of the chamber 710.

[0209] The unloading conveyor 762 is a moving device that pulls out and moves the horizontal electrode 720 from the chamber 710 after the powder surface treatment is completed.

[0210] The rack lifting means (not shown) is a device for raising or lowering the horizontal electrode 720 on which the powder surface treatment has been completed among the plurality of horizontal electrodes 720 mounted on the rack 711 to the height of the unloading conveyor 762.

[0211] The powder supply unit 763 is a device for supplying the powder to the upper surface of the horizontal electrode 720. The powder supply unit 763 is provided separately from the chamber 710 and supplies the powder to the upper surface of the horizontal electrode 720 before the horizontal electrode 720 enters the chamber 710. That is, the powder supply unit 763 will be described by way of example as being provided above the loading conveyor 761. However, it is not limited thereto, and the powder supply unit 763 may be provided inside the chamber 710 and supply the powder to the upper surface of the horizontal electrode 720 in a state where the horizontal electrode 720 is arranged in the chamber 710. Also, the powder supply unit 763 may be arranged for each of the spaced - apart spaces between the plurality of horizontal electrodes 720 and inject the powder into the spaced - apart spaces all at once, or one powder injector (not shown) may be provided so as to be movable in the vertical direction and continuously inject for each of the spaced - apart spaces between the horizontal electrodes 720 while moving. Also, the powder injector (not shown) may inject the powder inside the chamber 710.

[0212] The powder recovery unit 764 is a device that recovers the powder surface-treated on the upper surface of the horizontal electrode 720. The powder recovery unit 764 is provided separately from the chamber 710 and recovers the powder from the horizontal electrode 720 that has exited the chamber 710. That is, the powder recovery unit 764 will be described by way of example as being provided above the unloading conveyor 762. However, it is not limited thereto, and the powder recovery unit 764 may be provided inside the chamber 710.

[0213] The operation of the plasma device for powder surface treatment using the horizontal electrode according to the seventh embodiment of the present invention configured as described above will be as follows.

[0214] Referring to FIG. 16, when the horizontal electrode 720 is placed on the loading conveyor 761, the powder supply unit 763 supplies powder onto the upper surface of the horizontal electrode 720.

[0215] The loading conveyor 761 moves the horizontal electrode 720 on which the powder is placed inside the chamber 710.

[0216] The horizontal electrode 720 that has moved inside the chamber 710 is inserted into the rack 711.

[0217] At this time, the rack lifting means (not shown) raises or lowers the rack 711 so that the empty column where the horizontal electrode 720 is mounted comes to a predetermined loading position. The loading position is set in advance in the same manner as the height of the loading conveyor 761.

[0218] The horizontal electrode 720 is coupled to the rack 711 in a cartridge manner.

[0219] When the horizontal electrode 720 is coupled to the rack 711, the rack lifting means (not shown) returns the rack 711 to the original position where surface treatment is possible.

[0220] Thereafter, the vibration generator 730 is operated.

[0221] When the vibration generator 730 is operated, vibration is applied to the horizontal electrode 720 through the rack 711.

[0222] When vibration is applied to the horizontal electrode 720, the powder is uniformly surface-treated while the positions of the powder on the upper surface of the horizontal electrode 720 change relative to each other due to the vibration. That is, since the vibration generator 730 generates an effect of hitting the horizontal electrode 720, the positions of the powder located relatively close to the surface of the horizontal electrode 720 and the powder located far from the surface repeatedly change relative to each other.

[0223] That is, referring to FIG. 15, an adsorption force (B) in a direction toward the surface of the horizontal electrode 720 and a dispersion force (A) in a direction of bouncing outward from the surface of the horizontal electrode 720 act on the powder placed on the horizontal electrode 720. At this time, the adsorption force (B) and the dispersion force (A) can be adjusted according to the vibration intensity of the vibration generator 730. The adsorption force (B) and the dispersion force (A) can be calculated to obtain optimal values through experiments or the like. By appropriately adjusting the adsorption force (B) and the dispersion force (A), the powder can only move relative to each other without flying off the surface of the horizontal electrode 720, and the entire powder can be uniformly subjected to plasma surface treatment.

[0224] Therefore, since the powder is dispersed while moving in the vertical and horizontal directions by the vibration generator 730, it is possible to prevent the powder from accumulating to a thickness greater than a certain thickness at a specific portion in the surface of the horizontal electrode 720.

[0225] In addition, in order to give an effect of hitting the horizontal electrode 720 by the vibration generator 730, it is not necessary to completely remove the powder from the surface of the horizontal electrode 720, float it, disperse it, and then adsorb it again. Therefore, compared with the case of floating the powder, the processing time is shortened and the loss of the powder is prevented.

[0226] In addition, since the powder can be displaced while adsorbed on the surface of the horizontal electrode 720, the powder is uniformly surface-treated by plasma.

[0227] Also, if a magnetic force is generated around the horizontal electrode 720 by the magnetic force generator 740, additional movement of electrons is generated, increasing the plasma density and improving the surface treatment speed.

[0228] The step of surface-treating by the plasma is performed for a preset time.

[0229] If there is a horizontal electrode 720 for which the surface treatment has been completed among the plurality of horizontal electrodes 720 mounted on the rack 711, the rack lifting means (not shown) moves the horizontal electrode 720 for which the surface treatment has been completed to a preset unloading position. The unloading position is preset to the height of the unloading conveyor 762.

[0230] The horizontal electrode 720 for which the surface treatment has been completed is removed from the rack 711 by the transfer jig 765.

[0231] The unloading conveyor 762 moves the horizontal electrode 720 removed from the rack 711 outside the chamber 710.

[0232] The powder recovery unit 764 recovers the powder surface-treated on the surface of the horizontal electrode 720.

[0233] The horizontal electrode 720 from which the powder has been recovered moves to the loading conveyor 761 and is re-loaded.

[0234] As described above, since the plasma device for powder surface treatment according to the present invention has a structure in which a plurality of the horizontal electrodes 720 are stacked, the structure is very simple, and the capacity that can be processed at one time can be maximized according to the number of stacked horizontal electrodes 720.

[0235] In addition, since the surface treatment is performed with the powder placed on the upper surface of the horizontal electrode 720, the powder that is discarded without being treated is minimized as compared with the case where the powder is floated and then adsorbed. Further, since there is no need to repeat the process of completely removing the powder from the surface of the horizontal electrode 720, floating it, and dispersing it, the processing efficiency is improved.

[0236] In addition, by applying vibration to the horizontal electrode 720 using the vibration generator 730, the adsorption force (B) adsorbed on the surface of the horizontal electrode 720 and the dispersion force (A) away from the horizontal electrode 720 can be appropriately adjusted. Therefore, the powders can move relative to each other without flying off the surface of the horizontal electrode 720, and the entire powders can be uniformly subjected to plasma surface treatment.

[0237] On the other hand, FIG. 19 is a drawing schematically showing a plasma device for powder surface treatment using a horizontal electrode according to the eighth embodiment of the present invention. FIG. 20 is a drawing schematically showing the horizontal electrode shown in FIG. 19.

[0238] Referring to FIGS. 19 and 20, the plasma device for powder surface treatment according to the eighth embodiment of the present invention includes a chamber 810, a horizontal electrode 820, and a vibration generator 830.

[0239] The powders include nano- or micro-sized powders such as carbon nanotubes and graphene.

[0240] The chamber 810 houses the horizontal electrode 820 therein and forms a space where plasma is generated. A gas supply unit (not shown) for supplying external gas is connected to the chamber 810.

[0241] The description will be given by way of example in which a rack 811 into which the horizontal electrode 820 is inserted is provided inside the chamber 810.

[0242] The rack 811 may be fixedly installed inside the chamber 810, or may be provided so as to be retractable from the chamber 810. After inserting the horizontal electrode 820, it is also possible to retract it again.

[0243] The horizontal electrode 820 is a power electrode to which power is applied from a power supply device (not shown). When RF power is applied to the horizontal electrode 820 from the power supply device (not shown) and gas is supplied into the chamber 810 from the gas supply unit (not shown), plasma is generated inside the chamber 810.

[0244] In this embodiment, an example will be given in which the chamber 810 or the rack 811 is a ground electrode. However, it is not limited to this, and it may be configured such that the plasma is generated by being composed of different electrodes having a potential difference between one side and the other side of the horizontal electrode 820.

[0245] The plasma generated by the horizontal electrode 820 surface-treats and functionalizes the powder. The surface functionalization of the powder disperses the powders so that they do not aggregate without degrading the existing physical properties, but can improve the interfacial bonding force with different materials different from the powder.

[0246] The horizontal electrode 820 is arranged horizontally in the chamber 810, and at least a part of the upper surface is formed in a flat plate shape so that the powder can be placed thereon.

[0247] However, it is not limited to this. The horizontal electrode 820 can be variously modified and applied as long as it has a shape on which the powder can be placed, such as a disc or a container shape. For example, as shown in FIG. 22, the horizontal electrode 820' may be formed flat only in at least a part.

[0248] Also, the horizontal electrode 820 can be manufactured from various materials such as metal, polymer, and ceramic. Among metals, the horizontal electrode 820 can also be manufactured by aluminum, and is lighter than other metals such as stainless steel, and the cost is reduced.

[0249] At least a part of the upper surface of the horizontal electrode 820 is textured with a predetermined texture pattern so as to have a predetermined surface roughness. If the texture pattern is formed on the portion of the upper surface of the horizontal electrode 820 where the powder is placed, when the horizontal electrode 820 vibrates, the powder can further utilize mechanical energy while colliding with the texture pattern, so that the efficiency of plasma surface treatment can be increased.

