Coated article having a surface modification layer, and method for producing the same.

Abstract

Coated articles comprising a fluorine-free surface-modified layer are described herein. The surface-modified layer comprises an alkylsilane on its outer surface. The alkylsilane may (i) be bonded to another portion of the coated article by a silane group, and / or (ii) the silane group of the alkylsilane may be the free end of the alkylsilane. In some embodiments, the surface-modified layer may be a fingerprint-concealing coating exhibiting a water contact angle of 90° to 120°, an oleic acid contact angle of 40° or less, and a friction coefficient of 0.25 or less. When a simulated fingerprint is applied to the surface-modified layer in a simulated fingerprint test, the surface-modified layer exhibits an average gray level of 150 or less and / or a haze of 8% or less. Methods for forming the coated article may include reacting an alkylsilane comprising at least two reactive groups to form the surface-modified layer.

Description

[Technical Field]

[0001] Priority Claim This application claims priority under Section 119 of the United States Patent Act to U.S. Provisional Application No. 63 / 603,156 filed on 28 November 2023 and U.S. Provisional Application No. 63 / 669,001 filed on 9 July 2024, the contents of which this Provisional Application is relied upon and incorporated in whole by reference herein.

[0002] field This disclosure generally relates to coated articles having a surface modification layer (e.g., a fingerprint-hiding coating) and methods for producing the same, and more particularly to coated articles including a fluorine-free surface modification layer (e.g., a fingerprint-hiding coating) and methods for producing coated articles. [Background technology]

[0003] Glass, glass-ceramic, and ceramic materials are commonly used in a variety of consumer electronic products, including display devices such as liquid crystal displays (LCDs), electrophoretic displays (EPDs), organic light-emitting diode displays (OLEDs), and plasma display panels (PDPs). For example, chemically strengthened glass is advantageous for many touchscreen products, including mobile phones, music players, e-readers, notepads, tablets, laptop computers, ATMs, and other similar devices. Many of these glass, glass-ceramic, and ceramic materials are also used in displays and display devices for consumer electronic products that do not have touchscreen functionality but tend to be in direct human contact, such as desktop computers, laptop computers, elevator screens, and equipment displays. Glass, glass-ceramic, and ceramic materials are often treated to provide aesthetic and functional characteristics based on the material's end use. For example, anti-reflective, anti-glare, anti-fingerprint, and fingerprint-hiding treatments are common treatments used for materials used in touchscreen products.

[0004] The durability of some types of treatments, such as anti-fingerprint coatings or fingerprint-concealing coatings, can be limited, especially when used in combination with other treatments, such as anti-reflective coatings. It is known that fluorinated silanes, such as fluoroethersilanes, which can be bonded to a surface as a single or multilayer, are used to form coatings with a thickness of 2 nm to 5 nm. When this nanoscale coating wears away, the surface no longer exhibits repellent properties. Attempts to improve the durability and adhesion of ETC coatings include roughening the underlying surface to which the ETC coating is applied.

[0005] As a result, there is a need for a new surface modification layer (e.g., a fingerprint-hiding coating) that can be used with glass, glass-ceramic, and / or ceramic articles having improved abrasion resistance, and / or in conjunction with other treatments, such as anti-reflective coatings. This need and other needs are addressed by this disclosure. [Overview of the project]

[0006] The above and other needs are addressed by the present disclosure providing a surface modification layer (e.g., a fingerprint-hiding coating) or a coated article containing the same that can reduce visibility and / or color shift associated with placing fingerprints thereon. By providing a low polar surface energy and / or a high dispersibility surface energy a, it is possible to allow oil (e.g., fingerprint oil) to be dispersed across a fingerprint-hiding surface (e.g., lipophilic), thereby reducing visibility and / or color shift associated with fingerprints. For example, by providing an alkylsilane, it is possible to enable a low polar surface energy and a high dispersibility surface energy for a fingerprint-hiding coating, thereby enabling the fingerprint-hiding coating to be lipophilic. By providing a high diiodomethane contact angle (e.g., about 60° or more) and / or a low hexadecane contact angle (e.g., 20° or less), it is possible to reduce visibility and / or color shift associated with fingerprints by allowing fingerprint oil to be dispersed across the surface modification layer (e.g., a fingerprint-hiding coating) rather than forming noticeable droplets. By providing a low oleic acid contact angle (e.g., about 40° or less or 35° or less), fingerprint oil can be dispersed across the surface modification layer (e.g., fingerprint-concealing coating) rather than forming noticeable droplets, thereby reducing the visibility and / or color shift associated with fingerprints. By providing a high water contact angle (e.g., about 90° or more or about 100° or more), the removal of aqueous materials (e.g., water droplets, sweat droplets) from the surface modification layer (e.g., fingerprint-concealing coating) can be enhanced. As a result, the fingerprint-concealing coating can be both hydrophobic and oleophilic.

[0007] By providing a surface modification layer (e.g., a fingerprint-concealing coating) according to aspects of this disclosure, good abrasion resistance (e.g., abrasion water contact angle of about 80° or more or 90° or more after 2,000 and / or 3,500 cycles in a steel wool abrasion test, abrasion water contact angle of about 80° or more or 90° or more after 200,000 cycles in a cheese cloth abrasion test, or abrasion water contact angle of about 80° or more or 90° or more after 3,000 cycles in a rubber abrasion test) can be achieved, and, for example, hydrophobic and / or lipophilic characteristics can be maintained. The surface modification layer (e.g., a fingerprint-concealing coating) can exhibit good adhesion to a surface, for example, disposed on the surface of a substrate or optical stack. By providing a surface modification layer (e.g., a fingerprint-concealing coating) with a thickness of about 1 nm to 75 nm (e.g., about 2 nm to 5 nm), a fingerprint-concealing coating with good durability can be provided while minimizing the amount of material required to achieve the effects mentioned above.

[0008] As discussed herein, the properties of the present disclosure differ statistically significantly from the corresponding properties of comparative examples discussed herein, demonstrating that the surface modification layer of the present disclosure (e.g., a fingerprint-concealing coating) performs better than the comparative examples in "concealing" the visual effect associated with applied fingerprints. By providing a fluorine-free fingerprint-concealing coating, it can be made less expensive to produce and / or more environmentally friendly.

[0009] The surface modification layer (e.g., a fingerprint-concealing coating) may include oligomers of one or more alkylsilanes, polymers of one or more alkylsilanes, or both. As used herein, the term "polymer" may generally refer to oligomers, polymers, or combinations thereof. The alkylsilanes may be bis-silanes or tris-silanes, which can produce polymers or copolymers having a disiloxane bond between at least one pair of monomers.

[0010] In some embodiments, a surface modification layer (e.g., a fingerprint-hiding coating) can be bonded to and / or disposed on the planarization layer 123. The planarization layer may include silica or at least a partial silica-like network. Providing silica or a partial silica-like network allows the planarization layer to be rigid (e.g., with an elastic modulus of about 9 GPa or higher) while the surface modification layer (e.g., a fingerprint-hiding coating) remains sufficiently flexible to withstand abrasion.

[0011] The substrate may include glass-based, glass-ceramic, and / or ceramic-based materials, thereby providing good dimensional stability, good impact resistance, and / or good puncture resistance. The glass-based, glass-ceramic, and / or ceramic-based substrate may include one or more compressive stress regions, thereby further providing increased impact resistance and / or increased puncture resistance.

[0012] Examples of some aspects of this disclosure are described below, with the understanding that any of the features of the various aspects may be used individually or in combination with each other.

[0013] Appearance 1. A coated article, A substrate including a first main surface, A fingerprint-concealing coating disposed to cover the first main surface, wherein the fingerprint-concealing coating includes the outer surface of the coated article, and the fingerprint-concealing coating is fluorine-free, The aforementioned fingerprint-concealing coating Water contact angle of 90°~120°, Oleic acid contact angle of 40° or less, and A coated article having a coefficient of friction of 0.25 or less on its outer surface.

[0014] Embodiment 2. The fingerprint-concealing coating comprises an alkylsilane on the outer surface, The alkylsilane is bonded to the substrate by a silane group, or the alkylsilane is bonded to another portion of the fingerprint-concealing coating by a silane group, or both. The silane group of the alkylsilane is located at the free end of the alkylsilane, or The coated article described in Embodiment 1, which is both of the above.

[0015] Embodiment 3. The coated article according to Embodiment 2, wherein the fingerprint-concealing coating comprises an oligomer of the alkylsilane, a polymer of the alkylsilane, or both.

[0016] Embodiment 4. The alkylsilane oligomer, the alkylsilane polymer, or both are Dialkylsiloxane block, A dimethylsiloxane block that binds together the oligomer of the alkylsilane, the polymer of the alkylsilane, or both monomers thereof, or The coated article according to embodiment 3, comprising at least one of the oligomer of the alkylsilane, the polymer of the alkylsilane, or a disiloxane group that binds together the monomers of both thereof.

[0017] Embodiment 5. A coated article according to any one of Embodiments 2 to 4, wherein the alkylsilane is substantially chlorine-free.

[0018] Embodiment 6. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R')2[CH2] m [Si(R)2O] n Si(R')2[CH2] p Si(R)2} qA coated article according to any one of embodiments 1 to 5, comprising R, wherein m and p are independently selected from 3 to 34, R' and R'' are independently selected from CH3 and CH2CH3, n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

[0019] Embodiment 7. In the above structure, n is 1, and q is between 1 and 100, or A coated article according to embodiment 6, wherein n is 1, m is 8, p is 8, and q is at least one of 1 to 100.

[0020] Embodiment 8. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or The coated article according to embodiment 6, wherein n is 2 or greater, m is 8, p is 8, and q is at least one of 1 to 100.

[0021] Embodiment 9. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {Si(R')2[CH2] m A coated article according to any one of embodiments 6 to 8, comprising a condensation product of monomer units containing Si(R')2O, wherein each R' is independently selected from CH3 and CH2CH3, and m is 3 to 34.

[0022] Embodiment 10. The coated article according to Embodiment 9, wherein R' is CH3 and m is 8.

[0023] Aspect 11. The coated article according to Aspect 9 or 10, wherein the condensation product further comprises monomer units comprising {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or a combination thereof, wherein R” is (C5-C38) alkyl, and optionally, at least a portion of the monomer units are linked to the substrate.

[0024] Aspect 12. The coated article according to Aspect 11, wherein the ratio of the monomer units comprising {Si(R’)2[CH2] m Si(R’)2O} to the monomer units comprising {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or a combination thereof is 10:1 to 1:10.

[0025] Aspect 13. The coated article according to any one of Aspects 6-12, wherein the fingerprint hiding coating comprises the oligomer of the alkylsilane, the polymer of the alkylsilane, or both, and the oligomer of the alkylsilane, the polymer of the alkylsilane, or both comprise a condensation product of monomer units comprising {OSi(CH3)2[CH2]8Si(CH3)2} and monomer units comprising {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2) 17 Si}, or a combination thereof.

[0026] Aspect 14. The coated article according to Aspect 13, wherein the ratio of the monomer units comprising {OSi(CH3)2[CH2]8Si(CH3)2} to the monomer units comprising {(CH3)(CH2) 17 Si(OCH3)2}, {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2) 17 Si}, or a combination thereof is 10:1 to 1:10.

[0027] Embodiment 15. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R)2[CH2] m [Si(R)2O] n Su(R)2[CH2] p Si(R)2} q The formula includes R, where m and p are independently selected from 3 to 34, and each R is independently OCH3, OH, and OSi(R')2[CH2] m’ The coated article according to embodiment 2, wherein m' is independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' is independently selected from the group consisting of OCH3 and OH.

[0028] Embodiment 16. In the above structure, at least one: n is 1, and q is between 1 and 100, or A coated article according to embodiment 15, wherein n is 1, m is 8, p is 8, and q is between 1 and 100.

[0029] Embodiment 17. In the above structure, at least one: n is 1, and q is between 1 and 100, or A coated article according to embodiment 15, wherein n is 1, m is 6, p is 6, and q is between 1 and 100.

[0030] Embodiment 18. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2, m is 6, p is 6, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100. n is 2 or greater, m is 8, p is 8, and q is between 1 and 100, or A coated article according to embodiment 15, wherein n is 2 or greater, m is 6, p is 6, and q is at least one of 1 to 100.

[0031] Embodiment 19. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(R)2[CH2] m A coated article according to any one of embodiments 15 to 17, comprising a condensation product of monomer units containing Si(R)2, wherein each R is independently selected from OCH3 and OH, and m is 3 to 34.

[0032] Embodiment 20. The coated article according to Embodiment 18, wherein R is OCH3 and m is 8.

[0033] Embodiment 21. The coated article according to Embodiment 18, wherein R is OCH3 and m is 6.

[0034] Embodiment 22. A coated article according to any one of Embodiments 18 to 21, wherein the condensation product further comprises monomer units including {{R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, wherein R” is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

[0035] Appearance 23. The above {(OSi(R)2[CH2] mThe coated article according to embodiment 21, wherein the ratio of monomer units containing Si(R)2 to monomer units containing {{R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 10:1 to 1:10.

[0036] Embodiment 24. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both comprises monomer units containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 A coated article according to any one of embodiments 21 to 23, comprising a condensation product with monomer units including Si, or combinations thereof.

[0037] Embodiment 25. A monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and the {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 24, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:10.

[0038] Embodiment 26. A monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and the {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 24, wherein the ratio of monomer units containing Si or a combination thereof is 1:1 to 1:10.

[0039] Embodiment 27. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both comprises monomer units containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 A coated article according to any one of embodiments 21 to 23, comprising a condensation product with monomer units including Si, or combinations thereof.

[0040] Embodiment 28. A monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 27, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:10.

[0041] Embodiment 29. A monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and the {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 27, wherein the ratio of monomer units containing Si or a combination thereof is 1:1 to 1:10.

[0042] Embodiment 30. A coated article according to any one of Embodiments 1 to 29, wherein the fingerprint-concealing coating exhibits an oleic acid contact angle of 30° or less.

[0043] Embodiment 31. The fingerprint-concealing coating is A voltage of approximately 15 volts or less in a tribocharging test, or A coated article according to any one of embodiments 1 to 30, which exhibits at least one of the following voltage differences between a peripheral contact area and a central contact area of ​​about 5 volts or less in the aforementioned tribocharging test.

[0044] Embodiment 32. When a simulated fingerprint is applied to the fingerprint-concealing coating in a simulated fingerprint test, the fingerprint-concealing coating, The effective diameter of the simulated fingerprint droplet of 10 μm or larger, The average height of the simulated fingerprint droplets on the outer surface, which is 0.15 μm or less, or A coated article according to any one of embodiments 1 to 31, which shows at least one of the spherical crown radii of the simulated fingerprint droplets, which are 40 μm or larger.

[0045] Embodiment 33. When a simulated fingerprint is applied to the fingerprint-concealing coating in a simulated fingerprint test, the fingerprint-concealing coating, 0.10 μm between 10% and 90% of the load area ratio (areal material ratio) 3 / μm 2 A coated article according to any one of embodiments 1 to 32, showing the core material value Vmc of the above-mentioned simulated fingerprint droplet.

[0046] Embodiment 34. The fingerprint-concealing coating is The ratio of the volume of the droplet to the area of ​​the droplet is 0.78 μm. 3 / μm 2 Is it the following, The ratio of the height of the droplet to the area of ​​the droplet is 0.005 μm / μm 2 Is it the following, 150,000 μm 2 The total area of ​​the simulated fingerprints on the aforementioned outer surface, In the aforementioned simulated fingerprint test, is the haze caused by the simulated fingerprint applied to the fingerprint-concealing coating 8% or less? The center of the sphere modeled on the droplet of the simulated fingerprint is located more than 30 μm from the outer surface of the fingerprint-concealing coating. In the aforementioned simulated fingerprint test, the average gray level of the coated article having the simulated fingerprint applied to the fingerprint-concealing coating is 150 or less when measured in a gray level test, or The coated article according to embodiment 33, wherein the normalized gray level of the coated article having the fingerprint-concealing coating applied to the simulated fingerprint in the simulated fingerprint test is 2.0 or less when measured in a normalized gray level test, and the coated article exhibits at least one of these characteristics.

[0047] Embodiment 35. The fingerprint-concealing coating is Polar surface energy of 2 millinewtons per meter to 6 millinewtons per meter, or A coated article according to any one of embodiments 1 to 34, comprising at least one of a total surface energy of 25 millinewtons per meter to 35 millinewtons per meter.

[0048] Embodiment 36. A coated article according to any one of Embodiments 1 to 35, wherein the fingerprint-concealing coating has a thickness of 1 nanometer to 75 nanometers.

[0049] Embodiment 37. The coated article according to any one of Embodiments 1 to 36, wherein the outer surface of the fingerprint-concealing coating contains 0.5 atomic% to 2 atomic% of a non-fluorine halogen.

[0050] Embodiment 38. The coated article according to any one of Embodiments 1 to 37, wherein the outer surface of the fingerprint-concealing coating does not contain a transition metal-containing compound.

[0051] Embodiment 39. The fingerprint-concealing coating is After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of embodiments 1 to 38, exhibiting at least one of the following rubber abrasion water contact angles: approximately 80° or more after being subjected to 3,000 cycles of abrasion in a rubber abrasion test.

[0052] Embodiment 40. Further comprising a planar layer positioned between the substrate and the fingerprint-concealing coating, wherein the fingerprint-concealing coating is disposed on the planar layer, and the planar layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The ratio of Si-O-Si bonds to Si atoms in the planarization layer is approximately 2 to approximately 3, or A coated article according to any one of embodiments 1 to 39, wherein at least one of the following is observed: the molar ratio of hydrogen to silicon in the planarized layer is about 0.2 or more.

[0053] Embodiment 41. The coated article according to Embodiment 40, wherein the planarization layer includes a refractive index in the range of 1.37 to 1.55.

[0054] Embodiment 42. The coated article according to any one of Embodiments 40 to 41, wherein the planarization layer has an elastic modulus in the range of about 9 gigapascals to about 70 gigapascals.

[0055] Embodiment 43. The planarization layer is In the steel wool abrasion test, after 2,000 cycles of abrasion, the abrasion water contact angle was approximately 80° or more. After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of embodiments 40 to 42, exhibiting at least one of the following rubber abrasion water contact angles: approximately 80° or more after being subjected to 3,000 cycles of abrasion in a rubber abrasion test.

[0056] Embodiment 44. An anti-reflective coating positioned between the fingerprint-concealing coating and the substrate, or A coated article according to any one of embodiments 1 to 43, further comprising at least one of a gradient coating including a refractive index gradient positioned between the fingerprint-concealing coating and the substrate.

[0057] Embodiment 45. A coated article according to any one of Embodiments 1 to 44, further comprising an optical stack positioned between the fingerprint-concealing coating and the substrate, wherein the optical stack includes an anti-reflective coating, a bandpass filter coating, an edge-neutral mirror, a beam splitter coating, a multilayer high-reflectivity coating, or an edge filter coating.

[0058] Embodiment 46. The coated article according to Embodiment 45, wherein the optical stack has a stack thickness of about 10 nanometers to about 10 micrometers.

[0059] Embodiment 47. The coated article according to Embodiment 46, wherein the stack thickness of the optical stack is about 50 nanometers to about 5 micrometers.

[0060] Embodiment 48. A coated article according to any one of Embodiments 46 to 47, wherein the stack thickness of the optical stack is approximately 50 nanometers to approximately 500 nanometers.

[0061] Embodiment 49. A coated article according to any one of Embodiments 45 to 48, wherein the optical stack includes a scratch-resistant layer, the scratch-resistant layer having a scratch-resistant thickness of 0.05 micrometers to 3 micrometers.

[0062] Embodiment 50. The coated article according to any one of Embodiments 45 to 49, wherein the coated article, including the optical stack and the fingerprint-concealing coating, exhibits a hardness of 8 gigapascals or more as measured by a Berkovich indenter hardness test.

[0063] Embodiment 51. A coated article according to any one of Embodiments 45 to 50, wherein the optical stack comprises one or more of silicon-containing oxides, silicon-containing nitrides, silicon-containing oxynitrides, and Nb2O5.

[0064] Embodiment 52. A coated article according to any one of Embodiments 45 to 51, wherein the optical stack comprises two or more layers having different refractive indices, including at least a first low refractive index (RI) layer and a second high refractive index (RI) layer, the absolute value of the difference between the first low RI layer and the second high RI layer is 0.2 or more, and further, the optical stack comprises one or more of silicon-containing oxides, silicon-containing nitrides, silicon-containing oxynitrides, and Nb2O5.

[0065] Embodiment 53. A coated article according to any one of Embodiments 1 to 52, wherein the substrate is a textured substrate.

[0066] Embodiment 54. The coated article according to Embodiment 53, further comprising an anti-reflective coating or gradient coating positioned between the fingerprint-concealing coating and the textured substrate.

[0067] Embodiment 55. The coated article according to Embodiment 54, wherein the thickness of the anti-reflective coating is approximately 200 nanometers to approximately 3 micrometers.

[0068] Embodiment 56. A coated article according to any one of Embodiments 1 to 52, wherein the substrate is a polymer substrate.

[0069] Appearance 57. A coated article, A substrate including a first main surface, A fingerprint-concealing coating disposed to cover the first main surface, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint concealer comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R')2[CH2] m [Si(R)2O] nSi(R’)2[CH2] p Si(R”)2} q comprising R, wherein m and p are independently selected from 3 to 34, R’ and R” are independently selected from CH3 and CH2CH3, n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof, a coated article.

[0070] Aspect 58. The coated article according to aspect 57, wherein R” is CH3.

[0071] Aspect 59. In the above structure, at least one of: n is 1 and q is from 1 to 100, or n is 1, m is 8, p is 8, and q is from 1 to 100, the coated article according to any one of aspects 57 to 58.

[0072] Aspect 60. In the above structure, n is 2 and q is from 1 to 100, or n is 2, m is 8, p is 8, and q is from 1 to 100, or n is 2 or more and q is from 1 to 100, or n is 2 or more, m is 8, p is 8, and q is from 1 to 100, at least one of which is the case, the coated article according to any one of aspects 57 to 59.

[0073] Aspect 61. A coated article, comprising: a substrate including a first major surface, and a fingerprint hiding coating disposed to cover the first major surface, the fingerprint hiding coating including an outer surface of the coated article, wherein the fingerprint hiding coating does not contain fluorine, The fingerprint concealer comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {Si(R')2[CH2] m A coated article comprising a condensation product of monomer units containing Si(R')2O, wherein each R' is independently selected from CH3 and CH2CH3, and m is 3 to 34.

[0074] Aspect 62. The coated article according to aspect 61, wherein R' is CH3.

[0075] Embodiment 63. The coated article according to Embodiment 61, wherein R' is CH3 and m is 8.

[0076] Embodiment 64. A coated article according to any one of Embodiments 61 to 63, wherein the condensation product further comprises monomer units including {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, wherein R” is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

[0077] Embodiment 65. The {Si(R')2[CH2] m The coated article according to embodiment 64, wherein the ratio of monomer units containing Si(R')2O to monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 10:1 to 1:10.

[0078] Embodiment 66. The alkylsilane oligomer, the alkylsilane polymer, or both comprises a monomer unit containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17Si(OCH3)}, {(CH3)(CH2)} 17 A coated article according to any one of embodiments 61 to 65, comprising a condensation product with monomer units including Si or combinations thereof.

[0079] Embodiment 67. A monomer unit containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17 Si(OCH3)2, {(CH3)(CH2)} 17 Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 66, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:10.

[0080] Embodiment 68. The fingerprint-concealing coating is After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of embodiments 57 to 67, exhibiting at least one of the following rubber abrasion water contact angles: approximately 80° or more after 3,000 cycles of abrasion in a rubber abrasion test.

[0081] Embodiment 69. A coated article according to any one of Embodiments 57 to 68, further comprising an optical stack positioned between the fingerprint-concealing coating and the substrate, wherein the optical stack includes an anti-reflective coating, a bandpass filter coating, an edge-neutral mirror, a beam splitter coating, a multilayer high-reflectivity coating, or an edge filter coating.

[0082] Embodiment 70. A coated article according to any one of Embodiments 57 to 69, wherein the substrate is a textured substrate.

[0083] Embodiment 71. The coated article according to Embodiment 70, further comprising an anti-reflective coating or gradient coating positioned between the fingerprint-concealing coating and the textured substrate.

[0084] Embodiment 72. A coated article according to any one of Embodiments 57 to 68, wherein the substrate is a polymer substrate.

[0085] Appearance 73. A coated article, A substrate including a first main surface, A fingerprint-concealing coating disposed to cover the first main surface, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint concealer comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R)2[CH2] m [Si(R)2O] n Su(R)2[CH2] p Si(R)2} q The formula includes R, where m and p are independently selected from 3 to 34, and each R is independently OCH3, OH, and OSi(R')2[CH2] m’ A coated article in which m' is independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' is independently selected from the group consisting of OCH3 and OH.

[0086] Embodiment 74. The coated article according to Embodiment 73, wherein the alkylsilane is chlorine-free.

[0087] A coated article according to embodiment 73 or 74, wherein embodiment 75.R' is OCH3.

[0088] Embodiment 76. In the above structure, at least one: n is 1 and q is from 1 to 100, or The coated article according to any one of Aspects 73 to 75, wherein n is 1, m is 8, p is 8, and q is from 1 to 100.

[0089] Aspect 77. In the said structure, at least one of: n is 1 and q is from 1 to 100, or The coated article according to any one of Aspects 73 to 75, wherein n is 1, m is 6, p is 6, and q is from 1 to 100.

[0090] Aspect 78. In the said structure n is 2 and q is from 1 to 100, or n is 2, m is 8, p is 8, and q is from 1 to 100, or n is 2, m is 6, p is 6, and q is from 1 to 100, or n is 2 or more and q is from 1 to 100, or n is 2 or more, m is 8, p is 8, and q is from 1 to 100, or The coated article according to any one of Aspects 73 to 75, which is at least one of the cases where n is 2 or more, m is 6, p is 6, and q is from 1 to 100.

[0091] Aspect 79. A coated article comprising a substrate including a first main surface, and a fingerprint hiding coating disposed to cover the first main surface, the fingerprint hiding coating including the outer surface of the coated article. wherein the fingerprint hiding coating does not contain fluorine the fingerprint hiding includes an oligomer of an alkylsilane, a polymer of the alkylsilane, or both, and the oligomer of the alkylsilane, the polymer of the alkylsilane, or both is {(OSi(R)2[CH2] mA coated article comprising a condensation product of monomer units containing Si(R)2, wherein each R is independently selected from OCH3 and OH, and m is 3 to 34.

[0092] A coated article according to Aspect 79, wherein R is OCH3 and m is 8.

[0093] Embodiment 81. The coated article according to Embodiment 80, wherein R is OCH3 and m is 6.

[0094] Embodiment 82. A coated article according to any one of Embodiments 79 to 81, wherein the condensation product further comprises monomer units including {{R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, wherein R” is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

[0095] Appearance 83. The above {(OSi(R)2[CH2] m The coated article according to embodiment 82, wherein the ratio of monomer units containing Si(R)2 to monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 10:1 to 1:10.

[0096] Appearance 84. The above {(OSi(R)2[CH2] m The coated article according to embodiment 82, wherein the ratio of monomer units containing Si(R)2 to monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 1:1 to 1:10.

[0097] Embodiment 85. The alkylsilane oligomer, the alkylsilane polymer, or both, comprises a monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 A coated article according to any one of embodiments 79 to 84, comprising a condensation product with monomer units including Si or combinations thereof.

[0098] Embodiment 86. A monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 85, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:10.

[0099] Embodiment 87. A monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and the {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 85, wherein the ratio of monomer units containing Si or a combination thereof is 1:1 to 1:10.

[0100] Embodiment 88. The oligomer of the alkylsilane, the polymer of the alkylsilane, or both, comprises a monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 A coated article according to any one of embodiments 79 to 84, comprising a condensation product with monomer units including Si or combinations thereof.

[0101] Embodiment 89. A monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 88, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:10.

[0102] Embodiment 90. A monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 89, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:10.

[0103] Embodiment 91. The fingerprint-concealing coating is After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of embodiments 79 to 90, exhibiting at least one of the following rubber abrasion water contact angles: approximately 80° or more after 3,000 cycles of abrasion in a rubber abrasion test.

[0104] Embodiment 92. A coated article according to any one of Embodiments 79 to 91, further comprising an optical stack positioned between the fingerprint-concealing coating and the substrate, wherein the optical stack includes an anti-reflective coating, a bandpass filter coating, an edge-neutral mirror, a beam splitter coating, a multilayer high-reflectivity coating, or an edge filter coating.

[0105] Embodiment 93. A coated article according to any one of Embodiments 79 to 92, wherein the substrate is a textured substrate.

[0106] Embodiment 94. The coated article according to Embodiment 93, further comprising an anti-reflective coating or gradient coating positioned between the fingerprint-concealing coating and the textured substrate.

[0107] Embodiment 95. A coated article according to any one of Embodiments 79 to 94, wherein the substrate is a polymer substrate.

[0108] Appearance 96. A coated article, A substrate including a first main surface, A planarization layer disposed to cover the first main surface, wherein the planarization layer has a thickness of approximately 10 nanometers to approximately 600 nanometers between a first surface area and a second surface area opposite to the first surface area, and the second surface area faces the first main surface. A fingerprint-concealing coating disposed on the first surface area of ​​the planarized layer, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint-concealing coating comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R')2[CH2] m [Si(R)2O] n Si(R')2[CH2] p Si(R)2} q A coated article comprising R, wherein m and p are independently selected from 3 to 34, R' and R'' are independently selected from CH3 and CH2CH3, n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

[0109] Appearance 97. The planarization layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The ratio of Si-O-Si bonds to Si atoms in the planarization layer is approximately 2 to approximately 3, or A coated article according to embodiment 96, comprising at least one of the following: a molar ratio of hydrogen to silica of approximately 0.2 or more.

[0110] Embodiment 98. The coated article according to any one of Embodiments 96 to 97, wherein the planarization layer has an elastic modulus in the range of about 9 gigapascals to about 70 gigapascals.

[0111] A coated article according to any one of embodiments 96 to 98, wherein embodiment 99.R" is CH3.

[0112] Embodiment 100. In the above structure, at least one: n is 1, and q is between 1 and 100, or A coated article according to any one of embodiments 96 to 99, wherein n is 1, m is 8, p is 8, and q is between 1 and 100.

[0113] Embodiment 101. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or A coated article according to any one of embodiments 96 to 99, wherein n is 2 or greater, m is 8, p is 8, and q is 1 to 100, at least one of these.

[0114] Apparatus 102. A coated article, A substrate including a first main surface, A planarization layer disposed to cover the first main surface, wherein the planarization layer has a thickness of approximately 10 nanometers to approximately 600 nanometers between a first surface area and a second surface area opposite to the first surface area, and the second surface area faces the first main surface. A fingerprint-concealing coating disposed on the first surface area of ​​the planarized layer, including the outer surface of the coated article, The fingerprint-concealing coating is fluorine-free, and the fingerprint-concealing coating comprises an alkylsilane oligomer, the alkylsilane polymer, or both, and the alkylsilane oligomer, the alkylsilane polymer, or both contain {Si(R')2[CH2] m A coated article comprising a condensation product of monomer units containing Si(R')2O, wherein each R' is independently selected from CH3 and CH2CH3, and m is 3 to 34.

[0115] Embodiment 103. The planarization layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The ratio of Si-O-Si bonds to Si atoms in the planarization layer is approximately 2 to approximately 3, or A coated article according to embodiment 102, comprising at least one of the following: a molar ratio of hydrogen to silica of approximately 0.2 or more.

[0116] Embodiment 104. A coated article according to any one of Embodiments 102 to 103, wherein the planarization layer has an elastic modulus in the range of about 9 gigapascals to about 70 gigapascals.

[0117] Embodiment 105. A coated article according to any one of Embodiments 102 to 104, wherein R' is CH3 and m is 8.

[0118] Embodiment 106. A coated article according to any one of Embodiments 102 to 105, wherein the condensation product further comprises monomer units including {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, wherein R” is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

[0119] Appearance 107. {OSi(R')2[CH2] m The coated article according to embodiment 106, wherein the ratio of monomer units containing {Si(R')2} to monomer units containing {R”Si(OCH3)3} is 10:1 to 1:10.

[0120] Embodiment 108. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both comprises monomer units containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 A coated article according to any one of embodiments 102 to 107, comprising a condensation product with monomer units including Si, or combinations thereof.

[0121] Embodiment 109. A monomer unit containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17 Si(OCH3)2, {(CH3)(CH2)} 17 Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 108, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:10.

[0122] Embodiment 110. A monomer unit containing the {OSi(CH3)2[CH2]8Si(CH3)2} and the {(CH3)(CH2) 17 Si(OCH3)2, {(CH3)(CH2)} 17 Si(OCH3)}, {(CH3)(CH2)} 17 The coated article according to embodiment 108, wherein the ratio of monomer units containing Si or a combination thereof is 11:1 to 1:10.

[0123] Embodiment 111. The planarization layer is In the steel wool abrasion test, after 2,000 cycles of abrasion, the abrasion water contact angle was approximately 80° or more. After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of embodiments 102 to 110, exhibiting at least one of the following rubber abrasion water contact angles: approximately 80° or more after 3,000 cycles of abrasion in a rubber abrasion test.

[0124] Embodiment 112. A coated article according to any one of Embodiments 102 to 111, further comprising an optical stack positioned between the planarization layer and the substrate, wherein the optical stack includes an anti-reflective coating, a bandpass filter coating, an edge-neutral mirror, a beam splitter coating, a multilayer high-reflectivity coating, or an edge filter coating.

[0125] Embodiment 113. A coated article according to any one of Embodiments 102 to 112, wherein the substrate is a textured substrate.

[0126] Embodiment 114. The coated article according to Embodiment 113, further comprising an anti-reflective coating or gradient coating positioned between the planarization layer and the textured substrate.

[0127] Embodiment 115. A coated article according to any one of Embodiments 102 to 114, wherein the substrate is a polymer substrate.

[0128] Appearance 116. A coated article, A substrate including a first main surface, A planarization layer disposed to cover the first main surface, wherein the planarization layer has a thickness of approximately 10 nanometers to approximately 600 nanometers between a first surface area and a second surface area opposite to the first surface area, and the second surface area faces the first main surface. A fingerprint-concealing coating disposed on the first surface area of ​​the planarized layer, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint-concealing coating comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R)2[CH2] m [Si(R)2O] n Su(R)2[CH2] p Si(R)2} q The formula includes R, where m and p are independently selected from 3 to 34, and each R is independently OCH3, OH, and OSi(R')2[CH2] m’ A coated article in which m' is independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' is independently selected from the group consisting of OCH3 and OH.

[0129] Embodiment 117. The planarization layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The ratio of Si-O-Si bonds to Si atoms in the planarization layer is approximately 2 to approximately 3, or A coated article according to embodiment 116, comprising at least one of the following: a molar ratio of hydrogen to silica of approximately 0.2 or more.

[0130] Embodiment 118. A coated article according to any one of Embodiments 116 to 117, wherein the planarization layer has an elastic modulus in the range of about 9 gigapascals to about 70 gigapascals.

[0131] Embodiment 119. In the above structure, at least one: n is 1, and q is between 1 and 100, or A coated article according to any one of embodiments 116 to 118, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

[0132] Embodiment 120. In the above structure, at least one: n is 1, and q is between 1 and 100, or A coated article according to any one of embodiments 116 to 119, wherein n is 1, m is 6, p is 6, and q is 1 to 100.

[0133] Embodiment 121. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2, m is 6, p is 6, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100. n is 2 or greater, m is 8, p is 8, and q is between 1 and 100, or A coated article according to any one of embodiments 116 to 118, wherein n is 2 or greater, m is 6, p is 6, and q is 1 to 100, at least one of these.

[0134] Apparatus 122. A coated article, A substrate including a first main surface, A planarization layer disposed to cover the first main surface, wherein the planarization layer has a thickness of approximately 10 nanometers to approximately 600 nanometers between a first surface area and a second surface area opposite to the first surface area, and the second surface area faces the first main surface. A fingerprint-concealing coating disposed on the first surface area of ​​the planarized layer, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint-concealing coating comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(R)2[CH2] m A coated article comprising a condensation product of monomer units containing Si(R)2, wherein each R is independently selected from OCH3 and OH, and m is 3 to 34.

[0135] Embodiment 123. The coated article according to Embodiment 122, wherein R is OCH3 and m is 8.

[0136] Embodiment 124. The coated article according to Embodiment 122, wherein R is OCH3 and m is 6.

[0137] Embodiment 125. A coated article according to any one of Embodiments 122 to 124, wherein the condensation product further comprises monomer units including {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, wherein R” is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

[0138] Appearance 126. The above {(OSi(R)2[CH2] mAn article according to aspect 125, wherein the ratio of the monomer unit containing Si(R)2} to the monomer unit containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or a combination thereof is from 10:1 to 1:10.

[0139] Aspect 127. The oligomer of the alkylsilane, the polymer of the alkylsilane, or both contain a condensation product of a monomer unit containing {(OSi(R)2[CH2] m An article according to aspect 125, wherein the ratio of the monomer unit containing Si(R)2} to the monomer unit containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or a combination thereof is from 1:1 to 1:10.

[0140] Aspect 128. The oligomer of the alkylsilane, the polymer of the alkylsilane, or both contain a condensation product of a monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and a monomer unit containing {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2) 17 Si}, or a combination thereof, according to any one of aspects 125 to 127.

