Dynamic vacuum sealing system for physical vapor deposition sputtering applications

Abstract

A vacuum seal and seal system are provided that include a corresponding insulating ring and a corresponding sputtering target. The seal and seal system may be used in PVD sputtering applications. The seal may include a compressible portion and a rigid portion. The compressible portion may include two or more high-profile protrusions and two or more low-profile recesses that facilitate the formation of a vacuum seal by compression between the insulating ring and themselves by the sputtering target. The seal may further include a removable and replaceable plasma shield attachable to a first end of the seal. The seal may further include a rim at a second end that is selectively coupled to a corresponding step of the insulating ring. The sputtering target may have a continuous peripheral flange surface. In one embodiment, the seal and seal system are self-centering.

Description

Technical Field

[0001] [Cross - Reference to Related Applications] This application claims priority to U.S. Patent Application No. 63 / 367,914, filed on July 8, 2022, entitled "Dynamic Vacuum Seal System for Physical Vapor Deposition Sputter Applications", which is hereby incorporated by reference in its entirety.

[0002] [Field of the Invention] The present disclosure generally relates to a dynamic vacuum seal system for physical vapor deposition sputter applications, and more specifically, to a vacuum seal and seal system that includes a corresponding insulating ring and a corresponding sputtering target, and in which an O - ring, a corresponding groove or vent slot or scallop is not incorporated into the sputtering target.

Background Art

[0003] [Background] Physical vapor deposition (PVD) is a thin - film deposition technology used in manufacturing processes to create coatings and coating patterns on a desired surface substrate. In this technology, the sputtering method can be used to transfer materials from a solid source (e.g., a sputtering target) to the substrate surface in a vacuum environment. PVD can be used for depositing thin - film layers in various applications such as semiconductor manufacturing, glass coating, optical coating, solar cell coating, and nanotechnology. Sputtering in a vacuum environment can be further used to perform sputter cleaning such as ion plating.

[0004] As an example, in PVD, high-energy particles such as ions and plasma can be made to collide with a sputtering target, releasing atoms and molecules from the target surface, thereby vaporizing them in a vacuum chamber. Subsequently, the vaporized particles move through the vacuum chamber and deposit on the substrate surface, forming a thin film layer on the substrate surface. The sputtering target is consumed and has a limited lifespan based on its erosion characteristics and the materials available. The composition of the deposited film is determined by the composition of the material of the sputtering target. The composition of the material of the sputtering target can be selected so as to obtain desired characteristics such as conductivity, optical properties, and adhesiveness.

[0005] In a PVD process, usually, a high-vacuum environment is required to minimize gas interference and unwanted reactions, but the realization and maintenance of a high-vacuum environment can be technically difficult and costly. Also, the presence of residual gases and contaminants can affect the quality and properties of the deposited film. To maintain the integrity of the vacuum, prevent air and other gases from entering and exiting the vacuum chamber and disturbing the controlled environment, minimize system contamination, provide system stability for the accuracy and reliability of processes carried out in a high-vacuum environment, and meet other considerations such as safety assurance and energy efficiency, an appropriate seal is required. Summary of the Invention Means for Solving the Problems

[0006] [Summary] The following presents an overview of the present disclosure in order to provide a basic understanding of some aspects. This overview is not intended to identify key or critical elements nor to define limitations of embodiments or claims. Further, this overview may present a simplified summary of some aspects, which may be described in more detail elsewhere in the present disclosure. Any of the described aspects may be separated without being limited to the same effects or combined with other described aspects as if explicitly described in every possible combination.

[0007] A vacuum seal and seal system are disclosed that include a corresponding insulating ring and a corresponding sputtering target. The seal and seal system may be used in PVD sputtering applications. In one embodiment, the seal and seal system do not incorporate an O-ring, a corresponding groove or vent slot or scallop, or other shapes or features having a similar function. The seal may include a compressible portion and a rigid portion. The compressible portion may include two or more high-profile protrusions and two or more low-profile recesses. This facilitates the formation of a vacuum seal by compression between the insulating ring and the sputtering target. The rigid portion may be sealed with the same material as the compressible portion. The seal may further include a removable and replaceable plasma shield attachable to a first end of the seal. The seal may further include a rim at a second end that selectively contacts a corresponding step of the insulating ring. The sputtering target may have a continuous peripheral flange surface. In one embodiment, the seal and seal system are self-centering. In one embodiment, the seal and seal system expand a seal surface or interface surface. In one embodiment, the seal and seal system provide a buffer between the sputtering target and the insulating ring.

[0008] In an exemplary embodiment of the present invention, a seal ring for a physical vapor deposition (PVD) vacuum chamber is disclosed. The seal ring includes a compressible portion including at least one protrusion and at least one recess; a rigid portion adjacent to the compressible portion and having ribs substantially sealed with a secondary material; a rim extending from a first surface of the seal ring and configured to selectively couple with an insulating ring; and a removable shield configured to selectively couple with a first end of the compressible portion and configured to insulate the compressible portion from the interior of the vacuum chamber.

[0009] In a further aspect, the compressible portion may be made of a fluorocarbon, fluorosilicone, and / or fluororubber material. In a further aspect, the secondary material may be the same material as the compressible portion and the rim. In a further aspect, the at least one protrusion may extend beyond the first surface and a second opposite surface of the seal ring. In a further aspect, the at least one recess may terminate in front of the first surface and a second opposite surface of the seal ring. In a further aspect, each of the at least one protrusion and each of the at least one recess may be alternately arranged. In a further aspect, the compressible material and the at least one recess may be configured to capture particles.

[0010] In a further aspect, the rib of the rigid portion may be composed of aluminum. In a further aspect, the compressible portion and the rigid portion may be substantially the same. In a further aspect, the shield may be configured to elastically engage with the first end of the compressible portion. In a further aspect, the shield may be configured to suppress plasma arc discharge and thermal degradation of the compressible portion. In a further aspect, the shield may include polytetrafluoroethylene. In a further aspect, the rim may further include a plurality of retaining tabs. In a further aspect, the seal ring may be configured to selectively contact the insulating ring by interference fit, thereby forming a seal between the seal ring and the insulating ring when installed in the PVD vacuum chamber.

[0011] In a further aspect, the seal ring may be configured to be automatically centered with respect to the insulating ring using the plurality of retaining tabs on the rim and a stepped portion of the insulating ring cut at approximately 90 degrees. In a further aspect, the second surface of the seal ring may be configured to selectively contact a sputtering target, thereby forming a seal between the seal ring and the sputtering target when installed in the PVD vacuum chamber. In a further aspect, the sputtering target may have no grooves, vent slots, and scallops, and the sputtering target may be configured to contact the seal ring with a flat surface. In a further aspect, the seal ring may be configured to provide a buffer between the sputtering target and the insulating ring.

[0012] In yet another embodiment, there is provided a sputtering target including a first surface configured to selectively contact a seal ring on a PVD vacuum chamber, wherein the first surface has no grooves, vent slots, and scallops, and the first surface is configured to contact the seal ring with a flat surface. In another aspect, the first surface may be configured to be insulated from an insulating ring, and the insulating ring may be configured to selectively contact the opposite side of the seal ring on the vacuum chamber when installed in the PVD vacuum chamber.

[0013] In yet another embodiment, there is provided an insulating ring including a generally flat first surface configured to selectively contact a compressible portion and a rigid portion of a seal ring when installed in a PVD vacuum chamber, and a step portion configured to selectively contact a rim of the seal ring when installed in the PVD vacuum chamber. In yet another aspect, the step portion may have a notch of about 90 degrees.

