Wafer placement table

Abstract

To suppress the occurrence of temperature singularities in a vicinity directly above a terminal hole on a wafer.SOLUTION: A wafer mounting table 10 includes a ceramic substrate 20, a cooling substrate 30, a power supply terminal 54, and a power supply terminal hole 36. The ceramic substrate 20 has a wafer mounting surface 22a on the top surface, and incorporates an electrode 26 therein. The cooling substrate 30 is joined to the bottom surface of the ceramic substrate 20, and a coolant passage 32 is formed in the cooling substrate. The power supply terminal 54 is connected to the electrode 26. The power supply terminal hole 36 penetrates through the cooling substrate 30 in a vertical direction and houses the power supply terminal 54 therein. The power supply terminal hole 36 intersects the coolant passage 32.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a wafer stage. [Background technology]

[0002] Conventionally, a wafer mounting table is known in which a ceramic base material with an electrode built in is joined to a cooling base material with a coolant flow path formed therein. Patent Document 1 discloses a configuration for feeding power to the electrode as such a wafer mounting table. Specifically, an insulating tube is disposed in a power feeding terminal hole that passes through the cooling base material in the vertical direction, a power feeding terminal is inserted into the insulating tube, and the power feeding terminal is connected to the electrode. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent Publication No. 2021-64661 Summary of the Invention [Problem to be solved by the invention]

[0004] However, the power supply terminal hole has a relatively large diameter in order to accommodate the insulating tube, and it must be located in a way that avoids the coolant flow path. As a result, the area directly above the terminal hole on the wafer has poorer heat dissipation than other parts of the wafer, and can become a temperature singularity (hot spot).

[0005] The present invention has been made to solve such problems, and has as its main object to prevent the area directly above the power supply terminal hole on the wafer from becoming a temperature singular point. [Means for solving the problem]

[0006] [1] The wafer mounting table of the present invention comprises: a ceramic substrate having a wafer mounting surface on an upper surface thereof and incorporating an electrode; a cooling substrate bonded to a lower surface of the ceramic substrate and having a refrigerant flow path formed therein; A power supply terminal connected to the electrode; a power supply terminal hole that penetrates the cooling base material in the vertical direction and accommodates the power supply terminal; Equipped with The power supply terminal hole intersects with the refrigerant flow path. It is something.

[0007] In this wafer mounting table, the power supply terminal holes intersect with the coolant flow paths, so there is no need to provide a coolant flow path that avoids the power supply terminal holes, and it is therefore possible to prevent the area of ​​the wafer directly above the power supply terminal holes from becoming a temperature singular point.

[0008] In this specification, the present invention may be described using terms such as up / down, left / right, front / back, etc., but these terms are merely relative positional relationships. Therefore, when the orientation of the wafer placement table is changed, up / down may become left / right, or left / right may become up / down, but such cases are also included in the technical scope of the present invention. In addition, the "coolant flow path" may be a coolant flow path provided inside the cooling substrate, or a coolant flow path groove provided on the upper or lower surface of the cooling substrate.

[0009] [2] In the wafer stage of the present invention (the wafer stage described in [1] above), an electrically insulating liquid may be supplied to the coolant flow path, so that even if the cooling base is conductive, the power supply terminal is insulated from the cooling base by the electrically insulating liquid.

[0010] [3] In the wafer mounting table of the present invention (the wafer mounting table described in [1] or [2] above), an insulating tube may be disposed in the power supply terminal hole for inserting and supporting the power supply terminal. In this way, since the power supply terminal is supported by the insulating tube, it is possible to prevent the power supply terminal from being pushed by the flow of the coolant and being broken. In addition, it is possible to increase the withstand voltage between the cooling substrate and the power supply terminal.

[0011] [4] In the wafer mounting table of the present invention (the wafer mounting table described in [3] above), the upper end of the insulating tube may be fixed to the ceramic base, and the side surface of the insulating tube may have a protrusion that abuts against or is close to the inner wall of the power feed terminal hole. In this way, the movement of the insulating tube supporting the power feed terminal within the power feed terminal hole can be restricted by the protrusion.

