Method for manufacturing pixel definition layer

Abstract

The present invention aims to realize a colored pattern on an electrode substrate to provide a display with not only vivid colors but also high resolution, thereby improving reliability and lifespan. That is, pixels formed within the size range of the present invention can realize high resolution of Black PDL, and a display with high brightness and long lifespan can be produced depending on the driving voltage and current.

Description

Detailed Description of the Invention

[0001] [Technical field] The present invention relates to a method for fabricating a pixel-defining layer of a light-emitting display device using a photosensitive composition.

[0002] [Background technology] Widely used flat panel displays include liquid crystal displays (LCDs) and organic light emitting displays (OLEDs), among which OLEDs have advantages such as low power consumption, fast response speed, high color reproduction, high brightness, and a wide viewing angle.

[0003] In the case of the organic light emitting display device, a polarizing film is used to block external light that is incident and reflected from the panel, but the polarizing film has a drawback in that it is not suitable for application to a flexible device due to its poor bending properties.

[0004] To solve the above problems, a method has been proposed in which an inorganic film for blocking light is formed on the upper substrate in addition to the color filter and black matrix. However, this method has limitations in achieving a desired level of anti-reflection effect, and no specific method for replacing a polarizing film has been proposed.

[0005] On the other hand, colored patterns are used as red, green, and blue color filters not only in liquid crystal displays but also in organic light-emitting displays.

[0006] In manufacturing the colored pattern, various kinds of organic pigments as well as carbon black and inorganic pigments are used as colorants, and the pigment dispersion in which these are dispersed is mixed with other compositions to form the pattern. The organic light-emitting display manufactured with pixels formed in this way can achieve more vivid colors.

[0007] [Summary of the Invention] [Problem to be solved by the invention] The inventors discovered that when forming a colored pattern, if the pixel size is smaller than the standard size of the red, green, and blue pixels, the brightness decreases at the same driving voltage, and the driving voltage must be increased to maintain the same brightness, resulting in a shortened lifespan. Conversely, if the pixel size is larger, the brightness increases and the current and driving voltage decrease, which is good for device characteristics and lifespan, but has the disadvantage of making it difficult to achieve high resolution. This led to the completion of the present invention.

[0008] In order to solve the problems of the prior art, one embodiment of the present invention provides a method for realizing a colored pattern that forms desired pixels of a certain size on an electrode substrate, thereby improving not only the color clarity but also the reliability and lifespan of a high-resolution display.

[0009] Another embodiment provides an organic light emitting display device including a pixel defining layer manufactured by the method.

[0010] Another embodiment provides an electronic device including the organic light emitting display device.

[0011] [Means for solving the problem] The method for manufacturing a pixel defining layer according to the present invention includes the steps of applying and coating a photosensitive composition; pre-baking; exposing; developing; and post-heat treatment. After the post-heat treatment step, the length of the major axis of the green pixel is 8.0 to 13.0 μm, preferably 9.8 μm to 12.4 μm, and the length of the minor axis is 6.0 to 9.0 μm, preferably 6.2 to 8.3 μm, and it is preferable that the converted aperture ratio of the green pixel exceeds 32%.

[0012] After the post-heat treatment, it is preferable that the length of the major axis of the red pixel is 16.2 to 18.5 μm and the length of the minor axis is 11.6 to 14.5 μm.

[0013] After the post-heat treatment, it is preferable that the length of the major axis of the blue pixel is 21.3 to 25.0 μm and the length of the minor axis is 15.6 to 18.5 μm.

[0014] The shape of the pixel after the post-heat treatment is preferably such that the size of the major axis and the minor axis can be illustrated.

[0015] The pixel shape preferably has one or more of the following shapes: rhombus, square, rectangle, ellipse, hexagon, octagon, and circle.

[0016] The oven temperature in the post-heat treatment step is preferably 210 to 300°C, more preferably 250 to 270°C.

[0017] The post-heat treatment step is more preferably performed for 30 to 120 minutes, and even more preferably for 60 to 120 minutes.

[0018] The photosensitive composition preferably contains a colorant.

[0019] The colorant preferably comprises one or more of an inorganic dye, an organic dye, an inorganic pigment, and an organic pigment.

[0020] The colorant is preferably contained in an amount of 1 to 40% by weight based on the total amount of the photosensitive composition.

[0021] The colorant is preferably pretreated with a dispersant; or a water-soluble inorganic salt and a wetting agent.

[0022] The average particle size of the colorant is preferably 20 nm to 110 nm.

[0023] The photosensitive composition preferably contains a patterning resin that includes an acrylic binder resin, a cardo binder resin, or a combination thereof.

[0024] The weight average molecular weight of the acrylic binder resin is preferably 3,000 g / mol to 150,000 g / mol.

[0025] The cardo-based binder resin preferably contains a repeating structure of the following chemical formula 1:

[0026] [ka]

[0027] In the above Chemical Formula 1, 1) R1 and R2 are each independently hydrogen; deuterium; halogen; C6-C 30 aryl groups of the formula: C2-C containing at least one heteroatom of O, N, S, Si and P; 30 Heterocyclic group; C6-C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C 20 Alkoxy group: C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 2) R1 and R2 can form a ring together with adjacent groups, 3) m and n are each independently an integer of 0 to 4; 4) A1 and A2 are each independently represented by the following formula 2 or 3:

[0028] [ka]

[0029] [ka]

[0030] In the above Chemical Formula 2 and Chemical Formula 3, 4-1) * indicates the linkage site, 4-2) R3 to R6 are each independently hydrogen; deuterium; halogen; C6 to C 30 aryl groups of the formula: C2-C containing at least one heteroatom of O, N, S, Si and P; 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C 20 Alkoxy group: C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 4-3) R3 to R6 can form a ring together with adjacent groups, 4-4) Y 1 and Y 2 are each independently represented by the following formula 6 or 7:

[0031] [ka]

[0032] [ka]

[0033] In the chemical formula 6 and chemical formula 7, 4-4-1) * indicates the bond position, 4-4-2) R9 is hydrogen or methyl; 4-4-3)R 10 ~R 13 are independently hydrogen; deuterium; halogen; C6-C 30 aryl groups; C2-C containing at least one heteroatom selected from O, N, S, Si and P; 30 Heterocyclic group; C6-C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C20 Alkoxy group; C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 4-4-4) L1 to L3 are each independently a single bond; a fluorenylene group; or C2 to C 30 Arylene; C2~C 30 Heterocycles of C1-C 30 Alkoxylenes; C2-C 30 Alkyleneoxy; C6-C 30 Aryloxy group; C2-C 30 is a polyethyleneoxy group of the formula 4-4-5) q and r are each independently an integer of 0 to 3; provided that q + r = 3; 5) The ratio of A1 to A2 in the polymer chain of the resin containing the repeating unit represented by Chemical Formula 1 is 9:1 to 1:9; 6) X1 is a single bond; O; CO; SO2; CR'R"; SiR'R"; Formula 4 below; or Formula 5, 6-1) R' and R" are each independently hydrogen; deuterium; halogen; C6-C 30 aryl groups, C2-C containing at least one heteroatom selected from O, N, S, Si and P; 30 Heterocyclic group; C6-C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C 20 Alkoxy group: C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 6-2) R' and R" can form a ring with adjacent groups,

[0034] [ka]

[0035] [ka]

[0036] In the above Chemical Formula 4 and Chemical Formula 5, 6-3) * indicates the bond position, 6-4) R7 and R8 are each independently hydrogen; deuterium; halogen; C6 to C 30 aryl groups of the formula: C2-C containing at least one heteroatom of O, N, S, Si and P; 30 Heterocyclic group; C6-C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C 20 Alkoxy group; C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 6-5) o and p are each independently an integer of 0 to 4; 7) X2 is C6~C 30 aryl groups, C2-C containing at least one heteroatom selected from O, N, S, Si and P; 30 Heterocyclic groups, C6-C 30 a fused ring group of an aliphatic ring and an aromatic ring, C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C 20 Alkoxy group; C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula (8) The R', R'', X2, L1 to L3, R1 to R8 and R 10 ~R 13 are deuterium, halogen, and C1-C 30 or C6-C 30aryl group substituted or unsubstituted silane group; siloxane group; boron group; germanium group; cyano group; amino group; nitro group; C1-C 30 Alkylthio group; C1-C 30 Alkoxy group; C6-C 30 Arylalkoxy groups of C1-C 30 Alkyl groups of C2 to C 30 Alkenyl group; C2-C 30 Alkynyl group; C1-C 30 Aryl groups; deuterium-substituted C6-C 30 an aryl group; a fluorenyl group; a C2-C group containing at least one heteroatom selected from the group consisting of O, N, S, Si, and P; 30 Heterocyclic group; C3-C 30 Aliphatic ring group; C7-C 30 Aryl alkyl groups of C8-C 30 and combinations thereof, and adjacent substituents may be joined to form a ring.

