Composition containing hexafluoropropene

Abstract

An object of the present disclosure is to newly provide a composition containing hexafluoropropene.SOLUTION: A composition comprising hexafluoropropene.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present disclosure relates to compositions containing hexafluoropropene. [Background technology]

[0002] Patent Document 1 discloses a method for etching silicon-based materials such as silicon oxide films and / or silicon-containing low dielectric constant films using hexafluoropropene. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] International Publication No. WO02 / 021586-A1 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure aims to provide a novel composition containing hexafluoropropene. [Means for solving the problem]

[0005] The present disclosure encompasses the following configurations.

[0006] Section 1. A composition containing hexafluoropropene, (1) hexafluoropropene, (2) pentafluoropropene, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the (3) hydrogen fluoride, the content of the (3) hydrogen fluoride is 0.05 volume ppm or more and 5 volume ppm or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less, composition.

[0007] Section 2. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene, (2) containing pentafluoropropene in an amount of 1 ppm by volume to 1,000 ppm by volume; Item 1. The composition according to item 1.

[0008] Section 3. 1. A method for storing a composition containing hexafluoropropene, comprising: The composition comprises: (1) hexafluoropropene, (2) pentafluoropropene, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the hydrogen fluoride (3), the content of the hydrogen fluoride (3) is 0.05 ppm by volume or more and 5 ppm by volume or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less, method.

[0009] Section 4. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene, (2) containing pentafluoropropene in an amount of 1 ppm by volume to 1,000 ppm by volume; The method according to item 3.

[0010] Section 5. A method for suppressing a decrease in the purity of hexafluoropropene in a composition containing hexafluoropropene, comprising the steps of: The composition comprises: (1) hexafluoropropene, (2) pentafluoropropene, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the (3) hydrogen fluoride, the content of the (3) hydrogen fluoride is 0.05 volume ppm or more and 5 volume ppm or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume. or more, and 5 ppm by volume or less, method.

[0011] Section 6. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene, (2) containing pentafluoropropene in an amount of 1 ppm by volume to 1,000 ppm by volume; The method according to item 5.

[0012] The present disclosure relates to hexafluoropropene (HFP) and pentafluoropropene-containing According to the present disclosure, a method for stably transporting a composition containing HFP is disclosed. By adjusting the oxygen concentration, hydrogen fluoride concentration, or hydrogen chloride concentration, When transporting the composition in a cylinder, etc., the decomposition of HFP or pentafluoropropene is suppressed. This suppresses the decrease in purity of HFP or pentafluoropropene, and makes it possible to maintain the storage stability of the composition containing HFP.

[0013] The HFP-containing composition of the present disclosure contains pentafluoropropene and has improved storage stability. This prevents the decomposition of HFP or pentafluoropropene, enabling stable transportation even under harsh conditions (such as temperature rise during transport) during sea transport in containers. is. [Effects of the Invention]

[0014] According to the present disclosure, a new composition containing hexafluoropropene can be provided. DETAILED DESCRIPTION OF THE INVENTION

[0015] In this specification, "containing" is a concept that encompasses all of "comprise," "consist essentially of," and "consist only of." In this specification, when a numerical range is expressed as "A to B," it means "A or more and B or less." When parts, % and the like are used in this specification, these represent parts by mass, parts by weight, mass %, or weight % (wt%).

[0016] [1] Composition containing hexafluoropropene The hexafluoropropene (HFP)-containing compositions of the present disclosure include: (1) Hexafluoropropene (HFP), (2) pentafluoropropene, and (3) at least one component selected from the group consisting of oxygen (O), hydrogen fluoride (HF), and hydrogen chloride (HCl); Contains With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the (3) hydrogen fluoride, the content of the (3) hydrogen fluoride is 0.05 volume ppm or more and 5 volume ppm or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less.

[0017] The HFP-containing compositions of the present disclosure preferably include: Relative to the total amount of the composition, (1) The HFP is contained in an amount of 95% by volume to 99.99999% by volume, The (2) pentafluoropropene is contained in an amount of 1 ppm by volume to 1,000 ppm by volume.

