Illumination system, radiation source apparatus, method and lithography system for illuminating a reticle

Abstract

The present invention relates to an illumination system (30) for a lithography system, in particular a projection exposure apparatus (100, 200), for illuminating a reticle (106, 203) of the lithography system with use radiation (2) from a radiation source arrangement (1), the illumination system (30) comprising an optical device (31) having at least one optical element (32) and at least one mixing device (7). According to the invention, an interface device (8) is provided for coupling a plurality of individual radiations (4) forming the use radiation (2) into the mixing device (7), wherein the source etendue (33) of the radiation source arrangement (1) fills at least 50 percent, preferably at least 80 percent, of the optical etendue (34) of the optical device (31) and / or the mixing device (7).

Description

[Technical Field]

[0001] This application claims priority from German Patent Application No. 102022209465.4, the contents of which are incorporated herein by reference in their entirety.

[0002] The present invention relates to an illumination system for a lithography system, in particular for a projection exposure apparatus, for illuminating a reticle of the lithography system with used radiation from a radiation source apparatus, comprising an optical unit with at least one optical element and at least one mixing device.

[0003] The invention further relates to a radiation source device for generating and emitting usable radiation for a lithography system, in particular for a projection exposure apparatus.

[0004] The invention further relates to a method for illuminating a reticle of a lithography system, in particular of a projection exposure apparatus, with the radiation used.

[0005] The invention also relates to a lithographic system, in particular a projection exposure apparatus, having a radiation source device and / or an illumination system for illuminating a reticle with the radiation used. [Background technology]

[0006] The prior art discloses a radiation source device for a lithography system, in particular for a projection exposure apparatus. This known radiation source device serves to generate working or use radiation for exposing a wafer surface of the lithography system. For this purpose, a reticle of the lithography system, in particular of the projection exposure apparatus, is illuminated with use radiation in a manner known per se from the prior art.

[0007] A drawback of the radiation source devices known from the prior art is that they do not make efficient use of the optical etendue or the etendue provided by the projection exposure apparatus.

[0008] Firstly, this can result in a loss of intensity of the actinic radiation if it overfills the optical etendue, or it can result in insufficient intensity at the reticle if the actinic radiation does not completely fill the optical etendue. Summary of the Invention [Problem to be solved by the invention]

[0009] The present invention is based on the object of developing a radiation source device which avoids the drawbacks of the prior art and in particular allows efficient full illumination of the reticle.

[0010] The invention is further based on the object of developing an illumination system which avoids the drawbacks of the prior art and in particular allows efficient full illumination of the reticle. [Means for solving the problem]

[0011] According to the invention, this object is achieved by an illumination system having the features specified in claim 1.

[0012] According to the invention, this object is achieved by a radiation source device having the features specified in claim 9.

[0013] The invention is further based on the object of developing a method for illuminating a reticle which avoids the drawbacks of the prior art and in particular allows for efficient full illumination of the reticle.

[0014] According to the invention, this object is achieved by a method having the features specified in claim 33.

[0015] The invention further avoids the drawbacks of the prior art and is based in particular on the object of developing a lithography system having an efficiently fully illuminated reticle.

[0016] According to the invention, this object is achieved by a lithography system having the features specified in claim 38.

[0017] In a radiation source device according to the invention for generating and emitting used radiation for a lithography system, in particular for a projection exposure apparatus, the invention provides a plurality of source modules for generating individual radiation, the individual radiation forming the used radiation.

[0018] In particular, the individual radiations can be combined to form the used radiation and / or the individual radiations can illuminate at least approximately the same location on a reticle of the projection exposure apparatus.

[0019] Advantageously, as a result of the use of multiple source modules, the optical etendue of downstream devices in a lithography system can be fully illuminated in an efficient manner with the radiation source apparatus according to the invention. By using multiple source modules, the used radiation can be generated in a manner best adapted to the optical etendue by combining or focusing the individual radiations.

[0020] In an advantageous development of the radiation source device according to the invention, it can be provided that two radiation source modules are provided.

[0021] The inventors have determined that a total of exactly two source modules is superior in terms of efficiency to a larger number of source modules, and although a very large number of source modules allows the downstream etendue or optical etendue geometry to be particularly well covered, they have surprisingly found that a total of two source modules is superior to other solutions in terms of intensity arriving at the reticle.

[0022] In an advantageous development of the radiation source device according to the invention, the radiation source modules can be at least partially independently switchable.

[0023] The ability of the radiation source modules to be independently switchable is advantageous in that the number of radiation source modules involved can be adjusted depending on the requirements related to the illumination settings at the reticle, i.e. related to the beam angle distribution at the reticle location in the downstream projection exposure apparatus.

[0024] For example, it may be advantageous for smaller illumination settings to switch on only one radiation source module, since the effect of a second radiation source module would be costly and would not contribute to improving the exposure result.

[0025] In an advantageous development of the radiation source arrangement according to the invention, provision can be made for a control device to be provided for switching the radiation source modules.

[0026] Advantageously, the control device enables the switching of the radiation source modules to be controlled in such a way that the above-mentioned adaptation to the respectively used illumination setting of the projection exposure apparatus can be carried out fully automatically.

[0027] The control device can be configured to determine the number N of light source images.

[0028] The number of source images that can be used in a meaningful way (number N) depends first on the optical etendue E S and the source etendue E Q Second, the meaningful number N of source images also depends on the set partial coherence Q, as defined in equation (1).

number

[0029] In an advantageous development of the radiation source device according to the invention, the radiation source modules can be arranged in such a way that the radiation used is output from parallel, spaced-apart individual radiations of the radiation source modules.

[0030] Within the scope of the present invention, parallel means that the beam paths of the individual radiations and / or the single beam apertures of the individual radiations emerge from each other with a parallel shift. In particular, each individual radiation may also consist of a converging and / or diverging light beam.

[0031] The parallel, spaced formation of the individual radiations of the radiation source module is advantageous because it allows a given angular distribution of the illumination setting to be observed at the reticle of the lithography system or projection exposure apparatus, In the case of oblique propagation of the individual radiations with respect to each other, undesired deviations of the angular distribution at the reticle may occur.

[0032] The remote formation of the individual radiation is advantageous in that the individual radiation can be directly directed away from the source module without the use of further optical units, i.e. without the need to employ any further means for focusing the individual radiation.

[0033] If the individual radiations are formed in a parallel, spaced apart manner, overlapping of the images of the radiation source modules at the entrance to the projection exposure apparatus can be avoided. It is therefore advantageous, in the case of parallel, spaced apart individual radiations, if the control device is configured to set the number of radiation source modules used such that the available power ηN of all the radiation source modules is greater than the available power ηO of an individual radiation source module.

[0034] In that case, a control device can be used to adapt the number of light sources or radiation source modules actually used to the respective situation or embodiment of the downstream projection exposure apparatus.

[0035] In an advantageous development of the radiation source arrangement according to the invention, provision can be made for a positioning device to be provided for positioning the radiation source module.

[0036] In particular, in conjunction with a switchably realized radiation source module and a control device, the positioning device can enable positioning of the radiation source module, in particular a radiation source module that has been switched on, so that the maximum amount of light from the radiation source module can be coupled in or can be coupled in as use radiation into the projection exposure apparatus.

[0037] In an advantageous development of the radiation source device according to the invention, it can be provided that the radiation source modules can be positioned at least partially independently of one another.

[0038] The independently positionable nature of the source modules is advantageous in that the position of the source modules can be flexibly adapted to suit the requirements for complete reticle illumination.

[0039] The positioning device may be configured to position the source modules at least partially independently of one another.

[0040] In an advantageous development of the radiation source device according to the invention, the radiation source modules each comprise: - one or more parabolic and / or elliptical mirrors for aligning the individual radiations, and / or - one or more spectral filters for filtering out individual emissions, and / or a light source, preferably a discharge lamp, particularly preferably a mercury discharge lamp, and / or It may include one or more optical units, preferably a scale zoom optical unit and / or a focal length zoom optical unit.

[0041] Using an appropriate combination of the aforementioned features, the radiation source device can be configured to use an elliptical mirror to image the arc of the discharge lamp at or near the second focal point of the elliptical mirror.

[0042] A scale zoom optical unit arranged downstream thereof can be configured to image the second focal point of the elliptical mirror onto a downstream component of the projection exposure apparatus, in particular onto the rod entrance of the mixing rod described below, or more generally onto the entrance surface of the mixing device, at different scales depending on the setting of a movable lens element present as part of the scale zoom optical unit.

[0043] The preferred discharge lamps, particularly high-power discharge lamps known from the prior art, preferably have an arc length of approximately 6 mm to 10 mm. High-power discharge lamps typically emit within a limited solid angle that can be received by an ellipsoidal mirror. The preferred discharge lamps can be configured to generate a preferred illumination wavelength of 363 nm to 367 nm, preferably 365 nm.

[0044] From an analysis of the phase space at the second focus of the ellipsoidal mirror, the inventors have determined that high-power discharge lamps known from the prior art have a maximum diameter of approximately 200 mm. 2 It was determined to have an etendue of sr.

[0045] Illumination systems known from the prior art, particularly in scanner configurations, have a focal length of approximately 400 mm. 2 Advantageously, the illumination system in the stepper configuration provides an etendue of about 630 mm. 2 Brings about the étendue of sr.

[0046] As a result of the above-described embodiments of the radiation source device according to the invention, it is possible to reduce and / or avoid the formation of discrete secondary light sources in the illumination pupil of the downstream illumination system. By using multiple radiation source modules, dark regions in the illumination pupil are efficiently avoided. In other words, by using the radiation source device, dark intermediate regions in the local exit pupil are filled with radiance due to the use of multiple radiation source modules.

[0047] The radiation source device may be adapted to include at least one spectral filter arranged and configured for joint filtering of a plurality of individual radiations.