[0012] [5] In the wafer stage of the present invention (the wafer stage according to any one of [1] to [4] above), the cooling base may have a single-layer structure. This eliminates the need to manufacture the cooling base by bonding, thereby reducing the manufacturing cost of the cooling base.

[0013] [6] In the wafer mounting table of the present invention (the wafer mounting table described in [5] above) having a single-layered cooling substrate, the coolant flow path may have a coolant flow groove provided on the upper or lower surface of the cooling substrate. For example, when the upper surface of the cooling substrate has a coolant flow groove, the coolant flow path is formed by covering the upper surface of the coolant flow groove with a ceramic substrate (or a bonding layer that bonds the ceramic substrate and the cooling substrate). When the lower surface of the cooling substrate has a coolant flow groove, the coolant flow path is formed by covering the lower surface of the coolant flow groove with a plate member (e.g., a mounting plate).

[0014] [7] In the wafer mounting table of the present invention (the wafer mounting table described in any one of [1] to [6] above), the refrigerant flow path may have a plurality of lines each extending in a single stroke from one end to the other end in a plan view, and the power supply terminal hole may be provided in one or more of the plurality of lines. [Brief description of the drawings]

[0015] [Figure 1] FIG. 2 is a vertical cross-sectional view of the wafer mounting table 10 installed in the chamber 94. [Diagram 2] FIG. [Diagram 3] FIG. 4 is an enlarged cross-sectional view showing the periphery of a power supply terminal hole 36. [Figure 4] 5A to 5C are diagrams showing the manufacturing process of the wafer mounting table 10. [Diagram 5] FIG. 4 is an enlarged cross-sectional view showing the periphery of the power supply terminal hole 36 with the insulating tube 55 omitted. [Figure 6] FIG. 2 is a vertical cross-sectional view of the wafer mounting table 210. [Figure 7] FIG. 3 is a vertical cross-sectional view of the wafer mounting table 310. [Figure 8] FIG. 4 is a plan view of another example of the wafer mounting table 10. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0016] A preferred embodiment of the present invention will be described below with reference to the drawings. Fig. 1 is a vertical cross-sectional view of a wafer mounting table 10 installed in a chamber 94 (a cross-sectional view taken along a plane including the central axis of the wafer mounting table 10), Fig. 2 is a plan view of the wafer mounting table 10, and Fig. 3 is an enlarged cross-sectional view showing the periphery of a power supply terminal hole 36.

[0017] The wafer mounting table 10 is used for performing CVD, etching, and the like on a wafer W using plasma, and is fixed to a mounting plate 96 provided inside a semiconductor process chamber 94. The wafer mounting table 10 includes a ceramic base 20, a cooling base 30, and a metal bonding layer 40.

[0018] The ceramic base 20 has a central portion 22 having a circular wafer mounting surface 22a, and an outer peripheral portion 24 having an annular focus ring mounting surface 24a on the outer periphery of the central portion 22. Hereinafter, the focus ring may be abbreviated as "FR." The wafer W is mounted on the wafer mounting surface 22a, and the focus ring 12 is mounted on the FR mounting surface 24a. The ceramic base 20 is made of a ceramic material such as alumina or aluminum nitride. The FR mounting surface 24a is one step lower than the wafer mounting surface 22a.

[0019] The center portion 22 of the ceramic base material 20 incorporates a wafer adsorption electrode 26 on the side close to the wafer placement surface 22a. The wafer adsorption electrode 26 is formed of a material containing, for example, W, Mo, WC, MoC, etc. The wafer adsorption electrode 26 is a disk-shaped or mesh-shaped monopolar electrostatic adsorption electrode. The layer of the ceramic base material 20 above the wafer adsorption electrode 26 functions as a dielectric layer. A wafer adsorption DC power source 52 is connected to the wafer adsorption electrode 26 via a power supply terminal 54. The power supply terminal 54 is provided so as to pass through an insulating tube 55 disposed in a through hole that vertically penetrates the cooling base material 30 and the metal bonding layer 40, and reach the wafer adsorption electrode 26 from the lower surface of the ceramic base material 20. A low pass filter (LPF) 53 is provided between the wafer adsorption DC power source 52 and the wafer adsorption electrode 26.

