Container, substrate processing apparatus, and method of operating the apparatus

Abstract

To reduce the trouble of processing and the trouble of work associated with the processing when a substrate is processed by properly using a plurality of kinds of processing liquids.SOLUTION: A container includes a storage space forming portion in which a storage space for storing a processing liquid for processing a substrate is formed, an ejection port for the processing liquid provided in the storage space forming portion, and an entrance path forming portion provided in the storage space forming portion to form an entrance path that allows an entrance portion that is positioned inside the storage space forming portion and pressurizes the storage space to enter the inside of the storage space forming portion such that the processing liquid is ejected from the ejection port.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present disclosure relates to a container, a substrate processing apparatus, and How to operate the device Regarding. [Background technology]

[0002] In the manufacturing process of semiconductor devices, various processing liquids are supplied to a semiconductor wafer (hereinafter referred to as a wafer) serving as a substrate by a substrate processing apparatus. Patent Document 1 describes a substrate processing apparatus (coating apparatus) that supplies resist (photoresist liquid) as the processing liquid to a substrate and forms a resist film by spin coating. This coating apparatus includes a storage tank that stores the resist, a supply nozzle, and a supply pipe that connects the storage tank and the supply nozzle and has a bellows pump interposed therein. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 11-354419 Summary of the Invention [Problem to be solved by the invention]

[0004] The present disclosure provides a technique that can reduce the effort of processing and the effort of work associated with the processing when processing a substrate using a plurality of types of processing liquids. [Means for solving the problem]

[0005] The container according to the present disclosure includes a storage space forming portion having a storage space formed therein for storing a processing liquid for processing a substrate; a discharge port for the treatment liquid provided in the storage space forming portion; an entry path forming portion provided in the storage space forming portion to form an entry path through which an entry portion that is located inside the storage space forming portion and pressurizes the storage space can enter into the storage space forming portion so that the treatment liquid is discharged from the discharge port; Equipped with 、 The discharge port opens downward, a lower cover that is detachable from the storage space forming portion and that closes the discharge port from below when the lower cover is attached to the storage space forming portion; The lower lid is provided with an engagement portion for detachably engaging the lower lid with a container placement portion in which the container is placed. Another container according to the present disclosure includes a storage space forming part having a storage space formed therein for storing a processing liquid for processing a substrate; a discharge port for the treatment liquid provided in the storage space forming portion; an entry path forming portion provided in the storage space forming portion to form an entry path through which an entry portion that is located inside the storage space forming portion and pressurizes the storage space can enter into the storage space forming portion so that the treatment liquid is discharged from the discharge port; Equipped with The discharge port opens downward, a lower cover that is detachable from the storage space forming portion and that closes the discharge port from below when the lower cover is attached to the storage space forming portion; A partition member is provided to partition the space surrounded by the storage space forming portion into an upper space facing the access path and a lower space forming the storage space, The partition member is provided with a through hole that communicates between the upper space and the lower space, at a position that does not overlap with the entrance passage in a plan view. Another container according to the present disclosure includes a storage space forming part having a storage space formed therein for storing a processing liquid for processing a substrate; a discharge port for the treatment liquid provided in the storage space forming portion; an entry path forming portion provided in the storage space forming portion to form an entry path through which an entry portion that is located inside the storage space forming portion and pressurizes the storage space can enter into the storage space forming portion so that the treatment liquid is discharged from the discharge port; Equipped with The discharge port opens downward, a lower cover that is detachable from the storage space forming portion and that closes the discharge port from below when the lower cover is attached to the storage space forming portion; The storage space forming portion includes a container body in which the discharge port is formed, and an upper lid which is detachable from the container body and includes the storage space forming portion. Effect of the Invention

[0006] According to the present disclosure, when a substrate is treated using a plurality of different treatment liquids, the treatment time and labor involved in the treatment can be reduced. [Brief description of the drawings]

[0007] [Figure 1] 1 is a schematic perspective view of a resist coating apparatus according to an embodiment of a substrate processing apparatus of the present disclosure; [Diagram 2] FIG. 2 is a plan view of the resist coating apparatus. [Diagram 3] FIG. 2 is a schematic side view of the resist coating apparatus. [Figure 4]2 is a perspective view of a container and a transport unit provided in the resist coating apparatus; FIG. [Diagram 5] FIG. 2 is a perspective view of a container provided in the resist coating apparatus. [Figure 6] FIG. [Figure 7] FIG. 4 is a vertical sectional side view of the conveying unit and the container. [Figure 8] FIG. 4 is a vertical sectional side view of the conveying unit and the container. [Figure 9] 4 is a cross-sectional plan view of a claw portion constituting the conveying portion. FIG. [Figure 10] 3 is a perspective view of a container placement portion provided in the resist coating apparatus. FIG. [Figure 11] FIG. 4 is a vertical sectional side view of the container placement portion. [Figure 12] FIG. [Figure 13] FIG. 4 is a schematic plan view for explaining the arrangement of the containers. [Figure 14] 10A to 10C are explanatory views showing a procedure for mounting the container to the container placement section. [Figure 15] 10A to 10C are explanatory views showing a procedure for mounting the container to the container placement section. [Figure 16] 4 is a side view of a container nozzle that constitutes the container transported by the transport unit. FIG. [Figure 17] FIG. 4 is a plan view showing the container arrangement section. [Figure 18] FIG. 4 is a plan view showing the container arrangement section. [Figure 19] 3A to 3C are explanatory views showing a wafer processing procedure by the resist coating apparatus. [Figure 20] 3A to 3C are explanatory views showing a wafer processing procedure by the resist coating apparatus. [Figure 21] 3A to 3C are explanatory views showing a wafer processing procedure by the resist coating apparatus. [Figure 22] 3A to 3C are explanatory views showing a wafer processing procedure by the resist coating apparatus. [Figure 23] 3A to 3C are explanatory views showing a wafer processing procedure by the resist coating apparatus. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0008] A resist coating apparatus 1, which is an embodiment of the substrate processing apparatus of the present disclosure, will be described with reference to Figs. 1, 2, and 3, which are a schematic perspective view, a plan view, and a schematic side view, respectively. First, the resist coating apparatus 1 is generally configured as follows: the resist coating apparatus 1 supplies resist as a processing liquid to a wafer W, which is a circular substrate, and forms a resist film by spin coating. The resist coating apparatus 1 includes a cup 11, a container 2, a transport unit 6, a container arrangement unit 8, and a base 19. The cup 11 surrounds the wafer W during processing. A large number of containers 2 are arranged in the container arrangement unit 8, and, for example, different types of resist are stored in each container 2. A container nozzle 20 constituting the container 2 is used as a tank and a nozzle for storing the resist.