[0250] The horizontal electrode 820 includes a base substrate 820a and a pattern layer 820b on which the texture pattern is formed.

[0251] The base substrate 820a will be described by way of example as being made of an aluminum material.

[0252] The pattern layer 820b is a layer in which at least a part of the surface of the base substrate 820a is oxidized by anodization to form the texture pattern. However, it is not limited thereto, and the pattern layer 820b can also be formed by processing such as milling.

[0253] Also, a plurality of the horizontal electrodes 820 are stacked and arranged so as to have a separation space from each other in the vertical direction or the horizontal direction. In the present embodiment, a plurality of the horizontal electrodes 820 will be described by way of example as being inserted into the rack 811 with a plurality of them spaced apart in the vertical direction. The number of stacked horizontal electrodes 820 can be adjusted according to the processing capacity.

[0254] The vibration generator 830 is a device for applying vibration to the horizontal electrode 820 so that the positions of the powders on the upper surface of the horizontal electrode 820 are changed relative to each other, and for uniformly surface-treating the powders. The vibration generator 830 can generate vibrations like the effect of hitting the lower part of the horizontal electrode 20, and can change the positions of the powders located relatively close to and far from the surface of the horizontal electrode 820 relative to each other. Therefore, the powders placed on the upper surface of the horizontal electrode 820 are uniformly surface-treated. In this embodiment, the vibration generator 830 will be described by way of example as being connected to the rack 811 and applying vibration to the rack 811, so that vibration is applied to the horizontal electrode 820 due to the vibration of the rack 811.

[0255] The vibration generator 830 can generate at least one of mechanical vibration, acoustic vibration, and ultrasonic vibration and apply vibration to the horizontal electrode 820. Also, the vibration generator 830 can apply vibration so that the horizontal electrode 820 performs various behaviors such as up and down, left and right, rotation, and gyro motion. Further, the vibration generator 830 can also apply vibration discontinuously or periodically.

[0256] The vibration generator 830 will be described by way of example as generating mechanical vibration when power is applied by the power supply device. However, it is not limited thereto, and the vibration generator can also use an ultrasonic vibrator or an acoustic vibration module.

[0257] When the power is applied, the vibration generator 830 includes at least one of a vibration motor (not shown) that applies vibration to the horizontal electrode 820 by rotational force, an air knocker (not shown) that moves a piston by compressed air to apply vibration to the horizontal electrode 820, and an electronic hammer (not shown) that applies vibration to the horizontal electrode 820 using electromagnetic force generated when the power is applied. However, the present invention is not limited thereto, and the vibration generator 830 can apply vibration so that the horizontal electrode 820 performs various behaviors such as vertical, horizontal, rotational, and gyro motions. Further, the vibration generator 830 can apply vibration discontinuously or periodically.

[0258] The vibration motor (not shown) is a device that connects an eccentric shaft to the rotation shaft of the motor to generate vibration by eccentric rotational motion, and is connected to the horizontal electrode 820 by a connecting member.

[0259] The air knocker (not shown) is a device that moves a piston forward by compressed air supplied inside a housing, transmits an impact force caused by the forward movement of the piston to the horizontal electrode 820, and generates vibration in the horizontal electrode 820. The air knocker (not shown) is arranged so as to abut against the horizontal electrode 820.

[0260] The electronic hammer (not shown) is a device that includes an E-core and an I-core inside, and generates vibration in the horizontal electrode 820 using electromagnetic force generated between the E-core and the I-core when power is applied.

[0261] In addition, the plasma device for powder surface treatment includes a control unit (not shown) that controls the operation of the vibration generator 830 according to the amount of powder placed on the horizontal electrode 820 to adjust the intensity of vibration applied to the horizontal electrode 820.

[0262] FIG. 21 is a drawing showing an example in which the plasma device for powder surface treatment according to the eighth embodiment of the present invention is performed in a semi-continuous process.

[0263] Referring to FIG. 21, the plasma device for powder surface treatment will be described by way of example as being performed in a semi - continuous process, and further includes a loading conveyor 861, an unloading conveyor 862, rack lifting means (not shown), a powder supply unit 863, and a powder recovery unit 864.

[0264] The loading conveyor 861 is a moving device that moves the horizontal electrode 820 mounted on the moving jig 865 toward the inside of the chamber 810.

[0265] The unloading conveyor 862 is a moving device that pulls out and moves the horizontal electrode 820 from the chamber 810 after the powder surface treatment is completed.

[0266] The rack lifting means (not shown) is a device for raising or lowering the horizontal electrode 820 on which the powder surface treatment has been completed among the plurality of horizontal electrodes 820 mounted on the rack 811 to the height of the unloading conveyor 862.

[0267] The powder supply unit 863 is a device for supplying the powder to the upper surface of the horizontal electrode 820. The powder supply unit 863 is provided separately from the chamber 810 and supplies the powder to the upper surface of the horizontal electrode 820 before the horizontal electrode 820 enters the chamber 810. That is, the powder supply unit 863 will be described by way of example as being provided above the loading conveyor 861. However, it is not limited thereto, and the powder supply unit 863 may be provided inside the chamber 810 and supply the powder to the upper surface of the horizontal electrode 820 in a state where the horizontal electrode 820 is arranged inside the chamber 810. Also, the powder supply unit 863 may be arranged for each of the spaced - apart spaces between the plurality of horizontal electrodes 820 and inject the powder into the spaced - apart spaces all at once, or a single powder injector (not shown) may be provided so as to be movable in the vertical direction and continuously inject for each of the spaced - apart spaces between the horizontal electrodes 820 while moving. Also, the powder injector (not shown) may inject the powder inside the chamber 810.

[0268] The powder recovery unit 864 is a device that recovers the powder surface-treated on the upper surface of the horizontal electrode 820. The powder recovery unit 864 is provided separately from the chamber 810 and recovers the powder from the horizontal electrode 820 that has exited the chamber 810. That is, the powder recovery unit 864 will be described by way of example as being provided above the unloading conveyor 862. However, it is not limited thereto, and the powder recovery unit 864 may be provided within the chamber 810.

[0269] The operation of the plasma device for powder surface treatment using a horizontal electrode according to the eighth embodiment of the present invention configured as described above will be as follows.

[0270] Referring to FIG. 21, when the horizontal electrode 820 is placed on the loading conveyor 861, the powder supply unit 863 supplies powder to the upper surface of the horizontal electrode 820.

[0271] The loading conveyor 861 moves the horizontal electrode 820 on which the powder is placed into the chamber 810.

[0272] The horizontal electrode 820 that has moved inside the chamber 810 is inserted into the rack 811.

[0273] At this time, the rack lifting means (not shown) raises or lowers the rack 811 so that the empty slot where the horizontal electrode 820 is mounted comes to a predetermined loading position. The loading position is set in advance to be the same as the height of the loading conveyor 861.

[0274] The horizontal electrode 820 is coupled to the rack 811 in a cartridge manner.

[0275] When the horizontal electrode 820 is coupled to the rack 811, the rack lifting means (not shown) returns the rack 811 to its original position where surface treatment is possible.

[0276] Thereafter, the vibration generator 830 is operated.

[0277] When the vibration generator 830 is operated, vibration is applied to the horizontal electrode 820 through the rack 811.

[0278] When vibration is applied to the horizontal electrode 820, the positions of the powders on the upper surface of the horizontal electrode 820 are changed relative to each other while being uniformly surface-treated by the vibration. That is, since the vibration generator 830 generates an effect of hitting the horizontal electrode 820, the positions of the powders located relatively close to and far from the surface of the horizontal electrode 820 are repeatedly changed relative to each other.

[0279] That is, referring to FIG. 20, an adsorption force (B) in a direction toward the surface of the horizontal electrode 820 and a dispersion force (A) in a direction of bouncing outward from the surface of the horizontal electrode 820 act on the powders placed on the horizontal electrode 820. At this time, the adsorption force (B) and the dispersion force (A) can be adjusted according to the vibration intensity of the vibration generator 830. The adsorption force (B) and the dispersion force (A) can be calculated to have optimal values through experiments or the like. By appropriately adjusting the adsorption force (B) and the dispersion force (A), the powders can only move relative to each other without being blown off from the surface of the horizontal electrode 820, and the entire powders can be uniformly subjected to plasma surface treatment.

[0280] Therefore, since the powders are dispersed while moving in the vertical and horizontal directions by the vibration generator 830, it is possible to prevent the powders from accumulating to a thickness greater than a certain thickness in a specific portion of the surface of the horizontal electrode 820.

[0281] In addition, in order to give an effect of hitting the horizontal electrode 820 by the vibration generator 830, it is not necessary to completely remove the powders from the surface of the horizontal electrode 820, float them, disperse them, and then adsorb them again. Therefore, compared with the case of floating the powders, the processing time is shortened and the loss of the powders is prevented.

[0282] In addition, since the powder can be displaced while adsorbed on the surface of the horizontal electrode 820, the powder is uniformly surface-treated by the plasma.

[0283] In addition, by forming the texture pattern on the horizontal electrode 820, when the powder moves due to the vibration of the horizontal electrode 820, the effect of plasma treatment can be improved while colliding with the pattern layer 820b.

[0284] The step of surface-treating by the plasma is performed for a preset time.

