A light manipulation system
By combining dimer structural units and optical components, the complexity and material dependence of existing LOF generation methods are solved, achieving simple and efficient optical manipulation that is suitable for a variety of application scenarios.
Patent Information
- Application Number
- CN202521710248.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-12
- Publication Date
- 2026-06-23
- Estimated Expiration
- 2035-08-12
AI Technical Summary
Existing LOF generation methods have complex structural designs, high requirements for preparation processes, strong dependence on material properties, and limited degrees of freedom in regulation, making them difficult to meet the requirements of cost, ease of operation, and environmental stability in practical applications.
The device employs a dimer structural unit composed of two isotropic particles, combined with a laser emitting device, polarization adjustment component, beam shaping component, and incident angle adjustment component. By adjusting the polarization state and angle of the incident light, effective control of lateral light force can be achieved.
It achieves stable and reliable optical manipulation of dimer structural units, simplifies structural design, reduces dependence on material properties, and has good adaptability and adjustability. It is suitable for particle optical manipulation, optical rotating devices, microfluidic drive modules, and chiral particle sorting platforms.
Smart Images
Figure CN224399681U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of optical system technology, and more specifically, to a light manipulation system. Background Technology
[0002] In recent years, researchers have begun to focus on how to induce Lateral Optical Force (LOF) through optical field structure design. LOF is a type of asymmetric optical force perpendicular to the direction of incident light propagation, typically generated when structural symmetry is broken or the optical field exhibits lateral inhomogeneity. Studies have shown that generating significant LOF in the far field requires two key conditions: first, the scatterer itself must possess structural or material anisotropy, such as ellipsoidal particles or chiral structures; second, the incident light field must have an asymmetric phase or intensity distribution, such as a vector light field or an orbital angular momentum beam.
[0003] Existing methods for generating LOFs mainly fall into three categories: 1. Utilizing asymmetric particles such as ellipsoids and chiral metallic nanostructures to disrupt system symmetry and achieve transverse component modulation of optical force; 2. Adjusting the local field distribution by introducing interfaces, gradient refractive index media, or photonic crystal structures; 3. Constructing multi-particle systems with periodic or aperiodic arrangements and inducing asymmetric optical force through collective scattering behavior. However, these methods generally suffer from the following problems: complex structural design, demanding fabrication processes, strong dependence on material properties, limited degrees of freedom in control, and difficulty in meeting the requirements of cost, ease of operation, and environmental stability in practical applications.
[0004] Some have proposed that two isotropic particles can be bonded together to form a dimer structure, which would reduce the material requirements and construction difficulty of the particle system. Therefore, it is necessary to design an optical system that can meet the lateral light force control requirements of this dimer structure. Utility Model Content
[0005] The present invention aims to overcome at least one of the defects of the prior art and provide a light manipulation system for lateral light force modulation of a dimer structure.
[0006] The technical solution adopted by this utility model is to provide a light manipulation system, including:
[0007] Sample stage;
[0008] The dimer structural unit, assembled from two isotropic particles, is placed on the sample stage;
[0009] Laser emitting device for emitting linearly polarized Gaussian beams;
[0010] A polarization adjustment component is located in front of the laser emitting device and coaxially arranged with the output end of the laser emitting device, used to convert the linearly polarized Gaussian beam into a circularly polarized Gaussian beam.
[0011] A beam shaping component is located in front of and coaxially arranged with the polarization adjustment component, and is used to shape the circularly polarized Gaussian beam into an incident light with an elliptical cross section.
[0012] An incident angle adjustment component is disposed between the beam shaping assembly and the sample stage, and is used to adjust the angle at which the incident light irradiates the dimer structural unit.
