Charged particle beam apparatus and charged particle gun

Abstract

To provide a charged particle beam device capable of achieving more appropriate position adjustment of a charged particle source.SOLUTION: The charged particle beam apparatus includes a charged particle source support member 106 that directly or indirectly supports a charged particle source 103, and a moving mechanism 107 that moves the charged particle source support member 106, and the moving mechanism 107 has a first function of moving the charged particle source support member 106 in an X direction, a Y direction, and a Z direction and a second function of moving the charged particle source support member 106 in the Z direction from the outside of a vacuum chamber 101 separately from the first function, where the Z direction is a traveling direction of charged particles emitted from the charged particle source 103, the X direction is a direction orthogonal to the Z direction, and the Y direction is a direction orthogonal to the Z direction and the X direction.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a charged particle beam device and a charged particle gun. [Background technology]

[0002] As background art in this technical field, the following Patent Documents 1 and 2 describe techniques for adjusting the position of a charged particle source, such as an electron source. The descriptions in these documents are incorporated herein by reference. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 10-255711 [Patent Document 2] Japanese Patent Application Laid-Open No. 2007-19045 Summary of the Invention [Problem to be solved by the invention]

[0004] However, in the above-mentioned technology, there is a demand for realizing more appropriate position adjustment of the charged particle source. The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a charged particle beam apparatus and a charged particle gun that can realize appropriate position adjustment of a charged particle source. [Means for solving the problem]

[0005] In order to solve the above-mentioned problems, the charged particle beam device of the present invention is a charged particle beam device comprising: a charged particle gun that irradiates a charged particle beam; and a focusing lens, wherein the focusing lens focuses the charged particles by an electric field or a magnetic field and irradiates the charged particles onto a sample; the charged particle gun comprises: a charged particle source that emits charged particles; a vacuum chamber that surrounds the charged particle source; a charged particle source support member that directly or indirectly supports the charged particle source; and a moving mechanism that moves the charged particle source support member, wherein the moving mechanism defines a traveling direction of charged particles emitted from the charged particle source as a Z direction, a direction perpendicular to the Z direction as an X direction, and a direction perpendicular to the Z direction and the X direction as a Y direction, and has a first function of moving the charged particle source support member in the X direction, the Y direction, and the Z direction; and a second function of moving the charged particle source support member in the Z direction from outside the vacuum chamber, separately from the first function. [Effects of the Invention]

[0006] According to the present invention, it is possible to achieve appropriate position adjustment of the charged particle source. [Brief explanation of the drawings]

[0007] [Figure 1] FIG. 1 is a schematic diagram of an electron gun according to a first embodiment. [Figure 2] FIG. 10 is a schematic diagram of an electron gun according to a second embodiment. [Figure 3] FIG. 11 is a schematic perspective view of a main part of an electron gun according to a third embodiment. [Figure 4] FIG. 10 is a schematic cross-sectional view of a main part of an electron gun according to a fourth embodiment. [Figure 5] FIG. 10 is a schematic diagram of an electron gun according to a fifth embodiment. [Figure 6] FIG. 10 is a schematic diagram of an electron gun according to a sixth embodiment. [Figure 7] FIG. 12 is a schematic diagram of a charged particle beam device according to a seventh embodiment. [Figure 8] FIG. 13 is a schematic diagram of a charged particle beam device according to an eighth embodiment. [Figure 9]FIG. 13 is a schematic diagram of a charged particle beam device according to a ninth embodiment. [Figure 10] FIG. 1 is a block diagram of a computer. DETAILED DESCRIPTION OF THE INVENTION

[0008] [Outline of the embodiment] A charged particle beam device has a charged particle gun that emits a charged particle beam. For example, an SEM (Scanning Electron Microscope) has an electron gun. Furthermore, the charged particle gun has a charged particle source, and the charged particle beam emitted from the charged particle source is emitted from the charged particle gun. In the case of an SEM, an electron beam is emitted from an electron source provided in the electron gun and is emitted from the electron gun. For example, a tungsten crystal is used as the electron source.

[0009] In recent years, many charged particle guns have been developed, including short-focus and magnetic field superposition types, which have a short distance between the charged particle source and the focusing lens, in order to achieve high throughput using high-current probes. It is important for charged particle beam instruments to have a movement mechanism to adjust the position of the charged particle source, because the position of the charged particle source can deviate from the designed position due to assembly tolerances and other factors. In the case of SEMs, if the electron source position deviates, the aperture angle and aberration coefficient on the sample will change from the designed values, which may cause the target resolution to be lowered.

[0010] Therefore, it is desirable that a charged particle beam device be equipped with some kind of charged particle source moving mechanism so that the charged particle source is movable. Hereinafter, in this specification, the direction of travel of the charged particle beam emitted from the charged particle source is referred to as the Z direction, and the first and second directions perpendicular to the Z direction are referred to as the X and Y directions, respectively. By applying the technology of Patent Document 1, an ultra-high vacuum surface observation device can be realized, which includes a piezoelectric mechanism inside the vacuum chamber that can move the charged particle source in the X, Y, and Z directions. Furthermore, by applying the technology of Patent Document 2, an electron beam application device can be realized, which includes a mechanism outside the vacuum chamber that can move the charged particle source in the X and Y directions.

