Pigment dispersion composition for black matrix, resist composition for black matrix, and black matrix

Abstract

To provide a pigment dispersion composition for a black matrix capable of maintaining the surface resistance value even after post-baking while forming a black matrix with excellent heat flow characteristics.SOLUTION: The pigment dispersion composition for a black matrix contains a black colorant, a sulfonated copper phthalocyanine, and an amine compound. The amine compound is an imidazole-based compound and / or a triazole-based compound, and the content of the amine compound is 0.1 to 1.5 pts.mass with respect to 100 pts.mass of the black colorant.SELECTED DRAWING: None

Description

[Technical field]

[0001] The present invention relates to a pigment dispersion composition for a black matrix, a resist composition for a black matrix, and a black matrix. [Background technology]

[0002] In image display devices using liquid crystal or plasma, etc., a light-shielding film (black matrix) is provided in the gaps between colored patterns within the display area of ​​the screen, around the edges of the display area, and in liquid crystal displays using TFTs, on the external light side of the TFT. In LCD displays, it mainly prevents light leakage from the backlight from appearing on the screen, and in plasma displays, it mainly prevents blurring caused by the mixing of various colored lights from appearing on the screen, thereby improving display characteristics (contrast and color purity).

[0003] For example, color filters used to convert the white light of a backlight in a liquid crystal display device into colored light are usually manufactured by forming pixels of different hues, red, green and blue, in sequence in a striped or mosaic pattern on the surface of a transparent substrate, such as glass or a plastic sheet, on which a black matrix has been formed.

[0004] Similarly, in touch panels that combine image display devices and position input devices, color filters with black matrices formed as light-shielding films are also used, and up until now, they have generally been formed on the opposite side of the cover glass to the sensor substrate. However, as the demand for lighter touch panels increases, progress is being made in the development of technology to simultaneously form the light-shielding film and touch sensor on the same side of the cover glass in order to achieve even lighter weight.

[0005] As a method for forming such a black matrix, for example, a photolithography method using a pigment (pigment method) is used. In such a pigment method, a sulfonic acid derivative of copper phthalocyanine is sometimes used to improve the dispersibility of the pigment.

[0006] For example, Patent Document 1 discloses a pigment dispersion composition for black matrices, which is characterized in that carbon black having an oil absorption in the range of 10 to 150 ml / 100 g and a pH of more than 9, a basic group-containing urethane-based polymer pigment dispersant having a polyester chain, and a phthalocyanine derivative having a sulfonic acid group as an acid group-containing pigment derivative are dispersed in a solvent.

[0007] In the black matrix, it is desired that the surface resistance value can be maintained even after post-baking in order to prevent short circuits and current leakage. In addition, in the black matrix, loss of the pattern can be prevented by forming a forward tapered shape through heat flow during post-baking, so it is desirable for the black matrix to have appropriate heat flow characteristics. However, in Patent Document 1, the surface resistance value and heat flow characteristics are not sufficiently considered, and there is room for further improvement. [Prior art documents] [Patent documents]

[0008] [Patent Document 1] International Publication No. 2008 / 066100 Summary of the Invention [Problem to be solved by the invention]

[0009] Therefore, an object of the present invention is to provide a pigment dispersion composition for a black matrix, which is capable of forming a black matrix that can maintain its surface resistivity even after post-baking and has excellent thermal flow properties. [Means for solving the problem]

[0010] The present inventors have discovered that by further incorporating a specific amount of a specific amine compound in a pigment dispersion composition for black matrix containing a black colorant and a sulfonated product of copper phthalocyanine, it is possible to obtain a pigment dispersion composition for black matrix which is capable of maintaining surface resistivity even after post-baking and which is capable of forming a black matrix which is also excellent in thermal flow characteristics, and have thus completed the present invention.

[0011] That is, the present invention relates to a pigment dispersion composition for black matrix, comprising a black colorant, a sulfonated copper phthalocyanine, and an amine compound, wherein the amine compound is an imidazole-based compound and / or a triazole-based compound, and the content of the amine compound is 0.1 to 1.5 parts by mass relative to 100 parts by mass of the black colorant. The black colorant is preferably carbon black, and more preferably acidic carbon black. The imidazole compound is preferably an alkylimidazole, more preferably the alkylimidazole has an alkyl group having 8 to 16 carbon atoms, further preferably the alkylimidazole is a monoalkylimidazole having a linear alkyl group having 8 to 16 carbon atoms, and particularly preferably 2-undecylimidazole. The triazole compound preferably has a benzotriazole skeleton, and more preferably is benzotriazole. The sulfonated copper phthalocyanine preferably has 0.5 to 3 sulfonic acid groups in the molecule. The present invention also relates to a resist composition for a black matrix obtained from the above-mentioned pigment dispersion composition for a black matrix. The present invention also relates to a black matrix formed from the above-mentioned black matrix resist composition. Effect of the Invention

[0012] According to the present invention, it is possible to provide a pigment dispersion composition for a black matrix, which is capable of forming a black matrix that can maintain its surface resistivity even after post-baking and has excellent thermal flow characteristics. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0013] <Pigment dispersion composition for black matrix> The pigment dispersion composition for black matrix contains the black colorant of the present invention, a sulfonated copper phthalocyanine, and an amine compound, wherein the amine compound is an imidazole-based compound and / or a triazole-based compound.

