Laminated film and method for producing laminated film

Abstract

To provide a transparent laminated film capable of reconciling the easiness of breaking by a hand and barrier properties, and a method for manufacturing the laminated film.SOLUTION: A laminated film according to an embodiment is a transparent laminated film including a film main body having a base material layer having a first surface and a second surface, a barrier layer, and a sealant layer, in which a breaking line for breaking the film main body in a predetermined direction is formed when viewed from a lamination direction, the break line has a cut portion formed from the first surface toward the sealant layer, a processing width of the cut portion in the first surface is 1.8 μm or more and 25.0 μm or less, a processing width of the cut portion in the barrier layer is 0 μm or more and 20.0 μm or less, and a length of the cut portion in the lamination direction is 1 / 3 or more of a length from the first surface to the sealant layer and is shorter than a length of the film main body.SELECTED DRAWING: Figure 3

Description

[Technical Field]

[0001] The present invention relates to a laminated film and a method for producing the laminated film. [Background technology]

[0002] BACKGROUND ART As a package for sealing and storing contents, for example, a package such as that disclosed in Patent Document 1 is known. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 2019-131198 Summary of the Invention [Problem to be solved by the invention]

[0004] A laminated film having a barrier layer is used in a package for sealing and storing contents. To remove the sealed contents from the package, it is necessary to cut a portion of the package to open it. To cut the package in this way, an opening guide line such as a perforation is formed in the film constituting the package. Meanwhile, transparent films that do not use metal foil or the like have been used as laminated films in recent years. It has been difficult to achieve both easy tearing by hand and barrier properties with such transparent laminated films.

[0005] Therefore, an object of the present invention is to provide a transparent laminate film that is easy to tear by hand and has good barrier properties, and a method for producing the laminate film. [Means for solving the problem]

[0006] [1] A laminate film according to one aspect of the present invention is a transparent laminate film comprising a film body having a base layer having a first side and a second side opposite the first side, a barrier layer laminated on the second side of the base layer, and a sealant layer laminated on the barrier layer on the opposite side to the base layer, wherein the film body has a break line formed in it for breaking the film body in a predetermined direction when viewed from the stacking direction of the base layer, the barrier layer, and the sealant layer, the break line having a scratched portion formed from the first side toward the sealant layer, the scratched portion on the first side having a width of 1.8 μm or more and 25.0 μm or less, the scratched portion on the barrier layer having a width of 0 μm or more and 20.0 μm or less, and the length of the scratched portion in the stacking direction being ⅓ or more of the length from the first side to the sealant layer and shorter than the length of the film body.

[0007] [2] In the laminated film described in [1] above, the depth of the scratched portion from the first surface may be shorter than the thickness of the base material layer.

[0008] [3] In the laminated film described in [1] above, the scratched portion may reach the barrier layer, and the width of the scratched portion in the barrier layer may be greater than 0 and equal to or less than 20.0 μm.

[0009] [4] In the laminated film described in any one of [1] to [3] above, the base layer may have a first base layer having the first surface, and a second base layer having the second surface and disposed between the first base layer and the barrier layer.

[0010] [5] The laminated film according to any one of the above [1] to [4], wherein the oxygen permeability is 1.00 cc / (m 2 ·day) or less is fine.

[0011] [6] A method for manufacturing a laminated film according to another aspect of the present invention is a method for manufacturing a transparent laminated film, the method comprising: forming a break line in a film body having a base layer having a first surface and a second surface opposite to the first surface, a barrier layer laminated on the second surface of the base layer, and a sealant layer laminated on the barrier layer on the opposite side to the base layer; forming a break line for breaking the film body in a predetermined direction; the break line being formed by scratching the film body from the first surface side using a scratching tool so as not to penetrate the sealant layer; and the scratched portion formed by the scratching is a portion of the film body that is formed by scratching the first surface. The width of the processed portion is 1.8 μm or more and 25.0 μm or less, the width of the scratched portion in the barrier layer is 0 μm or more and 20.0 μm or less, and the length of the scratched portion in the stacking direction of the base layer, the barrier layer, and the sealant layer is 1 / 3 or more of the length from the first surface to the sealant layer and shorter than the length of the film body, and the scratching tool has a base member, a blade whose end opposite to the cutting edge is fixed to the surface of the base member, and a metal spacer part that is fixed to the surface of the base member and that determines the penetration depth of the cutting edge into the film body.

[0012] [7] In the method for producing a laminated film described in [6] above, the depth of the scratched portion with respect to the first surface may be shorter than the thickness of the base material layer.

[0013] [8] In the method for producing a laminated film described in [6] above, the scratched portion may reach the barrier layer, and the width of the scratched portion in the barrier layer may be greater than 0 and less than or equal to 20.0 μm.

[0014] [9] Another example of the laminated film of the present invention includes a film body having a base layer having a first surface and a second surface opposite to the first surface, a barrier layer laminated on the second surface of the base layer, and a sealant layer 13 laminated on the barrier layer opposite to the base layer, wherein the film body has a break line formed therein for breaking the film body in a predetermined direction when viewed from the lamination direction of the base layer, the barrier layer, and the sealant layer, and the break line has a scratched portion formed by a scratching device from the first surface toward the sealant layer, The processing width of the scratch processing portion on the first surface is 1.8 μm or more and 25.0 μm or less, the processing width of the scratch processing portion on the barrier layer is 0 μm or more and 20.0 μm or less, the length of the scratch processing portion in the stacking direction is 1 / 3 or more of the length from the first surface to the sealant layer and shorter than the length of the film body, and the scratch processing tool has a base member, a blade whose end opposite to the cutting edge is fixed to the surface of the base member, and a metal spacer portion fixed to the surface of the base member for determining the penetration depth of the cutting edge into the film body. [Effects of the Invention]

[0015] According to the present invention, it is possible to provide a transparent laminate film that is easy to tear by hand and has good barrier properties, and a method for producing the laminate film. [Brief explanation of the drawings]

[0016] [Figure 1] FIG. 1 is a plan view of a laminated film according to one embodiment of the present invention. [Figure 2] FIG. 2 is a schematic diagram for explaining the cross-sectional configuration taken along line II-I in FIG. [Figure 3] FIG. 3 is a diagram for explaining the scratched portion. [Figure 4] FIG. 4 is a diagram for explaining the scratching tool. [Figure 5] FIG. 5 is a diagram for explaining depressions that occur during punching using a Thomson blade. [Figure 6]FIG. 6 is a diagram illustrating a laminated film according to the first modification. [Figure 7] FIG. 7 is a diagram illustrating a laminated film according to the second modification. [Figure 8] FIG. 8 is a diagram illustrating a laminated film according to the third modification. [Figure 9] FIG. 9 is a table showing the evaluation results of the laminated films of Examples 1 to 20. [Figure 10] FIG. 10 is a table showing the evaluation results of the laminated films of Examples 21 to 38. [Figure 11] FIG. 11 is a table showing the evaluation results of the laminated films of Examples 39 to 44. [Figure 12] FIG. 12 is a table showing the evaluation results of the laminated films of Comparative Examples 1 to 20. [Figure 13] FIG. 13 is a table showing the evaluation results of the laminated films of Comparative Examples 21 to 25. [Figure 14] FIG. 14 is a diagram showing a stick-shaped packaging bag used for evaluating hand tearability. DETAILED DESCRIPTION OF THE INVENTION

[0017] Hereinafter, embodiments of the present invention will be described with reference to the drawings. The same elements are designated by the same reference numerals. Duplicate explanations will be omitted. The dimensional proportions of the drawings do not necessarily correspond to those in the description.

[0018] Fig. 1 is a plan view of a laminated film according to one embodiment of the present invention, and Fig. 2 is a schematic view illustrating a cross-sectional configuration taken along line II-I in Fig. 1.

[0019] The laminate film 1 is a transparent film. The laminate film 1 has a film body 10 in which a substrate layer 11, a barrier layer 12, and a sealant layer 13 are laminated. The laminate film 1 functions, for example, as a barrier film as a whole. In one embodiment, the laminate film 1 is a member (film, sheet, etc.) for constituting a package such as a three-sided bag, a four-sided bag, a pillow-shaped bag, a stick-shaped bag, or a gusseted bag. An example of a three-sided bag or a four-sided bag is a pouch (including a stand-up pouch). The laminate film 1 may be a member for constituting a lid that seals a container (such as a cup). In this specification, the terms "layer," "membrane," "film," and "sheet" are used with the same or substantially the same meaning.

[0020] Two directions perpendicular to the lamination direction of the base layer 11, barrier layer 12, and sealant layer 13 of the film body 10 are referred to as the first direction D1 and the second direction D2. The first direction D1 and the second direction D2 are perpendicular to each other. The lamination direction is also referred to as the third direction D3. For example, one of the first direction D1 and the second direction corresponds to the machine direction (MD), and the other corresponds to the transverse direction (TD).

