Stage device, charged particle beam device and vacuum device

Abstract

Provided is a stage device comprising a stage, a Z-axis motor that magnetically floats the stage, and an X-axis motor that drives, in one axial direction within a plane, the stage floated by the Z-axis motor, wherein: the X-axis motor is provided with an X-axis coil, a pair of X-axis magnets that face each other and that sandwich the X-axis coil in the vertical direction without contacting the X-axis coil, and an X-axis yoke that holds the pair of X-axis magnets; the Z-axis motor is provided with a Z-axis coil, a Z-axis magnet, and a Z-axis yoke that holds the Z-axis magnet; and the Z-axis motor is disposed at a position that is below the X-axis motor such that the magnetic field which has leaked from the Z-axis motor is blocked by the X-axis yoke. Thus, it is possible to suppress magnetic field leakage and to perform high-speed positioning.

Description

[Technical field]

[0001] The present disclosure relates to a stage apparatus, a charged particle beam apparatus, and a vacuum apparatus. [Background technology]

[0002] Conventionally, there are known technologies relating to device stages for semiconductor-related equipment and magnetic levitation stages for accurately positioning and supporting wafers. Patent Document 1 describes a magnetic levitation stage mechanism for moving devices. This magnetic levitation planar stage mechanism has a structure in which a magnetic material is placed on the side of the levitating movable table, and gravity support is performed by an electromagnetic actuator on the fixed side. In this patent, the gravity of the levitation part is supported by an upward thrust generated by a coil current. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2020-186815 A Summary of the Invention [Problem to be solved by the invention]

[0004] For example, in processes such as manufacturing, measuring, and inspecting semiconductor wafers, the conventional stage device is used to perform accurate positioning of the semiconductor wafer. In such stage devices, there is a demand for improved positioning accuracy of the semiconductor wafer. However, the conventional stage device generates a large amount of heat in the coil, which causes the coil to burn out. In addition, there is a problem that it is difficult to achieve a long stroke because the attractive force varies at the joints of the coil. In addition, there is a problem of leakage magnetic field, which makes it difficult to apply to charged particle beam devices.

[0005] The present disclosure solves the problems of the conventional techniques described above, and provides a stage device, a charged particle beam device, and a vacuum device that are capable of suppressing leakage of a magnetic field and performing high-speed positioning. [Means for solving the problem]

[0006] In order to solve the above-mentioned problems, the present invention provides a stage device comprising a stage, a Z-axis motor that magnetically levitates the stage, and an X-axis motor that drives the stage levitated by the Z-axis motor in one axial direction within a plane, wherein the X-axis motor comprises an X-axis coil, a pair of X-axis magnets that face the X-axis coil in a non-contact manner and sandwich the X-axis coil in the vertical direction, and an X-axis yoke that holds the pair of X-axis magnets, and the Z-axis motor comprises a Z-axis coil, a Z-axis magnet, and a Z-axis yoke that holds the Z-axis magnet, and the Z-axis motor is configured to be located below the X-axis motor in a position where magnetic fields leaking from the Z-axis motor are shielded by the X-axis yoke.

[0007] In addition, in order to solve the above-mentioned problems, the present invention provides a charged particle beam device including a stage device having a table on which a sample is placed, a vacuum chamber that houses the stage device and evacuates the inside to a vacuum, a charged particle beam optical system unit that irradiates a charged particle beam on a sample placed on the table of the stage device, and a control unit that controls the stage means, the vacuum chamber, and the charged particle beam optical system unit, wherein the stage device includes a stage on which the table is mounted, a Z-axis motor that magnetically levitates the stage, and an X-axis motor that drives the stage levitated by the Z-axis motor in one axial direction within a plane, the X-axis motor includes an X-axis coil, a pair of X-axis magnets that face the X-axis coil in a non-contact manner and sandwich the X-axis coil in the vertical direction, and an X-axis yoke that holds the pair of X-axis magnets, the Z-axis motor includes a Z-axis coil, a Z-axis magnet, and a Z-axis yoke that holds the Z-axis magnet, and the Z-axis motor is configured to be located below the X-axis motor in a position where a magnetic field leaking from the Z-axis motor is shielded by the X-axis yoke.

