Substrate Processing Equipment

Abstract

To provide a substrate processing apparatus capable of sharing the structure of a processing unit.SOLUTION: In a substrate processing apparatus 1, a first processing unit 12A is arranged to the right of a transport space 12A. The first processing unit 21A1 includes a first holding portion 25A. A second processing unit 21B1 is arranged on the left side of the transport space 12A. The second processing unit 21B1 includes a second holding portion 25B. The first holding portion 25A has a center 26A located behind a center 24A of the first processing unit 21A1 in plan view. The second holding portion 25B has a center 26B located forward of the center 24B of the second processing unit 21B1 in plan view. A front end 22B of the second processing unit 21B1 is arranged behind a front end 22A of the first processing unit 21A1 and arranged in front of a rear end 23A of the first processing unit 21A1. A first liquid reservoir 31 is arranged on the left side of the transport space 12A and is adjacent to the front of the second processing unit 21B1.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a substrate processing apparatus for processing substrates, such as semiconductor wafers, substrates for liquid crystal displays, substrates for organic electroluminescence (EL), substrates for flat panel displays (FPD), substrates for optical displays, substrates for magnetic disks, substrates for optical disks, substrates for magneto-optical disks, substrates for photomasks, and substrates for solar cells. [Background technology]

[0002] Patent Document 1 discloses a substrate processing apparatus that includes an indexer unit and a processing block. The processing block is disposed behind the indexer unit.

[0003] The processing block includes a transport space and a center robot. The transport space extends in a front-rear direction. The center robot is provided in the center of the transport space. The center robot is rotatable about a vertical axis. However, the center robot cannot move in parallel in the front-rear direction.

[0004] The substrate processing apparatus 1 includes a shuttle unit. The shuttle unit is provided in a transport space. The shuttle unit is disposed in front of the center robot. The shuttle unit places a substrate to be transported between the indexer unit and the center robot. The shuttle unit is movable in the front-rear direction. When the shuttle unit moves backward, the center robot can access the shuttle unit.

[0005] The processing block includes a first processing unit, a second processing unit, a third processing unit, and a fourth processing unit. The first processing unit and the third processing unit are disposed on a first side of the transport space. The third processing unit is disposed rearward of the first processing unit. Similarly, the second processing unit and the fourth processing unit are disposed on a second side of the transport space. The fourth processing unit is disposed rearward of the second processing unit.

[0006] The second processing unit has a structure symmetrical to that of the first processing unit. The fourth processing unit has a structure symmetrical to that of the third processing unit. Therefore, the center robot can access the first processing unit, the second processing unit, the third processing unit, and the fourth processing unit.

[0007] The substrate processing apparatus 1 includes a liquid storage section. The liquid storage section stores the processing liquid to be distributed to the first to fourth processing units. The liquid supply section is disposed behind the transfer space. The liquid supply section is disposed behind the first to fourth processing units. [Prior art documents] [Patent documents]

[0008] [Patent Document 1] JP 2010-225935 A Summary of the Invention [Problem to be solved by the invention]

[0009] However, the substrate processing apparatus disclosed in Patent Document 1 has the following problems. As described above, the second processing unit has a structure that is symmetrical to the structure of the first processing unit. Therefore, the structure of the second processing unit is similar to the structure of the first processing unit, but is not equal to the structure of the first processing unit. Therefore, the quality of the processing performed on the substrate is likely to vary between the first processing unit and the second processing unit. Furthermore, many types of parts are used to manufacture the first processing unit and the second processing unit.

[0010] Similarly, the fourth processing unit has a structure that is symmetrical to the structure of the third processing unit. Therefore, the structure of the fourth processing unit is similar to the structure of the third processing unit, but is not equal to the structure of the third processing unit. Therefore, the quality of the processing performed on the substrate is likely to vary between the third processing unit and the fourth processing unit. Furthermore, many types of parts are used to manufacture the third processing unit and the fourth processing unit. [Means for solving the problem]

[0011] The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a substrate processing apparatus capable of standardizing the structure of a processing unit.

[0012] The present inventor has made extensive research to solve the above problems. Therefore, the present inventor first considered a substrate processing apparatus 201 shown in FIG. 10. The substrate processing apparatus 201 includes an indexer section 202 and a processing block 203. The processing block 203 is disposed behind the indexer section 202. The processing block 203 includes a transport space 204, a substrate placement section 205, a transport mechanism 206, processing units 207A, 207B, 207C, 207D, and a liquid storage section 209. The processing units 207A-207D have a common structure. The processing units 207A and 207C are disposed on the right side of the transport space 204. The processing units 207B and 207D are disposed on the left side of the transport space 204. The liquid supply section 209 is disposed behind the transport space 204. The liquid supply section 209 is disposed behind the processing units 207A, 207B, 207C, and 207D.

[0013] The processing units 207A-207D include holders 208A-208D, respectively. The transport mechanism 206 is capable of translation in the front-rear direction X. The transport mechanism 206 accesses each of the holders 208A-208D.

[0014] However, the present inventors have found that the substrate processing apparatus 201 shown in Fig. 10 generates a new problem. Specifically, the new problem is that the moving distance of the transport mechanism 206 in the front-rear direction X is long. The holder 208B is located at the frontmost position among the holders 208A-208D. The holder 208C is located at the rearmost position among the holders 208A-208D. Fig. 10 shows the distance M. The distance M is the distance between the holder 208B and the holder 208C in the front-rear direction X. The distance M corresponds to the moving distance of the transport mechanism 206 in the front-rear direction X when the transport mechanism 206 transports the substrate to the first to fourth holders 208A-208D. The distance M is relatively long.

[0015] Furthermore, when the transport mechanism 206 accesses the holder 208B, the transport mechanism 206 may interfere with the substrate placement portion 205.

[0016] The present invention has been achieved through further intensive research based on these studies and findings, and has the following configuration: That is, the present invention is a substrate processing apparatus comprising an indexer section and a processing block disposed behind the indexer section and connected to the indexer section, the processing block comprising a transport space extending in a front-rear direction, a transport mechanism installed in the transport space and configured to be movable in parallel in the front-rear direction and transporting a substrate, a first processing unit disposed on a first side of the transport space for processing a substrate, a second processing unit disposed on a second side of the transport space for processing a substrate, and a first liquid storage section for storing a processing liquid distributed to the first processing unit and the second processing unit, the first processing unit comprising a first holding section for holding a substrate, and a first liquid supply section for supplying a processing liquid to the substrate held in the first holding section. the second processing unit comprises a second holding part that holds a substrate, and a second liquid supply part that supplies a processing liquid to the substrate held by the second holding part, the transport mechanism transports the substrate to the first holding part and the second holding part, the first holding part has a center that is located rearward of a center of the first processing unit in a planar view, the second holding part has a center that is located forward of a center of the second processing unit in a planar view, a front end of the second processing unit is disposed rearward of a front end of the first processing unit and forward of a rear end of the first processing unit, and the first liquid storage part is disposed on the second side of the transport space and adjacent to the front of the second processing unit.

[0017] The first processing unit is disposed on a first side of the transport space. The first processing unit includes a first holding part. The center of the first holding part is located rearward of the center of the first processing unit in a plan view. The second processing unit is disposed on a second side of the transport space. The second processing unit includes a second holding part. The center of the second holding part is located forward of the center of the second processing unit in a plan view. Therefore, two processing units having the same structure can be adopted as the first processing unit and the second processing unit. Therefore, it is possible to easily suppress variation in the quality of processing performed on the substrate between the first processing unit and the second processing unit.

[0018] The transport mechanism transports the substrate to the first holding part and the second holding part. The transport mechanism is configured to be able to move parallel to the front and rear directions. Therefore, the transport mechanism can suitably transport the substrate to the first holding part and the second holding part.

[0019] The front end of the second processing unit is disposed rearward of the front end of the first processing unit. The front end of the second processing unit is disposed forward of the rear end of the first processing unit. In this manner, the second processing unit is shifted rearward with respect to the first processing unit. Therefore, the second holding part is not disposed extremely forward. Thus, the movement distance of the transport mechanism in the front-rear direction is suitably reduced. Therefore, the transport mechanism can efficiently transport the substrate to the first holding part and the second holding part. As a result, the first processing unit and the second processing unit can efficiently process the substrate, respectively.

[0020] The first liquid storage section is disposed on the second side of the transport space. The first liquid storage section is adjacent to the front of the second processing unit. In this manner, the space in front of the second processing unit is effectively utilized. This makes it possible to prevent an increase in the length of the substrate processing apparatus in the front-rear direction.

[0021] As described above, according to the substrate processing apparatus of the present invention, the structure of the first processing unit and the structure of the second processing unit can be easily made common. As a result, the processing quality in the first processing unit and the processing quality in the second processing unit can be easily made uniform. Furthermore, the transport mechanism can efficiently transport substrates to the first processing unit and the second processing unit. As a result, the throughput of the substrate processing apparatus can be suitably improved. Furthermore, an increase in the footprint of the substrate processing apparatus can be suppressed.

[0022] In the above-mentioned substrate processing apparatus, it is preferable that the center of the second holding part is disposed forward of the center of the first holding part. The second processing unit does not shift excessively rearward relative to the first processing unit. This can prevent an increase in the length of the substrate processing apparatus in the front-rear direction.

[0023] In the above-described substrate processing apparatus, a front end of the first liquid storage portion is preferably disposed at a position equivalent to a front end of the first processing unit in the front-rear direction, thereby preventing an increase in the length of the substrate processing apparatus in the front-rear direction.

[0024] In the above-described substrate processing apparatus, it is preferable that the first processing unit is adjacent to the rear of the indexer section, and the first liquid storage section is adjacent to the rear of the indexer section, thereby preventing an increase in the length of the processing block in the front-rear direction.

[0025] In the above-mentioned substrate processing apparatus, it is preferable that the second processing unit has a structure equivalent to that of the first processing unit rotated 180 degrees around a vertical axis, so that the quality of substrate processing can be easily uniformed between the first processing unit and the second processing unit.

[0026] In the above-mentioned substrate processing apparatus, it is preferable that the apparatus further comprises a substrate placement section for placing a substrate to be transported between the indexer section and the transport mechanism, and at least a portion of the substrate placement section is installed in the transport space. The substrate processing apparatus comprises a substrate placement section. Therefore, the transport mechanism can easily receive a substrate from the indexer section. The transport mechanism can easily transfer a substrate to the indexer section. At least a portion of the substrate placement section is installed in the transport space. Therefore, the range of motion of the transport mechanism is limited to the rear of the substrate placement section. Even in this case, the transport mechanism can easily transport the substrate to the second holding section. This is because the second processing unit is shifted rearward relative to the first processing unit.

[0027] In the above-mentioned substrate processing apparatus, the substrate placement part is preferably disposed between the first processing unit and the first liquid storage part. In other words, the first processing unit, the substrate placement part, and the first liquid storage part are preferably arranged in this order in the width direction. Here, the width direction is a horizontal direction perpendicular to the front-rear direction. The substrate placement part does not prevent the transport mechanism from transporting the substrate to the second holding part.

[0028] The above-described substrate processing apparatus includes a third processing unit disposed on the first side of the transport space, adjacent to the rear of the first processing unit, and processing a substrate, and a fourth processing unit disposed on the second side of the transport space, adjacent to the rear of the second processing unit, and processing a substrate, the third processing unit including a third holder for holding a substrate, and a third liquid supply unit for supplying a processing liquid to the substrate held by the third holder, and the fourth processing unit including a fourth holder for holding a substrate, and a fourth liquid supply unit for supplying a processing liquid to the substrate held by the fourth holder. and a supply section, wherein the transport mechanism transports the substrate to the third holding section and the fourth holding section, the first liquid storage section stores the processing liquid to be distributed to the third processing unit and the fourth processing unit, the third holding section has a center located rearward of the center of the third processing unit in a planar view, the fourth holding section has a center located forward of the center of the fourth processing unit in a planar view, and a front end of the fourth processing unit is preferably positioned rearward of the front end of the third processing unit and forward of the rear end of the third processing unit.