[0011] However, a structure that includes an XYZ movement mechanism using piezoelectric elements inside a vacuum chamber, as in the technology applying Patent Document 1, poses a problem of restricting the baking temperature of the charged particle gun. Charged particle guns generally require a high to ultra-high vacuum inside to allow a charged particle beam to pass through. For this reason, it is common to perform a baking process on the charged particle gun. If a piezoelectric element is provided inside the vacuum chamber, the upper limit of the temperature at which baking can be performed is lowered, and it is conceivable that the charged particle gun cannot be sufficiently degassed, resulting in a poor level of vacuum. It is also conceivable to provide an XYZ movement mechanism using a motor inside the vacuum chamber instead of a piezoelectric element, but in either case, the problem of a lower baking temperature is similarly posed.

[0012] Furthermore, in a structure in which a mechanism for moving the position of the charged particle source is provided outside the vacuum chamber, as in the technology applying Patent Document 2, a problem occurs in that positioning accuracy deteriorates due to differences in air pressure. In particular, to move the position of the charged particle source in the Z direction from outside the vacuum chamber, it is considered necessary to provide a member that supports the charged particle source while separating the inside and outside of the vacuum chamber, and to provide a mechanism for moving this member in the Z direction. However, because there is a difference in air pressure between the inside and outside of the vacuum chamber, moving this member in the Z direction requires moving the member with a force that exceeds the force caused by atmospheric pressure. It has been difficult to precisely move the position of the charged particle source in the Z direction under such conditions.

[0013] On the other hand, short-focus and magnetic field superposition charged particle guns are more sensitive to misalignment of the charged particle source relative to the focusing lens than conventional charged particle guns. This has created a need for more accurate setting of the X, Y, and Z positions of the charged particle source. With regard to the Z position in particular, the distance between the charged particle source and the focusing lens becomes shorter, which increases the longitudinal magnification of the optical system, making it important to position the charged particle source with higher accuracy. It is believed that applying the technology of Patent Document 2 makes it possible to move the charged particle source in the X and Y directions from outside the charged particle gun. However, Patent Document 2 does not provide any detailed description of a method for moving the charged particle source in the Z direction.

[0014] In order to solve the above-mentioned problems, the present disclosure provides a charged particle gun and a charged particle beam device including a movement mechanism for moving a charged particle source support member, the movement mechanism having a first function of moving the charged particle source support member in X, Y, and Z directions, and a second function of moving the charged particle source support member from outside the vacuum chamber, separate from the first function.

[0015] Furthermore, the charged particle beam device provided by the present disclosure includes a drive unit that adjusts the position of the charged particle source support member, a detector, and a user interface device, and is configured to be able to adjust the position of the charged particle source support member so that the parameters displayed on the user interface device are optimized.

[0016] According to an embodiment of the present disclosure, the second function bears the force due to the air pressure difference, and the first function, which is free from atmospheric pressure, makes it possible to adjust the position of the charged particle source support member in three directions: X, Y, and Z. In the configuration of the present disclosure, there is no need to provide mechanisms such as piezoelectric elements and motors inside the vacuum chamber, so that the baking temperature of the charged particle gun can be set high to sufficiently degas the charged particle gun. Furthermore, according to the embodiment of the present disclosure, it is possible to move the charged particle source in three directions, X, Y and Z, so as to optimize one or more parameters displayed on the user interface device.

[0017] Various embodiments will be described below with reference to the drawings. In the drawings described below, components having the same or similar functions are designated by the same reference numerals, and descriptions thereof may not be repeated. In the following embodiments, charged particle beam devices and charged particle guns are mainly applied to SEMs (scanning electron microscopes) and electron guns, but the following embodiments are not limited to these and may also be applied to, for example, ion beam devices and ion guns.

[0018] [First embodiment] 1 is a schematic diagram of an electron gun 100 according to a first embodiment. The electron gun 100 of this embodiment is an example of a charged particle beam device and is primarily applied to an SEM. In this case, the charged particle gun provided in the charged particle beam device in the examples described below is an electron gun, and similarly, the charged particle beam and charged particle source are an electron beam and an electron source, respectively.

[0019] In FIG. 1, an electron gun 100 (charged particle gun, charged particle beam device) includes a vacuum chamber 101, an electron source 103 (charged particle source), a condenser coil 105 (focusing lens), an electron source support member 106 (charged particle source support member), and a moving mechanism 107. A high-vacuum space 102 is formed inside the vacuum chamber 101. The electron source 103 and the condenser coil 105 are provided inside the vacuum chamber 101. The electron source 103 emits an electron beam 104 (charged particle beam). The condenser coil 105 is a coil that focuses the electron beam 104, which is a charged particle beam. That is, a magnetic field is generated by supplying a current to the condenser coil 105, and this magnetic field focuses the electron beam 104.