[0141] Aspect 129. An article according to aspect 128, wherein the ratio of the monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} to the monomer unit containing {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2) 17 Si}, or a combination thereof is from 10:1 to 1:10.

[0142] Aspect 130. The monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and the monomer unit containing {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)17 The coated article according to aspect 128, wherein the ratio of the monomer units containing Si} or a combination thereof is 11:1 to 1:10.

[0143] Aspect 131. The oligomer of the alkylsilane, the polymer of the alkylsilane, or both contain monomer units containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2) 17 The coated article according to any one of aspects 125 to 127, which contains a condensation product of monomer units containing Si} or a combination thereof.

[0144] Aspect 132. The ratio of the monomer units containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} to the monomer units containing {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2) 17 Si} or a combination thereof is 10:1 to 1:10. The coated article according to aspect 131.

[0145] Aspect 133. The ratio of the monomer units containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} to the monomer units containing {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2) 17 Si} or a combination thereof is 11:1 to 1:10. The coated article according to aspect 131.

[0146] Aspect 134. A method for forming a coated article, An alkylsilane, wherein the alkylsilane contains a C3-C 34 alkyl group, and the alkylsilane contains at least two reactive groups independently selected from silane, non-fluorine halogen, or a combination thereof. Disposing the alkylsilane on the first major surface of the substrate. This includes reacting the alkylsilane to form a fingerprint-concealing coating on the first main surface of the substrate, The aforementioned fingerprint-concealing coating Water contact angle of 90°~120°, Oleic acid contact angle of 40° or less, and A method for demonstrating that the coefficient of friction of the outer surface is 0.25 or less.

[0147] Embodiment 135. The method according to Embodiment 134, wherein the arrangement includes spray coating the alkylsilane onto the first main surface.

[0148] Embodiment 136. The method according to any one of Embodiments 134 to 135, wherein the reaction comprises heating the alkylsilane at a temperature of about 80°C to about 250°C for a period of about 10 minutes to about 8 hours.

[0149] Embodiment 137. The method according to any one of Embodiments 134 to 135, wherein the reaction comprises distributing the alkylsilane on the planarized layer at a temperature of about 20°C to about 40°C for a period of about 1 hour to about 24 hours.

[0150] Embodiment 138. The method according to any one of Embodiments 134 to 137, wherein two of the at least two reactive groups are located at the opposite end of the alkylsilane.

[0151] Embodiment 139. The method according to any one of Embodiments 134 to 138, wherein the alkylsilane includes alkyltrichlorosilane, alkyldichloromethoxysilane, alkylchlorodimethoxysilane, alkyldichloromethylsilane, alkylchlorodimethylsilane, alkyltrimethoxysilane, alkyltriethoxysilane, or a combination thereof.

[0152] Embodiment 140. The method according to any one of Embodiments 134 to 139, wherein the alkylsilane comprises alkylchlorodimethylsilane and alkyltrimethoxysilane.

[0153] Embodiment 141. The method according to Embodiment 140, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

[0154] Embodiment 142. The method according to any one of Embodiments 139 to 141, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

[0155] Embodiment 143. The method according to Embodiment 142, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

[0156] Embodiment 144. The method according to any one of Embodiments 134 to 143, wherein the alkylsilane comprises 1,8-bis(chlorodimethylsilyl)ocatane, chloropropyltrimethoxysilane, octadecyltrimethoxysilane, or a combination thereof.

[0157] Embodiment 145. The method according to any one of Embodiments 134 to 143, wherein the alkylsilane comprises 1,8-bis(trimethoxysilyl)octane, 1,6-bis(trimethoxysilyl)hexane, octadecyltrimethoxysilane, or a combination thereof.

[0158] Embodiment 146. The method according to any one of Embodiments 134 to 145, wherein the alkylsilane is chlorine-free.

[0159] Embodiment 147. The method according to any one of Embodiments 134 to 146, wherein the alkylsilane comprises alkyltrimethoxysilyl and alkyltrimethoxysilane.

[0160] Embodiment 148. The method according to Embodiment 147, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

[0161] Embodiment 149. The method according to any one of Embodiments 147 to 148, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

[0162] Embodiment 150. The method according to Embodiment 149, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 10% to about 50%.

[0163] Embodiment 151. The method according to any one of embodiments 134-150 or 253-259, wherein the alkylsilane further comprises a dimethylsilane having silanes at both ends of the dimethylsilane.

[0164] Embodiment 152. The method according to Embodiment 151, wherein the dimethylsilane is dichloro-tetramethyl-disoloxane.

[0165] Embodiment 153. The method according to any one of Embodiments 151 to 152, wherein the amount of dimethylsilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

[0166] Embodiment 154. The method according to Embodiment 153, wherein the amount of dimethylsilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

[0167] Embodiment 155. The method according to any one of Embodiments 134 to 146, wherein the alkylsilane consists of a single alkylsilane compound.

[0168] Embodiment 156. The method according to any one of Embodiments 134 to 155, wherein the provision of the alkylsilane includes provision of a solution containing the alkylsilane, and the pH of the solution is 6 to 8.

[0169] Embodiment 157. The method according to any one of Embodiments 134 to 156, wherein the fingerprint-concealing coating comprises an oligomer of the alkylsilane, a polymer of the alkylsilane, or both.

[0170] Apparatus 158. The fingerprint-concealing coating is The alkylsilane is bonded to the substrate by a silane group, or the alkylsilane is bonded to another part of the coated article by a silane group, or both. The silane group of the alkylsilane is at the free end of the alkylsilane, or The method according to any one of embodiments 134 to 157, further comprising both of the above.

[0171] Embodiment 159. The method according to any one of Embodiments 157 to 158, wherein the oligomer of the alkylsilane, the polymer of the alkylsilane, or both comprises a dialkylsiloxane block.

[0172] Embodiment 160. The method according to any one of Embodiments 157 to 159, wherein monomer units comprising the oligomer of the alkylsilane, monomer units comprising the polymer of the alkylsilane, or both are bonded together by a disiloxane group.

[0173] Embodiment 161. The method according to any one of Embodiments 157 to 160, wherein monomer units comprising the oligomer of the alkylsilane, monomer units comprising the polymer of the alkylsilane, or both are bonded together by a dimethylsiloxane block.

[0174] Embodiment 162. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R')2[CH2] m [Si(R)2O] n Si(R')2[CH2] p Si(R)2} qThe method according to any one of embodiments 157 to 161, comprising R, wherein m and p are independently selected from 3 to 34, R' and R'' are independently selected from CH3 and CH2CH3, n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

[0175] Embodiment 163. The method according to Embodiment 162, wherein "R" is CH3.

[0176] Embodiment 164. In the above structure, at least one: n is 1, and q is between 1 and 100, or The method according to any one of embodiments 162 to 163, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

[0177] Embodiment 165. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or The method according to any one of embodiments 162 to 163, wherein n is 2 or greater, m is 8, p is 8, and q is 1 to 100, at least one of these.

[0178] Embodiment 166. The fingerprint concealer comprises an alkylsilane oligomer, an alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {Si(R')2[CH2] m The method according to any one of embodiments 157 to 161, comprising a condensation product of monomer units containing Si(R')2O, wherein each R' is independently selected from CH3 and CH2CH3, and m is 3 to 34.

[0179] Embodiment 167. The method according to Embodiment 166, wherein R' is CH3.

[0180] Embodiment 168. The method according to Embodiment 166, wherein R' is CH3 and m is 8.

[0181] Embodiment 169. The method according to any one of Embodiments 166 to 168, wherein the condensation product further comprises monomer units including {{R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, wherein R” is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

[0182] Embodiment 170. The {Si(R')2[CH2] m The method according to embodiment 169, wherein the ratio of monomer units containing Si(R')2O to monomer units containing {{R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 10:1 to 1:10.

[0183] Embodiment 171. The alkylsilane oligomer, the alkylsilane polymer, or both, comprises a monomer unit containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to any one of embodiments 169 to 170, comprising a condensation product with monomer units including Si or combinations thereof.

[0184] Embodiment 172. A monomer unit containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17 Si(OCH3)2, {(CH3)(CH2)} 17 Si(OCH3)}, {(CH3)(CH2)} 17The method according to embodiment 171, wherein the ratio of monomer units containing Si or combinations thereof is 10:1 to 1:10.

[0185] Embodiment 173. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R)2[CH2] m [Si(R)2O] n Su(R)2[CH2] p Si(R)2} q The formula includes R, where m and p are independently selected from 3 to 34, and each R is independently OCH3, OH, and OSi(R')2[CH2] m’ The method according to any one of embodiments 157 to 161, wherein m' is independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' is independently selected from the group consisting of OCH3 and OH.

[0186] Embodiment 174. The method according to Embodiment 173, wherein the alkylsilane does not contain chlorine.

[0187] Embodiment 175. The method according to any one of Embodiments 173 to 174, wherein R' is OCH3.

[0188] Embodiment 176. In the above structure, at least one: n is 1, and q is between 1 and 100, or The method according to any one of embodiments 173 to 175, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

[0189] Embodiment 177. In the above structure, at least one: n is 1, and q is between 1 and 100, or The method according to any one of embodiments 173 to 175, wherein n is 1, m is 6, p is 6, and q is 1 to 100.

[0190] Embodiment 178. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2, m is 6, p is 6, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or n is 2 or greater, m is 8, p is 8, and q is between 1 and 100, or The method according to any one of embodiments 173 to 175, wherein n is 2 or greater, m is 6, p is 6, and q is 1 to 100, at least one of these.

[0191] Embodiment 179. The fingerprint concealer comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(R)2[CH2] m The method according to any one of embodiments 157 to 161, comprising a condensation product of monomer units containing Si(R)2, wherein each R is independently selected from OCH3 and OH, and m is 3 to 34.

[0192] Embodiment 180. The method according to Embodiment 179, wherein R is OCH3 and m is 8.

[0193] Embodiment 181. The method according to Embodiment 179, wherein R is OCH3 and m is 6.

[0194] Embodiment 182. The method according to any one of Embodiments 179 to 181, wherein the condensation product further comprises monomer units including {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, wherein R” is (C5-C38)alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

[0195] Embodiment 183. The above {(OSi(R)2[CH2] m The method according to embodiment 182, wherein the ratio of monomer units containing Si(R)2 to monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 10:1 to 1:10.

[0196] Appearance 184. The above {(OSi(R)2[CH2] m The method according to embodiment 182, wherein the ratio of monomer units containing Si(R)2 to monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 1:1 to 1:10.

[0197] Embodiment 185. The alkylsilane oligomer, the alkylsilane polymer, or both, comprises a monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to any one of embodiments 179 to 184, comprising a condensation product with monomer units including Si or combinations thereof.

[0198] Embodiment 186. A monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to embodiment 185, wherein the ratio of monomer units containing Si or combinations thereof is 10:1 to 1:10.

[0199] 187. A monomer unit containing the above {(OSi(OCH3)2[CH2]8Si(OCH3)2} and the above {(CH3)(CH2)17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to embodiment 185, wherein the ratio of monomer units containing Si or combinations thereof is 1:1 to 1:10.

[0200] Embodiment 188. The alkylsilane oligomer, the alkylsilane polymer, or both, comprises a monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to any one of embodiments 179 to 184, comprising a condensation product with monomer units including Si or combinations thereof.

[0201] Embodiment 189. A monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to embodiment 188, wherein the ratio of monomer units containing Si or combinations thereof is 10:1 to 1:10.

[0202] Embodiment 190. A monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to embodiment 188, wherein the ratio of monomer units containing Si or combinations thereof is 11:1 to 1:10.

[0203] Embodiment 191. A method for forming a coated article, The functionalized polyhedral oligomer silsesquioxane is deposited onto the first main surface of the substrate, The method involves impacting the first main surface of the substrate with an ion beam, wherein the impact occurs for approximately 10 minutes. -4This is carried out in a chamber containing a chamber pressure in the range of Pascals to about 1 Pascal, and the ion beam is generated using a discharge current of about 0.25 amperes to about 1 ampere to form a planarization layer, and then, The method involves reacting the material of the planarization layer with an alkylsilane to form a fingerprint-concealing coating, wherein the alkylsilane contains three or more carbon atoms, and the silane contains at least two reactive groups independently selected from silanes, nonfluorine halogens, or combinations thereof. The aforementioned fingerprint-concealing coating Water contact angle of 90°~120°, Oleic acid contact angle of 40° or less, and A method for demonstrating that the coefficient of friction of the outer surface is 0.25 or less.

[0204] Embodiment 192. The method according to Embodiment 191, wherein the functionalized polyhedral oligomer silsesquioxane is at least partially functionalized with at least one of an alkene containing 2 to 8 carbon atoms, an alkane containing 1 to 8 carbon atoms, or a combination thereof.

[0205] Embodiment 193. The method according to any one of Embodiments 191 to 192, wherein the deposition of the functionalized polyhedral oligomer silsesquioxane and the collision are performed simultaneously.

[0206] Embodiment 194. The method according to any one of Embodiments 191 to 193, wherein the reaction comprises depositing the alkylsilane at a temperature of about 80°C to about 250°C for a period of about 10 minutes to about 8 hours.

[0207] Embodiment 195. The method according to any one of Embodiments 191 to 194, wherein the reaction comprises distributing the alkylsilane on the planarization layer at a temperature of about 20°C to about 40°C for a period of about 1 hour to about 24 hours.

[0208] Embodiment 196. The method according to any one of Embodiments 191 to 195, wherein two of the at least two reactive groups are located at the opposite end of the alkylsilane.

[0209] Embodiment 197. The method according to any one of Embodiments 191 to 196, wherein the alkylsilane includes alkyltrichlorosilane, alkyldichloromethoxysilane, alkylchlorodimethoxysilane, alkyldichloromethylsilane, alkylchlorodimethylsilane, alkyltrimethoxysilane, alkyltriethoxysilane, or a combination thereof.

[0210] Embodiment 198. The method according to any one of Embodiments 191 to 197, wherein the alkylsilane comprises alkylchlorodimethylsilane and alkyltrimethoxysilane.

[0211] Embodiment 199. The method according to Embodiment 199, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

[0212] Embodiment 200. The method according to any one of Embodiments 198 to 199, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

[0213] Embodiment 201. The method according to Embodiment 200, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

[0214] Embodiment 202. The method according to any one of Embodiments 191 to 201, wherein the alkylsilane comprises 1,8-bis(chlorodimethylsilyl)ocatane, chloropropyltrimethoxysilane, octadecyltrimethoxysilane, or a combination thereof.

[0215] Embodiment 203. The method according to any one of Embodiments 191 to 201, wherein the alkylsilane comprises 1,8-bis(trimethoxysilyl)octane, 1,6-bis(trimethoxysilyl)hexane, octadecyltrimethoxysilane, or a combination thereof.

[0216] Embodiment 204. The method according to any one of Embodiments 191 to 201, wherein the alkylsilane is chlorine-free.

[0217] Embodiment 205. The method according to any one of Embodiments 134 to 204, wherein the alkylsilane comprises alkyltrimethoxysilyl and alkyltrimethoxysilane.

[0218] Embodiment 206. The method according to Embodiment 205, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

[0219] Embodiment 207. The method according to any one of Embodiments 205 to 206, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

[0220] Embodiment 208. The method according to Embodiment 207, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 10% to about 50%.

[0221] Embodiment 209. The method according to any one of Embodiments 191 to 208, wherein the alkylsilane further comprises a dimethylsilane having silanes at both ends of the dimethylsilane.

[0222] Embodiment 210. The method according to Embodiment 209, wherein the dimethylsilane is dichloro-tetramethyl-disoloxane.

[0223] Embodiment 211. The method according to any one of Embodiments 209 to 210, wherein the amount of dimethylsilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

[0224] Embodiment 212. The method according to Embodiment 211, wherein the amount of dimethylsilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

[0225] Embodiment 213. The method according to any one of Embodiments 191 to 204, wherein the alkylsilane consists of a single alkylsilane compound.

[0226] Embodiment 214. The method according to any one of Embodiments 191 to 213, wherein the arrangement of the alkylsilane includes the arrangement of a solution containing the alkylsilane, and the pH of the solution is 6 to 8.

[0227] Embodiment 215. The planarization layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The ratio of Si-O-Si bonds to Si atoms in the planarization layer is approximately 2 to approximately 3, or The method according to any one of embodiments 191 to 214, wherein at least one of the following is expressed: the molar ratio of hydrogen to silicon in the planarized layer is about 0.2 or more.

[0228] Embodiment 216. The method according to any one of Embodiments 191 to 215, wherein the fingerprint-concealing coating comprises an oligomer of the alkylsilane, a polymer of the alkylsilane, or both.

[0229] Embodiment 217. The fingerprint-concealing coating is The alkylsilane is bonded to the planarization layer by a silane group, The silane group of the alkylsilane is at the free end of the alkylsilane, or The method according to any one of embodiments 119 to 216, further comprising both of the above.

[0230] Embodiment 218. The method according to any one of Embodiments 216 to 217, wherein the oligomer of the alkylsilane, the polymer of the alkylsilane, or both comprises a dialkylsiloxane block.

[0231] Embodiment 219. The method according to any one of Embodiments 216 to 218, wherein monomer units comprising the oligomer of the alkylsilane, monomer units comprising the polymer of the alkylsilane, or both are bonded together by a disiloxane group.

[0232] Embodiment 220. The method according to any one of Embodiments 216 to 219, wherein monomer units comprising the oligomer of the alkylsilane, monomer units comprising the polymer of the alkylsilane, or both are bonded together by a dimethylsiloxane block.

[0233] Embodiment 221. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R')2[CH2] m [Si(R)2O] n Si(R')2[CH2] p Si(R)2} q The method according to any one of embodiments 216 to 220, comprising R, wherein m and p are independently selected from 3 to 34, R' and R'' are independently selected from CH3 and CH2CH3, n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

[0234] Embodiment 222. The method according to Embodiment 221, wherein "R" is CH3.

[0235] Embodiment 223. In the above structure, at least one: n is 1, and q is between 1 and 100, or The method according to any one of embodiments 221 to 222, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

[0236] Embodiment 224. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or The method according to any one of embodiments 221 to 222, wherein n is 2 or greater, m is 8, p is 8, and q is 1 to 100, at least one of these.

[0237] Embodiment 225. The fingerprint concealer comprises an oligomer of the alkylsilane, a polymer of the alkylsilane, or both, wherein the oligomer of the alkylsilane, the polymer of the alkylsilane, or both are {Si(R')2[CH2] m The method according to any one of embodiments 216 to 220, comprising a condensation product of monomer units containing Si(R')2O, wherein each R' is independently selected from CH3 and CH2CH3, and m is 3 to 34.

[0238] Embodiment 226. The method according to Embodiment 225, wherein R' is CH3.

[0239] Embodiment 227. The method according to Embodiment 225, wherein R' is CH3 and m is 8.

[0240] Embodiment 228. The method according to any one of Embodiments 225 to 227, wherein the condensation product further comprises monomer units including {{R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, wherein R” is (C5-C38)alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

[0241] Appearance 229. The {Si(R')2[CH2] mThe method according to embodiment 228, wherein the ratio of monomer units containing Si(R')2O to monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 10:1 to 1:10.

[0242] Embodiment 230. The alkylsilane oligomer, the alkylsilane polymer, or both, comprises a monomer unit containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to any one of embodiments 228 to 229, comprising a condensation product with monomer units including Si or combinations thereof.

[0243] Embodiment 231. A monomer unit containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17 Si(OCH3)2, {(CH3)(CH2)} 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to embodiment 230, wherein the ratio of monomer units containing Si or combinations thereof is 10:1 to 1:10.

[0244] Embodiment 232. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R)2[CH2] m [Si(R)2O] n Su(R)2[CH2] p Si(R)2} q The formula includes R, where m and p are independently selected from 3 to 34, and each R is independently OCH3, OH, and OSi(R')2[CH2] m’The method according to any one of embodiments 216 to 220, wherein m' is independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' is independently selected from the group consisting of OCH3 and OH.

[0245] Embodiment 233. The method according to Embodiment 232, wherein the alkylsilane does not contain chlorine.

[0246] Embodiment 234. The method according to any one of Embodiments 232 to 233, wherein R' is OCH3.

[0247] Embodiment 235. In the above structure, at least one: n is 1, and q is between 1 and 100, or The method according to any one of embodiments 232 to 234, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

[0248] Embodiment 236. In the above structure, at least one: n is 1, and q is between 1 and 100, or The method according to any one of embodiments 232 to 234, wherein n is 1, m is 6, p is 6, and q is 1 to 100.

[0249] Embodiment 237. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2, m is 6, p is 6, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100. n is 2 or greater, m is 8, p is 8, and q is between 1 and 100, or The method according to any one of embodiments 232 to 234, wherein n is 2 or greater, m is 6, p is 6, and q is 1 to 100, at least one of these.

[0250] Embodiment 238. The fingerprint concealer comprises an alkylsilane oligomer, an alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(R)2[CH2] m The method according to any one of embodiments 216 to 220, comprising a condensation product of monomer units containing Si(R)2, wherein each R is independently selected from OCH3 and OH, and m is 3 to 34.

[0251] Embodiment 239. The method according to Embodiment 238, wherein R is OCH3 and m is 8.

[0252] Embodiment 240. The method according to Embodiment 238, wherein R is OCH3 and m is 6.

[0253] Embodiment 241. The method according to any one of Embodiments 238 to 240, wherein the condensation product further comprises monomer units including {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, wherein R” is (C5-C38)alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

[0254] Appearance 242. The above {(OSi(R)2[CH2] m The method according to embodiment 241, wherein the ratio of monomer units containing Si(R)2 to monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 10:1 to 1:10.

[0255] Appearance 243. The above {(OSi(R)2[CH2] mThe method according to embodiment 241, wherein the ratio of monomer units containing Si(R)2 to monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 1:1 to 1:10.

[0256] Embodiment 244. The alkylsilane oligomer, the alkylsilane polymer, or both, comprises a monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to any one of embodiments 238 to 243, comprising a condensation product with monomer units including Si or combinations thereof.

[0257] Embodiment 245. A monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and the {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to embodiment 244, wherein the ratio of monomer units containing Si or combinations thereof is 10:1 to 1:10.

[0258] Embodiment 246. A monomer unit containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to embodiment 244, wherein the ratio of monomer units containing Si or combinations thereof is 1:1 to 1:10.

[0259] Embodiment 247. The alkylsilane oligomer, the alkylsilane polymer, or both, comprises a monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17The method according to any one of embodiments 238 to 243, comprising a condensation product with monomer units including Si or combinations thereof.

[0260] Embodiment 248. A monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to embodiment 247, wherein the ratio of monomer units containing Si or combinations thereof is 10:1 to 1:10.

[0261] Embodiment 249. A monomer unit containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and the {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The method according to embodiment 247, wherein the ratio of monomer units containing Si or combinations thereof is 10:1 to 1:10.

[0262] Embodiment 250. A coated article according to any one of Embodiments 6 to 14, wherein R is selected from a methoxy group, an ethoxy group, a hydroxyl group, or a combination thereof.

[0263] Embodiment 251. A coated article according to any one of Embodiments 57 to 60, wherein R is selected from a methoxy group, an ethoxy group, a hydroxyl group, or a combination thereof.

[0264] Embodiment 252. A coated article according to any one of Embodiments 96 to 101, wherein R is selected from a methoxy group, an ethoxy group, a hydroxyl group, or a combination thereof.

[0265] Embodiment 253. The method according to any one of Embodiments 134 to 138, wherein the alkylsilane includes alkyltrichlorosilane, alkyldichloromethoxysilane, alkylchlorodimethoxysilane, alkyldichloromethylsilane, alkylchlorodimethylsilane, alkyltrimethoxysilane, alkyltriethoxysilane, alkyldimethylmethoxysilane, alkyldimethylethoxysilane, or a combination thereof.

[0266] Embodiment 254. The method according to any one of Embodiments 134 to 139, wherein the alkylsilane comprises alkyldimethylmethoxysilane and alkyltrimethoxysilane.

[0267] Embodiment 255. The method according to any one of Embodiments 253 to 254, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

[0268] Embodiment 256. The method according to any one of Embodiments 253 to 255, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

[0269] Embodiment 257. The method according to Embodiment 256, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

[0270] Embodiment 258. The method according to any one of Embodiments 134-143 or 253-257, wherein the alkylsilane comprises 1,8-bis(dimethylmethoxysilyl)octane, octadecyltrimethoxysilane, or a combination thereof.

[0271] Embodiment 259. The method according to any one of Embodiments 253 to 258, wherein the alkylsilane is chlorine-free.

[0272] Embodiment 260. The method according to any one of Embodiments 191 to 196, wherein the alkylsilane includes alkyltrichlorosilane, alkyldichloromethoxysilane, alkylchlorodimethoxysilane, alkyldichloromethylsilane, alkylchlorodimethylsilane, alkyltrimethoxysilane, alkyltriethoxysilane, alkyldimethylmethoxysilane, alkyldimethylethoxysilane, or a combination thereof.

[0273] Embodiment 261. The method according to any one of Embodiments 191 to 196, wherein the alkylsilane comprises alkyldimethylmethoxysilane and alkyltrimethoxysilane.

[0274] Embodiment 262. The method according to any one of Embodiments 260 to 261, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

[0275] Embodiment 263. The method according to any one of Embodiments 261 to 262, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

[0276] Embodiment 264. The method according to Embodiment 263, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

[0277] Embodiment 265. The method according to any one of Embodiments 191-201 or 260-264, wherein the alkylsilane comprises 1,8-bis(dimethylmethoxysilyl)octane, octadecyltrimethoxysilane, or a combination thereof.

[0278] Embodiment 266. The method according to any one of Embodiments 221 to 231, wherein R is selected from a methoxy group, an ethoxy group, a hydroxyl group, or a combination thereof.

[0279] Embodiment 267. The method according to any one of Embodiments 221 to 231, wherein R is selected from a methoxy group, an ethoxy group, or a combination thereof.

[0280] Embodiment 268. The method according to any one of Embodiments 221 to 231, wherein R is a methoxy group.

[0281] Embodiment 269. The fingerprint-concealing coating comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R')2[CH2] m [Si(R)2O] n Si(R')2[CH2] p Si(R)2} q A coated article according to any one of embodiments 1 to 5, comprising R, wherein m and p are independently selected from 3 to 34, R' and R'' are independently selected from CH3 and CH2CH3, n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

[0282] Embodiment 270. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {Si(R')2[CH2] m A monomer unit containing {Si(R')2O}, wherein each R' is independently selected from CH3 and CH2CH3, and m is 3 to 34, and {R 4 Si(OCH3)2}, {R 4 Si(OCH3)}, {R} 4 Si, {R 4 Si(OCH3)2(OH)}, {R} 4 Si(OCH3)(OH)2}, {R} 4 A monomer unit containing Si(OH)3 or a combination thereof, in the formula R 4However, it contains a condensation product with a monomer unit that is (C5-C38)alkyl, and optionally, at least a portion of the monomer unit is linked to the substrate, and the {Si(R')2[CH2] m A monomer unit containing Si(R')2O, and the {R 4 Si(OCH3)2}, {R 4 Si(OCH3)}, {R} 4 Si, {R 4 Si(OCH3)2(OH)}, {R} 4 Si(OCH3)(OH)2}, {R} 4 A coated article according to any one of embodiments 1 to 5 or 269, wherein the ratio of monomer units containing {Si(OH)3} or combinations thereof is 10:1 to 1:10.

[0283] Embodiment 271. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both comprises monomer units containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 The condensation product includes monomer units containing {OSi(CH3)2[CH2]8Si(CH3)2} or combinations thereof, and the monomer units containing {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 A coated article according to any one of embodiments 1 to 6 or 269 to 270, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:10.

[0284] Embodiment 272. A coated article according to any one of Embodiments 1 to 271, wherein the fingerprint-concealing coating exhibits at least one of the following: a voltage of approximately 15 volts or less in a tribocharging test, or a voltage difference of approximately 5 volts or less between a peripheral contact area and a central contact area in the tribocharging test.

[0285] Embodiment 273. A coated article according to any one of Embodiments 1 to 272, wherein, when a simulated fingerprint is applied to the fingerprint-concealing coating in a simulated fingerprint test, the fingerprint-concealing coating exhibits at least one of the following: an effective diameter of the droplet of the simulated fingerprint of 10 μm or more, an average height of the droplet of the simulated fingerprint on the outer surface of 0.15 μm or less, or a spherical crown radius of the droplet of the simulated fingerprint of 40 μm or more.

[0286] Apparatus 274. When a simulated fingerprint is applied to the fingerprint-concealing coating in a simulated fingerprint test, the fingerprint-concealing coating has a load area ratio of 0.10 μm between 10% and 90%. 3 / μm 2 A coated article according to any one of embodiments 1 to 273, showing the core material value Vmc of the aforementioned simulated fingerprint droplet.

[0287] Embodiment 275. The fingerprint-concealing coating has a ratio of 0.78 μm between the volume of the droplet and the area of ​​the droplet. 3 / μm 2 The ratio of the height of the droplet to the area of ​​the droplet is 0.005 μm / μm or less. 2 or less than 150,000 μm 2 A coated article according to embodiment 274, wherein at least one of the following is the total area of ​​the simulated fingerprints on the outer surface, or the haze of 8% or less due to the simulated fingerprints applied to the fingerprint-concealing coating in the simulated fingerprint test, or the center of the sphere modeled on the droplet of the simulated fingerprint is located more than 30 μm from the outer surface of the fingerprint-concealing coating, or the average gray level of the coated article having the simulated fingerprints applied to the fingerprint-concealing coating in the simulated fingerprint test is 150 or less when measured in a gray level test, or the normalized gray level of the coated article having the simulated fingerprints applied to the fingerprint-concealing coating in the simulated fingerprint test is 2.0 or less when measured in a normalized gray level test.

[0288] Embodiment 276. A coated article according to any one of Embodiments 1 to 275, wherein the fingerprint-concealing coating comprises a thickness of 1 nanometer to 75 nanometers.

[0289] Embodiment 277. A coated article according to any one of Embodiments 1 to 276, wherein the fingerprint-concealing coating exhibits at least one of the following: a cheese cloth abrasion water contact angle of about 80° or more after being subjected to a cheese cloth abrasion test for 200,000 cycles, or a rubber abrasion water contact angle of about 80° or more after being abraded for 3,000 cycles in a rubber abrasion test.

[0290] Embodiment 278. A coated article according to any one of Embodiments 1 to 277, further comprising a planarization layer positioned between the substrate and the fingerprint-concealing coating, wherein the fingerprint-concealing coating is disposed on the planarization layer, and the planarization layer exhibits at least one of the following: 50% to 90% of the silicon atoms of the planarization layer are in a silica-like network, or the molar ratio of hydrogen to silicon in the planarization layer is about 0.2 or greater, or the refractive index is in the range of 1.37 to 1.55.

[0291] Embodiment 279. The coated article according to Embodiment 278, wherein the planarized layer exhibits at least one of the following: an abrasion water contact angle of approximately 80° or more after 2,000 cycles of abrasion in a steel wool abrasion test, an abrasion water contact angle of approximately 80° or more after being subjected to a cheese cloth abrasion test for 200,000 cycles, or an abrasion water contact angle of approximately 80° or more after 3,000 cycles of abrasion in a rubber abrasion test.

[0292] Embodiment 280. A coated article according to any one of Embodiments 1 to 279, further comprising at least one of the following: an anti-reflective coating positioned between the fingerprint-concealing coating and the substrate, or a gradient coating including a refractive index gradient positioned between the fingerprint-concealing coating and the substrate.

[0293] Embodiment 281. A coated article according to any one of Embodiments 1 to 280, wherein the substrate is a metal, glass, glass ceramic, or polymer substrate.

[0294] Embodiment 282. The coated article according to any one of Embodiments 1 to 281, wherein the fingerprint-concealing coating is substantially halogen-free.

