Gas treatment device and gas treatment method

Abstract

The present invention provides a gas treatment device and a gas treatment method. The gas treatment device includes a cylindrical body (13), a top header (14) connected to the upper end of the cylindrical body (13), and a bottom header (15) connected to the lower end of the cylindrical body (13). A liquid supply pipe (3) is provided in the cylindrical body (13) near the top header (14), and a liquid discharge end of the liquid supply pipe (3) extends into the cylindrical body (13). An absorbent liquid spray head (10) is connected to the liquid discharge end and is used to spray the absorbent liquid downward. A gas supply pipe (6) is provided in the cylindrical body (13) near the bottom header (15), and a gas discharge end of the gas supply pipe (6) extends into the cylindrical body (13) and is used to introduce a gas to be treated into the cylindrical body (13). A microbubble-generating inner member (9) is connected to the gas discharge end of the gas supply pipe (6), and the microbubble-generating inner member (9) is used to convert the gas to be treated from the gas discharge end into microbubbles and mix them with the absorbent liquid. A back-mixing inner member (5) is provided in a cylindrical body (13) above the microbubble-generating inner member (9), and the back-mixing inner member (5) is used to create a back-mixing vortex in the absorbing liquid by the action of the upward microbubble flow.

Description

Detailed Description of the Invention

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS This application claims Chinese invention priority from patent applications Nos. 202310216131.2, 202310216392.4, and 202310216418.5, filed on March 8, 2023, the entire contents of which are incorporated herein by reference. [Technical Field]

[0002] The present invention relates to the technical field of gas processing, and more particularly to a gas processing device and a gas processing method. [Background technology]

[0003] In the petrochemical industry, as raw materials deteriorate, storage media often contain sulfur-containing compounds, nitrogen-containing compounds, and fine particles. The petrochemical production process inevitably generates large amounts of toxic and harmful gases, which not only harm people's health but also cause serious damage to the ecological environment. To ensure reliable operation of the production process, gas treatment equipment is required to treat the toxic and harmful gases generated.

[0004] Most conventional gas treatment equipment has a tray tower structure. Absorber towers with this structure are usually very tall and have the disadvantage of being unstable. In windy weather, the absorber tower is prone to shaking, posing a safety risk. In addition, it is difficult to improve mass transfer efficiency, and the contact between the gas phase and the liquid phase is insufficient. The resistance drop throughout the equipment is relatively large, resulting in relatively large energy losses. Summary of the Invention [Problem to be solved by the invention]

[0005] In view of the shortcomings of the prior art, the object of the present invention is to provide a gas treatment device that solves the problems of low mass transfer efficiency and insufficient contact between the gas phase and the liquid phase, and greatly reduces the scale and cost of the device. [Means for solving the problem]

[0006] To achieve the above objectives, the present invention adopts the following technical solutions.

[0007] A gas treatment device including a cylindrical body, a top header connected to an upper end of the cylindrical body, and a bottom header connected to a lower end of the cylindrical body, a liquid supply pipe is provided in the cylindrical body at a position close to the top header, a liquid discharge end of the liquid supply pipe extends into the cylindrical body, and an absorbent liquid spray head is connected to the liquid discharge end and is used to spray the absorbent liquid downward; a gas supply pipe is provided in the cylindrical body at a position close to the bottom header, a gas discharge end of the gas supply pipe extends into the cylindrical body, and the gas supply pipe is used to introduce the gas to be treated into the cylindrical body; a microbubble generating inner member is connected to a gas discharge end of the gas supply pipe, and the microbubble generating inner member is used to convert the gas to be treated from the gas discharge end into microbubbles and mix the microbubbles with the absorption liquid; A back-mixing inner member is provided in the cylindrical body above the microbubble-generating inner member, and the back-mixing inner member is used to create a back-mixing vortex in the absorbing liquid by the action of the upward microbubble flow.

[0008] According to the technical solution of the present invention, a microbubble-generating inner member and a back-mixing inner member are sequentially installed in a cylindrical tube, and these two members are combined to form a micro-macroscale double-reinforced reinforced gas absorption inner member. The microbubble-generating inner member generates microbubbles to enhance contact between the gas and liquid phases on the microscale, and the back-mixing inner member then forms a macroscale back-mixing vortex between the enhanced gas and liquid phases on the microscale. This combination not only strengthens the inner member but also combines microscale gas-liquid contact and macroscale overall gas-liquid flow, thereby enhancing backmixing, increasing the mass transfer coefficient, and extending the residence time of gas-liquid contact, thereby effectively improving the gas absorption efficiency. Furthermore, an absorbent liquid spray head is installed to spray absorbent liquid downward. As the gas released from the absorbent liquid flows upward, it undergoes a secondary reaction with the absorbent liquid sprayed downward. The gas is the continuous phase, and the liquid is the dispersed phase dispersed in the gas. This results in a large gas-liquid contact area and high mass transfer efficiency. Compared with the structure of a plate tower, the gas treatment device of the present invention does not require many components such as trays, and realizes the transformation of the structure of a plate absorption tower into a new type of absorption device, thereby simplifying the structure of the device, improving space utilization, saving costs, lowering the pressure drop of the entire device, reducing energy loss, and improving the safety of the device.

[0009] In some embodiments, the microbubble-generating inner member includes an inner member body and an underwater pump, the inner member body including a first variable-diameter mixing cavity, a reduced-diameter mounting cavity, and a second variable-diameter mixing cavity, which are connected to each other in order from bottom to top, one end of the first variable-diameter mixing cavity away from the reduced-diameter mounting cavity being a liquid-phase inlet, a conical cavity provided within the first variable-diameter mixing cavity, one end of the conical cavity facing the reduced-diameter mounting cavity being open, and a first mixing wick being filled within the reduced-diameter mounting cavity, the inner member body further including a gas supply branch pipe, one end of the gas supply branch pipe being connected to the gas discharge end of the gas supply pipe and the other end of the gas supply branch pipe being connected to the conical cavity, and an outlet of the underwater pump being connected to the liquid-phase inlet.

[0010] In some embodiments, the first variable diameter mixing cavity and the second variable diameter mixing cavity each have a small diameter end connected to the reduced diameter mounting cavity.

[0011] In some embodiments, the first variable-diameter mixing cavity includes a cylindrical section and a conical section that communicate from bottom to top, the maximum diameter of the conical section being equal to the diameter of the cylindrical section and the diameter of the reduced-diameter mounting cavity being equal to the minimum diameter of the conical section, and the second variable-diameter mixing cavity is configured to have a diameter that gradually increases from bottom to top, and the minimum diameter of the second variable-diameter mixing cavity being equal to the diameter of the reduced-diameter mounting cavity.

[0012] In some embodiments, the conical cavity includes a first tapered stage and a second tapered stage that communicate from bottom to top, and the gas supply branch pipe communicates with the first tapered stage.

[0013] In some embodiments, the taper of the first tapered step is greater than the taper of the second tapered step.

[0014] In some embodiments, a venturi mixing inner member is provided in the barrel between the microbubble-generating inner member and the back-mixing inner member, and the venturi mixing inner member is used to further break up and increase the velocity of the microbubble flow from the microbubble-generating inner member before transporting it upward.