[0020] Incidentally, the electron beam 104 does not necessarily have to be focused by a magnetic field, but can also be focused by an electric field. In that case, two or more electrodes (not shown) having a potential difference may be disposed instead of the condenser coil 105. Furthermore, the member for focusing the electron beam (condenser coil 105 or the above-mentioned electrode) does not have to be provided inside the electron gun 100, but may be provided in a lens barrel (not shown) below the electron gun 100.

[0021] The electron source 103 is supported directly or indirectly inside the vacuum chamber 101 by an electron source support member 106. Here, the meaning of the expression "directly or indirectly supported" will be explained. The electron source support member 106 is made of a metal such as SUS (stainless steel) and has a cylindrical shape. It is conceivable to support the electron source 103 by joining the electron source 103 to the lower end of the electron source support member 106. In this configuration, it can be said that the electron source support member 106 directly supports the electron source 103.

[0022] As another method, it is also possible to make the electron source support member 106 out of an insulator, further provide a metal wire on the electron source support member 106, and support the electron source 103 by joining the metal wire to the electron source 103. In this configuration, it can be said that the electron source support member 106 indirectly supports the electron source 103 via the metal wire. In the example of FIG. 1, the electron source support member 106 is illustrated as directly supporting the electron source 103, but as described above, a configuration may be adopted in which another member provided with the electron source support member 106 supports the electron source 103.

[0023] The moving mechanism 107 moves the electron source support member 106 in the X, Y, and Z directions. Here, "moving in the X, Y, and Z directions" means moving the electron source support member 106 by a desired distance in each of the three directions, namely, the X direction, the Y direction, and the Z direction. In FIG. 1, the electron source support member 106 is held in the vacuum chamber 101 via the moving mechanism 107, but the electron source support member 106 may also be held directly in the vacuum chamber 101.

[0024] Here, the moving mechanism 107 has a first function of moving the electron source support member 106 in the X, Y, and Z directions, and a second function, separate from the first function, of moving the electron source support member 106 from outside the vacuum chamber 101. Here, "outside the vacuum chamber 101" means an environment at ambient pressure that is not in contact with the high vacuum space 102.

[0025] By providing the second function described above, it is possible to cancel out the force generated by the air pressure difference between the outside of the vacuum chamber 101 and the first function, thereby realizing precise positioning when the electron source support member 106 is moved to a desired position in the X, Y, and Z directions by the first function.

[0026] [Second embodiment] FIG. 2 is a schematic diagram of an electron gun 100 according to the second embodiment. In the second embodiment, the moving mechanism 107 includes a first moving device 10 and a second moving device 30. The first moving device 10 realizes a first function of moving the electron source support member 106 in the X, Y, and Z directions. The second moving device 30 realizes a second function of moving the electron source support member 106 in the Z direction, separately from the first moving device 10.

[0027] Here, the second moving device 30 is installed outside the vacuum chamber 101. The second moving device 30 applies a force to the electron source support member 106 that cancels out the force generated by the air pressure difference, thereby freeing the first moving device 10 from the force caused by the air pressure difference. Then, the first moving device 10 moves the electron source support member 106 to a desired position in the X, Y, and Z directions. This makes it possible to achieve precise positioning when the electron source support member 106 is moved by the first moving device 10. The configuration of the second embodiment other than that described above is the same as that of the first embodiment.

[0028] [Third embodiment] Fig. 3 is a schematic perspective view of the main parts of an electron gun 100 according to a third embodiment. That is, Fig. 3 shows the second moving device 30, part of the upper surface of the vacuum chamber 101, and part of the electron source support member 106 of the electron gun 100. The third embodiment provides a specific configuration of the second moving device 30 in the second embodiment. As shown in Fig. 3, the second moving device 30 is installed outside the vacuum chamber 101, i.e., above the vacuum chamber 101.

[0029] The electron source support member 106 and the vacuum chamber 101 are connected via a connecting member 112. The connecting member 112 is a member that enables movement of the electron source support member 106 in the X, Y, and Z directions while maintaining the vacuum state of the vacuum chamber 101, and can be configured using, for example, a bellows.

[0030] In the illustrated example, the second moving device 30 includes a cylindrical portion 32 and three set screws 34. The cylindrical portion 32 is formed in a cylindrical shape, and through holes (not shown) are formed along the Z direction at three equally spaced positions in the circumferential direction, and female screws (not shown) are threaded into these through holes.

[0031] The cylindrical portion 32 has its inner peripheral surface in contact with the columnar electron source support member 106 and is fixed to the electron source support member 106. Each set screw 34 is formed in a substantially cylindrical shape, and a male thread is threaded on its outer peripheral surface (not shown). Each set screw 34 is inserted and threaded into a through-hole formed in the cylindrical portion 32. The lower end of each set screw 34 is in contact with the upper surface of the vacuum chamber 101.