[0037] The cardo resin preferably has a weight average molecular weight of 1,000 to 100,000 g / mol.

[0038] The cardo resin is preferably contained in an amount of 1 to 30% by weight based on the total amount of the photosensitive composition.

[0039] The photosensitive composition preferably contains 1 to 40% by weight of the reactive unsaturated compound based on the total amount of the photosensitive composition.

[0040] The photosensitive composition preferably contains 0.01 to 10% by weight of a photoinitiator based on the total amount of the photosensitive composition.

[0041] In another embodiment, the present invention preferably provides a pixel defining layer manufactured by the above manufacturing method.

[0042] In another embodiment, the present invention preferably provides an organic light emitting display device including the pixel defining layer.

[0043] In another embodiment, the present invention preferably provides an electronic device including the display device and a control unit that drives the display device.

[0044] [Effects of the invention] The present invention aims to improve reliability and lifespan by forming a colored pattern on an electrode substrate, resulting in a display with not only vivid colors but also high resolution. That is, pixels formed within the size range of the present invention can achieve high resolution of Black PDL, and a display with high brightness and long lifespan can be produced depending on the driving voltage and current.

[0045] [Best Mode for Carrying Out the Invention] The method for manufacturing a pixel defining layer according to the present invention includes the steps of applying and coating a photosensitive composition; pre-baking; exposing; developing; and post-heat treatment. After the post-heat treatment step, the length of the major axis of the green pixel is 8.0 to 13.0 μm, preferably 9.8 μm to 12.4 μm, and the length of the minor axis is 6.0 to 9.0 μm, preferably 6.2 to 8.3 μm, and it is preferable that the converted aperture ratio of the green pixel exceeds 32%.

[0046] [Mode for Carrying Out the Invention] Some embodiments of the present invention will be described in detail below with reference to the accompanying drawings. When referring to components in each drawing, the same reference numerals will be used to refer to the same components even if they are displayed in different drawings.

[0047] In the description of the present invention, if it is determined that a specific description of related publicly known configurations or functions may obscure the gist of the present invention, such detailed description may be omitted. When words such as "include," "have," and "consist" are used in this specification, other parts may be added unless "only" is used. When a component is expressed in the singular, the plural is included unless otherwise expressly stated.

[0048] Furthermore, in describing the components of the present invention, terms such as first, second, A, B, (a), (b), etc. are used to distinguish the component from other components, and do not limit the nature, order, sequence, or number of the component.

[0049] When describing the positional relationship of components, if two or more components are described as being "coupled," "coupled," or "connected," it should be understood that the two or more components may be directly "coupled," "coupled," or "connected," but that the two or more components may also be "coupled" or "connected" through further "intervening" components to other components, where the other components may be included in one or more of the two or more components that are "coupled," "coupled," or "connected" to each other.

[0050] Furthermore, when a component such as a layer, film, region, or plate is described as being "on" or "on top of" another component, this should be understood to include not only the case where it is "directly on" the other component, but also the case where there is another component between them. Conversely, when a component is described as being "directly on" another part, it should be understood to mean that there is no other part between them.

[0051] In describing the temporal flow relationship relating to components, methods of operation, methods of production, etc., when the temporal or flow sequence is described using terms such as "after," "following," "next," or "before," this also includes cases where the sequence is not consecutive, unless "immediately" or "directly" is used.

[0052] On the other hand, when a numerical value or corresponding information for a component is mentioned, even if there is no other explicit description, the numerical value or corresponding information can be interpreted as including an error range that may occur due to various factors (e.g., process factors, internal or external impact, noise, etc.).

[0053] The terms used in this specification and the appended claims are as follows unless otherwise specified, within the scope of the spirit of the present invention.

[0054] The term "halo" or "halogen" as used in this application includes fluorine (F), chlorine (Cl), bromine (Br), and iodine (I), unless otherwise specified.

[0055] The term "alkyl" or "alkyl group," as used in this application, unless otherwise specified, means the radical of a saturated aliphatic group having from 1 to 60 carbon atoms connected by a single bond, including straight-chain alkyl groups, branched-chain alkyl groups, cycloalkyl (alicyclic) groups, alkyl-substituted cycloalkyl groups, and cycloalkyl-substituted alkyl groups.

[0056] As used herein, the term "haloalkyl group" or "halogenalkyl group" means, unless otherwise specified, an alkyl group substituted with a halogen.

[0057] The terms "alkenyl" or "alkynyl" as used herein, unless otherwise specified, include groups having double or triple bonds, straight or branched chain groups, and having, but not limited to, 2 to 60 carbon atoms.

[0058] As used herein, unless otherwise specified, the term "cycloalkyl" refers to, but is not limited to, an alkyl ring having from 3 to 60 carbon atoms.

[0059] The term "alkoxy group" or "alkyloxy group" as used herein means an alkyl group having an oxygen radical attached thereto, and unless otherwise specified, has from 1 to 60 carbon atoms, but is not limited thereto.

[0060] The terms "alkeneoxyl," "alkenoxy," "alkenyloxyl," or "alkenyloxy" as used herein mean an alkenyl group having an oxygen radical attached thereto, and unless otherwise specified, having, but not limited to, 2 to 60 carbon atoms.

[0061] As used herein, the terms "aryl group" and "arylene group" each have 6 to 60 carbon atoms, unless otherwise specified, but are not limited thereto. In this application, the aryl group or arylene group includes a single ring, a ring assembly, a fused multi-ring system, etc. For example, the aryl group includes a phenyl group, a monovalent functional group of biphenyl, a monovalent functional group of naphthalene, a fluorenyl group, and a substituted fluorenyl group, and the arylene group includes a fluorenylene group and a substituted fluorenylene group.

[0062] As used herein, the term "ring assemblies" means two or more ring systems (single rings or joined ring systems) directly connected to each other by single or double bonds, where the number of direct connections between such rings is one less than the total number of ring systems in the compound. Ring assemblies can be identical or different ring systems directly connected to each other by single or double bonds.

[0063] In this application, the aryl group includes a ring assembly, and therefore includes biphenyl and terphenyl in which a single aromatic ring, a benzene ring, is connected by a single bond, and also includes compounds in which a single aromatic ring and a fused aromatic ring system are connected by a single bond, and therefore includes, for example, a compound in which a single aromatic ring, a benzene ring, and a fused aromatic ring system, a fluorene, are connected by a single bond.

[0064] The term "fused ring system" used in this application refers to a fused ring system that shares at least two atoms, including a fused ring system consisting of two or more hydrocarbon ring systems and a fused ring system consisting of at least one heterocyclic ring system containing at least one heteroatom. Such fused ring systems may be aromatic rings, heteroaromatic rings, aliphatic rings, or combinations of these rings. For example, in the case of an aryl group, fused rings include, but are not limited to, a naphthalenyl group, a phenanthrenyl group, a fluorenyl group, etc.

[0065] The term "spiro compound" as used in this application has a "spiro union," which means a connection formed by two rings sharing only one atom. In this case, the atom shared by the two rings is called a "spiro atom." Depending on the number of spiro atoms in a compound, these compounds are called "monospiro-," "dispiro-," or "trispiro-" compounds, respectively.

[0066] Unless otherwise specified, the terms "fluorenyl group," "fluorenylene group," and "fluorenetriyl group" used in this application refer to monovalent, divalent, or trivalent functional groups in which R, R', R", and R'" are all hydrogen atoms in the structures shown below, respectively. A "substituted fluorenyl group," a "substituted fluorenylene group," or a "substituted fluorenetriyl group" means that at least one of the substituents R, R', R", and R'" is a substituent other than hydrogen, and includes cases where R and R' are bonded to each other to form a spiro compound together with the carbon to which they are bonded. In this specification, fluorenyl groups, fluorenylene groups, and fluorenetriyl groups can all be referred to as fluorene groups, regardless of their valence, such as monovalent, divalent, or trivalent.

[0067] [ka]

[0068] Furthermore, R, R', R" and R'" are each independently an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or a heterocyclic group having 2 to 30 carbon atoms. For example, the aryl group may be phenyl, biphenyl, naphthalene, anthracene, or phenanthrene, and the heterocyclic group may be pyrrole, furan, thiophene, pyrazole, imidazole, triazole, pyridine, pyrimidine, pyridazine, pyrazine, triazine, indole, benzofuranquinazoline, or quinoxaline. For example, the substituted fluorenyl group and fluorenylene group may be a monovalent or divalent functional group of 9,9-dimethylfluorene, 9,9-diphenylfluorene, or 9,9'-spirobi[9H-fluorene], respectively.

[0069] The term "heterocyclic group" as used herein includes not only aromatic rings such as "heteroaryl groups" or "heteroarylene groups" but also non-aromatic rings, and means, but is not limited to, rings containing 2 to 60 carbon atoms, each containing one or more heteroatoms, unless otherwise specified. The term "heteroatom" as used herein means N, O, S, P, or Si, unless otherwise specified, and heterocyclic group refers to a single ring, ring assembly, fused multiple ring systems, spiro compounds, etc., containing a heteroatom.