[0020] The cooling substrate 30 is a disk member made of a brittle conductive material. The cooling substrate 30 has a refrigerant flow path 32 inside which a refrigerant can circulate. As shown in FIG. 2, the refrigerant flow path 32 is provided so as to cover the entire surface of the ceramic substrate 20 in a single stroke from one end (inlet) to the other end (outlet) in a plan view. One end and the other end of the refrigerant flow path 32 are connected to a refrigerant supply path and a refrigerant discharge path (not shown) provided on the installation plate 96, respectively, and the refrigerant discharged from the refrigerant discharge path is returned to the refrigerant supply path after being temperature-adjusted. The refrigerant flowing through the refrigerant flow path 32 is preferably a liquid and is preferably electrically insulating. Examples of electrically insulating liquids include fluorine-based inert liquids. Examples of brittle conductive materials include composite materials of metal and ceramic. Examples of composite materials of metal and ceramic include metal matrix composites (MMC) and ceramic matrix composites (CMC). Specific examples of such composite materials include materials containing Si, SiC, and Ti, materials in which a SiC porous body is impregnated with Al and / or Si, and materials in which Al is impregnated with SiC. 2 O 3and a composite material of Si and TiC. A material containing Si, SiC, and Ti is called SiSiCTi, a material in which a porous SiC body is impregnated with Al is called AlSiC, and a material in which a porous SiC body is impregnated with Si is called SiSiC. As a conductive material used for the cooling substrate 30, AlSiC, SiSiCTi, etc., whose thermal expansion coefficient is close to that of alumina, are preferable. The cooling substrate 30 is connected to an RF power source 62 via a power supply terminal 64. A high pass filter (HPF) 63 is disposed between the cooling substrate 30 and the RF power source 62. The cooling substrate 30 has a flange portion 34 on the lower surface side, which is used to clamp the wafer stage 10 to a mounting plate 96.

[0021] The cooling substrate 30 is provided with a power supply terminal hole 36. The power supply terminal hole 36 passes through the cooling substrate 30 in the vertical direction and intersects with the coolant flow path 32. A power supply terminal 54 for applying a voltage to the wafer adsorption electrode 26 is housed in the power supply terminal hole 36. The power supply terminal 54 is a rod-shaped member extending in the vertical direction. The upper end of the power supply terminal 54 is joined to the lower surface of the wafer adsorption electrode 26. The lower end of the power supply terminal 54 reaches the lower opening of the power supply terminal hole 36 and is in contact with the conical upper end of a power supply rod 56 provided in the chamber 94. The power supply rod 56 is biased from the bottom to the top by a spring (not shown). Therefore, the upper end of the power supply rod 56 is in contact with the power supply terminal 54 The insulating tube 55 is in elastic contact with the lower end of the power supply terminal 54. An insulating tube 55 is disposed in the power supply terminal hole 36 to insert and support the power supply terminal 54. The upper end of the insulating tube 55 is joined and fixed to the ceramic base material 20. A protrusion 55a is provided on the side surface of the insulating tube 55 to come into contact with the inner wall of the power supply terminal hole 36. The protrusion 55a is provided so as to protrude radially outward. For example, two protrusions 55a may be provided in the diameter direction, three or more protrusions may be provided radially, or the protrusions 55a may be provided in an annular shape around the entire circumference of the insulating tube 55.

[0022] The metal bonding layer 40 bonds the lower surface of the ceramic substrate 20 and the upper surface of the cooling substrate 30. The metal bonding layer 40 may be, for example, a layer formed of solder or a metal brazing material. The metal bonding layer 40 is formed, for example, by TCB (thermal compression bonding). TCB refers to a known method in which a metal bonding material is sandwiched between two members to be bonded, and the two members are pressurized and bonded while being heated to a temperature below the solidus temperature of the metal bonding material. The power supply terminal hole 36 also penetrates the metal bonding layer 40 in the vertical direction.