[0021] The base material layer 11 has a first surface 11a and a second surface 11b. The second surface 11b is the surface located opposite the first surface 11a. The base material layer 11 may be a single layer or may have multiple layers. FIG. 2 shows the configuration when the base material layer 11 is a single layer. Below, first, the configuration when the base material layer 11 is a single layer as shown in FIG. 2 will be described.

[0022] The base layer 11 is a transparent resin film (or resin sheet). Examples of materials for the base layer 11 include polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene (PE), polypropylene (PP), and nylon (NY). The thickness of the base layer 11 may be, for example, 9 μm or more and 40 μm or less.

[0023] The barrier layer 12 is laminated on the second surface 11b. The barrier layer 12 is, for example, a vapor-deposited film or a barrier coat layer. Examples of materials for the vapor-deposited film include aluminum, alumina, and silica. Examples of the barrier coat layer include a resin layer containing an inorganic filler and a layer made of a PVA binder. The thickness of the barrier layer 12 is, for example, 1 nm or more and 5 μm or less. The barrier layer 12 may be an adhesive having barrier properties. When the barrier layer 12 is a vapor-deposited layer, the thickness of the barrier layer 12 is, for example, 10 nm or more and 50 nm or less.

[0024] The sealant layer 13 is laminated on the barrier layer 12. The sealant layer 13 is disposed on the opposite side of the barrier layer 12 from the base material layer 11. Examples of materials for the sealant layer 13 include polyolefin resins, which are thermoplastic resins. The material for the sealant layer 13 may be polyethylene (PE). Low-density polyethylene (LDPE), medium-density polyethylene (MDPE), and linear low-density polyethylene (LLDPE) can be used as the material for the sealant layer 13.

[0025] Ethylene-based resins such as ethylene-vinyl acetate copolymer (EVA), ethylene-α-olefin copolymer, and ethylene-methacrylic acid resin copolymer, blend resin of polyethylene and polybutene, polypropylene-based resins such as homopolypropylene resin (PP), propylene-ethylene random copolymer, propylene-ethylene block copolymer, and propylene-α-olefin copolymer can also be used as materials for the sealant layer 13.

[0026] The thickness of the sealant layer 13 is, for example, 30 μm or more and 80 μm or less, and more preferably 40 μm or more and 60 μm or less.

[0027] The film body 10 can be manufactured, for example, as follows. First, the barrier layer 12 is formed on the second surface 11b of the base layer 11. If the barrier layer 12 is a vapor-deposited film, a vapor-deposited film can be formed on the base layer 11 by vacuum deposition or the like. If the barrier layer 12 is a barrier coat layer, the barrier coat layer can be formed on the second surface 11b by a blade coater or the like. Then, the sealant layer 13 is laminated on the barrier layer 12, thereby obtaining the film body 10. The sealant layer 13 can be laminated on the barrier layer 12 by film lamination, extrusion processing, coating, or the like.

[0028] A transparent vapor-deposited film may be used for the laminate (laminate structure) of the base layer 11 and the barrier layer 12. Examples of transparent vapor-deposited films include transparent vapor-deposited PET film and transparent vapor-deposited OPP film. An example of a transparent vapor-deposited PET film is GL-PET manufactured by TOPPAN Corporation. An example of a transparent vapor-deposited OPP film is GL-OPP manufactured by TOPPAN Corporation.

[0029] The laminated film 1 has a fracture line 14 for fracture of the laminated film 1 (film body 10) along the first direction D1 (predetermined direction). The fracture line 14 may be a perforation (perforation line) as shown in FIG. 1. The perforated fracture line 14 shown in FIG. 1 has a plurality of scratched portions 141 on an imaginary line VL along the first direction D1. The plurality of scratched portions 141 are formed discretely on the imaginary line VL. The fracture line 14 may be a continuous line when viewed from the first surface 11a side.

[0030] The scratched portion 141 is a scratch that does not penetrate the laminated film 1, and is formed from the first surface 11a toward the sealant layer 13. The scratched portion 141 may be a half-cut line in the laminated film 1. The scratched portion 141 will be described with reference to FIG. 3. FIG. 3 is a diagram for explaining the scratched portion. FIG. 3 is an enlarged schematic diagram of area A in FIG. 2.

[0031] The scratched portion 141 satisfies the following conditions 1, 2, and 3. (Condition 1) The width X of the scratched portion 141 on the first surface 11a (hereinafter referred to as "processed width X") is 1.8 μm or more and 25.0 μm or less. (Condition 2) The width Y of the scratched portion 141 in the barrier layer 12 (hereinafter referred to as "processed width Y") is not less than 0 μm and not more than 20.0 μm. (Condition 3) The depth of the scratched portion 141 (hereinafter referred to as "processing depth Z") is at least one-third the distance L1 from the first surface 11a to the sealant layer 13 and is shorter than the thickness L2 of the laminated film 1.

[0032] The processing width X in condition 1 is the width of the opening 141a of the scratch processing portion 141. The opening 141a corresponds to the end (the end at the position of the first surface 11a) opposite the tip 141b of the scratch processing portion 141. The processing width X may be 2.0 μm or more and 20.0 μm or less.

[0033] The processing width Y under condition 2 may be 0.0 μm or more and 15.0 μm or less. A processing width Y of 0 μm under condition 2 means that the scratch processing portion 141 does not reach the barrier layer 12, that is, no scratches are formed in the barrier layer 12. When the processing width Y is greater than 0, the processing width Y is the width of the scratches formed in the barrier layer 12 at a position closest to the sealant layer 13. When scratches are present in the barrier layer 12, the processing width Y may be, for example, greater than 0 and 20.0 μm or less, or greater than 0 and 15.0 μm or less.

[0034] The distance L1 in Condition 3 corresponds to the total thickness of the layers in the laminate film 1 located between the first surface 11a and the sealant layer 13. The distance L1 is the thickness of the film body 10 excluding the sealant layer 13. The ratio (Z / L1) may be 1 / 2 or more.

[0035] When the tip 141b of the scratched portion 141 is located within the sealant layer 13, the penetration depth into the sealant layer 13 may be ½ or less, or even ⅓ or less, of the thickness of the sealant layer 13. If the scratched portion 141 penetrates the sealant layer 13 to a large extent, the scratches on the barrier layer 12 will also be large. Therefore, from the viewpoint of ensuring better barrier properties, it is preferable that the position of the tip 141b of the scratched portion 141 be located closer to the first surface 11a than near the boundary between the barrier layer 12 and the sealant layer 13.

[0036] The oxygen permeability of the laminated film 1 is 1.0 cc / (m 2 ·day) or less. The oxygen permeability of the laminated film 1 is 0.5 cc / (m 2 It is preferable that the time is 100-2000 s.p.m. or less.

[0037] The oxygen permeability may be measured in accordance with JIS K7126-2. The oxygen permeability may be measured as follows in accordance with JIS K7126-2. The oxygen permeability may be measured by an oxygen permeability measuring device (product name "OX-TRAN2 / 20", manufactured by Modern Control).

[0038] (Example of oxygen permeability measurement method) (a) A measurement sample is prepared by forming a break line 14 along the first direction D1 in a film body having the same layer structure as the film body 10 of the laminated film 1. In the measurement sample, the break line 14 is 50 cm 2 The fracture line 14 is formed within the measurement area. The fracture line 14 is a perforation with multiple scratched portions 141 arranged at equal intervals. The length of each scratched portion 141 on the fracture line 14 formed on the measurement sample is 1 mm, and the length between adjacent scratched portions 141 (the length of the connecting portion) is 0.5 mm. In other words, if a scratched portion 141 with a length of 1 mm and a non-scratched portion with a length of 0.5 mm (corresponding to the connecting portion) is used as a repeating unit, the perforated fracture line 14 is formed by repeating them along the first direction D1. The total length of the perforated fracture line 14 is 60 mm. (b) In the measurement sample, the oxygen permeability of the measurement area where the break line 14, which is the perforation, is formed is measured, for example, using an oxygen permeability measuring device (product name "OX-TRAN2 / 20", manufactured by Modern Control).

[0039] In the embodiment where the oxygen permeability is measured by the measurement method exemplified above, the oxygen permeability is within the above range (1.0 cc / (m 2 ·day) or less, preferably 0.5cc / (m 2 The range obtained by dividing the above (50 cm ·day) by 60 mm may be defined as the oxygen permeability per unit length (1 mm). 2 The shape of the break line formed in the measurement area when viewed from the first surface 11a side may be arbitrary. 2 The oxygen permeability obtained for the measurement area is divided by the total length of the break line formed in the measurement area (total length of the break line along the break line), and the resulting value is used as the oxygen permeability per unit length (1 mm).

[0040] The method for producing the laminated film 1 includes a break line forming step of forming break lines 14 in the film body 10. In the break line forming step, break lines 14 are formed by scratching the film body 10 from the first surface 11a side so as to satisfy conditions 1 to 3.