[0295] Embodiment 283. A coated article comprising a substrate including a first main surface, and a fingerprint-concealing coating disposed covering the first main surface, including the outer surface of the coated article, wherein the fingerprint-concealing coating is fluorine-free, substantially halogen-free, and comprises an alkylsilane oligomer, an alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R')2[CH2] m [Si(R)2O] n Si(R')2[CH2] p Si(R)2} q A coated article comprising R, wherein m and p are independently selected from 3 to 34, R' and R'' are independently selected from CH3 and CH2CH3, n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

[0296] Embodiment 284. A coated article comprising: a substrate including a first main surface; a planar layer disposed covering the first main surface, wherein the planar layer has a thickness of about 10 nanometers to about 600 nanometers between a first surface area and a second surface area opposite to the first surface area, the second surface area facing the first main surface; and a fingerprint-concealing coating disposed on the first surface area of ​​the planar layer, including the outer surface of the coated article, wherein the fingerprint-concealing coating is fluorine-free, substantially halogen-free, and comprises an alkylsilane oligomer, an alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R')2[CH2] m [Si(R)2O] n Si(R')2[CH2] p Si(R)2} q A coated article comprising R, wherein m and p are independently selected from 3 to 34, R' and R'' are independently selected from CH3 and CH2CH3, n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

[0297] The above, as well as other features and advantages of the embodiments of this disclosure, will be better understood when the following detailed description is read with reference to the accompanying drawings. [Brief explanation of the drawing]

[0298] [Figure 1] This is a schematic diagram of an exemplary coated article in its configuration. [Figure 2A] This is a schematic diagram of an exemplary coated article in its configuration. [Figure 2B] This is a schematic diagram of an exemplary coated article in its configuration. [Figure 2C]This is a schematic diagram of an exemplary coated article in its configuration. [Figure 3] This is a schematic plan view of an example of a consumer electronic device depending on its configuration. [Figure 4] Figure 3 is a schematic perspective view of an example of a consumer electronic device. [Figure 5] A schematic diagram of functionalized polyhedral oligomeric silsesquioxane (POSS) compounds is shown. [Figure 6] The reaction of polysilazane (PHPS) is schematically shown. [Figure 7] This flowchart shows an example of a method for producing a coated article according to an aspect of the present disclosure. [Figure 8] This flowchart shows an example of a method for producing a coated article according to an aspect of the present disclosure. [Figure 9] The following schematic steps(s) of a method for producing a coated article include depositing a functionalized POSS and bombarding a first main surface of a substrate with an ion beam. [Figure 10] The steps of a method for producing a coated article, comprising reacting a material on a first main surface with an alkylsilane, are schematically shown. [Figure 11] The steps of a method for producing a coated article are schematically shown, which include distributing a solution to cover a first main surface of a substrate. [Figure 12] The steps of a method for producing a coated article are schematically shown, including heating a solution on a first main surface. [Figure 13] The steps of a method for producing a coated article, comprising spraying an alkylsilane and reacting the alkylsilane, are schematically shown. [Figure 14] The simulated fingerprints applied to Examples 1-2 and Comparative Examples XX-YY are schematically shown. [Figure 15] The results of cleaning the simulated fingerprints applied to Example 1 and Comparative Examples YY-ZZ are schematically shown. [Figure 16](a) Simulated fingerprints applied to Examples 1-2 and Comparative Examples XX-YY, and (b) a schematic representation of the droplet size distribution associated with the simulated fingerprints as measured by white light interferometry, with the vertical axis (i.e., y-axis) and horizontal axis (i.e., x-axis) corresponding to physical positions in μm units. [Figure 17A] The chemical structures of the alkylsilane compounds used to form Examples 1-2, Comparative Example EEE, Comparative Example XX, and Examples 46-71 are shown. [Figure 17B] The chemical structures of the alkylsilane compounds used to form Examples 1-2, Comparative Example EEE, Comparative Example XX, and Examples 46-71 are shown. [Figure 17C] The chemical structures of the alkylsilane compounds used to form Examples 1-2, Comparative Example EEE, Comparative Example XX, and Examples 46-71 are shown. [Figure 17D] The chemical structures of the alkylsilane compounds used to form Examples 1-2, Comparative Example EEE, Comparative Example XX, and Examples 46-71 are shown. [Figure 17E] The chemical structures of the alkylsilane compounds used to form Examples 1-2, Comparative Example EEE, Comparative Example XX, and Examples 46-71 are shown. [Figure 17F] The chemical structures of the alkylsilane compounds used to form Examples 1-2, Comparative Example EEE, Comparative Example XX, and Examples 46-71 are shown. [Figure 17G] The chemical structures of the alkylsilane compounds used to form Examples 1-2, Comparative Example EEE, Comparative Example XX, and Examples 46-71 are shown. [Figure 17H] The chemical structures of the alkylsilane compounds used to form Examples 1-2, Comparative Example EEE, Comparative Example XX, and Examples 46-71 are shown. [Figure 18A] The polymer structure of the surface-modified layer according to an aspect of this disclosure is shown. [Figure 18B] The polymer structure of the surface-modified layer according to an aspect of this disclosure is shown. [Figure 18C]The polymer structure of the surface-modified layer according to an aspect of this disclosure is shown. [Figure 19A] The spatial plots of the water contact angle for Examples 1-2 and Comparative Example XX are shown, with the vertical axis (i.e., y-axis) and horizontal axis (i.e., x-axis) corresponding to physical positions in millimeters. [Figure 19B] The spatial plots of the water contact angle for Examples 1-2 and Comparative Example XX are shown, with the vertical axis (i.e., y-axis) and horizontal axis (i.e., x-axis) corresponding to physical positions in millimeters. [Figure 19C] The spatial plots of the water contact angle for Examples 1-2 and Comparative Example XX are shown, with the vertical axis (i.e., y-axis) and horizontal axis (i.e., x-axis) corresponding to physical positions in millimeters. [Figure 20] For Examples 1-2 and Comparative Examples XX-YY, the average gray level is shown on the vertical axis (i.e., the y-axis) as a function of the oleic acid contact angle in degrees on the horizontal axis (i.e., the x-axis). [Figure 21] For Examples 1-2 and Comparative Examples XX-YY, the haze is shown on the vertical axis (i.e., the y-axis) in percentage units as a function of the oleic acid contact angle in degrees on the horizontal axis (i.e., the x-axis). [Figure 22] For Examples 1-2 and Comparative Examples XX-YY, the average height of the artificial fingerprint droplets in micrometers is shown on the vertical axis (i.e., y axis) as a function of the oleic acid contact angle in degrees on the horizontal axis (i.e., x axis). [Figure 23] For Examples 1-2 and Comparative Examples XX-YY, the ratio of the average height to the area of ​​the artificial fingerprint droplets (μm / μm² or μm⁻¹) is shown on the vertical axis (i.e., the y axis) as a function of the oleic acid contact angle in degrees on the horizontal axis (i.e., the x axis). [Figure 24] For Examples 1-2 and Comparative Examples XX-YY, the average spherical radius of the artificial fingerprint droplets in μm units is shown on the vertical axis (i.e., y axis) as a function of the oleic acid contact angle in degrees on the horizontal axis (i.e., x axis). [Figure 25]For Examples 1-2 and Comparative Examples XX-YY, the total area of ​​the artificial fingerprint droplets in μm² units is shown on the vertical axis (i.e., y axis) as a function of the oleic acid contact angle in degrees on the horizontal axis (i.e., x axis). [Figure 26] For Examples 1-2 and Comparative Examples XX-YY, the average ratio of the volume of the artificial fingerprint droplet to the droplet area (in μm³ / μm² or μm units) is shown on the vertical axis (i.e., y-axis) as a function of the oleic acid contact angle in degrees on the horizontal axis (i.e., x-axis). [Figure 27] For Examples 1-2 and Comparative Examples XX-YY, the haze is shown on the vertical axis (i.e., the y-axis) in percentage units as a function of the average gray level on the horizontal axis (i.e., the x-axis). [Figure 28] The simulated fingerprints applied to Examples 3-8 and Comparative Examples DD-GG are schematically shown. [Figure 29] A schematic diagram of the tribocharging test is provided below. [Figure 30] The voltages are schematically shown as contour lines, with the vertical axis (i.e., y-axis) and horizontal axis (i.e., x-axis) corresponding to physical locations within region 2911 in Figure 29. [Figure 31] The tribocharging voltages for Example 8, as well as Comparative Examples AA and XX~YY, are schematically shown, with the vertical axis (i.e., the y-axis) corresponding to voltage in volts. [Figure 32] The tribocharging voltage in volts is schematically shown on the vertical axis (i.e., y axis) as a function of time in seconds after the completion of the tribocharging test, on the horizontal axis (i.e., x axis). [Figure 33] The tribocharging voltage in volts is schematically shown on the vertical axis (i.e., y axis) as a function of time in seconds after the completion of the tribocharging test, on the horizontal axis (i.e., x axis). [Figure 34] The molar ratios of hydrogen to silicon (vertical axis - y axis) measured by dynamic secondary ion mass spectrometry (D-SIMS) for Examples 35-44 and Comparative Examples JJ-KK are schematically shown. [Figure 35]This is a schematic diagram of an exemplary coated article in its configuration. [Figure 36A] This is a schematic diagram of an exemplary coated article in its configuration. [Figure 36B] This is a schematic diagram of an exemplary coated article in its configuration. [Figure 36C] This is a schematic diagram of an exemplary coated article in its configuration. [Figure 37] For Examples 46-53, the static water contact angle in degrees is shown on the vertical axis (i.e., the y-axis) as a function of the rubber wear test cycle on the horizontal axis (i.e., the x-axis). [Figure 38] The simulated fingerprints applied to Examples 46-63 are schematically shown. [Figure 39] For Examples 46-53, the normalized gray levels are shown on the vertical axis (i.e., the y-axis) as a function of the BISCO precursor volume percentage relative to the total amount of 1,8-bis(chlorodimethylsilyl)octane (BISCO) and octadecyltrimethoxysilane on the horizontal axis (i.e., the x-axis). [Figure 40] The simulated fingerprints applied to Examples 54-57 are schematically shown. [Figure 41] For Examples 54-57, the static water contact angle in degrees is shown on the vertical axis (i.e., the y-axis) as a function of the rubber wear test cycle on the horizontal axis (i.e., the x-axis). [Figure 42] The simulated fingerprints applied to Examples 58-61 are schematically shown. [Figure 43] For Examples 58-61, the static water contact angle in degrees is shown on the vertical axis (i.e., the y-axis) as a function of the rubber wear test cycle on the horizontal axis (i.e., the x-axis). [Figure 44] For Example 54 before and after capping, the normalized gray levels of human fingerprints are shown on the vertical axis (i.e., y axis) as a function of the number of wipes on the horizontal axis (i.e., x axis). [Figure 45]For Example 46, a schematic representation of the time-of-flight secondary ion mass spectrometry (TOF-SIMS) spectrum, with intensity on the vertical axis (i.e., the y-axis) as a function of the mass-to-charge ratio (m / z), is shown. [Figure 46] A schematic representation of the time-of-flight secondary ion mass spectrometry (TOF-SIMS) spectrum of polydimethylsiloxane (PDMS), with intensity on the vertical axis (i.e., the y-axis) as a function of the mass-to-charge ratio (m / z), is shown. [Figure 47] For Example 54, a schematic representation of the time-of-flight secondary ion mass spectrometry (TOF-SIMS) spectrum, with intensity on the vertical axis (i.e., the y-axis) as a function of the mass-to-charge ratio (m / z), is shown. [Figure 48] A schematic representation of the time-of-flight secondary ion mass spectrometry (TOF-SIMS) spectrum of octadecyltrimethoxysilane (OTS), with intensity on the vertical axis (i.e., the y-axis) as a function of the mass-to-charge ratio (m / z), is shown. [Figure 49] A schematic representation of the TOF-SIMS spatial plots for Example 49 (BISCO:OTS with a 50:50 mass-to-charge ratio) at various mass-to-charge ratios (m / z) is shown. [Figure 50] The green / blue overlay TOF-SIMS spatial plots for C2H5+ and Si2C4H13O+ in Examples 49-51 (BISCO:OTS of 50:50, 40:60, and 30:70) are schematically shown. [Figure 51] For BISCO and OTS (BISCO:OTS with a 50:50 ratio) in Example 49, the TOF-SIMS spatial plots in the region of interest are schematically shown. [Figure 52] The time-of-flight secondary ion mass spectrometry (TOF-SIMS) spectra of positive ions, with intensity on the vertical axis (i.e., the y-axis) as a function of the mass-to-charge ratio (m / z), are schematically shown for the BISCO region of interest in Figure 51, the OTS region of interest in Figure 51, the pure BISCO reference, and the pure OTS reference. [Figure 53]For the BISCO region of interest in Figure 51, the OTS region of interest in Figure 51, the pure BISCO reference, and the pure OTS reference, the intensity of the Si2C4H13O+ / C2H5+ ratio as measured in Figure 52 is shown on the vertical axis (i.e., the y-axis). [Figure 54] For Examples 62-63, the static water contact angle in degrees is shown on the vertical axis (i.e., the y-axis) as a function of the rubber wear test cycle on the horizontal axis (i.e., the x-axis). [Figure 55] For Examples 64-65, the static water contact angle in degrees is shown on the vertical axis (i.e., the y-axis) as a function of the rubber wear test cycle on the horizontal axis (i.e., the x-axis). [Figure 56] For Examples 66-68, the static water contact angle in degrees is shown on the vertical axis (i.e., the y-axis) as a function of the rubber wear test cycle on the horizontal axis (i.e., the x-axis). [Figure 57] The simulated fingerprints applied to Examples 66-67 are schematically shown. [Figure 58] A schematic representation of the simulated fingerprints applied to Examples 50, 56, 62, 64, and 67 is shown.

[0299] Throughout this disclosure, the drawings are used to highlight certain aspects. Therefore, unless explicitly indicated otherwise, the relative sizes of different areas, parts, and substrates shown in the drawings should not be assumed to be proportional to their actual relative sizes. [Modes for carrying out the invention]

[0300] Next, the embodiments will be described more completely with reference to the accompanying drawings, which show exemplary embodiments. Wherever possible, the same reference numerals are used throughout the drawings to refer to the same or similar parts.

[0301] Figures 1, 2A-2C, 35, and 36A-36C illustrate coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621, including a surface modification layer 113 (e.g., a fingerprint-hiding coating) disposed over a substrate 103, according to embodiments of the present disclosure. In embodiments, as shown in Figures 35 and 36A-36C, the surface modification layer 113 (e.g., a fingerprint-hiding coating) may be disposed on a planarization layer 123, which is positioned between the surface modification layer 113 (e.g., a fingerprint-hiding coating) and the substrate 103. Unless otherwise noted, any discussion of the features of one surface modification layer 113 (e.g., a fingerprint-hiding coating) or coated article embodiment may be equally applicable to the corresponding features of any embodiment of the present disclosure. For example, the same sub-number throughout the disclosure may indicate that in some embodiments the identified features are identical to one another, and unless otherwise specified, a consideration of an identified feature in one embodiment may be equally applicable to an identified feature in any of the other embodiments of the disclosure.

[0302] As shown in Figures 1, 2A–2C, 35, and 36A–36C, the substrate 103 includes a first main surface 105 and a second main surface 107 opposite the first main surface 105. As shown, the first main surface 105 may extend along a first plane 104 and / or the second main surface 107 may extend along a second plane 106. In some embodiments, as shown, the second plane 106 may be parallel to the first plane 104. As used herein, the substrate thickness 109 is defined between the first main surface 105 and the second main surface 107 as the distance between the first plane 104 and the second plane 106. In this embodiment, the substrate thickness 109 can be approximately 10 micrometers (μm) or more, approximately 25 μm or more, approximately 40 μm or more, approximately 60 μm or more, approximately 70 μm or more, approximately 80 μm or more, approximately 90 μm or more, approximately 100 μm or more, approximately 125 μm or more, approximately 150 μm or more, approximately 200 μm or more, approximately 300 μm or more, approximately 5 millimeters (mm) or less, approximately 3 mm or less, approximately 2 mm or less, approximately 1 mm or less, approximately 800 μm or less, approximately 500 μm or less, approximately 300 μm or less, approximately 200 μm or less, approximately 180 μm or less, or approximately 160 μm or less. In some embodiments, the substrate thickness 109 can be in the range of approximately 10 μm to approximately 5 mm, approximately 25 μm to approximately 3 mm, approximately 40 μm to approximately 3 mm, approximately 60 μm to approximately 2 mm, approximately 70 μm to approximately 2 mm, approximately 70 μm to approximately 1 mm, approximately 70 μm to approximately 800 μm, approximately 80 μm to approximately 500 μm, approximately 90 μm to approximately 500 μm, approximately 100 μm to approximately 200 μm, approximately 125 μm to approximately 200 μm, approximately 150 μm to approximately 200 μm, approximately 150 μm to approximately 160 μm, or any range or partial range between these. Alternatively, the substrate thickness 109 can be in the range of approximately 1 millimeter (mm) to approximately 5 mm, approximately 1 mm to approximately 3 mm, or any range or partial range between these.

[0303] The substrate 103 may include glass-based materials, glass-ceramic materials, and / or ceramic materials having a pencil hardness of 8H or higher, for example, 9H or higher. As used herein, pencil hardness is measured using ASTM D3363-20 with a standard lead grade pencil. By providing glass-based substrates, glass-ceramic substrates, and / or ceramic substrates, puncture resistance and / or impact resistance can be enhanced. As used herein, "glass-based" includes both glass and glass-ceramic, where glass-ceramic has one or more crystalline phases and amorphous residual glass phases. Glass-based materials (e.g., glass-based substrates) may include amorphous materials (e.g., glass) and optionally one or more crystalline materials (e.g., ceramics). Exemplary glass-based materials may be alkali-free glass and / or contain low amounts of alkali metals (e.g., about 10 mol% or less of R2O, where R2O includes Li2O, Na2O, and K2O). As used herein, “ceramic-based” includes both ceramics and glass-ceramics, where glass-ceramics have one or more crystalline phases and amorphous residual glass phases. In some embodiments, ceramic-based materials may include one or more oxides, nitrides, oxynitrides, carbides, borides, and / or silicides. Throughout this disclosure, the modulus of elasticity (e.g., Young's modulus) of the substrate 103 is measured using ISO 527-1:2019. In some embodiments, the substrate 103 may have modulus of elasticity in the range of about 10 GPa to about 100 GPa, about 40 GPa to about 100 GPa, about 60 GPa to about 100 GPa, about 60 GPa to about 80 GPa, about 80 GPa to about 100 GPa, or any range or partial range between these. In some embodiments, the substrate 103 may include polymer substrates.

[0304] In some embodiments, the substrate 103 may be optically transparent. As used herein, “optically transparent” or “optically clear” means an average transmittance of 70% or more in the wavelength range of 400 nm to 750 nm through a 1.0 mm thick piece of material. In some embodiments, an “optically transparent material” or “optically clear material” may have an average transmittance of 75% or more, 80% or more, 85% or more, or 90% or more, 91% or more, 92% or more, 94% or more, or 96% or more in the wavelength range of 400 nm to 750 nm through a 1.0 mm thick piece of material. The average transmittance in the wavelength range of 400 nm to 700 nm is calculated by measuring the transmittance at integer wavelengths from approximately 400 nm to approximately 700 nm and averaging the measured values.

[0305] In some embodiments, the substrate 103 may be transparent, opaque, colored opaque, translucent, or colored translucent, in addition to being transparent. As used herein, “opaque” and “translucent” may mean the following: Opacity is a measure of impermeability to visible light. An opaque object is neither transparent (allowing all light to pass through) nor translucent (allowing some light to pass through). When light strikes the interface between two substances, generally some is reflected, some is absorbed, some is scattered, and the rest is transmitted. An opaque substance transmits very little light and therefore reflects, scatters, or absorbs most of it. Opacity depends on the frequency of light being considered. For example, some types of glass are transparent in the visible range but nearly opaque to ultraviolet light. Furthermore, colored transparent, colored opaque, and colored translucent can be any one of a variety of colors, such as black, white, green, yellow, pink, red, blue, orange, purple, brown, etc.

[0306] In some embodiments, coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621 comprising a glass substrate, a glass-ceramic substrate, and / or a ceramic substrate may contain one or more compressive stress regions. In some embodiments, compressive stress regions may be created by chemical strengthening. Chemical strengthening may involve an ion exchange process, where ions in the surface layer are replaced or exchanged with larger ions having the same valence or oxidation state. Methods of chemical strengthening will be discussed later. While not wishing to be bound by theory, chemical strengthening of the substrate 103 may enable good impact resistance, good puncture resistance, and / or, for example, a small bending radius where the compressive stress from chemical strengthening counteracts the bending-induced tensile stress on the outermost surface of the substrate. The compressive stress region may extend to a depth called the compression depth (DOC) to a portion of the first and / or second portion. Where used herein, compression depth means the depth to which the stress in a chemically strengthened substrate and / or portion described herein changes from compressive stress to tensile stress. Compression depth may be measured by a surface stress meter or a scattered light polarizer (SCALP; values ​​reported herein were prepared using a SCALP-5 manufactured by Glasstress Co., Estonia), depending on the ion exchange treatment and the thickness of the article being measured. If the stress in the substrate and / or portion is generated by the exchange of potassium ions into the substrate, a surface stress meter, e.g., FSM-6000 (Orihara Industrial Co., Ltd. (Japan)), is used to measure the compression depth. Unless otherwise specified, compressive stress (including surface CS) is measured by a surface stress meter (FSM) using commercially available equipment, e.g., an FSM-6000 manufactured by Orihara. Surface stress measurement relies on the accurate measurement of the stress optical coefficient (SOC) related to the birefringence of the glass.Unless otherwise specified, SOC is measured according to procedure C (glass disk method) described in ASTM standard C770-16, entitled “Standard test method for measuring glass stress-optical coefficient,” the entire content of which is incorporated herein by reference. SCALP is used to measure the compression depth and central tension (CT) when stress is generated by exchanging sodium ions in the substrate and the article being measured is thicker than approximately 400 μm. When stress is generated in the substrate and / or parts by exchanging both potassium and sodium ions in the substrate and / or parts and the article being measured is thicker than approximately 400 μm, the compression depth and CT are measured by SCALP. While we do not wish to be bound by theory, the sodium exchange depth may indicate the compression depth, while the potassium ion exchange depth may indicate the change in the magnitude of the compressive stress (but not the change in stress from compression to tension). Near-field refractive index (RNF, the RNF method is described in U.S. Patent No. 8,854,623, entitled “Systems and methods for measuring a profile characteristic of a glass sample,” which is incorporated herein by reference in its entirety) methods may also be used to derive a graphical representation of the stress profile. When the RNF method is used to derive a graphical representation of the stress profile, the maximum central tension value provided by SCALP is used in the RNF method. The graphical representation of the stress profile derived by RNF is force-balanced and calibrated to the maximum central tension value provided by SCALP measurement. As used herein, “depth of layer” (DOL) means the depth to which ions have been exchanged in the substrate and / or parts (e.g., sodium, potassium). Throughout this disclosure, DOL is measured according to ASTM C-1422. While we do not wish to be bound by theory, DOL is typically greater than or equal to the corresponding DOC.Through this disclosure, if the maximum central tension cannot be directly measured by SCALP (for example, when the article being measured is thinner than approximately 400 μm), the maximum central tension can be approximated by dividing the product of the maximum compressive stress and the compression depth by the difference between the thickness of the substrate and twice the compression depth, where the compressive stress and compression depth are measured by FSM.

[0307] In some embodiments, the substrate 103 may include a first compressive stress region on the first main surface 105 that extends from the first main surface 105 to a first compressive depth. In some embodiments, the substrate 103 may include a second compressive stress region on the second main surface 107 that extends from the second main surface 107 to a second compressive depth. In some embodiments, the first compressive depth and / or the second compressive depth as a percentage of the substrate thickness 109 may be about 5% or more, about 10% or more, about 12% or more, about 15% or more, about 17% or more, about 30% or less, about 25% or less, about 22% or less, about 20% or less, about 17% or less, or about 15% or less. In some embodiments, the first and / or second compression depth as a percentage of the substrate thickness 109 can be in the range of about 5% to about 30%, about 10% to about 25%, about 10% to about 22%, about 12% to about 20%, about 12% to about 17%, about 15% to about 17%, or any range or partial range between these. In some embodiments, the first and / or second compression depth can be about 1 μm or more, about 10 μm or more, about 15 μm or more, about 20 μm or more, about 25 μm or more, about 30 μm or more, about 200 μm or less, about 150 μm or less, about 100 μm or less, about 60 μm or less, about 45 μm or less, about 30 μm or less, or about 20 μm or less. In some embodiments, the first and / or second compression depths can be in the range of about 1 μm to about 200 μm, about 1 μm to about 150 μm, about 10 μm to about 100 μm, about 15 μm to about 600 μm, about 20 μm to about 45 μm, about 20 μm to about 30 μm, or any range or partial range between these. Providing a first and / or second compression depth of about 1% to about 30% of the first thickness can enable good impact resistance and / or puncture resistance.

[0308] In some embodiments, the first compressive stress region may include the maximum first compressive stress, and / or the second compressive stress region may include the maximum second compressive stress. In further embodiments, the maximum first compressive stress and / or the maximum second compressive stress may be about 100 megapascals (MPa) or more, about 300 MPa or more, 400 MPa or more, about 500 MPa or more, about 600 MPa or more, about 700 MPa or more, about 1,500 MPa or less, about 1,200 MPa or less, about 1,000 MPa or less, or about 800 MPa or less. In a further embodiment, the maximum first compressive stress and / or the maximum second compressive stress can be in the range of approximately 100 MPa to approximately 1,500 MPa, approximately 100 MPa to approximately 1,200 MPa, approximately 300 MPa to approximately 1,200 MPa, approximately 300 MPa to approximately 1,000 MPa, approximately 400 MPa to approximately 1,000 MPa, approximately 500 MPa to approximately 1,000 MPa, approximately 600 MPa to approximately 900 MPa, approximately 700 MPa to approximately 800 MPa, or any range or partial range between these. By providing a maximum first compressive stress and / or maximum second compressive stress of approximately 100 MPa to approximately 1,500 MPa, good impact resistance and / or puncture resistance can be enabled.

[0309] In some embodiments, the substrate 103 may include a tensile stress region. The tensile stress region may be positioned between a first compressive stress region and a second compressive stress region. In some embodiments, the tensile stress region may include a maximum tensile stress. In further embodiments, the maximum first stress may be about 10 MPa or more, about 20 MPa or more, about 30 MPa or more, about 100 MPa or less, about 80 MPa or less, or about 60 MPa or less. In further embodiments, the maximum tensile stress may be in the range of about 10 MPa to about 100 MPa, about 10 MPa to about 80 MPa, about 10 MPa to about 60 MPa, about 20 MPa to about 100 MPa, about 20 MPa to about 80 MPa, about 20 MPa to about 60 MPa, about 30 MPa to about 100 MPa, about 30 MPa to about 80 MPa, about 30 MPa to about 60 MPa, or any range or partial range between these. By providing a maximum tensile stress of approximately 10 MPa to approximately 100 MPa, good impact resistance and / or puncture resistance can be achieved.

[0310] As used herein, when a first layer or component is described as "displaced over" a second layer or component, other layers may or may not exist between the first layer or component and the second layer or component. Furthermore, as used herein, "displaced over" does not refer to a position relative to gravity. For example, a first layer and / or component can be considered "displaced over" a second layer and / or component if, for example, the first layer and / or component is positioned directly below, above, or to one side of the second layer and / or component. As used herein, when a first layer and / or component is described as "bonded" to a second layer and / or component, it means that the layers and / or components are bonded to each other by direct contact and / or bonding between the two layers and / or components, or via an adhesive layer. As used herein, the first layer and / or component described as "in contact with" or "in contact with" the second layer and / or component means direct contact and includes situations in which the layers and / or components are bonded to each other. As used herein, the first layer and / or component described as "displaced on" the second layer and / or component means that the layer does not have any other layers between it other than any optional layer of coupling agent, or that they are bonded together. As a result, the first layer disposed covering the second layer may be further disposed on the second layer, in contact with the second layer, and / or bonded to the second layer.

[0311] In some embodiments, as shown in Figures 2A-2C and 36A-36C, coated articles 201, 211, 221, 3601, 3611, or 3621 may include an optical stack 203 comprising a third main surface 205 disposed on a first main surface 105 of a substrate 103. As shown, the optical stack 203 may include a fourth main surface 207 opposite the third main surface 205, with the stack thickness 209 defined between them. In some embodiments, the stack thickness 209 may be about 10 nanometers (nm) or more, about 50 nm or more, about 100 nm or more, about 300 nm or more, about 500 nm or more, about 700 nm or more, about 1 μm or more, about 10 μm or less, about 5 μm or less, about 2 μm or less, or about 1 μm or less. In each embodiment, the stack thickness 209 can be in the range of approximately 10 nm to approximately 10 μm, approximately 50 nm to approximately 5 μm, approximately 100 nm to approximately 2 μm, approximately 300 nm to approximately 1 μm, approximately 500 nm to approximately 1 μm, or any range or partial range in between. In an exemplary embodiment, the stack thickness 209 can be in the range of 10 nm to 10 μm, 50 nm to 5 μm, or 50 nm to 500 nm.

[0312] In further embodiments, the optical stack 203 may include anti-reflective (AR) coatings, bandpass filter coatings, edge-neutral mirrors, beam splitter coatings, multilayer high-reflectivity coatings, and / or edge filter coatings. For example, the anti-reflective coating of the optical stack 203 may be positioned between the surface modification layer 113 (e.g., a fingerprint-concealing coating) and the substrate 103. In further embodiments, the optical stack 203 (e.g., the anti-reflective coating) may include two or more layers having different refractive index values, for example, a first low refractive index (RI) of about 1.3 to about 1.6 and a second high refractive index (RI) of about 1.6 to about 3.0. In further embodiments, the two or more layers of the optical stack 203 may form alternating sets of layers, for example, two or more sets, three or more sets, five or more sets, or ten or more sets, for example, a period of 2 to 15, a period of 2 to 10, a period of 2 to 12, a period of 3 to 8, a period of 3 to 6, or any range or partial range between them.

[0313] In some embodiments, as shown in Figures 2B and 36B, the coated article 211 includes an optical stack 203a comprising a plurality of silicon-containing oxide, silicon-containing nitride, and / or silicon-containing oxynitride layers. For example, the optical stack 203a may be an anti-reflective coating. As shown, the optical stack 203a may include one or more periods 213 comprising two or more layers having different refractive indices, for example, a first low RI layer 215a and a second high RI layer 217a. For example, the optical stack 203a shown in Figure 2B has two periods 213 comprising a first low RI layer 215a and 215b(L) and a second high RI layer 217a and 217b(H), which alternately overlap in the following layer arrangement: L / H / L / H, although in other embodiments, H / L / H / L can be provided. The absolute value of the difference between the first low RI layer 215a and the second high RI layer 217a can be approximately 0.01 or greater, approximately 0.05 or greater, approximately 0.1 or greater, or even 0.2 or greater. Exemplary materials for the first low RI layer 215a are SiO2, Al2O3, GeO2, SiO2, AlO x N y SiO x N y Si u Al v O x N y It contains MgO and MgAl2O4. An exemplary material for the second high RI layer 217a is Si u Al v O x N y AlN, oxygen-doped SiN x SiN x Si3N4, AlO x N y SiO x N y This includes Ta2O5, Nb2O5, HfO2, TiO2, ZrO2, Y2O3, ZrO2, Al2O3, and diamond-like carbon. The oxygen content of the material for the high RI layer (multiple layers possible) 217a and 217b is particularly SiN x or AlN xThis can be minimized in the material. The aforementioned material can be hydrogenated to a maximum of approximately 30% by weight. Where used herein, subscripts (e.g., "u", "v", "x", "y", and "z") range from greater than 0 to 1, and it should be understood that the sum of the subscripts is less than 1 in order to represent an "atomic fraction formula". See, for example, (i) Charles Kittel, Introduction to Solid State Physics, seventh edition, John Wiley & Sons, Inc., NY, 1996, pp. 611-627, (ii) Smart and Moore, Solid State Chemistry, An introduction, Chapman & Hall University and Professional Division, London, 1992, pp. 136-151, and (iii) James F. Shackelford, Introduction to Materials Science for Engineers, Sixth Edition, Pearson Prentice Hall, New Jersey, 2005, pp. 404-418. The remaining material (i.e., 1 minus the sum of the subscripts) is the first atom (for example, SiN where x = 0.57). x In reality, Si is the same as Si3N4. 0.43 N 0.57 (This corresponds to...). Also, the sum of all subscripts is greater than 0.

[0314] In some embodiments, the optical stack 203a may include anti-reflective structures, anti-reflective coatings, or outer optical films as described in U.S. Patent No. 10,948,629, U.S. Publication Application No. 2022 / 0011468, and / or International Publication No. 2022 / 125846, issued on 16 March 2021, which are incorporated by reference in whole. In some embodiments, the optical stack 203a may include a capping layer 219, as shown in Figure 2B. In further embodiments, the capping layer 219 may include a low refractive index material, which may be the same material as the first low RI layer 215a. In further embodiments, the capping layer 219 may include silicon-containing oxides (e.g., silicon dioxide), silicon-containing nitrides (e.g., oxide-doped silicon nitride, silicon nitride, etc.), and silicon-containing oxynitrides (e.g., silicon oxynitride). An exemplary embodiment of the capping layer is silicon dioxide (SiO2). In some embodiments, as shown, the layer of the optical stack 203 closest to the substrate 103 may be a low-index layer (i.e., a first low-RI layer 215a), and the layer closest to the surface modification layer 113 (Figure 2B) or the planarization layer 123 (Figure 36B) may be a low-index layer (e.g., a capping layer 219). An exemplary combination of materials for the optical stack is SiO2 for the first low-RI layer and silicon nitride (e.g., Si3N4, SiN) for the second high-RI layer. x ) or silicon oxynitride (SiO x N y ), and silicon dioxide (SiO2) for the capping layer.

[0315] In some embodiments, the coated article 211 may include a stack thickness 209a corresponding to the physical thickness of the optical stack 203a within the range of about 50 nm to less than 500 nm, about 75 nm to about 490 nm, about 100 nm to about 180 nm, about 125 nm to about 475 nm, about 150 nm to about 450 nm, about 175 nm to about 425 nm, about 200 nm to about 400 nm, about 225 nm to about 375 nm, about 250 nm to about 350 nm, about 250 nm to about 340 nm, or any range or partial range between these. As used herein, the term “optical thickness” is determined by (n*d), where “n” is the RI of the sublayer and “d” is the physical thickness of the layer. In some embodiments, at least one layer within the optical stack 203a may have an optical thickness of approximately 2 nm to approximately 200 nm, approximately 10 nm to approximately 100 nm, approximately 15 nm to approximately 90 nm, approximately 50 nm to approximately 80 nm, or any range or partial range in between. In further embodiments, the first low RI layers 215a and 215b within period 213 in the optical stack 203 may be within or greater than the ranges mentioned in the preceding paragraph. In some embodiments, the combined physical thickness of the second high RI layers 217a and 217b may be approximately 90 nm or more, approximately 100 nm or more, approximately 120 nm or more, approximately 130 nm or more, approximately 150 nm or more, or less than 500 nm. For example, the combined physical thickness of the second high RI layers 217a and 217b can be in the range of approximately 90 nm to less than 500 nm, approximately 100 nm to approximately 300 nm, approximately 120 nm to approximately 200 nm, or any range or partial range between these. In some embodiments, the combined physical thickness of the second high RI layers 217a and 217b as a percentage of the physical thickness of the stack thickness 209a can be approximately 30% or more, approximately 35% or more, approximately 40% or more, or approximately 45% or more, for example, approximately 35% to approximately 75%, approximately 40% to approximately 65%, approximately 45% to approximately 55%, or any range or partial range between these.

[0316] In some embodiments, the optical stack 203a of the coated article 211 may contain residual stresses of less than approximately +50 MPa (tensile) to approximately -1000 MPa (compressive). In some implementations of article 100, the anti-reflective coating is characterized by residual stresses of approximately -50 MPa to approximately -1000 MPa (compressive), or approximately -75 MPa to approximately -800 MPa (compressive). Unless otherwise specified, the residual stresses in the anti-reflective coating are obtained by measuring the curvature of the substrate 103 before and after deposition of the anti-reflective coating, and then calculating the residual film stresses according to Stoney's formula, in accordance with principles known and understood by those skilled in the art of the present disclosure.

[0317] In some embodiments, the optical stack 203a and / or coated article 211 may exhibit a visible photopic mean reflectance of about 1% or less, about 0.9% or less, about 0.8% or less, about 0.7% or less, about 0.6% or less, about 0.5% or less, about 0.4% or less, about 0.3% or less, or about 0.2% or less across the optical wavelength regime. These photopic mean reflectance values ​​may be expressed in incident illumination angles in the range of about 0° to about 20°, about 0° to about 40°, or about 0° to about 60°. As used herein, “photopic mean reflectance” mimics the response of the human eye by weighting the reflectance to the wavelength spectrum according to the sensitivity of the human eye. Photopic mean reflectance may also be referred to as the luminance of the reflected light, or the tristimulus Y value, according to known rules, e.g., CIE color space rules. Photopic Mean Reflectance <R p > is defined as the irradiation spectrum I(λ), which is the product of the spectral reflectance R(λ) and the CIE color matching function y(λ), related to the spectral response of the eye:

number

[0318] Furthermore, the article exhibits CIEa* values ​​at reflectances of approximately -10 to +2 and CIEb* values ​​at reflectances of approximately -10 to +2, where CIEa* and CIEb* values ​​are measured on the optical film structure at the normal incident irradiation angle, respectively. In some embodiments, the optical stack 203a and / or coated article 211 can exhibit a photopic mean light transmittance of approximately 90% or more, 92% or more, 94% or more, 96% or more, or 98% or more across the optical wavelength regime. In some embodiments, the optical stack 203a and / or coated article 211 exhibit a mean light transmittance of approximately 87% or more, 88% or more, 89% or more, 90% or more, 91% or more, 92% or more, 93% or more, 94% or more, or 95% or more across the optical wavelength regime in the infrared spectrum of 800nm ​​to 1000nm, 900nm to 1000nm, or 930nm to 950nm. In some embodiments, the optical stack 203a and / or coated article 211 may exhibit a hardness of 8 GPa or greater when measured at an indentation depth of about 100 nm, or a maximum hardness of 9 GPa or greater when measured over an indentation depth range of about 100 nm to about 500 nm, the hardness and maximum hardness being measured by a Berkovich indenter hardness test (as defined below).

[0319] In some embodiments, as shown in Figures 2B and 36B, the coated article 211 includes an optical stack 203a comprising an optical film 231, a scratch-resistant layer 233, and an optional capping layer 229. In some embodiments, the optical stack 203b may include scratch-resistant coatings, anti-reflective coatings, and / or optical film structures described in U.S. Patent No. 9,328,016 issued on 3 May 2016, U.S. Patent No. 9,684,097 issued on 20 June 2017, U.S. Patent No. 9,703,011 issued on 11 July 2017, U.S. Patent No. 9,079,802 issued on 14 July 2015, U.S. Patent No. 9,726,786 issued on 8 August 2017, and U.S. Patent No. 10,416,352 issued on 17 September 2019, which are incorporated by reference in whole. For example, the optical stack 203b may be an anti-reflective coating and / or a scratch-resistant coating.

[0320] In further embodiments, as shown in Figures 2C and 36C, the optical film 231 of the optical stack 203b may include one or more periods 223, including two or more layers having different refractive indices, for example, a first low RI layer 225 and a second high RI layer 227. For example, the optical stack 203b shown in Figure 2C has three periods 223, forming an optical film 231 having alternatingly overlapping first low RI layers 225 and second high RI layers 227. In further embodiments, the optical film 231 may include any number of periods, for example, within one or more of the ranges considered above for the optical stack 203a. The absolute value of the difference between the first low RI layer 225 and the second high RI layer 227 may be about 0.01 or greater, about 0.05 or greater, about 0.1 or greater, or even 0.2 or greater. In a further embodiment, the first low RI layer 225 may include any of the materials considered above for the first low RI layer 215a, for example, silicon dioxide (SiO2). In a further embodiment, the second high RI layer 227 may include any of the materials considered above for the second high RI layer 217a, for example, SiO2. x Ny This may include: In a further embodiment, the layers of the first low-RI sublayer 225 and / or the second high-RI sublayer 227 may include optical thicknesses (n*d) within the ranges of about 2 nm to about 200 nm, about 10 nm to about 100 nm, about 15 nm to about 100 nm, or any range or partial range between these. In a further embodiment, all layers in the optical film 231, or all of the second high-RI layers in the optical film 231, may have optical thicknesses within one or more of the ranges mentioned in the preceding paragraph. In a further embodiment, the layers of the first low-RI sublayer 225 and / or the second high-RI sublayer 227 may include physical thicknesses within the ranges of about 10 nm to about 800 nm, about 10 nm to about 500 nm, about 10 nm to about 300 nm, about 10 nm to about 200 nm, about 20 nm to about 100 nm, or any range or partial range between these. In a further embodiment, one or any of the layers or sections within the optical stack 203 and / or therein (e.g., optical film 231, scratch-resistant layer 233, optional capping layer 229) is approximately 10 -4 The following extinction coefficients (at a wavelength of approximately 400 nm) may be observed.

[0321] In further embodiments, as shown in Figures 2C and 36C, the scratch-resistant layer 233 may include inorganic carbides, nitrides, oxides, diamond-like materials, or combinations thereof. Examples of suitable materials for the scratch-resistant layer 233 include metal oxides, metal nitrides, metal oxynitrides, metal carbides, metal oxycarbides, and / or combinations thereof. Exemplary metals include B, Al, Si, Ti, V, Cr, Y, Zr, Nb, Mo, Sn, Hf, Ta, and W. Specific examples of materials that can be used for the scratch-resistant layer 233 include Al2O3, AlN, AlO x N y , Si3N4, SiO x N y Si u Al v O x N y Diamond, diamond-like carbon, Si x C y Six O y C z , ZrO2, TiO x N y , or combinations thereof. In a further embodiment, the scratch-resistant layer 233 is made of the same material as the second high RI layer 227, for example, SiO x N y This may include the following. In further embodiments, the physical thickness of the scratch-resistant layer and / or optical stack may be about 0.05 μm to about 3 μm, about 0.1 μm to about 3 μm, about 0.2 μm to about 3 μm, about 0.3 μm to about 2.2 μm, about 0.5 μm to about 2.1 μm, about 1 μm to about 2.1 μm, about 1.8 μm to about 2.1 μm, or any range or partial range between these. In exemplary embodiments, the physical thickness of the scratch-resistant layer may be 0.05 μm to 3 μm, 0.3 μm to 2.2 μm, or 1 μm to 2.1 μm. The scratch-resistant layer 233 and / or optical stack 203b may exhibit a hardness of about 8 GPa or more, about 10 GPa or more, about 13 GPa or more, or about 17 GPa or more when measured by a Berkovich indenter hardness test (as described below).

