Cleaning method and cleaning apparatus

The cleaning method addresses the inefficiencies of conventional ultrasonic cleaning by alternating immersion and exposure of 3D objects in a liquid, using ultrasonic waves and vibration to enhance the removal of uncured material from recesses, achieving improved cleaning efficiency and reduced liquid usage.

JP2026014698AActive Publication Date: 2026-01-29SK FINE CO LTD
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Patent Information

Application Number
JP2024116079
Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
Filing Date
2024-07-19
Publication Date
2026-01-29
Estimated Expiration
2044-07-19

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Abstract

To provide a technique capable of effectively removing an uncured material from a shaped article.SOLUTION: The cleaning apparatus 1 includes a cleaning tank 10, a cleaning liquid supply part 20, a support tool 30, and a swing mechanism 40. The cleaning tank 10 is configured to accommodate the cleaning liquid Wq and the manufactured object 9. The support tool 30 supports the manufactured object 9 in the cleaning tank 10. The swing mechanism 40 swings the object 9 supported by the support tool 30 relative to the liquid surface Ls of the cleaning liquid Wq stored in the cleaning tank 10. The swing mechanism 40 alternately repeats a stage ST1 of immersing at least a part of the manufactured object 9 below the liquid surface Ls of the cleaning liquid Wq and a stage ST2 of exposing at least a part of the manufactured object 9 above the liquid surface Ls of the cleaning liquid Wq.SELECTED DRAWING: Figure 3
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Description

[Technical Field]

[0001] FIELD OF THE INVENTION The subject matter disclosed herein relates to cleaning methods and apparatus. [Background technology]

[0002] One known 3D optical fabrication method is to apply a photocurable resin to a flat surface and then expose it to ultraviolet light by laser scanning. Specifically, a paste-like material called a slurry, which is a mixture of photocurable resin (liquid) and ceramic powder, is thinly applied to a modeling table, and the desired area is then exposed to ultraviolet light by laser scanning to harden the resin. A 3D object is obtained by repeatedly applying and hardening the resin. After the 3D object is obtained, the 3D structure is washed to remove unhardened materials, including unhardened photocurable resin.

[0003] When a three-dimensional object has recesses such as holes or grooves, uncured material is likely to remain in the recesses. For this reason, there is a need for an effective method for cleaning the uncured material. For example, Patent Document 1 discloses a method for cleaning a three-dimensional object.

[0004] Patent Document 1 discloses a cleaning device that cleans a metal additive manufacturing object that has been manufactured by stacking tanks that have been fused or sintered with laser light. In this cleaning device, a container is filled with a liquid containing a mixture of multiple organic solvents, and ultrasonic waves are transmitted to the metal additive manufacturing object immersed in the liquid to remove unnecessary powder adhering to the metal additive manufacturing object. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Publication No. 2023-167583 [Patent Document 2] Japanese Patent Publication No. 2022-051427 [Patent Document 3] Japanese Patent Application Publication No. 2023-054997 Summary of the Invention [Problem to be solved by the invention]

[0006] However, in the conventional technology, ultrasonic cleaning is performed while the entire object is immersed in a liquid, so depending on the shape of the object, it may be difficult to sufficiently remove uncured material.

[0007] An object of the present invention is to provide a technique that can effectively remove uncured material from a shaped object. [Means for solving the problem]

[0008] To solve the above problems, a first aspect of the present invention is a cleaning method for cleaning a shaped object, comprising: (a) a step of alternately and repeatedly immersing at least a portion of the shaped object below the surface of a cleaning liquid and a step of exposing at least a portion of the shaped object above the surface of the cleaning liquid.

[0009] A second aspect is the cleaning method according to the first aspect, wherein the step (a) includes a step of raising and lowering the shaped object relative to the cleaning liquid.

[0010] A third aspect is the cleaning method according to the first aspect, wherein the step (a) includes a step of vibrating the shaped object, the surface of the cleaning liquid, or both, by ultrasonic waves.

[0011] A fourth aspect is the cleaning method of the first aspect, wherein the step (a) includes a step of vibrating the surface of the cleaning liquid.

[0012] A fifth aspect is the cleaning method according to the fourth aspect, wherein the step (a) includes a step of shaking a cleaning tank in which the cleaning liquid is stored.

[0013] A sixth aspect is the cleaning method of the first aspect, further comprising (b) a step of placing the shaped object and cleaning liquid in a soft bag prior to step (a), wherein step (a) includes a step of alternately repeating a step of immersing the soft bag in liquid and a step of lifting the soft bag out of the liquid.

[0014] A seventh aspect is a cleaning method according to any one of the first to sixth aspects, further comprising the step of (c) removing the shaped object from the stored cleaning liquid after step (a), during step (a), or both, and sucking out the cleaning liquid from within the shaped object.