[0041] The scratching can be performed using a scratching tool 20 shown in FIG. 4. FIG. 4 is a diagram for explaining the scratching tool 20. The scratching tool 20 has a base member 21. The base member 21 may be a wooden plate member. The base member 21 may be, for example, a wooden plate member used in a Thomson mold (or a Vik type). The base member 21 may also be a metal plate member. A blade 22 and a spacer portion 23 are attached to a surface 21a of the base member 21.

[0042] The blade 22 is fixed to the base member 21 by having the end opposite to the cutting edge 22a fixed to the surface 21a. The blade 22 has a tapered portion 221 that narrows toward the cutting edge 22a.

[0043] The spacer portion 23 is a metal member. The spacer portion 23 may be a metal block. The spacer portion 23 functions as a stopper that stops the blade 22 from penetrating the film body 10 a certain distance. The spacer portion 23 has an end face 23a located opposite the base member 21. The end face 23a is the face that comes into contact with the first surface 11a when scratching the film body 10. The length between the surface 21a and the end face 23a is shorter than the length between the surface 21a and the cutting edge 22a. In FIG. 4, two spacers 23 are arranged to sandwich the blade 22, but the number of spacers 23 may be one. The spacer portion 23 may surround the blade 22.

[0044] In the above configuration, when the scratching tool 20 is viewed from the side (as viewed from the direction of arrow α in FIG. 4), part or all of the tapered portion 221 protrudes from the spacer portion 23. This protruding portion 221a is the portion that penetrates into the film body 10. Therefore, the width of the scratching portion 141 is determined by the thickness of the protruding portion 221a, and the processing depth Z of the scratching portion 141 is essentially determined by the length between the cutting edge 22a and the end face 23a in the thickness direction of the base member 21 (hereinafter referred to as the "protrusion amount d"). Therefore, the shape of the protruding portion 221a and the length of the spacer portion 23 are set to satisfy conditions 1, 2, and 3.

[0045] When the cutting edge 22a penetrates beyond the barrier layer 12 into the sealant layer 13, the processing depth Z of the scratch processing portion 141 tends to be smaller than the protrusion amount d due to the cushioning effect of the sealant layer 13. Figure 2 shows a case where the cushioning effect of the sealant layer 13 causes the tip 141b of the scratch processing portion 141 to move back slightly toward the first surface 11a, resulting in the processing depth Z being shorter than the protrusion amount d.

[0046] In the break line forming step, the scratch processing tool 20 is pressed against the film body 10 so that the end surface 23a contacts the first surface 11a, thereby forming the scratch processing portion 141 in the film body 10. For example, while the film body 10 is transported along the first direction D1, the scratch processing tool 20 is repeatedly pressed against the film body 10 and moved away from the film body 10 at appropriate times, thereby forming the break line 14 in a perforated pattern.

[0047] The laminated film 1 can be manufactured using a scratching tool 20. The scratching tool 20 can regulate the penetration amount of the tapered portion 221 of the blade 22 into the film body 10 using the spacer portion 23, making it possible to perform highly precise scratching. In particular, by using a blade 22 with a thin portion near the cutting edge 22a, more precise scratching is possible. Furthermore, because the penetration amount of the tapered portion 221 into the film body 10 can be regulated, it is possible to perform half cuts on thin resin films, for example, those having a thickness of 12 μm or less.

[0048] Possible methods for scratching a film include laser processing using CO2 laser light and physical scratch processing using a Thomson die. However, when using CO2 laser light, the width of the scratched area depends on the area irradiated with the laser light. In this case, it is difficult to achieve high-precision processing that satisfies conditions 1 and 2. Furthermore, when scratching the first surface 11a using CO2 laser light, the area around the scratched area rises due to the effects of heat, leaving raised marks on the surface of the film to be scratched. Scratch processing using a Thomson die is a punching process using a Thomson blade. This technique is difficult to achieve high-precision processing that satisfies conditions 1 and 2, and cannot achieve half-cutting. Furthermore, when scratching using a Thomson blade, a thick Thomson blade is pressed into the resin film to be scratched and punched to create the scratch. In this case, a depression is formed on the surface of the resin film where the scratched area is formed. The depression is explained using Figure 5. Figure 5 is a schematic diagram for explaining the depression.

[0049] FIG. 5 shows a case where a scratched portion 31 is formed on a resin film 30 by punching from the surface 30a side of the resin film 30 using a Thomson blade. When the scratched portion 31 is formed by punching using a Thomson blade as described above, a depression 32 is formed on the surface 30a, as shown in FIG. 5. The depression 32 is a portion where the surface 30a of the resin film 30 is deformed and smoothed as the blade penetrates the resin film 30 when the blade is pressed into the resin film 30, and is also known as a "sag" or "indentation mark." The depression 32 also smoothly connects the inner surface 31a of the scratched portion 31 to the surface 30a. The inner surface 31a is a linear portion formed along the outer surface of the blade in the scratched portion 31.

[0050] When the scratch processing tool 20 is used, as described above, highly precise scratch processing is possible while regulating the penetration amount of the blade 22. Therefore, in the manufacturing method of the laminated film 1 using the scratch processing tool 20, it is possible to obtain the scratch processing part 141 that satisfies conditions 1 to 3. In other words, the scratch processing tool 20 is capable of highly precise scratch processing. Therefore, the scratch processing tool 20 is sometimes referred to as a "high-precision scratch processing tool."

[0051] When using the scratching tool 20, no raised marks due to the effects of heat are produced, as occurs with CO2 laser light. Furthermore, because the portion of the blade 22 near the cutting edge 22a can penetrate into the film body 10, the depression 32 shown in FIG. 5 is not produced. That is, the vicinity of the opening 141a of the scratching portion 141 on the first surface 11a of the laminate film 1 is flat. For example, when a strip-shaped laminate film 1 is manufactured by forming a break line 14 while transporting the strip-shaped film body 10, and the manufactured laminate film 1 is then wound into a roll, the laminate film 1 is less likely to wrinkle or be damaged. Furthermore, because the first surface 11a is flat, it is easy to print on the first surface 11a, and the aesthetic appeal of the printed pattern (including pictures, text, etc.) can be enhanced.

[0052] The absence of the depression 32 means that the first surface 11a is substantially directly connected to the inner surface 141c of the scratching portion 141 at the periphery of the opening 141a of the scratching portion 141. Therefore, the periphery of the opening 141a has, for example, a cliff-like shape. The inner surface 141c means a linear portion corresponding to the outer surface of the tapered portion 221 of the blade 22 in the cross section shown in FIG. 3. The phrase "substantially directly connected" means that a slight curved portion is acceptable when the periphery of the opening 141a is observed at a very microscopic level.

[0053] If the curved portion exists, for example, if the distance between the intersection of the virtual extension of the linear inner surface 141c and the virtual extension of the first surface 11a and the intersection of the curved portion and the first surface 11a is 1 μm or less, it can be considered that there is no depression.

[0054] When the scratch processing device 20 is used to form the scratch processing portion 141, half cutting is possible. Therefore, as explained in the manufacturing method of the laminated film 1, after the film body 10 is manufactured, the scratch processing portion 141 can be formed on the film body 10. In this case, the scratch processing portion 141 can also be formed while the film body 10 is being transported, and the laminated film 1 can be manufactured efficiently.

[0055] When the laminated film 1 satisfies the condition 2, the barrier layer 12 is free from scratches, or even if the barrier layer 12 is scratched, damage to the barrier layer 12 can be suppressed. 2 ·day) or less, preferably 0.5cc / (m 2 ·day) or less can be achieved. That is, the laminate film 1 can ensure high barrier properties (specifically, oxygen barrier properties). Because the laminate film 1 satisfies condition 3, the laminate film 1 can be easily torn along the breaking line 14. That is, by satisfying conditions 1 to 3, the laminate film 1 achieves both barrier properties and ease of manual tearing.

[0056] As described above, the laminate film 1 can be easily torn by hand while maintaining its barrier properties. Therefore, the laminate film 1 can be suitably used for packaging that seals the contents and is opened by tearing the packaging bag when used. This is particularly effective for stick-type packaging bags, which are difficult to provide with an opening trigger such as a notch.

[0057] Films containing metal foil, such as aluminum foil, have been known as films used to make packaging (packaging bags). The metal foil is included in the film to stop laser processing in the depth direction when scratching using a CO2 laser, or to ensure barrier properties. However, from the perspective of reducing environmental impact, there is a demand for films that do not contain metal foil. Depending on the application of the packaging, a transparent film that does not contain metal foil may be required to check the consumption status of the contents.

