Electrode layer forming apparatus

Abstract

To provide an electrode layer forming apparatus capable of suppressing floating of a pattern mask from a current collector.SOLUTION: An electrode layer forming apparatus 20 includes a first main roll 23, a second main roll 24 which is spaced apart from the first main roll 23, and a pattern mask 22 which is conveyed so as to pass between the first main roll 23 and the second main roll 24 in a state of being superimposed on the current collector 10 to be conveyed along an outer peripheral surface 23c of the first main roll 23. The electrode layer forming apparatus 20 includes a guide member 33 on the upstream side of the electrode layer forming position in a conveyance direction of the current collector 10. The guide member 33 has a guide surface 33e which faces the outer peripheral surface 23c of the first main roll 23 and has a shape extending along the outer peripheral surface 23c of the first main roll 23. The pattern mask 22 is conveyed together with the current collector 10 while being pinched by the outer peripheral surface 23c of the first main roll 23 and the guide surface 33e of the guide member 33.SELECTED DRAWING: Figure 3

Description

[Technical field]

[0001] The present invention relates to an electrode layer forming apparatus. [Background technology]

[0002] Patent Document 1 discloses a coating device that coats paint on a long strip-shaped sheet. The coating device includes two rolls and a hopper that supplies paint between the two rolls. The paint is, for example, a paint with a high solid content. The sheet is transported along the outer circumferential surface of one of the two rolls and passes between the two rolls. Then, as the sheet passes between the two rolls, the paint is coated on the sheet.

[0003] Patent Document 2 discloses a coating device that forms a film on the coating surface of a long strip-shaped film substrate. The coating device includes a coating roll that rotates with a coating material attached to its outer circumferential surface, and a pattern mask application section that overlays a pattern mask on the coating surface of the film substrate. After a pattern mask is overlaid on the coating surface of the film substrate by the pattern mask application section, the film substrate is transported so as to come into contact with the outer circumferential surface of the coating roll. A film is formed on the portions of the coating surface of the film substrate that are not covered by the pattern mask, but no film is formed on the portions that are covered by the pattern mask.

[0004] For example, the pattern mask has first mask constituent parts that are arranged intermittently in the longitudinal direction of the film substrate and second mask constituent parts that are arranged continuously in the longitudinal direction of the sheet with respect to the film substrate. The first mask constituent parts set the film formation range in the longitudinal direction of the film substrate. The second mask constituent parts set the film formation range in the lateral direction of the film substrate. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP 2012-254422 A [Patent Document 2] JP 2015-181981 A Summary of the Invention [Problem to be solved by the invention]

[0006] When the pattern mask disclosed in Patent Document 2 is used in the coating device disclosed in Patent Document 1, the pattern mask is superimposed on the sheet before the sheet passes between the two rolls. At this time, the pattern mask may not deform into a shape that fits the outer peripheral surface of the roll, and may lift off the sheet. This results in some parts of the sheet being left uncovered and coated with paint, even though the sheet should be covered by the pattern mask and not coated with paint.

[0007] In particular, since the first mask constituent parts are provided intermittently in the longitudinal direction of the sheet, they tend to lift up from the sheet without deforming into a shape that fits the outer circumferential surface of the roll. If the first mask constituent parts lift up from the current collector, paint will get in between the lifted first mask constituent parts and the current collector, causing coating defects such as a shift in the coating end position in the longitudinal direction of the sheet. [Means for solving the problem]

[0008] An electrode layer forming apparatus for solving the above problems includes a first roll, a second roll disposed at an interval from the first roll, and a pattern mask that is transported to pass between the first roll and the second roll in a state where the pattern mask is superimposed on a long strip-shaped current collector transported along an outer circumferential surface of the first roll so as to cover a part of a second surface of the current collector that is an opposite surface to a first surface of the current collector that faces the outer circumferential surface of the first roll, the pattern mask having first mask constituent parts that are intermittently disposed in a longitudinal direction of the current collector with respect to the current collector, and the second roll is disposed at a position where a distance between the outer circumferential surface of the first roll and the outer circumferential surface of the second roll is shortest. The present invention relates to an electrode layer forming device that forms an electrode layer on a portion of a second surface of the current collector that is not covered by the pattern mask by pressing a wet powder containing an electrode active material, a binder, and a solvent against the current collector and the pattern mask at an electrode layer formation position, the device including a guide member located upstream of the electrode layer formation position in a transport direction of the current collector, the guide member facing an outer circumferential surface of the first roll and having a guide surface shaped along the outer circumferential surface of the first roll, and the pattern mask being sandwiched between the outer circumferential surface of the first roll and the guide surface of the guide member and transported together with the current collector.

[0009] According to this, the pattern mask is sandwiched between the outer peripheral surface of the first roll and the guide surface of the guide member, and is deformed into a shape that conforms to the outer peripheral surface of the first roll. This makes it possible to prevent the first mask constituent part of the pattern mask from floating up from the current collector. As a result, it is possible to prevent poor formation of the electrode layer in the longitudinal direction of the current collector, which is caused by the first mask constituent part of the pattern mask floating up from the current collector.

[0010] In the above-described electrode layer forming apparatus, the pattern mask may further have second mask components arranged continuously in a longitudinal direction of the current collector, the guide member may have a recess on a surface facing an outer circumferential surface of the first roll, a bottom surface of the recess may be the guide surface, and the second mask components may be located within the recess.

[0011] This can prevent misalignment of the second mask components in the short-side direction of the current collector, thereby preventing poor formation of the electrode layer in the short-side direction of the current collector and preventing wrinkles in the pattern mask.

[0012] The electrode layer forming apparatus may further include a guide roll for guiding a transport route of the pattern mask, the pattern mask further having a second mask component portion that is continuously arranged in a longitudinal direction of the current collector relative to the current collector, the guide roll having a groove portion that extends around the entire outer circumferential surface, and the second mask component portion may be located within the groove portion.

[0013] This prevents misalignment of the second mask components in the axial direction of the guide rolls, thereby preventing wrinkles in the pattern mask. In the above-described electrode layer forming apparatus, the pattern mask may have an overlapping portion where the first mask component and the second mask component overlap, and in the overlapping portion, the first mask component may be located between the second mask component and the current collector.

[0014] According to this, when the guide member has a recess, if the second mask component part is located between the first mask component part and the current collector, the second mask component part will be removed from the recess in the overlapping part. On the other hand, when the first mask component part is located between the second mask component part and the current collector, the second mask component part will be located in the recess in the overlapping part as well. In other words, the pattern mask can be transported with the second mask component part always located in the recess. Similarly, when the guide roll has a groove, the first mask component part is located between the second mask component part and the current collector, so that the pattern mask can be transported with the second mask component part always located in the groove. Therefore, wrinkles in the pattern mask can be further suppressed.

