Solid-state imaging device and electronic device

Abstract

A solid-state imaging device comprises: a transmittal transistor having a vertical gate electrode; and an element separation unit, at least a part of which is positioned separated from the vertical gate electrode with a semiconductor layer interposed therebetween, the semiconductor layer having a high concentration of first-electroconductivity-type impurities, and the element separation unit being constituted from an oxide film insulator.

Description

[Technical field]

[0001] The present disclosure relates to a solid-state imaging device and an electronic device. [Background technology]

[0002] Solid-state imaging devices are used in, for example, imaging devices such as digital still cameras and video cameras, and electronic devices such as mobile terminal devices having an imaging function. As a solid-state imaging device, a CMOS (complementary MOS) image sensor that reads out charges accumulated in a photodiode, which is a photoelectric conversion element, via a MOS (Metal Oxide Semiconductor) transistor is known (see, for example, Patent Documents 1 to 3). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] International Publication WO2018 / 221261 [Patent Document 2] JP 2010-283086 A [Patent Document 3] JP 2018-148116 A Summary of the Invention

[0004] However, in solid-state imaging devices, there is a demand for suppressing dark current and improving transfer characteristics. Therefore, it is desirable to provide a solid-state imaging device capable of suppressing dark current and improving transfer characteristics, and an electronic device equipped with the same.

[0005] A solid-state imaging device according to an embodiment of the present disclosure includes a semiconductor substrate having a light receiving surface and a plurality of pixels arranged opposite to the light receiving surface. Each pixel has a photoelectric conversion unit, a charge holding unit, a transfer transistor, an element isolation unit, and a semiconductor layer. The photoelectric conversion unit photoelectrically converts light incident through the light receiving surface. The charge holding unit is formed as a semiconductor region of a second conductivity type different from the first conductivity type in a semiconductor region of a first conductivity type of the semiconductor substrate, and holds charges transferred from the photoelectric conversion unit. The transfer transistor has a vertical gate electrode reaching the photoelectric conversion unit, and a gate insulating film in contact with the vertical gate electrode and formed on the surface of the semiconductor substrate opposite to the light receiving surface, and transfers charges from the photoelectric conversion unit to the charge holding unit. The element isolation unit is composed of an oxide film insulator formed near the surface of the semiconductor substrate opposite to the light receiving surface. The semiconductor layer is a layer in contact with the side and bottom of the element isolation unit and in contact with the gate insulating film, and has a higher concentration of impurities of the first conductivity type than the semiconductor region. At least a part of the element isolation portion is disposed away from the vertical gate electrode with a portion of the semiconductor layer in contact with the gate insulating film therebetween.

[0006] According to an embodiment of the present disclosure, an electronic device includes a solid-state imaging device that outputs pixel signals in response to incident light, and a signal processing circuit that processes the pixel signals. The solid-state imaging device provided in the electronic device has the same configuration as the solid-state imaging device described above.

[0007] In the solid-state imaging device and electronic device according to an embodiment of the present disclosure, a transfer transistor having a vertical gate electrode is provided, and at least a part of an element isolation portion made of an oxide film insulator is disposed away from the vertical gate electrode with a semiconductor layer having a high concentration of impurities of a first conductivity type therebetween. This makes it possible to improve transfer characteristics while suppressing dark current even when the element isolation portion is disposed close to the vertical gate electrode. [Brief description of the drawings]

[0008] [Figure 1] 1 is a diagram illustrating an example of a schematic configuration of a solid-state imaging device according to an embodiment of the present disclosure. [Diagram 2]2 is a diagram illustrating an example of a circuit configuration of a sensor pixel in FIG. [Diagram 3] 2 is a diagram illustrating an example of a planar configuration of a sensor pixel in FIG. 1. [Figure 4] 4 is a diagram illustrating an example of a cross-sectional configuration of a sensor pixel taken along line AA in FIG. 3. [Diagram 5] 4 is a diagram illustrating an example of a cross-sectional configuration of a sensor pixel taken along line BB in FIG. 3. [Figure 6] 5 is a diagram illustrating a modified example of the cross-sectional configuration of the sensor pixel in FIG. [Figure 7] 6 is a diagram illustrating a modified example of the cross-sectional configuration of the sensor pixel in FIG. 5. [Figure 8] 5 is a diagram illustrating a modified example of the cross-sectional configuration of the sensor pixel in FIG. [Figure 9] 6 is a diagram illustrating a modified example of the cross-sectional configuration of the sensor pixel in FIG. 5. [Figure 10] 5 is a diagram illustrating a modified example of the cross-sectional configuration of the sensor pixel in FIG. [Figure 11] 6 is a diagram illustrating a modified example of the cross-sectional configuration of the sensor pixel in FIG. 5. [Figure 12] 6 is a diagram illustrating a modified example of the cross-sectional configuration of the sensor pixel in FIG. 5. [Figure 13] 3 is a diagram illustrating a modified example of the circuit configuration of the sensor pixel in FIG. 2. [Figure 14] 5 is a diagram illustrating a modified example of the cross-sectional configuration of the sensor pixel in FIG. [Figure 15] FIG. 1 is a diagram illustrating an example of a schematic configuration of an imaging system including an imaging device according to the above embodiment and its modified example. [Figure 16] 16 is a diagram illustrating an example of an imaging procedure in the imaging system of FIG. 15. [Figure 17] 1 is a block diagram showing an example of a schematic configuration of a vehicle control system; [Figure 18] 4 is an explanatory diagram showing an example of the installation positions of an outside-vehicle information detection unit and an imaging unit; FIG. [Figure 19] 1 is a diagram illustrating an example of a schematic configuration of an endoscopic surgery system. [Figure 20]2 is a block diagram showing an example of a functional configuration of a camera head and a CCU. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0009] Hereinafter, preferred embodiments of the present disclosure will be described in detail with reference to the accompanying drawings. In this specification and the drawings, components having substantially the same functional configurations are denoted by the same reference numerals, and redundant description will be omitted.

[0010] In addition, in this specification and drawings, multiple components having substantially the same or similar functional configurations may be distinguished by adding different numbers after the same reference symbol. However, if there is no particular need to distinguish between multiple components having substantially the same or similar functional configurations, only the same reference symbol will be used. Furthermore, similar components in different embodiments may be distinguished by adding different alphabets after the same reference symbol. However, if there is no particular need to distinguish between similar components, only the same reference symbol will be used.

[0011] In addition, the drawings referred to in the following description are drawings for explaining and understanding one embodiment of the present disclosure, and for the sake of clarity, the shapes, dimensions, ratios, etc. shown in the drawings may differ from the actual ones. Furthermore, the solid-state imaging element shown in the drawings may be appropriately modified in design with reference to the following explanation and known techniques. In addition, in the explanation using a cross-sectional view of the solid-state imaging element, the up-down direction of the stacked structure of the solid-state imaging element corresponds to the relative direction when the incident surface on which light is incident on the solid-state imaging element is set to the top, and may differ from the up-down direction according to the actual gravitational acceleration.

[0012] Furthermore, in the following description, expressions relating to size and shape do not necessarily mean values ​​identical to mathematically defined numerical values ​​or geometrically defined shapes, but also include shapes that have industrially acceptable differences in the manufacturing process of solid-state imaging devices or shapes that are similar to those shapes.

[0013] Furthermore, in the following description of the circuit configuration, unless otherwise specified, "connection" means electrical connection between multiple elements. In addition, in the following description, "connection" includes not only cases where multiple elements are directly and electrically connected, but also cases where multiple elements are indirectly and electrically connected via other elements.

[0014] The explanation will be given in the following order. 1. Embodiment (Solid-state imaging device)...FIGS. 1 to 5 2. Modifications (solid-state imaging device)...FIGS. 6 to 14 3. Application example (imaging system)…Fig. 15, Fig. 16 4. Application Examples Application examples for moving objects: Figures 17 and 18 Application example to endoscopic surgery system...Figures 19 and 20

[0015] <1. Preferred embodiment> [composition] 1 illustrates an example of a schematic configuration of a solid-state imaging device 1 according to an embodiment of the present disclosure. The solid-state imaging device 1 includes a pixel array section 10 in which a plurality of sensor pixels 11 are arranged in a matrix. The pixel array section 10 has a configuration in which a plurality of sensor pixels 11 are stacked on a semiconductor substrate 12 made of, for example, silicon. The plurality of sensor pixels 11 are arranged in a matrix at positions facing a light receiving surface 11A, which is the back surface of the semiconductor substrate 12. In other words, the pixel array section 10 includes a semiconductor substrate 12 having a light receiving surface 11A and a plurality of sensor pixels 11 arranged facing the light receiving surface 11A.