[0048] The radiation source device may include one or more parabolic and / or elliptical mirrors for aligning the individual radiations, and / or multiple radiation source modules may share one parabolic and / or elliptical mirror and / or one optical unit.

[0049] The radiation source modules may each include multiple light sources.

[0050] In an advantageous development of the radiation source arrangement according to the invention, a mixing device can be provided which mixes the radiation used and has an entrance surface.

[0051] The use of a mixing device allows for an advantageously efficient homogenization of the radiation used. When, as in this case, the radiation used is formed by a plurality of individual radiations, the mixing device facilitates the mixing or homogenization of the radiation used.

[0052] The geometry of the entrance and / or exit surfaces of the mixing device may preferably be determined by the required field shape at the reticle.

[0053] As will be explained below, the mixing device can be realized as a mixing rod and / or a fly's eye collector. In these cases, the geometry of the entrance and / or exit faces of the mixing rod or of the field honeycomb of the fly's eye collector may preferably be determined by the required field shape of the used radiation at the reticle.

[0054] In an advantageous development of the radiation source arrangement according to the invention, provision can be made for interface devices to be provided for positioning and alignment of the individual radiations.

[0055] The presence of the interface device is particularly advantageous for efficient in-coupling of a plurality of individual radiation beams into the downstream beam path of the projection exposure apparatus, in particular into the mixing device. Individual conditions in the source modules, such as the spatial extent or mounting options, can be compensated for by a suitable design of the interface device, resulting in the most optimized possible in-coupling into the mixing device.

[0056] An advantageous development of the radiation source arrangement according to the invention can be provided in that the interface device is configured for coupling the used radiation into the mixing device.

[0057] The interface device is particularly advantageous when coupling the used radiation formed from the individual radiations into the mixing device, in particular, since the used radiation can be further adapted to the input surface of the mixing device by means of the interface device.

[0058] In an advantageous development of the radiation source device according to the invention, the individual radiations can be configured to form the used radiation in such a way that when the used radiation is incident on the entrance surface of the mixing device, the cross section of the used radiation is formed by a plurality of individual radiations that are adjacent to one another, preferably without overlapping, and that propagate in parallel.

[0059] The above-described embodiments allow for the creation of an efficient reticle illumination in a particularly simple manner.

[0060] An advantageous development of the radiation source arrangement according to the invention can be provided in that the mixing device is in the form of a mixing rod.

[0061] The embodiment of the mixing device as a mixing rod is advantageous in that the mixing rod represents a known and tested option for homogenizing the radiation used and can furthermore be easily integrated into the beam path of a projection exposure apparatus.

[0062] The mixing rod can consist of two at least approximately orthogonal mixing rod sections and a prism device, which is configured to direct the used radiation from the first mixing rod section to the second mixing rod section, thereby resulting in a corner-turning mixing rod configuration, which facilitates making the beam path of the projection exposure apparatus more compact.

[0063] An advantageous development of the radiation source device according to the invention comprises: the source modules are spaced apart and arranged parallel to one another in the direction of their individual radiation, and / or - the interface device comprises four or more deflection mirrors, the deflection mirrors being arranged at least partly parallel to one another such that the distance between the individual radiations is reduced after incidence on the deflection mirrors, and / or The deflection mirrors can be arranged so that the individual radiations are directed perpendicular to the entrance face of the mixing rod.

[0064] The above-mentioned features can be implemented individually, however, it is particularly advantageous to implement a combination of these features based on the motion.

[0065] The above-described arrangement of the source modules and the formation of the interface device allows for elongated embodiments to be realized, which may be advantageous depending on the geometric situation in the projection exposure apparatus.

[0066] An advantageous development of the radiation source device according to the invention comprises: the source modules are spaced apart and laterally offset antiparallel to the direction of their individual radiation, and / or - the interface device may include two or more prisms, the prisms being arranged such that a first side of each of the prisms is at least approximately parallel to the entrance face of the mixing rod, a second side of each of the prisms is at least approximately perpendicular to the individual radiation, and a third side of each of the prisms is arranged such that the individual radiation is guided from the second side to the first side within the respective prism.

[0067] The above-described embodiments of the arrangement of the components of the radiation source device allow flexible adaptation in the case of given installation space conditions.

[0068] In an advantageous development of the radiation source device according to the invention, the radiation source modules can be arranged at a distance and in the direction of their individual radiations pointing towards each other and tilted towards the central plane of the mixing rod so that the respective scale zoom optical units and / or focal length zoom optical units have a common pupil plane, and / or the interface device comprises a Fourier optical device as an input coupling group, which is configured to image the individual radiations onto an input plane of the mixing rod, the interface device preferably comprises a deflection mirror, the deflection mirror being arranged such that the individual radiations are aligned with the Fourier optical device, or the interface device comprises a deflection device, which has a refractive power acting on the individual radiations in particular to adapt the back focal length, the deflection device being arranged such that the individual radiations are aligned with the Fourier optical device.

[0069] Depending on the installation space situation in a projection exposure apparatus, the above-described embodiment allows for a simple and space-saving solution.

[0070] The individual radiation beams may be incident on the deflection mirror at an angle between 1° and 30°, preferably between 2° and 20°.

[0071] In an advantageous development of the radiation source device according to the invention, it can be provided that the individual radiations are coupled into the mixing rod along the longitudinal axis of the mixing rod.

[0072] Coupling the individual radiations into the mixing rod along the longitudinal axis is advantageous in that as a result, particularly low losses are expected when passing through the front entrance face.

[0073] An advantageous development of the radiation source arrangement according to the invention can be provided in that the mixing device is in the form of a fly's eye collector with a field honeycomb device, a pupil honeycomb device and a downstream second-order Fourier optical device.

[0074] The embodiment of the mixing device as a fly's eye concentrator with a field honeycomb device, a pupil honeycomb device and a second-order Fourier optical device is advantageous in that it results in a particularly efficient mixing that is feasible in a particularly small installation space.

[0075] In an advantageous development of the radiation source device according to the invention, it can be provided that the radiation source modules each comprise at least one focal length zoom optical unit.

[0076] Unlike the above-described embodiment using a mixing rod, a focal length zoom optical unit with downstream Fourier optics, a second order Fourier optical device, can be used, preferably when a fly's eye concentrator is used.

[0077] The positioning device can be designed for relative rotation of the source modules with respect to one another. The available space between the individual channels of the fly's eye collector can be filled by relative rotation of the source modules with respect to one another.

[0078] The positioning device may be configured to effect translation and / or rotation of the source modules relative to each other.

[0079] The interface device may be configured to combine the individual radiation beams upstream of the field honeycomb device, in particular the interface device may comprise a deflection mirror for this purpose.

[0080] The field honeycomb device may preferably be in the form of a field honeycomb plate.

[0081] The exit back focal length of each of the focal length zoom optical units can be made larger than the image diameter of the radiation used. As a result of selecting relatively large exit back focal lengths of the focal length zoom optical units, it is possible to ensure a sufficiently large distance between the radiation source modules.

[0082] In an advantageous development of the radiation source arrangement according to the invention, it can be provided that the focal length zoom optical unit comprises a retrofocus device.

[0083] By using a retrofocus device, the back focal length of the focal length zoom can be chosen to be particularly large in a particularly simple manner.

[0084] In an advantageous development of the radiation source device according to the invention, the radiation source module comprises: - the individual radiation is imaged into a field honeycomb device, and / or - so that each focal length zoom optical unit has a common pupil plane; They may be spaced apart and tilted in the direction of their individual emissions towards each other and towards the optical axis.

[0085] The above described arrangement has been found to be particularly advantageous when used in conjunction with a fly's eye collector as a mixing device, as the tilt of the source module towards the optical axis is particularly advantageous for filling gaps in the illumination pupil when a fly's eye collector is used.

[0086] The individual rays may be incident on the field honeycomb plate at an angle of 1° to 40°, preferably 5° to 30°, relative to the optical axis of the field honeycomb plate.

[0087] An advantageous development of the radiation source device according to the invention comprises: - the source modules are arranged at a distance from each other and antiparallel to the direction of their individual radiation; and / or the interface device preferably comprises a deflection device with at least two deflection mirrors, which are arranged in such a way that the individual radiations are integrated on the field honeycomb device at an angle to the optical axis, wherein: - the individual radiation is imaged into a field honeycomb device, and / or It is possible to make each focal length zoom optical unit have a common pupil plane.

[0088] The above-described configuration is particularly suitable when an oblique arrangement of all source modules towards the optical axis is disadvantageous for space reasons. Oblique incidence of the individual radiation on the fly's eye collector can be obtained by efficient use of the installation space using suitably adapted interface devices.

[0089] In an advantageous development of the radiation source arrangement according to the invention, the interface device preferably comprises a deflection mirror, which can be arranged in such a way that the individual radiations are combined on the field honeycomb device.

[0090] The above-described configurations facilitate the formation of embodiments of the radiation source device described above in which the radiation source modules are spaced apart and laterally offset anti-parallel to the direction of their individual radiation.

[0091] In an advantageous development of the radiation source device according to the invention, the back focal length of each focal length zoom optical unit can be made to correspond to at least one image diameter of each individual radiation on the field honeycomb device, preferably three times the image diameter, particularly preferably ten times the image diameter.

[0092] The above-mentioned selection of the back focal lengths of the respective focal length zoom optical units has been found to be particularly suitable for obtaining a wide working range when positioning the radiation source modules.

[0093] The back focal length can be between 10 mm and 2000 mm, preferably between 20 mm and 1200 mm, and / or can be adjustable.

[0094] The invention further relates to an illumination system having the features specified in claim 1.