[0015] The electrode layer forming apparatus may further include a powder removing section that removes the wet powder adhering to the pattern mask. The second roll presses the wet powder against the pattern mask, causing the wet powder to adhere to the surface of the pattern mask, and the powder removal section removes the wet powder adhered to the pattern mask, making the pattern mask reusable.

[0016] In the electrode layer forming apparatus, the pattern mask may be in a loop shape and circulated so as to pass between the first roll and the second roll, and the powder removal unit may be disposed midway along the transport of the pattern mask.

[0017] According to this, the pattern mask can be used repeatedly, and therefore, for example, the task of replenishing the pattern mask is no longer necessary. In the above-described electrode layer forming apparatus, the powder removal unit is a scraping blade that removes the wet powder from the pattern mask by scraping off the wet powder adhering to the pattern mask, and when a transport direction of the pattern mask at a point on a transport route of the pattern mask where the powder removal unit is located is defined as a first direction, a direction perpendicular to the first direction and along the thickness of the pattern mask is defined as a second direction, and a direction along the surface of the pattern mask and perpendicular to the first direction and the second direction is defined as a third direction, the scraping blade may be arranged to be inclined with respect to each of the first direction and the third direction.

[0018] According to this, the wet powder can be removed from the pattern mask in two directions, that is, the first direction and the third direction. In the above-described electrode layer forming apparatus, the powder removal unit is a scraping blade that removes the wet powder from the pattern mask by scraping off the wet powder adhering to the pattern mask, and when a transport direction of the pattern mask at a point on a transport route of the pattern mask where the powder removal unit is located is defined as a first direction, and a direction perpendicular to the first direction and along a thickness of the pattern mask is defined as a second direction, the scraping blade is positioned so as to be inclined with respect to each of the first direction and the second direction, and a cutting edge of the scraping blade may be an inclined surface that follows the surface of the pattern mask.

[0019] This improves the ability to scrape off the wet powder adhering to the pattern mask. The electrode layer forming apparatus may further include an adjustment mechanism for adjusting a position of the guide member in a circumferential direction of the first roll.

[0020] According to this, for example, when the suitable position of the guide member in the circumferential direction of the first roll changes due to a change in the shape or thickness of the pattern mask, the position of the guide member can be adjusted by the adjustment mechanism. Effect of the Invention

[0021] According to the present invention, it is possible to suppress the pattern mask from lifting off the current collector. [Brief description of the drawings]

[0022] [Figure 1] FIG. 2 is a plan view of a current collector on which an electrode layer is formed. [Diagram 2] FIG. 2 is a cross-sectional view of a current collector on which an electrode layer is formed. [Diagram 3] 3 is a cross-sectional view of an electrode layer forming section in the first embodiment. FIG. [Figure 4] FIG. 2 is a perspective view of a pattern mask in the first embodiment. [Diagram 5] FIG. 2 is a plan view showing a patterned mask overlaid on a current collector. [Figure 6]FIG. 2 is a side view of the electrode layer forming apparatus. [Figure 7] FIG. 2 is an exploded perspective view of a partition member and a guide member before they are integrated together. [Figure 8] 13A to 13C are side views showing the operation of the adjustment mechanism of the guide member. [Figure 9] FIG. [Figure 10] FIG. 4 is a cross-sectional view of the powder removal unit. [Figure 11] FIG. 11 is a plan view showing a pattern mask in a second embodiment. [Figure 12] FIG. 11 is a perspective view showing a guide member in the second embodiment. [Figure 13] FIG. 11 is a side view showing a guide roll in the second embodiment. [Figure 14] FIG. 11 is a side view of an electrode layer forming section in a second embodiment. [Figure 15] FIG. 11 is a plan view showing another example of a pattern mask. [Figure 16] FIG. 11 is a plan view showing another example of a pattern mask. [Figure 17] FIG. 11 is a plan view showing another example of a pattern mask. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0023] (First embodiment) A first embodiment of an electrode layer forming apparatus will be described below with reference to FIGS.

[0024] <<Current collector with electrode layer formed>> Before describing the electrode layer forming apparatus, a current collector on which an electrode layer is formed by the electrode layer forming apparatus will be described.

[0025] As shown in FIG. 1 and FIG. 2, the current collector 10 is in the form of a long strip. The electrode layer 11 is formed on one side of the current collector 10. The current collector 10 has a first surface 10a on which no electrode layer 11 is formed, and a second surface 10b on the opposite side to the first surface 10a on which a plurality of electrode layers 11 are formed. The plurality of electrode layers 11 are formed at intervals in the longitudinal direction of the current collector 10. The current collector 10 has a portion on which no electrode layer 11 is formed between two electrode layers 11 adjacent to each other in the longitudinal direction of the current collector 10. Each electrode layer 11 is rectangular. The dimension of the electrode layer 11 in the longitudinal direction of the current collector 10 is A1. The dimension of the electrode layer 11 in the lateral direction of the current collector 10 is A2. The dimension A2 of the electrode layer 11 is shorter than the dimension of the current collector 10 in the lateral direction. The current collector 10 has portions at both ends in the short side direction where the electrode layer 11 is not formed.

[0026] <<Electrode layer forming device>> As shown in FIG. 3, the electrode layer forming apparatus 20 includes an electrode layer forming section 21 and a pattern mask 22. The pattern mask 22 is superimposed on the second surface 10b of the current collector 10. In a state where the pattern mask 22 is superimposed on the second surface 10b of the current collector 10, a part of the second surface 10b of the current collector 10 is covered by the pattern mask 22. The electrode layer forming section 21 presses a wet powder P containing an electrode active material, a binder, and a solvent against the current collector 10 on which the pattern mask 22 is superimposed, thereby forming an electrode layer 11 on the current collector 10. At this time, the electrode layer 11 is formed on the part of the second surface 10b of the current collector 10 that is not covered by the pattern mask 22, but the electrode layer 11 is not formed on the part covered by the pattern mask 22. That is, the pattern mask 22 is for setting the formation range of the electrode layer 11 on the second surface 10b of the current collector 10.