[0016] The pixel array section 10 further includes a plurality of pixel driving lines and a plurality of vertical signal lines VSL on a semiconductor substrate 12 made of, for example, silicon. The pixel driving lines are wirings to which control signals for controlling the output of electric charges accumulated in the sensor pixels 11 are applied, and extend, for example, in the row direction. The vertical signal lines VSL are wirings for outputting pixel signals output from each sensor pixel 11 to the logic circuit 20, and extend, for example, in the column direction. The logic circuit 20 is provided, for example, on the semiconductor substrate 12 and around the pixel array section 10. The logic circuit 20 may be provided on a semiconductor substrate or a semiconductor layer formed on the semiconductor substrate 12. The logic circuit 20 includes, for example, a vertical driving circuit 21, a column signal processing circuit 22, a horizontal driving circuit 23, a system control circuit 24, and an output circuit 25. Details of each block of the solid-state imaging device 1 according to this embodiment will be described below.

[0017] (Vertical drive circuit 21) The vertical drive circuit 21 is formed of, for example, a shift register. The vertical drive circuit 21 selects a pixel drive line 42, supplies a pulse for driving the sensor pixel 11 to the selected pixel drive line 42, and drives the sensor pixel 11 in a predetermined unit pixel row. The vertical drive circuit 21 sequentially selects and scans each sensor pixel 11 in the pixel array section 10 in the vertical direction (up and down direction in FIG. 1) in the predetermined unit pixel row, and supplies a pixel signal based on a charge generated according to the amount of light received by the photodiode PD of each sensor pixel 11 to the column signal processing circuit 22 via a vertical signal line VSL.

[0018] (Column signal processing circuit 22) The column signal processing circuit 22 is arranged for each column of the sensor pixels 11, and performs signal processing such as noise removal for each pixel column on pixel signals output from the sensor pixels 11 of a predetermined unit pixel row. The column signal processing circuit 22 performs, for example, correlated double sampling (CDS) processing to remove fixed pattern noise specific to each pixel. The column signal processing circuit 22 includes, for example, a single-slope A / D converter. The single-slope A / D converter includes, for example, a comparator and a counter circuit, and performs AD (Analog-Digital) conversion on the pixel signals.

[0019] (Horizontal drive circuit 23) The horizontal drive circuit 23 is configured by, for example, a shift register. The horizontal drive circuit 23 sequentially outputs horizontal scanning pulses to select each of the above-mentioned column signal processing circuits 22 in order, and causes each of the column signal processing circuits 22 to output a pixel signal to a horizontal signal line.

[0020] (Output circuit 25) The output circuit 25 performs signal processing on the pixel signals sequentially supplied from each of the column signal processing circuits 22 via the horizontal signal line, and outputs the pixel signals obtained thereby. The output circuit 25 may function as a functional unit that performs, for example, buffering, and may perform processing such as black level adjustment, column variation correction, and various digital signal processing. Buffering refers to temporarily storing pixel signals to compensate for differences in processing speed and transfer speed when exchanging pixel signals.

[0021] (System Control Circuit 24) The system control circuit 24 receives an input clock and data instructing an operation mode and the like, and also outputs data such as internal information of the sensor pixel 11. The system control circuit 24 generates clock signals and control signals that serve as a reference for the operation of the vertical drive circuit 21, the column signal processing circuit 22, the horizontal drive circuit 23, etc., based on a vertical synchronization signal, a horizontal synchronization signal, and a master clock. The system control circuit 24 outputs the generated clock signals and control signals to the vertical drive circuit 21, the column signal processing circuit 22, the horizontal drive circuit 23, etc.

[0022] The planar configuration example of the solid-state imaging device 1 according to this embodiment is not limited to the example shown in FIG. 1, and may include other circuits, for example.

[0023] (Sensor pixel 11) Next, the circuit configuration of the sensor pixel 11 will be described. FIG. 2 shows an example of the circuit configuration of the sensor pixel 11. As described above, the pixel array unit 10 has a plurality of sensor pixels 11. Each sensor pixel 11 has, for example, a photodiode PD that photoelectrically converts light incident through the light receiving surface 11A, and a pixel circuit. The photodiode PD corresponds to a specific example of a "photoelectric conversion unit" in the present disclosure. The pixel circuit generates a pixel signal based on the charge output from the photodiode PD, and outputs the pixel signal to the vertical signal line VSL. The pixel circuit includes a plurality of pixel transistors, and has, for example, a transfer transistor TRX, a selection transistor SEL, a reset transistor RST, and an amplification transistor AMP. The pixel transistor is, for example, a MOS (Metal-Oxide-Semiconductor) transistor. The pixel circuit further has a floating diffusion FD. The transfer transistor TRX corresponds to a specific example of a "transfer transistor" in the present disclosure. The floating diffusion FD corresponds to a specific example of a "charge holding unit" in the present disclosure.

[0024] The transfer transistor TRX is connected between the photodiode PD and the floating diffusion FD, and transfers the charge stored in the photodiode PD from the photodiode PD to the floating diffusion FD in response to a control signal applied to the gate electrode. The transfer transistor TRX transfers the charge from the photodiode PD to the floating diffusion FD. The drain of the transfer transistor TRG is electrically connected to the floating diffusion FD, and the gate of the transfer transistor TRX is connected to the pixel drive line.

[0025] The floating diffusion FD is a floating diffusion region that temporarily holds the charge transferred from the photodiode PD via the transfer transistor TRX. For example, a reset transistor RST is connected to the floating diffusion FD, and a vertical signal line VSL is connected to the floating diffusion FD via an amplification transistor AMP and a selection transistor SEL.

[0026] In the reset transistor RST, the drain is connected to the power supply line VDD, and the source is connected to the floating diffusion FD. The reset transistor RST initializes (resets) the floating diffusion FD in response to a control signal applied to the gate electrode. For example, when the reset transistor RST is turned on, the potential of the floating diffusion FD is reset to the potential level of the power supply line VDD. That is, the floating diffusion FD is initialized.

[0027] The amplifier transistor AMP has a gate electrode connected to the floating diffusion FD and a drain connected to a power supply line VDD, and serves as an input section of a source follower circuit that reads out charges obtained by photoelectric conversion in the photodiode PD. That is, the amplifier transistor AMP has a source connected to the vertical signal line VSL via the selection transistor SEL, and thus constitutes a source follower circuit together with a constant current source connected to one end of the vertical signal line VSL.

[0028] The selection transistor SEL is connected between the source of the amplification transistor AMP and the vertical signal line VSL, and a control signal is supplied to the gate electrode of the selection transistor SEL as a selection signal. When the control signal is turned on, the selection transistor SEL is turned on, and the sensor pixel 11 connected to the selection transistor SEL is turned on. When the sensor pixel 11 is turned on, a pixel signal output from the amplification transistor AMP is read out to the column signal processing circuit 22 via the vertical signal line VSL.

[0029] Next, the structure of the sensor pixel 11 will be described. Fig. 3 shows an example of a planar configuration of the sensor pixel 11. Fig. 4 shows an example of a cross-sectional configuration of the sensor pixel 11 taken along line AA in Fig. 3. Fig. 5 shows an example of a cross-sectional configuration of the sensor pixel 11 taken along line BB in Fig. 3.

[0030] A pixel circuit including, for example, a transfer transistor TRX is formed on the upper surface of the semiconductor substrate 12. Therefore, the upper surface of the semiconductor substrate 12 serves as a formation surface 11B on which the transfer transistor TRX and the like are formed. Note that a part of the pixel circuit (for example, the selection transistor SEL, the amplification transistor, and the reset transistor RST) may be formed in a semiconductor substrate or semiconductor layer formed on the upper surface (formation surface 11B) side of the semiconductor substrate 12. For example, a wiring layer including wiring in the pixel circuit is formed in contact with the upper surface (formation surface 11B) of the semiconductor substrate 12.