[0029] The third processing unit is disposed on a first side of the transport space. The third processing unit includes a third holding part. The center of the third holding part is located rearward of the center of the third processing unit in a plan view. The fourth processing unit is disposed on a second side of the transport space. The fourth processing unit includes a fourth holding part. The center of the fourth holding part is located forward of the center of the fourth processing unit in a plan view. For this reason, four processing units having the same structure can be adopted as the first processing unit, the second processing unit, the third processing unit and the fourth processing unit. Therefore, it is possible to easily suppress variation in the quality of processing performed on the substrate between the first to fourth processing units.

[0030] The front end of the fourth processing unit is disposed rearward of the front end of the third processing unit. The front end of the fourth processing unit is disposed forward of the rear end of the third processing unit. In this manner, the fourth processing unit is shifted rearward with respect to the third processing unit. Therefore, the third holding unit is not disposed extremely rearward. Thus, the travel distance of the transport mechanism in the front-rear direction is suitably reduced. Therefore, the transport mechanism can efficiently transport the substrate to the first to fourth holding units. As a result, the first to fourth processing units can efficiently process the substrate, respectively.

[0031] In the above-mentioned substrate processing apparatus, it is preferable that the third processing unit has a structure identical to that of the first processing unit, and the fourth processing unit has a structure identical to that of the first processing unit rotated 180 degrees around a vertical axis, so that the quality of substrate processing can be easily uniformed among the first to fourth processing units.

[0032] In the above-mentioned substrate processing apparatus, a second liquid storage section is disposed on the first side of the transport space and stores the processing liquid to be distributed to the first processing unit, the second processing unit, the third processing unit, and the fourth processing unit, and the second liquid storage section is preferably disposed on the first side of the transport space and adjacent to the rear of the third processing unit. The second liquid storage section is disposed on the first side of the transport space. The second liquid storage section is adjacent to the rear of the third processing unit. In this way, the space behind the third processing unit is effectively utilized. This makes it possible to suppress an increase in the length of the substrate processing apparatus in the front-rear direction.

[0033] In the above-described substrate processing apparatus, it is preferable that a rear end of the second liquid storage portion is disposed at a position equivalent to a rear end of the fourth processing unit in the front-rear direction, thereby preventing an increase in the length of the substrate processing apparatus in the front-rear direction.

[0034] In the above-described substrate processing apparatus, it is preferable that the processing liquid stored in the second liquid storage section is different from the processing liquid stored in the first liquid storage section, and each of the first to fourth processing units can supply two types of processing liquid to the substrate.

[0035] In the above-mentioned substrate processing apparatus, it is preferable to include an upper space formed above the transfer space, the first processing unit, the second processing unit, the third processing unit, the fourth processing unit, the first liquid storage unit, and the second liquid storage unit, a first distributor provided in the upper space and distributing the processing liquid from the first liquid storage unit to the first processing unit, the second processing unit, the third processing unit, and the fourth processing unit, and a second distributor provided in the upper space and distributing the processing liquid from the second liquid storage unit to the first processing unit, the second processing unit, the third processing unit, and the fourth processing unit. The first distributor and the second distributor are provided in the upper space. This can suitably prevent the footprint of the substrate processing apparatus from increasing.

[0036] In the above-described substrate processing apparatus, it is preferable that the second distribution section is equal to the first distribution section rotated 180 degrees in a plan view, so that the flow path lengths of the first distribution section and the second distribution section can be easily made uniform.

[0037] In the above-mentioned substrate processing apparatus, the apparatus includes a first connection box arranged above the first processing unit, a second connection box arranged above the second processing unit, a third connection box arranged above the third processing unit, and a fourth connection box arranged above the fourth processing unit, and it is preferable that the first distribution section extends from the first liquid storage section to the first connection box, the second connection box, the third connection box, and the fourth connection box, and the second distribution section extends from the second liquid storage section to the first connection box, the second connection box, the third connection box, and the fourth connection box. Both the first distribution section and the second distribution section extend to the first connection box. Similarly, both the first distribution section and the second distribution section extend to the second to fourth connection boxes. Therefore, the flow path length of the first distribution section and the flow path length of the second distribution section are easily made uniform.

[0038] In the above-mentioned substrate processing apparatus, it is preferable that the first connection box is disposed forward of the first holding part in the front-rear direction, the second connection box is disposed rearward of the second holding part in the front-rear direction, the third connection box is disposed forward of the third holding part in the front-rear direction, and the fourth connection box is disposed rearward of the fourth holding part in the front-rear direction. The difference between the flow path length from the first liquid storage part to the first connection box and the flow path length from the first liquid storage part to the second connection box can be suitably reduced. Similarly, the difference between the flow path length from the first liquid storage part to the third connection box and the flow path length from the first liquid storage part to the fourth connection box can be suitably reduced. The difference between the flow path length from the second liquid storage part to the first connection box and the flow path length from the second liquid storage part to the second connection box can be suitably reduced. The difference between the flow path length from the second liquid storage part to the third connection box and the flow path length from the second liquid storage part to the fourth connection box can be suitably reduced.

[0039] In the above-mentioned substrate processing apparatus, it is preferable to include a first joint housed in the first connection box and connecting the first distribution unit and the first liquid supply unit, a second joint housed in the second connection box and connecting the first distribution unit and the second liquid supply unit, a third joint housed in the third connection box and connecting the first distribution unit and the third liquid supply unit, and a fourth joint housed in the fourth connection box and connecting the first distribution unit and the fourth liquid supply unit. The first distribution unit and the first to fourth liquid supply units can be conveniently attached and detached in the first to fourth connection boxes.

[0040] In the above-mentioned substrate processing apparatus, it is preferable that the substrate processing apparatus further includes a substantially flat footboard installed in the upper space, where a user of the substrate processing apparatus can stand on the footboard, thereby enabling the user to perform, for example, maintenance work on the footboard.

[0041] In the above-mentioned substrate processing apparatus, the footplate is preferably disposed near the first connection box, the second connection box, the third connection box, and the fourth liquid supply unit. A user can easily access the first to fourth connection boxes. A user can conveniently attach and detach the first to second distribution unit and the first to fourth liquid supply unit.

[0042] In the above-described substrate processing apparatus, it is preferable that the footplate passes between the second connection box and the third connection box and extends from the first connection box to the fourth liquid supply unit, so that a user can easily move between the first to fourth connection boxes.

[0043] In the above-mentioned substrate processing apparatus, the foot plate is preferably disposed above at least a portion of the first distributor, and the foot plate provides suitable protection for the first distributor. Effect of the Invention

[0044] According to the substrate processing apparatus of the present invention, the first processing unit and the second processing unit can easily have a common structure. [Brief description of the drawings]

[0045] [Figure 1] 1 is a plan view showing an inside of a substrate processing apparatus according to an embodiment; [Diagram 2] 2 is a left side view showing a configuration of a central part of the substrate processing apparatus in a width direction. FIG. [Diagram 3] FIG. [Figure 4] 2 is a right side view showing a configuration of a right portion of the substrate processing apparatus. FIG. [Diagram 5] 2 is a left side view showing a configuration of a left portion of the substrate processing apparatus. FIG. [Figure 6] FIG. 2 is a plan view of the substrate processing apparatus. [Figure 7] FIG. 2 is a plan view of the substrate processing apparatus. [Figure 8] FIG. 2 is a side view of the processing unit. [Figure 9] FIG. 13 is a right side view of the substrate processing apparatus according to a modified embodiment. [Figure 10] FIG. 11 is a plan view of a substrate processing apparatus according to a comparative example. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0046] Hereinafter, a substrate processing apparatus according to the present invention will be described with reference to the drawings.

[0047] 1. Overview of substrate processing equipment 1 is a plan view showing the inside of a substrate processing apparatus 1 according to an embodiment of the present invention, in which a substrate (eg, a semiconductor wafer) W is processed.

[0048] The substrate W is, for example, a semiconductor wafer, a substrate for a liquid crystal display, a substrate for an organic EL (Electroluminescence), a substrate for an FPD (Flat Panel Display), a substrate for an optical display, a substrate for a magnetic disk, a substrate for an optical disk, a substrate for a magneto-optical disk, a substrate for a photomask, or a substrate for a solar cell. The substrate W has a thin flat plate shape. The substrate W has a substantially circular shape in a plan view.

[0049] The substrate processing apparatus 1 includes an indexer section 3 and a processing block 11. The processing block 11 is connected to the indexer section 3. The indexer section 3 supplies a substrate W to the processing block 11. The processing block 11 processes the substrate W. The indexer section 3 recovers the substrate W from the processing block 11.

[0050] For convenience, in this specification, the direction in which the indexer unit 3 and the processing block 11 are aligned is referred to as the "front-rear direction X." The front-rear direction X is horizontal. Within the front-rear direction X, the direction from the processing block 11 toward the indexer unit 3 is referred to as the "front." The direction opposite to the front is referred to as the "rear."

[0051] The processing block 11 is disposed behind the indexer unit 3 .

[0052] In this specification, the horizontal direction perpendicular to the front-to-rear direction X is called the "width direction Y." One direction of the width direction Y is called the "right direction" as appropriate. The direction opposite to the right direction is called the "left direction." The direction perpendicular to the horizontal direction is called the "vertical direction Z." In each figure, for reference, front, back, right, left, top, and bottom are indicated as appropriate.

[0053] The right side is an example of the first side in the present invention, and the left side is an example of the second side in the present invention.

[0054] The indexer unit 3 includes a plurality of (e.g., four) carrier placement units 4. The carrier placement units 4 are arranged in the width direction Y. Each carrier placement unit 4 places one carrier C thereon. The carrier C stores a plurality of substrates W. The carrier C is, for example, a FOUP (front opening unified pod).

[0055] The indexer unit 3 includes a transport space 5. The transport space 5 is disposed behind the carrier placement unit 4.

[0056] The indexer unit 3 includes a transport mechanism 6. The transport mechanism 6 is installed in the transport space 5. The transport mechanism 6 is disposed behind the carrier platform 4. The transport mechanism 6 transports substrates W. The transport mechanism 6 is accessible to the carriers C placed on the carrier platform 4.

[0057] The structure of the transport mechanism 6 will be described. The transport mechanism 6 includes a hand 7 and a hand driving unit 8. The hand 7 supports one substrate W in a horizontal position. The hand driving unit 8 is connected to the hand 7. The hand driving unit 8 moves the hand 7.

[0058] The structure of the hand driving unit 8 is illustrated. The hand driving unit 8 includes a first driving unit 8a and a second driving unit 8b. The first driving unit 8a itself is unable to move in the horizontal direction. The first driving unit 8a supports the second driving unit 8b. The first driving unit 8a moves the second driving unit 8b in the vertical direction Z. The first driving unit 8a further rotates the second driving unit 8b around a rotation axis parallel to the vertical direction Z. The second driving unit 8b supports the hand 7. The second driving unit 8b moves the hand 7 back and forth in the horizontal direction relative to the first driving unit 8a. The second driving unit 8b is composed of, for example, a multi-joint arm.

[0059] According to the above-mentioned hand driving unit 8, the hand 7 is movable in the vertical direction Z. The hand 7 is movable in the horizontal direction. The hand 7 is rotatable within a horizontal plane.

[0060] The processing block 11 includes a transport space 12A. The transport space 12A extends in the front-rear direction X. A front portion of the transport space 12A is connected to the transport space 5 of the indexer unit 3. The transport space 12A is disposed in the center of the processing block 11 in the width direction Y.

[0061] The processing block 11 includes a transport mechanism 13A. The transport mechanism 13A is installed in the transport space 12A. The transport mechanism 13A is capable of translation in the front-rear direction X. The transport mechanism 13A transports the substrate W.

[0062] The transport mechanism 13A includes a hand 14 and a hand driving unit 15. The hand 14 supports one substrate W in a horizontal position. The hand driving unit 15 is connected to the hand 14. The hand driving unit 15 moves the hand 14. The hand driving unit 15 moves the hand 14 in the front-rear direction X, the width direction Y, and the vertical direction Z.

