High-voltage substrate processing equipment

Abstract

The present invention provides a high-pressure substrate processing apparatus comprising: an inner chamber configured to accommodate a substrate to be processed; an outer chamber including an outer housing configured to accommodate the inner chamber and an outer door configured to be movable between a closed state in which the outer housing is closed and an open state in which the outer housing is opened; and a fastening module configured to fasten the outer housing and the outer door together in the closed state to maintain a processing gas for processing the substrate in the inner chamber at a first pressure higher than atmospheric pressure and a protective gas in the outer chamber at a second pressure set relative to the first pressure, the fastening module including a support protrusion mounted on the outer housing; and a locking protrusion mounted on the outer door and supported by the protrusion during movement, one of the support protrusion and the locking protrusion being a protrusion body; and a friction reducing member attached to the protrusion body so as to come into contact with the other of the support protrusion and the locking protrusion during the movement, the friction reducing member having a lower friction coefficient than the protrusion body and the other one of the support protrusion and the locking protrusion.

Description

[Technical Field]

[0001] The present invention relates to an apparatus used to process substrates at high pressures. [Background technology]

[0002] Generally, during the manufacturing process of semiconductor devices, semiconductor wafers undergo various processes, such as oxidation, nitridation, deposition, silicide, and ion implantation. Hydrogen or deuterium heat treatment processes are also used to improve interface properties of semiconductor devices.

[0003] The gas used in processing is supplied into the chamber at high pressure and acts on the semiconductor wafer. To maintain high pressure inside the chamber, the chamber housing and door must be firmly fastened together. To achieve this, a fastening structure is adopted in which part of the housing and part of the door are interlocked with each other and one supports the other.

[0004] When one of the components supports the other, friction occurs due to the relative movement between them. The friction can cause wear and particles. The wear can deteriorate the airtightness between the housing and the door. The particles can contaminate the object to be processed.

[0005] The above-mentioned background art is technical information that the inventor possessed in order to derive the embodiments of the present invention or that he acquired in the process of deriving the embodiments, and is not necessarily publicly known art that was made public to the general public prior to the filing of this application. Summary of the Invention [Problem to be solved by the invention]

[0006] It is an object of the present invention to provide a high pressure substrate processing apparatus that minimizes wear and particles generated from the chamber's fastening structure. [Means for solving the problem]

[0007] According to one aspect of the present invention, there is provided a high-pressure substrate processing apparatus for achieving the above object, comprising: an internal chamber configured to accommodate a substrate to be processed; an external chamber including an external housing configured to accommodate the internal chamber and an external door configured to be movable between a closed state in which the external housing is closed and an open state in which the external housing is opened; and a fastening module configured to fasten the external housing and the external door together in the closed state to maintain a processing gas for processing the substrate in the internal chamber at a first pressure higher than atmospheric pressure and to maintain a protective gas in the external chamber at a second pressure set relative to the first pressure, wherein the fastening module includes a support protrusion mounted on the external housing; and a locking protrusion mounted on the external door and supported by the support protrusion by switching from a first relationship in which the support protrusion is offset relative to the support protrusion to a second relationship corresponding to the support protrusion, wherein one of the support protrusion and the locking protrusion is a protrusion body; and a friction reducing member attached to the protrusion body so as to contact the other of the support protrusion and the locking protrusion during switching from the first relationship to the second relationship, the friction reducing member having a lower friction coefficient than the protrusion body and the other one of the support protrusion and the locking protrusion.

[0008] Here, the protrusion body and the other one may be made of a first metal, and the friction reducing member may be made of one of reinforced plastic and a second metal that is softer than the first metal.

[0009] Here, the protrusion main body may include a storage portion and a peripheral portion formed on at least one of both sides of the storage portion and protruding from the storage portion, and the friction reduction member may include an insertion portion inserted into the storage portion and a contact portion supported by the peripheral portion and contacting the other one in the closed state.

