Learning to control a pneumatically driven positioning device

Abstract

The present invention provides a method having an improved pneumatically actuated system that enables reliable movement of one or more positioned pin lifting devices and / or vacuum valves. [Solution] A method for providing control parameters for controlling a vacuum system 1, wherein a control unit 30 derives control parameters based on processing a set of observation parameters, the control unit 30 applying a first control signal to a first control valve 21 to change the pressure of a pneumatic actuator 11, thereby moving a first mount 17 from a first start position to a first end position, monitoring the fluctuating pressure of the first pneumatic actuator with a first fluid sensor 22, determining when the first mount reaches the first end position, and processing a set of observation parameters. The set of observation parameters includes at least the first control signal, the fluctuating pressure, and information regarding the arrival of the first mount at the first end position.

Description

Technical Field

[0001] The present invention relates to a method for providing control parameters for controlling a vacuum system and respective controllers in order to provide improved drive performance of a pneumatic positioning device for operating in a vacuum application.

[0002] Background Art Vacuum applications are typically carried out in a vacuum chamber system. These applications are carried out, for example, in the field of IC, semiconductor, or substrate manufacturing, and need to be carried out in a protective atmosphere that excludes the presence of contaminating particles as much as possible.

[0003] The vacuum chamber system is provided, in particular, to receive a semiconductor element or substrate to be processed or manufactured, and comprises at least one evacuable vacuum chamber having at least one vacuum chamber opening through which the semiconductor element or other substrate can be inserted into and removed from the vacuum chamber. For example, in a semiconductor wafer or liquid crystal substrate manufacturing plant, a high-sensitivity semiconductor or liquid crystal element sequentially passes through several processing vacuum chambers, and components arranged in the processing vacuum chambers are each processed by a processing device.

[0004] The processing chamber often has at least one transfer valve whose cross-section is adapted to the substrate and the robot and can introduce the substrate into the vacuum chamber and, if necessary, remove it after the intended processing. Alternatively, a second transfer valve may be provided through which the processed substrate can be removed from the chamber that can be hermetically sealed.

[0005] Furthermore, the processing system may comprise one or more peripheral units used, in particular, to control or regulate the flow of fluid to and / or from the vacuum chamber. The peripheral unit may be provided by an adjustment valve arranged between the vacuum chamber and a vacuum provider or another vacuum chamber, or by a gas inlet valve, for example a mass flow controller, arranged upstream to supply a specific type and amount of fluid into the vacuum chamber.

[0006] The substrate to be processed, for example, a wafer, is guided, for example, by a appropriately designed and controlled robotic arm, which may be guided through an opening in the processing chamber provided by a transfer valve. The processing chamber is then loaded by holding the substrate with the robotic arm, introducing the substrate into the processing chamber, and placing the substrate in the chamber in a prescribed manner. The processing chamber is emptied accordingly.

[0007] For handling the substrate and ensuring its precise positioning within the chamber, relatively high accuracy and mobility of the substrate must be guaranteed. For this purpose, a pin lifting system is typically used, driven by a pneumatic positioning device (pin lifter) that provides multiple support points for the substrate, thus distributing the load (due to the substrate's own weight) across the entire substrate. The pins can be lowered after the substrate is placed, and thereafter exist separately from the substrate, i.e., there is no contact between the pins and the substrate. This allows the substrate to be lifted and placed on a support structure such as a chuck. After removing the robotic arm and closing the chamber (and introducing or exhausting the processing fluid), the processing steps can be performed.

[0008] After processing the substrate, it must be lifted again. Here, it is particularly important that the force acting on the substrate is small, for example, because the substrate may adhere to the carrier. If the substrate is pushed out from the carrier too quickly, it may break because the adhesive force cannot be overcome or eliminated (wafer adhesion) at least at certain contact points. In addition, even if contact is established between the support pins and the substrate, any impact with the substrate can cause undesirable stress (or breakage).

[0009] At the same time, in addition to handling the substrate to be processed as gently and carefully as possible, the shortest possible processing time should also be possible. This means that the substrate should be brought into the chamber as quickly as possible to the specified conditions, namely the loading and unloading positions and the processing positions. Therefore, a pneumatic positioning device equipped with a pneumatic actuator is preferred.

[0010] To avoid undesirable shocks during semiconductor wafer processing, for example, U.S. Patent No. 6,481,723 recommends the use of special stopping devices instead of hard motion stops in pneumatic positioning devices. Here, any hard stop should be replaced by a combination of a more flexiblely designed stopping unit and a hard stop, in which contact with a soft stop unit is made first to restrict movement, and then the hard stop contacts the soft stop unit and is damped accordingly.

[0011] U.S. Patent No. 6,646,857 proposes adjusting the lifting motion by recording the generated force. The lifting pin can be moved in response to the received force signal, thereby ensuring that the lifting force at the lifting pin is always applied to the wafer in a controlled and quantitative manner.

[0012] Furthermore, considering the handling of the substrate, it is even more important to provide uniform movement of the lift pins so that all pins make contact with the substrate as simultaneously as possible. In addition, the pins should move at the same speed and acceleration. Both of these requirements provide a favorable distribution of contact force across the entire substrate, as well as horizontal alignment and transport of the substrate.

[0013] Therefore, on the one hand, proper control of the pneumatic positioning device is necessary, and on the other hand, the lifter should be constructed simply, especially without electronic components, to avoid (electromagnetic) influences on substrate processing, particularly when using a plasma generator. Furthermore, with respect to some pneumatic positioning device systems, the different driving behavior of individual pneumatic positioning devices can lead to problems with proper wafer handling. Here, tolerance differences can occur in various aspects such as spring stiffness, different coefficients of friction, mechanical dimensions / parameters, or at the proportional valve level that provides specific pressure to the lifter.

[0014] Furthermore, technical deviations or nonlinear dynamics of pneumatic positioning devices also depend on specific ambient and operating conditions, and therefore affect the driving performance. This can, for example, make physics- and parameter-based driving methods inaccurate when estimating position in the absence of position sensors, or such methods may lose their effectiveness if they change over time and with use (e.g., changes in spring constant due to use).

[0015] Similar requirements apply to vacuum valves, such as transfer valves or control valves. It is important to provide precisely controlled and uniform movement of the valve closure in order to provide the desired contact force between the valve closure and the valve seat or the position of the valve closure.

[0016] Vacuum valves and their drive units are preferably constructed simply without electronic components to avoid (electromagnetic) influences on the vacuum process, especially when using a plasma generator. Furthermore, the technical deviations or nonlinear dynamics of separate vacuum valves also depend on ambient and operating conditions and therefore affect their respective drive performance. This can lead to inaccuracies in physics- and parameter-based drive methods, for example, when estimating position in the absence of a position sensor, or such methods may lose their effectiveness if they change over time and with use (e.g., changes in the spring constant due to use).

[0017] Purpose of the invention Therefore, an object of the present invention is to provide an improved method for controlling a system having a pneumatic positioning device for vacuum applications that reduces or avoids the above-mentioned drawbacks.

[0018] In particular, an object of the present invention is to provide a method using an improved pneumatically actuated system that enables reliable movement of one or more positioned pin lifting devices and / or vacuum valves.

[0019] These objectives are addressed by implementing the distinctive features of the independent claims. Features that further develop the invention in alternative or advantageous ways may be found in the dependent claims.

[0020] Summary of the Invention The present invention proposes to solve the above problem by generating appropriate control parameters or data-driven models for determining or estimating the position of a lift pin or vacuum valve closing part, i.e., its mount, in a configuration without position sensors. The training or learning algorithm is proposed to be used to generate data or models during the training or learning phase (cycle), taking into account at least one known position and further operating quantities such as voltage, pressure, flow rate, and temperature.