[0285] If there is a horizontal electrode 820 on which the surface treatment has been completed among the plurality of horizontal electrodes 820 mounted on the rack 811, the rack lifting means (not shown) moves the horizontal electrode 820 on which the surface treatment has been completed to a preset unloading position. The unloading position is preset to the height of the unloading conveyor 862.

[0286] The horizontal electrode 820 on which the surface treatment has been completed is removed from the rack 811 by the transfer jig 865.

[0287] The unloading conveyor 862 moves the horizontal electrode 820 removed from the rack 811 outside the chamber 810.

[0288] The powder recovery unit 864 recovers the powder surface-treated on the surface of the horizontal electrode 820.

[0289] The horizontal electrode 820 from which the powder has been recovered moves to the loading conveyor 861 and is re-loaded.

[0290] As described above, since the plasma device for powder surface treatment according to the present invention has a structure in which a plurality of the horizontal electrodes 820 are stacked, the structure is very simple, and the capacity that can be processed at one time can be maximized according to the number of stacked horizontal electrodes 820.

[0291] In addition, since the surface treatment is performed with the powder placed on the upper surface of the horizontal electrode 820, the powder that is discarded without being treated is minimized as compared with the case where the powder is adsorbed after being floated. Further, since there is no need to repeat the process of completely removing the powder from the surface of the horizontal electrode 820, floating it, and dispersing it, the processing efficiency is improved.

[0292] In addition, by applying vibration to the horizontal electrode 820 using the vibration generator 830, the adsorption force (B) adsorbed on the surface of the horizontal electrode 820 and the dispersing force (A) away from the horizontal electrode 820 can be appropriately adjusted. Therefore, the powder can move relative to each other without flying off the surface of the horizontal electrode 820, and the entire powder can be uniformly subjected to plasma surface treatment.

[0293] On the other hand, FIG. 23 is a drawing schematically showing still another example of the horizontal electrode according to the eighth embodiment of the present invention.

[0294] Referring to FIG. 23, the horizontal electrode 821 may include a base substrate 821a made of a metal material, a coating layer 821b formed by coating an aluminum material on the surface of the base substrate 821a, and a pattern layer 821c in which at least a part of the surface of the coating layer 821b is oxidized by an anodizing method to form the texture pattern.

[0295] That is, when the base substrate 821a is made of a metal material such as stainless steel, after coating the surface on which the powder is placed with an aluminum material to form the coating layer 821b, the coating layer 821b can be oxidized to form the pattern layer 821c in which the texture pattern is formed.

[0296] In addition, when the base substrate 821a is made of a metal material such as stainless steel, the pattern layer 821c can be directly joined to the base substrate 821a.

[0297] However, without being limited thereto, the pattern layer 821c can also be formed by processing such as milling.

[0298] On the other hand, FIG. 24 is a drawing schematically showing a plasma device for powder surface treatment using a horizontal electrode according to the ninth embodiment of the present invention. FIG. 25 is a drawing schematically showing the horizontal electrode shown in FIG. 24.

[0299] Referring to FIGS. 24 and 25, the plasma device for powder surface treatment according to the ninth embodiment of the present invention includes a chamber 910, a horizontal electrode 920, and a vibration generator 930.

[0300] The powder includes nano- or micro-sized powders such as carbon nanotubes and graphene.

[0301] The chamber 910 forms a space in which the horizontal electrode 920 is accommodated and plasma is generated. A gas supply unit (not shown) for supplying external gas is connected to the chamber 910.

[0302] For example, the chamber 910 is described with an example in which a rack 911 into which the horizontal electrode 920 is inserted is provided inside.

[0303] The rack 911 may be fixedly provided inside the chamber 910, or may be provided so as to be pullable from the chamber 910. After inserting the horizontal electrode 920, it is also possible to pull it in again.

[0304] The rack 911 is a second electrode part for causing plasma discharge between the rack 911 and the horizontal electrode 920.

[0305] For example, the rack 911 is described with an example in which it is grounded and serves as a ground electrode.

[0306] For example, the rack 911 is described with an example in which an insulating part 912 and a connector 913 are provided.

[0307] The insulating portion 912 is provided on the rack 911 and is made of an insulator for electrically insulating between the horizontal electrode 920 and the rack 911. The shape and size of the insulating portion 912 can be variously changed and applied.

[0308] The connector 913 is mounted in a groove formed in the rack 911, and the horizontal electrode 920 is inserted and coupled in a cartridge manner. The connector 913 is connected to a power supply device 940 described later by an electric wire or the like. However, it is not limited thereto, and the horizontal electrode 920 can also be directly connected to the power supply device 940 by an electric wire or the like.

[0309] The horizontal electrode 920 is a driving electrode to which power is applied from a power supply device 940, and is a first electrode portion that causes plasma discharge between the horizontal electrode 920 and the rack 911 which is the second electrode portion.

[0310] The horizontal electrode 920 will be described by way of example as being applied with an RF power supply from the power supply device 940. When an RF power supply is applied to the horizontal electrode 920 and gas is supplied into the chamber 910 from a gas supply unit (not shown), plasma is generated inside the chamber 910.

[0311] The plasma generated by the horizontal electrode 920 surface-treats and functionalizes the powder. The surface functionalization of the powder disperses the powder so that the powders do not aggregate without a decrease in existing physical properties, but can improve the interfacial bonding force with different materials different from the powder.

[0312] The horizontal electrode 920 is disposed horizontally in the chamber 910, and at least a part of the upper surface is formed in a flat plate shape so that the powder can be placed thereon.

[0313] However, it is not limited thereto, and the horizontal electrode 920 can be variously changed and applied as long as it has a shape on which the powder can be placed, such as a disc or a container shape. For example, as shown in FIG. 27, it is also possible that only at least a part of the horizontal electrode is formed flat.

[0314] Also, the horizontal electrode 920 can be manufactured from various materials such as metal, polymer, and ceramic. Among metals, the horizontal electrode 920 can also be manufactured from aluminum, which is lighter and more cost-effective than other metals such as stainless steel.

[0315] Also, a plurality of the horizontal electrodes 920 are stacked and arranged so as to have a separation space from each other in the vertical or horizontal direction. In the present embodiment, the plurality of horizontal electrodes 920 will be described by way of example as being inserted into the rack 911 with a plurality of them being vertically separated. The number of stacked layers of the horizontal electrode 920 can be adjusted according to the processing capacity.

[0316] The vibration generator 930 is a device for applying vibration to the horizontal electrode 920 so that the positions of the powders change relative to each other on the upper surface of the horizontal electrode 920 to uniformly surface-treat the powders. The vibration generator 930 can generate vibrations such as the effect of hitting the lower part of the horizontal electrode 20 to change the positions of the powders located relatively close to and far from the surface of the horizontal electrode 920 relative to each other. Therefore, the powders placed on the upper surface of the horizontal electrode 920 are uniformly surface-treated. In the present embodiment, the vibration generator 930 will be described by way of example as being connected to the rack 911 and applying vibration to the rack 911, so that the vibration of the rack 911 applies vibration to the horizontal electrode 920.

[0317] The vibration generator 930 can apply vibration to the horizontal electrode 920 by generating at least one of mechanical vibration, acoustic vibration, and ultrasonic vibration. Also, the vibration generator 930 can apply vibration so that the horizontal electrode 920 performs various behaviors such as up and down, left and right, rotation, and gyro motion. Also, the vibration generator 930 can apply vibration discontinuously or periodically.

[0318] The vibration generator 930 will be described by way of example as generating mechanical vibrations when power is applied by the power supply device. However, it is not limited thereto, and the vibration generator may also use an ultrasonic vibrator or an acoustic vibration module.

[0319] The vibration generator 930 includes at least one of a vibration motor (not shown) that applies vibration to the horizontal electrode 920 by a rotational force when power is applied, an air knocker (not shown) that moves a piston by compressed air to apply vibration to the horizontal electrode 920, and an electronic hammer (not shown) that applies vibration to the horizontal electrode 920 using the electromagnetic force generated when power is applied. However, it is not limited thereto, and the vibration generator 930 can apply vibration so that the horizontal electrode 920 performs various behaviors such as vertical, horizontal, rotational, and gyro motions. Also, the vibration generator 930 can apply vibration discontinuously or periodically.

[0320] The vibration motor (not shown) is a device that connects an eccentric shaft to the rotation shaft of the motor to generate vibration by eccentric rotational motion, and is connected to the horizontal electrode 920 by a connecting member.

[0321] The air knocker (not shown) is a device that moves a piston forward by compressed air supplied inside a housing, transmits the impact force caused by the forward movement of the piston to the horizontal electrode 920, and generates vibration in the horizontal electrode 920. The air knocker (not shown) is arranged to abut against the horizontal electrode 920.

[0322] The electronic hammer (not shown) is a device that includes an E-core and an I-core inside, and generates vibration in the horizontal electrode 920 using the electromagnetic force generated between the E-core and the I-core when power is applied.

[0323] Further, the plasma device for powder surface treatment includes a control unit (not shown) that controls the operation of the vibration generator 930 according to the amount of powder placed on the horizontal electrode 920 to adjust the intensity of the vibration applied to the horizontal electrode 920.

[0324] FIG. 26 is a drawing showing an example in which the plasma device for powder surface treatment according to the ninth embodiment of the present invention is performed in a semi - continuous process.

[0325] Referring to FIG. 26, the plasma device for powder surface treatment will be described by way of example as being performed in a semi - continuous process, and further includes a loading conveyor 961, an unloading conveyor 962, rack lifting means (not shown), a powder supply unit 963, and a powder recovery unit 964.