[0008] Furthermore, in order to solve the above-mentioned problems, the present invention provides a vacuum apparatus comprising a stage device and a vacuum chamber which houses the stage device and evacuates the inside to a vacuum, the stage device comprising a stage, a Z-axis motor which magnetically levitates the stage, and an X-axis motor which drives the stage levitated by the Z-axis motor in one axial direction within a plane, the X-axis motor comprising an X-axis coil, a pair of X-axis magnets which face the X-axis coil in a non-contact manner and sandwich the X-axis coil in the vertical direction, and an X-axis yoke which holds the pair of X-axis magnets, the Z-axis motor comprising a Z-axis coil, a Z-axis magnet, and a Z-axis yoke which holds the Z-axis magnet, the Z-axis motor being configured to be located below the X-axis motor in a position where the magnetic field leaking from the Z-axis motor is shielded by the X-axis yoke. Effect of the Invention

[0009] According to the above aspect of the present disclosure, it is possible to provide a stage device, a charged particle beam device, and a vacuum device that are capable of suppressing leakage of a magnetic field and performing high-speed positioning. [Brief description of the drawings]

[0010] [Figure 1] FIG. 1 is a front view showing a schematic configuration of a motor with an open magnetic circuit. [Diagram 2] FIG. 2 is a front view showing a schematic configuration of a motor in which a magnetic circuit is closed. [Diagram 3] FIG. 1 is a front view showing a schematic configuration of a repulsive type gravity compensation actuator. [Figure 4] FIG. 1 is a front view showing a schematic configuration of an attraction-type gravity compensation actuator. [Diagram 5] FIG. 1 is a front view showing a schematic configuration of a magnetic levitation stage according to a reference example of the present invention. [Figure 6] FIG. 1 is a front view showing a schematic configuration in which an X-axis motor for explaining the principle of the present invention and a Z-axis motor having a Z drive and gravity compensation function are arranged in a stacked manner. [Figure 7] FIG. 2 is a front view showing the layout of a water-cooling jacket and an X-axis motor and a Z-axis motor, which explains the principle of the present invention. [Figure 8]1 is a front view showing a schematic configuration of a stage device according to a first embodiment of the present invention. [Figure 9] FIG. 11 is a front view showing a schematic configuration of a charged particle beam device according to a second embodiment of the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0011] Hereinafter, the principle of the configuration of a stage device according to the present disclosure, and embodiments of a stage device, a charged particle beam device, and a vacuum device to which this principle is applied will be described with reference to the drawings.

[0012] For a magnetic levitation stage with a stroke of several hundred mm in one axis direction (X direction), we will explain an example of a motor in the longitudinal direction (X-axis motor axis), which is a component of the magnetic levitation stage. Since the X-axis motor needs to secure thrust over a long stroke of several hundred mm, it is necessary to use a three-phase AC linear motor. They are roughly divided into two types depending on the shape of the magnetic circuit of the yoke.

[0013] 1 shows an example of a linear motor 100 with an open yoke magnetic circuit. A coil 107 is placed between two permanent magnets 105, and a current is passed through the coil 107 to generate thrust. Magnetic flux 108 is absorbed by a yoke 106 behind the permanent magnet 105, but because the yokes 106 are separated from each other, the magnetic flux 108 passes through space and enters the back of the yoke 106 on the opposite side. While a linear motor 100 with an open magnetic circuit for the yoke 106 has the advantage of a simple structure, it has the problem of a large leakage magnetic field from the yoke 106.

[0014] 2 shows an example of a linear motor 110 with a U-shaped yoke in which the magnetic circuit is closed. A U-shaped yoke 116 is used in such a linear motor 110 with a closed magnetic circuit. In such a configuration, magnetic flux 118 that enters the U-shaped yoke 116 from one of a pair of permanent magnets 115 arranged opposite each other passes through the U-shaped yoke 116 and enters the corresponding permanent magnet 115 with almost no leakage to the outside. As a result, the leakage magnetic field generated by leakage of the magnetic flux 118 is small. This principle is applied in the present invention.

[0015] From the viewpoint of reducing leakage magnetic field, it is effective to use a linear motor that employs a U-shaped yoke 116 with a closed magnetic circuit for the X-motor.