[0015] In some embodiments, the venturi mixing inner member includes a gas collection port, a cavity structure, and a diverging mixing port, which are connected in order from bottom to top, wherein the gas collection port is configured to have a gradually smaller diameter from bottom to top, and the diverging mixing port is configured to have a gradually larger diameter from bottom to top, and the cavity structure is provided with a reducing diameter stage communicating with the bottom of the diverging mixing port and a changing diameter stage communicating with the bottom of the reducing diameter stage, and a second mixing wick is filled in the reducing diameter stage.

[0016] In some embodiments, the venturi mixing inner member further includes a connecting leg, the connecting leg being connected between the top of the flared mixing port and the bottom of the back-mixing inner member.

[0017] In some embodiments, the backmixing inner member includes an inner cylinder and a distribution plate attached to the inner wall of the inner cylinder, the inner cylinder and the cylinder body being coaxial, and there is a gap between the outer wall of the inner cylinder and the inner wall of the cylinder body.

[0018] In some embodiments, the height of the inner cylinder is 500 to 1500 mm, and the distance between the outer wall of the inner cylinder and the inner wall of the cylinder is 100 to 200 mm.

[0019] In some embodiments, the backmixing inner member further includes a screen plate attached to an inner wall of the inner cylinder, the screen plate being spaced above the distribution plate.

[0020] In some embodiments, the distributor plate is provided with a plurality of axial through-holes, each of which has a tubular distributor disposed therein.

[0021] In some embodiments, the screen plate is perforated with a plurality of elongated grids.

[0022] In some embodiments, a gas discharge pipe is provided at an upper portion of the top header, and a liquid discharge pipe is provided at a lower portion of the bottom header.

[0023] In some embodiments, a baffle plate is provided on the inner wall of the cylinder between the backmixing inner member and the liquid supply pipe.

[0024] In some embodiments, a bubble removal mechanism is further attached to the inner wall of the barrel.

[0025] In some embodiments, the bubble removal mechanism includes an upper bubble removal device, an intermediate bubble removal device, and a lower bubble removal device, wherein the upper bubble removal device is located above the liquid supply pipe, the intermediate bubble removal device is located between the liquid supply pipe and the baffle plate, and the lower bubble removal device is located below the gas supply pipe.

[0026] In some embodiments, the upper, middle, and lower foam removal devices are all mesh structures; The upper foam removal device has a mesh pore size of 1 to 5 mm, a wire diameter of 0.5 to 2 mm, and a thickness of 50 to 100 mm; The intermediate bubble removal device has a mesh pore size of 1 mm to 5 mm, a wire diameter of 0.5 mm to 2 mm, and a thickness of 100 to 200 mm; The lower foam removal device has a mesh hole diameter of 2 mm to 8 mm, a wire diameter of 0.5 mm to 2 mm, and a thickness of 100 to 200 mm.

[0027] The present invention provides Step S1: introducing the gas to be treated into the absorption liquid region in the form of microbubbles to carry out a primary reaction; Step S2: forming a back-mixing vortex in the absorption liquid region by the action of the upward flow of microbubbles; and step S3 of spraying an absorption liquid from above the absorption liquid region downward so that the gas released from the absorption liquid region flows upward and undergoes a secondary reaction with the absorption liquid sprayed downward.

[0028] According to the technical solution of the present invention, the gas to be treated is introduced into the absorbent region in the form of microbubbles. The absorbent in the absorbent region serves as the continuous phase, and the gas serves as the dispersed phase, resulting in a large gas-liquid contact area and high mass transfer efficiency. The gas undergoes a primary reaction with the absorbent, rapidly reacting with the components to be absorbed in the gas. The absorbent is sprayed from above to below the absorbent region, allowing the gas released from the absorbent region to flow upward and undergo a secondary reaction with the absorbent sprayed downward. The gas serves as the continuous phase, and the liquid serves as the dispersed phase dispersed in the gas. This results in a large gas-liquid contact area and high mass transfer efficiency. Therefore, the gas treatment method of the present invention fully absorbs certain components in the gas, increasing mass transfer efficiency and improving space utilization.

[0029] In some embodiments, the method further comprises the step of further breaking up the microbubble stream to increase its velocity prior to step S2.

[0030] In some embodiments, the method is carried out using the gas treatment device described above.

[0031] Other features and advantages of the present invention are described in detail in the specific embodiments section below. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] The drawings constituting a part of this invention are intended to provide a further understanding of the invention, and the schematic embodiments of the invention and their description are for purposes of illustrating the invention and are not intended to unduly limit the invention. FIG. 1 is a structural schematic diagram of a first embodiment of a gas treatment device according to the present invention. FIG. 2 is a schematic diagram showing the flow of the operation of the gas treatment device in FIG. FIG. 3 is a structural schematic diagram of a second embodiment of the gas treatment device of the present invention. FIG. 4 is a structural schematic diagram of a third embodiment of the gas treatment device of the present invention. FIG. 5 is a structural schematic diagram of a fourth embodiment of the gas treatment device of the present invention. FIG. 6 is a structural schematic diagram of one embodiment of the back-mixing inner member of the present invention. FIG. 7 is a structural schematic diagram of another embodiment of the back-mixing inner member of the present invention. FIG. 8 is a view taken along the line AA in FIG. FIG. 9 is a view taken along the arrow BB in FIG. FIG. 10 is a structural schematic diagram of one embodiment of the venturi mixing inner member of the present invention. FIG. 11 is a cross-sectional view of one embodiment of a bubble-generating inner member of the present invention. FIG. 12 is a bottom view of one embodiment of the interconnected liquid supply pipe and absorbent liquid spray head of the present invention. 13 is a side view of the liquid supply pipe and absorbent liquid spray head connected to each other in FIG. 12. FIG. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] 1 Gas exhaust pipe 2 Upper foam removal device 3 Liquid supply pipe 4 Intermediate foam removal device 5 Back-mixing inner member 510 Distribution Plate 511 Tubular distributor 520 Screen Plate 521 Long Grid 530 Inner cylinder 6 Gas supply pipe 7 Lower foam removal device 8 Liquid drain pipe 9 Microbubble generating inner component 900 Inner member body 910 Submersible Pump 920 First variable diameter mixing cavity 930 Gas supply branch pipe 940 1st mixed core 950 Second variable diameter mixing cavity 960 conical cavity 970 Reduced diameter mounting cavity 10 Absorbent spray head 101 Fountain board 102 Fountain 11 Baffle plate 12 Venturi mixing inner member 121 Gas collection port 122 Variable diameter stage 123 Diameter reduction stage 124 2nd mixed core 125 Mixed expansion port 126 connecting leg 13 Cylinder 14 Top Header 15 Bottom Header [Mode for Carrying Out the Invention]

[0034] Hereinafter, the embodiments of the present invention will be described in more detail with reference to the drawings. The detailed description of the embodiments and the drawings below are for illustrative purposes only and are not intended to limit the scope of the present invention. The present invention is not limited to the specific embodiments disclosed herein, but can be realized in many different forms, including all technical solutions encompassed by the claims.

[0035] The present invention provides these embodiments to make the present invention thorough and complete, and to fully convey the scope of the present invention to those skilled in the art. Note that the relative arrangements of components and steps, material compositions, numerical formulas and values ​​described in these embodiments should be construed as merely illustrative and not limiting unless otherwise specified.