[0095] An illumination system according to the invention for a lithography system, in particular for a projection exposure apparatus, serves to illuminate a reticle of the lithography system with use radiation from a radiation source device and comprises an optical unit having at least one optical element and at least one mixing device. According to the invention, an interface device is provided for coupling a plurality of individual radiations forming the use radiation into the mixing device, wherein the source etendue of the radiation source device fills at least 50 percent, preferably at least 80 percent, of the optical etendue of the optical and / or mixing device.

[0096] The use of an interface device is advantageous in that the individual radiations that may emanate from different radiation sources or radiation source modules can be adapted to the prevailing requirements and geometry at the point of incidence into the mixing device.

[0097] As a result, the illumination system allows complete illumination of a larger portion of the system etendue than is the case with illumination systems known from the prior art.

[0098] Within the scope of the present invention, it has been found that having at least 50 percent of the optical etendue filled by the source etendue is an advantageous compromise between the number of individual emissions required and the resulting improvement in light intensity at the reticle.

[0099] An advantageous development of the lighting system according to the invention can be provided in that the mixing device is in the form of a mixing rod.

[0100] The use of a mixing rod as the mixing device is advantageous in that mixing rods are known from the prior art as reliable and inexpensive mixing devices.

[0101] In an advantageous development of the illumination system according to the invention, it can be provided that in the entrance plane of the mixing rod the individual radiation beams are offset from one another and from the optical axis of the mixing rod and are offset parallel to the optical axis and from one another.

[0102] The parallel, offset arrangement of the individual radiations in the input face of the mixing rod is advantageous in that the radiation used can fill the etendue or optical etendue of the illumination system to a particularly complete extent.

[0103] An advantageous development of the illumination system according to the invention can be provided in that the mixing device is in the form of a fly's eye collector with a field honeycomb device, a pupil honeycomb device and a downstream second-order Fourier optical device.

[0104] The use of a fly's eye concentrator is advantageous in that it allows the mixing device to be formed in a particularly efficient and space-saving manner.

[0105] In an advantageous development of the illumination system according to the present invention, the interface device is configured to couple a plurality of individual rays of the used radiation into the fly's eye collector, so that the individual rays are inclined relative to each other and to the optical axis of the fly's eye collector in the field honeycomb device and are integrated therein.

[0106] When a fly's eye collector is used as a mixing device, the filling of the etendue of the illumination system can be increased, in particular by using an interface device to tilt a plurality of individual radiations and feed them into the fly's eye collector. The alignment of the combined but tilted individual radiations at their point of incidence into the fly's eye collector is advantageous in that the illumination setting at the reticle of the downstream projection exposure apparatus is not impaired compared to a single individual radiation.

[0107] An advantageous development of the illumination system according to the invention can be provided in that the interface device comprises at least one deflecting mirror and / or at least one prism, preferably having a refractive power.

[0108] By using optical elements with refractive power, for example deflecting mirrors with refractive power and / or prisms with refractive power, it is possible to influence and in particular lengthen the exit or back focal length or working distance of the scale zoom optical unit and / or focal length zoom optical unit.

[0109] An advantageous development of the illumination system according to the invention can be provided in that the radiation source device is in the form of a radiation source device as claimed in any of claims 9-32.

[0110] Although more advantageous UV light can be produced by radiation sources known from the prior art, illumination systems in scanner and / or stepper configurations are limited in terms of the available etendue. To compensate for this, there is a need for radiation sources with high radiance. Discharge lamps, as used in preferred embodiments of the radiation source device according to the invention, provide high radiance.

[0111] The illumination system according to the invention is particularly suitable for applications in the packaging field of semiconductor lithography, where throughput is crucial and the resolution limit of the projection exposure apparatus is less important. Using the illumination system according to the invention and the high irradiance and intensity at the reticle that can be achieved by the illumination system according to the invention, such a high throughput can be achieved with short illumination times.

[0112] In illumination systems of scanner and / or stepper configurations known from the prior art, the optical etendue of the optics of the illumination system is larger than the etendue of the radiation source, which allows the use of multiple discharge lamps to increase the radiation flux and thus the system throughput or productivity of the projection exposure apparatus.

[0113] Due to the partial coherence of the radiation used, it is possible to ensure that only a portion of the entrance pupil of the projection optical unit of the projection exposure apparatus is illuminated by the radiation used, thereby avoiding light losses.

[0114] In an advantageous development of the illumination system according to the invention, it can be provided that a positioning device is provided for positioning the illumination system in particular relative to the radiation source device and / or for positioning the radiation source device in particular relative to the illumination system.

[0115] The positioning device may be configured to rotate parts of the source arrangement, in particular the source module, that form the individual radiation, which is particularly advantageous in particular when using fly's eye collectors.

[0116] The invention further relates to a method for illuminating a reticle, having the features specified in claim 33.

[0117] In a method according to the invention for illuminating a lithography system, in particular a reticle of a projection exposure apparatus, with used radiation, individual radiations for forming the used radiation are generated by a plurality of radiation source modules, and according to the invention, the individual radiations are coupled into a mixing device of the projection exposure apparatus.

[0118] The method according to the invention is advantageous in that, as a result of the in-coupling of a plurality of individual radiation beams, the etendue of the projection exposure apparatus, in particular of the mixing device, can be utilized as completely as possible.

[0119] In an advantageous development of the method according to the invention, it can be provided that the radiation source modules can be switched and / or positioned at least partly independently.

[0120] As a result of the at least partly independent control of the position and emission state of the source module, particularly good illumination of the reticle can be obtained.

[0121] In an advantageous development of the method according to the present invention, in order to form the radiation to be used in a mixing device in the form of a fly's eye collector having a field honeycomb device, a pupil honeycomb device and a downstream secondary Fourier optical device, the individual radiations can be coupled into the field honeycomb device in such a way that they are inclined relative to each other and relative to the optical axis of the mixing rod and are then combined therein.

[0122] The tilted feeding of the individual radiations to the fly's eye collectors makes it possible to advantageously fill the optical etendue of the mixing device.

[0123] In an advantageous development of the method according to the invention, the source etendue of the used radiation for each used pupil filling is selected so as to fill at least 50 percent, preferably at least 80 percent, of the optical etendue of the projection exposure apparatus. The source modules may be adapted to be switched and / or positioned.

[0124] In particular, the source etendue of the radiation used may correspond to the etendue of the radiation source device.

[0125] Within the scope of the present invention, an underfill of the optical etendue of 50 percent to 70 percent has been found to be an advantageous compromise between light loss and luminous intensity at the illuminated reticle.

[0126] The invention further relates to a lithography system having the features specified in claim 38.

[0127] A lithographic system according to the invention, in particular a projection exposure apparatus, comprises a radiation source device and / or an illumination system for illuminating a reticle with the radiation used. According to the invention, it is provided that the radiation source device is a radiation source device according to the invention or one of the preferred embodiments of a radiation source device according to the invention, and / or that the illumination system is an illumination system according to the invention or one of the preferred embodiments of an illumination system according to the invention, and / or that the reticle is illuminated using the method according to the invention and / or using one of the embodiments of the method according to the invention.

[0128] A lithography system according to the present invention is advantageous in that it has a high illumination intensity at the reticle, thereby increasing the system throughput of the overall lithography system.

[0129] In an advantageous development of the lithography system according to the invention, a positioning device is provided, which positioning device comprises: - positioning the radiation source modules relative to each other and / or relative to the illumination system, and / or The radiation source device may be configured to be positioned relative to the illumination system.

[0130] The positioning device can be used to adjust the positioning of the source module based on the illumination settings at the reticle required during operation of the projection exposure apparatus.

[0131] In an advantageous development of the lithography system according to the invention, the source modules can be switchable and / or positionable such that the source etendue fills at least 50 percent, preferably at least 80 percent, of the optical etendue for each used pupil fill.

[0132] Particularly in the case of underfilling of the optical etendue of 50 to 70 percent, a very good compromise between the luminous intensity at the reticle and the number of source modules used is obtained.

[0133] Features described in conjunction with one of the inventive subject matters, in particular provided by the inventive radiation source device, the inventive illumination system, the inventive method and the inventive lithography system, can also be advantageously implemented for the other inventive subject matters, and likewise advantages specified in conjunction with one of the inventive subject matters can also be understood in relation to the other inventive subject matters.

[0134] It should further be noted that words such as "comprising", "having" or "with" do not exclude any other features or steps, and words such as "a" or "the" referring to a singular step or feature do not exclude a plurality of features or steps and vice versa.

[0135] However, in pure embodiments of the invention, features described in the invention using terms such as "comprising," "having," or "with" may constitute an exhaustive list. Thus, one or more lists of features can be considered exhaustive within the scope of the invention, for example, when considered individually for each claim. As an example, the invention can consist only of the features specified in claim 9 or 1.

[0136] It should be noted that labels such as "first" or "second" are used primarily to distinguish features of each apparatus or method, and are not necessarily intended to indicate that features require or relate to each other.

[0137] Exemplary embodiments of the present invention will now be described in detail with reference to the drawings.

[0138] Each drawing illustrates a preferred exemplary embodiment in which individual features of the invention are shown in combination with one another. Features of one exemplary embodiment may be implemented separately from other features of the same exemplary embodiment, and therefore may be readily combined by a skilled artisan to form further useful combinations and subcombinations with features of other exemplary embodiments.