[0032] When the set screw 34 is rotated with its lower end in contact with the upper surface of the vacuum chamber 101, a force is applied to the electron source support member 106 in the negative direction of the Z axis through the cylindrical portion 32. By rotating the set screw 34 by an appropriate amount, the force of atmospheric pressure applied to the electron source support member 106 is canceled out. This allows the electron source support member 106 to be precisely positioned by the now free first moving device 10 (see FIG. 2).

[0033] Furthermore, the second moving device 30 may be provided with a member such as a screw or a block (not shown) other than the set screw 34. That is, these members can be used to move the second moving device 30 and also to cancel the force of atmospheric pressure applied to the first moving device 10 (see FIG. 2). For example, it is conceivable to form a male thread on the circumferential surface of the electron source support member 106 and a female thread on the inner circumferential surface of the cylindrical portion 32, and then screw the two together. In this way, by rotating the cylindrical portion 32, a force in the negative direction of the Z axis can be applied to the electron source support member 106, thereby canceling the force of atmospheric pressure applied to the first moving device 10.

[0034] [Fourth embodiment] Fig. 4 is a schematic cross-sectional view of the main part of the electron gun 100 according to the fourth embodiment. That is, Fig. 4 shows mainly the first moving device 10 and its peripheral parts of the electron gun 100.

[0035] The first moving device 10 illustrated in Fig. 4 includes a rotating member 12, a protrusion 14, and a set screw 16. The electron source support member 106 has a male threaded portion 106a on its circumferential surface. The rotating member 12 is formed, for example, in a cylindrical shape, and has a female thread (no reference numeral) on its inner circumferential surface. The female thread is threadedly engaged with the male threaded portion 106a of the electron source support member 106, whereby the rotating member 12 is attached to the electron source support member 106.

[0036] The protrusions 14 are provided around the periphery of the rotating member 12 at four equal positions in the circumferential direction, i.e., at positive and negative positions in the X direction and positive and negative positions in the Y direction. However, Fig. 4 only shows two protrusions 14 provided at positive and negative positions in the X direction. Each protrusion 14 is provided so as to protrude upward from the upper surface of the vacuum chamber 101. Each protrusion 14 has a through-hole (not shown) that extends from the outer periphery to the inner periphery of the protrusion 14, and these through-holes are threaded with female screws.

[0037] A total of four set screws 16 are provided, and are screwed into through holes (not shown) formed in the respective protrusions 14. However, only two set screws 16 are shown in FIG. 4. When the set screws 16 are rotated, the tip of the set screws 16 moves the rotating member 12 in the pushing direction, thereby moving the electron source support member 106. For example, when the two set screws 16 shown in FIG. 4 are rotated, they move the electron source support member 106 in the X direction via the rotating member 12.

[0038] Here, a procedure for positioning the electron source support member 106 using the first moving device 10 and the second moving device 30 will be described. Step #1: First, in the first moving device 10, the set screw 16 is loosened so that no force is applied from the set screw 16 to the rotating member 12. Then, the rotating member 12 is rotated in the release direction to separate the rotating member 12 from the upper surface of the vacuum chamber 101.

[0039] Step #2: Next, the second moving device 30 is used to roughly adjust the Z-direction position of the electron source support member 106. When the electron source support member 106 is moved in the Z-direction by the second moving device 30, the rotating member 12 also moves along with the electron source support member 106. In the rough adjustment, it is preferable to position the electron source support member 106 in the Z-direction slightly lower than the ideal position.

[0040] Step #3: Next, in the first moving device 10, the rotating member 12 is rotated in the fastening direction, and eventually the rotating member 12 comes into contact with the upper surface of the vacuum chamber 101. In this contact state, if the rotating member 12 is further rotated in the fastening direction, the electron source support member 106 gradually moves upward.

[0041] Conversely, when the rotating member 12 is rotated in the release direction while the rotating member 12 is in contact with the vacuum chamber 101, the electron source support member 106 gradually moves downward. As a result, by operating the rotating member 12, the position of the electron source support member 106 in the Z direction can be finely adjusted. As described above, the force due to atmospheric pressure applied to the electron source support member 106 is almost completely canceled by the second moving device 30 (for example, that shown in FIG. 3 ). Therefore, the user can rotate the rotating member 12 with a relatively weak force. This allows the user to operate the rotating member 12 to precisely adjust the position of the electron source support member 106 in the Z direction. Step #4: Next, the four set screws 16 are rotated to adjust the position of the electron source support member 106 in the X and Y directions.

[0042] As described above, according to this embodiment, the user can use the second moving device 30 to free the first moving device 10 from atmospheric pressure, and then operate the rotating member 12 to finely adjust the Z-direction position of the electron source support member 106 using the first moving device 10. According to this embodiment, since there is no need to include a piezoelectric element or the like inside the vacuum chamber 101, it is possible to configure an electron gun 100 that can bake the vacuum chamber 101 at high temperatures and can also move the electron source 103 in the Z direction. Note that the configuration of the fourth embodiment other than that described above is the same as any of the first to third embodiments.