[0322] Although not shown, it should be understood that the scratch-resistant layer can be sandwiched between portions of the optical film. For example, three or more periods can be positioned between the scratch-resistant layer and the substrate, while two or more periods can be positioned between the scratch-resistant layer and a surface modification layer (e.g., a fingerprint-hiding coating).

[0323] In further embodiments, as shown in Figure 2C or 36C, the optical stack 203b may include a capping layer 229 disposed over the scratch-resistant layer (for example, disposed on top of the scratch-resistant layer). In even further embodiments, the capping layer 229 may be SiO2, Al2O3, GeO2, SiO2, AlO x N y SiO x N y Si u Al v O x N yThis may include low refractive index materials such as MgO, MgF2, BaF2, CaF2, DyF3, YbF3, YF3, or CeF3. In a further embodiment, the capping layer 229 may contain the same material as the first high RI layer 225, for example, SiO2. In a further embodiment, the thickness of the capping layer 229 may be about 10 nm to about 120 nm, about 20 nm to about 115 nm, about 50 nm to about 110 nm, about 80 nm to about 110 nm, about 90 nm to about 105 nm, or any range or partial range between these. The capping layer 229 may exhibit an intrinsic hardness in the range of about 7 GPa to about 10 GPa when measured by a Berkovich indenter hardness test (measured on the surface of a layer of the same material of a capping layer formed in the same manner but having a thickness of about 1 micrometer or more).

[0324] In a further embodiment, the stack thickness 209b, corresponding to the physical thickness of the optical stack 203b, can be in the range of approximately 0.2 μm to approximately 3 μm, approximately 0.5 μm to approximately 3 μm, approximately 1 μm to approximately 3 μm, approximately 1.2 μm to approximately 3 μm, approximately 1.5 μm to approximately 3 μm, approximately 2 μm to approximately 2.6 μm, or any range or subrange between these. In a further embodiment, the optical stack 203b can exhibit an average optical reflectance of approximately 0.5% or less, approximately 0.25% or less, approximately 0.1% or less, or even 0.05% or less across the optical wavelength regime. In a further embodiment, the optical stack 203b can exhibit an average transmittance or average reflectance having an average oscillation amplitude of approximately 5 percent points or less across the optical wavelength regime. In a further embodiment, the optical stack 203b may exhibit an average light transmittance of 80% or more, 82% or more, 85% or more, 90% or more, 90.5% or more, 91% or more, 91.5% or more, 92% or more, 92.5% or more, 93% or more, 93.5% or more, 94% or more, 94.5% or more, or 95% or more.

[0325] Optical stacks 203, 203a, or 203b can be formed using a variety of deposition methods, e.g., vacuum deposition techniques, chemical vapor deposition (e.g., plasma-enhanced chemical vapor deposition (PECVD), low-pressure chemical vapor deposition, atmospheric pressure chemical vapor deposition, and plasma-enhanced atmospheric pressure chemical vapor deposition), physical vapor deposition (e.g., reactive or non-reactive sputtering or laser ablation), thermal or e-beam deposition, and / or atomic layer deposition. Liquid-based methods, e.g., printing, spray coating, or slot coating, may also be used. When vacuum deposition is utilized, an in-line process may be used to form optical stacks 203, 203a, or 203b in a single deposition run. In some embodiments, vacuum deposition can be performed by a linear PECVD source. In some embodiments, optical stacks 203, 203a, or 203b can be prepared using a sputtering process (e.g., reactive sputtering process), a chemical vapor deposition (CVD) process, a plasma-enhanced chemical vapor deposition process, or a combination of these processes. In some embodiments, an optical stack 203a or 203b including a low RI layer 215a, 215b, or 225 and a high RI layer 217a, 217b, or 227 can be prepared according to a reactive sputtering process. According to some embodiments, an optical stack 203a or 203b (including a low RI layer 215a, 215b, or 225, a high RI layer 217a, 217b, or 227, and a capping layer 219 or 229) can be fabricated using metallic mode reactive sputtering in a rotating drum coater. The reactive sputtering process conditions were defined through careful experimentation to achieve a desired combination of hardness, refractive index, optical transparency, low color, and controlled film stress.

[0326] In a further embodiment, the optical stack 203 may include a gradient coating that includes a refractive index gradient. For example, the gradient coating of the optical stack 203 may be positioned between the surface modification layer 113 (Figure 2A) or the planarization layer 123 (Figure 36A) and the substrate 103. In another further embodiment, the refractive index gradient may extend to a range of refractive index values ​​of about 0.2 or more, about 0.3 or more, about 0.4 or more, about 1 or less, about 0.8 or less, about 0.6 or less, or about 0.5 or less, for example, about 0.2 to about 1, about 0.3 to about 0.8, about 0.4 to about 0.6, or any range or partial range between them. In yet another embodiment, the gradient coating may include a concentration gradient of one or more of oxygen, nitrogen, and / or silicon. However, it should be understood that other functional coatings may be provided to the optical stack 203 in order to achieve a predetermined optical property of the coated articles 201, 211, 221, 3501, 3601, 3611, or 3621.

[0327] According to one or more embodiments, anti-reflective coatings can be used in combination with anti-glare (AG) surfaces. Anti-glare surface treatment can affect the performance of the anti-reflective coating. Therefore, the selection of an appropriate anti-glare surface can be important for optimal performance, especially in challenging usage environments such as vehicle interiors. In such environments, it may be beneficial for the anti-glare surface on the cover glass to have minimal sparkle and provide appropriate anti-glare effect and tactile properties while satisfying the required contrast ratio (CR) under sunlight. For example, a sample can be prepared using a chemically etched ultra-low sparkle (ULS) AG surface on a glass substrate made of Corning® Gorilla® glass having an anti-reflective coating, and an easily cleanable (ETC) coating to provide a stable color appearance at a wide viewing angle to facilitate visibility in sunlight, according to embodiments of the present disclosure.

[0328] Anti-glare surfaces can be prepared on Corning® Gorilla® glass substrates by using a chemical etching method that enables ultra-low sparkle performance suitable for high-resolution displays with up to 300 pixels per inch (PPI). The optical properties of the anti-glare glass can be analyzed, including specular reflection (i.e., specular refractory component excluded (SCE) or specular refractory component included (SCI)), transmitted haze, gloss, image clarity (DOI), and the presence or absence of contributions from sparkle. Further information on these properties and methods for performing these measurements can be found in (1) C. Li and T. Ishikawa, Effective Surface Treatment on the Cover Glass for Auto-Interior Applications, SID Symposium Digest of Technical Papers Volume 1, Issue 36.4, pp. 467 (2016); (2) J. Gollier, GAPiech, SD Hart, JA West, H. Hovagimian, EM Kosik Williams, A. Stillwell and J. Ferwerda, Display Sparkle Measurement and Human Response, SID Symposium Digest of Technical Papers Volume 44, Issue 1 (2013); and (3) J. Ferwerda, A. Stillwell, H. Hovagimian and EM Kosik Williams, Perception of sparkle in anti-glare display screen, Journal of the SID, Vol 22, Issue This can be found in 2(2014), and this content is incorporated herein by reference.

[0329] The balance of five metrics—SCE / SCI (see previous paragraph), Transmittance Haze, Gloss, Image Clarity (DOI), and Sparkle—is crucial for maximizing the anti-glare benefits for display readability, glass surface tactile feel, and the aesthetic appearance of high-performance touch displays in applications such as vehicle interiors. Sparkle is the micro-scattering interaction between the anti-glare surface and LCD pixels, which creates bright spots that degrade image quality, especially at high resolutions. The sparkle effect can be characterized using the Pixel Power Deviation (PPDr) criterion to investigate the sparkle effect on displays of different resolutions. For example, ultra-low sparkle anti-glare glass with a PPDr of less than 1% will have an invisible sparkle effect on displays with less than 300 pixels per inch (PPI). However, depending on the content of the display and based on end-user preference, a PPDr of up to 4% may be acceptable. In vehicle or automotive interior settings, approximately 120 PPI to approximately 300 PPI is acceptable, with displays above 300 PPI having a reduced value.

[0330] In some embodiments, the substrate 103 and / or anti-glare surface of the optical stacks 203, 203a, and / or 203b may include a textured surface having, for example, fine particles, a mechanically roughened surface, and / or a chemically roughened surface. In further embodiments, the anti-glare and / or textured surface may be formed by treating the corresponding surface with an anti-glare treatment. Exemplary embodiments of the anti-glare treatment include chemical or physical surface treatment to form irregularities and / or etching the surface (e.g., with hydrofluoric acid) to create etched areas exhibiting anti-glare properties.

[0331] Throughout this disclosure, the hardness of the optical stack is measured using the “Berkovich indenter hardness test.” As used herein, the “Berkovich indenter hardness test” measures the hardness of the material by indenting a surface (e.g., the fourth main surface 207) with a diamond Berkovich indenter to an indentation depth in the range of approximately 50 nm to approximately 1000 nm (or the smaller of the thicknesses of optical stacks 203, 203a, or 203b), and measuring the hardness from this indentation at various points along the entire indentation depth range, along a specified segment of this indentation depth (e.g., a depth range of approximately 100 nm to approximately 500 nm), or at a specific indentation depth (e.g., a depth of 100 nm, a depth of 500 nm, etc.). This measurement is generally described in Oliver, WC and Pharr, GM, “An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation.” The methods described in “experiments”, J.Mater.Res., Vol.7, No.6, 1992, 1564-1583; and Oliver, WC and Pharr, GM, “Measurement of Hardness and Elastic Modulus by Instrument Indentation: Advances in Understanding and Refinements to Methodology”, J.Mater.Res., Vol.19, No.1, 2004, 3-20 are used. Furthermore, when hardness is measured over an indentation depth range (e.g., a depth range of approximately 100 nm to approximately 500 nm), the results can be reported as the maximum hardness within the specified range, and the maximum value is selected from the measurements taken at each depth within that range. As used herein, both “hardness” and “maximum hardness” refer to the measured hardness values, not the average of the hardness values. Similarly, when hardness is measured at the indentation depth, the hardness value obtained from the Berkovich indenter hardness test is given for that particular indentation depth.

[0332] Optical stacks 203, 203a, or 203b, if present, may have a hardness greater than approximately 8 GPa as measured by a Berkovich indenter hardness test at an indentation depth of approximately 100 nm. Optical stack 203 may exhibit a hardness of approximately 8 GPa or greater, approximately 9 GPa or greater, approximately 10 GPa or greater, approximately 11 GPa or greater, approximately 12 GPa or greater, approximately 13 GPa or greater, approximately 14 GPa or greater, or approximately 15 GPa or greater as measured by a Berkovich indenter hardness test at an indentation depth of approximately 100 nm. For example, optical stacks 203 or 203a, including a surface modification layer 113 (e.g., a fingerprint-concealing coating) and / or a planarization layer 123 as described herein, may exhibit a hardness of approximately 8 GPa or greater, approximately 10 GPa or greater, or approximately 12 GPa or greater as measured by a Berkovich indenter hardness test at an indentation depth of approximately 100 nm. In some embodiments, the optical stack 203 or 203b can exhibit hardness in the range of approximately 8 GPa to approximately 30 GPa, approximately 10 GPa to approximately 25 GPa, approximately 12 GPa to approximately 20 GPa, approximately 16 GPa to approximately 20 GPa, or any range or partial range in between. Such measured hardness values ​​may be indicated by optical stacks 203, 203a, or 203b and / or coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621 over an intrusion depth of approximately 50 nm or more or approximately 100 nm or more (e.g., approximately 100 nm to approximately 300 nm, approximately 100 nm to approximately 400 nm, approximately 100 nm to approximately 500 nm, or approximately 200 nm to approximately 600 nm).Similarly, maximum hardness values ​​of approximately 8 GPa or higher, approximately 9 GPa or higher, approximately 10 GPa or higher, approximately 11 GPa or higher, approximately 12 GPa or higher, approximately 13 GPa or higher, approximately 14 GPa or higher, or approximately 15 GPa or higher, as determined by the Berkovich indenter hardness test, may be indicated by optical stack 203 and / or coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621 over an indentation depth of approximately 50 nm or more or approximately 100 nm or more (e.g., approximately 100 nm to approximately 300 nm, approximately 100 nm to approximately 400 nm, approximately 100 nm to approximately 500 nm, or approximately 200 nm to approximately 600 nm).

[0333] As shown in Figures 1, 2A-2C, 35, and 36A-36C, coated articles 101, 201, 221, 221, 3501, 3601, 3611, or 3621 include a surface modification layer 113 (e.g., a fingerprint-hiding coating) disposed over the first main surface 105 of the substrate 103. The surface modification layer 113 includes an inner surface 117 facing the first main surface 105 of the substrate 103. In some embodiments, as shown in Figure 1, the surface modification layer 113 (e.g., the inner surface 117) can be disposed on and / or bonded to the first main surface 105 of the substrate 103. In some embodiments, as shown in Figures 2A-2C and 36A-36C, the surface modification layer 113 (e.g., a fingerprint-hiding coating) can be disposed on an optical stack 203, 203a, or 203b. In embodiments such as that shown in Figure 35, the surface modification layer 113 (e.g., inner surface 117) can be disposed on and / or bonded to a first surface area 125 of the planarization layer 123 (discussed below). In embodiments such as those shown in Figures 1, 2A-2C, the surface modification layer 113 (e.g., fingerprint-hiding coating) includes an outer surface 115 that forms the outer surface of the coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621. As a result, the user interacts with the coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621, for example, by touching the outer surface 115 or by viewing an image through the outer surface 115. The surface modification thickness 119 is defined as the average distance between the inner surface 117 and the outer surface 115. In one embodiment, the surface modification thickness 119 can be approximately 1 nm or more, approximately 2 nm or more, approximately 3 nm or more, approximately 5 nm or more, approximately 10 nm or more, approximately 20 nm or more, approximately 50 nm or more, approximately 75 nm or less, approximately 50 nm or less, approximately 25 nm or less, approximately 15 nm or less, approximately 10 nm or less, approximately 8 nm or less, approximately 7 nm or less, approximately 6 nm or less, approximately 5 nm or less, or approximately 4 nm or less. In another embodiment, the surface modification thickness 119 can be approximately 1 nm to approximately 75 nm, approximately 1 nm to approximately 50 nm, approximately 1 nm to approximately 25 nm, approximately 1 nm to approximately 15 nm, approximately 2 nm to approximately 10 nm, approximately 2 nm to approximately 8 nm, approximately 2 nm to approximately 5 nm, approximately 3 nm to approximately 5 nm, or any range or partial range between these.In some embodiments, the surface modification thickness 119 can be approximately 10 nm or less, for example, approximately 1 nm to approximately 8 nm, approximately 1 nm to approximately 5 nm, approximately 2 nm to approximately 4 nm, or any range or partial range between these. The surface modification thickness 119 is determined using a polarization analysis method.

[0334] Throughout this disclosure, “surface-modifying layer” refers to a layer characterized by altering the physical properties or other behavior of a coated article. For example, a surface-modifying layer can modify one or more of the following: water contact angle, oleic contact angle, visibility of fingerprints (e.g., simulated fingerprints), and / or the ability to remove fingerprints (e.g., by wiping).

[0335] In some embodiments, the surface modification layer may be an anti-fingerprint coating. Throughout this disclosure, a surface modification layer is an "anti-fingerprint" coating if the coating on a substrate reduces the visibility of fingerprint oils, reduces color shift of fingerprint oils, and / or reduces droplet formation of fingerprint oils compared to a substrate without a coating. As used herein, fingerprint visibility refers to the absolute difference in brightness (e.g., CIELAB L* value) between a portion of the anti-fingerprint coating with fingerprint oils and another portion of the anti-fingerprint coating without fingerprint oils. As used herein, color shift of the substrate is √((a1*-a2*) 2 +(b1*-b2*) 2) refers to the measured color difference, where a* refers to the CIELAB a* value, b* refers to the CIELAB b* value, subscript 1 refers to a portion of the anti-fingerprint coating that does not contain fingerprint oil, and subscript 2 refers to a portion of the anti-fingerprint coating that contains fingerprint oil. The anti-fingerprint coating can reduce droplet formation, which can increase the visibility and / or color shift of fingerprint oil, by being lipophilic, as defined below. In addition, the anti-fingerprint coating can allow the removal of aqueous materials (e.g., water droplets, sweat droplets) from the coating by being hydrophobic, for example, as defined below. In a further embodiment, the anti-fingerprint coating can exhibit a water contact angle (e.g., as formed) of 90° to 120°, an oleic acid contact angle (e.g., as formed) of 40° or less, and a coefficient of friction of 0.25 or less. In a further embodiment, the easy-to-clean coating can be substantially fluorine-free and / or fluorine-free. In some embodiments, the diiodomethane contact angle of the (e.g., as-formed) anti-fingerprint coating may be about 60° or more, about 62° or more, about 65° or more, about 80° or less, about 75° or less, about 73° or less, or about 70° or less. In some embodiments, the diiodomethane contact angle of the (e.g., as-formed) anti-fingerprint coating may be in the range of about 60° to about 80°, about 62° to about 75°, about 65° to about 72°, or any range or partial range between these. In some embodiments, the anti-fingerprint coating may be lipophilic. In some embodiments, the hexadecane contact angle and / or oleic acid contact angle of the (e.g., as-formed) anti-fingerprint coating may be about 45° or less, about 40° or less, about 30° or less, about 25° or less, or about 20° or less, or the anti-fingerprint coating may wet hexadecane and / or oleic acid. In a further embodiment, the anti-fingerprint coating (for example, as formed) wets hexadecane and / or oleic acid.By providing a low diiodomethane contact angle (e.g., about 60° or less) and / or a low hexadecane contact angle (e.g., about 30° or less), fingerprint oil can be dispersed across the anti-fingerprint coating rather than forming noticeable droplets, thereby reducing the visibility and / or color shift associated with fingerprints.

[0336] In some embodiments, the surface modification layer may be a fingerprint-concealing coating. Throughout this disclosure, a “fingerprint-concealing coating” can reduce the visibility of fingerprint oils and / or color shifts applied thereon compared to a glass substrate without a coating. As used herein, fingerprint visibility refers to the absolute difference in brightness (e.g., CIELAB L* value) between a portion of the fingerprint-concealing coating with fingerprint oil and another portion of the fingerprint-concealing coating without fingerprint oil. As used herein, color shift of a glass substrate is expressed as √((a1*-a2*) 2 +(b1*-b2*) 2) refers to the measured color difference as, in the formula, a* refers to the CIELAB a* value, b* refers to the CIELAB b* value, subscript 1 refers to a portion of the fingerprint-concealing coating that does not have fingerprint oil, and subscript 2 refers to a portion of the fingerprint-concealing coating that has fingerprint oil. Specifically, a fingerprint-concealing coating can cause fingerprint oil to spread and cover the surface of the fingerprint-concealing coating. Color shift and / or visibility associated with fingerprint oil can be reduced by reducing the thickness of fingerprint oil droplets and / or increasing the area of ​​the fingerprint-concealing coating covered by fingerprint oil. A fingerprint-concealing coating that can be lipophilic is in contrast to other coatings (e.g., anti-fingerprint coatings) that can reduce droplet formation by being oleophobic. In addition, a fingerprint-concealing coating can be hydrophobic, for example, as considered herein, which allows for the removal of aqueous materials (e.g., water droplets, sweat droplets) from the coating. In further embodiments, the fingerprint-concealing coating may exhibit a water contact angle (e.g., as formed) of 90° to 120°, an oleic acid contact angle (e.g., as formed) of 40° or less, and a coefficient of friction of 0.25 or less. In further embodiments, the fingerprint-concealing coating may be a fluorine-containing material. Alternatively, in further embodiments, the fingerprint-concealing coating may be substantially fluorine-free and / or fluorine-free. In further embodiments, the fingerprint-concealing coating may exhibit a hexadecane contact angle (or wet hexadecane) of 20° or less and / or a diiodomethane contact angle of 60° or more.

[0337] In some embodiments, the surface modification layer can be an easily cleanable coating. Throughout this disclosure, a surface modification layer is an "easily cleanable" coating if the coating on a glass substrate repels and / or facilitates the removal of materials placed on it compared to a glass substrate without a coating. As used herein, the ability to repel materials is determined based on a contact angle having a higher contact angle associated with greater repulsive force. As used herein, the ability to remove materials is measured by wiping the material placed on the surface (e.g., the coating or glass substrate) with a cheesecloth (see details from the cheesecloth abrasion test with modification where the material is placed on the surface before wiping), and the visibility of the material is monitored. A decrease in visibility (e.g., fewer wiping cycles to achieve a given reduction in visibility) is associated with a coating that facilitates the removal of materials placed on it. In a further embodiment, the easy-to-clean coating may exhibit a (e.g., as-formed) water contact angle of 90° to 120°, an (e.g., as-formed) oleic acid contact angle of 50° or more, and a coefficient of friction of 0.25 or less. In a further embodiment, the easy-to-clean coating may be a fluorine-containing material. Alternatively, in a further embodiment, the easy-to-clean coating may be substantially fluorine-free and / or fluorine-free. In an embodiment, the diiodomethane contact angle of the (e.g., as-formed) anti-fingerprint coating may be about 60° or more, about 62° or more, about 65° or more, about 80° or less, about 75° or less, about 73° or less, or about 70° or less. In an embodiment, the diiodomethane contact angle of the (e.g., as-formed) anti-fingerprint coating may be in the range of about 60° to about 80°, about 62° to about 75°, about 65° to about 72°, or any range or partial range between these. In some embodiments, the anti-fingerprint coating can be lipophilic.In some embodiments, the hexadecane contact angle of the (e.g., as-formed) anti-fingerprint coating can be about 45° or less, about 40° or less, about 30° or less, about 25° or less, or about 20° or less, or the anti-fingerprint coating can wet hexadecane. In further embodiments, the (e.g., as-formed) anti-fingerprint coating wets hexadecane. By providing a low diiodomethane contact angle (e.g., about 60° or less) and / or a low hexadecane contact angle (e.g., about 30° or less), the visibility and / or color shift associated with fingerprints can be reduced by allowing fingerprint oil to disperse across the surface-modified layer rather than forming noticeable droplets.

[0338] In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) may contain at least one alkylsilane on its outer surface 115, bonded to the remainder of the coated articles 101, 201, 211, 212, 3501, 3601, 3611, and / or 3621 (e.g., the planarization layer 123, the optical stack 203, 203a, or 203b, and / or the substrate 103). As used herein, “alkylsilane” refers to a compound containing an alkyl chain directly bonded to a silicon atom of a silane group, and the silane group may be bonded to other silane groups (e.g., forming a siloxane or siloxane-like network). In further embodiments, the alkylsilane may have 3 to about 34 carbon atoms (i.e., C3-C3 34 Alkyl groups), for example, 4 carbons to 34 carbons (i.e., C4-C 34 Alkyl group), 6 carbons to 34 carbons (i.e., C6-C 34 Alkyl group), 8 carbons to 20 carbons (i.e., C8-C 20 It may include a continuous row of carbon atoms from 4 carbon atoms to about 34 carbon atoms (i.e., C4-C). In some embodiments, the alkyl group of the alkylsilane may include a continuous row of carbon atoms from 4 carbon atoms to about 34 carbon atoms (i.e., C4-C). 34 Alkyl group) (For example, 6 carbons to 34 carbons (i.e., C6-C 34 Alkyl group), 8 carbons to 20 carbons (i.e., C8-C 20Alkyl alkyl groups, for example, iso-octyl alkyl groups, dodecyl alkyl groups, octadecyl alkyl groups, or combinations thereof. Exemplary embodiments of alkylsilanes include propylsilanes (e.g., chloropropyltrimethoxysilane - see Figure 17B), hexylsilanes (e.g., 1,6-bis(trichlorosilyl)hexane), octylsilanes (e.g., 1,8-bis(chlorodimethylsilyl)octane - see Figure 17A, and 1,8-bis(dimethylmethoxysilyl)octane - see Figure 17H), iso-octylsilanes (e.g., iso-octyltrimethoxysilane), dodecilanes (e.g., dodecyltrimethoxysilane), octadecilanes (e.g., octadecyltrimethoxysilane - see Figure 17G), or combinations thereof. In some embodiments, alkylsilanes may include dipodial or polypodial alkylsilanes having two or more silane head groups on each end of the alkyl group of an alkylsilane (e.g., bis-silane or tris-silane). Exemplary embodiments of such dipodial alkylsilanes include 1,6-bis(trimethoxysilyl)hexane (bishexane) (see Figure 17E) and 1,8-bis(trimethoxysilyl)octane (BISMO) (see Figure 17F). In some embodiments, alkylsilanes may include combinations of one or more monopodial alkylsilanes and one or more dipodial alkylsilanes. Using mixtures of alkylsilanes, various desired attributes, such as good durability combined with fingerprint concealment, can be obtained. Thus, the coating can consist of two or more functions.For example, alkylsilanes may include one or more monolegged alkylsilanes, such as octadecyltrimethoxysilane, dodecyltrimethoxysilane, or combinations thereof, as well as one or more dilegged alkylsilanes, such as 1,8-bis(chlorodimethylsilyl)octane, 1,8-bis(dimethylmethoxysilyl)octane, 1,6-bis(trichlorosilyl)hexane, bis(triethoxysilyl)methane, 1,2-bis(triethoxysilyl)ethane, 1,6-bis(trimethoxysilyl)hexane, 1,8-bis(triethoxysilyl)octane, 1,8-bis(trimethoxysilyl)octane, or combinations thereof. While not intended to be bound by any particular theory, it is conceivable that polylegged alkylsilanes (e.g., dilegged alkylsilanes) might create longer chains through intermolecular polycondensation. In the case of monofunctional silanes, the unreactive methyl group can disrupt chain packing. In the case of bifunctional or trifunctional silanes, polycondensation can occur from multiple sites, allowing the molecule to branch more and resulting in insufficient ordering. Due to their bilegged nature, these materials may contain unreacted terminal hydroxyl groups. In some embodiments, it may be beneficial to react or "cap" these groups with monofunctional monolegged silanes or other molecules. Such examples include monofunctional alkylsilanes in alkyl chains containing 3 to 36 carbon atoms. Other preferred steps include methylation, such as through the use of hexamethyldisilazane (HMDS). Functionalizations suitable for improved durability include linear alkylsilanes in alkyl chains containing 3 to 26 carbon atoms. Certain examples include octadecyltrimethoxysilanes and dodecyltrimethoxysilanes. Such examples are expected to form well-ordered SAMs that maintain a high water contact angle even after rubber abrasion testing against bare glass. When combined with planarization layer 123, good rubber abrasion performance against bare glass results in enhanced durability (steel wool, cheesecloth).In some embodiments, the ratio of monolegged alkylsilanes to polylegged alkylsilanes used to form polymers in the surface modification layer 113 may be selected to adjust the fingerprint-hiding properties, as well as the cleanliness and / or durability properties, of the surface modification layer 113 formed therefrom (e.g., a fingerprint-hiding coating). While not intended to be bound by any particular theory, it is believed that monolegged alkylsilanes may increase the cleanliness and / or durability of the surface modification layer 113 formed therefrom, and bilegged silanes may increase the fingerprint-hiding properties of the surface modification layer 113 formed therefrom. The deposition of monolegged and polylegged silanes in the surface modification layer 113 may include various ratios of monolegged and polylegged alkylsilanes. In the embodiment, the alkylsilane is 10:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 9:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 8:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 7:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 6:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 5:1~1:9, 1:8 This may include ratios of multi-legged alkylsilane to monolegged alkylsilane ranging from 10:1 to 1:10, such as 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 4:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 2:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, or 1:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, or 1:2. In some embodiments, the alkylsilane may not contain one or more of the following: alkenes, aryl groups, alkenyl groups, ketones, carboxylic acid groups, chlorine, or combinations thereof. In further embodiments, the alkylsilane may include methoxysilanes (e.g., trimethoxysilane) and / or trialkoxysilanes (e.g., trimethylsilane or triethylsilane in addition to the alkyl groups mentioned above).In further embodiments, the silane may include alkyltrimethoxysilane, alkyltriethoxysilane, alkyltrichlorosilane, alkyltrimethoxysilane, alkyltriethoxysilane, or a combination thereof (e.g., dichloromutoxysilane, chlorodimethoxysilane). In further embodiments, the alkylsilane may include chlorosilane, methylsilane, methoxysilane, trimethoxysilane, triethoxysilane, or a combination thereof (e.g., chlorodimethylsilane, chlorodimethioxysilane, trichlorosilane). By providing alkylsilanes, the surface energy (e.g., total, dispersibility, polarity) of the surface-modified layer (e.g., fingerprint-hiding coating) can be reduced, thereby enabling the surface-modified layer (e.g., fingerprint-hiding coating) to be lipophilic. By reacting the substrate and / or initial coating with an alkoxysilane or chlorosilane, it is possible to bond well to the initial coating and enable low surface energy (e.g., total surface energy or about 30 mN / m or less, polar surface energy about 5 mN / m or less).

[0339] In a further embodiment, as discussed above, the alkylsilane is the siloxane portion of the structure (i.e., the [Si(R)2O] of the polymer structure discussed in the following paragraphs). nIn addition to additional alkylsilanes that can contribute to the dialkylsilane, it may include one or more of the silanes considered above. In further embodiments, the additional alkylsilane may include a dialkylsilane having silanes at both ends of the dialkylsilane, where the alkyl group of the dialkylsilane may be methyl, ethyl, or a combination thereof. An exemplary embodiment of the dialkylsilane is dimethylsilane, i.e., dichlorotetramethyl disoloxane (see Figure 17D), but the other leaving group may independently be another chlorine group (e.g., selected from those considered in the previous paragraph). In further embodiments, the amount of additional alkylsilane as a weight percentage of the total amount of alkylsilane can be about 1% by weight or more, about 5% by weight or more, about 10% by weight or more, about 20% by weight or more, about 25% by weight or more, about 30% by weight or more, about 35% by weight or more, about 40% by weight or more, about 45% by weight or more, about 50% by weight or more, about 55% by weight or more, about 60% by weight or more, about 65% by weight or more, about 70% by weight or more, about 75% by weight or more, about 90% by weight or less, about 85% by weight or less, about 80% by weight or less, about 75% by weight or less, about 70% by weight or less, about 65% by weight or less, about 60% by weight or less, about 55% by weight or less, about 50% by weight or less, about 45% by weight or less, about 40% by weight or less, about 35% by weight or less, or about 30% by weight or less. In further embodiments, the amount of additional alkylsilane as a weight percentage of the total amount of alkylsilane can be within the range of about 1% to about 90%, about 5% to about 90%, about 10% to about 85%, about 20% to about 80%, about 25% to about 75%, about 30% to about 70%, about 35% to about 65%, about 40% to about 60%, about 45% to about 55%, about 45% to about 50%, or any range or partial range between these. In preferred embodiments, the amount of additional alkylsilane as a weight percentage of the total amount of alkylsilane can be 1% to 90% or 25% to 75%. Alternatively, the alkylsilane may consist of a single alkylsilane selected from those considered in the preceding paragraph, excluding the additional alkylsilane.

[0340] In some embodiments, an alkylsilane outside the surface modification layer 113 (e.g., a fingerprint-concealing coating) can be bonded to another portion of the surface modification layer 113 (e.g., a fingerprint-concealing coating) by a silane group. In further embodiments, the bond between the alkylsilane and another portion of the coated article can be a disiloxane group. The disiloxane group can be formed by condensation of silanes. In even further embodiments, the disiloxane group can include one or more dialkylsiloxanes (e.g., dimethylsiloxane(pl) and / or diethylsiloxane(pl)). As discussed in the following paragraphs, the alkylsilane outside the surface modification layer 113 (e.g., a fingerprint-concealing coating) can be (i) a polymer of alkylsilane, or (ii) part of a block copolymer of alkylsilane and a siloxane-based polymer.

[0341] In further embodiments, the alkylsilane may be part of an alkylsilane polymer bonded to another part of the coated article (e.g., a first main surface 105 of the substrate or a fourth main surface 207 of the optical stack 203 or 203a). In further embodiments, the alkylsilane polymer may be a dialkylsiloxane (e.g., dimethylsiloxane, diethylsiloxane, or a combination thereof) polymer. In further embodiments, the monomers of the alkylsilane polymer may be bonded together by disiloxane groups. In further embodiments, the disiloxane may bond together the monomers of the alkylsilane polymer with one or more alkyl chains. In further embodiments, the disiloxane groups may include one or more dimethylsiloxanes, diethylsiloxanes, or a combination thereof. For example, the polymer structure may be {OSi(R')2[CH2] m [Si(R)2O] n Si(R')2[CH2] p Si(R)2} qR may be present in the formula, where m and p are independently selected from 3 to 34, R' and R'' are independently selected from CH3 and CH2CH3, n is 1 or greater, q can be 1 or greater and / or the degree of polymerization. In further embodiments, R may be a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof. In certain embodiments, R may be an alkoxide containing a methoxy group, an ethoxy group, or a combination thereof. In even further embodiments, R may be a hydroxyl group or a chloro group. In even further embodiments, when n is 1, one or more of the following may also be true: R' may be CH3, R'' may be CH3, m may be 8, p may be 8, or a combination thereof. In further embodiments, n may be 1, and q may be within one or more of the corresponding ranges in the latter half of this paragraph. In further embodiments, n can be 2 or more (e.g., 2 to 10, 2 to 5, or 2), and q can be within one or more of the corresponding ranges in the latter half of this paragraph. For example, when n is 2 or more, one or more of the following may also be true: R' can be CH3, R'' can be CH3, m can be 8, p can be 8, or a combination thereof. In further embodiments, n can be 2, and q can be within one or more of the corresponding ranges in the latter half of this paragraph. For example, when n is 2, one or more of the following may also be true: R' can be CH3, R'' can be CH3, m can be 8, p can be 8, or a combination thereof. In further embodiments, R' and R'' can be CH3, which results in the structure shown in Figure 18A, both as a skeletal structure and SMILES. Furthermore, as shown in Figure 18A, the shown structure can be directly bonded to the surface of a substrate or optical film.In further embodiments, the degree of polymerization of the polymer can be 1 or more, 2 or more, 5 or more, 10 or more, 20 or more, 50 or more, 100 or less, 75 or less, 60 or less, 40 or less, 25 or less, 15 or less, 10 or less, or 5 or less. In further embodiments, the degree of polymerization of the polymer can be within the range of 1 to 100, 2 to 100, 5 to 75, 10 to 60, 20 to 40, or any range or partial range between these. In further embodiments, the degree of polymerization of the polymer can be about 40 or less, for example, 1 to 40, 1 to 25, 1 to 15, 1 to 10, 2 to 5, or any range or partial range between these.

[0342] In a further embodiment, the alkylsilane polymer has the structure {OSi(R)2[CH2] m [Si(R)2O] n Su(R)2[CH2] p Si(R)2} q R may be included in the formula, where m and p are independently selected from 3 to 34, and each R is independently OCH3, OH, and OSi(R')2[CH2] m’ R' is selected from , m' is independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' is independently selected from the group consisting of OCH3 and OH. In one embodiment, n is 1 and q is 1, which results in the structure shown in Figure 18B. Furthermore, as shown in Figure 18B, the shown structure can be directly bonded to the surface of a substrate or optical film. R is OSi(R')2[CH2] m’In one embodiment, one or more monomers of the alkylsilane may form one or more branches, as shown in Figure 18C. In yet another embodiment, when n is 1, one or more of the following may also be true: R may be OCH3, m may be 8, p may be 8, or a combination thereof. In yet another embodiment, n may be 1 and q may be within one or more of the corresponding ranges later in this paragraph. In yet another embodiment, n may be 2 or more (e.g., 2 to 10, 2 to 5, or 2) and q may be within one or more of the corresponding ranges later in this paragraph. For example, when n is 2 or greater, one or more of the following may also be true: R' can be CH3, R'' can be CH3, m can be 8, p can be 8, or a combination thereof. In a further embodiment, n can be 2, and q can be within one or more of the corresponding ranges later in this paragraph. For example, when n is 2, one or more of the following may also be true: R can be OCH3, m can be 8, p can be 8, or a combination thereof. In a further embodiment, R' and R'' can be CH3, which results in the structure shown in Figure 18A as both the skeletal structure and SMILES. Furthermore, as shown in Figure 18A, the shown structure can be directly bonded to the surface of a substrate or optical film. In further embodiments, the degree of polymerization of the polymer can be 1 or more, 2 or more, 5 or more, 10 or more, 20 or more, 50 or more, 100 or less, 75 or less, 60 or less, 40 or less, 25 or less, 15 or less, 10 or less, or 5 or less. In further embodiments, the degree of polymerization of the polymer can be within the range of 1 to 100, 2 to 100, 5 to 75, 10 to 60, 20 to 40, or any range or partial range between these. In further embodiments, the degree of polymerization of the polymer can be about 40 or less, for example, 1 to 40, 1 to 25, 1 to 15, 1 to 10, 2 to 5, or any range or partial range between these.