[0010] Here, the receiving portion may extend in a direction intersecting the direction of the movement.

[0011] Here, the accommodating portion may have a shape that narrows in width as it extends in a direction away from the protrusion main body, and the inserting portion may have a shape that corresponds to the shape of the accommodating portion.

[0012] Here, one of the support protrusion and the locking protrusion may further include a fixing piece for fixing the friction reducing member to the protrusion body.

[0013] Here, the fastening module may further include a rotating member forming a second plane parallel to a first plane formed by the support protrusion and one of the locking protrusions, and the support protrusion may be formed to protrude from the rotating member and positioned to support the locking protrusion as the rotating member rotates.

[0014] Here, the rotating member may include a rotating ring rotatably mounted on the outer housing.

[0015] Here, the support projection may include the friction reducing member, and the friction reducing member may be disposed on an upper side of the projection body.

[0016] Here, the internal chamber may include an internal housing and an internal door, and the internal door may be connected to the external door so as to close or open the internal housing in conjunction with movement of the external door.

[0017] Here, the second pressure may be a pressure higher than atmospheric pressure.

[0018] According to another aspect of the present invention, a high-pressure substrate processing apparatus includes a chamber having a housing and a door configured to open and close the housing; and a fastening module configured to fasten the housing and the door to maintain a process gas injected into the chamber at a pressure higher than atmospheric pressure, wherein the fastening module includes a support protrusion installed on the housing; and a locking protrusion installed on the door and supported by the support protrusion by switching from a first relationship in which the support protrusion is offset relative to the support protrusion to a second relationship corresponding to the support protrusion, wherein one of the support protrusion and the locking protrusion is a protrusion body; and a friction reducing member attached to the protrusion body so as to contact the other of the support protrusion and the locking protrusion during switching from the first relationship to the second relationship, and having a lower friction coefficient than the protrusion body and the other one of the support protrusion and the locking protrusion.

[0019] Here, the fastening module may further include a rotating ring rotatably installed on the housing, and the support protrusion may be formed to protrude from the rotating ring and positioned to support the locking protrusion as the rotating ring rotates.

[0020] Here, the protrusion body and the other one may be made of a first metal, and the friction reducing member may be made of one of reinforced plastic and a second metal that is softer than the first metal.

[0021] Here, the protrusion main body may include a accommodating portion and a peripheral portion formed on at least one of both sides of the accommodating portion and protruding from the accommodating portion, and the friction reduction member may include an insertion portion inserted into the accommodating portion and a contact portion supported by the peripheral portion and contacting the other one. [Effects of the Invention]

[0022] According to the high-pressure substrate processing apparatus of the present invention configured as described above, the fastening module that fastens the chamber housing and door has a support protrusion and a locking protrusion supported by it, and one of these has a friction reduction member with a lower friction coefficient than the other, so that wear and particle generation can be significantly reduced during the fastening process.

[0023] The reduced wear allows the airtightness of the chamber to be maintained for a longer period, and the reduced particle generation significantly reduces the possibility of particles contaminating the object to be processed. [Brief explanation of the drawings]

[0024] [Figure 1] 1 is a conceptual diagram of a high-pressure substrate processing apparatus 100 according to an embodiment of the present invention. [Figure 2] 2 is a perspective view showing an open state in which an outer door 125 opens an outer housing 121 in the high-pressure substrate processing apparatus 100 of FIG. 1. FIG. [Figure 3] 3 is a cross-sectional view showing the relationship between the support protrusion 153 and the locking protrusion 157 when the closed state in which the outer door 125 closes the outer housing 121 in FIG. 2 is realized. [Figure 4] 3 is a partial perspective view showing a fastening state between an outer housing 121 and an outer door 125 in the high-pressure substrate processing apparatus 100 of FIG. 2. FIG. [Figure 5] 3 is an enlarged cross-sectional view of a support protrusion 153 of FIG. 2. FIG. [Figure 6] 6 is a cross-sectional view showing a support protrusion 153' according to a modified example of the support protrusion 153 of FIG. 5. FIG. DETAILED DESCRIPTION OF THE INVENTION

[0025] Hereinafter, a high-pressure substrate processing apparatus and a processing gas line used therein according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. In this specification, the same or similar reference numerals are used to designate the same or similar components even in different embodiments, and the description thereof supersedes the first description.