[0070] For example, the term "heterocyclic group" may include compounds containing heteroatom groups such as SO2 and P=O instead of the carbon atoms forming the ring, as in the compounds below.

[0071] [ka]

[0072] The term "ring" as used in this application includes single and multiple rings, including hydrocarbon rings as well as heterocycles containing at least one heteroatom, and aromatic and non-aromatic rings.

[0073] The term "polycyclic" as used in this application includes ring assemblies such as biphenyls, terphenyls, etc., fused multiple ring systems, and spiro compounds, including aromatic as well as non-aromatic rings, and including hydrocarbon rings as well as heterocycles containing at least one heteroatom.

[0074] The term "aliphatic cyclic group" as used in this application refers to cyclic hydrocarbons excluding aromatic hydrocarbons, including single rings, ring aggregates, fused ring systems, spiro compounds, etc., and unless otherwise specified, refers to a ring having 3 to 60 carbon atoms, but is not limited thereto. For example, the fusion of benzene, an aromatic ring, and cyclohexane, a non-aromatic ring, also constitutes an aliphatic ring.

[0075] Furthermore, when prefixes are named consecutively, it means that the substituents are listed in the order they are written in. For example, an arylalkoxy group means an alkoxy group substituted with an aryl group, an alkoxycarbonyl group means a carbonyl group substituted with an alkoxy group, and an arylcarbonylalkenyl group means an alkenyl group substituted with an arylcarbonyl group, where the arylcarbonyl group is a carbonyl group substituted with an aryl group.

[0076] In addition, unless otherwise explicitly stated, in the term "substituted or unsubstituted" used in this application, "substituted" means deuterium, halogen, amino group, nitrile group, nitro group, C1-C 30 Alkyl groups, C1-C 30 Alkoxy groups, C1-C 30 Alkylamine groups, C1-C 30 Alkylthiophene group, C6-C 30 Arylthiophene groups, C2-C 30 Alkenyl groups, C2-C 30 Alkynyl groups, C3-C 30 Cycloalkyl groups of C6-C 30 Aryl groups, deuterium-substituted C6-C 30 Aryl groups, C8-C 30an arylalkenyl group, a silane group, a boron group, a germanium group, and a C2-C group containing at least one heteroatom selected from the group consisting of O, N, S, Si, and P; 30 The term "substituted" means that the heterocyclic group is substituted with one or more substituents selected from the group consisting of the following heterocyclic groups, but is not limited to these substituents.

[0077] In this application, the "functional group name" corresponding to an aryl group, an arylene group, a heterocyclic group, etc., which are exemplified as examples of each symbol and its substituent, can be written as the "functional group name reflecting the valence" or as the "parent compound name." For example, in the case of "phenanthrene," which is a type of aryl group, the name of the group can be written by distinguishing the valence, such as "phenanthryl (group)" for a monovalent "group" and "phenanthrylene (group)" for a divalent group, or it can be written as the parent compound name "phenanthrene" regardless of the valence.

[0078] Similarly, pyrimidine can be written as "pyrimidine" regardless of the valence, or it can be written as the "name of the group" of the valence, such as pyrimidinyl (group) if it is monovalent, or pyrimidinylene (group) if it is divalent. Therefore, when the type of substituent is written in the name of a parent compound in this application, it can mean an n-valent "group" formed by eliminating hydrogen atoms bonded to carbon atoms and / or heteroatoms of the parent compound.

[0079] Furthermore, in this specification, when describing compound names and substituent names, numbers and letters indicating positions may be omitted. For example, pyrido[4,3-d]pyrimidine may be written as pyridopyrimidine, benzofuro[2,3-d]pyrimidine as benzofuropyrimidine, 9,9-dimethyl-9H-fluorene as dimethylfluorene, etc. Therefore, both benzo[g]quinoxaline and benzo[f]quinoxaline may be written as benzoquinoxaline.

[0080] Unless otherwise specified, the chemical formulas used in this application are applied in the same manner as the substituent definitions according to the index definitions of the following chemical formulas.

[0081] [ka]

[0082] where a is an integer of 0, the substituent R 1 In other words, when a is 0, it means that all hydrogen atoms are bonded to the carbon atoms forming the benzene ring. In this case, the hydrogen atoms bonded to the carbon atoms may be omitted and the chemical formula or compound may be written. Also, when a is an integer of 1, one substituent R 1 is bonded to any one of the carbons forming a benzene ring, and when a is an integer of 2 or 3, it can be bonded, for example, as shown below. When a is an integer of 4 to 6, it is bonded to a carbon of the benzene ring in a similar manner, and when a is an integer of 2 or more, R1 may be the same or different.

[0083] [ka]

[0084] Unless otherwise specified in this application, "forming a ring" means that adjacent groups are bonded to each other to form a single ring or multiple joined rings, and the single rings and the multiple joined rings formed include hydrocarbon rings as well as heterocycles containing at least one heteroatom, and include aromatic and non-aromatic rings.

[0085] Unless otherwise specified in this specification, when referring to a fused ring, the number in "number-fused ring" indicates the number of fused rings. For example, a form in which three rings are fused to each other, such as anthracene, phenanthrene, or benzoquinazoline, can be expressed as a 3-fused ring.

[0086] On the other hand, the term "bridged bicyclic compound" as used in this application, unless otherwise specified, refers to a compound in which two rings share three or more atoms to form a ring, and the shared atoms include carbon or heteroatoms.

[0087] In this application, the organic electronic element may refer to the component(s) between the positive electrode and the negative electrode, or may refer to an organic light-emitting diode including the positive electrode, the negative electrode, and the component(s) located therebetween.

[0088] In some cases, the term "display device" in this application may refer to an organic electric element, an organic light-emitting diode, and a panel including the same, or an electronic device including a panel and a circuit. Here, for example, the electronic device may include lighting devices, solar cells, portable or mobile terminals (e.g., smartphones, tablets, PDAs, electronic dictionaries, PMPs, etc.), navigation terminals, game consoles, various TVs, various computer monitors, etc., but is not limited thereto and may be any type of device as long as it includes the above component(s).

[0089] Hereinafter, embodiments of the present invention will be described in detail, but these are presented as examples and are not intended to limit the present invention, which is defined only by the scope of the claims that follow.

[0090] A composition including a colorant according to an embodiment of the present invention is used to manufacture a red pattern, a green pattern, a blue pattern, a black matrix, or a pixel defining layer (PDL).

[0091] A black pixel defining layer (PDL) according to an embodiment of the present invention may further include an organic black pigment or black dye as an additional colorant in addition to the colorants contained in the colorants. For example, an organic pigment may be used alone, or an organic pigment may be mixed with a colored pigment. In this case, since a colored pigment with insufficient light-blocking properties is mixed, there is an advantage that the strength of the film (layer) or adhesion to the substrate does not decrease even if the amount of colorant increases relatively. A negative pixel defining layer (PDL) according to an embodiment of the present invention may include a black pigment or black dye as an additional colorant instead of the colorants contained in the colorants.

[0092] Each component will be specifically described below.

[0093] 1. The manufacturing process of the negative pixel defining layer is as follows:

[0094] (1) Application and coating stage Photosensitive compositions are low-viscosity liquid samples, and after applying them to a substrate, a spin coater or slit coater is used to coat them at a consistent thickness. The faster the spin coater rotates, the thinner the coating, but the greater the reduction in surface flatness. Slit coaters are preferred over spin coaters for coating large substrates. After coating, residual solvent can cause the surface to become fluid, resulting in poor flatness. To overcome this, a vacuum chamber dry (VCD) is used to remove some of the solvent, reducing surface fluidity.

[0095] (2) Pre-bake stage This process involves heating the coated substrate at a certain temperature and time on a hot plate or in an oven to remove some of the solvent contained in the coating. If the surface or depth of the coating film is not dried, contamination of the photomask occurs during exposure in the next process, and the exposed area does not harden properly when irradiated with UV light. Due to the unhardened film, the pattern is not formed during the development process and is removed.

[0096] (3) Exposure stage After the pre-baking process is completed, the patterned photomast is irradiated with actinic rays (ultraviolet rays) to harden the formed film. The types of lamps that generate actinic rays include LED lamps and metal (mercury) lamps, and the wavelengths are g-line (436nm), h-line (405nm), i-line (365nm), and deep UV (<260nm), which can be used individually or in combination.

[0097] (4) Development stage During the exposure step, exposed and unexposed areas are separated by a photomask when actinic radiation is applied. In the case of a positive type, the exposed areas dissolve in a developer, while the unexposed areas resist the developer, leaving a pattern. In the case of a negative type, the exposed areas harden and become resistant to the developer, while the unexposed areas are developed. The black pixel defining layer (Black PDL) manufactured using a composition containing the colorant of the present invention is a negative type, and a pattern is formed by separating the exposed areas (hardened) and unexposed areas (developed).