[0031] The semiconductor substrate 12 is made of, for example, a silicon substrate. The semiconductor substrate 12 has a semiconductor region (well layer 14) of a first conductivity type (e.g., P type) in and near a part of the upper surface (formation surface 11B), and has a semiconductor region deeper than the well layer 14 that has a lower concentration of impurities of the first conductivity type (e.g., P type) than the well layer 14.

[0032] The semiconductor substrate 12 has a semiconductor region 13 of a second conductivity type (e.g., N type) different from the first conductivity type (e.g., P type) in a semiconductor region having a lower concentration of impurities of a first conductivity type (e.g., P type) than the well layer 14. A photodiode PD is formed by a PN junction between the semiconductor region 13 and a semiconductor region having the first conductivity type (e.g., P type) adjacent to the semiconductor region 13. The photodiode PD photoelectrically converts light incident through the light receiving surface 11A, which is the back surface of the semiconductor substrate 12. The photodiode PD performs photoelectric conversion to generate charges according to the amount of received light. The cathode of the photodiode PD is electrically connected to the source of the transfer transistor TRG, and the anode of the photodiode PD is electrically connected to a reference potential line (e.g., ground GND).

[0033] The semiconductor substrate 12 has an insulating film 15 used as a gate oxide film of the transfer transistor TRX on a part of the upper surface (formation surface 11B). The insulating film 15 is, for example, a silicon oxide film formed by performing thermal oxidation on the surface of the silicon substrate. The semiconductor substrate 12 has a semiconductor layer 17 having a higher concentration of impurities of a first conductivity type (e.g., P type) than the well layer 14 in a layer between the well layer 14 and the insulating film 15 near the upper surface (formation surface 11B). The semiconductor layer 17 corresponds to a specific example of a "semiconductor layer" in the present disclosure. The semiconductor layer 17 is formed in contact with the insulating film 15 and the well layer 14. The semiconductor layer 17 is also formed in contact with the side and bottom surfaces of the element isolation portion 16 described later.

[0034] The transfer transistor TRX has a vertical gate electrode VG as a gate electrode. The vertical gate electrode VG is formed in the semiconductor substrate 12 so as to extend in the thickness direction of the semiconductor substrate 12 except for its upper end (umbrella-shaped portion). The lower end of the vertical gate electrode VG is formed to a depth that reaches the photodiode PD, for example. The upper end of the vertical gate electrode VG is formed in contact with the upper surface of the semiconductor substrate 12. The vertical gate electrode VG is formed, for example, by filling a trench provided in the semiconductor substrate 12, the inner wall of which is covered with an insulating film 15, with a conductive material such as a metal material or polysilicon. The insulating film 15 in the trench is formed, for example, by subjecting the inner wall of the trench provided in the semiconductor substrate 12 to thermal oxidation or the like. The conductive material is filled in the trench by, for example, CVD (Chemical Vapor Deposition) or the like.

[0035] The transfer transistor TRX has an insulating film 15 as a gate oxide film. The insulating film 15 corresponds to a specific example of a "gate oxide film" in the present disclosure. The insulating film 15 is formed on the upper surface of the semiconductor substrate 12 (the surface (formation surface 11B) opposite to the light-receiving surface 11A). The insulating film 15 is formed in contact with a portion of the vertical gate electrode VG other than the upper end portion (umbrella-shaped portion).

[0036] The floating diffusion FD is disposed, for example, away from a portion of the vertical gate electrode VG other than the upper end portion (umbrella-shaped portion). The floating diffusion FD may be disposed away from the vertical gate electrode VG when viewed from the normal direction of the semiconductor substrate 12. A semiconductor region having a lower concentration of impurities of the second conductivity type (e.g., N-type) than the floating diffusion FD may be provided around the floating diffusion FD. In this case, the semiconductor region may be disposed at a position where at least a portion of the semiconductor region overlaps with the vertical gate electrode VG when viewed from the normal direction of the semiconductor substrate 12.

[0037] Each sensor pixel 11 has an element isolation portion 16 on the upper surface (formation surface 11B) of the semiconductor substrate 12. The element isolation portion 16 corresponds to a specific example of an "element isolation portion" of the present disclosure. The element isolation portion 16 is formed near the surface (formation surface 11B) of the semiconductor substrate 12 opposite to the light receiving surface 11A. The element isolation portion 16 electrically isolates two adjacent sensor pixels 11 from each other on the upper surface (formation surface 11B) of the semiconductor substrate 12 and its vicinity. The lower end of the element isolation portion 16 is provided, for example, at a depth of the semiconductor substrate 12 that does not reach the depth at which the photodiode PD is formed. At least a part of the element isolation portion 16 is disposed apart from a portion of the vertical gate electrode VG other than the upper end (umbrella-shaped portion) with the semiconductor layer 17 therebetween. At least a part of the element isolation portion 16 is disposed apart from a portion of the vertical gate electrode VG other than the upper end (umbrella-shaped portion) with the semiconductor layer 17 in between.

[0038] The semiconductor layer 17 is formed in the vicinity of the upper surface (formation surface 11B) of the semiconductor substrate 12. The semiconductor layer 17 is formed in contact with the side and bottom surfaces of the element isolation portion 16, and further extends from the element isolation portion 16 side toward the vertical gate electrode VG in the vicinity of the upper surface (formation surface 11B) of the semiconductor substrate 12. The semiconductor layer 17 is disposed at a position where a part of the semiconductor layer 17 overlaps with the vertical gate electrode VG when viewed from the normal direction of the semiconductor substrate 12.

[0039] At least a part of the element isolation portion 16 may be disposed away from the vertical gate electrode VG when viewed from the normal direction of the semiconductor substrate 12. Any part of the element isolation portion 16 may be disposed away from the vertical gate electrode VG when viewed from the normal direction of the semiconductor substrate 12. The element isolation portion 16 is formed of, for example, an oxide film insulator such as STI (Shallow Trench Isolation). The STI is formed, for example, by filling a trench formed in the semiconductor substrate 12 with silicon oxide by CVD or the like.

[0040] Each sensor pixel 11 may have a color filter and a light receiving lens on the back surface (light receiving surface 11A) side of the semiconductor substrate 12. In this case, the solid-state imaging device 1 includes a plurality of light receiving lenses, one for each sensor pixel 11. The plurality of light receiving lenses are provided one for each photodiode PD, and are disposed at positions facing the photodiode PD. The light receiving lens is provided, for example, in contact with the color filter, and is disposed at a position facing the photodiode PD via the color filter.

[0041] Each sensor pixel 11 may have an element isolation portion that electrically and optically isolates two photodiodes PD adjacent to each other. In this case, the element isolation portion is formed extending in the normal direction (thickness direction) of the semiconductor substrate 12, for example, penetrating the semiconductor substrate 12. The element isolation portion includes, for example, a DTI (Deep Trench Isolation) structure. The DTI is, for example, composed of an insulating film in contact with the inner wall of a trench provided from the back surface (light receiving surface 11A) side of the semiconductor substrate 12, and a metal embedded portion provided inside the insulating film. The insulating film is, for example, an oxide film formed by thermally oxidizing the semiconductor substrate 12, and is formed of, for example, silicon oxide. The metal embedded portion is formed, for example, by utilizing a substitution phenomenon caused by heat treatment, and is formed of, for example, aluminum or an aluminum alloy.

[0042] [effect] Next, the effects of the solid-state imaging device 1 according to the present embodiment will be described.

[0043] In this embodiment, a vertical transistor (transfer transistor TRX) having a vertical gate electrode VG is provided, and at least a part of the element isolation part 16 is disposed away from a portion of the vertical gate electrode VG other than the upper end part (umbrella-shaped part) with the semiconductor layer 17 therebetween. As a result, even if the element isolation part 16 is disposed close to the vertical gate electrode VG as shown in, for example, Figures 6 and 7, it is possible to improve the transfer characteristics while suppressing the dark current.

[0044] In this embodiment, the semiconductor layer 17 is provided between at least a part of the element isolation portion 16 and the vertical gate electrode VG, and further, any part of the element isolation portion 16 is disposed away from the vertical gate electrode VG when viewed from the normal direction of the semiconductor substrate 12. This makes it possible to improve the transfer characteristics while suppressing the dark current, compared to the case where the semiconductor layer 17 is not provided between the element isolation portion 16 and the vertical gate electrode VG.