[0326] The loading conveyor 961 is a moving device that moves the horizontal electrode 920 mounted on the moving jig 965 toward the inside of the chamber 910.

[0327] The unloading conveyor 962 is a moving device that pulls out and moves the horizontal electrode 920 whose powder surface treatment has been completed from the chamber 910.

[0328] The rack lifting means (not shown) is a device for raising or lowering the horizontal electrode 920 whose powder surface treatment has been completed among the plurality of horizontal electrodes 920 mounted on the rack 911 to the height of the unloading conveyor 962.

[0329] The powder supply unit 963 is a device that supplies the powder onto the upper surface of the horizontal electrode 920. The powder supply unit 963 is provided separately from the chamber 910 and supplies the powder onto the upper surface of the horizontal electrode 920 before the horizontal electrode 920 enters the chamber 910. That is, the powder supply unit 963 will be described by way of example as being provided above the loading conveyor 961. However, it is not limited thereto, and the powder supply unit 963 may be provided inside the chamber 910 to supply the powder onto the upper surface of the horizontal electrode 920 in a state where the horizontal electrode 920 is disposed in the chamber 910. Further, the powder supply unit 963 may be disposed for each of the spaced-apart spaces between the plurality of horizontal electrodes 920 to inject the powder into the spaced-apart spaces all at once, or one powder injector (not shown) may be provided to be movable in the vertical direction and continuously inject while moving for each of the spaced-apart spaces between the horizontal electrodes 920. Further, the powder injector (not shown) may also inject powder inside the chamber 910.

[0330] The powder recovery unit 964 is a device that recovers the powder that has been surface-treated with powder on the upper surface of the horizontal electrode 920. The powder recovery unit 964 is provided separately from the chamber 910 and recovers the powder from the horizontal electrode 920 that has exited the chamber 910. That is, the powder recovery unit 964 will be described by way of example as being provided above the unloading conveyor 962. However, it is not limited thereto, and the powder recovery unit 964 may be provided inside the chamber 910.

[0331] The operation of the plasma device for powder surface treatment using the horizontal electrode according to the ninth embodiment of the present invention configured as described above will be described as follows.

[0332] Referring to FIG. 26, when the horizontal electrode 920 is placed on the loading conveyor 961, the powder supply unit 963 supplies powder onto the upper surface of the horizontal electrode 920.

[0333] The loading conveyor 961 moves the horizontal electrode 920 on which the powder is placed into the chamber 910.

[0334] The horizontal electrode 920 that has moved into the chamber 910 is inserted into the rack 911.

[0335] At this time, the rack lifting means (not shown) raises or lowers the rack 911 so that the empty slot where the horizontal electrode 920 is to be mounted comes to a predetermined loading position. The loading position is set in advance in the same manner as the height of the loading conveyor 961.

[0336] The horizontal electrode 920 is coupled to the connector 913 of the rack 911 in a cartridge manner.

[0337] Once the horizontal electrode 920 is coupled to the connector 913 of the rack 911, the rack lifting means (not shown) returns the rack 911 to its original position where surface treatment is possible.

[0338] RF power is applied to the horizontal electrode 920 from the power supply device 940 through the connector 913, and the rack 911 is grounded.

[0339] When power is applied to the horizontal electrode 920 and the rack 911 is grounded, plasma is concentrated between the horizontal electrode 920 and the rack 911, so that surface treatment of the powder can be better performed on the upper surface of the horizontal electrode 920.

[0340] Also, the vibration generator 930 is operated.

[0341] When the vibration generator 930 is operated, vibration is applied to the horizontal electrode 920 through the rack 911.

[0342] If vibration is applied to the horizontal electrode 920, the vibration causes the positions of the powders on the upper surface of the horizontal electrode 920 to change relative to each other while being uniformly surface-treated. That is, since the vibration generator 930 generates an effect of hitting the horizontal electrode 920, the positions of the powders located relatively close to and far from the surface of the horizontal electrode 920 repeatedly change relative to each other.

[0343] That is, referring to FIG. 25, an adsorption force (B) in a direction toward the surface of the horizontal electrode 920 and a dispersion force (A) in a direction of bouncing outward from the surface of the horizontal electrode 920 act on the powders placed on the horizontal electrode 920. At this time, the adsorption force (B) and the dispersion force (A) can be adjusted according to the vibration intensity of the vibration generator 930. The adsorption force (B) and the dispersion force (A) can be calculated to obtain optimal values through experiments or the like. By appropriately adjusting the adsorption force (B) and the dispersion force (A), the powders can only move relative to each other without flying off the surface of the horizontal electrode 920, and the entire powders can be uniformly plasma surface-treated.

[0344] Therefore, since the powders are dispersed while moving in the vertical and horizontal directions by the vibration generator 930, it is possible to prevent the powders from accumulating to a certain thickness or more in a specific portion on the surface of the horizontal electrode 920.

[0345] In addition, in order to give an effect of hitting the horizontal electrode 920 by the vibration generator 930, it is not necessary to completely remove the powders from the surface of the horizontal electrode 920, float them, and then re-adsorb them. Therefore, compared with the case of floating the powders, the processing time is shortened and the loss of the powders is prevented.

[0346] In addition, since the powders can move relative to each other while being adsorbed on the surface of the horizontal electrode 920, the powders are uniformly surface-treated by the plasma.

[0347] The step of surface-treating by the plasma is performed for a preset time.

[0348] If there is a horizontally disposed electrode 920 on the rack 911 that has completed surface treatment among the plurality of horizontally disposed electrodes 920 mounted on the rack 911, the rack elevating means (not shown) moves the horizontally disposed electrode 920 that has completed surface treatment to a predetermined unloading position. The unloading position is set in advance to the height of the unloading conveyor 962.

[0349] The horizontally disposed electrode 920 that has completed surface treatment is removed from the rack 911 by the transfer jig 965.

[0350] The unloading conveyor 962 moves the horizontally disposed electrode 920 removed from the rack 911 outside the chamber 910.

[0351] The powder recovery unit 964 recovers the powder surface-treated on the surface of the horizontally disposed electrode 920.

[0352] The horizontally disposed electrode 920 from which the powder has been recovered moves to the loading conveyor 961 and is re-loaded.

[0353] As described above, since the plasma apparatus for powder surface treatment according to the present invention has a structure in which a plurality of the horizontally disposed electrodes 920 are stacked, the structure is very simple, and the capacity that can be processed at one time can be maximized according to the number of stacked horizontally disposed electrodes 920.

[0354] In addition, since the surface treatment is performed with the powder placed on the upper surface of the horizontally disposed electrode 920, the powder that is discarded without being processed is minimized as compared with the case where the powder is floated and then adsorbed. Further, since the step of repeatedly completely removing the powder from the surface of the horizontally disposed electrode 920, floating it, and dispersing it is unnecessary, the processing efficiency is improved.

[0355] In addition, by applying vibration to the horizontal electrode 920 using the vibration generator 930, the adsorption force (B) adsorbed on the surface of the horizontal electrode 920 and the dispersion force (A) away from the horizontal electrode 920 can be appropriately adjusted. Therefore, the powders can move relative to each other without being blown off from the surface of the horizontal electrode 920, and the entire powders can be uniformly subjected to plasma surface treatment.

[0356] On the other hand, FIG. 27 is a drawing schematically showing a plasma device for powder surface treatment using a horizontal electrode according to the tenth embodiment of the present invention.

[0357] Referring to FIG. 27, in the plasma device for powder surface treatment using a horizontal electrode according to the tenth embodiment of the present invention, at least a part of the horizontal electrode 921 is formed in a concave dish shape. The second electrode portion includes the rack 911 and a cover electrode 950 coupled to the rack 911 and arranged to face the horizontal electrode 921, which is different from the ninth embodiment. The remaining configurations and operations are similar. Therefore, the following detailed description of the similar configurations is omitted, and the different points will be described in detail.

[0358] The cover electrode 950 is coupled to the rack 911 and electrically connected to the rack 911. That is, the cover electrode 950 and the rack 911 have the same potential.

[0359] The cover electrode 950 is arranged to face the horizontal electrode 921 at a position spaced upward from the upper surface of the horizontal electrode 921 by a predetermined distance.

[0360] The cover electrode 950 is described by way of example as being in a panel shape arranged horizontally so as to face the portion of the horizontal electrode 921 where the powder is placed. However, it is not limited thereto, and the size and shape of the cover electrode 950 can be variously changed and applied.

[0361] The cover electrode 950 will be described by way of example as being coupled to the rack 911 only at one end. However, it is not limited thereto, and both ends of the cover electrode 950 can be fixed as long as a predetermined plasma discharge space can be formed between the cover electrode 950 and the horizontal electrode 921. The vertical isolation distance between the cover electrode 950 and the horizontal electrode 921 can be set in advance as the distance at which the plasma discharge efficiency is the highest through experiments or the like.

[0362] In the present embodiment, since the plurality of horizontal electrodes 921 are stacked with a space therebetween in the vertical direction, the cover electrode 950 is disposed between the plurality of horizontal electrodes 921.

[0363] In the present embodiment, an RF power source is applied to the horizontal electrode 921, and the rack 911 and the cover electrode 950 will be described by way of example as being grounded. That is, the rack 911 and the cover electrode 950 serve as ground electrodes.

[0364] As described above, if a power source is applied to the horizontal electrode 921 and the cover electrode 950 is grounded, plasma is more likely to be generated between the horizontal electrode 921 and the cover electrode 950, so that the effect of surface treatment of the powder is maximized.