[0023] The side surface of the outer periphery 24 of the ceramic substrate 20, the outer periphery of the metal bonding layer 40, and the side surface of the cooling substrate 30 are covered with an insulating film 42. The insulating film 42 may be, for example, a thermally sprayed film of alumina, yttria, or the like.

[0024] The wafer mounting table 10 is attached via seal rings 76, 77 onto a mounting plate 96 provided inside a chamber 94. The seal rings 76, 77 are made of metal or resin. The seal ring 76 is disposed slightly inside the outer edge of the cooling substrate 30. The seal ring 77 is disposed so as to surround the lower opening edge of the power supply terminal hole 36, and prevents the coolant from leaking out to the outside of the seal ring 77.

[0025] The outer peripheral region of the wafer mounting table 10 is attached to the mounting plate 96 by using a clamp member 70. The clamp member 70 is an annular member having a cross section in a generally inverted L-shape, and has an inner peripheral step surface 70a. With the inner peripheral step surface 70a of the clamp member 70 placed on the flange portion 34 of the cooling substrate 30 of the wafer mounting table 10, a bolt 72 is inserted from the upper surface of the clamp member 70 and screwed into a screw hole provided on the upper surface of the mounting plate 96. The bolt 72 is attached to a plurality of locations (e.g., 8 locations or 12 locations) that are provided at equal intervals along the circumferential direction of the clamp member 70. The clamp member 70 and the bolt 72 may be made of an insulating material or a conductive material (such as a metal).

[0026] The power supply rod 56 is inserted from the underside of the installation plate 96 into a through hole 97 provided in the installation plate 96 at a position facing the power supply terminal hole 36. The through hole 97 has a large diameter portion at the top and a small diameter portion at the bottom. A ring groove is provided on the inner wall of the small diameter portion of the through hole 97, and an O-ring 78 is fitted into the ring groove. The O-ring 78 is crushed in the radial direction by the power supply rod 56 and prevents the refrigerant in the power supply terminal hole 36 from leaking out below the through hole 97. One end and the other end of the refrigerant flow path 32 are connected to a refrigerant supply path and a refrigerant discharge path provided in the installation plate 96, respectively, via seal rings arranged between the cooling substrate 30 and the installation plate 96, although not shown. These seal rings prevent the refrigerant from leaking out to the outside.

[0027] Next, a manufacturing example of the wafer mounting table 10 will be described with reference to Fig. 4. Fig. 4 is a manufacturing process diagram of the wafer mounting table 10. First, a disk-shaped ceramic sintered body 120, which is the base of the ceramic substrate 20, is produced by hot-pressing and firing a ceramic powder compact (Fig. 4A). The ceramic sintered body 120 has a built-in wafer adsorption electrode 26. Next, a hole 27 is made from the bottom surface of the ceramic sintered body 120 to the wafer adsorption electrode 26 (Fig. 4B), and a power supply terminal 54 is inserted into the hole 27 to join the power supply terminal 54 and the wafer adsorption electrode 26 (Fig. 4C).

[0028] In parallel with this, two disk members 131, 133 are produced (FIG. 4D). Then, a groove 132 that will eventually become the coolant flow path 32 is formed on the lower surface of the upper disk member 131. A through hole 136a that will eventually become the power supply terminal hole 36 is formed in part of the groove 132. Furthermore, a through hole 136b that will eventually become the power supply terminal hole 36 is formed in the lower disk member 133. When the ceramic sintered body 120 is made of alumina, it is preferable that the disk members 131, 133 are made of SiSiCTi or AlSiC. This is because the thermal expansion coefficient of alumina is roughly the same as that of SiSiCTi or AlSiC.

[0029] The SiSiCTi disk member can be manufactured, for example, as follows. First, silicon carbide, metal Si, and metal Ti are mixed to produce a powder mixture. Next, the obtained powder mixture is uniaxially pressed to produce a disk-shaped compact, which is then hot-press sintered in an inert atmosphere to obtain the SiSiCTi disk member.