[0343] In a further embodiment, the alkylsilane polymer is {Si(R')2[CH2] m The condensation product may include monomer units containing {Si(R')2O}, where each R' is independently selected from CH3 and CH2CH3, and m is 3 to 34. In further embodiments, one or more of the following may also apply: R' may be CH3 and may be 8. In further embodiments, the condensation product may further include monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, where R” is (C5-C38) alkyl. In embodiments, {Si(R')2[CH2] mThe ratio of monomer units containing Si(R')2O to monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 10:1 to 1:9, 1:8, 1:7, 1 :6, 1:5, 1:4, 1:3, 1:2, or 1:1, 9:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 8:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 7:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 6:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 5:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 4:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 2: The ratios can be 10:1 to 1:10, such as 1:1-1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 2:1-1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, or 1:1-1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, or 1:2. In further embodiments, the alkylsilane polymer may consist of monomer units containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 It may include condensation products with monomer units containing {OSi(CH3)2[CH2]8Si(CH3)2} or combinations thereof. In some embodiments, the monomer units containing {OSi(CH3)2[CH2]8Si(CH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17The ratio of monomer units containing Si, or combinations thereof, is 10:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 9:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 8:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 7:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 6:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, and Alternatively, it could be 1:1, 5:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 4:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 2:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 2:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, or 1:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, or 1:2, which could be 10:1~1:10.

[0344] In a further embodiment, the alkylsilane polymer is {(OSi(R)2[CH2] m The condensation product may include monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof, where R” is (C5-C38) alkyl. In a further embodiment, {(OSi(R)2[CH2] mThe ratio of monomer units containing Si(R)2 to monomer units containing {R”Si(OCH3)2}, {R”Si(OCH3)}, {R”Si}, {R”Si(OCH3)2(OH)}, {R”Si(OCH3)(OH)2}, {R”Si(OH)3}, or combinations thereof is 10:1 to 1:9, 1:8, 1:7, 1:6. , 1:5, 1:4, 1:3, 1:2, or 1:1, 9:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 8:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 7:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1 :2, or 1:1, 6:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 5:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 4:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 2:1 The ratios can be 10:1 to 1:10, such as 1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 2:1 to 1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1 to 1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, or 1:2. In further embodiments, the alkylsilane polymer may consist of monomer units containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 It may include a condensation product with monomer units containing {(OSi(OCH3)2[CH2]8Si(OCH3)2} or combinations thereof. In some embodiments, the monomer units include {(OSi(OCH3)2[CH2]8Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17The ratio of monomer units containing Si, or combinations thereof, is 10:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 9:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 8:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 7:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 6:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, and Alternatively, it could be 1:1, 5:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 4:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 2:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 2:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, or 1:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, or 1:2, which could be 10:1~1:10. In a further embodiment, the alkylsilane polymer comprises monomer units containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17 It may include condensation products with monomer units containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} or combinations thereof. In some embodiments, the monomer units containing {(OSi(OCH3)2[CH2]6Si(OCH3)2} and {(CH3)(CH2) 17 Si(OCH3)}, {(CH3)(CH2)} 17The ratio of monomer units containing Si, or combinations thereof, is 10:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 9:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 8:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 7:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1; 6:1~1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, and Alternatively, the ratios could be 10:1 to 1:10, such as 1:1, 5:1 to 1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 4:1 to 1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, 2:1 to 1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, 1:2, or 1:1, or 1:1 to 1:9, 1:8, 1:7, 1:6, 1:5, 1:4, 1:3, or 1:2. In some embodiments, at least a portion of the monomer unit can be linked to the substrate. In a further embodiment, the condensation product may further comprise monomer units including {R”Si(R”')2}, {R”Si(R”')}, {R”Si}, {R”Si(R”')2(OH)}, {R”Si(R”')(OH)2}, {R”Si(OH)3}, or combinations thereof, where R” is (C5-C38)alkyl and each R”' is selected from a methoxy group, an ethoxy group, a hydroxyl group, or a bond to a substrate.

[0345] In further embodiments, the polymer may be a homopolymer of a single alkylsilane (e.g., a single bis-silane). Alternatively, in further embodiments, the polymer may be a copolymer of more than one alkylsilane. For example, the polymer may be a copolymer of an alkylsilane contributing to the siloxane portion of the structure and an additional alkylsilane, as discussed above. An exemplary embodiment of the copolymer in the structure discussed herein is the product obtained by copolymerizing 1,8-bis(chlorodimethylsilyl)octane (see Figure 17A) with dichloro-tetramethyl-disoloxane (see Figure 17D). An additional exemplary embodiment of the copolymer in the structure discussed herein is the product obtained by copolymerizing 1,8-bis(dimethylmethoxysilyl)octane (see Figure 17H) with dichloro-tetramethyl-disoloxane (see Figure 17D). In further embodiments, at least one of the alkylsilanes in the copolymer may be a bissilane, and at least one of the alkylsilanes may contain a non-fluorine halogen. For example, the structure of the copolymer may be {OSi(R')2[CH2] m [Si(R)2O] n Si(R')2[CH2]p[Si(R")2] x} qR can be a hydroxyl group, a chloro group, a bromo group, an alkoxide, an alkylsilane, or a combination thereof. In certain embodiments, R can be a methoxy group, an ethoxy group, or a combination thereof. It may be an alkoxide containing a combination. In further embodiments, n may be 1. In further embodiments, n may be 2 or more (e.g., 2 to 10, 2 to 5, or 2), and q may be within one or more of the corresponding ranges in the latter half of this paragraph. For example, when n is 2 or more (e.g., 2 to 10, 2 to 5, or 2), one or more of the following may also be true: R' may be CH3, R'' may be CH3, m may be 8, p may be 8, or a combination thereof. In further embodiments, the degree of polymerization of the polymer may be 1 or more, 2 or more, 5 or more, 10 or more, 20 or more, 50 or more, 100 or less, 75 or less, 60 or less, 40 or less, 25 or less, 15 or less, or 9 or less. In further embodiments, the degree of polymerization of the polymer can be within the range of 1 to 100, 2 to 100, 5 to 75, 10 to 60, 20 to 40, or any range or partial range between these. In further embodiments, the degree of polymerization of the polymer can be about 40 or less, for example, 1 to 40, 1 to 25, 1 to 15, 1 to 10, 2 to 5, or any range or partial range between these.

[0346] In further embodiments, the alkylsilane may be part of a block copolymer of alkylsilane bonded to the first main surface 105 of the substrate, the planarization layer 123, and / or the fourth main surface 207 of the optical stack 203, 203a, or 203b. In further embodiments, the block copolymer may include blocks corresponding to the polymers described in the preceding paragraph. In further embodiments, the block copolymer may include dialkylsiloxane (e.g., dimethylsiloxane and / or diethylsiloxane, or a combination thereof) blocks. In further embodiments, the block copolymer may be (i)C3-C 34 The copolymer contains alternating stacked blocks containing alkyl groups and (ii) dialkylsiloxanes (e.g., dimethylsiloxane, diethylsiloxane, or a combination thereof). In a further embodiment, monomers in one or more blocks of the block copolymer can be bonded together by disiloxane groups. In a further embodiment, the disiloxane groups may include one or more dialkylsiloxanes (e.g., dimethylsiloxane, diethylsiloxane, or a combination thereof). In a further embodiment, the copolymer can be alternately stacked between blocks of one extra bisalkylsilane and an additional alkylsilane, which mainly contribute to the siloxane (e.g., dialkylsiloxane, dimethylsiloxane) portion of the resulting copolymer. In a further embodiment, the dialkylsiloxane (e.g., dimethylsiloxane, diethylsiloxane, or a combination thereof) blocks of the block copolymer can correspond to the silica-like network described in the following paragraph for the planarization layer 123.

[0347] As used herein, the “free end” of a molecule refers to the end of a polyatomic chain that is not bonded to another molecule (or another part of the same molecule that lies at the free end). In this sense, the “free end” is “free” to interact with potential fingerprints or other materials. The “free end” can correspond to the terminal monomer (and / or terminal part thereof) of a polymer material. In some embodiments, the silane group of an alkylsilane may be at the free end of the alkylsilane. Alternatively or in addition to this, the free end of an alkylsilane may contain a non-fluorohalogen (e.g., chlorine). In some embodiments, the alkylsilane may be a bis-silane or a tris-silane. An exemplary embodiment of a bis-silane is 1,8-bis(chlorodimethylsilyl)octane, as shown in Figure 17A. As discussed above, alkylsilanes can include structures shown in Figure 18A, for example, as the product of the homopolymerization of (i) bis(chlorodimethylsilyl)octane (see Figure 17A) and / or (ii) the product of copolymerizing 1,8-bis(chlorodimethylsilyl)octane (see Figure 17A) with dichloro-tetramethyl-disoloxane (see Figure 17D). Another exemplary embodiment of bis-silane is 1,8-bis(dimethylmethoxysilyl)octane, as shown in Figure 17H. As discussed above, alkylsilanes may include structures shown in Figure 18A, for example, as the product of the homopolymerization of (i) 1,8-bis(dimethylmethoxysilyl)octane (see Figure 17H) and / or (ii) the product of copolymerizing 1,8-bis(dimethylmethoxysilyl)octane (see Figure 17H) with dichlorotetramethyl-disoloxane (see Figure 17D). In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) may include alkylsilanes directly bonded to another part of the coated article (e.g., the first main surface 105 of the substrate, the planarization layer 123, the fourth main surface 207 of the optical stack 203, 203a, or 230b). In further embodiments, alkylsilanes may be directly bonded through the silane groups of the alkylsilane.Alternatively, or in addition to this, the free end of the alkylsilane may contain a non-fluorohalogen (e.g., chlorine) and / or another silane (e.g., the alkylsilane may be a bis-silane).

[0348] When used herein, the elemental composition of the surface modification layer 113 (e.g., a fingerprint-hiding coating) is determined using X-ray photoelectron spectroscopy (XPS). In some embodiments, the surface modification layer may be fluorine-free. In some embodiments, the surface modification layer 113 (e.g., a fingerprint-hiding coating) may contain silicon atoms, oxygen atoms, carbon atoms, and hydrogen atoms. In further embodiments, the surface modification layer 113 (e.g., a fingerprint-hiding coating) may further contain nitrogen atoms. In further embodiments, oxygen atoms in the surface modification layer may be more common than any other atoms in the surface modification layer detected by XPS. In further embodiments, the surface modification layer may contain about 30 atomic% or less of carbon, about 25 atomic% or less of carbon, about 10 atomic% or less of carbon, about 2 atomic% or more of carbon, or about 5 atomic% or more of carbon. By providing a fluorine-free surface modification layer 113 (e.g., a fingerprint-hiding coating), it may be cheaper to produce and / or more environmentally friendly.

[0349] In some embodiments, the outer surface (e.g., outer surface 115) of the surface modification layer 113 (e.g., fingerprint-concealing coating) may be fluorine-free. In some embodiments, the outer surface (e.g., outer surface 115) of the surface modification layer 113 (e.g., fingerprint-concealing coating) may be free of transition metal-containing compounds. In some embodiments, the outer surface (e.g., outer surface 115) of the surface modification layer 113 (e.g., fingerprint-concealing coating) may contain non-zero amounts of non-fluorine halogens (e.g., chlorine, bromine, iodine). In a further embodiment, the amount of non-fluorinated halogen outside the surface modification layer 113 can be about 0.5 atomic% or more, about 0.7 atomic% or more, about 0.8 atomic% or more, about 1 atomic% or more, about 1.2 atomic% or more, about 1.5 atomic% or more, about 2 atomic% or less, about 1.5 atomic% or less, about 1.3 atomic% or less, about 1 atomic% or less, about 0.9 atomic% or less, about 0.8 atomic% or less, or about 0.7 atomic% or less. In a further embodiment, the amount of non-fluorinated halogen outside the surface modification layer 113 (e.g., fingerprint-concealing coating) can be about 0.5 atomic% to about 2 atomic%, about 0.7 atomic% to about 1.5 atomic%, about 0.8 atomic% to about 1.5 atomic%, about 1 atomic% to about 1.3 atomic%, or any range or partial range between these. In a further embodiment, the non-fluorine halogen may be chlorine, and the amount of chlorine outside the surface modification layer 113 (e.g., fingerprint-concealing coating) may be within one or more of the ranges mentioned above in this paragraph.

[0350] As shown in Figures 35 and 36A-36C, the coated articles 3501, 3601, 3611, or 3621 include a planarization layer 123 positioned between a substrate 103 (e.g., disposed covering a first main surface 105 of the substrate 103) and a surface modification layer 113 (e.g., an inner surface 117 of the surface modification layer 113). The planarization layer 123 includes a first surface area 125 facing the first main surface 105 of the substrate 103 and a second surface area 127 (on the opposite side of the first surface area 125) facing and / or bonded to the surface modification layer 113 (e.g., an inner surface 117 of the surface modification layer 113). In some embodiments, as shown in Figure 35, the planarization layer 123 (e.g., the second surface area 127) may be disposed on and / or bonded to the first main surface 105 of the substrate 103. In some embodiments, as shown in Figures 36A to 36C, the planarization layer 123 (e.g., a second surface area 127) may cover, be positioned on, and / or in contact with an optical stack 203, 203a, or 203b positioned between the planarization layer 123 and the substrate 103. The planarization thickness 129 is defined as the average distance between the first surface area 125 and the second surface area 127. In some embodiments, the planarization thickness 129 may be about 10 nm or more, about 20 nm or more, about 50 nm or more, about 100 nm or more, about 200 nm or more, about 600 nm or less, about 500 nm or less, about 400 nm or less, about 350 nm or less, or about 300 nm or less. In some embodiments, the planarization thickness 129 can be in the range of approximately 10 nm to approximately 500 nm, approximately 20 nm to approximately 400 nm, approximately 20 nm to approximately 300 nm, approximately 20 nm to approximately 200 nm, approximately 20 nm to approximately 150 nm, approximately 20 nm to approximately 100 nm, approximately 50 nm to approximately 100 nm, or any range or partial range between these. In some embodiments, the planarization thickness 129 can be in the range of approximately 10 nm to approximately 600 nm, approximately 20 nm to approximately 500 nm, approximately 50 nm to approximately 400 nm, approximately 100 nm to approximately 350 nm, approximately 200 nm to approximately 300 nm, or any range or partial range between these. In exemplary embodiments, the planarization thickness 129 can be 10 nm to 600 nm or 20 nm to 100 nm. The planarization thickness 129 is determined by polarization analysis.

[0351] In some embodiments, the silica-like network of the planarization layer 123 of this disclosure can be readily distinguished from other silicon-containing oxides (e.g., silica capping layers) by properties considered herein (e.g., hydroxyl content, hardness, refractive index, surface power spectral density, surface roughness Ra). For example, the silica-like network may contain a higher hydroxyl content than the capping layer, and / or may exhibit lower hardness, lower elastic modulus, and / or higher refractive index than the corresponding properties of the capping layer. As used herein, the term “planarization layer” is not intended to be limited by a specific surface roughness Ra (or a specific reduction of surface roughness Ra on the surface to which the planarization layer is disposed). Instead, the planarization may include any of the embodiments considered herein, in addition to, or instead of, surface roughness Ra properties, hydroxyl content and / or power spectral density.

[0352] Throughout this disclosure, the elastic modulus (e.g., Young's modulus) of the planarization layer 123 is determined using nanoindentation with a Berkovich diamond indenter tip. See Fischer-Cripps, AC, “Critical Review of Analysis and Interpretation of Nanoindentation Test Data,” Surface & Coatings Technology, 200, 4153-4165 (2006); and Hay, J., Agee, P, and Herbert, E., “Continuous Stiffness Measurement During Instrumented Indentation Testing, Experimental Techniques,” 34(3) 86-94 (2010). For the coating, the instantaneous estimate of the elastic modulus is measured as a function of the indentation depth. The elastic modulus is taken as the maximum instantaneous estimate of the elastic modulus for measurements within the range obtained by subtracting 5 nm of the planarization layer 123 from the outer surface 115, starting from 50% of the planarization thickness 129 closest to the outer surface 115 (i.e., the first surface area 125). While we do not wish to be bound by theory, if the coating is of sufficient thickness, it is possible to isolate the properties of the coating from adjacent coatings based on the response profile obtained as a function of depth. The extraction of reliable nano-impregnation data is based on well-established protocols described in the references mentioned above. Otherwise, significant errors can occur in these metrics.

[0353] Throughout this disclosure, the hardness of planarized layers with a thickness of at least 30 nm is measured in a Berkovich indenter hardness test as the maximum hardness recorded in the range from the first surface area 125 of the 20 nm planarized layer 123 to 60% of the planarization thickness 129 (from the first surface area 125 of the planarized layer 123). It has been found that measurements closer to the surface than 20 nm tend to underestimate the hardness, while measurements closer to 40% of the planarization thickness to the underlying layer can be significantly influenced by the properties of the underlying layer. It is considered that reliable hardness measurements cannot be obtained for planarized layers with a thickness of 30 nm or less. In some embodiments, the elastic modulus of the flattening layer 123 can be approximately 9 GPa or more, approximately 10 GPa or more, approximately 12 GPa or more, approximately 15 GPa or more, approximately 20 GPa or more, approximately 25 GPa or more, approximately 70 GPa or less, approximately 60 GPa or less, approximately 50 GPa or less, approximately 40 GPa or less, approximately 38 GPa or less, approximately 35 GPa or less, approximately 30 GPa or less, or approximately 25 GPa or less. In some embodiments, the elastic modulus of the flattening layer 123 can be approximately 9 GPa to approximately 70 GPa, approximately 9 GPa to approximately 60 GPa, approximately 9 GPa to approximately 50 GPa, approximately 10 GPa to approximately 40 GPa, approximately 12 GPa to approximately 38 GPa, approximately 15 GPa to approximately 35 GPa, approximately 20 GPa to approximately 30 GPa, or any range or partial range between these.

[0354] In some embodiments, the planarization layer 123 may include silica or a partially silica-like network. A silica-like network refers to the coordination of silicon atoms bonded together by oxygen atoms having four Si-O bonds with the silicon atoms, corresponding to an SiO2 network. As used herein, the fraction of silicon atoms in a silica-like network is all Si-O-Si bends (approximately 1105 cm²). -1 Si-O-Si bend (e.g., approximately 1000 cm) for POSS (including T-shaped expansion and contraction) -1 ~1060cm -1The absorption intensity related to the above is determined by Fourier transform infrared (FTIR) spectroscopy. In some embodiments, the percentage of silicon atoms in the planarization layer 123 in the silica-like network can be about 50% or more, about 60% or more, about 65% or more, about 70% or more, about 90% or less, about 80% or less, about 75% or less, or about 70% or less. In some embodiments, the percentage of silicon atoms in the planarization layer 123 in the silica-like network can be in the range of about 50% to about 90%, about 60% to about 80%, about 65% to about 75%, or any range or partial range between these. By providing a partial silica-like network, it is possible to make the planarization layer rigid (e.g., with an elastic modulus of about 9 GPa or more) while maintaining sufficient flexibility to withstand abrasion with the surface modification layer disposed thereon.

[0355] The ratio of Si-O-Si bonds to silicon atoms in planarization layer 123 is determined by (a) XPS to determine the amount of Si-O bonds based on the Si 2p fine structure relative to the total amount of Si, or (b) fitting the observed chemical shifts to six Gaussian curves corresponding to different coordination structures (e.g., T units, D units, M units, and three Q units with different numbers of hydroxyls). 29 The measurement can be performed using Si solid-state nuclear magnetic resonance (NMR), where the functional groups bonded to the silicon atoms can be substituted with organic groups (e.g., carbon). In some embodiments, the ratio of Si-O-Si bonds to silicon atoms in the planarization layer 123 can be about 2 or more, about 2.2 or more, about 2.4 or more, about 2.6 or more, about 3 or less, about 2.9 or less, about 2.8 or less, or about 2.75 or less. In some embodiments, the ratio of Si-O-Si bonds to silicon atoms in the planarization layer 123 can be about 2 to about 3, about 2.2 to about 2.9, about 2.4 to about 2.8, about 2.6 to about 2.75, or any range or partial range between these.

[0356] In some embodiments, the planarization layer 123 may include one or more of the following: (1) a percentage of silicon atoms in a silica-like network within one or more of the ranges considered above (e.g., about 50% to about 90%), or (2) a ratio of Si-O-Si bonds to silicon atoms within one or more of the ranges considered above (e.g., about 2 to about 3). In some embodiments, the planarization layer 123 may include nitrogen atoms, for example, nitrogen atoms bonded to silicon atoms. For example, the planarization layer 123 may be a product of polysilazane that covers and / or is at least partially cured on the first main surface 105 of the substrate 103, which can be reacted with silane after at least partially curing (to form a surface modification layer thereon). Alternatively, the planarization layer 123 may be nitrogen-free. In some embodiments, the planarization layer 123 may be a product of ion beam impacting the first main surface 105 of the substrate while it is reacting with silane after ion beam treatment (for forming a surface modification layer thereon), where a functionalized polyhedral oligomer silsesquioxane (POSS) (as defined below) covers and / or is disposed on the first main surface 105. In some embodiments, the planarization layer 123 may be the result of thermal curing of a POSS (e.g., hydrogen POSS) compound covering and / or disposed on the first main surface 105 of the substrate 103, which can then be reacted with silane after thermal curing (for forming a surface modification layer thereon). In some embodiments, the surface modification layer 113 (e.g., a fingerprint-hiding coating) may contain at least one alkylsilane on its outer surface 115, bonded (either directly or indirectly) to the Si-O groups in the planarization layer 123. In some embodiments, the surface modification layer 113 and / or the planarization layer 123 do not contain fluorine and / or nitrogen. In some embodiments, the surface modification layer 113 and / or the planarization layer may consist of carbon, oxygen, silicon, hydrogen, and oxygen.

[0357] One method for quantifying the amount (e.g., density) of hydroxyls in the surface modification layer 113 (e.g., below the alkylsilane) is based on the molar ratio determined by secondary ion mass spectrometry (SIMS). Unless otherwise specified, samples were cleaned with a low-energy Ar gas cluster ion beam (GCIB) source before analysis by SIMS. The molar ratio at the surface can be measured using static SIMS. Unless otherwise specified, the molar ratio is for most surface modification layers using dynamic SIMS (D-SIMS). Unlike static SIMS, dynamic SIMS corrodes the surface to provide depth-resolved composition information. As used herein, D-SIMS was performed using a time-of-flight secondary ion mass spectrometer (ToF-SIMS) with a dual-beam configuration. Unless otherwise specified, the TOF-SIMS used for the results reported herein was the TOF-SIMS M6 instrument (available from IONTOF GmbH) equipped with a nanoprobe 50 bismuth source. The TOF-SIMS M6 instrument was operated in a dual-beam configuration, where the analytical beam was a 30 kiloelectron volt (keV) Bi3 with a current of approximately 0.1 pA. + The beam is a sputtered beam with a current of approximately 120 nA and is 2 keV Cs + The sputtered beam was configured to form a 300 μm × 300 μm sputtered "crater," and the analytical beam was configured to collide with a 75 μm × 75 μm area centered on the sputtered "crater." Charge compensation was achieved using an electron flood gun operating with a beam current of 20 nA, an electron energy of 20 eV, and a spot size of 1.5 mm focused on the location where the analytical beam collided. The chamber was 5 × 10 -7 Pascal (5 x 10 -9 After vacuuming to a pressure of millibars, use argon (e.g., 99.99999% purity) to perform 5 × 10⁻¹⁰ -5 Pascal (5 x 10 -7The pressure was set to millibars and maintained. Data was collected in negative ion mode using an analyzer in "universal" mode, with an analyzer energy of 3000V and a cycle time of 100 microseconds. The data was processed using Surface Lab software (version 7.3.125519, available from IONTOF GmbH). 16 O 1 H - , 18 O - , and 28 Si - To obtain the molar ratio from the signal, 18 O - and 17 O - Using the known isotopic ratios between, 16 O 1 H - From the traffic light 17 O - The interference was subtracted. The normalized intensity was corrected for mass interference. 16 O 1 H signal 28 Si - Defined as the result of dividing by the signal. Normalized intensity ( 16 O 1 H - / 28 Si - ) is further corrected to obtain the background signal (normalized intensity measured simultaneously from GE Type 124 fused silica ( 16 O 1 H - / 28 Si - The "corrected signal" was determined by removing the (determined from) (and so on). The corrected signal was converted to the molar ratio of hydrogen to silicon ("molar ratio") using a calibration curve (derived from a series of natural mid-ocean ridge basalt (MORB) glasses with known -OH concentrations, as well as other silica and silicate minerals covering the range of 0.0 wt% to 1.98 wt%) using the formula "molar ratio" = 1.26 × "corrected signal" - 0.025.

[0358] Throughout this disclosure, “molar ratio” refers to the molar ratio of hydrogen to silicon (i.e., the molar amount of hydrogen divided by the molar amount of silicon), as determined by SIMS analysis of the material (e.g., the surface modification layer beneath the alkylsilane). While we do not wish to be bound by theory, hydrogen is considered to represent a hydroxyl group (e.g., silanol, Si-OH). In some embodiments, the molar ratio (of hydrogen to silicon) of the surface modification layer beneath the alkylsilane can be about 0.2 or greater (e.g., about 0.2 or greater), about 0.21 or greater, about 0.22 or greater, about 0.23 or greater, about 0.24 or greater, about 0.25 or greater, about 0.45 or less, about 0.4 or less, about 0.37 or less, about 0.35 or less, about 0.32 or less, about 0.30 or less, or about 0.28 or less. In some embodiments, the molar ratio (of hydrogen to silicon) can be within the range of about 0.2 to about 0.45, about 0.20 to about 0.4 (e.g., about 0.2 to about 0.4), about 0.21 to about 0.37, about 0.22 to about 0.35, about 0.23 to about 0.32, about 0.24 to about 0.32, about 0.24 to about 0.30, about 0.25 to about 0.28, or any range or partial range between these. In exemplary embodiments, the molar ratio of hydrogen to silicon can be within the range of 0.20 to 0.4 or about 0.22 to about 0.35. For example, as discussed below with reference to Figure 34, surface modified layers according to embodiments of the present disclosure (e.g., Examples 35 to 44) exhibit a molar ratio of hydrogen to silicon of 0.20 or greater, about 0.20 to 0.4, or about 0.22 to about 0.35. In contrast, conventional methods of silica deposition (Comparative Examples JJ-KK) have a molar ratio of about 0.10 or less, meaning that Examples 35-44 have a molar ratio at least about twice (2×) that of Comparative Examples JJ-KK. In some embodiments, the molar ratio at the surface can be within any of the ranges listed above in this paragraph. In some embodiments, the molar ratio (of hydrogen to silicon) of the surface-modified layer can be greater than the molar ratio of the reactively sputtered silica layer by a multiple of 2 or more, 2.5 or more, 3 or more, 4 or more, 10 or less, 7 or less, 5 or less, or 4 or less.In some embodiments, the molar ratio (of hydrogen to silicon) of the surface-modified layer can be a multiple within the range of about 2–10, 2–7, 2.5–5, 2.5–4, 3–4, or any range or partial range between them, compared to the molar ratio of the reactively sputtered silica layer. In some embodiments, the ionic intensity of carbon (as a ratio to the ionic intensity of silicon) can be within the range of about 0.01 or less, about 0.005 or less, about 0.002 or less, or about 0.001 or less, for example, about 0.00001–0.01, about 0.00005–0.005, about 0.0001–0.002, about 0.0005–0.001, or any range or partial range between them. The carbon intensity is based on measurements corrected to remove background signals (as would be determined from carbon intensity measured from fused silica).

[0359] In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) and / or the coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621 may include an average transmittance of about 80% or more, about 85% or more, about 88% or more, about 89% or more, about 90% or more, about 91% or more, about 92% or more, or about 93% or more (as described above). In some embodiments, the average transmittance of the surface modification layer 113 (e.g., fingerprint-concealing coating) and / or the coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621 may be in the range of about 80% to 100%, about 85% to about 99%, about 88% to about 97%, about 89% to about 97%, about 90% to about 96%, about 91% to about 95%, about 92% to about 94%, or any range or partial range between these. In some embodiments, the transmittance of the surface modification layer 113 (e.g., fingerprint-concealing coating) and / or the coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621 at 550 nm may be in the range of one or more of the ranges mentioned above in this paragraph for the average transmittance.

[0360] As used herein, haze refers to transmitted haze measured at 0° with respect to the direction perpendicular to the outer surface 115, through the surface modification layer 113 (e.g., fingerprint-hiding coating) and / or coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621 (through the outer surface 115) according to ASTM D1003-21. The haze is measured using a HAZE-GARD PLUS available from BYK Gardner, which has an aperture on the source port. The aperture has a diameter of 8 mm. CIE C illumination light is used as a light source to illuminate the surface modification layer 113 (e.g., fingerprint-hiding coating) and / or coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621. In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) and / or the coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621 include haze of about 5% or less, about 2% or less, about 1.5% or less, about 1% or less, about 0.5% or less, or about 0.1% or less, for example, about 0.01% to about 5%, about 0.01% to about 2%, about 0.05% to about 1.5%, about 0.05% to about 1%, about 0.1% to about 0.5%, or any range or partial range between these.

[0361] Throughout this disclosure, the contact angle is determined using a 30-gauge needle for a corresponding liquid droplet (not treated with plasma or corona) placed on the outer surface, and the contact angle is measured using a goniometer in accordance with ASTM D5946. If the contact angle cannot be reliably determined due to a high degree of droplet diffusion corresponding to a contact angle of 15° or less, the coating is said to "wet" the droplet material. As used herein, the water contact angle is measured using a droplet of deionized water. As used herein, a coating is "hydrophobic" if it has a water contact angle of 90° or more. As used herein, a coating is "superhydrophobic" if it has a water contact angle of 130° or more. As used herein, a "as-formed" coating refers to a coating that has not been subjected to abrasion (see, for example, the steel wool abrasion test and cheese cloth abrasion test below). As used herein, a coating is "lipophilic" if it has a hexadecane contact angle of less than 40°.

[0362] As used herein, the "uniformity" of the water contact angle is determined based on water contact angle measurements at least every 5 mm over a 50 mm × 50 mm area of ​​the outer surface. Here, uniformity is calculated as (maximum - minimum) / (2 × average) × 100%, where "maximum" and "minimum" refer to the corresponding extreme values, and "average" is the average value of the water contact angle measurements. In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) can exhibit a water contact angle uniformity of about 10% or less or about 9% or less. In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) can exhibit a water contact angle uniformity within a range of 1% to 10%, 5% to 9%, or any range or partial range between these.

[0363] In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) (in its as-formed state) is hydrophobic but not superhydrophobic. In some embodiments, the water contact angle of the surface modification layer 113 (e.g., a fingerprint-concealing coating) (in its as-formed state) can be approximately 90° or more, approximately 95° or more, approximately 100° or more, approximately 105° or more, approximately 110° or more, approximately 115° or more, approximately 120° or less, approximately 115° or less, approximately 110° or less, or approximately 105° or less. In some embodiments, the water contact angle of the surface modification layer 113 (e.g., a fingerprint-concealing coating) (in its as-formed state) can be approximately 90° to approximately 120°, approximately 95° to approximately 115°, approximately 95° to approximately 110°, approximately 100° to approximately 110°, approximately 105° to approximately 110°, or any range or partial range between these. In some embodiments, the diiodomethane contact angle of the surface modification layer 113 (e.g., a fingerprint-concealing coating) (in its as-formed state) can be approximately 60° or more, approximately 61° or more, approximately 62° or more, approximately 65° or more, approximately 80° or less, approximately 75° or less, approximately 73° or less, or approximately 70° or less. In some embodiments, the diiodomethane contact angle of the surface modification layer 113 (e.g., a fingerprint-concealing coating) (in its as-formed state) can be approximately 60° to approximately 80°, approximately 61° to approximately 75°, approximately 61° to approximately 72°, approximately 62° to approximately 70°, or any range or partial range between these. In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) can be lipophilic. In some embodiments, the oleic acid contact angle of the surface modification layer 113 (e.g., a fingerprint-concealing coating) (e.g., as formed) can be about 50° or less, about 45° or less, about 40° or less, about 35° or less, about 30° or less, about 25° or less, or about 20° or less, or the surface modification layer 113 (e.g., a fingerprint-concealing coating) can wet oleic acid. In further embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) (e.g., as formed) wets oleic acid.By providing a low diiodomethane contact angle (e.g., about 60° or more) and / or a low hexadecane contact angle (e.g., about 20° or less), the visibility and / or color shift associated with fingerprints can be reduced by allowing fingerprint oil to disperse across the surface modification layer 113 (e.g., fingerprint-concealing coating) rather than forming noticeable droplets. By providing a high water contact angle (e.g., about 90° or more, about 95° or more, or about 100° or more), the removal of aqueous materials (e.g., water droplets, sweat droplets) from the surface modification layer 113 (e.g., fingerprint-concealing coating) can be enhanced.

[0364] Throughout this disclosure, the surface energy (e.g., total surface energy) and its components (e.g., polarity, dispersibility) are calculated using the Wu model based on contact angle measurements, as described above. In some embodiments, the surface modification layer 113 (e.g., fingerprint-concealing coating) may have a total surface energy of about 35 millinewtons per meter (mN / m) or less, about 32 mN / m or less, about 31 mN / m or less, about 30 mN / m or less, about 29 mN / m or less, about 28 mN / m or less, about 27 mN / m or less, about 25 mN / m or more, about 26 mN / m or more, about 28 mN / m or more, about 30 mN / m or more, about 31 mN / m or more, or about 32 mN / m or more. In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) may contain a total surface energy of approximately 25 mN / m to approximately 35 mN / m, approximately 26 mN / m to approximately 32 mN / m, approximately 26 mN / m to approximately 30 mN / m, approximately 26 mN / m to approximately 29 mN / m, approximately 26 mN / m to approximately 28 mN / m, or any range or partial range between these. In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) may contain a dispersive surface energy of approximately 30 mN / m or less, approximately 28 mN / m or less, approximately 27 mN / m or less, approximately 26 mN / m or less, approximately 25 mN / m or less, approximately 24 mN / m or less, or approximately 23 mN / m or less. In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) may contain dispersive surface energies in the ranges of approximately 15 mN / m to approximately 30 mN / m, approximately 18 mN / m to approximately 30 mN / m, approximately 20 mN / m to approximately 28 mN / m, approximately 22 mN / m to approximately 28 mN / m, approximately 24 mN / m to approximately 27 mN / m, or any range or partial range in between. In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) may contain polar surface energies of approximately 6 mN / m or less, approximately 5 mN / m or less, approximately 4 mN / m or less, approximately 3 mN / m or less, or approximately 2 mN / m or less. In some embodiments, the surface modification layer 113 (e.g., a fingerprint-concealing coating) may contain dispersive surface energies in the ranges of approximately 0.5 mN / m to approximately 6 mN / m, approximately 1 mN / m to approximately 6 mN / m, approximately 1.5 mN / m to approximately 6 mN / m, approximately 2 mN / m to approximately 6 mN / m, approximately 2 mN / m to approximately 5 mN / m, approximately 2 mN / m to approximately 4 mN / m, or any range or subrange between these ranges.By providing a low polarity surface energy and / or a highly dispersible surface energy a, it is possible to disperse oil (e.g., fingerprint oil) across the surface (e.g., lipophilic) of the surface modification layer 113 (e.g., fingerprint-concealing coating), thereby reducing the visibility and / or color shift associated with fingerprints.

[0365] Throughout this disclosure, a "steel wool abrasion test" is used to determine the durability of the coating. For the steel wool abrasion test, steel wool (Bonstar #0000) was cut into strips (25 mm x 12 mm), placed on a sheet of aluminum foil, and baked in an oven at 100°C for 2 hours. The steel wool strips were attached to an attachment (10 mm x 10 mm) of an abrader (5750, Taber Industries) using cable ties. A total of 720 grams of weight was added to the Taber arm to provide a total applied load of 1 kilogram. The stroke length was set to 25 mm, the speed to 60 cycles per minute, and the test was performed at 23°C. The area to be abraded was marked on the back of the sample for tracking. The coating sample was fixed to the abrader and subjected to 2,000 or 3,500 cycles. After abrading the coating for the predetermined number of cycles, the abrasion water contact angle was measured according to the method for contact angles described above. High contact angles (e.g., approximately 80° or higher, approximately 85° or higher, approximately 90° or higher) indicate a surface modification layer 113 (e.g., a fingerprint-concealing coating) that can withstand the steel wool abrasion test. A decrease in contact angle below 70° correlates with the loss of the surface modification layer 113 (e.g., a fingerprint-concealing coating). In some embodiments, the abrasion water contact angle after 2,000 and / or 3,500 cycles in the steel wool abrasion test can be approximately 80° or higher, 85° or higher, approximately 88° or higher, or approximately 90° or higher.

[0366] Throughout this disclosure, a "cheese cloth abrasion test" is also used to determine the durability of the coating. In the cheese cloth abrasion test, four layers of cheese cloth wrap (Crockmeter Squares for American Standards, 200877; SDL Atlas USA, Rock Hill, SC) are applied to the tip of a cylindrical Linear Taber abrader (Model 5750; Taber Industries, North Tonawanda, NY) with a radius of 2 cm under a constant load of 750 grams. The path length of each swipe is 15 mm, and each cycle includes forward and backward swipes to return the tip to its original position before proceeding to the next cycle. The speed is 30 cycles per minute, and the test is performed at 23°C. After abrading the coating for 200,000 cycles, the cheese cloth abrasion water contact angle is measured according to the method for contact angles described above. In some embodiments, the cheese cloth abrasion water contact angle of the surface modification layer 113 (e.g., a fingerprint-concealing coating) can be about 80° or more, about 85° or more, about 90° or more, about 95° or more, about 100° or more, about 105° or more, or about 110° or more. In some embodiments, the difference between the water contact angle of the (as formed) surface modification layer 113 (e.g., a fingerprint-concealing coating) and the cheese cloth abrasion water contact angle (after 200,000 cycles) can be about 15° or less, about 12° or less, about 10° or less, or about 8° or less. As demonstrated by the results of steel wool abrasion tests and cheese cloth abrasion tests, the surface modification layer 113 (e.g., a fingerprint-concealing coating) of the present disclosure can withstand abrasion and maintain a good contact angle.