[0021] By performing such system learning, it is possible to derive the respective control parameters or generate a model using these quantities and parameters to estimate the position, particularly based on the applied control signal and / or measured pressure, based on the control input and the parameters described above.

[0022] Furthermore, the data-driven model can also estimate the influence of other parameters, such as the dependence of lubricant properties on changes in the surrounding environment. Deviations from the data-driven model may indicate degradation or unintended operating conditions of the wafer lifter or vacuum valve system. Therefore, if its parameters change over time (e.g., with use), further or iterative training cycles can be performed to (re)calibrate the model.

[0023] This, for example, reduces the undesirable effects of technical differences between devices and improves positioning accuracy.

[0024] The present invention relates to a method for providing control parameters for controlling a vacuum system. The vacuum system comprises at least a first pneumatic positioning device configured to move and position an operating element within a processing atmosphere area that can be provided by a vacuum processing chamber.

[0025] The first pneumatic positioning device comprises a first mount configured to hold an operating element. The operating element can be embodied as a lift pin or a valve closing portion.

[0026] The first pneumatic positioning device also comprises a first pneumatic actuator connected to a first mount, which interacts with the first mount to move along a first movement axis, in particular from a lowered normal position to an elevated lifted position, and then back.

[0027] A first control valve is provided and connected to a first pneumatic actuator and a first fluid supply unit, and is configured to change at least one of the pressure in the first pneumatic actuator and the fluid flow from or into the first pneumatic actuator to provide movement of the first mount, particularly in the extension direction.

[0028] The first fluid sensor is arranged and configured to measure at least one of the pressure of the first pneumatic actuator, or the fluid flow from or to the first pneumatic actuator, particularly the pressure within the pressure chamber of the actuator's working cylinder.

[0029] The method includes applying a first control signal to a first control valve to vary at least one of the pressure of the first pneumatic actuator and the fluid flow to the first pneumatic actuator, thereby moving the first mount from a first starting position to a first end position.

[0030] The first end position need not limit the mobility of the mount and should be understood as a position that the mount can reach when moving the mount. The end position can in particular correspond to the full stroke of the moving member or mount, i.e., the position limited by the hard stop. Alternatively, the first end position can be provided by a position where the substrate contacts the lift pin, or any other position that can be determined or measured respectively (explained in more detail below).

[0031] At least one of the varying pressure of the first pneumatic actuator or the varying fluid flow to the first pneumatic actuator is measured by the first fluid sensor, and in particular, based on the monitoring or analysis of the varying pressure, it is detected whether the first mount has reached the first end position.

[0032] The control parameter is derived based on processing a set of observed parameters, and the set of observed parameters includes information regarding at least the first control signal, the varying pressure, and the arrival of the first mount at the first end position.

[0033] In one embodiment, the set of observation parameters may include information about a first start position and a first end position. As already described for the first (and any other) end positions, the first (and any other) start position may be a known position where a mount can be provided.

[0034] According to one embodiment, a first pneumatic actuator can handle fluctuating pressure and / or fluctuating fluid flow, and the arrival of the first mount at a first termination position is determined based on the fluctuating pressure or fluctuating fluid flow. For example, if the termination position correlates with reaching a hard stop, a change in the pressure profile (e.g., a peak) can represent reaching a hard stop.

[0035] In one embodiment, the vacuum system may include a position sensor for measuring the position of a first mount, and the arrival of the first mount at a first end position is determined based on the measurement or monitoring of the position of the first mount by the position sensor. Thus, the positioning of the first mount at a first start position can be detected.

[0036] In one embodiment, a control signal, particularly voltage or current, can be monitored, and information regarding the generation or change of the control signal can provide additional parameters to a set of observation parameters. Such monitoring makes it possible to precisely adjust the control signal to result in a determined adjustment of the control valve setting.

[0037] According to one embodiment, the vacuum system may include at least one temperature sensor configured and positioned to provide temperature information by measuring at least one of the ambient temperature, the temperature associated with a first pneumatic positioning device, and the temperature associated with a first control valve. The temperature information is determined by the at least one temperature sensor and is provided as an additional parameter to the set of observation parameters to be processed.

[0038] In one embodiment, the vacuum system may include at least one fluid flow sensor configured and positioned to provide flow information by measuring at least one of the fluid flow between a first control valve and a first pneumatic actuator, the fluid flow between the first control valve and a first fluid supply unit, and the exhaust fluid flow from the first control valve. The flow information may be determined by the at least one fluid flow sensor, and the flow information is provided as an additional parameter to the set of observation parameters to be processed. In particular, the first fluid sensor is provided by at least one fluid flow sensor.

[0039] According to one embodiment, the vacuum system may include at least one pressure sensor configured and positioned to provide pressure information by measuring at least one of the following: the inlet pressure to a first pneumatic actuator, the outlet pressure downstream of a first control valve, the supply pressure supplied by a first fluid supply unit, the exhaust pressure associated with an exhaust line connected to the first control valve, and the ambient pressure.

[0040] Pressure information can be determined by at least one pressure sensor, and the pressure information can be provided as an additional parameter to the set of observation parameters to be processed, in particular the first fluid sensor is provided by at least one pressure sensor.

[0041] In one embodiment, the position of the first mount can be estimated or derived based on the processing of a set of observation parameters. In other words, the position of the first mount can be calculated by processing information regarding a first control signal, at least one of a fluctuating pressure or a fluctuating fluid flow, and the arrival of the first mount at a first end position. A model of a pneumatic positioning device may further be used to provide such an estimation.

[0042] In one embodiment, a digital model can be provided based on a set of observed parameters, the model representing at least the dynamic characteristics of a first pneumatic positioning device by model state variables, the model state variables relating to the physical characteristics of the first pneumatic positioning device, and providing a derivation of the actual state of the first pneumatic positioning device.

[0043] In particular, control parameters can be derived based on model state variables, or the model state variables represent control parameters, and in particular, the control parameters can be replaced by the model state variables.

[0044] The actual position of the first mount can be determined by deriving the actual state of the first pneumatic positioning device.

[0045] The influence on at least one of the physical properties of the first pneumatic positioning device is determined or estimated based on the actual state of the first pneumatic positioning device.

[0046] In one embodiment, the actual pressure of the first pneumatic actuator is measured by a first fluid sensor, and the actual load affecting the mount is derived by processing a set of model state variables or observation parameters and the actual pressure.

[0047] By continuously measuring the actual pressure of the first pneumatic actuator and continuously deriving the actual load, the actual load affecting the mount can be continuously monitored.

[0048] The actual load derived can be compared with the predicted load, and load information can be derived through this comparison.

[0049] In one embodiment, a first dynamic target behavior of the first pneumatic positioning device is derived based on a set of observation parameters, the first pneumatic positioning device is driven according to a production cycle, and simultaneously, a first actual dynamic behavior of the first pneumatic positioning device is derived, and behavioral deviation information is derived and provided based on a comparison between the first dynamic target behavior and the first actual dynamic behavior. This makes it possible to detect any deviation or error during the operation of the first pneumatic positioning device.

[0050] According to one embodiment, the method can provide a second control parameter for controlling a vacuum system, and the vacuum system may comprise a second pneumatic positioning device having a second mount configured to hold at least one working element, and a second pneumatic actuator connected to the second mount and interacting with the second mount such that the second mount is movable along a second movable axis.

[0051] Furthermore, a second control valve may be connected to a second pneumatic actuator and a second fluid supply unit and configured to control at least one of pressurizing the second pneumatic actuator and the fluid flow from or to the second pneumatic actuator to provide movement of the second mount.