[0043] [Fifth embodiment] FIG. 5 is a schematic diagram of an electron gun 100 according to the fifth embodiment. The fifth embodiment is configured by adding a position specifying unit 130 to any of the second to fourth embodiments. The position specifying unit 130 is a device that specifies the position in the Z direction of the electron source support member 106 adjusted by the first moving device 10 (see FIG. 2). In FIG. 5, the position specifying unit 130 includes a pad unit 131, a micrometer 132, a conductivity detection unit 133, and a micrometer support member 136.

[0044] The micrometer support member 136 includes an insulating portion 136a and an attachment portion 136b. The attachment portion 136b is attached to the micrometer support member 136 and supports the insulating portion 136a. The insulating portion 136a is made of an insulating material such as resin and formed into a circular ring shape, and a female screw (not shown) is threaded on the inner circumferential surface thereof.

[0045] The micrometer 132 has a male thread portion 132a formed in a male screw shape, and the male thread portion 132a is screwed into the insulating portion 136a. As a result, the tip of the male thread portion 132a of the micrometer 132 protrudes downward from the micrometer support member 136. The micrometer 132 measures the protruding length of this male thread portion 132a from the micrometer support member 136.

[0046] The pad portion 131 is a sheet-like member attached to the upper surface of the vacuum chamber 101, and includes an insulator sheet portion 131a and a conductor sheet portion 131b. The insulator sheet portion 131a is an insulator formed from a resin or the like in a sheet shape, and is attached to the upper surface of the vacuum chamber 101. The conductor sheet portion 131b is a sheet-like conductor joined to the upper surface of the insulator sheet portion 131a.

[0047] The conduction detection unit 133 detects whether or not the pad portion 131 is in contact with the micrometer 132. More specifically, the conduction detection unit 133 detects whether or not the male thread portion 132a of the micrometer 132 and the conductive sheet portion 131b of the pad portion 131 are in conduction.

[0048] Here, a method of using the position specifying unit 130 will be described. First, the micrometer 132 is operated so that the protruding length of the male thread portion 132a from the micrometer support member 136 corresponds to a desired position of the electron source support member 106 in the Z direction. Next, the electron source support member 106 is moved by the first moving device 10 (see FIG. 2). Then, the conductivity detecting unit 133 detects that the pad portion 131 and the micrometer 132 have come into contact with each other by an appropriate amount of movement. At this time, it is preferable to fix the position of the electron source support member 106 in the Z direction. In this way, by providing the position specifying unit 130, it is possible to move the electron source support member 106 while quantitatively detecting the position of the electron source support member 106.

[0049] [Sixth embodiment] FIG. 6 is a schematic diagram of an electron gun 100 according to the sixth embodiment. The electron gun 100 of this embodiment, like that of the first embodiment (see FIG. 1), includes a vacuum chamber 101, an electron source 103, a condenser coil 105, an electron source support member 106, and a moving mechanism 107. Furthermore, the electron gun 100 of this embodiment includes a drive unit 210 and a controller 208.

[0050] The controller 208 outputs a position command signal that commands the position of the electron source support member 106. The drive unit 210 drives the movement mechanism 107 based on the position command signal. For example, when the second movement device 30 shown in FIG. 3 is employed, the controller 208 and the drive unit 210 can rotate the set screw 34 using a motor (not shown).

[0051] 4 is employed, the controller 208 and the drive unit 210 can rotate the rotating member 12 and the protrusion 14 using a motor (not shown). Alternatively, instead of the rotating member 12 and the set screw 16, an appropriate actuator (not shown) can be provided, and the controller 208 and the drive unit 210 can drive this actuator to move the electron source support member 106. In this way, by providing the controller 208 and the drive unit 210, the user does not need to directly adjust the position of the electron source support member 106, and this can result in effects such as reduced maintenance time.

[0052] 4, when a motor or an actuator is used instead of the rotating member 12 and the set screw 16, it is clear that the temperature constraint during baking, which was mentioned as an issue at the beginning, does not become a problem in this embodiment. The reason for this is that the moving mechanism 107 in this disclosure can adjust the position of the electron source support member 106 from outside the vacuum chamber 101.

[0053] At the location where the moving mechanism 107 is installed outside the vacuum chamber 101, the temperature does not rise as much as inside the vacuum chamber 101, and it is possible to install a motor or actuator there. If necessary, the motor or actuator should be designed so that it can be removed during baking. Furthermore, when control by an actuator or motor is employed, interlocking control may be employed so that automatic movement is performed in the X and Y directions while also moving in the Z direction.

[0054] [Seventh embodiment] 7 is a schematic diagram of a charged particle beam system 200 according to a seventh embodiment. As in the first to sixth embodiments, the charged particle beam system 200 is applicable to, for example, an SEM. The charged particle beam device 200 includes an electron gun 100, a vacuum chamber 201, an aperture 202, a condenser coil 203, and a detector 204. A sample 205 is placed at a predetermined location in the vacuum chamber 201. The configuration of the electron gun 100 is the same as that of the first embodiment. The high vacuum space 102 of the vacuum chamber 101 is connected to the internal space of the vacuum chamber 201.