[0045] <2. Modifications> Modifications of the solid-state imaging device 1 according to the above embodiment will be described below.

[0046] [Variation A] In the above embodiment, a part of the semiconductor layer 17 overlaps with the vertical gate electrode VG when viewed from the normal direction of the semiconductor substrate 12. However, in the above embodiment, for example, as shown in FIG. 8 and FIG. 9, the semiconductor layer 17 may be disposed apart from the vertical gate electrode VG when viewed from the normal direction of the semiconductor substrate 12. FIG. 8 shows a modified example of the cross-sectional configuration of the sensor pixel 11 taken along the line AA in FIG. 3. FIG. 9 shows a modified example of the cross-sectional configuration of the sensor pixel 11 taken along the line BB in FIG. 3. Even in this case, it is possible to suppress dark current and improve transfer characteristics in the same way as in the above embodiment.

[0047] [Variation B] In the above embodiment and its modified examples, the photodiode PD is formed in the semiconductor substrate 12 at a position deeper than the well layer 14. However, in the above embodiment and its modified examples, for example, as shown in FIG. 10 and FIG. 11, a part of the photodiode PD may be formed in the charge transfer path of the transfer transistor TRX. FIG. 10 shows a modified example of the cross-sectional configuration of the sensor pixel 11 taken along the line AA in FIG. 3. FIG. 11 shows a modified example of the cross-sectional configuration of the sensor pixel 11 taken along the line BB in FIG. 3. At this time, a part of the photodiode PD extends toward the upper surface (formation surface 11B) of the semiconductor substrate 12 along the vertical gate electrode VG. In this case, an improvement in the transfer characteristics can be realized.

[0048] [Variation C] In the above embodiment and its modified examples, the upper end of the vertical gate electrode VG is umbrella-shaped. However, in the above embodiment and its modified examples, for example, as shown in FIG. 12, the upper end of the vertical gate electrode VG may be omitted in a portion that is not a transfer path of the transfer gate. In this case, the dimension of the upper end of the vertical gate electrode VG in the stacking plane direction is reduced by the amount of omission. In this case, the element isolation part 16 can be brought closer to the vertical gate electrode VG by the amount of reduction in the dimension of the upper end of the vertical gate electrode VG in the stacking plane direction. As a result, the pixel size of the sensor pixel 11 can be reduced by the amount of reduction in the dimension of the upper end of the vertical gate electrode VG in the stacking plane direction.

[0049] [Variation D] In the above embodiment and its modified examples, each sensor pixel 11 may have a photodiode PD1 instead of the photodiode PD, and may further have a photodiode PD2 in addition to the photodiode PD1, as shown in Fig. 13. In this case, each pixel circuit may be configured to include a transfer transistor TGS, a pixel internal capacitance FC, an FC connection transistor FCC, and a conversion efficiency switching transistor EXC in addition to the transfer transistor TRX, the reset transistor RST, the selection transistor SEL, the amplification transistor AMP, and the floating diffusion FD, as shown in Fig. 13.

[0050] In this modification, each pixel circuit generates a pixel signal based on, for example, the charge held in the floating diffusion FD, and outputs it to the vertical signal line VSL. The photodiode PD2 performs photoelectric conversion on the light incident through the light receiving surface 11A. The photodiode PD2 performs photoelectric conversion to generate a charge according to the amount of light received. The cathode of the photodiode PD2 is electrically connected to the source of the transfer transistor TGS, and the anode of the photodiode PD2 is electrically connected to a reference potential line (for example, ground GND).

[0051] In this modification, the photodiode PD1 may generate a larger total amount of charge per unit time and per unit illuminance than the photodiode PD2. In this case, the photodiode PD1 has a higher sensitivity than the photodiode PD2, and the photodiode PD2 has a lower sensitivity than the photodiode PD1.

[0052] The transfer transistor TGS is connected between the photodiode PD2 and the node between the pixel internal capacitance FC and the FC connection transistor FCC. The transfer transistor TGS transfers the charge stored in the photodiode PD2 to the node between the pixel internal capacitance FC and the FC connection transistor FCC in response to a control signal applied to the gate electrode.

[0053] The drain of the reset transistor RST is connected to the power supply line VDD1, and the source is connected to the drain of the conversion efficiency switching transistor EXC. The reset transistor RST initializes (resets) the floating diffusion FD via the conversion efficiency switching transistor EXC in response to a control signal applied to the gate electrode. For example, when the reset transistor RST and the conversion efficiency switching transistor EXC are turned on, the potential of the floating diffusion FD is reset to the potential level of the power supply line VDD1. That is, the floating diffusion FD is initialized.

[0054] The amplification transistor AMP has a gate electrode connected to the floating diffusion FD, a drain connected to a power supply line VDD1, and a source connected to the selection transistor SEL, and serves as an input section of a source follower circuit that reads out the charge held in the floating diffusion FD. That is, the amplification transistor AMP has a source connected to the vertical signal line VSL via the selection transistor SEL, and thus constitutes a source follower circuit together with a constant current source connected to one end of the vertical signal line VSL.

[0055] The pixel internal capacitance FC is connected between a node between the FC connection transistor FCC and the transfer transistor TGS and a power supply line VDD2. The pixel internal capacitance FC accumulates the charge transferred (overflowed) from the photodiode PD2.

[0056] The FC connection transistor FCC is connected between a node between the transfer transistor TGS and the pixel internal capacitance FC and a node between the reset transistor RST and the conversion efficiency switching transistor EXC. The FC connection transistor FCC couples the capacitive potential of the floating diffusion FD and the capacitive potential of the pixel internal capacitance FC to each other in response to a control signal applied to the gate electrode.

[0057] The conversion efficiency switching transistor EXC is connected between the node between the reset transistor RST and the FC connection transistor FCC and the floating diffusion FD, and couples the capacitive potential of the floating diffusion FD and the capacitive potential of the pixel content FC to each other in response to a control signal applied to the gate electrode.

[0058] As shown in FIG. 14, the pixel internal volume FC is composed of a semiconductor region 18a of a second conductivity type (e.g., N type) formed in the semiconductor substrate 12 and an electrode 18b arranged to face the semiconductor region 18a via an insulating film 15. The pixel internal volume FC is surrounded by an element isolation section 16 and arranged at a position facing the vertical gate electrode VG with the element isolation section 16 in between. The drain of the transfer transistor TGS is composed of a semiconductor region 18c as shown in FIG. 14, for example. The semiconductor region 18c is provided adjacent to the pixel internal volume FC with the element isolation section 16 in between. The semiconductor region 18c is provided as a semiconductor region of a second conductivity type (e.g., N type) in the semiconductor substrate 12. A part of the charge stored in the photodiode PD is transferred to the pixel internal volume FC via a metal wiring 11a electrically connected to the semiconductor region 18c.

[0059] In this modification, a pixel content volume FC and a transfer transistor TGS are formed on the upper surface (forming surface 11B) of the semiconductor substrate 12. At this time, the element isolation section 16 is provided, for example, as shown in FIG. 14, between the pixel content volume FC and the vertical gate electrode VG, or between the pixel content volume FC and the transfer transistor TGS. As a result, the element isolation section 16 electrically isolates the pixel content volume FC from the transfer transistor TRX and the transfer transistor TGS. Here, the element isolation section 16 is provided, for example, in the vicinity of the vertical gate electrode VG, as shown in FIG. In this way, even when the element isolation section 16 is provided in the vicinity of the vertical gate electrode VG, it is possible to suppress dark current and improve transfer characteristics, similar to the above embodiment.

[0060] <3. Application Examples> 15 illustrates an example of a schematic configuration of an imaging system 2 including a solid-state imaging device 1 according to the above embodiment and its modified examples. The imaging system 2 corresponds to a specific example of an "electronic device" in the present disclosure.