[0098] (5) Post-heat treatment stage This is a process in which the developed substrate is heated at a high temperature of 210°C or higher to remove the remaining solvent and moisture. If the solvent and moisture are not completely removed in this process, the remaining solvent and moisture will affect the device in the post-heat treatment process, resulting in dark spots, pixel shrinkage, and other problems that can affect the device's lifespan.

[0099] The oven temperature in the post-heat treatment step is preferably 210 to 300°C, more preferably 250 to 270°C.

[0100] The post-heat treatment step is more preferably performed for 30 to 120 minutes, and even more preferably for 60 to 120 minutes.

[0101] After the post-heat treatment step, the length of the major axis of the green pixel is 8.0 to 13.0 μm, preferably 9.8 μm to 12.4 μm, and the length of the minor axis is 6.0 to 9.0 μm, preferably 6.2 to 8.3 μm, and here, it is preferable that the converted aperture ratio of the green pixel exceeds 32%.

[0102] After the post-heat treatment, it is preferable that the length of the major axis of the red pixel is 16.2 to 18.5 μm and the length of the minor axis is 11.6 to 14.5 μm.

[0103] After the post-heat treatment, it is preferable that the length of the major axis of the blue pixel is 21.3 to 25.0 μm and the length of the minor axis is 15.6 to 18.5 μm.

[0104] The shape of the pixel after the post-heat treatment is not limited as long as the major and minor axis sizes can be depicted, and specifically, diamond, square, rectangle, ellipse, hexagon, octagon, circle, and the like are possible.

[0105] 2. The composition forming the negative pixel-defining layer containing the colorant is as follows:

[0106] (1) Patterning resin The patterning resin according to an embodiment of the present invention includes a cardo-based binder resin.

[0107] The acrylic binder resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin containing one or more acrylic repeating units.

[0108] The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing one or more carboxy groups, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof. The first ethylenically unsaturated monomer may be included in an amount of 5% by weight to 50% by weight, for example, 10% by weight to 40% by weight, based on the total weight of the acrylic binder resin.

[0109] Examples of the second ethylenically unsaturated monomer include aromatic vinyl compounds such as styrene, α-methylstyrene, vinyltoluene, and vinylbenzyl methyl ether; unsaturated carboxylate compounds such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, and phenyl (meth)acrylate; unsaturated carboxylate aminoalkyl ester compounds such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; carboxylate vinyl ester compounds such as vinyl acetate; and unsaturated carboxylate glycidyl ester compounds such as glycidyl (meth)acrylate; vinyl cyanide compounds such as (meth)acrylonitrile; and unsaturated amide compounds such as (meth)acrylamide. These may be used alone or in combination of two or more.

[0110] Specific examples of the acrylic binder resin include, but are not limited to, (meth)acrylic acid / benzyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene copolymer, (meth)acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, and (meth)acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer. These may be used alone or in combination. The weight-average molecular weight of the acrylic binder resin may be 3,000 g / mol to 150,000 g / mol, for example, 5,000 g / mol to 50,000 g / mol, for example, 20,000 g / mol to 30,000 g / mol.

[0111] Cardo resins contain a repeating structure as shown in Formula 1 below.

[0112] [ka]

[0113] In the above Chemical Formula 1, 1) R1 and R2 are each independently hydrogen; deuterium; halogen; C6-C 30 aryl groups of the formula: C2-C containing at least one heteroatom of O, N, S, Si and P; 30 Heterocyclic group; C6-C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C 20 Alkoxy group; C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 2) R1 and R2 can form a ring together with adjacent groups, 3) m and n are each independently an integer of 0 to 4; 4) A1 and A2 are each independently represented by the following formula 2 or 3:

[0114] [ka]

[0115] [ka]

[0116] In the above Chemical Formula 2 and Chemical Formula 3, 4-1) * indicates the linkage site, 4-2) R3 to R6 are each independently hydrogen; deuterium; halogen; C6 to C 30 aryl groups of the formula: C2-C containing at least one heteroatom of O, N, S, Si and P; 30 Heterocyclic group; C6-C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20Alkynyl group; C1-C 20 Alkoxy group; C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 4-3) R3 to R6 can form a ring together with adjacent groups, 4-4) Y1 and Y2 are each independently represented by the following Formula 6 or Formula 7:

[0117] [ka]

[0118] [ka]

[0119] In the above Chemical Formula 6 and Chemical Formula 7, 4-4-1) * indicates the bond position, 4-4-2) R9 is hydrogen or methyl; 4-4-3)R 10 ~R 13 are independently hydrogen; deuterium; halogen; C6-C 30 an aryl group; a C2-C group containing at least one hetero group selected from O, N, S, Si, and P; 30 Heterocyclic group; C6-C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C 20 Alkoxy group; C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 4-4-4) L1 to L3 are each independently a single bond; a fluorenylene group; or a C2 to C 30 Alkylene; C6-C 30 Arylene; C2~C 30 Heterocycles of C1-C30 Alkoxylenes; C2-C 30 alkyleneoxy; C6-C30 aryloxy; C2-C 20 is a polyethyleneoxy group of the formula 4-4-5) q and r are each independently an integer of 0 to 3, provided that q+r=3; 5) The ratio of A1 to A2 in the polymer chain of the resin containing the repeating unit represented by Chemical Formula 1 is 9:1 to 1:9; 6) X1 is a single bond; O; CO; SO2; CR'R"; SiR'R"; the following chemical formula 4; or chemical formula 5, 6-1) R' and R" are each independently hydrogen; deuterium; halogen; C6-C 30 aryl groups of the formula: C2-C containing at least one heteroatom of O, N, S, Si and P; 30 Heterocyclic group; C6-C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C 20 Alkoxy group; C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 6-2) R' and R" can form a ring with adjacent groups,

[0120] [ka]

[0121] [ka]

[0122] In the above Chemical Formulas 4 and 5, 6-3) * indicates the bond position, 6-4) R7 and R8 are each independently hydrogen; deuterium; halogen; C6 to C 30aryl groups of the formula: C2-C containing at least one heteroatom of O, N, S, Si and P; 30 Heterocyclic group; C6-C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C 20 Alkoxy group; C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 6-5) o and p are each independently an integer of 0 to 4; 7) X2 is C6~C 30 aryl groups of the formula: C2-C containing at least one heteroatom of O, N, S, Si and P; 30 Heterocyclic group; C6-C 30 A fused ring group of an aliphatic ring and an aromatic ring; C1-C 20 Alkyl groups of C2 to C 20 Alkenyl group; C2-C 20 Alkynyl group; C1-C 20 Alkoxy group; C6-C 30 an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or a C1-C 20 is an alkoxycarbonyl group of the formula 8) The R', R'', X2, L1 to L3, R1 to R8 and R 10 ~R 13 are deuterium, halogen, and C1-C 30 or C6-C 30 Silane groups substituted or unsubstituted with aryl groups; siloxane groups; boron groups; germanium groups; cyano groups; amino groups; nitro groups; C1-C 30 Alkylthio group; C1-C 30 Alkoxy group; C6-C 30 Arylalkoxy groups of C1-C 30 Alkyl groups of C2 to C 30 Alkenyl group; C2-C 30 Alkynyl group; C6-C 30 Aryl groups; deuterium-substituted C6-C30 an aryl group; a fluorenyl group; a C2-C group containing at least one heteroatom selected from the group consisting of O, N, S, Si, and P; 30 Heterocyclic group; C3-C 30 Aliphatic ring group; C7-C 30 Aryl alkyl groups of C8-C 30 and combinations thereof, and adjacent substituents may be joined to form a ring.

[0123] The R', R'', X2, L1 to L3, R1 to R8 and R 10 ~R 13 When is an aryl group, it is preferably a C6 to C 30 an aryl group of, more preferably, C6 to C 18 The alkyl group may be an aryl group such as phenyl, biphenyl, naphthyl, terphenyl, and the like.

[0124] The R', R'', X2, L1 to L3, R1 to R8 and R 10 ~R 13 When is a heterocyclic group, it is preferably a C2 to C 30 Heterocyclic groups of the formula (I), more preferably C2 to C 18 and the like, for example, dibenzofuran, dibenzothiophene, naphthobenzothiophene, naphthobenzofuran, and the like.

[0125] The R', R'', R1 to R8 and R 10 ~R 13 When is a fluorenyl group, it may be preferably 9,9-dimethyl-9H-fluorene, 9,9-diphenyl-9H-fluorenyl, 9,9'-spirobifluorene, or the like.

[0126] Said L 1 ~L 3 When is an arylene group, it is preferably a C6 to C 30 and more preferably, an arylene group having C6 to C18, such as phenyl, biphenyl, naphthyl, or terphenyl.

[0127] The R', R'', X2, R1 to R8 and R 10 ~R 13 When is an alkyl group, it is preferably a C1 to C 10 and may be, for example, methyl, t-butyl, and the like.