[0058] The laminate film manufacturing method described in this embodiment can manufacture a transparent laminate film 1 while ensuring barrier properties. For example, the laminate film manufacturing method described in this embodiment can manufacture the laminate film 1 as a mono-material transparent film. Specifically, the film body 10 may be a mono-material film. In a manufacturing method using a scratch processing device 20, scratch processing portions 141 that satisfy conditions 1 to 3 can be easily formed even in such a mono-material film body 10. For example, the laminate film 1 can also be a film made entirely of olefin-based resin. When the laminate film 1 is a mono-material film, it contributes to reducing the environmental impact.

[0059] The removal of aluminum foil is particularly desired for medical gusset bags, PTP (press through pack) packaging, etc. Therefore, the laminated film 1 and the method for manufacturing the laminated film are effective for packaging that requires the removal of aluminum foil, such as medical gusset bags, PTP (press through pack) packaging, etc.

[0060] Since the laminated film 1 is a transparent film, in a package constructed using the laminated film 1, the consumption state of the contents can be visually confirmed.

[0061] (Variation 1) 6 is a diagram illustrating a laminated film 1A according to Modification 1. The laminated film 1A differs from the laminated film 1 in that the scratched portion 141 does not reach the barrier layer 12. The laminated film 1A is a film that satisfies conditions 1 to 3. In the laminated film 1A, the processing width Y in condition 2 is 0.

[0062] The structure of laminate film 1A is the same as that of laminate film 1, except that scratched portion 141 does not reach barrier layer 12, and laminate film 1A can be manufactured in the same manner as laminate film 1. Therefore, laminate film 1A and the manufacturing method for laminate film 1A have the same effects as laminate film 1 and the manufacturing method for laminate film 1. In laminate film 1A, barrier layer 12 does not have scratches. Therefore, the barrier properties are improved compared to when barrier layer 12 has scratches.

[0063] (Variation 2) FIG. 7 is a diagram illustrating a laminated film 1B according to Modification 2. The configuration of laminated film 1B differs from that of laminated film 1 in that base layer 11 has first base layer 11A and second base layer 11B. First base layer 11A and second base layer 11B are laminated. First base layer 11A is a layer having a first surface 11a. Second base layer 11B is located between first base layer 11A and barrier layer 12 and is a layer having a second surface 11b.

[0064] The materials of the first base material layer 11A and the second base material layer 11B may be the same as the examples given in the description of the base material layer 11. The materials of the first base material layer 11A and the second base material layer 11B may be the same or different.

[0065] The barrier layer 12 is laminated on the second base layer 11 B. The method for forming the barrier layer 12 may be the same as that for forming the barrier layer 12 on the base layer 11 .

[0066] In the layer configuration shown in FIG. 7, the distance L1 of Condition 3 is the distance from the first surface 11a, which is the surface of the first base material layer 11A, to the sealant layer 13.

[0067] The laminated film 1B is produced, for example, as follows. First, the barrier layer 12 is laminated on the second base material layer 11B. Then, the first base material layer 11A is laminated on the side of the second base material layer 11B opposite the barrier layer 12, and the sealant layer 13 is laminated on the barrier layer 12. This results in the film main body 10B. Next, a fracture line forming step is performed on the film main body 10B to obtain the laminated film 1B. A transparent vapor-deposited film may be used for the laminate (laminate structure) of the second base material layer 11B and the barrier layer 12. Examples of transparent vapor-deposited films include the transparent vapor-deposited PET film and transparent vapor-deposited OPP film described above.

[0068] The configuration of laminate film 1B is the same as that of laminate film 1, except that base layer 11 has a two-layer structure, and laminate film 1B is a film that satisfies conditions 1 to 3. Therefore, laminate film 1B has the same effects as laminate film 1. The fracture line forming step in the manufacturing method of laminate film 1B is the same as the fracture line forming step described in the manufacturing method of laminate film 1. Therefore, the manufacturing method of laminate film 1B has the same effects as the manufacturing method of laminate film 1.

[0069] (Variation 3) 8 is a diagram illustrating a laminated film 1C according to Modification 3. The laminated film 1C differs from the laminated film 1B in that the scratched portion 141 does not reach the barrier layer 12. The laminated film 1C is a film that satisfies conditions 1 to 3. In the laminated film 1C, the processing width Y under condition 2 is 0, as in Modification 1.

[0070] The structure of laminate film 1C is the same as that of laminate film 1B, except that scratched portion 141 does not reach barrier layer 12, and it can be manufactured in the same manner as laminate film 1B (or laminate film 1). Therefore, laminate film 1C and the manufacturing method of laminate film 1C have the same effects as laminate film 1B and the manufacturing method of laminate film 1B. In laminate film 1C, barrier layer 12 does not have scratches. Therefore, the barrier properties are improved compared to when barrier layer 12 has scratches.

[0071] The laminate film and the method for manufacturing the laminate film according to the present invention have been described above. However, the present invention is not limited to the above-described embodiments, and is intended to include the scope of the claims, including equivalents and all modifications within the scope of the claims.

[0072] The breaking line may be, for example, a wavy line formed so as to be able to break the laminated film along a predetermined direction. In this case, the processing width X and processing width Y of the scratching portion may be the width of the scratching portion in a cross section perpendicular to the direction in which the breaking line extends.

[0073] The various embodiments exemplified above may be combined as appropriate without departing from the spirit of the present invention. [Example]

[0074] The present invention will be further described using examples. The present invention is not limited to the examples described below. Comparative examples for the examples will also be described below.

[0075] [Film body] As the film bodies, film body F1, film body F2, film body F3, film body F4, film body F5 and film body F6 were prepared.

[0076] (1) Film body F1 The film body F1 was a film having the following layer structure: The layer structure of the film body F1 corresponded to the layer structure shown in FIG. Transparent vapor-deposited PET film / PE film

[0077] In the description of the layer structure, the symbol " / " indicates the boundary of the layer structure. This also applies to the description of the layer structure of the film body F2 etc. described later.

[0078] (1a) The transparent vapor-deposited PET film was a film in which a vapor-deposited layer was formed on a 12 μm-thick PET film. The material of the vapor-deposited layer was silica. The transparent vapor-deposited PET film used was GL-PET manufactured by TOPPAN Corporation. Since the thickness of the vapor-deposited layer on the transparent vapor-deposited PET film is very thin compared to the thickness of the other layers, the thickness of the transparent vapor-deposited PET film will be explained as 12 μm unless otherwise specified.

[0079] (1b) The PET film of the transparent vapor-deposited PET film was a layer corresponding to the base layer 11, and the vapor-deposited layer was a layer corresponding to the barrier layer 12.

[0080] (1c) The thickness of the PE film was 50 μm. The PE film was a layer corresponding to the sealant layer 13. LC-5 manufactured by Tamapoly Corporation was used as the PE film.

[0081] (1d) In the film body F1, the distance L1 shown in FIG. 2 or FIG. 6 was 12 μm.

[0082] (2) Film body F2 Film body F2 was a film having the following layer structure: The layer structure of film body F2 corresponded to the layer structure shown in FIG. PET film / transparent vapor-deposited PET film / PE film

[0083] (2a) Film body F2 was a film in which a PET film was further laminated on the transparent vapor-deposited PET film of film body F1. Therefore, the configurations (including thicknesses) of the transparent vapor-deposited PET film and PE film were the same as those of film body F1. (2b) The thickness of the PET film laminated on the transparent vapor-deposited PET film was 12 μm. The PET film used was E5100 manufactured by Toyobo Co., Ltd.

[0084] (2c) In the layer structure of the film body F2, the PET film was the layer corresponding to the first base material layer 11A, and the PET film of the transparent vapor-deposited PET film was the layer corresponding to the second base material layer 11B. The vapor-deposited layer of the transparent vapor-deposited PET film was the layer corresponding to the barrier layer 12, and the PE film was the layer corresponding to the sealant layer 13.

[0085] (2d) In the film body F2, the distance L1 shown in FIG. 7 or 8 was 24 μm.

[0086] (3) Film body F3 Film body F3 was a film having the following layer structure: The layer structure of film body F3 corresponded to the layer structure shown in FIG. Transparent vapor-deposited OPP film / CPP film

[0087] (3a) The transparent vapor-deposited OPP film was a film in which a vapor-deposited layer was formed on a 20 μm-thick OPP film. The material of the vapor-deposited layer was aluminum. GL-OPP manufactured by TOPPAN Corporation was used as the transparent vapor-deposited OPP film. Because the thickness of the vapor-deposited layer on the transparent vapor-deposited OPP film is much thinner than the thickness of the other layers, the thickness of the transparent vapor-deposited OPP film will be described as 20 μm unless otherwise specified.

[0088] (3b) The OPP film of the transparent vapor-deposited OPP film was a layer corresponding to the base layer 11, and the vapor-deposited layer was a layer corresponding to the barrier layer 12.

[0089] (3c) The thickness of the CPP film was 50 μm. The CPP film was a layer corresponding to the sealant layer 13. P1128 manufactured by Toyobo Co., Ltd. was used as the CPP film.

