Method for purifying hydrogen peroxide

Abstract

A method for purifying hydrogen peroxide capable of producing highly pure hydrogen peroxide is provided. The method for purifying hydrogen peroxide of the present invention includes the steps of regenerating an adsorption resin in a primary purification system using an acidic solution, a basic solution, or a combination thereof, purifying a crude hydrogen peroxide product using the adsorption resin in the primary purification system, and purifying the primary purified hydrogen peroxide solution using a secondary purification system, which includes an electrodeionization system, and the adsorption resin removes organic carbon and cations from the crude hydrogen peroxide product.

Description

[Technical Field]

[0001] The present invention relates to a method for purifying hydrogen peroxide, and more particularly to a method for purifying hydrogen peroxide that includes an electrodeionization step. [Background technology]

[0002] Hydrogen peroxide has strong oxidizing power and its decomposition products are harmless, so it is used as an oxidizing agent, a bleaching agent for silk thread and wool, and a catalyst for vinyl polymerization in the plastics industry. In addition to the above uses, hydrogen peroxide is also used for cleaning display wafers and semiconductor wafers.

[0003] In the information age, the field of displays that visually represent electrical information signals has been rapidly developing, and accordingly, various display devices with excellent performance such as thinness, light weight, and low power consumption have been developed.

[0004] Typically, an organic light emitting diode display device involves deposition and patterning processes of various materials on a substrate, and a conductive member such as a metal mask may be used in the deposition and patterning processes. Because the display substrate may become contaminated with various materials during the deposition and patterning processes, a cleaning process is required for the display substrate. A typical wet cleaning method for a display substrate is a chemical wet method using hydrogen peroxide.

[0005] Semiconductor wafer cleaning techniques can be divided into wet cleaning and dry cleaning. The cleaning process is similar to the etching process in that it removes materials from the semiconductor wafer surface, but differs in that it selectively removes impurities from the semiconductor wafer surface. A representative wet cleaning method is a chemical wet method using hydrogen peroxide. Summary of the Invention [Problem to be solved by the invention]

[0006] An object of the present invention is to provide a method for purifying hydrogen peroxide that can produce highly pure hydrogen peroxide. Another object of the present invention is to provide a method for improving the performance and stability of an electrodeionization system in hydrogen peroxide purification. [Means for solving the problem]

[0007] A method for purifying hydrogen peroxide according to the present invention may include regenerating an adsorption resin in a primary purification system using an acidic solution, a basic solution, or a combination thereof, purifying a crude hydrogen peroxide product using the adsorption resin in the primary purification system, and purifying the primarily purified hydrogen peroxide solution using a secondary purification system, wherein the secondary purification system includes an electrodeionization system, and the adsorption resin can remove organic carbon and cations from the crude hydrogen peroxide product.

[0008] A method for manufacturing an electronic device according to another aspect of the present invention may include performing a cleaning process on a substrate using hydrogen peroxide purified by the hydrogen peroxide purification method. [Effects of the Invention]

[0009] The method for purifying hydrogen peroxide according to the present invention can obtain high-purity hydrogen peroxide in high yield and large volume through an electrodeionization system. The method for purifying hydrogen peroxide according to the present invention can remove organic carbon and cations from hydrogen peroxide using an adsorption resin system before the electrodeionization system. In particular, the stability of hydrogen peroxide can be improved above the standard level using only one adsorption resin system, thereby improving the stability and impurity removal efficiency of the electrodeionization system. [Brief explanation of the drawings]

[0010] [Figure 1]1 is a schematic diagram illustrating a hydrogen peroxide purification system according to an embodiment of the present invention. FIG. [Figure 2] FIG. 2 is a schematic diagram illustrating an electrodeionization system of the hydrogen peroxide purification system of FIG. 1. [Figure 3] 1 is a flow chart illustrating a hydrogen peroxide purification process and an adsorption resin regeneration process according to an embodiment of the present invention. [Figure 4] FIG. 4 is a flowchart illustrating a hydrogen peroxide purification process and an adsorption resin regeneration process according to another embodiment of the present invention. [Figure 5] 1 is a schematic diagram illustrating a hydrogen peroxide purification system according to an embodiment of the present invention. FIG. [Figure 6] 1 is a schematic diagram illustrating a substrate cleaning process using purified hydrogen peroxide according to an embodiment of the present invention; DETAILED DESCRIPTION OF THE INVENTION

[0011] In order to fully understand the configuration and effects of the present invention, preferred embodiments of the present invention will be described with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, and can be embodied in various forms and can be modified in various ways. However, the description of the present embodiments is provided to complete the disclosure of the present invention and to fully convey the scope of the invention to those skilled in the art to which the present invention pertains.