[0027] <Pattern Mask> As shown in FIG. 4, the pattern mask 22 has a three-layer structure consisting of a metal foil 22x, an adhesive layer 22y provided on one side of the metal foil 22x, and a coating layer 22z provided on the other side of the metal foil 22x. The metal foil 22x is a SUS foil. The adhesive layer 22y is formed by applying an easily releasable adhesive to one side of the metal foil 22x. The coating layer 22z is formed by applying a fluororesin treatment such as Teflon (registered trademark) to the other side of the metal foil 22x. The surface of the adhesive layer 22y constitutes the first surface 22a of the pattern mask 22. The surface of the coating layer 22z constitutes the second surface 22b, which is the surface opposite to the first surface 22a of the pattern mask 22. Note that the three-layer structure of the pattern mask 22 is not shown in any figures other than FIG. 4. The thickness of the pattern mask 22 is about 100 μm.

[0028] The pattern mask 22 has a loop shape. The pattern mask 22 has two annular portions 221 and a plurality of connection portions 222 connecting the two annular portions 221. The two annular portions 221 are arranged in parallel with a gap therebetween. The plurality of connection portions 222 are arranged with a gap therebetween in the circumferential direction of the annular portion 221. Each connection portion 222 extends linearly along the direction in which the two annular portions 221 are arranged.

[0029] 3 and 5, the pattern mask 22 is overlaid on the current collector 10 such that the first surface 22a faces the second surface 10b of the current collector 10. Each annular portion 221 extends along the longitudinal direction of the current collector 10, and each connection portion 222 extends along the lateral direction of the current collector 10. An edge portion of one annular portion 221 that is located opposite to the other annular portion 221 is aligned along one of a pair of long edges of the current collector 10. An edge portion of the other annular portion 221 that is located opposite to the one annular portion 221 is aligned along the other of the pair of long edges of the current collector 10.

[0030] The connection portions 222 are first mask components that are arranged intermittently on the current collector 10 in the longitudinal direction of the current collector 10. The second surface 10b of the current collector 10 has portions that are covered by the connection portions 222 and portions that are not covered by the connection portions 222, which are arranged alternately in the longitudinal direction of the current collector 10. The annular portions 221 are second mask components that are arranged continuously on the current collector 10 in the longitudinal direction of the current collector 10. Both short-side end portions of the second surface 10b of the current collector 10 are covered by the annular portions 221.

[0031] The dimension A1 of the electrode layer 11 is the same as the interval B1 between two connection portions 222 adjacent to each other in the circumferential direction of the annular portion 221. That is, the multiple connection portions 222 set the formation range of the electrode layer 11 in the longitudinal direction of the current collector 10. The dimension A2 of the electrode layer 11 is the same as the interval B2 between the two annular portions 221. That is, the two annular portions 221 set the formation range of the electrode layer 11 in the lateral direction of the current collector 10.

[0032] <Electrode layer forming part> As shown in FIGS. 3 and 6, the electrode layer forming section 21 includes a first main roll 23 serving as a first roll, and a second main roll 24 serving as a second roll.

[0033] As shown in FIG. 6, the first main roll 23 has a cylindrical first roll portion 23a and two first shaft portions 23b provided at both ends of the first roll portion 23a. Note that FIG. 6 shows only one of the two first shaft portions 23b. The axis of the first roll portion 23a coincides with the axis of the two first shaft portions 23b. The first main roll 23 is rotated by being driven by a first power portion M1. The first power portion M1 is, for example, a motor.

[0034] The second main roll 24 has a cylindrical second roll portion 24a and two second shaft portions 24b provided at both ends of the second roll portion 24a. Note that in FIG. 6, only one of the two second shaft portions 24b is shown. The axis of the second roll portion 24a coincides with the axis of the two second shaft portions 24b. The second main roll 24 is rotated by the drive of the second power portion M2. The second power portion M2 is, for example, a motor.

[0035] As shown in Fig. 3, the second main roll 24 is arranged next to the first main roll 23 with a gap therebetween. The axis of the first main roll 23, i.e., the axis of the first roll portion 23a and the two first shaft portions 23b, is arranged parallel to the axis of the second main roll 24, i.e., the axis of the second roll portion 24a and the two second shaft portions 24b. The outer peripheral surface 23c of the first main roll 23 and the outer peripheral surface 24c of the second main roll 24 are spaced apart. The position where the distance between the outer peripheral surface 23c of the first main roll 23 and the outer peripheral surface 24c of the second main roll 24 is the shortest is determined as the electrode layer formation position.

[0036] The peripheral speed of the first main roll 23 is faster than the peripheral speed of the second main roll 24. The rotation direction of the first main roll 23 is opposite to the rotation direction of the second main roll 24. The current collector 10 is arranged so as to pass between the first main roll 23 and the second main roll 24. The pattern mask 22 is also arranged so as to pass between the first main roll 23 and the second main roll 24. The first main roll 23 is located outside the loop of the pattern mask 22. The second main roll 24 is located inside the loop of the pattern mask 22. The current collector 10 and the pattern mask 22 are transported from above to below by the rotation of the first main roll 23 and the second main roll 24. The current collector 10 is transported in the longitudinal direction. The transport direction of the current collector 10 coincides with the longitudinal direction of the current collector 10. The pattern mask 22 is transported in the circumferential direction of the annular portion 221. The transport direction of the pattern mask 22 coincides with the circumferential direction of the annular portion 221. The current collector 10 and the pattern mask 22 are transported at the same speed as the circumferential speed of the first main roll 23.

[0037] Wet powder P is supplied between the first main roll 23 and the second main roll 24 from a reservoir 35 described later. The second main roll 24 presses the wet powder P against the second surface 10b of the current collector 10 and the second surface 22b of the pattern mask 22 at the electrode layer formation position. As a result, the electrode layer 11 is formed on the portion of the second surface 10b of the current collector 10 that is not covered by the pattern mask 22. In addition, the wet powder P adheres to the second surface 22b of the pattern mask 22.

[0038] <Feeding roll> 6, the electrode layer forming apparatus 20 includes a pay-out roll 25 around which the long strip-shaped current collector 10 is wound, on the upstream side in the transport direction of the current collector 10. The current collector 10 is transported by the rotation of the first main roll 23 and the second main roll 24, and the current collector 10 is sequentially paid out from the pay-out roll 25.

[0039] <First guide roll> The electrode layer forming apparatus 20 includes a plurality of first guide rolls 26 that guide the current collector 10 so that it is transported along a predetermined transport route.

[0040] Of the multiple first guide rolls 26, the first guide roll 26 arranged upstream of the electrode layer forming unit 21 in the transport direction of the current collector 10 guides the current collector 10 so that the current collector 10 follows the outer circumferential surface 23c of the first main roll 23. In other words, the current collector 10 is transported so as to follow the outer circumferential surface 23c of the first main roll 23. The first surface 10a of the current collector 10 faces the outer circumferential surface 23c of the first main roll 23.

