Hydrogen gas supply device and hydrogen gas supply system

Abstract

This enables the supply of hydrogen gas, from which impurities such as water and oxygen have been suitably removed, to customers requiring high-purity hydrogen gas. [Solution] The system is equipped with solenoid valves 7a and 7b that adjust the oxygen detection processing position by the oxygen detection unit 8 and the flow rate of hydrogen gas Gh to the storage unit 20 according to the control of the control unit 9. The "removal processing unit (gas-liquid separation tank 3, hollow fiber membrane filter 4, oxygen removal filter 5, and moisture removal filter 6)" and the oxygen detection unit 8 are housed in the housing 10, and the hydrogen gas Gh that has passed through the detection processing position is released into the housing 10. The hollow fiber membrane filter 4 is arranged to release moisture separated from the hydrogen gas Gh into the housing 10. The control unit 9 controls the solenoid valves 7a and 7b to supply high-purity hydrogen gas Gh to the storage unit 20 when the hydrogen purity of the hydrogen gas Gh identified based on the detection result by the oxygen detection unit 8 reaches a predetermined supply allowable purity.

Description

Technical Field

[0001] The present invention relates to a hydrogen gas supply device configured to supply a high-purity hydrogen gas from which impurities contained in hydrogen gas have been removed to a supply target, and a hydrogen gas supply system including such a hydrogen gas supply device and an electrolysis processing device that generates hydrogen gas by electrolysis processing.

Background Art

[0002] For example, the following patent document discloses a hydrogen generation system configured to electrolyze pure water generated from tap water (public water supply) by a pure water supply device to generate high-pressure hydrogen, and store the generated hydrogen (hydrogen gas) in a hydrogen tank or the like and supply it to a fuel cell vehicle or the like. This hydrogen generation system includes a water electrolysis device that generates hydrogen gas from pure water, a gas-liquid separator that removes moisture contained in the hydrogen gas generated by the water electrolysis device, a water adsorption device that adsorbs and removes moisture contained in the hydrogen gas passed through the gas-liquid separator, and a hydrogen tank capable of storing the hydrogen gas passed through the water adsorption device. In this case, in this hydrogen generation system, the above gas-liquid separator and water adsorption device are arranged in the flow path of hydrogen gas from the water electrolysis device to the hydrogen tank, thereby avoiding a situation where hydrogen gas containing a large amount of moisture flows into the hydrogen tank.

[0003] Furthermore, it is known that in water electrolysis devices (electrolysis treatment devices) used in this type of system, immediately after the start of the hydrogen gas generation process (electrolysis process), the amount of impurities such as oxygen in the generated hydrogen gas is large, resulting in a low purity of hydrogen gas. Therefore, in this hydrogen generation system, a back pressure valve mechanism is provided at the upstream end of the hydrogen gas flow path generated in the water electrolysis device. This mechanism is designed to discharge the hydrogen gas through a hydrogen discharge channel when the pressure of the hydrogen gas in the flow path has not reached a predetermined pressure immediately after the start of the generation process. In addition, this hydrogen generation system is designed to allow the flow of hydrogen gas toward the hydrogen tank only after a period of time has elapsed since the start of the generation process and the pressure of the hydrogen gas in the flow path has reached or exceeded a predetermined pressure.

[0004] Furthermore, in this hydrogen production system, an oxygen concentration meter is installed between the water electrolyzer and the gas-liquid separator in the hydrogen gas flow path to detect the oxygen contained in the hydrogen gas (determine the oxygen concentration of the hydrogen gas). In addition to the pressure conditions of the hydrogen gas in the flow path as described above, the system is configured such that when the oxygen concentration determined by the oxygen concentration meter reaches an oxygen concentration usable in a polymer electrolyte fuel cell, the flow of hydrogen gas toward the hydrogen tank by the back pressure valve mechanism is permitted. Through these configurations, this hydrogen production system aims to avoid a situation where "hydrogen gas containing a large amount of impurities such as oxygen (low-purity hydrogen gas)" generated immediately after the start of the production process by the water electrolyzer flows into the hydrogen tank. [Prior art documents] [Patent Documents]

[0005] [Patent Document 1] Japanese Patent Publication No. 2010-053378 (pages 4-7, figures 1-4) [Overview of the Initiative] [Problems that the invention aims to solve]

[0006] However, the hydrogen generation system disclosed in the above-mentioned patent document has the following problems that need to be solved. Specifically, as mentioned above, this hydrogen generation system attempts to avoid a situation in which hydrogen gas containing a large amount of impurities such as oxygen flows into the hydrogen tank by restricting the flow of hydrogen gas toward the hydrogen tank until the oxygen concentration of the hydrogen gas produced by the water electrolysis device falls below a predetermined concentration and the pressure of the hydrogen gas exceeds a predetermined pressure.

[0007] In this case, the hydrogen generation system disclosed in the above-mentioned patent document has an oxygen concentration meter installed between the water electrolysis device and the gas-liquid separator. Therefore, in this hydrogen generation system, the oxygen concentration is detected by the oxygen concentration meter on "hydrogen gas containing a large amount of water" that has been discharged from the water electrolysis device and before the water is separated in the gas-liquid separator. As a result, in this hydrogen generation system, there is a risk that a large amount of water will adhere to the oxygen concentration meter, making it difficult to accurately detect the amount of oxygen contained in the hydrogen gas. Consequently, in this hydrogen generation system, there is a risk that the amount of oxygen contained in the hydrogen gas will be misdetected, and hydrogen gas with insufficient oxygen reduction may flow into the hydrogen tank.

[0008] In this hydrogen generation system, fuel cell vehicles (fuel cells), which are envisioned as the target recipients of the hydrogen gas produced, can still achieve their purpose (such as power generation using hydrogen gas) even if the supplied hydrogen gas contains a certain amount of impurities such as oxygen and water. However, hydrogen gas intended for use as a carrier gas in gas chromatography, or as a reducing gas in photolithography and CDV processes for semiconductor devices, needs to be of a much higher hydrogen purity (a state in which the content of impurities such as water and oxygen is sufficiently low) than the hydrogen gas used as fuel gas in fuel cells. Therefore, as mentioned above, in the hydrogen generation system described above, where there is a risk of oxygen-containing hydrogen gas flowing into the hydrogen tank, there is a problem in that it is difficult to supply hydrogen gas to targets that require high-purity hydrogen gas, such as gas chromatography.