[0061] The imaging system 2 is, for example, an electronic device such as an imaging device such as a digital still camera or a video camera, or a mobile terminal device such as a smartphone or a tablet terminal. The imaging system 2 includes, for example, the solid-state imaging device 1 according to the above-mentioned embodiment and its modified example, an optical system 31, a shutter device 32, a control circuit 33, a DSP circuit 34, a frame memory 35, a display unit 36, a storage unit 37, an operation unit 38, and a power supply unit 39. In the imaging system 2, the solid-state imaging device 1 according to the above-mentioned embodiment and its modified example, the shutter device 32, the control circuit 33, the DSP circuit 34, the frame memory 35, the display unit 36, the storage unit 37, the operation unit 38, and the power supply unit 39 are connected to each other via a bus line L.

[0062] The optical system 31 is configured with one or more lenses, and guides light (incident light) from a subject to the solid-state imaging device 1, forming an image on the light receiving surface of the solid-state imaging device 1. The shutter device 32 is disposed between the optical system 31 and the solid-state imaging device 1, and controls the light irradiation period and the light blocking period of the solid-state imaging device 1 according to the control of the control circuit 33. The solid-state imaging device 1 accumulates signal charges for a certain period according to the light imaged on the light receiving surface via the optical system 31 and the shutter device 32. The signal charges accumulated in the solid-state imaging device 1 are transferred as pixel signals (image data) to the DSP circuit 34 according to a drive signal (timing signal) supplied from the control circuit 33. That is, the solid-state imaging device 1 receives image light (incident light) incident via the optical system 31 and the shutter device 32, and outputs a pixel signal according to the received image light (incident light) to the DSP circuit 34. The control circuit 33 outputs drive signals that control the transfer operation of the solid-state imaging device 1 and the shutter operation of the shutter device 32 to drive the solid-state imaging device 1 and the shutter device 32 .

[0063] The DSP circuit 34 is a signal processing circuit that processes pixel signals (image data) output from the solid-state imaging device 1. The frame memory 35 temporarily holds the image data processed by the DSP circuit 34 on a frame-by-frame basis. The display unit 36 ​​is formed of a panel-type display device such as a liquid crystal panel or an organic EL (Electro Luminescence) panel, and displays a moving image or a still image captured by the solid-state imaging device 1. The storage unit 147 records image data of the moving image or the still image captured by the solid-state imaging device 1 in a recording medium such as a semiconductor memory or a hard disk. The operation unit 38 issues operation commands for various functions of the imaging system 2 according to the user's operation. The power supply unit 39 appropriately supplies various power sources that serve as operating power sources for the solid-state imaging device 1, the shutter device 32, the control circuit 33, the DSP circuit 34, the frame memory 35, the display unit 36, the storage unit 37, and the operation unit 38 to these supply targets.

[0064] Next, the imaging procedure in the imaging system 2 will be described.

[0065] 16 shows an example of a flowchart of the imaging operation in the imaging system 2. The user issues an instruction to start imaging by operating the operation unit 38 (step S101). The operation unit 38 then transmits an imaging command to the control circuit 33 (step S102). Upon receiving the imaging command, the control circuit 33 starts controlling the shutter device 32 and the solid-state imaging device 1. The solid-state imaging device 1 (specifically, the system control circuit 24) performs imaging in a predetermined imaging method under the control of the control circuit 33 (step S103). The shutter device 32 controls the light irradiation period and the light blocking period for the solid-state imaging device 1 under the control of the control circuit 33.

[0066] The solid-state imaging device 1 outputs image data obtained by imaging to the DSP circuit 34. Here, the image data refers to data for all pixels of pixel signals generated based on charges temporarily stored in the floating diffusion FD. The DSP circuit 34 performs predetermined signal processing (e.g., noise reduction processing, etc.) based on the image data input from the solid-state imaging device 1 (step S104). The DSP circuit 34 stores the image data that has been subjected to the predetermined signal processing in the frame memory 35, and the frame memory 35 stores the image data in the storage unit 37 (step S105). In this manner, imaging is performed in the imaging system 2.

[0067] In this application example, the solid-state imaging device 1 according to the above-described embodiment and its modified example is applied to an imaging system 2. This makes it possible to obtain a high-definition image with little noise.

[0068] <4. Application Examples> [Application example 1] The technology according to the present disclosure (the present technology) can be applied to various products. For example, the technology according to the present disclosure may be realized as a device mounted on any type of moving body such as an automobile, an electric vehicle, a hybrid electric vehicle, a motorcycle, a bicycle, a personal mobility device, an airplane, a drone, a ship, a robot, etc.

[0069] FIG. 17 is a block diagram showing a schematic configuration example of a vehicle control system, which is an example of a moving object control system to which the technology according to the present disclosure can be applied.

[0070] The vehicle control system 12000 includes a plurality of electronic control units connected via a communication network 12001. In the example shown in Fig. 17, the vehicle control system 12000 includes a drive system control unit 12010, a body system control unit 12020, an outside-vehicle information detection unit 12030, an inside-vehicle information detection unit 12040, and an integrated control unit 12050. Also, as functional configurations of the integrated control unit 12050, a microcomputer 12051, an audio / video output unit 12052, and an in-vehicle network I / F (interface) 12053 are illustrated.

[0071] The drivetrain control unit 12010 controls the operation of devices related to the drivetrain of the vehicle in accordance with various programs. For example, the drivetrain control unit 12010 functions as a control device for a drive force generating device for generating a drive force of the vehicle, such as an internal combustion engine or a drive motor, a drive force transmission mechanism for transmitting the drive force to the wheels, a steering mechanism for adjusting the steering angle of the vehicle, and a braking device for generating a braking force of the vehicle.

[0072] The body system control unit 12020 controls the operation of various devices mounted on the vehicle body according to various programs. For example, the body system control unit 12020 functions as a control device for a keyless entry system, a smart key system, a power window device, or various lamps such as head lamps, back lamps, brake lamps, turn signals, and fog lamps. In this case, radio waves or signals of various switches transmitted from a portable device that replaces a key may be input to the body system control unit 12020. The body system control unit 12020 receives the input of these radio waves or signals and controls the door lock device, power window device, lamps, and the like of the vehicle.

[0073] The outside-vehicle information detection unit 12030 detects information outside the vehicle equipped with the vehicle control system 12000. For example, an imaging unit 12031 is connected to the outside-vehicle information detection unit 12030. The outside-vehicle information detection unit 12030 causes the imaging unit 12031 to capture an image outside the vehicle and receives the captured image. The outside-vehicle information detection unit 12030 may perform object detection processing or distance detection processing for a person, a car, an obstacle, a sign, or characters on a road surface, based on the received image.

[0074] The imaging unit 12031 is an optical sensor that receives light and outputs an electrical signal according to the amount of light received. The imaging unit 12031 can output the electrical signal as an image, or as distance measurement information. The light received by the imaging unit 12031 may be visible light or invisible light such as infrared light.

[0075] The in-vehicle information detection unit 12040 detects information inside the vehicle. For example, a driver state detection unit 12041 that detects the state of the driver is connected to the in-vehicle information detection unit 12040. The driver state detection unit 12041 includes, for example, a camera that captures an image of the driver, and the in-vehicle information detection unit 12040 may calculate the degree of fatigue or concentration of the driver based on the detection information input from the driver state detection unit 12041, or may determine whether the driver is dozing.

[0076] The microcomputer 12051 can calculate control target values ​​for the driving force generating device, the steering mechanism, or the braking device based on the information inside and outside the vehicle acquired by the outside-of-vehicle information detection unit 12030 or the inside-vehicle information detection unit 12040, and output a control command to the drive system control unit 12010. For example, the microcomputer 12051 can perform cooperative control aimed at realizing the functions of an ADAS (Advanced Driver Assistance System), including vehicle collision avoidance or impact mitigation, following driving based on the inter-vehicle distance, vehicle speed maintenance driving, vehicle collision warning, vehicle lane departure warning, etc.

[0077] In addition, the microcomputer 12051 can perform cooperative control for the purpose of autonomous driving, which allows the vehicle to travel autonomously without relying on the driver's operation, by controlling the driving force generating device, steering mechanism, braking device, etc. based on information about the surroundings of the vehicle acquired by the outside vehicle information detection unit 12030 or the inside vehicle information detection unit 12040.

[0078] Furthermore, the microcomputer 12051 can output a control command to the body system control unit 12020 based on the information outside the vehicle acquired by the outside-vehicle information detection unit 12030. For example, the microcomputer 12051 can control the headlamps according to the position of a preceding vehicle or an oncoming vehicle detected by the outside-vehicle information detection unit 12030, and perform cooperative control for the purpose of preventing glare, such as switching from high beams to low beams.