[0030] Next, the first metal bonding material is placed on the upper surface of the lower disk member 133. A hole penetrating in the vertical direction is provided in the first metal bonding material at a position facing the through hole 136b. Next, the upper disk member 131 is placed on the first metal bonding material, and the second metal bonding material is placed on the upper surface of the disk member 131. A hole penetrating in the vertical direction is provided in the second metal bonding material at a position facing the through hole 136a. Next, the ceramic sintered body 120 is placed on the second metal bonding material while inserting the power supply terminal 54 of the ceramic sintered body 120 into the through holes 136a and 136b of the disk members 131 and 133. As a result, a laminate is obtained in which the disk member 133, the first metal bonding material, the disk member 131, the second metal bonding material, and the ceramic sintered body 120 are laminated in order from the bottom. The laminate is heated and pressurized (TCB) to obtain the bonded body 110 (FIG. 4F).

[0031] The joined body 110 is formed by joining a ceramic sintered body 120 to the upper surface of a circular block 130, which is the base of the cooling substrate 30, via a metal joining layer 40. The circular block 130 is a laminated structure in which an upper circular plate member 131 and a lower circular plate member 133 are joined to each other via a metal joining layer. The circular block 130 has a refrigerant flow passage 32 and a power supply terminal hole 36 inside. Child hole A power supply terminal 54 is housed in 36.

[0032] For example, TCB is performed as follows. That is, the laminate is pressed and bonded at a temperature equal to or lower than the solidus temperature of the metal bonding material (for example, a temperature equal to or higher than the solidus temperature minus 20°C and equal to or lower than the solidus temperature), and then returned to room temperature. This causes the metal bonding material to become a metal bonding layer. As the metal bonding material, an Al-Mg based bonding material or an Al-Si-Mg based bonding material can be used. For example, when TCB is performed using an Al-Si-Mg based bonding material, the laminate is pressed in a heated state under a vacuum atmosphere. It is preferable to use a metal bonding material with a thickness of about 100 μm.

[0033] Next, the outer periphery of the ceramic sintered body 120 is ground to form a step, thereby forming the ceramic base material 20 having the central portion 22 and the outer periphery 24. Also, the outer periphery of the circular block 130 is ground to form a step. Yo This completes the cooling substrate 30 equipped with a flange portion 34. An insulating tube 55 is inserted into the lower opening of the power supply terminal hole 36. A power supply terminal 54 is inserted into the insulating tube 55. The upper end of the insulating tube 55 is then joined to the ceramic substrate 20. Furthermore, the side surface of the outer periphery 24 of the ceramic substrate 20, the periphery of the metal bonding layer 40, and the side surface of the cooling substrate 30 are thermally sprayed with ceramic powder to form an insulating film 42 (FIG. 4G). In this way, the wafer mounting table 10 is obtained.

[0034] Next, an example of how the wafer stage 10 is used will be described with reference to FIG. 1. The outer peripheral area of ​​the wafer stage 10 is fixed to the installation plate 96 of the chamber 94 by the clamp members 70 as described above. R The upper end of the power supply rod 56 is in elastic contact with the lower surface of the power supply terminal 54. Seal rings 76, 77 are arranged between the mounting plate 96 and the wafer mounting table 10. An electrically insulating liquid is supplied as a coolant to the coolant flow passage 32. The coolant passes through the coolant flow passage 32, and also passes through the power supply terminal hole 36 on the way. A shower head 95 is arranged on the ceiling surface of the chamber 94, which ejects process gas from a number of gas injection holes into the chamber 94. The mounting plate 96 is formed of an insulating material such as alumina.