[0063] The structure of the hand driving unit 15 is illustrated. The hand driving unit 15 includes, for example, two support columns 15a, a vertical moving section 15b, a horizontal moving section 15c, a rotating section 15d, and an advancing / retreating moving section 15e. The support columns 15a are fixedly installed. The support columns 15a are disposed on the sides of the transport space 12A. The two support columns 15a are aligned in the front-rear direction X. Each support column 15a extends in the vertical direction Z. Each support column 15a supports the vertical moving section 15b. The vertical moving section 15b extends in the front-rear direction X between the two support columns 15a. The vertical moving section 15b moves in parallel with the support columns 15a in the vertical direction Z. The vertical moving section 15b supports the horizontal moving section 15c. The horizontal moving section 15c moves in parallel with the vertical moving section 15b in the front-rear direction X. The horizontal moving section 15c supports the rotating section 15d. The rotating unit 15d rotates relative to the horizontal moving unit 15c. The rotating unit 15d rotates around a rotation axis parallel to the vertical direction Z. The rotating unit 15d supports the advancing and retreating moving unit 15e. The advancing and retreating moving unit 15e supports the hand 14. The advancing and retreating moving unit 15e moves the hand 14 forward and backward relative to the rotating unit 15d. The advancing and retreating moving unit 15e moves the hand 14 back and forth in one horizontal direction determined by the orientation of the rotating unit 15d.

[0064] According to the above-described hand driving unit 15, the hand 14 can translate in the vertical direction Z. The hand 14 can translate in the front-rear direction X. The hand 14 can rotate in a horizontal plane. The hand 14 can move toward and away from the rotating unit 15d.

[0065] The substrate processing apparatus 1 includes a substrate placement part 16A. The substrate placement part 16A places a substrate W to be transported between the indexer part 3 and the transport mechanism 13A. Specifically, the substrate placement part 16A places a substrate W to be transported between the transport mechanism 6 and the transport mechanism 13A. The transport mechanism 6 is accessible to the substrate placement part 16A. The transport mechanism 13A is also accessible to the substrate placement part 16A.

[0066] The substrate placement portion 16A is fixedly installed.

[0067] The substrate platform 16A is disposed behind the transport mechanism 6. The substrate platform 16A is disposed in front of the transport mechanism 13A. The range of motion of the transport mechanism 13A is limited to the rear of the substrate platform 16A.

[0068] At least a part of the substrate platform 16A is disposed in the transport space 12A. For example, the entire substrate platform 16A is disposed in the transport space 12A.

[0069] The processing block 11 includes a first processing unit 21A1, a second processing unit 21B1, a third processing unit 21C1, and a fourth processing unit 21D1. The first processing unit 21A1 and the third processing unit 21C1 are disposed on the right side of the transport space 12A. The third processing unit 21C1 is adjacent to the rear of the first processing unit 21A1. The second processing unit 21B1 and the fourth processing unit 21D1 are disposed on the left side of the transport space 12A. The fourth processing unit 21D1 is adjacent to the rear of the second processing unit 21B1. The first to fourth processing units 21A1-21D1 each perform processing on the substrate W.

[0070] The second processing unit 21B1 is shifted rearward relative to the first processing unit 21A1. Specifically, the first processing unit 21A1 has a front end 22A and a rear end 23A. The second processing unit 21B1 has a front end 22B and a rear end 23B. In the front-rear direction X, the front end 22B is disposed rearward of the front end 22A. In the front-rear direction X, the front end 22B is disposed forward of the rear end 23A. In the front-rear direction X, the rear end 23B is disposed rearward of the rear end 23A.

[0071] The fourth processing unit 21D1 is shifted rearward relative to the third processing unit 21C1. Specifically, the third processing unit 21C1 has a front end 22C and a rear end 23C. The fourth processing unit 21D1 has a front end 22D and a rear end 23D. In the front-rear direction X, the front end 22D is disposed rearward of the front end 22C. In the front-rear direction X, the front end 22D is disposed forward of the rear end 23C. In the front-rear direction X, the rear end 23D is disposed rearward of the rear end 23C.

[0072] The first processing unit 21A1 is adjacent to the rear of the indexer section 3.

[0073] At least a part of the substrate platform 16A is disposed rearward of the front end 22A of the first processing unit 21A1 in the front-rear direction X. For example, the entire substrate platform 16A is disposed rearward of the front end 22A of the first processing unit 21A1 in the front-rear direction X.

[0074] At least a part of the second processing unit 21B1 is disposed rearward of the substrate platform 16A in the front-rear direction X. For example, the entirety of the second processing unit 21B1 is disposed rearward of the substrate platform 16A in the front-rear direction X.

[0075] The first processing unit 21A1 includes a first holding part 25A and a first liquid supply part 27A. The first holding part 25A holds the substrate W. The first liquid supply part 27A supplies a processing liquid to the substrate W held in the first holding part 25A.

[0076] Similarly, the second processing unit 21B1 includes a second holding part 25B and a second liquid supply part 27B. The second holding part 25B holds the substrate W. The second liquid supply part 27B supplies a processing liquid to the substrate W held in the second holding part 25B.

[0077] The third processing unit 21C1 includes a third holding part 25C and a third liquid supply part 27C. The third holding part 25C holds the substrate W. The third liquid supply part 27C supplies a processing liquid to the substrate W held in the third holding part 25C.

[0078] The fourth processing unit 21D1 includes a fourth holding part 25D and a fourth liquid supply part 27D. The fourth holding part 25D holds the substrate W. The fourth liquid supply part 27D supplies a processing liquid to the substrate W held in the fourth holding part 25D.

[0079] The first liquid supply unit 27A does not supply the processing liquid to the substrate W held in the second to fourth holding units 25B to 25D. The first liquid supply unit 27A supplies the processing liquid only to the substrate W held in the first holding unit 25A. The second to fourth liquid supply units 27B to 27D are similar to the first liquid supply unit 27A.

[0080] The transport mechanism 13A transports the substrate W to the first to fourth holding parts 25A to 25D.

[0081] The first processing unit 21A1 has a first transfer port 28A. For convenience, FIG. 1 shows the first transfer port 28A with a dashed line. The first transfer port 28A faces the transfer space 12A. The substrate W can pass through the first transfer port 28A. When the transfer mechanism 13A transfers the substrate W to the first holder 25A, the transfer mechanism 13A causes the substrate W to enter the first transfer port 28A. Similarly, the second, third, and fourth processing units 21B1, 21C1, and 21D1 have second, third, and fourth transfer ports 28B, 28C, and 28D, respectively.

[0082] The first holding portion 25A is close to the rear end 23A of the first processing unit 21A1. Specifically, the first processing unit 21A1 has a center 24A in a plan view. The first holding portion 25A has a center 26A in a plan view. The center 26A is located rearward of the center 24A in a plan view.

[0083] The second holding portion 25B is close to the front end 22B of the second processing unit 21B1. Specifically, the second processing unit 21B1 has a center 24B in a plan view. The second holding portion 25B has a center 26B in a plan view. The center 26B is located forward of the center 24B in a plan view.

[0084] The third holding portion 25C is close to the rear end 23C of the third processing unit 21C1. Specifically, the third processing unit 21C1 has a center 24C in a plan view. The third holding portion 25C has a center 26C in a plan view. The center 26C is located rearward of the center 24C in a plan view.

[0085] The fourth holding portion 25D is close to the front end 22D of the fourth processing unit 21D1. Specifically, the fourth processing unit 21D1 has a center 24D in a plan view. The fourth holding portion 25D has a center 26D in a plan view. The center 26D is located forward of the center 24D in a plan view.

[0086] Here, a center 26B of the second holding portion 25B is disposed forward of a center 26A of the first holding portion 25A in the front-rear direction X. A center 26D of the fourth holding portion 25D is disposed forward of a center 26C of the third holding portion 25C in the front-rear direction X.

[0087] The second holding portion 25B is disposed rearward of the substrate mounting portion 16A in the front-rear direction X. Specifically, the entire second holding portion 25B is disposed rearward of the substrate mounting portion 16A in the front-rear direction X. The first holding portion 25A is also disposed rearward of the substrate mounting portion 16A in the front-rear direction X.

[0088] 1 shows the distance L. The distance L is the distance in the front-rear direction X between the center 24B and the center 26C. The distance L corresponds to the movement distance of the transport mechanism 13A in the front-rear direction X when the transport mechanism 13A transports the substrate W to the first to fourth holding parts 25A-25D.

[0089] The second processing unit 21B1 has a structure equivalent to that of the first processing unit 21A1 rotated 180 degrees around the vertical axis. Therefore, the structure of the second processing unit 21B1 is common to that of the first processing unit 21A1. Specifically, the relative positions of the second holding part 25B, the second liquid supply part 27B, and the second transfer port 28B are the same as the relative positions of the first holding part 25A, the first liquid supply part 27A, and the first transfer port 28A.

[0090] The third processing unit 21C1 has the same structure as the first processing unit 21A1. That is, the structure of the third processing unit 21C1 is common to the structure of the first processing unit 21A1. Specifically, the relative positions of the third holding part 25C, the third liquid supply part 27C, and the third transfer port 28C are the same as the relative positions of the first holding part 25A, the first liquid supply part 27A, and the first transfer port 28A.

[0091] The fourth processing unit 21D1 has a structure equivalent to that of the first processing unit 21A1 rotated 180 degrees around the vertical axis. Therefore, the structure of the fourth processing unit 21D1 is common to that of the first processing unit 21A1. Specifically, the relative positions of the fourth holding unit 25D, the fourth liquid supply unit 27D, and the fourth transfer port 28D are the same as the relative positions of the first holding unit 25A, the first liquid supply unit 27A, and the first transfer port 28A.

[0092] The processing block 11 includes a first liquid storage section 31. The first liquid storage section 31 is disposed to the left of the transport space 12A. The first liquid storage section 31 is disposed adjacent to the front of the second processing unit 21B1. The first liquid storage section 31 stores the processing liquid to be distributed to the first to fourth processing units 21A1-21D1.

[0093] The first liquid storage section 31 has a front end 31f. In the front-rear direction Y, the front end 31 is disposed at a position equivalent to the front end 22A of the first processing unit 21A1.

[0094] The first liquid storage section 31 is adjacent to the rear of the indexer section 3.

[0095] The substrate placement portion 16A is disposed between the first processing unit 21A1 and the first liquid storage portion 31. The first processing unit 21A1, the substrate placement portion 16A, and the first liquid storage portion 31 are arranged in the width direction Y in this order.

[0096] The processing block 11 includes a second liquid storage section 32. The second liquid storage section 32 is disposed to the right of the transport space 12A. The second liquid storage section 32 is disposed adjacent to the rear of the third processing unit 21C1. The second liquid storage section 32 stores the processing liquid to be distributed to the first to fourth processing units 21A1-21D1.

[0097] The second liquid storage section 32 has a rear end 32r. In the front-rear direction Y, the rear end 32r is disposed at a position equivalent to the rear end 23D of the fourth processing unit 21D1.

[0098] The treatment liquid stored in the second liquid storage section 32 is a treatment liquid different in type from the treatment liquid stored in the first liquid storage section 31 .

[0099] Specifically, the treatment liquid stored in the first liquid storage unit 31 is a first treatment liquid. The first treatment liquid is classified as, for example, an acid liquid. The first treatment liquid includes, for example, at least one of hydrofluoric acid (hydrofluoric acid), hydrochloric acid-hydrogen peroxide solution, sulfuric acid, sulfuric acid-hydrogen peroxide solution, hydrofluoric nitric acid (a mixture of hydrofluoric acid and nitric acid), and hydrochloric acid.

[0100] The treatment liquid stored in the second liquid storage section 32 is a second treatment liquid. The second treatment liquid is classified as, for example, an organic liquid. The organic liquid includes at least one of isopropyl alcohol (IPA), methanol, ethanol, hydrofluoroether (HFE), and acetone.

[0101] 2. Structure of Processing Block 11 Fig. 2 is a left side view showing the configuration of the central part of the substrate processing apparatus in the width direction. Fig. 3 is a front view of the processing block. The processing block 11 includes a transport space 12B in addition to the transport space 12A. The transport space 12B is disposed below the transport space 12A. The transport space 12B is also connected to the transport space 5 of the indexer unit 3. The transport space 12B is disposed at the same position as the transport space 12A in a plan view.

[0102] The processing block 11 includes one partition 17. The partition 17 is disposed below the transport space 12A and above the transport space 12B. The partition 17 has a horizontal plate shape. The partition 17 separates the transport space 12A from the transport space 12B.