[0015] An eighth aspect is the cleaning method according to the seventh aspect, wherein the step (c) includes a step of pressing the shaped object against an adsorbent.

[0016] A ninth aspect is a cleaning device for cleaning a molded object, comprising: a cleaning tank configured to contain a cleaning liquid and a molded object; a support that supports the molded object in the cleaning tank; and a swinging mechanism that swings the molded object supported by the support relative to the surface of the cleaning liquid stored in the cleaning tank, wherein the swinging mechanism alternately performs a step of immersing at least a portion of the molded object below the surface of the cleaning liquid and a step of exposing at least a portion of the molded object above the surface of the cleaning liquid. [Effects of the Invention]

[0017] According to the first to ninth aspects, by repeatedly inserting and removing at least a portion of the object into and from the surface of the cleaning liquid, the cleaning liquid can easily enter and exit the recesses of the object, thereby effectively removing the uncured material remaining on the object.

[0018] According to the cleaning method of the second aspect, the shaped object is raised and lowered so that at least a portion of the shaped object is moved in and out of the surface of the cleaning liquid, thereby making it possible to effectively remove uncured material from within the shaped object.

[0019] According to the cleaning method of the third aspect, by vibrating the shaped object, the surface of the cleaning liquid, or both, with ultrasonic waves, at least a part of the shaped object can be easily moved in and out of the surface of the cleaning liquid.

[0020] According to the cleaning method of the fourth aspect, by oscillating the liquid surface, at least a part of the shaped object can be easily put in and taken out from the liquid surface of the cleaning liquid.

[0021] According to the cleaning method of the fifth aspect, by oscillating the cleaning tank, at least a part of the shaped object can be easily moved in and out of the surface of the cleaning liquid.

[0022] According to the cleaning method of the sixth aspect, the amount of cleaning liquid used can be reduced.

[0023] According to the cleaning method of the seventh aspect, the uncured material in the recesses of the shaped object can be discharged together with the cleaning liquid.

[0024] According to the cleaning method of the eighth aspect, the uncured material in the recesses of the shaped object can be efficiently discharged. [Brief explanation of the drawings]

[0025] [Figure 1] 1 is a diagram schematically illustrating a configuration of a cleaning device according to an embodiment. [Figure 2] 1A to 1C are diagrams showing the flow of a cleaning method according to an embodiment. [Figure 3] 3 is a diagram showing a cleaning device that performs the vibration cleaning step shown in FIG. 2. FIG. [Figure 4] FIG. 3 is a diagram schematically illustrating the suction process shown in FIG. 2. [Figure 5] FIG. 10 is a diagram conceptually showing a modified example of the suction process. [Figure 6A] 10 is a diagram showing the cleaning tank 10 before the swing mechanism 40 starts the swing cleaning step S1 of the first modified example. FIG. [Figure 6B] FIG. 10 is a diagram schematically illustrating a swing cleaning step according to a first modified example. [Figure 7] FIG. 10 is a diagram schematically illustrating a swing cleaning step according to a second modified example. [Figure 8] FIG. 10 is a diagram schematically illustrating a swing cleaning step according to a third modified example. [Figure 9] FIG. 10 is a diagram schematically illustrating a swing cleaning step according to a fourth modified example. [Figure 10] FIG. 13 is a diagram schematically illustrating a swing cleaning step according to a fifth modified example. [Figure 11] FIG. 13 is a diagram schematically illustrating a swing cleaning step according to a sixth modified example. [Figure 12] FIG. 13 is a diagram schematically illustrating a swing cleaning step according to a seventh modified example. [Figure 13] FIG. 10 is a diagram illustrating an example of a shaped object. DETAILED DESCRIPTION OF THE INVENTION

[0026] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. Note that the components described in the embodiment are merely examples and are not intended to limit the scope of the present invention. In the drawings, the dimensions and numbers of each part may be exaggerated or simplified as necessary to facilitate understanding.

[0027] <1. Embodiment> FIG. 1 is a diagram schematically illustrating the configuration of a cleaning apparatus 1 according to an embodiment. The cleaning apparatus 1 is an apparatus used when manufacturing a three-dimensionally shaped object (hereinafter referred to as a "shaped object"), and is an apparatus that removes unnecessary materials remaining on the shaped object 9 by cleaning the shaped object 9. The shaped object 9 to be processed is, for example, a layered object formed by stacking layers of cured photocurable resin. Specifically, the shaped object 9 is manufactured by three-dimensional optical lithography as described in Patent Document 2 (JP 2022-051427 A) or Patent Document 3 (JP 2023-054997 A). The shaped object 9 may also be formed by powder sintering layered manufacturing as described in Patent Document 1, etc.

[0028] The cleaning device 1 is a device for removing uncured materials, such as uncured photocurable resin, remaining on the shaped object 9 from the shaped object 9. The uncured materials include uncured resin, curing initiator, ceramic powder, metal powder or dispersant, plasticizer, leveling agent, photosensitizer, and the like.