[0365] In the above embodiment, the first electrode portion is described by way of example as being applied with an RF power source, and the second electrode portion is described as being grounded. However, it is not limited thereto, and a predetermined alternating current (AC) power source can also be applied between the first electrode portion and the second electrode portion.

[0366] On the other hand, FIG. 28 is a drawing schematically showing a plasma device for powder surface treatment using a horizontal electrode according to the 11th embodiment of the present invention. FIG. 29 is a drawing schematically showing the horizontal electrode shown in FIG. 28.

[0367] Referring to FIGS. 28 and 29, the plasma device for powder surface treatment according to the 11th embodiment of the present invention includes a chamber 1010, a horizontal electrode 1020, a vibration generator 1030, a reaction gas supply unit 1040, and a coating source supply unit 1050.

[0368] The powder includes nano- or micro-sized powders such as carbon nanotubes and graphene.

[0369] The chamber 1010 houses the horizontal electrode 1020 therein and forms a space where plasma is generated. A gas supply unit (not shown) for supplying external gas is connected to the chamber 1010.

[0370] The description will be given by way of example that a rack 1011 into which the horizontal electrode 1020 is inserted is provided inside the chamber 1010.

[0371] The rack 1011 may be fixedly provided inside the chamber 1010, or may be provided so as to be pullable out of the chamber 1010. After inserting the horizontal electrode 1020, it is also possible to pull it in again.

[0372] The horizontal electrode 1020 is a power electrode to which power is applied from a power supply device (not shown). When RF power is applied to the horizontal electrode 1020 from the power supply device (not shown) and gas is supplied into the chamber 1010 from the gas supply unit (not shown), plasma is generated inside the chamber 1010.

[0373] In this embodiment, the description will be given by way of example that the chamber 1010 or the rack 1011 is a ground electrode. However, it is not limited thereto, and it may be configured such that the one side and the other side of the horizontal electrode 1020 are different electrodes having a potential difference to generate plasma.

[0374] The plasma generated by the horizontal electrode 1020 surface-treats and functionalizes the powder. The surface functionalization of the powder disperses the powder so that the powders do not aggregate without degrading the existing physical properties, while improving the interfacial bonding force with dissimilar materials different from the powder.

[0375] The horizontal electrode 1020 is arranged horizontally in the chamber 1010, and at least a part of the upper surface is formed in a flat plate shape so that the powder can be placed thereon.

[0376] However, it is not limited to this. The horizontal electrode 1020 can be variously modified and applied as long as it has a shape on which the powder can be placed, such as a disc or a container shape. For example, as shown in FIG. 31, the horizontal electrode 1020' can also be formed flat only in at least a part thereof.

[0377] Also, the horizontal electrode 1020 can be manufactured from various materials such as metal, polymer, and ceramic. The horizontal electrode 1020 can also be manufactured from aluminum among metals, and is lighter and cost-saving compared to other metals such as stainless steel.

[0378] Also, a plurality of the horizontal electrodes 1020 are stacked and arranged so as to have a separation space from each other in the vertical or horizontal direction. In the present embodiment, a plurality of the horizontal electrodes 1020 will be described by way of example as being inserted into the rack 1011 with a separation in the vertical direction. The number of stacked layers of the horizontal electrode 1020 can be adjusted according to the processing capacity.

[0379] The vibration generator 1030 is a device for applying vibration to the horizontal electrode 1020 so that the positions of the powders change relative to each other on the upper surface of the horizontal electrode 1020, thereby uniformly surface-treating the powders. The vibration generator 1030 can generate vibrations such as the effect of hitting the lower part of the horizontal electrode 20, and can change the positions of the powders located relatively close to and far from the surface of the horizontal electrode 1020. Therefore, the powders placed on the upper surface of the horizontal electrode 1020 are uniformly surface-treated. In this embodiment, the vibration generator 1030 will be described by way of example as being connected to the rack 1011 and applying vibration to the rack 1011, and the vibration of the rack 1011 will cause vibration to be applied to the horizontal electrode 1020.

[0380] The vibration generator 1030 can generate at least one of mechanical vibration, acoustic vibration, and ultrasonic vibration and apply the vibration to the horizontal electrode 1020. Also, the vibration generator 1030 can apply vibration so that the horizontal electrode 1020 performs various behaviors such as up and down, left and right, rotation, and gyro motion. Also, the vibration generator 1030 can apply vibration discontinuously or periodically.

[0381] The vibration generator 1030 will be described by way of example as generating mechanical vibration when power is applied by the power supply device. However, it is not limited to this, and the vibration generator can also use an ultrasonic vibrator or an acoustic vibration module.

[0382] When the power is applied, the vibration generator 1030 includes at least one of a vibration motor (not shown) that applies vibration to the horizontal electrode 1020 by rotational force, an air knocker (not shown) that moves a piston by compressed air to apply vibration to the horizontal electrode 1020, and an electronic hammer (not shown) that applies vibration to the horizontal electrode 1020 using the electromagnetic force generated when the power is applied. However, it is not limited thereto, and the vibration generator 1030 can apply vibration so that the horizontal electrode 1020 performs various behaviors such as vertical, horizontal, rotational, and gyro motions. Also, the vibration generator 1030 can apply vibration discontinuously or periodically.

[0383] The vibration motor (not shown) is a device that generates vibration by eccentric rotational motion by connecting an eccentric shaft to the rotation shaft of the motor, and is connected to the horizontal electrode 1020 by a connecting member.

[0384] The air knocker (not shown) is a device that moves a piston forward by compressed air supplied inside a housing, transmits the impact force caused by the forward movement of the piston to the horizontal electrode 1020, and generates vibration in the horizontal electrode 1020. The air knocker (not shown) is arranged so as to abut against the horizontal electrode 1020.

[0385] The electronic hammer (not shown) is a device that includes an E-core and an I-core inside, and generates vibration in the horizontal electrode 1020 using the electromagnetic force generated between the E-core and the I-core when the power is applied.

[0386] Also, the plasma device for powder surface treatment includes a control unit (not shown) that controls the operation of the vibration generator 1030 according to the amount of powder placed on the horizontal electrode 1020 and adjusts the intensity of the vibration applied to the horizontal electrode 1020.

[0387] On the one hand, the reaction gas supply unit 1040 supplies a plasma reaction gas into the chamber 1010. The reaction gas supply unit 1040 includes a reaction gas tank 1041, a reaction gas supply channel 1042 connecting the reaction gas tank 1041 and the chamber 1010, and a reaction gas valve 1043 for adjusting the flow rate of the reaction gas passing through the reaction gas supply channel 1042.

[0388] The reaction gas supply unit 1040 will be described by way of example as supplying a plasma reaction gas into the chamber 1010. However, it is not limited thereto, and the reaction gas supply channel 1042 may be formed to supply onto the upper surface of the horizontal electrode 1020. In the present embodiment, since there are a plurality of the horizontal electrodes 1020, the reaction gas supply channel 1042 may be branched into a plurality of channels toward the upper surfaces of the plurality of horizontal electrodes 1020, and the plasma reaction gas may be supplied to the upper surfaces of the horizontal electrodes 102 respectively.

[0389] The coating source supply unit 1050 includes a coating source bubbler 1051, a coating source supply channel 1052 connecting the coating source bubbler 1051 and the chamber 1010, and a coating source valve 1053 for adjusting the flow rate of the coating source passing through the coating source supply channel 1052.

[0390] The coating source bubbler 1051 is a device for heating a liquid coating source through adiabatic heating and supplying it in a gaseous state at the heated temperature.

[0391] The coating source supply channel 1052 is connected to the reaction gas supply channel 1042, and an example will be given to illustrate that the coating source is supplied together with the plasma reaction gas. However, it is not limited thereto, and the coating source supply channel 1052 may be provided separately from the reaction gas supply channel 1042. Further, the coating source supply channel 1052 can supply the coating source into the chamber 1010, and can also supply it to the upper surfaces of the plurality of horizontal electrodes 1020 respectively.

[0392] For the coating source (precusor), for the SiO2 coating which is one of the oxides, a liquid precursor such as HDMSO (Hexamethyldisiloxane) can be used, and for the carbon-based coating, any one of a liquid precursor containing a component capable of carbon coating or vaporizing and injecting solid carbon can be used.

[0393] FIG. 30 is a drawing showing an example in which the plasma device for powder surface treatment according to the 11th embodiment of the present invention is performed in a semi-continuous process.

[0394] Referring to FIG. 30, the plasma device for powder surface treatment will be described by way of example as being performed in a semi-continuous process, and further includes a loading conveyor 1061, an unloading conveyor 1062, a rack lifting means (not shown), a powder supply unit 1063, and a powder recovery unit 1064.

[0395] The loading conveyor 1061 is a moving device that moves the horizontal electrode 1020 mounted on the moving jig 1065 toward the inside of the chamber 1010.

[0396] The unloading conveyor 1062 is a moving device that pulls out and moves the horizontal electrode 1020 whose powder surface treatment has been completed from the chamber 1010.

[0397] The above-described rack lifting means (not shown) is a device for lifting or lowering the horizontal electrodes 1020 that have undergone powder surface treatment among the plurality of horizontal electrodes 1020 mounted on the rack 1011 to the height of the unloading conveyor 1062.