[0009] The transport unit 6 holds the container nozzle 20 of one selected container 2 from among the multiple containers 2, transports it to a processing position above the wafer W, and ejects resist from the container nozzle 20 onto the wafer W. The transport unit 6 is configured to be able to pressurize and depressurize the inside of the container nozzle 20 so as to switch between ejecting and stopping the ejection of the resist. Note that the container nozzle 20 that has been used is returned to the container arrangement unit 8 by the transport unit 6, and the wafers W that are being transported to the resist coating device 1 can be processed using a resist that corresponds to the lot of the wafer W.

[0010] The configuration of the resist coating apparatus 1 will be described in more detail below. A cup 11 is provided on the right side of a base 19, and a container placement section 8 is provided on the left side. A spin chuck 12 that serves as a placement section for a wafer W is provided within the cup 11, and therefore the container placement section 8 and the spin chuck 12 are provided side by side on the left and right. The spin chuck 12, which serves as a placement section for a substrate, adheres to the center of the back side of the placed wafer W and holds the wafer W in a horizontal position. The spin chuck 12 is connected to a rotation mechanism 13, which rotates the wafer W together with the spin chuck 12 around a vertical axis.

[0011] Hereinafter, when the cup 11 is seen on the right side and the container placement section 8 is seen on the left side, the near side will be referred to as the front and the far side as the rear. A transfer area where the wafer W is transferred by a transfer mechanism (not shown) is formed behind the base 19, and the wafer W is transferred from the transfer area onto the cup 11 by the transfer mechanism. The wafer W is then delivered between the transfer mechanism above the cup 11 and the spin chuck 12 by lift pins (not shown) provided in the cup 11.

[0012] In this resist coating apparatus 1, after the formation of the resist film, unnecessary resist film on the peripheral portion of the wafer W is removed by a solvent. On the right side of the cup 11, a waiting section 15 is provided where a peripheral nozzle 14 that supplies the solvent is kept waiting. The peripheral nozzle 14 is supported on the tip side of an arm 16 that extends forward and backward, and the base end side of the arm 16 is connected to a moving section 17. The moving section 17 is capable of moving left and right on the rear side of the cup 11 and of raising and lowering the arm 16, and the peripheral nozzle 14 is capable of moving between the inside of the cup-shaped waiting section 15 and above the peripheral portion of the wafer W where the solvent is discharged.

[0013] The above-mentioned container 2 will be described below with reference to the perspective views of Figures 4 and 5 and the vertical cross-sectional side view of Figure 6. The container 2 is generally cylindrical and is composed of a container body 21, a lower lid 31, an upper lid 41 and a partition member 51, and the above-mentioned container nozzle 20 is composed of the container body 21, the upper lid 41 and the partition member 51. Each of the lower lid 31, the upper lid 41 and the partition member 51 is freely attachable to and detachable from the container body 21, and Figure 4 shows a state in which the lower lid 31 is attached, and Figure 5 shows a state in which the lower lid 31 is removed. The above-mentioned members constituting the container 2 are circular members that are coaxial in plan view and are made of, for example, resin.

[0014] Below, each of the components constituting the container 2 will be described. First, the container body 21 will be described. The container body 21 has a cylindrical portion 22. When the container 2 is used, the axis of the cylindrical portion 22 is in a vertical (perpendicular) state. The following description of each part of the container 2 will be given assuming that the axis of the cylindrical portion 22 is in such a vertical state. The portion of the container body 21 below the cylindrical portion 22 is configured in a funnel shape. More specifically, the lower peripheral wall of the cylindrical portion 22 extends downward toward the central axis of the cylindrical portion 22, forming an inclined wall 23. The lower end of the inclined wall 23 extends slightly vertically downward to form a tip portion 24, and the area surrounded by the tip portion 24 forms a discharge port 25 that opens downward.