[0029] In this example, the shaped object 9 (see FIG. 13) has one or more recesses, such as holes (through holes or holes with a bottom) or grooves. The hole may have a linear or spiral shape, for example. The cross-sectional shape of the hole may be a circle or a polygon.

[0030] 1, the cleaning device 1 includes a cleaning tank 10, a cleaning liquid supply unit 20, a support 30, a swing mechanism 40, an ultrasonic wave generator 50, and a controller 60. The configuration and function of each element of the cleaning device 1 will be described below in order.

[0031] The shape of the cleaning tank 10 is not particularly limited, and may be, for example, a rectangular / cubic container with an open top, or a cylindrical container with a bottom. The cleaning tank 10 may be provided with a heater for heating the cleaning liquid Wq. The cleaning tank 10 is configured to accommodate the shaped object 9 and the cleaning liquid Wq therein.

[0032] The type of cleaning liquid Wq is not particularly limited, but may be, for example, a glycol-based solution, glycol ethers, or hydrocarbons. The glycol-based solution may be polyethylene glycol. The hydrocarbons may be terpenes. Specifically, the cleaning liquid Wq may be an aqueous solution containing diethylene glycol monobutyl ether and a nonionic surfactant. Using a glycol-based solution as the cleaning liquid Wq can reduce swelling, evaporation, and drying of the molded object, and can also reduce damage such as cracks on the molded object. The cleaning liquid Wq may also be an aqueous solution containing a surfactant, or an alcohol-based solution (isopropyl alcohol (IPA), ethanol, benzyl alcohol, etc.). The cleaning liquid Wq may also contain additives such as surfactants, polymeric dispersants, and rust inhibitors in the main solution.

[0033] The cleaning liquid supply unit 20 is a device that supplies the cleaning liquid Wq into the cleaning tank 10. The cleaning liquid supply unit 20 has a nozzle 21, a cleaning liquid tank 23, a supply pipe 25, and a circulation pipe 27. The nozzle 21 ejects the cleaning liquid Wq into the cleaning tank 10. The nozzle 21 is, for example, a shower nozzle that ejects the cleaning liquid Wq in the form of dispersed droplets. By using a shower nozzle, the cleaning liquid can be supplied over a wide area. The nozzle 21 may also be a straight nozzle that directly sprays the cleaning liquid Wq.

[0034] The cleaning liquid tank 23 is a tank that can store unused cleaning liquid Wq. The supply pipe 25 forms a path for supplying the cleaning liquid Wq. The supply pipe 25 is connected between the cleaning liquid tank 23 and the nozzle 21. A supply pump 251 and an on-off valve 253 are arranged in the supply pipe 25. The supply pump 251 pressure-feeds the cleaning liquid Wq from the cleaning liquid tank 23 toward the nozzle 21. The supply pump 251 is driven by, for example, an electric motor. The on-off valve 253 is arranged downstream of the supply pump 251 to control the flow of the cleaning liquid Wq. The on-off valve 253 is, for example, an electromagnetic valve. The supply pump 251 and the on-off valve 253 are controlled by the control unit 60.

[0035] The circulation pipe 27 forms a path for circulating the cleaning liquid stored in the cleaning tank 10. The circulation pipe 27 is connected to the cleaning tank 10 and the supply pipe 25. More specifically, a first end of the circulation pipe 27 is connected to the bottom of the cleaning tank 10, and a second end of the circulation pipe 27 is connected to a portion of the supply pipe 25 downstream of the on-off valve 253. A filter may be provided in the supply pipe 25 to remove foreign matter from the cleaning liquid flowing through the supply pipe 25.

[0036] A circulation pump 271, an on-off valve 273, and a filter 275 are arranged in the circulation pipe 27. The circulation pump 271 pressure-feeds the cleaning liquid in the cleaning tank 10 toward the supply pipe 25. The circulation pump 271 is driven by, for example, an electric motor. The on-off valve 273 is arranged downstream of the circulation pump 271 to control the flow of the cleaning liquid. The on-off valve 273 is, for example, an electromagnetic valve. The circulation pump 271 and the on-off valve 273 are controlled by the control unit 60. The filter 275 is provided to remove foreign matter from the cleaning liquid flowing through the circulation pipe 27. The filter 275 is provided upstream or downstream of the circulation pump 271.

[0037] A heater for heating the cleaning liquid Wq may be provided in the supply pipe 25 or the circulation pipe 27. The cleaning liquid supply unit 20 may also include a mechanism for moving the nozzle 21 up and down, back and forth, left and right, etc. The cleaning liquid supply unit 20 may also be configured to supply not only one type of cleaning liquid but also multiple types of cleaning liquid to the cleaning tank 10.