[0013] In this scheme, the linearly polarized Gaussian beam emitted by the laser emitting device is converted into a circularly polarized Gaussian beam with an elliptical cross-section after passing through a polarization adjustment component and a beam shaping component. This beam is then incident on the dimer structural unit via an incident angle adjustment component. As the elliptical spot is expanded along its major axis, the intensity gradient is weakened, thus significantly reducing the influence of the gradient force on the dimer structural unit along the major axis of the elliptical spot. Through the adjustment action of the incident angle adjustment component, the balance of the dimer structural unit can be broken based on the scattering process of the incident light, resulting in a net energy difference between the dimer structural units along the major axis of the ellipse. Consequently, the dimer structural unit is mainly driven by the lateral light force caused by asymmetric scattering and moves along the major axis of the elliptical spot. Simultaneously, the spot is compressed along the minor axis of the ellipse, the intensity gradient is enhanced, and a strong confinement potential well is formed. This effectively suppresses the offset of the dimer structural unit along the minor axis of the ellipse caused by scattering force, achieving stable and reliable optical manipulation of the dimer structural unit through lateral light force.
[0014] Furthermore, the isotropic particles are selected from polystyrene particles, polymethyl methacrylate particles, or silica particles.
[0015] Furthermore, the radius of the isotropic particles is 100 nm to 1 μm.
[0016] Furthermore, the polarization adjustment component includes a half-wave plate and a quarter-wave plate arranged coaxially and sequentially.
[0017] In this scheme, by adjusting the rotation angle of the half-wave plate, the direction of the linearly polarized Gaussian beam entering the quarter-wave plate is changed, thereby changing the rotation direction of the circularly polarized Gaussian beam obtained by conversion through the quarter-wave plate. The linear polarization adjustment component of this scheme has a simple structure and is easy to adjust the rotation direction of the circularly polarized Gaussian beam.
[0018] Furthermore, the beam shaping assembly includes a cylindrical lens, a first convex lens, and a second convex lens arranged coaxially and sequentially, wherein the first convex lens and the second convex lens are confocal.
[0019] In this scheme, the cylindrical lens expands the circularly polarized Gaussian beam output by the polarization adjustment component to produce beam asymmetry. The beam is then collimated by a beam-expanding telescope composed of a first convex lens and a second convex lens, thereby obtaining a collimated elliptical circularly polarized Gaussian beam.
[0020] Furthermore, a third convex lens is provided between the beam shaping component and the incident angle adjustment component, and the third convex lens is coaxially arranged with the beam shaping component.
[0021] This solution uses a third convex lens to focus the elliptical beam output from the beam shaping component, forming a high-energy-density elliptical focal spot, thereby improving the control effect of the incident light on the dimer structural unit.
[0022] Furthermore, the incident angle adjustment component employs a reflector with an adjustable tilt angle.
[0023] Furthermore, the optical manipulation system also includes a polarizer, which is disposed between the laser emitting device and the polarization adjustment component.
[0024] This scheme enhances the controllability and stability of linearly polarized Gaussian beams through a polarizer.
[0025] Furthermore, the optical manipulation system also includes an imaging component for imaging the motion process of the dimer structural unit and / or the dimer structural unit.
[0026] Furthermore, the imaging component includes:
[0027] The lighting source is located above the sample stage;
[0028] An objective lens, positioned between the illumination source and the sample stage, is used to focus the illumination source onto the dimer structural unit;
[0029] A semi-transparent, semi-reflective mirror is disposed between the illumination source and the objective lens, and the illumination source enters the objective lens through the semi-transparent, semi-reflective mirror;
[0030] A CCD camera, which is located on a different side of the semi-transparent mirror from the illumination source, is used to acquire images of the dimer structural units reflected by the semi-transparent mirror.
[0031] A fourth convex lens is disposed between the CCD camera and the semi-transparent mirror, and is used to focus the image of the dimer structural unit reflected by the semi-transparent mirror onto the CCD camera.
[0032] Furthermore, a filter is provided between the fourth convex lens and the semi-transparent mirror.
[0033] Furthermore, the light control system also includes a computer electrically connected to the CCD camera.
[0034] Compared with the prior art, the beneficial effects of this utility model are as follows:
[0035] With its simple structure and easy construction, the manipulated object only requires two conventional isotropic particles, avoiding dependence on complex anisotropic structures or noble metal nanomaterials.