[0052] A second fluid sensor may be positioned and configured to measure at least one of the pressurization of the second pneumatic actuator and / or the fluid flow from or to the second pneumatic actuator.

[0053] The method may further include the steps of: applying a second control signal to a second control valve to change at least one of the pressure of a second pneumatic actuator and / or the fluid flow to the second pneumatic actuator; thereby moving a second mount from a second starting position to a second ending position; and monitoring the fluctuating pressure of the second pneumatic actuator and / or the fluctuating fluid flow to the second pneumatic actuator using a second fluid sensor.

[0054] The method may further include the steps of determining when a second mount reaches a second end position, and deriving a second control parameter based on processing a second set of observation parameters, wherein the second set of observation parameters includes at least a second control signal, at least one of a fluctuating pressure and / or fluctuating fluid flow of a second pneumatic actuator, and information regarding the arrival of the second mount at the second end position.

[0055] In particular, the second dynamic target behavior of the second pneumatic positioning device can be derived based on a second set of observation parameters, the second pneumatic positioning device can be driven according to the production cycle, the second actual dynamic behavior of the second pneumatic positioning device can be derived at the same time, and second behavior deviation information can be derived and provided based on a comparison between the second dynamic target behavior and the second actual dynamic behavior.

[0056] In one embodiment, a first pneumatic positioning device and a second pneumatic positioning device can be driven according to a production cycle, the driving performance of the first pneumatic positioning device and the second pneumatic positioning device can be monitored, the driving performance of the first pneumatic positioning device and the second pneumatic positioning device can be compared, and performance information is derived and provided based on the comparison.

[0057] In one embodiment, the first and / or second pneumatic positioning device may be a pin lifting device for moving and positioning a substrate processed by lift pins, the mount is configured to hold lift pins designed to contact and support the substrate and form an actuation element, and the first pneumatic actuator provides a linear adjustment function for the mount.

[0058] In one embodiment, the first and / or second pneumatic positioning device may be a vacuum valve for adjusting volume or mass flow rate, or for airtight sealing of a flow path. The vacuum valve comprises a valve seat having a valve opening that defines an opening axis and a first sealing surface surrounding the valve opening.

[0059] The valve further comprises a valve closing portion that forms an operating element having a second sealing surface corresponding to a first sealing surface, the valve closing portion being coupled by a mount to a pneumatic actuator such that it is adjustable from an open position in which the valve closing portion and the valve seat of the vacuum valve are non-contact with each other to a closed position in which a sealing contact exists between the first and second sealing surfaces via an intervening seal, thereby closing the valve opening particularly airtight and making it adjustable again. The mount is designed to hold the valve closing portion.

[0060] The present invention also relates to a control unit for a vacuum system, the vacuum system comprising at least a first pneumatic positioning device configured to move and position an actuarial element, particularly within a processing atmosphere area that can be provided by a vacuum processing chamber, the at least first pneumatic positioning device comprising a first mount configured to hold the actuarial element, and a first pneumatic actuator connected to the first mount and interacting with the first mount such that the first mount is movable along a first movement axis.

[0061] The vacuum system also includes a first control valve connected to a first pneumatic actuator and a first fluid supply unit, configured to provide movement of the first mount by changing at least one of the pressure in the first pneumatic actuator and the fluid flow from or to the first pneumatic actuator.

[0062] Furthermore, the first fluid sensor is arranged and configured to measure at least one of the pressure of the first pneumatic actuator and the fluid flow from or to the first pneumatic actuator.

[0063] The control unit is configured to apply a first control signal to a first control valve to change at least one of the pressure of a first pneumatic actuator and the fluid flow to the first pneumatic actuator, thereby moving the first mount from a first starting position to a first ending position.

[0064] The control unit is further configured to monitor, by means of a first fluid sensor, at least one of the fluctuating pressure of a first pneumatic actuator and the fluctuating fluid flow to the first pneumatic actuator, to determine when the first mount will reach a first termination position, and to derive control parameters based on processing a set of observation parameters, the set of observation parameters including at least a first control signal, at least one of the fluctuating pressure and the fluctuating fluid flow, and information regarding the arrival of the first mount at the first termination position.

[0065] In particular, the control unit is configured to perform any embodiment of the method described above.

[0066] The present invention also relates to a computer program product embodied by electromagnetic waves having a program code segment stored in a machine-readable carrier, particularly stored in the control unit described above, or having program code for performing or controlling the above method, wherein the computer program product includes computer executable instructions for performing the above method, and in particular, the computer program product is configured such that, when executed, the steps of the above method are performed automatically.

[0067] The method and control unit according to the present invention will be described in detail below merely as examples, with reference to certain exemplary embodiments schematically shown in the drawings, and further advantages of the present invention will also be discussed. In detail in the drawings, [Brief explanation of the drawing]

[0068] [Figure 1] This figure shows one embodiment of the vacuum system according to the present invention. [Figure 2] This figure shows another embodiment of the vacuum system according to the present invention. [Figure 3] This figure shows another embodiment of the vacuum system according to the present invention. [Figure 4] This figure shows another embodiment of the vacuum system according to the present invention. [Figure 5] This figure shows another embodiment of the vacuum system according to the present invention. [Figure 6] This figure shows the steps for carrying out one embodiment of the method according to the present invention.

[0069] Detailed description of the drawing Figure 1 schematically shows one embodiment of the vacuum system 1 according to the present invention.

[0070] The vacuum system 1 comprises a pneumatic positioning device embodied as a pin lifting device 10 having a pneumatic actuator 11. The pneumatic actuator 11 comprises a cylinder 12 separated into two chambers 14, 15 by a moving member 13. The moving member 13 is preferably a piston. A stem 16 is connected to the moving member 13 and extends outside the internal volume of the cylinder 12. The stem 16 is configured to provide operation for a connected first mount 17 to be moved. A lift pin 20 is mounted on the mount 17. Thus, a load is applied to the moving member 13 by the stem 16, i.e., by the weight of the stem 16, and / or by additional elements interacting with the stem 16, such as the lift pin 20 or a lifted substrate.

[0071] The pneumatic actuator 11 further comprises a first fluid passage 19. The first fluid passage 19 allows fluid to flow in and out of the first chamber 15.

[0072] Furthermore, the pneumatic actuator 11 includes a restoring element 18, in particular a spring. The restoring element 18 is connected to the moving member 13 and applies a restoring force to the moving member 13. In the illustrated embodiment, the restoring element 18 is located inside the second chamber 14. The restoring force acts downward to move the moving member 13 accordingly (in accordance with the pressure in the chamber 15).

[0073] System 1 also includes a first control valve 21 connected to a first fluid passage 19 and a fluid supply unit 35, configured to provide control of the fluid flow to the first chamber 15. The fluid supply unit 35 may be provided by a high-pressure fluid source, such as a reservoir of compressed air. The first control valve 21 may be a proportional control valve capable of providing a predetermined fluid flow in response to the applied control signals.

[0074] The control valve 21 provides controlled changes in flow and / or pressure to the chamber 15.

[0075] The first fluid sensor 22 is positioned and configured to measure the pressure inside the first chamber 15, i.e., on one side of the pneumatic cylinder. Here, the first fluid sensor is embodied as a pressure sensor 22 and provides pressure feedback from the first chamber 15, i.e., pressure affecting the moving member 13.

[0076] In an alternative embodiment, the first fluid sensor 22 may be a flow meter that measures the fluid flow from the control valve 21 and / or the fluid flow into the chamber 15. Such a flow meter can also measure the fluid flow from the chamber 15.

[0077] As shown in the figure, the first fluid sensor 22 can be positioned in close proximity to the pin lifting device 10, or integrated with it. Alternatively, the first fluid sensor 22 can be positioned along the supply lines of each chamber 15. Furthermore, the sensor 22 may be positioned with each control valve 21, or it may be positioned away from the valve 22.