[0128] The R', R'', X2, R1 to R8 and R 10 ~R 13 When is an alkoxy group, it is preferably a C1 to C 20 Alkoxy groups of the formula (I), more preferably C1 to C 10 The alkyl group may be an alkoxy group such as methoxy, t-butoxy, and the like.

[0129] The R', R'', X2, L1 to L3, R1 to R8 and R 10 ~R 13 The ring formed by bonding adjacent groups is C6 to C 60 an aromatic ring group; a fluorenyl group; a C2-C group containing at least one heteroatom selected from O, N, S, Si, and P; 60 or a heterocyclic group of C3 to C 60 For example, when adjacent groups are bonded to each other to form an aromatic ring, it is preferably an aliphatic ring group having a C6 to C 20 More preferably, an aromatic ring of C6 to C 14 can form aromatic rings such as benzene, naphthalene, phenanthrene, and the like.

[0130] The cardo resin may be prepared by mixing two or more of the following compounds: a fluorene-containing compound such as 9,9-bis(4-oxiranylmethoxyphenyl)fluorene; an anhydride compound such as benzenetetracarboxylic dianhydride, naphthalenetetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, benzophenonetetracarboxylic dianhydride, pyromellitic dianhydride, cyclobutanetetracarboxylic dianhydride, perylenetetracarboxylic dianhydride, tetrahydrofurantetracarboxylic dianhydride, and tetrahydrophthalic anhydride; a glycol compound such as ethylene glycol, propylene glycol, or polyethylene glycol; an alcohol compound such as methanol, ethanol, propanol, n-butanol, cyclohexanol, or benzyl alcohol; a solvent compound such as propylene glycol methyl ethyl acetate or N-methylpyrrolidone; a phosphorus compound such as triphenylphosphine; and an amine or ammonium salt compound such as tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, or benzyltriethylammonium chloride.

[0131] The cardo resin may have a weight-average molecular weight of 1,000 to 100,000 g / mol, preferably 1,000 to 50,000 g / mol, and more preferably 1,000 to 30,000 g / mol. When the weight-average molecular weight of the resin is within this range, pattern formation is successfully performed without residue during the preparation of the light-shielding layer, and a good pattern can be obtained without loss of film thickness during development. The resin may be included in an amount of 1 to 30 wt %, more preferably 3 to 20 wt %, based on the total amount of the photosensitive resin composition. When the resin is included within this range, excellent sensitivity, developability, and adhesion (adhesion) can be obtained.

[0132] (2) Reactive unsaturated compounds The reactive unsaturated compound, which is essential for a negative pattern, has an ethylenically unsaturated double bond, and thereby undergoes sufficient polymerization upon exposure in the pattern formation step, thereby enabling the formation of a pattern that is excellent in heat resistance, light resistance, and chemical resistance.

[0133] Specific examples of the reactive unsaturated compound include ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, bisphenol A epoxy acrylate, ethylene glycol monomethyl ether acrylate, trimethylolpropane triacrylate, and tripentaerythritol octaacrylate.

[0134] Examples of commercially available products of the reactive unsaturated compounds are as follows:

[0135] Examples of the bifunctional esters of (meth)acrylic acid include Aronix M-210, M-240, M-6200, etc., manufactured by Toagosei Chemical Industry Co., Ltd.; KAYARAD HDDA, HX-220, R-604, etc., manufactured by Nippon Kayaku Co., Ltd.; and V-260, V-312, V-335HP, etc., manufactured by Osaka Organic Chemical Industry Co., Ltd.

[0136] Examples of the trifunctional esters of (meth)acrylic acid include Aronix M-309, M-400, M-405, M-450, M-7100, M-8030, and M-8060 manufactured by Toagosei Chemical Industry Co., Ltd.; KAYARAD TMPTA, DPCA-20, DPCA-60, and DPCA-120 manufactured by Nippon Kayaku Co., Ltd.; and V-295, V-300, and V-360 manufactured by Osaka Organic Chemical Industry Co., Ltd.

[0137] The above products can be used alone or in combination of two or more.

[0138] The reactive unsaturated compound may be treated with an acid anhydride to provide better developability. The reactive unsaturated compound may be included in an amount of 1 to 40 wt %, for example, 1 to 20 wt %, based on the total amount of the photosensitive resin composition. When the reactive unsaturated compound is included within this range, sufficient curing occurs upon exposure in the pattern formation process, resulting in excellent reliability, and the pattern has excellent heat resistance, light resistance, and chemical resistance, as well as excellent resolution and adhesion.

[0139] (3) Photoinitiator To achieve a negative pattern in photolithography, a photoradical initiator must be used. This photoinitiator has a molar absorption coefficient of 10,000 (L / mol cm) or more in the 330-380 nm region and undergoes a 5% weight loss at 200°C or less. The molar absorption coefficient can be calculated using the Beer-Lambert Law. Weight loss was measured using a TGA in a nitrogen atmosphere by heating up to 300°C at a rate of 5°C per minute.

[0140] The photopolymerization initiator is an initiator commonly used in photosensitive resin compositions, and examples thereof include acetophenone-based compounds, benzophenone-based compounds, thioxanthone-based compounds, benzoin-based compounds, and triazine-based compounds.

[0141] Examples of the acetophenone compounds include 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, pt-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one, and 2-benzyl-2-dimethylamino-1-(4-(morpholinophenyl)-butan-1-one.

[0142] Examples of the benzophenone-based compounds include benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, and 3,3'-dimethyl-2-methoxybenzophenone.

[0143] Examples of the thioxanthone compounds include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, and 2-chlorothioxanthone.

[0144] Examples of the benzoin-based compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyl dimethyl ketal.

[0145] Examples of the triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl) )-s-triazine, 2-biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphth 1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphth 1-yl)4,6-bis(trichloromethyl)-s-triazine, 2-4-trichloromethyl(piperonyl)-6-triazine, 2-4-trichloromethyl(4'-methoxystyryl)-6-triazine, and the like.

[0146] In addition to the above compounds, the photoinitiator may also include carbazole-based compounds, diketone compounds, sulfonium borate-based compounds, diazo-based compounds, imidazole-based compounds, and non-imidazole-based compounds.

[0147] The photoinitiator may be a radical polymerization initiator such as a peroxide-based compound or an azobis-based compound.

[0148] Examples of the peroxide compounds include ketone peroxides such as methyl ethyl ketone peroxide, methyl isobutyl ketone peroxide, cyclohexanone peroxide, methylcyclohexanone peroxide, and acetylacetone peroxide; diacyl peroxides such as isobutyryl peroxide, 2,4-dichlorobenzoyl peroxide, o-methylbenzoyl peroxide, and bis-3,5,5-trimethylhexanoyl peroxide; hydroperoxides such as 2,4,4-trimethylpentyl-2-hydroperoxide, diisopropylbenzene hydroperoxide, cumene hydroperoxide, and t-butyl hydroperoxide; dicumyl peroxide, 2,5-dimethyl-2,5-di(t-butyl) dialkyl peroxides such as t-butylperoxyhexane, 1,3-bis(t-butyloxyisopropyl)benzene, and t-butylperoxyvaleric acid n-butyl ester; alkyl peresters such as 2,4,4-trimethylpentylperoxyphenoxyacetate, α-cumylperoxyneodecanoate, t-butylperoxybenzoate, and di-t-butylperoxytrimethyladipate; and percarbonates such as di-3-methoxybutylperoxydicarbonate, di-2-ethylhexylperoxydicarbonate, bis-4-t-butylcyclohexylperoxydicarbonate, diisopropylperoxydicarbonate, acetylcyclohexylsulfonyl peroxide, and t-butylperoxyallyl carbonate.

[0149] Examples of the azobis compounds include 1,1'-azobiscyclohexane-1-carbonitrile, 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), α,α'-azobis(isobutylnitrile), and 4,4'-azobis(4-cyanovaleric acid).

[0150] The photoinitiator may be used together with a photosensitizer that absorbs light to become excited and then transfers the energy to initiate a chemical reaction. Examples of the photosensitizer include tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, and dipentaerythritol tetrakis-3-mercaptopropionate.

[0151] The photoinitiator may be included in an amount of 0.01 to 10 wt %, for example, 0.1 to 5 wt %, based on the total amount of the photosensitive composition. When the photoinitiator is included within this range, sufficient curing occurs upon exposure in the pattern formation process, resulting in excellent reliability, excellent heat resistance, light resistance, and chemical resistance of the pattern, excellent resolution and adhesion, and prevention of a decrease in transmittance due to unreacted initiator.

[0152] (4) Colorant As the colorant, organic pigments, inorganic pigments, and dyes can all be used.

[0153] As the colorant, red pigments, green pigments, blue pigments, yellow pigments, black pigments, etc. can be used.

[0154] Examples of the red pigment include CI Red Pigment 254, CI Red Pigment 255, CI Red Pigment 264, CI Red Pigment 270, CI Red Pigment 272, CI Red Pigment 177, CI Red Pigment 89, and the like.