[0016] Next, we will explain the Z-axis motor, which compensates for gravity in the levitation section and generates thrust in the Z-axis direction. If we try to support the gravity of the levitation section using only the thrust obtained from the coil current, a relatively large current must be passed through the coil, which will generate a huge amount of heat. Therefore, from the perspective of reducing the heat generated by the coil during gravity compensation, it is effective to use magnetic repulsion or magnetic attraction for the Z-axis motor.

[0017] FIG. 3 shows an example of a gravity compensation actuator 300 that utilizes a repulsive force. A fixed-side yoke 302 is covered with permanent magnets 301, and the repulsive force 313 between the permanent magnets 125 attached to the movable-side yoke 126 supports the gravity of the levitation part. By adjusting the amount of current in the coil 127, the repulsive force can be increased or decreased, and driving in the vertical direction (Z direction) is also possible, and the distance between the fixed-side permanent magnet 301 and the movable-side permanent magnet 125 can be adjusted. With this structure, if gravity compensation over a movable stroke 312 of several hundred mm in a plane (X direction or Y direction) is to be realized, it is necessary to make a long magnet corresponding to the movable stroke for the fixed-side permanent magnet 301. However, since it is difficult to actually make a magnet with the above-mentioned length, a plurality of permanent magnets are laid out to form a fixed-side permanent magnet of the required length. However, when multiple permanent magnets are combined, the density of the magnetic flux 128 decreases at the joints between the permanent magnets, causing the repulsive force to change. Therefore, when a configuration is used that utilizes magnetic repulsive force as shown in Figure 3, fluctuations in the gravity compensation force occur when the stage is moved, causing yawing, making it unsuitable for a long stroke.

[0018] FIG. 4 shows an example of a gravity compensation actuator 400 that utilizes an attractive force. The permanent magnet 145 of the linear motor 140, which is composed of a permanent magnet 145, a yoke 146, and a coil 147, is attracted to a guide yoke 402 made of a magnetic material such as an iron-based material on the fixed side, and the magnetic attractive force 401 is utilized for gravity compensation. Since the guide yoke 402 is made of an iron-based material, its length can be freely set according to the movable range of the linear motor 140. By adjusting the amount of current in the coil 147, the attractive force between the guide yoke 402 and the permanent magnet 145 can be increased or decreased, and driving in the vertical direction (Z direction) is also possible, and the distance between the guide yoke 402 and the linear motor 140 can be adjusted. The magnetic attractive force 401 is suitable for a long stroke because the force is constant within the stroke where the guide yoke 402 exists.

[0019] That is, in order to realize a magnetic levitation stage with a low magnetic field, it is effective to use a U-shaped yoke for the X motor and an attraction type for the Z motor.

[0020] Fig. 5 shows a magnetic levitation stage 500 as a reference example of the present invention. The reference example shown in Fig. 5 is a configuration example of a magnetic levitation stage 500 configured according to the above-mentioned concept, using a U-shaped yoke 516 as explained in Fig. 2 for an X-axis motor 510 and a suction type as explained in Fig. 4 for a Z-axis motor 520. In the configuration shown in Fig. 5, 101 is a top table, 102 is a bar mirror, 103 is a sample stage, and 104 is a sample placed on the sample stage 103. 508 is a water-cooled jacket that also serves as the X-stage, and water-cooled piping 507 runs through it. A top table support column 509 is fixed to the water-cooled jacket 508, and the top table support column 509 supports the top table 101.

[0021] Reference numeral 520 denotes a Z-axis motor, which is equipped with a coil 527, a permanent magnet 525, and a yoke 526, and is disposed in pair on the left and right sides of the water-cooled jacket 508. The pair of Z-axis motors 520 are each fixed by a side bracket 541 to the water-cooled jacket 508, which also serves as the X-stage.

[0022] Reference numeral 510 denotes an X-axis motor, which includes a coil 517 , a permanent magnet 515 , and a yoke 516 . The coil 517 is fixed to a water-cooled jacket 508 which also serves as an X-stage by a central bracket 542 , and the yoke 516 is fixed to a Y-table 540 .

