Composition containing hexafluoropropene

Abstract

An object of the present disclosure is to newly provide a composition containing hexafluoropropene.SOLUTION: A composition comprising hexafluoropropene.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present disclosure relates to compositions containing hexafluoropropene. [Background technology]

[0002] Patent Document 1 discloses a method for etching silicon-based materials such as silicon oxide films and / or silicon-containing low dielectric constant films using hexafluoropropene. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] International Publication No. WO02 / 021586-A1 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure aims to provide a novel composition containing hexafluoropropene. [Means for solving the problem]

[0005] The present disclosure encompasses the following configurations.

[0006] Section 1. A composition containing hexafluoropropene, (1) hexafluoropropene, (2) hexafluorocyclopropane, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the (3) hydrogen fluoride, the content of the (3) hydrogen fluoride is 0.05 volume ppm or more and 5 volume ppm or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less, composition.

[0007] Section 2. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene, (2) containing 1 ppm by volume to 1,000 ppm by volume of hexafluorocyclopropane; Item 1. The composition according to item 1.

[0008] Section 3. 1. A method for storing a composition containing hexafluoropropene, comprising: The composition comprises: (1) hexafluoropropene, (2) hexafluorocyclopropane, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the hydrogen fluoride (3), the content of the hydrogen fluoride (3) is 0.05 ppm by volume or more and 5 ppm by volume or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less, method.

[0009] Section 4. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene, (2) containing 1 ppm by volume to 1,000 ppm by volume of hexafluorocyclopropane; The method according to item 3.

[0010] Section 5. A method for suppressing a decrease in the purity of hexafluoropropene in a composition containing hexafluoropropene, comprising the steps of: The composition comprises: (1) hexafluoropropene, (2) hexafluorocyclopropane, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the hydrogen fluoride (3), the content of the hydrogen fluoride (3) is 0.05 ppm by volume or more and 5 ppm by volume or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less, method.

[0011] Section 6. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene, (2) containing 1 ppm by volume to 1,000 ppm by volume of hexafluorocyclopropane; The method according to item 5.

[0012] This disclosure discloses a method for stably transporting a composition containing hexafluoropropene (HFP) and hexafluorocyclopropane (c-C3F6). According to this disclosure, by adjusting the oxygen concentration, hydrogen fluoride concentration, or hydrogen chloride concentration in the HFP-containing composition, it is possible to suppress decomposition of HFP or c-C3F6 when the HFP-containing composition is transported in a cylinder or the like, thereby suppressing a decrease in the purity of HFP or c-C3F6 and maintaining the storage stability of the HFP-containing composition.

[0013] The HFP-containing composition of the present disclosure contains c-C3F6, has improved storage stability, and Even under the harsh conditions of sea transport (such as temperature rise during transport), HFP, suppresses the decomposition of c-C3F6, enabling stable transportation. [Effects of the Invention]

[0014] According to the present disclosure, a new composition containing hexafluoropropene can be provided. DETAILED DESCRIPTION OF THE INVENTION

[0015] In this specification, "containing" is a concept that encompasses all of "comprise," "consist essentially of," and "consist only of." In this specification, when a numerical range is expressed as "A to B," it means "A or more and B or less." When parts, % and the like are used in this specification, these represent parts by mass, parts by weight, mass %, or weight % (wt%).

[0016] [1] Composition containing hexafluoropropene The hexafluoropropene (HFP)-containing compositions of the present disclosure include: (1) Hexafluoropropene (HFP), (2) hexafluorocyclopropane (c-C3F6), and (3) at least one component selected from the group consisting of oxygen (O), hydrogen fluoride (HF), and hydrogen chloride (HCl); Contains With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the (3) hydrogen fluoride, the content of the (3) hydrogen fluoride is 0.05 volume ppm or more and 5 volume ppm or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less.