[0012] In this specification, when a certain component is referred to as being on another component, it means that it can be formed directly on the other component, or a third component can be interposed therebetween. Also, in the drawings, the thickness of the components is exaggerated for the sake of efficient explanation of the technical content. Parts designated with the same reference numerals throughout the specification refer to the same components.

[0013] In various embodiments of the present specification, terms such as first, second, and third are used to describe various components, but these components should not be limited by such terms. These terms are merely used to distinguish certain components from other components. The embodiments described and illustrated herein also include their complementary embodiments.

[0014] The terms used in this specification are for the purpose of describing the embodiments and are not intended to limit the present invention. In this specification, the singular form includes the plural form unless otherwise specified in the text. The terms 'comprises' and / or 'comprising' used in this specification do not exclude the presence or addition of one or more other components in the secondary battery having the referenced configuration.

[0015] Fig. 1 is a schematic diagram illustrating a hydrogen peroxide purification system according to an embodiment of the present invention, and Fig. 2 is a schematic diagram illustrating an electrodeionization system of the hydrogen peroxide purification system of Fig. 1.

[0016] 1 and 2, the hydrogen peroxide purification system may include a primary purification system PFS1 and a secondary purification system PFS2. The crude hydrogen peroxide product R is purified sequentially through the primary purification system PFS1 and the secondary purification system PFS2, and finally, purified hydrogen peroxide P can be obtained from the crude hydrogen peroxide product R.

[0017] The crude hydrogen peroxide R can be produced by the alkylanthraquinone process. The crude hydrogen peroxide R can be a product synthesized by the alkylanthraquinone hydrogenation-oxygenation reaction. The crude hydrogen peroxide R can be a product of the alkylanthraquinone process that has not undergone a purification step such as distillation.

[0018] Specifically, hydrogen is added to alkylanthraquinone to produce hydroquinone, which is then reacted with oxygen in the air to be reduced to anthraquinone, producing hydrogen peroxide. Crude hydrogen peroxide can be obtained by adding water to the oxidation products, anthraquinone and hydrogen peroxide, and extracting them.

[0019] The crude hydrogen peroxide product R produced by the alkylanthraquinone process contains metal impurities such as Al, Ni, and Cr at concentrations of 100 ppb or more, and PO4 at concentrations of 100 ppb or more. 3- , SO4 2- , NO3 - and Cl - and TOC (total organic carbon) having a concentration of 100 ppm or more.

[0020] The crude hydrogen peroxide product R may be input into the primary purification system PFS1. The primary purification system PFS1 according to one embodiment of the present invention may be a resin system. The resin system according to the present invention may include an adsorption resin made of a porous polymer. The resin system can remove organic carbon from the crude hydrogen peroxide product R through an adsorption filter filled with the adsorption resin. The adsorption resin according to an embodiment of the present invention can remove not only organic carbon but also cations from the crude hydrogen peroxide product R.

[0021] The adsorption resin according to an embodiment of the present invention may include porous polymer particles. The specific surface area of ​​the adsorption resin is 300 m 2 / g~1,000m 2 / g. More specifically, the specific surface area of ​​the adsorption resin can be 300 m 2 / g~800m 2 / g.

[0022] The average particle size (or diameter) of the adsorbent resin may be 10 Å to 200 Å. More specifically, the average particle size of the adsorbent resin may be 40 Å to 100 Å. The particle volume of the adsorbent resin may be 0.5 mL / g to 2 mL / g. The average particle diameter of the adsorbent resin may be 0.3 mm to 2 mm.