[0015] The central part of the height of the outer circumferential surface of the cylindrical portion 22 bulges outward from the cylindrical portion 22 to form a ring-shaped handle 26. Above the handle 26 on the outer circumferential surface of the cylindrical portion 22, a helical protrusion is formed along the outer circumferential surface with the central axis of the cylindrical portion 22 as the helical axis, forming a male thread 27. Below the handle 26 on the outer circumferential surface of the cylindrical portion 22, a first protrusion 28 and a second protrusion 29 are formed, each of which protrudes in the horizontal direction. The first protrusion 28 and the second protrusion 29 are formed by protruding in opposite directions at positions 180° apart from the central axis of the cylindrical portion 22 on the outer circumferential surface of the cylindrical portion 22, and are each circular when viewed in the protruding direction. The first protrusion 28 and the second protrusion 29 are provided at the same height, and the first protrusion 28 is longer than the second protrusion 29. That is, the first protrusion 28 protrudes more from the outer circumferential surface of the cylindrical portion 22.

[0016] Next, the lower cover 31 will be described. The lower cover 31 is composed of a vertically standing cylindrical portion 32 and a bottom plate 33 that closes the lower portion of the cylindrical portion 32. The central portion of the upper surface of the bottom plate 33 is raised to form a protrusion 34. Two positions separated from each other in the circumferential direction of the upper end portion of the cylindrical portion 32 are cut downward to form grooves 35. These grooves 35 are formed at positions that are 180° apart from each other with respect to the central axis of the cylindrical portion 32, and are formed so that the first protrusion 28 and the second protrusion 29 of the cylindrical portion 22 can be inserted. The grooves 35 are formed in a keyhole shape. Specifically, the width of the upper side of the groove 35 narrows slightly as it goes downward, and the width of the lower end is slightly smaller than the diameter of a circle when the first protrusion 28 and the second protrusion 29 are seen in the protruding direction. The lower side of the groove 35 is formed in a circular shape, and its size is approximately the same as the size of a circle when the first protrusion 28 and the second protrusion 29 are seen in the protruding direction. Therefore, it can be seen that a narrowed portion is provided in the groove 35 as it moves downward, narrowing its width.

[0017] In addition, two horizontal plate-like engagement protrusions 36 are formed on the outer circumferential surface of the cylindrical portion 32. These engagement protrusions 36 are provided for attaching the lower cover 31 to the container placement portion 8. The two engagement protrusions 36 are formed by protruding in opposite directions when viewed from the central axis of the cylindrical portion 32, and are formed to protrude in directions that differ by 90° from the central axis with respect to the groove 35. The engagement protrusions 36 are formed below the lower end of the groove 35.

[0018] The attachment of the bottom cover 31 to the container body 21 will be described. With the bottom cover 31 and the container body 21 separated from each other, their central axes are aligned, and the first protrusion 28 and the second protrusion 29 are positioned so as to overlap the grooves 35 as viewed in the axial direction. The container body 21 is then moved closer to the bottom cover 31 along the axial direction relative to the bottom cover 31, so that the first protrusion 28 and the second protrusion 29 enter the grooves 35. By pressing the container body 21 toward the bottom cover 31 from this state, the first protrusion 28 and the second protrusion 29 move beyond the narrowed portion of the groove 35 and into the depth of the groove 35, so that the first protrusion 28 and the second protrusion 29 fit (engage) with the groove 35, and the relative positions of the bottom cover 31 and the container body 21 are fixed. In this fixed state, the projection 34 enters the discharge port 25 of the container body 21, and the tip 24 comes into contact with the bottom plate 33 of the bottom lid 31, thereby sealing the discharge port 25. In other words, the discharge port 25 is blocked from below by the bottom lid 31, and the resist in the container body 21 does not leak from the discharge port 25. In addition, in this fixed state, the tip of the first projection 28 penetrates the groove 35 and protrudes from the circumferential surface of the cylindrical portion 32 of the bottom lid 31.

[0019] In addition, by applying a force along the axial direction so as to move the container body 21 relatively away from the bottom cover 31, the first protrusion 28 and the second protrusion 29 move beyond the narrowed portion to the entrance of the groove 35, the above-mentioned engagement is released, and the bottom cover 31 is removed from the container body 21. As described below, the bottom cover 31 is fixed to the container placement unit 8, and in this state, the conveying unit 6 holding the container nozzle 20 including the container body 21 moves up and down relative to the bottom cover 31. This causes such engagement and release of the engagement to be performed.

[0020] Next, the upper cover 41 will be described. The upper cover 41 includes a vertically standing cylindrical portion 42 and an upper wall 43 provided to close the upper side of the cylindrical portion 42. On the inner peripheral surface of the cylindrical portion 42, a spiral groove is formed along the inner peripheral surface with the central axis of the cylindrical portion 42 as the spiral axis, forming a female thread 44. The female thread 44 is screwed into the male thread 27 of the container body 21, so that the upper cover 41 is attached and fixed to the container body 21. A circular recess 45 is provided on the upper surface of the upper wall 43. This recess 45 is used to hold the container nozzle 20 by the conveying unit 6, but since this will be described in detail later, it will be briefly described here. The bottom surface of the recess 45 is a flat surface on the outer side of the opening 46 described later, and an O-ring 67 constituting the conveying unit 6 is in close contact with the flat surface. By such close contact, the flat surface forms a sealing surface for sealing the inside of the container nozzle 20 from the outside. Since the bottom surface of the recess 45 is the sealing surface, this sealing surface is provided at a position on the container body 21 where it overlaps with the container body 21 .