[0014] In yet another embodiment, there is provided a sealing kit for a vacuum chamber. The sealing kit may include the following.

[0015] A seal ring including a compressible portion, a rigid portion adjacent to the compressible portion, and a rim extending perpendicularly from the rigid portion. An insulating ring configured to selectively contact a first joint surface of the insulating ring including the rim, the insulating ring including a notch configured to selectively receive the rim of the seal ring and contact the rim of the seal ring, thereby forming a seal between the insulating ring and the seal ring when installed in a PVD vacuum chamber. A sputtering target including a substantially flat first joint surface configured to selectively contact a second joint surface of the seal ring, thereby forming a seal between the sputtering target and the seal ring when installed in a PVD vacuum chamber.

[0016] In another aspect, there may be no grooves, vent slots, and scallops on the first joint surface of the sputtering target. In yet another aspect, the compressible portion may include at least one protrusion and at least one recess, and each of the at least one protrusion and each of the at least one recess may be alternately arranged. In a further aspect, the ribs of the rigid portion may be suspended within the same material that constitutes the compressible material and the rim. In yet another aspect, the seal ring may further include a plasma shield configured to be attached to the inner peripheral side of the compressible portion.

[0017] In a further aspect, each of the sputtering target and the insulating ring may form a seal with the seal ring. In another aspect, the sputtering target and the insulating ring may be insulated from each other by the seal ring.

[0018] In another embodiment, a method of assembling a sealing kit is provided. The method includes disposing an insulating ring in a PVD vacuum chamber, the insulating ring including a step on a joint surface; disposing a seal ring on the joint surface of the insulating ring, the seal ring having a first joint surface and a second joint surface on the opposite side of the first joint surface, the first joint surface of the seal ring including a rim configured to selectively couple with the step of the insulating ring, the first joint surface of the seal ring contacting the joint surface of the insulating ring; disposing a sputtering target on the second joint surface of the seal ring, the seal ring including a compressible portion and a shield, the sputtering target being configured to compress the compressible portion and the shield of the seal ring, wherein the insulating ring and the seal ring form a seal when installed in the PVD vacuum chamber, and the seal ring and the sputtering target form a seal when installed in the PVD vacuum chamber. In a further aspect, the sputtering target and the insulating ring may be insulated from each other by the seal ring.

[0019] Also disclosed is a sealing kit for a physical vapor deposition (PVD) vacuum chamber. The sealing kit includes a seal ring for the PVD vacuum chamber, the seal ring including a compressible portion including at least one protrusion and at least one recess, a rigid portion adjacent to the compressible portion, the rigid portion having ribs substantially sealed with a secondary material, a rim extending from a first surface of the seal ring and configured to selectively couple with an insulating ring, and a removable shield configured to selectively couple with a first end of the compressible portion and configured to insulate the compressible portion from the interior of the vacuum chamber.

[0020] The insulating ring has a generally flat first surface configured to selectively contact the compressible portion and the rigid portion of the seal ring when installed in the PVD vacuum chamber, and a stepped portion configured to selectively contact the rim of the seal ring when installed in the PVD vacuum chamber. The sputtering target has a first surface with a peripheral flange surface configured to contact the seal ring when installed in the PVD vacuum chamber, and the peripheral flange surface of the first surface has no O-ring groove, vent slot, and scallop, and the peripheral flange surface of the first surface is configured to contact the seal ring with a flat surface.

[0021] The following description and drawings disclose various exemplary embodiments. Some improvements and novel aspects may be specifically identified, and other aspects may be apparent from the description and drawings.

Brief Description of the Drawings

[0022] The present teachings can be better understood by referring to the following detailed description in conjunction with the following figures. In the figures, the same reference numerals refer to the same parts throughout.

[0023] FIG. 1A shows an embodiment of a conventional vacuum chamber and seal including an O-ring inserted into a double-tail groove formed in a sputtering target by machining.

[0024] FIG. 1B is an enlarged view of the conventional vacuum chamber and seal of FIG. 1A including an O-ring inserted into a double-tail groove formed in a sputtering target by machining.

[0025] Figures 1C to 1F show various embodiments of a conventional vacuum chamber and seal that include an O-ring inserted into a doubletail groove formed in a sputtering target by machining, and further include an inner vent slot (i), a scallop slot (ii), a cross ground vent slot (iii), and an outer vent slot (iv).

[0026] (A) to (F) of FIG. 2 are diagrams showing examples of arc discharge, oxidation, nodule formation, wear, and redeposition that may occur in the conventional vacuum chamber and seal of FIGS. 1A to 1C.

[0027] FIG. 3A is a diagram showing an embodiment of a seal and a seal system including an insulating ring and a sputtering target assembled on a vacuum chamber according to various aspects disclosed herein.

[0028] FIG. 3B is a diagram showing an embodiment of a seal and a seal system including an insulating ring and a sputtering target assembled on a vacuum chamber according to various aspects disclosed herein.

[0029] FIG. 4A is a top view showing an embodiment of a seal according to various aspects disclosed herein, and FIG. 4B is a bottom view showing an embodiment of a seal according to various aspects disclosed herein.

[0030] FIG. 5A is an enlarged top view showing an embodiment of a seal according to various aspects disclosed herein, and FIG. 5B is an enlarged bottom view showing an embodiment of a seal according to various aspects disclosed herein.

[0031] FIG. 6A is a cross-sectional top view showing an embodiment of a seal according to various aspects disclosed herein, FIG. 6B is a cross-sectional bottom view showing an embodiment of a seal according to various aspects disclosed herein, and FIG. 6C is a cross-sectional side view showing an embodiment of a seal according to various aspects disclosed herein.

[0032] FIG. 7 is a perspective view showing an embodiment of a sputtering target according to various aspects disclosed herein.

[0033] FIG. 8A is a top view showing an embodiment of an insulating ring according to various aspects disclosed herein, FIG. 8B is a cross-sectional side view showing an embodiment of an insulating ring according to various aspects disclosed herein, and FIG. 8C is an enlarged cross-sectional side view showing an embodiment of an insulating ring according to various aspects disclosed herein.

[0034] FIGS. 9A and 9B are views showing an embodiment of an insulating ring assembled on a vacuum chamber according to various aspects disclosed herein.

[0035] FIGS. 10A and 10B are views showing an embodiment of a seal assembled on an insulating ring and a vacuum chamber according to various aspects disclosed herein.

[0036] FIG. 11 is a view showing an embodiment of a sputtering target assembled on a seal, an insulating ring, and a vacuum chamber according to various aspects disclosed herein.

[0037] FIG. 12A is a view showing an embodiment of a vacuum chamber according to various aspects disclosed herein, and FIG. 12B is a view showing an embodiment of a sputtering target according to various aspects disclosed herein.

[0038] FIGS. 13A and 13B are views showing examples of post-life sputtering targets using the described seals and sealing systems according to various aspects disclosed herein.

[0039] (A) to (D) of FIG. 14 are views showing examples of post-life sputtering targets using the described seals and sealing systems according to various aspects disclosed herein.

[0040] Figures 15A - 15E are diagrams showing experimental data using the described seals and sealing systems according to various aspects disclosed herein.

[0041] The present invention can be implemented in several forms without departing from its spirit or essential characteristics. The scope of the present invention is defined not by the detailed description preceding the appended patent claims, but by the appended patent claims. Accordingly, all embodiments within the meaning of the claims and within the scope of equivalents are intended to be encompassed by the patent claims.