[0026] FIG. 1 is a conceptual diagram of a high-pressure substrate processing apparatus 100 according to one embodiment of the present invention.

[0027] Referring to this figure, a high pressure substrate processing apparatus 100 may include an inner chamber 110 , an outer chamber 120 , an air supply module 130 , and an exhaust module 140 .

[0028] The inner chamber 110 forms a receiving space for receiving a substrate to be processed. The inner chamber 110 may be made of a non-metallic material, such as quartz, to reduce contamination of the substrate in a high-temperature and high-pressure working environment. The temperature of the inner chamber 110 can reach several hundred to several thousand degrees Celsius by operating a heater (not shown) disposed outside the inner chamber 110. The substrate may be, for example, a semiconductor wafer W (see FIG. 2) mounted on a holder 113 (see FIG. 2). The substrate is not limited to a wafer and may be any other base structure for forming circuits. For example, the substrate may include glass for display manufacturing. The holder 113 may be a boat on which substrates to be processed can be stacked in multiple layers.

[0029] The outer chamber 120 is disposed to house the inner chamber 110. Unlike the inner chamber 110, the outer chamber 120 may be made of a metal material because it is free from the problem of inducing contamination to the substrate. The outer chamber 120 is hollow and has an internal space to house the inner chamber 110.

[0030] The gas supply module 130 is configured to supply gas to the inner chamber 110 and the outer chamber 120. The gas supply module 130 includes a gas supplier 131 serving as a gas source. The gas supplier 131 may selectively supply a process gas, such as hydrogen / deuterium gas, fluorine gas, ammonia gas, chlorine gas, or nitrogen gas, to the inner chamber 110. The gas supplier 131 may also supply a protective gas, such as an inert gas, such as nitrogen gas, to the outer chamber 120. The process gas and protective gas are supplied to the inner chamber 110 and the outer chamber 120 via a process gas line 133 and a protective gas line 135, respectively. The protective gas supplied to the outer chamber 120 is specifically supplied to the space between the outer chamber 120 and the inner chamber 110. The process gas and the protective gas may be simply referred to as process gases.

[0031] The process gas may be supplied at a pressure higher than atmospheric pressure, for example, to form a high pressure ranging from several atmospheres to several tens of atmospheres. When the process gas pressure is a first pressure and the protective gas pressure is a second pressure, they may be maintained within a set relationship (range). For example, the second pressure may be set to be substantially the same as or slightly higher than the first pressure. Such a pressure relationship provides the advantage of preventing leakage of the process gas from the inner chamber 110 and preventing damage to the inner chamber 110. The second pressure may be set slightly lower than the first pressure, and in this case, similar effects can be achieved.

[0032] The exhaust module 140 is configured to exhaust the process gas. An exhaust pipe 141 may be connected to the upper part of the inner chamber 110 to exhaust the process gas from the inner chamber 110. Similarly, an exhaust pipe 145 may be connected to the outer chamber 120 to exhaust the protective gas from the outer chamber 120. Because the exhaust pipes 141 and 145 are connected to each other, the process gas is diluted with the protective gas during the exhaust process, reducing its concentration.

[0033] The fastening structure of the outer chamber 120 will be described with reference to Figures 2 to 4. Figure 2 is a perspective view showing an open state in which the outer door 125 opens the outer housing 121 in the high pressure substrate processing apparatus 100 of Figure 1, Figure 3 is a cross-sectional view showing the relationship between the support protrusions 153 and the locking protrusions 157 when the closed state in which the outer door 125 closes the outer housing 121 in Figure 2 is achieved, and Figure 4 is a partial perspective view showing the fastening state between the outer housing 121 and the outer door 125 in the high pressure substrate processing apparatus 100 of Figure 2.