[0021] A circular opening 46 is provided at the center of the recess 45, penetrating the top lid 41 and opening upward. The centers of the recess 45 and the opening 46 are located on the central axis of the container 2. An air supply and exhaust pipe 68, which will be described later and which constitutes the conveying section 6, is inserted into the container nozzle 20 through the opening 46. The pressure control by pressurization and depressurization within the container nozzle 20 described above is performed by supplying and exhausting air from the air supply and exhaust pipe 68, which is an entry section that enters the container nozzle 20. Therefore, the upper wall 43 of the top lid 41 is configured as an entry path forming section for forming the opening 46, which is an entry path for allowing the air supply and exhaust pipe 68 to enter the container nozzle 20 in this manner.

[0022] The above-mentioned screwing can be released by an operator twisting the top lid 41 around the axis of the container 2 relative to the container body 21, and therefore the top lid 41 can be attached and detached to the container body 21 as described above. The above-mentioned first protrusion 28 and second protrusion 29 provided on the container body 21 have a role of fixing the bottom lid 31 to the container body 21, as well as a role of preventing the operator's hand from slipping on the outer circumferential surface of the container body 21 when attaching and detaching the top lid 41 and the container body 21. In other words, when holding the side of the container body 21 with one hand as if pinching it, and pinching the side of the top lid 41 with the other hand to twist the top lid 41, the first protrusion 28 and the second protrusion 29 catch on the operator's fingers, making it easy to hold the top lid 41 so that it does not rotate relative to the container body 21, and therefore the top lid 41 can be easily attached and detached. The first protrusion 28 is also used to determine the presence or absence of the container nozzle 20 in the container placement section 8, as will be described in detail later.

[0023] Next, the partition member 51 will be described. The partition member 51 is disposed in the cylindrical portion 22 of the container body 21 and has a plate-shaped main body portion 52 that spreads laterally inside the cylindrical portion 22. The main body portion 52 is circular in plan view, and the periphery of the main body portion 52 extends upward along the inner circumferential surface of the cylindrical portion 22 toward the top, and the upper end spreads outward to form a flange portion 53. The flange portion 53 is sandwiched between the lower surface of the upper wall 43 of the upper lid 41 and the upper end of the cylindrical portion 22 of the container body 21, so that the partition member 51 is fixed to the upper lid 41 and the container body 21. The main body portion 52 divides the space inside the container body 21 into upper and lower portions, and the lower side of the main body portion 52 is used as a storage space 54 in which the resist is stored. The resist is stored at a height such that the liquid level does not contact the partition member 51. Furthermore, the opening 46 of the top lid 41 opens into the upper space partitioned by the partition member 51, and the tip (lower end) of the supply and exhaust pipe 68 is located above the main body 52 of the partition member 51 when the supply and exhaust pipe 68 enters the container 2 through the opening 46. A plurality of through holes are provided at positions near the periphery of the main body 52 at intervals in the circumferential direction of the main body 52, and are formed as communication holes 55 that communicate between the upper and lower sides of the partition member 51. The communication holes 55 are provided at positions that do not overlap the opening 46 in a plan view.

[0024] The role of the partition member 51 will be described. As described above, the supply and exhaust is performed by the supply and exhaust pipe 68 that has entered the container nozzle 20. Suppose that the resist splashes from the liquid surface and adheres to the supply and exhaust pipe 68 due to the supply and exhaust or the vibration during transport of the container nozzle 20. As described above, different types of resist are stored in each container 2, and the supply and exhaust pipe 68 is shared by each container 2, so it is possible that the resist adhered in one container 2 will be mixed with the resist in the other container 2. However, by providing the partition member 51 with the communication hole 55 at a position off the opening 46 in a plan view as described above, the pressure in the storage space 54 can be changed by supply and exhaust while preventing the above-mentioned resist from adhering to the supply and exhaust pipe 68. As described above, the material of the partition member 51 is, for example, resin, like the materials of the other members that constitute the container 2, but it may be made of other materials, such as rubber.

[0025] Returning to Figs. 1 to 3, the conveying section 6 will be described. The conveying section 6 is composed of a moving section 61, a lifting section 62, an arm 63, an air supply and exhaust section 64, and a gripping section 7. The moving section 61 is movable left and right in front of the cup 11. The lifting section 62 is connected to the left of the moving section 61 and extends forward, and is configured to be vertically lifted and lowered by the moving section 61. The base end of the arm 63 is provided on the tip end (rear end) of the lifting section 62, and is rotatable around an axis R1 along the vertical direction (vertical direction) provided at the tip end of the lifting section 62. The tip side of the arm 63 extends in the horizontal direction. Therefore, the tip side of the arm 63 is movable left and right, lifted and lowered, and rotatable around the axis R1 that forms a rotation axis. A solvent supply nozzle 60 is provided at the tip of the arm 63, and the solvent supply nozzle 60 ejects the solvent vertically downward. This solvent is used for surface modification (pre-wetting) of the wafer W before resist coating, and is supplied to the entire surface of the wafer W by spin coating.

[0026] An air supply / exhaust unit 64 and a gripper 7 are provided at the tip of the arm 63, which will be described with reference to the perspective view of Fig. 4 and the vertical cross-sectional side views of Fig. 7 and Fig. 8. The air supply / exhaust unit 64 is composed of a container connection part 66, an O-ring 67, an air supply / exhaust pipe 68, branch paths 69A, 69B, valves V1, V2, a gas supply source 60A, and an exhaust source 60B.