[0023] The adsorption resin according to the present invention may be a non-polar (or neutral) resin that does not carry an electric charge. In one embodiment of the present invention, the adsorption resin may include a hydrophobic polymer. The polymer of the adsorption resin may have a hydrophobic group. For example, the hydrophobic group may include an alkyl group having 1 to 20 carbon atoms. The adsorption resin according to the present invention may be a hydrophobic adsorption resin that does not have an ion exchange group.

[0024] The adsorption resin polymer may include a polyaromatic compound. More specifically, the adsorption resin polymer may include an aromatic polymer having a hydrophobic group attached thereto. For example, the adsorption resin polymer may include at least one selected from the group consisting of a styrene / divinylbenzene copolymer, a styrene / trivinylbenzene copolymer, and a vinyltoluene / divinylbenzene copolymer. Preferably, a hydrophobic group may be attached to the copolymer.

[0025] The adsorption resin according to the present invention may be a non-polar resin that does not carry an electric charge. In one embodiment of the present invention, ion exchange resins having cation / anion functional groups may be excluded from the adsorption resin according to the present invention. The adsorption resin according to the present invention described above can adsorb and remove not only organic carbon but also cations in the crude hydrogen peroxide product R.

[0026] The primary purification system PFS1 removes some of the impurities in the crude hydrogen peroxide product R, yielding a primarily purified hydrogen peroxide solution PS. The adsorption resin in the primary purification system PFS1 reduces the TOC concentration in the primarily purified hydrogen peroxide solution PS to 100 ppm or less. The adsorption resin in the primary purification system PFS1 reduces the ion concentration in the primarily purified hydrogen peroxide solution PS.

[0027] In another embodiment of the present invention, the adsorption resin in the primary purification system PFS1 may include not only a neutral resin but also an ionic resin. Again, the adsorption resin of the present invention may be a mixture of a neutral resin and an ionic resin. The ionic resin allows for more effective removal of ions in the primary purification system PFS1.

[0028] The cations in the crude hydrogen peroxide product R are adsorbed by the adsorption resin of the primary purification system PFS1, so that the concentration of cations in the primary purified hydrogen peroxide solution PS can be lower than the concentration of cations in the crude hydrogen peroxide product R.

[0029] The purified hydrogen peroxide solution PS may be input into a secondary purification system PFS2. The secondary purification system PFS2 may include an electrodeionization system EDI. The electrodeionization process may be performed on the hydrogen peroxide solution PS using the electrodeionization system EDI.

[0030] Referring again to FIG. 2, the electrodeionization system EDI may include a first electrode ELa, a second electrode ELc, a first concentrating chamber (CC1), a second concentrating chamber CC2, and a dilute chamber (DC) between the first and second concentrating chambers CC1 and CC2. The first and second concentrating chambers CC1 and CC2 and the dilute chamber DC may be interposed between the first and second electrodes ELa and ELc. For example, the first electrode ELa may be an anode, and the second electrode ELc may be a cathode.

[0031] Anion exchange membranes EMa and cation exchange membranes EMc may be alternately arranged between the first and second electrodes ELa and ELc. For example, an anion exchange membrane EMa may be interposed between the first concentration compartment CC1 and the dilution compartment DC, and between the second concentration compartment CC2 and the second electrode ELc. A cation exchange membrane EMc may be interposed between the second concentration compartment CC2 and the dilution compartment DC, and between the first concentration compartment CC1 and the first electrode ELa. The anion exchange membrane EMa is permeable to anions but not to cations. The cation exchange membrane EMc is permeable to cations but not to anions.

[0032] An ion exchange resin ER may be provided in the dilution compartment DC. In one embodiment of the present invention, an ion exchange resin ER may also be provided in the first concentration compartment CC1 and the second concentration compartment CC2. In particular, if an ion exchange resin ER is provided in the first concentration compartment CC1 and the second concentration compartment CC2, the efficiency of hydrogen peroxide purification may be further improved. The ion exchange resin ER may include an anion exchange resin ERa and a cation exchange resin ERc. The anion exchange resin ERa can adsorb anions and transfer them to the anion exchange membrane EMa. The cation exchange resin ERc can adsorb cations and transfer them to the cation exchange membrane EMC. For example, the ion exchange resin ER can prevent the resistance of the hydrogen peroxide solution PS from increasing even if the concentration of ions in the hydrogen peroxide solution PS decreases.