[0017] The HFP-containing compositions of the present disclosure preferably include: Relative to the total amount of the composition, (1) The HFP is contained in an amount of 95% by volume to 99.99999% by volume, The (2) c-C3F6 is contained in an amount of 1 ppm by volume to 1,000 ppm by volume.

[0018] The present disclosure discloses a method for stably delivering a composition containing HFP and c-C3F6. According to the disclosure, in a composition containing HFP, the oxygen concentration, hydrogen fluoride concentration, or hydrogen chloride concentration By adjusting the element concentration, it is possible to suppress the decomposition of HFP or c-C3F6 when the composition containing HFP is transported in a cylinder or the like, to suppress the decrease in the purity of HFP or c-C3F6, and to maintain the storage stability of the composition containing HFP.

[0019] The HFP-containing composition of the present disclosure contains c-C3F6, has improved storage stability, and Even under the harsh conditions of sea transport (such as temperature rise during transport), HFP, suppresses the decomposition of c-C3F6, enabling stable transportation.

[0020] (1) Hexafluoropropene The HFP-containing composition of the present disclosure contains, as a first component, (1) hexafluoropropene (CF3-CF=CF2, also known as hexafluoropropylene, HFP).

[0021] The HFP-containing composition of the present disclosure contains the first component (1) HFP as a main component. The HFP content in the HFP-containing composition improves storage stability and allows for easy storage in containers, etc. From the viewpoint of suppressing decomposition of HFP or c-C3F6 and transporting it stably even under harsh conditions in marine transportation (such as temperature rise during transportation), the content of HFP or c-C3F6 is preferably 95% by volume to 99.99999% by volume, more preferably 95% by volume to 99.999% by volume, or 96% by volume to 99.99% by volume, and even more preferably 97% by volume to 99.95% by volume, based on the total amount (gas volume) of the composition containing HFP. The content is particularly preferably 98% by volume to 99.9% by volume.

[0022] (2) Hexafluorocyclopropane The HFP-containing composition of the present disclosure contains (2) hexafluorocyclopropane (c-C3F6) as a second component.

[0023] The HFP-containing composition of the present disclosure contains hexafluorocyclopropane (c-C3F6) as a second component, and therefore has improved storage stability and is suitable for marine transport in containers, etc. Even under harsh conditions (such as temperature rise during transportation), HFP, dimer and / or triglyceride This prevents the polymer from decomposing, allowing for stable transportation.

[0024] In the composition containing HFP, the content of c-C3F6 is high, and the storage stability is improved. Even under the harsh conditions of sea transport (such as temperature rise during transport), HFP, From the viewpoint of suppressing the decomposition of c-C3F6 and transporting it stably, the total amount of the composition containing HFP ( The concentration is preferably 1 ppm by volume (ppm by volume) to 1,000 ppm by volume (ppm by volume), more preferably 5 ppm by volume to 500 ppm by volume, even more preferably 5 ppm by volume to 300 ppm by volume, and particularly preferably 5 ppm by volume to 200 ppm by volume, relative to the total gas volume.

[0025] (3) Oxygen, hydrogen fluoride, and hydrogen chloride The HFP-containing composition of the present disclosure contains, as a third component, (3) at least one component selected from the group consisting of oxygen (O2), hydrogen fluoride (HF), and hydrogen chloride (HCl).

[0026] (a) Oxygen (O 2 ) The HFP-containing composition of the present disclosure contains (3) oxygen (O2) as a third component.

[0027] In the composition containing HFP, the content of oxygen (O2) is 0.05 ppm by volume or more and 10 ppm by volume or less based on the total amount (gas volume) of the composition containing HFP. By adjusting the O2 concentration to the above range, the composition containing HFP can be transported in a cylinder or the like. When the decomposition of HFP or c-C3F6 is suppressed, the decomposition of HFP or c-C3F6 in a composition containing HFP is suppressed. suppresses the decrease in the purity of c-C3F6 and maintains the storage stability of the composition containing HFP well. Compositions containing HFP can withstand the harsh conditions of sea transport (export) in containers, etc. Even if the temperature rises during transportation, the decomposition of HFP or c-C3F6 is suppressed, and transportation is stable. It is possible to do this.