[0027] The container connection part 66 is a circular member that protrudes downward from the tip of the arm 63, and the lower end part is expanded in diameter. The diameter of the lower end part of this container connection part 66 is formed, for example, to be approximately the same as the diameter of the recess 45 so that it can be recessed into and retracted from the recess 45 of the upper lid 41 of the container 2, as will be described later.

[0028] An annular groove is provided on the underside of the container connection part 66 along the circumference of the container connection part 66, and an O-ring 67, which serves as a seal, is embedded in the annular groove. The above-mentioned supply and exhaust pipe 68 is provided so as to pass vertically through the center of the container connection part 66, and the tip of the supply and exhaust pipe 68 protrudes from the underside of the container connection part 66. Therefore, the O-ring 67 is located above the lower end of the supply and exhaust pipe 68 and is provided so as to surround the supply and exhaust pipe 68 in a plan view. The supply and exhaust pipe 68 is formed, for example, with a diameter substantially the same as the diameter of the opening 46 of the upper lid 41 so that it can advance into and retreat from the container nozzle 20 through the opening 46.

[0029] One end of the flow path is connected to the upper side of the supply and exhaust pipe 68, and the other end of this flow path branches into two branches 69A and 69B. The branch path 69A is connected to a gas supply source 60A via a valve V1, and the branch path 69B is connected to an exhaust source 60B, which is, for example, an ejector, via a valve V2. Both of the valves V1 and V2 are closed, or one of them is open. When the valve V1 is opened, a gas such as an inert gas, nitrogen gas, is supplied from the tip of the supply and exhaust pipe 68, and when the valve V2 is opened, exhaust is performed from the tip of the supply and exhaust pipe 68.

[0030] The gripper 7 is composed of three claws 71 and a drive mechanism (not shown) provided at the tip of the arm 63. Below, an explanation will be given with reference to Fig. 9, which is a plan view showing the three claws 71. These claws 71 are provided at positions 120° apart from each other around the supply and exhaust pipe 68 in a plan view, are equidistant from the supply and exhaust pipe 68, and are arranged rotationally symmetrical with each other. Note that in Figs. 7 and 8, for convenience of illustration, cross sections in directions different by 120° from the supply and exhaust pipe 68 are shown on the same plane, so that the two claws 71 are shown symmetrically with the supply and exhaust pipe 68 in between.

[0031] The claw portion 71 is vertically long and is formed in an inverted L-shape in a side view. More specifically, the claw portion 71 extends horizontally away from the supply and exhaust pipe 68, and then is bent downward. The lower end of the claw portion 71 protrudes slightly toward the supply and exhaust pipe 68 in a plan view to form a support portion 72. The support portion 72 has a role of supporting the handle 26 of the container body 21 from below when the claw portion 71 is gripped. The upper end of each claw portion 71 is connected to the driving mechanism described above, and the driving mechanism moves each claw portion 71 horizontally between an open position (shown by a solid line in FIG. 7) that is relatively far away from the supply and exhaust pipe 68 in a plan view, and a gripping position (shown by a chain line in FIG. 7) that is relatively close to the supply and exhaust pipe 68. FIG. 9 shows the claw portion 71 in the open position.

[0032] The procedure for the transport unit 6 to attach and transport the container nozzle 20 constituting the container 2 will be described. The container nozzle 20 is in a state where the bottom lid 31 is attached, and as described above, the bottom lid 31 is fixed to the container placement unit 8. The arm 63 descends with the supply and exhaust pipe 68 positioned above the opening 46 of the top lid 41 of the container 2 and the claw portion 71 positioned in the open position. Note that FIG. 4 above shows the arm 63 during this descending state. Then, the lower end of the container connection portion 66 is recessed into the recess 45 of the top lid 41 of the container 2, and the O-ring 67 is in close contact with the outer periphery of the opening 46 at the bottom surface of the recess 45, and the tip (lower end) of the supply and exhaust pipe 68 enters the container body 21 and is positioned on the partition member 51. The position of the container nozzle 20 relative to the arm 63 in this state is referred to as the attachment position. FIG. 7 shows the container nozzle 20 in this attachment position.

[0033] In the above-mentioned mounting position, the O-ring 67 of the container connection part 66 seals the gap between the lower surface of the container connection part 66 and the bottom surface of the recess 45 of the top lid 41. This prevents the storage space 54 in the container nozzle 20 from communicating with the space outside the container nozzle 20 through the gap and the gap between the supply and exhaust pipe 68 and the inner peripheral edge of the opening 46. Therefore, even if air is supplied and exhausted through the supply and exhaust pipe 68, gas is prevented from flowing out to the outer space and gas is prevented from flowing in from the outer space. In this way, the O-ring 67 makes it possible to more reliably pressurize and depressurize the storage space 54.