[0139] In the figures, elements with the same function are designated by the same reference numerals. [Brief explanation of the drawings]

[0140] [Figure 1] 1 shows a meridional section of an EUV projection exposure apparatus. [Figure 2] 1 shows a DUV projection exposure apparatus. [Figure 3] 1A and 1B are schematic diagrams illustrating possible embodiments of a radiation source device according to the invention; [Figure 4] 2A and 2B are schematic diagrams illustrating possible embodiments of a source module of a radiation source device according to the invention; [Figure 5] 3A and 3B are schematic diagrams illustrating further possible embodiments of a radiation source device according to the invention; [Figure 6] 3A and 3B are schematic diagrams illustrating further possible embodiments of a radiation source device according to the invention; [Figure 7] 3A and 3B are schematic diagrams illustrating further possible embodiments of a radiation source device according to the invention; [Figure 8] 3A and 3B are schematic diagrams illustrating further possible embodiments of a radiation source device according to the invention; [Figure 9] 3A and 3B are schematic diagrams illustrating further possible embodiments of a radiation source device according to the invention; [Figure 10] 1 is a schematic diagram illustrating a conventional radiation source device. [Figure 11] 3A and 3B are schematic diagrams illustrating further possible embodiments of a radiation source device according to the invention; [Figure 12] 3A and 3B are schematic diagrams illustrating further possible embodiments of a radiation source device according to the invention; [Figure 13]3A and 3B are schematic diagrams illustrating further possible embodiments of a radiation source device according to the invention; [Figure 14] FIG. 1 is a schematic diagram illustrating possible ratios of source etendue to optical etendue in a conventional illumination system. [Figure 15] 1 is a schematic diagram illustrating possible ratios of source etendue to optical etendue in an illumination system according to the present invention; [Figure 16] 1A and 1B are schematic diagrams illustrating possible improvements in the use of etendue by a radiation source device according to the invention or an illumination system according to the invention in the case of a scanner configuration and large illumination settings. [Figure 17] FIG. 17 is a schematic diagram showing a possible improvement according to FIG. 16 for a stepper configuration. [Figure 18] FIG. 17 is a schematic diagram illustrating the possible improvement according to FIG. 16 for small illumination settings. [Figure 19] FIG. 17 is a schematic diagram illustrating the possible improvements shown in FIG. 16 for small illumination settings and stepper configurations. [Figure 20] 1 is a block diagram showing a possible embodiment of the method according to the invention; [Figure 21] 3 shows a schematic diagram of a further possible embodiment of a projection exposure apparatus according to the invention; DETAILED DESCRIPTION OF THE INVENTION

[0141] 1, the important components of a microlithography EUV projection exposure apparatus 100 as an example of a lithography system will first be described below by way of example, where the description of the basic structure of the EUV projection exposure apparatus 100 and its component parts should not be construed as limiting.

[0142] In addition to the radiation source 102, the illumination system 101 of the EUV projection exposure apparatus 100 comprises an illumination optical unit 103 for illuminating an object field 104 in an object plane 105. What is exposed here is a reticle 106 arranged in the object field 104. The reticle 106 is held by a reticle holder 107. The reticle holder 107 is movable, in particular in the scanning direction, by means of a reticle movement drive 108.

[0143] For ease of illustration, a Cartesian xyz coordinate system is plotted in FIG. 1. The x direction is perpendicular to the plane of the drawing. The y direction is horizontal, and the z direction is vertical. In FIG. 1, the scanning direction is the y direction. The z direction is perpendicular to the object plane 105.

[0144] The EUV projection exposure apparatus 100 comprises a projection optical unit 109. The projection optical unit 109 serves to image the object field 104 into an image field 110 in an image plane 111. The image plane 111 extends parallel to the object plane 105. Alternatively, an angle different from 0° between the object plane 105 and the image plane 111 is also possible.

[0145] The structures on the reticle 106 are imaged onto a photosensitive layer of a wafer 112, which is arranged in the region of the image field 110 in an image plane 111. The wafer 112 is held by a wafer holder 113. The wafer holder 113 is movable, in particular in the y-direction, by means of a wafer movement drive 114. The movements of the reticle 106, firstly by means of the reticle movement drive 108, and of the wafer 112, secondly by means of the wafer movement drive 114, can be performed synchronously with respect to one another.

[0146] The radiation source 102 is an EUV radiation source. The radiation source 102 in particular emits EUV radiation 115, hereinafter also referred to as working radiation, illumination radiation or projection radiation. In particular, the working radiation 115 has a wavelength in the range of 5 nm to 30 nm. The radiation source 102 may be a plasma source, for example an LPP source ("laser produced plasma") or a GDPP source ("gas discharge produced plasma"). It may also be a synchrotron-based radiation source. The radiation source 102 may be a free electron laser (FEL).

[0147] Illumination radiation 115 from radiation source 102 is focused by collector 116. Collector 116 may be a collector having one or more elliptical and / or hyperbolic reflective surfaces. At least one reflective surface of collector 116 may be incident on which the illumination radiation 115 is incident at grazing incidence (GI), i.e., at an angle of incidence greater than 45°, or at normal incidence (NI), i.e., at an angle of incidence less than 45°. Collector 116 may be constructed and / or coated, firstly, to optimize its reflectivity for the radiation 115 used, and secondly, to suppress extraneous light.

[0148] Downstream of collector 116, illumination radiation 115 propagates through an intermediate focus at intermediate focal plane 117. Intermediate focal plane 117 may represent the separation between the source module comprising radiation source 102 and collector 116 and illumination optics unit 103.

[0149] The illumination optical unit 103 includes a deflection mirror 118 and a first facet mirror 119 downstream in the beam path. The deflection mirror 118 can be a plane deflection mirror or a mirror with a beam-influencing effect beyond a simple deflection effect. Alternatively or additionally, the deflection mirror 118 can be in the form of a spectral filter that separates the used optical wavelength of the illumination radiation 115 from external light at wavelengths deviating therefrom. If the first facet mirror 119 is arranged in a plane of the illumination optical unit 103 that is optically conjugate with the object plane 105 as a field plane, it is also called a field facet mirror. The first facet mirror 119 includes a number of individual first facets 120, also referred to as field facets hereinafter. Only a few of these facets 120 are shown in FIG. 1 as examples.

[0150] The first facet 120 may be realized as a macro facet, in particular as a rectangular facet, or as a facet with an arcuate edge profile or an edge profile of a portion of a circle. The first facet 120 may be realized as a planar facet, or as a convexly or concavely curved facet.

[0151] As is known for example from DE 102008009600, the first facets 120 themselves can each consist of a number of individual mirrors, in particular a number of micromirrors. In particular, the first facet mirrors 119 can be realized as microelectromechanical systems (MEMS). See DE 102008009600 for further details.

[0152] Illumination radiation 115 travels horizontally, or in the y-direction, between collector 116 and deflection mirror 118 .

[0153] A second facet mirror 121 is arranged downstream of the first facet mirror 119 in the beam path of the illumination optical unit 103. If the second facet mirror 121 is arranged in the pupil plane of the illumination optical unit 103, it is also called a pupil facet mirror. The second facet mirror 121 can also be arranged at a certain distance from the pupil plane of the illumination optical unit 103. In this case, the combination of the first facet mirror 119 and the second facet mirror 121 is also called a specular reflector. Specular reflectors are known from US Patent Publication No. 2006 / 0132747, EP 1 614 008 and US Patent No. 6,573,978.

[0154] The second facet mirror 121 includes a plurality of second facets 122. In the case of a pupil facet mirror, the second facets 122 are also called pupil facets.

[0155] The second facet 122 may also be a macro facet, which may have, for example, rounded, rectangular or hexagonal boundaries, or it may also be a facet consisting of a micromirror, see in this regard DE 102008009600 A1.

[0156] The second facet 122 may have a planar reflective surface or a reflective surface with a convex or concave curvature.

[0157] The illumination optical unit 103 therefore forms a double-faceted system. This basic principle is also called a fly's eye integrator.

[0158] It may be advantageous for the second facet 121 not to be located exactly in a plane that is optically conjugate with the pupil plane of the projection optical unit 109 .

[0159] With the aid of the second facet mirror 121, the individual first facets 120 are imaged into the object field 104. The second facet mirror 121 is the last beam-shaping mirror or indeed the last mirror for the illumination radiation 115 in the beam path upstream of the object field 104.

[0160] In a further embodiment, not shown, of the illumination optical unit 103, a transfer optical unit can be arranged in the beam path between the second facet mirror 121 and the object field 104, said transfer optical unit contributing in particular to imaging the first facet 120 into the object field 104. The transfer optical unit may comprise exactly one mirror, but instead may comprise two or more mirrors arranged one behind the other in the beam path of the illumination optical unit 103. In particular, the transfer optical unit may comprise one or two mirrors for normal incidence (NI mirrors, “normal incidence” mirrors) and / or one or two mirrors for grazing incidence (GI mirrors, “grazing incidence” mirrors).

[0161] In the embodiment shown in FIG. 1, the illumination optical unit 103 includes exactly three mirrors downstream of the collector 116, namely a deflection mirror 118, a field facet mirror 119 and a pupil facet mirror 121.

[0162] The deflection mirror 118 may also be omitted in further embodiments of the illumination optical unit 103, which may then have exactly two mirrors downstream of the collector 116, specifically a first facet mirror 119 and a second facet mirror 121.

[0163] The imaging of the first facet 120 onto the object plane 105 using the second facet 122 or using the second facet 122 and the transfer optical unit is in principle only a schematic imaging.

[0164] The projection optical unit 109 comprises a number of mirrors Mi, numbered according to their location in the beam path of the EUV projection exposure apparatus 100 .

[0165] 1, the projection optical unit 109 includes six mirrors M1 to M6. Alternatives with 4, 8, 10, 12 or any other number of mirrors Mi are possible as well. The penultimate mirror M5 and the last mirror M6 each have an aperture for the illumination radiation 115 to pass through. The projection optical unit 109 is a double-shielded optical unit. The projection optical unit 109 has an image-side numerical aperture that is greater than 0.5, may be greater than 0.6, and may be, for example, 0.7 or 0.75.