[0035] A focus ring 12 is placed on the FR mounting surface 24a of the wafer mounting table 10, and a disk-shaped wafer W is placed on the wafer mounting surface 22a. The focus ring 12 has a step along the inner circumference of the upper end so as not to interfere with the wafer W. In this state, a DC voltage from a wafer suction DC power supply 52 is applied to the wafer suction electrode 26 to suction the wafer W onto the wafer mounting surface 22a. Then, the interior of the chamber 94 is set to a predetermined vacuum atmosphere (or reduced pressure atmosphere), and an RF voltage from an RF power supply 62 is applied to the cooling substrate 30 while a process gas is supplied from a shower head 95. Then, a plasma is generated between the wafer W and the shower head 95. Then, the plasma is used to perform CVD film formation or etching on the wafer W. The focus ring 12 is also worn out as the wafer W is subjected to plasma processing. However, since the focus ring 12 is thicker than the wafer W, the focus ring 12 is replaced after processing a plurality of wafers W.

[0036] When processing the wafer W with high-power plasma, it is necessary to efficiently cool the wafer W. In the wafer mounting table 10, a metal bonding layer 40 with high thermal conductivity is used as a bonding layer between the ceramic base material 20 and the cooling base material 30, instead of a resin layer with low thermal conductivity. Therefore, the ability to draw heat from the wafer W (heat extraction ability) is high. In addition, since the difference in thermal expansion between the ceramic base material 20 and the cooling base material 30 is small, even if the stress relaxation property of the metal bonding layer 40 is low, problems are unlikely to occur.

[0037] In the wafer mounting table 10 described above, the power supply terminal holes 36 intersect with the coolant flow paths 32. Therefore, it is not necessary to provide the coolant flow paths 32 so as to avoid the power supply terminal holes 36. This makes it possible to prevent the areas of the wafer W directly above the power supply terminal holes 36 from becoming temperature singular points.

[0038] Moreover, an electrically insulating liquid is supplied as a refrigerant to the refrigerant flow passage 32. Therefore, the power supply terminal 54 and the conductive cooling substrate 30 are insulated from each other by the electrically insulating liquid.

[0039] Furthermore, an insulating tube 55 that supports the power supply terminal 54 by inserting it therethrough is disposed in the power supply terminal hole 36. Since the power supply terminal 54 is supported by the insulating tube 55, the power supply terminal 54 can be prevented from being pushed by the flow of the refrigerant and being broken. Also, the withstand voltage between the cooling substrate 30 and the power supply terminal 54 can be increased.

[0040] Furthermore, the upper end of the insulating tube 55 is fixed to the ceramic base material 20, and a protrusion 55a that abuts against the inner wall of the power feed terminal hole 36 is provided on the side of the insulating tube 55. Therefore, the movement of the insulating tube 55 supporting the power feed terminal 54 within the power feed terminal hole 36 can be restricted by the protrusion 55a. This reliably prevents the power feed terminal 54 from being pushed by the flow of the refrigerant and being broken. Note that the protrusion 55a may be located close to the inner wall of the power feed terminal hole 36 without abutting against it.

[0041] It goes without saying that the present invention is not limited to the above-described embodiment, and can be embodied in various forms within the technical scope of the present invention.

[0042] In the embodiment described above, the insulating tube 55 is disposed to support the power supply terminal 54 by inserting it into the power supply terminal hole 36, but the insulating tube 55 may be omitted as shown in Fig. 5. Even in this case, the power supply terminal 54 and the conductive cooling substrate 30 are insulated from each other by the electrically insulating liquid.

[0043] In the above embodiment, the insulating tube 55 having the convex portion 55a on the side surface is used, but an insulating tube 55 without the convex portion 55a on the side surface may be used. Even in this case, since the power supply terminal 54 is supported by the insulating tube 55, it is possible to prevent the power supply terminal 54 from being pushed by the flow of the refrigerant and being broken.