[0036] In the description of the present invention, unless otherwise specified, "plurality" means two or more. The orientations or positional relationships indicated by terms such as "upper," "lower," "left," "right," "inner," and "outer" are intended to facilitate and simplify the description of the present invention, and do not indicate or imply that the devices or elements shown have a particular orientation or must be configured or operate in a particular orientation, and therefore cannot be understood as limiting the present invention. If the absolute position of the described objects changes, the relative positional relationships may also change accordingly.

[0037] Furthermore, the terms "first," "second," and similar terms used in the present invention do not imply any order, quantity, or importance, but are merely used to distinguish different parts. "Perpendicular" does not mean perpendicular in the strict sense, but has a margin of error. "Parallel" does not mean parallel in the strict sense, but has a margin of error. Similar terms such as "comprise" or "include" mean that the element before the term includes the elements listed after the term, and do not exclude the possibility of including other elements.

[0038] Furthermore, in the description of the present invention, unless otherwise expressly defined and limited, the terms "attach," "couple," and "connect" should be understood in a broad sense, and may refer to, for example, a fixed connection, a detachable connection, or an integral connection. They may be directly connected or indirectly connected via an intermediate medium. The specific meanings of the above terms in the present invention can be understood by those skilled in the art depending on the specific situation. When a specific device is described as being located between a first device and a second device, there may or may not be an intermediate device between the specific device and the first or second device.

[0039] Unless otherwise defined, all terms used in the present invention have the same meaning as understood by a person skilled in the art. Furthermore, it should be understood that terms defined in general dictionaries, etc., should not be interpreted in an idealized or extremely formalized sense unless explicitly defined herein, but should be interpreted as having a meaning consistent with the meaning in the context of the relevant art.

[0040] Techniques, methods and equipment known to those skilled in the art may not be described in detail, but should, where appropriate, be considered part of the description.

[0041] In addition, in the present invention, the gas treatment device provided is used to purify the gas to be treated (e.g., sulfur exhaust gas, recycled gas, natural gas, carbon dioxide, etc.) and absorb harmful substances therein, and when in use, the absorption liquid introduced into the cylindrical body is determined by the gas to be treated.

[0042] 1 is a structural schematic diagram of a first embodiment of a gas treatment device of the present invention. As shown in Fig. 1, the gas treatment device includes a cylindrical body 13, a top header 14 connected to the upper end of the cylindrical body 13, and a bottom header 15 connected to the lower end of the cylindrical body 13. Among these, a gas discharge pipe 1 is provided at the top of the top header 14, a liquid discharge pipe 8 is provided at the bottom of the bottom header 15, a liquid supply pipe 3 is provided in the cylindrical body 13 at a position close to the top header 14, a liquid discharge end of the liquid supply pipe 3 extends into the cylindrical body 13, and an absorption liquid spray head 10 is connected to the liquid discharge end of the liquid supply pipe 3 and is used to spray the absorption liquid downward, a gas supply pipe 6 is provided in the cylindrical body 13 at a position close to the bottom header 15, and a gas discharge end of the gas supply pipe 6 extends into the cylindrical body 13 and is used to introduce the gas to be treated into the cylindrical body 13, a microbubble generating inner member 9 is connected to the gas discharge end of the gas supply pipe 6 and is used to convert the gas to be treated from the gas discharge end into microbubbles and mix them with the absorption liquid, and a back-mixing inner member 5 is provided in the cylindrical body above the microbubble generating inner member 9 and is used to create a back-mixing vortex in the absorption liquid by the action of the upward microbubble flow.

[0043] According to the above technical solution, the present invention provides a microbubble-generating inner member 9 and a back-mixing inner member 5, which are sequentially installed in the cylindrical body 13. These components are combined to form a micro-macroscale double-reinforced reinforced gas absorption inner member. The microbubble-generating inner member 9 generates microbubbles and enhances the contact between the gas and liquid phases at the microscale. The back-mixing inner member 5 then transforms the enhanced contact between the gas and liquid phases at the microscale into a macroscale back-mixing vortex. This combination not only strengthens the inner member but also combines the two aspects of microscale gas-liquid contact and macroscale overall gas-liquid flow, thereby enhancing back-mixing, increasing the mass transfer coefficient, and extending the residence time of gas-liquid contact, thereby effectively improving the gas absorption effect. Compared with the structure of a plate tower, the gas treatment device of the present invention does not require many components such as trays, and realizes the transformation of the structure of a plate absorption tower into a new type of absorption device, thereby simplifying the structure of the device, improving space utilization, saving costs, lowering the pressure drop of the entire device, reducing energy loss, and improving the safety of the device.

[0044] In addition, by spraying the absorbing liquid downward using the absorbing liquid spray head 10, the gas phase becomes the continuous phase in the gas-liquid contact section at the top of the device, and the liquid phase becomes the dispersed phase dispersed in the gas to be treated, while the liquid phase becomes the continuous phase and the gas phase becomes the dispersed phase in the gas-liquid contact section at the bottom of the device. This not only improves mass transfer efficiency, but also makes rational use of the space in the device.

[0045] 1, the gas treatment device further includes a bubble removal mechanism, which is attached to the inner wall of the cylindrical body 13. Specifically, the bubble removal mechanism includes an upper bubble removal device 2, an intermediate bubble removal device 4, and a lower bubble removal device 7, with the upper bubble removal device 2 being located above the liquid supply pipe 3, the intermediate bubble removal device 4 being located below the liquid supply pipe 3, and the lower bubble removal device 7 being located below the gas supply pipe 6.

[0046] Preferably, the distance between the bottom end of the top header 14 and the liquid supply pipe 3 is 150 to 300 mm, for example, 200 mm, so that a bubble removal device can be provided at this distance and there is sufficient distance to remove any bubbles that may be mixed in. The distance between the bottom end of the backmixing inner member 5 and the upper bubble outlet of the microbubble-generating inner member 9 is 200 to 800 mm, for example, 500 mm, so that the gas phase forms stable microbubbles before entering the backmixing inner member 5 and the microbubble flow has a predetermined initial kinetic energy and flow velocity when it enters the backmixing inner member 5. It can be understood that the cylinder 13 is provided with a gas supply port (not shown) and a liquid supply port (not shown), and the liquid supply port is provided near the top header 14 and 150 to 300 mm below the top header 14, and the liquid supply pipe 3 passes through the liquid supply port and extends to the center of the cylinder so as to be perpendicular to the cylinder. The gas supply pipe 6 passes through the gas supply port and extends perpendicular to the center of the cylinder. In some embodiments, the gas discharge end of the gas supply pipe 6 is bent upward by 90° at the center of the cylinder to facilitate attachment of the microbubble-generating inner member 9 (see FIGS. 1, 3, and 5).

[0047] When combined with the operational flow diagram of the gas treatment device shown in Figure 2, a reaction chamber for gas absorption is defined by the cylinder 13, top header 14, and bottom header 15, and an absorbent liquid region is located within the reaction chamber, with the microbubble generating inner member 9 and back-mixing inner member 5 located within the absorbent liquid region and the absorbent liquid spray head 10 located above the absorbent liquid region. The gas discharge pipe 1 connected to the top of the top header 14 is for discharging purified gas made from the gas that has been subjected to the absorption treatment, and the liquid discharge pipe 8 connected to the bottom of the bottom header 15 is for discharging the concentrated absorbent liquid after absorption.