Mode for Carrying Out the Invention

[0042] [Detailed Description] Next, various exemplary embodiments of the present disclosure will be described in detail. Examples of the embodiments are shown in the accompanying drawings, and like - numbered aspects refer to common features throughout. It should be understood that other embodiments may be utilized and structural and functional changes may be made without departing from each scope of the present disclosure. Further, features of various embodiments may be combined or modified without departing from the scope of the present disclosure. Accordingly, the following description is presented for purposes of illustration only and is not intended to limit in any way the various alternatives and modifications that may be made to the embodiments illustrated within the spirit and scope of the present invention.

[0043] In the present disclosure, a number of specific details are provided to enable a complete understanding of the subject matter disclosed. It should be understood that the various aspects of the present disclosure may be implemented in other embodiments that do not necessarily include all of the aspects described herein.

[0044] As used herein, the terms "example" and "exemplary" mean an instance or illustration. The words "example" or "exemplary" do not indicate important or preferred aspects or embodiments. The word "or" is intended to be inclusive rather than exclusive, unless the context suggests otherwise. For example, the phrase "A adopts B or C" includes all inclusive permutations (e.g., A adopts B; A adopts C; or A adopts both B and C).

[0045] Furthermore, unless the context suggests otherwise, descriptions of shapes (e.g., circular, rectangular, triangular, etc.) refer to shapes that meet the definition of such shapes and general representations of such shapes. For example, a triangle or generally triangular includes shapes having three sides and three vertices, or shapes generally representing a triangle (e.g., shapes having three main sides with or without straight edges, shapes like triangles with rounded vertices, etc.).

[0046] A vacuum seal and seal system are disclosed that include corresponding insulating rings and corresponding sputtering targets. The seal and seal system can be used in PVD sputtering applications. In PVD sputtering applications, a sputtering target is used to transfer material under vacuum conditions. The material from the sputtering target is vaporized by colliding high-energy particles with the sputtering target, and the vaporized material is deposited on the substrate surface as a thin film layer. The sputtering target may be consumed during this process.

[0047] In the case of semiconductor applications, in one example, the sputtering target may be a material suitable for vaporization and deposition on a substrate, such as, but not limited to, copper. The vacuum chamber may be used to vaporize the material from the sputtering target and deposit that material on a substrate, for example, to form copper traces on a wafer. The transfer of material from the sputtering target to the substrate may be used to create conductive paths or insulating layers, or may be used to provide barrier properties, and may also be used in the manufacture of circuit boards or other electrical components. The vacuum state and seal between the sputtering target and the vacuum chamber are useful for performing PVD and providing a viable end product.

[0048] As shown in FIGS. 1A-1F, conventional seals in a PVD sputtering process generally may include an O-ring 13 inserted into an O-ring groove, such as, but not limited to, a double-tail groove, machined into a flange of the sputtering target 255. Such an O-ring may twist or rotate within the groove during assembly and the PVD process. As a result, during use over the life of the sputtering target 255, before the sputtering target 255 is worn out, the seal of the vacuum chamber 5 becomes insufficient and the reliability decreases. Further, the flange of the sputtering target 255 may generally include vent slots and / or scallops that cross the seal surface, or other shapes having a similar function. Refer to FIGS. 1C-1F, which show examples of inner vent slots 21, scallop slots 22, cross-ground vent slots 23, and outer vent slots 24.

[0049] However, these conventional features weaken the flange of the sputtering target 255 and can cause leakage between the atmosphere and the sputtering environment in the vacuum chamber 5, especially under high and sustained pressures. As the sputtering target is consumed and its mass decreases, the physical properties of the assembly can also be impaired. Arc discharge, oxidation, nodule formation, degradation, wear, redeposition, and particle generation often occur near or adjacent to the O-ring seal, vent slots, and / or scallops (see, for example, (A)-(F) of FIG. 2), which can lead to inefficiencies and failures of the system seal. Further, since the single O-ring 13 depends on a single discrete contact point, it can produce a single point fulcrum effect with the bottom contact surface 15a of the insulating ring 15 during the dynamic cycle of the sputtering target (A), resulting in the generation of a single point stress that can lead to a seal that is susceptible to wear and failure.

[0050] There is a need for improvements to vacuum chambers and vacuum sealing mechanisms for sputtering applications. There is a need for an improved vacuum seal that provides one or more (or all) of the following: preventing leaks during use throughout the life of the sputtering target and maintaining the vacuum seal; minimizing or preventing arc discharge, oxidation, nodule formation, degradation, wear, redeposition, and / or particle generation (and related PVD failures due to these events) during use throughout the life of the sputtering target; being unaffected by changes or variations during use (e.g., torsion); providing consistent coating and stabilization of components; achieving automatic leveling and automatic centering during assembly; minimizing or eliminating vent slots and / or scallops; minimizing or eliminating grooves on the sputtering target surface; eliminating the single-point fulcrum effect of conventional systems; expanding the seal surface or interface surface; incorporating a unique blocking mechanism for capturing and removing particles that may enter the vacuum chamber during the dynamic cycle; including an integral plasma shield for protecting the seal from attack by high-energy ionized gas (plasma) and thermal degradation; providing a buffer between the sputtering target and the insulating ring, etc.

[0051] In one embodiment, according to the seal and seal system, O-rings within the sputtering target, and corresponding grooves or vent slots or scallops are unnecessary, for example, backing plates within non-monolithic sputtering targets, flanges of monolithic sputtering targets, etc. are unnecessary. The sputtering target may have a continuous peripheral flange surface. In one embodiment, the seal and seal system is self-centering. In one embodiment, according to the seal and seal system, the seal surface or interface surface is expanded. In one embodiment, the seal and seal system provides a buffer between the sputtering target and the insulating ring.

[0052] The disclosed seal and seal system can provide one or more (or all) of the following. That is, prevent leakage during use throughout the life of the sputtering target and maintain a vacuum seal; minimize or prevent arc discharge, oxidation, nodule formation, degradation, wear, redeposition, and / or particle generation (and related failures of PVD due to these events) during use throughout the life of the sputtering target; be unaffected by changes or variations during use (e.g., torsion); provide consistent coating and stabilization of components; achieve automatic leveling and automatic centering during assembly; minimize or eliminate vent slots and / or scallops; minimize or eliminate grooves on the sputtering target surface; eliminate the single-point fulcrum effect of conventional systems; expand the seal surface or interface surface; incorporate a unique blocking mechanism for capturing and removing particles that may enter the vacuum chamber during the dynamic cycle; include an integral plasma shield to protect the seal from attacks by high-energy ionized gas (plasma) and thermal degradation; provide a buffer between the sputtering target and the insulating ring, etc.

[0053] Moving on to FIGS. 3-6, a seal ring 100 is shown that can be used as part of a sealing system 400 and includes a corresponding insulating ring 210 and / or a corresponding sputtering target 255. The insulating ring 210 can selectively contact the vacuum chamber 5. The seal ring 100 can selectively contact the insulating ring 210. The sputtering target 255 can selectively contact the seal ring 100. When the insulating ring 210, the seal ring 100, and the sputtering target 255 (including the sealing system 400) are assembled in the vacuum chamber 5, a vacuum seal is provided between the sputtering target 255 and the vacuum chamber 5, enabling the execution of a PVD process while confining the plasma within the vacuum chamber 5.