[0014] (Black colorant) The pigment dispersion composition for a black matrix of the present invention contains a black colorant. The black colorant preferably contains carbon black, and the carbon black is more preferably acidic carbon black. The carbon black preferably has an average primary particle diameter of 20 to 60 nm, and more preferably is neutral carbon black with an average primary particle diameter of 20 to 60 nm and / or acidic carbon black with an average primary particle diameter of 20 to 60 nm. When the primary particle size of the black colorant is smaller than 20 nm or larger than 60 nm, the light-shielding property may be insufficient and the storage stability may be poor. The above average primary particle size is an arithmetic mean diameter value determined by observation with an electron microscope.

[0015] From the viewpoint of imparting a suitable surface resistivity, the black colorant preferably contains only acidic carbon black. On the other hand, when the neutral carbon black and the acidic carbon black are used in combination, the neutral carbon black preferably accounts for 85 mass% or less, and more preferably 75 mass% or less, of the total mass of the neutral carbon black and the acidic carbon black. If the neutral carbon black content in the carbon black is more than 85% by mass, the seal strength may decrease.

[0016] The above-mentioned acidic carbon black and neutral carbon black will now be described. Carbon black can be broadly classified into acidic carbon black and neutral carbon black based on the surface structure. Acidic carbon black is a carbonaceous material that is naturally or artificially oxidized and exhibits acidity when mixed and boiled with distilled water. On the other hand, neutral carbon black is known to exhibit a neutral or higher pH when mixed and boiled with distilled water.

[0017] The neutral carbon black preferably has a pH in the range of 8.0 to 10.0. Specific examples include Printex 25 (average primary particle diameter 56 nm, pH 9.5), Printex 35 (average primary particle diameter 31 nm, pH 9.5), Printex 65 (average primary particle diameter 21 nm, pH 9.5), manufactured by Orion Engineered Carbons, and MA#20 (average primary particle diameter 40 nm, pH 8.0), MA#40 (average primary particle diameter 40 nm, pH 8.0), MA#30 (average primary particle diameter 30 nm, pH 8.0), manufactured by Mitsubishi Chemical Corporation.

[0018] The acidic carbon black preferably has a pH in the range of 2.0 to 4.0. Specific examples of the acidic carbon black include Raven 1080 (average primary particle size 28 nm, pH 2.4) and Raven 1100 (average primary particle size 32 nm, pH 2.9) manufactured by Columbia Chemicals, MA-8 (average primary particle size 24 nm, pH 3.0) and MA-100 (average primary particle size 22 nm, pH 3.5) manufactured by Mitsubishi Chemical, Special Black 250 (average primary particle size 56 nm, pH 3.0), Special Black 350 (average primary particle size 31 nm, pH 3.0), Special Black 550 (average primary particle size 25 nm, pH 4.0), and NEROX 305 (average primary particle size about 28 nm, pH about 2.8) manufactured by Orion Engineered Carbons, and the like.

[0019] As the black colorant, from the viewpoint of providing favorable pigment dispersibility and surface resistance value, Special Black 250 or NEROX305 is preferable.

[0020] The pH can be measured by adding 1 g of carbon black to 20 ml of decarbonated distilled water (pH 7.0) and mixing with a magnetic stirrer to prepare an aqueous suspension, and using a glass electrode at 25°C (German Industrial Standard DIN ISO 787 / 9).

[0021] The content of the black colorant is preferably from 3 to 70% by mass, and more preferably from 10 to 50% by mass, as a mass fraction relative to the total solid content of the pigment dispersion composition for black matrix of the present invention. If the content of the black colorant is less than 3% by mass, the light blocking properties may be reduced when a black matrix is ​​formed, whereas if it exceeds 70% by mass, it may become difficult to disperse the pigment.

[0022] (Sulfonated copper phthalocyanine) The pigment dispersion composition for black matrix of the present invention contains a sulfonated copper phthalocyanine. In the process of microparticulating or dispersing the black colorant, the sulfonated copper phthalocyanine has an effect of improving the microparticulation of the black colorant during dispersion and the dispersion stability after dispersion, because the basic skeleton portion is adsorbed to the pigment surface and the sulfonic acid group increases the affinity with the organic solvent or pigment dispersant.

[0023] The copper phthalocyanine in the sulfonated copper phthalocyanine is not particularly limited as long as it has a structure having a copper phthalocyanine skeleton. For example, the copper phthalocyanine skeleton may have a known substituent such as an alkyl group or a halogen atom. From the viewpoint of ease of introduction of a sulfonic acid group, however, a structure having no substituent is preferable.

[0024] The sulfonated copper phthalocyanine preferably has 0.5 to 3 sulfonic acid groups in the molecule. In this way, by having 0.5 to 3 sulfonic acid groups in the molecule, it is possible to obtain a composition for a black matrix that can provide a coating film with excellent surface resistance. The sulfonated copper phthalocyanine more preferably has 0.5 to 1.5 sulfonic acid groups in the molecule, and further preferably has 0.7 to 1.5 sulfonic acid groups. The number of sulfonic acid groups in the molecule can be calculated based on the ratio of sulfur atoms to copper atoms obtained by elemental analysis.

[0025] As the sulfonated copper phthalocyanine, commercially available products may be used, such as Solsperse 12000 (manufactured by Lubrizol Japan Co., Ltd.) and desodium VALIFAST BLUE 1605 (manufactured by Orient Chemical Industries Co., Ltd.).

[0026] The content of the sulfonated copper phthalocyanine is preferably from 0.1 to 20 parts by mass, and more preferably from 1 to 15 parts by mass, relative to 100 parts by mass of the black colorant.