[0048] The operation process of the above gas treatment device will be described in detail below with reference to FIGS.

[0049] S1: The absorption liquid spray head 10 is activated to introduce a predetermined amount of absorption liquid into the cylinder 13. The absorption liquid accumulates in the cylinder 13 until it reaches a predetermined liquid layer, forming an absorption liquid region. The liquid level of the absorption liquid region is higher than the back-mixing inner member 5, specifically, the height is between 200 mm above the back-mixing inner member 5 and the intermediate bubble removal device 4.

[0050] S2: The valve of the gas supply pipe 6 is opened, and the gas to be treated enters the cylindrical body 13 through the gas supply pipe 6 and the microbubble-generating inner member 9. The gas passes through the microbubble-generating inner member 9 and forms microbubbles in the absorption liquid region at the bottom of the cylindrical body 13. The gas and liquid phases come into contact and undergo the first reaction for gas absorption treatment, and the target gas bubbles move upward due to buoyancy. Next, the gas phase moves upward in the absorption liquid and passes through the backmixing inner member 5, forming a backmixing vortex, which increases the mass transfer time between the gas and liquid phases. The gas phase then flows upward.

[0051] S3: Microbubbles are released from the absorption liquid region, forming a continuous gas phase, which moves to the upper part of the cylinder 13. At this time, the absorption liquid ejected from the absorption liquid spray head 10 is sprayed downward in the continuous gas phase, comes into countercurrent contact with the continuous gas phase, and absorbs the target components of gas treatment through a secondary reaction.

[0052] S4: The purified gas formed by the secondary reaction passes through the upper bubble remover 2 and then exits through the gas outlet pipe 1 at the top to enter the subsequent flow, while the absorbent is discharged through the liquid outlet pipe 7 at the bottom of the device.

[0053] The gas treatment device described above can extend the residence time of the gas and liquid phases through backmixing, ensure sufficient contact between the gas and liquid phases, maintain the stability of the bed layer, improve mass transfer efficiency, and significantly reduce the scale and cost of the device.

[0054] FIG. 3 is a structural schematic diagram of a second embodiment of a gas treatment device of the present invention. This embodiment is similar to the gas treatment device of the first embodiment, except that it includes multiple backmixing inner members 5, which are spaced apart from one another in the height direction of the cylindrical body 13 and create turbulent backmixing of the gas and liquid phases in the absorbent region in multiple stages. All of the multiple backmixing inner members 5 are provided within the absorbent region, and the specific number of them may be 1 to 4, for example, 1, 2, 3, or 4. Specifically, FIG. 3 shows two backmixing inner members 5. In actual use, the number of backmixing inner members 5 may be selected depending on the height of the cylindrical body 13.

[0055] 4 shows a structural schematic diagram of a third embodiment of the gas treatment device of the present invention, which is similar to the gas treatment device of the first embodiment, except that the gas treatment device in this embodiment further includes a baffle plate 11, which is provided on the inner wall of the cylinder between the backmixing inner member 5 and the liquid supply pipe 3. Specifically, the gas treatment device shown in FIG. 4 includes a plurality of baffle plates 11 extending radially inward from the inner wall of the cylinder 13, which are spaced apart from one another in the height direction of the cylinder 13, and which form a serpentine channel through which the gas phase and the liquid phase flow and come into contact with each other and cause mass transfer.

[0056] The operation process of the above gas treatment device will be described in detail below with reference to FIG.

[0057] S1: The absorption liquid spray head 10 is activated to introduce a predetermined amount of absorption liquid into the cylinder 13. The absorption liquid accumulates in the cylinder 13 until it reaches a predetermined liquid layer, forming an absorption liquid region. The liquid level of the absorption liquid region is higher than the back-mixing inner member 5, specifically, the height is between 200 mm above the back-mixing inner member 5 and the intermediate bubble removal device 4.

[0058] S2: The valve of the gas supply pipe 6 is opened, and the target gas enters the cylinder 13 via the gas supply pipe 6 and the microbubble-generating inner member 9. The gas passes through the microbubble-generating inner member 9 and forms microbubbles in the absorption liquid region at the bottom of the cylinder. The gas and liquid phases come into contact and undergo the first reaction for gas absorption treatment, and the target gas bubbles move upward due to buoyancy. Next, the gas phase moves upward in the absorption liquid and passes through the backmixing inner member 5, forming a backmixing vortex, which increases the mass transfer time between the gas and liquid phases. The gas phase then flows upward.

[0059] S3: Microbubbles are released from the absorbent region, forming a continuous gas phase that moves to the top of the cylinder. At this time, the absorbent sprayed from the absorbent spray head 10 is sprayed downward in the continuous gas phase, comes into countercurrent contact with the continuous gas phase, and absorbs the target components of the gas treatment through a secondary reaction.

[0060] S4: The purified gas formed by the secondary reaction passes through the upper bubble remover 2 and then exits through the gas outlet pipe 1 at the top to enter the subsequent flow, while the absorbent is discharged through the liquid outlet pipe 7 at the bottom of the device.

[0061] 5 is a structural schematic diagram of a fourth embodiment of the gas treatment device of the present invention. The gas treatment device of this embodiment is similar to the gas treatment device of the third embodiment, except that a venturi mixing inner member 12 is provided in the cylindrical body between the microbubble-generating inner member 9 and the back-mixing inner member 5, and the venturi mixing inner member 12 is used to further break down the microbubble flow from the microbubble-generating inner member 9, increase the speed of the microbubbles, and transport them upward.

[0062] In the above embodiment, the microbubble-generating inner member 9, the venturi mixing inner member 12, and the back-mixing inner member 5 are arranged in this order within the cylindrical body 13. These three components are combined to form a micro-macroscale double-reinforced reinforced gas absorption inner member. The microbubble-generating inner member 9 generates microbubbles to enhance gas-liquid contact at the microscale. The venturi mixing inner member 12 further breaks the microbubbles, increasing gas-liquid contact and forming a high-speed microbubble flow, enhancing back-mixing. Finally, the back-mixing inner member 5 transforms the enhanced gas-liquid contact at the microscale into a macroscale back-mixing vortex. This combination not only strengthens the inner member but also combines the two aspects of microscale gas-liquid contact and macroscale overall gas-liquid flow, thereby enhancing back-mixing, increasing the mass transfer coefficient, more sufficient mass transfer, and improving turbulence, thereby extending the residence time of gas-liquid contact and effectively improving the gas absorption effect.

[0063] Preferably, the distance between the bottom end of the top header 14 and the liquid supply pipe 3 is 150 to 300 mm, for example 250 mm, so that a bubble removal device can be provided at this distance and there is a sufficient distance to remove bubbles that may be mixed in. The distance between the bottom end of the venturi mixing inner member 12 and the upper bubble outlet of the microbubble-generating inner member 9 is 100 to 500 mm, for example 350 mm, so that all gas from the upper bubble outlet of the microbubble-generating inner member 9 can be easily collected.

[0064] The operation process of the above gas treatment device will be described in detail below with reference to FIG.

[0065] S1: The absorption liquid spray head 10 is activated to introduce a predetermined amount of absorption liquid into the cylinder 13. The absorption liquid accumulates in the cylinder 13 until it reaches a predetermined liquid layer, forming an absorption liquid region. The liquid level of the absorption liquid region is higher than the back-mixing inner member 5, specifically, the height is between 200 mm above the back-mixing inner member 5 and the intermediate bubble removal device 4.

