Metamaterial interferometer system and method

Abstract

The optical system includes a first optical element comprising a first substrate, a partial reflection coating disposed on a first surface of the first substrate, and a first metamaterial layer disposed on or adjacent to the first surface of the first substrate and having a structure that defines a continuous phase gradient along a first direction parallel to the first surface of the first substrate; and a second optical element comprising a second substrate and a second metamaterial layer disposed on or adjacent to the first surface of the second substrate and having a structure that defines a continuous phase gradient along a second direction parallel to the first surface of the first substrate, wherein at least one surface of the second optical element is curved along the second direction.

Claims

1. An optical system, The first optical element is, The first substrate and A partial reflective coating disposed on the first surface of the first substrate, A first metamaterial layer is located on or adjacent to the first surface of the first substrate and has a structure that defines a continuous phase gradient along a first direction parallel to the first surface of the first substrate, wherein the change in the magnitude of the phase along the first direction is at least 2π in wavelength λ, A partial reflective layer disposed on or adjacent to the first metamaterial layer, and on the side opposite to the first substrate, A first optical element comprising, A second optical element, The second circuit board, A second metamaterial layer is located on or adjacent to the first surface of the second substrate and has a structure that defines a continuous phase gradient along a second direction parallel to the first surface of the first substrate, A second optical element comprising, The first and second optical elements are oriented such that the first and second directions are substantially orthogonal to each other. At least one surface of the second optical element is curved along the second direction. Optical system.

2. The optical system according to claim 1, wherein the change in the magnitude of the phase along the first direction is at least 2π at a wavelength λ from 0.8 μm to 1.8 μm.

3. The first substrate is made of SiO ２ Al ２ O ３ The optical system according to claim 1, which is formed from at least one material selected from the group consisting of , and ZnS.

4. The optical system according to claim 1, wherein the partial reflection coating comprises Si.

5. The optical system according to claim 1, wherein the partial reflection coating has a reflectance of 20% to 50% at a wavelength λ.

6. The optical system according to claim 5, wherein the partial reflection coating has a reflectance of 25% to 35% at a wavelength λ.

7. The optical system according to claim 1, wherein the continuous phase gradient along the first direction extends over a distance of at least 1 mm along the first direction.

8. The optical system according to claim 7, wherein the continuous phase gradient along the first direction extends over a distance of at least 2 mm along the first direction.

9. The optical system according to claim 1, wherein the continuous phase gradient along the first direction is a linear phase gradient.

10. The optical system according to claim 1, wherein a portion of the continuous phase gradient along the first direction is a linear phase gradient.

11. The optical system according to claim 1, wherein the partial reflective layer is a coating disposed on the surface of the first metamaterial layer.

12. The optical system according to claim 1, wherein the partial reflective layer comprises a third metamaterial layer different from the first metamaterial layer.

13. The optical system according to claim 12, wherein the third metamaterial layer is in contact with the first metamaterial layer.

14. The optical system according to claim 12, wherein the third metamaterial layer is disposed on a third substrate different from the first substrate.

15. The optical system according to claim 14, wherein the third substrate is positioned relative to the first substrate such that the first metamaterial layer and the third metamaterial layer are in contact with each other.

16. The optical system according to claim 14, wherein the third substrate is positioned relative to the first substrate such that a gap exists between the first metamaterial layer and the third metamaterial layer.

17. The optical system according to claim 16, wherein the gap is at least partially filled with air.

18. The optical system according to claim 16, wherein at least one additional layer is located within the gap.

19. The optical system according to claim 18, wherein the at least one additional layer comprises a solid material.

20. The optical system according to claim 18, wherein the at least one additional layer comprises an index matching layer whose refractive index at wavelength λ is between the refractive index of the first metamaterial layer at wavelength λ and the refractive index of the third metamaterial layer at wavelength λ.

21. The optical system according to claim 1, further comprising an anti-reflective coating disposed on a second surface of the first substrate opposite to the first surface.

22. The optical system according to claim 21, wherein the anti-reflective coating has a reflectance of 5% or less at a wavelength λ.

23. The optical system according to claim 1, wherein the partial reflective coating, the first metamaterial layer, and the partial reflective layer define an optical cavity, and the finesse of the optical cavity is at least 2.