[0367] Throughout this disclosure, a “rubber abrasion test” is also used to determine the durability of the coating. In the rubber abrasion test, a 6 mm diameter × 20 mm rubber rod is attached to a 5 mm long cylindrical tip of a Linear Taber abrader (Model 5750; Taber Industries, North Tonawanda, NY) under a constant load of 1 kg. The rubber rod used herein was Testick (available from Hwarang) with a hardness of 88 (HDC, as measured by a hardness tester). The path length of each swipe is 15 mm, and each cycle includes forward and backward swipes to return the tip to its original position before proceeding to the next cycle. The speed is 40 cycles per minute, and the test is performed at 23°C. After abrading the coating for 3,000 cycles, the rubber abrasion water contact angle is measured according to the method for contact angles described above. In some embodiments, the rubber abrasion water contact angle of the surface modification layer 113 (e.g., fingerprint-concealing coating) can be about 80° or more, about 85° or more, about 90° or more, about 95° or more, about 100° or more, about 105° or more, or about 110° or more. In some embodiments, the difference between the water contact angle of the (as formed) surface modification layer 113 (e.g., fingerprint-concealing coating) and the rubber abrasion water contact angle (after 3,000 cycles) can be about 15° or less, about 12° or less, about 10° or less, or about 8° or less.

[0368] As used herein, “surface roughness” means Ra surface roughness, which is the arithmetic mean of the absolute deviations of the surface profile from the mean position in the direction perpendicular to the surface of the test area. Ra surface roughness values ​​for a 2 μm × 2 μm test area using an atomic force microscope (AFM). In some embodiments, the surface modification layer 113 and / or planarization layer 123 may contain a surface roughness Ra (e.g., as formed) of about 1 nm or less, 0.8 nm or less, 0.7 nm or less, about 0.6 nm or less, about 0.5 nm or less, about 0.1 nm or more, about 0.2 nm or more, about 0.3 nm or more, or about 0.4 nm or more. In some embodiments, the surface modification layer 113 and / or planarization layer 123 may include a surface roughness Ra (e.g., as formed) in the range of about 0.1 nm to about 1 nm, about 0.2 nm to about 0.8 nm, about 0.3 nm to about 0.7 nm, about 0.4 nm to about 0.5 nm, or any range or partial range in between.

[0369] Throughout this disclosure, the coefficient of friction refers to the dynamic coefficient of friction measured in accordance with ASTM D1894-14. In some embodiments, the outer surface 115 of the surface modification layer 113 (e.g., fingerprint-hiding coating) may include a dynamic coefficient of friction of about 0.25 or less, about 0.22 or less, about 0.20 or less, about 0.18 or less, or about 0.15 or less. In some embodiments, the outer surface 115 of the surface modification layer 113 (e.g., fingerprint-hiding coating) may include a dynamic coefficient of friction within the range of 0.05 to about 0.25, about 0.10 to about 0.22, about 0.12 to about 0.20, about 0.15 to about 0.18, or any range or partial range between these.

[0370] Throughout this disclosure, the refractive indices of coatings and films are measured by spectroscopic polarization analysis using a Woollam M-2000 and modeled using Woollam CompleteEase software. Unless otherwise specified, refractive indices are measured at 550 nm. In some embodiments, the refractive index of the planarization layer 123 may be approximately 1.37 or greater, approximately 1.38 or greater, approximately 1.4 or greater, approximately 1.42 or greater, approximately 1.44 or greater, approximately 1.48 or greater, approximately 1.5 or greater, approximately 1.55 or less, approximately 1.53 or less, approximately 1.49 or less, approximately 1.44 or less, approximately 1.42 or less, or approximately 1.4 or less. In some embodiments, the refractive index of the planarization layer 123 can be in the range of approximately 1.37 to approximately 1.55, 1.38 to approximately 1.55, approximately 1.42 to approximately 1.55, approximately 1.44 to approximately 1.55, approximately 1.44 to approximately 1.53, approximately 1.48 to approximately 1.51, or any range or partial range between these. In some embodiments, the refractive index of the planarization layer 123 can be less than or equal to approximately 1.51, for example, approximately 1.37 to approximately 1.51, approximately 1.37 to approximately 1.50, approximately 1.37 to approximately 1.49, approximately 1.38 to approximately 1.44, approximately 1.4 to approximately 1.42, or any range or partial range between these. In some embodiments, the refractive index of the substrate 103 can be greater than or less than the refractive index of the planarization layer 123. As will be discussed below, different compositions of the planarization layer 123 can have different refractive index values ​​or ranges.

[0371] Throughout this disclosure, the properties of the surface modification layer 113 (e.g., a fingerprint-concealing coating) are characterized in terms of the behavior of the simulated fingerprint applied in a simulated fingerprint test. As used herein, a simulated fingerprint test includes (1) cleaning the surface of the sample to be tested and the artificial silicone fingerprint with isopropyl alcohol; (2) heating artificial sebum in a glass petri dish and then cooling the artificial sebum to room temperature (25°C); (3) pressing the fingerprint portion of an artificial silicone finger into the cooled artificial sebum; and (4) placing the fingerprint portion of an artificial silicon finger on the surface of the sample to be tested and transferring the artificial sebum from the fingerprint portion to the surface as a simulated fingerprint.

[0372] In some embodiments, the visibility of fingerprints on the surface modification layer 113 (e.g., fingerprint-concealing coating) can be about 15 or less, about 10 or less, about 8 or less, about 5 or less, and about 2 or less, as defined above as the absolute difference between CIELAB L* values ​​for a portion of the surface modification layer 113 (e.g., fingerprint-concealing coating), with or without fingerprint oil. In some embodiments, the visibility of fingerprints (e.g., fingerprint-concealing coating) on ​​the surface modification layer 113 can be in the range of 0 to 15, about 0.5 to about 10, about 1 to about 8, about 2 to about 5, or any range or partial range between these. In some embodiments, √((a1*-a2*) 2 +(b1*-b2*) 2 As defined above, the color deviation of fingerprints on the surface modification layer 113 (e.g., fingerprint-concealing coating) can be about 15 or less, about 10 or less, about 8 or less, about 5 or less, or about 2 or less. In some embodiments, the color deviation of fingerprints (e.g., fingerprint-concealing coating) on ​​the surface modification layer 113 can be in the range of 0 to 15, about 0.5 to about 10, about 1 to about 8, about 2 to about 5, or any range or partial range between these. Figures 14 and 16(a) show photographs of simulated fingerprints applied to various coated articles (discussed in more detail in the examples) by simulated fingerprint testing.

[0373] As used herein, “haze” refers to transmitted haze measured according to ASTM D1003-21 at 0° with respect to the direction perpendicular to the outer surface 115, through the surface modification layer 113 (through the outer surface 115) of the coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621. The haze is measured using a HAZE-GARD PLUS available from BYK Gardner, which has an aperture on the source port. The aperture has a diameter of 8 mm. CIE C illumination light is used as a light source to illuminate the surface modification layer 113 and / or through the coated articles 101, 201, 211, 221, 3501, 3601, 3611, or 3621. In some embodiments, when a simulated fingerprint is applied to the surface modification layer 113 in a simulated fingerprint test, the surface modification layer 113 exhibits haze of 8% or less, 7% or less, 6% or less, 5% or less, 4% or less, 1% or more, 2% or more, 3% or more, 4% or more, or 5% or more (i.e., transmittance haze measured after the simulated fingerprint is applied). In some embodiments, the surface modification layer 113 exhibits haze within the range of 1% to 8%, 2% to 7%, 3% to 7%, 3% to 6%, or any range or partial range between these (i.e., transmittance haze measured after the simulated fingerprint is applied). As will be discussed below, the comparative examples exhibit haze of more than 10%, which is statistically significantly different from the ranges mentioned above, demonstrating that the surface modification layer 113 of the present disclosure (e.g., a fingerprint-concealing coating) performs better than the comparative examples in "concealing" the visual effect associated with the applied fingerprint.

[0374] As used herein, “average gray level” was determined in a gray level test using a simulated fingerprint test. Specifically, the gray level test involved photographing the surface modification layer 113 (e.g., fingerprint-concealing coating) of a simulated fingerprint before and after application, using a Canon Rebel T7 DSLR camera equipped with a Canon EF-S 60mm macro lens and illuminated with a ring light. The camera was operated in manual mode with manual focus. The photographs were captured in RAW format and processed in ImageJ to determine the average gray level value in the photograph after application of the simulated fingerprint, where the physically possible average gray value range is 0 to 609. In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) indicates an average gray value from the application of simulated fingerprints in a simulated fingerprint test, ranging from 150 or less, 145 or less, 140 or less, 135 or less, 130 or less, 125 or less, 120 or less, 115 or less, 110 or less, 105 or less, 100 or less, 50 or more, 60 or more, 70 or more, 80 or more, 90 or more, 95 or more, 98 or more, or 100 or more. In another embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) indicates an average gray value from the application of simulated fingerprints in a simulated fingerprint test, ranging from 50 to 150, 60 to 140, 70 to 130, 50 to 125, 60 to 120, 70 to 115, 80 to 110, 90 to 105, 95 to 100, or any range or partial range between these. As will be discussed below, the comparative examples exhibit average gray values ​​exceeding 140 (e.g., exceeding 300), which are statistically significantly different from the range mentioned above. As will be discussed below, the comparative examples exhibit average gray values ​​exceeding 140 (or exceeding 300), which are statistically significantly different from the range mentioned above, demonstrating that the surface modification layer 113 of the present disclosure (e.g., a fingerprint-concealing coating) performs better than the comparative examples in "concealing" the visual effect associated with applied fingerprints.

[0375] Where used herein, “normalized gray level” is determined using a normalized gray level test. The normalized gray level test determines the average gray level value in each photograph using the before and after photographs described in the previous paragraph regarding the gray level test processed in ImageJ. The normalized gray level test is calculated by taking the ratio of the average gray level value of the after photograph (with the simulated fingerprint) to the average gray level of the before photograph (i.e., dividing the after by the before). For example, a normalized gray level of 1.0 means that the simulated fingerprint did not change the average gray level at all, while a normalized gray level of 2.0 means that the average gray value of the simulated fingerprint is twice the average gray value in the before (reference) photograph. In one embodiment, the normalized gray level (as measured by a normalized gray level test) of a coated article (having a surface modification layer 113) having a simulated fingerprint applied to the surface modification layer 113 (e.g., a fingerprint-concealing coating) in the simulated fingerprint may be about 2.0 or less, about 1.95 or less, about 1.90 or less, about 1.85 or less, about 1.70 or less, about 1.65 or less, about 1.6 or less, about 1.55 or less, about 1.5 or less, about 1.45 or less, about 1.40 or less, about 1.35 or less, about 1.30 or less, about 1.25 or less, about 1.0 or more, about 1.05 or more, about 1.10 or more, about 1.15 or more, about 1.20 or more, or about 1.25 or more. In some embodiments, the normalized gray level (as measured in a normalized gray level test) of a coated article (having a surface modified layer) having a simulated fingerprint applied to a surface modified layer 113 (e.g., a fingerprint-concealing coating) in the simulated fingerprint may be within the range of about 1.0 to about 1.5, about 1.05 to about 1.45, about 1.10 to about 1.40, about 1.15 to about 1.35, about 1.20 to about 1.30, about 1.25 to about 1.30, or any range in between. As considered in the examples herein, the surface modified layer (e.g., a fingerprint-concealing coating) according to this disclosure can provide a normalized gray level of about 2.0 or less or 1.5 or less, which may be 50% or less of the other (comparative) coating being tested (e.g., based on functionalized poly(dimethylsiloxane) (PDMS)).

[0376] Unless otherwise specified, additional properties exhibited by the surface modification layer 113 (e.g., fingerprint-concealing coating) when the simulated fingerprint is applied in the simulated fingerprint test are measured using a Bruker ContourGT-X white light interferometry spectrometer and vertical scanning interferometry (VSI) method at four 1 mm × 1 mm areas with a 20x objective lens and a magnification of 0.55x per sample. When used herein, properties measured by vertical scanning interferometry are measured and reported in accordance with ISO 25178 and ISO 21920.

[0377] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) indicates the average height of the simulated fingerprint droplets applied in a simulated fingerprint test, which is 0.17 μm or less, 0.15 μm or less, 0.13 μm or less, 0.12 μm or less, 0.11 μm or less, or 0.10 μm or less. In another embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) indicates the average height of the simulated fingerprint droplets applied in a simulated fingerprint test, which is within the range of 0.01 μm to 0.17 μm, 0.05 μm to 0.15 μm, 0.06 μm to 0.13 μm, 0.07 μm to 0.12 μm or less, 0.08 μm to 0.11 μm, or 0.09 μm to 0.10 μm, or any range or partial range between these. As will be discussed below, the comparative examples show an average height of 0.20 μm or more (e.g., 0.65 μm or more), which is statistically significant from the range mentioned above, indicating a difference in the size of the formed droplets, which may be related to a difference in the oleic acid contact angle (e.g., lipophilic vs. oleophobic).

[0378] In this embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) has a density of 0.006 μm / μm 2 Below, 0.005μm / μm 2 Below, 0.0045μm / μm 2 The following, or 0.004 μm / μm 2 The following shows the ratio of the height to the area of ​​the droplet of simulated fingerprint applied in the simulated fingerprint test. In this embodiment, the surface modification layer 113 (e.g., fingerprint concealing coating) is 0.001 μm / μm 2~0.006 μm / μm 2 , 0.002 μm / μm 2 ~0.005 μm / μm 2 , 0.0025 μm / μm 2 ~0.0045 μm / μm 2 , 0.003 μm / μm 2 ~0.004 μm / μm 2 This indicates the ratio of the height to the area of ​​the simulated fingerprint droplet applied in the simulated fingerprint test, within any range or partial range between those ranges. As discussed below, the comparative example is 0.008 μm / μm, which is different from the range mentioned above. 2 (For example, 0.023 μm / μm) 2 The above shows the ratio of height to area, which may be related to the difference in oleic acid contact angle (e.g., lipophilic vs. oleophobic).

[0379] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) is 0.78 μm thick. 3 / μm 2 Below, 0.76μm 3 / μm 2 Below, 0.75μm 3 / μm 2 Below, 0.74μm 3 / μm 2 Below, 0.73μm 3 / μm 2 Below, 0.70μm 3 / μm 2 Below, 0.60μm 3 / μm 2 Below, 0.55μm 3 / μm 2 The following, or 0.50 μm 3 / μm 2 The following shows the ratio of the volume to the area of ​​the simulated fingerprint droplet applied in the simulated fingerprint test. In this embodiment, the surface modification layer 113 (e.g., fingerprint concealing coating) is 0.10 μm 3 / μm 2 ~0.78μm 3 / μm 2 , 0.20 μm 3 / μm 2 ~0.76μm 3 / μm 2, 0.25 μm 3 / μm 2 ~0.75μm 3 / μm 2 , 0.30 μm 3 / μm 2 ~0.74μm 3 / μm 2 , 0.35μm 3 / μm 2 ~0.73μm 3 / μm 2 , 0.40 μm 3 / μm 2 ~0.72μm 3 / μm 2 This indicates the ratio of the volume to the area of ​​a droplet of simulated fingerprint applied in a simulated fingerprint test, or within any range or partial range between those ranges.

[0380] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) indicates a spherical crown radius that fits a droplet of simulated fingerprint applied in a simulated fingerprint test, with dimensions of 40 μm or more, 50 μm or more, 60 μm or more, 70 μm or more, 80 μm or more, 90 μm or more, or 100 μm or more. In another embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) indicates a spherical crown radius that fits a droplet of simulated fingerprint applied in a simulated fingerprint test, with dimensions of 40 μm to 200 μm, 50 μm to 180 μm, 60 μm to 160 μm, 70 μm to 140 μm, 80 μm to 120 μm, 90 μm to 110 μm, or any range or partial range between these dimensions. As will be discussed below, the comparative examples exhibit spherical crown radii of 21 μm or less (e.g., 10 μm or less), which are statistically significantly different from the range mentioned above, indicating a difference in the size of the formed droplets, which may be related to a difference in oleic acid contact angle (e.g., lipophilic vs. oleophobic).

[0381] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) indicates the center of a sphere that fits a droplet of simulated fingerprint applied in a simulated fingerprint test, located 30 μm or more, 40 μm or more, 50 μm or more, 60 μm or more, 70 μm or more, 80 μm or more, or 90 μm or more from the outer surface of the surface modification layer 113 (e.g., fingerprint-concealing coating). In another embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) indicates the center of a sphere that fits a droplet of simulated fingerprint applied in a simulated fingerprint test, located 30 μm to 200 μm, 40 μm to 180 μm, 50 μm to 160 μm, 60 μm to 140 μm, 80 μm to 120 μm, 90 μm to 110 μm, or any range or partial range between these, from the outer surface of the surface modification layer 113 (e.g., fingerprint-concealing coating). As will be discussed below, the comparative examples show the center of the fitted spheres within 20 μm (e.g., 6 μm or less) of the outer surface, which is statistically significantly different from the range mentioned above, conveying a difference in the size of the formed droplets, which may be related to a difference in the oleic acid contact angle (e.g., lipophilic vs. oleophobic).

[0382] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) indicates the average effective diameter of droplets of simulated fingerprints applied in a simulated fingerprint test, which is 10 μm or larger, 11 μm or larger, 12 μm or larger, 13 μm or larger, 14 μm or larger, 15 μm or larger, 16 μm or larger, 17 μm or larger, or 18 μm or larger. In another embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) indicates the average effective diameter of droplets of simulated fingerprints applied in a simulated fingerprint test, which is within the range of 10 μm to 40 μm, 11 μm to 35 μm, 12 μm to 30 μm, 13 μm to 28 μm, 14 μm to 26 μm, 15 μm to 24 μm, 16 μm to 22 μm, 17 μm to 20 μm, or any range or partial range between these. As will be discussed below, the comparative examples show an average effective diameter of less than 8 μm, which is statistically significantly different from the range mentioned above, indicating a difference in the size of the formed droplets, which may be related to a difference in oleic acid contact angle (e.g., lipophilic vs. oleophobic).

[0383] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) is 200 μm thick.2 More than 400μm 2 More than 600μm 2 More than 700μm 2 More than 800μm 2 More than 900μm 2 Above or above, or 1000 μm 2 The above shows the average area of ​​the simulated fingerprint droplets applied in the simulated fingerprint test. In this embodiment, the surface modification layer 113 (e.g., fingerprint concealing coating) coating is 200 μm 2 ~3000μm 2 , 400 μm 2 ~2500μm 2 , 500μm 2 ~2000μm 2 , 600 μm 2 ~1900μm 2 , 700 μm 2 ~1800μm 2 , 800 μm 2 ~1700μm 2 This indicates the average area of ​​the simulated fingerprint droplets applied in the simulated fingerprint test, within any range or partial range between these ranges. As discussed below, the comparative example is 200 μm, which is statistically significantly different from the range mentioned above. 2 Less than (for example, 125 μm) 2 The following shows the average area, conveying the difference in the size of the formed droplets, which may be related to the difference in oleic acid contact angle (e.g., lipophilic vs. oleophobic).

[0384] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) is 150,000 μm thick. 2 More than 170000μm 2 More than 200000μm 2 More than 220000μm 2 More than 240000μm 2 Above or above, or 250,000 μm 2 The above shows the total area of ​​all droplets related to the simulated fingerprints applied in the simulated fingerprint test. In this embodiment, the surface modification layer 113 (e.g., fingerprint concealing coating) is 150,000 μm 2 ~1,000,000 μm 2 , 170,000 μm2 ~800,000 μm 2 , 200,000 μm 2 ~600,000 μm 2 , 220,000 μm 2 ~500,000 μm 2 , 240,000 μm 2 ~400,000 μm 2 , 250,000 μm 2 ~300,000 μm 2 This indicates the total area of ​​all droplets associated with the simulated fingerprint applied in the simulated fingerprint test, within any range or partial range between those ranges. As discussed below, the comparative example is 120,000 μm, which is statistically significantly different from the range mentioned above. 2 Less than (for example, 55,000 μm) 2 The following shows the average area, conveying the difference in the size of the formed droplets, which may be related to the difference in oleic acid contact angle (e.g., lipophilic vs. oleophobic).

[0385] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits an average peak region shape coefficient Sdff of droplets of simulated fingerprints applied in a simulated fingerprint test, with a value of 0.65 or higher, 0.67 or higher, 0.68 or higher, 0.69 or higher, or 0.70 or higher. In another embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits an average peak region shape coefficient Sdff of droplets of simulated fingerprints applied in a simulated fingerprint test, with a value of 0.65 to 1.00, 0.65 to 0.90, 0.67 to 0.85, 0.68 to 0.80, 0.69 to 0.75, 0.70 to 0.73, or any range or partial range between these.

[0386] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits an average peak-area equivalent diameter shed of the simulated fingerprint droplets applied in a simulated fingerprint test, with dimensions of 60 μm or more, 65 μm or more, 70 μm or more, 75 μm or more, 80 μm or more, 85 μm or more, or 90 μm or more. In another embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits an average peak-area equivalent diameter shed of the simulated fingerprint droplets applied in a simulated fingerprint test, within the range of 60 μm to 200 μm, 65 μm to 150 μm, 70 μm to 130 μm, 75 μm to 110 μm, 80 μm to 100 μm, or any range or partial range between these.

[0387] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits a material ratio Smrk1 of the peak region of a simulated fingerprint droplet applied in a simulated fingerprint test, which is 25% or more, 28% or more, 30% or more, 31% or more, 32% or more, 33% or more, or 34% or more. In another embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits a material ratio Smrk1 of the peak region of a simulated fingerprint droplet applied in a simulated fingerprint test, which is within the range of 25% to 50%, 28% to 45%, 30% to 40%, 31% to 38%, 32% to 35%, or any range or partial range between these.

[0388] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits a reverse load area ratio Smc relative to the load area ratio of 10% of the simulated fingerprint droplet applied in a simulated fingerprint test, with a thickness of 0.2 μm or more, 0.22 μm or more, 0.25 μm or more, 0.27 μm or more, 0.29 μm or more, 0.32 μm or more, 0.35 μm or more, 0.37 μm or more, or 0.40 μm or more. In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits a reverse load area ratio Smc relative to the load area ratio of 10% of the simulated fingerprint droplet applied in a simulated fingerprint test, within the range of 0.2 μm to 0.7 μm, 0.22 μm to 0.65 μm, 0.25 μm to 0.60 μm, 0.27 μm to 0.55 μm, 0.29 μm to 0.50 μm, 0.32 μm to 0.45 μm, 0.35 μm to 0.40 μm, or any range or partial range between these.

[0389] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits an area cross-sectional height difference between a 10% load area ratio and a 90% load area ratio of a droplet of simulated fingerprint applied in a simulated fingerprint test, with dimensions of 0.40 μm or more, 0.45 μm or more, 0.5 μm or more, 0.55 μm or more, 0.6 μm or more, 0.65 μm or more, 0.70 μm or more, or 0.75 μm or more. In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits an area cross-sectional height difference between a 10% load area ratio and a 90% load area ratio of a simulated fingerprint droplet applied in a simulated fingerprint test, within the range of 0.40 μm to 2.0 μm, 0.45 μm to 1.5 μm, 0.5 μm to 1.4 μm, 0.55 μm to 1.3 μm, 0.6 μm to 1.2 μm, 0.65 μm to 1.1 μm, 0.7 μm to 1.0 μm, 0.75 μm to 0.90 μm, or any range or partial range between these.

[0390] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) is 0.10 μm thick. 3 / μm 2 or more, 0.12μm 3 / μm 2 More than 0.15μm 3 / μm 2 or more, 0.18μm 3 / μm 2 or greater than 0.20 μm 3 / μm 2 The above shows the core material value Vmc between the 10% load area ratio and the 90% load area ratio of the simulated fingerprint droplets applied in the simulated fingerprint test. In this embodiment, the surface modification layer 113 (e.g., fingerprint concealing coating) is 0.10 μm 3 / μm 2 ~1.0 μm 3 / μm 2 , 0.12 μm 3 / μm 2 ~0.8μm 3 / μm 2 , 0.15 μm 3 / μm 2 ~0.6μm 3 / μm 2 , 0.18 μm 3 / μm2 Or ~0.4μm 3 / μm 2 , or 0.20 μm 3 / μm 2 ~0.30μm 3 / μm 2 This indicates the core material value Vmc between the 10% load area ratio and the 90% load area ratio of the simulated fingerprint droplet applied in the simulated fingerprint test, or within any range or partial range between those values.

[0391] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) has a root mean square height Sq of the simulated fingerprint applied in a simulated fingerprint test that is 0.45 μm or more, 0.50 μm or more, 0.55 μm or more, 0.60 μm or more, or 0.65 μm or more. In another embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) has a root mean square height Sq of the simulated fingerprint applied in a simulated fingerprint test that is within the range of 0.45 μm to 1.0 μm, 0.50 μm to 0.90 μm, 0.55 μm to 0.8 μm, 0.60 μm to 0.75 μm, or any range or partial range between these.

[0392] In one embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits an autocorrelation length Sal of a simulated fingerprint applied in a simulated fingerprint test that is 20 μm or more, 25 μm or more, 30 μm or more, 35 μm or more, or 40 μm or more. In another embodiment, the surface modification layer 113 (e.g., fingerprint-concealing coating) exhibits an autocorrelation length Sal of a simulated fingerprint applied in a simulated fingerprint test that is within the range of 20 μm to 100 μm, 25 μm to 80 μm, 30 μm to 60 μm, 35 μm to 55 μm, 40 μm to 50 μm, or any range or partial range between these.

[0393] Throughout this disclosure, electrostatic charge is measured using a tribocharging test. Referring to Figure 29, the tribocharging apparatus 2901 includes a friction head 2921 containing a silver-coated nylon mesh having a circular cross-section with a diameter of 8 mm. The friction head 2921 is rubbed for 100 cycles in a straight line (consisting of one cycle forward and backward) along a long 25 mm trajectory (indicated as friction region 2913). The friction induces a surface charge on the surface 2905 of the material 2903 being tested. The surface charge that appears on the surface 2905 is distributed over a 70 mm × 70 mm square (4900 mm²) centered at the center of the trajectory (i.e., the center of friction region 2913). 2 The voltage was measured using a non-contact field meter (Monroe 244a) as voltage at multiple locations across the surface within the measurement area 2911 (indicated by the measurement area having a total area of ​​2921), where the friction head 2921 is shown in Figure 29. The measurements were taken 100 seconds after the completion of 100 friction cycles.

[0394] Figure 30 shows an example of an exemplary contour plot of voltage measured by a non-contact field meter. In Figure 30, the vertical axis 3003 (i.e., the y-axis) and the horizontal axis 3001 (i.e., the x-axis) correspond to the physical distance from the center of the trajectory along the corresponding axes. The 70 mm × 70 mm measurement area (e.g., measurement area 2911 in Figure 29, which corresponds to the entire area shown in Figure 30) is divided into three areas: the peripheral contact area, the internal area, and the central area. The central contact area 3014 extends 40 mm in the direction in which the friction head 2921 (see Figure 29) travels along the trajectory, and 20 mm in the direction perpendicular to that direction (800 mm). 2 The internal region 3012 is defined by a central boundary 3013 centered on the center of the total area of ​​the region. The internal region 3012 is defined by the central boundary 3013 (discussed in the preceding paragraph) and the internal boundary 3011 (excluding the central contact region 3014) (2500 mm) centered on the center of the track, which extends 50 mm in the direction in which the friction head moves along the track and 50 mm in the direction perpendicular to that direction. 2 -800mm 2 = 1700mm 2The peripheral contact area 3010 is defined between the total area of ​​the area (4900mm). The peripheral contact area 3010 is still defined between the total area of ​​the area (4900mm) and the measuring area (4900mm). 2 -2500m 2 = 2400mm 2 It is defined as the area that extends beyond the internal boundary 3011 (discussed in the preamble) within the total area of ​​3010. In the example of the voltage contour plot shown in Figure 30, the contours extend from area 3027, which has the greatest voltage accumulation (tribocharging), to area 3021, which has the least tribocharging. As shown, the greatest tribocharging was observed in area 3027, which is located mainly in the central contact area 3014, followed by area 3026. Smaller tribocharging was observed in area 3025, which is located in the central contact area 3014 and the internal area 3012, followed by area 3024. Area 3023 straddles the internal boundary 3011, with even less tribocharging observed in area 3022 within the peripheral contact area 3010, and the least tribocharging observed in area 3021. While we don't want to be constrained by theory, surfaces with lower tribocharging are capable of distributing charge more effectively across the surface than other surfaces with higher tribocharging.

[0395] In the tribocharging test, a single value equal to the absolute value of the average voltage measured in the central contact region 3014 can be extracted. In addition, three voltages corresponding to the average voltages in the central contact region 3014, the internal region 3012, and the peripheral contact region 3010 can be extracted. Furthermore, a voltage difference equal to the absolute value of the difference between the average voltage in the peripheral contact region 3010 and the average voltage in the central contact region 3014 can be extracted. In some embodiments, the voltage measured in the tribocharging test (i.e., corresponding to the absolute value of the average voltage measured in the central contact region 3014) can be approximately 15 volts (V) or less, approximately 12 V or less, approximately 10 V or less, approximately 8 V or less, approximately 6 V or less, approximately 5 V or less, approximately 0 V or more, approximately 1 V or more, approximately 2 V or more, approximately 3 V or more, approximately 4 V or more, or approximately 5 V or more. In some embodiments, the voltage measured in the tribocharging test (i.e., corresponding to the absolute value of the average voltage measured in the central contact area 3014) can be within the range of approximately 0V to approximately 15V, approximately 1V to approximately 12V, approximately 1V to approximately 10V, approximately 2V to approximately 8V, approximately 3V to approximately 6V, approximately 4V to approximately 5V, or any range or partial range between these. In some embodiments, the voltage difference between the peripheral contact area 3010 and the central contact area 3014 (i.e., the absolute value of the difference between the average voltage in the peripheral contact area 3010 and the average voltage in the central contact area 3014) can be approximately 5V or less, approximately 4V or less, approximately 3V or less, approximately 2V or less, approximately 1V or less, approximately 0V or more, approximately 0.5V or more, approximately 1V or more, approximately 1.5V or more, approximately 2V or more, or approximately 2.5V or less. In one embodiment, the voltage difference between the peripheral contact area 3010 and the central contact area 3014 (i.e., the absolute value of the difference between the average voltage in the peripheral contact area 3010 and the average voltage in the central contact area 3014) can be within a range of approximately 0V to approximately 5V, approximately 0.5V to approximately 4V, approximately 1V to approximately 3V, approximately 1.5V to approximately 2V, or any range or partial range between these.As discussed herein with reference to Figures 31-32, surface modification coatings according to embodiments of the present disclosure (e.g., fingerprint-concealing coatings) can exhibit an absolute average voltage of less than 15V (e.g., less than 10V, less than 8V, or about 5V) in the central contact area 3014, and a voltage difference of less than 5V (e.g., less than 3V, about 2V or less, or about 1V) between the peripheral contact area 3010 and the central contact area 3014.

[0396] Embodiments of this disclosure may include consumer electronic products. Consumer electronic products may include a front surface, a rear surface, and side surfaces. Consumer electronic products may further include electrical components at least partially within the housing. Electrical components may include a controller, memory, and a display. The display may be on the front surface of the housing or adjacent to it. The display may include a liquid crystal display (LCD), an electrophoretic display (EPD), an organic light-emitting diode (OLED) display, or a plasma display panel (PDP). Consumer electronic products may include a cover substrate disposed over the display. In embodiments, at least one of the housing or a portion of the cover substrate includes a coated article and / or surface modification layer 113 (e.g., a fingerprint-hiding coating) as considered throughout this disclosure. Consumer electronic products may include portable electronic devices, such as smartphones, tablets, wearable devices, or laptops.

[0397] The coated articles and / or surface modification layers 113 (e.g., fingerprint-hiding coatings) disclosed herein may be incorporated into other articles, such as articles having displays (or display articles) (e.g., consumer electronics including mobile phones, tablets, computers, navigation systems, wearable devices (e.g., watches)), building articles, transport articles (e.g., automobiles, trains, aircraft, ships, etc.), instrument articles, or any article that may benefit from some transparency, scratch resistance, abrasion resistance, or a combination thereof. Exemplary articles incorporating any of the coated articles and / or surface modification layers (e.g., fingerprint-hiding coatings) disclosed herein are shown in Figures 3-4. Specifically, Figures 3-4 show a consumer electronic device 300 including a housing 302 having a front surface 304, a rear surface 306, and a side surface 308. Although not shown, the consumer electronic device may include electrical components that are at least partially inside or entirely inside the housing. For example, the electrical components include at least a controller, memory, and a display. As shown in Figures 3-4, the display 310 may be on the front surface of the housing 302 or adjacent to it. The consumer electronic device may include a cover substrate 312 on or over the front surface of the housing 302, as on the display 310. In some embodiments, at least one of the cover substrate 312 or a portion of the housing 302 may include one of the coated articles and / or surface modification layers disclosed herein (e.g., fingerprint-hiding coatings).

[0398] Embodiments of methods for producing foldable devices and / or foldable substrates according to aspects of this disclosure will be considered with reference to the flowcharts in Figures 7-8 and the examples of method steps shown in Figures 9-13.

[0399] Herein, examples of embodiments for producing coated articles 3501, 3601, 3611, or 3621 (for example, having a surface modification layer disposed on a planarization layer 123) are considered with reference to Figures 5-6 and 9-12, and the flowchart in Figure 7. In the first step 701, the method can begin by obtaining a substrate 103. In some embodiments, the substrate 103 may be provided by purchasing a substrate or obtaining it by other means, or by forming a substrate. In some embodiments, the substrate 103 may include glass-based materials, glass-ceramic materials, and / or ceramic materials. In further embodiments, glass-based substrates, glass-ceramic substrates, and / or ceramic substrates may be provided by forming them in a variety of ribbon-forming processes, e.g., slot draw, down draw, fusion down draw, up draw, press roll, re-stretch, or float. In further embodiments, glass-ceramic substrates and / or ceramic substrates may be provided by heating a glass-based substrate to crystallize one or more ceramic crystals. The substrate 103 includes a first main surface 105 that can extend along a first plane 104. In some embodiments, an optical stack 203 including an anti-reflective coating and / or a gradient coating including a refractive index gradient can be disposed on and / or bonded to the first main surface 105, as shown in Figures 2A-2C and 36A-36B. Although not shown in Figures 9-10, it should be understood that the optical stack 203 can be disposed on the first main surface 105. In some embodiments, the substrate 103 can be chemically strengthened in one or more compressive stress regions (or central tension regions) including any of the embodiments relating to the compressive depth, maximum compressive stress, and / or tensile stress discussed above for the corresponding properties.

[0400] In some embodiments, step 701 may further include obtaining a functionalized polyhedral oligomeric silsesquioxane (POSS). As used herein, the polyhedral oligomeric silsesquioxane (POSS) is RSiO 1.5This refers to a functionalized oligomer silsesquioxane composed of monomers. Exemplary embodiments of the functionalized POSS include 6, 8, 10, or 12 RSiO 1.5 It may contain monomers, but other embodiments are also possible. For example, eight RSiO 1.5 Functionalized oligomeric silsesquioxanes composed of monomers are octahedral functionalized POSS (e.g., polyoctahedral silsesquioxanes). Figure 5 shows a functionalized POSS, i.e., an octahedral functionalized POSS, where R is a functional group that can be independently selected from the functional groups discussed below.

[0401] In some embodiments, functionalized oligomeric silsesquioxanes can be formed from condensation reactions of silanes. As used herein, the condensation reaction produces an R2O byproduct, where R may include any of the R units considered below, and may further include hydrogen (e.g., having hydroxyl or water byproducts). For example, a silane (e.g., R3OSi) can be reacted to form a terminal RSiO2 monomer. For example, a terminal RSiO2 monomer can react with another RSiO2 monomer (e.g., terminal, non-terminal) to form a condensation byproduct, such that the oxygen atom of one monomer forms a bond with the silicon atom of another monomer, producing a condensation byproduct. 1.5 It can form monomers. RSiO 1.5 Silsesquioxane monomers are M-type siloxane monomers (e.g., R3SiO 0.5 It should be understood that this is different from siloxane monomers that can contain D-type siloxane monomers (e.g., R2SiO2) and / or silica-type siloxane monomers (SiO2).