[0054] Figures 9 to 11 show, for example, the assembly of the insulating ring 210 into the vacuum chamber 5, followed by the assembly of the sealing ring 100 onto the insulating ring 210, and then the assembly of the sputtering target 255 onto the sealing ring 100. In one embodiment, each of the sealing ring 100, the insulating ring 210, and the sputtering target 255 is generally concentric and may be formed in a size and shape to fit into a vacuum chamber such as the vacuum chamber 5. In one embodiment, each of the sealing ring 100, the insulating ring 210, and the sputtering target 255 may be attached by an interference fit or a friction fit. Note that other attachment mechanisms may be used. The assembly of the sealing ring 100, the insulating ring 210, and the sputtering target 255 can be performed quickly, for example, in less than 5 minutes, less than 1 minute, less than 30 seconds, etc. Various components of the sealing ring 100, the insulating ring 210, and the sputtering target 255 (such as the rim portion 140 having the holding tab 144, etc.) enable quick assembly and various functions such as automatic centering and automatic leveling.

[0055] The seal ring 100 generally includes a planar portion 148 and a rim portion 140. The planar portion 148 has a first side (or surface) 102 and a second side (or surface) 104. In one embodiment, the first side 102 of the seal ring 100 can be understood as an insulating ring opposing side that can be selectively coupled to a corresponding side of the insulating ring 210. In one embodiment, the second side 104 of the seal ring 100 can be understood as a sputtering target opposing side that can be selectively in contact with a corresponding side of the sputtering target 255. It should be noted that the first side 102 is also referred to as the lower side of the seal ring 100, and the second side 104 can also be referred to as the upper side of the seal ring 100. When assembled, the first side (or surface) 102 can be in contact (touch) with the insulating ring 210, and the second side (or surface) 104 can be in contact (touch) with the sputtering target 255. In one embodiment, the seal ring 100 can function as a buffer and separation means between the insulating ring 210 and the sputtering target 255, thereby preventing the insulating ring 210 and the sputtering target 255 from contacting each other when assembled in the vacuum chamber 5.

[0056] The flat portion 148 of the seal ring 100 may include a compressible portion 110 that extends toward the center of the seal ring 100. In one embodiment, the compressible portion 110 may include one or more high-profile protrusions (e.g., protrusion 113) that extend away from the horizontal axis 150 of the seal ring 100. The flat portion 148 includes the horizontal axis 150. In one embodiment, the horizontal axis 150 is located midway between the peak of the protrusion 113 on the first side 102 and the peak of the protrusion 113 on the second side 104. One or more low-profile recesses (e.g., recess 116) narrow toward the horizontal axis 150 of the seal ring 100. In one embodiment, the compressible portion 110 may include two or more high-profile protrusions 113. For example, the compressible portion 110 may include 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, etc. high-profile protrusions 113. In one embodiment, the compressible portion 110 may include two or more low-profile recesses 116. For example, the compressible portion 110 may include 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, etc. low-profile recesses 116. The protrusions 113 and the recesses 116 may be arranged alternately. In one embodiment, the compressible portion 110 may include n protrusions 113 and n - 1 recesses 116. For example, the compressible portion 110 may include two protrusions 113 and one recess 116. One recess 116 may be arranged between two protrusions 113. In one embodiment, the compressible portion 110 may include n protrusions 113 and n + 1 recesses 116. For example, the compressible portion 110 may include two protrusions 113 and three recesses 116. One recess 116 may be arranged between two protrusions 113, and the remaining two recesses 116 may be arranged on opposite sides of each protrusion 113, resulting in a pattern such as recess, protrusion, recess, protrusion, recess. Note that other quantities, positions, and patterns of protrusions 113 and recesses 116 may be used in the compressible portion 110.

[0057] In one embodiment, the protrusion 113 may extend beyond the remaining profile on the second side 104 of the seal ring 100. In other words, the protrusion 113 may extend further from the horizontal axis 150 than any other feature on the first side 102 of the seal ring 100. Further, the protrusion 113 may extend beyond the remaining profile on the first side 102 of the seal ring 100, excluding the rim portion 140. In other words, the protrusion 113 may extend further from the horizontal axis 150 than any other feature on the second side 104 of the seal ring 100, excluding the rim portion 140. In an exemplary embodiment, the protrusion 113 may have a greater height or diameter than the remaining profile of the seal ring 100 (excluding the rim portion 140). In one embodiment, the recess 116 may terminate in front of the remaining profile of the seal ring 100. In one embodiment, the height or diameter of the recess 116 may be smaller than the remaining profile of the seal ring 100. In one embodiment, the protrusion 113 may extend beyond the first surface 102. In one embodiment, the protrusion 113 may extend beyond the second surface 104. In one embodiment, the protrusion 113 may extend beyond both the first surface 102 and the second surface 104. In one embodiment, the protrusion 113 may be generally rounded or circular. Note that other shapes may be used, unless the context or the present disclosure specifically suggests otherwise. In an exemplary embodiment, the recess 116 may terminate in front of the first surface 102. In one example, the recess 116 may terminate in front of the second surface 104. In an exemplary embodiment, the recess 116 may terminate in front of both the first surface 102 and the second surface 104. Further, in an exemplary embodiment, the recess 116 may extend downward from the first surface 102 towards the horizontal axis 150 of the seal ring 100. In an exemplary embodiment, the recess 116 may terminate below the second surface 104 and towards the horizontal axis 150 of the seal ring 100.In an exemplary embodiment, the recess 116 may terminate toward the horizontal axis 150 of the seal ring 100 under both the first surface 102 and the second surface 104. In an exemplary embodiment, the recess 116 may be generally rounded or recessed. Note that other shapes may be used unless the context or the present disclosure specifically suggests otherwise.

[0058] The compressible portion 110 may include any compressible material or combination of materials that is desirable or suitable for a particular purpose or intended use. In one embodiment, the compressible portion 110 may include a fluorocarbon, a fluoroelastomer, or a fluorokautschuk material (FKM) composition. In one example, the material may be selected based on its durometer. In one example, the material may be selected based on its compressibility and / or elasticity. In one example, the material may be selected based on its heat resistance. Other materials include, but are not limited to, polymers such as polyurethane, ethylene propylene diene monomer, styrene butadiene rubber, thermoplastic elastomer, other natural rubbers or silicone rubbers, neoprene, foamed polytetrafluoroethylene, polyurethane foam, and combinations of two or more thereof.

[0059] The protrusion 113 functions as a contact point or compression point that selectively contacts the corresponding surface of the insulating ring 210 and / or the corresponding surface of the sputtering target 255. Also, the corresponding surface of the insulating ring 210 and / or the corresponding surface of the sputtering target 255 selectively compresses the protrusion 113 until the corresponding surface of the insulating ring 210 and / or the corresponding surface of the sputtering target 255 contacts the remaining body portion of the seal ring 100 (e.g., the rigid portion 130, the shield 190, etc.). The recess 116 generally provides clearance for the compressed protrusion 113, and a vacuum seal is achieved by compressing the protrusion 113 and pushing it into the recess 116. The compressible portion 110 generally facilitates the formation of a vacuum seal by the insulating ring 210 and / or the sputtering target 255 and by compressing the protrusion 113 therebetween and with them.

[0060] The seal ring 100 can provide a radially concentric seal and can separate the high-vacuum (sputter) environment within the vacuum chamber 5 where sputtering is performed, for example, during the dynamic cycle occurring throughout the PVD process, from the atmosphere.