24. The optical system according to claim 23, wherein the finesse is at least 3.

25. The optical system according to claim 24, wherein the finesse is at least 10.

26. The optical system according to claim 1, wherein the transmission efficiency of the optical system is at least 70%.

27. The optical system according to claim 26, wherein the transmission efficiency is at least 80%.

28. The optical system according to claim 1, wherein the first metamaterial layer is located on or adjacent to a first region of the first surface of the first substrate, and the apertures where the first metamaterial layer is absent are located on or adjacent to a second region of the first surface of the first substrate, and the first and second regions of the first surface of the first substrate do not overlap.

29. The optical system according to claim 28, wherein the partial reflective coating is not located in the second region of the first surface that forms the aperture.

30. The optical system according to claim 28, wherein the partial reflective layer is not located on or adjacent to the second region of the first surface forming the aperture.

31. The optical system according to claim 1, wherein at least one of the group consisting of the partial reflective coating, the first metamaterial layer, and the partial reflective layer comprises a reference marker.

32. The optical system according to claim 1, wherein the first metamaterial layer comprises a plurality of repeating structures formed from a first material and embedded in a second material.

33. The optical system according to claim 32, wherein the first material comprises Si.

34. The first material is TiO ２ The optical system according to claim 32, comprising:

35. The optical system according to claim 32, wherein the plurality of repeating structures include cylindrical structures.

36. The optical system according to claim 32, wherein the plurality of repeating structures comprises a rectangular parallelepiped prism structure.

37. The optical system according to claim 32, wherein the average height of the repeating structure in the first metamaterial layer is 0.2 μm to 1.5 mm, measured in a direction perpendicular to the first surface of the first substrate.

38. The optical system according to claim 37, wherein the average height of the repeating structure in the first metamaterial layer is 0.5 μm to 1.0 mm, measured in a direction perpendicular to the first surface of the first substrate.

39. The optical system according to claim 32, wherein the average maximum cross-sectional dimension of the repeating structure in the first metamaterial layer is 50 nm to 1 mm, measured in a direction parallel to the first surface of the first substrate.

40. The optical system according to claim 39, wherein the average maximum cross-sectional dimension of the repeating structure in the first metamaterial layer is 200 nm to 600 nm, measured in a direction parallel to the first surface of the first substrate.

41. The optical system according to claim 32, wherein the refractive index of the first material at a wavelength λ is 3.0 to 4.

0.

42. The optical system according to claim 32, wherein the refractive index of the second material at wavelength λ is 1.0 to 2.

0.

43. The optical system according to claim 32, wherein the difference in refractive index between the first material and the second material at wavelength λ is 1.5 to 2.

5.

44. The optical system according to claim 32, wherein the second material comprises at least one material selected from the group consisting of glass, fused silica, quartz, and sapphire.

45. The optical system according to claim 32, wherein the second material comprises at least one polymer material.

46. The optical system according to claim 45, wherein the at least one polymer material is selected from the group consisting of polymethyl methacrylate (PMMA), polycarbonate (PC), polystyrene (PS), polyester (PE), and cyclic olefin polymer (COP).

47. The optical system according to claim 32, wherein the plurality of repeating structures are a first plurality of repeating structures, and the first metamaterial layer further comprises a second plurality of repeating structures formed from the first material and embedded in the second material, wherein the second plurality of repeating structures are different from the first plurality of repeating structures.

48. The optical system according to claim 47, wherein the second plurality of repeating structures have a different cross-sectional shape from the first plurality of repeating structures.

49. The optical system according to claim 47, wherein the average height of the second plurality of repeating structures is measured in a direction perpendicular to the first surface of the first substrate and differs from the average height measured in a direction perpendicular to the first direction of the first plurality of repeating structures.

50. The optical system according to claim 47, wherein the average maximum dimension of the second plurality of repeating structures is measured in a direction parallel to the first surface of the first substrate and differs from the average maximum dimension of the first plurality of repeating structures measured in a direction parallel to the first surface.

51. The optical system according to claim 32, wherein the first metamaterial layer further comprises a plurality of repeating structures formed from a third material and embedded in the second material, the third material being different from the first material.