[0398] The powder supply unit 1063 is a device for supplying the powder onto the upper surface of the horizontal electrode 1020. The powder supply unit 1063 is provided separately from the chamber 1010 and supplies the powder onto the upper surface of the horizontal electrode 1020 before the horizontal electrode 1020 enters the chamber 1010. That is, the powder supply unit 1063 will be described by way of example as being provided above the loading conveyor 1061. However, it is not limited thereto, and the powder supply unit 1063 may be provided inside the chamber 1010 and supply the powder onto the upper surface of the horizontal electrode 1020 in a state where the horizontal electrode 1020 is disposed in the chamber 1010. Further, the powder supply unit 1063 may be arranged for each of the spaced-apart spaces between the plurality of horizontal electrodes 1020 and inject the powder into the spaced-apart spaces all at once, or a single powder injector (not shown) may be provided so as to be movable in the vertical direction and continuously inject while moving for each of the spaced-apart spaces between the horizontal electrodes 1020. Further, the powder injector (not shown) may also inject powder inside the chamber 1010.

[0399] The powder recovery unit 1064 is a device for recovering the powder that has undergone powder surface treatment on the upper surface of the horizontal electrode 1020. The powder recovery unit 1064 is provided separately from the chamber 1010 and recovers the powder from the horizontal electrode 1020 that has exited the chamber 1010. That is, the powder recovery unit 1064 will be described by way of example as being provided above the unloading conveyor 1062. However, it is not limited thereto, and the powder recovery unit 1064 may also be provided inside the chamber 1010.

[0400] The operation of the plasma device for powder surface treatment using the horizontal electrode according to the 11th embodiment of the present invention configured as described above will be described as follows.

[0401] Referring to FIG. 30, when the horizontal electrode 1020 is placed on the loading conveyor 1061, the powder supply unit 1063 supplies powder onto the upper surface of the horizontal electrode 1020.

[0402] The loading conveyor 1061 moves the horizontal electrode 1020 with the powder thereon into the chamber 1010.

[0403] The horizontal electrode 1020 that has moved into the chamber 1010 is inserted into the rack 1011.

[0404] At this time, the rack lifting means (not shown) raises or lowers the rack 1011 so that the empty slot where the horizontal electrode 1020 is to be mounted comes to the predetermined loading position. The loading position is set in advance to be the same as the height of the loading conveyor 1061.

[0405] The horizontal electrode 1020 is coupled to the connector 1013 of the rack 1011 in a cartridge manner.

[0406] When the horizontal electrode 1020 is coupled to the connector 1013 of the rack 1011, the rack lifting means (not shown) returns the rack 1011 to its original position where surface treatment is possible.

[0407] RF power is applied to the horizontal electrode 1020 from the power supply device 1040 through the connector 1013, and the rack 1011 is grounded.

[0408] When power is applied to the horizontal electrode 1020 and the rack 1011 is grounded, plasma is concentrated between the horizontal electrode 1020 and the rack 1011, so that surface treatment of the powder can be better performed on the upper surface of the horizontal electrode 1020.

[0409] Also, when the plasma reaction gas and the coating source are supplied, the coating source is uniformly and more strongly coated on the surface of the powder on the upper surface of the horizontal electrode 1020 by plasma polymerization. That is, by injecting the coating source together in a plasma discharge state, the gaseous coating source is better bonded and coated on the surface of the powder by the plasma polymerization.

[0410] Also, operate the vibration generator 1030.

[0411] When the vibration generator 1030 is operated, vibration is applied to the horizontal electrode 1020 through the rack 1011.

[0412] When vibration is applied to the horizontal electrode 1020, the powder on the upper surface of the horizontal electrode 1020 is uniformly surface-treated while the positions of the powder change relative to each other by the vibration. That is, the vibration generator 1030 generates an effect of hitting the horizontal electrode 1020, so that the positions of the powder located relatively close to the surface of the horizontal electrode 1020 and the powder located far away from the surface of the horizontal electrode 1020 repeatedly change relative to each other.

[0413] That is, referring to FIG. 29, an adsorption force (B) in a direction toward the surface of the horizontal electrode 1020 and a dispersion force (A) in a direction of bouncing outward from the surface of the horizontal electrode 1020 act on the powder placed on the horizontal electrode 1020. At this time, the adsorption force (B) and the dispersion force (A) can be adjusted by the vibration intensity of the vibration generator 1030. The adsorption force (B) and the dispersion force (A) can be calculated to have optimal values through experiments and the like. By appropriately adjusting the adsorption force (B) and the dispersion force (A), the powder can only move relative to each other without being blown off from the surface of the horizontal electrode 1020, and the entire powder can be uniformly subjected to plasma surface treatment.

[0414] Therefore, since the powder is dispersed while being displaced in the vertical and horizontal directions by the vibration generator 1030, it is possible to prevent the powder from accumulating to a thickness greater than a certain level at a specific portion on the surface of the horizontal electrode 1020.

[0415] In addition, in order to provide an effect of hitting the horizontal electrode 1020 by the vibration generator 1030, after completely removing the powder from the surface of the horizontal electrode 1020 and suspending and dispersing it, it is not necessary to adsorb it again. Therefore, compared with the case of suspending the powder, the processing time is shortened and the loss of the powder is prevented.

[0416] In addition, since the powder can be displaced while being adsorbed on the surface of the horizontal electrode 1020, the powder is uniformly surface-treated by the plasma.

[0417] In addition, the coating source is more uniform and strongly coated on the surface of the horizontal electrode 1020.

[0418] The step of surface-treating by the plasma is performed for a preset time.

[0419] If there is a horizontal electrode 1020 on which the surface treatment has been completed among the plurality of horizontal electrodes 1020 mounted on the rack 1011, the rack lifting means (not shown) moves the horizontal electrode 1020 on which the surface treatment has been completed to a preset unloading position. The unloading position is preset to the height of the unloading conveyor 1062.

[0420] The horizontal electrode 1020 on which the surface treatment has been completed is removed from the rack 1011 by the moving jig 1065.

[0421] The unloading conveyor 1062 moves the horizontal electrode 1020 removed from the rack 1011 to the outside of the chamber 1010.

[0422] The powder recovery unit 1064 recovers the powder surface-treated on the surface of the horizontal electrode 1020.

[0423] The horizontal electrode 1020 from which the powder has been recovered moves to the loading conveyor 1061 and is re-loaded.

[0424] As described above, since the plasma device for powder surface treatment according to the present invention has a structure in which a plurality of the horizontal electrodes 1020 are laminated, the structure is very simple, and the capacity that can be processed at one time can be maximized according to the number of laminations of the horizontal electrodes 1020.

[0425] In addition, since the surface treatment is performed with the powder placed on the upper surface of the horizontal electrode 1020, the powder that is discarded without being processed is minimized compared to the case where the powder is floated and then adsorbed. Also, since the process of completely removing the powder from the surface of the horizontal electrode 1020, floating it, and dispersing it repeatedly is not required, the processing efficiency is improved.

[0426] In addition, by applying vibration to the horizontal electrode 1020 using the vibrator 1030, the adsorption force (B) adsorbed on the surface of the horizontal electrode 1020 and the dispersing force (A) leaving the horizontal electrode 1020 can be appropriately adjusted. Therefore, the powder can move relative to each other without flying off the surface of the horizontal electrode 1020, and the entire powder can be uniformly subjected to plasma surface treatment.

[0427] On the other hand, FIG. 32 is a drawing schematically showing another example of the coating source supply unit in the plasma device for powder surface treatment according to the 11th embodiment of the present invention.

[0428] Referring to FIG. 32, the coating source supply unit may include a coating source injector 1055 that injects a gaseous coating source toward the horizontal electrode 1020.

[0429] The coating source injector 1055 is provided on each upper surface of the horizontal electrode 1020, and can inject the coating source toward the powder placed on each upper surface of the horizontal electrode 1020. Therefore, compared with the case of supplying the coating source into the chamber 1010, the loss of the coating source is minimized, and the phenomenon that parts other than the horizontal electrode 1020 are contaminated by the coating source is prevented.

[0430] The coating source injector 1055 is mounted on the rack 1011 and is described by way of example as being formed long in the horizontal direction so as to face the horizontal electrode 1020. However, it is not limited thereto, and the coating source injector 1055 can also be mounted on the side surface of the rack 1011 and inject laterally from the side surface of the rack 1011, and can also be provided so as to project upward from the horizontal electrode 1020 and inject downward toward the horizontal electrode 1020. That is, the coating source injector 1055 can be variously modified and applied as long as it has a structure capable of injecting the coating source toward the upper surface of the horizontal electrode 1020.

[0431] On the other hand, FIG. 33 is a drawing schematically showing a plasma device for powder surface treatment using a horizontal electrode according to the 12th embodiment of the present invention. FIG. 34 is a drawing schematically showing the horizontal electrode shown in FIG. 33.

[0432] Referring to FIGS. 33 and 34, the plasma device for powder surface treatment according to the 12th embodiment of the present invention includes a chamber 1110, a horizontal electrode 1120, a vibration generator 1130, and a powder pulverizing means 1140.

[0433] The powder includes nano- or micro-sized powders such as carbon nanotubes and graphene.

[0434] The chamber 1110 houses the horizontal electrode 1120 therein and forms a space where plasma is generated. A gas supply unit (not shown) for supplying external gas is connected to the chamber 1110.

[0435] As an example, a description will be given of a case where a rack 1111 into which the horizontal electrode 1120 is inserted is provided inside the chamber 1110.