[0061] In one embodiment, the larger the compressible portion 110 extends toward the center of the seal ring 100 and the greater the number of protrusions 113 and contact points, the larger the contact area. The protrusions 113 may be semi-circular. The larger the contact area, the longer the life of the vacuum seal and the stronger the rigidity and structure of the seal ring 100. Multiple contact points, such as multiple protrusions 113, can double the vacuum seal, maintain the vacuum seal during use before the life of the sputtering target 255, and make the vacuum seal less susceptible to weaknesses such as leakage. In an exemplary embodiment, the protrusions 113 may be spaced at intervals of about 0.150 inches (about 3.810 mm). In other words, each vertical axis 113a of a series of protrusions 113 may be spaced at intervals of about 0.150 inches (about 3.810 mm) along the horizontal axis 150, for example, along the horizontal axis 150 from the outer wall 147 to the center of the seal ring 100. Each of the protrusions 113a has a vertical axis 113a. Further, in an exemplary embodiment, the innermost protrusion 113 (the protrusion closest to the center of the seal ring 100) may be located at a position about 0.255 inches (about 6.477 mm) from the tip 190a of the shield 190. Further, in an exemplary embodiment, the innermost protrusion 113 (the protrusion closest to the center of the seal ring 100) may be located at a position about 0.255 inches (about 6.477 mm) from the inner diameter of the shield 190. In an exemplary embodiment, when measured vertically from the upper portion 113b to the lower portion 113c of the protrusion 113 along the vertical axis 113a, the protrusion 113 may have a height of about 0.114 inches to 0.124 inches (about 2.896 to 3.150 mm).

[0062] Furthermore, according to a plurality of contact points, for example a plurality of protrusions 113, a blocking mechanism is provided to confine gas and particles within the annular portion between the seal ring 100 and the compressible portion 110, while at the same time obtaining a high enough contact force to form a vacuum seal. The seal ring 100 helps to reduce the movement of the flange of the sputtering target 255 throughout the life of the sputtering target by increasing the contact area with the flange portion of the sputtering target 255 and enabling a sufficient contact force with the seal ring 100. In one embodiment, a flat gasket type seal may require an unrealistic contact force for the seal that cannot be obtained by vacuum force alone.

[0063] The seal ring 100 may further include a rigid portion 130. In one embodiment, the rigid portion 130 may be disposed adjacent to the compressible portion 110. In one embodiment, the rigid portion 130 may be disposed at a position farther from the center of the seal ring 100 (e.g., toward the ambient environment) compared to the position of the compressible portion 110, and the compressible portion 110 may be disposed at a position closer to the center of the seal ring 100 (e.g., toward the inside of the vacuum chamber 5) compared to the position of the rigid portion 130.

[0064] The rigid portion 130 can have a higher rigidity than the compressible portion 110. To obtain rigidity, the rigid portion may have ribs 131. The ribs 131 can include any rigid material or combination of materials that are desirable or suitable for a particular purpose or intended use. In one embodiment, the ribs 131 can include aluminum. Note that any other non-magnetic material having suitable mechanical properties may be used. For example, the material can be selected based on its durometer. For example, the material can be selected based on its rigidity, non-magnetic properties, conductive properties, etc. Other materials include, but are not limited to, certain grades of stainless steel, titanium, brass, carbon fiber reinforced polymers, ceramics such as alumina and zirconia, and glass fiber.

[0065] The rib 131 of the rigid portion 130 may be sealed with the same material as the compressible portion 110 or suspended within the material. The rib 131 may be sealed with a material similar to the compressible portion 110 or suspended within the material. The rib 131 may be completely sealed with a compressible material. The rib 131 may be substantially sealed with a compressible material. The rib 131 may be partially sealed with a compressible material. The horizontal axis of the rigid portion 130 may be arranged along the horizontal axis 150 of the seal ring 100. Further, the horizontal axis of the rib 131 may be arranged along the horizontal axis 150 of the seal ring 100. For example, the rib 131 may be completely sealed with a compressible material except for some notches or openings 120 used to suspend the rib 131 in a mold and apply a compressible material thereto. In one embodiment, the rib 131 may be exposed through a notch or opening 120 in the compressible material of the rigid portion 130. An arc discharge between the rigid portion 130 and the sputtering target 255 can be prevented or minimized by a coating or sealant. In one embodiment, the thickness of the coating or sealant of the rigid portion 130 (on each side of the upper and lower sides of the rib 131) may be about 0.084 inches to 0.096 inches (about 2.134 to 2.438 mm). In other embodiments, the thickness of the coating or sealant of the rigid portion may be about 0.080 inches to 0.010 inches (about 2.032 to 0.254 mm). In further exemplary embodiments, the thickness of the coating or sealant of the rigid portion may be about 0.076 inches to 0.014 inches (about 1.930 to 0.356 mm).

[0066] In other embodiments, the thickness of the coating or seal of the rigid portion 130 (on each side above and below the rib 131) may be about 0.014 inches (about 0.356 mm). In other embodiments, the thickness of the coating or seal of the rigid portion 130 between the upper surface 131a of the rib 131 and the second side 104 may be about 0.014 inches (about 0.356 mm), and the thickness of the coating or seal of the rigid portion 130 between the bottom surface 131b of the rib 131 and the first side 102 may be about 0.013 inches (about 0.330 mm). In another exemplary embodiment, the thickness of the coating or seal of the rigid portion 130 between the bottom surface 131b of the rib 131 and the first side 102 may be about 0.008 inches to 0.018 inches (about 0.203 to 0.457 mm). In other embodiments, the thickness of the coating or seal between the back surface 131d of the rib 131 and the second end 108 of the seal ring 100 may be about 0.07 inches (about 1.778 mm). The coating or seal can prevent or minimize wear from the insulating ring 210 and / or the sputtering target 255. In one embodiment, the width of the rigid portion 130 may be approximately the same size as the compressible portion 110. In one embodiment, the length of the rigid portion 130 may be shorter than the compressible portion 110. In one embodiment, the length of the rigid portion 130 may be longer than the compressible portion 110. The thickness of the rib 131 (the distance between the upper surface 131a and the bottom surface 131b of the rib portion 131) may be 0.063 inches (1.600 mm). The width of the rib 131 (the distance between the inner surface 131c and the outer surface 131d along the horizontal cross-section of the rigid portion 130 (or the rib 131), in other words, the distance along the horizontal axis 150) may be about 0.45 inches (about 11.4 mm).

[0067] The rigid portion 130 can impart supportability, rigidity, and / or stability to the seal ring 100. The rigid portion 130 can impart strength to the seal ring 100 during the dynamic sputtering cycle and may help to suppress excessive movement of the flange of the sputtering target 255 relative to the insulating ring 210. The rigid portion 130 can suppress or minimize mechanical wear and particle generation resulting from the proximity movement between the flange of the sputtering target 255 (the flange of the backing plate 260 of the sputtering target 255 for a non-monolithic target, or the peripheral flange of the monolithic sputtering target 255) and the insulating ring 210. In an exemplary embodiment, the inner diameter of the rib 131 measured from the inner surface 131c of the rib 131 may be about 19.57 inches to 19.63 inches (about 497.1 to 498.6 mm), and the outer diameter of the rib 131 measured from the outer surface 131d of the rib 131 may be about 20.47 inches to 20.53 inches (about 519.9 to 521.5 mm).