[0044] In the above-mentioned embodiment, the cooling substrate 30 has a laminated structure in which two disk members 131, 133 are bonded as shown in FIG. 4, but is not particularly limited thereto. For example, a single-layered cooling substrate 230 may be used as the wafer mounting table 210 shown in FIG. 6. In FIG. 6, the same components as those in the above-mentioned embodiment are given the same reference numerals. The cooling substrate 230 has a coolant flow groove 282 that opens on the upper surface. The coolant flow groove 232 is formed by covering the upper opening of the coolant flow groove 282 with the metal bonding layer 40. A power supply terminal hole 236 is provided inside the coolant flow groove 232 (coolant flow groove 282). In manufacturing the wafer mounting table 210, the coolant flow groove 282 and the power supply terminal hole 236 are formed in one disk member, and then the wafer mounting table 210 is bonded to the ceramic substrate 20 by TCB using a metal bonding material. Since the cooling substrate 230 has a single-layered structure, the manufacturing cost (material cost and manufacturing cost) of the cooling substrate 230 can be reduced compared to a laminated structure.

[0045] Alternatively, a single-layered cooling substrate 330 may be used, as in the wafer mounting table 310 shown in FIG. 7. In FIG. 7, the same components as those in the above-described embodiment are denoted by the same reference numerals. The cooling substrate 330 has a coolant flow groove 382 that opens on the lower surface. The coolant flow groove 332 is formed by covering the lower opening of the coolant flow groove 382 with the installation plate 96 and the seal ring 76. The seal ring 77 may be omitted. A power supply terminal hole 336 is provided inside the coolant flow groove 332 (coolant flow groove 382). In manufacturing the wafer mounting table 310, the coolant flow groove 382 and the power supply terminal hole 336 are formed in one disc member, and then the wafer mounting table 310 is bonded to the ceramic substrate 20 by TCB using a metal bonding material. Since the cooling substrate 330 has a single-layered structure, the manufacturing cost (material cost and manufacturing cost) of the cooling substrate 330 can be reduced compared to a laminated structure. In addition, a seal member that separates adjacent coolant flow passage grooves 382 may be disposed between the lower surface of the cooling base material 330 and the upper surface of the mounting plate 96.

[0046] In the above-described embodiment, the power supply terminal hole 36 is provided between one end (inlet) and the other end (outlet) of the refrigerant flow path 32 as shown in FIG. 2, but the power supply terminal hole 36 may be provided at one or the other end of the refrigerant flow path 32.

[0047] In the above-mentioned embodiment, the cooling medium 30 is provided with one coolant flow passage 32 (one system), but the present invention is not limited to this. For example, the cooling medium flow passage 32 may be provided with two or more lines, one line may be provided with a power supply terminal hole 36 so as to intersect with the other lines, and the other lines may not be provided with the power supply terminal hole 36. FIG. 8 shows an example of this. FIG. 8 is a plan view of another example of the wafer mounting table 10, and the same components as those in the above-mentioned embodiment are given the same reference numerals. The cooling medium flow passage 432 has a first line 432a and a second line 432b. The first line 432a and the second line 432b are provided from one end (inlet) to the other end (outlet) in a single stroke in a plan view without intersecting with each other. The one end (inlet) and the other end (outlet) are provided at different positions in a plan view. The first line 432a and the second line 432b are supplied with and discharged from each other individually. The second line 432b has a power supply terminal hole 36, but the first line 432a does not have a power supply terminal hole 36. The power supply terminal hole 36 may be provided at one end (or the other end) of the second line 432b as shown in FIG. 8, or between one end and the other end of the second line 432b. The power supply terminal hole 36 may not be provided at the second line 432b, but may be provided at the first line 432a. When there are multiple power supply terminals and the multiple power supply terminals are housed in individual power supply terminal holes, some of the multiple power supply terminal holes may be provided at the first line 432a and the rest may be provided at the second line 432b. Alternatively, a line may be provided for each power supply terminal hole 36, and the refrigerant may be supplied and discharged separately for each line.

[0048] In the above-described embodiment, holes may be provided through the wafer mounting table 10 so as to extend from the lower surface of the cooling substrate 30 to the wafer mounting surface 22a. Examples of such holes include gas supply holes for supplying a thermally conductive gas (e.g., He gas) to the rear surface of the wafer W, and lift pin holes for inserting lift pins for raising and lowering the wafer W relative to the wafer mounting surface 22a. The thermally conductive gas is supplied to a space formed by the wafer W and a large number of small protrusions (not shown) provided on the wafer mounting surface 22a. When the wafer W is supported by, for example, three lift pins, the lift pin holes are provided in three locations.