[0041] <Second guide roll> The electrode layer forming apparatus 20 includes second guide rolls 27 as multiple guide rolls that guide the pattern mask 22 so that it is transported along a predetermined transport route. The multiple second guide rolls 27 are disposed inside the pattern mask 22. The pattern mask 22 is transported in a circular motion by the rotation of the first main roll 23 and the second main roll 24 and the guide of the multiple second guide rolls 27. The first surface 22a of the pattern mask 22 is an outer peripheral surface, and the second surface 22b of the pattern mask 22 is an inner peripheral surface.

[0042] Of the multiple second guide rolls 27, the second guide roll 27 arranged above the first main roll 23 guides the pattern mask 22 so that the pattern mask 22 overlaps the current collector 10 transported along the outer circumferential surface 23c of the first main roll 23. As a result, the pattern mask 22 passes between the first main roll 23 and the second main roll 24 together with the current collector 10 in a state where it is overlapped on the current collector 10. In other words, the current collector 10 passes between the first main roll 23 and the second main roll 24 with a part of the second surface 10b covered by the pattern mask 22.

[0043] Of the multiple second guide rolls 27, the second guide roll 27 disposed below the first main roll 23 guides the pattern mask 22 so that the pattern mask 22 is transported along a transport route different from the transport route of the current collector 10 on which the electrode layer 11 is formed. This causes the pattern mask 22 to change from a state in which it was overlapped with the current collector 10 to a state in which it is not overlapped.

[0044] <Compartment material> The electrode layer forming apparatus 20 includes a partition member 30 above the electrode layer forming section 21 . As shown in FIG. 7, the partitioning member 30 has a rectangular first partitioning wall 31 and a pair of second partitioning walls 32 erected from both ends of the first partitioning wall 31 in the longitudinal direction. The partitioning member 30 is U-shaped in a plan view. Each second partitioning wall 32 has a narrow width portion 321 whose dimension in the erecting direction of the second partitioning wall 32 from the first partitioning wall 31 gradually decreases. Each second partitioning wall 32 also has two long holes 32h penetrating the second partitioning wall 32 in the plate thickness direction. The two long holes 32h are aligned in the thickness direction of the first partitioning wall 31.

[0045] <Guide parts> As shown in FIG. 6, the electrode layer forming apparatus 20 includes a guide member 33 above the first main roll .

[0046] As shown in FIG. 7, the guide member 33 is block-shaped. The guide member 33 is disposed between a pair of second partition walls 32 of the partition member 30. The guide member 33 has a first surface 33a facing one of the second partition walls 32 and a second surface 33b facing the other of the second partition walls 32. Two female screw holes 33h are formed in each of the first surface 33a and the second surface 33b. The guide member 33 has a third surface 33c that connects the first surface 33a and the second surface 33b and faces the first partition wall 31. As shown in FIG. 3, the third surface 33c of the guide member 33 is spaced from the first partition wall 31 of the partition member 30. The guide member 33 has a curved surface 33d that connects the first surface 33a and the second surface 33b and is curved. As shown in FIG. 3, the curved surface 33d has a guide surface 33e shaped to fit along the outer circumferential surface 23c of the first main roll 23 at a portion located on the third surface 33c side.

[0047] The partition member 30 and the guide member 33 are integrated together by threading bolts 34 inserted through the long holes 32h of the second partition walls 32 into the female threaded holes 33h of the guide member 33.

[0048] 8, the shaft portion of each bolt 34 is movable within the elongated hole 32h. The guide member 33 is capable of moving relative to the partition member 30 within a range in which the shaft portion of each bolt 34 is movable within the elongated hole 32h.

[0049] The partition member 30 and the guide member 33, which are integrated together, are disposed upstream of the electrode layer formation position in the transport direction of the current collector 10. Each narrow width portion 321 of the partitioning member 30 is located between the first main roll 23 and the second main roll 24. The first partitioning wall 31 of the partitioning member 30 is located above the second main roll 24.

[0050] As shown in FIG. 3, the guide member 33 is disposed so that the curved surface 33d faces the outer peripheral surface 23c of the first main roll 23 while being spaced apart from the outer peripheral surface 23c of the first main roll 23. Therefore, the guide surface 33e, which is a part of the curved surface 33d, also faces the outer peripheral surface 23c of the first main roll 23. The gap between the guide surface 33e of the curved surface 33d and the outer peripheral surface 23c of the first main roll 23 is set to be slightly larger than the combined thickness of the current collector 10 and the pattern mask 22. In addition, the gap between the curved surface 33d and the outer peripheral surface 23c of the first main roll 23 becomes larger as it moves away from the third surface 33c of the guide member 33. The third surface 33c of the guide member 33 is spaced from the outer peripheral surface 24c of the second main roll 24.

[0051] 8, the position of the guide member 33 in the circumferential direction of the first main roll 23 can be changed by changing the position of the shaft portion of the bolt 34 in each long hole 32h. In other words, the long holes 32h and the bolts 34 of the partition member 30 constitute a position adjustment mechanism for adjusting the position of the guide member 33 in the circumferential direction of the first main roll 23.

[0052] 8, the guide member 33 is illustrated by a dotted line when the shaft portion of the bolt 34 is located on the side closer to the first partition wall 31 in the long hole 32h. The guide member 33 is illustrated by a two-dot chain line when the shaft portion of the bolt 34 is located on the side farther from the first partition wall 31 in the long hole 32h. The guide member 33 when the bolt 34 is located on the side closer to the first partition wall 31 in the long hole 32h is further between the first main roll 23 and the second main roll 24 than the guide member 33 when the bolt 34 is located on the side farther from the first partition wall 31 in the long hole 32h.

[0053] <Storage section> A storage section 35 in which the wet powder P is stored is defined by the inner surface of the first partition wall 31, the inner surfaces of the pair of second partition walls 32, the third surface 33c of the guide member 33, and the outer circumferential surface 24c of the second main roll 24. The storage section 35 has a discharge outlet 35a defined by a gap provided between the outer circumferential surface 24c of the second main roll 24 and the third surface 33c of the guide member 33. The wet powder P stored in the storage section 35 is discharged from the discharge outlet 35a to between the first main roll 23 and the second main roll 24 by gravity.

[0054] <Supply section> As shown in FIG. 6, the electrode layer forming device 20 includes a supply unit 36 ​​above the partition member 30 for supplying the wet powder P to the storage unit 35.