[0068] The seal ring 100 can generally include a first end portion 106 and a second end portion 108. In one embodiment, the first end portion 106 may be the inner peripheral side end portion of the seal ring 100 located in the central direction of the seal ring 100. In one embodiment, the second end portion 108 may be the outer peripheral side end portion of the seal ring 100 located on the opposite side of the first end portion 106 and away from the center of the seal ring 100. The first end portion 106 may extend from the compressible portion 110 towards the center of the seal ring 100. The first end portion 106 may be disposed adjacent to and attached to the compressible portion 110 of the seal ring 100. The first end portion 106 may include the same material as or a material similar to the compressible portion 110. In one embodiment, the compressible portion 110 may be disposed between the rigid portion 130 and the first end portion 106. The first end portion 106 may be configured to selectively receive the shield 190. The shield 190 may be configured to cover all or at least a part of the first end portion 106. The shield 190 may be configured to insulate and protect the compressible portion 110 and the remaining portion of the seal ring 100 from the vacuum environment in the vacuum chamber 5 (e.g., protect from the plasma in the vacuum chamber 5). The shield 190 may be selectively removable and replaceable from the compressible portion 110 of the seal ring 100. The first end portion 106 may be configured to selectively receive and elastically engage the shield 190. It should be noted that other connection mechanisms may be used if desired or suitable for a particular purpose or intended application. In one embodiment, the first end portion 106 of the seal ring 100 may be tapered. In one embodiment, the first end portion 106 of the seal ring 100 may be referred to as a C-shaped. In one embodiment, the first end portion 106 of the seal ring 100 may be referred to as a snake head shape. In an example, the first end portion 106 of the seal ring 100 may include an inclined portion having a gradually increasing inclination and a slot.In one example, the shield 190 may include a hollow portion having a size and shape that generally corresponds to the tapered or serpentine head shape of the first end 106 of the seal ring 100, and snap fingers configured to be inserted into the slots. The snap fingers are inserted into the slots over a sloped portion of the first end 106 of the seal ring 100 having a gradually increasing slope and are inserted into the slots until locked in the slots. The shape of the shield 190 may be configured to sandwich the shield 190 against the first end 106 of the seal ring 100 by the pressure from the sputtering target 255 and the insulating ring 210 during the assembly of the seal system 400. In an exemplary embodiment, the inner diameter of the shield 190 may be about 18.585 inches to 18.645 inches (about 472.06 to 473.58 mm) when measured from the tip 190a of the shield 190. In an exemplary embodiment, the inner diameter of the shield 190 may be about 19.095 inches to 19.155 inches (about 485.01 to 486.54 mm) when measured from the base 190b of the shield 190.

[0069] As shown in FIG. 3A, the shield 190 may have a curved shape with a relatively slim profile, i.e., a rounded C-shaped form, and may have a C-shaped form that reflects the size and shape of the first end 106 of the seal ring 100. As shown in FIG. 3B, the shield 190 may have an elongated teardrop shape extending towards the center of the seal ring 100 within the vacuum chamber 5. In one embodiment, the elongated teardrop shape of the shield 190 may extend over and cover the inner edge on the inner edge of the insulating ring 210. It should be noted that shields 190 of other shapes, thicknesses, and sizes may be incorporated. In an exemplary embodiment, the shield 190 may have a width of 0.130 inches (3.30 mm) along the horizontal axis 150 when measured from the tip 190a to the base 190b. In another exemplary embodiment, the shield 190 may have a height of approximately 0.114 inches to 0.124 inches (approximately 2.896 to 3.150 mm) when measured in a vertical direction perpendicular to the horizontal axis 150 (a direction parallel to the vertical axis 113a).

[0070] The shield 190 may include any plasma suppression material or combination of materials that is desirable or suitable for a particular purpose or intended application. In one embodiment, the shield 190 may include a plasma suppression polytetrafluoroethylene (PTFE) material that is a synthetic fluoropolymer of tetrafluoroethylene. It should be noted that any other material that suppresses plasma and thermal damage may be used. In one example, the material may be selected based on its low coefficient of friction. Other materials include, but are not limited to, polyimide, ceramics such as alumina and boron nitride, molybdenum disulfide, fluorinated ethylene propylene, etc.

[0071] In one embodiment, the shield 190 may be referred to as a plasma shield. In one embodiment, the shield 190 can suppress plasma arc discharge and can protect the vacuum seal by suppressing plasma arc discharge and thermal degradation of the vacuum seal material.

[0072] Therefore, the flat portion 148 of the seal ring 100 has the shield 190, the compressible portion 110, and the rigid portion 130, extending outward along the horizontal axis 150 from the center of the seal ring 100.

[0073] The seal ring 100 may be disposed on the first surface 102 and further include a rim portion 140 that forms an "L" shape together with the flat portion 148. The rim portion 140 has an inner wall 142 disposed in a direction toward the center of the seal ring 100 perpendicular to the first surface 102, an outer wall 147 disposed on the outer periphery of the seal ring 100 perpendicular to the first surface, and a bottom wall 146 connecting the bottom 142a of the inner wall 142 and the bottom 147a of the outer wall 147. The inner wall 142 may be disposed in a direction toward the center of the seal ring 100. The bottom wall 146 is disposed in a direction perpendicular to the inner wall 142 and the outer wall 147 and may form a "U" shape. The outer wall 147 and the second end portion 108 may form a continuous surface that is linearly equidistant from the first end portion 106 when measured along the horizontal axis 150 of the flat portion 148. In an exemplary embodiment, the rim portion 140 may be disposed adjacent to the rigid portion 130 of the flat portion 148. In an exemplary embodiment, the rim portion 140 may be disposed at the second end portion 108 of the seal ring 100. In an exemplary embodiment, the rim portion 140 may extend perpendicularly from the rigid portion 130 and the compressible portion 110 with respect to an insulating ring facing the first surface 102 of the seal ring 100. In an exemplary embodiment, the seal ring 100 may be L-shaped. The rim portion 140, the rigid portion 130, and the compressible portion 110 may be provided as a single accessory unit. The rim portion 140 may include the same material as the compressible portion 110. The rim portion 140 may include a material similar to the compressible portion 110. The rim portion 140 may be configured to selectively couple with a corresponding step portion 213 of the insulating ring 210. Both the inner wall 142 and the bottom wall 146 (or the inner wall 142, the retaining tab 144, and / or the bottom wall 146) may selectively engage with a corresponding wall of the step portion 213 of the insulating ring 210.

[0074] In an exemplary embodiment, the seal ring 100 may have a thickness of about 0.270 inches (about 6.858 mm) when measured at the rim portion 140. In other words, in an exemplary embodiment, the distance between the bottom wall 146 of the seal ring 100 and the second side 104 may be about 0.270 inches (about 6.858 mm). Further, in another exemplary embodiment, the seal ring 100 may have a thickness of about 0.085 inches to 0.095 inches (about 2.159 to 2.413 mm) at the rigid portion 130. In other words, in an exemplary embodiment, the distance between the first side 102 and the second side 104 at the rigid portion 130 of the seal ring 100 may be about 0.085 inches to 0.095 inches (about 2.159 to 2.413 mm). Further still, in another exemplary embodiment, the diameter of the second end portion 108 of the seal ring 100 may be about 20.585 inches to 20.645 inches (about 522.86 to 524.38 mm). In another exemplary embodiment, the diameter of the inner wall 142 of the seal ring 100 where the retaining tab 144 is absent may be about 20.325 inches to 20.385 inches (about 516.26 to 517.78 mm).

[0075] The rim portion 140 may be disposed on the inner wall 142 and may further include one or more retaining tabs 144 that extend from the inner wall 142 along the inner circumference of the rim portion 140 toward the center of the seal ring 100. In an exemplary embodiment, a plurality of retaining tabs 144 may be equally spaced along the circumference of the inner wall 142. In an exemplary embodiment, a plurality of retaining tabs 144 may be disposed at different distances along the circumference of the inner wall 142. In an exemplary embodiment, the rim portion 140 may include 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 15, 20, 30, etc. retaining tabs 144. The retaining tab 144 may be semi-circular and may extend from the bottom wall 146 (or the bottom 142a of the inner wall) to the first side 102. To facilitate placement of the seal ring 100 on the insulating ring 210, the retaining tab 144 may have a chamfer near the bottom wall 146 (or the bottom 142a of the inner wall). In an exemplary embodiment, the inner surface 144a of the retaining tab 144 may be at a distance of about 10.10 inches (about 256.5 mm) from the center of the seal ring 100. The inner surface 144a is the surface of the tab 144 closest to the center of the seal ring 100 when viewed along the horizontal axis 150.