[0055] The electron beam 104 emitted by the electron gun 100 is guided downstream to a vacuum chamber 201, where it is focused and irradiated onto a sample 205. At this time, the electron beam 104 is focused by a condenser coil 105, then extracted by an aperture 202, and further focused by a condenser coil 203 before being irradiated onto the sample 205.

[0056] However, the embodiment shown is merely an example of an optical system for irradiating a sample with a focused charged particle beam, and does not limit the present disclosure. For example, the charged particle beam device 200 may include an electrode instead of the condenser coil 203, and may focus the electron beam 104 by an electric field, or may include both the condenser coil 203 and the electrode.

[0057] It is also possible to provide any number of components for focusing the electron beam 104, one or more. Two or more apertures 202 may also be provided. In addition, as in the other embodiments described above, the condenser coil 105 and the aperture 202 may be provided either inside or outside the electron gun 100.

[0058] The focused electron beam 104 is irradiated onto a sample 205, and a signal generated by the irradiation of the electron beam is detected by a detector 204. Various signals can be detected here. In the SEM of this embodiment, secondary electrons emitted from the sample are typically detected, but in the case of a transmission electron microscope (TEM), it is also possible to detect transmitted electrons that have interacted with the sample, and, depending on the application, electromagnetic waves such as X-rays or cathodoluminescence.

[0059] 7, detector 204 detects secondary electrons emitted from sample 205 with a component in the negative Z-axis direction. However, as described above, various detection targets are possible, and the scope of the present disclosure is not limited by the configuration in Fig. 7. The signal detected by detector 204 is input into computer system 207, processed, and then displayed on GUI device 206 (user interface device) equipped with a GUI (Graphical User Interface) function.

[0060] In this embodiment, the position of the electron source support member 106 can be adjusted using the moving mechanism 107 while referring to one or more signals displayed on the GUI device 206. The signals to be displayed on the GUI device 206 may be, for example, an image obtained by irradiating the electron beam 104, a current value obtained by collecting the electron beam 104, or the like.

[0061] The position of the electron source support member 106 can be adjusted while viewing the GUI device 206, for example, by the following method. During the adjustment stage of the charged particle beam device 200 after the electron gun 100 is mounted, it is possible that the axes of the electron source 103 and the aperture 202 are not aligned due to assembly tolerances. Therefore, these axes are aligned. First, the axes of the members below the aperture 202 are adjusted in advance so that they coincide with the center of the screen on the GUI device 206.

[0062] Next, no current is passed through the condenser coils 105 and 203, and the electron beam emitted from the sample 205 is displayed on the GUI device 206. If the axes of the electron source 103 and the aperture 202 are not aligned, the image of the electron beam emitted from the sample 205 will be displayed in a position that is off-center on the screen of the GUI device 206. Therefore, the electron source support member 106 is moved using the XY movement mechanism of the movement mechanism 107 so that the electron image is positioned at the center of the screen of the GUI device 206. This makes it possible to align the axis of the electron source 103 with the axis of the aperture 202.

[0063] Further, an example of an adjustment method using the Z-direction movement function of the movement mechanism 107 is as follows. First, the current values ​​of the condenser coils 105 and 203 are adjusted so that the electron beam emitted from the desired Z-coordinate of the electron source 103 is focused on the sample 205. Here, if the Z-coordinate of the electron source 103 is not at the desired position, the SEM image displayed on the GUI device 206 will be blurred. In this case, it is advisable to use the Z-direction movement function of the movement mechanism 107 to adjust the Z-coordinate of the electron source 103 so that the SEM image is in focus. In this way, it is possible to adjust the Z-coordinate of the electron source 103 to the desired position.

[0064] [Eighth embodiment] FIG. 8 is a schematic diagram of a charged particle beam device 200 according to an eighth embodiment. In this embodiment, the moving mechanism 107 is configured similarly to that of the second embodiment (see FIG. 2). That is, the moving mechanism 107 includes a first moving device 10 and a second moving device 30 that moves the electron source support member 106 in the Z direction from outside the vacuum chamber 101. The configuration of this embodiment other than that described above is similar to that of the seventh embodiment (see FIG. 7). According to this embodiment, like the second embodiment described above, it is possible to configure an electron gun 100 that does not impose restrictions on the baking temperature and that is capable of adjusting the electron source support member 106 in the three directions of X, Y, and Z.

[0065] [Ninth embodiment] FIG. 9 is a schematic diagram of a charged particle beam device 200 according to a ninth embodiment. In this embodiment, the charged particle beam device 200 further includes a controller 208 and a driving unit 210 in addition to the same configuration as that of the eighth embodiment (see FIG. 8). As in the sixth embodiment (see FIG. 6), the controller 208 outputs a position command signal that commands the position of the electron source support member 106. Furthermore, the driving unit 210 drives the moving mechanism 107 based on the position command signal.