[0028] In the composition containing HFP, the content of oxygen (O2) is preferably 0.1 ppm by volume (ppm by volume) to 10 ppm by volume (ppm by volume) relative to the total amount (gas volume) of the composition containing HFP. The preferred amount is 0.1 ppm by volume to 5 ppm by volume.

[0029] (b) Hydrogen fluoride (HF) The HFP-containing composition of the present disclosure contains (3) hydrogen fluoride (HF) as a third component.

[0030] In the composition containing HFP, the content of hydrogen fluoride (HF) is 0.05 ppm by volume or more and 5 ppm by volume or less with respect to the total amount (gas volume) of the composition containing HFP. By adjusting the HF concentration in the composition containing HFP to the above range, the composition containing HFP can be easily stored in a cylinder or the like. During transportation, the decomposition of HFP or c-C3F6 is suppressed, and the HFP or c-C3F6 in the composition containing HFP is prevented. or suppresses the decrease in the purity of c-C3F6, and maintains the storage stability of compositions containing HFP. Compositions containing HFP can withstand the harsh conditions of sea transport, such as container transport. Even in the event of temperature rise during transportation, the decomposition of HFP or c-C3F6 is suppressed, ensuring stable transport. It is possible to transport it.

[0031] In a composition containing HFP, the content of hydrogen fluoride (HF) is preferably 0.1 ppm by volume (ppm by volume) to 5 ppm by volume (ppm by volume), more preferably 0.1 ppm by volume to 3 ppm by volume, and even more preferably 0.1 ppm by volume to 1 ppm by volume, relative to the total amount (gas volume) of the composition containing HFP.

[0032] (c) Hydrogen chloride (HCl) The HFP-containing composition of the present disclosure contains (3) hydrogen chloride (HCl) as a third component. .

[0033] In the composition containing HFP, the content of hydrogen chloride (HCl) is The HCl concentration in the composition containing HFP is adjusted to fall within the above range, thereby suppressing the decomposition of HFP or c-C3F6 when the composition containing HFP is transported in a cylinder or the like, and preventing the decomposition of HFP or c-C3F6 in the composition containing HFP. or suppresses the decrease in the purity of c-C3F6, and maintains the storage stability of compositions containing HFP. Compositions containing HFP can withstand the harsh conditions of sea transport, such as container transport. Even in the event of temperature rise during transportation, the decomposition of HFP or c-C3F6 is suppressed, ensuring stable transport. It is possible to transport it.

[0034] In the composition containing HFP, the content of hydrogen chloride (HCl) is The concentration relative to the total amount (gas volume) is preferably 0.1 to 5 ppm by volume (ppm by volume), more preferably 0.1 to 3 ppm by volume, and even more preferably 0.1 to 1 ppm by volume.

[0035] [2] Method for storing a composition containing hexafluoropropene The present disclosure encompasses a method for preserving a composition containing hexafluoropropene (HFP), and a method for suppressing a decrease in the purity of HFP in a composition containing HFP.

[0036] In a method for storing a composition containing HFP or a method for preventing a decrease in the purity of HFP, The composition comprises: (1) Hexafluoropropene (HFP), (2) hexafluorocyclopropane (c-C3F6), and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the hydrogen fluoride (3), the content of the hydrogen fluoride (3) is 0.05 ppm by volume or more and 5 ppm by volume or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. The upper limit is 5 ppm by volume or less.

[0037] The composition containing HFP preferably comprises: Relative to the total amount of the composition, (1) The HFP is contained in an amount of 95% by volume to 99.99999% by volume, The (2) c-C3F6 is contained in an amount of 1 ppm by volume to 1,000 ppm by volume.

[0038] For details of compositions containing HFP, see the previous section. [1] Composition containing hexafluoropropene will be adopted.