[0076] In an exemplary embodiment, according to the rim portion 140, during the assembly of the seal system 400, it becomes easier to align the seal ring 100 on the insulating ring 210. In an exemplary embodiment, the retaining tab 144 can automatically center the seal ring 100 on the insulating ring 210. In an exemplary embodiment, the retaining tab 144 can firmly grip the insulating ring 210 and fix the seal ring 100 to the insulating ring 210. In an exemplary embodiment, the seal ring 100 may be attached upside down, for example, attached to the insulating ring 210 on top of the seal ring 100, and the retaining tab 144 can maintain and fix the seal ring 100 with respect to its upside-down insulating ring 210 (for example, when the insulating ring 210 and the seal ring 100 are reversed, the insulating ring 210 is disposed on top of the seal ring 100, and the seal ring 100 is pulled in a direction away from the insulating ring 210 by gravity, the retaining tab can maintain and fix the seal ring 100 with respect to the insulating ring 210).

[0077] Next, turning to FIG. 7, a sputtering target 255 including a seal joint surface 259 is shown. As described above, the seal joint surface 259 may be a generally continuous and / or smooth flange surface, i.e., a surface without grooves, vent slots, scallops, and other shapes or features having similar functions (see also FIGS. 3A - 3B). In an exemplary embodiment, the flange (seal joint surface 259) of the backing plate 260 of the sputtering target 255 has no features. According to one embodiment, the sputtering target 255 can eliminate the conventional O-ring seals, grooves, vent slots, scallops, and other shapes or features having similar functions shown in FIGS. 1A - 1F. These are susceptible to the effects of the failures shown in FIGS. 2(A) - (F) (such as arc discharge, oxidation, nodule formation, deterioration, wear, redeposition, and particle generation) that frequently occur near or adjacent to the O-ring seals, vent slots, and / or scallops. In an exemplary embodiment, according to the sputtering target 255, the radial single-point fulcrum effect in a conventional sputtering target vacuum chamber assembly that can affect the mechanical movement of various components during the dynamic sputtering cycle of the sputtering target 255 can also be eliminated.

[0078] The seal joint surface 259 of the sputtering target 255 (e.g., the flange of the backing plate 260 of the non-monolithic target sputtering target 255, or the peripheral flange of the monolithic sputtering target 255) may be configured to selectively contact the seal ring 100. The seal joint surface 259 of the sputtering target 255 may be configured to selectively contact the second side 104 of the seal ring 100 including the compressible portion 110, the rigid portion 130 (sealed with a compressible material), and the shield 190. The sputtering target 255 can provide a vacuum seal with the seal ring 100.

[0079] The sputtering target 255 can include any material or combination of materials that is desirable or suitable for a particular purpose or intended use. In one embodiment, the sputtering target 255 can include copper, titanium, gold, and the like. Note that any other metals, alloys, oxides, and nitride materials thereof may be used. In one example, the material may be selected based on sputtering ability. Other materials include, but are not limited to, aluminum, tungsten, nickel, silicon, germanium, and the like.

[0080] Turning to FIGS. 8A - 8C, an insulating ring 210 including a seal joint surface 216 and a rim fitting step portion 213 is shown. As described above, the seal joint surface 216 (upper surface) may be a generally continuous and / or smooth surface, and the rim fitting step portion 213 can provide a step portion 213 on the outer periphery of the insulating ring 210. The rim fitting step portion 213 may be configured to selectively engage both the inner wall 142 and the bottom wall 146 (or the inner wall 142 and the retaining tab 144) of the rim portion 140. The rim fitting step portion 213 may generally have a notch of about 90 degrees. In an exemplary embodiment, the step portion 213 may be formed by making vertical and horizontal cuts at the upper part of the outer diameter of the insulating ring 210. In other words, in an exemplary embodiment, the step portion 213 is formed on the joint surface 216 and the outer surface 217 of the insulating ring 210, thereby creating a vertical surface 218 and a horizontal surface 219 of the step portion 213. In an exemplary embodiment, when the step portion 213 is formed on the insulating ring, the vertical surface 218 may be offset from the outer surface 217 by about 0.200 inches (about 5.080 mm), and the horizontal surface 219 may be offset from the joint surface 216 by about 0.200 inches (about 5.080 mm). In an exemplary embodiment, the inner diameter of the insulating ring 210 may be about 18.505 inches (about 470.03 mm) when measured at the inner surface 220 of the insulating ring 210. In a further exemplary embodiment, the outer diameter of the insulating ring 210 may be about 20.625 inches (about 523.88 mm) when measured at the outer surface 217 of the insulating ring 210. In an additional exemplary embodiment, the diameter of the insulating ring 210 may be about 20.225 inches (about 513.72 mm) when measured at the vertical surface 218 of the step portion 213 of the insulating ring 210. In a further exemplary embodiment, the thickness of the insulating ring 210 may be about 0.538 inches (about 13.67 mm) when measured from the joint surface 216 to the bottom surface 221 of the insulating ring 210. In an additional exemplary embodiment, the thickness of the insulating ring 210 may be about 0.338 inches (about 8.585 mm) when measured from the horizontal surface 219 to the bottom surface 221 of the insulating ring 210.In another exemplary embodiment, the width of the insulating ring 210 may be about 1.06 inches (about 26.92 mm) when measured from the outer surface 217 to the inner surface 220. The outer surface 217 is located on the opposite side of the inner surface 220.

[0081] The seal joint surface 216 of the insulating ring 210 may be configured to selectively couple with the seal ring 100. The seal joint surface 216 of the insulating ring 210 may be configured to selectively couple with the first surface 102 of the seal ring 100 including the compressible portion 110, the rigid portion 130 (sealed with a compressible material), the shield 190, and the rim portion 140. The insulating ring 210 can provide a vacuum seal between the seal ring 100. By using the seal ring 100, the sputtering target 255, and the insulating ring 210 together, it is also possible to expand the seal surface or the boundary surface between the sputtering target 255 and the insulating ring 210, or to provide a buffer therebetween.

[0082] The insulating ring 210 can include any material or combination of materials that is desirable or suitable for a particular purpose or intended use. In one embodiment, the insulating ring 210 can include a highly polished ceramic dielectric material. Note that any other material that can electrically insulate the sputtering target 255 from the vacuum chamber 5 may be used. In one example, the material can be selected based on its electrical insulation properties. Other materials include, but are not limited to, glass, plastic, and polymers such as polyethylene (PE), polypropylene (PP), polycarbonate (PC), polyimide (PI), and polytetrafluoroethylene (PTFE), mica, epoxy resin, polyethylene terephthalate (PET), etc.

[0083] Figures 13A - 13B and (A) - (D) of Figure 14 show the end - of - life sputtering target 255 using the seal ring 100 and the sealing system 400. No signs of arc discharge, particles, or flange wear are seen in the resulting sputtering target 255. Further, the formation of side - wall oxides is consistently controlled.

[0084] Figures 15A - 15E show various empirical data obtained prior to the life of the sputtering target 255 using the seal ring 100 and the sealing system 400. For example, Figures 15A - 1 and 15A - 2 show the observed bake - out. Figures 15B - 1 and 15B - 2 show that no helium leak was observed at the seal. Figure 15C shows that the gas load was stable during the processing of the sputtering target 255. Figure 15D shows that no arc - discharge events were captured prior to the life of the sputtering target 255. Figure 15E shows that the idle - mode chamber pressure was stable throughout the life of the sputtering target 255.