[0066] In this embodiment, a user can remotely control the moving mechanism 107 via the controller 208 and the driving unit 210. This allows the user to adjust the position of the electron source support member 106 so that various parameters are optimized while referring to the SEM image displayed on the GUI device 206. Furthermore, the position adjustment of the electron source support member 106 is not limited to manual operation by the user, and the position adjustment of the electron source support member 106 may be performed automatically by the computer system 207.

[0067] [Computer Configuration] 10 is a block diagram of the computer 980. The GUI device 206, the computer system 207, and the controller 208 shown in FIGS. 6 to 9 each include one or more computers 980 shown in FIG. 10, a computer 980 includes a CPU 981, a storage unit 982, a communication I / F (interface) 983, an input / output I / F 984, and a media I / F 985.

[0068] Here, the storage unit 982 includes a RAM 982a, a ROM 982b, and an SSD (Solid State Drive) 982c. The communication I / F 983 is connected to a communication circuit 986. The input / output I / F 984 is connected to an input / output device 987. The media I / F 985 reads and writes data from a recording medium 988. The ROM 982b stores an IPL (Initial Program Loader) executed by the CPU, etc. The SSD 982c stores control programs, various data, etc. The CPU 981 executes control programs, etc. loaded from the SSD 982c into the RAM 982a to realize various functions.

[0069] [Variations] The present disclosure is not limited to the above-described embodiments and various modifications are possible. The above-described embodiments are provided as examples to facilitate understanding of the present disclosure and are not necessarily limited to those including all of the described configurations. Furthermore, it is possible to replace part of the configuration of one embodiment with the configuration of another embodiment, or to add the configuration of another embodiment to the configuration of one embodiment. It is also possible to delete part of the configuration of each embodiment, or to add or replace other configurations. Furthermore, the control lines and information lines shown in the figures are those considered necessary for explanation, and do not necessarily represent all control lines and information lines necessary for the product. In reality, it is acceptable to consider that almost all configurations are interconnected. Possible modifications of the above-described embodiments include, for example, the following:

[0070] (1) In each of the above embodiments, the arrangement positions and number of capacitor coils 105, 203 may be changed as appropriate, and as described above, capacitor coils 105, 203 may be replaced with electrodes.

[0071] (2) Since the hardware of the GUI device 206, the computer system 207, and the controller 208 in each of the above embodiments can be realized by a general computer, the programs for executing the various processes described above may be stored on a storage medium (a computer-readable storage medium on which the programs are recorded) or distributed via a transmission path.

[0072] (3) In the above embodiments, the various processes executed by the GUI device 206, the computer system 207, and the controller 208 have been described as software processes using programs. However, some or all of these processes may be replaced with hardware processes using an ASIC (Application Specific Integrated Circuit) or an FPGA (Field Programmable Gate Array), etc.

[0073] (4) The various processes executed by the GUI device 206, the computer system 207, and the controller 208 in each of the above embodiments may be executed by a server computer via a network (not shown), and the various data stored in the above embodiments may also be stored in the server computer.

[0074] [Effects of the embodiment] As described above, according to the embodiment, the movement mechanism 107 in the charged particle beam device (100, 200) has a first function of moving the charged particle source support member (106) in the X, Y, and Z directions, and a second function of moving the charged particle source support member (106) in the Z direction from outside the vacuum chamber 101, separately from the first function. As a result, the force in the Z direction applied to the charged particle source support member (106) can be borne by the first function and the second function, and therefore, high-precision position adjustment is possible by both functions, thereby realizing appropriate position adjustment of the charged particle source.

[0075] Furthermore, it is more preferable that the moving mechanism 107 includes a first moving device 10 having a first function and a second moving device 30 having a second function, and that the second moving device 30 is installed outside the vacuum chamber 101. By installing the second moving device 30 outside the vacuum chamber 101 in this way, the second moving device 30 can be easily handled and the temperature of the second moving device 30 can also be suppressed.

[0076] Furthermore, it is more preferable that the charged particle source support member (106) has a cylindrical shape with a male screw portion 106a formed on the outer circumferential surface, and the first moving device 10 includes a rotating member 12 having a female screw portion that screws into the male screw portion 106a and that moves the charged particle source support member (106) in the Z direction when rotated. In this way, the charged particle source support member (106) can be moved by rotating the rotating member 12.

[0077] It is more preferable to further provide a position identification unit 130 that identifies the position of the charged particle source support member (106) adjusted by the first moving device 10. This makes it possible to move the charged particle source support member (106) while quantitatively detecting the position of the charged particle source support member (106).

[0078] Furthermore, it is more preferable that the charged particle beam device (100, 200) further includes a controller 208 that outputs a position command signal that commands the position of the charged particle source support member (106), and a drive unit 210 that drives the movement mechanism 107 based on the position command signal. This allows a user to remotely control the movement mechanism 107.