[0103] The processing block 11 includes a transport mechanism 13B in addition to the transport mechanism 13A. The transport mechanism 13B is installed in the transport space 12B. The transport mechanism 13B is installed below the transport mechanism 13A. The transport mechanism 13B is capable of translation in the front-rear direction X. The transport mechanism 13B transports the substrate W. The transport mechanism 13B has the same structure as the transport mechanism 13A. Specifically, the transport mechanism 13B also includes a hand 14 and a hand drive unit 15.

[0104] The processing block 11 includes a substrate placement part 16B in addition to the substrate placement part 16A. The substrate placement part 16B places a substrate W to be transported between the indexer unit 3 and the transport mechanism 13B. The transport mechanism 6 and the transport mechanism 13B are each accessible to the substrate placement part 16B. The substrate placement part 16B is disposed below the substrate placement part 16A. The substrate placement part 16B is disposed at the same position as the substrate placement part 16A in a plan view.

[0105] Please refer to Figures 3 and 4. Figure 4 is a right side view showing the configuration of the right part of the substrate processing apparatus 1. The processing block 11 includes, in addition to the first processing unit 21A1, five first processing units 21A2-21A6. Each of the first processing units 21A2-21A6 has the same structure as the first processing unit 21A1.

[0106] The first processing units 21A1-21A6 are arranged in a row in the vertical direction Z. The first processing units 21A1-21A6 are stacked. The first processing units 21A1-21A3 are arranged at the same height as the transport space 12A. The transport mechanism 13A transports the substrate W to the first processing units 21A1-21A3. The first processing units 21A4-21A6 are arranged below the first processing units 21A1-21A3. The first processing units 21A4-21A6 are arranged at the same height as the transport space 12B. The transport mechanism 13B transports the substrate W to the first processing units 21A4-21A6.

[0107] 4, the processing block 11 includes, in addition to the third processing unit 21C1, five third processing units 21C2-21C6. Each of the third processing units 21C2-21C6 has the same structure as the first processing unit 21A1.

[0108] The third processing units 21C1-21C6 are aligned in a row in the vertical direction Z. The third processing units 21C1-21C6 are stacked. The third processing units 21C4-21C6 are disposed below the third processing units 21C1-21C3.

[0109] 5 is a left side view showing the configuration of the left part of the substrate processing apparatus 1. The processing block 11 includes, in addition to the second processing unit 21B1, five second processing units 21B2-21B6. Each of the second processing units 21B2-21B6 has a structure common to the first processing unit 21A1.

[0110] The second processing units 21B1-21B6 are aligned in a row in the vertical direction Z. The second processing units 21B1-21B6 are stacked. The second processing units 21B4-21B6 are disposed below the second processing units 21B1-21B3.

[0111] Similarly, the processing block 11 includes, in addition to the fourth processing unit 21D1, five fourth processing units 21D2-21D6. Each of the fourth processing units 21D2-21D6 has a common structure with the first processing unit 21A1.

[0112] The fourth processing units 21D1-21D6 are aligned in a row in the vertical direction Z. The fourth processing units 21D1-21D6 are stacked. The fourth processing units 21D4-21D6 are disposed below the fourth processing units 21D1-21D3.

[0113] The transport mechanism 13A transports the substrate W to the second processing units 21B1-21B3, the third processing units 21C1-21C3, and the fourth processing units 21D1-21D3. The transport mechanism 13B transports the substrate W to the second processing units 21B4-21B6, the third processing units 21C4-21C6, and the fourth processing units 21D4-21D6.

[0114] When the first processing units 21A1-21A6 are not distinguished, they are called first processing units 21A. When the second processing units 21B1-21B6 are not distinguished, they are called second processing units 21B. When the third processing units 21C1-21C6 are not distinguished, they are called third processing units 21C. When the fourth processing units 21D1-21D6 are not distinguished, they are called fourth processing units 21D.

[0115] The first liquid storage unit 31 includes a first tank 33 and a first pump 34. The first tank 33 is a container that stores the processing liquid. The first tank 33 stores the processing liquid (specifically, the first processing liquid). The first pump 34 is connected in communication with the first tank 33. The first pump 34 pumps the processing liquid.

[0116] The first liquid storage section 31 includes a cabinet 35. The cabinet 35 defines a storage space 35a therein. The first tank 33 and the first pump 34 are installed in the storage space 35a. The cabinet 35 separates the storage space 35a from the transfer space 12. The cabinet 35 separates the storage space 35a from the second processing unit 21B.

[0117] Please refer to Fig. 4. The second liquid storage unit 32 includes a second tank 36 and a second pump 37. The second tank 36 is a container that stores the processing liquid. The second tank 36 stores the processing liquid (specifically, the second processing liquid). The second pump 37 is connected in communication with the second tank 36. The second pump 37 pumps the processing liquid.

[0118] The second liquid storage section 32 includes a cabinet 38. The cabinet 38 defines a storage space 38a therein. The second tank 36 and the second pump 37 are installed in the storage space 38a. The cabinet 38 separates the storage space 38a from the transfer space 12. The cabinet 38 separates the storage space 38a from the third processing unit 21C.

[0119] 2-5, the substrate processing apparatus 1 includes an upper space 39. The upper space 39 is formed above the transfer space 12, the first processing unit 21A, the second processing unit 21B, the third processing unit 21C, the fourth processing unit 21D, the first liquid storage section 31, and the second liquid storage section 32.

[0120] The substrate processing apparatus 1 includes a partition wall 40. The partition wall 40 has a horizontal plate shape. The partition wall 40 is disposed above the transport space 12, the first to fourth processing units 21A-21D, the first liquid storage section 31, and the second liquid storage section 32. The partition wall 40 is disposed below the upper space 39. The partition wall 40 separates the upper space 39 from the transport space 12. Similarly, the partition wall 40 separates the upper space 39 from the first to fourth processing units 21A-21D. The partition wall 40 separates the upper space 39 from the first to second liquid storage sections 31-32.

[0121] Please refer to Figs. 4-6. Fig. 6 is a plan view of the substrate processing apparatus 1. Fig. 6 shows the upper space 39. The substrate processing apparatus 1 includes a first distribution section 41. The first distribution section 41 is provided in the upper space 39. The first distribution section 41 distributes the processing liquid from the first liquid storage section 31 to the first processing unit 21A, the second processing unit 21B, the third processing unit 21C, and the fourth processing unit 21D.

[0122] The first distribution section 41 extends in a substantially horizontal direction. The first distribution section 41 extends rearward from the first liquid storage section 31.

[0123] Specifically, the first distribution unit 41 is connected in communication with the first pump 34. The first distribution unit 41 is connected in communication with the first liquid supply unit 27A, the second liquid supply unit 27B, the third liquid supply unit 27C, and the fourth liquid supply unit 27D.

[0124] The substrate processing apparatus 1 includes a second distribution section 42. The second distribution section 42 is provided in the upper space 39. The second distribution section 42 distributes the processing liquid from the second liquid storage section 32 to the first processing unit 21A, the second processing unit 21B, the third processing unit 21C, and the fourth processing unit 21D.

[0125] The second distribution section 42 extends in a substantially horizontal direction. The second distribution section 42 extends forward from the second liquid storage section 32.

[0126] Specifically, the second distribution unit 42 is connected in communication with the second pump 37. The second distribution unit 42 is connected in communication with the first liquid supply unit 27A, the second liquid supply unit 27B, the third liquid supply unit 27C, and the fourth liquid supply unit 27D.

[0127] Please refer to Fig. 6. In a plan view, the second distribution section 42 is equivalent to the first distribution section 41 rotated 180 degrees. In other words, the second distribution section 42 has a structure equivalent to the first distribution section 41 rotated 180 degrees around a vertical axis.

[0128] Specifically, the first distributor 41 includes a first pipe 43A, a second pipe 43B, a third pipe 43C, and a fourth pipe 43D. The first pipe 43A communicates between the first liquid storage section 31 and the first processing unit 21A. The second pipe 43B communicates between the first liquid storage section 31 and the second processing unit 21B. The third pipe 43C communicates between the first liquid storage section 31 and the third processing unit 21C. The fourth pipe 43D communicates between the first liquid storage section 31 and the fourth processing unit 21D.

[0129] The second distribution section 42 includes a fifth pipe 44A, a sixth pipe 44B, a seventh pipe 44C, and an eighth pipe 44D. The fifth pipe 44A communicates between the second liquid storage section 32 and the first processing unit 21A. The sixth pipe 44B communicates between the second liquid storage section 32 and the second processing unit 21B. The seventh pipe 44C communicates between the second liquid storage section 32 and the third processing unit 21C. The eighth pipe 44D communicates between the second liquid storage section 32 and the fourth processing unit 21D.

[0130] Here, the eighth pipe 44D is equivalent to the first pipe 43A rotated 180 degrees in a plan view. The seventh pipe 44C is equivalent to the second pipe 43B rotated 180 degrees in a plan view. The sixth pipe 44B is equivalent to the third pipe 43C rotated 180 degrees in a plan view. The fifth pipe 44A is equivalent to the fourth pipe 43D rotated 180 degrees in a plan view.

[0131] The length of the first pipe 43A in the width direction Y is greater than the length of the second pipe 43B in the width direction Y. However, the length of the first pipe 43A in the front-rear direction X is less than the length of the second pipe 43B in the front-rear direction X. Therefore, the difference between the length of the first pipe 43A and the length of the second pipe 43B is relatively small.

[0132] The length of the third pipe 43C in the width direction Y is greater than the length of the fourth pipe 43D in the width direction Y, but the length of the third pipe 43C in the front-rear direction X is smaller than the length of the fourth pipe 43D in the front-rear direction X. Therefore, the difference between the lengths of the third pipe 43C and the fourth pipe 43D is relatively small.

[0133] The length of the fifth pipe 44A in the width direction Y is smaller than the length of the sixth pipe 44B in the width direction Y. However, the length of the fifth pipe 44A in the front-rear direction X is larger than the length of the sixth pipe 44B in the front-rear direction X. Therefore, the difference between the length of the fifth pipe 44A and the length of the sixth pipe 44B is relatively small.

[0134] The length of the seventh pipe 44C in the width direction Y is smaller than the length of the eighth pipe 44D in the width direction Y. However, the length of the seventh pipe 44C in the front-rear direction X is larger than the length of the eighth pipe 44D in the front-rear direction X. Therefore, the difference between the length of the seventh pipe 44C and the length of the eighth pipe 44D is relatively small.

[0135] The substrate processing apparatus 1 includes a first connection box 46A, a second connection box 46B, a third connection box 46C, and a fourth connection box 46D. The first connection box 46A, the third connection box 46C, and the second liquid storage section 32 are arranged in this order in the front-rear direction X. The first liquid storage section 31, the second connection box 46B, and the fourth connection box 46D are arranged in this order in the front-rear direction X. The first connection box 46A and the first liquid storage section 31 are arranged in the width direction Y. The second connection box 46B and the third connection box 46C are arranged in the width direction Y. The fourth connection box 46D and the second liquid storage section 32 are arranged in the width direction Y.

[0136] The first distribution section 41 extends from the first liquid storage section 31 to the first connection box 46A, the second connection box 46B, the third connection box 46C, and the fourth connection box 46D. Specifically, the first pipe 43A extends from the first liquid storage section 31 to the first connection box 46A. The second pipe 43B extends from the first liquid storage section 31 to the second connection box 46B. The third pipe 43C extends from the first liquid storage section 31 to the third connection box 46C. The fourth pipe 43D extends from the first liquid storage section 31 to the fourth connection box 46D.

[0137] The second distribution section 42 extends from the second liquid storage section 32 to the first connection box 46A, the second connection box 46B, the third connection box 46C, and the fourth connection box 46D. Specifically, the fifth pipe 44A extends from the second liquid storage section 32 to the first connection box 46A. The sixth pipe 44B extends from the second liquid storage section 32 to the second connection box 46B. The seventh pipe 44C extends from the second liquid storage section 32 to the third connection box 46C. The eighth pipe 44D extends from the second liquid storage section 32 to the fourth connection box 46D.

[0138] Please refer to Fig. 4. The first connection box 46A and the third connection box 46C are each disposed in the upper space 39. The first connection box 46A and the third connection box 46C are disposed at approximately the same height position.

[0139] The first connection box 46A is disposed above the first processing unit 21A. In the front-rear direction X, the first connection box 46A is disposed forward of the first holding portion 25A.