[0055] <Collection Department> The electrode layer forming apparatus 20 includes a recovery section 37 below the electrode layer forming section 21 for recovering the wet powder P. The recovery section 37 recovers the wet powder P that has fallen off the pattern mask 22, for example.

[0056] <Powder removal section> The electrode layer forming apparatus 20 includes a scraping blade 38 as a powder removing section for removing the wet powder P adhering to the pattern mask 22, and a collection tray 39 for collecting the wet powder P removed from the pattern mask 22 by the scraping blade 38. The scraping blade 38 and the collection tray 39 are disposed midway along the transport of the pattern mask 22.

[0057] Here, the transport direction of the pattern mask 22 at the point where the scraping blade 38 is arranged on the transport route of the pattern mask 22 is defined as the first direction. The direction along the thickness of the pattern mask 22 at the point where the scraping blade 38 is arranged on the transport route of the pattern mask 22 is defined as the second direction. The second direction is a direction perpendicular to the first direction. The direction along the surface of the pattern mask 22 at the point where the scraping blade 38 is arranged on the transport route of the pattern mask 22 and perpendicular to the first and second directions is defined as the third direction.

[0058] 9 and 10, the scraping blade 38 has a rectangular shape. The scraping blade 38 is disposed such that the longitudinal direction is inclined with respect to each of the first direction and the third direction, and the lateral direction is inclined with respect to each of the first direction and the second direction.

[0059] 10, the scraping blade 38 has a cutting edge 38a on one side along the longitudinal direction. The cutting edge 38a is an inclined surface. The scraping blade 38 is disposed so that the cutting edge 38a is aligned with the second surface 22b of the pattern mask 22. The scraping blade 38 removes the wet powder P from the pattern mask 22 by scraping off the wet powder P adhering to the second surface 22b of the pattern mask 22 with the cutting edge 38a.

[0060] The collection tray 39 is disposed on the opposite side of the pattern mask 22 from the scraping blade 38. The collection tray 39 is disposed below the pattern mask 22. <<Electrode layer formation method>> Next, a method for forming an electrode layer will be described.

[0061] As shown in FIG. 6, the electrode layer forming method includes a mask arrangement step P1 of overlaying a pattern mask 22 on a current collector 10. In the mask arrangement step P1, the current collector 10 and the pattern mask 22 are transported while being sandwiched between a guide surface 33e of a guide member 33 and an outer peripheral surface 23c of a first main roll 23. The current collector 10 is transported such that a first surface 10a thereof is aligned with an outer peripheral surface 23c of the first main roll 23. The pattern mask 22 is transported such that a first surface 22a thereof faces a second surface 10b of the current collector 10 and a second surface 22b thereof slides against a guide surface 33e of a guide member 33. As a result, the pattern mask 22 is deformed into a shape that follows the outer peripheral surface 23c of the first main roll 23. In addition, by clamping the pattern mask 22 and the current collector 10 between the guide surface 33e of the guide member 33 and the outer peripheral surface 23c of the first main roll 23, the first surface 22a of the pattern mask 22 is adhered to the second surface 10b of the current collector 10.

[0062] The electrode layer forming method includes an electrode layer forming step P2 in which a wet powder P is pressed against the current collector 10 and the pattern mask 22. The electrode layer forming step P2 is performed at an electrode layer forming position where the distance between the outer peripheral surface 23c of the first main roll 23 and the outer peripheral surface 24c of the second main roll 24 is the shortest. The wet powder P is supplied from the outlet 35a of the storage section 35 to between the outer peripheral surface 23c of the first main roll 23 and the outer peripheral surface 24c of the second main roll 24. The supplied wet powder P is pressed by the second main roll 24 against the portion of the second surface 10b of the current collector 10 that is not covered by the pattern mask 22 and the second surface 22b of the pattern mask 22. As a result, a rectangular electrode layer 11 is formed on the portion of the second surface 10b of the current collector 10 that is not covered by the pattern mask 22. The electrode layer 11 is not formed on the portion of the second surface 10b of the current collector 10 that was covered by the pattern mask 22. In addition, the wet powder P adheres to the second surface 22b of the pattern mask 22.

[0063] The electrode layer forming method includes a removal step P3 of removing the pattern mask 22 from the current collector 10. In the removal step P3, the pattern mask 22 is transported to a transport route different from the transport route of the current collector 10. As a result, the pattern mask 22 is removed from the second surface 10b of the current collector 10. The current collector 10 on which the electrode layer 11 has been formed is transported to a subsequent step. The subsequent step is, for example, a step of drying the electrode layer 11 to remove the solvent, thereby converting the electrode layer 11 into an active material layer.

[0064] The electrode layer forming method includes a powder removing step P4 for removing the wet powder P adhering to the second surface 22b of the pattern mask 22. In the powder removing step P4, the pattern mask 22 moves relative to the scraping blade 38. The blade tip 38a of the scraping blade 38 is in contact with the second surface 22b of the pattern mask 22. This allows the scraping blade 38 to scrape off the wet powder P adhering to the pattern mask 22. The wet powder P scraped off from the pattern mask 22 by the scraping blade 38 is collected in a collection tray 39. The wet powder P collected in the collection tray 39 may be reused for forming the electrode layer 11. The pattern mask 22 from which the wet powder P has been removed is transported around and is transported again to the mask arrangement step P1. That is, the pattern mask 22 is repeatedly used by being transported around.

[0065] The operation and effects of the first embodiment will be described. (1-1) The electrode layer forming device 20 includes a guide member 33 upstream of the electrode layer formation position in the transport direction of the current collector 10. The pattern mask 22 is transported together with the current collector 10 while being sandwiched between a guide surface 33e of the guide member 33 and the outer circumferential surface 23c of the first main roll 23. This causes the pattern mask 22 to deform into a shape that conforms to the outer circumferential surface 23c of the first main roll 23. This makes it possible to prevent the connection parts 222 of the pattern mask 22 from floating away from the current collector 10. As a result, poor formation of the electrode layer 11 in the longitudinal direction of the current collector 10 is suppressed.

[0066] (1-2) The electrode layer forming apparatus 20 includes a scraping blade 38 that removes the wet powder P adhering to the pattern mask 22. When the electrode layer 11 is formed on the current collector 10, the wet powder P adheres to the pattern mask 22, but the wet powder P is removed by the scraping blade 38, making the pattern mask 22 reusable.