[0166] The reflective surface of the mirror Mi can be in the form of a free-form surface without an axis of rotational symmetry. Alternatively, the reflective surface of the mirror Mi can be designed as an aspheric surface with exactly one axis of rotational symmetry of the reflective surface shape. Just like the mirrors of the illumination optical unit 103, the mirror Mi can have a highly reflective coating for the illumination radiation 115. These coatings can be designed as multi-layer coatings, in particular with alternating layers of molybdenum and silicon.

[0167] The projection optical unit 109 has a large object image shift in the y direction between the y coordinate of the center of the object field 104 and the y coordinate of the center of the image field 110. In the y direction, this object image shift can be approximately as large as the z distance between the object plane 105 and the image plane 111.

[0168] The projection optical unit 109 particularly has an anamorphic shape. In particular, the projection optical unit 109 has different imaging scales βx and βy in the x and y directions. The two imaging scales βx and βy of the projection optical unit 109 are preferably (βx, βy)=(±0.25, ±0.125). A positive imaging scale β means imaging without image inversion. A negative sign for the imaging scale β means imaging with image inversion.

[0169] The projection optical unit 109 therefore produces a size reduction in the x-direction, ie perpendicular to the scanning direction, with a ratio of 4:1.

[0170] The projection optical unit 109 produces a size reduction of 8:1 in the y-direction, ie the scan direction.

[0171] Other imaging scales are possible as well, for example imaging scales of the same sign and magnitude in the x and y directions of 0.125 or 0.25 absolute.

[0172] The number of intermediate image planes in the x and y directions in the beam path between the object field 104 and the image field 110 can be the same or different depending on the embodiment of the projection optical unit 109. An example of a projection optical unit with a different number of such intermediate images in the x and y directions is known from US Patent Publication No. 2018 / 0074303.

[0173] In each case, one of the pupil facets 122 is assigned to exactly one of the field facets 120 in order to form an illumination channel for illuminating the object field 104 in each case. In particular, this allows illumination according to the Köhler principle to be obtained. The field facets 120 are used to decompose the far field into multiple object fields 104. The field facets 120 produce multiple images of intermediate foci on the pupil facets 122 respectively assigned to the field facets 120.

[0174] The field facets 120 are superimposed on one another and imaged onto the reticle 106 in order to illuminate the object field 104 in each case with the assigned pupil facets 122. The illumination of the object field 104 is particularly as uniform as possible. Preferably, the uniformity error is less than 2%. Field uniformity can be obtained by superimposing different illumination channels.

[0175] The illumination of the entrance pupil of the projection optical unit 109 can be geometrically defined by means of the arrangement of the pupil facets. By selecting the illumination channels, and in particular the subset of pupil facets, through which light is directed, the intensity distribution at the entrance pupil of the projection optical unit 109 can be set. This intensity distribution is also called the illumination setting.

[0176] A similarly favorable pupil uniformity in the region of a section of the illumination pupil of the illumination optical unit 103 that is illuminated in a defined manner can be achieved by redistribution of the illumination channels.

[0177] Further aspects and details of the illumination of the object field 104, and in particular the entrance pupil of the projection optical unit 109, are described below.

[0178] The projection optical unit 109 may in particular have a concentric entrance pupil. The concentric entrance pupil may be accessible. The concentric entrance pupil may also be inaccessible.

[0179] The entrance pupil of the projection optical unit 109 cannot generally be illuminated exactly using the pupil facet mirror 121. When the projection optical unit 109 images the center of the pupil facet mirror 121 telecentrically onto the wafer 112, the aperture rays often do not intersect at a single point. However, it is possible to determine the surface area over which the spacing of the aperture rays determined in pairs is minimized. This surface area corresponds to the entrance pupil or to an area in real space that is conjugate to the entrance pupil. In particular, this area has a finite curvature.

[0180] The projection optical unit 109 may have different orientations of the entrance pupil for the tangential and sagittal beam paths, in which case imaging elements, in particular optical components of the transfer optical unit, must be provided between the second facet mirror 121 and the reticle 106. This optical component can be used to take into account the different orientations of the tangential and sagittal entrance pupils.

[0181] 1, the pupil facet mirror 121 is arranged in an area conjugate with the entrance pupil of the projection optical unit 109. The first field facet mirror 119 is arranged so as to be tilted with respect to the object plane 105. The first facet mirror 119 is arranged so as to be tilted with respect to the arrangement plane defined by the deflection mirror 118.

[0182] The first facet mirror 119 is arranged so as to be tilted with respect to the arrangement plane defined by the second facet mirror 121 .

[0183] 2 shows an exemplary DUV projection exposure apparatus 200. For this purpose, EUV-specific components, such as the collector mirror 116, are not required or can be replaced accordingly. However, it is also possible to use a discharge lamp with a collector. The DUV projection exposure apparatus 200 comprises an illumination system 201, a device known as a reticle stage 202 for receiving and precisely positioning a reticle 203 on which the subsequent structure on the wafer 204 is determined, a wafer holder 205 for holding, moving and precisely positioning the wafer 204, and an imaging device, in particular the projection optical unit 206, having a number of optical elements, in particular lens elements 207 held by fixtures 208 in a lens housing 209 of the projection optical unit 206.

[0184] As an alternative to, or in addition to, the illustrated lens element 207, various refractive, diffractive and / or reflective optical elements may be provided, in particular mirrors, prisms, end plates, etc.

[0185] The basic functional principle of the DUV projection exposure tool 200 is that structures incorporated in a reticle 203 are imaged onto a wafer 204 .

[0186] Illumination system 201 provides projection radiation in the form of a projection beam 210, or electromagnetic radiation, required to image a reticle 203 onto a wafer 204. The radiation source used for this radiation can be a laser, a plasma source, etc. The radiation is shaped in illumination system 201 using optical elements so that when it impinges on reticle 203, projection beam 210 has the desired properties in terms of wavefront diameter, polarization, shape, etc.

[0187] An image of the reticle 203 is generated using the projection beam 210 and transferred, in an appropriately reduced form, from the projection optics unit 206 onto the wafer 204. In this case, the reticle 203 and the wafer 204 can be moved synchronously so that areas of the reticle 203 are imaged onto corresponding areas of the wafer 204 in a substantially continuous manner during what is called a scanning operation.

[0188] The air gap between the last lens element 207 and the wafer 204 can optionally be replaced by a liquid medium having a refractive index greater than 1.0. The liquid medium can be, for example, high-purity water. Such an arrangement, also called immersion lithography, has improved photolithographic resolution.

[0189] The use of the present invention is not limited to use in projection exposure apparatuses 100, 200, which do not necessarily have the specifically described structure. The present invention is suitable for any lithography system, but is particularly suitable for projection exposure apparatuses having the described structure. The present invention is also suitable for EUV projection exposure apparatuses having smaller image-side numerical apertures than those described in the context of FIG. 1. In particular, the present invention is also suitable for EUV projection exposure apparatuses having image-side numerical apertures of 0.25 to 0.5, preferably 0.3 to 0.4, and particularly preferably 0.33. Furthermore, the present invention and the following exemplary embodiments should not be construed as being limited to any particular design. The following figures illustrate the present invention in highly schematic form, by way of example only.

[0190] FIG. 3 shows a schematic diagram of a possible embodiment of the radiation source device 1 .

[0191] A radiation source device 1 for generating and emitting used radiation 2 for a lithography system, in particular for one of the projection exposure apparatuses 100, 200, comprises a plurality of radiation source modules 3 for generating individual radiation 4, the individual radiation 4 forming the used radiation 2.

[0192] In the exemplary embodiment of the radiation source device 1 shown in FIG. 3, preferably exactly two radiation source modules 3 are provided.

[0193] Preferably, the radiation source modules 3 in the exemplary embodiment shown in Figure 3 are at least partly independently switchable. To switch the radiation source modules 3, a control device 5 is preferably present in the exemplary embodiment of the radiation source device 1 shown in Figure 3.

[0194] In the exemplary embodiment of the radiation source device 1 shown in FIG. 3, the radiation source modules 3 are preferably further arranged such that the used radiation 2 is output from parallel spaced apart individual radiations 4 of the radiation source modules 3 .

[0195] The radiation source apparatus 1 according to the exemplary embodiment shown in Figure 3 also has a positioning device 6 which serves the purpose of positioning the radiation source modules 3. In this case, preferably, the radiation source modules 3 are positionable at least partly independently of one another.

[0196] In the exemplary embodiment shown in FIG. 3, a mixing device 7 having an entrance surface 14 for mixing the used radiation 2 is preferably also provided.

[0197] According to the exemplary embodiment shown in FIG. 3, the radiation source device 1 is preferably provided with an interface device 8 for positioning and aligning the individual radiation rays 4 .

[0198] In this case, the interface device 8 is preferably configured to couple the used radiation 2 incidentally into the mixing device 7 .

[0199] FIG. 4 shows a schematic diagram of a possible embodiment of the source module 3 of the source device 1 .

[0200] 4, the source module 3 includes an ellipsoidal mirror 9 for aligning the individual radiation 4. Alternatively or additionally, the source module 3 may also include one or more parabolic mirrors or multiple ellipsoidal mirrors 9.

[0201] In the exemplary embodiment shown in Figure 4, the radiation source module 3 preferably includes a spectral filter 10 for filtering the individual radiation 4. Multiple spectral filters 10 may also be provided.

[0202] In the exemplary embodiment shown in Figure 4, the source module 3 also comprises a light source 11, preferably in the form of a discharge lamp, particularly preferably in the form of a mercury discharge lamp. A plurality of light sources 11 may also be provided.

[0203] The exemplary embodiment of the source module 3 shown in Figure 3 also includes an optical unit 12, preferably in the form of a scale zoom optical unit 12a and / or a focal length zoom optical unit 12b (see Figures 5 and 12). Multiple optical units 12 may be provided.