[0066] S2: The valve of the gas supply pipe 6 is opened, and the target gas enters the cylinder through the gas supply pipe 6 and the microbubble-generating inner member 9. The target gas forms microbubbles through the microbubble-generating inner member 9 and is mixed with the absorption liquid. The gas and liquid phases come into contact in the microscale, causing mass transfer. The microbubbles are then further crushed by the Venturi mixing inner member 12, becoming smaller and more numerous. A microbubble flow is formed in the absorption liquid region at the bottom of the device, and the gas and liquid phases come into contact, causing gas absorption. The microbubble flow then moves upward in the absorption liquid and passes through the backmixing inner member 5, forming a backmixing vortex, thereby lengthening the mass transfer time between the gas and liquid phases. The gas phase then flows upward.

[0067] S3: Microbubbles are released from the absorbent region, forming a continuous gas phase that moves to the top of the cylinder. At this time, the absorbent sprayed from the absorbent spray head 10 is sprayed downward in the continuous gas phase, comes into countercurrent contact with the continuous gas phase, and absorbs the target gas components again through reaction.

[0068] S4: The purified gas formed by the secondary reaction passes through the upper bubble remover 2 and then exits through the gas outlet pipe 1 at the top to enter the subsequent flow, while the absorbent is discharged through the liquid outlet pipe 7 at the bottom of the device.

[0069] Compared with the structure of a plate tower, the gas treatment device of the present invention does not require many components such as trays, and realizes the transformation of the structure of a plate absorption tower into a new type of absorption device, thereby simplifying the structure of the device, improving space utilization, saving costs, lowering the pressure drop of the entire device, reducing energy loss, and improving the safety of the device.

[0070] Apparently, each gas treatment device according to the invention is particularly characterized by the following:

[0071] This invention utilizes two different forms of mass transfer processes, gas and liquid. In the absorption liquid zone at the bottom of the device, where the concentration of the components to be absorbed in the gas is highest, the gas to be absorbed exists in the form of many bubbles in the absorption liquid. The absorption liquid is the continuous phase, and the gas is the dispersed phase. This provides a large gas-liquid contact area, high mass transfer efficiency, and primary reactions between the gas and the absorption liquid occur, resulting in rapid reactions of the components to be absorbed in the gas. The installation of one or more backmixing inner members in the absorption liquid zone creates backmixing flow in the absorption liquid zone, lengthening retention and mass transfer times and increasing turbulence. At the top of the device, absorption liquid droplets are sprayed from the absorption liquid spray head 10 to further absorb the continuous gas phase, during which secondary reactions of the components to be treated occur.

[0072] In addition, the gas that has just entered the device contains a relatively high concentration of the components to be treated, which are absorbed through reaction by the absorbing liquid in the absorbing liquid zone. After the gas leaves the absorbing liquid zone, the content of the components to be treated has decreased to a certain extent, and they are absorbed through reaction by the absorbing liquid droplets. Therefore, the present invention fully absorbs certain components in the gas, improving mass transfer efficiency and rationally utilizing the space of the device. Compared with the tray column structure of the prior art, the present reactor simplifies the device structure and does not require a column structure, thereby reducing the burden on operating residence time.

[0073] Furthermore, in the present invention, one or more back-mixing internal members are provided in the absorption liquid zone, and the driving force of the gas from bottom to top causes one or more back-mixing flows in the absorption liquid zone, which increases the contact time between the gas phase and the liquid phase, increases the degree of turbulence, improves the mass transfer coefficient, makes the mass transfer more sufficient, maintains the stability of the bed, ensures the reaction is controllable, and maintains a relatively small pressure drop.

[0074] In the present invention, the microbubble-generating inner member 9, the venturi mixing inner member 12, the back-mixing inner member 5, the absorption liquid spray head 10, and the bubble removal mechanism described in each of the above embodiments of the gas treatment device may have any appropriate structure as long as they can perform their functions. However, the present invention also provides some preferred embodiments of these members.

[0075] Referring to the embodiment of the microbubble-generating inner member 9 shown in FIG. 11, the microbubble-generating inner member 9 may include an inner member body 900 and a submersible pump 910. The inner member body 900 includes a first variable-diameter mixing cavity 920, a reduced-diameter mounting cavity 970, and a second variable-diameter mixing cavity 950, which are connected in this order from bottom to top. One end of the first variable-diameter mixing cavity 920 away from the reduced-diameter mounting cavity 970 is a liquid phase inlet. A conical cavity 960 is provided in the tee 920, one end of which opens toward a reduced-diameter mounting cavity 970, and a first mixing wick 940 is filled in the reduced-diameter mounting cavity 970. The inner member body 900 further includes a gas supply branch pipe 930, one end of which is connected to the gas discharge end of the gas supply pipe 6 and the other end of which is connected to the conical cavity 960, and the outlet of the submersible pump 910 is connected to the liquid inlet. The microbubble-generating inner member 9 is connected and fixed via both the gas pipeline and the liquid pipeline at the same time, thereby ensuring stable installation of the microbubble-generating inner member 9. The conical cavity 960 is provided in the first variable-diameter mixing cavity 920, so that the conical cavity 960 can form a narrowing flow path with the first variable-diameter mixing cavity 920, which reduces the flow resistance of the liquid phase when it enters the first variable-diameter mixing cavity 920, changes the flow area of ​​the liquid phase fluid, increases its flow rate, and cuts and pre-breaks the gas in the first variable-diameter mixing cavity 920, thereby effectively improving the microbubble generation effect.

[0076] Here, first variable-diameter mixing cavity 920 and second variable-diameter mixing cavity 950 both have a variable-diameter structure, and each of first variable-diameter mixing cavity 920 and second variable-diameter mixing cavity 950 has a small-diameter end connected to reduced-diameter mounting cavity 970, i.e., a structural form in which the diameter decreases and increases in the gas-liquid flow direction is formed. Submersible pump 910 may be provided at the bottom of the device.

[0077] 11, the first variable-diameter mixing cavity 920 includes a cylindrical section and a conical section that are connected from bottom to top, with the maximum diameter of the conical section being equal to the diameter of the cylindrical section and the diameter of the reduced-diameter mounting cavity 970 being equal to the minimum diameter of the conical section, and the second variable-diameter mixing cavity 950 is configured so that its diameter gradually increases from bottom to top, with the minimum diameter of the second variable-diameter mixing cavity 950 being equal to the diameter of the reduced-diameter mounting cavity 970. The conical cavity 960 includes a first tapered section and a second tapered section that are connected from bottom to top, and the gas supply branch pipe 930 is connected to the first tapered section.

[0078] Preferably, the taper of the first tapered step is greater than the taper of the second tapered step.

[0079] In the above embodiment, the microbubble-generating inner member 9 is provided with a first mixing core 940 at its narrowest point, and is connected to one submersible pump 910. The submersible pump is located near the bottom of the device, and the absorbing liquid in the cylinder is circulated by the pump into the liquid inlet of the first variable-diameter mixing cavity 920 of the microbubble-generating inner member 9. The gas phase from the gas supply pipe 6 enters the conical cavity 960 located in the first variable-diameter mixing cavity 920 through the gas supply branch pipe 930. The gas phase and the liquid phase collide and mix at the open end of the conical cavity 960. At this time, the bubbles are relatively large and are crushed into relatively small microbubbles through the first mixing core 940. They then leave the microbubble-generating inner member 9 through the gas-liquid mixing outlet of the second variable-diameter mixing cavity 950.