[0038] The support 30 is a member for supporting the object 9 in the cleaning tank 10. The support 30 is, for example, a cage formed in a rectangular parallelepiped shape. In this example, the support 30 has a bottom 31, a lid 33, and sidewalls 35. The bottom 31, the lid 33, and the sidewalls 35 have a number of meshes that allow the cleaning liquid Wq to pass through. The shapes of the bottom 31 and the lid 33 are not particularly limited. They may be flat and facing each other vertically, or they may not be flat to fit the object 9, and may be made of an elastic material such as netting. The sidewalls 35 connect the bottom 31 and the lid 33 vertically. The lid 33 is openable and closable relative to the sidewalls 35. The object 9 is fixed to the support 30 by being sandwiched between the bottom 31 and the lid 33. Note that it is not essential that the object 9 be fixed to the support 30. For example, the lid portion 33 may be omitted.

[0039] The swing mechanism 40 is connected to the support 30 and is a device that moves the support 30 back and forth in the vertical direction. The swing mechanism 40 is configured by, for example, a linear motor, a ball screw mechanism, a hydraulic or pneumatic cylinder, or a cam mechanism. The swing mechanism 40 is controlled by the control unit 60.

[0040] The ultrasonic wave generating unit 50 is disposed on the upper surface of the bottom of the cleaning tank 10. The ultrasonic wave generating unit 50 is capable of transmitting ultrasonic waves upward. The ultrasonic wave generating unit 50 may be disposed on the side wall of the cleaning tank 10. The ultrasonic wave generating unit 50 may also be configured to transmit ultrasonic waves in the horizontal direction. The ultrasonic waves emitted by the ultrasonic wave generating unit 50 are preferably spherical waves, but may also be plane waves. The frequency of the ultrasonic waves is preferably 10 kHz to several hundred kHz.

[0041] The control unit 60 manages or controls the cleaning process in the cleaning apparatus 1 by controlling the operation of the cleaning apparatus 1. The control unit 60 has a processor 61, a memory 63, a display 65, an input device 67, and a bus 69.

[0042] The processor 61 has a CPU that controls the overall operation of the control unit 60. The memory 63 is a device for storing the program P and various data. The memory 63 has a volatile memory such as RAM, or a non-volatile memory such as flash memory. The memory 63 may also have an auxiliary storage device such as a hard disk drive (HDD) or a solid state drive (SSD). The processor 61 executes the program P stored in the memory 63, causing the control unit 60 to manage and control the cleaning process.

[0043] The display 65 is an output device for visually displaying various types of information. The input device 67 is an interface for receiving input from a user. The input device 67 includes, for example, a mouse and a keyboard. The input device 67 may also include a touch panel integrated with the display 65. The bus 69 is a path for transmitting data and control signals. The processor 61 is electrically connected to the memory 63, the display 65, and the input device 67 via the bus 69.

[0044] 2 is a diagram showing the flow of the cleaning method according to the embodiment. In the cleaning method according to the present embodiment, a swing cleaning step S1 and a suction step S2 are carried out in this order. Each step will be explained below.

[0045] FIG. 3 is a diagram showing the cleaning apparatus 1 that executes the oscillation cleaning step S1 shown in FIG. 2. Note that, before the oscillation cleaning step S1 is performed, the model 9 is placed in the cleaning tank 10 by the support 30. The cleaning liquid is supplied into the cleaning tank 10 by being sent from the cleaning liquid tank 23 to the nozzle 21. At this time, the cleaning liquid may be dispersed from the nozzle 21 and supplied to the model 9. This may improve the cleaning efficiency of the model 9. When the amount of the cleaning liquid Wq exceeds a certain amount, the supply of the cleaning liquid Wq is stopped. Note that the supply amount of the cleaning liquid Wq may be a predetermined constant value, or may be automatically set by the control unit 60 according to the shape and size of the model 9 estimated based on 3D data or the like.

[0046] After the cleaning liquid Wq is supplied to the cleaning tank 10, the oscillation cleaning step S1 is performed. The oscillation cleaning step S1 is a step in which the model 9 is oscillated relative to the liquid surface Ls of the cleaning liquid Wq stored in the cleaning tank 10. Specifically, as shown in Fig. 3, the oscillation mechanism 40 moves the support tool 30 up and down, thereby moving the model 9 into and out of the cleaning liquid Wq. That is, a stage ST1 in which the entire model 9 is immersed in the cleaning liquid Wq and a stage ST2 in which the entire model 9 is exposed from the cleaning liquid Wq are alternately repeated a predetermined number of times.

[0047] In step ST1, it is not essential to immerse the entire object 9 in the cleaning liquid Wq, and only a part of the object 9 may be immersed. In step ST2, it is not essential to expose the entire object 9 from the cleaning liquid Wq, and only a part of the object 9 may be exposed from the cleaning liquid Wq. That is, in the vibration cleaning step S1, a step of immersing at least a part of the object 9 below the liquid surface Ls of the cleaning liquid Wq and a step of exposing the part of the object 9 above the liquid surface Ls of the cleaning liquid Wq are alternately and repeatedly performed.