[0036] By jointly controlling the incident angle and polarization state of the incident light through the polarization adjustment component and the incident angle adjustment component, dual-parameter adjustment of the direction and magnitude of the lateral light force can be achieved. It has good adaptability and adjustability and has broad application potential. When combined with other devices, it can be further expanded to various scenarios such as particle light manipulation, optical rotation devices, microfluidic drive modules, and chiral particle sorting platforms. Attached Figure Description
[0037] Figure 1 This is a schematic diagram of the optical control system of this utility model.
[0038] Reference numerals: Sample stage 10, Dimer structural unit 20, Laser emitting device 30, Polarizer 31, Polarization adjustment component 40, Half-wave plate 41, Quarter-wave plate 42, Beam shaping component 50, Cylindrical lens 51, First convex lens 52, Second convex lens 53, Incident angle adjustment component 60, Third convex lens 70, Illumination source 81, Objective lens 82, Semi-transparent mirror 83, CCD camera 84, Fourth convex lens 85, Filter 86, Computer 90. Detailed Implementation
[0039] The accompanying drawings are for illustrative purposes only and should not be construed as limiting the scope of this invention. To better illustrate the following embodiments, some components in the drawings may be omitted, enlarged, or reduced, and do not represent the actual dimensions of the product. It is understandable to those skilled in the art that some well-known structures and their descriptions may be omitted in the drawings.
[0040] Furthermore, in this utility model, unless otherwise explicitly specified and limited, the terms "connection," "fixing," etc., should be interpreted broadly. For example, "fixing" can mean a fixed connection, a detachable connection, or an integral part; it can mean a direct connection or an indirect connection through an intermediate medium; it can mean the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.
[0041] Furthermore, in this utility model, descriptions involving "first," "second," etc., are for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature. Additionally, the technical solutions of the various embodiments can be combined with each other, but only on the basis of being achievable by those skilled in the art. When the combination of technical solutions is contradictory or impossible to implement, such a combination of technical solutions should be considered non-existent and not within the scope of protection claimed by this utility model.
[0042] Example 1
[0043] like Figure 1 As shown, this embodiment provides an optical manipulation system, including: a sample stage 10;
[0044] The dimer structural unit 20 is assembled from two isotropic particles and placed on the sample stage 10.
[0045] Laser emitting device 30 is used to emit a linearly polarized Gaussian beam;
[0046] The polarization adjustment component 40 is located in front of the laser emitting device 30 and coaxially arranged with the output end of the laser emitting device 30, and is used to convert the linearly polarized Gaussian beam into a circularly polarized Gaussian beam.
[0047] The beam shaping component 50 is located in front of the polarization adjustment component 40 and is coaxially arranged with the polarization adjustment component 40. It is used to shape the circularly polarized Gaussian beam into an incident light with an elliptical cross section.
[0048] An incident angle adjustment component 60 is located between the beam shaping assembly 50 and the sample stage 10, and is used to adjust the angle at which the incident light irradiates the dimer structural unit 20.
[0049] In practice, the isotropic particles are selected from polystyrene particles, polymethyl methacrylate particles, or silica particles, and the radius of the isotropic particles is 100 nm to 1 μm. For ease of manipulation, the sample stage 10 contains a homogeneous medium, and the dimer structural unit 20 is completely immersed in the homogeneous medium. In practice, the homogeneous medium can be deionized water or air.
[0050] In a preferred embodiment, the isotropic particles are spherical particles of the same size and isotropic. Specifically, two isotropic particles are placed on the substrate of the sample stage 10 and arranged in a bonded manner. Under the action of intermolecular forces (such as van der Waals forces), the two isotropic particles assemble to form a one-dimensional linear dimer structural unit 20. In this way, when the dimer structural unit 20 is driven by lateral light force, the forces on the two isotropic particles are consistent, improving the reliability and flexibility of light manipulation.