52. The third material is Si and TiO ２ The optical system according to claim 51, comprising at least one material selected from the group consisting of the following.

53. The optical system according to claim 51, wherein the plurality of repeating structures formed from the first material and the plurality of repeating structures formed from the third material have a common cross-sectional shape.

54. The optical system according to claim 51, wherein the plurality of repeating structures formed from the first material and the plurality of repeating structures formed from the third material have different cross-sectional shapes.

55. The optical system according to claim 51, wherein the average height of the plurality of repeating structures formed from the first material is measured in a direction perpendicular to the first surface of the first substrate and is the same as the average height of the plurality of repeating structures formed from the third material measured in a direction perpendicular to the first surface.

56. The optical system according to claim 51, wherein the average height of the plurality of repeating structures formed from the first material is measured in a direction perpendicular to the first surface of the first substrate and differs from the average height of the plurality of repeating structures formed from the third material measured in a direction perpendicular to the first surface.

57. The optical system according to claim 51, wherein the average maximum dimension of the plurality of repeating structures formed from the first material is measured in a direction parallel to the first surface of the first substrate and is the same as the average maximum dimension of the plurality of repeating structures formed from the third material measured in a direction parallel to the first surface.

58. The optical system according to claim 51, wherein the maximum dimension of the plurality of repeating structures formed from the first material is measured in a direction parallel to the first surface of the first substrate and differs from the average maximum dimension of the plurality of repeating structures formed from the third material measured in a direction parallel to the first surface.

59. The optical system according to claim 1, wherein the second optical element is a lens.

60. The optical system according to claim 59, wherein the second optical element is a cylindrical lens.

61. The optical system according to claim 59, wherein the second optical element is a lens selected from the group consisting of plano-convex lenses, plano-concave lenses, biconvex lenses, biconcave lenses, and convex-concave lenses.

62. The optical system according to claim 59, wherein the second optical element is a transmissive lens.

63. The optical system according to claim 59, wherein the second optical element is a reflective lens.

64. The optical system according to claim 1, wherein at least one surface of the second optical element is curved along both the first and second directions.

65. The optical system according to claim 1, wherein the curvature of at least one surface of the second optical element along the second direction is aspherical.

66. The optical system according to claim 1, wherein the curvature of at least one surface of the second optical element along the second direction is at least partially spherical.

67. The optical system according to claim 1, wherein the curvature of at least one surface of the second optical element along the second direction is at least partially parabolic.

68. The optical system according to claim 64, wherein the curvature of at least one surface of the second optical element along either the first or second direction is aspherical.

69. The optical system according to claim 64, wherein the curvature of at least one surface of the second optical element along either the first or second direction is at least partially spherical.

70. The optical system according to claim 64, wherein the curvature of at least one surface of the second optical element along either the first or second direction is at least partially parabolic.

71. The optical system according to claim 64, wherein the curvature of at least one surface of the second optical element along the first direction is different from the curvature of at least one surface of the second optical element along the second direction.

72. The optical system according to claim 1, wherein the change in the magnitude of the phase along the second direction is at least 2π at a wavelength λ from 0.8 μm to 1.8 μm.

73. The second substrate is SiO ２ Al ２ O ３ The optical system according to claim 1, which is formed of at least one material selected from the group consisting of , and ZnS.

74. The optical system according to claim 1, wherein the continuous phase gradient along the second direction extends over a distance of at least 1 mm along the second direction.

75. The optical system according to claim 74, wherein the continuous phase gradient along the second direction extends over a distance of at least 2 mm along the second direction.

76. The optical system according to claim 1, wherein the continuous phase gradient along the second direction is a linear phase gradient.

77. The optical system according to claim 1, wherein a portion of the continuous phase gradient along the second direction is a linear phase gradient.

78. The optical system according to claim 1, wherein the second metamaterial layer comprises a plurality of repeating structures formed from the first material and embedded in the second material.

79. The optical system according to claim 78, wherein the first material comprises Si.

80. The first material includes TiO ２ The optical system according to claim 78, comprising the same.

81. The optical system according to claim 78, wherein the plurality of repeating structures include cylindrical structures.

82. The optical system according to claim 78, wherein the plurality of repeating structures comprises a rectangular parallelepiped prism structure.