[0079] The audio / video output unit 12052 transmits at least one output signal of audio and video to an output device capable of visually or audibly notifying information to passengers in the vehicle or the outside of the vehicle. In the example of Fig. 17, an audio speaker 12061, a display unit 12062, and an instrument panel 12063 are exemplified as the output device. The display unit 12062 may include at least one of an on-board display and a head-up display, for example.

[0080] FIG. 18 is a diagram showing an example of the installation position of the imaging unit 12031.

[0081] In FIG. 18, a vehicle 12100 has imaging units 12101, 12102, 12103, 12104, and 12105 as an imaging unit 12031.

[0082] The imaging units 12101, 12102, 12103, 12104, and 12105 are provided at positions such as the front nose, side mirrors, rear bumper, back door, and the upper part of the windshield inside the vehicle cabin of the vehicle 12100. The imaging unit 12101 provided at the front nose and the imaging unit 12105 provided at the upper part of the windshield inside the vehicle cabin mainly acquire images of the front of the vehicle 12100. The imaging units 12102 and 12103 provided at the side mirrors mainly acquire images of the sides of the vehicle 12100. The imaging unit 12104 provided at the rear bumper or back door mainly acquires images of the rear of the vehicle 12100. The images of the front acquired by the imaging units 12101 and 12105 are mainly used to detect a preceding vehicle, a pedestrian, an obstacle, a traffic light, a traffic sign, a lane, or the like.

[0083] 18 shows an example of the imaging ranges of the imaging units 12101 to 12104. An imaging range 12111 indicates the imaging range of the imaging unit 12101 provided on the front nose, imaging ranges 12112 and 12113 indicate the imaging ranges of the imaging units 12102 and 12103 provided on the side mirrors, respectively, and an imaging range 12114 indicates the imaging range of the imaging unit 12104 provided on the rear bumper or back door. For example, an overhead image of the vehicle 12100 viewed from above is obtained by superimposing the image data captured by the imaging units 12101 to 12104.

[0084] At least one of the imaging units 12101 to 12104 may have a function of acquiring distance information. For example, at least one of the imaging units 12101 to 12104 may be a stereo camera made up of a plurality of imaging elements, or may be an imaging element having pixels for detecting a phase difference.

[0085] For example, the microcomputer 12051 can extract, as a preceding vehicle, a three-dimensional object that is the closest three-dimensional object on the travel path of the vehicle 12100 and travels at a predetermined speed (for example, 0 km / h or more) in approximately the same direction as the vehicle 12100, by calculating the distance to each three-dimensional object in the image capture ranges 12111 to 12114 and the change over time of this distance (relative speed with respect to the vehicle 12100) based on the distance information obtained from the image capture units 12101 to 12104. Furthermore, the microcomputer 12051 can set a vehicle distance to be secured in advance in front of the preceding vehicle, and perform automatic brake control (including follow-up stop control) and automatic acceleration control (including follow-up start control). In this way, cooperative control can be performed for the purpose of automatic driving that runs autonomously without relying on the driver's operation.

[0086] For example, the microcomputer 12051 classifies and extracts three-dimensional object data on three-dimensional objects into two-wheeled vehicles, ordinary vehicles, large vehicles, pedestrians, utility poles, and other three-dimensional objects based on distance information obtained from the imaging units 12101 to 12104, and can use the data for automatic obstacle avoidance. For example, the microcomputer 12051 distinguishes obstacles around the vehicle 12100 into obstacles that are visible to the driver of the vehicle 12100 and obstacles that are difficult to see. Then, the microcomputer 12051 determines a collision risk indicating the risk of collision with each obstacle, and when the collision risk is equal to or greater than a set value and a collision is possible, the microcomputer 12051 can provide driving assistance for collision avoidance by outputting an alarm to the driver via the audio speaker 12061 or the display unit 12062, or by performing forced deceleration or avoidance steering via the drive system control unit 12010.

[0087] At least one of the imaging units 12101 to 12104 may be an infrared camera that detects infrared rays. For example, the microcomputer 12051 can recognize a pedestrian by determining whether or not a pedestrian is present in the captured images of the imaging units 12101 to 12104. The recognition of such a pedestrian is performed, for example, by a procedure of extracting feature points in the captured images of the imaging units 12101 to 12104 as infrared cameras, and a procedure of performing pattern matching processing on a series of feature points that indicate the contour of an object to determine whether or not the object is a pedestrian. When the microcomputer 12051 determines that a pedestrian is present in the captured images of the imaging units 12101 to 12104 and recognizes the pedestrian, the audio / image output unit 12052 controls the display unit 12062 to superimpose a rectangular contour line for emphasis on the recognized pedestrian. The audio / image output unit 12052 may also control the display unit 12062 to display an icon or the like indicating a pedestrian at a desired position.

[0088] An example of a mobile object control system to which the technology according to the present disclosure can be applied has been described above. The technology according to the present disclosure can be applied to the imaging unit 12031 in the configuration described above. Specifically, the solid-state imaging device 1 according to the above embodiment and its modified example can be applied to the imaging unit 12031. By applying the technology according to the present disclosure to the imaging unit 12031, it is possible to provide a mobile object control system that uses high-definition images with little noise.

[0089] [Application example 2] FIG. 19 is a diagram showing an example of a schematic configuration of an endoscopic surgery system to which the technology according to the present disclosure (the present technology) can be applied.

[0090] 19 shows a state in which an operator (doctor) 11131 is performing surgery on a patient 11132 on a patient bed 11133 using an endoscopic surgery system 11000. As shown in the figure, the endoscopic surgery system 11000 is composed of an endoscope 11100, other surgical tools 11110 such as an insufflation tube 11111 and an energy treatment tool 11112, a support arm device 11120 that supports the endoscope 11100, and a cart 11200 on which various devices for endoscopic surgery are mounted.

[0091] The endoscope 11100 is composed of a lens barrel 11101, a region of a predetermined length from the tip of which is inserted into a body cavity of a patient 11132, and a camera head 11102 connected to the base end of the lens barrel 11101. In the illustrated example, the endoscope 11100 is configured as a so-called rigid scope having a rigid lens barrel 11101, but the endoscope 11100 may be configured as a so-called flexible scope having a flexible lens barrel.

[0092] An opening into which an objective lens is fitted is provided at the tip of the lens barrel 11101. A light source device 11203 is connected to the endoscope 11100, and light generated by the light source device 11203 is guided to the tip of the lens barrel by a light guide extending inside the lens barrel 11101, and is irradiated via the objective lens toward an observation target in the body cavity of the patient 11132. The endoscope 11100 may be a direct-viewing endoscope, an oblique-viewing endoscope, or a side-viewing endoscope.

[0093] An optical system and an image sensor are provided inside the camera head 11102, and reflected light (observation light) from an observation target is collected on the image sensor by the optical system. The observation light is photoelectrically converted by the image sensor to generate an electrical signal corresponding to the observation light, i.e., an image signal corresponding to an observation image. The image signal is transmitted to a camera control unit (CCU) 11201 as RAW data.

[0094] The CCU 11201 is configured with a CPU (Central Processing Unit), a GPU (Graphics Processing Unit), etc., and performs overall control of the operations of the endoscope 11100 and the display device 11202. Furthermore, the CCU 11201 receives an image signal from the camera head 11102, and performs various types of image processing on the image signal, such as development processing (demosaic processing), for displaying an image based on the image signal.

[0095] Under the control of the CCU 11201, the display device 11202 displays an image based on an image signal that has been subjected to image processing by the CCU 11201.

[0096] The light source device 11203 is composed of a light source such as an LED (Light Emitting Diode), and supplies the endoscope 11100 with irradiation light when photographing an operation site or the like.

[0097] The input device 11204 is an input interface for the endoscopic surgery system 11000. A user can input various information and instructions to the endoscopic surgery system 11000 via the input device 11204. For example, the user inputs an instruction to change the imaging conditions (type of irradiated light, magnification, focal length, etc.) of the endoscope 11100.