[0034] With the container nozzle 20 in the mounting position described above, the claws 71 move from the open position to the gripping position. At this gripping position, the side of each claw 71 presses the side of the handle 26 of the container nozzle 20 toward the central axis of the container nozzle 20, thereby gripping the container nozzle 20 and fixing it at the mounting position. In addition, the support portion 72 at the lower end of the claw 71 at the gripping position is in contact with the lower surface of the handle 26. When the arm 63 is raised in this state in which the container nozzle 20 is gripped (held), the support portion 72 of the claw 71 pulls up the handle 26, and the engagement between the bottom cover 31 and the container nozzle 20 described in FIG. 5 and FIG. 6 is released, and the bottom cover 31 is removed from the container nozzle 20. FIG. 8 shows the container nozzle 20 in such a state in which the bottom cover 31 has been removed. When the bottom cover 31 is to be attached to the container nozzle 20, the operations are performed in the reverse order to the above-described procedure. To further explain, during this operation, the arm 63 descends and the container nozzle 20 is pressed downward by the container connection portion 66, so that the container nozzle 20 re-fits into the lower lid 31.

[0035] During the period when the bottom cover 31 is removed from the container nozzle 20 as described above, exhaust is performed through the supply and exhaust pipe 68, except for the period when the resist is discharged from the container nozzle 20, and the pressure in the storage space 54 is reduced. This reduction in pressure prevents the resist from flowing down unnecessarily from the discharge port 25 of the container nozzle 20, even when the bottom cover 31 is removed.

[0036] As shown in Figs. 4 and 9, a laser light emitting section 73 and a light receiving section 74 are provided below the tip of the arm 63, and these emitting section 73 and light receiving section 74 constitute a second detection mechanism. As shown by the dotted arrow in the figure, the emitting section 73 irradiates the laser light horizontally toward the light receiving section 74. The light receiving section 74 transmits a detection signal according to whether or not the laser light is received to the control section 100 described later. When the container nozzle 20 is located at the above-mentioned mounting position, the optical path of the laser light is blocked by the upper cover 41 of the container nozzle 20, and when the container nozzle 20 is not located at the mounting position, the optical path is not blocked. Therefore, the control section 100 can determine whether the container nozzle 20 is being held normally (whether it has not fallen from the mounting position) during the period when the transport section 6 transports the container nozzle 20.

[0037] Next, the container arrangement section 8 will be described with reference to FIG. 10, which is a perspective view seen from the front side, FIG. 11, which is a side view seen from the rear side, and FIG. 12, which is a plan view, in addition to the already described FIG. 1 and FIG. 2. In this example, 26 containers 2 are arranged in the container arrangement section 8. The container arrangement section 8 is composed of a horizontal plate-shaped arrangement section main body 81 and a horizontal plate-shaped detection mechanism mounting section 82 provided below the arrangement section main body 81, and the arrangement section main body 81 and the detection mechanism mounting section 82 are connected to each other by a connection section 83 with a gap therebetween in the vertical direction. The arrangement section main body 81 has a circular opening 84. The openings 84 are provided in a number of 26, the same number as the containers 2 arranged in the container arrangement section 8, and form an arrangement area for the containers 2 that each accommodates the bottom of the bottom cover 31. The detection mechanism mounting section 82 is provided with a detection mechanism 9 for detecting whether the bottom cover 31 of the container 2 is attached to the opening 84. The detection mechanism 9, which constitutes the first detection mechanism, is provided for each opening 84.

[0038] In this example, the openings 84 are provided in a row in the left-right direction, five such rows are provided in the front-rear direction, and the intervals between adjacent openings 84 in the left-right direction are the same. The rows are numbered in order from the front row to the rear row, with the frontmost row being the first row. The first to fourth rows each consist of six openings 84, and the fifth row each consists of two openings 84. The first to fourth rows are positioned more to the right, i.e., closer to the cup 11, as they move toward the rear. The opening 84 on the right side of the fifth row is positioned slightly leftward of the opening 84 on the right side of the fourth row.

[0039] By forming each opening 84 as described above, each container 2 arranged in the opening 84 is arranged in a band-shaped region R2 that forms an arc around the axis R1 in a plan view as shown in Fig. 13, and is arranged so that it can be grasped by the claw portion 71 of the conveying unit 6 that can move left and right and rotate as described above. Note that the distance between the axis R1 in a plan view and the supply and exhaust pipe 68 is R3, and the arrangement of the container 2 for the above-mentioned grasping will be supplemented. In a plan view, the center of each container 2 is located in an area between an arc with the axis R1 as the center and the radius R3 when the axis R1 is located at the leftmost end and an arc with the axis R1 as the center and the radius R3 when the axis R1 is located at the rightmost end, within the range in which the axis R1 can be moved left and right by the moving portion 61 of the conveying unit 6.

[0040] 10 to 12, the arrangement section main body 81 that forms the opening 84 will be further described. This arrangement section main body 81 is composed of a lower plate 85 and an upper plate 86 that are stacked on top of each other as shown in Fig. 11, and a through hole that forms the opening 84 is formed in each of these lower plate 85 and upper plate 86. Two places on the upper surface of the outer periphery of the through hole in the lower plate 85 are cut out. The cutouts in the upper surface of the lower plate 85 are shown as 87A in Fig. 11, and the cutouts 87A are formed on the front side and the rear side of the opening 84, respectively.

[0041] The upper plate 86 is provided so as to cover a portion of the notch 87 and leave the remaining portion open, thereby forming a groove 88 along the outer periphery of the opening 84 and an entrance 89 that opens upward so as to communicate with the groove 88. More specifically, the through hole of the upper plate 86 has a shape in which a portion of a circle is slightly cut out toward the outside. The notches of the upper plate 86 are also formed on both the front side and the rear side, and are shown as notches 87B. The portion of the edge of the through hole of the upper plate 86 that is shifted clockwise along the circumference of the through hole in a plan view from the notch 87B is bent so that its height gradually increases when viewed counterclockwise, forming an inclined portion 80.