83. The optical system according to claim 78, wherein the average height of the repeating structure in the second metamaterial layer is 0.2 μm to 1.5 mm, measured in a direction perpendicular to the first surface of the second substrate.

84. The optical system according to claim 83, wherein the average height of the repeating structure in the second metamaterial layer is 0.5 μm to 1.0 mm, measured in a direction perpendicular to the first surface of the second substrate.

85. The optical system according to claim 78, wherein the average maximum cross-sectional dimension of the repeating structure in the second metamaterial layer is 50 nm to 1 mm, measured in a direction parallel to the first surface of the second substrate.

86. The optical system according to claim 85, wherein the average maximum cross-sectional dimension of the repeating structure in the second metamaterial layer is 200 nm to 600 nm, measured in a direction parallel to the first surface of the second substrate.

87. The optical system according to claim 78, wherein the refractive index of the first material at wavelength λ is 3.0 to 4.

0.

88. The optical system according to claim 78, wherein the refractive index of the second material at wavelength λ is 1.0 to 2.

0.

89. The optical system according to claim 78, wherein the difference in refractive index at wavelength λ between the first material and the second material is 1.5 to 2.

5.

90. The optical system according to claim 78, wherein the second material comprises at least one material selected from the group consisting of glass, fused silica, quartz, and sapphire.

91. The optical system according to claim 78, wherein the second material comprises at least one polymer material.

92. The optical system according to claim 91, wherein the at least one polymer material is selected from the group consisting of polymethyl methacrylate (PMMA), polycarbonate (PC), polystyrene (PS), polyester (PE), and cyclic olefin polymer (COP).

93. The optical system according to claim 78, wherein the plurality of repeating structures are a first plurality of repeating structures, and the second metamaterial layer further comprises a second plurality of repeating structures formed from the first material and embedded in the second material, wherein the second plurality of repeating structures are different from the first plurality of repeating structures.

94. The optical system according to claim 93, wherein the second plurality of repeating structures have a different cross-sectional shape from the first plurality of repeating structures.

95. The optical system according to claim 93, wherein the average height of the second plurality of repeating structures is measured in a direction perpendicular to the first surface of the second substrate and differs from the average height measured in a direction perpendicular to the first direction of the first plurality of repeating structures.

96. The optical system according to claim 93, wherein the average maximum dimension of the second plurality of repeating structures is measured in a direction parallel to the first surface of the second substrate and differs from the average maximum dimension of the first plurality of repeating structures measured in a direction parallel to the first surface.

97. The optical system according to claim 78, wherein the second metamaterial layer further comprises a plurality of repeating structures formed from a third material and embedded in the second material, the third material being different from the first material.

98. The third material is Si and TiO ２ The optical system according to claim 97, comprising at least one material selected from the group consisting of the following.

99. The optical system according to claim 97, wherein the plurality of repeating structures formed from the first material and the plurality of repeating structures formed from the third material have a common cross-sectional shape.

100. The optical system according to claim 97, wherein the plurality of repeating structures formed from the first material and the plurality of repeating structures formed from the third material have different cross-sectional shapes.

101. The optical system according to claim 97, wherein the average height of the plurality of repeating structures formed from the first material is measured in a direction perpendicular to the first surface of the second substrate and is the same as the average height of the plurality of repeating structures formed from the third material measured in a direction perpendicular to the first surface.

102. The optical system according to claim 97, wherein the average height of the plurality of repeating structures formed from the first material is measured in a direction perpendicular to the first surface of the second substrate and differs from the average height of the plurality of repeating structures formed from the third material measured in a direction perpendicular to the first surface.

103. The optical system according to claim 97, wherein the average maximum dimension of the plurality of repeating structures formed from the first material is measured in a direction parallel to the first surface of the second substrate and is the same as the average maximum dimension of the plurality of repeating structures formed from the third material measured in a direction parallel to the first surface.

104. The optical system according to claim 97, wherein the maximum dimensions of the plurality of repeating structures formed from the first material are measured in a direction parallel to the first surface of the second substrate and differ from the average maximum dimensions of the plurality of repeating structures formed from the third material measured in a direction parallel to the first surface.