[0140] The third connection box 46C is disposed above the third processing unit 21C. In the front-rear direction X, the third connection box 46C is disposed forward of the third holding portion 25C.

[0141] 5, the second connection box 46B and the fourth connection box 46D are each disposed in the upper space 39. The second connection box 46B and the fourth connection box 46D are disposed at approximately the same height position.

[0142] The second connection box 46B is disposed above the second processing unit 21B. In the front-rear direction X, the second connection box 46B is disposed forward of the second holding portion 25B.

[0143] The fourth connection box 46D is disposed above the fourth processing unit 21D. In the front-rear direction X, the fourth connection box 46D is disposed forward of the fourth holding portion 25D.

[0144] 3, the first connection box 46A and the second connection box 46B are disposed at approximately the same height, and therefore the first to fourth connection boxes 46A to 46D are disposed at approximately the same height.

[0145] 4, the first distribution unit 41 and the second distribution unit 42 are each connected to the first liquid supply unit 27A in a first connection box 46A. The first distribution unit 41 and the second distribution unit 42 are each connected to the third liquid supply unit 27C in a third connection box 46C.

[0146] The substrate processing apparatus 1 includes a first joint 47A and a fifth joint 48A. The first joint 47A is accommodated in a first connection box 46A. The first joint 47A connects the first distribution unit 41 (specifically, the first pipe 43A) and the first liquid supply unit 27A. The fifth joint 48A is accommodated in the first connection box 46A. The fifth joint 48A connects the second distribution unit 42 (specifically, the fifth pipe 44A) and the first liquid supply unit 27A.

[0147] The substrate processing apparatus 1 includes a third joint 47C and a seventh joint 48C. The third joint 47C is accommodated in the third connection box 46C. The third joint 47C connects the first distribution unit 41 (specifically, the third pipe 43C) and the third liquid supply unit 27C. The seventh joint 48C is accommodated in the third connection box 46C. The seventh joint 48C connects the second distribution unit 42 (specifically, the seventh pipe 44C) and the third liquid supply unit 27C.

[0148] 5, the first distribution unit 41 and the second distribution unit 42 are each connected to the second liquid supply unit 27B in the second connection box 46B. The first distribution unit 41 and the second distribution unit 42 are each connected to the fourth liquid supply unit 27B in the fourth connection box 46D.

[0149] The substrate processing apparatus 1 includes a second joint 47B and a sixth joint 48B. The second joint 47B is accommodated in the second connection box 46B. The second joint 47B connects the first distribution unit 41 (specifically, the second pipe 43B) and the second liquid supply unit 27B. The sixth joint 48B is accommodated in the second connection box 46B. The sixth joint 48B connects the second distribution unit 42 (specifically, the sixth pipe 44B) and the second liquid supply unit 27B.

[0150] The substrate processing apparatus 1 includes a fourth joint 47D and an eighth joint 48D. The fourth joint 47D is accommodated in a fourth connection box 46D. The fourth joint 47D connects the first distribution unit 41 (specifically, the fourth pipe 43D) and the fourth liquid supply unit 27D. The eighth joint 48D is accommodated in the fourth connection box 46D. The eighth joint 48D connects the second distribution unit 42 (specifically, the eighth pipe 44D) and the fourth liquid supply unit 27D.

[0151] 3 and 6. The substrate processing apparatus 1 further includes exhaust pipes 53A, 53B, 54A, 54B, 55A, and 55B. The exhaust pipes 53A, 53B, 54A, 54B, 55A, and 55B are disposed in the upper space 39. The exhaust pipes 53A, 54A, and 55A exhaust gases from the first processing unit 21A and the third processing unit 21C, respectively. The exhaust pipes 53B, 54B, and 55B exhaust gases from the second processing unit 21B and the fourth processing unit 21D, respectively.

[0152] The exhaust pipes 53A, 54A, 55A are disposed to the right of the first distribution section 41 and the second distribution pipe 42. The exhaust pipes 53A, 54A, 55A are disposed to the right of the first to fourth connection boxes 46A-64D. The exhaust pipes 53B, 54B, 55B are disposed to the left of the first distribution section 41 and the second distribution pipe 42. The exhaust pipes 53B, 54B, 55B are disposed to the left of the first to fourth connection boxes 46A-64D.

[0153] The exhaust pipes 53A, 54A, and 55A are disposed at approximately the same height. The exhaust pipes 53B, 54B, and 55B are disposed at approximately the same height. The exhaust pipes 53B, 54B, and 55B are disposed at approximately the same height as the exhaust pipes 53A, 54A, and 55A. The exhaust pipes 53A, 53B, 54A, 54B, 55A, and 55B are disposed at approximately the same height as the first to fourth connection boxes 46A-46D.

[0154] Please refer to Fig. 2-5. The substrate processing apparatus 1 includes a footboard 57. The footboard 57 is installed in the upper space 39. The footboard 57 has a substantially flat shape. Note that the footboard 57 is not shown in Fig. 6.

[0155] The step plate 57 allows a user to stand on the step plate 57. The step plate 57 is rigidly supported by the processing block 11. The step plate 57 is rigidly supported by, for example, a frame 59 of the processing block 11. The step plate 57 has sufficient rigidity. The step plate 57 has sufficient strength. The step plate 57 is less likely to bend than the partition wall 40.

[0156] 7 is a plan view of the substrate processing apparatus 1. The footplate 57 is disposed above at least a portion of the first distribution section 41. The footplate 57 protects the first distribution section 41 from damage. The footplate 57 is disposed above at least a portion of the second distribution section 42. The footplate 57 protects the second distribution section 42 from damage.

[0157] The footplate 57 is disposed above at least a portion of the exhaust pipes 53A, 54A, 55A. The footplate 57 protects the exhaust pipes 53A, 54A, 55A from damage. The footplate 57 is disposed above at least a portion of the exhaust pipes 53B, 54B, 55B. The footplate 57 protects the exhaust pipes 53B, 54B, 55B from damage.

[0158] The footboard 57 is disposed near the first connection box 46A, the second connection box 46B, the third connection box 46C and the fourth connection box 46D.

[0159] The step plate 57 passes between the second connection box 46B and the third connection box 46C, and extends from the first connection box 46A to the fourth connection box 46D. The step plate 57 extends in the front-rear direction X.

[0160] 3. Structure of the processing unit 21 In the following, when the first to fourth processing units 21A-21D are not differentiated, they are referred to as processing units 21. When the first to fourth holding parts 25A-25D are not differentiated, they are referred to as holding parts 25. When the first to fourth liquid supply parts 27A-27D are not differentiated, they are referred to as liquid supply 33. When the first to fourth connection boxes 46A-60D are not differentiated, they are referred to as connection boxes 46. When the first to fourth joints 47A-47D are not differentiated, they are referred to as joints 47. When the fifth to eighth joints 48A-48D are not differentiated, they are referred to as joints 48. When the exhaust pipes 53A and 53B are not differentiated, they are referred to as exhaust pipes 53. When the exhaust pipes 54A and 54B are not differentiated, they are referred to as exhaust pipes 54. When the exhaust pipes 55A and 55B are not differentiated, they are referred to as exhaust pipes 55.

[0161] 8 is a side view of the processing unit 21. As described above, the processing unit 21 includes the holder 25 and the liquid supply unit 27.

[0162] Further, the processing unit 21 includes a processing housing 61. The processing housing 61 is adjacent to the transport space 12. The processing housing 61 has, for example, a box shape. The processing housing 61 defines a processing space 62 inside the processing housing 61. The processing housing 61 houses the holding part 25. The holding part 25 is provided inside the processing housing 61.

[0163] The holder 25 holds one substrate W in a horizontal position.

[0164] The processing unit 21 includes a rotation drive unit 63. The rotation drive unit 63 is installed inside the processing housing 61. The rotation drive unit 63 is connected to the holder 25. The rotation drive unit 63 rotates the holder 25. The substrate W held by the holder 25 rotates integrally with the holder 25.

[0165] The liquid supply unit 27 includes a discharge adjustment unit 70 and a discharge unit 77. The discharge adjustment unit 70 is connected in communication with the first distribution unit 41 and the second distribution unit 42. The discharge adjustment unit 70 is disposed outside the processing housing 61. The discharge unit 77 is disposed inside the processing housing 61. The discharge unit 77 is connected in communication with the discharge adjustment unit 70. The discharge unit 77 discharges the processing liquid onto the substrate W held in the holder 25. The discharge adjustment unit 70 supplies the processing liquid to the discharge unit 77, and stops the supply of the processing liquid to the discharge unit 77.

[0166] Specifically, the discharge adjustment unit 70 includes a first discharge adjustment unit 71 and a second discharge adjustment unit 72. The first discharge adjustment unit 71 is connected to the first distribution unit 41. The second discharge adjustment unit 72 is connected to the second distribution unit 42.

[0167] The first discharge adjustment unit 71 includes a pipe 73 and a valve 74. The pipe 73 extends to the connection box 46. The pipe 73 is connected to the first distribution unit 41 via a joint 47. The valve 74 is provided on the pipe 73. Similarly, the second discharge adjustment unit 72 includes a pipe 75 and a valve 76. The pipe 75 extends to the connection box 46. The pipe 75 is connected to the second distribution unit 42 via a joint 48. The valve 76 is provided on the pipe 75.

[0168] The discharge unit 77 includes a first nozzle 78 and a second nozzle 79. The first nozzle 78 is connected to a first discharge adjustment unit 71 (specifically, a pipe 73). The second nozzle 79 is connected to a second discharge adjustment unit 72 (specifically, a pipe 75). The first nozzle 78 discharges a treatment liquid (specifically, a first treatment liquid). The second nozzle 79 discharges a treatment liquid (specifically, a second treatment liquid).

[0169] The liquid supply unit 27 does not include a tank for storing the treatment liquid, and does not include a pump for pressure-feeding the treatment liquid.

[0170] The processing unit 21 includes a cup 80. The cup 80 is provided inside the processing housing 61. The cup 80 has a generally cylindrical shape. The cup 80 is disposed around the holder 25. The cup 80 receives the processing liquid splashed from the substrate W held by the holder 25.

[0171] The processing unit 21 includes a gas exhaust part 81. The gas exhaust part 81 exhausts gas from inside the processing housing 61. At least a part of the gas exhaust part 81 is disposed outside the processing housing 61.

[0172] The gas exhaust unit 81 includes a switching mechanism 82 and a plurality of (for example, three) exhaust pipes 83, 84, and 85. The switching mechanism 82 is connected to the processing housing 61. The exhaust pipes 83-85 are each connected to the switching mechanism 82. The exhaust pipe 83 is connected to the exhaust pipe 53. The exhaust pipe 84 is connected to the exhaust pipe 54. The exhaust pipe 85 is connected to the exhaust pipe 55. The switching mechanism 82 connects the processing housing 61 to one of the exhaust pipes 83-85. The switching mechanism 82 switches the exhaust path of the processing housing 61 between the exhaust pipes 83-85. Specifically, the switching mechanism 82 switches between a first state, a second state, and a third state. In the first state, the switching mechanism 82 connects the processing housing 61 to the exhaust pipe 83 and isolates the processing housing 61 from the exhaust pipes 84 and 85. In the first state, only exhaust pipe 83 exhausts gas from processing housing 61. That is, in the first state, exhaust pipe 84 does not exhaust gas from processing housing 61, and exhaust pipe 85 does not exhaust gas from processing housing 61. In the second state, switching mechanism 82 connects processing housing 61 to exhaust pipe 84 and blocks processing housing 61 from exhaust pipes 83 and 85. In the second state, only exhaust pipe 84 exhausts gas from processing housing 61. In the third state, switching mechanism 82 connects processing housing 61 to exhaust pipe 85 and blocks processing housing 61 from exhaust pipes 83 and 84. In the third state, only exhaust pipe 85 exhausts gas from processing housing 61.

[0173] 4. Operation example of the substrate processing apparatus 1 An example of the operation of the substrate processing apparatus 1 will be briefly described below. In the following, when there is no need to distinguish between the transport spaces 12A and 12B, they will be referred to as the transport space 12. When there is no need to distinguish between the transport mechanisms 13A and 13B, they will be referred to as the transport mechanism 13. When there is no need to distinguish between the substrate placement parts 16A and 16B, they will be referred to as the substrate placement part 16. When there is no need to distinguish between the first to fourth transport ports 28A-28D, they will be referred to as the transport ports 28.