[0048] In this way, by oscillating the object 9 relative to the cleaning liquid Wq, high pressure can be applied to recesses in the object 9, such as holes (through holes or holes with a bottom) or grooves (long, narrow depressions located on the surface). This allows the uncured material in the recesses to be pushed out into the cleaning liquid, thereby effectively removing the uncured material. In particular, by raising and lowering the object 9, at least a portion of the object 9 is moved in and out of the liquid surface Ls of the cleaning liquid Wq, thereby enhancing the cleaning effect.

[0049] Furthermore, although immersing the object 9 in the cleaning liquid Wq may cause air to enter the recesses of the object 9, the air is expelled from the recesses by shaking the object 9, and the cleaning liquid Wq can be permeated into the recesses instead. Therefore, the uncured material can be properly removed from the recesses.

[0050] Furthermore, the oscillation of the shaped object 9 facilitates capillary action, which allows the cleaning liquid Wq to be sucked into the narrow recesses, dispersing the uncured material in the cleaning liquid Wq. This allows the uncured material to be removed efficiently.

[0051] Furthermore, the cleaning liquid Wq is agitated by the vibration of the shaped object 9, which makes it possible to homogenize the cleaning liquid Wq in the cleaning tank 10. This improves the cleaning effect.

[0052] During the vibration cleaning process S1, the ultrasonic generator 50 may transmit ultrasonic waves to enhance the cleaning effect. During the vibration cleaning process S1, the cleaning effect may be enhanced by supplying a cleaning liquid from the nozzle 21 to the model 9. In this case, the cleaning liquid Wq circulated through the circulation pipe 27 may be supplied to the model 9. This allows the cleaning liquid Wq to be supplied to the model 9 without using new cleaning liquid Wq. This reduces the consumption of the cleaning liquid Wq and reduces the environmental impact.

[0053] Furthermore, during the vibration cleaning step S1, a lid may be attached to the top of the cleaning tank 10 to close the upper end of the cleaning tank 10. This reduces the scattering of the cleaning liquid Wq in the cleaning tank 10 to the surrounding area. Furthermore, prior to the vibration cleaning step S1, the shaped object 9 may be vibrated while the shaped object 9 is in a dry state to remove foreign matter.

[0054] 4 is a diagram schematically illustrating the suction step S2 shown in FIG. 2. The suction step S2 is a step of removing the model 9 from the cleaning liquid Wq stored in the cleaning tank 10 and suctioning out the cleaning liquid Wq from the model 9. In the example shown in FIG. 4, an adsorbent 71 is used in the suction step S2. The adsorbent 71 is, for example, a sponge, a waste cloth (including wipers, wipes, and cloths), or a pad. The material of the adsorbent 71 may be any material that can absorb the cleaning liquid Wq. Specifically, natural fibers such as pulp and cellulose, chemical fibers such as polyester, polypropylene, rayon, and acrylic, water-absorbent resins, oil-absorbent resins, etc. may be used.

[0055] As shown in Fig. 4, in the suction step S2, the model 9 is brought into contact with the adsorbent 71. As a result, the cleaning liquid Wq in the recesses 91 (through holes in Fig. 4) of the model 9 is sucked out into the adsorbent 71. The cleaning liquid Wq in the recesses 91 of the model 9 may contain uncured material, or the uncured material may be separated from the cleaning liquid Wq and remain in the recesses 91. By sucking out the cleaning liquid Wq, the uncured material in the recesses 91 is appropriately discharged together with the cleaning liquid Wq.

[0056] The suction step S2 may be automatically performed within the cleaning apparatus 1. For example, the adsorbent 71 may be disposed on the outside or inside of the cleaning tank 10, and the swinging mechanism 40 may move the support 30 to bring the model 9 into contact with the adsorbent 71. Alternatively, the user may remove the model 9 from the support 30 and bring it into contact with the adsorbent 71.

[0057] The suction step S2 may be performed after the oscillation cleaning step S1 or during the oscillation cleaning step S1. Furthermore, the oscillation cleaning step S1 may be performed both after the oscillation cleaning step S1 and during the oscillation cleaning step S1.

[0058] The adsorbent material 71 is a material that is more flexible than the model 9. Therefore, the model 9 can be fitted to the adsorbent material 71, and suction can be performed efficiently. In addition, damage to the model 9 can be reduced, and the surface of the model 9 can be protected.