[0018] The present disclosure relates to a method for stably transporting a composition containing HFP and pentafluoropropene. According to this disclosure, a method for reducing the oxygen concentration, hydrogen fluoride concentration, and the like in a composition containing HFP is disclosed. By adjusting the concentration of hydrogen chloride, it is possible to transport HFP-containing compositions in cylinders, etc. When the composition is heated, the decomposition of HFP or pentafluoropropene is inhibited, the decrease in purity of HFP or pentafluoropropene is inhibited, and the storage stability of the composition containing HFP is maintained. can be done.

[0019] The HFP-containing composition of the present disclosure contains pentafluoropropene and has improved storage stability. This prevents the decomposition of HFP or pentafluoropropene, enabling stable transportation even under harsh conditions (such as temperature rise during transport) during sea transport in containers. is.

[0020] (1) Hexafluoropropene The HFP-containing composition of the present disclosure contains, as a first component, (1) hexafluoropropene (CF3-CF=CF2, also known as hexafluoropropylene, HFP).

[0021] The HFP-containing composition of the present disclosure contains the first component (1) HFP as a main component. The HFP content in the HFP-containing composition improves storage stability and allows for easy storage in containers, etc. Even under the harsh conditions of sea transport (such as temperature rise during transport), HFP or Pen A composition containing HFP from the viewpoint of suppressing the decomposition of trifluoropropene and transporting it stably. With respect to the total amount (gas volume), the content is preferably 95% by volume to 99.99999% by volume, more preferably 95% by volume to 99.999% by volume, or 96% by volume to 99.99% by volume, and even more preferably 97% by volume to 99.9999% by volume. The content is preferably 98% to 99.9% by volume, more preferably 98% to 99.9% by volume.

[0022] (2) Pentafluoropropene The HFP-containing composition of the present disclosure contains (2) pentafluoropropene (C3HF5) as a second component.

[0023] The HFP-containing composition of the present disclosure contains pentafluoropropene (C3HF5) as a second component, and therefore has improved storage stability. Even under harsh conditions (such as temperature rise during transport) during sea transport in containers, the HFP or dimer and / or trimer remain stable. Decomposition is suppressed, allowing for stable transportation.

[0024] The pentafluoropropene of the second component is not particularly limited, and any isomer can be used. As the pentafluoropropene, 1,1,2,3,3-pentafluoropropene (FC=CF-CHF), 1,1,3,3,3-pentafluoropropene (FC=CH-CF), (E / Z)-1,2,3,3,3-pentafluoro-1-propene (HFC=CF-CF), etc. are preferably used.

[0025] The composition containing HFP may contain one pentafluoropropene (including isomers) alone or a mixture (blend) of two or more pentafluoropropenes.

[0026] In compositions containing HFP, the content of pentafluoropropene is This is because the decomposition of HFP or pentafluoropropene is suppressed and stable transportation is possible even under the harsh conditions of sea transport in containers (such as temperature rise during transport). Therefore, the content of HFP is preferably 1 ppm by volume (ppm by volume) to 1,000 ppm by volume (ppm by volume), more preferably 10 ppm by volume to 500 ppm by volume, even more preferably 10 ppm by volume to 300 ppm by volume, and particularly preferably 50 ppm by volume to 600 ppm by volume, based on the total amount (gas volume) of the composition containing HFP. ppm by volume to 300 ppm by volume.

[0027] (3) Oxygen, hydrogen fluoride, and hydrogen chloride The HFP-containing composition of the present disclosure contains, as a third component, (3) at least one component selected from the group consisting of oxygen (O2), hydrogen fluoride (HF), and hydrogen chloride (HCl).

[0028] (a) Oxygen (O 2 ) The HFP-containing composition of the present disclosure contains (3) oxygen (O2) as a third component.

[0029] In the composition containing HFP, the content of oxygen (O2) is 0.05 ppm by volume or more and 10 ppm by volume or less based on the total amount (gas volume) of the composition containing HFP. By adjusting the O2 concentration to the above range, the composition containing HFP can be transported in a cylinder or the like. When the composition containing HFP is stored in a container or the like, the decomposition of HFP or pentafluoropropene is inhibited, the decrease in the purity of HFP or pentafluoropropene in the composition containing HFP is inhibited, and the storage stability of the composition containing HFP can be maintained well. Even under the harsh conditions of sea transport (such as temperature rise during transport), HFP or Penta This suppresses the decomposition of fluoropropene, enabling stable transportation.