[0080] In another preferred embodiment, the microbubble-generating inner member 9 is made of a porous material and may have various shapes, such as tubular, hemispherical, or disc-like, as needed. However, a spherical or hemispherical shape is preferred to increase the surface area and allow the gas to diffuse more uniformly around the periphery. The microbubble-generating inner member 9 and the gas supply pipe 6 may be connected by bolts, flanges, or other methods. The material of the microbubble-generating inner member 9 may be 316 stainless steel. After passing through the microbubble-generating inner member 9, the gas to be treated forms many bubbles in the absorption liquid. The microbubble-generating inner member 9 may also employ the microbubble generator for an enhanced hydrogenation process disclosed in Chinese Patent No. 201410081189.1.

[0081] 10 shows an embodiment of the venturi mixing inner member 12. The venturi mixing inner member 12 includes a gas collection port 121, a cavity structure, and a diverging mixing port 125, which are connected in this order from bottom to top. The gas collection port 121 is configured to have a gradually decreasing diameter from bottom to top (i.e., a flared horn shape), and the diverging mixing port 125 is configured to have a gradually increasing diameter from bottom to top (in the gas flow direction). The cavity structure includes a reduced diameter stage 123 communicating with the bottom of the diverging mixing port 125 and a variable diameter stage 122 (the diameter decreases from bottom to top in the gas flow direction) communicating with the bottom of the reduced diameter stage 123. A second mixing wick 124 is packed in the reduced diameter stage 123. This venturi mixing inner member has a simple, compact, and durable structure. It also increases the degree of gas-liquid turbulence within the device, improving the mass transfer coefficient and mass transfer efficiency. Here, the second mixing core 124 is provided at the narrowest point of the venturi mixing inner member 12, so that the gas phase enters the gas collection port 121 due to the floating action of the gas, enters the diameter change stage 122 through the gas collection port 121, passes through the second mixing core 124 in the diameter reduction stage 123, compresses and breaks the bubbles, and after passing through the second mixing core 124, passes through the mixing expansion port 125, where the pressure changes, the bubbles are further broken and dispersed, and leave the venturi mixing inner member.

[0082] Here, the venturi mixing inner member 12 may further include a connecting leg 126, which is connected between the top of the expanding mixing port 125 and the bottom of the back-mixing inner member 5. That is, the venturi mixing inner member 12 is connected to the back-mixing inner member 5 by the connecting leg 126. Preferably, the number of connecting legs 126 may be three or more, specifically, three, four, five, six, etc.

[0083] Referring to the embodiment of the back-mixing inner member 5 shown in FIG. 6, the back-mixing inner member 5 has a cylindrical structure and includes an inner cylinder 530 and a distribution plate 510 attached to the inner wall of the inner cylinder 530, the inner cylinder 530 and the cylinder body 13 are coaxially arranged, and there is a gap between the outer wall of the inner cylinder 530 and the inner wall of the cylinder body 13.

[0084] Here, in order to enable the formation of a backmixing flow in the backmixing inner member 5, the height of the inner cylinder 530 is preferably 500 to 1500 mm, and more preferably, the height of the inner cylinder 530 may be 500 mm, 600 mm, 700 mm, 800 mm, 900 mm, 1000 mm, 1100 mm, 1200 mm, 1300 mm, 1400 mm, 1500 mm, etc. The distance between the outer wall of the inner cylinder 530 and the inner wall of the cylindrical body 13 is 100 to 200 mm, and more preferably, this distance may be 100 mm, 110 mm, 120 mm, 130 mm, 140 mm, 150 mm, 160 mm, 170 mm, 180 mm, 190 mm, 200 mm, etc.

[0085] Referring to the embodiment of the backmixing inner member 5 shown in FIG. 7 , the backmixing inner member 5 includes an inner cylinder 530, a distribution plate 510 and a screen plate 520 attached to the inner wall of the inner cylinder 530, and the screen plate 520 is disposed above and parallel to the distribution plate 510 in spaced relation.

[0086] It should be particularly emphasized that the back-mixing inner member 5 is attached to the inner wall of the cylinder 13, and may be connected to the inner wall of the cylinder by a structure extending from the side of the distribution plate 510, or may be connected to the inner wall of the cylinder by a structure extending from the side of the screen plate 520, and the extended structure may be in the form of a normal mounting structure for an inner member, but the present invention does not explain or limit the specific form, and this is a normal technical means that a person skilled in the art would have.

[0087] 9, a plurality of axial through-holes are uniformly formed in the distribution plate 510, and a tubular distributor 511 (called a distribution pipe) is provided in each axial through-hole. As shown in FIG. 8, a plurality of elongated grids 521 are formed in the screen plate 520. Specifically, bubbles pass through the distribution plate 510 at the bottom of the back-mixing inner member 5, and enter the back-mixing inner member 5 from the distribution pipes in the distribution plate 510. The distribution plate 510 can uniformly distribute and stabilize a large amount of bubbles in the absorption liquid. Once uniformly distributed, the bubbles continue to rise and pass through the screen plate 520, which stabilizes the fluid in the back-mixing inner member 5 and reduces turbulence. Due to the propulsive action of the gas from bottom to top, the absorption liquid is disturbed from the center to the periphery, causing back-mixing. In other words, the liquid in the absorption liquid region causes back-mixing flow within the inner tube 530 and the tube body 13, and the absorption liquid in the inner tube 530 flows back throughout the entire back-mixing inner member through the gap between the inner tube 530 and the tube body 13, where a back-mixing region is created.

[0088] 12 and 13, the absorbent liquid spray head 10 includes a spray plate 101 and spray nozzles 102 provided on the spray plate 101. Preferably, the angle between the axial direction of the spray nozzle 102 and the horizontal direction is 40° to 50°, more preferably 45°. The spray plate 101 has a circular cross section, and a plurality of spray nozzles 102 are provided on the underside of the spray plate 101, the plurality of spray nozzles 102 forming an annular spray array on the spray plate 101, the annular spray array being distributed concentrically with the spray plate 101, and the number of annular spray arrays is plural.

[0089] Referring to the embodiment of the bubble removal mechanism shown in Figures 1 to 5, the bubble removal mechanism includes an upper bubble removal device 2, an intermediate bubble removal device 4, and a lower bubble removal device 7, wherein the upper bubble removal device 2 is located above the liquid supply pipe 3, the intermediate bubble removal device 4 is located between the liquid supply pipe 3 and the baffle plate 11 (if the baffle plate 11 is not present, the intermediate bubble removal device 4 is located between the liquid supply pipe 3 and the back-mixing inner member 5), and the lower bubble removal device 7 is located below the gas supply pipe 6.

[0090] Here, the upper foam removal device 2, the intermediate foam removal device 4, and the lower foam removal device 7 all have a mesh structure provided laterally within the cylindrical body.