[0204] FIG. 5 shows a schematic diagram of a further possible embodiment of the radiation source device 1.

[0205] In the exemplary embodiment shown in Figure 5, the mixing device 7 is in the form of a mixing rod 7a.

[0206] 5, the source modules 3 are also spaced apart and arranged parallel to one another in the direction of the individual radiation 4, and the interface device 8 comprises four deflection mirrors 13 arranged parallel to one another in pairs such that the spacing of the individual radiation 4 is reduced as a result of deflection after incidence on the deflection mirrors 13. In this case, the deflection mirrors 13 are preferably arranged such that the deflected individual radiation 4 is directed perpendicularly to the entrance face 14 of the mixing rod 7a.

[0207] FIG. 6 shows a schematic diagram of a further possible embodiment of the radiation source device 1.

[0208] In the exemplary embodiment shown in FIG. 6, the source modules 3 are preferably spaced apart and laterally offset anti-parallel to the direction of the individual radiation 4 .

[0209] For further reference numbers see FIG.

[0210] FIG. 7 shows a schematic diagram of a further possible embodiment of the radiation source device 1.

[0211] In this case, the interface device 8 comprises two or more prisms 15, which are arranged such that the first side 15a of each of the prisms 15 is at least approximately parallel to the entrance face 14 of the mixing rod 7a, the second side 15b of each of the prisms 15 is preferably at least approximately perpendicular to the individual radiation 4, and the third side 15c of each of the prisms 15 is arranged such that the individual radiation 4 is guided from the second side 15b to the first side 15a of each of the prisms 15.

[0212] FIG. 8 shows a schematic diagram of a further possible embodiment of the radiation source device 1.

[0213] 8, the source modules 3 are spaced apart and tilted towards each other in the direction of their individual emissions 4 and towards the central plane 16 of the mixing rod 7a, such that the respective scale zoom optical units 12a and / or focal length zoom optical units 12b have a common pupil plane 17. The interface device 8 also preferably includes a Fourier optical device 18 as an input coupling group 19 configured to image the individual emissions 4 onto the input face 14 of the mixing rod 7a.

[0214] In the exemplary embodiment shown in FIG. 8, the interface device 8 preferably includes one or more deflection mirrors 13 that are positioned such that the individual radiation 4 is aligned with a Fourier optical device 18 .

[0215] FIG. 9 shows a schematic diagram of a further possible embodiment of the radiation source device 1 according to FIG.

[0216] Compared to the embodiment shown in Figure 8, the interface device 8 in Figure 9 comprises a deflection device 20, which has a refractive power acting on the individual radiation 4, in particular for adaptation of the back focal length 21 (see Figure 12). In this case, the deflection device 20 is arranged such that the individual radiation 4 is aligned with the Fourier optical device 18. In the exemplary embodiment shown in Figures 5 to 9, the individual radiation 4 can be coupled into the mixing rod 7a along the central plane of the mixing rod 7a.

[0217] In the exemplary embodiment shown in FIGS. 7, 8 and 9, the image of the individual radiation 4 is illustrated as a circle in the area of ​​the entrance surface 14 .

[0218] FIG. 10 shows a schematic diagram of a conventional radiation source device 1.

[0219] In the exemplary embodiment shown in FIG. 10, the mixing device 7 is in the form of a fly's eye concentrator 7 b having a field honeycomb device 22 , a pupil honeycomb device 23 and a downstream second order Fourier optical device 24 .

[0220] FIG. 11 shows a schematic diagram of a further possible embodiment of a radiation source device 1 according to the invention, which is based on the radiation source device 1 according to FIG.

[0221] In the exemplary embodiment shown in Figure 11, the individual radiations 4 are imaged into the field honeycomb device 22 and are tilted towards each other and towards the optical axis 25 so that their respective focal length zoom optical units 12b (see Figure 12) have a common pupil plane 17.

[0222] In the exemplary embodiment shown in FIGS. 10 and 11, fA denotes the focal length of the field honeycomb device 22, fB denotes the focal length of the pupil honeycomb device 23, and fL denotes the focal length of the second-order Fourier optical device 24.

[0223] FIG. 12 shows a schematic diagram of a further possible embodiment of the radiation source device 1.

[0224] In the exemplary embodiment shown in Figure 12, the source modules 3 preferably each include at least one focal length zoom optical unit 12b.

[0225] In the exemplary embodiment shown in Figure 12, the radiation source modules 3 are spaced apart and tilted towards each other and towards the optical axis 25 in the direction of their individual radiation sources 4 so that the individual radiation 4 is imaged into the field honeycomb device 22 and their respective focal length zoom optical units 12b have a common pupil plane 17.

[0226] In the exemplary embodiment shown in FIG. 12, the focal length zoom optical units 12b each include at least one retrofocus device.

[0227] FIG. 13 shows a schematic diagram of a further possible embodiment of the radiation source device 1.

[0228] In the exemplary embodiment shown in Fig. 13, the radiation source modules 3 are arranged at a distance and anti-parallel to the direction of the individual emissions 4. In the exemplary embodiment shown in Fig. 13, the images of the light source 11 are preferably positioned laterally offset by the second-order Fourier optics 24 as a result of the different field angles. Furthermore, the interface device 8 preferably includes a deflection device 20 having at least two deflection mirrors 13, which are arranged such that the individual emissions 4 are integrated on the field honeycomb device 22 such that they are tilted with respect to the optical axis 25. Furthermore, the individual emissions 4 are preferably imaged into the field honeycomb device 22, and the focal length zoom optical units 12b of the radiation source modules 3 have a common pupil plane 17.

[0229] In the exemplary embodiment shown in FIG. 13, the interface device 8 therefore preferably comprises at least one deflection mirror 13, which is arranged such that the individual radiations 4 are combined on the field honeycomb device 22.

[0230] In the exemplary embodiment shown in Figures 12 and 13, the back focal length 21 of each focal length zoom optical unit 12b is formed to correspond to at least one image diameter of each individual radiation 4 of the field honeycomb device 22, preferably three times the image diameter, and particularly preferably ten times the image diameter.

[0231] Together with the respective mixing device 7, 7a, 7b, the radiation source apparatus 1 shown in FIGS. 3 to 13 forms at least part of an illumination system 30 for a lithography system, in particular for one of the projection exposure apparatus 100,200.

[0232] The illumination system 30 serves to illuminate a reticle 106, 203 of a lithography system using the used radiation 2 from the radiation source arrangement 1. The illumination system 30 comprises an optical device 31 (see FIG. 21) having at least one optical element 32 (see FIG. 21) and at least one mixing device 7. Also, an interface device 8 is adapted to couple a plurality of individual radiations 4 forming the used radiation 2 into the mixing device 7.

[0233] 5-9, the mixing device 7 is in the form of a mixing rod 7a, and at the entrance face 14 of the mixing rod 7a, the individual radiation beams 4 are offset from one another and are parallel to the central axis 16 of the mixing rod, offset from the central axis 16 and from one another.

[0234] According to the exemplary embodiment shown in FIGS. 11-13, the mixing device 7 is in the form of a fly's eye concentrator 7b having a field honeycomb device 22, a pupil honeycomb device 23 and a downstream secondary Fourier optical device 24.

[0235] The interface device 8 is further configured to couple a plurality of individual radiations 4 of the used radiation 2 into the fly's eye collector 7b, where the individual radiations 4 are tilted relative to each other and to the optical axis 25 of the fly's eye collector 7b in the field honeycomb device 22 and are integrated therein.

[0236] According to the exemplary embodiment of the illumination system 30 shown in Figures 5, 6, 8, 9 and 13, the interface device 8 includes at least one deflecting mirror 13 having optical power.

[0237] According to the exemplary embodiment shown in FIG. 7, the interface device 8 includes at least one prism, which may preferably have optical power.

[0238] 14 shows the entrance surface of the mixing device 7 and the individual radiation 4. Possible ratios of the source etendue 33 of the source device 1 of the illumination system 30 to the optical etendue 34 of the optical device 31 and / or mixing device 7 in a conventional illumination system are shown schematically.

[0239] In conventional illumination systems, the optical etendue 34 is not completely filled by the source etendue 33. The available etendue is not utilized to its fullest extent, which can result in insufficient light intensity at the reticle 106, 203.

[0240] In the exemplary embodiments shown in Figures 3 to 9 and 11 to 13, the radiation source apparatus 1 of the illumination system 30 is in the form of a radiation source apparatus 1 according to the invention as described in the context of Figures 3 to 13.

[0241] In the exemplary embodiment shown in FIG. 3, in the case of the illumination system 30, a positioning device 6 is further present and is configured to position the illumination system 30 in particular relative to the radiation source device 1 and / or to position the radiation source device 1 in particular relative to the illumination system 30.

[0242] FIG. 15 shows a schematic diagram of possible ratios between the source etendue 33 of the radiation source device 1 and the optical etendue 34 of the illumination system 30 in the illumination system 30 or for a radiation source apparatus 1 as described in the context of FIGS. 3 to 13.

[0243] In a preferred exemplary embodiment of the illumination system 30 shown in FIG. 15, the source etendue 33 of the radiation source apparatus 1 fills at least 50 percent, preferably at least 80 percent, of the optical etendue 34 of the optical device 31 and / or the mixing device 7 .

[0244] A control device, not shown here, preferably controls the available power η of all the radiation source modules 3 or light sources 11. N The number of light sources 11 or individual radiation sources 4 used is configured to be set so that the available power η of the individual radiation source module 3 is greater than the available power η of the individual radiation source module 3. Nand η1 are defined by equations (2) and (3).

[0245]

number

[0246] In equations (2) and (3), P i (x, y) denotes the image of the i-th light source 11 on the plane of incidence 14, where x and y represent Cartesian coordinates in the image plane. In equations (2) and (3), dS represents a surface element, and the integration is performed over the plane S, which preferably corresponds to the plane of incidence 14.