[0034] Referring to this figure, the internal chamber 110 includes an internal housing 111 and an internal door 115. The internal housing 111 forms the storage space for storing the substrate W, and the bottom thereof may be open. The internal door 115 closes the open bottom of the internal housing 111. The internal door 115 may have a trough shape that opens downward. The internal door 115 descends in an opening / closing direction (E) to open the storage space (open state, see FIG. 2). The opening / closing direction (E) is the direction in which the internal door 115 approaches or moves away from the internal housing 111. In the open state, the substrate W can be loaded into or unloaded from the storage space. As the internal door 115 ascends in the opening / closing direction (E), the internal door 115 comes into contact with the internal housing 111. In this case, the storage space is said to be closed (closed state).

[0035] The outer chamber 120 also includes an outer housing 121 and an outer door 125. The outer housing 121 may be formed to entirely accommodate the inner chamber 110. As a result, the outer housing 121 is formed to cover not only the inner housing 111 but also the inner door 115. The outer housing 121 can be opened and closed by moving the outer door 125. The outer door 125 can be connected to the inner door 115 by a support member 127 and support the inner door 115. In this case, the inner door 115 can move in conjunction with the upward and downward movement of the outer door 125, thereby opening and closing the inner housing 111. The expressions "open state" and "closed state" can also be applied to the relationship between the outer housing 121 and the outer door 125.

[0036] The high-pressure substrate processing apparatus 100 may further include a fastening module 150 for fastening the outer housing 121 and the outer door 125 in the closed state. Because the inner door 115 is supported on the outer door 125 by a support member 127, the fastening module 150 may also fasten the inner door 115 to the inner housing 111. The fastening module 150 ensures that the protective gas in the outer chamber 120 is maintained at the second pressure. The fastening module 150 also exerts a fastening force to ensure that the processing gas in the inner chamber 110 is maintained at the first pressure.

[0037] The fastening module 150 may specifically include a rotating ring 151 , a support protrusion 153 , and a locking protrusion 157 .

[0038] The rotatable ring 151 is attached to the outer housing 121 and rotates around the central axis of the outer housing 121. Specifically, a ring-shaped guide groove 123 may be formed on the outer surface of the outer housing 121. The rotatable ring 151 is inserted into the guide groove 123 and can rotate around the outer housing 121. The force for rotating the rotatable ring 151 is provided by a drive wheel (not shown) that contacts the rotatable ring 151. The rotatable ring 151 may be formed to form a second plane parallel to a first plane formed by support protrusions 153 or locking protrusions 157 (described below). The first and second planes may be planes that are approximately perpendicular to the opening / closing direction (E).

[0039] The support protrusions 153 may be protrusions that are installed on the outer housing 121. The support protrusions 153 may be installed on the outer housing 121 via the rotating ring 151. Specifically, the support protrusions 153 may be formed to protrude from the inner circumferential surface of the rotating ring 151, and may be arranged in a plurality of numbers along the circumferential direction of the rotating ring 151.

[0040] The support protrusion 153 may include a protrusion body 154 and a friction reduction member 155. The protrusion body 154 may be formed integrally with the rotating ring 151. The friction reduction member 155 may be a member separate from the rotating ring 151 and attached to the upper side of the protrusion body 154. If the friction reduction member 155 comes into contact with the locking protrusion 157, the protrusion body 154 supports the friction reduction member 155.

[0041] The friction reduction member 155 may have a lower coefficient of friction than the locking protrusion 157 and the protrusion body 154. For example, if the locking protrusion 157 or the protrusion body 154 is made of a first metal, the friction reduction member 155 may be made of a second metal that is softer than the first metal. The friction reduction member 155 may also be made of reinforced plastic.