[0091] Preferably, the upper bubble removal device 2 has a mesh opening diameter of 1 to 5 mm, a wire diameter of 0.5 to 2 mm, and a thickness of 50 to 100 mm. For example, the upper bubble removal device 2 may have a mesh opening diameter of 1 mm, 2 mm, 3 mm, 4 mm, 5 mm, etc., a wire diameter of 0.5 mm, 1 mm, 1.5 mm, 2 mm, and a thickness of 50 mm, 60 mm, 70 mm, 80 mm, 90 mm, 100 mm, etc. The upper bubble removal device 2 is used to remove bubbles from the gas phase that has entered the gas discharge pipe 1 and make the gas discharged outside the device relatively clean.

[0092] Preferably, the intermediate bubble removal device 4 has a mesh opening diameter of 1 mm to 5 mm, a wire diameter of 0.5 mm to 2 mm, and a thickness of 100 to 200 mm. For example, the intermediate bubble removal device 4 may have a mesh opening diameter of 1 mm, 2 mm, 3 mm, 4 mm, 5 mm, etc., a wire diameter of 0.5 mm, 1 mm, 1.5 mm, 2 mm, and a thickness of 100 mm, 110 mm, 120 mm, 130 mm, 140 mm, 150 mm, 160 mm, 170 mm, 180 mm, 190 mm, 200 mm, etc. The intermediate bubble removal device 4 removes air bubbles that become mixed in the gas phase moving upward within the device, thereby eliminating any effect on the spraying effect of the absorption liquid.

[0093] The lower bubble removal device 7 has a mesh pore size of 2 mm to 8 mm, a wire diameter of 0.5 mm to 2 mm, and a thickness of 100 to 200 mm. For example, the lower bubble removal device 7 may have a mesh pore size of 2 mm, 3 mm, 4 mm, 5 mm, 6 mm, 7 mm, or 8 mm, a wire diameter of 0.5 mm, 1 mm, 1.5 mm, or 2 mm, and a thickness of 100 mm, 110 mm, 120 mm, 130 mm, 140 mm, 150 mm, 160 mm, 170 mm, 180 mm, 190 mm, or 200 mm. The lower bubble removal device 7 is located inside the bottom header 15 of the device and can remove bubbles in the liquid phase away from the bottom of the device.

[0094] The first and second mixing wicks in the present invention are structured packings made of stainless steel. In the present invention, in order to generate microbubbles, the hole diameters for gas discharge in the microbubble generating inner member 9 and the venturi mixing inner member 12 (specifically, the hole diameters of the first and second mixing wicks) must be on the micron level, such as 0.5 to 3 μm.

[0095] The beneficial effects of the gas treatment device of the present invention over the conventional trayed absorption tower will be explained below with reference to examples and comparative examples.

[0096] In both Examples 1 and 2, sulfur-containing exhaust gas was absorbed using the gas treatment device shown in FIG. 5, and in the Comparative Example, sulfur-containing exhaust gas of the same components was absorbed using a tray absorption tower according to conventional technology. A specific comparison is shown in the table below. [Table 1]

[0097] As can be seen from the above table, when treating sulfur-containing exhaust gas of the same components, the examples can significantly reduce the height of the reactor and the amount of absorbent used, while ensuring the treatment requirements, compared to the comparative examples.

[0098] In Example 1, the amount of absorbent used can be reduced by about 25% under the same treatment requirements. In Example 2, the height of the reactor can be reduced by about 15% under the same treatment requirements. The mass transfer coefficients of Examples 1 and 2 are significantly improved compared to the comparative example.

[0099] The present invention further provides a gas processing method, said method comprising the steps of:

[0100] S1: The gas to be treated is introduced into the absorption liquid region in the form of microbubbles to carry out the primary reaction.

[0101] S2: The absorption liquid in the absorption liquid region is turned into a back-mixing vortex by the action of the upward flowing microbubble flow.

[0102] S3: The absorbing liquid is sprayed downward from above the absorbing liquid region so that the gas released from the absorbing liquid region flows upward and undergoes a secondary reaction with the absorbing liquid sprayed downward.

[0103] According to the technical solution of the present invention, the gas to be treated is introduced into the absorbent region in the form of microbubbles. The absorbent in the absorbent region serves as the continuous phase, and the gas serves as the dispersed phase, resulting in a large gas-liquid contact area and high mass transfer efficiency. The gas undergoes a primary reaction with the absorbent, rapidly reacting with the components to be absorbed in the gas. The absorbent is sprayed from above to below the absorbent region, allowing the gas released from the absorbent region to flow upward and undergo a secondary reaction with the absorbent sprayed downward. The gas serves as the continuous phase, and the liquid serves as the dispersed phase dispersed in the gas. This results in a large gas-liquid contact area and high mass transfer efficiency. Therefore, the gas treatment method of the present invention fully absorbs certain components in the gas, increasing mass transfer efficiency and improving space utilization.

[0104] In some embodiments, the method further comprises the step of further breaking up the microbubble stream to increase its velocity prior to step S2.

[0105] The method may be carried out using the gas treatment device of the present invention, and the method also exhibits the treatment processes and advantages of the gas treatment device.

[0106] Of course, in other embodiments, the method can be carried out using any other suitable gas processing device. The above has described in detail each embodiment of the present invention. In order to avoid obscuring the concept of the present invention, some details that are well known in the art are not described. Those skilled in the art can fully understand how to implement the technical solutions disclosed in this specification based on the above description.

[0107] Although several specific embodiments of the present invention have been described in detail using examples, those skilled in the art should understand that the above examples are merely for illustrative purposes and do not limit the scope of the present invention. Those skilled in the art should understand that modifications may be made to the above embodiments or equivalent substitutions may be made for some technical features without departing from the scope and spirit of the present invention. In particular, the technical features described in each embodiment may be combined in any manner as long as there is no structural contradiction. [Brief explanation of the drawings]

[0108] [Figure 1] 1 is a structural schematic diagram of a first embodiment of a gas treatment device of the present invention. [Figure 2] 2 is a flow diagram illustrating the operation of the gas treatment device in FIG. 1. [Figure 3] FIG. 2 is a structural schematic diagram of a second embodiment of a gas treatment device according to the present invention. [Figure 4] FIG. 4 is a structural schematic diagram of a third embodiment of a gas treatment device of the present invention. [Figure 5] FIG. 10 is a structural schematic diagram of a fourth embodiment of a gas treatment device of the present invention. [Figure 6] FIG. 2 is a structural schematic diagram of an embodiment of a back-mixing inner member in the present invention. [Figure 7] FIG. 4 is a structural schematic diagram of another embodiment of the back-mixing inner member of the present invention. [Figure 8] FIG. 8 is a view taken along the arrow AA in FIG. 7. [Figure 9] FIG. 8 is a view taken along the arrow BB in FIG. 7. [Figure 10] FIG. 2 is a structural schematic diagram of one embodiment of a venturi mixing inner member in the present invention. [Figure 11] 1 is a cross-sectional view of one embodiment of a bubble-generating inner member of the present invention. FIG. [Figure 12] FIG. 2 is a bottom view of one embodiment of the interconnected liquid supply pipe and absorbent liquid spray head of the present invention. [Figure 13] FIG. 13 is a side view of the liquid supply pipe and absorbent liquid spray head connected to each other in FIG. 12.