[0027] (Amine compounds) The pigment dispersion composition for a black matrix of the present invention contains an amine compound. The amine compound is an imidazole-based compound and / or a triazole-based compound. Such amine compounds have low basicity, so that the ionicity of the salt formed by neutralization with sulfonic acid or carboxylic acid (for example, the above-mentioned acidic carbon black or sulfonated copper phthalocyanine, or the below-mentioned alkali-soluble resin or binder resin) is low, and therefore the black matrix formed is unlikely to conduct electricity, which is considered to result in excellent surface resistance. In addition, since the above-mentioned amine compounds have low basicity, the ionicity of the salt formed by neutralization with sulfonic acid or carboxylic acid is low, so that the ionic crosslinking in the resist coating film is weak, making the resist coating film flexible and excellent in thermal flowability. However, the present invention should not be construed as being limited to the above mechanism.

[0028] Examples of the imidazole compounds include imidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-(1-naphthyl)imidazole, 2-(1-naphthyl)-4-methylimidazole, 2-(2-naphthyl)imidazole, 2-(2-naphthyl)-4-methylimidazole, 4-phenylimidazole, 2-methyl-4-phenylimidazole, 2-methylimidazole, 2-ethylimidazole, 2-propylimidazole, 2-isopropylimidazole, 2-butylimidazole, 2-tert-butylimidazole, 2-pentylimidazole, 2-hexylimidazole, 2-heptylimidazole, 2-(1-ethylpentyl)imidazole, 2-octylimidazole, 2-nonylimidazole, azole, 2-decylimidazole, 2-undecylimidazole, 2-dodecylimidazole, 2-tridecylimidazole, 2-tetradecylimidazole, 2-pentadecylimidazole, 2-hexadecylimidazole, 2-heptadecylimidazole, 2-(1-heptyldecyl)imidazole, 2-ethyl-4-methylimidazole, 2-undecyl-4-methylimidazole, 2-heptadecyl-4-methylimidazole, 4-methylimidazole, 4-isopropylimidazole, 4-octylimidazole, 2,4,5-trimethylimidazole, 4,5-dimethyl-2-octylimidazole, 2-undecyl-4-methyl-5-bromoimidazole, 4,5-dichloro-2-ethylimidazole, and the like. Among these, from the viewpoint of imparting favorable surface resistance and heat flow characteristics, alkylimidazole is preferable, the alkylimidazole more preferably has an alkyl group having 8 to 16 carbon atoms, the alkylimidazole is further preferably a monoalkylimidazole having a linear alkyl group having 8 to 16 carbon atoms, and 2-undecylimidazole is particularly preferable.

[0029] Examples of the triazole compounds include 1,2,3-triazole, 1,2,4-triazole, 3-mercaptotriazole, 3-amino-5-mercaptotriazole, benzotriazole, 2-(2'-hydroxy-5'-methyl-phenyl)benzotriazole, 2-(2'-hydroxy-3,5-di-t-butyl-phenyl)benzotriazole, 2-[2'-hydroxy-3,5-bis(α,α-dimethylbenzyl)phenyl]benzotriazole, 2-(2'-hydroxy-3,5-di-t-amylphenyl]benzotriazole, 2-(2'-hydroxy-3,5-di-isoamyl-phenyl)benzotriazole, 2-[2'-hydroxy-3,5-bis-(α,α-dimethylbenzyl)phenyl]-2H-benzotriazole, and 2-(2'-hydroxy-4'-octoxyphenyl)benzotriazole.

[0030] Among these, from the viewpoint of providing favorable surface resistance and heat flow characteristics, it is preferable that the material has a benzotriazole skeleton, and it is more preferable that the material is benzotriazole.

[0031] The above amine compounds can be used alone or in combination of two or more.

[0032] The content of the amine compound is 0.1 to 1.5 parts by mass, preferably 0.3 to 1.4 parts by mass, and more preferably 0.5 to 1.3 parts by mass, relative to 100 parts by mass of the black colorant. When the content of the amine compound is less than 0.1 parts by mass or exceeds 1.5 parts by mass relative to 100 parts by mass of the black colorant, the surface resistance value and heat flow characteristics decrease.

[0033] (Organic solvent) The pigment dispersion composition for a black matrix of the present invention preferably contains an organic solvent. As the organic solvent, organic solvents that have been conventionally used in the field of liquid crystal black matrix resists can be suitably used.

[0034] Specifically, the organic solvent is a solvent that is soluble in water under normal pressure (1.013×10 2 The organic solvents include ester-based organic solvents, ether-based organic solvents, ether ester-based organic solvents, ketone-based organic solvents, aromatic hydrocarbon-based organic solvents, and nitrogen-containing organic solvents, each of which has a boiling point of 100 to 250°C at 250 kPa. If a large amount of an organic solvent having a boiling point exceeding 250°C is contained, when a coating film formed by applying the resist composition for a black matrix obtained from the pigment dispersion composition for a black matrix of the present invention is prebaked, the organic solvent may not evaporate sufficiently and remain in the dried coating film, which may result in a decrease in heat resistance of the dried coating film. Furthermore, if the composition contains a large amount of the organic solvent having a boiling point of less than 100° C., it may become difficult to apply the composition uniformly without unevenness, and a coating film having excellent surface smoothness may not be obtained.

[0035] Specific examples of the organic solvent include ether-based organic solvents such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, and diethylene glycol methyl ethyl ether; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene ... Examples of the organic solvents include ether ester organic solvents such as ethylene glycol monoethyl ether acetate; ketone organic solvents such as methyl isobutyl ketone, cyclohexanone, 2-heptanone, and δ-butyrolactone; ester organic solvents such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, 3-methyl-3-methoxybutylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, and n-amyl formate; alcohol solvents such as methanol, ethanol, isopropyl alcohol, and butanol; and nitrogen-containing organic solvents such as N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide. These can be used alone or in combination of two or more.