[0042] The locking protrusion 157 may be a protrusion installed on the outer door 125. The locking protrusion 157 has a size that allows it to pass between a pair of adjacent support protrusions 153 when the outer door 125 moves up in the opening / closing direction (E). The locking protrusion 157 is located at a higher level than the support protrusions 153 in the closed state (see FIG. 3). When the support protrusions 153 rotate in the rotation direction (R), the locking protrusion 157 is located on the support protrusions 153 and is supported by the support protrusions 153 (fastened state, see FIG. 4). In the fastened state, the level of the outer door 125 may be substantially the same as in the closed state. The fastened state may also be understood as one aspect of the closed state.

[0043] With this configuration, the outer door 125 rises in the opening / closing direction (E) to enter the closed state, with the locking protrusion 157 positioned offset from the support protrusion 153 (first relationship, see FIG. 3). In the closed state, the rotating ring 151 rotates in the rotation direction (R), causing the support protrusion 153 to rotate relative to the locking protrusion 157. The top surface of the support protrusion 153 rotates in contact with the bottom surface of the locking protrusion 157. This rotation positions the support protrusion 153 in correspondence with the locking protrusion 157 (second relationship, see FIG. 2).

[0044] The upper surface of the support protrusion 153 is made of the friction reduction member 155, which has a low friction coefficient and therefore minimizes friction with the locking protrusion 157. As a result, wear of the support protrusion 153 and the locking protrusion 157 and the resulting generation of particles can be suppressed during the process of switching from the first relationship to the second relationship.

[0045] Although the friction reduction member 155 has been described as being part of the support protrusion 153, the friction reduction member 155 may also be part of the locking protrusion 157. In this case, the friction reduction member 155 occupies the lower part of the locking protrusion 157 and can come into contact with the upper surface of the support protrusion 153 during the rotation.

[0046] Although the above describes an example in which the support protrusion 153 rotates while the locking protrusion 157 is stationary, in an alternative embodiment, the locking protrusion 157 may rotate while the support protrusion 153 is stationary. In the latter case, a rotating member (not shown) may be rotatably installed on the outer door 125, and the locking protrusion 157 may protrude from the rotating member. The rotating member may also be formed to form the second plane. The rotating member is located within the space defined by the outer housing 121 and can rotate around an axis passing through the center of the periphery of the outer door 125. The rotating member may have a ring-shaped rotating ring that receives the outer door 125.

[0047] In another alternative embodiment, the locking protrusion 157 may be moved in a manner other than rotation, for example, translation, relative to the support protrusion 153. In this case, friction between the locking protrusion 157 and the support protrusion 153 that occurs during switching from the first relationship to the second relationship can be reduced by the friction reduction member 155.

[0048] A specific form of the support protrusion 153 will be described with reference to Fig. 5. Fig. 5 is an enlarged cross-sectional view of the support protrusion 153 of Fig. 2.

[0049] Referring to this figure, the protrusion body 154 may include a receiving portion 154a and a peripheral portion 154b.

[0050] The receiving portion 154a is a portion that is recessed compared to the peripheral portion 154b. The receiving portion 154a may be located at the center along the width direction of the protrusion body 154. The receiving portion 154a may extend along an extension direction (a direction penetrating into the drawing) that intersects with the rotation direction (R).

[0051] The peripheral portion 154b is located on the side of the receiving portion 154a. As in this embodiment, the peripheral portion 154b may be formed on both sides of the receiving portion 154a. The peripheral portion 154b has a shape that protrudes from the receiving portion 154a.

[0052] The friction reducing member 155 may include an insert portion 155a and a contact portion 155b.

[0053] The insertion portion 155a is a portion that is inserted into the receiving portion 154a. The insertion portion 155a has a size that corresponds to the receiving portion 154a, so that it can be inserted into the receiving portion 154a without play. The insertion portion 155a can be slid along the extension direction and inserted into the receiving portion 154a.