[0030] In the composition containing HFP, the content of oxygen (O2) is preferably 0.1 ppm by volume (ppm by volume) to 10 ppm by volume (ppm by volume) relative to the total amount (gas volume) of the composition containing HFP. The preferred amount is 0.1 ppm by volume to 5 ppm by volume.

[0031] (b) Hydrogen fluoride (HF) The HFP-containing composition of the present disclosure contains (3) hydrogen fluoride (HF) as a third component.

[0032] In the composition containing HFP, the content of hydrogen fluoride (HF) is 0.05 ppm by volume or more and 5 ppm by volume or less with respect to the total amount (gas volume) of the composition containing HFP. By adjusting the HF concentration in the composition containing HFP to the above range, the composition containing HFP can be easily stored in a cylinder or the like. During transportation, the decomposition of HFP or pentafluoropropene is suppressed, the decrease in the purity of HFP or pentafluoropropene in the composition containing HFP is suppressed, and the storage stability of the composition containing HFP can be maintained well. Even under the harsh conditions of sea transport (such as temperature rise during transport), HFP or This suppresses the decomposition of pentafluoropropene, enabling stable transportation.

[0033] In a composition containing HFP, the content of hydrogen fluoride (HF) is preferably 0.1 ppm by volume (ppm by volume) to 5 ppm by volume (ppm by volume), more preferably 0.1 ppm by volume to 3 ppm by volume, and even more preferably 0.1 ppm by volume to 1 ppm by volume, relative to the total amount (gas volume) of the composition containing HFP.

[0034] (c) Hydrogen chloride (HCl) The HFP-containing composition of the present disclosure contains (3) hydrogen chloride (HCl) as a third component. .

[0035] In the composition containing HFP, the content of hydrogen chloride (HCl) is The HCl concentration is 0.05 ppm by volume or more and 5 ppm by volume or less based on the total amount (gas volume). By adjusting the HCl concentration in the HFP-containing composition to fall within the above range, decomposition of HFP or pentafluoropropene can be suppressed when the HFP-containing composition is transported in a cylinder or the like, and a decrease in the purity of HFP or pentafluoropropene in the HFP-containing composition can be suppressed, thereby maintaining good storage stability of the HFP-containing composition. The HFP-containing composition can be transported in a container or the like when it is shipped. Even under the harsh conditions of sea transport (such as temperature rise during transport), HFP or Penta This suppresses decomposition of fluoropropene and allows for stable transportation.

[0036] In the composition containing HFP, the content of hydrogen chloride (HCl) is The concentration relative to the total amount (gas volume) is preferably 0.1 to 5 ppm by volume (ppm by volume), more preferably 0.1 to 3 ppm by volume, and even more preferably 0.1 to 1 ppm by volume.

[0037] [2] Method for storing a composition containing hexafluoropropene The present disclosure encompasses a method for preserving a composition containing hexafluoropropene (HFP), and a method for suppressing a decrease in the purity of HFP in a composition containing HFP.

[0038] In a method for storing a composition containing HFP or a method for preventing a decrease in the purity of HFP, The composition comprises: (1) HFP, (2) pentafluoropropene, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the (3) hydrogen fluoride, the content of the (3) hydrogen fluoride is 0.05 volume pp m or more and 5 ppm by volume or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. The upper limit is 5 ppm by volume or less.

[0039] The composition containing HFP preferably comprises: Relative to the total amount of the composition, (1) The HFP is contained in an amount of 95% by volume to 99.99999% by volume, The (2) pentafluoropropene is contained in an amount of 1 ppm by volume to 1,000 ppm by volume.

[0040] For details of compositions containing HFP, see the previous section. [1] Composition containing hexafluoropropene will be adopted.