[0036] Among the above organic solvents, in terms of solubility, dispersibility, coatability, and the like, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, 2-heptanone, ethyl 2-hydroxypropionate, 3-methyl-3-methoxybutylpropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, n-amyl formate, and the like are preferred, with propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate being more preferred.

[0037] (Pigment dispersant) The pigment dispersion composition for a black matrix of the present invention preferably contains a pigment dispersant. The pigment dispersant is a basic group-containing pigment dispersant, and examples of the pigment dispersant that can be used include anionic surfactants, basic group-containing polyester-based pigment dispersants, basic group-containing acrylic-based pigment dispersants, basic group-containing urethane-based pigment dispersants, basic group-containing carbodiimide-based pigment dispersants, and acidic group-containing polymeric pigment dispersants. These basic group-containing pigment dispersants may be used alone or in combination of two or more kinds. Among them, basic group-containing polymeric pigment dispersants are preferred because they provide good pigment dispersibility.

[0038] Specific examples of the basic group-containing polymeric pigment dispersant include: (1) A reaction product of an amino group and / or an imino group of a polyamine compound (e.g., a poly(lower alkylene amine) such as polyallylamine, polyvinylamine, or polyethylene polyimine) with at least one member selected from the group consisting of polyesters, polyamides, and polyesteramides having a free carboxyl group (JP 2001-59906 A), (2) Reaction products of low molecular weight amino compounds such as poly(lower) alkyleneimines and methyliminobispropylamine with polyesters having free carboxyl groups (JP-A-54-37082, JP-A-01-311177), (3) A reaction product obtained by sequentially reacting an isocyanate group of a polyisocyanate compound with an alcohol such as methoxypolyethylene glycol, a polyester having one hydroxyl group such as caprolactone polyester, a compound having two or three isocyanate group-reactive functional groups, and an aliphatic or heterocyclic hydrocarbon compound having an isocyanate group-reactive functional group and a tertiary amino group (JP Patent Publication No. 02-612); (4) A compound obtained by reacting a polymer of an acrylate having an alcoholic hydroxyl group with a polyisocyanate compound and a hydrocarbon compound having an amino group. (5) A reaction product obtained by adding a polyether chain to a low molecular weight amino compound. (6) A reaction product obtained by reacting a compound having an isocyanate group with a compound having an amino group (JP-A-04-210220), (7) A reaction product obtained by reacting a polyepoxy compound with a linear polymer having a free carboxyl group and an organic amine compound having one secondary amino group (JP-A-09-87537). (8) Reaction products of polycarbonate compounds having a functional group capable of reacting with an amino group at one end with polyamine compounds (JP Patent Publication (Kokai) No. 09-194585), (9) Copolymers of at least one selected from methacrylic acid esters or acrylic acid esters, such as methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, stearyl methacrylate, benzyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, stearyl acrylate, and benzyl acrylate, at least one basic group-containing polymerizable monomer, such as acrylamide, methacrylamide, N-methylolamide, vinylimidazole, vinylpyridine, and a monomer having an amino group and a polycaprolactone skeleton, and at least one styrene, styrene derivative, and other polymerizable monomer (JP Patent Publication (Kokai) No. 01-164429), (10) Basic group-containing carbodiimide pigment dispersants (International Publication WO04 / 000950), (11) Block copolymers consisting of a block having a basic group such as a tertiary amino group or a quaternary ammonium salt group and a block having no functional group (see the description in JP-A-2005-55814), (12) A pigment dispersant obtained by subjecting a polyallylamine to a Michael addition reaction with a polycarbonate compound (JP-A-09-194585), (13) Carbodiimide-based compounds having at least one polybutadiene chain and at least one basic nitrogen-containing group (JP 2006-257243 A), (14) Carbodiimide-based compounds having at least one side chain having an amide group and at least one basic nitrogen-containing group in the molecule (JP 2006-176657 A), (15) Polyurethane-based compounds having structural units having ethylene oxide chains and propylene oxide chains and having amino groups quaternized with a quaternizing agent (JP 2009-175613 A), (16) A compound obtained by reacting an isocyanate group of an isocyanate compound having an isocyanurate ring in the molecule with an active hydrogen group of a compound having an active hydrogen group in the molecule and having a carbazole ring and / or an azobenzene skeleton, wherein the number of carbazole rings and azobenzene skeletons in the molecule of the compound is 15 to 85% of the total number of isocyanate groups derived from the isocyanate compound having an isocyanurate ring and urethane bonds and urea bonds generated by the reaction of the isocyanate groups with the active hydrogen groups (Patent Application No. 2009-220836). (17) Examples include graft copolymers in which polyether or polyester side chains are introduced into acrylate polymers having amino groups.

[0039] Among the basic group-containing polymeric pigment dispersants, basic group-containing urethane-based polymeric pigment dispersants, basic group-containing polyester-based polymeric pigment dispersants, and basic group-containing acrylic-based polymeric pigment dispersants are more preferred, and amino group-containing urethane-based polymeric pigment dispersants, amino group-containing polyester-based polymeric pigment dispersants, and amino group-containing acrylic-based polymeric pigment dispersants are even more preferred.Among the basic group-containing polymeric pigment dispersants, basic group (amino group)-containing polymeric pigment dispersants having at least one chain selected from the group consisting of polyester chains, polyether chains, and polycarbonate chains are particularly preferred.