[0402] Functionalized oligomeric silsesquioxanes can be functionalized by one or more functional groups. For the methods considered with reference to the flowchart in Figure 7 (e.g., thermal deposition of the functionalized oligomeric silsesquioxane), hydrogen may be excluded from the functional groups that functionalize the functionalized oligomeric silsesquioxane. In some embodiments, bisphenol, fluorine-containing functional isocyanate, epoxy, glycidyl, oxirane, sulfur-containing functional (e.g., thiol), anhydride, acrylate, methacrylate, and / or alkyne may be excluded. In some embodiments, the functional groups that functionalize the functionalized oligomeric silsesquioxane are alkyl groups, alkene groups, aromatic groups (e.g., phenyl groups), silanes (e.g., alkylsilyl groups), or combinations thereof. As used herein, alkyl groups contain saturated hydrocarbons having a carbon-carbon single bond and hydrogen bonded to a carbon atom. In some embodiments, alkyl functional groups contain 1 to 10 carbon atoms (i.e., C1-C 10Alkyl groups can range from 1 to 8 carbon atoms (i.e., C1-C8 alkyl) or from 1 to 4 carbon atoms (i.e., C1-C4 alkyl). Exemplary embodiments of alkyl functional groups include methyl, isobutyl, and dimethylsilyl. An exemplary embodiment of aromatic functional groups is the phenyl group. An exemplary embodiment of silanes includes the dimethylsilyl group. As used herein, alkene groups contain unsaturated hydrocarbons having one or more carbon-carbon double bonds. Alkenes may optionally contain one or more carbon-carbon single bonds (e.g., alkyl chains in the alkene group). In further embodiments, functionalized POSS can be at least partially functionalized with alkenes containing 2 to 8 carbon atoms (i.e., C2-C8 alkenes). At least partially functionalized with functional group B means that one or more of the R groups shown in Figure 5 are B. Fully functionalized means that 95% or more of all R groups shown in Figure 5 are B. Exemplary embodiments of alkene-functionalized POSS are vinyl POSS, e.g., partially vinyl-functionalized vinyl / isobutyl POSS (OL1123 available from Hybrid Plastics) or octa-vinyl POSS (OL1170 available from Hybrid Plastics). Exemplary embodiments of aromatic-functionalized POSS are octaphenyl POSS (MS0840 available from Hybrid Plastics). Exemplary embodiments of alkyl-functionalized POSS are octamethyl POSS (MS0830 available from Hybrid Plastics) and octa(isobutyl) POSS (MS0825 available from Hybrid Plastics). By providing short chains (e.g., about 8 or fewer carbon atoms) for functionalizing the functionalized POSS, it is possible to allow the functionalized POSS to be deposited during step 703.By providing one or more of the functional groups considered above to functionalize the functionalized POSS, the reactivity of the functionalized POSS can be reduced (for example, by sterically interfering with the interactions between the functionalized POSS) before it is collided with by an ion beam and / or deployed on a substrate, thereby enabling its use to generate the partially condensed silica-like network described above.

[0403] Alternatively, for example, when the method proceeds to step 713 (e.g., coating the functionalized oligomer silsesquioxane as a solution) instead of step 703 (e.g., depositing the functionalized POSS), the functional group functionalizing the functionalized oligomer silsesquioxane may be hydrogen or an alkyl group. In some embodiments, the functional groups functionalizing the functionalized oligomer silsesquioxane may be excluding bisphenol, fluorine-containing functional group isocyanates, epoxy, glycidyl, oxiranes, sulfur-containing functional groups (e.g., thiols), anhydrides, acrylates, methacrylates, and / or alkynes. In some embodiments, the functional group functionalizing the functionalized oligomer silsesquioxane may be hydrogen, alkyl groups, alkene groups, aromatic groups, silanes, or combinations thereof. For example, the functional group may be hydrogen plus one or more of the functional groups discussed above in the previous paragraph. In further embodiments, the functional group functionalizing the functionalized oligomer silsesquioxane may consist of carbon and / or hydrogen. In further embodiments, the functionalized oligomer silsesquioxane can be at least partially functionalized with hydrogen and / or fully functionalized with hydrogen. In further embodiments, the functionalized POSS can be at least partially functionalized with an alkene containing 2 to 8 carbon atoms (i.e., C2-C8 alkenes), such as ethene, propene, butene, pentene, hexene, heptane, or octene. In further embodiments, the functionalized POSS can be at least partially functionalized with an alkene containing 2 to 8 carbon atoms (i.e., C2-C8 alkenes).

[0404] Throughout this disclosure, the effective diameter of molecules (e.g., functionalized POSS) is measured using dynamic light scattering in accordance with ISO 22412:2017. In some embodiments, the effective diameter of a functionalized POSS may be about 20 nm or less, about 15 nm or less, about 10 nm or less, about 6 nm or less, about 1 nm or more, about 2 nm or more, or about 4 nm or more. In some embodiments, the effective diameter of a functionalized POSS may be within the range of about 1 nm to about 20 nm, about 1 nm to about 15 nm, about 2 nm to about 15 nm, about 2 nm to about 10 nm, about 4 nm to about 10 nm, about 4 nm to about 6 nm, about 1 nm to about 6 nm, about 2 nm to about 6 nm, or any range or subrange between these. In further embodiments, the average effective diameter of a functionalized POSS may be within one or more of the ranges discussed above in this paragraph. In a further embodiment, substantially all and / or all of the functionalized POSS may fall within one or more of the ranges for the effective diameter of the functionalized oligomer silsesquioxanes considered above.

[0405] As shown in Figure 9, after step 701, the method may proceed to step 703, which includes depositing a functionalized POSS onto the first main surface 105 of the substrate 103. In some embodiments, as shown, step 703 may include positioning the substrate 103 in a chamber 903 (e.g., a vacuum chamber) that can be maintained under reduced pressure. In some embodiments, the reduced pressure may be about 50,000 Pascals (Pa) or less, about 1,000 Pa or less, about 1 Pa or less, about 0.5 Pa or less, about 10 -6 Pa or more, about 10 -4 Pa or higher, or approximately 10 -3 It can be Pa. In this embodiment, the reduced pressure is about 10 -6 Pa ~ approximately 1,000 Pa, approximately 10 -4 ~approximately 1 Pa, approximately 10 -3 ~Approximately 0.5 Pa, approximately 10 -3 Pa ~ about 10 -1The pressure can be Pa, or any range or partial range between them. In some embodiments, the pressure in chamber 903 (e.g., reduced pressure) can be maintained by operating one or more of the valves 905 and 925. In further embodiments, the pressure in chamber 903 can be reduced or maintained by opening valve 905, which is connected to a pump 907 that can remove gas from chamber 903. In further embodiments, the pressure in chamber 903 can be increased or maintained by opening valve 925, which is connected to a gas source 921 that adds gas to the chamber, as indicated by arrow 923. In some embodiments, the gas source 921 can provide a non-reactive gas (e.g., argon, helium, krypton), oxygen, nitrogen, air, or a combination thereof. By providing reduced pressure when depositing functionalized POSS, the rate of deposition can be increased and / or a wide range of functionalized POSS materials can be used.

[0406] As shown in Figure 9, the functionalized POSS 913 can be positioned in a container 911 located within a chamber 903. In the chamber 903, the functionalized POSS 913 can be disposed on the first main surface 105 of the substrate 103 (as indicated by arrow 919) or deposited into the gas phase (as indicated by arrow 917) (as indicated by arrow 915). Exemplary embodiments of the container 911 include a Knudsen cell or an evaporation cell. In these embodiments, the container 911 can be maintained at a temperature of approximately 50°C or higher, approximately 65°C or higher, approximately 75°C or higher, approximately 90°C or higher, approximately 110°C or lower, approximately 200°C or lower, approximately 170°C or lower, approximately 150°C or lower, approximately 135°C or lower, approximately 120°C or lower, or approximately 110°C or lower. In some embodiments, the container 911 can be maintained at a temperature of approximately 50°C to 200°C, approximately 65°C to 170°C, approximately 75°C to 150°C, approximately 90°C to 135°C, approximately 110°C to 135°C, or any range or partial range in between. Heating the container can facilitate the deposition of the functionalized POSS, thereby increasing the deposition rate.

[0407] In some embodiments, the deposition rate of the functionalized POSS 913 can be monitored using a sensor that includes a surface positioned at a predetermined distance from the surface (e.g., the first main surface 105 of the substrate 103). In further embodiments, the sensor may be configured to detect a nanogram difference in mass from the material deposited on the surface, where the increase in mass and a predetermined surface area of ​​the surface can be used to determine the effective deposition rate. It should be understood that the “effective deposition rate” is not necessarily the actual deposition rate on the surface (e.g., the first main surface 105) and may actually overestimate the actual deposition rate by two or three times. An exemplary embodiment of the sensor is a quartz crystal microbalance (QCM). As used herein, “deposition rate” or “deposition rate” refers to the effective deposition rate as measured by a QCM positioned 500 mm below the surface and 150 mm above the container 911.

[0408] Although not shown, it should be understood that when the optical stack 203 is disposed on the first main surface 105, the functionalized POSS913 is disposed covering the first main surface 105 and also disposed on the optical stack 203. In some embodiments, the deposition rate of the functionalized POSS913 on the first main surface 105 can be approximately 0.01 nanometers per second (nm / sec) (0.1 A / sec) or more, approximately 0.03 nm / sec (0.3 A / sec) or more, approximately 0.05 nm / sec (0.5 A / sec) or more, approximately 0.1 nm / sec (1 A / sec), approximately 0.5 nm / sec or less (5 A / sec), approximately 0.3 nm / sec (3 A / sec) or less, approximately 0.2 nm / sec (2 A / sec) or less, or approximately 0.15 nm / sec (1.5 A / sec) or less. In some embodiments, the deposition rate of the functionalized POSS 913 onto the first main surface 105 can be in the range of approximately 0.01 nm / to approximately 0.5 nm / second, approximately 0.03 nm / second to approximately 0.3 nm / second, approximately 0.05 nm / second to approximately 0.2 nm / second, approximately 0.1 nm / second to approximately 0.15 nm / second, or any range or partial range between these. By controlling the deposition rate within one or more of the ranges mentioned above, a substantially uniform coating of the functionalized POSS can be efficiently (e.g., rapidly) deposited on the first main surface. In some embodiments, at the end of step 703, the thickness of the functionalized POSS disposed on the first main surface 105 can be within one or more of the ranges considered above with reference to the planarization thickness 129. While we do not wish to be bound by theory, it is believed that the deposition of functionalized POSS and its deposition on the first main surface does not, by itself, chemically (e.g., covalently) bond the functionalized POSS to the first main surface or alter the structure of the functionalized POSS. An exemplary embodiment of a container 911 in a Radak II cell, which can be used in a chamber 903, e.g., an Angstrom Engineering Evovac chamber. Although not shown, it should be understood that if an optical stack 203 is disposed on the first main surface 105, the functionalized POSS 913 is disposed covering the first main surface 105 and also disposed on the optical stack 203.

[0409] As shown in Figure 9, after (or concurrently with) step 703, the method may proceed to step 705, which includes causing an ion beam traveling as a plume 933 to collide onto a first main surface 105 of the substrate 103. As shown, the substrate 103 may be located within a chamber 903, which may be the same chamber 903 discussed above with reference to step 703. In some embodiments, as shown in Figure 9, the beam source 931 may be configured to emit an ion beam traveling as a plume 933 that is incident onto the first main surface 105 (or optical stack) of the substrate 103. The beam source 931 may operate so that the ion beam traveling as a plume 933 collide across the entire first main surface 105. In some embodiments, the ion beam source 931 may include an end-hole ion source, a grid-type ion source, or an inductively coupled plasma (ICP) ion source. An exemplary embodiment of the beam source 931 is an end-hole ion source. In some embodiments, the beam source 931 can generate an ion beam using a discharge current. While we do not wish to be bound by theory, it is believed that the degree of reaction (e.g., from functionalized POSS to a partial silica-like network) is influenced by the ion beam energy and the discharge current. In further embodiments, the discharge current can be approximately 0.25 amperes (A) or more, approximately 0.3 A or more, approximately 0.35 A or more, approximately 1 A or less, approximately 0.75 A or less, or approximately 0.5 A or less. In further embodiments, the discharge current can be in the range of approximately 0.25 A to approximately 1 A, approximately 0.3 A to approximately 0.75 A, approximately 0.35 A to approximately 0.5 A, or any range or partial range between these. In some embodiments, the beam source 931 can operate at a voltage of approximately 100 volts (V), for example, approximately 50V to approximately 220V, approximately 70V to approximately 120V, approximately 90V to approximately 110V, or any range or partial range between these. In some embodiments, the ion beam may include oxygen ions, argon ions, or a combination thereof. The composition of the ion beam can be adjusted through the selection of a gas source 921 and the control of the amount of gas released from the gas source 921 (for example, using a valve 925).In one embodiment, the chamber 903 (e.g., vacuum chamber) is reduced in step 703 to the range described above (e.g., about 10). -8 Pa ~ about 10 -7 The pressure can be maintained within one or more of the following ranges (Pa):

[0410] While we do not wish to be bound by theory, it is thought that the ion beam disrupts the cage structure of the functionalized POSS, volatilizes the functional groups that functionalize the functionalized POSS, and / or bonds the functionalized POSS to the surface on which it is disposed (e.g., the first main surface 105 as shown in Figure 9, or, if present, the fourth main surface 207 of the optical stack 203). At the end of step 705, the formed coating 1033 (see Figure 10) may include a partial silica-like network, for example, having a percentage of silicon atoms in the coating in the silica-like network within one or more of the ranges considered above for the percentage of silica atoms in the planarization layer 123 in the silica-like network. In addition to or instead of this, at the end of step 705, the formed coating 1033 (see Figure 10) may include a ratio of Si-O-Si bonds to silicon atoms within one or more of the ranges considered above for the ratio of Si-O-Si bonds to silicon atoms. In a further embodiment, by colliding with an ion beam in step 705, at least a portion of the silicon atoms in the cage structure of the functionalized POSS can be converted into a partial Si-O-Si network (i.e., Si-O-Si bonds). In yet another embodiment, the fraction of silicon atoms converted in step 705 can be in the range of about 50% to about 90%, about 60% to about 80%, about 65% to about 75%, or any range or partial range in between. In an embodiment, the coating thickness 1039 of the coating 1033 defined between opposite surfaces 1035 and 1037 can be within one or more of the ranges considered above for the planarization thickness 129, and / or the coating 1033 can correspond to the planarization layer 123.

[0411] In some embodiments, the deposition of the functionalized POSS 913 in step 703 and the collision of the ion beam traveling along the beam path in step 705 can be performed simultaneously. As used herein, steps 703 and 705 performed "simultaneously" means that there is at least one point in time when the activities of steps 703 and 705 are both occurring. It should be understood that if one step starts before the other step finishes, and / or if one step finishes before the other step finishes, it can still be considered simultaneous, but both steps 703 and 705 can start and / or finish simultaneously in further embodiments. As shown in Figure 9, the container 911 (e.g., a Knudsen cell or evaporation cell), the substrate 103, and at least a portion of the beam path can be positioned within the chamber 903 so that the functionalized POSS 913 in the gas phase (as indicated by 917) and / or the functionalized POSS 913 disposed on the first main surface 105 can be collided with by the ion beam traveling along the beam path. By performing steps 703 and 705 simultaneously, the formation of a coating 1033 (see Figure 10) that has good adhesion to the substrate 103 and / or is relatively homogeneous can be facilitated. Providing a discharge current of about 0.25 A or more facilitates the formation of the coating 1033 (see Figure 10) and generates an ion beam with sufficient energy to react, for example, one functionalized POSS with other functionalized POSS and / or the first main surface 105 of the substrate 103 at a considerable rate (compared to, for example, a lower discharge current). Providing a discharge current of about 1 A or less provides an ion beam that is not strong enough to remove any POSS material disposed by deposition. In addition, performing steps 703 and 705 simultaneously can reduce processing time.

[0412] Alternatively, as shown in Figure 11, after step 701, the method may proceed to step 713, which includes distributing the precursor solution 1103 to cover the first main surface 105 of the substrate 103. The precursor solution 1103 may contain polysilazane or POSS at a concentration within one or more of the ranges considered in the previous paragraph. In some embodiments, as shown in Figure 11, the precursor solution 1103 may be distributed from a container 1101 (e.g., a conduit, flexible tube, micropipette, inkjet printhead, or syringe) to cover (e.g., on) the first main surface 105 of the substrate 103 to form a precursor layer 1105. In a further embodiment, as shown, step 803 may include spin-coating the precursor solution 1103 over (for example, on) the first main surface 105 by, for example, distributing the second main surface 107 of the substrate over the surface 1115 of the holder 1113, and the holder may be rotated while the precursor solution 1103 is distributed over the first main surface 105 (as indicated by arrow 1119). In another further embodiment, the holder 1113 may be rotated at a rate of 200 revolutions per minute (rpm) or more, about 500 rpm or more, about 700 rpm or more, about 4,000 rpm or less, about 2,500 rpm or less, or about 1,500 rpm or less. In further embodiments, the holder 1113 can be rotated in a range of 200 rpm to about 4,000 rpm, about 500 rpm to about 2,500 rpm, about 700 rpm to about 1,500 rpm, or any range or partial range in between. By spin-coating the precursor solution, a substantially uniform precursor layer can be formed by covering the first main surface of the substrate.

[0413] As shown in Figure 12, after step 713, the method may proceed to step 715, which includes heating the precursor layer 1105 (see Figure 11) of the precursor solution 1103 at a first temperature for a first period to form the coating 1033. In some embodiments, as shown, the substrate 103 may be placed in an oven 1201 maintained at a first temperature for a first period. In some embodiments, the first temperature may be about 150°C or higher, about 170°C or higher, about 190°C or higher, about 400°C or lower, about 300°C or lower, about 250°C or lower, about 230°C or lower, or about 210°C or lower. In some embodiments, the first temperature can be in the range of about 150°C to about 400°C, about 150°C to about 300°C, about 150°C to about 250°C, about 170°C to about 230°C, about 190°C to about 210°C, or any range or partial range between these. In some embodiments, the first period can be about 5 minutes or more, about 10 minutes or more, about 20 minutes or more, about 25 minutes or more, about 2 hours or less, about 1.5 hours or less, about 1 hour or less, or about 40 minutes or less. In some embodiments, the first period can be in the range of about 5 minutes to about 2 hours, about 10 minutes to about 1.5 hours, about 20 minutes to about 1 hour, about 25 minutes to about 40 minutes, or any range or partial range between these. In some embodiments, the precursor solution 1103 may contain a catalyst or may not contain a catalyst. In some embodiments, the precursor solution 1103 may contain a silane in addition to the polysilazane or POSS. The silane may include any of the embodiments of the silane discussed above.

[0414] While we do not wish to be bound by theory, heating the precursor layer of the precursor solution can remove the solvent from the precursor layer and / or partially cure the polysilazane or POSS to form, for example, silica or a partially silica-like network (e.g., corresponding to the planarization layer 123). For example, heating the POSS can rearrange the silicon-oxygen network into a silica-like network and / or bond the precursor solution to the surface on which it is placed (e.g., the first main surface 105). For example, as shown in Figure 6, the polysilazane can undergo a reaction in which ammonia and hydrogen are generated and oxygen and water are consumed, converting it from a structure with alternating silicon-nitrogen skeletons to a silica-like network with silicon-oxygen bonds. Since the polysilazane can only undergo this reaction partially, at the end of step 715, the coating 1033 may contain silicon, oxygen, nitrogen, and / or hydrogen. It should also be understood that these reactions may continue in subsequent steps (e.g., step 707).

[0415] As shown in Figures 10 and 13, after step 705 or 715, the method may proceed to step 707, which includes reacting a material (e.g., coating 1033) on the first main surface 105 of the substrate 103 with an alkylsilane to form a surface modification layer 113 (e.g., a fingerprint-hiding coating) that can be disposed over the substrate 103 and / or coating 1033. In some embodiments, the alkylsilane 1013 (e.g., droplet 1317) may include an alkylsilane. In further embodiments, the alkylsilane may have four or more carbon atoms, e.g., 3 to 34 carbon atoms (e.g., C3-C 34 Alkyl), 4 carbons to about 34 carbons (i.e., C4-C 34 Alkyl group), 6 carbon atoms to 20 carbon atoms (for example, C6-C 34 Alkyl), 8 to 18 carbon atoms (for example, C8-C 18 Alkyl)...

Claims

1. Coated articles, A substrate including a first main surface, A fingerprint-concealing coating disposed to cover the first main surface, wherein the fingerprint-concealing coating includes the outer surface of the coated article, and the fingerprint-concealing coating is fluorine-free, The aforementioned fingerprint-concealing coating Water contact angle of 90° to 120°, Oleic acid contact angle of 40° or less, and A coated article having a coefficient of friction of 0.25 or less on its outer surface.

2. The fingerprint-concealing coating contains alkylsilane on the outer surface, The alkylsilane is bonded to the substrate by a silane group, or the alkylsilane is bonded to another portion of the fingerprint-concealing coating by a silane group, or both. The silane group of the alkylsilane is located at the free end of the alkylsilane, or The coated article according to claim 1, which is both of the above.

3. The coated article according to claim 2, wherein the fingerprint-concealing coating comprises an oligomer of the alkylsilane, a polymer of the alkylsilane, or both.

4. The alkylsilane oligomer, the alkylsilane polymer, or both, Dialkylsiloxane block, A dimethylsiloxane block that binds together the oligomer of the alkylsilane, the polymer of the alkylsilane, or both monomers thereof, or The coated article according to claim 3, comprising at least one of the alkylsilane oligomer, the alkylsilane polymer, or a disiloxane group that binds together the monomers of both thereof.

5. The coated article according to any one of claims 2 to 4, wherein the alkylsilane is substantially chlorine-free.

6. The fingerprint-concealing coating contains the oligomer of the alkylsilane, the polymer of the alkylsilane, or both, and the oligomer of the alkylsilane, the polymer of the alkylsilane, or both have the structure {OSi(R') ２ [CH ２ ｍ [Si(R'') ２ O] ｎ Si(R') ２ [CH ２ ｐ Si(R'') ２} ｑ and include R, where m and p are independently selected from 3 to 34, R' and R'' are independently CH ３ and CH ２ CH ３ selected from, n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof. The coated article according to any one of claims 1 to 5.​​

7. In the above structure, n is 1 and q is between 1 and 100, or The coated article according to claim 6, wherein n is 1, m is 8, p is 8, and q is at least one of 1 to 100.

8. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or The coated article according to claim 6, wherein n is 2 or more, m is 8, p is 8, and q is 1 to 100, at least one of these.

9. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {Si(R') ２ [television] ２ ] ｍ Si(R') ２ The compound contains a condensation product of monomer units including O, where each R' independently is CH ３ and CH ２ CH ３ A coated article according to any one of claims 6 to 8, wherein m is selected from and m is 3 to 34.

10. R' is CH ３ The coated article according to claim 9, wherein m is 8.

11. The condensation product is {R''Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The coated article according to claim 9 or 10, further comprising monomer units comprising} or a combination thereof, wherein R'' is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

12. The above {Si(R') ２ [television] ２ ] ｍ Si(R') ２ A monomer unit containing {O} and the {R''Si(OCH}}. ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The coated article according to claim 11, wherein the ratio of monomer units, including} or combinations thereof, is 10:1 to 1:

10.

13. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ A coated article according to any one of claims 6 to 12, comprising a condensation product with monomer units including Si, or combinations thereof.

14. The aforementioned {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ A monomer unit containing {(CH ３ ) (CH ２ ) １７ Si(OCH) ３ ) ２ }, {(CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 13, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

15. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R) ２ [television] ２ ] ｍ [Si (Note)] ２ O] ｎ Si(R) ２ [television] ２ ] ｐ Si(R) ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and each R is independently OCH ３ , OH, and OSi(R') ２ [television] ２ ] ｍ’ Selected from, m' independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' independently, OCH ３ The coated article according to claim 2, selected from the group consisting of and OH.

16. In the above structure, at least one: n is 1 and q is between 1 and 100, or The coated article according to claim 15, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

17. In the above structure, at least one: n is 1 and q is between 1 and 100, or The coated article according to claim 15, wherein n is 1, m is 6, p is 6, and q is 1 to 100.

18. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2, m is 6, p is 6, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100. n is 2 or greater, m is 8, p is 8, and q is between 1 and 100, or The coated article according to claim 15, wherein n is 2 or more, m is 6, p is 6, and q is 1 to 100, at least one of these.

19. The fingerprint-concealing coating includes the oligomer of the alkylsilane, the polymer of the alkylsilane, or both, and the oligomer of the alkylsilane, the polymer of the alkylsilane, or both include a condensation product of monomer units including {(OSi(R) ２ [CH ２ ｍ Si(R) ２}, wherein each R is independently selected from OCH ３ and OH, and m is 3 to 34. The coated article according to any one of claims 15 to 17.​

20. R is OCH ３ The coated article according to claim 18, wherein m is 8.

21. R is OCH ３ The coated article according to claim 18, wherein m is 6.

22. The condensation product is {R″Si(OCH ３ ), {R″Si(OCH ２ ), {R″Si}, {R″Si(OCH ３ )(OH)}, {R″Si(OCH ３ )(OH ２ ), {R″Si(OCH ３ )(OH ２ ), {R″Si(OH ３ ), or further includes monomer units including a combination thereof, where R″ is (C5-C38) alkyl, and optionally, at least a part of the monomer units is linked to the substrate. The coated article according to any one of claims 18 to 21.

23. The aforementioned {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ A monomer unit containing} and the {R"Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The coated article according to claim 21, wherein the ratio of monomer units, or combinations thereof, to monomer units is 10:1 to 1:

10.

24. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ A coated article according to any one of claims 21 to 23, comprising a condensation product with monomer units including Si, or combinations thereof.

25. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 24, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

26. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 24, wherein the ratio of monomer units containing Si or a combination thereof is 1:1 to 1:

10.

27. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ A coated article according to any one of claims 21 to 23, comprising a condensation product with monomer units including Si, or combinations thereof.

28. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 27, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

29. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 27, wherein the ratio of monomer units containing Si or combinations thereof is 1:1 to 1:

10.

30. The coated article according to any one of claims 1 to 29, wherein the fingerprint-concealing coating exhibits an oleic acid contact angle of 30° or less.

31. The aforementioned fingerprint-concealing coating A voltage of approximately 15 volts or less in a tribocharging test, or A coated article according to any one of claims 1 to 30, which exhibits at least one of the voltage differences between a peripheral contact area and a central contact area of ​​about 5 volts or less in the tribocharging test.

32. When a simulated fingerprint is applied to the fingerprint-concealing coating in a simulated fingerprint test, the fingerprint-concealing coating, The effective diameter of the simulated fingerprint droplet of 10 μm or larger, The average height of the simulated fingerprint droplets on the outer surface, which is 0.15 μm or less, or A coated article according to any one of claims 1 to 31, which shows at least one of the spherical crown radii of the simulated fingerprint droplets, which are 40 μm or larger.

33. When a simulated fingerprint is applied to the fingerprint-concealing coating in a simulated fingerprint test, the fingerprint-concealing coating, 0.10 μm between 10% and 90% load area ratio ３ / μm ２ A coated article according to any one of claims 1 to 32, showing the core material value Vmc of the above-mentioned simulated fingerprint droplet.

34. The aforementioned fingerprint-concealing coating The ratio of the volume of the droplet to the area of ​​the droplet is 0.78 μm. ３ / μm ２ Is it the following, The ratio of the height of the droplet to the area of ​​the droplet is 0.005 μm / μm ２ Is it the following, 150,000 μm ２ The total area of ​​the simulated fingerprints on the aforementioned outer surface, In the aforementioned simulated fingerprint test, is the haze caused by the simulated fingerprint applied to the fingerprint-concealing coating 8% or less? The center of the sphere modeled on the droplet of the simulated fingerprint is located more than 30 μm from the outer surface of the fingerprint-concealing coating. In the aforementioned simulated fingerprint test, the average gray level of the coated article having the simulated fingerprint applied to the fingerprint-concealing coating is 150 or less when measured in a gray level test, or The coated article according to claim 33, wherein the normalized gray level of the coated article having the fingerprint-concealing coating applied to the simulated fingerprint in the simulated fingerprint test is 2.0 or less when measured in a normalized gray level test, and the normalized gray level of the coated article is 2.0 or less.

35. The aforementioned fingerprint-concealing coating Polar surface energy of 2 millinewtons per meter to 6 millinewtons per meter, or A coated article according to any one of claims 1 to 34, comprising at least one of a total surface energy of 25 millinewtons per meter to 35 millinewtons per meter.

36. The coated article according to any one of claims 1 to 35, wherein the fingerprint-concealing coating has a thickness of 1 nanometer to 75 nanometers.

37. The coated article according to any one of claims 1 to 36, wherein the outer surface of the fingerprint-concealing coating contains 0.5 atomic% to 2 atomic% of a non-fluorine halogen.

38. The coated article according to any one of claims 1 to 37, wherein the outer surface of the fingerprint-concealing coating does not contain a transition metal-containing compound.

39. The aforementioned fingerprint-concealing coating After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of claims 1 to 38, exhibiting at least one of a rubber abrasion water contact angle of approximately 80° or more after being abraded for 3,000 cycles in a rubber abrasion test.

40. The material further includes a planarization layer positioned between the substrate and the fingerprint-concealing coating, wherein the fingerprint-concealing coating is disposed on the planarization layer, and the planarization layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The ratio of Si-O-Si bonds to Si atoms in the planarized layer is approximately 2 to approximately 3, or A coated article according to any one of claims 1 to 39, wherein at least one of the following is expressed: the molar ratio of hydrogen to silicon in the planarized layer is about 0.2 or more.

41. The coated article according to claim 40, wherein the planarization layer includes a refractive index in the range of 1.37 to 1.

55.

42. The coated article according to any one of claims 40 to 41, wherein the planarization layer has an elastic modulus in the range of about 9 gigapascals to about 70 gigapascals.

43. The planarization layer is In the steel wool abrasion test, after 2,000 cycles of abrasion, the abrasion water contact angle was approximately 80° or more. After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of claims 40 to 42, exhibiting at least one of a rubber abrasion water contact angle of approximately 80° or more after being abraded for 3,000 cycles in a rubber abrasion test.

44. An anti-reflective coating positioned between the fingerprint-concealing coating and the substrate, or A coated article according to any one of claims 1 to 43, further comprising at least one of a gradient coating including a refractive index gradient positioned between the fingerprint-concealing coating and the substrate.

45. A coated article according to any one of claims 1 to 44, further comprising an optical stack positioned between the fingerprint-concealing coating and the substrate, wherein the optical stack includes an anti-reflective coating, a bandpass filter coating, an edge-neutral mirror, a beam splitter coating, a multilayer high-reflectivity coating, or an edge filter coating.

46. The coated article according to claim 45, wherein the optical stack has a stack thickness of about 10 nanometers to about 10 micrometers.

47. The coated article according to claim 46, wherein the stack thickness of the optical stack is about 50 nanometers to about 5 micrometers.

48. The coated article according to any one of claims 46 to 47, wherein the stack thickness of the optical stack is about 50 nanometers to about 500 nanometers.

49. The coated article according to any one of claims 45 to 48, wherein the optical stack includes a scratch-resistant layer, and the scratch-resistant layer has a scratch-resistant thickness of 0.05 micrometers to 3 micrometers.

50. The coated article according to any one of claims 45 to 49, wherein the coated article, including the optical stack and the fingerprint-concealing coating, exhibits a hardness of 8 gigapascals or more as measured by a Berkovich indenter hardness test.

51. The optical stack comprises silicon-containing oxide, silicon-containing nitride, silicon-containing oxynitride, and Nb ２ O ５ A coated article according to any one of claims 45 to 50, comprising one or more of the following:

52. The optical stack comprises two or more layers having different refractive indices, including at least a first low refractive index (RI) layer and a second high refractive index (RI) layer, wherein the absolute value of the difference between the first low RI layer and the second high RI layer is 0.2 or more, and furthermore, the optical stack comprises silicon-containing oxide, silicon-containing nitride, silicon-containing oxynitride, and Nb ２ O ５ A coated article according to any one of claims 45 to 51, comprising one or more of the above.

53. The coated article according to any one of claims 1 to 52, wherein the substrate is a textured substrate.

54. The coated article according to claim 53, further comprising an anti-reflective coating or gradient coating positioned between the fingerprint-concealing coating and the textured substrate.

55. The coated article according to claim 54, wherein the thickness of the anti-reflective coating is approximately 200 nanometers to approximately 3 micrometers.

56. The coated article according to any one of claims 1 to 52, wherein the substrate is a polymer substrate.

57. Coated articles, A substrate including a first main surface, A fingerprint-concealing coating disposed to cover the first main surface, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint concealer comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R') ２ [television] ２ ] ｍ [Si(R'') ２ O] ｎ Si(R') ２ [television] ２ ] ｐ Si(R") ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and R' and R'' are independently selected from CH ３ and CH ２ CH ３ A coated article selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

58. R is CH ３ The coated article according to claim 57.

59. In the above structure, at least one: n is 1 and q is between 1 and 100, or A coated article according to any one of claims 57 to 58, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

60. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or A coated article according to any one of claims 57 to 59, wherein n is 2 or more, m is 8, p is 8, and q is 1 to 100, at least one of these.

61. Coated articles, A substrate including a first main surface, A fingerprint-concealing coating disposed to cover the first main surface, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint concealer comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {Si(R') ２ [television] ２ ] ｍ Si(R') ２ The compound contains a condensation product of monomer units including O, where each R' independently is CH ３ and CH ２ CH ３ A coated article selected from the range where m is between 3 and 34.

62. R' is CH ３ The coated article according to claim 61.

63. R' is CH ３ The coated article according to claim 61, wherein m is 8.

64. The condensation product is {{R''Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ A coated article according to any one of claims 61 to 63, further comprising monomer units comprising} or a combination thereof, wherein R'' is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

65. The above {Si(R') ２ [television] ２ ] ｍ Si(R') ２ A monomer unit containing {O} and the {R''Si(OCH}}. ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The coated article according to claim 64, wherein the ratio of monomer units, including} or a combination thereof, is 10:1 to 1:

10.

66. The alkylsilane oligomer, the alkylsilane polymer, or both are {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ A coated article according to any one of claims 61 to 65, comprising a condensation product with monomer units including Si, or combinations thereof.

67. The aforementioned {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ A monomer unit containing {(CH ３ ) (CH ２ ) １７ Si(OCH) ３ ) ２ }, {(CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 66, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

68. The aforementioned fingerprint-concealing coating After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of claims 57 to 67, exhibiting at least one of a rubber abrasion water contact angle of approximately 80° or more after being abraded for 3,000 cycles in a rubber abrasion test.

69. A coated article according to any one of claims 57 to 68, further comprising an optical stack positioned between the fingerprint-concealing coating and the substrate, wherein the optical stack includes an anti-reflective coating, a bandpass filter coating, an edge-neutral mirror, a beam splitter coating, a multilayer high-reflectivity coating, or an edge filter coating.

70. The coated article according to any one of claims 57 to 69, wherein the substrate is a textured substrate.

71. The coated article according to claim 70, further comprising an anti-reflective coating or gradient coating positioned between the fingerprint-concealing coating and the textured substrate.

72. The coated article according to any one of claims 57 to 68, wherein the substrate is a polymer substrate.

73. Coated articles, A substrate including a first main surface, A fingerprint-concealing coating disposed to cover the first main surface, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint concealer comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R) ２ [television] ２ ] ｍ [Si (Note)] ２ O] ｎ Si(R) ２ [television] ２ ] ｐ Si(R) ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and each R is independently OCH ３ , OH, and OSi(R') ２ [television] ２ ] ｍ’ Selected from, m' independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' independently, OCH ３ A coated article selected from the group consisting of and OH.

74. The coated article according to claim 73, wherein the alkylsilane is chlorine-free.

75. R' is OCH ３ The coated article according to claim 73 or 74.

76. In the above structure, at least one: n is 1 and q is between 1 and 100, or A coated article according to any one of claims 73 to 75, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

77. In the above structure, at least one: n is 1 and q is between 1 and 100, or A coated article according to any one of claims 73 to 75, wherein n is 1, m is 6, p is 6, and q is 1 to 100.

78. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2, m is 6, p is 6, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100. n is 2 or greater, m is 8, p is 8, and q is between 1 and 100, or A coated article according to any one of claims 73 to 75, wherein n is 2 or more, m is 6, p is 6, and q is 1 to 100, at least one of these.

79. Coated articles, A substrate including a first main surface, A fingerprint-concealing coating disposed to cover the first main surface, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint concealer comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ The formula contains a condensation product of monomer units including}, where each R is independently OCH ３ Coated articles selected from and OH, where m is 3 to 34.

80. R is OCH ３ The coated article according to claim 79, wherein m is 8.

81. R is OCH ３ The coated article according to claim 80, wherein m is 6.

82. The condensation product is {{R''Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ A coated article according to any one of claims 79 to 81, further comprising monomer units including} or a combination thereof, wherein R'' is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

83. The aforementioned {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ A monomer unit containing {{R"Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The coated article according to claim 82, wherein the ratio of monomer units, including} or combinations thereof, is 10:1 to 1:

10.

84. The aforementioned {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ A monomer unit containing} and the {R"Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The coated article according to claim 82, wherein the ratio of monomer units, including} or combinations thereof, to monomer units is 1:1 to 1:

10.

85. The alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ A coated article according to any one of claims 79 to 84, comprising a condensation product with monomer units including Si, or combinations thereof.

86. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 85, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

87. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 85, wherein the ratio of monomer units containing Si or a combination thereof is 1:1 to 1:

10.

88. The alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ A coated article according to any one of claims 79 to 84, comprising a condensation product with monomer units including Si, or combinations thereof.

89. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 88, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

90. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 89, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

91. The aforementioned fingerprint-concealing coating After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of claims 79 to 90, exhibiting at least one of a rubber abrasion water contact angle of approximately 80° or more after being abraded for 3,000 cycles in a rubber abrasion test.