[0174] The indexer unit 3 supplies the substrate W to the processing block 11. Specifically, the transport mechanism 6 transports the substrate W from the carrier C to the substrate platform 16. For example, the transport mechanism 6 delivers the substrate W alternately to the substrate platform 16A and 16B.

[0175] The transport mechanism 13 receives the substrate W from the indexer section 3 via the substrate platform 16. Then, the transport mechanism 13 transports the substrate W from the substrate platform 16 to one of the processing units 21. Specifically, the transport mechanism 13 moves parallel to the front-rear direction X. Then, the transport mechanism 13 stops at a position facing the holder 25. The transport mechanism 13 delivers the substrate W to the holder 25 through the transfer port .

[0176] The processing liquid (first processing liquid) is distributed from the liquid storage section 31 to the processing unit 21 (liquid supply section 27) through the first distribution section 41. The processing liquid (second processing liquid) is distributed from the liquid storage section 32 to the processing unit 21 (liquid supply section 27) through the second distribution section 42.

[0177] The processing unit 21 processes the substrate W. Specifically, the holder 25 holds the substrate W. The rotation drive unit 63 rotates the substrate W held by the holder 25. The liquid supply unit 27 supplies a processing liquid to the substrate W held by the holder 25. The cup 80 receives the processing liquid scattered from the substrate W. The gas exhaust unit 81 exhausts gas from the processing space 62.

[0178] For example, the first discharge adjustment unit 71 supplies the first processing liquid to the first nozzle 78. The first nozzle 78 discharges the first processing liquid onto the substrate W. The switching mechanism 82 switches the exhaust path of the processing housing 61 to the exhaust pipe 83. Gas flows from the processing housing 61 to the exhaust pipe 83, and then flows from the exhaust pipe 83 to the exhaust pipe 53. Thereafter, the first discharge adjustment unit 71 stops supplying the first processing liquid to the first nozzle 78. The first nozzle 78 stops discharging the first processing liquid.

[0179] Next, the second discharge adjustment unit 72 supplies the second processing liquid to the second nozzle 79. The second nozzle 79 discharges the second processing liquid onto the substrate W. The switching mechanism 82 switches the exhaust path of the processing housing 61 to the exhaust pipe 84. The gas flows from the processing housing 61 to the exhaust pipe 84, and then flows from the exhaust pipe 84 to the exhaust pipe 54. Thereafter, the second discharge adjustment unit 72 stops supplying the second processing liquid to the second nozzle 79. The second nozzle 79 stops discharging the second processing liquid.

[0180] After the processing unit 21 processes the substrate W, the processing block 11 returns the processed substrate W to the indexer section 3. Specifically, the transport mechanism 13 transports the substrate W from the processing unit 21 (holding section 25) to the substrate platform section 16.

[0181] The indexer unit 3 retrieves the substrate W from the processing block 11. Specifically, the transport mechanism 6 transports the substrate W from the substrate platform 16 to the carrier C.

[0182] 5. Effects of the embodiment The substrate processing apparatus 1 includes an indexer section 3 and a processing block 11. The processing block 11 is disposed behind the indexer section 3. The processing block 11 is connected to the indexer section 3. The processing block 11 includes a transport space 12A, a transport mechanism 16A, a first processing unit 21A1, and a second processing unit 21B1. The transport space 12A extends in the front-rear direction X. The transport mechanism 16A is installed in the transport space 12A. The transport mechanism 16A transports a substrate W. The first processing unit 21A1 processes the substrate W. The second processing unit 21B1 processes the substrate W. The first processing unit 21A1 includes a first holding section 25A and a first liquid supply section 27A. The first holding section 25A holds the substrate W. The first liquid supply section 27A supplies a processing liquid to the substrate W held in the first holding section 25A. The second processing unit 21B1 includes a second holding part 25B and a second liquid supply part 27B. The second holding part 25B holds the substrate W. The second liquid supply part 27B supplies a processing liquid to the substrate W held in the second holding part 25B.

[0183] Here, the first processing unit 21A1 is disposed on the right side of the transport space 12A. The center 26A of the first holding part 25A is located behind the center 24A of the first processing unit 21A1 in a plan view. The second processing unit 21B1 is disposed on the left side of the transport space 12A. The center 26B of the second holding part 25B is located forward of the center 24B of the second processing unit 21B1 in a plan view. Therefore, two processing units having the same structure can be adopted as the first processing unit 21A1 and the second processing unit 21B1. Therefore, it is possible to easily suppress variation in the quality of the processing performed on the substrate W between the first processing unit 21A1 and the second processing unit 21A2. Furthermore, the components of the first processing unit 21A1 and the second processing unit 21B1 can be easily made common.

[0184] The transport mechanism 16A transports the substrate W to the first holding part 25A and the second holding part 25B. The transport mechanism 16A is configured to be capable of translation in the front-rear direction X. Therefore, the transport mechanism 16A can suitably transport the substrate W to the first holding part 25A and the second holding part 25B.

[0185] The front end 22B of the second processing unit 21B1 is disposed rearward of the front end 22A of the first processing unit 21A1. The front end 22B of the second processing unit 21B1 is disposed forward of the rear end 23A of the first processing unit 21A1. In this manner, the second processing unit 21B1 is shifted rearward with respect to the first processing unit 21A1. Therefore, the second holding portion 25B is not disposed extremely forward. Therefore, the movement distance of the transport mechanism 13A in the front-rear direction X is suitably reduced. Specifically, the distance L is relatively short.

[0186] 10 is a plan view of the substrate processing apparatus 201 according to the comparative example. The distance L in the substrate processing apparatus 1 is shorter than the distance M in the substrate processing apparatus 201. Therefore, the transport mechanism 13A can efficiently transport the substrate W to the first holding part 25A and the second holding part 25B. As a result, the first processing unit 21A1 and the second processing unit 21B1 can efficiently process the substrate 2, respectively.

[0187] The processing block 11 includes a first liquid storage section 31. The second liquid storage section 31 stores the processing liquid distributed to the first processing unit 21A1 and the second processing unit 21B1. The first liquid storage section 31 is disposed to the left of the transport space 12A. The first liquid storage section 31 is adjacent to the front of the second processing unit 21B1. In this manner, the space in front of the second processing unit 21B1 is effectively utilized. This makes it possible to prevent an increase in the length of the substrate processing apparatus 1 in the front-rear direction X.

[0188] As described above, according to the substrate processing apparatus 1 of the embodiment, the structure of the first processing unit 21A1 and the structure of the second processing unit 21B1 can be easily standardized. As a result, the processing quality in the first processing unit 21A1 and the processing quality in the second processing unit 21B1 can be easily uniformed. Furthermore, the transport mechanism 13A can efficiently transport the substrate W to the first processing unit 21A1 and the second processing unit 21B1. As a result, the throughput of the substrate processing apparatus 1 can be suitably improved. Furthermore, an increase in the footprint of the substrate processing apparatus 1 can be suppressed.

[0189] The center 26B of the second holding part 25B is disposed forward of the center 26A of the first holding part 25A. Therefore, the second processing unit 21B1 does not shift excessively backward with respect to the first processing unit 21A1. This makes it possible to prevent an increase in the length of the substrate processing apparatus 1 in the front-rear direction X.

[0190] The liquid storage portion 31 has a front end 31f. In the front-rear direction X, the front end 31f is disposed at a position equivalent to the front end 22A of the first processing unit 21A1. This makes it possible to prevent the length of the substrate processing apparatus 1 in the front-rear direction X from increasing.

[0191] The first processing unit 21A1 is adjacent to the rear of the indexer section 3. The first liquid storage section 31 is adjacent to the rear of the indexer section 3. Therefore, an increase in the length of the processing block 11 in the front-rear direction X can be suppressed.

[0192] Second processing unit 21B1 has the same structure as first processing unit 21A1 rotated 180 degrees around a vertical axis, which makes it easy to equalize the processing quality in first processing unit 21A1 and the processing quality in second processing unit 21B1.

[0193] The substrate processing apparatus 1 includes a substrate placement part 16A. The substrate placement part 16A places a substrate W to be transported between the indexer part 3 and the transport mechanism 13A. This allows the transport mechanism 13A to easily receive the substrate W from the indexer part 3. The transport mechanism 13A can easily deliver the substrate W to the indexer part 3.

[0194] At least a portion of the substrate placement part 16A is installed in the transport space 12A. Therefore, the range of motion of the transport mechanism 13A is limited to the rear of the substrate placement part 16A. Even in this case, the transport mechanism 13A can easily transport the substrate W to the second holding part 26B. Specifically, when the transport mechanism 13A transports the substrate W to the second holding part 26B, there is no risk of the transport mechanism 13A interfering with the substrate placement part 16A. This is because the second processing unit 21B1 is shifted rearward relative to the first processing unit 21A1.

[0195] The substrate placement part 16A is disposed between the first processing unit 21A1 and the first liquid storage part 31. In other words, the first processing unit 21A1, the substrate placement part 16A, and the first liquid storage part 31 are arranged in this order in the width direction Y. For this reason, the substrate placement part 16A does not prevent the transport mechanism 13A from transporting the substrate W to the second holding part 26B.

[0196] The substrate processing apparatus 1 includes a third processing unit 21C1 and a fourth processing unit 21D1. The third processing unit 21C1 is adjacent to the rear of the first processing unit 21A1. The third processing unit 21C1 processes a substrate W. The fourth processing unit 21D1 is adjacent to the rear of the second processing unit 21B1. The fourth processing unit 21D1 processes a substrate W. The third processing unit 21C1 includes a third holding part 25C and a third liquid supply part 27C. The third holding part 25C holds a substrate W. The third liquid supply part 27C supplies a processing liquid to the substrate W held in the third holding part 25C. The fourth processing unit includes a fourth holding part 25D and a fourth liquid supply part 27D. The fourth holding part 25D holds a substrate W. The fourth liquid supply part 27D supplies a processing liquid to the substrate W held in the fourth holding part 25D. The transport mechanism 13A transports the substrate W to the third holding part 25C and the fourth holding part 25D. The first liquid storage part 31 stores the processing liquid to be distributed to the third processing unit 21C1 and the fourth processing unit 21D1. Here, the third processing unit 21C1 is disposed on the right side of the transport space 12A. The third processing unit 21C1 has a center 24C in a plan view. The third holding part 25C has a center 26C in a plan view. The center 26C is located rearward of the center 24C in a plan view. The fourth processing unit 21D1 is disposed on the left side of the transport space 12A. The fourth processing unit 21D1 has a center 24D in a plan view. The fourth holding part 25D has a center 26D in a plan view. The center 26D is located forward of the center 24D in a plan view. For this reason, four processing units having the same structure can be adopted as the first to fourth processing units 21A1-21D1. This makes it possible to easily suppress variations in the quality of processing performed on the substrate W between the first to fourth processing units 21A1-21D1. Furthermore, parts can be easily standardized between the first to fourth processing units 21A1-21D1.

[0197] The front end 22D of the fourth processing unit 21D1 is disposed rearward of the front end 22C of the third processing unit 21C1. The front end 22D of the fourth processing unit 21D1 is disposed forward of the rear end 23C of the third processing unit 21C1. In this manner, the fourth processing unit 21D1 is shifted rearward with respect to the third processing unit 21C1. Therefore, the third holding part 25C is not disposed extremely rearward. Therefore, the movement distance of the transport mechanism 13A in the front-rear direction X is suitably reduced. Therefore, the transport mechanism 13A can efficiently transport the substrate W to the first to fourth holding parts 25A-25D. As a result, the first to fourth processing units 21A1-21D1 can efficiently process the substrate W, respectively.

[0198] The third processing unit 21C1 has the same structure as the first processing unit 21A1. The fourth processing unit 21D1 has the same structure as the first processing unit 21A1 rotated 180 degrees around the vertical axis. This makes it easy to uniformize the quality of processing performed on the substrate W among the first to fourth processing units 21A1-21D1.