[0009] This invention has been made in view of the problems that need to be solved, and its main objective is to provide a hydrogen gas supply device and a hydrogen gas supply system that can supply hydrogen gas from which impurities such as water and oxygen have been suitably removed to a target that requires high-purity hydrogen gas. [Means for solving the problem]

[0010] To achieve the above objective, the hydrogen gas supply device according to claim 1 is configured to supply the hydrogen gas after the impurity removal treatment to a target, comprising: an oxygen detection unit that detects oxygen in the hydrogen gas after the impurity removal treatment; a control unit that controls the manner of supplying the hydrogen gas to the target according to the detection result by the oxygen detection unit; a housing that houses at least the removal unit and the oxygen detection unit; and a flow rate adjustment unit that adjusts the oxygen detection processing position by the oxygen detection unit and the flow rate of the hydrogen gas to the target according to the control of the control unit, wherein the removal unit comprises: a first removal unit having a gas-liquid separation tank that separates and removes water as an impurity contained in the hydrogen gas supplied from the source; and the hydrogen gas that has passed through the first removal unit The system comprises a second removal processing unit having a hollow fiber membrane filter for separating and removing water as an impurity from the hydrogen gas; a third removal processing unit having an oxygen removal filter for removing oxygen as an impurity contained in the hydrogen gas that has passed through the second removal processing unit by catalytic reaction; and a fourth removal processing unit having a water removal filter for adsorbing and removing water as an impurity contained in the hydrogen gas that has passed through the third removal processing unit. The system is configured such that the hydrogen gas that has passed through the detection processing position is released into the housing. The second removal processing unit is equipped with the hollow fiber membrane filter so that the water separated from the hydrogen gas can be released into the housing. The control unit determines the hydrogen purity of the hydrogen gas based on the detection result by the oxygen detection unit, and controls the flow rate adjustment unit to supply high-purity hydrogen gas to the target when the determined hydrogen purity reaches a predetermined supply allowable purity.

[0011] The hydrogen gas supply device according to claim 2 is the hydrogen gas supply device according to claim 1, wherein the control unit performs a purity notification process that notifies purity information that can identify the hydrogen purity when predetermined notification conditions are met.

[0012] The hydrogen gas supply device according to claim 3 is the hydrogen gas supply device according to claim 1, wherein the fourth removal processing unit comprises at least activated alumina as an adsorbent to constitute the moisture removal filter.

[0013] The hydrogen gas supply system according to claim 4 comprises a hydrogen gas supply device according to any one of claims 1 to 3 and an electrolysis treatment device as the supply source that generates the hydrogen gas by electrolyzing raw water.

[0014] The hydrogen gas supply system according to claim 5 is the hydrogen gas supply system according to claim 4, further comprising a water storage tank capable of storing the raw water, wherein the water storage tank and the electrolysis treatment device are housed within the casing, and the oxygen generated during the generation of hydrogen gas in the electrolysis treatment device is discharged outside the casing via the water storage tank. [Effects of the Invention]

[0015] The hydrogen gas supply device according to claim 1 includes: an oxygen detection unit that detects oxygen in hydrogen gas after an impurity removal process that removes impurities contained in the hydrogen gas supplied from a supply source; a control unit that controls the mode of supplying hydrogen gas to the target according to the detection result by the oxygen detection unit; a housing that houses at least a removal processing unit that performs the impurity removal process and an oxygen detection unit; and a flow rate adjustment unit that adjusts the oxygen detection processing position by the oxygen detection unit and the flow rate of hydrogen gas to the target according to the control of the control unit, wherein the removal processing unit includes a first removal processing unit having a gas-liquid separation tank that separates and removes water as an impurity contained in the hydrogen gas supplied from the supply source; and a hollow fiber membrane that separates and removes water as an impurity contained in the hydrogen gas that has passed through the first removal processing unit. The system comprises a second removal processing unit having a filter, a third removal processing unit having an oxygen removal filter that removes oxygen as an impurity contained in the hydrogen gas that has passed through the second removal processing unit by catalytic reaction, and a fourth removal processing unit having a moisture removal filter that adsorbs and removes moisture as an impurity contained in the hydrogen gas that has passed through the third removal processing unit, and is configured so that the hydrogen gas that has passed through the detection processing position is released into the housing, the second removal processing unit is equipped with a hollow fiber membrane filter so that moisture separated from the hydrogen gas can be released into the housing, and the control unit determines the hydrogen purity of the hydrogen gas based on the detection result by the oxygen detection unit, and controls the flow rate adjustment unit to supply high-purity hydrogen gas to the target when the determined hydrogen purity reaches a predetermined supply allowable purity.

[0016] Therefore, according to the hydrogen gas supply device described in claim 1, by adopting a configuration in which the oxygen contained in the hydrogen gas from which moisture has been removed by the removal processing unit (first removal processing unit, second removal processing unit, and fourth removal processing unit) is detected by the oxygen detection unit, it is possible to avoid a situation in which hydrogen gas containing a large amount of moisture flows into the oxygen detection processing position of the oxygen detection unit, thereby enabling accurate detection of whether or not oxygen is contained in the hydrogen gas and to what extent oxygen is contained. Furthermore, by adopting a configuration in which the hydrogen gas from which moisture has been removed by the removal processing unit is discharged into the housing that houses the second removal processing unit, the partial pressure of water vapor outside the hollow fiber membrane filter in the second removal processing unit can be sufficiently reduced, and moisture contained in the hydrogen gas passing inside the hollow fiber membrane filter can be suitably released to the surroundings of the hollow fiber membrane filter (second removal processing unit) (a mixture of the atmosphere and hydrogen gas inside the housing). This significantly improves the moisture removal capacity of the second removal unit, allowing for effective removal of moisture contained in the hydrogen gas. This prevents moisture from adhering to the third removal unit, thus maintaining the oxygen removal capacity of the third removal unit in a favorable state. Furthermore, by employing a configuration in which hydrogen gas is supplied to the target when the hydrogen purity, determined based on the detection results from the oxygen detection unit, reaches the supply-permissible purity, the situation of supplying low-purity hydrogen gas containing a large amount of oxygen can be reliably avoided.

[0017] In the hydrogen gas supply device according to claim 2, the control unit performs a purity notification process that notifies purity information that can identify the hydrogen purity when predetermined notification conditions are met. Therefore, the hydrogen gas supply device according to claim 2 makes it possible for the user to reliably and easily recognize whether or not high-purity hydrogen gas that has reached the supply-permissible purity is being supplied to the target.

[0018] In the hydrogen gas supply device according to claim 3, the fourth removal section comprises a moisture removal filter with at least activated alumina as an adsorbent. Therefore, according to the hydrogen gas supply device according to claim 3, not only moisture, which is the main target of removal, but also carbon dioxide contained in the hydrogen gas can be suitably removed in the fourth removal section. As a result, even higher purity hydrogen gas can be supplied to the target.