92. A coated article according to any one of claims 79 to 91, further comprising an optical stack positioned between the fingerprint-concealing coating and the substrate, wherein the optical stack includes an anti-reflective coating, a bandpass filter coating, an edge-neutral mirror, a beam splitter coating, a multilayer high-reflectivity coating, or an edge filter coating.

93. The coated article according to any one of claims 79 to 92, wherein the substrate is a textured substrate.

94. The coated article according to claim 93, further comprising an anti-reflective coating or gradient coating positioned between the fingerprint-concealing coating and the textured substrate.

95. The coated article according to any one of claims 79 to 94, wherein the substrate is a polymer substrate.

96. Coated articles, A substrate including a first main surface, A planarization layer disposed to cover the first main surface, wherein the planarization layer has a thickness of approximately 10 nanometers to approximately 600 nanometers between a first surface area and a second surface area opposite to the first surface area, and the second surface area faces the first main surface. A fingerprint-concealing coating disposed on the first surface area of ​​the planarized layer, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint-concealing coating comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R') ２ [television] ２ ] ｍ [Si(R'') ２ O] ｎ Si(R') ２ [television] ２ ] ｐ Si(R") ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and R' and R'' are independently selected from CH ３ and CH ２ CH ３ A coated article selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

97. The planarization layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The ratio of Si-O-Si bonds to Si atoms in the planarized layer is approximately 2 to approximately 3, or The coated article according to claim 96, comprising at least one of the following: a molar ratio of hydrogen to silica of approximately 0.2 or more.

98. The coated article according to any one of claims 96 to 97, wherein the planarization layer has an elastic modulus in the range of about 9 gigapascals to about 70 gigapascals.

99. R is CH ３ A coated article according to any one of claims 96 to 98.

100. In the above structure, at least one: n is 1 and q is between 1 and 100, or A coated article according to any one of claims 96 to 99, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

101. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or A coated article according to any one of claims 96 to 99, wherein n is 2 or more, m is 8, p is 8, and q is 1 to 100, at least one of these.

102. Coated articles, A substrate including a first main surface, A planarization layer disposed to cover the first main surface, wherein the planarization layer has a thickness of approximately 10 nanometers to approximately 600 nanometers between a first surface area and a second surface area opposite to the first surface area, and the second surface area faces the first main surface. A fingerprint-concealing coating disposed on the first surface area of ​​the planarized layer, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint-concealing coating comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {Si(R') ２ [television] ２ ] ｍ Si(R') ２ The compound contains a condensation product of monomer units including O, where each R' independently is CH ３ and CH ２ CH ３ A coated article selected from the range where m is between 3 and 34.

103. The planarization layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The ratio of Si-O-Si bonds to Si atoms in the planarized layer is approximately 2 to approximately 3, or The coated article according to claim 102, comprising at least one of the following: a molar ratio of hydrogen to silica of approximately 0.2 or more.

104. The coated article according to any one of claims 102 to 103, wherein the planarization layer has an elastic modulus in the range of about 9 gigapascals to about 70 gigapascals.

105. R' is CH ３ A coated article according to any one of claims 102 to 104, wherein m is 8.

106. The condensation product is {R''Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ A coated article according to any one of claims 102 to 105, further comprising monomer units comprising} or a combination thereof, wherein R'' is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

107. {OSi(R') ２ [television] ２ ] ｍ Si(R') ２ A monomer unit containing {R”Si(OCH ３ ) ３ The coated article according to claim 106, wherein the ratio of monomer units containing} is 10:1 to 1:

10.

108. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ A coated article according to any one of claims 102 to 107, comprising a condensation product with monomer units including Si, or combinations thereof.

109. The aforementioned {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ A monomer unit containing {(CH ３ ) (CH ２ ) １７ Si(OCH) ３ ) ２ }, {(CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 108, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

110. The aforementioned {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ A monomer unit containing the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ ) ２ }, {(CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 108, wherein the ratio of monomer units containing Si or a combination thereof is 11:1 to 1:

10.

111. The planarization layer is In the steel wool abrasion test, after 2,000 cycles of abrasion, the abrasion water contact angle was approximately 80° or more. After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of claims 102 to 110, exhibiting at least one of a rubber abrasion water contact angle of approximately 80° or more after being abraded for 3,000 cycles in a rubber abrasion test.

112. A coated article according to any one of claims 102 to 111, further comprising an optical stack positioned between the planarization layer and the substrate, wherein the optical stack includes an anti-reflective coating, a bandpass filter coating, an edge-neutral mirror, a beam splitter coating, a multilayer high-reflectivity coating, or an edge filter coating.

113. The coated article according to any one of claims 102 to 112, wherein the substrate is a textured substrate.

114. The coated article according to claim 113, further comprising an anti-reflective coating or gradient coating positioned between the planarization layer and the textured substrate.

115. The coated article according to any one of claims 102 to 114, wherein the substrate is a polymer substrate.

116. Coated articles, A substrate including a first main surface, A planarization layer disposed to cover the first main surface, wherein the planarization layer has a thickness of approximately 10 nanometers to approximately 600 nanometers between a first surface area and a second surface area opposite to the first surface area, and the second surface area faces the first main surface. A fingerprint-concealing coating disposed on the first surface area of ​​the planarized layer, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint-concealing coating comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R) ２ [television] ２ ] ｍ [Si (Note)] ２ O] ｎ Si(R) ２ [television] ２ ] ｐ Si(R) ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and each R is independently OCH ３ , OH, and OSi(R') ２ [television] ２ ] ｍ’ Selected from, m' independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' independently, OCH ３ A coated article selected from the group consisting of and OH.

117. The planarization layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The ratio of Si-O-Si bonds to Si atoms in the planarized layer is approximately 2 to approximately 3, or The coated article according to claim 116, comprising at least one of the following: a molar ratio of hydrogen to silica of approximately 0.2 or more.

118. The coated article according to any one of claims 116 to 117, wherein the planarization layer has an elastic modulus in the range of about 9 gigapascals to about 70 gigapascals.

119. In the above structure, at least one: n is 1 and q is between 1 and 100, or A coated article according to any one of claims 116 to 118, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

120. In the above structure, at least one: n is 1 and q is between 1 and 100, or A coated article according to any one of claims 116 to 119, wherein n is 1, m is 6, p is 6, and q is 1 to 100.

121. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2, m is 6, p is 6, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100. n is 2 or greater, m is 8, p is 8, and q is between 1 and 100, or A coated article according to any one of claims 116 to 118, wherein n is 2 or more, m is 6, p is 6, and q is 1 to 100, at least one of these.

122. Coated articles, A substrate including a first main surface, A planarization layer disposed to cover the first main surface, wherein the planarization layer has a thickness of approximately 10 nanometers to approximately 600 nanometers between a first surface area and a second surface area opposite to the first surface area, and the second surface area faces the first main surface. A fingerprint-concealing coating disposed on the first surface area of ​​the planarized layer, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint-concealing coating comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ The formula contains a condensation product of monomer units including}, where each R is independently OCH ３ Coated articles selected from and OH, where m is 3 to 34.

123. R is OCH ３ The coated article according to claim 122, wherein m is 8.

124. R is OCH ３ The coated article according to claim 122, wherein m is 6.

125. The condensation product is {R''Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ A coated article according to any one of claims 122 to 124, further comprising monomer units comprising}, or a combination thereof, wherein R'' is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

126. The aforementioned {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ A monomer unit containing} and the {R"Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The coated article according to claim 125, wherein the ratio of monomer units, including} or combinations thereof, is 10:1 to 1:

10.

127. The aforementioned {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ A monomer unit containing {{R"Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The coated article according to claim 125, wherein the ratio of monomer units, or combinations thereof, to monomer units is 1:1 to 1:

10.

128. The alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ A coated article according to any one of claims 125 to 127, comprising a condensation product with monomer units including Si, or combinations thereof.

129. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 128, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

130. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 128, wherein the ratio of monomer units containing Si or a combination thereof is 11:1 to 1:

10.

131. The alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ A coated article according to any one of claims 125 to 127, comprising a condensation product with monomer units including Si, or combinations thereof.

132. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 131, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

133. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The coated article according to claim 131, wherein the ratio of monomer units containing Si or a combination thereof is 11:1 to 1:

10.

134. A method for forming a coated article, an alkylsilane, wherein the alkylsilane is C ３ -C ３４ An alkylsilane containing an alkyl group, wherein the alkylsilane contains at least two reactive groups independently selected from silane, nonfluorine halogen, or a combination thereof, is disposed on the first main surface of the substrate. This includes reacting the alkylsilane to form a fingerprint-concealing coating on the first main surface of the substrate, The aforementioned fingerprint-concealing coating Water contact angle of 90° to 120°, Oleic acid contact angle of 40° or less, and A method for demonstrating that the coefficient of friction of the outer surface is 0.25 or less.

135. The method according to claim 134, wherein the arrangement includes spray coating the alkylsilane onto the first main surface.

136. The method according to any one of claims 134 to 135, wherein the reaction comprises heating the alkylsilane at a temperature of about 80°C to about 250°C for a period of about 10 minutes to about 8 hours.

137. The method according to any one of claims 134 to 135, wherein the reaction comprises distributing the alkylsilane on the planarized layer at a temperature of about 20°C to about 40°C for a period of about 1 hour to about 24 hours.

138. The method according to any one of claims 134 to 137, wherein two of the at least two reactive groups are located at the opposite end of the alkylsilane.

139. The method according to any one of claims 134 to 138, wherein the alkylsilane includes alkyltrichlorosilane, alkyldichloromethoxysilane, alkylchlorodimethoxysilane, alkyldichloromethylsilane, alkylchlorodimethylsilane, alkyltrimethoxysilane, alkyltriethoxysilane, or a combination thereof.

140. The method according to any one of claims 134 to 139, wherein the alkylsilane comprises alkylchlorodimethylsilane and alkyltrimethoxysilane.

141. The method according to claim 140, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

142. The method according to any one of claims 139 to 141, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

143. The method according to claim 142, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

144. The method according to any one of claims 134 to 143, wherein the alkylsilane includes 1,8-bis(chlorodimethylsilyl)ocatane, chloropropyltrimethoxysilane, octadecyltrimethoxysilane, or a combination thereof.

145. The method according to any one of claims 134 to 143, wherein the alkylsilane includes 1,8-bis(trimethoxysilyl)octane, 1,6-bis(trimethoxysilyl)hexane, octadecyltrimethoxysilane, or a combination thereof.

146. The method according to any one of claims 134 to 145, wherein the alkylsilane is chlorine-free.

147. The method according to any one of claims 134 to 146, wherein the alkylsilane comprises alkyltrimethoxysilyl and alkyltrimethoxysilane.

148. The method according to claim 147, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

149. The method according to any one of claims 147 to 148, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

150. The method according to claim 149, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 10% to about 50%.

151. The method according to any one of claims 134 to 150 or 253 to 259, wherein the alkylsilane further comprises a dimethylsilane having silanes at both ends of the dimethylsilane.

152. The method according to claim 151, wherein the dimethylsilane is dichloro-tetramethyl-disoloxane.

153. The method according to any one of claims 151 to 152, wherein the amount of dimethylsilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

154. The method according to claim 153, wherein the amount of dimethylsilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

155. The method according to any one of claims 134 to 146, wherein the alkylsilane consists of a single alkylsilane compound.

156. The method according to any one of claims 134 to 155, wherein the provision of the alkylsilane includes providing a solution containing the alkylsilane, and the pH of the solution is 6 to 8.

157. The method according to any one of claims 134 to 156, wherein the fingerprint-concealing coating comprises an oligomer of the alkylsilane, a polymer of the alkylsilane, or both.

158. The aforementioned fingerprint-concealing coating The alkylsilane is bonded to the substrate by a silane group, or the alkylsilane is bonded to another part of the coated article by a silane group, or both. The silane group of the alkylsilane is at the free end of the alkylsilane, or The method according to any one of claims 134 to 157, further comprising both of the above.

159. The method according to any one of claims 157 to 158, wherein the oligomer of the alkylsilane, the polymer of the alkylsilane, or both comprises a dialkylsiloxane block.

160. The method according to any one of claims 157 to 159, wherein monomer units comprising the oligomer of the alkylsilane, monomer units comprising the polymer of the alkylsilane, or both are bonded together by a disiloxane group.

161. The method according to any one of claims 157 to 160, wherein monomer units comprising the oligomer of the alkylsilane, monomer units comprising the polymer of the alkylsilane, or both are bonded together by a dimethylsiloxane block.

162. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R') ２ [television] ２ ] ｍ [Si(R'') ２ O] ｎ Si(R') ２ [television] ２ ] ｐ Si(R") ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and R' and R'' are independently selected from CH ３ and CH ２ CH ３ The method according to any one of claims 157 to 161, wherein n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

163. R is CH ３ The method according to claim 162.

164. In the above structure, at least one: n is 1 and q is between 1 and 100, or The method according to any one of claims 162 to 163, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

165. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or The method according to any one of claims 162 to 163, wherein n is 2 or more, m is 8, p is 8, and q is 1 to 100, at least one of these.

166. The fingerprint concealer comprises an alkylsilane oligomer, an alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {Si(R') ２ [television] ２ ] ｍ Si(R') ２ The compound contains a condensation product of monomer units including O, where each R' independently is CH ３ and CH ２ CH ３ The method according to any one of claims 157 to 161, wherein m is selected from and m is 3 to 34.

167. R' is CH ３ The method according to claim 166.

168. R' is CH ３ The method according to claim 166, wherein m is 8.

169. The condensation product is {R''Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The method according to any one of claims 166 to 168, further comprising monomer units including} or a combination thereof, wherein R'' is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

170. The above {Si(R') ２ [television] ２ ] ｍ Si(R') ２ A monomer unit containing {O} and the {R''Si(OCH}}. ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The method according to claim 169, wherein the ratio of monomer units, or combinations thereof, to monomer units is 10:1 to 1:

10.

171. The alkylsilane oligomer, the alkylsilane polymer, or both are {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to any one of claims 169 to 170, comprising a condensation product with monomer units including Si, or combinations thereof.

172. The aforementioned {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ ) ２ }, {(CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to claim 171, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

173. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R) ２ [television] ２ ] ｍ [Si (Note)] ２ O] ｎ Si(R) ２ [television] ２ ] ｐ Si(R) ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and each R is independently OCH ３ , OH, and OSi(R') ２ [television] ２ ] ｍ’ Selected from, m' independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' independently, OCH ３ The method according to any one of claims 157 to 161, selected from the group consisting of and OH.

174. The method according to claim 173, wherein the alkylsilane is chlorine-free.

175. R' is OCH ３ The method according to any one of claims 173 to 174.

176. In the above structure, at least one: n is 1 and q is between 1 and 100, or The method according to any one of claims 173 to 175, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

177. In the above structure, at least one: n is 1 and q is between 1 and 100, or The method according to any one of claims 173 to 175, wherein n is 1, m is 6, p is 6, and q is 1 to 100.

178. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2, m is 6, p is 6, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or n is 2 or greater, m is 8, p is 8, and q is between 1 and 100, or The method according to any one of claims 173 to 175, wherein n is 2 or more, m is 6, p is 6, and q is 1 to 100, at least one of these.

179. The fingerprint concealer comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ The formula contains a condensation product of monomer units including}, where each R is independently OCH ３ The method according to any one of claims 157 to 161, wherein m is selected from and OH, and m is between 3 and 34.

180. R is OCH ３ The method according to claim 179, wherein m is 8.

181. R is OCH ３ The method according to claim 179, wherein m is 6.

182. The condensation product is {{R''Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The method according to any one of claims 179 to 181, further comprising monomer units including} or a combination thereof, wherein R'' is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

183. The aforementioned {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ A monomer unit containing} and the {R"Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The method according to claim 182, wherein the ratio of monomer units containing}, or combinations thereof, is 10:1 to 1:

10.

184. The aforementioned {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ A monomer unit containing} and the {R"Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The method according to claim 182, wherein the ratio of monomer units containing}, or combinations thereof, is 1:1 to 1:

10.

185. The alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to any one of claims 179 to 184, comprising a condensation product with monomer units including Si, or combinations thereof.

186. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to claim 185, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

187. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to claim 185, wherein the ratio of monomer units containing Si or combinations thereof is 1:1 to 1:

10.

188. The alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to any one of claims 179 to 184, comprising a condensation product with monomer units including Si, or combinations thereof.

189. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to claim 188, wherein the ratio of monomer units containing {Si} or combinations thereof is 10:1 to 1:

10.

190. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to claim 188, wherein the ratio of monomer units containing Si or a combination thereof is 11:1 to 1:

10.

191. A method for forming a coated article, The functionalized polyhedral oligomer silsesquioxane is deposited onto the first main surface of the substrate, The method involves impacting the first main surface of the substrate with an ion beam, wherein the impact occurs approximately 10 times －４ This is carried out in a chamber containing a chamber pressure in the range of Pascals to about 1 Pascal, and the ion beam is generated using a discharge current of about 0.25 amperes to about 1 ampere to form a planarization layer, and then, The method involves reacting the material of the planarization layer with an alkylsilane to form a fingerprint-concealing coating, wherein the alkylsilane contains three or more carbon atoms, and the silane contains at least two reactive groups independently selected from silanes, nonfluorine halogens, or combinations thereof. The aforementioned fingerprint-concealing coating Water contact angle of 90° to 120°, Oleic acid contact angle of 40° or less, and A method for demonstrating that the coefficient of friction of the outer surface is 0.25 or less.

192. The method according to claim 191, wherein the functionalized polyhedral oligomer silsesquioxane is at least partially functionalized with at least one of an alkene containing 2 to 8 carbon atoms, an alkane containing 1 to 8 carbon atoms, or a combination thereof.

193. The method according to any one of claims 191 to 192, wherein the deposition of the functionalized polyhedral oligomer silsesquioxane and the collision are carried out simultaneously.

194. The method according to any one of claims 191 to 193, wherein the reaction comprises depositing the alkylsilane at a temperature of about 80°C to about 250°C for a period of about 10 minutes to about 8 hours.

195. The method according to any one of claims 191 to 194, wherein the reaction comprises distributing the alkylsilane on the planarization layer at a temperature of about 20°C to about 40°C for a period of about 1 hour to about 24 hours.

196. The method according to any one of claims 191 to 195, wherein two of the at least two reactive groups are located at the opposite end of the alkylsilane.

197. The method according to any one of claims 191 to 196, wherein the alkylsilane includes alkyltrichlorosilane, alkyldichloromethoxysilane, alkylchlorodimethoxysilane, alkyldichloromethylsilane, alkylchlorodimethylsilane, alkyltrimethoxysilane, alkyltriethoxysilane, or a combination thereof.

198. The method according to any one of claims 191 to 197, wherein the alkylsilane comprises alkylchlorodimethylsilane and alkyltrimethoxysilane.

199. The method according to claim 198, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

200. The method according to any one of claims 198 to 199, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

201. The method according to claim 200, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

202. The method according to any one of claims 191 to 201, wherein the alkylsilane includes 1,8-bis(chlorodimethylsilyl)ocatane, chloropropyltrimethoxysilane, octadecyltrimethoxysilane, or a combination thereof.

203. The method according to any one of claims 191 to 201, wherein the alkylsilane includes 1,8-bis(trimethoxysilyl)octane, 1,6-bis(trimethoxysilyl)hexane, octadecyltrimethoxysilane, or a combination thereof.

204. The method according to any one of claims 191 to 201, wherein the alkylsilane is chlorine-free.

205. The method according to any one of claims 134 to 204, wherein the alkylsilane comprises alkyltrimethoxysilyl and alkyltrimethoxysilane.

206. The method according to claim 205, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

207. The method according to any one of claims 205 to 206, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

208. The method according to claim 207, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 10% to about 50%.

209. The method according to any one of claims 191 to 208, wherein the alkylsilane further comprises a dimethylsilane having silanes at both ends of the dimethylsilane.

210. The method according to claim 209, wherein the dimethylsilane is dichloro-tetramethyl-disoloxane.

211. The method according to any one of claims 209 to 210, wherein the amount of dimethylsilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

212. The method according to claim 211, wherein the amount of dimethylsilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

213. The method according to any one of claims 191 to 204, wherein the alkylsilane comprises a single alkylsilane compound.

214. The method according to any one of claims 191 to 213, wherein the provision of the alkylsilane includes provision of a solution containing the alkylsilane, and the pH of the solution is 6 to 8.

215. The planarization layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The ratio of Si-O-Si bonds to Si atoms in the planarized layer is approximately 2 to approximately 3, or The method according to any one of claims 191 to 214, wherein the molar ratio of hydrogen to silicon in the planarized layer is about 0.2 or more.

216. The method according to any one of claims 191 to 215, wherein the fingerprint-concealing coating comprises an oligomer of the alkylsilane, a polymer of the alkylsilane, or both.

217. The aforementioned fingerprint-concealing coating The alkylsilane is bonded to the planarization layer by a silane group, The silane group of the alkylsilane is at the free end of the alkylsilane, or The method according to any one of claims 119 to 216, further comprising both of the above.

218. The method according to any one of claims 216 to 217, wherein the oligomer of the alkylsilane, the polymer of the alkylsilane, or both comprises a dialkylsiloxane block.

219. The method according to any one of claims 216 to 218, wherein monomer units comprising the oligomer of the alkylsilane, monomer units comprising the polymer of the alkylsilane, or both are bonded together by a disiloxane group.

220. The method according to any one of claims 216 to 219, wherein monomer units comprising the oligomer of the alkylsilane, monomer units comprising the polymer of the alkylsilane, or both are bonded together by a dimethylsiloxane block.

221. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R') ２ [television] ２ ] ｍ [Si(R'') ２ O] ｎ Si(R') ２ [television] ２ ] ｐ Si(R") ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and R' and R'' are independently selected from CH ３ and CH ２ CH ３ The method according to any one of claims 216 to 220, wherein n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

222. R is CH ３ The method according to claim 221.

223. In the above structure, at least one: n is 1 and q is between 1 and 100, or The method according to any one of claims 221 to 222, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

224. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100, or The method according to any one of claims 221 to 222, wherein n is 2 or more, m is 8, p is 8, and q is 1 to 100, at least one of these.

225. The fingerprint concealer comprises an alkylsilane oligomer, an alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {Si(R') ２ [television] ２ ] ｍ Si(R') ２ The compound contains a condensation product of monomer units including O, where each R' independently is CH ３ and CH ２ CH ３ The method according to any one of claims 216 to 220, wherein m is selected from and m is 3 to 34.

226. R' is CH ３ The method according to claim 225.

227. R' is CH ３ The method according to claim 225, wherein m is 8.

228. The condensation product is {R''Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The method according to any one of claims 225 to 227, further comprising monomer units comprising}, or a combination thereof, or a combination thereof, wherein R'' is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

229. The above {Si(R') ２ [television] ２ ] ｍ Si(R') ２ A monomer unit containing {O} and the {R''Si(OCH}}. ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The method according to claim 228, wherein the ratio of monomer units containing}, or combinations thereof, is 10:1 to 1:

10.

230. The alkylsilane oligomer, the alkylsilane polymer, or both are {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to any one of claims 228 to 229, comprising a condensation product with monomer units including Si, or combinations thereof.

231. The monomer unit containing {OSi(CH ３ )(CH ２ )[CH ２ ) ８ Si(CH ３ )(CH ２}, and the ratio of the monomer unit containing {(CH ３ )(CH ２ ) １７ Si(OCH ３ )(CH ２}, {(CH ３ )(CH ２ ) １７ Si(OCH ３ ), {(CH ３ )(CH ２ )<0000\910>Si}, or a combination thereof is 10:1 to 1:10, the method according to claim 230.

232. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R) ２ [television] ２ ] ｍ [Si (Note)] ２ O] ｎ Si(R) ２ [television] ２ ] ｐ Si(R) ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and each R is independently OCH ３ , OH, and OSi(R') ２ [television] ２ ] ｍ’ Selected from, m' independently selected from 3 to 34, n is 1 or greater, q is 1 or greater, and each R' independently, OCH ３ The method according to any one of claims 216 to 220, selected from the group consisting of and OH.

233. The method according to claim 232, wherein the alkylsilane does not contain chlorine.

234. R' is OCH ３ The method according to any one of claims 232 to 233.

235. In the above structure, at least one: n is 1 and q is between 1 and 100, or The method according to any one of claims 232 to 234, wherein n is 1, m is 8, p is 8, and q is 1 to 100.

236. In the above structure, at least one: n is 1 and q is between 1 and 100, or The method according to any one of claims 232 to 234, wherein n is 1, m is 6, p is 6, and q is 1 to 100.

237. In the above structure, n is 2, and q is between 1 and 100. n is 2, m is 8, p is 8, and q is between 1 and 100. n is 2, m is 6, p is 6, and q is between 1 and 100. n is 2 or greater, and q is between 1 and 100. n is 2 or greater, m is 8, p is 8, and q is between 1 and 100, or The method according to any one of claims 232 to 234, wherein n is 2 or more, m is 6, p is 6, and q is 1 to 100, at least one of these.

238. The fingerprint concealer comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ The formula contains a condensation product of monomer units including}, where each R is independently OCH ３ The method according to any one of claims 216 to 220, wherein m is selected from and OH, and m is between 3 and 34.

239. R is OCH ３ The method according to claim 238, wherein m is 8.

240. R is OCH ３ The method according to claim 238, wherein m is 6.

241. The condensation product is {{R''Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The method according to any one of claims 238 to 240, further comprising monomer units comprising} or a combination thereof, wherein R'' is (C5-C38) alkyl, and optionally at least a portion of the monomer units is linked to the substrate.

242. The aforementioned {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ A monomer unit containing} and the {R"Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The method according to claim 241, wherein the ratio of monomer units containing}, or combinations thereof, is 10:1 to 1:

10.

243. The aforementioned {(OSi(R) ２ [television] ２ ] ｍ Si(R) ２ A monomer unit containing} and the {R"Si(OCH ３ ) ２ }, {R”Si(OCH ３ )}, {R”Si}, {R”Si(OCH ３ ) ２ (OH)}, {R”Si(OCH ３ ) (OH) ２ }, {R”Si(OH) ３ The method according to claim 241, wherein the ratio of monomer units, or combinations thereof, is 1:1 to 1:

10.

244. The oligomer of the alkylsilane, the polymer of the alkylsilane, or both of them, { (OSi(OCH ３ )) ２ [CH ２ ８ Si(OCH ３ )) ２}, and a condensation product with a monomer unit containing { (CH ３ )(CH ２ )) １７ Si(OCH ３ ), { (CH ３ )(CH ２ )) １７ Si}, or a combination thereof, the method according to any one of claims 238 to 243.​

245. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to claim 244, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

246. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ８ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to claim 244, wherein the ratio of monomer units containing Si or combinations thereof is 1:1 to 1:

10.

247. The alkylsilane oligomer, the alkylsilane polymer, or both are {(OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to any one of claims 238 to 243, comprising a condensation product with monomer units including Si, or combinations thereof.

248. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to claim 247, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

249. The aforementioned { (OSi(OCH ３ ) ２ [television] ２ ] ６ Si(OCH) ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The method according to claim 247, wherein the ratio of monomer units containing Si or a combination thereof is 10:1 to 1:

10.

250. The coated article according to any one of claims 6 to 14, wherein R is selected from a methoxy group, an ethoxy group, a hydroxyl group, or a combination thereof.

251. The coated article according to any one of claims 57 to 60, wherein R is selected from a methoxy group, an ethoxy group, a hydroxyl group, or a combination thereof.

252. The coated article according to any one of claims 96 to 101, wherein R is selected from a methoxy group, an ethoxy group, a hydroxyl group, or a combination thereof.

253. The method according to any one of claims 134 to 138, wherein the alkylsilane includes alkyltrichlorosilane, alkyldichloromethoxysilane, alkylchlorodimethoxysilane, alkyldichloromethylsilane, alkylchlorodimethylsilane, alkyltrimethoxysilane, alkyltriethoxysilane, alkyldimethylmethoxysilane, alkyldimethylethoxysilane, or a combination thereof.

254. The method according to any one of claims 134 to 139, wherein the alkylsilane comprises alkyldimethylmethoxysilane and alkyltrimethoxysilane.

255. The method according to any one of claims 253 to 254, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

256. The method according to any one of claims 253 to 255, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

257. The method according to claim 256, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

258. The method according to any one of claims 134-143 or 253-257, wherein the alkylsilane comprises 1,8-bis(dimethylmethoxysilyl)octane, octadecyltrimethoxysilane, or a combination thereof.

259. The method according to any one of claims 253 to 258, wherein the alkylsilane is chlorine-free.

260. The method according to any one of claims 191 to 196, wherein the alkylsilane includes alkyltrichlorosilane, alkyldichloromethoxysilane, alkylchlorodimethoxysilane, alkyldichloromethylsilane, alkylchlorodimethylsilane, alkyltrimethoxysilane, alkyltriethoxysilane, alkyldimethylmethoxysilane, alkyldimethylethoxysilane, or a combination thereof.

261. The method according to any one of claims 191 to 196, wherein the alkylsilane comprises alkyldimethylmethoxysilane and alkyltrimethoxysilane.

262. The method according to any one of claims 260 to 261, wherein the alkyltrimethoxysilane is octadecyltrimethoxysilane.

263. The method according to any one of claims 261 to 262, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 1% to about 90%.

264. The method according to claim 263, wherein the amount of alkyltrimethoxysilane as a weight percentage of the total amount of alkylsilane is about 25% to about 75%.

265. The method according to any one of claims 191 to 201 or 260 to 264, wherein the alkylsilane comprises 1,8-bis(dimethylmethoxysilyl)octane, octadecyltrimethoxysilane, or a combination thereof.

266. The method according to any one of claims 221 to 231, wherein R is selected from a methoxy group, an ethoxy group, a hydroxyl group, or a combination thereof.

267. The method according to any one of claims 221 to 231, wherein R is selected from a methoxy group, an ethoxy group, or a combination thereof.

268. The method according to any one of claims 221 to 231, wherein R is a methoxy group.

269. The fingerprint-concealing coating comprises an alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R') ２ [television] ２ ] ｍ [Si(R'') ２ O] ｎ Si(R') ２ [television] ２ ] ｐ Si(R") ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and R' and R'' are independently selected from CH ３ and CH ２ CH ３ A coated article according to any one of claims 1 to 5, wherein n is 1 or more, q is 1 or more, and R is selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

270. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {Si(R') ２ [television] ２ ] ｍ Si(R') ２ A monomer unit containing O, in which each R' independently is CH ３ and CH ２ CH ３ Selected from, where m is 3 to 34, monomer units and {R ４ Si(OCH) ３ ) ２ }, {R ４ Si(OCH) ３ )}, {R ４ Si, {R ４ Si(OCH) ３ ) ２ (OH)}, {R ４ Si(OCH) ３ ) (OH) ２ }, {R ４ Si(OH) ３ }, or a monomer unit including a combination thereof, in the formula R ４ However, it contains a condensation product with a monomer unit that is (C5-C38) alkyl, and optionally, at least a portion of the monomer unit is linked to the substrate, and the {Si(R') ２ [television] ２ ] ｍ Si(R') ２ A monomer unit containing {O} and the {R} ４ Si(OCH) ３ ) ２ }, {R ４ Si(OCH) ３ )}, {R ４ Si, {R ４ Si(OCH) ３ ) ２ (OH)}, {R ４ Si(OCH) ３ ) (OH) ２ }, {R ４ Si(OH) ３ A coated article according to any one of claims 1 to 5 or 269, wherein the ratio of monomer units, including a combination thereof, to a monomer unit is 10:1 to 1:

10.

271. The fingerprint-concealing coating comprises the alkylsilane oligomer, the alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both are {OSi(CH ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ monomer units containing} and { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ The {OSi(CH}} includes a condensation product with monomer units containing combinations thereof, and the {OSi(CH}} includes a condensation product with monomer units containing those units. ３ ) ２ [television] ２ ] ８ Si(CH ３ ) ２ A monomer unit containing} and the { (CH ３ ) (CH ２ ) １７ Si(OCH) ３ )}, {(CH ３ ) (CH ２ ) １７ A coated article according to any one of claims 1 to 6 or 269 to 270, wherein the ratio of monomer units containing Si or combinations thereof is 10:1 to 1:

10.

272. The aforementioned fingerprint-concealing coating A voltage of approximately 15 volts or less in a tribocharging test, or A coated article according to any one of claims 1 to 271, which exhibits at least one of the voltage differences between a peripheral contact area and a central contact area of ​​about 5 volts or less in the tribocharging test.

273. When a simulated fingerprint is applied to the fingerprint-concealing coating in a simulated fingerprint test, the fingerprint-concealing coating, The effective diameter of the simulated fingerprint droplet of 10 μm or larger, The average height of the simulated fingerprint droplets on the outer surface, which is 0.15 μm or less, or A coated article according to any one of claims 1 to 272, which shows at least one of the spherical crown radii of the simulated fingerprint droplets, which are 40 μm or larger.

274. When a simulated fingerprint is applied to the fingerprint-concealing coating in a simulated fingerprint test, the fingerprint-concealing coating, 0.10 μm between 10% and 90% load area ratio ３ / μm ２ A coated article according to any one of claims 1 to 273, showing the core material value Vmc of the above-mentioned simulated fingerprint droplet.

275. The aforementioned fingerprint-concealing coating The ratio of the volume of the droplet to the area of ​​the droplet is 0.78 μm. ３ / μm ２ Is it the following, The ratio of the height of the droplet to the area of ​​the droplet is 0.005 μm / μm ２ Is it the following, 150,000 μm ２ The total area of ​​the simulated fingerprints on the aforementioned outer surface, In the aforementioned simulated fingerprint test, is the haze caused by the simulated fingerprint applied to the fingerprint-concealing coating 8% or less? The center of the sphere modeled on the droplet of the simulated fingerprint is located more than 30 μm from the outer surface of the fingerprint-concealing coating. In the aforementioned simulated fingerprint test, the average gray level of the coated article having the simulated fingerprint applied to the fingerprint-concealing coating is 150 or less when measured in a gray level test, or The coated article according to claim 274, wherein the normalized gray level of the coated article having the simulated fingerprint applied to the fingerprint-concealing coating in the simulated fingerprint test is 2.0 or less when measured in a normalized gray level test, and the normalized gray level of the coated article is 2.0 or less.

276. The coated article according to any one of claims 1 to 275, wherein the fingerprint-concealing coating has a thickness of 1 nanometer to 75 nanometers.

277. The aforementioned fingerprint-concealing coating After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or A coated article according to any one of claims 1 to 276, exhibiting at least one of a rubber abrasion water contact angle of approximately 80° or more after being abraded for 3,000 cycles in a rubber abrasion test.

278. The material further includes a planarization layer positioned between the substrate and the fingerprint-concealing coating, wherein the fingerprint-concealing coating is disposed on the planarization layer, and the planarization layer is 50% to 90% of the silicon atoms in the planarized layer are located within a silica-like network, The molar ratio of hydrogen to silicon in the planarized layer is approximately 0.2 or greater. or A coated article according to any one of claims 1 to 277, wherein the refractive index is in the range of 1.37 to 1.55, and the refractive index is at least one of these.

279. The planarization layer is In the steel wool abrasion test, after 2,000 cycles of abrasion, the abrasion water contact angle was approximately 80° or more. After being subjected to a cheese cloth abrasion test for 200,000 cycles, the cheese cloth abrasion water contact angle was approximately 80° or more, or The coated article according to claim 278, which exhibits at least one of the following rubber abrasion water contact angles: approximately 80° or more after being abraded for 3,000 cycles in a rubber abrasion test.

280. An anti-reflective coating positioned between the fingerprint-concealing coating and the substrate, or A coated article according to any one of claims 1 to 279, further comprising at least one of a gradient coating including a refractive index gradient positioned between the fingerprint-concealing coating and the substrate.

281. The coated article according to any one of claims 1 to 280, wherein the substrate is a metal, glass, glass ceramic, or polymer substrate.

282. The coated article according to any one of claims 1 to 281, wherein the fingerprint-concealing coating is substantially halogen-free.

283. Coated articles, A substrate including a first main surface, A fingerprint-concealing coating disposed to cover the first main surface, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint-concealing coating is substantially halogen-free and comprises an alkylsilane oligomer, an alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure {OSi(R') ２ [television] ２ ] ｍ [Si(R'') ２ O] ｎ Si(R') ２ [television] ２ ] ｐ Si(R") ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and R' and R'' are independently selected from CH ３ and CH ２ CH ３ A coated article selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

284. Coated articles, A substrate including a first main surface, A planarization layer disposed to cover the first main surface, wherein the planarization layer has a thickness of approximately 10 nanometers to approximately 600 nanometers between a first surface area and a second surface area opposite to the first surface area, and the second surface area faces the first main surface. A fingerprint-concealing coating disposed on the first surface area of ​​the planarized layer, including the outer surface of the coated article, The aforementioned fingerprint-concealing coating does not contain fluorine. The fingerprint-concealing coating is substantially halogen-free and comprises an alkylsilane oligomer, an alkylsilane polymer, or both, wherein the alkylsilane oligomer, the alkylsilane polymer, or both have the structure o{OSi(R') ２ [television] ２ ] ｍ [Si(R'') ２ O] ｎ Si(R') ２ [television] ２ ] ｐ Si(R") ２ } ｑ The formula includes R, where m and p are independently selected from 3 to 34, and R' and R'' are independently selected from CH ３ and CH ２ CH ３ A coated article selected from the group consisting of a hydroxyl group, a chloro group, a bromo group, an alkylsilane, an alkoxide, or a combination thereof.

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