[0090] (3d) In the film body F3, the distance L1 shown in FIG. 2 or FIG. 6 was 20 μm.

[0091] (4) Film body F4 Film body F4 was a film having the following layer structure: The layer structure of film body F4 corresponded to the layer structure shown in FIG. Transparent vapor-deposited OPP film / PE film

[0092] (4a) Film body F4 was a film in which a PE film was used instead of the CPP film in film body F3. Therefore, the structure (including thickness) of the transparent vapor-deposited OPP film was the same as that of film body F3. In film body F4, the OPP film in the transparent vapor-deposited OPP film also corresponded to the base layer 11, and the vapor-deposited layer corresponded to the barrier layer 12.

[0093] (4b) The PE film was a film having the same structure (including thickness) as the PE film in the film body F1. In the film body F4, the PE film was a layer corresponding to the sealant layer 13.

[0094] (4c) In the film body F4, the distance L1 shown in FIG. 2 was 20 μm.

[0095] (5) Film body F5 Film body F5 was a film having the following layer structure: The layer structure of film body F5 corresponded to the layer structure shown in FIG. OPP film / transparent vapor-deposited OPP film / PE film

[0096] (5a) Film body F5 was a film in which an OPP film was further laminated on the transparent vapor-deposited OPP film of film body F4. Therefore, the configurations (including thicknesses) of the transparent vapor-deposited OPP film and PE film were the same as those of film body F1.

[0097] (5b) The thickness of the OPP film laminated on the transparent vapor-deposited OPP film was 20 μm. The OPP film used was “2171” manufactured by Toyobo Co., Ltd.

[0098] (5c) In the layer structure of the film body F5, the OPP film was the layer corresponding to the first base material layer 11A, and the OPP film of the transparent vapor-deposited OPP film was the layer corresponding to the second base material layer 11B. The vapor-deposited layer of the transparent vapor-deposited OPP film was the layer corresponding to the barrier layer 12, and the PE film was the layer corresponding to the sealant layer 13.

[0099] (5c) In the film body F5, the distance L1 shown in FIG. 7 or FIG. 8 was 40 μm.

[0100] (6) Film body F6 Film body F6 was a film having the following layer structure: The layer structure of film body F6 corresponded to the layer structure shown in FIG. OPP film / transparent vapor-deposited OPP film / CCP film

[0101] (6a) Film body F6 was a film in which a CPP film was used instead of the PE film of film body F6. Therefore, the configurations (including thickness) of the OPP film and transparent vapor-deposited OPP film were the same as those of film body F5. In film body F6, the OPP film also corresponded to the first base layer 11A, and the OPP film of the transparent vapor-deposited OPP film corresponded to the second base layer 11B. The vapor-deposited layer of the transparent vapor-deposited OPP film corresponded to the barrier layer 12.

[0102] (6b) The CPP film was a layer corresponding to the sealant layer 13. The thickness of the CPP film of the film body F6 was 60 μm. P1128 manufactured by Toyobo Co., Ltd. was used as the CPP film.

[0103] (6c) In the film body F6, the distance L1 shown in FIG. 7 or 8 was 40 μm.

[0104] [Examples 1 to 13] In Examples 1 to 13, the laminated films were produced by forming a break line along the TD direction in the film body F1. The break line had a scratched portion.

[0105] To form the scratched portion, a scratch processing tool was used, which had a blade 22 and a metal spacer portion 23 on a base member 21, and was configured so that the blade tip 22a protruded from the end face 23a of the spacer portion 23 when viewed from the direction of arrow α in Fig. 4. In other words, a high-precision scratch processing tool was used.

[0106] In Examples 1 to 13, a blade 22 having a thin portion near the cutting edge 22a was used to satisfy Conditions 1, 2, and 3, and scratched portions with different processing widths X, Y, and processing depths Z were formed by adjusting the protrusion amount d shown in Fig. 4 (i.e., adjusting the processing depth Z). Specifically, scratched portions were formed so that the processing depth Z became deeper from Example 1 to Example 14.

[0107] [Examples 14 to 20] In Examples 14 to 20, the laminated films were produced by forming a break line along the TD direction in the film main body F2. The break line had a scratched portion.

[0108] A high-precision scratch processing tool was used to form the scratch processing parts. In forming the scratch processing parts, a blade 22 having a thin portion near the cutting edge 22a was used to satisfy conditions 1, 2, and 3, and scratch processing parts with different processing widths X, Y, and processing depths Z were formed by adjusting the protrusion amount d shown in Figure 4 (i.e., adjusting the processing depth Z). Specifically, scratch processing parts were formed so that the processing depth Z became deeper from Example 14 to Example 20.

[0109] [Examples 21 to 26] In Examples 21 to 26, the laminated films were produced by forming a break line along the TD direction in the film main body F3. The break line had a scratched portion.

[0110] A high-precision scratch processing tool was used to form the scratch processing parts. In forming the scratch processing parts, a blade 22 having a thin portion near the cutting edge 22a was used to satisfy conditions 1, 2, and 3, and scratch processing parts with different processing widths X, Y, and processing depths Z were formed by adjusting the protrusion amount d shown in Figure 4 (i.e., adjusting the processing depth Z). Specifically, the scratch processing parts were formed so that the processing depth Z became deeper from Example 21 to Example 26.

[0111] [Examples 27 to 32] In Examples 27 to 32, the laminated films were produced by forming a break line along the TD direction in the film main body F4, and the break line had a scratched portion.

[0112] A high-precision scratch processing tool was used to form the scratch processing parts. In forming the scratch processing parts, a blade 22 having a thin portion near the cutting edge 22a was used to satisfy conditions 1, 2, and 3, and scratch processing parts with different processing widths X, Y, and processing depths Z were formed by adjusting the protrusion amount d shown in Figure 4 (i.e., adjusting the processing depth Z). Specifically, scratch processing parts were formed so that the processing depth Z became deeper from Example 27 to Example 32.

[0113] [Examples 33 to 38] In Examples 33 to 38, laminated films were produced by forming a break line along the TD direction in the film body F5. The break line had a scratched portion.

[0114] A high-precision scratch processing tool was used to form the scratch processing parts. To form the scratch processing parts, a blade 22 with a thin edge 22a was used to satisfy conditions 1, 2, and 3, and scratch processing parts with different processing widths X, Y, and Z were formed by adjusting the protrusion amount d shown in FIG. 4 (i.e., adjusting the processing depth Z). Specifically, scratch processing parts were formed so that the processing depth Z became deeper from Example 33 to Example 38.

[0115] [Examples 39 to 44] In Examples 39 to 44, laminated films were produced by forming a break line along the TD direction in the film body F6. The break line had a scratched portion.

[0116] A high-precision scratch processing tool was used to form the scratch processing parts. In forming the scratch processing parts, a blade 22 having a thin portion near the cutting edge 22a was used to satisfy conditions 1, 2, and 3, and scratch processing parts with different processing widths X, Y, and processing depths Z were formed by adjusting the protrusion amount d shown in Figure 4 (i.e., adjusting the processing depth Z). Specifically, the scratch processing parts were formed so that the processing depth Z became deeper from Example 39 to Example 44.

[0117] [Comparative Examples 1 to 6] In Comparative Examples 1 to 6, no break lines were formed, and the film bodies F1 to F6 themselves were used as laminated films. In Comparative Example 1, the film body F1 was used as a laminated film. In Comparative Example 2, the film body F2 was used as a laminated film. In Comparative Example 3, the film body F3 was used as a laminated film. In Comparative Example 4, the film body F4 was used as a laminated film. In Comparative Example 5, the film body F5 was used as the laminated film. In Comparative Example 6, the film body F6 was used as the laminated film.

[0118] Comparative Example 7 In Comparative Example 7, a laminated film was produced by forming a fracture line in the film body F1 in the same manner as in Examples 1 to 13 using the film body F1, except that the scratched portion did not satisfy condition 3. Specifically, the processing depth Z was set to be shallower than the lower limit of condition 3 to form the scratched portion.

[0119] [Comparative Example 8] In Comparative Example 8, a laminated film was produced by forming a fracture line in the film body F2 in the same manner as in Examples 14 to 20 using the film body F2, except that the scratched portion did not satisfy condition 3. Specifically, the processing depth Z was set to be shallower than the lower limit of condition 3 to form the scratched portion.

[0120] Comparative Example 9 In Comparative Example 9, a laminated film was produced by forming a fracture line in the film body F3 in the same manner as in Examples 21 to 26 using the film body F3, except that the scratched portion did not satisfy condition 3. Specifically, the processing depth Z was set to be shallower than the lower limit of condition 3 to form the scratched portion.