[0059] It should be noted that the use of the adsorbent 71 is not essential in the suction step S2. FIG. 5 is a conceptual diagram illustrating a modified example of the suction step S2. For example, the cleaning liquid Wq may be suctioned by rotating the model 9 to apply centrifugal force, vibrating the model 9, placing the model 9 in a low-pressure space lower than atmospheric pressure (vacuuming), or by suction using a suction device. In the case of vacuuming, a highly vaporizable component (e.g., alcohol) may be mixed into the cleaning liquid Wq. In this case, the uncured material is more likely to be pushed out of the recesses 91 due to pressure fluctuations caused by the evaporation of the cleaning liquid Wq. This allows the uncured material to be efficiently discharged.

[0060] The control unit 60 may set the rocking time (or the number of rocking times) according to the shape or size of the model 9 based on the 3D data. By doing so, the cleaning conditions are automatically optimized regardless of the user's level of skill, and the model 9 can be properly cleaned. Alternatively, the user may operate the input device 67 to set the control unit 60. Alternatively, the user may directly set the cleaning liquid supply unit 20, the support tool 30, the rocking mechanism 40, and the ultrasonic wave generation unit 50 without using the input device 67 or the control unit 60.

[0061] The swing mechanism 40 of this embodiment swings the shaped object 9 relative to the liquid surface Ls of the cleaning liquid Wq by vertically reciprocating the support tool 30, but the swing mechanism 40 is modifiable.

[0062] Fig. 6A is a diagram showing the cleaning tank 10 before the swing mechanism 40 starts the swing cleaning step S1 of the first modified example. Fig. 6B is a diagram showing the swing cleaning step S1 of the first modified example. The swing mechanism 40 has, for example, an electric motor and can swing the cleaning tank 10 around an axis A1 parallel to the horizontal direction (see Fig. 6B).

[0063] In this modification, as shown in Fig. 6A, the support 30 supports the object 9 in the cleaning tank 10. The cleaning liquid Wq is supplied into the cleaning tank 10 to such an extent that the top of the object 9 is exposed above the liquid level Ls. Then, as shown in Fig. 6B, the swing mechanism 40 swings the cleaning tank 10 around the axis A1. As a result, the support 30 and the object 9 swing around the axis A1.

[0064] As shown in FIG. 6B, the swinging mechanism 40 repeatedly performs a step of immersing a part 9p of the object 9 below the liquid surface Ls of the cleaning liquid Wq and a step of exposing the part 9p of the object 9 above the liquid surface Ls of the cleaning liquid Wq.

[0065] 7 is a diagram schematically illustrating the oscillation cleaning step S1 of the second modified example. In this second modified example, the oscillation mechanism 40 moves the cleaning tank 10 back and forth from side to side along one horizontal direction. This movement of the cleaning tank 10 causes the liquid surface Ls of the cleaning liquid Wq to ripple. That is, the liquid surface Ls of the cleaning liquid Wq oscillates relative to the model 9, thereby performing the oscillation cleaning step S1. By oscillating the cleaning tank 10 in this way, at least a portion of the model 9 can be easily moved in and out of the liquid surface Ls of the cleaning liquid Wq.

[0066] FIG. 8 is a diagram schematically illustrating the oscillation cleaning step S1 of the third modified example. In the third modified example, the oscillation mechanism 40 is configured to revolve the cleaning tank 10. That is, the oscillation mechanism 40 rotates the cleaning tank 10 around an axis A2 that is parallel to the vertical direction and away from the center of the cleaning tank 10 while maintaining the orientation of the cleaning tank 10. This causes the liquid surface Ls of the cleaning liquid Wq to ripple. That is, the liquid surface Ls of the cleaning liquid Wq oscillates relative to the model 9, thereby performing the oscillation cleaning step S1. In this way, by oscillating the cleaning tank 10, at least a portion of the model 9 can be easily moved in and out of the liquid surface Ls of the cleaning liquid Wq.

[0067] FIG. 9 is a diagram schematically illustrating the oscillation cleaning step S1 of the fourth modified example. In the fourth modified example, the ultrasonic generator 50 functions as an oscillation mechanism. That is, in the fourth modified example, the ultrasonic generator 50 transmits ultrasonic waves to ripple the liquid surface Ls of the cleaning liquid Wq. As a result, the liquid surface Ls of the cleaning liquid Wq oscillates relative to the model 9, thereby performing the oscillation cleaning step S1. Note that resonance may be caused by ultrasonic waves to form unevenness on the liquid surface Ls. In this way, by oscillating the liquid surface Ls of the cleaning liquid Wq with ultrasonic waves, at least a portion of the model 9 can be easily moved in and out of the liquid surface Ls of the cleaning liquid Wq.