[0051] In practical applications, the linearly polarized Gaussian beam emitted by the laser emitting device 30 is converted into a circularly polarized Gaussian beam with an elliptical cross-section after passing through the polarization adjustment component 40 and the beam shaping component 50 in sequence. The beam then passes through the incident angle adjustment component 60 and enters the dimer structural unit 20. The incident light projects an elliptical spot onto the substrate of the sample stage 10. The major axis of the elliptical spot is perpendicular to the propagation direction of the incident light, and the axis of the dimer structural unit 20 is parallel to the minor axis of the elliptical spot. Because the elliptical light spot is expanded along its major axis, the intensity gradient is weakened, thus significantly reducing the influence of the gradient force on the dimer structural unit 20 along the major axis of the elliptical light spot. Through the adjustment of the incident angle adjustment component 60, the balance of the dimer structural unit 20 can be broken based on the scattering process of the incident light, so that the dimer structural unit 20 forms a net energy difference along the major axis of the ellipse. Thus, the dimer structural unit 20 is mainly driven by the lateral light force caused by asymmetric scattering and moves along the major axis of the elliptical light spot. At the same time, the light spot is compressed along the minor axis of the ellipse, the intensity gradient is enhanced, and a strong confinement potential well is formed, thereby effectively suppressing the offset of the dimer structural unit 20 along the minor axis of the ellipse caused by the scattering force, and realizing stable and reliable optical manipulation of the dimer structural unit 20 by the lateral light force.
[0052] In some embodiments, the polarization adjustment assembly 40 includes a half-wave plate 41 and a quarter-wave plate 42 arranged coaxially and sequentially. The half-wave plate 41 is used to adjust the polarization angle of the incident linearly polarized Gaussian light, while the quarter-wave plate 42 is used to convert the linearly polarized Gaussian beam into a circularly polarized Gaussian beam. During operation, by adjusting the rotation angle of the half-wave plate 41, the direction of the linearly polarized Gaussian beam entering the quarter-wave plate 42 is changed, thereby changing the rotation direction of the circularly polarized Gaussian beam obtained by the quarter-wave plate 42. Specifically, the circularly polarized Gaussian beam can be either left-handed or right-handed.
[0053] In some embodiments, the beam shaping assembly 50 includes a cylindrical lens 51, a first convex lens 52, and a second convex lens 53 arranged coaxially and sequentially. The first convex lens 52 and the second convex lens 53 are confocal. In specific applications, the cylindrical lens 51 is used to expand the circularly polarized Gaussian beam output by the polarization adjustment assembly 40 in one direction (such as the x-direction) without affecting the direction perpendicular to it (such as the y-direction), thereby producing beam asymmetry. Then, the beam is collimated by the beam expanding telescope formed by the first convex lens 52 and the second convex lens 53, thereby obtaining a stable and non-divergent elliptical beam spot.
[0054] Continue to refer to Figure 1A third convex lens 70 is also provided between the beam shaping component 50 and the incident angle adjustment component 60, and the third convex lens 70 is coaxially arranged with the beam shaping component 50. In specific implementation, the third convex lens 70 can focus the elliptical beam output by the beam shaping component 50 to form a high-energy-density elliptical focal spot, so as to improve the control effect of the incident light on the dimer structural unit 20.
[0055] In some embodiments, the incident angle adjustment component 60 employs a reflector with an adjustable tilt angle.
[0056] In some embodiments, the optical manipulation system also includes a polarizer 31, which is disposed between the laser emitting device 30 and the polarization adjustment component 40. It is understood that although the laser emitting device 30 itself can output a linearly polarized Gaussian beam, its polarization direction may drift due to factors such as temperature, current, and mechanical vibration, or there may be a small amount of stray polarization components. The polarizer 31 can filter out the components perpendicular to the target polarization direction, ensuring a higher polarization extinction ratio of the output light, thereby enhancing the controllability and stability of the linearly polarized Gaussian beam.
[0057] In some embodiments, the optical manipulation system further includes an imaging component for imaging the motion of the dimer structural unit 20 and / or the dimer structural unit 20. Specifically, the imaging component includes:
[0058] The illumination source 81 is located above the sample stage 10;
[0059] Objective lens 82 is located between illumination source 81 and sample stage 10 and is used to focus illumination source 81 onto dimer structural unit 20.
[0060] A semi-transparent mirror 83 is disposed between the illumination source 81 and the objective lens 82. The illumination source 81 enters the objective lens 82 through the semi-transparent mirror 83 and is focused onto the dimer structural unit 20.
[0061] The CCD camera 84 and the illumination source 81 are located on different sides of the semi-transparent mirror 83, and are used to acquire images of the dimer structural unit 20 reflected by the semi-transparent mirror 83.