[0042] In the upper plate 86, a portion shifted clockwise with respect to the inclined portion 80 covers the notch 87A as described above, forming the groove 88. The notch 87B of the upper plate 86 and the notch 87A of the lower plate 85 overlap with each other, forming the entrance 89 at a position shifted counterclockwise with respect to the inclined portion 80. Since the lower plate 85 and the upper plate 86 are configured as described above, two entrances 89, two inclined portions 80, and two grooves 88 are formed for one opening 84. The two entrances 89 are provided to sandwich the center of the opening 84 so that the two engagement projections 36 of the lower cover 31 of the container 2 can be inserted from above and placed on the portion of the lower plate 85 that forms the notch 87A.

[0043] Next, the detection mechanism 9 will be described. This detection mechanism 9 is composed of a detection body 91 and a detection mechanism main body 92. The right side portion of the periphery of each opening 84 of the arrangement section main body 81 is cut out so as to face outward from the opening 84. If this cutout is designated as 93, then the detection body 91 is provided within the cutout 93. This detection body 91 is configured as a thick rod extending upward, and the rear side surface of its upper end portion is configured as an inclined surface 94 that rises from the rear to the front. The lower side of the detection body 91 extends downward, and is connected to the detection mechanism main body 92 provided on the detection mechanism mounting section 82.

[0044] The detection body 91 can be raised and lowered relative to the detection mechanism body 92, and the amount by which the detection body 92 protrudes upward through the cutout 93 of the arrangement part body 81 can be changed. The detection mechanism body 92 is configured to bias the detection body 91 upward, and the height position of the detection body 91 when no force against the biasing force is applied is defined as the upper position. Although not shown, the detection mechanism body 92 includes a laser light emitting section and a light receiving section that receives the laser light. The optical path of this laser light extends laterally and overlaps with the lifting and lowering region at the lower end of the detection body 91. When the detection body 91 is in the raised position, the optical path is opened, and therefore the laser light is supplied to the light receiving section.

[0045] When the detection body 91 is pressed downward against the biasing force from the detection mechanism body 92 and lowered to a predetermined height position (hereinafter referred to as the lower position), the optical path is blocked and the supply of the laser light to the light receiving section is stopped. The light receiving section of the detection mechanism body 92 transmits a detection signal according to the presence or absence of reception of the laser light to the control section 100 described later.

[0046] Next, the attachment of the container 2 to the container placement section 8 will be described with reference to Figures 14 and 15. Figure 14 shows how an engagement is formed between the bottom cover 31 of the container 2 and the container placement section 8, with the container placement section 8 viewed from the front. Figure 15 shows how the height of the detection body 91 changes in parallel with the formation of this engagement, with the container placement section 8 viewed from the right. Figures 14 and 15 show containers 2 in the upper, middle, and lower rows, respectively, but the same row shows the state of the container 2 at the same point in time.

[0047] The container 2 is positioned on the opening 84 of the container placement section 8, and the position of the engagement protrusion 36 of the lower cover 31 is aligned with respect to the entrance 89. At this time, the first protrusion 28 of the container nozzle 20 is positioned on the right side (the side where the detection body 91 is provided with respect to the opening 84) (upper parts of Figs. 14 and 15). The container 2 is lowered with respect to the opening 84, and the lower end of the container 2 is inserted into the opening 84, and the engagement protrusion 36 is placed on the lower plate 85 constituting the placement section main body 81 of the container placement section 8 through the entrance 89. At this time, the height of the inclined surface 94 of the detection body 91 located at the upper position and the height of the first protrusion 28 of the lower cover 31 are aligned (middle parts of Figs. 14 and 15). Then, the container 2 is rotated clockwise in a plan view. By this rotation, the engagement protrusion 36, which is the engagement part, enters the groove 88, which is the engaged part, and they engage with each other, and the container 2 is fixed to the container placement section 8 (lower part of Fig. 14). The inclined portion 80 serves as a guide for allowing the engagement projection 36 to easily enter the groove 88 by rotating the container 2 .

[0048] During the rotation of the container 2 in the process of forming the above-mentioned engagement, the first protrusion 28 comes into contact with the inclined surface 94 of the detection body 91, and the further rotation of the container 2 causes the inclined surface 94 to be pressed by the first protrusion 28. By pressing the inclined surface 94 in the lateral direction in this manner, the detection body 91 descends so that the first protrusion 28 ascends the inclined surface 94. Then, as the above-mentioned engagement is formed, the detection body 91 is positioned in a lower position, blocking the optical path of the detection mechanism main body 92 as described above (lower part of FIG. 15). Note that the above-mentioned installation of the container 2 to the container placement part 8 is performed by an operator. When removing the container 2 from the container placement part 8, the operator should perform the procedure in reverse to that of installation.

[0049] 7 and 8, the arm 63 grasps the container nozzle 20 constituting the container 2 attached to the container placement section 8 with the claw portion 71 and raises it, thereby removing it from the bottom cover 31. When the container nozzle 20 is removed in this manner and the interference by the first projection 28 is released, the detection body 91 moves to the raised position by the biasing force received from the detection mechanism main body 92 (see FIG. 16). When the container nozzle 20 is attached to the bottom cover 31, the container nozzle 20 is lowered by the arm 63, during which the first projection 28 comes into contact with the inclined surface 94 and is pushed downward, and the detection body 91 returns to the lowered position, thereby blocking the optical path of the detection mechanism main body 92.