[0067] (1-3) The pattern mask 22 is in a loop shape. The pattern mask 22 is transported in a circular manner so as to pass between the first main roll 23 and the second main roll 24. The scraping blade 38 is disposed midway along the transport of the pattern mask 22. For this reason, the pattern mask 22 is used repeatedly. Therefore, for example, the task of replenishing the pattern mask 22 is not required.

[0068] (1-4) The scraping blade 38 is disposed so that the longitudinal direction of the scraping blade 38 is inclined with respect to each of the first direction and the third direction. Therefore, the wet powder P can be removed from the pattern mask 22 in both the first direction and the third direction.

[0069] (1-5) The scraping blade 38 is disposed so that the short side direction of the scraping blade 38 is inclined with respect to each of the first direction and the second direction. The blade tip 38a of the scraping blade 38 is an inclined surface along the second surface 22b of the pattern mask 22. This improves the ability to scrape the wet powder P from the pattern mask 22.

[0070] (1-6) The electrode layer forming apparatus 20 has an adjustment mechanism that adjusts the position of the guide member 33 in the circumferential direction of the first main roll 23. For this reason, when the suitable position of the guide member 33 in the circumferential direction of the first main roll 23 changes due to, for example, a change in the shape or thickness of the pattern mask 22, the position of the guide member 33 in the circumferential direction of the first main roll 23 can be adjusted.

[0071] (1-7) The first main roll 23 and the second main roll 24 serve both as the electrode layer forming section 21 that presses the wet powder P against the current collector 10 to form the electrode layer 11, and as a conveying device that conveys the current collector 10 and the pattern mask 22. For this reason, there is no need to provide a conveying device that conveys the current collector 10 and the pattern mask 22 separately from the first main roll 23 and the second main roll 24. This allows the configuration of the electrode layer forming device 20 to be simplified.

[0072] (1-8) Since the first surface 22a of the pattern mask 22 is the adhesive layer 22y, the first surface 22a of the pattern mask 22 is adhered to the second surface 10b of the current collector 10. This can further prevent the pattern mask 22 from lifting off the current collector 10. In addition, since the adhesive layer 22y is easily releasable, the pattern mask 22 can be easily peeled off from the current collector 10 when removing the pattern mask 22 from the current collector 10 after the electrode layer 11 is formed on the second surface 10b of the current collector 10.

[0073] (1-9) The second surface 22b of the pattern mask 22 is a Teflon-coated coating layer 22z. Therefore, the wet powder P is less likely to adhere to the second surface 22b of the pattern mask 22. Second embodiment A second embodiment of an electrode layer forming apparatus will be described below with reference to Figures 11 to 14. Note that a description of the same configuration as in the first embodiment will be omitted.

[0074] <Pattern Mask> 11, the pattern mask 22 of the second embodiment is composed of two annular first mask forming members 223 and a plurality of strip-shaped second mask forming members 224. The thickness H22 of each of the first mask forming members 223 is about 100 μm. The thickness of each of the second mask forming members 224 is about 100 μm.

[0075] The two first mask forming members 223 are arranged in parallel with a gap therebetween. Each second mask forming member 224 connects two first mask forming members 223. The multiple second mask forming members 224 are arranged with gaps in the circumferential direction of the first mask forming member 223. Each second mask forming member 224 extends linearly along the direction in which the two first mask forming members 223 are arranged.

[0076] The pattern mask 22 has a plurality of first overlapping portions 225 where one end of the first mask forming member 223 overlaps with one end of the second mask forming member 224, and a plurality of second overlapping portions 226 where the other end of the first mask forming member 223 overlaps with the other end of the second mask forming member 224. In each of the overlapping portions 225, 226, the first mask forming member 223 and the second mask forming member 224 are joined by welding.

[0077] The pattern mask 22 is overlaid on the second surface 10b of the current collector 10. In this state, each of the first mask forming members 223 extends along the longitudinal direction of the current collector 10, and each of the second mask forming members 224 extends along the lateral direction of the current collector 10. An edge of one of the first mask forming members 223, which is located on the opposite side to the other first mask forming member 223, is aligned with one of a pair of long edges of the current collector 10. An edge of the other of the first mask forming members 223, which is located on the opposite side to the one first mask forming member 223, is aligned with the other of the pair of long edges of the current collector 10.

[0078] The second mask forming members 224 are parts of the first mask that are arranged intermittently on the current collector 10 in the longitudinal direction of the current collector 10. The second surface 10b of the current collector 10 has parts that are covered by the second mask forming members 224 and parts that are not covered by the second mask forming members 224, which are arranged alternately in the longitudinal direction of the current collector 10. The first mask forming members 223 are parts of the second mask that are arranged continuously on the current collector 10 in the longitudinal direction of the current collector 10. Both ends in the lateral direction of the second surface 10b of the current collector 10 are covered by the first mask forming members 223.

[0079] A dimension A1 of the electrode layer 11 is the same as a distance B1 between two second mask forming members 224 adjacent to each other in the circumferential direction of the first mask forming member 223. The multiple second mask forming members 224 set a formation range of the electrode layer 11 in the longitudinal direction of the current collector 10. A dimension A2 of the electrode layer 11 is the same as a distance B2 between the two first mask forming members 223. The two first mask forming members 223 set a formation range of the electrode layer 11 in the lateral direction of the current collector 10.

[0080] In the first overlapping portion 225 and the second overlapping portion 226, the second mask forming member 224 is located between the first mask forming member 223 and the second surface 10b of the current collector 10. <Guide parts> 12, the guide member 33 of the second embodiment has two recesses 33f on the curved surface 33d. The two recesses 33f are formed with a gap between them in the direction in which the first surface 33a and the second surface 33b of the guide member 33 form a pair. The gap between one recess 33f and the other recess 33f is approximately equal to the gap B2 between the two first mask forming members 223 of the pattern mask 22. The curved surface 33d and the bottom surfaces 33g of the recesses 33f are shaped to fit the outer circumferential surface 23c of the first main roll 23.

[0081] A width W33 of each recess 33f in a direction in which the first surface 33a and the second surface 33b of the guide member 33 form a pair is set to 1.1 times a width W22 of each first mask forming member 223 of the pattern mask 22. A depth D33 of each recess 33f is set to 80% of a thickness H22 of each first mask forming member 223 of the pattern mask 22. The depth D33 of each recess 33f refers to the distance from the curved surface 33d to a bottom surface 33g of the recess 33f.

[0082] The guide member 33 is disposed so that the curved surface 33d and the bottom surfaces 33g of the recesses 33f face the outer circumferential surface 23c of the first main roll 23. Each recess 33f extends in the circumferential direction of the first main roll 23.