Claims

1. A gas treatment device including a cylindrical body (13), a top header (14) connected to an upper end of the cylindrical body (13), and a bottom header (15) connected to a lower end of the cylindrical body (13), A liquid supply pipe (3) is provided in the cylindrical body (13) at a position close to the top header (14), and a liquid discharge end of the liquid supply pipe (3) extends into the cylindrical body (13), and an absorption liquid spray head (10) is connected to the liquid discharge end and is used to spray the absorption liquid downward; a gas supply pipe (6) is provided in the cylindrical body (13) at a position close to the bottom header (15), and a gas discharge end of the gas supply pipe (6) extends into the cylindrical body (13) and is used to introduce a gas to be treated into the cylindrical body (13); a microbubble generating inner member (9) connected to a gas discharge end of the gas supply pipe (6), the microbubble generating inner member (9) being used to convert the gas to be treated from the gas discharge end into microbubbles and mix them with an absorbing liquid; a back-mixing inner member (5) provided in a cylindrical body above the microbubble-generating inner member (9), the back-mixing inner member (5) being used to create a back-mixing vortex in the absorption liquid by the action of an upward microbubble flow.

2. The microbubble generating inner member (9) comprises an inner member body (900) and a submersible pump (910), and the inner member body (900) comprises a first variable diameter mixing cavity (920), a reduced diameter mounting cavity (970), and a second variable diameter mixing cavity (950) which are connected in this order from bottom to top, and one end of the first variable diameter mixing cavity (920) away from the reduced diameter mounting cavity (970) serves as a liquid phase inlet, and a conical cavity (960) is provided in the first variable diameter mixing cavity (920), and the conical cavity ( 2. The gas treatment device according to claim 1, wherein one end of the inner member body (900) of the submersible pump (910) facing the reduced diameter mounting cavity (970) is open, and a first mixing wick (940) is filled in the reduced diameter mounting cavity (970), and the inner member body (900) further includes a gas supply branch pipe (930), one end of which is connected to the gas discharge end of the gas supply pipe (6), and the other end of which is connected to the conical cavity (960), and an outlet of the submersible pump (910) is connected to the liquid phase inlet.

3. 3. The gas treatment device of claim 2, wherein the first variable diameter mixing cavity (920) and the second variable diameter mixing cavity (950) each have a small diameter end connected to the reduced diameter mounting cavity (970).

4. 4. The gas treatment device of claim 3, wherein the first variable-diameter mixing cavity (920) includes a cylindrical section and a conical section that are connected from bottom to top, the maximum diameter of the conical section being equal to the diameter of the cylindrical section, and the diameter of the reduced-diameter mounting cavity (970) being equal to the minimum diameter of the conical section, and the second variable-diameter mixing cavity (950) is configured to have a diameter that gradually increases from bottom to top, and the minimum diameter of the second variable-diameter mixing cavity (950) being equal to the diameter of the reduced-diameter mounting cavity (970).

5. The conical cavity (960) includes a first tapered stage and a second tapered stage that communicate from bottom to top, and the gas supply branch pipe (930) communicates with the first tapered stage; 5. The gas treatment device of claim 4, wherein the taper of the first tapered stage is preferably greater than the taper of the second tapered stage.

6. 6. The gas treatment device according to claim 1, wherein a venturi mixing inner member (12) is provided in a cylindrical body between the microbubble-generating inner member (9) and the back-mixing inner member (5), and the venturi mixing inner member (12) is used to further break down the microbubble flow from the microbubble-generating inner member (9) to increase its velocity and then transport it upward.

7. The venturi mixing inner member (12) includes a gas collection port (121), a cavity structure, and a mixing diverging port (125), which are connected in this order from bottom to top. The gas collection port (121) is configured so that its diameter gradually decreases from bottom to top, and the mixing diverging port (125) is configured so that its diameter gradually increases from bottom to top. The cavity structure is provided with a reduced diameter stage (123) communicating with the bottom of the mixing diverging port (125) and a variable diameter stage (122) communicating with the bottom of the reduced diameter stage (123). A second mixing wick (124) is filled in the reduced diameter stage (123).

7. The gas treatment device of claim 6, wherein the venturi mixing inner member (12) preferably further comprises a connecting leg (126), the connecting leg (126) being connected between the top of the mixing expansion port (125) and the bottom of the back-mixing inner member (5).

8. The backmixing inner member (5) comprises an inner cylinder (530) and a distribution plate (510) attached to the inner wall of the inner cylinder (530), the inner cylinder (530) and the cylindrical body (13) are coaxially arranged, and there is a gap between the outer wall of the inner cylinder (530) and the inner wall of the cylindrical body (13), and / or 8. The gas treatment device according to claim 1, wherein a gas discharge pipe (1) is provided at an upper portion of the top header (14), and a liquid discharge pipe (8) is provided at a lower portion of the bottom header (15).

9. The height of the inner cylinder (530) is between 500 and 1500 mm, and the distance between the outer wall of the inner cylinder (530) and the inner wall of the cylinder (13) is between 100 and 200 mm; and / or 9. The gas treatment device according to claim 8, wherein the backmixing inner member (5) further comprises a screen plate (520) attached to the inner wall of the inner cylinder (530), the screen plate (520) being spaced above the distribution plate (510).

10. 10. The gas treatment device according to claim 9, wherein the distribution plate (510) is provided with a plurality of axial through-holes, each of which is provided with a tubular distributor (511), and / or the screen plate (520) is provided with a plurality of elongated grids (521).

11. The gas treatment device according to any one of claims 1 to 10, characterized in that a baffle plate (11) is provided on the inner wall of the cylinder between the backmixing inner member (5) and the liquid supply pipe (3), and / or a bubble removal mechanism is further attached to the inner wall of the cylinder (13).

12. 12. The gas treatment device of claim 11, wherein the bubble removal mechanism includes an upper bubble removal device (2), an intermediate bubble removal device (4), and a lower bubble removal device (7), wherein the upper bubble removal device (2) is located above the liquid supply pipe (3), the intermediate bubble removal device (4) is located between the liquid supply pipe (3) and the baffle plate (11), and the lower bubble removal device (7) is located below the gas supply pipe (6).

13. The upper foam removal device (2), the middle foam removal device (4), and the lower foam removal device (7) are all of mesh structure, The upper bubble removal device (2) has a mesh hole diameter of 1 to 5 mm, a wire diameter of 0.5 to 2 mm, and a thickness of 50 to 100 mm; The intermediate bubble removal device (4) has a mesh hole diameter of 1 mm to 5 mm, a wire diameter of 0.5 mm to 2 mm, and a thickness of 100 to 200 mm; 13. The gas treatment device according to claim 12, wherein the lower bubble removal device (7) has a mesh hole diameter of 2 mm to 8 mm, a wire diameter of 0.5 mm to 2 mm, and a thickness of 100 to 200 mm.

14. 1. A gas processing method comprising: The method comprises: Step S1: introducing a gas to be treated into an absorption liquid region in the form of microbubbles to carry out a primary reaction; Step S2: forming a back-mixing vortex in the absorption liquid region by the action of the upward flow of microbubbles; and step S3 of spraying an absorption liquid from above the absorption liquid region downward so that the gas released from the absorption liquid region flows upward and undergoes a secondary reaction with the absorption liquid sprayed downward.

15. The method further comprises the step of further breaking up the microbubble stream to increase its velocity prior to step S2; and / or 15. The gas processing method according to claim 14, wherein the method is carried out using a gas processing device according to any one of claims 1 to 13.

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