[0199] The substrate processing apparatus 1 includes a second liquid storage section 32. The second liquid storage section 32 stores the processing liquid distributed to the first processing unit 21A1, the second processing unit 21B1, the third processing unit 21C1, and the fourth processing unit 21D1. The second liquid storage section 32 is disposed to the right of the transport space 12A. The second liquid storage section 32 is disposed adjacent to the rear of the third processing unit 21C1. In this manner, the space behind the third processing unit 21C1 is effectively utilized. This makes it possible to prevent the length of the substrate processing apparatus 1 in the front-rear direction X from increasing.

[0200] The rear end 32r of the second liquid storage portion 32 is disposed at a position equivalent to the rear end 23D of the fourth processing unit 21D1 in the front-rear direction X. This makes it possible to prevent the length of the substrate processing apparatus 1 in the front-rear direction X from increasing.

[0201] The processing liquid stored in the second liquid storage portion 32 is a different type from the processing liquid stored in the first liquid storage portion 31. Therefore, each of the first to fourth processing units 21A1-21D1 can supply two types of processing liquid to the substrate W.

[0202] The substrate processing apparatus 1 includes an upper space 39, a first distribution section 41, and a second distribution section 42. The upper space 39 is formed above the transport space 12A1, the first processing unit 21A1, the second processing unit 21B1, the third processing unit 21C1, the fourth processing unit 21D1, the first liquid storage section 31, and the second liquid storage section 32. The first distribution section 41 distributes the processing liquid from the first liquid storage section 31 to the first processing unit 21A1, the second processing unit 21B1, the third processing unit 21C1, and the fourth processing unit 21D1. The second distribution section 42 distributes the processing liquid from the second liquid storage section 32 to the first processing unit 21A1, the second processing unit 21B1, the third processing unit 21C1, and the fourth processing unit 21D1. Here, the first distribution section 41 is provided in the upper space 39. The second distributor 42 is provided in the upper space 39. This makes it possible to suitably prevent the footprint of the substrate processing apparatus 1 from increasing.

[0203] The second distribution section 42 is equivalent to the first distribution section 41 rotated 180 degrees in a plan view. Therefore, the flow path length of the first distribution section 41 and the flow path length of the second distribution section 42 can be easily made uniform.

[0204] The substrate processing apparatus 1 includes a first connection box 46A, a second connection box 46B, a third connection box 46C, and a fourth connection box 46D. The first connection box 46A is disposed above the first processing unit 21A1. The second connection box 46B is disposed above the second processing unit 21B1. The third connection box 46C is disposed above the third processing unit 21C1. The fourth connection box 46D is disposed above the fourth processing unit 21D1. The first distribution section 41 extends from the first liquid storage section 31 to the first connection box 46A, the second connection box 46B, the third connection box 46C, and the fourth connection box 46D. The second distribution section 42 extends from the second liquid storage section 32 to the first connection box 46A, the second connection box 46B, the third connection box 46C, and the fourth connection box 46D. In this manner, both the first distribution section 41 and the second distribution section 42 extend to the first connection box 46A. Similarly, both the first distribution section 41 and the second distribution section 42 extend to the second to fourth connection boxes 46B-46D. Therefore, the flow path length of the first distribution section 41 and the flow path length of the second distribution section 42 are easily made uniform.

[0205] In the front-rear direction X, the first connection box 46A is disposed forward of the first holding portion 25A. In the front-rear direction X, the second connection box 46B is disposed rearward of the second holding portion 25B. In the front-rear direction X, the third connection box 46C is disposed forward of the third holding portion 25C. In the front-rear direction X, the fourth connection box 46D is disposed rearward of the fourth holding portion 25D. Therefore, the difference between the flow path length from the first liquid storage portion 31 to the first connection box 46A and the flow path length from the first liquid storage portion 31 to the second connection box 46B can be suitably reduced. Specifically, the difference between the length of the first pipe 43A and the length of the second pipe 43B can be suitably reduced. Similarly, the difference between the flow path length from the first liquid storage portion 31 to the third connection box 46C and the flow path length from the first liquid storage portion 31 to the fourth connection box 46D can be suitably reduced. Specifically, the difference between the length of the third pipe 43C and the length of the fourth pipe 43D can be suitably reduced. The difference between the flow path length from the second liquid storage section 32 to the first connection box 46A and the flow path length from the second liquid storage section 32 to the second connection box 46B can be suitably reduced. Specifically, the difference between the length of the fifth pipe 44A and the length of the sixth pipe 44B can be suitably reduced. The difference between the flow path length from the second liquid storage section 32 to the third connection box 46C and the flow path length from the second liquid storage section 32 to the fourth connection box 46D can be suitably reduced. Specifically, the difference between the length of the seventh pipe 44C and the eighth pipe 44D can be suitably reduced.

[0206] The substrate processing apparatus 1 includes a first joint 47A, a second joint 47B, a third joint 47C, and a fourth joint 47D. The first joint 47A is accommodated in the first connection box 46A. The first joint 47A connects the first distribution unit 41 and the first liquid supply unit 27A. The second joint 47B is accommodated in the second connection box 46B. The second joint 47B connects the first distribution unit 41 and the second liquid supply unit 27B. The third joint 47C is accommodated in the third connection box 46C. The third joint 47C connects the first distribution unit 41 and the third liquid supply unit 27C. The fourth joint 47D is accommodated in the fourth connection box 46D. The fourth joint 47D connects the first distribution unit 41 and the fourth liquid supply unit 27D. Therefore, the first distribution section 41 and the first to fourth liquid supply sections 27A-27D can be conveniently attached and detached in the first to fourth connection boxes 46A-46D.

[0207] The substrate processing apparatus 1 includes a fifth joint 48A, a sixth joint 48B, a seventh joint 48C, and an eighth joint 48D. The fifth joint 48A is accommodated in the first connection box 46A. The fifth joint 48A connects the second distribution unit 42 and the first liquid supply unit 27A. The sixth joint 48B is accommodated in the second connection box 46B. The sixth joint 48B connects the second distribution unit 42 and the second liquid supply unit 27B. The seventh joint 48C is accommodated in the third connection box 46C. The seventh joint 48C connects the second distribution unit 42 and the third liquid supply unit 27C. The eighth joint 48D is accommodated in the fourth connection box 46D. The eighth joint 48D connects the second distribution unit 42 and the fourth liquid supply unit 27D. Therefore, the second distribution section 42 and the first to fourth liquid supply sections 27A-27D can be conveniently attached and detached in the first to fourth connection boxes 46A-46D.

[0208] The substrate processing apparatus 1 includes a footboard 57. The footboard 57 is installed in the upper space 39. The footboard 57 is substantially flat. Therefore, a user of the substrate processing apparatus 1 can stand on the footboard 57. Therefore, the user can perform maintenance work on the footboard 57, for example.

[0209] The footboard 57 is disposed near the first connection box 46A. Therefore, the user can easily access the first connection box 46A. Therefore, the user can perform the operation of attaching and detaching the first distribution unit 41 and the first liquid supply unit 27A on the footboard 57. The user can perform the operation of attaching and detaching the second distribution unit 42 and the first liquid supply unit 27A on the footboard 57. Similarly, the footboard 57 is disposed near the second connection box 46B, the third connection box 46C, and the fourth connection box 46D. Therefore, the user can perform the operation of attaching and detaching the first-second distribution unit 41-42 and the second-fourth liquid supply units 27B-27D on the footboard 57.

[0210] The footboard 57 passes between the second connection box 46B and the third connection box 46C and extends from the first connection box 46A to the fourth connection box 46D, allowing the user to easily move between the first to fourth connection boxes 46A-46D.

[0211] The footplate 57 is disposed above at least a portion of the first distribution section 41. Therefore, the footplate 57 protects the first distribution section 41 in an appropriate manner.

[0212] The footplate 57 is disposed above at least a portion of the second distribution section 42. Therefore, the footplate 57 protects the second distribution section 42 in an appropriate manner.

[0213] The present invention is not limited to the embodiments, and can be modified as follows.

[0214] In the embodiment, the right side is an example of the first side of the present invention, and the left side is an example of the second side of the present invention. However, this is not limited to this. The left side may be an example of the first side of the present invention, and the right side may be an example of the second side of the present invention. Specifically, the first processing unit 21A1 may be disposed on the left side of the transport space 12A, and the second processing unit 21B1 and the first liquid storage section 31 may be disposed on the right side of the transport space 12A.

[0215] In the embodiment, the substrate processing apparatus 1 may further include another storage section in addition to the first liquid storage section and the second liquid storage section. Fig. 9 is a right side view of the substrate processing apparatus 1 according to the modified embodiment. Note that the same components as those in the embodiment are denoted by the same reference numerals and detailed description thereof will be omitted. For convenience, Fig. 9 does not show the first distribution section 41 and the second distribution section 42.

[0216] The substrate processing apparatus 1 according to the modified embodiment includes a third liquid storage section 91. The third liquid storage section 91 is disposed in the indexer section 3. The third liquid storage section 91 stores the processing liquid to be distributed to the first to fourth processing units 21A-21D.

[0217] The treatment liquid stored in the third liquid storage unit 91 is a third treatment liquid. The third treatment liquid is classified as, for example, an alkaline liquid (alkaline-based chemical liquid). The third treatment liquid includes, for example, at least one of an ammonia-hydrogen peroxide solution (SC1), an ammonia water solution, an ammonium fluoride solution, and a tetramethylammonium hydroxide (TMAH).

[0218] The third liquid storage unit 91 includes a tank 92, a pump 93, and a cabinet 94. The tank 92 stores a processing liquid (specifically, a third processing liquid). The pump 93 is connected in communication with the tank 92. The cabinet 94 houses the tank 92 and the pump 93.

[0219] The substrate processing apparatus 1 includes a third distributor 95. The third distributor 95 distributes the processing liquid from the third liquid storage section 91 to the first to fourth processing units 21A to 21D.

[0220] Specifically, the third distribution unit 95 is connected in communication with the pump 93. The third distribution unit 95 extends from the bottom of the indexer unit 3 to the bottom of the processing block 11. The third distribution unit 95 is provided, for example, in an underground pit. The underground pit is formed below the floor surface FL on which the indexer unit 3 and the processing block 11 are installed. The third distribution unit 95 is connected to the first to fourth liquid supply units 27A-27D via joints 96.

[0221] The substrate processing apparatus 1 according to the modified embodiment includes a fourth liquid storage section 101. The fourth liquid storage section 101 is installed outside the indexer section 3 and the processing block 11. For example, the fourth liquid storage section 101 is provided in an underground pit. The fourth liquid storage section 101 stores the processing liquid to be distributed to the first to fourth processing units 21A-21D.

[0222] The treatment liquid stored in the fourth liquid storage portion 101 is a fourth treatment liquid. The fourth treatment liquid is, for example, classified as a cleaning liquid. The fourth treatment liquid is, for example, pure water.

[0223] The fourth liquid storage unit 101 includes a tank 102, a pump 103, and a cabinet 104. The tank 102 stores a processing liquid (specifically, a fourth processing liquid). The pump 103 is connected in communication with the tank 102. The cabinet 104 houses the tank 102 and the pump 103.

[0224] The substrate processing apparatus 1 includes a fourth distribution section 105. The fourth distribution section 105 distributes the processing liquid from the fourth liquid storage section 101 to the first to fourth processing units 21A-21D.

[0225] Specifically, the fourth distribution unit 105 is connected in communication with the pump 103. The fourth distribution unit 105 extends from the fourth storage unit 101 to the bottom of the processing block 11. The fourth distribution unit 105 is provided, for example, in an underground pit. The fourth distribution unit 105 is connected to the first to fourth liquid supply units 27A-27D via joints 106.

[0226] The substrate processing apparatus 1 includes a return section 107. The return section 107 returns the processing liquid to the fourth liquid storage section 101 from the first to fourth processing units 21A to 21D.

[0227] Specifically, the return portion 107 is connected to the first to fourth liquid supply portions 27A-27D. The return portion 107 is connected to the first to fourth liquid supply portions 27A-27D in the first to fourth connection boxes 46A-46D. The return portion 107 is connected to the first to fourth liquid supply portions 27A-27D via joints 108. The return portion 107 is installed in the upper space 39. The return portion 107 extends rearward from the first to fourth connection boxes 46A-46D.