[0121] [Comparative Example 10] In Comparative Example 10, a laminated film was produced by forming a fracture line in film body F4 in the same manner as in Examples 27 to 32 using film body F4, except that the scratched portion did not satisfy condition 3. Specifically, the processing depth Z was set to be shallower than the lower limit of condition 3 to form the scratched portion.

[0122] [Comparative Example 11] In Comparative Example 11, a laminated film was produced by forming a fracture line in film body F5 in the same manner as in Examples 33 to 38 using film body F5, except that the scratched portion did not satisfy condition 3. Specifically, the processing depth Z was set to be shallower than the lower limit of condition 3 to form the scratched portion.

[0123] [Comparative Example 12] In Comparative Example 12, a laminated film was produced by forming a fracture line in film body F6 in the same manner as in Examples 39 to 44 using film body F6, except that the scratched portion did not satisfy condition 3. Specifically, the processing depth Z was set to be shallower than the lower limit of condition 3 to form the scratched portion.

[0124] [Comparative Examples 13 to 16] In Comparative Examples 13 to 16, the laminated films were produced by forming a fracture line along the TD direction in the film body F2 using laser processing technology. The fracture line had a scratched portion.

[0125] In Comparative Examples 13 to 16, the scratched portions were formed by irradiating the CO2 laser beam onto the film body F2 from the surface of the PET film (the surface opposite the transparent vapor-deposited PET film). Since the PE film, which is an olefin-based film, does not react to CO2 laser beam, the processing depth Z in Comparative Examples 13 to 16 was 24.0 μm. In Comparative Examples 13 to 16, the laser irradiation conditions were the same except for the change in laser output. Specifically, the laser output was reduced from Comparative Example 13 to Comparative Example 16.

[0126] [Comparative Examples 17 to 20] In Comparative Examples 17 to 20, laminated films were produced by forming fracture lines using laser processing technology in the same manner as in Comparative Examples 13 to 16, except that the film body F1 was used instead of the film body F2.

[0127] In Comparative Examples 17 to 20, a CO2 laser beam was incident on the surface of the transparent vapor-deposited PET film (the surface opposite the PE film) to form scratched sections in the film body F1. For the same reasons as in Comparative Examples 13 to 16, the processing depth Z in Comparative Examples 17 to 20 was 24.0 μm. In Comparative Examples 17 to 20, the laser irradiation conditions were the same except that the laser output was changed. Specifically, the laser output was reduced from Comparative Example 17 to Comparative Example 20.

[0128] [Comparative Example 21] In Comparative Example 21, a transparent vapor-deposited PET film identical to the transparent vapor-deposited PET film in the film body F1 was prepared. A break line was formed in the TD direction of the prepared transparent vapor-deposited PET film. The break line had a scratched portion.

[0129] The scratched portion was formed as a perforation that penetrated the transparent vapor-deposited PET film by pressing a scratching tool (hereinafter referred to as a "Thomson-type scratching tool") with a Thomson blade fixed to a wooden base member against the transparent vapor-deposited PET film.

[0130] The laminated film of Comparative Example 21 was obtained by laminating the same PE film as the PE film in the film body F1 onto the vapor deposition layer (corresponding to barrier layer 12) of the transparent vapor deposition PET film on which the fracture line having the above-mentioned scratch processing portion was formed.

[0131] The layer structure of the laminate film of Comparative Example 21 was the same as that of the film body F1. In the laminate film of Comparative Example 21, as described above, a scratching portion penetrating the transparent vapor-deposited PET film was formed in advance, and therefore the scratching depth Z of the laminate film of Comparative Example 21 was the thickness of the transparent vapor-deposited PET film, which was substantially 12 μm.

[0132] [Comparative Example 22] In Comparative Example 22, a transparent vapor-deposited PET film having a break line (in other words, having a scratched portion) was prepared. The configuration of the break line and the configuration of the transparent vapor-deposited PET film were the same as those in Comparative Example 21. The prepared transparent vapor-deposited PET film was used to realize the layer configuration of film body F2, thereby producing the laminate film of Comparative Example 22. Therefore, the layer configuration of the laminate film of Comparative Example 22 was the same as that of film body F2.

[0133] In the laminated film of Comparative Example 22, in the layer structure of the film body F2, a perforated scratched portion was formed in the transparent vapor-deposited PET film arranged between the PET film (first base layer) and the PE film (sealant layer). In Comparative Example 22, the length of the scratched portion formed in the transparent vapor-deposited PET film is referred to as the scratched depth Z. Since the scratched portion penetrated the transparent vapor-deposited PET film, the scratched depth Z was the length of the perforated scratched portion in the transparent vapor-deposited PET film, and was substantially 12 μm.

[0134] [Comparative Example 23] In Comparative Example 23, a transparent vapor-deposited PET film having a break line (in other words, having a scratched portion) was prepared in the same manner as in Comparative Example 21. The configuration of the break line and the configuration of the transparent vapor-deposited PET film were the same as in Comparative Example 21. A 15 μm-thick nylon (NY) film and a 50 μm-thick PE film were laminated on the vapor-deposited layer (corresponding to barrier layer 12) of the prepared transparent vapor-deposited PET film to obtain the laminated film of Comparative Example 23. ONMB manufactured by Unitika Ltd. was used as the NY film. The PE film was the same as the PE film in the film body F1.

[0135] The layer structure of the laminated film of Comparative Example 23 was as follows. Transparent vapor-deposited PET film / NY film / PE film

[0136] For ease of explanation, a film having the above layer structure but without scratch processing is referred to as "film body F7." In this case, the laminated film of Comparative Example 23 is a film in which scratch processing portions penetrating the transparent vapor-deposited PET film of film body F7 are formed in the transparent vapor-deposited PET film.

[0137] 2, 6, 7, and 8 corresponds to the distance from the surface of the transparent vapor-deposited PET film (the side opposite the NY film) to the PE film, and is 27 μm. In the film body F7, the distance from the surface of the transparent vapor-deposited PET film to the PE film is also referred to as distance L1.

[0138] In the laminated film of Comparative Example 23, as in Comparative Example 21, a scratch-processed portion penetrating the transparent vapor-deposited PET film was formed in advance, and therefore the processing depth Z of the scratch-processed portion in the laminated film of Comparative Example 23 was the thickness of the transparent vapor-deposited PET film, which was essentially 12 μm.

[0139] [Comparative Example 24] In Comparative Example 24, a transparent vapor-deposited PET film having a break line (in other words, having a scratched portion) was prepared in the same manner as in Comparative Example 21. The configuration of the break line and the configuration of the transparent vapor-deposited PET film were the same as in Comparative Example 21. A 15 μm-thick NY film and a 100 μm-thick CPP film were laminated on the vapor-deposited layer (corresponding to barrier layer 12) of the prepared transparent vapor-deposited PET film to obtain the laminated film of Comparative Example 24. The NY film was the same as the NY film used in Comparative Example 23. ZK207 manufactured by Toray Industries, Inc. was used as the CPP film.

[0140] The layer structure of the laminated film of Comparative Example 24 was as follows. Transparent vapor-deposited PET film / NY film / CPP film

[0141] For ease of explanation, a film having the above layer structure but without scratch processing is referred to as film body F8. In this case, the laminated film of Comparative Example 24 is a film in which scratch processing portions penetrating the transparent vapor-deposited PET film of film body F8 are formed in the transparent vapor-deposited PET film.

[0142] 2, 6, 7, and 8, corresponds to the distance from the surface of the transparent vapor-deposited PET film (the side opposite the NY film) to the CPP film, and was 27 μm. In the film body F8, the distance from the surface of the transparent vapor-deposited PET film to the CPP film is also referred to as distance L1.

[0143] In the laminate film of Comparative Example 24, scratching portions penetrating the transparent vapor-deposited PET film were formed in advance, as in Comparative Example 21. Therefore, the scratching depth Z of the laminate film of Comparative Example 24 was the thickness of the transparent vapor-deposited PET film, which was substantially 12 μm.

[0144] [Comparative Example 25] In Comparative Example 25, a laminated film of Comparative Example 25 was obtained in the same manner as in Comparative Example 22, except that a Thomson blade was used such that the processing width X was narrower than in Comparative Example 21.

[0145] Therefore, the layer structure of the laminate film of Comparative Example 25 was the same as the layer structure of the laminate film of Comparative Example 22 (i.e., the same as the film main body F2). In the laminate film of Comparative Example 25, a scratched portion penetrating the transparent vapor-deposited PET film was formed in advance, as in Comparative Example 22. Therefore, the processing depth Z of the scratched portion in the laminate film of Comparative Example 25 was substantially 12 μm, as in Comparative Example 22.

[0146] [Laminated film evaluation] (1) Cross-sectional evaluation Each of the laminated films of Examples 1 to 44 and Comparative Examples 7 to 25 was cut perpendicular to the TD direction at the position where the scratched portion was formed, and the cross section of each laminated film was observed.

