Space-use structural dimension determination device, structural dimension determination method, and optical element

JP2026095774APending Publication Date: 2026-06-12MITSUBISHI ELECTRIC ENG CO LTD

Patent Information

Authority / Receiving Office
JP · JP
Patent Type
Applications
Current Assignee / Owner
MITSUBISHI ELECTRIC ENG CO LTD
Filing Date
2024-12-02
Publication Date
2026-06-12

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Abstract

The goal is to determine dimensions for the surface texture of optical elements that can lower the solar absorption rate and increase the hemispherical emissivity. [Solution] The structural dimension determination device is configured to include: a candidate value acquisition unit 1 that acquires candidate values ​​for the dimensions of the uneven structure applied to the surface of an optical element; an emissivity calculation unit 2 that calculates the emissivity for each wavelength in the optical element based on the candidate values ​​acquired by the candidate value acquisition unit 1; an evaluation value calculation unit 3 that calculates an evaluation value for evaluating the emissivity for each wavelength calculated by the emissivity calculation unit 2; and a candidate value update unit 4 that updates the candidate values ​​acquired by the candidate value acquisition unit 1 and repeatedly performs the emissivity calculation process by the emissivity calculation unit 2 and the evaluation value calculation process by the evaluation value calculation unit 3 based on the updated candidate values. The structural dimension determination device also includes a dimension determination unit 6 that selects candidate values ​​to be adopted for the dimensions of the uneven structure from among the candidate values ​​acquired by the candidate value acquisition unit 1 and the updated candidate values ​​by the candidate value update unit 4, based on the evaluation value calculated by the evaluation value calculation unit 3.
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Claims

[Claim 1] A candidate value acquisition unit that acquires candidate values ​​for the dimensions of the uneven structure applied to the surface of an optical element, An emissivity calculation unit calculates the emissivity for each wavelength in the optical element based on the candidate values ​​obtained by the candidate value acquisition unit, An evaluation value calculation unit calculates an evaluation value for evaluating the emissivity for each wavelength calculated by the emissivity calculation unit, A candidate value update unit updates the candidate values ​​obtained by the candidate value acquisition unit, and repeatedly performs the emissivity calculation process by the emissivity calculation unit and the evaluation value calculation process by the evaluation value calculation unit based on the updated candidate values. A dimension determination unit selects candidate values ​​to be used for the dimensions of the uneven structure from among the candidate values ​​obtained by the candidate value acquisition unit and the updated candidate values ​​by the candidate value update unit, based on the evaluation values ​​calculated by the evaluation value calculation unit. A structural dimension determination device equipped with the following features. [Claim 2] The evaluation value calculation unit, An evaluation function returns an evaluation value indicating the degree of closeness between the emissivity of the optical element at each wavelength and the emissivity of the target. By providing the emissivity of each wavelength calculated by the emissivity calculation unit to this evaluation function, an evaluation value for evaluating the emissivity of each wavelength is obtained from the evaluation function. The structural dimension determination device according to claim 1, characterized in that it is a structural dimension determination device. [Claim 3] The aforementioned evaluation function is, This function returns an evaluation value that represents the overall relationship between the degree of closeness between the emissivity of the optical element for each wavelength and the target emissivity, and the degree of closeness between the heat dissipation efficiency of the uneven structure and the target heat dissipation efficiency. The evaluation value calculation unit, The emissivity for each wavelength calculated by the emissivity calculation unit and the heat dissipation efficiency of the uneven structure are given to the evaluation function, and an evaluation value representing the sum of the emissivity for each wavelength and the heat dissipation efficiency of the uneven structure is obtained from the evaluation function. The structural dimension determination device according to claim 2. [Claim 4] The candidate value acquisition unit acquires candidate values ​​for the dimensions of the uneven structure applied to the surface of the optical element. The emissivity calculation unit calculates the emissivity for each wavelength in the optical element based on the candidate values ​​obtained by the candidate value acquisition unit. The evaluation value calculation unit calculates an evaluation value for evaluating the emissivity for each wavelength calculated by the emissivity calculation unit. The candidate value update unit updates the candidate value obtained by the candidate value acquisition unit, and based on the updated candidate value, repeatedly performs the emissivity calculation process by the emissivity calculation unit and the evaluation value calculation process by the evaluation value calculation unit. The dimension determination unit selects a candidate value to be used for the dimensions of the uneven structure from among the candidate values ​​obtained by the candidate value acquisition unit and the updated candidate values ​​by the candidate value update unit, based on the evaluation value calculated by the evaluation value calculation unit. Method for determining structural dimensions. [Claim 5] An optical element having an uneven surface structure, An optical element characterized in that the dimensions of the uneven structure are 100 μm or less, and the emissivity is greater than 0.

75. [Claim 6] The aforementioned uneven structure is a periodically arranged structure, The dimensions of the aforementioned uneven structure correspond to the emissivity of each wavelength in the optical element. The optical element according to claim 5, characterized in that it is as described above. [Claim 7] The material with the aforementioned uneven structure is a material whose emissivity changes with temperature. The optical element according to claim 5, characterized in that it is as described above. [Claim 8] The optical element has multiple layers of different materials inside. The optical element according to claim 5, characterized in that it is as described above. [Claim 9] The aforementioned uneven structure is arranged not only on one side of the substrate but on both sides. The optical element according to claim 5, characterized in that it is as described above.