[0436] The rack 1111 may be fixedly provided inside the chamber 1110, or may be provided so as to be pullable out of the chamber 1110. After inserting the horizontal electrode 1120, it is also possible to pull it in again.

[0437] The horizontal electrode 1120 is a power supply electrode to which power is applied from a power supply device (not shown). When RF power is applied to the horizontal electrode 1120 from the power supply device (not shown) and gas is supplied into the chamber 1110 from the gas supply unit (not shown), plasma is generated inside the chamber 1110.

[0438] In the present embodiment, as an example, the chamber 1110 or the rack 1111 is a ground electrode. However, the present invention is not limited to this, and the horizontal electrode 1120 may be configured to generate plasma by being composed of mutually different electrodes having a potential difference between one side and the other side.

[0439] The plasma generated by the horizontal electrode 1120 surface-treats and functionalizes the powder. The surface functionalization of the powder disperses the powders so that they do not aggregate without degrading the existing physical properties, but can improve the interfacial bonding force with different materials different from the powder.

[0440] The horizontal electrode 1120 is arranged horizontally in the chamber 1110, and at least a part of the upper surface is formed in a flat plate shape so that the powder can be placed thereon.

[0441] However, the present invention is not limited to this, and the horizontal electrode 1120 can be variously modified and applied as long as it has a shape on which the powder can be placed, such as a disk or a container shape. For example, as shown in FIG. 36, the horizontal electrode 1120' may be formed flat only in at least a part thereof.

[0442] In addition, the horizontal electrode 1120 can be manufactured from various materials such as metal, polymer, and ceramic. The horizontal electrode 1120 can also be manufactured from aluminum among metals, and is lighter than other metals such as stainless steel, reducing costs.

[0443] In addition, a plurality of the horizontal electrodes 1120 are stacked and arranged such that there are spaced-apart spaces from each other in the vertical or horizontal direction. In the present embodiment, the plurality of horizontal electrodes 1120 will be described by way of example as being inserted into the rack 1111 with a plurality of them spaced apart in the vertical direction. The number of stacked horizontal electrodes 1120 can be adjusted according to the processing capacity.

[0444] The vibration generator 1130 is a device for applying vibration to the horizontal electrode 1120 so that the positions of the powders change relative to each other on the upper surface of the horizontal electrode 1120, and for uniformly surface-treating the powders. The vibration generator 1130 generates vibration like the effect of hitting the lower part of the horizontal electrode 20, and can change the positions of the powders located relatively close and far from the surface of the horizontal electrode 1120 relative to each other. Therefore, the powders placed on the upper surface of the horizontal electrode 1120 are uniformly surface-treated. In the present embodiment, the vibration generator 1130 will be described by way of example as being connected to the rack 1111 and applying vibration to the rack 1111, and the vibration of the rack 1111 applies vibration to the horizontal electrode 1120.

[0445] The vibration generator 1130 can generate at least one of mechanical vibration, acoustic vibration, and ultrasonic vibration to apply vibration to the horizontal electrode 1120. In addition, the vibration generator 1130 can apply vibration so that the horizontal electrode 1120 performs various behaviors such as up and down, left and right, rotation, and gyro motion. In addition, the vibration generator 1130 can also apply vibration discontinuously or periodically.

[0446] The vibration generator 1130 will be described by way of example as generating mechanical vibrations when power is applied by the power supply device. However, it is not limited thereto, and the vibration generator may also use an ultrasonic vibrator or an acoustic vibration module.

[0447] The vibration generator 1130 includes at least one of a vibration motor (not shown) that applies vibration to the horizontal electrode 1120 by rotational force when power is applied, an air knocker (not shown) that moves a piston by compressed air to apply vibration to the horizontal electrode 1120, and an electronic hammer (not shown) that applies vibration to the horizontal electrode 1120 using the electromagnetic force generated when power is applied. However, it is not limited thereto, and the vibration generator 1130 can apply vibration so that the horizontal electrode 1120 performs various behaviors such as vertical, horizontal, rotational, and gyro motions. Also, the vibration generator 1130 can apply vibration discontinuously or periodically.

[0448] The vibration motor (not shown) is a device that generates vibration by eccentric rotational motion by connecting an eccentric shaft to the rotation shaft of the motor, and is connected to the horizontal electrode 1120 by a connecting member.

[0449] The air knocker (not shown) is a device that moves a piston forward by compressed air supplied inside a housing, transmits the impact force caused by the forward movement of the piston to the horizontal electrode 1120, and generates vibration in the horizontal electrode 1120. The air knocker (not shown) is arranged to abut against the horizontal electrode 1120.

[0450] The electronic hammer (not shown) is a device that includes an E-core and an I-core inside and generates vibration in the horizontal electrode 1120 using the electromagnetic force generated between the E-core and the I-core when power is applied.

[0451] In addition, the plasma device for powder surface treatment includes a control unit (not shown) that controls the operation of the vibration generator 1130 according to the amount of powder placed on the horizontal electrode 1120 to adjust the intensity of the vibration applied to the horizontal electrode 1120.

[0452] On the other hand, the powder grinding means 1140 mixes a grinding medium 1141 with the powder placed on the horizontal electrode 1120, and grinds the powder while the powder and the grinding medium collide during the surface treatment of the powder.

[0453] The powder grinding means 1140 will be described by way of example as a grinding medium supply unit that supplies the grinding medium 1141 to a powder supply unit 1163 described later. However, the present invention is not limited to this, and the powder grinding means 1140 can also directly supply the grinding medium 1141 to the upper surface of the horizontal electrode 1120.

[0454] In the present embodiment, the grinding medium 1141 will be described by way of example as being ball-shaped made of a metal material and larger than the size of the powder. However, the present invention is not limited to this, and the grinding medium 1141 can be the same size as the powder or smaller than the powder, and can have various shapes other than balls, such as beads. Further, at least a part of the grinding medium 1141 can be formed with different sizes and shapes from each other. That is, as long as the grinding medium 1141 grinds the powder while colliding with the powder, it can be applied with various changes in material, shape, and size.

[0455] FIG. 35 is a drawing showing an example in which the plasma device for powder surface treatment according to the 12th embodiment of the present invention is performed in a semi-continuous process.

[0456] Referring to FIG. 35, the plasma device for powder surface treatment will be described by way of example as being performed in a semi-continuous process, and further includes a loading conveyor 1161, an unloading conveyor 1162, a rack lifting means (not shown), a powder supply unit 1163, and a powder recovery unit 1164.

[0457] The loading conveyor 1161 is a moving device that moves the horizontal electrode 1120 mounted on the moving jig 1165 toward the inside of the chamber 1110.

[0458] The unloading conveyor 1162 is a moving device that pulls out and moves the horizontal electrode 1120 whose powder surface treatment has been completed from the chamber 1110.

[0459] The rack lifting means (not shown) is a device for lifting or lowering the horizontal electrode 1120 whose powder surface treatment has been completed among the plurality of horizontal electrodes 1120 mounted on the rack 1111 to the height of the unloading conveyor 1162.

[0460] The powder supply unit 1163 is a device that supplies the powder to the upper surface of the horizontal electrode 1120. The powder supply unit 1163 is provided separately from the chamber 1110 and supplies the powder to the upper surface of the horizontal electrode 1120 before the horizontal electrode 1120 enters the chamber 1110. That is, the powder supply unit 1163 will be described by way of example as being provided above the loading conveyor 1161. However, it is not limited thereto, and the powder supply unit 1163 may be provided inside the chamber 1110 and supply the powder to the upper surface of the horizontal electrode 1120 in a state where the horizontal electrode 1120 is arranged in the chamber 1110. Further, the powder supply unit 1163 may be arranged for each of the separation spaces between the plurality of horizontal electrodes 1120 and spray the powder into the separation spaces all at once, or one powder injector (not shown) may be provided so as to be movable in the vertical direction and continuously spray for each of the separation spaces between the horizontal electrodes 1120 while moving. Further, the powder injector (not shown) may also spray the powder inside the chamber 1110.

[0461] The powder recovery unit 1164 is a device for recovering the powder surface-treated on the upper surface of the horizontal electrode 1120. The powder recovery unit 1164 is provided separately from the chamber 1110 and recovers the powder from the horizontal electrode 1120 that has exited the chamber 1110. That is, the powder recovery unit 1164 will be described by way of example as being provided above the unloading conveyor 1162. However, it is not limited thereto, and the powder recovery unit 1164 may be provided inside the chamber 1110.

[0462] The operation of the plasma device for powder surface treatment using a horizontal electrode according to the 12th embodiment of the present invention configured as described above will be as follows.

[0463] Referring to FIG. 35, when the horizontal electrode 1120 is placed on the loading conveyor 1161, the powder supply unit 1163 supplies powder to the upper surface of the horizontal electrode 1120.

[0464] Here, since it will be described by way of example that the grinding medium 1141 is supplied from the grinding medium supply unit 1140 to the powder supply unit 1163, in the powder supply unit 1163, the powder and the grinding medium 1141 are mixed.

[0465] Therefore, the powder and the grinding medium are placed on the upper surface of the horizontal electrode 1120 through the powder supply unit 1163. However, it is not limited thereto, and the grinding medium may be supplied to the upper surface of the horizontal electrode 1120 after the powder is supplied, or may be separately supplied to the upper surface of the horizontal electrode 1120 inside the chamber 1110.

[0466] The loading conveyor 1161 moves the horizontal electrode 1120 on which the powder and the grinding medium are placed into the chamber 1110.