[0079] According to another aspect, the charged particle beam device 200 of the seventh to ninth embodiments includes one or more detectors 204 that detect charged particles transmitted through a sample 205, charged particles emitted from the sample 205, or electromagnetic waves emitted from the sample 205, and a user interface device (206), and the user interface device (206) has a function of displaying an output signal when the detector 204 detects a charged particle or an electromagnetic wave, and a function of adjusting the position of the charged particle source (103) by a moving mechanism 107 based on a user operation. This allows the user to adjust the position of the charged particle source (103) by the moving mechanism 107 while referring to various signals displayed on the user interface device (206). [Explanation of symbols]

[0080] 10 First mobile device 12 Rotating member 30 Second mobile device 100 Electron gun (charged particle gun, charged particle beam device) 101 Vacuum Chamber 103 Electron source (charged particle source) 104 Electron beam (charged particle beam) 105 Condenser coil (focusing lens) 106 Electron source support member (charged particle source support member) 106a Male thread 107 Moving mechanism 130 Location identification part 200 Charged particle beam device 203 Condenser coil (focusing lens) 204 detector 205 samples 206 GUI Device (User Interface Device) 208 Controller 210 Drive unit

Claims

1. A charged particle beam device comprising: a charged particle gun that irradiates a charged particle beam; and a focusing lens, the focusing lens focuses the charged particles by an electric field or a magnetic field and irradiates the charged particles onto the sample; The charged particle gun comprises: a charged particle source that emits charged particles; a vacuum chamber surrounding the charged particle source; a charged particle source support member that directly or indirectly supports the charged particle source; a moving mechanism for moving the charged particle source support member; Equipped with The moving mechanism includes: a first function of defining a traveling direction of charged particles emitted from the charged particle source as a Z direction, a direction perpendicular to the Z direction as an X direction, and a direction perpendicular to the Z direction and the X direction as a Y direction, and moving the charged particle source support member in the X direction, the Y direction, and the Z direction; a second function of moving the charged particle source support member in the Z direction from outside the vacuum chamber, separately from the first function. A charged particle beam device characterized by:

2. the movement mechanism includes a first movement device having the first function and a second movement device having the second function; The second moving device is installed outside the vacuum chamber.

2. The charged particle beam device according to claim 1, wherein the charged particle beam is a diffusing beam.

3. the charged particle source support member has a cylindrical shape with a male screw portion formed by threading a male screw on an outer circumferential surface, The first moving device includes a rotating member that has a female screw portion that screws into the male screw portion and moves the charged particle source support member in the Z direction when rotated.

3. The charged particle beam device according to claim 2, wherein the charged particle beam is a diffusing beam.

4. a position determining unit that determines the position of the charged particle source support member adjusted by the first moving device; 4. A charged particle beam device according to claim 2 or 3.

5. a controller that outputs a position command signal that commands a position of the charged particle source support member; a drive unit that drives the movement mechanism based on the position command signal.

5. The charged particle beam device according to claim 4.

6. A charged particle beam device that irradiates a sample with a focused charged particle beam, comprising: a charged particle source that emits charged particles; a vacuum chamber surrounding the charged particle source; a charged particle source support member that directly or indirectly supports the charged particle source; a moving mechanism for moving the charged particle source support member; one or more detectors for detecting charged particles transmitted through the sample, charged particles emitted from the sample, or electromagnetic waves emitted from the sample; a user interface device; Equipped with The user interface device a function of displaying an output signal when the detector detects a charged particle or an electromagnetic wave; and a function of adjusting the position of the charged particle source by a movement mechanism based on a user operation. A charged particle beam device characterized by:

7. The moving mechanism includes: a first function of defining a traveling direction of charged particles emitted from the charged particle source as a Z direction, a direction perpendicular to the Z direction as an X direction, and a direction perpendicular to the Z direction and the X direction as a Y direction, and moving the charged particle source support member in the X direction, the Y direction, and the Z direction; a second function of moving the charged particle source support member in the Z direction from outside the vacuum chamber, separately from the first function.

7. A charged particle beam device according to claim 6.

8. the movement mechanism includes a first movement device having the first function and a second movement device having the second function; The second moving device is installed outside the vacuum chamber.

8. A charged particle beam device according to claim 7.

9. a controller that outputs a position command signal that commands a position of the charged particle source support member; a drive unit that drives the movement mechanism based on the position command signal.

9. A charged particle beam device according to claim 6, wherein the charged particle beam is a beam of a charged particle having a diameter of 100 nm.

10. a charged particle source that emits charged particles; a vacuum chamber surrounding the charged particle source; a charged particle source support member that directly or indirectly supports the charged particle source; a moving mechanism for moving the charged particle source support member; Equipped with the charged particle source support member has a cylindrical shape with a male screw portion formed by threading a male screw on an outer circumferential surface, The moving mechanism includes: a rotating member that has a female screw portion that screws into the male screw portion and that, when rotated, moves the charged particle source support member in the Z direction, which is the traveling direction of the charged particles emitted from the charged particle source; A charged particle gun characterized by:

11. The moving mechanism includes: The charged particle source support member is movable in the Z direction from outside the vacuum chamber.

11. The charged particle gun according to claim 10.

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