[0041] The present disclosure relates to a method for stably transporting a composition containing HFP and pentafluoropropene. According to this disclosure, a method for reducing the oxygen (O2) concentration of fluorinated compounds in a composition containing HFP is disclosed. By adjusting the hydrogen (HF) concentration or hydrogen chloride (HCl) concentration, it is possible to suppress decomposition of HFP or pentafluoropropene when transporting a composition containing HFP in a cylinder or the like, to suppress a decrease in the purity of HFP or pentafluoropropene in the composition containing HFP, and to maintain good storage stability of the composition containing HFP.

[0042] The HFP-containing composition of the present disclosure contains pentafluoropropene, inhibits the production of HFP-derived decomposition products or pentafluoropropene-derived decomposition products, and has improved storage stability. Even under harsh conditions (such as temperature increases during transport) during sea transport in containers, the decomposition of HFP or pentafluoropropene is inhibited, enabling stable transportation. .

[0043] [3] Uses of compositions containing hexafluoropropene The present disclosure relates to a gas that is supplied to a substrate for manufacturing a semiconductor to generate plasma, and the composition containing hexafluoropropene (HFP) of the present disclosure is used as an etching gas. The present invention also includes a method for performing etching using a silicon dioxide film.

[0044] The gas plasma of the composition (etching gas) containing HFP is used to remove silicon oxide film (SiO2 film) ), or silicon-based materials on which a silicon nitride film (SiN film) is formed. The silicon-based material to be etched is preferably a substrate for semiconductor manufacturing.

[0045] By using a composition containing HFP, the gas plasma generated can be used to etch holes in silicon-based materials, including silicon oxide (SiO2) or silicon nitride (SiN), while maintaining the shape of the holes. The etching conditions (especially the dry etching method) can be the same as those of conventional methods. [Example]

[0046] The present invention will be specifically described below using examples and comparative examples, but the present invention is not limited to these examples alone.

[0047] [1-1] Storage stability of compositions containing hexafluoropropene (Example 1-1) Hexafluoropropene: HFP Pentafluoropropene Oxygen: O2 Compositions containing HFP were prepared by conventional methods, with purified HFP and pentafluoropropene adjusted to predetermined concentrations (200 ppm by volume, 100 ppm by volume, and 10 ppm by volume), and O2 adjusted to predetermined concentrations (100 ppm by volume, 10 ppm by volume, 5 ppm by volume, and 1 ppm by volume).

[0048] The concentration (ppm by volume) of pentafluoropropene in the composition containing HFP was analyzed by gas chromatography (GC analysis).

[0049] The O2 concentration (ppm by volume) in the HFP-containing compositions was analyzed by GC.

[0050] The composition containing HFP was stored at a constant temperature (20°C and 50°C) for a certain period of time (30 days, 90 days, and 180 days), and the gas phase was extracted and hexafluoropropene (HFP) was analyzed. The resulting decomposition products were analyzed by GC (ppm by volume).

[0051] [Table 1]

[0052] The compositions containing HFP and pentafluoropropene (200 ppm by volume, 100 ppm by volume, and 10 ppm by volume) of the examples were heated at a constant temperature (20°C) by adjusting the O2 concentration (to 10 ppm by volume or less). The production of HFP-derived decomposition products or pentafluoropropene-derived decomposition products was successfully suppressed even after storage at temperatures (temperatures of 100°C, 50°C, and 50°C) for a certain period of time (30 days, 90 days, and 180 days).

[0053] [1-2] Oxygen (O 2 ) content lower limit (Example 1-2) A composition consisting of HFP and pentafluoropropene (5 ppm by volume) and O2 was prepared by a conventional method. The concentrations were adjusted to the specified values ​​(0.1 ppm by volume, 0.01 ppm by volume), and O2 and pentafluoropropane were added. A composition containing methacrylate was prepared.

[0054] The O2 concentration (ppm by volume) in a composition consisting of HFP and pentafluoropropene (5 ppm by volume) was analyzed by GC.

[0055] A composition consisting of HFP and pentafluoropropene (5 ppm by volume) was stored at a constant temperature (20°C, 50°C) for a certain period of time (30 days, 90 days, 180 days), after which the gas phase was extracted and analyzed by GC (ppm by volume).

[0056] [Table 2]

[0057] When the O2 concentration in the composition was 0.01 ppm by volume, no decomposition products were observed. When the O2 concentration in the composition was 0.01 ppm by volume, decomposition products were detected.