[0068] FIG. 10 is a schematic diagram illustrating the oscillation cleaning step S1 of the fifth modified example. In the fifth modified example, the model 9 is supported in an unfixed state by a support 30 without a lid 33. In this state, the ultrasonic generator 50 transmits ultrasonic waves to ripple the liquid surface Ls of the cleaning liquid Wq. Furthermore, by leaving the model 9 unfixed, the model 9 is oscillated within the support 30 by the pressure of the ultrasonic waves and the pressure of the rippling cleaning liquid Wq. The direction of oscillation of the model 9 can be arbitrarily set by transmitting ultrasonic waves of a predetermined frequency corresponding to the shape of the model 9 from the ultrasonic generator 50. For example, as shown in FIG. 10, the model 9 may be oscillated so that both the left and right ends alternately move up and down. Alternatively, the entire model 9 may be oscillated so that it vibrates up and down or left and right. By oscillating the model 9 together with the liquid surface Ls in this way, the pressure fluctuations applied from the liquid surface Ls to the model 9 are increased. This improves the cleaning effect.

[0069] FIG. 11 is a diagram schematically illustrating the oscillation cleaning step S1 of the sixth modified example. In the sixth modified example, a soft bag 73 is used. The soft bag 73 is a bag-shaped container made of a flexible film. The soft bag 73 can be made of a synthetic resin, such as polyethylene, polypropylene, nylon, or laminated film. The soft bag 73 has an opening for inserting and removing the model 9 and cleaning solution, and the opening is appropriately sealed with a zipper, a seal, a cap, or the like. The soft bag 73 is preferably transparent so that the inside can be seen. The oscillation mechanism 40 is configured to move one or more soft bags 73 up and down in a reciprocating manner.

[0070] The model 9 and the cleaning liquid Wq are accommodated in the soft bag 73 before the vibration cleaning step S1. At this time, air is also introduced into the soft bag 73. A liquid (e.g., water) different from the cleaning liquid Wq is stored in the cleaning tank 10 in advance. In the vibration cleaning step S1, as shown in FIG. 11 , a stage ST11 in which the soft bag 73 is immersed in the external liquid and a stage ST12 in which the soft bag 73 is pulled up from the external liquid are alternately repeated. As the soft bag 73 is pulled up and down, it is pushed by the external liquid and deformed. As a result, a stage in which a part 9p of the model 9 is immersed below the liquid level Ls of the cleaning liquid Wq stored in the soft bag 73 and a stage in which the part 9p is exposed above the liquid level Ls are alternately repeated.

[0071] When the soft bag 73 is put in and taken out of an external liquid, the movement of the external liquid moves the cleaning liquid Wq and the model 9 inside the soft bag 73. This improves the cleaning effect. Also, the amount of cleaning liquid Wq used can be reduced. This reduces the environmental impact.

[0072] 12 is a diagram schematically illustrating the oscillation cleaning step S1 of the seventh modified example. In the seventh modified example, the bottom 31 of the support 30 is a meshed member, and the other portions (lid 33 and side wall 35) are composed of closed members without mesh. The oscillation mechanism 40 is capable of injecting and evacuating air into and from the internal space of the support 30. The oscillation mechanism 40 is composed of a pipe connected to the support 30, an air pump, a valve, and the like attached to the pipe.

[0073] Prior to the oscillation cleaning step S1, the support tool 30 containing the model 9 is placed in the cleaning tank 10. The cleaning liquid Wq is stored in the cleaning tank 10. At this time, the cleaning liquid Wq is stored to such an extent that the upper part (part 9p) of the model 9 placed in the cleaning tank 10 is exposed above the liquid surface Ls of the cleaning liquid Wq. In this state, the oscillation cleaning step S1 is performed. That is, the oscillation mechanism 40 alternately supplies and exhausts air into the support tool 30. As a result, the air pressure P A Specifically, the pressure P A is the air pressure P outside the support 30 B When the pressure P A The pressure P outside the support 30 B When the liquid level Ls inside the support 30 becomes smaller, the liquid level Ls inside the support 30 becomes higher than the liquid level Ls outside the support 30 (stage ST22). Furthermore, the liquid level Ls inside the support 30 oscillates up and down relative to the model 9 supported in the support 30. As a result, stage ST21 in which a part 9p of the model 9 is exposed above the liquid level Ls and stage ST22 in which a part 9p of the model 9 is immersed below the liquid level Ls are alternately and repeatedly executed.

[0074] In the above example, the position of the bottom 31 may be elevated so that the entire object 9 accommodated in the cleaning tank 10 is exposed above the liquid level Ls of the cleaning liquid Wq. In this case, a step of exposing the entire object 9 above the liquid level Ls and a step of immersing the entire object 9 below the liquid level Ls are alternately repeated. Alternatively, the cleaning liquid Wq may be stored in the cleaning tank 10 until the entire object 9 accommodated in the cleaning tank 10 is submerged below the liquid level Ls of the cleaning liquid Wq, and the rocking mechanism 40 may be operated to increase the pressure P A Increase the pressure P outside the support 30 B By increasing the pressure P A By lowering the pressure P outside the support 30 B When the liquid levels Ls are set to the same height inside and outside the support 30, the liquid levels Ls will be the same height inside and outside the support 30. These steps may be repeated alternately.