[0147] By the above-mentioned cross-sectional observation, the processed width X, processed width Y, and processed depth Z of the scratched portion formed in each of the laminated films of Examples 1 to 44 and Comparative Examples 7 to 25 were measured, and the presence or absence of raised marks and depressed marks near the opening of the scratched portion of each laminated film was observed. The laminated films of Comparative Examples 1 to 6 did not have scratched portions (fracture lines), so cross-sectional observation was not performed.

[0148] The measurement results of the processing width X, processing width Y, and processing depth Z of the scratched portion in each of the laminated films of Examples 1 to 20, as well as the evaluation results of the presence or absence of raised marks and depressed marks near the openings of the scratched portions, were as shown in the table in Figure 9.

[0149] The measurement results of the processing width X, processing width Y, and processing depth Z of the scratch processing part in each laminate film of Examples 21 to 38, as well as the evaluation results of the presence or absence of protrusions and depressions on the surface near the opening of the scratch processing part, were as shown in the table in Figure 10.

[0150] The measurement results of the processing width X, processing width Y, and processing depth Z of the scratch processing part in each laminate film of Examples 39 to 44, as well as the evaluation results of the presence or absence of protrusions and depressions on the surface near the opening of the scratch processing part, were as shown in the table in Figure 11.

[0151] The measurement results of the processing width X, processing width Y, and processing depth Z of the scratched portion in each of the laminated films of Comparative Examples 7 to 20, as well as the evaluation results of the presence or absence of protrusions and depressions on the surface near the opening of the scratched portion, were as shown in the table in Figure 12.

[0152] The measurement results of the processing width X, processing width Y, and processing depth Z of the scratched portion in each of the laminated films of Comparative Examples 21 to 25, as well as the evaluation results of the presence or absence of protrusions and depressions on the surface near the opening of the scratched portion, were as shown in the table in Figure 13.

[0153] In the charts of Figures 9 to 13, the "Cutting type" column indicates the processing method used to form the scratched portion. In the charts of Figures 9 to 13, "High definition" indicates that the scratched portion was formed using a "high definition scratch processing tool," "Thomson" indicates that the scratched portion was formed using a "Thomson scratch processing tool," and "Laser" indicates that the scratched portion was formed using "laser processing technology."

[0154] In the diagrams of FIGS. 9 to 13, "width X," "width Y," and "depth Z" indicate "machining width X," "machining width Y," and "machining depth Z."

[0155] 12, when the laser processing technology was used, the processing width X was 46.8 μm or more, and the processing width Y was also 29.3 μm, so it was not possible to form a scratch-processed part that satisfied conditions 1 and 2. Furthermore, when the laser processing technology was used, a raised mark was present near the opening of the scratch-processed part.

[0156] From the results of Comparative Examples 21 to 25 shown in Fig. 13, when a Thomson-type flaw processing tool was used, the processing width X was 30 µm or more, and the processing width Y was also 21 µm, so it was not possible to form a flaw processing part that satisfied conditions 1 and 2. Furthermore, when a Thomson-type flaw processing tool was used, a depression was present near the opening of the flaw processing part.

[0157] From the results of Examples 1 to 44 shown in Figures 9 to 11 and Comparative Examples 8 to 12 shown in Figure 12, it can be seen that the processing width X and processing width Y shown in Conditions 1 and 2 can be achieved by using a high-precision scratch processing tool. Furthermore, it can be seen that the use of a high-precision scratch processing tool allows half cuts to be made in the film body. Furthermore, when a high-precision scratch processing tool was used, neither raised nor depressed marks were observed near the opening of the scratch processing area. In other words, it can be seen that the use of a high-precision scratch processing tool can prevent raised and depressed marks.

[0158] (2) Barrier property evaluation To evaluate the barrier properties, the oxygen permeability of each of the laminated films of Examples 1 to 44 and Comparative Examples 1 to 25 was measured in accordance with JIS K7126-2. The measurement method was as follows.

[0159] As a measurement sample for measuring oxygen permeability, laminated films of Examples 1 to 44 and Comparative Examples 1 to 25 were prepared. The laminated films of Examples 1 to 44 and Comparative Examples 7 to 25 prepared for the evaluation of barrier properties were each 50 cm 2 The measurement area had a measurement area of ​​50 cm, and a break line with a length of 60 mm was formed in the measurement area. The break line formed in the measurement area was a perforation with a plurality of scratched sections arranged at equal intervals. The length of each scratched section in the break line formed in the measurement sample was 1 mm, and the length between adjacent scratched sections (length of connecting section) was 0.5 mm. In other words, when a scratched section with a length of 1 mm and a non-scratched section with a length of 0.5 mm (corresponding to the connecting section) was used as a repeating unit, the perforated break line was formed by repeating the above repeating unit along the TD direction. Each of the laminated films of Comparative Examples 1 to 7 had a length of 50 cm 2 The measurement area had no scratched portion.

[0160] The oxygen permeability of the measurement area of ​​each prepared laminated film was measured at 20°C and 65% RH using an oxygen permeability measuring device (product name "OX-TRAN2 / 20", manufactured by Modern Control Co., Ltd.) The measured value was used as an index of the barrier property (oxygen barrier property) of the laminated film.

[0161] The measurement results of the oxygen permeability for each of the laminated films of Examples 1 to 20 are shown in the table of FIG. The measurement results of the oxygen permeability for each of the laminated films of Examples 21 to 38 are shown in the table of FIG. The measurement results of the oxygen permeability for each of the laminated films of Examples 39 to 44 are shown in the table of FIG. The measurement results of the oxygen permeability for each of the laminated films of Comparative Examples 7 to 20 were as shown in the table of FIG. The measurement results of the oxygen permeability for each of the laminated films of Comparative Examples 21 to 25 were as shown in the table of FIG.

[0162] The "OR" in the "barrier properties" results for Comparative Examples 13 and 17 shown in FIG. 12 indicates that the oxygen permeability exceeded the measurement range of the measuring device, that is, was over-range.

[0163] In Comparative Examples 13 to 25 shown in FIGS. 12 and 13, the processing width X was larger than the range indicated by Condition 1, and the processing width Y was also larger than the range indicated by Condition 2. In particular, large scratches were formed on the vapor deposition layer, which is the barrier layer, and it was found that the oxygen permeability was 1.00 cc / (m 2 ·days). In other words, the barrier properties were significantly impaired in Comparative Examples 13 to 25.

[0164] In Examples 1 to 44 shown in Figs. 9 to 11, the barrier properties decrease as the processing width Y increases. In other words, the processing width Y has an effect on ensuring the barrier properties. As the processing width Y increases, the barrier properties decrease, but when Condition 2 is satisfied, the barrier properties are 1.00 cc / (m 2 This enabled the realization of an oxygen permeability of less than 1000 kJ / day, ensuring high barrier properties.

[0165] (3) Easy to tear by hand For the evaluation of hand-tearability, stick packaging bags 40 (hereinafter simply referred to as "packaging bags 40") shown in Fig. 14 were produced using the laminate films of Examples 1 to 44 and Comparative Examples 1 to 25. The laminate films of Examples 1 to 44 and Comparative Examples 1 to 25 will be referred to as laminate films 41 in the following description of packaging bags 40.

[0166] The packaging bag 40 had a tubular portion 43 with a seam seal portion (back seal portion) 42 that sealed opposing both end portions of a single laminated film 41 in a seam-like manner. In the packaging bag 40, both end portions of the tubular portion 43 in the extension direction of the seam seal portion 42 were heat-sealed, and a top seal portion (first end seal portion) 44 and a bottom seal portion (second end seal portion) 45 that, together with the seam seal portion 42, formed a storage space for the contents. The distance between the top seal portion 44 and the bottom seal portion 45 was 100 mm. The length in the width direction of the packaging bag 40 was 10 mm. In the packaging bag 40, the width direction (short side direction) of the packaging bag 40 was the TD direction of the laminated film 41.

[0167] When the laminated films of Examples 1 to 44 and Comparative Examples 8 to 25 were used as laminated film 41, packaging bag 40 had break lines 46, as shown in Fig. 14. Break lines 46 were perforations with a plurality of scratched portions 46a formed discretely in the width direction (TD). Each scratched portion 46a had a length of 1 mm, and the length between adjacent scratched portions 46a (joint length) was 0.5 mm.

[0168] In the evaluation of hand tearability, packaging bags 40 were produced using the laminate films of Examples 1 to 44 and Comparative Examples 1 to 25 as laminate films 41. The laminate films of Examples 1 to 44 and Comparative Examples 8 to 25 were laminate films in which the break lines in Examples 1 to 44 and Comparative Examples 8 to 25 were formed in the perforated pattern described above. That is, the break lines in the laminate films of Examples 1 to 44 and Comparative Examples 8 to 25 were perforations with a plurality of discretely formed scratched portions, each of which was 1 mm long, and the length between adjacent scratched portions (joint length) was 0.5 mm. The conditions of the scratched portions themselves were as described in Examples 1 to 44 and Comparative Examples 8 to 25.