[0062] The fourth convex lens 85 is located between the CCD camera 84 and the semi-transparent mirror 83, and is used to focus the image of the dimer structure unit 20 reflected by the semi-transparent mirror 83 onto the CCD camera 84.
[0063] During operation, after receiving illumination from the light source 81, the dimer structural unit 20 scatters and reflects part of the light through the objective lens 82, which then collimates the light and reflects it through the semi-transparent mirror 83 to the CCD camera 84, thereby enabling the CCD camera 84 to image the dimer structural unit 20.
[0064] In some embodiments, a filter 86 is provided between the fourth convex lens 85 and the semi-transparent mirror 83 to filter out the scattered light of the laser wavelength so as to observe the movement of the particles more clearly.
[0065] In some embodiments, the light control system also includes a computer 90 electrically connected to the CCD camera 84. The computer 90 can store images acquired by the CCD camera 84.
[0066] Obviously, the above embodiments of this utility model are merely examples for clearly illustrating the technical solution of this utility model, and are not intended to limit the specific implementation of this utility model. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the claims of this utility model should be included within the protection scope of the claims of this utility model.
Claims
1. A light manipulation system, characterized in that, include: Sample stage; The dimer structural unit, assembled from two isotropic particles, is placed on the sample stage; Laser emitting device for emitting linearly polarized Gaussian beams; A polarization adjustment component is located in front of the laser emitting device and coaxially arranged with the output end of the laser emitting device, used to convert the linearly polarized Gaussian beam into a circularly polarized Gaussian beam. A beam shaping component is located in front of and coaxially arranged with the polarization adjustment component, and is used to shape the circularly polarized Gaussian beam into an incident light with an elliptical cross section. An incident angle adjustment component is disposed between the beam shaping assembly and the sample stage, and is used to adjust the angle at which the incident light irradiates the dimer structural unit.
2. The optical manipulation system according to claim 1, characterized in that, The isotropic particles are polystyrene particles, polymethyl methacrylate particles, or silica particles; and / or, The radius of the isotropic particles is 100 nm to 1 μm.
3. The optical manipulation system according to claim 1, characterized in that, The polarization adjustment component includes a half-wave plate and a quarter-wave plate arranged coaxially and sequentially.
4. The optical manipulation system according to claim 1, characterized in that, The beam shaping assembly includes a cylindrical lens, a first convex lens, and a second convex lens arranged coaxially and sequentially, wherein the first convex lens and the second convex lens are confocal.
5. The optical manipulation system according to claim 1, characterized in that, A third convex lens is also provided between the beam shaping component and the incident angle adjustment component, and the third convex lens is coaxially arranged with the beam shaping component.
6. The optical manipulation system according to claim 1, characterized in that, The incident angle adjustment component is a reflector with an adjustable tilt angle.
7. The optical manipulation system according to any one of claims 1-6, characterized in that, It also includes a polarizer, which is disposed between the laser emitting device and the polarization adjustment component.
8. The optical manipulation system according to any one of claims 1-6, characterized in that, It also includes an imaging component for imaging the motion of the dimer structural unit and / or the dimer structural unit.
9. The optical manipulation system according to claim 8, characterized in that, The imaging component includes: The lighting source is located above the sample stage; An objective lens, positioned between the illumination source and the sample stage, is used to focus the illumination source onto the dimer structural unit; A semi-transparent and semi-reflective mirror is disposed between the illumination source and the objective lens. The illumination source enters the objective lens through the semi-transparent and semi-reflective mirror and is focused onto the dimer structural unit. A CCD camera, which is located on a different side of the semi-transparent mirror from the illumination source, is used to acquire images of the dimer structural units reflected by the semi-transparent mirror. A fourth convex lens is disposed between the CCD camera and the semi-transparent mirror, and is used to focus the image of the dimer structural unit reflected by the semi-transparent mirror onto the CCD camera.
10. The optical manipulation system according to claim 9, characterized in that, A filter is further provided between the fourth convex lens and the semi-transparent mirror; and / or, It also includes a computer electrically connected to the CCD camera.