[0019] The hydrogen gas supply system according to claim 4 comprises the above-mentioned hydrogen gas supply device and an electrolysis treatment device as a supply source that generates hydrogen gas by electrolyzing raw water. Therefore, according to the hydrogen gas supply system according to claim 4, unlike generation devices (supply sources) that generate hydrogen gas by reforming fossil fuels or thermal decomposition of biomass, hydrogen gas can be easily generated and supplied to the target using an electrolysis treatment device with a relatively simple configuration. As a result, the hydrogen gas supply system can be made more compact, making it easier to store and transport.

[0020] The hydrogen gas supply system according to claim 5 includes a water storage tank capable of storing raw water, the water storage tank and the electrolysis treatment device are housed within the casing, and the system is configured such that oxygen generated during hydrogen gas production in the electrolysis treatment device is discharged to the outside of the casing via the water storage tank. Therefore, according to the hydrogen gas supply system according to claim 5, oxygen discharged from the electrolysis treatment device housed within the casing can be discharged to the outside of the casing through a water inlet to the water storage tank, without the need to provide a dedicated exhaust port or the like for discharging oxygen to the outside of the casing, and it is possible to suitably avoid a state in which the hydrogen gas discharged into the casing after oxygen detection by the oxygen detection unit is completed and the oxygen discharged from the electrolysis treatment device are mixed inside the casing. [Brief explanation of the drawing]

[0021] [Figure 1] This is a diagram showing the configuration of the hydrogen gas supply system 100.

Embodiments for Carrying Out the Invention

[0022] Hereinafter, embodiments of a hydrogen gas supply device and a hydrogen gas supply system will be described with reference to the accompanying drawings.

[0023] First, the configuration of the hydrogen gas supply system 100 will be described with reference to the accompanying drawings.

[0024] The hydrogen gas supply system 100 shown in FIG. 1 is an example of a "hydrogen gas supply system". As will be described later, it is configured to be able to execute generation of hydrogen gas Gh, removal of impurities from the generated hydrogen gas Gh, and supply to a storage unit 20 (a hydrogen gas tank: a hydrogen gas canister, which is an example of a "supply target") of high-purity hydrogen gas Gh from which impurities have been removed. In the hydrogen gas supply system 100 of this example, as an example, a configuration in which hydrogen gas Gh can be supplied to the detachable storage unit 20 is adopted. However, instead of the storage unit 20, a configuration in which hydrogen gas Gh is directly supplied to "various devices that require high-purity hydrogen gas (another example of a'supply target')" such as a gas chromatograph can also be adopted.

[0025] This hydrogen gas supply system 100 includes a raw material water tank 1, an electrolysis processing device 2, a gas-liquid separation tank 3, a hollow fiber membrane filter 4, an oxygen removal filter 5, a moisture removal filter 6, electromagnetic valves 7a, 7b, an oxygen detection unit 8, and a control unit 9. These components 1 to 9 are housed in a housing 10 and packaged. In this example, a "hydrogen gas supply device" is constituted by components 3 to 10 excluding the raw material water tank 1 and the electrolysis processing device 2. Also, in this example, the gas-liquid separation tank 3, the hollow fiber membrane filter 4, the oxygen removal filter 5, and the moisture removal filter 6 together constitute a "removal processing unit capable of executing an impurity removal process for removing impurities contained in the hydrogen gas supplied from a supply source from the hydrogen gas".

[0026] The raw water tank 1 is an example of a "water storage tank" and is configured to store raw water W (an example of "raw water") that does not contain impurities and is produced by a pure water generator (pure water purifier) ​​or the like (not shown). In this case, the hydrogen gas supply system 100 of this example has a water inlet (not shown) opening in the housing 10 that allows raw water W to be supplied to the raw water tank 1 housed in the housing 10. From this water inlet, air is drawn in as the amount of raw water W in the raw water tank 1 decreases, and oxygen Go, which has been discharged from the electrolysis treatment device 2 and guided into the raw water tank 1, is also discharged, as will be described later. Alternatively, a vent for drawing air into the raw water tank 1 and for discharging oxygen Go from the raw water tank 1 can be provided separately from the water inlet.

[0027] The electrolysis treatment apparatus 2 is an example of an "electrolysis treatment apparatus as a supply source," and is configured to generate hydrogen gas Gh by electrolyzing raw water W stored in the raw water tank 1 according to the control of the control unit 9. In this case, in this type of "electrolysis treatment apparatus," when hydrogen gas Gh is generated by electrolysis, oxygen Go is generated along with the hydrogen gas Gh, and a small amount of raw water W is discharged along with the hydrogen gas Gh and oxygen Go. Therefore, in the hydrogen gas supply system 100 of this example, as will be described later, the raw water W discharged along with the hydrogen gas Gh is separated from the hydrogen gas Gh in the gas-liquid separation tank 3, the separated raw water W is flowed into the raw water tank 1, and the raw water W discharged along with oxygen Go is also flowed into the raw water tank 1 along with oxygen Go, thereby effectively utilizing it as raw water W used in the electrolysis treatment in the electrolysis treatment apparatus 2.

[0028] The gas-liquid separation tank 3 is an example of a gas-liquid separation tank that constitutes the "first removal processing unit," and is configured to separate and remove raw water W (liquid droplets of water) discharged from the electrolysis processing unit 2 together with hydrogen gas Gh, as described above, and to store the removed raw water W. In this case, the hydrogen gas supply system 100 of this example has a solenoid valve 3a installed in the water supply piping from the gas-liquid separation tank 3 to the raw water tank 1, and the control unit 9 is configured to send the raw water W from the gas-liquid separation tank 3 to the raw water tank 1 when it determines that a specified amount of raw water W has been stored in the gas-liquid separation tank 3 based on the sensor signal of a water level sensor (not shown).

[0029] The hollow fiber membrane filter 4 is an example of a hollow fiber membrane filter that constitutes the "second removal processing unit," and separates and removes the moisture (water vapor) contained in the hydrogen gas Gh from the hydrogen gas Gh after the raw water W (liquid droplets of water) has been removed when it passes through the gas-liquid separation tank 3. Specifically, in the hollow fiber membrane filter 4 of this example, when the hydrogen gas Gh that has passed through the gas-liquid separation tank 3 passes through a tubular section made of a non-porous hollow fiber membrane, the difference between the partial pressure of water vapor in the hydrogen gas Gh inside the tubular section and the partial pressure of water vapor in the atmosphere inside the housing 10 causes moisture to move from the inside of the tubular section to the outside of the tubular section where the partial pressure of water vapor is lower, and is released around the tubular section (inside the housing 10), thereby removing moisture from the hydrogen gas Gh inside the tubular section.