[0040] The content of the pigment dispersant is preferably 1 to 200 parts by mass, and more preferably 5 to 100 parts by mass, relative to 100 parts by mass of the black colorant.

[0041] (binder resin) The pigment dispersion composition for a black matrix of the present invention preferably contains a binder resin.

[0042] The binder resin may be a thermosetting resin, a thermoplastic resin, a photopolymerizable compound, an alkali-soluble resin, etc. These may be used alone or in combination of two or more kinds.

[0043] Examples of the thermosetting resins and thermoplastic resins include butyral resins, styrene-maleic acid copolymers, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, vinyl chloride-vinyl acetate copolymers, polyvinyl acetate, polyurethane resins, phenolic resins, polyester resins, acrylic resins, alkyd resins, styrene resins, polyamide resins, rubber resins, cyclized rubbers, epoxy resins, celluloses, polybutadiene, polyimide resins, benzoguanamine resins, melamine resins, and urea resins.

[0044] Examples of the photopolymerizable compound include a monomer having one or more photopolymerizable unsaturated bonds in the molecule, and an oligomer having a photopolymerizable unsaturated bond.

[0045] Examples of the monomer having one photopolymerizable unsaturated bond in the molecule include alkyl methacrylates or acrylates such as methyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, methyl acrylate, butyl acrylate, and 2-ethylhexyl acrylate; aralkyl methacrylates or acrylates such as benzyl methacrylate and benzyl acrylate; alkoxyalkyl methacrylates or acrylates such as butoxyethyl methacrylate and butoxyethyl acrylate; and amino groups such as N,N-dimethylaminoethyl methacrylate and N,N-dimethylaminoethyl acrylate. Examples of usable compounds include alkyl methacrylates or acrylates, methacrylic acid esters or acrylic acid esters of polyalkylene glycol monoalkyl ethers such as diethylene glycol monoethyl ether, triethylene glycol monobutyl ether, and dipropylene glycol monomethyl ether, methacrylic acid esters or acrylic acid esters of polyalkylene glycol monoaryl ethers such as hexaethylene glycol monophenyl ether, isobornyl methacrylate or acrylate, glycerol methacrylate or acrylate, and 2-hydroxyethyl methacrylate or acrylate.

[0046] Examples of the monomer having two or more photopolymerizable unsaturated bonds in the molecule include bisphenol A dimethacrylate, 1,4-butanediol dimethacrylate, 1,3-butylene glycol dimethacrylate, diethylene glycol dimethacrylate, glycerol dimethacrylate, neopentyl glycol dimethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol tetramethacrylate, dipentaerythritol hexamethacrylate, dipentaerythritol pentamethacrylate, and the like. Methacrylate, epoxy methacrylate, bisphenol A diacrylate, 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, diethylene glycol diacrylate, glycerol diacrylate, neopentyl glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, epoxy acrylate, and the like can be used.

[0047] As the oligomer having a photopolymerizable unsaturated bond, one obtained by appropriately polymerizing the above-mentioned monomers can be used. The binder resins may be used alone or in combination of two or more kinds.

[0048] From the viewpoints of heat resistance and developability, the binder resin is preferably an epoxy acrylate resin.

[0049] The alkali-soluble resin will be described later.

[0050] The content of the binder resin is preferably 3 to 50% by mass, expressed as a mass fraction relative to the total solid content of the pigment dispersion composition for black matrix of the present invention.

[0051] (Method of manufacturing pigment dispersion composition for black matrix) The pigment dispersion composition for black matrix of the present invention can be produced by adding the above-mentioned various components, mixing and kneading the components. The method for the above-mentioned kneading is not particularly limited, and the kneading may be performed by a known method using, for example, a bead mill, a ready mill, an ultrasonic homogenizer, a high-pressure homogenizer, a paint shaker, a ball mill, a roll mill, a sand mill, a sand grinder, a Dyno Mill, a Dispermat, an SC Mill, a Nanomizer, or the like.

[0052] <Resist composition for black matrix> The present invention also relates to a resist composition for a black matrix obtained from the pigment dispersion composition for a black matrix of the present invention.

[0053] (Pigment dispersion composition for black matrix) The resist composition for a black matrix of the present invention contains the above-mentioned pigment dispersion composition for a black matrix of the present invention. The content of the pigment dispersion composition for black matrix is ​​preferably 30 to 80 mass %, and more preferably 40 to 75 mass %, based on the total mass of the resist composition for black matrix of the present invention.

[0054] (Photopolymerization initiator) The black matrix resist composition of the present invention preferably contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited as long as it can generate radicals or cations by irradiation with active energy rays such as ultraviolet rays or electron beams. Examples of the photopolymerization initiator include 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime)ethanone, benzophenone, N,N'-tetraethyl-4,4'-diaminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone, 2,2-diethoxyacetophenone, benzoin, benzoin methyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, α-hydroxyisopropyl ether, benzoin methyl ... Examples of photopolymerization initiators include benzophenone-based, thioxanthone-based, anthraquinone-based, and triazine-based photopolymerization initiators such as isobutylphenone, thioxanthone, 2-chlorothioxanthone, 1-hydroxycyclohexyl phenyl ketone, t-butylanthraquinone, 1-chloroanthraquinone, 2,3-dichloroanthraquinone, 3-chloro-2-methylanthraquinone, 2-ethylanthraquinone, 1,4-naphthoquinone, 1,2-benzoanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone, and 2-methyl-1[4-(methylthio)phenyl]-2-morpholinopropan-1-one. The above photopolymerization initiators may be used alone or in combination of two or more kinds.