[0078] The vacuum system 1 includes a control unit 30. The control unit 30 is configured to control the movement of the moving member 13 by applying a specific pressure inside the chamber 15. The pressure inside the chamber 15 can be changed by controlling a control valve 21 to increase or decrease the pressure inside the chamber 15.

[0079] The control unit 30 is connected to the pressure sensor 22 and receives pressure information related to the chamber 15.

[0080] The control unit 30 is configured to derive and generate control signals for the first control valve 21. The control signals can set and change the pressure inside the first chamber 15, thereby setting and changing the force that reacts to the restoring force of the restoring element 18.

[0081] In an alternative embodiment (not shown), the pneumatic positioning device may be constructed to include two pressure chambers, each located on one side of the moving member, and both chambers may be pressurized independently. Thus, two control valves may be provided to pressurize the chambers. While no restoring element is provided, movement of the moving member can be provided by setting and / or varying the pressure within the chambers. Control parameters (described in more detail later) may be provided to control the two control valves to provide the desired movement of the moving member.

[0082] According to the present invention, the movement of the pin lifter 10, i.e., the mount 17, can be controlled based on respective control parameters. Each process or cycle can be performed to derive the control parameters. To this end, a first control signal is applied to the first control valve 21 to change the pressure inside the first pneumatic actuator 11, i.e., the chamber 15, thereby moving the first mount 17 from a first starting position to a first ending position.

[0083] For this purpose, it is preferable that the first mount 17 is provided at a first starting position. The first starting position can correspond to a "zero" position, i.e., a position where the mount 17 and the movable member 13 are provided, for example, at the lowest possible position. Alternatively, the mount 17 may be provided at a determined alternative position.

[0084] The fluctuating pressure of the first pneumatic actuator 11, which is the result of applying the first control signal, is monitored by the first fluid sensor 22. Furthermore, it is determined when the first mount 17 has reached the first end position.

[0085] The fluctuating pressure is preferably represented by an increase in pressure within the first chamber 15, which moves the mount 17 in the extension direction E.

[0086] The first end position can correspond to the full stroke of the moving member 13, i.e., the position provided when the moving member 13 reaches the hard stop 25 located inside the cylinder 12.

[0087] Alternatively, the first termination position may be provided by a position in which the substrate is in contact with the lift pin 20, or by any other position which can be determined.

[0088] The arrival of the mount 17 at the first endpoint can be detected by placing a position sensor and monitoring the position of the mount 17 and any changes in its position.

[0089] The arrival of the mount 17 to the first end position can alternatively be detected by the control unit 30 by measuring the pressurization of the first pneumatic actuator with the first pressure sensor 22 and monitoring the change in pressure within the first pneumatic actuator. For example, when the hard stop 25 is brought into contact with the moving member 13, the path of the time-pressure curve may deviate from a preferably homogeneous development, providing a pressure peak to be detected.

[0090] This means that the moment the mount reaches its end position can be detected by the pressure sensor 22 and the control unit 30.

[0091] Next, the control parameters are derived based on the processing of a set of observation parameters. The set of observation parameters includes at least a first control signal, fluctuating pressure, and information about the arrival of the first mount at the first termination position.

[0092] In other words, control parameters are learned by performing the steps described above. Such control parameters provide control of the pin lifter 10 by controlling the control valve 21 according to a predetermined movement cycle. The learned control parameters make it possible to set a predetermined speed and / or acceleration of the mount 17 to reach a predetermined position of the mount 17, or a specific lifting position, by applying the respective adjusted control signals.

[0093] The pressure in the first chamber 15 can be increased or decreased by controlling the control valve 21. The control valve may be equipped with an exhaust channel 29 for allowing fluid to flow out of the first chamber 15.

[0094] Furthermore, a digital model is provided based on a set of observed parameters. The model can be generated or fitted based on the observed parameters. The model represents at least the dynamic characteristics of the first pin lifter 10 by model state variables, the model state variables relating to the physical characteristics of the first pin lifter 10, and providing a derivation of the actual state of the first pin lifter 10.

[0095] The control of the vacuum system 1 can be performed using digital models.

[0096] The position of mount 17 can be derived or estimated based on the model, for example, by processing the actual model state variables. Each mount 17 can be controlled to move along the movement axis M1 and set to a desired position.

[0097] The model state parameters describe the vacuum system 1 and enable the calculation of the actual state, so the relationship between the applied pressure in the chamber 15 and the (estimated) position of the mount 17 is also known from the model. Furthermore, the state of each control valve 21 representing the actual pressure in the chamber 15, and their associated actual positions are known. Therefore, possible changes in the control signal, such as a change in the applied voltage, can be derived to precisely change the position of the first mount 17 as desired.

[0098] For example, the model can be processed to derive the actual load affecting the mount 17, depending on the actual pressure measured by the first fluid sensor 22 and the currently applied control signal.

[0099] Further information related to the processing cycle can be derived based on determining the load affecting the mount 17, or based on monitoring the actual dynamic behavior of the pneumatic positioning device 10. For example, if the load detected when lifting the substrate exceeds a specified load threshold, this can provide information about so-called wafer adhesion, i.e., the substrate unintentionally adheres to the chuck or the like. As a result, the lifting motion of the pins can be slowed down or interrupted to avoid wafer damage.

[0100] Using the digital model described above, such control and monitoring can be provided solely by measuring the pressure within the chamber and further using (processing) the model parameters. There is no need to place additional sensors that may be necessary to determine the forces and / or positions associated with the mount.

[0101] Furthermore, by monitoring the pressure in the first chamber 15 and deriving the load applied to the mount 17 based on that pressure, the possibility of substrate damage can also be detected.

[0102] For example, the pressure is initially detected to increase uniformly as desired, and then the increase in pressure accelerates. When a control signal is applied that should cause the pressure to increase continuously and uniformly, the occurrence of such pressure represents an (e.g., unexpected) increase in the load applied to mount 17. The increase in load can represent a contact event in which the lift pins come into contact with the substrate being lifted.

[0103] By further monitoring the pressure and estimating the applied load, substrate lift-off (e.g., from the chuck) can be detected if the load does not exceed a defined low threshold and then continuously decreases again. If the load exceeds the low threshold level, such an event can be identified as so-called wafer adhesion, meaning that the substrate cannot be separated from the chuck as expected. Furthermore, if the load increases further and exceeds a second high threshold level and then decreases again, this may correspond to substrate damage due to excessive load (force) being applied to the substrate.

[0104] An intermediate event in which a wafer adheres to a chuck and then separates can be detected when the pressure or load exceeds a lower threshold but does not exceed an upper threshold, and a pressure drop begins between these thresholds.

[0105] Figure 2 shows one embodiment of the vacuum system 1 according to the present invention. In contrast to the embodiment in Figure 1, a second pneumatic positioning device, also embodied as a pin lifting device 40, a second control valve 23, and a second fluid sensor 24 are arranged here. Both pin lifting devices 10 and 40 are provided for handling a substrate 5, such as a semiconductor wafer, in a vacuum atmosphere. Thus, the lift pins 20 and 20' can be located inside the vacuum chamber, while the respective pneumatic actuators 11 and 41 can be located outside the vacuum chamber.

[0106] As described above, the substrate needs to be handled with high precision; that is, the substrate should be raised and lowered without misalignment while remaining horizontally aligned. To this end, the load (force) applied to the substrate by the pin lifting devices 10 and 40 should not individually exceed a specific load threshold, and / or the load should preferably be uniformly distributed across the substrate.