[0033] A hydrogen peroxide solution PS and water may be introduced into an inlet IN of the electrodeionization system EDI. The water may be purified water with low electrical conductivity. The hydrogen peroxide concentration of the introduced hydrogen peroxide solution PS may be 1 wt% to 70 wt%. The hydrogen peroxide solution PS may be introduced into a dilution chamber DC, and the water may be introduced into a first concentration chamber CC1 and a second concentration chamber CC2. The hydrogen peroxide concentrations of the first concentrate WF1 introduced into the first concentration chamber CC1 and the second concentrate WF2 introduced into the second concentration chamber CC2 may be 1 wt% or less.

[0034] A DC power supply is applied between the first and second electrodes ELa and ELc, causing a current to flow from the first electrode ELa to the second electrode ELc. Cations (e.g., metal impurities) in the hydrogen peroxide solution PS in the dilution chamber DC can pass through the cation exchange membrane EMa due to electrostatic attraction generated by the DC power supply and migrate to the second concentrate WF2 in the second concentration chamber CC2. Anions (e.g., anion impurities) in the hydrogen peroxide solution PS in the dilution chamber DC can pass through the anion exchange membrane EMa due to electrostatic attraction generated by the DC power supply and migrate to the first concentrate WF1 in the first concentration chamber CC1.

[0035] The concentration of ions in the hydrogen peroxide solution PS decreases from the inlet (IN) to the outlet (OUT) of the dilution chamber DC. In other words, the concentration of impurities in the hydrogen peroxide solution PS decreases from the inlet (IN) to the outlet (OUT) of the dilution chamber DC. Purified hydrogen peroxide P can be discharged through the outlet (OUT) of the dilution chamber DC.

[0036] The first and second concentrates WF1 and WF2 may be discharged through the outlets OUT of the first and second concentration chambers CC1 and CC2. The discharged first and second concentrates WF1 and WF2 may contain concentrated impurities transferred from the hydrogen peroxide solution PS. For example, the discharged first and second concentrates WF1 and WF2 may be discarded. For another example, the first and second concentrates WF1 and WF2 may be filtered and then reintroduced into the inlet IN of the electrodeionization system EDI. That is, the first and second concentrates WF1 and WF2 may be circulated within the electrodeionization system EDI.

[0037] Because the ion concentration of the hydrogen peroxide solution PS decreases from the inlet (IN) to the outlet (OUT) of the dilution chamber DC, the resistance of the hydrogen peroxide solution PS may increase in a region of the dilution chamber DC adjacent to the outlet (OUT). This results in a voltage drop in the region of the dilution chamber DC, which can cause water decomposition and / or hydrogen peroxide decomposition. Hydrogen ions and hydroxide ions can be generated by the water decomposition and / or hydrogen peroxide decomposition, and the generated hydrogen ions and hydroxide ions can regenerate the ion exchange resin ER. Therefore, the electrodeionization system EDI according to the present invention does not require a separate process for regenerating the ion exchange resin ER.

[0038] The hydrogen peroxide purification system according to an embodiment of the present invention can obtain high-purity hydrogen peroxide at a high yield by utilizing an electrodeionization system EDI as a secondary hydrogen peroxide purification system PFS2. Furthermore, the electrodeionization system EDI can be operated at a relatively high flow rate, for example, 0.1 to 10 m per electrodeionization stack. 3 / hr. The production volume can be adjusted according to the system design (stack area, number of cells, etc.), ultimately resulting in a large volume of highly pure hydrogen peroxide.

[0039] It was confirmed that when the stability of the hydrogen peroxide solution PS introduced into the electrodeionization system EDI is lower than the standard value, the purification performance and stability of the electrodeionization system EDI decrease rapidly depending on the start-up time of the electrodeionization system EDI. In addition, it was confirmed that when the stability of the hydrogen peroxide solution PS is lower than the standard value, the removal rate of ions and organic carbon decreases rapidly depending on the start-up time of the electrodeionization system EDI.