[0155] Examples of the green pigment include halogen-substituted copper phthalocyanine pigments such as CI Green Pigment 36 and CI Green Pigment 7.

[0156] Examples of the blue pigment include copper phthalocyanine pigments such as CI Blue Pigment 15:6, CI Blue Pigment 15, CI Blue Pigment 15:1, CI Blue Pigment 15:2, CI Blue Pigment 15:3, CI Blue Pigment 15:4, CI Blue Pigment 15:5, and CI Blue Pigment 16.

[0157] Examples of the yellow pigment include isoindoline pigments such as CI Yellow Pigment 139, quinophthalone pigments such as CI Yellow Pigment 138, and nickel complex pigments such as CI Yellow Pigment 150.

[0158] Examples of the black pigment include lactam black, aniline black, perylene black, titanium black, and carbon black.

[0159] The colorant in the photosensitive resin composition according to the embodiment may include a pigment, a dye, or a combination thereof. For example, the dye may include a phthalocyanine-based compound.

[0160] The pigments and dyes may be used alone or in combination, and are not limited to these examples.

[0161] Among these, the black pigment can be used to efficiently block light in the light-shielding layer. When the black pigment is used, it can be used together with a color correction agent such as an anthraquinone pigment, a perylene pigment, a phthalocyanine pigment, or an azo pigment.

[0162] A dispersant may be used to disperse the pigment in the photosensitive resin composition. Specifically, the pigment may be surface-treated with a dispersant before use, or the dispersant may be added together with the pigment during the preparation of the photosensitive resin composition.

[0163] The dispersant may be a nonionic dispersant, an anionic dispersant, a cationic dispersant, etc. Specific examples of the dispersant include polyalkylene glycol and its ester, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salt, alkylamide alkylene oxide adduct, alkylamine, etc. These may be used alone or in combination of two or more.

[0164] Examples of commercially available dispersant products include DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, and DISPERBYK-2001 from BYK; Examples include Kal's EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, and EFKA-450; Zeneka's Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, and Solsperse 28000; and Ajinomoto's PB711 and PB821.

[0165] The dispersant may be included in an amount of 0.1 to 15 wt % based on the total weight of the photosensitive resin composition. When the dispersant is included in this range, the dispersibility of the composition is excellent, resulting in excellent stability, developability, and patternability during the preparation of the light-shielding layer.

[0166] The pigment may be pretreated with a water-soluble inorganic salt and a wetting agent, and the average particle size of the pigment may be reduced.

[0167] The pretreatment is carried out by kneading the pigment with a water-soluble inorganic salt and a wetting agent, and then filtering and washing the pigment obtained from the kneading step.

[0168] The kneading is carried out at a temperature of 40° C. to 100° C., and the filtering and washing are carried out by washing the inorganic salt with water and then filtering.

[0169] Examples of the water-soluble inorganic salt include, but are not limited to, sodium chloride and potassium chloride.

[0170] The wetting agent serves as a medium for uniformly mixing the pigment and the water-soluble inorganic salt to facilitate pulverization of the pigment. Examples of the wetting agent include alkylene glycol monoalkyl ethers such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, and diethylene glycol monomethyl ether; and alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, and glycerin polyethylene glycol. These can be used alone or in combination of two or more.

[0171] The pigment that has undergone the kneading step may have an average particle size of 100 nm or less. When the average particle size of the pigment is within this range, it is possible to effectively form a fine pattern while having excellent heat resistance and light resistance.

[0172] The pigment may be contained in an amount of 1 to 40 wt %, more particularly 2 to 30 wt %, based on the total amount of the photosensitive resin composition. When the pigment is contained within this range, excellent color reproduction and excellent curability and adhesion of the pattern are achieved.

[0173] (5) Solvent The solvent is a substance that is compatible with, but does not react with, the cardo resin, the reactive unsaturated compound, the pigment, the cardo compound, and the initiator.

[0174] Examples of the solvent include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methyl phenyl ether, and tetrahydrofuran; glycol ethers such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methyl ethyl carbitol, diethyl carbitol, diethyl glycol monomethyl ester, diethylene glycol monomethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate; aromatic hydrocarbons such as toluene and xylene; methyl ethyl ketone, cyclohexanone, 4-hydroxy-4- Ketones such as methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, 2-heptanone, etc.; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, etc.; lactic acid esters such as methyl lactate and ethyl lactate; oxyacetic acid alkyl esters such as methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, alkoxyacetic acid alkyl esters such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate; 3-oxypropionic acid alkyl esters such as methyl 3-oxypropionate and ethyl 3-oxypropionate; 3-alkoxypropionic acid alkyl esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate, etc.; 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate;2-alkoxypropionic acid alkyl esters such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, and methyl 2-ethoxypropionate; 2-oxy-2-methylpropionic acid esters such as methyl 2-oxy-2-methylpropionate and ethyl 2-oxy-2-methylpropionate; monooxymonocarboxylic acid alkyl esters of 2-alkoxy-2-methylpropionic acid alkyl esters such as methyl 2-methoxy-2-methylpropionate and ethyl 2-ethoxy-2-methylpropionate; esters such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate, and methyl 2-hydroxy-3-methylbutanoate; and ketone acid esters such as ethyl pyruvate.

[0175] Also usable are high-boiling point solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformanilide, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate.

[0176] Among the above solvents, in consideration of compatibility and reactivity, glycol ethers such as ethylene glycol monoethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; carbitols such as diethylene glycol monomethyl ether; and propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate may be used.

[0177] The solvent may be included as the remainder of the total amount of the photosensitive resin composition, specifically, 40 to 90 wt %. When the solvent is included within this range, the photosensitive resin composition has an appropriate viscosity, which provides excellent processability during the manufacture of the pattern layer.

[0178] (6) Other additives The photosensitive composition may further contain additives such as malonic acid; 3-amino-1,2-propanediol; a silane coupling agent containing a vinyl group or a (meth)acryloxy group; a leveling agent; a fluorine-based surfactant; or a radical polymerization initiator in order to prevent stains and spots during application, improve leveling performance, and prevent the generation of residues due to undevelopment.

[0179] For example, the photosensitive resin composition may further include a silane coupling agent having a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, or an epoxy group to improve adhesion to a substrate.

[0180] Examples of the silane coupling agent include trimethoxysilylbenzoic acid, gamma methacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, gamma isocyanatepropyltriethoxysilane, gamma glycidoxypropyltrimethoxysilane, and beta epoxycyclohexylethyltrimethoxysilane, and these may be used alone or in combination of two or more.

[0181] The silane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition, and when the silane coupling agent is included in this range, the composition has excellent adhesion, storage stability, etc.

[0182] Furthermore, the photosensitive resin composition may further contain a surfactant, for example, a fluorine-based surfactant, to improve coating properties and prevent defects, if necessary.

[0183] The fluorine-based surfactant is BM Fluorosurfactants commercially available under the names BM-1000 (registered trademark), BM-1100 (registered trademark) and the like from Chemie; Megafac F142D (registered trademark), F172 (registered trademark), F173 (registered trademark), F183 (registered trademark) and the like from Dainippon Ink and Chemicals, Inc.; Fluorad FC-135 (registered trademark), FC-170C (registered trademark), FC-430 (registered trademark), FC-431 (registered trademark) and the like from Sumitomo 3M Limited; Surflon S-112 (registered trademark), S-113 (registered trademark), S-131, S-141, S-145 and the like from Asahi Glass Co., Ltd.; SH-28PA (registered trademark), S-190 (registered trademark), S-193 (registered trademark), SZ-6032 (registered trademark), SF-8428 (registered trademark) and the like from Dray Silicon Co., Ltd. may also be used.

[0184] The surfactant may be used in an amount of 0.001 to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the surfactant is included within this range, coating uniformity is ensured, stains are prevented, and wetting to the glass substrate is excellent. In addition, the photosensitive resin composition may contain other additives such as antioxidants and stabilizers in amounts that do not impair physical properties.

[0185] In another embodiment, the pixel separating portion of the organic light emitting device electrode may be patterned using the above-described photosensitive resin composition.

[0186] Synthesis examples and examples according to the present invention will be specifically described below, but the synthesis examples and examples of the present invention are not limited thereto.

[0187] (Production of Black Photosensitive Composition) Synthesis Example 1: (Production of 9,9-Bis[4-(glycidyloxy)phenyl]fluorene of Chemical Formula 8) 20 g of 9,9'-bisphenolfluorene (Sigma Aldrich), 8.67 g of glycidyl chloride (Sigma Aldrich), and 30 g of anhydrous potassium carbonate were placed in a 300 ml three-necked round-bottom flask equipped with 100 ml of dimethylformamide and a distillation column. The mixture was heated to 80°C and reacted for 4 hours. The temperature was then lowered to 25°C, and the reaction mixture was filtered. The filtrate was added dropwise to 1000 ml of water with stirring. The precipitated powder was filtered, washed with water, and dried under reduced pressure at 40°C to yield 25 g of 9,9-Bis[4-(glycidyloxy)phenyl]fluorene, represented by formula 8 below. The resulting powder was analyzed by HPLC and showed a purity of 98%.