[0058] [2-1] Storage stability of compositions containing hexafluoropropene Example 2-1 Hexafluoropropene: HFP Pentafluoropropene Hydrogen fluoride: HF Purified HFP and pentafluoropropene were adjusted to predetermined concentrations (200 ppm by volume, 100 ppm by volume, and 10 ppm by volume) by a conventional method, and HF was adjusted to predetermined concentrations (10 ppm by volume, 5 ppm by volume). Compositions containing HFP were prepared by adjusting the concentration of HFP to 1 ppm by volume, 1 ppm by volume, and 0.1 ppm by volume.

[0059] The concentration (ppm by volume) of pentafluoropropene in the composition containing HFP was analyzed by gas chromatography (GC analysis).

[0060] The concentration (volume ppm) of HF in the composition containing HFP was analyzed using a Fourier transform infrared spectrophotometer (FT-IR) to measure the initial concentration.

[0061] The composition containing HFP was stored at a constant temperature (20°C and 50°C) for a certain period of time (30 days, 90 days, and 180 days), and the gas phase was extracted and hexafluoropropene (HFP) was analyzed. The resulting decomposition products were analyzed by GC (ppm by volume).

[0062] [Table 3]

[0063] In the compositions of the examples containing HFP and pentafluoropropene (200 ppm by volume, 100 ppm by volume, and 10 ppm by volume), by adjusting the HF concentration (5 ppm by volume or less), the production of HFP-derived decomposition products or pentafluoropropene-derived decomposition products could be effectively suppressed even after storage at constant temperatures (20°C and 50°C) for certain periods (30 days, 90 days, and 180 days).

[0064] [2-2] Examination of the lower limit of hydrogen fluoride (HF) content in the composition (Example 2-2) A composition consisting of HFP and pentafluoropropene (5 ppm by volume) and O2 was prepared by a conventional method. The concentrations were adjusted to the specified values ​​(0.1 ppm by volume, 0.01 ppm by volume), and HF and pentafluoropropane were added. A composition containing methacrylate was prepared.

[0065] The concentration (ppm by volume) of HF in a composition consisting of HFP and pentafluoropropene (5 ppm by volume) was analyzed by GC.

[0066] A composition consisting of HFP and pentafluoropropene (5 ppm by volume) was stored at a constant temperature (20°C, 50°C) for a certain period of time (30 days, 90 days, 180 days), after which the gas phase was extracted and analyzed by GC (ppm by volume).

[0067] [Table 4]

[0068] When the HF concentration in the composition was 0.1 ppm by volume, no decomposition products were observed. When the HF concentration in the composition was 0.01 ppm by volume, decomposition products were detected.

[0069] [3-1] Storage stability of compositions containing hexafluoropropene (Example 3-1) Hexafluoropropene: HFP Pentafluoropropene Hydrogen chloride: HCl Compositions containing HFP were prepared by a conventional method, with purified HFP and pentafluoropropene adjusted to predetermined concentrations (200 ppm by volume, 100 ppm by volume, and 10 ppm by volume), and with HCl adjusted to predetermined concentrations (10 ppm by volume, 5 ppm by volume, 1 ppm by volume, and 0.1 ppm by volume).

[0070] The concentration (ppm by volume) of pentafluoropropene in the composition containing HFP was analyzed by gas chromatography (GC analysis).

[0071] The concentration (volume ppm) of HCl in the composition containing HFP was analyzed using a Fourier transform infrared spectrophotometer (FT-IR) to measure the initial concentration.

[0072] The composition containing HFP was stored at a constant temperature (20°C and 50°C) for a certain period of time (30 days, 90 days, and 180 days), and the gas phase was extracted and hexafluoropropene (HFP) was analyzed. The resulting decomposition products were analyzed by GC (ppm by volume).

[0073] [Table 5]

[0074] The compositions containing HFP and pentafluoropropene (200 ppm by volume, 100 ppm by volume, and 10 ppm by volume) of the examples were heated at a constant temperature (20°C) by adjusting the HCl concentration (to 5 ppm by volume or less). The production of HFP-derived decomposition products or pentafluoropropene-derived decomposition products was successfully suppressed even after storage at temperatures (temperatures of 100°C, 50°C, and 50°C) for a certain period of time (30 days, 90 days, and 180 days).