[0023] Reference numeral 530 denotes a Y-axis motor, which is equipped with a coil 537 , a permanent magnet 535 , and a yoke 536 . The coil 537 is fixed to the water-cooled jacket 508 which also serves as the X-stage by a central bracket 542 , and the yoke 536 is fixed to a Y-table 540 .

[0024] A pair of yokes 514 are fixed to the Y table 540 at positions facing the pair of Z-axis motors 520. The Y table 540 is guided by a lower shaft linear guide 545 via a sphere 544.

[0025] 5 has a stacked stage configuration in which an X-axis stage equipped with a water-cooled jacket 508 is mounted on a Y-axis stage equipped with a Y table 540, and the Y-axis (lower axis) is guided by a contact-type rolling guide, while the X-axis (upper axis) is made non-contact by a magnetic levitation guide. In other words, the upper axis is a magnetic levitation stage with a stroke of several hundred mm in the X-axis direction.

[0026] In this configuration, since the coil 537 of the Y-axis motor 530 and the coil 517 of the X-axis motor 510 are on the levitation side, it is necessary to mount a water-cooling jacket 508 containing a water-cooling pipe 507 for cooling the coils. The Z-axis motor 520 needs to be placed with a wide gap on both sides to control the inclination of the levitation part, and needs to be placed at a low position away from the top table 101 to reduce the leakage magnetic field to the top table 101 side. Therefore, the X-axis motor 510 (and the Y-axis motor 530) also needs to be placed at a low position, resulting in a large gap 552 between the horizontal axis drive center 551 and the height 550 of the center of gravity. Since the pitching moment (rotational force around the Y-axis) during stage drive increases in proportion to the gap 552, the current required for the coil 527 of the Z-axis motor 520 increases, which leads to an increase in the heat generated by the coil during drive, resulting in a problem of reduced throughput.

[0027] The present invention solves the above-mentioned problems by preventing the occurrence of pitching moment (rotational force around the Y-axis) when the stage is driven, thereby eliminating the need to increase the current required for the Z-axis motor coil and reducing heat generation in the coil during drive.

[0028] Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings. In all the drawings for explaining the embodiment, the same reference numerals are used to denote the same functions, and the repeated description is omitted as a rule.

[0029] However, the present invention should not be construed as being limited to the description of the embodiments shown below. It will be easily understood by those skilled in the art that the specific configurations can be modified without departing from the concept or spirit of the present invention. EXAMPLES

[0030] A low magnetic field gravity compensation mechanism in a first embodiment of the present invention will be described with reference to Fig. 6. Fig. 6 shows a configuration in which a Z-axis motor 620 is arranged below an X-axis motor 610. As shown in Fig. 6, a permanent magnet 625, a yoke 626, and a coil 627 of a Z-axis motor 620 are arranged below a U-shaped yoke 616 of an X-axis motor 610, and an attractive force 601 acts on the Z-axis motor 620 by energizing the coil 627, forming an attractive type gravity compensation actuator / Z-axis motor 620.

[0031] With this configuration, surface 6161 of yoke 606 of X-axis motor 610 facing the Z-axis motor also plays a role equivalent to guide yoke 402 described in FIG. 4, making yoke 514 in magnetic levitation stage 500 as shown in FIG. 5 unnecessary.

[0032] Furthermore, by arranging the X-axis motor 610 and the Z-axis motor 620 as shown in FIG. 6, the leakage magnetic field from the permanent magnet 625 and yoke 626 of the Z-axis motor 620 can be shielded using the yoke 616 of the X-axis motor 610, thereby suppressing the effect on the electron beam of the electron optical system (not shown) arranged above the X-axis motor 610.

[0033] The principle of this embodiment is explained in Fig. 7. The configuration shown in Fig. 7 shows a state in which X-axis motor 610 and Z-axis motor 620 explained in Fig. 6 are attached to a block 711 that corresponds to water-cooling jacket 508 in magnetic levitation stage 500 in Fig. 5. A table 712 that corresponds to top table 101 in magnetic levitation stage 500 in Fig. 5 is supported by pillars 713 on block 711.

[0034] 7, the X-axis motor 610 and the Z-axis motor 620 are arranged in pairs on the left and right sides of a block 711, and a yoke 616 of the X-axis motor 610 is fixed to a wall surface 710. In addition, a coil 617 of the X-axis motor 610 and a yoke 626 and a coil 627 of the Z-axis motor 620 are fixed to the block 711.