[0085] Various embodiments of the present teachings are shown in the accompanying drawings and described in the foregoing detailed description, but the present teachings are not limited to the disclosed embodiments. It should be understood that the present teachings described herein are capable of numerous rearrangements, modifications, and substitutions without departing from the following claims. The following claims are intended to cover any modifications and changes as long as they are within the scope of the claims or their equivalents.

Claims

1. A sealing kit for a physical vapor deposition (PVD) vacuum chamber, comprising: A seal ring for the PVD vacuum chamber, comprising: A compressible portion including at least one protrusion and at least one recess; A rigid portion adjacent to the compressible portion, the rigid portion having ribs substantially sealed with a secondary material; A rim extending from a first surface of the seal ring and configured to selectively couple with an insulating ring; A removable shield configured to selectively couple with a first end of the compressible portion and configured to insulate the compressible portion from the interior of the vacuum chamber; A seal ring; A generally flat first surface configured to selectively contact the compressible portion and the rigid portion of the seal ring when installed in the PVD vacuum chamber; A stepped portion configured to selectively contact the rim of the seal ring when installed in the PVD vacuum chamber; An insulating ring; A sputtering target including a peripheral flange surface of the first surface configured to contact the seal ring when installed in the PVD vacuum chamber, the peripheral flange surface having no O-ring groove, vent slot, and scallop, and the peripheral flange surface being configured to contact the seal ring with a flat surface; A sealing kit.

2. A seal ring for a physical vapor deposition (PVD) vacuum chamber, comprising: A compressible portion including at least one protrusion and at least one recess; A rigid portion adjacent to the compressible portion, the rigid portion having ribs substantially sealed with a secondary material; A rim extending from a first surface of the seal ring and configured to selectively couple with an insulating ring; A removable shield configured to selectively couple with a first end of the compressible portion and configured to insulate the compressible portion from the interior of the vacuum chamber; A seal ring.

3. The seal ring according to claim 2, wherein the compressible portion comprises a fluorocarbon, fluorosilicone, and / or fluorine rubber material.

4. The seal ring according to claim 2 or claim 3, wherein the secondary material is the same material as the compressible portion and the rim.

5. The seal ring according to any one of claims 2 to 4, wherein the at least one protrusion extends beyond the first surface and the second opposite surface of the seal ring.

6. The seal ring according to any one of claims 2 to 5, wherein the at least one recess terminates in front of the first surface and the second opposite surface of the seal ring.

7. The seal ring according to any one of claims 2 to 6, wherein each of the at least one protrusion and each of the at least one recess are arranged alternately.

8. The seal ring according to any one of claims 2 to 6, wherein the compressible material and the at least one recess are configured to capture particles.

9. The seal ring according to any one of claims 2 to 8, wherein the rib of the rigid portion is made of aluminum.

10. The seal ring according to any one of claims 2 to 9, wherein the compressible portion and the rigid portion have substantially the same length.

11. The seal ring according to any one of claims 2 to 10, wherein the shield is configured to elastically engage with the first end of the compressible portion.

12. The seal ring according to any one of claims 2 to 11, wherein the shield is configured to suppress plasma arc discharge and thermal degradation of the compressible portion.

13. The seal ring according to any one of claims 2 to 12, wherein the shield contains polytetrafluoroethylene.

14. The seal ring according to any one of claims 2 to 13, wherein the rim further includes a plurality of retaining tabs.

15. The seal ring is configured to selectively contact the insulating ring by interference fit, thereby forming a seal between the seal ring and the insulating ring when installed in the PVD vacuum chamber. The seal ring according to any one of claims 2 to 14.

16. The seal ring is configured to be automatically centered with respect to the insulating ring using the plurality of retaining tabs on the rim and the stepped portion of the insulating ring cut at approximately 90 degrees. The seal ring according to any one of claims 2 to 15.

17. The second surface of the seal ring is configured to selectively contact the sputtering target, thereby forming a seal between the seal ring and the sputtering target when installed in the PVD vacuum chamber, the seal ring according to any one of claims 2 to 16.

18. The sputtering target has no grooves, vent slots, and scallops, and the sputtering target is configured to contact the seal ring with a flat surface, the seal ring according to claim 17.

19. The seal ring is configured to provide a buffer between the sputtering target and the insulating ring, the seal ring according to claim 17 or claim 18.

20. Including a first surface configured to selectively contact a seal ring on the PVD vacuum chamber, The first surface has no grooves, vent slots, and scallops, and the first surface is configured to contact the seal ring with a flat surface, a sputtering target.

21. The first surface is configured to be insulated from the insulating ring, The insulating ring is configured to selectively contact the opposite side of the seal ring on the vacuum chamber when installed in the PVD vacuum chamber, the sputtering target according to claim 20.

22. When installed in the PVD vacuum chamber, a generally flat first surface configured to selectively contact the compressible portion and the rigid portion of the seal ring, When installed in the PVD vacuum chamber, a stepped portion configured to selectively contact the rim of the seal ring An insulating ring comprising.

23. The stepped portion has a notch of about 90 degrees, the insulating ring according to claim 22.

24. A sealing kit for a vacuum chamber, A seal ring including a compressible portion, a rigid portion adjacent to the compressible portion, and a rim extending perpendicularly from the rigid portion, An insulating ring configured to selectively contact a first joint surface of the insulating ring including the rim, the insulating ring selectively accommodating the rim of the sealing ring and including a notch configured to contact the rim of the sealing ring, whereby, when installed in a PVD vacuum chamber, an insulating ring that forms a seal between the insulating ring and the sealing ring, and A sputtering target including a substantially flat first joint surface configured to selectively contact a second joint surface of the sealing ring, whereby, when installed in a PVD vacuum chamber, a sputtering target that forms a seal between the sputtering target and the sealing ring, and A sealing kit including.

25. The sealing kit according to claim 24, wherein the first joint surface of the sputtering target has no grooves, vent slots, and scallops.

26. The compressible portion includes at least one protrusion and at least one recess, The sealing kit according to claim 24 or claim 25, wherein each of the at least one protrusion and each of the at least one recess are alternately arranged.

27. The sealing kit according to any one of claims 24 to 26, wherein the ribs of the rigid portion are suspended in the same material constituting the compressible material and the rim.

28. The sealing kit according to any one of claims 24 to 27, wherein the sealing ring further includes a plasma shield configured to be attached to the inner peripheral side of the compressible portion.

29. The sealing kit according to any one of claims 24 to 28, wherein each of the sputtering target and the insulating ring forms a seal with the sealing ring.

30. The sealing kit according to any one of claims 24 to 29, wherein the sputtering target and the insulating ring are insulated from each other by the sealing ring.

31. A method of assembling the sealing kit according to claim 24, comprising: Placing an insulating ring in a PVD vacuum chamber, the insulating ring including a stepped portion on the joint surface, A seal ring is disposed on the joint surface of the insulating ring, the seal ring having a first joint surface and a second joint surface on the side opposite to the first joint surface, the first joint surface of the seal ring including a rim configured to selectively couple with the stepped portion of the insulating ring, the first joint surface of the seal ring contacting the joint surface of the insulating ring, A sputtering target is disposed on the second joint surface of the seal ring, the seal ring including a compressible portion and a shield, the sputtering target being configured to compress the compressible portion and the shield of the seal ring. comprising A method, wherein the insulating ring and the seal ring form a seal when installed in a PVD vacuum chamber, and the seal ring and the sputtering target form a seal when installed in the PVD vacuum chamber.

32. The method according to claim 31, wherein the sputtering target and the insulating ring are insulated from each other by the seal ring.

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