[0083] <Second guide roll> 13, each second guide roll 27 in the second embodiment has two grooves 27b on its outer circumferential surface 27a. Each groove 27b is formed around the entire circumference of the second guide roll 27. The two grooves 27b are formed with a gap between them in the direction in which the axis of the second guide roll 27 extends. The gap between one groove 27b and the other groove 27b in the direction in which the axis of the second guide roll 27 extends is substantially equal to the gap B2 between the two first mask forming members 223 of the pattern mask 22.

[0084] A width W27 of each groove 27b in the direction in which the axis of the second guide roll 27 extends is set to 1.1 times the width W22 of each first mask forming member 223 of the pattern mask 22. A depth D27 of each groove 27b is set to 80% of a thickness H22 of each first mask forming member 223 of the pattern mask 22. The depth D27 of each groove 27b refers to the distance from the outer circumferential surface 27a of the second guide roll 27 to a bottom surface 27c of the groove 27b.

[0085] 14, the pattern mask 22 is transported in a state in which the first mask forming member 223 is positioned in the groove portion 27b of the second guide roll 27 and in the recessed portion 33f of the guide member 33. The pattern mask 22 is transported together with the current collector 10 in a state in which the first mask forming member 223 is sandwiched between the bottom surface 33g of the recessed portion 33f and the outer circumferential surface 23c of the first main roll 23. That is, in the second embodiment, the bottom surface 33g is the guide surface.

[0086] In the second embodiment, in addition to the effects (1-1) to (1-9) of the first embodiment, the following effect can be obtained. (2-1) Since the first mask forming member 223 is positioned in the recess 33f of the guide member 33, misalignment of the first mask forming member 223 in the axial direction of the first main roll 23 is suppressed. This suppresses misalignment of the first mask forming member 223 in the short-side direction of the current collector 10. This suppresses misalignment of the formation position of the electrode layer 11 in the short-side direction of the current collector 10. In addition, wrinkles in the pattern mask 22 can be suppressed.

[0087] (2-2) Since the first mask forming member 223 is positioned in the groove portion 27b of the second guide roll 27, the first mask forming member 223 is prevented from shifting in the axial direction of the second guide roll 27. This makes it possible to prevent wrinkles in the pattern mask 22.

[0088] (2-3) When the first mask forming member 223 is located between the second mask forming member 224 and the current collector 10 in each overlapping portion 225, 226, the first mask forming member 223 is removed from the recess 33f and the groove 27b in each overlapping portion 225, 226. In contrast, when the second mask forming member 224 is located between the first mask forming member 223 and the current collector 10 in each overlapping portion 225, 226, the first mask forming member 223 is located in the recess 33f and the groove 27b in each overlapping portion 225, 226. That is, the pattern mask 22 can be transported in a state in which the first mask forming member 223 is always located in the recess 33f and the groove 27b. Therefore, the positional deviation of the pattern mask 22 in the short direction of the current collector 10 can be further suppressed.

[0089] (2-4) The width W33 of the recess 33f and the width W27 of the groove 27b are each set to 1.1 times the width W22 of the first mask forming member 223. This makes it possible to suppress misalignment of the first mask forming member 223 within the recess 33f and the groove 27b.

[0090] (2-5) The depth D33 of the recesses 33f and the depth D33 of the grooves 27b are each set to 80% of the thickness H22 of the first mask forming member 223. This makes it difficult for the first mask forming member 223 to fall off from the recesses 33f and the grooves 27b.

[0091] This embodiment can be modified as follows: The embodiment and the modified examples can be combined with each other to the extent that there is no technical contradiction. The material of the metal foil 22x of the pattern mask 22 is not limited to SUS. The material of the metal foil 22x is preferably a material harder than the wet powder P, and may be, for example, aluminum.

[0092] The thickness of the pattern mask 22 may be changed depending on the material of the pattern mask 22. For example, when the material of the metal foil 22x is aluminum, the thickness of the pattern mask 22 may be set to about 150 μm.

[0093] The adhesive layer 22y of the pattern mask 22 may be omitted. However, it is preferable to provide the adhesive layer 22y at the portion of the pattern mask 22 that constitutes the first mask, in order to prevent the pattern mask 22 from lifting up from the current collector 10.

[0094] The coating layer 22z of the pattern mask 22 may be omitted. The shape of the pattern mask 22 may be changed as appropriate so that the electrode layer 11 having a desired shape is formed on the current collector 10 .

[0095] 15, for example, the pattern mask 22 may have a plurality of annular portions 221. In this case, a plurality of electrode layers 11 are formed in the short side direction of the current collector 10. 16, a radius may be added to the connection portion between the annular portion 221 and the connection portion 222 of the pattern mask 22. In this case, tearing of the pattern mask 22 can be suppressed.

[0096] As shown in FIG. 17, the pattern mask 22 may have two annular portions 221 and a plurality of connection portions 222 that are arranged so as to be inclined with respect to the direction in which the two annular portions 221 are arranged.

[0097] In each of the overlapping portions 225, 226, the first mask forming member 223 and the second mask forming member 224 may be bonded with an adhesive. In each of the overlapping portions 225 and 226 , the first mask forming member 223 may be located between the second mask forming member 224 and the current collector 10 .

[0098] The pattern mask 22 does not have to be in a loop shape. The pattern mask 22 may be in a long strip shape, for example. When the pattern mask 22 is in a long strip shape and is to be reused, the pattern mask 22 to which the moist powder P is attached may be once wound up and then the moist powder P may be removed, so that the pattern mask 22 can be reused. Alternatively, the pattern mask 22 may be reused by removing the moist powder P and then winding it up.

[0099] The pattern mask 22 does not have to be reused. In this case, the electrode layer removal portion becomes unnecessary. The method for removing the wet powder P adhering to the pattern mask 22 is not limited to scraping with the scraping blade 38. For example, the wet powder P adhering to the pattern mask 22 may be removed by spraying air toward the second surface 22b of the pattern mask 22.

[0100] The scraping blade 38 may be disposed so that its longitudinal direction is perpendicular to the first direction. The scraping blade 38 may be disposed so that the short side direction coincides with the second direction, and the cutting edge 38a of the scraping blade 38 may be a flat surface.

[0101] In the second embodiment, either the recess 33f of the guide member 33 or the groove 27b of the second guide roll 27 may be omitted. The number of recesses 33 f of the guide member 33 may be changed appropriately according to the number of first mask forming members 223 of the pattern mask 22 .