[0035] In this configuration, by energizing the pair of left and right coils 627, an attractive force 601 acts on the yoke 616 fixed to the wall surface 710 of the X-axis motor 610 and the Z-axis motor 620, and the Z-axis motor 620, which acts as an attraction-type gravity compensation actuator, is levitated together with the block 711 and table 712. By controlling the current flowing through the coil 617 of the X-axis motor 610 in this state, the block 711, table 712, and Z-axis motor 620 move in the X direction on the horizontal axis drive center 701 in a levitated state.

[0036] In this configuration, by balancing the mass of table 712, block 711, and pair of left and right Z-axis motors 620 above and below horizontal axis drive center 701, it is possible to align their centers of gravity on horizontal axis drive center 701. This makes it possible to drive the center of gravity when driving the horizontal axis, and suppresses the occurrence of the pitching moment that was a problem in the reference example shown in FIG.

[0037] Furthermore, by adopting a configuration that suppresses the occurrence of pitching when the levitated block 711 and table 712 move, the occurrence of pitching can be suppressed even if the current flowing through the coil 627 of the Z-axis motor 620 is reduced, and heat generation by the Z-axis motor 620 can be suppressed.

[0038] As shown in FIG. 7, this embodiment relates to a stage device equipped with a support stage that supports an object to be positioned, and a levitation mechanism that magnetically levitates and positions this support stage, and a gravity compensation mechanism and Z actuator are configured by arranging a permanent magnet and a coil under the X yoke of the X motor of the levitation mechanism.

[0039] Figure 8 shows the schematic configuration of a low magnetic field magnetic levitation stage 800 realized by this embodiment, the principle of which has been explained in Figures 6 and 7. The magnetic levitation stage 800 shown in Figure 8 is equipped with a water-cooled jacket 858 corresponding to block 711 shown in Figure 7, an X-axis motor 810 corresponding to X-axis motor 610, a Z-axis motor 820 corresponding to Z-axis motor 620 in Figure 7, and a Y-axis motor 830.

[0040] A yoke 816 of the X-axis motor 810 is fixed to the Y table 809, and a coil 817 of the X-axis motor 810 is fixed to a water-cooled jacket 858 via a block 818. Furthermore, a yoke 826 of the Z-axis motor 820 is fixed to the water-cooled jacket 858 via a block 828. Furthermore, a yoke 836 of the Y-axis motor 830 is fixed to the Y table 809, and a coil 837 is fixed to the water-cooled jacket 858 via a block 838. The Y table 809 is guided by a lower shaft linear guide 962 via a sphere 961.

[0041] Arrows indicate heat flow 803 from coils 817, 827, and 837 of each motor, which are heat sources. By configuring coil 817 of X-axis motor 810 to be directly fixed to water-cooled jacket 508 with block 818 and coil 827 of Z-axis motor 820 to be directly fixed to water-cooled jacket 508 with block 828, the path of heat flow from coil 817 and coil 827 to water-cooled jacket 858 is shortened, enabling efficient coil cooling.

[0042] In addition, magnetic levitation stage 800 is equipped with a linear scale consisting of a scale head 841 fixed to the water-cooled jacket 858 side and a scale plate 842 fixed to the Y table 809 side, and measures the position of water-cooled jacket 858, which is the levitation part, relative to Y table 809. In the configuration shown in Fig. 8, an example is shown in which a one-axis linear scale is installed, but for stable levitation control, it is necessary to install a six-axis linear scale.

[0043] The relative displacement between the scale head 841 and the scale plate 842 is measured and used for feedback control of the position of the water-cooled jacket 858, which is the floating part. The scale head 841 is a heat source, like the coils 817, 827, and 837 of each motor, and therefore needs to be cooled so that the heat is not transferred to the top table. In the configuration shown in FIG. 8, the scale head 841 is directly fixed to the water-cooled jacket 858, so that the cooling efficiency is high. The top table 101 on which the sample stage 103 is mounted is also fixed to the water-cooled jacket 858 via the top table support column 509, so that it is possible to prevent the heat of the coils 817, 827, and 837 of each motor and the scale head 841 from being transferred to the sample 104 mounted on the sample stage 103.