[0040] According to an embodiment of the present invention, the adsorption resin of the primary purification system PFS1 can remove not only organic carbon but also ions (e.g., anions and cations) from the crude hydrogen peroxide product R. Therefore, the stability of the hydrogen peroxide solution PS input to the electrodeionization system EDI can be improved. When the stability of the hydrogen peroxide solution PS is equal to or greater than the reference value, the purification performance and stability depending on the start-up time of the electrodeionization system EDI can be maintained well, and the removal rate of impurities (e.g., ions and organic carbon) can also be maintained well.

[0041] According to an embodiment of the present invention, both organic carbon and cations in the crude hydrogen peroxide product R can be removed using only the adsorption resin process of the primary purification system PFS1. As a comparative example of the present invention, if another purification system (e.g., an ion exchange resin system or a reverse osmosis system) is additionally used before inputting the hydrogen peroxide into the electrodeionization system EDI, the economic efficiency of the hydrogen peroxide purification process can be significantly reduced.

[0042] In another comparative example of the present invention, if the adsorption resin process in the primary purification system PFS1 is omitted and the crude hydrogen peroxide product R is directly introduced into the electrodeionization system EDI, the performance and stability of the electrodeionization system EDI may be significantly reduced.

[0043] The present invention can improve the performance and stability of the electrodeionization system EDI with only a simple pretreatment process (a primary purification system PFS1, which is an adsorption resin process).

[0044] Figure 3 is a flow chart illustrating a hydrogen peroxide purification process and an adsorption resin regeneration process according to an embodiment of the present invention. Referring to Figure 3, the stability of the hydrogen peroxide solution PS, which has been purified through the primary purification system PFS1 (adsorption resin) of Figure 1, can be measured (S100). The stability can be measured using the hydrogen peroxide stability measurement method (standard number: KSM1112) specified in the National Standards Certification Integrated Information System (KS Standard).

[0045] According to an embodiment of the present invention, the reference stability value may be 90%. More specifically, the reference stability value may be 95%. If the stability of the hydrogen peroxide solution PS is less than 90%, the purification performance and durability of the electrodeionization system EDI may be significantly reduced depending on the startup time. On the other hand, if the stability of the hydrogen peroxide solution PS is greater than 90%, the impurity removal rate may be stably maintained depending on the startup time of the electrodeionization system EDI, and durability may be improved.

[0046] If the measured stability of the hydrogen peroxide solution PS is equal to or greater than the reference value, the hydrogen peroxide solution PS can be introduced into the secondary purification system PFS2, EDI described with reference to FIGS. 1 and 2 (S200).

[0047] If the measured stability of the hydrogen peroxide solution PS is less than the reference value, the adsorption resin of the primary purification system PFS1 can be regenerated. A method for regenerating an adsorption resin according to an embodiment of the present invention can include treating the adsorption resin with an acidic solution, a basic solution, or a combination thereof (S300).

[0048] For example, the adsorption resin can be washed with an acidic solution (e.g., hydrochloric acid and / or sulfuric acid), or with a basic solution (e.g., sodium hydroxide and / or ammonium bicarbonate). After the adsorption resin has been washed with the acidic solution, it can be washed with a basic solution.

[0049] When the adsorption resin is regenerated with an acidic and / or basic solution, ions (e.g., cations) adsorbed in the adsorption resin can be removed. Therefore, the ion adsorption performance of the adsorption resin can be restored. As a result, the stability of the purified hydrogen peroxide solution PS can be improved to above the standard value (90%) through this method of regenerating the adsorption resin.

[0050] 4 is a flow chart illustrating a process for purifying hydrogen peroxide and a process for regenerating an adsorption resin according to another embodiment of the present invention. Referring to FIG. 4, the process for regenerating an adsorption resin may further include a step (S400) of regenerating the adsorption resin with alcohol.

[0051] Adsorption resins are typically regenerated by washing with alcohol (e.g., methanol) and water. This is because organic solvents such as alcohol are effective in removing organic compounds adsorbed on the adsorption resin. However, while regeneration methods using alcohol are effective in removing organic compounds from the adsorption resin, they may not be suitable for removing the cations mentioned above. Therefore, in the present invention, after the step of regenerating the adsorption resin with alcohol (S400), a step of regenerating the adsorption resin with an acidic and / or basic solution (S300) may be further performed.