[0075] The swinging mechanism 40 may be configured to change the pressure PB outside the support 30. For example, the top of the cleaning tank 10 may be closed with a lid, and the swinging mechanism 40 may let air in and out of the space within the closed cleaning tank 10.

[0076] <2. Variations> Although the embodiments have been described above, the present invention is not limited to the above and various modifications are possible. For example, in addition to the vibration cleaning step S1, other cleaning methods may be performed. Examples of other cleaning methods include air blow cleaning, IPA spray cleaning, blast cleaning (wet blasting or dry blasting using dry ice (CO2), etc.), cleaning in which a microbubble generator is installed in the cleaning tank 10 and microbubbles are supplied into the cleaning liquid, cleaning with submerged bubbling, brush cleaning, cleaning by exposure to solvent vapor, foreign matter removal using centrifugal force, and foreign matter removal by vibration.

[0077] Alternatively, the cleaning liquid supply unit 20 may not be provided with the nozzle 21, but rather a supply port may be provided on the bottom or side of the cleaning tank 10, through which the cleaning liquid is supplied. The cleaning liquid supply unit 20 may not be provided, and a user may pour the cleaning liquid into the cleaning tank. Alternatively, the support 30 may not be provided, and the object 9 may be rotated while floating in the cleaning liquid. In this case, the frequency at which the object 9 rotates while floating in the cleaning liquid may be confirmed in advance through experiments. The user may set this frequency in the control unit 60 by operating the input device 67. Alternatively, when cleaning multiple types of objects 9, a combination of identification information for identifying the type of object 9 and the frequency at which each type of object 9 rotates while floating in the cleaning liquid may be stored in the memory 63, and the control unit 60 may automatically set a frequency selected based on the identification information of the object 9 to be cleaned.

[0078] 2, the suction step S2 may be performed one or more times during the oscillation cleaning step S1. For example, the suction step S2 may be performed each time the entire or part of the model 9 is exposed from the cleaning liquid Wq one or more times. The control unit 60 may automatically set the number of times the suction step S2 is performed (i.e., how many times the suction step S2 is performed during the oscillation cleaning step S1) depending on the shape and size of the model 9 estimated based on 3D data or the like.

[0079] Although the present invention has been described in detail, the above description is merely illustrative in all respects and does not limit the present invention. It is understood that countless variations not illustrated can be envisioned without departing from the scope of the present invention. The configurations described in the above embodiments and variations can be combined or omitted as appropriate as long as they are not mutually inconsistent. [Explanation of symbols]

[0080] 1: Cleaning equipment 9: Modeled object 10: Cleaning tank 20: Cleaning liquid supply unit 30: Support 40: Oscillating mechanism 71: Adsorbent 73: Soft bag Ls:Liquid level Wq: cleaning solution

Claims

1. A cleaning method for cleaning a shaped object, comprising: (a) alternately and repeatedly performing a step of immersing at least a portion of the shaped object below the surface of a cleaning liquid and a step of exposing the at least a portion of the shaped object above the surface of the cleaning liquid; A cleaning method comprising:

2. 2. The cleaning method according to claim 1, The cleaning method, wherein the step (a) includes a step of raising and lowering the shaped object relative to the cleaning liquid.

3. 2. The cleaning method according to claim 1, The cleaning method, wherein the step (a) includes a step of vibrating the shaped object, the surface of the cleaning liquid, or both, by ultrasonic waves.

4. 2. The cleaning method according to claim 1, The cleaning method, wherein the step (a) includes a step of vibrating the surface of the cleaning liquid.

5. 5. The cleaning method according to claim 4, The cleaning method, wherein the step (a) includes a step of shaking a cleaning tank in which the cleaning liquid is stored.

6. 2. The cleaning method according to claim 1, (b) prior to step (a), placing the shaped object and the cleaning liquid in a soft bag; further comprising The step (a) includes alternately repeating a step of immersing the soft bag in a liquid and a step of removing the soft bag from the liquid.

7. 7. The cleaning method according to claim 1, further comprising: (c) removing the object from the stored cleaning liquid after step (a), during step (a), or both, and sucking out the cleaning liquid from inside the object; The cleaning method further comprises:

8. 8. The cleaning method according to claim 7, The cleaning method, wherein the step (b) includes a step of pressing the shaped object against an adsorbent.

9. A cleaning device for cleaning a shaped object, comprising: a cleaning tank configured to contain a cleaning solution and a model; a support that supports the object in the cleaning tank; a swinging mechanism that swings the object supported by the support tool relative to a liquid surface of the cleaning liquid stored in the cleaning tank; Equipped with the swinging mechanism alternately and repeatedly performs a step of immersing at least a portion of the shaped object below the surface of the cleaning liquid and a step of exposing at least a portion of the shaped object above the surface of the cleaning liquid.

Citation Information

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