[0107] As can be seen, the second pin lifting device 40 comprises a second cylinder 42, a second moving member 43, a second third chamber 44 and a fourth chamber 45 inside the cylinder 42, a second stem 46, and a second restoring element 48, which constitute a second pneumatic actuator 41. Furthermore, the second pin lifting device 40 comprises a second mount 47, a second hard stop 25', and a second fluid passage 49. The second mount 48 is movable along the second moving axis M2.

[0108] The second control valve 23 and the second fluid sensor 24 are connected to the control unit 30.

[0109] The control unit 30 is configured to provide adjustment of the motion profile of at least one of the two pin lifting devices 10 and 40 by providing control signals to both lifters 10 and 40.

[0110] To this end, the calibration or learning cycle described above can be performed in both the pin lifting devices 10 and 40.

[0111] Therefore, the movement of the first mount 17 and the second mount 47 from their respective (first and second) starting positions to their respective (first and second) ending positions, by applying their respective (first and second) control signals to their respective (first and second) control valves 21 and 23, is provided (controlled) by the control unit 30. The fluctuating pressures in the first and second actuators are monitored and their respective arrival at the ending positions is detected.

[0112] Based on this, control parameters can be derived by processing a set of observation parameters, which relate to at least the (first and second) control signals, the fluctuating pressures of the (first and second) pneumatic actuators, and information regarding the arrival of the (first and second) mounts at their (first and second) end positions.

[0113] Given known control signals and known (or precisely measured) end positions and their arrival, the respective positions of mounts 17 and 47 along their movement axes M1 and M2 can be continuously determined or estimated based on such (measured) learning of pressure generation in the actuators.

[0114] To this end, each digital model can be derived based on observed and known parameters. The digital model may be generated individually for each system component, or an overall model describing the dynamics of each such component may be generated.

[0115] The spring constants of the restoring elements 18 and 48, and their effects on the moving members 13 and 43, and therefore on the mounts 17 and 47, may also be known. Thus, it can be assumed that the load applied by the restoring elements is known and constant.

[0116] However, due to use and / or time, the properties (e.g., stiffness) of the restoring elements 18,48 may change. By applying the learning cycle as described above, it becomes possible to recalibrate the precise control and / or adjust the digital models describing each lifter 10,40, and thus adjust the control according to the changed physical properties. Thus, changes in the spring constant (or any other structural changes) can be taken into account.

[0117] Figure 3 shows one embodiment of the vacuum system 1 according to the present invention. In contrast to the embodiment in Figure 2, here three pin lifting devices 10, 40, and 50, each having control valves 21, 23, and 27 and pressure sensors 22, 24, and 28, are arranged as pneumatic positioning devices. The pin lifting devices 10, 40, and 50 are provided for handling a substrate 5, such as a semiconductor wafer, in a vacuum atmosphere.

[0118] The control unit 30 is connected to each control valve 21, 23, 27 and pressure sensors 22, 24, 28, and acquires pressure information related to the pneumatic actuators of the lifters 10, 40, 50, and applies control signals to the control valves 21, 23, 27 to move the lifters.

[0119] Control parameters for controlling the pin lifting device can be derived according to the method described herein. Thus, individual digital models and / or overall models of the lifter can be derived.

[0120] The control unit 30 is configured to monitor the motion characteristics of the pin lifting devices 10, 40, and 50. The applied load or force affecting each lifter can be individually derived or estimated. Thus, the distribution of the load applied to the substrate 5 can be derived.

[0121] Each control unit 30 can provide the ability to detect non-uniformity in the load distribution by, for example, comparing the loads derived individually for the lifters 10, 40, and 50. For example, if the wafer 5 is offset from its ideal (center) position relative to the lifters 10, 40, and 50, the difference in the applied loads makes it possible to determine the possibility of misalignment of the wafer 5 on the lift pins. For example, if the center of the wafer 5 is offset toward the lifter 50, the load applied to the lifter 50 will be higher than the loads on the lifters 10 and 40.

[0122] The misalignment of wafer 5 can also be detected through an uneven pressure distribution, or by a change in such distribution relative to the expected pressure distribution applied to the pneumatic actuators of lifters 10, 40, and 50. If the pressure on any lifter differs from the pressure on the other lifters more than expected, this can be a clear indicator of misalignment.

[0123] Furthermore, non-horizontal, i.e., tilted orientations of the wafer 5 can also be detected. This can be provided, for example, by individually estimating the positions of the lift pins (based on observed parameters such as applied control signals and measured pressures) and comparing the resulting positional information. If positional deviations are derived, this can be a hint about each tilt. In addition, tilts can be identified based on comparing the loads applied to the pin lifters. If at least one of the applied loads differs significantly from the others, this can also be identified as wafer tilt.

[0124] The distinction between positional offset and wafer tilt can be made based on the load distribution and the deviation of the applied load. For example, if the loads on two lifters are the same but the load on a third lifter is significantly different, this can be identified as a substrate offset toward the third lifter.

[0125] Another aspect relates to the detection of non-uniformity by pin lifters 10, 40, and 50 from pressure measurements. Assuming the position of the substrate 5 is known and correctly positioned, the pin lifters 10, 40, and 50 can be controlled to approach and contact the substrate 5. Each contact point can be derived by measuring the pressure. A possible pressure difference can be detected here from each. Based on such differences, a possible defect or deviation of each lifter can be determined.

[0126] Information regarding contact locations may be used for further processes, such as training a model or tuning control parameters, to learn the respective pressure levels associated with a specific reference (contact) location corresponding to each lifter.

[0127] Figure 4 shows a further embodiment of System 1 according to the present invention. System 1 is based on the vacuum system shown in Figure 1, and System 1 comprises a pin lifting device 10, a control unit 30, and a control valve 21.

[0128] System 1 further includes various sensors for acquiring process information that may affect the motion performance of the pin lifting device 10. During wafer lifter operation, several phenomena such as wafer adhesion during chucking and unchucking, and misalignment of the wafer or pin lifter can impair the performance of the vacuum system, in addition to potentially causing downtime due to failure. Such failures can potentially be costly in terms of materials and user downtime.

[0129] The illustrated embodiments are intended to detect such phenomena by means of sensors and / or by using models to which they are applied, and as a result adapt control inputs to prevent such failures, or simply notify the user of the occurrence of such phenomena.

[0130] A pressure sensor 22 is positioned to detect the operating pressure applied to move the pin lifting device 10. A further pressure sensor 61 is positioned to measure the valve outlet pressure. Such an additional sensor 61 provides, for example, detection of a potential leak in the supply line or any other fluctuation in pressure between the valve outlet point and the pressure level at the lifter 10.

[0131] The pressure sensor 62 is positioned between the pressure supply unit 35 and the control valve 21 and provides information about the current pressure of the working fluid (e.g., compressed air). This information helps predict the pressure change in the actuator in response to the operation of the control valve 21. For example, the higher the pressure in the supply unit 35, the more rapidly the pressure rises in the actuator due to the operation of the control valve 21 (when the control valve is opened).

[0132] The exhaust pressure sensor 63 makes similar information available compared to sensor 62. Here, the pressure level required to vent the pin lifting device can be measured, and the effect on the pressure drop when venting the lifter can be derived.

[0133] It should be understood that, according to an alternative embodiment of the present invention, the pressure sensor described above may alternatively be a flow sensor that enables corresponding derivation of fluid flow from and to the lifter 10 and control valve 21.

[0134] A position sensor 64 is also provided. Such a position sensor 64 can enable the determination of the position of the lift pin or mount. The sensor 64 may be used to train a digital model or to derive control parameters; that is, the position sensor 64 can detect when the mount has reached its end position. Furthermore, the position sensor 64 can be used to derive the relationship between the applied pressure and the respective positions of the mount. This information can be stored or further processed.