[0054] The contact portion 155b may be a portion located above the insertion portion 155a. The contact portion 155b may be supported by the peripheral portion 154b. The contact portion 155b is a portion that comes into contact with the locking protrusion 157 (see FIG. 2) in the closed state.

[0055] A fixing piece 159 may be further provided to fix the friction-reducing member 155 to the protrusion body 154. The fixing piece 159 is inserted into the friction-reducing member 155 and the protrusion body 154 in a direction from the friction-reducing member 155 toward the protrusion body 154. The upper surface of the fixing piece 159 may be formed concavely so that contact with the locking protrusion 157 is minimized.

[0056] With this configuration, the insertion portion 155a is inserted into the housing portion 154a and cannot move in the rotational direction (R). The fixing piece 159 also prevents the insertion portion 155a from being removed from the housing portion 154a in the height direction.

[0057] Another embodiment of the support protrusion 153 will be described with reference to Fig. 6. Fig. 6 is a cross-sectional view showing a support protrusion 153' according to a modification of the support protrusion 153 of Fig. 5.

[0058] Referring to this figure, the (first) receiving portion 154a' of the protrusion main body 154' has a shape that narrows in width as it goes away from the protrusion main body 154'. The (first) insertion portion 155a' may have a shape corresponding to the receiving portion 154a'.

[0059] A (second) housing portion 154a" may be formed on both sides of the housing portion 154a'. The housing portion 154a" may have the same shape as the housing portion 154a (see FIG. 5). The (second) insertion portion 155a" may also have a shape corresponding to the housing portion 154a".

[0060] With this configuration, the insertion portion 155a' is inserted into the housing portion 154a' and cannot move in the rotational direction (R). The insertion portion 155a' does not come off the housing portion 154a' in the height direction due to not only the fixing piece 159' but also the interlocking structure between the insertion portion 155a' and the housing portion 154a'.

[0061] Due to the engagement between the insertion portion 155a'' and the accommodation portion 154a'', both ends of the contact portion 155b' are prevented from lifting up due to a shear force along the rotation direction (R). The shear force is a force that the locking protrusion 157 applies to the contact portion 155b' along the rotation direction (R) during the rotation.

[0062] Although the present specification has described a high-pressure substrate processing apparatus 100 having dual chambers 110 and 120, the present invention is not limited thereto. A processing apparatus having a single chamber also falls within the scope of the present invention. The single chamber comprises a housing and a door. A substrate is placed in the chamber, and a process gas for processing the substrate, specifically, a process gas, is supplied into the chamber. The fastening module 150 is also applicable to such a single chamber. The fastening module 150 ensures that the door is firmly fastened to the housing regardless of the pressure of the process gas.

[0063] Although a batch-type processing apparatus is exemplified in this specification, the present invention is not limited thereto, and can also be applied to a single-wafer-type processing apparatus. [Industrial Applicability]

[0064] The present invention has industrial applicability in the field of manufacturing high-pressure substrate processing apparatuses.

Claims

1. an interior chamber configured to accommodate a substrate to be processed; an outer chamber including an outer housing configured to contain the inner chamber and an outer door configured to be movable between a closed state that closes the outer housing and an open state that opens the outer housing; and a fastening module configured to fasten the outer housing and the outer door together in the closed state to maintain a process gas for processing the substrate in the inner chamber at a first pressure higher than atmospheric pressure and a protective gas in the outer chamber at a second pressure set relative to the first pressure; The fastening module comprises: a support protrusion mounted on the outer housing; and a locking protrusion disposed on the exterior door and supported by the support protrusion by being switched from a first relationship in which the locking protrusion is offset relative to the support protrusion to a second relationship in which the locking protrusion corresponds to the support protrusion; One of the support protrusion and the locking protrusion is a projection body; and a friction reducing member attached to the projection body so as to come into contact with the other of the support projection and the locking projection during switching from the first relationship to the second relationship, the friction reducing member having a lower coefficient of friction than the projection body and the other of the support projection and the locking projection; High-voltage substrate processing equipment.