[0228] The processing block 11 includes an interface portion 111. The interface portion 111 is located at the rear of the processing block 11. The interface portion 111 is disposed at the rear of the transport space 12, the processing unit 21, the first liquid storage portion 31, and the second liquid storage portion 32. The interface portion 111 extends in the vertical direction Z. The interface portion 111 extends from the upper space 39 to the bottom of the processing block 11.

[0229] The return portion 107 enters the interface portion 111 from the upper space 39. The return portion 107 extends downward inside the interface portion 111. The return portion 107 exits to the outside of the interface portion 111 (the underground pit) through the bottom of the interface portion 111. The return portion 107 then enters the fourth storage portion 101. The return portion 107 is connected in communication with the tank 102.

[0230] The processing block 11 may further include a power distribution unit (not shown). The power distribution unit is disposed, for example, at the rear of the processing block 11. The power distribution unit is disposed, for example, near the interface unit 111. The power distribution unit manages the power supply of the substrate processing apparatus 1. The power distribution unit includes, for example, one or more switches. The switches turn on and off the power to the electrical devices of the substrate processing apparatus 1.

[0231] In the embodiment, the first liquid storage section 31 stores the first treatment liquid. However, this is not limited to this. The first liquid storage section 31 may store any of the second treatment liquid, the third treatment liquid, and the fourth treatment liquid. Similarly, in the embodiment, the second liquid storage section 32 stores the second treatment liquid. However, this is not limited to this. The second liquid storage section 32 may store any of the first treatment liquid, the third treatment liquid, and the fourth treatment liquid.

[0232] In the embodiment, a part of the substrate mounting part 16A may be disposed in the indexer part 3.

[0233] In an embodiment, the footplate 57 may be disposed above the entire first distribution section 41. The footplate 57 may be disposed above the entire second distribution section 42. The footplate 57 may be disposed above the entire exhaust pipes 53-55.

[0234] In the embodiment, the step plate 57 is not disposed above the first to fourth connection boxes 46A-46D. However, this is not limited thereto. The step plate 57 may be disposed above at least a part of the first to fourth connection boxes 46A-46D. The step plate 57 may be disposed above all of the first to fourth connection boxes 46A-46D. The step plate 57 may have a panel that opens and closes above the first connection box 46A. When the panel is open, the user can easily access the first connection box 46A. When the panel is closed, the panel protects the first connection box 46A. Similarly, the step plate 57 may have a panel that opens and closes above the second to fourth connection boxes 46B-46D.

[0235] In the embodiment, the number of transport spaces 12 included in the processing block 11 is two. However, this is not limited to this. The number of transport spaces 12 included in the processing block 11 may be one or more than two.

[0236] In the embodiment, the number of transport mechanisms 13 included in the processing block 11 is two. However, this is not limited to this. The number of transport mechanisms 13 included in the processing block 11 may be one or more than two.

[0237] In the embodiment, the substrate processing apparatus 1 includes the third processing unit 21C1 and the fourth processing unit 21D1. However, the present invention is not limited to this. For example, the third processing unit 21C1 and the fourth processing unit 21D1 may be omitted.

[0238] In the embodiment, the number of processing units 21 arranged in the front-rear direction X on the right side of the transporting space 12A is two. However, this is not limited to this. The number of processing units 21 arranged in the front-rear direction X on the right side of the transporting space 12A may be one or more than two. Similarly, the number of processing units 21 arranged in the front-rear direction X on the left side of the transporting space 12A may be one or more than two.

[0239] In the embodiment, the number of the first processing units 21A is six. However, this is not limited to this. The number of the first processing units 21A may be one or more and less than six, or may be more than six.

[0240] In the embodiment, the number of processing units 21 aligned in the vertical direction Z is six. However, this is not limited to this. The number of processing units 21 aligned in the vertical direction Z may be one or more and less than six, or more than six.

[0241] The embodiment and each modified embodiment may be further modified as appropriate by replacing or combining each configuration with the configuration of another modified embodiment. [Explanation of symbols]

[0242] 1 ... Substrate processing equipment 3 … Indexer section 12A … Transport space 12A 13A … Transport mechanism 16A … Board placement area 21A1… First processing unit 22A … Front end of first processing unit 23A … Rear end of first processing unit 24A … Center of the first processing unit in plan view 21B1... Second processing unit 22B … Front end of second processing unit 23B … Rear end of second processing unit 24B … Center of the second processing unit in plan view 21C1… 3rd processing unit 22C … Front end of the third processing unit 23C … Rear end of the third processing unit 24C … Center of the third processing unit in plan view 21D1... 4th processing unit 22D … Front end of 4th processing unit 23D … Rear end of 4th processing unit 24D: Center of the 4th processing unit in plan view 25A … 1st holding part 26A … Center of the first holding part in plan view 25B…Second holding part 26B … Center of the second holding portion in plan view 25C...Third holding part 26C … Center of the third retaining part in plan view 25D … 4th holding part 26D … Center of the fourth holding part in plan view 27A … 1st liquid supply section 27B…Second liquid supply section 27C … Third liquid supply section 27D … 4th liquid supply section 31 … First liquid storage section 32…Second liquid storage section 39 … Top space 41 … 1st distribution section 42…Second distribution section 46A … 1st connection box 46B … 2nd connection box 46C … 3rd connection box 46D … 4th connection box 47A … First joint 47B … 2nd joint 47C ... 3rd joint 47D … 4th joint 57 ... Tread W … Substrate X…Anteroposterior direction Y: Width direction Z: Vertical direction

Claims

1. A substrate processing apparatus, comprising: An indexer unit; a processing block disposed behind the indexer unit and connected to the indexer unit; Equipped with The processing block includes: A transport space extending in the front-rear direction; a transport mechanism that is installed in the transport space and configured to be movable in parallel in the forward and backward directions and transports a substrate; a first processing unit disposed on a first side of the transport space and configured to process a substrate; a second processing unit disposed on a second side of the transport space and configured to process a substrate; a first liquid storage section configured to store a processing liquid to be distributed to the first processing unit and the second processing unit; Equipped with The first processing unit is A first holding part that holds the substrate; a first liquid supply unit that supplies a processing liquid to the substrate held by the first holding unit; Equipped with The second processing unit is A second holding part that holds the substrate; a second liquid supply unit that supplies a processing liquid to the substrate held by the second holder; Equipped with the transport mechanism transports the substrate to the first holding unit and the second holding unit; the first holding portion has a center located rearward of a center of the first processing unit in a plan view, the second holding portion has a center located forward of a center of the second processing unit in a plan view, a front end of the second processing unit is disposed rearward of a front end of the first processing unit and forward of a rear end of the first processing unit; The first liquid storage section is disposed on the second side of the transfer space and adjacent to a front of the second processing unit. Substrate processing equipment.

2. 2. The substrate processing apparatus according to claim 1, The center of the second holding portion is disposed forward of the center of the first holding portion. Substrate processing equipment.

3. 3. The substrate processing apparatus according to claim 1, In the front-rear direction, a front end of the first liquid storage portion is disposed at a position equivalent to the front end of the first processing unit. Substrate processing equipment.

4. 4. The substrate processing apparatus according to claim 1, the first processing unit is adjacent to the rear of the indexer section, The first liquid storage section is adjacent to the rear of the indexer section. Substrate processing equipment.

5. 5. The substrate processing apparatus according to claim 1, The second processing unit has a structure equivalent to that of the first processing unit rotated 180 degrees around a vertical axis. Substrate processing equipment.

6. 6. The substrate processing apparatus according to claim 1, a substrate placement unit for placing a substrate to be transported between the indexer unit and the transport mechanism; Equipped with At least a portion of the substrate placement section is disposed in the transport space. Substrate processing equipment.

7. 7. The substrate processing apparatus according to claim 6, The substrate placement part is disposed between the first processing unit and the first liquid storage part. Substrate processing equipment.

8. 8. The substrate processing apparatus according to claim 1, a third processing unit disposed on the first side of the transport space and adjacent to a rear side of the first processing unit, the third processing unit configured to process a substrate; a fourth processing unit disposed on the second side of the transport space and adjacent to a rear side of the second processing unit, the fourth processing unit configured to process a substrate; Equipped with The third processing unit is A third holding part that holds the substrate; a third liquid supply unit that supplies a processing liquid to the substrate held by the third holder; Equipped with The fourth processing unit is A fourth holding part that holds the substrate; a fourth liquid supply unit that supplies a processing liquid to the substrate held by the fourth holder; Equipped with the transport mechanism transports the substrate to the third holding unit and the fourth holding unit; the first liquid storage portion stores a processing liquid to be distributed to the third processing unit and the fourth processing unit; the third holding portion has a center located rearward of a center of the third processing unit in a plan view, the fourth holding portion has a center located forward of a center of the fourth processing unit in a plan view, A front end of the fourth processing unit is disposed rearward of a front end of the third processing unit and forward of a rear end of the third processing unit. Substrate processing equipment.

9. 9. The substrate processing apparatus according to claim 8, The third processing unit has the same structure as the first processing unit, The fourth processing unit has a structure equivalent to that of the first processing unit rotated 180 degrees around a vertical axis. Substrate processing equipment.

10. 10. The substrate processing apparatus according to claim 8, a second liquid storage section disposed on the first side of the transfer space and configured to store a processing liquid to be distributed to the first processing unit, the second processing unit, the third processing unit, and the fourth processing unit; Equipped with The second liquid storage section is disposed on the first side of the transfer space and adjacent to the rear of the third processing unit. Substrate processing equipment.

11. 11. The substrate processing apparatus according to claim 10, In the front-rear direction, a rear end of the second liquid storage portion is disposed at a position equivalent to a rear end of the fourth processing unit. Substrate processing equipment.

12. 12. The substrate processing apparatus according to claim 10, The treatment liquid stored in the second liquid storage section is a different type from the treatment liquid stored in the first liquid storage section. Substrate processing equipment.

13. 13. The substrate processing apparatus according to claim 10, an upper space formed above the transfer space, the first processing unit, the second processing unit, the third processing unit, the fourth processing unit, the first liquid storage portion, and the second liquid storage portion; a first distributor provided in the upper space and configured to distribute a treatment liquid from the first liquid storage to the first treatment unit, the second treatment unit, the third treatment unit, and the fourth treatment unit; a second distributor provided in the upper space and configured to distribute the treatment liquid from the second liquid storage to the first treatment unit, the second treatment unit, the third treatment unit, and the fourth treatment unit; Equipped Substrate processing equipment.

14. 14. The substrate processing apparatus according to claim 13, The second distribution section is equivalent to the first distribution section rotated 180 degrees in a plan view. Substrate processing equipment.

15. 15. The substrate processing apparatus according to claim 13, a first connection box disposed above the first processing unit; a second connection box disposed above the second processing unit; a third connection box disposed above the third processing unit; a fourth connection box disposed above the fourth processing unit; Equipped with the first distribution section extends from the first liquid storage section to the first connection box, the second connection box, the third connection box, and the fourth connection box; The second distribution section extends from the second liquid storage section to the first connection box, the second connection box, the third connection box, and the fourth connection box. Substrate processing equipment.

16. 16. The substrate processing apparatus according to claim 15, In the front-rear direction, the first connection box is disposed forward of the first holding portion, The second connection box is disposed rearward of the second holding portion in the front-rear direction, In the front-rear direction, the third connection box is disposed forward of the third holding portion, The fourth connection box is disposed rearward of the fourth holding portion in the front-rear direction. Substrate processing equipment.

17. 17. The substrate processing apparatus according to claim 15, a first joint housed in the first connection box and connecting the first distribution unit and the first liquid supply unit; a second joint housed in the second connection box and connecting the first distribution unit and the second liquid supply unit; a third joint housed in the third connection box and connecting the first distribution unit and the third liquid supply unit; a fourth joint housed in the fourth connection box and connecting the first distribution unit and the fourth liquid supply unit; Equipped Substrate processing equipment.

18. 18. The substrate processing apparatus according to claim 15, A substantially flat footboard is provided in the upper space. Substrate processing equipment.

19. 20. The substrate processing apparatus according to claim 18, The footboard is disposed near the first connection box, the second connection box, the third connection box, and the fourth connection box. Substrate processing equipment.

20. 20. The substrate processing apparatus according to claim 18, The footboard is disposed above at least a portion of the first distributor. Substrate processing equipment.

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