[0044] As explained above, in this embodiment, the magnetic levitation stage is configured such that the magnets and coils are placed under the two U-shaped X-yokes, with the openings of the X-yokes facing inward, and the coils are fixed to the water-cooled jacket.

[0045] In the configuration of magnetic levitation stage 800 shown in Fig. 8, the position of the center of gravity of the portion including water-cooled jacket 858 and top table 101 that are levitated by operating Z-axis motor 820 is adjusted so as to overlap with horizontal-axis drive center 701, as described in Fig. 7. This makes it possible to drive the center of gravity so as to overlap with horizontal-axis drive center 701 when driving the X-axis motor to drive the horizontal axis to move the movable portion including water-cooled jacket 858 and top table 101, thereby suppressing the occurrence of pitching moment. EXAMPLES

[0046] Next, as a second embodiment, Fig. 9 shows an example in which the magnetic levitation stage 800 described in the first embodiment is applied to a charged particle beam device and a vacuum device. A semiconductor measuring device 1900, which is an embodiment of the charged particle beam device and the vacuum device according to this embodiment shown in Fig. 9, includes a stage device 1910 that positions an object, and a vacuum chamber 1901 that houses the stage device 1910. The semiconductor measuring device 1900 according to this embodiment is, for example, a length measurement SEM that is an application device of a scanning electron microscope (SEM). The stage device 1910 has the same configuration as the magnetic levitation stage 800 described in the first embodiment using Fig. 8.

[0047] The semiconductor measuring device 1900 includes, for example, a stage device 1910, a vacuum chamber 1901, an electron optical system barrel 1902, a vibration-damping mount 1903, a laser interferometer 1904, and a controller 1905. The vacuum chamber 1901 houses the stage device 1910, and the inside of the vacuum chamber is depressurized by a vacuum pump (not shown) to create a vacuum state with a pressure lower than atmospheric pressure. The vacuum chamber 1901 is supported by a vibration-damping mount 1903 to prevent the stage device 1910 and the electron optical system barrel 1902 from being affected by external vibrations.

[0048] The semiconductor measuring apparatus 1900 positions an object 1906 such as a semiconductor wafer using a stage device 1910, irradiates an electron beam from an electron optical system barrel 1902 onto the object, captures an image of a pattern on the object, measures the line width of the pattern, and evaluates the shape accuracy. In the stage device 1910, a laser interferometer 1904 measures the position (position in the Y direction) of the bar mirror 102, and the scale head 841 described in Fig. 8 measures the position (position in the X direction) of the scale plate 842. A controller 1905 controls the positioning of the object such as a semiconductor wafer held on the sample stage 103 of the stage device 1910 in the X and Y directions.

[0049] In the configuration of such semiconductor measuring apparatus 1900, when the configuration of the magnetic levitation stage 800 described with reference to FIG. 8 in the first embodiment is adopted as the stage device 1910, while the electron beam is being irradiated from the electron optical system barrel 1902 onto the object 1906, the top table 101 stops and only a small current flows through the coil 807 of the X-axis motor 810 and the coil 837 of the Y-axis motor 830. On the other hand, the Z-axis motor 820 is in operation and a relatively large current flows through the coil 827. In this state, the magnetic field generated on the top table 101 side among the magnetic fields generated by the coil 827 of the Z-axis motor 820 is trapped by the yoke 816 of the X-axis motor 810, and the magnetic field leaking to the top table 101 side is reduced, and the influence on the electron beam irradiated from the electron optical system barrel 1902 onto the object 1906 can be reduced to a level that can be almost ignored.

[0050] As described above, according to this embodiment, by adopting the configuration of magnetic levitation stage 800 described in embodiment 1 using FIG. 8 as stage device 1910 of semiconductor measuring device 1900, it is possible to prevent the occurrence of contamination on the surface of object 1906 caused by metal powder generated from the sliding portion when a stage using a conventional sliding type guide is adopted.