[0055] The content of the photopolymerization initiator is preferably 1 to 20% by mass, expressed as a mass fraction relative to the total solid content of the black matrix resist composition of the present invention.

[0056] (Photopolymerizable compound) The resist composition for a black matrix of the present invention preferably contains a photopolymerizable compound. As the photopolymerizable compound, any of those described in the above-mentioned pigment dispersion composition for black matrix can be appropriately selected and used.

[0057] The content of the photopolymerizable compound is preferably 0.1 to 50 mass % as a mass fraction relative to the total solid content of the black matrix resist composition of the present invention.

[0058] (alkali soluble resin) The black matrix resist composition of the present invention preferably contains an alkali-soluble resin. The alkali-soluble resin preferably acts as a binder for the black colorant and is soluble in a developer, particularly an alkali developer, used in the development process when producing a black matrix.

[0059] The alkali-soluble resin may be a block copolymer. By using a block copolymer, the pigment dispersibility is improved compared to other copolymers, and solubility in PGMEA or an alkaline developer can be imparted. Among these block copolymers, a block copolymer having a block composed of an ethylenically unsaturated monomer having one or more carboxyl groups and a block composed of another copolymerizable ethylenically unsaturated monomer is preferred.

[0060] The block copolymer is not particularly limited, and can be one that has been used in the past.Specific examples of the block copolymer include copolymers of an ethylenically unsaturated monomer having a carboxyl group, such as acrylic acid or methacrylic acid, and at least one ethylenically unsaturated monomer selected from the group of monomers and oligomers such as styrene, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, glycerol monoacrylate, glycerol methacrylate, N-phenylmaleimide, polystyrene macromonomer, polymethyl methacrylate macromonomer, and carboepoxy diacrylate that can be copolymerized with the ethylenically unsaturated monomer having a carboxyl group, and oligomers. However, it is preferable not to use N-vinylpyrrolidone or monomers containing sulfur element. As the block copolymer, a block resin synthesized by living radical polymerization or anionic polymerization can be used. A portion of the block portions of the block copolymer may be composed of a random copolymer.

[0061] As the alkali-soluble resin, an alkali-soluble cardo resin can also be used. Examples of the alkali-soluble cardo resin include epoxy (meth)acrylate acid adducts having a fluorene skeleton, which are addition products of fluorene epoxy (meth)acrylic acid derivatives and dicarboxylic acid anhydrides and / or tetracarboxylic acid dianhydrides. The alkali-soluble resin may also have a photopolymerizable functional group.

[0062] The acid value of the alkali-soluble resin is preferably from 5 to 300 mgKOH / g, more preferably from 5 to 250 mgKOH / g, further preferably from 10 to 200 mgKOH / g, and particularly preferably from 60 to 150 mgKOH / g, from the viewpoint of development characteristics. In this specification, the acid value is a theoretical acid value, which is a value calculated arithmetically based on the amount of ethylenically unsaturated monomer having a carboxyl group and its content.

[0063] The weight average molecular weight of the alkali-soluble resin is preferably from 1,000 to 100,000, more preferably from 3,000 to 50,000, and even more preferably from 5,000 to 30,000, from the viewpoints of development characteristics and solubility in organic solvents. In the present invention, the weight average molecular weight is a polystyrene-equivalent weight average molecular weight obtained based on GPC. In this specification, the weight average molecular weight is measured using a Water2690 (manufactured by Waters Corporation) as an apparatus and a PLgel 5 μm MIXED-D (manufactured by Agilent Technologies Corporation) as a column.

[0064] The content of the alkali-soluble resin is preferably from 1 to 200 parts by mass, and more preferably from 10 to 150 parts by mass, relative to 100 parts by mass of the black colorant. In this case, if the content of the alkali-soluble resin is less than 1 part by mass, the development characteristics may deteriorate, whereas if the content of the alkali-soluble resin exceeds 200 parts by mass, the concentration of the black colorant decreases relatively, making it difficult to achieve the desired color density as a thin film.

[0065] The alkali-soluble resin preferably does not contain any primary, secondary, or tertiary amino group, and further preferably does not contain any quaternary ammonium group, and more preferably does not contain any basic group. Incidentally, an alkali-soluble resin having a structure other than that of a block copolymer may be blended within a range that does not impair the effects of the present invention.

[0066] (Organic solvent) As the organic solvent, any of the organic solvents described above in relation to the pigment dispersion composition for black matrix can be appropriately selected and used.

[0067] The content of the organic solvent is preferably from 1 to 40 mass %, and more preferably from 5 to 35 mass %, based on the total mass of the black matrix resist composition of the present invention.

[0068] (Other additives) In the black matrix resist composition of the present invention, various additives such as a thermal polymerization inhibitor, an ultraviolet absorber, and an antioxidant can be appropriately used as necessary.

[0069] (Method of manufacturing a resist composition for black matrix) As a method for producing the resist composition for a black matrix of the present invention, for example, the pigment dispersion composition for a black matrix of the present invention is prepared, and then the remaining materials are added and stirred and mixed using a stirring device or the like. The method for stirring and mixing is not particularly limited, and known methods such as those using an ultrasonic disperser, a high-pressure emulsifier, a bead mill, a three-roll mill, a sand mill, and a kneader can be used. After the stirring and mixing, the mixture may be filtered through a filter. When preparing the resist composition for a black matrix of the present invention, the black colorant, the epoxy resin, the oxazine compound, and the like described in the pigment dispersion composition for a black matrix of the present invention may be added, if necessary.