[0049] In the above-described embodiment, the cooling substrate 30 is made of a brittle conductive material, but the cooling substrate 30 may be made of another brittle material (e.g., an alumina material). Alternatively, the cooling substrate 30 may be made of a metal such as aluminum or an aluminum alloy.

[0050] In the above-described embodiment, the wafer attracting electrode 26 is built into the central portion 22 of the ceramic base material 20, but instead of or in addition to this, an RF electrode for generating plasma or a heater electrode (resistance heating element) may be built into the central portion 22 of the ceramic base material 20. The wafer attracting electrode 26 may also serve as an RF electrode. A focus ring (FR) attracting electrode, an RF electrode, or a heater electrode may be built into the outer circumferential portion 24 of the ceramic base material 20.

[0051] In the above-described embodiment, the ceramic sintered body 120 in FIG. 4A was produced by hot-press sintering a ceramic powder compact. However, the compact may be produced by stacking a plurality of tape compacts, by a mold casting method, or by compressing ceramic powder.

[0052] In the above-described embodiment, the ceramic base 20 and the cooling base 30 are joined by the metal joining layer 40. However, instead of the metal joining layer 40, a resin joining layer may be used. [Explanation of symbols]

[0053] 10 wafer mounting table, 12 focus ring, 20 ceramic substrate, 22 center portion, 22a wafer mounting surface, 24 outer periphery, 24a focus ring mounting surface, 26 wafer suction electrode, 27 hole, 30 cooling substrate, 32 coolant flow path, 34 flange portion, 36 power supply terminal hole, 40 metal bonding layer, 42 insulating film, 52 wafer suction DC power source, 54 power supply terminal, 55 insulating tube, 55a protrusion, 56 power supply rod, 62 RF power source, 64 power supply terminal, 70 clamp member, 70a inner peripheral step surface, 72 bolt, 76, 77 seal ring, 78 O-ring, 94 chamber, 95 shower head, 96 installation plate, 97 through hole, 110 joint, 120 ceramic sintered body, 130 circular block, 131, 133 Circular plate member, 132 groove, 136a, 136b through holes, 210 wafer mounting base, 230 cooling substrate, 232 refrigerant flow path, 236 power supply terminal hole, 282 refrigerant flow path groove, 310 wafer mounting base, 330 cooling substrate, 332 refrigerant flow path, 336 power supply terminal hole, 382 refrigerant flow path groove, 432 refrigerant flow path, 432a first line, 432b second line.

Claims

1. a ceramic substrate having a wafer mounting surface on an upper surface thereof and incorporating an electrode; a cooling substrate bonded to a lower surface of the ceramic substrate and having a refrigerant flow path formed therein; A power supply terminal connected to the electrode; a power supply terminal hole that penetrates the cooling base material in the vertical direction and accommodates the power supply terminal; Equipped with The power supply terminal hole intersects with the refrigerant flow path and is in communication with the refrigerant flow path. Wafer placement stage.

2. An electrically insulating liquid is supplied to the coolant flow path. The wafer stage according to claim 1 .

3. An insulating tube is disposed in the power supply terminal hole to insert and support the power supply terminal. The wafer stage according to claim 1 .

4. an upper end of the insulating tube is fixed to the ceramic base material, and a side surface of the insulating tube has a protrusion that abuts against or is close to an inner wall of the power supply terminal hole; The wafer stage according to claim 3 .

5. The cooling substrate has a single layer structure. The wafer stage according to claim 1 .

6. The refrigerant flow path has a refrigerant flow path groove provided on the upper surface or the lower surface of the cooling substrate. The wafer stage according to claim 5 .

7. The refrigerant flow path includes a plurality of lines each extending from one end to the other end in a single stroke in a plan view, The power supply terminal hole is provided in one or more of the plurality of lines. The wafer stage according to claim 1 .

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