[0051] Furthermore, when a stage using a conventional sliding-type guide mechanism is employed, the sliding portion becomes a heat source, causing thermal expansion of the stage, which may result in a change in the position of the object 1906 placed on the sample stage 103, and thus a shift in the position of the electron beam irradiated onto the object from the electron optical system column 1902. In contrast, the semiconductor measuring device 1900 of this embodiment employs the configuration of the magnetic levitation stage 800, which eliminates heat generation due to sliding and the problem of deviation in the electron beam irradiation position due to thermal expansion.

[0052] Furthermore, by adopting the configuration of magnetic levitation stage 800, non-contact, high-speed, and high-precision positioning can be achieved. For example, positioning can be performed with an accuracy of about ±1 μm in about 1 / 100 of the time compared to when using a conventional sliding guide mechanism.

[0053] Furthermore, by adopting the configuration of magnetic levitation stage 800, the vibrations, deformation, and heat of the lower table are not transmitted to the magnetically levitated upper table, eliminating causes that reduce the accuracy of the irradiation position of the electron beam on the target object.

[0054] That is, the semiconductor measuring device 1900 according to this embodiment includes the magnetic levitation stage 800 as the stage device 1910, thereby making it possible to improve the positioning accuracy of an object such as a wafer and suppress the leakage of a magnetic field. Therefore, it is possible to improve the measurement accuracy of the semiconductor measuring device as a charged particle beam device. In addition, since the levitation mechanism of the magnetic levitation stage 800 is of a magnetic levitation type, it is easily applied to the semiconductor measuring device, which is a vacuum device, and can exhibit excellent effects such as reducing contamination and suppressing heat generation. Note that the charged particle beam device and vacuum device of the present disclosure are not limited to the semiconductor measuring device.

[0055] Although the embodiment of the present invention has been described in detail above using the drawings, the specific configuration is not limited to this embodiment, and even if there are design changes and the like within the scope that does not deviate from the gist of the present invention, they are also included in the present invention. [Explanation of symbols]

[0056] 100,110,120,140 Linear motor 101 Top Table 102 Bar Mirror 103 Sample stage 104 Samples 105, 115, 125, 145 Permanent magnets 106, 116, 126, 146 York 107, 117, 127, 147 coils 108, 118, 128, 148 magnetic flux 300, 400 Gravity Compensation Actuator 301 Permanent Magnets 402 Guide Yoke 403 Back Yoke 500,800 Magnetic levitation stage 510,610,810 X-axis motor 515,615,815 Permanent magnets for X-axis motor 516,616,816 Yoke of X-axis motor 517,617,817 X-axis motor coil 520,620,820 Z-axis motor 525,625,825 Z-axis motor permanent magnet 526,626,826 Z-axis motor yoke 527,627,827 Z-axis motor coil 530,830 Y-axis motor 535,835 Y-axis motor permanent magnet 536,836 Y-axis motor yoke 537,837 Y-axis motor coil 540 Y Table 841 Scale Head 842 Scale Plate 858 Water Cooling Jacket 1900 Semiconductor measuring equipment 1901 Vacuum chamber 1902 Electron optical system tube 1905 Controller

Claims

1. A stage device including a stage, a Z-axis motor that magnetically levitates the stage, and an X-axis motor that drives the stage levitated by the Z-axis motor in one axial direction within a plane, the X-axis motor includes an X-axis coil, a pair of X-axis magnets facing each other without contacting the X-axis coil and sandwiching the X-axis coil in the vertical direction, and an X-axis yoke that holds the pair of X-axis magnets; the Z-axis motor includes a Z-axis coil, a Z-axis magnet, and a Z-axis yoke that holds the Z-axis magnet; 2. A stage apparatus comprising: a stage unit including: a stage yoke for receiving a magnetic field from the Z-axis motor; a stage yoke for receiving a magnetic field from the Z-axis motor;

2. 2. The stage device according to claim 1, The X-axis yoke has a U-shaped cross section that covers the outside of the pair of X-axis magnets that vertically sandwich the X-axis coil and has an open surface facing the stage, and the Z-axis motor is disposed below the X-axis yoke.

3. 3. The stage device according to claim 2, a housing having a wall surface arranged outside the stage, the X-axis coil and the Z-axis motor of the X-axis motor being supported by the stage, and the X-axis yoke being fixed to the wall surface arranged outside the stage of the housing.