[0188] [ka]

[0189] Synthesis Example 2: Production of Cardo-based binder resin 25 g (54 mmol) of Compound 1 obtained from Synthesis Example 1, 8 g of acrylic acid (Daejung Chemicals & Metals), 0.2 g of benzyltriethylammonium chloride (Daejung Chemicals & Metals), and 0.2 g of hydroquinone (Daejung Chemicals & Metals) were placed in a 300 ml three-necked round-bottom flask equipped with a distillation tube along with 52 g of propylene glycol methyl ether acetate (Sigma-Aldrich) and stirred at 110°C for 6 hours. After the reaction was complete, 8 g of biphenyltetracarboxylic dianhydride (Mitsubishi Gas) and 1.8 g of tetrahydrophthalic acid (Sigma-Aldrich) were added and the mixture was stirred again at 110°C for 6 hours. After the reaction was complete, the reaction solution was recovered and analyzed. A cardo-based binder resin with a molecular weight of 4,580 and a solids content of 45% was obtained.

[0190] Production Example 1: Production of black pigment dispersion A dispersion was obtained by dispersing 15 g of Irgaphor Black S 100 CF (black pigment / BASF), 8.5 g of Disperbyk-163 (BYK), and 6.5 g of SR-3613 (SMS) together with 70 g of propylene glycol methyl ether acetate using a paint shaker (Asada) equipped with 100 g of 0.5 mm diameter zirconia beads (Toray).

[0191] A photosensitive composition liquid was prepared according to the composition shown in Table 1 below.

[0192] Specifically, an initiator was dissolved in a solvent and stirred at room temperature, and then a binder resin and a polymerizable compound were added thereto and stirred at room temperature. Next, a colorant and other additives were added to the resulting reaction product and stirred at room temperature. Next, the product was filtered three times to remove impurities, thereby preparing a photosensitive resin composition.

[0193] [Table 1]

[0194] The method for manufacturing a negative pixel defining layer (NDL) using the photosensitive composition is as follows.

[0195] (1) Application and coating stage The photosensitive composition is applied to a cleaned 10cm x 10cm substrate with a metal deposition at a uniform thickness using a spin coater, and then a coating is formed by removing part of the solvent using a vacuum chamber dry (VCD). The coating thickness of the photosensitive composition after VCD is 2.0 to 1.7 micrometers.

[0196] (2) Pre-bake stage To remove the solvent contained in the resulting coating, the coating is heated on a hot plate at 80°C to 120°C for 50 to 200 seconds. By removing a certain amount of solvent in this process, pixel-shaped mask contamination can be reduced in the next process (exposure), allowing for the creation of a clean pattern.

[0197] (3) Exposure stage To obtain the required pattern and a uniform thickness of the resulting coating film, a pixel-shaped mask is interposed, and then the film is irradiated with actinic rays of 190 nm to 600 nm, preferably a light source of a metal or LED lamp having a ghi-line, using an exposure device to form a pattern. The exposure dose for pattern formation is 20 to 150 mJ / cm. 2 and is a negative-type photoresist material formed.

[0198] (4) Development stage Following the exposure step, the film is developed by dipping in a 2.38 wt% TMAH (tetramethylammonium hydroxide) developer at 23±2°C for a certain time (minutes), and then washed with ultrapure water (DI water). The unexposed areas are dissolved and removed, leaving only the exposed areas, forming an image pattern with a coating thickness of 1.70 to 1.90 μm.

[0199] (5) Post-heat treatment stage To obtain an image pattern obtained by the development, post-baking is performed in an oven at 210 to 300°C for 30 to 120 minutes to completely remove the solvent, and the pattern is hardened to form a film, after which the size of each pixel is measured.

[0200] (6) Pixel size measurement After forming a pattern on a substrate using the photosensitive composition through steps (1) to (5) above, the red, green, and blue pixel sizes were measured. The pixel size was adjusted by changing the exposure dose during the exposure step; under the same development conditions, a lower exposure dose results in larger pixels, while a higher exposure dose results in smaller pixel sizes. The pixel sizes of the fabricated substrates were measured using a Nikon ECLIPSE ME600 optical microscope.

[0201] (7) Device reliability evaluation After forming a patterned substrate of pixel defining layer (PDL) with different pixel sizes, organic materials were deposited to evaluate the reliability of the device, and reliability verification factors such as driving voltage (V), electric current, luminance, and life time were confirmed.

[0202] The device substrate manufactured by the above method and the measurement results thereof are shown in Table 2 below.

[0203] [Table 2]

[0204] * Brightness = 14.20J standard / * Current density = 1000nit standard / * Lifespan = 1000nit standard *Converted aperture ratio = The total of the actual aperture ratios of R / G / B is converted to 100% Equivalent aperture ratio 100% ±10% (90% & 110%) = [Red pixel equivalent aperture ratio 25% ±10% (22.5% & 27.5%)] + [Green pixel equivalent aperture ratio 32% ±10% (27.9% & 34.1%)] + [Blue pixel equivalent aperture ratio 43% ±10% (37.8% & 46.2%)] *Total actual aperture rate of R / G / B 25% = [Red pixel aperture rate 6.25%] + [Green pixel aperture rate 8%] + [Blue pixel aperture rate 10.75%].

[0205] After the post-annealing step, devices were fabricated using the pixel substrates obtained from the process, and the brightness, current, and lifetime were compared. Referring to Comparative Example 1 in Table 2, as the pixel size decreased, the brightness decreased from 1000 nit to 833 nit when the current value was fixed at 14.2 J. At the same brightness level, the current density increased, and the lifetime decreased. As the pixel size increased, the brightness increased to 1250 nit and the lifetime also increased. However, as the pixel size increased, the number of pixels realized per unit area decreased, making it difficult to achieve high resolution. As shown in Table 2, when the equivalent aperture ratio decreased to 80%, the lifetime decreased by more than 100 hours compared to when the equivalent aperture ratio was 100%. This is thought to be due to the increased current required to achieve the same brightness as the aperture ratio decreased, which placed a strain on the device and reduced lifetime.

[0206] According to the present invention, if the green pixel size of the panel after post-annealing is less than 8.0-13.0 μm in major axis and less than 6.0-9.0 μm in minor axis, and the converted aperture ratio of the green pixel is less than 32%, the brightness decreases and the lifespan decreases due to increased power and driving voltage. Also, if the pixel size is larger than this range, the efficiency improves due to the increased aperture ratio, but it is impossible to manufacture a high-resolution panel.

[0207] According to the present invention, if the red pixel size of the panel after post-heat treatment is below the range of 15.8~19.8μm in the major axis and 11.0~15.0μm in the minor axis, and the equivalent aperture ratio of the red pixel is less than 25%, the brightness decreases and the lifespan decreases due to the increase in power and driving voltage. Also, if the pixel size is larger than the corresponding range, the efficiency improves due to the increase in aperture ratio, but it is impossible to manufacture a high-resolution panel.

[0208] According to the present invention, if the blue pixel size of the panel after post-heat treatment is 20.5~25.5μm in the long axis and less than 15.0~19.0μm in the short axis, and the converted aperture ratio of the blue pixel is less than 43%, the brightness decreases and the lifespan decreases due to the increase in power and driving voltage. Also, if the pixel size is larger than this range, the efficiency improves due to the increase in aperture ratio, but it is impossible to manufacture a high-resolution panel.

[0209] The above description is merely an illustrative example of the present invention, and various modifications can be made by a person having ordinary knowledge in the technical field to which the present invention pertains without departing from the essential characteristics of the present invention.

[0210] Therefore, the embodiments disclosed in this specification are for illustrative purposes only and are not intended to limit the scope of the present invention. The scope of protection of the present invention should be interpreted by the claims, and all technologies within the scope equivalent thereto should be interpreted as being included in the scope of the present invention.

[0211] [Industrial Applicability] The present invention relates to a method for fabricating a pixel-defining layer of a light-emitting display device using a photosensitive composition. [Brief explanation of the drawings]

[0212] [Figure 1] This is a schematic diagram of red, green, and blue pixels.

Claims

1. A method for manufacturing a pixel defining layer, the method including the steps of applying and coating a photosensitive composition; pre-baking; exposing; developing; and post-heat treatment, wherein after the post-heat treatment step, the length of the major axis of the Green pixel is 8.0 to 13.0 μm, the length of the minor axis is 6.0 to 9.0 μm, and the converted aperture ratio of the Green pixel exceeds 32%.

2. 2. The method of claim 1, wherein after the post-heat treatment, the green pixels have a major axis length of 9.8 μm to 12.4 μm and a minor axis length of 6.2 to 8.3 μm.

3. 2. The method of claim 1, wherein after the post-heat treatment, the red pixels have a major axis length of 16.2 to 18.5 μm and a minor axis length of 11.6 to 14.5 μm.