[0098] The treatment tool control device 11205 controls the driving of the energy treatment tool 11112 for cauterizing tissue, incising, sealing blood vessels, etc. The insufflation device 11206 sends gas into the body cavity of the patient 11132 via the insufflation tube 11111 to inflate the body cavity for the purpose of securing the field of view of the endoscope 11100 and securing the working space of the surgeon. The recorder 11207 is a device capable of recording various information related to the surgery. The printer 11208 is a device capable of printing various information related to the surgery in various formats such as text, image, or graph.

[0099] The light source device 11203 that supplies irradiation light to the endoscope 11100 when photographing the surgical site can be composed of a white light source composed of, for example, an LED, a laser light source, or a combination of these. When the white light source is composed of a combination of RGB laser light sources, the output intensity and output timing of each color (each wavelength) can be controlled with high precision, so that the white balance of the captured image can be adjusted in the light source device 11203. In this case, it is also possible to capture images corresponding to each of the RGB colors in a time-division manner by irradiating the observation object with laser light from each of the RGB laser light sources in a time-division manner and controlling the driving of the image sensor of the camera head 11102 in synchronization with the irradiation timing. According to this method, a color image can be obtained without providing a color filter to the image sensor.

[0100] The light source device 11203 may be controlled to change the intensity of the light it outputs at predetermined time intervals. The driving of the image sensor of the camera head 11102 may be controlled in synchronization with the timing of the change in the light intensity to obtain images in a time-division manner, and the images may be synthesized to generate an image with a high dynamic range that is free of so-called blackout and whiteout.

[0101] The light source device 11203 may be configured to supply light of a predetermined wavelength band corresponding to the special light observation. In the special light observation, for example, by utilizing the wavelength dependency of light absorption in body tissue, a narrow band light is irradiated compared to the irradiated light (i.e., white light) during normal observation, and a predetermined tissue such as blood vessels on the mucous membrane surface is photographed with high contrast, so-called narrow band imaging is performed. Alternatively, in the special light observation, a fluorescent observation may be performed in which an image is obtained by fluorescence generated by irradiating an excitation light. In the fluorescent observation, it is possible to irradiate an excitation light to a body tissue and observe the fluorescence from the body tissue (autofluorescence observation), or to locally inject a reagent such as indocyanine green (ICG) into the body tissue and irradiate the body tissue with excitation light corresponding to the fluorescent wavelength of the reagent to obtain a fluorescent image. The light source device 11203 may be configured to supply narrow band light and / or excitation light corresponding to such special light observation.

[0102] FIG. 20 is a block diagram showing an example of the functional configuration of the camera head 11102 and the CCU 11201 shown in FIG.

[0103] The camera head 11102 has a lens unit 11401, an imaging unit 11402, a drive unit 11403, a communication unit 11404, and a camera head control unit 11405. The CCU 11201 has a communication unit 11411, an image processing unit 11412, and a control unit 11413. The camera head 11102 and the CCU 11201 are connected to each other by a transmission cable 11400 so as to be able to communicate with each other.

[0104] The lens unit 11401 is an optical system provided at the connection portion with the lens barrel 11101. Observation light taken in from the tip of the lens barrel 11101 is guided to the camera head 11102 and enters the lens unit 11401. The lens unit 11401 is configured by combining a plurality of lenses including a zoom lens and a focus lens.

[0105] The imaging unit 11402 is composed of an imaging element. The imaging element constituting the imaging unit 11402 may be one (so-called single-plate type) or multiple (so-called multi-plate type). When the imaging unit 11402 is composed of a multi-plate type, for example, each imaging element may generate an image signal corresponding to each of RGB, and a color image may be obtained by combining the image signals. Alternatively, the imaging unit 11402 may be configured to have a pair of imaging elements for acquiring image signals for the right eye and the left eye corresponding to 3D (Dimensional) display. By performing 3D display, the surgeon 11131 can more accurately grasp the depth of the biological tissue in the surgical site. Note that when the imaging unit 11402 is composed of a multi-plate type, multiple lens units 11401 may be provided corresponding to each imaging element.

[0106] Furthermore, the imaging unit 11402 does not necessarily have to be provided in the camera head 11102. For example, the imaging unit 11402 may be provided inside the lens barrel 11101, immediately behind the objective lens.

[0107] The driving unit 11403 is configured by an actuator, and moves the zoom lens and focus lens of the lens unit 11401 by a predetermined distance along the optical axis under the control of the camera head control unit 11405. This allows the magnification and focus of the image captured by the imaging unit 11402 to be appropriately adjusted.

[0108] The communication unit 11404 is configured by a communication device for transmitting and receiving various information to and from the CCU 11201. The communication unit 11404 transmits the image signal obtained from the imaging unit 11402 to the CCU 11201 via the transmission cable 11400 as RAW data.

[0109] Furthermore, the communication unit 11404 receives a control signal for controlling the driving of the camera head 11102 from the CCU 11201, and supplies the control signal to the camera head control unit 11405. The control signal includes information on the imaging conditions, such as information specifying the frame rate of the captured image, information specifying the exposure value at the time of capturing the image, and / or information specifying the magnification and focus of the captured image.

[0110] The image capturing conditions such as the frame rate, exposure value, magnification, and focus may be appropriately specified by a user, or may be automatically set by the control unit 11413 of the CCU 11201 based on an acquired image signal. In the latter case, the endoscope 11100 is equipped with a so-called AE (Auto Exposure) function, AF (Auto Focus) function, and AWB (Auto White Balance) function.

[0111] The camera head control unit 11405 controls the driving of the camera head 11102 based on a control signal received from the CCU 11201 via the communication unit 11404.

[0112] The communication unit 11411 is configured with a communication device for transmitting and receiving various information to and from the camera head 11102. The communication unit 11411 receives an image signal transmitted from the camera head 11102 via the transmission cable 11400.

[0113] Furthermore, the communication unit 11411 transmits, to the camera head 11102, a control signal for controlling the driving of the camera head 11102. The image signal and the control signal can be transmitted by electrical communication, optical communication, or the like.

[0114] The image processing unit 11412 performs various types of image processing on the image signal, which is RAW data sent from the camera head 11102 .

[0115] The control unit 11413 performs various controls related to imaging of the surgical site etc. by the endoscope 11100 and display of the captured image obtained by imaging the surgical site etc. For example, the control unit 11413 generates a control signal for controlling the driving of the camera head 11102.

[0116] Further, the control unit 11413 causes the display device 11202 to display the captured image showing the surgical site, etc., based on the image signal that has been image-processed by the image processing unit 11412. At this time, the control unit 11413 may recognize various objects in the captured image using various image recognition techniques. For example, the control unit 11413 can recognize surgical tools such as forceps, specific living body parts, bleeding, mist when the energy treatment tool 11112 is used, etc., by detecting the shape and color of the edge of an object included in the captured image. When the control unit 11413 causes the display device 11202 to display the captured image, it may use the recognition result to superimpose various types of surgery support information on the image of the surgical site. By superimposing and presenting the surgery support information to the surgeon 11131, the burden on the surgeon 11131 can be reduced and the surgeon 11131 can proceed with the surgery reliably.

[0117] The transmission cable 11400 connecting the camera head 11102 and the CCU 11201 is an electrical signal cable for communication of electrical signals, an optical fiber for optical communication, or a composite cable of these.

[0118] Here, in the illustrated example, communication is performed wired using a transmission cable 11400, but communication between the camera head 11102 and the CCU 11201 may also be performed wirelessly.

[0119] An example of an endoscopic surgery system to which the technology according to the present disclosure can be applied has been described above. Of the configurations described above, the technology according to the present disclosure can be suitably applied to the imaging unit 11402 provided in the camera head 11102 of the endoscope 11100. By applying the technology according to the present disclosure to the imaging unit 11402, it is possible to reduce the size or increase the definition of the imaging unit 11402, and therefore it is possible to provide an endoscope 11100 that uses high-definition images with little noise.

[0120] The present disclosure has been described above by giving embodiments and their modified examples, application examples, and application examples, but the present disclosure is not limited to the above-mentioned embodiments, etc., and various modifications are possible. Note that the effects described in this specification are merely examples. The effects of the present disclosure are not limited to the effects described in this specification. The present disclosure may have effects other than those described in this specification.