[0039] The present disclosure discloses a method for stably delivering a composition containing HFP and c-C3F6. According to the disclosure, in a composition containing HFP, the oxygen (O2) concentration, the hydrogen fluoride (HF) concentration, Alternatively, by adjusting the hydrogen chloride (HCl) concentration, it is possible to suppress the decomposition of HFP or c-C3F6 when the HFP-containing composition is transported in a cylinder or the like, thereby suppressing a decrease in the purity of HFP or c-C3F6 in the HFP-containing composition, and thereby maintaining good storage stability of the HFP-containing composition.

[0040] The HFP-containing composition of the present disclosure contains c-C3F6, inhibits the generation of HFP-derived decomposition products or c-C3F6-derived decomposition products, and has improved storage stability. The composition also inhibits the decomposition of HFP or c-C3F6 even under harsh conditions (such as temperature increases during transport) during sea transport in containers, etc. It is possible to transport it stably.

[0041] [3] Uses of compositions containing hexafluoropropene The present disclosure relates to a method for producing a semiconductor substrate, the method comprising the step of: supplying a composition containing hexafluoropropene (HFP) of the present disclosure as an etching gas to generate plasma on the substrate; The present invention also includes a method for performing etching using a silicon dioxide film.

[0042] The gas plasma of the composition (etching gas) containing HFP is used to remove silicon oxide film (SiO2 film) ), or silicon-based materials on which a silicon nitride film (SiN film) is formed. The silicon-based material to be etched is preferably a substrate for semiconductor manufacturing.

[0043] By using a composition containing HFP, the gas plasma generated can be used to etch holes in silicon-based materials, including silicon oxide (SiO2) or silicon nitride (SiN), while maintaining the shape of the holes. The etching conditions (especially the dry etching method) can be the same as those of conventional methods. [Example]

[0044] The present invention will be specifically described below using examples and comparative examples, but the present invention is not limited to these examples alone.

[0045] [1-1] Storage stability of compositions containing hexafluoropropene (Example 1-1) Hexafluoropropene: HFP Hexafluorocyclopropane: c-C3F6 Oxygen: O2 Compositions containing purified HFP and c-C3F6 were prepared in a conventional manner to predetermined concentrations (150 volume ppm, 50 volume ppm, and 5 volume ppm), and O2 was adjusted to predetermined concentrations (100 volume ppm, 10 volume ppm, 5 volume ppm, and 1 volume ppm).

[0046] The concentration (ppm by volume) of c-C3F6 in the composition containing HFP was analyzed by gas chromatography (GC analysis).

[0047] The O2 concentration (ppm by volume) in the HFP-containing compositions was analyzed by GC.

[0048] The composition containing HFP was stored at a constant temperature (20°C and 50°C) for a certain period of time (30 days, 90 days, and 180 days), and the gas phase was extracted and hexafluoropropene (HFP) was analyzed. The resulting decomposition products were analyzed by GC (ppm by volume).

[0049] [Table 1]

[0050] The compositions containing HFP and c-C3F6 (150 ppm by volume, 50 ppm by volume, and 5 ppm by volume) of the examples were stored at constant temperatures (20°C and 50°C) by adjusting the O2 concentration (10 ppm by volume or less). Furthermore, even after a certain period of time (30 days, 90 days, and 180 days) had passed, the production of HFP-derived decomposition products or c-C3F6-derived decomposition products was successfully suppressed.

[0051] [1-2] Oxygen (O 2 ) content lower limit (Example 1-2) A composition containing HFP and c-C3F6 (5 ppm by volume) was prepared by a conventional method, and O2 was adjusted to a predetermined concentration (0.1 ppm by volume, 0.01 ppm by volume) to prepare a composition containing O2, HFP, and c-C3F6. did.

[0052] The O2 concentration (ppm by volume) in a composition consisting of HFP and c-C3F6 (5 ppm by volume) was analyzed by GC.