4. 4. The stage device according to claim 3, A stage device characterized in that a portion of the X-axis yoke facing the Z-axis motor magnetically attracts the Z-axis motor using a magnetic field generated by the Z-axis motor, thereby levitating the Z-axis motor together with the stage.

5. 2. The stage device according to claim 1, A stage device characterized in that the height of the drive center that drives the stage in the one axial direction by the X-axis motor is the same as the height of the center of gravity of a part that includes the stage levitated by the Z-axis motor.

6. 2. The stage device according to claim 1, The stage device is characterized in that the stage includes a table for mounting a sample thereon, and a water-cooling jacket having cooling water piping therein.

7. A charged particle beam device comprising: a stage device having a table on which a sample is placed; a vacuum chamber that houses the stage device and evacuates the inside of the stage device to a vacuum; a charged particle beam optical system unit that irradiates the sample placed on the table of the stage device with a charged particle beam; and a control unit that controls the stage device, the vacuum chamber, and the charged particle beam optical system unit, The stage device includes: a stage on which the table is mounted, a Z-axis motor that magnetically levitates the stage, and an X-axis motor that drives the stage levitated by the Z-axis motor in one axial direction within a plane, the X-axis motor includes an X-axis coil, a pair of X-axis magnets facing each other without contacting the X-axis coil and sandwiching the X-axis coil in the vertical direction, and an X-axis yoke that holds the pair of X-axis magnets; the Z-axis motor includes a Z-axis coil, a Z-axis magnet, and a Z-axis yoke that holds the Z-axis magnet; The Z-axis motor is disposed below the X-axis motor in a position where the magnetic field leaking from the Z-axis motor is shielded by the X-axis yoke. A charged particle beam device comprising:

8. The charged particle beam device according to claim 7, a charged particle beam device, characterized in that the X-axis yoke of the stage device has a U-shaped cross section that covers the outside of the pair of X-axis magnets that vertically sandwich the X-axis coil and has an open surface facing the stage, and the Z-axis motor is disposed below the X-axis yoke.

9. The charged particle beam device according to claim 8, The stage device further comprises a housing having a wall surface arranged outside the stage, the X-axis coil and the Z-axis motor of the X-axis motor are supported by the stage, and the X-axis yoke is fixed to the wall surface arranged outside the stage of the housing.

10. The charged particle beam device according to claim 9, A charged particle beam device characterized in that a portion of the X-axis yoke of the stage device facing the Z-axis motor magnetically attracts the Z-axis motor using a magnetic field generated by the Z-axis motor, thereby levitating the Z-axis motor together with the stage.

11. The charged particle beam device according to claim 7, the stage device comprises a Y-axis motor that drives the stage device in a direction perpendicular to the one axis direction, a one axis direction position measurement unit that measures the position of the stage in the one axis direction in a non-contact manner, and a perpendicular direction position measurement unit that measures the position in the direction perpendicular to the one axis direction in a non-contact manner, and the control unit controls the X-axis motor and the Y-axis motor based on position information of the stage measured by the one axis direction position measurement unit and the perpendicular direction position measurement unit.

12. A vacuum apparatus including a stage device and a vacuum chamber that accommodates the stage device and evacuates the inside of the vacuum chamber, The stage device includes: a stage, a Z-axis motor that magnetically levitates the stage, and an X-axis motor that drives the stage levitated by the Z-axis motor in one axial direction within a plane, the X-axis motor includes an X-axis coil, a pair of X-axis magnets facing each other without contacting the X-axis coil and sandwiching the X-axis coil in the vertical direction, and an X-axis yoke that holds the pair of X-axis magnets; the Z-axis motor includes a Z-axis coil, a Z-axis magnet, and a Z-axis yoke that holds the Z-axis magnet; The Z-axis motor is disposed below the X-axis motor in a position where the magnetic field leaking from the Z-axis motor is shielded by the X-axis yoke. A vacuum device comprising:

13. 13. The vacuum device of claim 12, The vacuum apparatus is characterized in that the stage device comprises a Y-axis motor that drives the stage device in a direction perpendicular to the one axis direction, a one axis position measurement unit that measures the position of the stage in the one axis direction in a non-contact manner, and a perpendicular direction position measurement unit that measures the position in a direction perpendicular to the one axis direction in a non-contact manner.

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