[0030] In this case, although the amount of water contained in the hydrogen gas Gh that has passed through the gas-liquid separation tank 3 is small, when this small amount of water reaches the oxygen removal filter 5, it not only becomes difficult for the oxygen removal filter 5 to remove oxygen effectively, but it may also lead to a situation where the "oxygen removal capacity" of the oxygen removal filter 5 decreases rapidly. For this reason, in the hydrogen gas supply system 100 of this example, a hollow fiber membrane filter 4 is installed between the gas-liquid separation tank 3 and the oxygen removal filter 5 in order to sufficiently reduce the amount of water contained in the hydrogen gas Gh that has passed through the gas-liquid separation tank 3 that reaches the oxygen removal filter 5.

[0031] The oxygen removal filter 5 is an example of an oxygen removal filter that constitutes the "third removal processing unit," and removes oxygen contained in the hydrogen gas Gh that has passed through the hollow fiber membrane filter 4 from the hydrogen gas Gh by a catalytic reaction. In this case, in the oxygen removal filter 5 that removes oxygen from the hydrogen gas Gh by a catalytic reaction, a small amount of water is generated by the reaction between the oxygen to be removed and the hydrogen gas Gh.

[0032] The moisture removal filter 6 is an example of a "moisture removal filter" that constitutes the "fourth removal processing unit," and it adsorbs and removes moisture contained in the hydrogen gas Gh that has passed through the oxygen removal filter 5 (mainly moisture generated by the catalytic reaction in the oxygen removal filter 5). In this case, the hydrogen gas supply system 100 of this example has, as an example, two adsorption units: one filled with activated alumina granules (an example of "activated alumina") as a moisture adsorbent, and another filled with synthetic zeolite (molecular sieve) granules as a moisture adsorbent, arranged in this order along the flow direction of the hydrogen gas Gh. Note that the above adsorbents are not limited to granules, but can be in various shapes such as powder, rod, and plate.

[0033] Solenoid valves 7a and 7b are examples of "flow rate adjustment units," where solenoid valve 7a, in accordance with the control unit 9, allows / regulates the flow of hydrogen gas Gh, which has passed through the moisture removal filter 6, to the "oxygen detection processing position by the oxygen detection unit 8," and solenoid valve 7b, in accordance with the control unit 9, allows / regulates the flow (supply) of hydrogen gas Gh, which has passed through the moisture removal filter 6, to the storage unit 20.

[0034] In this case, the hydrogen gas supply system 100 of this example employs a configuration in which, when the solenoid valve 7a is moved to the open state and the solenoid valve 7b is moved to the closed state, the entire amount of hydrogen gas Gh that has passed through the moisture removal filter 6 is directed toward the "oxygen detection processing position by the oxygen detection unit 8", and when the solenoid valve 7a is moved to the closed state and the solenoid valve 7b is moved to the open state, the entire amount of hydrogen gas Gh that has passed through the moisture removal filter 6 is directed toward the storage unit 20 (an example of adjusting the "detection processing position and the flow rate of hydrogen gas to the supply target"). Instead of this configuration, for example, by replacing the on / off valve solenoid valve 7a with a flow rate adjustment valve whose opening degree can be adjusted and configuring a "flow rate adjustment unit", it is possible to move the solenoid valve 7b to the open state and arbitrarily change the opening degree of the flow rate adjustment valve, so that a portion of the hydrogen gas Gh that has passed through the moisture removal filter 6 is directed toward the storage unit 20, while the other portion of the hydrogen gas Gh that has passed through the moisture removal filter 6 is directed toward the "oxygen detection processing position by the oxygen detection unit 8".

[0035] The oxygen detection unit 8 is an example of an "oxygen detection unit that detects oxygen in hydrogen gas after impurity removal treatment." In the hydrogen gas supply system 100 of this example, the oxygen detection unit 8 is configured with a galvanic cell-type oxygen sensor as an example. In this case, the hydrogen gas supply system 100 of this example has a flow path for hydrogen gas Gh such that the hydrogen gas Gh (hydrogen gas Gh that has passed through the oxygen detection processing position) that has passed through the moisture removal filter 6 and whose oxygen detection by the oxygen detection unit 8 has been completed is released into the housing 10.

[0036] The control unit 9 is an example of a "control unit" and comprehensively controls the hydrogen gas supply system 100. Specifically, the control unit 9 controls the electrolysis treatment device 2 to generate hydrogen gas Gh, and determines the hydrogen purity of the hydrogen gas Gh based on the detection results by the oxygen detection unit 8 for the hydrogen gas Gh generated by the electrolysis treatment device 2 and passed through the "removal treatment device". Furthermore, the control unit 9 restricts the supply of the hydrogen gas Gh to the storage unit 20 when the determined hydrogen purity does not reach a predetermined supply-permissible purity, and allows the supply of the hydrogen gas Gh to the storage unit 20 when the determined hydrogen purity reaches a predetermined supply-permissible purity (an example of "controlling the hydrogen gas supply method to the target according to the detection results by the oxygen detection unit").

[0037] In practice, the amount of moisture contained in the hydrogen gas Gh that has passed through the "removal processing unit" described above is identified, and the supply of hydrogen gas Gh to the storage unit 20 is permitted only when the amount of moisture is below a predetermined level. However, in order to facilitate understanding of the configuration of the "hydrogen gas supply device" and the "hydrogen gas supply system," the explanation of how to identify this moisture content and how to permit / regulate the supply of hydrogen gas Gh to the storage unit 20 based on the identified result will be omitted.

[0038] Furthermore, the control unit 9, as an example, executes a "purity notification process" to sequentially display the specified hydrogen purity (as an example, a numerical value indicating purity) on an unillustrated display unit when the hydrogen purity of the hydrogen gas Gh identified based on the detection results of the oxygen detection unit 8 does not reach the supply-permissible purity (an example of when "pre-defined notification conditions are met"). Also, when the hydrogen purity of the specified hydrogen gas Gh reaches the supply-permissible purity and the supply of this hydrogen gas Gh to the storage unit 20 is permitted, the control unit 9 executes a "purity notification process" to have the oxygen detection unit 8 detect the oxygen contained in the hydrogen gas Gh at predetermined time intervals (another example of when "pre-defined notification conditions are met"), and to identify the hydrogen purity based on the detection results and display it on the display unit.