[0053] A composition consisting of HFP and c-C3F6 (5 ppm by volume) was stored at a constant temperature (20°C, 50°C), After a certain period of time (30 days, 90 days, 180 days), the gas phase was extracted and analyzed by GC (ppm by volume).

[0054] [Table 2]

[0055] When the O2 concentration in the composition was 0.1 ppm by volume, no decomposition products were observed. When the O2 concentration in the composition was 0.01 ppm by volume, decomposition products were detected.

[0056] [2-1] Storage stability of compositions containing hexafluoropropene Example 2-1 Hexafluoropropene: HFP Hexafluorocyclopropane: c-C3F6 Hydrogen fluoride: HF Compositions containing HFP were prepared by a conventional method, with purified HFP and c-C3F6 adjusted to predetermined concentrations (150 volume ppm, 50 volume ppm, and 5 volume ppm), and with HF adjusted to predetermined concentrations (10 volume ppm, 5 volume ppm, 1 volume ppm, and 0.1 volume ppm).

[0057] The concentration (ppm by volume) of c-C3F6 in the composition containing HFP was analyzed by gas chromatography (GC analysis).

[0058] The concentration (volume ppm) of HF in the composition containing HFP was analyzed using a Fourier transform infrared spectrophotometer (FT-IR) to measure the initial concentration.

[0059] The composition containing HFP was stored at a constant temperature (20°C and 50°C) for a certain period of time (30 days, 90 days, and 180 days), and the gas phase was extracted and hexafluoropropene (HFP) was analyzed. The resulting decomposition products were analyzed by GC (ppm by volume).

[0060] [Table 3]

[0061] In the compositions of the examples containing HFP and c-C3F6 (150 ppm by volume, 50 ppm by volume, and 5 ppm by volume), by adjusting the HF concentration (5 ppm by volume or less), the production of HFP-derived decomposition products or c-C3F6-derived decomposition products could be effectively suppressed even after storage at constant temperatures (20°C and 50°C) for certain periods (30 days, 90 days, and 180 days).

[0062] [2-2] Examination of the lower limit of hydrogen fluoride (HF) content in the composition (Example 2-2) A composition consisting of HFP and c-C3F6 (5 ppm by volume) and a composition containing HF, HFP, and c-C3F6 were prepared by adjusting the HF concentration to the predetermined values ​​(0.1 ppm by volume, 0.01 ppm by volume) according to a conventional method. did.

[0063] The concentration (ppm by volume) of HF in a composition consisting of HFP and c-C3F6 (5 ppm by volume) was analyzed by GC.

[0064] A composition consisting of HFP and c-C3F6 (5 ppm by volume) was stored at a constant temperature (20°C, 50°C), After a certain period of time (30 days, 90 days, 180 days), the gas phase was extracted and analyzed by GC (ppm by volume).

[0065] [Table 4]

[0066] When the HF concentration in the composition was 0.1 ppm by volume, no decomposition products were observed. When the HF concentration in the composition was 0.01 ppm by volume, decomposition products were detected.

[0067] [3-1] Storage stability of compositions containing hexafluoropropene Example 3-1 Hexafluoropropene: HFP Hexafluorocyclopropane: c-C3F6 Hydrogen chloride: HCl Compositions containing HFP were prepared by a conventional method using purified HFP and c-C3F6 adjusted to predetermined concentrations (150 volume ppm, 50 volume ppm, and 5 volume ppm), and HCl adjusted to predetermined concentrations (10 volume ppm, 5 volume ppm, 1 volume ppm, and 0.1 volume ppm).

[0068] The concentration (ppm by volume) of c-C3F6 in the composition containing HFP was analyzed by gas chromatography (GC analysis).

[0069] The concentration (volume ppm) of HCl in the composition containing HFP was analyzed using a Fourier transform infrared spectrophotometer (FT-IR) to measure the initial concentration.

[0070] The composition containing HFP was stored at a constant temperature (20°C and 50°C) for a certain period of time (30 days, 90 days, and 180 days), and the gas phase was extracted and hexafluoropropene (HFP) was analyzed. The resulting decomposition products were analyzed by GC (ppm by volume).