[0135] In one embodiment, the position sensor 64 is placed only temporarily to train the model, but is removed after each training or learning session.

[0136] Additional inputs for learning control parameters and / or training the model can be provided by a temperature sensor 65 and an ambient pressure sensor 66 that measure ambient temperature (related to the pin lifting device 10).

[0137] For example, the pin lifting device 10 can be controlled by processing the temperature information provided by the temperature sensor 65. Temperature or temperature changes can have a direct and significant impact on the motion characteristics of the pin lifting device 10. For instance, the effect of the lubricant used to provide smooth movement of the lifter changes with temperature and therefore can result in different performance due to temperature changes.

[0138] The detection unit 67 is provided to measure the control signal applied to the control valve 21. The sensor 67 can be configured to measure voltage and / or current, and thus can provide measurements directly related to the state of the control valve 21. In one embodiment, the sensor 67 is integrated into the control unit 30, and the control voltage or current is determined by the control unit. The control unit 30 may further apply the control signal according to the processing cycle or training routine, and thus may provide a direct relationship between the applied control signal and the desired motion of the pin lifting device 10. This connected information can further be used for digital modeling and adjustment of control parameters.

[0139] The control unit 30 is configured to process the inputs provided by all sensors. Each control parameter can be derived based on performing the training cycle described above, monitoring the generation of pressure applied to move at least within the pin lifting device 10, detecting when a specific end position has been reached, and determining the time (duration) of each movement to reach this position. Furthermore, a digital data model can be generated or fitted based on the inputs.

[0140] Once the dynamic characteristics of System 1 are learned, the control unit 30 can also estimate or predict (or accurately derive) a specific current state of the pin lifter 10 according to the inputs currently provided. The digital model enables the calculation of such a current pin lifter state by processing at least a portion of the inputs. For example, if actual temperature and actual pressure are provided to the control unit 30, the control unit 30 processes the measured actual pressure to derive an estimated position of the lift pin, and further processes the measured temperature to adjust the estimate of the current position based on the pre-learned effect of temperature changes on the pin lift state.

[0141] Such estimated or calculated actual states of the pin lifting device 10 can be provided as the respective model output or algorithm output 68.

[0142] The system shown in Figure 4 allows for the estimation of the load applied to the pin lifter 10, for example, by measuring a pressure signal. In addition, chucking release (lifting of the substrate from the support) can be detected via the change in the pin lifter load, followed by the pressure signal. Similarly, the control input (for controlling the control valve 21) can be adapted to avoid wafer damage in such events.

[0143] It can also detect the possibility of wafer damage.

[0144] Furthermore, wafer misalignment can be detected by unequal pin lifter loads or unequal or unexpected pressure distributions. Conversely, if the wafer position is known and correctly positioned, some pin lifter non-uniformity can be detected from pressure measurements.

[0145] It should be understood that in alternative embodiments, the pin lifter 10 can be replaced with a vacuum valve, or an additional vacuum valve can be provided and controlled by the system. Each vacuum valve comprises a mount positioned to hold a valve disc (acting element) and a pneumatic actuator connected to the mount and interacting with the mount so that the mount (mounted valve disc) is movable along a first movable axis.

[0146] The control and / or learning of such vacuum valves can be provided according to the method described above.

[0147] Figure 5 shows another embodiment of the vacuum system 1 according to the present invention. The vacuum system 1 comprises a vacuum valve 80, a pneumatic positioning device constructed here as a vacuum slit valve. The vacuum valve 80 has a valve housing having a valve wall having an opening 81 with an opening shaft O, and an elongated, essentially rectangular valve seat 82 surrounding the opening 81. A closing element 84 provided on the closing side, particularly on the processing side, has a cross-section slightly larger than the opening 81 and functions to substantially airtightly close the opening 81 by pressing its closing side against the valve seat 82. The closing element 84 is supported by a valve stem 83. The closing element 84 is connected to the valve stem 83 by a mount 87. The mount 87 can be implemented, for example, by screw fastening or clamping.

[0148] The valve housing is divided into a vacuum region where the opening 81, valve seat 82, and closing plate 84 are located, and a drive region outside the vacuum region.

[0149] The valve stem 83 passes through an airtight feedthrough designed as a diaphragm seal or diaphragm bellows 85 (as shown in the figure), and their end components (e.g., O-rings) seal the vacuum region from the drive region inside the valve housing.

[0150] A pneumatic actuator 91 is provided in the drive region. The pneumatic actuator 91 is constructed similarly to the actuator 11 in Figure 1. The pneumatic actuator 91 comprises a cylinder 12 separated into two chambers 14, 15 by a moving member 13. The moving member 13 is preferably a piston. A stem 16 is connected to the moving member 13 and extends outside the internal volume of the cylinder 12. The stem 16 is configured to provide operation for a connected mount 87 to be moved. The stem 16 may be connected to a valve stem 83, or a valve stem may be constructed directly, i.e., a valve stem 83 may be provided.

[0151] The valve closing section 84 is mounted on the mount 87. Thus, the moving member 13 is subjected to load by the stem 16, i.e., by the weight of the stem 16, and / or by additional elements that interact with the stem 16, such as the valve closing section 84.

[0152] The pneumatic actuator 91 further comprises a first fluid passage 19. The first fluid passage 19 allows fluid to flow in and out of the first chamber 15.

[0153] The pneumatic actuator 91 further includes an additional fluid passage 19' for the second chamber 14. The additional fluid passage 19' allows fluid to flow in and out of the second chamber 14.

[0154] System 1 also includes a first control valve 21 connected to a first fluid passage 19 and a fluid supply unit, configured to control the fluid flow to the first chamber 15 and / or to change the pressure within the first chamber 15. The first control valve 21 may be a proportional control valve capable of providing a predetermined fluid flow in response to the applied control signals. The control valve 21 provides a controlled change in flow and / or pressure to the chamber 15.

[0155] The first fluid sensor 22 is positioned and configured to measure the pressure within the first chamber 15, i.e., on one side of the pneumatic cylinder. Here, the first fluid sensor is embodied as a pressure sensor 22 and provides pressure feedback from the first chamber 15, i.e., the pressure affecting the moving member 13. In an alternative embodiment, the first fluid sensor 22 may be a flow meter that measures the fluid flow from the control valve 21 and / or the fluid flow into the chamber 15. Such a flow meter can also measure the fluid flow from the chamber 15.

[0156] As shown in the figure, the first fluid sensor 22 is integrated with the control valve 21.

[0157] The system further includes a fluid sensor 92 and a control valve 93 to provide control and measurement of the fluid flow or pressurization in the second chamber 14.

[0158] The vacuum system 1 includes a control unit 30. The control unit 30 is configured to control the movement of the moving member 13 by applying a specific pressure within the chambers 14 and 15. The pressure within the chambers 14 and 15 can be changed by controlling control valves 21 and 93 to individually increase or decrease the pressure within the chambers 14 and 15.

[0159] As described in more detail above, the control unit 30 is configured to derive and generate control signals for the first control valve 21 and the additional control valve 93, respectively. The control signals can set and change the pressure inside the first chamber 15 and the second chamber 14, thereby setting and changing the force applied to the moving member 13. The pressure difference between the two chambers 14 and 15 can be set and changed, respectively. The acceleration, velocity, and / or position of the moving member or mount can be determined and derived, respectively.

[0160] Therefore, the control parameters of the vacuum valve 80 can be derived by changing the pressure in at least the first chamber 15 or controlling the flow to the first chamber 15, and by monitoring the movement of the moving member in response to the fluctuating pressure or flow. This allows for the learning or training of each control unit 30.

[0161] In addition, the control parameters can be driven by taking into account the respective control signals of the additional control valves 93 and the respective pressures of the flow rate measurements from the additional sensors 92.