[0039] Furthermore, regarding the display (notification) of hydrogen purity, instead of performing the notification each time the hydrogen purity is determined, a configuration can be adopted in which the determined hydrogen purity is displayed when the determined hydrogen purity falls below the specified purity (another example of "when the predetermined notification conditions are met"), or when the determined hydrogen purity reaches the specified purity (another example of "when the predetermined notification conditions are met"). In addition, instead of (or in addition to) the "purity notification processing at predetermined time intervals" when hydrogen gas Gh is allowed to be supplied to the storage unit 20, the determined hydrogen purity can be displayed based on the detection result by the oxygen detection unit 8 when a purity display switch (not shown) is operated (another example of "when the predetermined notification conditions are met").

[0040] Next, the operating principle of the hydrogen gas supply system 100 will be explained with reference to the attached diagram.

[0041] When generating hydrogen gas Gh and supplying (filling) it to the storage unit 20 using this hydrogen gas supply system 100, first, raw water W is supplied from the aforementioned water inlet to store a sufficient amount of raw water W in the raw water tank 1. In this state, when the processing start switch on the operation unit (not shown) is operated, the control unit 9 controls the electrolysis processing unit 2 to start the electrolysis process (hydrogen gas Gh generation process). Since the hydrogen gas Gh generation process (electrolysis process) by the electrolysis processing unit 2 is well known, a detailed explanation is omitted. In this case, at this point in time of processing start, the control unit 9 moves the solenoid valve 7b to the closed state and the solenoid valve 7a to the open state. As a result, the hydrogen gas Gh generated by the electrolysis processing unit 2 passes through the gas-liquid separation tank 3, the hollow fiber membrane filter 4, the oxygen removal filter 5, the moisture removal filter 6, and the solenoid valve 7a in that order, and oxygen is detected at the oxygen detection processing position by the oxygen detection unit 8, after which a flow path is formed for release into the housing 10.

[0042] In this case, as mentioned above, during the electrolysis process (hydrogen gas Gh generation process) by the electrolysis treatment device 2, oxygen Go is generated along with hydrogen gas Gh, and a small amount of raw water W is discharged from the electrolysis treatment device 2 along with the hydrogen gas Gh and oxygen Go. At this time, the oxygen Go discharged from the electrolysis treatment device 2, containing the raw water W, flows into the raw water tank 1, so that the raw water W discharged with oxygen Go mixes with the raw water W stored in the raw water tank 1 and is reused as raw water W for the electrolysis process in the electrolysis treatment device 2. This makes effective use of the expensive raw water W produced by the pure water generator, etc.

[0043] Furthermore, the oxygen Go that is introduced into the raw water tank 1 along with the raw water W is exhausted outside the housing 10 through a water inlet (or a vent for drawing in air, etc.) provided in the raw water tank 1. This effectively avoids a situation where the oxygen Go discharged from the electrolysis treatment device 2 and the hydrogen gas Gh that is exhausted into the housing 10 after oxygen detection by the oxygen detection unit 8 are mixed inside the housing 10 (a state in which oxygen Go and hydrogen gas Gh can react inside the housing 10), without requiring a dedicated exhaust port for exhausting the oxygen Go discharged from the electrolysis treatment device 2 outside the housing 10.

[0044] On the other hand, the hydrogen gas Gh discharged from the electrolysis treatment device 2, containing the raw water W, passes through the gas-liquid separation tank 3, where the raw water W (liquid droplets) is separated and removed. The separated raw water W is stored in the gas-liquid separation tank 3, and when the amount of water stored in the gas-liquid separation tank 3 reaches a specified level, the control unit 9 opens the solenoid valve 3a, allowing the water to flow from the gas-liquid separation tank 3 into the raw water tank 1. As a result, most of the water discharged from the electrolysis treatment device 2 along with the hydrogen gas Gh is reused as raw water W for the electrolysis treatment in the electrolysis treatment device 2, thus making effective use of the expensive raw water W.

[0045] Furthermore, when the hydrogen gas Gh passes through the gas-liquid separation tank 3, moisture is removed when it passes through the hollow fiber membrane filter 4, oxygen is removed when it passes through the oxygen removal filter 5, and moisture generated in the oxygen removal filter 5 is removed when it passes through the moisture removal filter 6. As a result, unlike the hydrogen generation system described above, in which the oxygen concentration is detected by an oxygen concentration meter on "hydrogen gas containing a large amount of moisture" before moisture is separated in the gas-liquid separator, the hydrogen gas Gh from which moisture has been suitably removed reaches the oxygen detection processing position by the oxygen detection unit 8, making it possible to accurately detect the oxygen contained in this hydrogen gas Gh.

[0046] In this case, the moisture removal filter 6 used in the hydrogen gas supply system 100 of this example is configured to have an adsorption section filled with activated alumina granules as a moisture "adsorbent," as described above. It has been confirmed that the activated alumina used in this adsorption section not only has the ability to adsorb and remove moisture, but also has the ability to suitably adsorb and remove carbon dioxide contained in the hydrogen gas Gh. Therefore, the amount of carbon dioxide, which is an "impurity," is reduced in the hydrogen gas Gh that has passed through the moisture removal filter 6 by passing through the adsorption section of activated alumina granules.

[0047] Furthermore, the hydrogen gas Gh, after oxygen detection at the detection processing location has been completed, is released into the housing 10 as described above. At this time, in this hydrogen gas supply system 100, a hollow fiber membrane filter 4 is provided inside the housing 10 to remove moisture contained in the hydrogen gas Gh that has passed through the gas-liquid separation tank 3. Therefore, when the hydrogen gas Gh, from which moisture has been sufficiently removed as it passes through the gas-liquid separation tank 3, the hollow fiber membrane filter 4, and the moisture removal filter 6, is released into the housing 10 after oxygen detection at the detection processing location, the relative humidity of the "mixture of air and hydrogen gas Gh" around the hollow fiber membrane filter 4 decreases, and the partial pressure of water vapor inside the housing 10 becomes sufficiently lower than the partial pressure of water vapor of the hydrogen gas Gh passing through the hollow fiber membrane filter 4. As a result, moisture can be suitably separated from the hydrogen gas Gh passing through the hollow fiber membrane filter 4 and suitably discharged into the "mixture" inside the housing 10 (around the hollow fiber membrane filter 4). As a result, the removal of moisture from hydrogen gas Gh in the hollow fiber membrane filter 4 becomes more efficient. This significantly reduces the amount of moisture that reaches the oxygen removal filter 5 along with the hydrogen gas Gh, allowing for accurate detection of whether or not oxygen is present in the hydrogen gas Gh, and to what extent.