[0247] Figure 16 shows a schematic diagram illustrating the possible improvement in the utilization of the optical etendue 34 by the source etendue 33 using the radiation source device 1 according to the invention or the illumination system 30 according to the invention in the case of an elongated scanner configuration of the illumination field on the reticle 106, 203.

[0248] On the left, the desired large illumination setting 26 is shown with a wide cone of used radiation 2 and the position of the beam cross section at the entrance face 14 of a mixing rod 7a according to the prior art.

[0249] On the right side, the position of the beam cross section of the used radiation 2 at the entrance surface 14 of the mixing rod 7a is shown for the radiation source device 1 or illumination system 30. In this case, the used radiation 2 is formed by several, preferably a total of two, individual radiations 4, which leads to a better utilization of the optical etendue 34 and therefore a greater luminous intensity at the reticle 106, 203.

[0250] In the embodiment of the scanner configuration shown in FIG. 16, the etendue can be utilized more efficiently than in the prior art with two separate radiation beams 4 that are at least approximately identical and parallel and spaced apart.

[0251] Figure 17 shows a schematic diagram of the possible improvement of the conventionally available optical etendue 34 by the source etendue 33 shown on the left side using the radiation source device 1 according to the invention or the illumination system 30 according to the invention in the case of a square stepper configuration of the illumination field on the reticle 106, 203 in a manner similar to that of Figure 16.

[0252] In the stepper configuration embodiment shown on the right side of Figure 17, the etendue can be utilized more efficiently than in the prior art using four at least approximately identical, parallel, spaced-apart individual beams 4 arranged in an at least approximately square pattern.

[0253] Figure 18 shows a schematic diagram of the possible improvement in the utilization of the optical etendue 34 by the source etendue 33 using the radiation source device 1 according to the invention or the illumination system 30 according to the invention in the case of an elongated scanner configuration of the illumination field on the reticle 106, 203 in a manner similar to that of Figure 16.

[0254] On the left, a desired small illumination setting 26 is shown with a wide cone of used radiation 2 and the position of the beam cross section at the entrance face 14 of a mixing rod 7a according to the prior art.

[0255] On the right side, the position of the beam cross section of the used radiation 2 at the entrance surface 14 of the mixing rod 7a is shown for the radiation source device 1 or illumination system 30. In this case, the used radiation 2 is formed by several, preferably a total of two, individual radiations 4, which leads to a better utilization of the optical etendue 34 and thus a greater luminous intensity at the reticle 106, 203. In this case, the entrance surface 14 is overfilled, which results in a loss of light. However, there is still an increase in brightness at the reticle 106, 203 compared to the prior art solution shown on the left.

[0256] Figure 19 shows, in a similar way to Figure 17, a schematic diagram of a possible improvement of the conventionally available optical etendue 34 by the source etendue 33 shown on the left, using a radiation source device 1 according to the invention or an illumination system 30 according to the invention, for a square scanner configuration of the illumination field on a reticle 106, 203. However, in the exemplary embodiment shown in Figure 19, a smaller illumination setting 26 is desired.

[0257] In the stepper configuration embodiment shown on the right side of Figure 19, the etendue can be utilized more efficiently than in the prior art by using at least four approximately identical, parallel, spaced-apart individual radiations 4 arranged in an at least approximately square pattern and overfilling the entrance surface 14.

[0258] FIG. 20 shows a block diagram of a possible embodiment of a method for illuminating a reticle 106, 203 in a lithography system.

[0259] In a method for illuminating a lithography system, in particular a reticle 106 , 203 of a projection exposure apparatus 100 , 200 using a used radiation 2 , in a generation block 40 individual radiation 4 for forming the used radiation 2 is generated by a plurality of radiation source modules 3 .

[0260] In the coupling-in block 41 the individual radiation 4 is coupled into the mixing device 7 of the projection exposure apparatus 100 , 200 .

[0261] An optional switching block 42 allows the source modules 3 to be switched and / or positioned in an at least partially independent manner.

[0262] Within the input coupling block 41, the individual radiations 4 can preferably be input coupled into a mixing device 7, preferably in the form of a mixing rod 7a, in such a way that at the input surface 14 of the mixing rod 7a the individual radiations 4 are offset from one another and from the optical axis 25 of the mixing rod 7a and are offset parallel to the optical axis and from one another.

[0263] Preferably, as an alternative or in addition, the individual radiations 4 can be incidentally coupled in the field honeycomb device 22 so that they are tilted relative to each other and relative to the optical axis 25b of the fly's eye collector 7b and integrated therein, in order to form the use radiation 2 in a mixing device 7 in the form of a fly's eye collector 7b having a field honeycomb device 22, a pupil honeycomb device 23 and a downstream secondary Fourier optical device 24 within the incident coupling block 41.

[0264] Within the switching block 42, the radiation source modules 3 can preferably be switched and / or positioned such that the source etendue 33 of the radiation source device 1 fills at least 50 percent, preferably at least 80 percent, of the optical etendue 34 of the projection exposure apparatus 100, 200 for each used pupil fill.

[0265] FIG. 21 shows a schematic diagram of a further possible embodiment of a projection exposure apparatus 200 according to the invention, which uses a radiation source device 1 and / or an illumination system 30 .

[0266] In the lithography systems shown in Figures 1, 2 and 21, in particular in the projection exposure apparatus 100, 200 having a radiation source device 1 and / or an illumination system 30 for illuminating the reticle 106, 203 with the radiation used 2, the radiation source device 1 is the radiation source device 1 described in the context of Figures 3 to 19 and / or the illumination system 30 is the illumination system 30 described in the context of Figures 3 to 19 and / or the reticle 106, 203 is illuminated using the method described in the context of Figure 20.

[0267] In the lithography system, a positioning device 6 is preferably provided and configured to position the source modules 3 relative to each other and / or relative to the illumination system 30 and / or to position the radiation source arrangement 1 relative to the illumination system 30 . [Explanation of symbols]

[0268] 1 Radiation source device 2. Radiation used 3 Radiation Source Module 4 Individual radiation 5 Control Device 6 Positioning Device 7 Mixed Devices 7a Mixed Rod 7b Fly's eye concentrator 8 Interface Devices 9. Elliptical mirror 10 Spectral Filters 11 Light source 12 Optical unit 12a Scale Zoom Optical Unit 12b focal length zoom optical unit 13 Deflecting mirror 14 Entrance plane 15 Prism 15a First Aspect 15b Second Aspect 15c The Third Aspect 16 Center plane 17 Pupil plane 18 Fourier Optical Devices 19 Incident Bonding Group 20 Deflection Device 21 Back focal length 22 Field Honeycomb Device 23 Hitomi Honeycomb Device 24 Second-order Fourier optical devices 25 Optical axis 26 Lighting Settings 30 Lighting System 31 Optical Devices 32 Optical Elements 33 Radiation source etendue 34 Optical etendue 40 Generation Block 41 Incident coupling block 42 Switching Block 100 EUV projection exposure equipment 101 Lighting System 102 Radiation source 103 Lighting optical unit 104 Objective Field 105 Objective Surface 106 Reticle 107 Reticle Holder 108 Reticle movement drive unit 109 Projection Optical Unit 110 Image field 111 Image plane 112 wafers 113 Wafer holder 114 Wafer movement drive unit 115 EUV / use / illumination radiation 116 Concentrator 117 Intermediate focal plane 118 Deflecting Mirror 119 First Facet Mirror / Field Facet Mirror 120 First Facet / Field Facet 121 Second Faceted Mirror / Pupil Faceted Mirror 122 Second Facet / Pupil Facet 200 DUV projection exposure equipment 201 Lighting 202 Reticle Stage 203 Reticle 204 wafers 205 Wafer holder 206 Projection Optical Unit 207 Lens 208 Mounting fixture 209 Lens Housing 210 Projection Beam Mi Mirror

Claims

1. An illumination system (30) for a lithography system, in particular a projection exposure apparatus (100, 200), for illuminating a reticle (106, 203) of said lithography system with used radiation (2) from a radiation source arrangement (1), said illumination system comprising an optical device (31) having at least one optical element (32) and at least one mixing device (7), an interface device (8) for coupling a plurality of individual radiations (4) forming the used radiation (2) into the mixing device (7); 1. An illumination system (30), characterized in that the source etendue (33) of said radiation source arrangement (1) fills at least 50 percent, preferably at least 80 percent, of the optical etendue (34) of said optical device (31) and / or said mixing device (7).

2. 2. An illumination system (30) according to claim 1, characterized in that the mixing device (7) is in the form of a mixing rod (7a).

3. 3. The illumination system (30) of claim 2, characterized in that at the entrance surface (14) of the mixing rod (7a), the individual radiations (4) are offset from each other and from the optical axis (25) of the mixing rod and are offset parallel to the optical axis (25) and from each other.

4. 4. The illumination system (30) according to claim 1, wherein the mixing device (7) is in the form of a fly's eye collector (7b) having a field honeycomb device (22), a pupil honeycomb device (23) and a downstream secondary Fourier optical device (24).

5. 5. The illumination system (30) according to claim 4, characterized in that the interface device (8) is configured to couple a plurality of individual radiations (4) of the used radiation (2) into the fly's eye collector (7b), the individual radiations (2) being inclined in the field honeycomb device (22) with respect to each other and with respect to the optical axis (25b) of the fly's eye collector (7b) and being integrated in the field honeycomb device (22).

6. 6. The illumination system (30) according to any one of claims 1 to 5, characterized in that the interface device (8) comprises at least one deflecting mirror (13) and / or at least one prism (15), preferably having a refractive power.

7. An illumination system (30) according to any one of claims 1 to 6, characterized in that the radiation source device (1) is in the form of a radiation source device (1) according to any one of claims 9 to 32.