[0052] Meanwhile, according to another embodiment of the present invention, the step of regenerating the adsorption resin with an acidic solution and / or a basic solution (S300) may be performed before the step of regenerating the adsorption resin with an alcohol (S400).

[0053] Experimental example Hydrogen peroxide was purified using the hydrogen peroxide purification process described with reference to FIG. 1. Specifically, crude hydrogen peroxide produced by an alkylanthraquinone process was primarily purified through an adsorption resin process. The stability of the purified hydrogen peroxide was measured according to standard number KSM1112 of the National Standard Certification Integrated Information System. The primarily purified hydrogen peroxide solution was secondarily purified using the electrodeionization system EDI according to the present invention.

[0054] In Example 1, the adsorption resin regenerated with an acidic and / or basic solution was used for the primary purification. In Comparative Example 1, the adsorption resin regenerated with alcohol was used for the primary purification. The concentrations of ionic impurities in the purified hydrogen peroxide according to the EDI system operation time in Example 1 and Comparative Example 1 were measured and are shown in Table 1 below.

[0055] [Table 1]

[0056] Referring to Table 1, in the first comparative example using adsorption resin regenerated with only alcohol, the stability was measured at a significantly low level of 75.7%. It can be seen that the concentration of cationic impurities such as Na, Al, and Ni increased significantly to over 1,000 ppt by 30 days after EDI operation. Referring to the first comparative example, it can be seen that the stability of the primarily purified hydrogen peroxide decreased because the cations in the adsorption resin could not be removed below the standard value, and therefore the purification performance of the EDI rapidly decreased. In contrast, in the first example using adsorption resin regenerated with an acidic and / or basic solution, the stability was measured at a significantly high level of 95.5%. It can be seen that the concentration of cationic impurities such as Na, Al, and Ni remained very low, around 100 ppt, even 30 days after EDI operation. Furthermore, it can be seen that the concentration of ionic impurities in the first example remained significantly lower than in the first comparative example, even after 180 days. Referring to the first embodiment, it can be seen that the adsorption resin regenerated with an acidic solution and / or a basic solution can significantly improve the stability of the primarily purified hydrogen peroxide, thereby stably maintaining the EDI performance and improving durability.

[0057] Figure 5 is a schematic diagram illustrating a hydrogen peroxide purification system according to an embodiment of the present invention. Referring to Figure 5, the hydrogen peroxide purification system may further include a heat exchanger HE disposed between the primary purification system PFS1 and the secondary purification system PFS2. The primarily purified hydrogen peroxide solution PS passes through the heat exchanger HE, whereby its temperature can be adjusted. The heat exchanger HE can adjust the temperature of the hydrogen peroxide solution PS to between -20°C and 20°C. Again, the hydrogen peroxide solution PS having a temperature between -20°C and 20°C can be input into the electrodeionization system EDI, which is the secondary purification system PFS2.

[0058] Hydrogen peroxide is a strong oxidizing agent and can oxidize and age the ion exchange media it comes into contact with in the dilution chamber DC of the electrodeionization system EDI. Therefore, the oxygen generated by the decomposition of hydrogen peroxide as a side reaction in the dilution chamber DC can increase the pressure within the electrodeionization system EDI. The higher the temperature of the hydrogen peroxide, the more rapidly the amount of oxygen produced. If excessive oxygen is produced, the pressure within the electrodeionization system EDI increases excessively, damaging the electrodeionization system EDI and reducing the efficiency of the purification process.

[0059] According to this embodiment, the heat exchanger HE appropriately controls the temperature of the hydrogen peroxide solution PS fed into the electrodeionization system EDI, thereby preventing excessive oxygen generation. The heat exchanger HE further improves the stability of the hydrogen peroxide solution PS of the present invention. As a result, damage to the electrodeionization system EDI can be prevented and the purification efficiency of hydrogen peroxide can be increased.

[0060] High-purity hydrogen peroxide can be obtained through the method for purifying hydrogen peroxide according to the above-described embodiment of the present invention. Figure 6 is a schematic diagram illustrating a substrate cleaning process using hydrogen peroxide purified according to the embodiment of the present invention.