[0048] Meanwhile, the control unit 9, based on the oxygen detection result by the oxygen detection unit 8, identifies the amount of oxygen contained in the hydrogen gas Gh that has passed through the moisture removal filter 6, and, based on the identified amount of oxygen, identifies the hydrogen purity of the hydrogen gas Gh and displays the hydrogen purity on a display unit (not shown). In this case, immediately after the start of the generation process by the electrolysis processing device 2, the amount of oxygen contained in the hydrogen gas Gh discharged from the electrolysis processing device 2 is large, so this oxygen cannot be sufficiently removed by the oxygen removal filter 5, and the hydrogen purity of the hydrogen gas Gh that has passed through the moisture removal filter 6 becomes low. Therefore, immediately after the start of the generation process by the electrolysis processing device 2, the low hydrogen purity identified by the control unit 9 is sequentially displayed on the display unit. As a result, anyone who sees this display can reliably and easily recognize that high-purity hydrogen gas Gh is not being generated.

[0049] Furthermore, after some time has elapsed since the start of the generation process by the electrolysis apparatus 2, when it becomes possible to generate hydrogen gas Gh with a sufficiently reduced amount of oxygen, the oxygen contained in the hydrogen gas Gh can be suitably removed by the oxygen removal filter 5, and the amount of oxygen detected by the oxygen detection unit 8 decreases sufficiently. At this time, the control unit 9 displays the hydrogen purity identified based on the detection result by the oxygen detection unit 8 on the display unit, and when the identified hydrogen purity reaches the supply-permissible purity, it switches the solenoid valve 7a to the closed state and the solenoid valve 7b to the open state. As a result, a flow path is formed in which the hydrogen gas Gh generated by the electrolysis apparatus 2 passes through the gas-liquid separation tank 3, the hollow fiber membrane filter 4, the oxygen removal filter 5, the moisture removal filter 6, and the solenoid valve 7b in this order, and is discharged (supplied) from the hydrogen gas supply system 100 to the storage unit 20.

[0050] As a result, high-purity hydrogen gas Gh, which has undergone moisture removal by the gas-liquid separation tank 3, hollow fiber membrane filter 4, and moisture removal filter 6, and oxygen removal by the oxygen removal filter 5, is supplied to the storage unit 20 and stored. Furthermore, anyone who looks at the hydrogen purity displayed on the display unit can easily and reliably recognize that high-purity hydrogen gas Gh has been generated and is being stored in the storage unit 20.

[0051] Furthermore, as described above, when hydrogen gas Gh is being supplied from the hydrogen gas supply system 100 to the storage unit 20 for storage, the control unit 9 causes the oxygen detection unit 8 to detect oxygen contained in the hydrogen gas Gh at predetermined time intervals, and determines the hydrogen purity based on the detection results and displays it on the display unit. Specifically, when a predetermined time has elapsed since the time when the determination of the hydrogen purity was completed and the solenoid valve 7a was moved to the closed state and the solenoid valve 7b was moved to the open state (the time when the supply of hydrogen gas Gh to the storage unit 20 was started), the control unit 9 moves the solenoid valve 7b to the closed state and the solenoid valve 7a to the open state, supplying the hydrogen gas Gh that has passed through the moisture removal filter 6 to the oxygen detection processing position of the oxygen detection unit 8, causing the oxygen detection unit 8 to detect oxygen, and determining the hydrogen purity of the hydrogen gas Gh based on the detection results of the oxygen detection unit 8, and displays the determined hydrogen purity on the display unit.

[0052] In this case, if the identified hydrogen purity is below the supply-permissible purity, that is, if the oxygen concentration in the hydrogen gas Gh that has passed through the moisture removal filter 6 is high and the hydrogen gas Gh is of low purity, the control unit 9 maintains the state in which the solenoid valve 7b is closed and the solenoid valve 7a is open, and repeatedly identifies the hydrogen purity of the hydrogen gas Gh based on the oxygen detection result by the oxygen detection unit 8. This prevents low-purity hydrogen gas Gh that does not meet the supply-permissible purity from being supplied to and stored in the storage unit 20, and allows anyone who looks at the hydrogen purity displayed on the display unit to reliably and easily recognize that the system is not in a state where high-purity hydrogen gas Gh is being generated.

[0053] On the other hand, when the specified hydrogen purity reaches the supply-permissible purity, that is, when the oxygen concentration in the hydrogen gas Gh that has passed through the moisture removal filter 6 is low and the hydrogen gas Gh is of high purity, the control unit 9 switches solenoid valve 7a to the closed state and solenoid valve 7b to the open state. As a result, the state in which high-purity hydrogen gas Gh is supplied from the hydrogen gas supply system 100 to the storage unit 20 and stored is resumed, and anyone who looks at the hydrogen purity displayed on the display unit can reliably and easily recognize that a state in which high-purity hydrogen gas Gh is being produced is achieved.

[0054] Subsequently, when a sufficient amount of hydrogen gas Gh is stored in the storage unit 20 connected to the hydrogen gas supply system 100, the control unit 9 stops the generation of hydrogen gas Gh by the electrolysis treatment device 2, closes the solenoid valve 7b, and lights up a "filling completion indicator" (not shown) to notify that the storage of hydrogen gas Gh in the storage unit 20 is complete. In this example, the hydrogen gas supply system 100 employs a configuration in which, as an example, it determines that a sufficient amount of hydrogen gas Gh has been stored in the storage unit 20 (that the storage of hydrogen gas Gh in the storage unit 20 is complete) when the pressure of the hydrogen gas Gh in the storage unit 20 reaches a predetermined pressure. Alternatively, a configuration can be adopted in which it determines that the storage of hydrogen gas Gh in the storage unit 20 is complete when a predetermined time has elapsed since the supply of hydrogen gas Gh to the storage unit 20 was stopped and the pressure of the hydrogen gas Gh in the storage unit 20 is maintained at or above a predetermined pressure.