[0121] The present disclosure can also be configured as follows. (1) A semiconductor substrate having a light receiving surface and a plurality of pixels disposed opposite the light receiving surface, Each of the pixels is a photoelectric conversion unit that performs photoelectric conversion on light incident through the light receiving surface; a charge retention portion formed as a semiconductor region of a second conductivity type different from the first conductivity type in the semiconductor region of the semiconductor substrate, the charge retention portion retaining charges transferred from the photoelectric conversion portion; a transfer transistor including a vertical gate electrode reaching the photoelectric conversion unit and a gate insulating film in contact with the vertical gate electrode and formed on a surface of the semiconductor substrate opposite to the light receiving surface, the transfer transistor transferring charges from the photoelectric conversion unit to the charge storage unit; an element isolation portion formed of an oxide film insulator on a surface of the semiconductor substrate opposite to the light receiving surface; a semiconductor layer that is in contact with a side surface and a bottom surface of the element isolation portion and is in contact with the gate insulating film and has a higher concentration of the first conductive type impurity than the semiconductor region; having At least a part of the element isolation portion is disposed away from the vertical gate electrode with a part of the semiconductor layer in contact with the gate insulating film therebetween. Solid-state imaging device. (2) At least a part of the element isolation portion is disposed away from a portion of the vertical gate electrode other than the upper end portion thereof, with a portion of the semiconductor layer in contact with the gate insulating film being sandwiched therebetween. A solid-state imaging device according to (1). (3) At least a part of the element isolation portion is disposed apart from the vertical gate electrode when viewed in a normal direction of the semiconductor substrate. A solid-state imaging device according to (2). (4) Any of the element isolation portions is disposed away from the vertical gate electrode when viewed from a normal direction of the semiconductor substrate. A solid-state imaging device according to (3). (5) The semiconductor layer is disposed away from the vertical gate electrode when viewed in a normal direction of the semiconductor substrate. A solid-state imaging device according to any one of (1) to (4). (6) A portion of the photoelectric conversion portion extends along the vertical gate electrode toward a surface of the semiconductor substrate opposite to the light receiving surface. A solid-state imaging device according to any one of (1) to (5). (7) The pixel capacitance is arranged at a position opposite to the vertical gate electrode with the element isolation portion therebetween, and is configured to accumulate charges transferred from the photoelectric conversion portion. A solid-state imaging device according to any one of (1) to (6). (8) a solid-state imaging device that outputs pixel signals in response to incident light; a signal processing circuit for processing the pixel signal; Equipped with the solid-state imaging device includes a semiconductor substrate having a light receiving surface and a plurality of pixels disposed opposite the light receiving surface; Each of the pixels is a photoelectric conversion unit that performs photoelectric conversion on light incident through the light receiving surface; a charge retention portion formed as a semiconductor region of a second conductivity type different from the first conductivity type in the semiconductor region of the semiconductor substrate, the charge retention portion retaining charges transferred from the photoelectric conversion portion; a transfer transistor including a vertical gate electrode reaching the photoelectric conversion unit and a gate insulating film in contact with the vertical gate electrode and formed on a surface of the semiconductor substrate opposite to the light receiving surface, the transfer transistor transferring charges from the photoelectric conversion unit to the charge storage unit; an element isolation portion formed of an oxide film insulator on a surface of the semiconductor substrate opposite to the light receiving surface; a semiconductor layer that is in contact with a side surface and a bottom surface of the element isolation portion and is in contact with the gate insulating film and has a higher concentration of the first conductive type impurity than the semiconductor region; having At least a part of the element isolation portion is disposed away from the vertical gate electrode with a part of the semiconductor layer in contact with the gate insulating film therebetween. electronic equipment.

[0122] According to the solid-state imaging device and electronic device of the embodiment of the present disclosure, a vertical transistor (transfer transistor TRX) having a vertical gate electrode VG is provided, and at least a part of the element isolation part 16 is arranged away from a portion of the vertical gate electrode VG other than the upper end part (umbrella-shaped part) with the semiconductor layer 17 therebetween, so that it is possible to improve the transfer characteristics while suppressing the dark current. Note that the effect of the present technology is not necessarily limited to the effect described herein, and may be any effect described in this specification.

[0123] This application claims priority based on Japanese Patent Application No. 2019-226378, filed on December 16, 2019 in the Japan Patent Office, the entire contents of which are incorporated herein by reference.

[0124] Those skilled in the art will recognize that various modifications, combinations, subcombinations, and variations may occur to those skilled in the art depending on design requirements and other factors, and that such modifications are within the scope of the appended claims and their equivalents.

Claims

1. A semiconductor substrate having a light receiving surface and a plurality of pixels disposed opposite the light receiving surface, Each of the pixels is a photoelectric conversion unit that performs photoelectric conversion on light incident through the light receiving surface; a charge holding section formed as a semiconductor region of a second conductivity type different from the first conductivity type in a semiconductor region of a first conductivity type of the semiconductor substrate, the charge holding section holding charges transferred from the photoelectric conversion section; a transfer transistor including a vertical gate electrode reaching the photoelectric conversion unit and a gate insulating film in contact with the vertical gate electrode and formed on a surface of the semiconductor substrate opposite to the light receiving surface, the transfer transistor transferring charges from the photoelectric conversion unit to the charge storage unit; an element isolation portion formed of an oxide film insulator on a surface of the semiconductor substrate opposite to the light receiving surface; a semiconductor layer that is in contact with a side surface and a bottom surface of the element isolation portion and is in contact with the gate insulating film and has a higher concentration of the first conductive type impurity than the semiconductor region; having at least a part of the element isolation portion is disposed away from the vertical gate electrode with a part of the semiconductor layer in contact with the gate insulating film therebetween, The semiconductor layer extends from the side and bottom surfaces of the element isolation portion to a position overlapping an upper end of the vertical gate electrode when viewed in a normal direction of the semiconductor substrate. Solid-state imaging device.

2. At least a part of the element isolation portion is disposed away from a portion of the vertical gate electrode other than the upper end portion thereof, with a portion of the semiconductor layer in contact with the gate insulating film being sandwiched therebetween. The solid-state imaging device according to claim 1 .

3. At least a part of the element isolation portion is disposed apart from the vertical gate electrode when viewed in a normal direction of the semiconductor substrate. The solid-state imaging device according to claim 2 .

4. The semiconductor layer is disposed away from the vertical gate electrode when viewed in a normal direction of the semiconductor substrate. The solid-state imaging device according to claim 1 .

5. A portion of the photoelectric conversion portion extends along the vertical gate electrode toward a surface of the semiconductor substrate opposite to the light receiving surface. The solid-state imaging device according to claim 1 .

6. The pixel capacitance is arranged at a position opposite to the vertical gate electrode with the element isolation portion therebetween, and is configured to accumulate charges transferred from the photoelectric conversion portion. The solid-state imaging device according to claim 1 .

7. a solid-state imaging device that outputs pixel signals in response to incident light; a signal processing circuit for processing the pixel signal; Equipped with the solid-state imaging device includes a semiconductor substrate having a light receiving surface and a plurality of pixels disposed opposite the light receiving surface; Each of the pixels is a photoelectric conversion unit that performs photoelectric conversion on light incident through the light receiving surface; a charge holding section formed as a semiconductor region of a second conductivity type different from the first conductivity type in a semiconductor region of a first conductivity type of the semiconductor substrate, the charge holding section holding charges transferred from the photoelectric conversion section; a transfer transistor including a vertical gate electrode reaching the photoelectric conversion unit and a gate insulating film in contact with the vertical gate electrode and formed on a surface of the semiconductor substrate opposite to the light receiving surface, the transfer transistor transferring charges from the photoelectric conversion unit to the charge storage unit; an element isolation portion formed of an oxide film insulator on a surface of the semiconductor substrate opposite to the light receiving surface; a semiconductor layer that is in contact with a side surface and a bottom surface of the element isolation portion and is in contact with the gate insulating film and has a higher concentration of the first conductive type impurity than the semiconductor region; having at least a part of the element isolation portion is disposed away from the vertical gate electrode with a part of the semiconductor layer in contact with the gate insulating film therebetween, The semiconductor layer extends from the side and bottom surfaces of the element isolation portion to a position overlapping an upper end of the vertical gate electrode when viewed in a normal direction of the semiconductor substrate. electronic equipment.

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