[0061] 6, the method for manufacturing an electronic device may include a cleaning process of a substrate SUB. The substrate SUB according to an embodiment of the present invention may include a display substrate or a semiconductor substrate. Specifically, the cleaning process of the substrate SUB may include applying hydrogen peroxide P purified by the purification method of the present invention onto the substrate SUB. For example, the display substrate may include a substrate for an organic electroluminescent display device, a substrate for a micro LED display device, or an LCD substrate. The semiconductor substrate SUB may include silicon, germanium, or silicon-germanium.

[0062] If hydrogen peroxide containing impurities is used in the cleaning process, the impurities may react with materials on the substrate SUB, causing process defects. On the other hand, the purified hydrogen peroxide P according to the present invention has a very low impurity content, thereby preventing defects from occurring in the cleaning process.

[0063] Although the embodiments of the present invention have been described above with reference to the accompanying drawings, those skilled in the art will understand that the present invention may be embodied in other specific forms without changing the technical spirit or essential features thereof. Therefore, it should be understood that the above-described embodiments are illustrative in all respects and are not limiting. [Explanation of symbols]

[0064] CC1 1st concentration room CC2 2nd concentration chamber DC Dilution Chamber EDI Electrodeionization System ER ion exchange resin HE heat exchanger PFS1 Primary Purification System PFS2 Secondary Purification System PS hydrogen peroxide solution SUB board WF1 1st concentrate WF2 2nd concentrate

Claims

1. regenerating the adsorption resin of the primary purification system using an acidic solution, a basic solution, or a combination thereof; purifying the crude hydrogen peroxide product using the adsorption resin of the primary purification system; and purifying the primarily purified hydrogen peroxide solution using a secondary purification system; the secondary purification system includes an electrodeionization system; The method for purifying hydrogen peroxide, wherein the adsorption resin removes organic carbon and cations from the crude hydrogen peroxide product.

2. The regenerated adsorption resin increases the stability of the purified hydrogen peroxide solution above a reference value, 2. The method for purifying hydrogen peroxide according to claim 1, wherein the reference value is 90%.

3. 2. The method for purifying hydrogen peroxide according to claim 1, wherein the adsorption resin is a non-polar polymer resin.

4. 4. The method for purifying hydrogen peroxide according to claim 3, wherein the adsorption resin contains a hydrophobic aromatic polymer.

5. 2. The method for purifying hydrogen peroxide according to claim 1, wherein the adsorption resin includes a neutral resin and an ionic resin.

6. 2. The method for purifying hydrogen peroxide according to claim 1, further comprising the step of regenerating the adsorption resin using alcohol.

7. 2. The method for purifying hydrogen peroxide according to claim 1, wherein the step of regenerating the adsorption resin includes removing cations within the adsorption resin.

8. The electrodeionization system comprises: a first electrode and a second electrode; a first concentrating compartment, a second concentrating compartment, and a diluting compartment between the first and second concentrating compartments; an ion exchange resin provided in the dilution chamber, the first concentration chamber, and the second concentration chamber; an anion exchange membrane between the first concentrating compartment and the diluting compartment; 2. The method for purifying hydrogen peroxide according to claim 1, further comprising a cation exchange membrane between the second concentrating compartment and the diluting compartment.

9. a DC power source is applied to the first electrode and the second electrode; anion impurities in the hydrogen peroxide solution in the dilution chamber pass through the anion exchange membrane and move to the first concentration chamber; 9. The method for purifying hydrogen peroxide according to claim 8, wherein cationic impurities in the hydrogen peroxide solution in the dilution compartment pass through the cation exchange membrane and move to the second concentration compartment.

10. A first concentrate and a second concentrate are respectively introduced into the first concentration chamber and the second concentration chamber; 9. The method for purifying hydrogen peroxide according to claim 8, wherein the first concentrated liquid and the second concentrated liquid are water.

11. 2. The method for purifying hydrogen peroxide according to claim 1, further comprising passing the primarily purified hydrogen peroxide solution through a heat exchanger.

12. 10. A method for manufacturing an electronic device, comprising: performing a cleaning process on a substrate using the purified hydrogen peroxide of claim 1.

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