[0055] Thus, the "hydrogen gas supply device" in this hydrogen gas supply system 100 includes an oxygen detection unit 8 that detects oxygen in hydrogen gas Gh after an "impurity removal process" which removes impurities contained in the hydrogen gas Gh supplied from the "supply source (in this example, the electrolysis processing device 2)", a control unit 9 that controls the mode of supplying hydrogen gas Gh to the "supply target (for example, the storage unit 20)" according to the detection result by the oxygen detection unit 8, a housing 10 that houses the "removal processing unit (in this example, a gas-liquid separation tank 3, a hollow fiber membrane filter 4, an oxygen removal filter 5, and a moisture removal filter 6)" that performs the "impurity removal process" and the oxygen detection unit 8, and solenoid valves 7a and 7b that adjust the oxygen detection processing position by the oxygen detection unit 8 and the flow rate of hydrogen gas Gh to the "supply target" according to the control unit 9, and the "removal processing unit" separates and removes moisture as an impurity contained in the hydrogen gas Gh supplied from the "supply source" from the hydrogen gas Gh. The system comprises a liquid separation tank 3, a hollow fiber membrane filter 4 that separates and removes water as an impurity contained in the hydrogen gas Gh that has passed through the gas-liquid separation tank 3, an oxygen removal filter 5 that removes oxygen as an impurity contained in the hydrogen gas Gh that has passed through the hollow fiber membrane filter 4 by catalytic reaction, and a moisture removal filter 6 that adsorbs and removes water as an impurity contained in the hydrogen gas Gh that has passed through the oxygen removal filter 5. The system is configured such that the hydrogen gas Gh that has passed through the above detection processing position is released into the housing 10, and the hollow fiber membrane filter 4 is arranged so that the water separated from the hydrogen gas Gh can be released into the housing 10. The control unit 9 determines the hydrogen purity of the hydrogen gas Gh based on the detection result by the oxygen detection unit 8, and controls the solenoid valves 7a and 7b to supply high-purity hydrogen gas Gh to the "supply target" when the determined hydrogen purity reaches a predetermined supply allowable purity.

[0056] Therefore, according to the "hydrogen gas supply device," by adopting a configuration in which the oxygen contained in hydrogen gas Gh from which moisture has been removed by the "removal processing unit (gas-liquid separation tank 3, hollow fiber membrane filter 4, and moisture removal filter 6)" is detected by the oxygen detection unit 8, it is possible to avoid a situation in which hydrogen gas Gh containing a large amount of moisture flows into the oxygen detection processing position of the oxygen detection unit 8, thereby enabling accurate detection of whether or not oxygen is contained in the hydrogen gas Gh and to what extent oxygen is contained. Furthermore, by adopting a configuration in which the hydrogen gas Gh from which oxygen detection by the oxygen detection unit 8 has completed, i.e., hydrogen gas Gh from which moisture has been removed by the "removal processing unit," is discharged into the housing 10 in which the hollow fiber membrane filter 4 is housed, the partial pressure of water vapor outside the hollow fiber membrane in the hollow fiber membrane filter 4 can be sufficiently reduced, and the moisture contained in the hydrogen gas Gh that passes inside the hollow fiber membrane can be suitably released to the surroundings of the hollow fiber membrane (hollow fiber membrane filter 4) (the mixture of the atmosphere and hydrogen gas Gh inside the housing 10). This significantly improves the moisture removal capacity of the hollow fiber membrane filter 4, allowing for the effective removal of moisture contained in the hydrogen gas Gh. This prevents moisture from adhering to the oxygen removal filter 5, thus maintaining the oxygen removal capacity of the oxygen removal filter 5 in an optimal state. Furthermore, by adopting a configuration in which hydrogen gas Gh is supplied to the "supply target" such as the storage unit 20 only when the hydrogen purity, determined based on the detection results from the oxygen detection unit 8, reaches the supply-permissible purity, the situation in which low-purity hydrogen gas Gh containing a large amount of oxygen is supplied can be reliably avoided.

[0057] Furthermore, in the hydrogen gas supply device of this hydrogen gas supply system 100, the control unit 9 performs a "purity notification process" that notifies purity information that allows for the identification of hydrogen purity when predetermined "notification conditions" are met. Therefore, with this "hydrogen gas supply device," the user can be reliably and easily informed of whether or not high-purity hydrogen gas Gh that has reached the supply-permissible purity is being supplied to the "supply target" such as the storage unit 20.

[0058] Furthermore, in the hydrogen gas supply device of this hydrogen gas supply system 100, the moisture removal filter 6 is configured to include at least activated alumina (in this example, activated alumina granules) as an adsorbent. Therefore, with this hydrogen gas supply device, not only moisture, which is the main target of removal, but also carbon dioxide contained in the hydrogen gas Gh can be suitably removed by the moisture removal filter 6. As a result, even higher purity hydrogen gas Gh can be supplied to the "supply target" such as the storage unit 20.

[0059] Furthermore, this hydrogen gas supply system 100 includes the above-mentioned "hydrogen gas supply device" and an electrolysis treatment device 2 that serves as a "supply source" for generating hydrogen gas Gh by electrolyzing raw water W. Therefore, unlike generation devices (supply sources) that generate hydrogen gas Gh by reforming fossil fuels or thermal decomposition of biomass, this hydrogen gas supply system 100 can easily generate hydrogen gas Gh using the relatively simple electrolysis treatment device 2 and supply it to "supply targets" such as the storage unit 20. This makes the hydrogen gas supply system 100 more compact, and makes it easier to store and transport.

[0060] Furthermore, this hydrogen gas supply system 100 includes a raw water tank 1 capable of storing raw water W, and the raw water tank 1 and the electrolysis treatment device 2 are housed within the housing 10. The system is configured such that oxygen Go generated during the production of hydrogen gas Gh in the electrolysis treatment device 2 is discharged outside the housing 10 via the raw water tank 1. Therefore, with this hydrogen gas supply system 100, oxygen Go discharged from the electrolysis treatment device 2 housed within the housing 10 can be discharged outside the housing 10 from the water inlet to the raw water tank 1 without the need to provide a dedicated exhaust port or the like. In addition, it is possible to suitably avoid a state in which the hydrogen gas Gh discharged into the housing 10 after the oxygen detection unit 8 has completed the detection of oxygen and the oxygen Go discharged from the electrolysis treatment device 2 are mixed inside the housing 10.

[0061] The configuration of the "hydrogen gas supply device" and "hydrogen gas supply system" is not limited to the example of the configuration of the hydrogen gas supply system 100 described above.

[0062] For example, the explanation described a configuration in which a moisture removal filter 6 is provided as the "fourth removal processing unit," having two adsorption units: one equipped with activated alumina (for example, activated alumina granules) as an adsorbent, and the other equipped with synthetic zeolite (for example, synthetic zeolite granules) as an adsorbent. However, the "fourth removal processing unit" can also be configured by providing only one of the activated alumina adsorption unit and the synthetic zeolite adsorption unit, or by combining one or both of the activated alumina adsorption unit and the synthetic zeolite adsorption unit with an adsorption unit equipped with an adsorbent other than activated alumina or synthetic zeolite. In this case, by using an adsorbent other than activated alumina or synthetic zeolite that is suitable for removing the impurities to be removed, it becomes possible to supply high-purity hydrogen gas Gh from which impurities other than moisture, oxygen, and carbon dioxide have also been suitably removed.