[0102] The number of grooves 27 b of the second guide roll 27 may be changed appropriately according to the number of first mask forming members 223 of the pattern mask 22 . The width W33 of each recess 33f may be appropriately changed within the range of 1.05 to 1.5 times the width W22 of the first mask formation member 223. If the width W33 of the recess 33f is greater than 1.5 times the width W22 of the first mask formation member 223 of the pattern mask 22, the first mask formation member 223 may be misaligned within the recess 33f.

[0103] The depth D33 of each recess 33f may be appropriately changed within a range of 10 to 90% of the thickness H22 of the first mask forming member 223. If the depth D33 of the recess 33f is shallower than 10% of the thickness H22 of the first mask forming member 223, the first mask forming member 223 is likely to fall off from the recess 33f. On the other hand, if the depth D33 of the recess 33f is deeper than 90% of the thickness H22 of the first mask forming member 223, the pattern mask 22 may not be sufficiently clamped between the guide member 33 and the first main roll 23.

[0104] The width W27 of each groove 27b may be appropriately changed within a range of 1.05 to 1.5 times the width W22 of the first mask forming member 223. If the width W27 of the groove 27b is greater than 1.5 times the width W22 of the first mask forming member 223, the first mask forming member 223 may be misaligned within the groove 27b.

[0105] The depth D27 of each groove 27b may be changed as appropriate as long as it is 10% or more of the thickness H22 of the first mask forming member 223. If the depth D27 of the groove 27b is shallower than 10% of the thickness H22 of the first mask forming member 223, the first mask forming member 223 is likely to fall off from the groove 27b.

[0106] A transport device for transporting the current collector 10 and the pattern mask 22 may be provided separately. The second mask constituent parts of the pattern mask 22 do not have to be for setting the dimension A2 of the electrode layer 11, but may be for simply connecting the first mask constituent parts.

[0107] The configuration of the storage unit 35 may be changed as appropriate. For example, the storage unit 35 may be a tank having a discharge hole for discharging the wet powder P at a lower portion. [Explanation of symbols]

[0108] Reference Signs List 10...current collector, 10a...first surface, 10b...second surface, 11...electrode layer, 20...electrode layer forming device, 22...pattern mask, 23...first main roll as first roll, 23c...outer peripheral surface, 24...second main roll as second roll, 24c...outer peripheral surface, 27...second guide roll as guide roll, 27a...outer peripheral surface, 27b...groove portion, 38...scraping blade as powder removal portion, 38a...blade tip, 33...guide member, 33e...guide surface, 33f...recess, 33g...bottom surface as guide surface, 221...annular portion as second mask constituent portion, 222...connection portion as first mask constituent portion, 223...first mask forming member as second mask constituent portion, 224...second mask forming member as first mask constituent portion, 225...first polymerization portion as polymerization portion, 226...second polymerization portion as polymerization portion, P...wet powder.

Claims

1. A first roll; a second roll disposed at a distance from the first roll; a pattern mask that is transported to pass between the first roll and the second roll in a state where the pattern mask is superimposed on the long strip-shaped current collector transported along the outer circumferential surface of the first roll so as to cover a part of a second surface of the current collector that is an opposite surface to a first surface facing the outer circumferential surface of the first roll; Equipped with the pattern mask has first mask constituent portions that are intermittently arranged on the current collector in a longitudinal direction of the current collector, the second roll is an electrode layer forming device that forms an electrode layer on a portion of the second surface of the current collector that is not covered by the pattern mask by pressing a wet powder containing an electrode active material, a binder, and a solvent against the current collector and the pattern mask at an electrode layer forming position where a distance between an outer circumferential surface of the first roll and an outer circumferential surface of the second roll is shortest, a guide member provided upstream of the electrode layer forming position in a transport direction of the current collector, the guide member has a guide surface that faces an outer circumferential surface of the first roll and has a shape that follows the outer circumferential surface of the first roll, The electrode layer forming apparatus, wherein the pattern mask is transported together with the current collector in a state where the pattern mask is sandwiched between an outer peripheral surface of the first roll and the guide surface of the guide member.

2. the pattern mask further includes second mask components that are continuously arranged on the current collector in a longitudinal direction of the current collector, the guide member has a recess on a surface facing an outer circumferential surface of the first roll, a bottom surface of the recessed portion is the guide surface, 2. The electrode layer forming apparatus according to claim 1, wherein the second mask component is located within the recess.

3. a guide roll for guiding a transport route of the pattern mask; the pattern mask further includes second mask components that are continuously arranged on the current collector in a longitudinal direction of the current collector, The guide roll has a groove extending around the entire outer circumferential surface, 3. The electrode layer forming apparatus according to claim 1, wherein the second mask component is located within the groove.

4. the pattern mask has an overlapping portion where the first mask component and the second mask component overlap, 4. The electrode layer forming apparatus according to claim 2, wherein in the overlapping portion, the first mask component is located between the second mask component and the current collector.

5. 5. The electrode layer forming apparatus according to claim 1, further comprising a powder removing section for removing the wet powder adhering to the pattern mask.

6. the pattern mask is loop-shaped and is transported circulatingly so as to pass between the first roll and the second roll; The electrode layer forming apparatus according to claim 5 , wherein the powder removing section is disposed midway through the transport of the pattern mask.

7. the powder removing unit is a scraping blade that removes the wet powder from the pattern mask by scraping off the wet powder attached to the pattern mask, a first direction is a transport direction of the pattern mask at a point on a transport route of the pattern mask where the powder removal unit is disposed, a second direction is a direction perpendicular to the first direction and along the thickness of the pattern mask, and a third direction is a direction along a surface of the pattern mask and perpendicular to the first direction and the second direction, 7. The electrode layer forming apparatus according to claim 5, wherein the scraping blade is disposed so as to be inclined with respect to each of the first direction and the third direction.

8. the powder removing unit is a scraping blade that removes the wet powder from the pattern mask by scraping off the wet powder attached to the pattern mask, a conveying direction of the pattern mask at a point on a conveying route of the pattern mask where the powder removing unit is disposed is defined as a first direction, and a direction perpendicular to the first direction and along a thickness of the pattern mask is defined as a second direction, The electrode layer forming apparatus according to any one of claims 5 to 7, wherein the scraping blade is arranged so as to be inclined with respect to each of the first direction and the second direction, and the tip of the scraping blade is an inclined surface that follows the surface of the pattern mask.

9. 9. The electrode layer forming apparatus according to claim 1, further comprising an adjustment mechanism for adjusting a position of the guide member in a circumferential direction of the first roll.

Images