[0162] Referring to the adjustment of the motion profile of a pneumatic positioning device, the adjustment cycle can be performed as described above. Based on the determined motion deviation, the control signals of either one or both of the control valves 21, 93 can be adjusted to control the generation of pressure differences when the signals are applied, thereby changing the motion profile.

[0163] The actuator 91 is designed to move the valve stem 83 along the geometric longitudinal axis in the longitudinal closing direction z from the open position shown here to the intermediate position, and to move the valve stem 83 along the geometric transverse axis extending perpendicular to the longitudinal axis in the transverse closing direction y from the intermediate position to the closed position, and in the reverse direction (the movement of the closing plate is L-shaped, hence it is called L-shaped), thereby moving the closing plate 84 to the open position shown here or the intermediate position.

[0164] The vacuum valve 80 or its opening 81 is designed to be connected to a vacuum processing chamber. The processing atmosphere within this chamber expands to and from the vacuum region of the vacuum valve 80 in such a connection. In other words, a processing atmosphere region is formed that includes at least both the volume of the vacuum chamber and the vacuum region of the vacuum valve 80. This processing atmosphere region is isolated from the external atmosphere region by a sealed bellows 85. The drive region is part of the external atmosphere region.

[0165] Figure 6 schematically shows the steps involved in carrying out one embodiment of the method according to the present invention.

[0166] Before applying a control signal to the pneumatic positioning device, the lift pin or valve disc (and the respective mounts of the pneumatic positioning device) are positioned at their respective starting positions (step 71). For example, the mount and / or moving member can be moved to the lowest possible retracted position. Such starting positions may be well known for the structural design of the pneumatic positioning device.

[0167] Alternatively, the starting position may be any other position known and available through the mount and / or moving member.

[0168] In the next step 72, a control signal is applied to the control valve. As described above, the control valve is connected to the pneumatic actuator of the pneumatic positioning device, allowing the working element of the pneumatic positioning device (e.g., a lift pin or valve disc) to be moved by changing the pressure within the actuator. The control valve may be provided by a proportional control valve, which is preferably connected to a high-pressure source to increase the pressure within the actuator and also provides an exhaust path for exhausting the actuator.

[0169] Therefore, by applying a control signal, the pressure in the actuator changes, and as a result, the mount of the pneumatic positioning device moves from the starting position to the ending position (step 73). The ending position may also be known and can be defined, for example, by the maximum possible extension of the mount. In particular, the distance between the starting position and the ending position is also known. Such a distance can be further considered or processed to determine the control parameters and / or digital model.

[0170] Simultaneously in step 74, the pressure change is monitored by the installed fluid sensor.

[0171] While the pressure is rising, monitor whether the mount has reached the end position and when it will reach it. The arrival of the mount at each end position is determined (step 75). Each time step and / or duration or movement of the mount can be derived accordingly. Each detection of arrival at the end position can be provided by monitoring the pressure generation and detecting deviations from a uniform or linear pressure rise.

[0172] In the next step 76, the control parameters for controlling the control valve (and thereby the pin lifting device) are derived based on processing observed inputs such as the control signal, fluctuating pressure, and information about the arrival of the mount at the end position.

[0173] Furthermore, a digital data model is derived based on the processing of the observed inputs (step 77). Such a model provides the ability to estimate or calculate a specific state of a pneumatic positioning device by processing the inputs currently provided as described above.

[0174] It should be understood that the illustrated figures only schematically represent possible exemplary embodiments. The various methods according to the present invention can also be combined with each other and with prior art methods and apparatus for controlling pneumatic positioning devices.

Claims

1. A method for providing control parameters for controlling a vacuum system (1), wherein the vacuum system (1) is At least a first pneumatic positioning device (10, 40, 50, 80) configured to move and position the working elements (20, 20', 84), wherein the first pneumatic positioning device (10, 40, 50, 80) is A first mount (17, 47, 87) configured to hold the aforementioned working element, A first pneumatic actuator (11, 41, 91) is connected to the first mount (17, 47, 87) and interacts with the first mount (17, 47, 87) so that the first mount (17, 47, 87) is movable along the first movable axis (M1, M2), A first pneumatic positioning device (10, 40, 50, 80) is provided, A first control valve (21, 23, 27) connected to the first pneumatic actuator (11, 41, 91) and the first fluid supply unit (35), configured to change at least one of the pressure in the first pneumatic actuator (11, 41, 91) or the fluid flow from or to the first pneumatic actuator (11, 41, 91) in order to provide movement of the first mount (17, 47, 87), A first fluid sensor (22, 24, 28) is configured to measure at least one of the pressure of the first pneumatic actuator (11, 41, 91) or the fluid flow from or to the first pneumatic actuator (11, 41, 91), Equipped with, The aforementioned method, The steps include: applying a first control signal to the first control valve (21, 23, 27) to change at least one of the pressure of the first pneumatic actuator (11, 41, 91) or the fluid flow to the first pneumatic actuator (11, 41, 91), thereby moving the first mount (17, 47, 87) from a first starting position to a first ending position; The steps include monitoring, by the first fluid sensors (22, 24, 28), at least one of the fluctuating pressure of the first pneumatic actuators (11, 41, 91) or the fluctuating fluid flow to the first pneumatic actuators (11, 41, 91), A step of determining when the first mount (17, 47, 87) reaches the first end position, A step of deriving the control parameters based on processing a set of observation parameters, wherein the set of observation parameters is at least The first control signal, At least one of the fluctuating pressure or the fluctuating fluid flow, Information regarding the arrival of the first mount (17, 47, 87) at the first termination position. Steps including, including A method characterized by the following features.

2. The method described above is The set of observation parameters includes information regarding the first start position and the first end position, and The control signal is monitored, and information regarding the occurrence or variation of the control signal provides additional parameters to the set of observation parameters. The method according to claim 1, comprising at least one of the following.

3. To determine the arrival of the first mount (17, 47, 87) at the first end position, The fluctuating pressure or fluctuating fluid flow of the first pneumatic actuator (11, 41, 91) is processed, and the arrival of the first mount (17, 47, 87) at the first termination position is determined based on the fluctuating pressure or fluctuating fluid flow, or The vacuum system (1) includes a position sensor (64) for measuring the position of the first mount (17, 47, 87), and the arrival of the first mount (17, 47, 87) at the first end position is determined based on the measurement or monitoring of the position of the first mount by the position sensor (64). The method according to claim 1 or 2, wherein at least one of the following is provided.

4. The vacuum system (1) Ambient temperature, The temperature associated with the first pneumatic positioning device (10, 40, 50, 80), and Temperature related to the first control valve (21, 23, 27) The system includes at least one temperature sensor (65) configured and positioned to provide temperature information by measuring at least one of the following: The temperature information is determined by the at least one temperature sensor (65), The temperature information is provided as an additional parameter to the set of observation parameters to be processed. The method according to any one of claims 1 to 3.

5. The vacuum system (1) The fluid flow between the first control valves (21, 23, 27) and the first pneumatic actuators (11, 41, 91), The fluid flow between the first control valves (21, 23, 27) and the first fluid supply unit (35), and Exhaust fluid flow from the first control valves (21, 23, 27), A fluid flow sensor comprising at least one configured and positioned to provide flow information by measuring at least one of the following, The flow rate information is determined by the at least one fluid flow rate sensor. The flow rate information is provided as an additional parameter to the set of observation parameters to be processed. The method according to any one of claims 1 to 4.