[0063] Furthermore, although the explanation described an example in which all components 1 to 9 are housed and packaged within the housing 10, it is also possible to package only the other components 3 to 8 within the housing, without housing the raw water tank 1, the electrolysis processing device 2, and the control unit 9 within the housing (not shown). Also, although the explanation described an example in which a raw water tank 1 capable of storing raw water W used during electrolysis processing by the electrolysis processing device 2 is provided, it is also possible to adopt a configuration in which, instead of a "storage tank" such as the raw water tank 1, a supply pipe for "raw water" capable of generating high-purity hydrogen gas Gh is directly connected to the electrolysis processing device 2, and the "raw water" supplied via the supply pipe is electrolyzed to generate hydrogen gas Gh (not shown).

[0064] Furthermore, although we have described an example configuration in which an electrolysis treatment device 2 capable of generating hydrogen gas Gh by electrolysis is provided, and impurities such as water and oxygen contained in the supplied hydrogen gas Gh are removed using this electrolysis treatment device 2 as a "supply source", it is also possible to configure the system without a "electrolysis treatment device" like the electrolysis treatment device 2, by connecting an "electrolysis treatment device" as an external device, or a "storage unit: hydrogen gas canister" in which the hydrogen gas Gh generated in the external device is stored, to a "removal processing unit (gas-liquid separation tank 3, hollow fiber membrane filter 4, oxygen removal filter 5, and water removal filter 6 in the hydrogen gas supply system 100)" as a "supply source", and removing "impurities" such as water and oxygen contained in the hydrogen gas Gh supplied from the "supply source" in the "removal processing unit", thereby enabling the supply of high-purity hydrogen gas Gh to "supply targets" such as the storage unit 20 (not shown).

[0065] Furthermore, although the explanation described an example in which hydrogen gas Gh (hydrogen gas Gh from which various impurities have been removed by the "removal processing unit") that has passed through the moisture removal filter 6 is directly supplied to the storage unit 20 as the "target of supply," instead of such a configuration, it is also possible to adopt a configuration in which a "storage unit" other than the storage unit 20, capable of storing hydrogen gas Gh from which various impurities have been removed by the "removal processing unit," is provided as a component of the "hydrogen gas supply device" or "hydrogen gas supply system," and the hydrogen gas Gh stored in this "storage unit" is supplied to various "targets of supply (including the "storage unit" such as the storage unit 20 in the above example)" (not shown).

[0066] Furthermore, while we have explained using as an example a configuration in which a "purity notification process" is performed to display a numerical value indicating the hydrogen purity of the hydrogen gas Gh identified based on the detection results of the oxygen detection unit 8 on the display unit, it is also possible to adopt a configuration in place of (or in addition to) such a configuration, which includes at least one of an indicator that lights up when the identified hydrogen purity reaches the supply-permissible purity, and an indicator that lights up when the identified hydrogen purity does not reach the supply-permissible purity, and which performs a "purity notification process" to notify the identified hydrogen purity by lighting up / turning off the indicators. Alternatively, it is also possible to adopt a configuration that performs a "purity notification process" to emit a notification sound according to the identified hydrogen purity, or to notify the identified hydrogen purity by voice. [Explanation of Symbols]

[0067] 100 Hydrogen gas supply system 1. Raw water tank 2. Electrolysis Apparatus 3 Gas-liquid separation tank 3a, 7a, 7b Solenoid valves 4. Hollow fiber membrane filter 5. Oxygen removal filter 6. Moisture Removal Filter 8. Oxygen detection unit 9. Control Unit 10 cabinets 20 Storage section Gh Hydrogen gas Go Oxygen W raw water

Claims

1. A hydrogen gas supply device is configured to supply hydrogen gas to a target, comprising a removal processing unit capable of performing an impurity removal process to remove impurities contained in hydrogen gas supplied from a source, and the hydrogen gas after the impurity removal process. An oxygen detection unit for detecting oxygen in the hydrogen gas after the impurity removal treatment, A control unit that controls the manner in which hydrogen gas is supplied to the target according to the detection result by the oxygen detection unit, A housing comprising at least the removal processing unit and the oxygen detection unit, The system includes a flow rate adjustment unit that adjusts the oxygen detection processing position by the oxygen detection unit and the flow rate of the hydrogen gas to the supply target, in accordance with the control of the control unit. The removal processing unit is, A first removal processing unit having a gas-liquid separation tank for separating and removing water, which is an impurity contained in the hydrogen gas supplied from the aforementioned supply source, from the hydrogen gas, A second removal processing unit having a hollow fiber membrane filter that separates and removes water, which is an impurity contained in the hydrogen gas that has passed through the first removal processing unit, from the hydrogen gas, A third removal processing unit having an oxygen removal filter that removes oxygen, which is an impurity contained in the hydrogen gas that has passed through the second removal processing unit, from the hydrogen gas by a catalytic reaction, The system comprises a fourth removal processing unit having a moisture removal filter that adsorbs and removes moisture, which is an impurity contained in the hydrogen gas that has passed through the third removal processing unit, from the hydrogen gas. The hydrogen gas that has passed through the detection processing position is released into the housing. The second removal processing unit is equipped with the hollow fiber membrane filter so that the water separated from the hydrogen gas can be released into the housing. The control unit determines the hydrogen purity of the hydrogen gas based on the detection result by the oxygen detection unit, and controls the flow rate adjustment unit to supply high-purity hydrogen gas to the target of supply when the determined hydrogen purity reaches a predetermined supply-permissible purity.

2. The hydrogen gas supply device according to claim 1, wherein the control unit performs a purity notification process that notifies purity information that can identify the hydrogen purity when a predetermined notification condition is met.

3. The hydrogen gas supply apparatus according to claim 1, wherein the fourth removal processing unit comprises at least activated alumina as an adsorbent and the moisture removal filter is configured accordingly.

4. A hydrogen gas supply device according to any one of claims 1 to 3, A hydrogen gas supply system comprising an electrolysis treatment apparatus as a supply source that generates hydrogen gas by electrolyzing raw water.

5. The hydrogen gas supply system according to claim 4, comprising a water storage tank capable of storing the raw water, wherein the water storage tank and the electrolysis treatment apparatus are housed within the casing, and the oxygen generated during the generation of hydrogen gas in the electrolysis treatment apparatus is discharged to the outside of the casing via the water storage tank.

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