[0071] [Table 5]

[0072] The compositions containing HFP and c-C3F6 (150 ppm by volume, 50 ppm by volume, and 5 ppm by volume) of the examples were stored at constant temperatures (20°C and 50°C) by adjusting the HCl concentration (to 5 ppm by volume or less). Furthermore, even after a certain period of time (30 days, 90 days, and 180 days) had passed, the production of HFP-derived decomposition products or c-C3F6-derived decomposition products was successfully suppressed.

[0073] [3-2] Examination of the lower limit of hydrogen chloride (HCl) content in the composition (Example 3-2) According to the usual method, a composition consisting of HFP and c-C3F6 (5 ppm by volume) and HCl at a predetermined concentration (0.1 ppm by volume) were mixed. A composition containing HCl, HFP, and c-C3F6 was prepared with the concentration adjusted to 0.01 ppm by volume (0.01 ppm by volume).

[0074] The concentration of HCl (ppm by volume) in a composition consisting of HFP and c-C3F6 (5 ppm by volume) was determined by GC analysis. Ta.

[0075] A composition consisting of HFP and c-C3F6 (5 ppm by volume) was stored at a constant temperature (20°C, 50°C), After a certain period of time (30 days, 90 days, 180 days), the gas phase was extracted and analyzed by GC (ppm by volume).

[0076] [Table 6]

[0077] When the HCl concentration in the composition was 0.1 ppm by volume, no decomposition products were observed. When the HCl concentration in the composition was 0.01 ppm by volume, decomposition products were detected.

[0078] [4] Industrial Applicability The present disclosure discloses a method for stably delivering a composition containing HFP and c-C3F6. According to the disclosure, in a composition containing HFP, the oxygen (O2) concentration, hydrogen fluoride (HF) concentration By adjusting the concentration of hydrogen chloride (HCl), the decomposition of HFP or c-C3F6 can be suppressed when a composition containing HFP is transported in a cylinder or the like, and the decomposition of HFP or c-C3F6 in the composition containing HFP can be prevented. suppresses the decrease in the purity of c-C3F6 and maintains the storage stability of the composition containing HFP well. It is possible.

[0079] The HFP-containing composition of the present disclosure contains hexafluorocyclopropane (c-C3F6), inhibits the generation of HFP-derived decomposition products or c-C3F6-derived decomposition products, and has improved storage stability.Even under harsh conditions (such as temperature increases during transport) during maritime transport in containers, the decomposition of HFP or c-C3F6 is inhibited, enabling stable transportation.

Claims

1. A composition containing hexafluoropropene, (1) hexafluoropropene, (2) hexafluorocyclopropane, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the (3) hydrogen fluoride, the content of the (3) hydrogen fluoride is 0.05 volume ppm or more and 5 volume ppm or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less, composition.

2. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene; (2) containing 1 ppm by volume to 1,000 ppm by volume of hexafluorocyclopropane; 10. The composition of claim 1.

3. 1. A method for storing a composition containing hexafluoropropene, comprising: The composition comprises: (1) hexafluoropropene, (2) hexafluorocyclopropane, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the hydrogen fluoride (3), the content of the hydrogen fluoride (3) is 0.05 ppm by volume or more and 5 ppm by volume or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less, method.

4. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene; (2) containing 1 ppm by volume to 1,000 ppm by volume of hexafluorocyclopropane; The method of claim 3.

5. A method for suppressing a decrease in the purity of hexafluoropropene in a composition containing hexafluoropropene, comprising the steps of: The composition comprises: (1) hexafluoropropene, (2) hexafluorocyclopropane, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the hydrogen fluoride (3), the content of the hydrogen fluoride (3) is 0.05 ppm by volume or more and 5 ppm by volume or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less, method.

6. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene; (2) containing 1 ppm by volume to 1,000 ppm by volume of hexafluorocyclopropane; The method of claim 5.

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