[0070] <Black matrix> The black matrix of the present invention is formed from the black matrix resist composition of the present invention.

[0071] The method for forming the black matrix of the present invention is not particularly limited, and for example, the black matrix can be formed by applying the black matrix resist composition of the present invention onto a transparent substrate, drying the composition to form a coating film, placing a photomask on the coating film, and performing image exposure through the photomask, development, and, if necessary, photocuring, or the like.

[0072] Methods for applying, drying, exposing and developing the black matrix resist composition of the present invention can be appropriately selected from known methods. As the transparent substrate, a known transparent substrate such as a glass substrate or a plastic substrate can be appropriately selected and used.

[0073] The thickness of the coating film after drying is preferably 0.2 to 10 μm, more preferably 0.5 to 6 μm, and even more preferably 1 to 4 μm. By setting the thickness within the above range, a predetermined pattern can be suitably developed, and a predetermined optical density can be suitably imparted.

[0074] The black matrix of the present invention was prepared by applying the above-mentioned black matrix resist composition to a glass substrate (EAGLE XG) using a spin coater to a thickness of 1 μm, pre-baking the composition at 100° C. for 3 minutes, and then exposing the composition to a high-pressure mercury lamp (UV integrated light amount: 80 mJ / cm 2 ). 2 ) and then post-baked at 230°C for 60 minutes to produce a black resist pattern consisting of only the solid areas. The surface resistance of the black resist pattern was 1.0×10 8 Ω / □ or more is preferable, 5.0×10 8 Ω / □ or more is preferable, and 1.0×10 9 More preferably, it is Ω / □ or more. The surface resistance is 1.0×10 8 If it is Ω / □ or more, short circuits and current leakage can be suitably prevented. The surface resistance value can be measured using a microammeter R8340 (main body) and a shield box R12702A (optional) (both manufactured by Advance Co., Ltd.).

[0075] In the black matrix of the present invention, the heat flow characteristic [ΔCD (%)] is preferably 2.0% or more, more preferably 3.0% or more, and even more preferably 4.0% or more. If the heat flow characteristic [ΔCD(%)] is 2.0% or more, loss of the black matrix pattern can be suitably prevented.

[0076] The heat flow characteristic [ΔCD (%)] can be calculated by the following formula. The above black matrix resist composition was applied to a glass substrate (EAGLE XG) using a spin coater to a thickness of 1 μm, prebaked at 100° C. for 3 minutes, and then exposed to a high-pressure mercury lamp (UV integrated light amount 80 mJ / cm 2 ) and exposed to a high-pressure mercury lamp (UV integrated light amount 80 mJ / cm ) using a photomask with a 20 μm line pattern. 2 ) and then immersed in a 0.05% potassium hydroxide aqueous solution at 23°C and 0.5 kgf / cm 2 The development was carried out at a shower pressure of 3.0 kgf / cm2 Wash with high pressure spray water. The line width of the 20 μm pattern on the obtained glass substrate is measured by a digital microscope, and the measured value is defined as CD1 (μm). Thereafter, the glass substrate is post-baked at 230° C. for 30 minutes, and then the line width of the 20 μm pattern on the glass substrate is measured by a digital microscope, and the measured value is taken as CD2 (μm). The heat flow characteristic [ΔCD (%)] can be calculated by the following formula. ΔCD(%)={(CD2 / CD1)-1}×100

[0077] Since the pigment dispersion composition for a black matrix, the resist composition for a black matrix, and the black matrix of the present invention have the above-mentioned properties, they can be suitably used as a black matrix for image display devices, touch panels, and the like. EXAMPLES

[0078] The present invention will be specifically described below using examples, but the present invention is not limited to these as long as it does not deviate from the spirit and scope of application. In the examples, "parts" and "%" represent "parts by mass" and "% by mass", respectively, unless otherwise specified.

[0079] The various materials used in the following examples and comparative examples are as follows. <Black colorant> Carbon black (product name "NEROX305", average primary particle size approximately 28 nm, pH approximately 2.8, manufactured by Orion Engineered Carbons) <Pigment dispersant> DISPERBYK-167 (solid content 52% by mass, manufactured by BYK-Chemie) <Amine compounds> 2-Undecylimidazole (Tokyo Chemical Industry Co., Ltd.) Benzotriazole (Tokyo Chemical Industry Co., Ltd.) Bis(2-ethylhexyl)amine (Tokyo Chemical Industry Co., Ltd.) 4-(3-phenylpropyl)pyridine (Tokyo Chemical Industry Co., Ltd.) <Binder resin> ZCR-1569H (epoxy acrylate resin, solid content 70% by mass, manufactured by Nippon Kayaku Co., Ltd.) <Organic solvent> PGMEA (Propylene glycol monomethyl ether acetate) <Photopolymerization initiator> OXE02 (product name: Irgacure OXE02, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime)ethanone, manufactured by BASF) <Photopolymerizable compound> DPHA (Dipentaerythritol Hexaacrylate) <Alkali-soluble resin> WR-301 (Product name "WR-301", cardo resin, acid value 100 mg KOH / g, solid content 45% by mass, manufactured by ADEKA)

[0080] <Preparation of Dispersion Composition> (Dispersion composition 1) Solsperse 12000 (a sulfonated copper phthalocyanine (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Nippon Co., Ltd.) and 2-undecylimidazole were mixed in a mass ratio of 25:11 to obtain a dispersion composition 1. (Dispersion composition 2) Solsperse 12000 (a sulfonated copper phthalocyanine (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Nippon Co., Ltd.) and benzotriazole were mixed in a mass ratio of 25:6 to obtain a dispersion composition 2. (Dispersion composition 3) Solsperse 12000 (a sulfonated copper phthalocyanine (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Japan) and bis(2-ethylhexyl)amine were mixed in a mass ratio of 25:12 to obtain a dispersion composition 3. (Dispersion composition 4) Solsperse 12000 (a sulfonated copper phthalocyanine (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Japan) and 4-(3-phenylpropyl)pyridine were mixed in a mass ratio of 5:2 to obtain a dispersion composition 4.