[0169] Thirty panelists manually opened packaging bags 40 manufactured using the laminate film of each of Examples 1 to 44 and Comparative Examples 1 to 25 as laminate film 41 in the width direction of packaging bag 40. The ease of opening was evaluated using four levels: "easily torn along the scratched portion (break line)," "tears along the scratched portion (break line)," "tears, but may not along the scratched portion (break line)," and "cannot be torn." The evaluation results of the 30 panelists were further evaluated according to the following criteria. <Rating G++> The number of panelists who evaluated the product as "easy to tear along the scratched area (break line)" was between 25 and 30. <Rating: G+> The number of panelists who evaluated that the product "can be torn along the scratched area (break line)" is between 15 and 24 <Rating G> The number of panelists who evaluated that "It can be torn, but sometimes not along the scratched area (break line)" is 5 or more and 14 or less <Rating B> The number of panelists who rated it as "unbreakable" is between 0 and 4

[0170] The final evaluation result of the hand tearability was determined using the evaluations G++, G+, G, and B. The evaluation results of the hand tearability of the laminated films of Examples 1 to 20 were as shown in the table of FIG. The evaluation results of the hand tearability of the laminated films of Examples 21 to 38 were as shown in the table of FIG. The evaluation results of the hand tearability of the laminated films of Examples 39 to 44 were as shown in the table of FIG. The evaluation results of the hand tearability of the laminated films of Comparative Examples 7 to 20 were as shown in the table in FIG. The evaluation results of the hand tearability of the laminated films of Comparative Examples 21 to 25 were as shown in the table of FIG.

[0171] In Comparative Examples 1 to 12 shown in FIG. 12, the ratio (Z / L1) of the distance L1 to the processing depth Z was smaller than 1 / 3, and the evaluation of the hand cutting ability was graded B.

[0172] In contrast, in Examples 1 to 44 shown in Figures 9 to 11, Comparative Examples 13 to 16 shown in Figure 12, and Comparative Examples 21 to 25 shown in Figure 13, the ratio of distance L1 to processing depth Z (Z / L1) was 1 / 3 or more, and the hand-tearability was evaluated as G+ or G++. The results of Examples 1 to 44, which used a high-precision scratching tool, showed that when Condition 1 and Condition 2 are satisfied, that is, even when the width of the scratched portion is narrow, good hand-tearability can be achieved when the ratio of distance L1 to processing depth Z (Z / L1) is 1 / 3 or more.

[0173] (4) Overall rating (overall review) Based on the results of the measurement of the barrier properties and the evaluation of the hand-tearability, the laminated films of Examples 1 to 44 and Comparative Examples 1 to 25 were evaluated according to the following criteria. <Rating: G+> Oxygen permeability is 0.5cc / (m 2 ·days) or less and the hand tearability rating is G++. <Rating G> Oxygen permeability is 1.00cc / (m 2 ·day) or less and the hand tearability rating is G or G+, or the oxygen permeability is greater than 0.5cc / (m2 ·day) and less than 1.00cc / (m 2 ·days) or less and the hand tearability rating is G++. <Rating B> Oxygen permeability is 1.00 (cc / (m 2 The test piece satisfies either the requirement that the test piece has a greater than 100% tear-off time than the test piece's 100% tear-off time (day) or the requirement that the test piece has a hand-tearability rating of B.

[0174] The results of the overall evaluation of the laminated films of Examples 1 to 20 are shown in the table of FIG. The results of the overall evaluation of the laminated films of Examples 21 to 38 are shown in the table of FIG. The results of the overall evaluation of the laminated films of Examples 39 to 44 are shown in the table of FIG. The overall evaluation results for each of the laminated films of Comparative Examples 7 to 20 are shown in the table of FIG. The overall evaluation results for each of the laminated films of Comparative Examples 21 to 25 are shown in the table of FIG.

[0175] As shown in Figures 12 and 13, the overall evaluation of the laminate films of Comparative Examples 1 to 25 was a rating of B. In contrast, the laminate films of Examples 1 to 44 shown in Figures 9 to 11 were overall evaluated as G+ or G. The laminate films of Comparative Examples 1 to 25 did not satisfy any of Condition 1, Condition 2, or Condition 3. On the other hand, the laminate films of Examples 1 to 44 satisfied all of Condition 1, Condition 2, and Condition 3.

[0176] Therefore, it can be understood that a laminate film that satisfies all of conditions 1, 2, and 3 can ensure both barrier properties and ease of manual tearing. Furthermore, the laminate films of Examples 1 to 44 were produced using a high-precision scratching tool. Therefore, it was also shown that the use of a high-precision scratching tool can produce a laminate film that satisfies all of conditions 1, 2, and 3. [Explanation of symbols]

[0177] 1, 1A, 1B, 1C... laminated film, 11... base layer, 11a... first surface, 11A... first base layer, 11b... second surface, 11B... second base layer, 12... barrier layer, 13... sealant layer, 14... breaking line, 20... scratching tool, 21... base member, 21a... surface, 22... blade, 22a... cutting edge, 23... spacer portion, 141... scratching portion.

Claims

1. A transparent laminate film, a film body including a substrate layer having a first surface and a second surface opposite to the first surface, a barrier layer laminated on the second surface of the substrate layer, and a sealant layer laminated on the barrier layer on the opposite side of the substrate layer, a break line for breaking the film body in a predetermined direction when viewed from the stacking direction of the base layer, the barrier layer, and the sealant layer is formed in the film body; the break line has a scratched portion formed from the first surface toward the sealant layer, The processing width of the scratch processing portion on the first surface is 1.8 μm or more and 25.0 μm or less, a processing width of the scratch processing portion in the barrier layer is 0 μm or more and 20.0 μm or less, a length of the scratched portion in the lamination direction that is equal to or greater than one-third of a length from the first surface to the sealant layer and is shorter than a length of the film body; Laminated film.

2. a depth of the scratched portion with respect to the first surface being shorter than a thickness of the base material layer; The laminated film according to claim 1 .

3. the scratched portion reaches the barrier layer, The width of the scratched portion in the barrier layer is greater than 0 and less than 20.0 μm. The laminated film according to claim 1 .

4. the substrate layer includes a first substrate layer having the first surface and a second substrate layer having the second surface and disposed between the first substrate layer and the barrier layer; The laminated film according to claim 1 .

5. Oxygen permeability is 1.00 cc / (m ２ ・day) or less, The laminated film according to any one of claims 1 to 4.

6. A method for producing a transparent laminate film, comprising: a break line forming step of forming a break line in a film body having a base layer having a first surface and a second surface opposite to the first surface, a barrier layer laminated on the second surface of the base layer, and a sealant layer laminated on the barrier layer on the opposite side to the base layer, for breaking the film body in a predetermined direction; the break line is formed by scratching the film body from the first surface side using a scratching tool so as not to penetrate the sealant layer, the scratched portion formed by the scratching has a width on the first surface of 1.8 μm or more and 25.0 μm or less, a width on the barrier layer of 0 μm or more and 20.0 μm or less, and a length of the scratched portion in the stacking direction of the base layer, the barrier layer, and the sealant layer of 1 / 3 or more of the length from the first surface to the sealant layer and shorter than the length of the film body; The scratch processing device is A base member; a blade having an end opposite to the cutting edge fixed to the surface of the base member; a metal spacer portion fixed to the surface of the base member for defining the penetration depth of the blade tip into the film body; having A method for manufacturing a laminated film.

7. a depth of the scratched portion with respect to the first surface being shorter than a thickness of the base material layer; The method for producing the laminated film according to claim 6.

8. the scratched portion reaches the barrier layer, The width of the scratched portion in the barrier layer is greater than 0 and less than 20.0 μm. The method for producing the laminated film according to claim 6.

9. a film body including a substrate layer having a first surface and a second surface opposite to the first surface, a barrier layer laminated on the second surface of the substrate layer, and a sealant layer 13 laminated on the barrier layer on the opposite side of the substrate layer, a break line for breaking the film body in a predetermined direction when viewed from the stacking direction of the base layer, the barrier layer, and the sealant layer is formed in the film body; the breaking line has a scratched portion formed by a scratching tool from the first surface toward the sealant layer, The processing width of the scratch processing portion on the first surface is 1.8 μm or more and 25.0 μm or less, a processing width of the scratch processing portion in the barrier layer is 0 μm or more and 20.0 μm or less, a length of the scratched portion in the lamination direction being equal to or greater than one-third of a length from the first surface to the sealant layer and shorter than a length of the film body; The scratch processing device is A base member; a blade having an end opposite to the cutting edge fixed to the surface of the base member; a metal spacer portion fixed to the surface of the base member for defining the penetration depth of the blade tip into the film body; having Laminated film.

Images