8. 8. The illumination system (30) according to any one of claims 1 to 7, characterized in that a positioning device (6) is provided for positioning the illumination system (30), in particular relative to the radiation source device (1) and / or for positioning the radiation source device (1), in particular relative to the illumination system (30).

9. A radiation source device (1) for generating and emitting radiation (2) for use in a lithography system, in particular a projection exposure apparatus (100, 200), comprising: A radiation source device (1), characterized in that a plurality of radiation source modules (3) are provided for generating individual radiations (4), said individual radiations (4) forming said used radiation (2).

10. 10. The radiation source device (1) according to claim 9, characterized in that two radiation source modules (3) are provided.

11. 11. The radiation source device (1) according to claim 9 or 10, characterized in that the radiation source modules (3) are at least partly independently switchable.

12. The radiation source arrangement (1) according to any one of claims 9 to 11, characterized in that a control device (5) is provided for switching the radiation source modules (3).

13. 13. The radiation source device (1) according to any one of claims 9 to 12, characterized in that the radiation source module (3) is arranged such that the used radiation (2) is output from the parallel and spaced apart individual radiations (4) of the radiation source module (3).

14. The radiation source arrangement (1) according to any one of claims 9 to 13, characterized in that a positioning device (6) is provided for positioning the radiation source module (3).

15. The radiation source device (1) according to any one of claims 9 to 14, characterized in that the radiation source modules (3) are positionable at least partly independently of one another.

16. Each of the radiation source modules (3) one or more parabolic and / or elliptical mirrors (9) for aligning said individual radiations (4), and / or one or more spectral filters (10) for filtering said individual radiation (4), and / or a light source (11), preferably a discharge lamp, particularly preferably a mercury discharge lamp, and / or one or more optical units (12), preferably a scale zoom optical unit (12a) and / or a focal length zoom optical unit (12b), The radiation source device (1) according to any one of claims 9 to 15, characterized in that it comprises

17. The radiation source arrangement (1) according to any one of claims 9 to 16, characterized in that a mixing device (7) is provided for mixing the used radiation (2) and having an entrance surface (14).

18. The radiation source device (1) according to any one of claims 9 to 17, characterized in that an interface device (8) is provided for positioning and aligning the individual radiations (4).

19. 19. The radiation source arrangement (1) according to claim 18, characterized in that the interface device (8) is configured for coupling the used radiation (2) incident on the mixing device (7).

20. 20. The radiation source device (1) according to any one of claims 17 to 19, characterized in that the individual radiations (4) are configured to form the used radiation (2) in such a way that when the used radiation (2) is incident on the entrance surface (14) of the mixing device (7), a cross section of the used radiation (2) is formed by a plurality of individual radiations (4) that are adjacent to each other and travel parallel, preferably non-overlapping, the individual radiations (4).

21. The radiation source arrangement (1) according to any one of claims 17 to 20, characterized in that the mixing device (7) is in the form of a mixing rod (7a).

22. the radiation source modules (3) are arranged at a distance and parallel to one another in the direction of their individual radiation (4), and / or - the interface device (8) comprises four or more deflection mirrors (13), the deflection mirrors (13) being arranged at least partly parallel to one another so that the distance between the individual radiations (4) is reduced after incidence on the deflection mirrors (13), and / or - The radiation source device (1) according to claim 21, characterized in that the deflection mirror (13) is arranged so that the individual radiation (4) is directed perpendicularly to the entrance face (14) of the mixing rod (7a).

23. the source modules (3) are spaced apart and laterally offset antiparallel to the direction of their individual radiation (4), and / or - The radiation source device (1) according to claim 21 or 22, characterized in that the interface device (8) comprises two or more prisms (15), the prisms (15) being arranged such that a first side (15a) of each of the prisms (15) is arranged at least approximately parallel to the entrance surface (15) of the mixing rod (7a), a second side (15b) of each of the prisms (15) is arranged at least approximately perpendicular to the individual radiation (4), and a third side (15c) of each of the prisms (15) is arranged such that the individual radiation (4) is guided from the second side (15b) to the first side (15a) within each of the prisms (15).

24. the radiation source modules (3) are spaced apart and tilted towards each other and towards the central plane (16) of the mixing rod (7a) in the direction of the respective individual radiations (4) so ​​that their respective scale zoom optical units (12a) and / or focal length zoom optical units (12b) comprise a common pupil plane (17); and / or the interface device (8) comprises a Fourier optical device (18) as an input coupling group (19), the input coupling group (19) being configured to image the individual radiations (4) onto the input surface (14) of the mixing rod (7a); - said interface device (8) preferably comprises a deflection mirror (13), said deflection mirror (13) being arranged so that said individual radiation (4) is aligned with said Fourier optical device (18), or the interface device (8) comprises a deflection device (20) having a refractive power acting on the individual radiations, in particular for the purpose of adapting a back focal length (21), the deflection device (20) being arranged so that the individual radiations (4) are aligned with the Fourier optical device (18); A radiation source device (1) according to any one of claims 21 to 23, characterized in that it

25. The radiation source device (1) according to any one of claims 21 to 24, characterized in that the individual radiation (4) can be coupled into the mixing rod (7a) along a longitudinal axis of the mixing rod (7a).

26. 26. The radiation source apparatus (1) according to any one of claims 17 to 25, characterized in that the mixing device (7) is in the form of a fly's eye collector (7b) having a field honeycomb device (22), a pupil honeycomb device (23) and a downstream secondary Fourier optical device (24).

27. The radiation source device (1) according to any one of claims 17 to 26, characterized in that the radiation source modules (3) each comprise at least one focal length zoom optical unit (12b).

28. 28. The radiation source apparatus (1) according to claim 27, characterized in that the focal length zoom optical unit (12b) comprises a retrofocus device.

29. the radiation source module: - the individual radiation (4) is imaged into the field honeycomb device (22), and / or - so that each focal length zoom optical unit (12b) has a common pupil plane (17), 29. The radiation source device (1) according to claim 27 or 28, characterized in that the radiation sources (1) are arranged at a distance and inclined towards each other in the direction of their respective individual radiation (4) towards the optical axis (25).

30. the radiation source modules (3) are arranged at a distance and antiparallel to the direction of their individual radiation (4), and / or - said interface device (8) preferably comprises a deflection device (20) with at least two deflection mirrors (13), said deflection mirrors (13) being arranged in such a way that said individual radiation (4) is integrated on said field honeycomb device (22) at an angle to said optical axis (25); - the individual radiation (4) is imaged into the field honeycomb device (22), and / or The radiation source device (1) according to any one of claims 27 to 29, characterized in that each focal length zoom optical unit (12b) has a common pupil plane (17).

31. The radiation source apparatus (1) according to any one of claims 26 to 30, characterized in that the interface device (8) comprises at least one deflection mirror (13), the deflection mirror (13) being arranged in such a way that the individual radiations (4) are integrated on the field honeycomb device (22).

32. 32. The radiation source device (1) according to any one of claims 27 to 31, characterized in that the back focal length (21) of each focal length zoom optical unit (12b) corresponds to at least one image diameter of each of the individual radiations (4) on the field honeycomb device (22), preferably three times the image diameter, particularly preferably ten times the image diameter.

33. 1. A method for illuminating a reticle (106, 203) of a lithography system, in particular of a projection exposure apparatus (100, 200), with used radiation (2), comprising: the individual radiations (4) for forming said used radiation (2) are generated by a plurality of radiation source modules (3), - a method, characterized in that the individual radiations (4) are coupled incident on a mixing device (7) of the projection exposure apparatus.

34. 34. Method according to claim 33, characterized in that the radiation source modules (3) are switched and / or positioned at least partly independently.

35. 35. The method according to claim 33 or 34, characterized in that the individual radiations (4) are incidentally coupled into a mixing device (7) in the form of a mixing rod (7a) such that at the entrance surface (14) of the mixing rod (7a) the individual radiations (4) are offset from one another and from the optical axis (25) of the mixing rod (7a) and are offset parallel to the optical axis (25) and from one another.

36. 36. The method according to claim 33, wherein the individual radiations (4) are coupled in such a way that they are inclined in the field honeycomb device (22) with respect to one another and with respect to the optical axis (25) of the fly's eye collector (7b) and are integrated in the field honeycomb device (22) to form the used radiation (2) in a mixing device (7) in the form of a fly's eye collector (7b) having a field honeycomb device (22), a pupil honeycomb device (23) and a downstream second-order Fourier optical device (24).

37. 37. The method according to any one of claims 33 to 36, characterized in that the radiation source module (3) is switched and / or positioned such that the source etendue (33) of the used radiation (2) fills at least 50 percent, preferably at least 80 percent, of the optical etendue (34) of the projection exposure apparatus (100, 200) for each used pupil filling.

38. A lithography system, in particular a projection exposure apparatus (100, 200), having a radiation source device (1) and / or an illumination system (30) for illuminating a reticle (106, 203) with used radiation (2), - the radiation source device (1) is a radiation source device (1) according to any one of claims 9 to 32, and / or - the illumination system (30) is an illumination system (30) according to any one of claims 1 to 8, and / or The reticle (106, 203) is illuminated using a method according to any one of claims 33 to 37. A lithography system comprising:

39. A positioning device (6) is provided, said positioning device comprising: positioning the radiation source modules (3) relative to each other and / or relative to the illumination system (30), and / or - to position said radiation source device (1) relative to said illumination system (30), 39. The lithography system of claim 38, wherein the lithography system is configured to:

40. 40. A lithography system according to claim 38 or 39, characterized in that the radiation source module (3) is switchable and / or positionable such that the radiation source etendue (33) fills at least 50 percent, preferably at least 80 percent, of the optical etendue (34) for each used pupil fill.

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