[0081] <Dispersion material> Solsperse 12000 (sulfonated copper phthalocyanine (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Japan) Solsperse 5000 (quaternary ammonium salt of sulfonated copper phthalocyanine (containing approximately 0.9 sulfonic acid groups per molecule), manufactured by Lubrizol Japan)

[0082] <Preparation of Pigment Dispersion Composition for Black Matrix> The materials were mixed to obtain the composition shown in Table 1, and kneaded overnight in a bead mill to prepare a pigment dispersion composition for black matrix.

[0083] [Table 1]

[0084] <Preparation of Black Matrix Resist Composition> Using a high-speed stirrer, the above-mentioned pigment dispersion composition for black matrix and other materials (photopolymerizable compound, alkali-soluble resin, photopolymerization initiator, and organic solvent) were uniformly mixed to the composition shown in Table 2, and then filtered through a filter with a pore size of 3 μm to obtain black matrix resist compositions of the Examples and Comparative Examples.

[0085] <Evaluation test> (Surface resistance value) Each of the pigment dispersion resist compositions for black matrix in the Examples and Comparative Examples was applied to a glass substrate (EAGLE XG) using a spin coater to a film thickness of 1 μm, prebaked at 100° C. for 3 minutes, and then exposed to a high-pressure mercury lamp (UV integrated light amount 80 mJ / cm 2) and then post-baked at 230° C. for 60 minutes to produce a black resist pattern (black matrix) consisting of only solid areas. The surface resistance of each of the prepared black resist patterns was measured using a microammeter R8340 (main unit) and a shield box R12702A (optional unit) (both manufactured by Advance Co., Ltd.). The results are shown in Table 2.

[0086] (Heat flow characteristics) Each black matrix resist composition was applied to a glass substrate (EAGLE XG) using a spin coater to a thickness of 1 μm, prebaked at 100° C. for 3 minutes, and then exposed to a high-pressure mercury lamp (UV integrated light amount 80 mJ / cm 2 ) and exposed to a high-pressure mercury lamp (UV integrated light amount 80 mJ / cm ) using a photomask with a 20 μm line pattern. 2 ) was then subjected to 0.5 kgf / cm2 immersion in a 0.05% aqueous potassium hydroxide solution at 23°C. 2 The development was carried out at a shower pressure of 3.0 kgf / cm 2 Pressure spray washing was performed. The line width of the 20 μm pattern on the obtained glass substrate was measured by a digital microscope, and the measured value was taken as CD1 (μm). Thereafter, the glass substrate was post-baked at 230° C. for 30 minutes, and then the line width of the 20 μm pattern on the glass substrate was measured by a digital microscope, and the measured value was taken as CD2 (μm). The heat flow characteristics [ΔCD (%)] were calculated using the following formula. ΔCD(%)={(CD2 / CD1)-1}×100

[0087] [Table 2]

[0088] In an example using a pigment dispersion composition for a black matrix containing a black colorant and a sulfonated copper phthalocyanine and a specified amount of a specific amine compound, it was confirmed that the surface resistance value can be maintained even after post-baking, and a black matrix having excellent thermal flow characteristics can be formed. [Industrial Applicability]

[0089] According to the present invention, it is possible to provide a pigment dispersion composition for a black matrix, which is capable of forming a black matrix that can maintain its surface resistivity even after post-baking and has excellent thermal flow characteristics.

Claims

1. The ink contains a black colorant, a sulfonated copper phthalocyanine, and an amine compound, the amine compound is an imidazole-based compound (excluding imidazole silane compounds) and / or a triazole-based compound, the triazole compound is at least one selected from the group consisting of 1,2,3-triazole, 1,2,4-triazole, 3-mercaptotriazole, and 3-amino-5-mercaptotriazole; The content of the amine compound is 0.1 to 1.5 parts by mass with respect to 100 parts by mass of the black colorant. Pigment dispersion composition for black matrix.

2. 2. The pigment dispersion composition for a black matrix according to claim 1, wherein the black colorant is carbon black.

3. 3. The pigment dispersion composition for a black matrix according to claim 2, wherein the black colorant is acidic carbon black.

4. 4. The pigment dispersion composition for a black matrix according to claim 1, wherein the imidazole compound is an alkylimidazole.

5. 5. The pigment dispersion composition for black matrix according to claim 4, wherein the alkylimidazole has an alkyl group having 8 to 16 carbon atoms.

6. 6. The pigment dispersion composition for black matrix according to claim 5, wherein the alkylimidazole is a monoalkylimidazole having a linear alkyl group having 8 to 16 carbon atoms.

7. 7. The pigment dispersion composition for a black matrix according to claim 6, wherein the alkyl imidazole is 2-undecylimidazole.

8. 8. The pigment dispersion composition for black matrix according to claim 1, wherein the sulfonated copper phthalocyanine has 0.5 to 3 sulfonic acid groups in the molecule.

9. A resist composition for a black matrix obtained from the pigment dispersion composition for a black matrix according to any one of claims 1 to 8.

10. A black matrix formed from the resist composition for a black matrix according to claim 9.

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