6. The vacuum system (1) The inlet pressure to the first pneumatic actuator (11, 41, 91), The outlet pressure downstream of the first control valves (21, 23, 27), The supply pressure provided by the first fluid supply unit (35), The exhaust pressure associated with the exhaust line connected to the first control valve (21, 23, 27), and Ambient pressure, The system comprises at least one pressure sensor configured and positioned to provide pressure information by measuring at least one of the following: The pressure information is determined by the at least one pressure sensor. The pressure information is provided as an additional parameter to the set of observation parameters to be processed. The method according to any one of claims 1 to 5.

7. Based on the processing of the set of observation parameters, the position of the first mount (17, 47, 87) is estimated. The method according to any one of claims 1 to 6.

8. The method according to any one of claims 1 to 7, wherein a digital model is provided based on the set of observation parameters, the model represents the dynamic characteristics of the at least first pneumatic positioning device (10, 40, 50, 80) by model state variables, the model state variables relate to the physical characteristics of the first pneumatic positioning device (10, 40, 50, 80), and provides a derivation of the actual state of the first pneumatic positioning device (10, 40, 50, 80).

9. The method described above is The control parameters are derived based on the model state variables. The model state variables represent the control parameters. The actual position of the first mount (17, 47, 87) is determined by deriving the actual state of the first pneumatic positioning device (10, 40, 50, 80). The influence on at least one of the physical properties of the first pneumatic positioning device (10, 40, 50, 80) is determined or estimated based on the actual state of the first pneumatic positioning device (10, 40, 50, 80). The method according to claim 8, comprising at least one of the following.

10. The actual pressure of the first pneumatic actuator (11, 41, 91) is measured by the first fluid sensor (22, 24, 28), and the actual load affecting the mount (17, 47, 87) is derived by processing the model state variables or the set of observation parameters and the actual pressure. The actual load affecting the mounts (17, 47, 87) is continuously monitored by continuously measuring the actual pressure of the first pneumatic actuators (11, 41, 91) and continuously deriving the actual load. The actual load derived is compared with the expected load, and load information is derived from the comparison. The method according to any one of claims 1 to 9, wherein at least one of the following is performed.

11. The first dynamic target behavior of the first pneumatic positioning device (10, 40, 50, 80) is derived based on the set of observation parameters. The first pneumatic positioning device (10, 40, 50, 80) is driven according to the production cycle, and at the same time, the first actual dynamic behavior of the first pneumatic positioning device (10, 40, 50, 80) is derived. Behavioral deviation information is derived and provided based on a comparison between the first dynamic target behavior and the first actual dynamic behavior. The method according to any one of claims 1 to 10.

12. The method provides a second control parameter for controlling the vacuum system (1), the vacuum system (1) being a second pneumatic positioning device (40), and the second pneumatic positioning device (40) is A second mount (47) configured to hold at least one working element, A second pneumatic actuator (41) is connected to the second mount (47) and interacts with the second mount (47) so that the second mount (47) is movable along the second movable axis (M2), A second pneumatic positioning device (40) is provided, A second control valve (23) is connected to the second pneumatic actuator (41) and the second fluid supply unit and is configured to control at least one of pressurizing the second pneumatic actuator (41) or the fluid flow from or to the second pneumatic actuator (41) in order to provide movement of the second mount (47), A second fluid sensor (24) is configured to measure at least one of the pressurization of the second pneumatic actuator (41) or the fluid flow from or to the second pneumatic actuator (41), Equipped with, The aforementioned method, The steps include: applying a second control signal to the second control valve (23) to change at least one of the pressure of the second pneumatic actuator (41) or the fluid flow to the second pneumatic actuator (41), thereby moving the second mount (47) from a second starting position to a second ending position; The steps include monitoring, using the second fluid sensor (24), at least one of the fluctuating pressure of the second pneumatic actuator (41) or the fluctuating fluid flow to the second pneumatic actuator (41); A step of determining when the second mount reaches the second end position, A step of deriving the second control parameter based on processing a second set of observation parameters, wherein the second set of observation parameters is at least The second control signal, At least one of the fluctuating pressure or the fluctuating fluid flow of the second pneumatic actuator, Information regarding the arrival of the second mount (47) at the second termination position. Steps including, including method.

13. The first pneumatic positioning device is a pin lifting device (10, 40) for moving and positioning a substrate (5) that is processed by lift pins (20, 20'), The mounts (17, 47) are configured to contact and support the substrate (5) and hold the lift pins (20, 20') which are designed to form the working elements. The first pneumatic actuator (11, 41) provides a linear adjustment function for the mount (17, 47), or The first pneumatic positioning device is a vacuum valve (80) for adjusting the volume or mass flow rate, or for airtight sealing of the flow path, and the vacuum valve (80) is A valve seat (82) comprising a valve opening (81) defining an opening axis (O) and a first sealing surface surrounding the valve opening (81), A valve closing portion (84) forming the operating element having a second sealing surface corresponding to the first sealing surface, Equipped with, The valve closing portion (84) is coupled to the pneumatic actuator (91) by the mount (87) so that it can be adjusted from an open position in which the valve closing portion (84) and the valve seat (82) of the vacuum valve (80) are not in contact with each other, to a closed position in which there is seal contact between the first seal and the second seal surface via an intervening seal, thereby closing the valve opening (81), and so that it can be adjusted to a closed position in which the valve opening (81) is closed and becomes adjustable again. The mount (87) is designed to hold the valve closing portion (84). The method according to any one of claims 1 to 12.

14. In a control unit (30) for a vacuum system (1), the vacuum system (1) is: At least one first pneumatic positioning device (10, 40, 50, 80) configured to move and position an operating element, wherein the at least one first pneumatic positioning device (10, 40, 50, 80) is A first mount (17, 47, 87) configured to hold the aforementioned working elements (20, 20', 84), A first pneumatic actuator (11, 41, 91) is connected to the first mount (17, 47, 87) and interacts with the first mount (17, 47, 87) so that the first mount (17, 47, 87) is movable along the first movable axis (M1, M2), A first pneumatic positioning device (10, 40, 50, 80) is provided, A first control valve (21, 23, 27) is connected to the first pneumatic actuator (11, 41, 91) and the first fluid supply unit (35) and is configured to change at least one of the pressure in the first pneumatic actuator (11, 41, 91) or the fluid flow from or to the first pneumatic actuator (11, 41, 91) in order to provide movement of the first mount (17, 47, 87), A first fluid sensor (22, 24, 28) is configured to measure at least one of the pressure of the first pneumatic actuator (11, 41, 91) or the fluid flow from or to the first pneumatic actuator (11, 41, 91), Equipped with, The control unit is A first control signal is applied to the first control valve (21, 23, 27) to change at least one of the pressure of the first pneumatic actuator (11, 41, 91) or the fluid flow to the first pneumatic actuator (11, 41, 91), thereby moving the first mount (17, 47, 87) from a first starting position to a first ending position. The first fluid sensors (22, 24, 28) monitor at least one of the fluctuating pressure of the first pneumatic actuators (11, 41, 91) or the fluctuating fluid flow to the first pneumatic actuators (11, 41, 91). Determine when the first mount (17, 47, 87) will reach the first end position. The control parameters are derived based on processing a set of observation parameters, and the set of observation parameters is at least The first control signal, At least one of the fluctuating pressure or the fluctuating fluid flow, Information regarding the arrival of the first mount at the first termination position. including, It is configured to A control unit characterized by the following features.

15. A computer program product embodied by electromagnetic waves having a program code segment having program code stored in a machine-readable carrier, particularly stored in a control unit (30) according to claim 14, or for performing or controlling the method according to any one of claims 1 to 13, wherein the computer program product includes computer executable instructions for performing the method according to any one of claims 1 to 13, and in particular, the computer program product is configured such that, when executed, the steps of the method according to any one of claims 1 to 13 are performed automatically.

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