2. The protrusion body and the other one are formed of a first metal, The friction reducing member is 2. The high-pressure substrate processing apparatus according to claim 1, wherein the substrate is made of one of a reinforced plastic and a second metal that is softer than the first metal.

3. The protrusion body is a receiving portion; and a peripheral portion formed on at least one of both sides of the receiving portion and protruding from the receiving portion, The friction reducing member is The high-pressure substrate processing apparatus according to claim 1 , further comprising: an insertion portion inserted into said accommodation portion; and a contact portion supported by said peripheral portion and contacting said other one in said closed state.

4. The storage section is The high-pressure substrate processing apparatus according to claim 3 , wherein the high-pressure substrate processing apparatus extends along a direction intersecting the direction of the movement.

5. The storage section is The width of the projection becomes narrower as it goes away from the projection body. The insertion portion is The high-pressure substrate processing apparatus according to claim 3 , having a shape corresponding to the shape of the accommodation portion.

6. One of the support protrusion and the locking protrusion is The high-pressure substrate processing apparatus according to claim 1 , further comprising a fixing piece for fixing the friction reducing member to the protrusion body.

7. The fastening module comprises: a rotating member that forms a second plane parallel to a first plane formed by either the support protrusion or the locking protrusion; The support protrusion is 2. The high-pressure substrate processing apparatus according to claim 1, wherein the locking projection is formed to protrude from the rotating member and positioned so as to support the locking projection when the rotating member rotates.

8. The rotating member is The high pressure substrate processing apparatus of claim 7 , further comprising a rotating ring rotatably mounted on the outer housing.

9. The support protrusion is The friction reducing member is included, The friction reducing member is The high-pressure substrate processing apparatus according to claim 1 , wherein the high-pressure substrate processing apparatus is disposed above the protrusion body.

10. The internal chamber comprises: an inner housing and an inner door; The interior door is The high-pressure substrate processing apparatus according to claim 1 , wherein the outer door is connected to the inner housing so as to close or open the inner housing in conjunction with movement of the outer door.

11. The second pressure is 2. The high pressure substrate processing apparatus according to claim 1, wherein the pressure is higher than atmospheric pressure.

12. a chamber having a housing and a door configured to open and close the housing; and a fastening module configured to fasten the housing and the door together to maintain a pressure of the process gas injected into the chamber higher than atmospheric pressure; The fastening module comprises: a support protrusion mounted on the housing; and a locking protrusion that is mounted on the door and is supported by the support protrusion by being switched from a first relationship in which the locking protrusion is offset relative to the support protrusion to a second relationship in which the locking protrusion corresponds to the support protrusion; One of the support protrusion and the locking protrusion is a projection body; and A high-pressure substrate processing apparatus including a friction reduction member attached to the projection body so as to contact the other one of the support projection and the locking projection during switching from the first relationship to the second relationship, and having a lower friction coefficient than the projection body and the other one.

13. The fastening module comprises: The housing further includes a rotating ring rotatably mounted thereon, The support protrusion is The high pressure substrate processing apparatus according to claim 12 , wherein the locking projection is formed to protrude from the rotating ring and positioned to support the locking projection when the rotating ring rotates.

14. The protrusion body and the other one are formed of a first metal, The friction reducing member is The high-pressure substrate processing apparatus according to claim 12 , wherein the substrate is made of one of a reinforced plastic and a second metal that is softer than the first metal.

15. The protrusion body is a receiving portion; and a peripheral portion formed on at least one of both sides of the receiving portion and protruding from the receiving portion, The friction reducing member is The high pressure substrate processing apparatus according to claim 12 , further comprising: an insertion portion inserted into said accommodation portion; and a contact portion supported by said peripheral portion and contacting said other one of said plurality of contact portions.

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