4. 2. The method of claim 1, wherein after the post-heat treatment, the blue pixels have a major axis length of 21.3 to 25.0 μm and a minor axis length of 15.6 to 18.5 μm.

5. 2. The method of claim 1, wherein the shape of the pixel after the post-heat treatment is such that the sizes of the major and minor axes can be depicted.

6. The method of claim 5, wherein the pixel has at least one shape selected from the group consisting of a diamond, a square, a rectangle, an ellipse, a hexagon, an octagon, and a circle.

7. 2. The method of claim 1, wherein the post-heat treatment is performed at an oven temperature of 250 to 270.degree.

8. 2. The method of claim 1, wherein the post-heat treatment is performed for 60 to 120 minutes.

9. 2. The method for manufacturing a pixel-defining layer according to claim 1, wherein the photosensitive composition contains a colorant.

10. 10. The method of claim 9, wherein the colorant comprises one or more of an inorganic dye, an organic dye, an inorganic pigment, and an organic pigment.

11. 10. The method of claim 9, wherein the colorant is contained in an amount of 1 to 40% by weight based on the total amount of the photosensitive composition.

12. The method of claim 9, wherein the colorant is pretreated using a dispersant or a water-soluble inorganic salt and a wetting agent.

13. 10. The method for manufacturing a pixel defining layer according to claim 9, wherein the colorant has an average particle size of 20 nm to 110 nm.

14. 2. The method for manufacturing a pixel-defining layer according to claim 1, wherein the photosensitive composition comprises a patterning resin comprising a cardo-based binder resin or a combination thereof.

15. The method for manufacturing a pixel defining layer according to claim 14, wherein the cardo-based binder resin has a repeating structure of the following Chemical Formula 1: 【Chemistry 1】 In the above Chemical Formula 1, 1) R １ and R ２ are each independently hydrogen; deuterium; halogen; C ６ ~C ３０ aryl groups of the formula: C, containing at least one heteroatom of O, N, S, Si and P; ２ ~C ３０ a heterocyclic group represented by the formula C ６ ~C ３０ a fused ring group of an aliphatic ring and an aromatic ring; １ ~C ２０ an alkyl group of C ２ ~C ２０ an alkenyl group of C ２ ~C ２０ an alkynyl group represented by C １ ~C ２０ Alkoxy group: C ６ ~C ３０ an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or C １ ~C ２０ is an alkoxycarbonyl group of the formula 2) R １ and R ２ can form a ring with adjacent groups, 3) m and n are each independently an integer from 0 to 4; 4) A １ and A ２ are each independently represented by the following formula 2 or 3: 【Chemistry 2】 【Transformation 3】 In the above Chemical Formula 2 and Chemical Formula 3, 4-1) * indicates a linking site, 4-2) R ３ ~R ６ are each independently hydrogen; deuterium; halogen; C ６ ~C ３０ aryl groups of the formula: C, containing at least one heteroatom of O, N, S, Si and P; ２ ~C ３０ a fused ring group of an aliphatic ring and an aromatic ring; １ ~C ２０ an alkyl group of C ２ ~C ２０ an alkenyl group of C ２ ~C ２０ an alkynyl group represented by C １ ~C ２０ Alkoxy group: C ６ ~C ３０ an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or C １ ~C ２０ is an alkoxycarbonyl group of the formula 4-3) R ３ ~R ６ can form a ring with adjacent groups, 4-4) Y １ and Y ２ are each independently represented by the following formula 6 or 7: 【Chemistry 4】 【Transformation 5】 In Chemical Formula 6 and Chemical Formula 7, 4-4-1) * indicates the bond position, 4-4-2) R ９ is hydrogen or methyl, 4-4-3) R １０ ~R １３ are each independently hydrogen; deuterium; halogen; C ６ ~C ３０ aryl groups of the formula: C containing at least one heteroatom of O, N, S, Si and P; ２ ~C ３０ a heterocyclic group represented by the formula C ６ ~C ３０ a fused ring group of an aliphatic ring and an aromatic ring; １ ~C ２０ an alkyl group of C ２ ~C ２０ an alkenyl group of C ２ ~C ２０ an alkynyl group represented by C １ ~C ２０ an alkoxy group of C ６ ~C ３０ an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or C １ ~C ２０ is an alkoxycarbonyl group of the formula 4-4-4) L １ ~L ３ are each independently a single bond; a fluorenylene group; C ２ ~C ３０ Arylene of C ２ ~C ３０ Heterocycle of C １ ~C ３０ Alkoxylene; C ２ ~C ３０ alkyleneoxy of C ６ ~C ３０ Aryloxy group; C ２ ~C ３０ is a polyethyleneoxy group of the formula 4-4-5) q and r are each independently an integer from 0 to 3; provided that q + r = 3; 5) A is present in the polymer chain of a resin containing a repeating unit represented by chemical formula 1. １ and A ２ is in the ratio of 9:1 to 1:9, 6) X １ is a single bond; O; CO; SO2; CR'R"; SiR'R"; Formula 4 below; or Formula 5, 6-1) R' and R" are each independently hydrogen; deuterium; halogen; C ６ ~C ３０ an aryl group of the formula C, containing at least one heteroatom of O, N, S, Si, and P; ２ ~C ３０ Heterocyclic group of C6-C ３０ a fused ring group of an aliphatic ring and an aromatic ring; １ ~C ２０ an alkyl group of C ２ ~C ２０ an alkenyl group of C ２ ~C ２０ an alkynyl group represented by C １ ~C ２０ Alkoxy group: C ６ ~C ３０ an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or C １ ~C ２０ is an alkoxycarbonyl group of the formula 6-2) R' and R" can form a ring together with adjacent groups, 【Transformation 6】 【Transformation 7】 In Chemical Formula 4 and Chemical Formula 5, 6-3) * indicates the bond position, 6-4) R ７ ~R ８ are each independently hydrogen; deuterium; halogen; C ６ ~C ３０ aryl groups of the formula: C, containing at least one heteroatom of O, N, S, Si and P; ２ ~C ３０ a heterocyclic group represented by the formula C ６ ~C ３０ a fused ring group of an aliphatic ring and an aromatic ring; １ ~C ２０ an alkyl group of C ２ ~C ２０ an alkenyl group of C ２ ~C ２０ an alkynyl group represented by C １ ~C ２０ an alkoxy group of C ６ ~C ３０ an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or C １ ~C ２０ is an alkoxycarbonyl group of the formula 6-5) o and p are each independently an integer from 0 to 4; 7) X ２ is C ６ ~C ３０ an aryl group of the formula C, containing at least one heteroatom of O, N, S, Si, and P; ２ ~C ３０ a heterocyclic group of C ６ ~C ３０ a fused ring group of an aliphatic ring and an aromatic ring, １ ~C ２０ alkyl group of C ２ ~C ２０ an alkenyl group of C ２ ~C ２０ an alkynyl group represented by C １ ~C ２０ an alkoxy group of C ６ ~C ３０ an aryloxy group; a fluorenyl group; a carbonyl group; an ether group; or C １ ~C ２０ is an alkoxycarbonyl group of the formula (8) The R′, R″, and X ２ , L １ ~L ３ , R １ ~R ８ and R １０ ~R １３ are deuterium, halogen, and C, respectively. １ ~C ３０ or an alkyl group of C ６ ~C ３０ silane groups substituted or unsubstituted with aryl groups; siloxane groups; boron groups; germanium groups; cyano groups; amino groups; nitro groups; C １ ~C ３０ an alkylthio group represented by C １ ~C ３０ an alkoxy group of C ６ ~C ３０ an arylalkoxy group represented by C １ ~C ３０ alkyl group of C ２ ~C ３０ an alkenyl group of C ２ ~C ３０ an alkynyl group represented by C １ ~C ３０ aryl groups of the formula: ６ ~C ３０ an aryl group of the formula: ２ ~C ３０ a heterocyclic group represented by the formula C ３ ~C ３０ an aliphatic cyclic group represented by C ７ ~C ３０ an aryl alkyl group of C ８ ~C ３０ and combinations thereof, and adjacent substituents may be joined to form a ring.

16. 15. The method of claim 14, wherein the cardo resin has a weight average molecular weight of 1,000 to 100,000 g / mol.

17. 15. The method of claim 14, wherein the cardo resin is contained in an amount of 1 to 30% by weight based on the total amount of the photosensitive composition.

18. 2. The method for manufacturing a pixel-defining layer according to claim 1, wherein the photosensitive composition contains 1 to 40% by weight of the reactive unsaturated compound based on the total amount of the photosensitive composition.

19. 2. The method of claim 1, wherein the photosensitive composition contains 0.01 to 10% by weight of a photoinitiator based on the total weight of the photosensitive composition.

20. A pixel defining layer manufactured according to claim 1.

21. An organic light emitting display device comprising the pixel defining layer according to claim 20.

22. 22. An electronic device comprising the display device of claim 21 and a control unit that drives the display device.

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