105. The optical system comprises the one described in any one of claims 1 to 104, The optical system comprises a plurality of first optical elements, The first surface of the first substrate of each first optical element is located in a common plane such that the partial reflection coating, first metamaterial layer, and partial reflection layer of each first optical element define a continuous optical cavity extending in a direction parallel to the common plane. The device wherein the change in the magnitude of the phase along the continuous optical cavity exceeds 2π at wavelength λ.

106. The apparatus according to claim 105, wherein the change in the magnitude of the phase exceeds 8π at a wavelength λ.

107. The apparatus according to claim 105, wherein each of the plurality of first optical elements is identical.

108. The apparatus according to claim 105, wherein one or more of the plurality of first optical elements are different from one or more other first optical elements.

109. The apparatus according to claim 108, wherein one or more first metamaterial layers among the plurality of first optical elements are different from the first metamaterial layers of one or more other first optical elements.

110. The apparatus according to claim 109, wherein the change in the magnitude of the phase along a first direction of one or more of the plurality of first optical elements is different from the change in the magnitude of the phase along a first direction of one or more other plurality of first optical elements.

111. The apparatus according to claim 105, wherein the plurality of first optical elements comprises at least four first optical elements.

112. The optical system comprises the one described in any one of claims 1 to 104, The optical system comprises a plurality of first optical elements, The first surface of one or more first substrates among the plurality of first optical elements is offset from the first surface of the first substrate of one or more other first optical elements in a direction perpendicular to the first surface of the first substrate, and as a result, the partial reflection coatings, metamaterial layers, and partial reflection layers of the plurality of first optical elements define a plurality of optical cavities that are offset from each other in an orthogonal direction. The overall change in the magnitude of the phase between the optical cavities exceeds 2π at wavelength λ in the apparatus.

113. The apparatus according to claim 112, wherein the first surface of the first substrate of at least some of the plurality of first optical elements is located in a common plane such that the partial reflection coating, metamaterial layer and partial reflection layer of at least some of the first optical elements define a continuous optical cavity as a whole that extends in a direction parallel to the common plane.

114. The apparatus according to claim 113, comprising a plurality of continuous optical cavities each extending in different planes, wherein each continuous optical cavity is offset from other continuous optical cavities in the apparatus.

115. The apparatus according to claim 112, wherein the overall change in the magnitude of the phase between the optical cavities exceeds 8π at wavelength λ.

116. The apparatus according to claim 112, wherein each of the plurality of first optical elements is identical.

117. The apparatus according to claim 112, wherein one or more of the plurality of first optical elements are different from one or more other first optical elements.

118. The apparatus according to claim 117, wherein one or more metamaterial layers among the plurality of first optical elements are different from the metamaterial layers of one or more other first optical elements.

119. The apparatus according to claim 118, wherein the change in the magnitude of the phase along a first direction of one or more of the plurality of first optical elements is different from the change in the magnitude of the phase along a first direction of one or more other plurality of first optical elements.

120. The apparatus according to claim 114, wherein each continuous optical cavity has a phase magnitude change along the continuous optical cavity, and the phase magnitude change of one or more of the multiple continuous optical cavities is different from the phase magnitude change of the other one or more of the multiple continuous optical cavities.

121. The apparatus according to claim 112, wherein the plurality of first optical elements comprises at least four first optical elements.

122. A method for generating an output optical waveform, A step of preparing the optical system according to any one of claims 1 to 104, A step of generating an input optical waveform containing multiple wavelength components, The step of transmitting the input optical waveform through the optical system to generate an output optical waveform is included, At least some of the wavelength components of the input light waveform pass through the optical system multiple times, passing through at least one metamaterial layer of the optical system. The output optical waveform comprises spatially separated wavelength components. A method for generating output light waveforms.

123. A method for generating an output optical waveform, A step of preparing the apparatus according to any one of claims 105 to 121, A step of generating an input optical waveform containing multiple wavelength components, The step of transmitting the input optical waveform through the device to generate an output optical waveform is included, At least some of the wavelength components of the input optical waveform pass through the apparatus multiple times, passing through at least one metamaterial layer of the apparatus. The output optical waveform comprises spatially separated wavelength components. A method for generating output light waveforms.

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