[0075] [3-2] Examination of the lower limit of hydrogen chloride (HCl) content in the composition (Example 3-2) A composition consisting of HFP and pentafluoropropene (5 ppm by volume) and O2 was prepared by a conventional method. Compositions containing HCl and pentafluoropropene were prepared by adjusting the concentrations to predetermined values ​​(0.1 ppm by volume, 0.01 ppm by volume).

[0076] The concentration (ppm by volume) of HCl in a composition consisting of HFP and pentafluoropropene (5 ppm by volume) was analyzed by GC.

[0077] A composition consisting of HFP and pentafluoropropene (5 ppm by volume) was stored at a constant temperature (20°C, 50°C) for a certain period of time (30 days, 90 days, 180 days), after which the gas phase was extracted and analyzed by GC (ppm by volume).

[0078] [Table 6]

[0079] When the HCl concentration in the composition was 0.1 ppm by volume, no decomposition products were observed. When the HCl concentration in the composition was 0.01 ppm by volume, decomposition products were detected.

[0080] [4] Industrial Applicability The present disclosure relates to a method for stably transporting a composition containing HFP and pentafluoropropene. According to this disclosure, a method for reducing the oxygen (O2) concentration, fluorine concentration, and the like in a composition containing HFP is disclosed. By adjusting the hydrogen chloride (HF) concentration or hydrogen chloride (HCl) concentration, it is possible to suppress decomposition of HFP or pentafluoropropene when transporting a composition containing HFP in a cylinder or the like, to suppress a decrease in the purity of HFP or pentafluoropropene in the composition containing HFP, and to maintain good storage stability of the composition containing HFP.

[0081] The HFP-containing composition of the present disclosure contains pentafluoropropene, and inhibits the production of HFP-derived decomposition products or pentafluoropropene-derived decomposition products, improving storage stability. Even under harsh conditions (such as temperature increases during transport) during maritime transport in containers or the like, decomposition of HFP or pentafluoropropene is inhibited, enabling stable transportation.

Claims

1. A composition containing hexafluoropropene, (1) hexafluoropropene, (2) pentafluoropropene, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the (3) hydrogen fluoride, the content of the (3) hydrogen fluoride is 0.05 ppm by volume or more and 5 ppm by volume or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less, composition.

2. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene; (2) containing pentafluoropropene in an amount of 1 ppm by volume to 1,000 ppm by volume; 10. The composition of claim 1.

3. 1. A method for storing a composition containing hexafluoropropene, comprising: The composition comprises: (1) hexafluoropropene, (2) pentafluoropropene, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the hydrogen fluoride (3), the content of the hydrogen fluoride (3) is 0.05 ppm by volume or more and 5 ppm by volume or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume or less. Above 5 ppm by volume or less, method.

4. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene; (2) containing pentafluoropropene in an amount of 1 ppm by volume to 1,000 ppm by volume; The method of claim 3.

5. A method for suppressing a decrease in the purity of hexafluoropropene in a composition containing hexafluoropropene, comprising the steps of: The composition comprises: (1) hexafluoropropene, (2) pentafluoropropene, and (3) Contains at least one component selected from the group consisting of oxygen, hydrogen fluoride, and hydrogen chloride; With respect to the total amount of the composition, When the composition contains the oxygen (3), the content of the oxygen (3) is 0.05 ppm by volume or more, and 10 ppm by volume or more. ppm or less, When the composition contains the hydrogen fluoride (3), the content of the hydrogen fluoride (3) is 0.05 ppm by volume or more and 5 ppm by volume or less, or When the composition contains the (3) hydrogen chloride, the content of the (3) hydrogen chloride is 0.05 ppm by volume. or more, and 5 ppm by volume or less, method.

6. Relative to the total amount of the composition, (1) The composition contains 95% by volume to 99.99999% by volume of hexafluoropropene; (2) containing pentafluoropropene in an amount of 1 ppm by volume to 1,000 ppm by volume; The method of claim 5.

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