[0467] The horizontal electrode 1120 that has moved inside the chamber 1110 is inserted into the rack 1111.

[0468] At this time, the rack lifting means (not shown) raises or lowers the rack 1111 so that the empty column where the horizontal electrode 1120 is mounted comes to a predetermined loading position. The loading position is set in advance to be the same as the height of the loading conveyor 1161.

[0469] The horizontal electrode 1120 is coupled to the connector 1113 of the rack 1111 in a cartridge manner.

[0470] Once the horizontal electrode 1120 is coupled to the connector 1113 of the rack 1111, the rack lifting means (not shown) returns the rack 1111 to its original position where surface treatment is possible.

[0471] RF power is applied to the horizontal electrode 1120 from the power supply device 1140 through the connector 1113, and the rack 1111 is grounded.

[0472] When power is applied to the horizontal electrode 1120 and the rack 1111 is grounded, plasma is concentrated between the horizontal electrode 1120 and the rack 1111, so that the surface treatment of the powder can be better performed on the upper surface of the horizontal electrode 1120.

[0473] Also, when the vibrator 1130 is operated, vibration is applied to the horizontal electrode 1120 through the rack 1111.

[0474] When vibration is applied to the horizontal electrode 1120, the powder is uniformly surface-treated while the positions of the powder on the upper surface of the horizontal electrode 1120 change relative to each other due to the vibration. That is, the vibrator 1130 generates an effect of hitting the horizontal electrode 1120, so that the positions of the powder relatively close to and far from the surface of the horizontal electrode 1120 repeatedly change relative to each other.

[0475] That is, referring to FIG. 34, an adsorption force (B) in a direction toward the surface of the horizontal electrode 1120 and a dispersion force (A) in a direction bouncing outward from the surface of the horizontal electrode 1120 act on the powder placed on the horizontal electrode 1120. At this time, the adsorption force (B) and the dispersion force (A) can be adjusted according to the vibration intensity of the vibration generator 1130. The adsorption force (B) and the dispersion force (A) can be calculated to obtain optimal values through experiments or the like. By appropriately adjusting the adsorption force (B) and the dispersion force (A), the powder can only move relative to each other without flying off the surface of the horizontal electrode 1120, and the entire powder can be uniformly subjected to plasma surface treatment.

[0476] Therefore, since the powder is dispersed while moving in the vertical and horizontal directions by the vibration generator 1130, it is possible to prevent the powder from accumulating to a certain thickness or more in a specific portion of the surface of the horizontal electrode 1120.

[0477] In addition, in order to give the effect of hitting the horizontal electrode 1120 by the vibration generator 1130, after completely removing the powder from the surface of the horizontal electrode 1120, floating it, and dispersing it, there is no need to adsorb it again. Therefore, compared with the case of floating the powder, the processing time is shortened and the loss of the powder is prevented.

[0478] In addition, since the powder can move relative to each other while being adsorbed on the surface of the horizontal electrode 1120, the powder is uniformly surface-treated by plasma.

[0479] In addition, during the plasma surface treatment, when vibration is applied to the horizontal electrode 1120, the powder and the grinding medium 1141 collide with each other, and the powder is ground and dispersed into smaller particles. Therefore, the effect of mechanical grinding can be obtained by the grinding medium 1141, and the efficiency of surface treatment can be increased.

[0480] The process of surface treatment by the plasma is performed for a preset time.

[0481] If there is a horizontally disposed electrode 1120 on the rack 1111 that has completed surface treatment among the plurality of horizontally disposed electrodes 1120 mounted on the rack 1111, the rack lifting means (not shown) moves the horizontally disposed electrode 1120 that has completed surface treatment to a predetermined unloading position. The unloading position is set in advance to the height of the unloading conveyor 1162.

[0482] The horizontally disposed electrode 1120 that has completed surface treatment is removed from the rack 1111 by the transfer jig 1165.

[0483] The unloading conveyor 1162 moves the horizontally disposed electrode 1120 removed from the rack 1111 outside the chamber 1110.

[0484] The powder recovery unit 1164 recovers the powder surface-treated on the surface of the horizontally disposed electrode 1120.

[0485] The horizontally disposed electrode 1120 from which the powder has been recovered moves to the loading conveyor 1161 and is re-loaded.

[0486] As described above, since the plasma device for powder surface treatment according to the present invention has a structure in which a plurality of the horizontally disposed electrodes 1120 are stacked, the structure is very simple, and the capacity that can be processed at one time can be maximized depending on the number of stacked horizontally disposed electrodes 1120.

[0487] In addition, since the surface treatment is performed with the powder placed on the upper surface of the horizontally disposed electrode 1120, the powder that is discarded without being processed is minimized compared to the case where the powder is floated and then adsorbed. Further, since the step of completely removing the powder from the surface of the horizontally disposed electrode 1120, floating it, and dispersing it repeatedly is unnecessary, the processing efficiency is improved.

[0488] In addition, by applying vibration to the horizontal electrode 1120 using the vibration generator 1130, the adsorption force (B) adsorbed on the surface of the horizontal electrode 1120 and the dispersion force (A) away from the horizontal electrode 1120 can be appropriately adjusted. Therefore, the powder can be displaced relative to each other without being blown off the surface of the horizontal electrode 1120, and the entire powder can be uniformly subjected to plasma surface treatment.

[0489] The present invention has been described with reference to the embodiments shown in the drawings, but these are merely exemplary, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible. Therefore, the true technical protection scope of the present invention must be determined by the technical idea of the claims.

Industrial Applicability

[0490] According to the present invention, a plasma apparatus for powder surface treatment using a horizontal electrode capable of performing surface treatment more quickly and uniformly can be manufactured.

Claims

1. A horizontal electrode is provided horizontally inside the chamber that forms the space where plasma is generated, with at least a portion of its upper surface formed flat so that powder can be placed on it, and which generates plasma when power is applied to surface-treat the powder and make it functional. A vibration generator for uniformly surface-treating the powder by applying vibration to the horizontal electrode so that the positions of the powder particles change relative to each other on the upper surface of the horizontal electrode, A plasma apparatus for powder surface treatment that utilizes horizontal electrodes, including a plasma device for powder surface treatment.

2. The vibration generator is, Plasma apparatus for powder surface treatment using a horizontal electrode according to claim 1, wherein the horizontal electrode is capable of vibrating in at least one of the following directions: up and down, left and right, rotation and gyroscopic motion.

3. The vibration generator is, A plasma apparatus for powder surface treatment using a horizontal electrode according to claim 2, comprising a vibration motor connected to the horizontal electrode and applying vibration to the horizontal electrode by rotational force when power is applied.

4. Plasma apparatus for powder surface treatment using a horizontal electrode according to claim 1, further comprising a heater for applying heat to the horizontal electrode to remove residual moisture from the powder.

5. Plasma apparatus for powder surface treatment utilizing a horizontal electrode according to claim 1, further comprising a magnetic field generator that generates a magnetic field around the horizontal electrode to increase the plasma density.

6. The aforementioned magnetic field generator is A plasma apparatus for powder surface treatment using a horizontal electrode according to claim 5, comprising a magnet attached to the horizontal electrode.

7. The aforementioned magnetic field generator is A plasma apparatus for powder surface treatment utilizing horizontal electrodes according to claim 5, comprising a plurality of magnets that are ring-shaped with different sizes, arranged at predetermined distances apart from each other in the radial direction, and having alternating north and south poles.

8. Plasma apparatus for powder surface treatment using a horizontal electrode according to claim 1, wherein at least a portion of the upper surface of the horizontal electrode is textured with a predetermined texture pattern to have a predetermined surface roughness.

9. The chamber further includes a second electrode portion provided inside the chamber, which generates a plasma discharge between itself and the first electrode portion including the horizontal electrode, The plasma apparatus for powder surface treatment using a horizontal electrode according to claim 1, wherein the second electrode portion includes a rack provided inside the chamber and formed such that the horizontal electrode is detachably coupled to it.

10. The second electrode portion is, Plasma apparatus for powder surface treatment using a horizontal electrode according to claim 9, further comprising a cover electrode coupled to the rack, electrically connected to the rack and having the same potential, and positioned opposite the horizontal electrode at a predetermined distance above the upper surface of the horizontal electrode.

11. The aforementioned rack includes: The horizontal electrode is coupled to a connector that is connected to a power supply unit, A plasma apparatus for powder surface treatment using a horizontal electrode according to claim 9, comprising an insulating portion for insulating the gap between the connector and the rack.

12. Multiple horizontal electrodes are detachably coupled to the rack and arranged stacked apart from each other in the vertical direction. The plasma apparatus for powder surface treatment using horizontal electrodes according to claim 10, wherein the cover electrodes are arranged in multiples between the multiple horizontal electrodes.

13. A reaction gas supply unit that supplies plasma reaction gas to the inside of the chamber, A coating source supply unit provides a gaseous coating source inside the chamber to coat the surface of the powder by plasma polymerization during plasma generation, A plasma apparatus for powder surface treatment utilizing a horizontal electrode, further comprising the horizontal electrode described in claim 1.

14. A plasma apparatus for powder surface treatment using a horizontal electrode according to claim 1, further comprising a powder grinding means for mixing a grinding medium with the powder, and when power is applied to the horizontal electrode and vibration is applied, the powder and the grinding medium collide to grind the powder.

15. The aforementioned grinding medium is A plasma apparatus for powder surface treatment using horizontal electrodes according to claim 14, wherein at least a portion of the electrodes are formed to differ in size and shape from one another.

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