[0050] In this way, by attaching or detaching the container nozzle 20 to or from the bottom cover 31, the height of the detection body 91 switches between the upper and lower positions, thereby switching the detection signal output from the light receiving unit of the detection mechanism main body 92 to the control unit 100. Therefore, the control unit 100 can detect the attachment or detachment state of the container nozzle 20 to each bottom cover 31. As described above, when the container nozzle 20 is positioned at the position where the bottom cover 31 is attached, the presence or absence of the first protrusion 28 is detected by the detection mechanism 9 (first detection mechanism), and the presence or absence of the container nozzle 20 at the position where the attachment is performed is detected.

[0051] As described above, since the detection mechanism 9 is provided for each opening 84 forming the arrangement area of ​​the containers 2, the control unit 100 can detect the presence or absence of the container nozzle 20 for each arrangement area. Therefore, it is possible to monitor whether the container nozzle 20 used for processing has been normally removed from the bottom cover 31 by the arm 63. In addition, it is possible to prevent a malfunction in which the transport unit 6 operates to return the container nozzle 20 held by the transport unit 6 to the bottom cover 31 to which the container nozzle 20 is attached in the container arrangement unit 8.

[0052] The container arrangement section 8 will be further described with reference to Figs. 17 and 18. On the base 19 of the resist coating apparatus 1, a guide 101 is provided which extends in the front-rear direction and is spaced apart from the left and right, and a slider 102 is provided whose left and right edges are connected to the guide 101. The slider 102 has a rough shape that is a concave horizontal plate-like body whose rear side is open in a plan view, and a notch formed from the rear end toward the front side to form such a concave shape is shown as 103. For the container arrangement section 8, the left and right edges of the arrangement section main body 81 are supported on the slider 102, and the detection mechanism mounting section 82 is placed in the notch 103.

[0053] The slider 102 can be slid between a rear position and a front position along the guide 101 by an operator. The container arrangement unit 8 also moves together with the slider 102, so the slider 102 is a sliding member that changes the relative front-rear position of the container arrangement unit 8 with respect to the cups 11 and the spin chuck 12. Note that the arrangement of the containers 2 in the container arrangement unit 8 described so far in FIG. 13 and the like is an arrangement in a state in which the slider 102 is located at the rear position, and in this state, the containers 2 and the cups 11 are lined up on the left and right. By moving the slider 102 to the front position, for example, as shown in FIG. 17, the front row of containers 2 in the container arrangement unit 8 is located forward of the front ends of the cups 11.

[0054] The placement unit main body 81 and the slider 102 are detachable via a fixing mechanism (not shown). When performing maintenance on the container placement unit 8, such as replacing the container 2, the container placement unit 8 is removed from the slider 102 that has been moved to the forward position as described above (see FIG. 18). Since the container placement unit 8 can be moved and removed from the slider 102 in this manner, the worker can easily attach and detach the container 2 to and from the container placement unit 8 as described in FIG. 14 and FIG. 15. In the following description, unless otherwise specified, it is assumed that the slider 102 is located in the rear position, and therefore the container 2 is located in the position described in FIG. 13 etc.

[0055] 1 and 2, a drainage port 111 is provided at a position sandwiched between the container arrangement section 8 and the cup 11 from the left and right. More specifically, in a plan view, the drainage port 111 is disposed between the containers 2 in the fifth row in the container arrangement section 8 and the rear side of the center of the cup 11. The drainage port 111 is in a circular cup shape, and the inside of the drainage port 111 is connected to a drainage path (not shown), and liquid supplied to the drainage port 111 flows into the drainage path and is removed.

[0056] Above this drainage port 111 is a waiting area where the container nozzle 20 and the solvent supply nozzle 60 held by the arm 63 are kept waiting, and as necessary, the container nozzle 20 and the solvent supply nozzle 60 positioned in the waiting area respectively discharge the resist and the solvent into the drainage port 111. The supply of the resist and the solvent toward the drainage port 111 is a so-called dummy dispense that is not intended for processing the wafer W.

[0057] By arranging the drainage port 111 forming the waiting area between the container placement unit 8 and the cup 11 in this manner, the waiting area is located between the container nozzle 20 held by the transport unit 6 and the container nozzle 20 moving toward the cup 11. Therefore, after a dummy dispense, the held container nozzle 20 can be quickly transported to the wafer W for processing. After processing the wafer W, the container nozzle 20 is temporarily moved to the waiting area to wait there before processing the subsequent wafer W. Since the distance between the waiting area and the wafer W is relatively small, the container nozzle 20 can be quickly moved to the wafer W for processing. Therefore, by arranging the drainage port 111 in this manner, the throughput of the apparatus can be improved.

[0058] The resist coating apparatus 1 includes a control unit 100 configured by a computer. The control unit 100 includes a program, and the control unit 100 sends control signals to each unit of the resist coating apparatus 1 by the program. The control signals control each operation such as gripping and releasing the grip of the container nozzle 20 by the transport unit 6, transporting the container nozzle 20, pressurizing and depressurizing the inside of the container nozzle 20, and rotating the spin chuck 12, and the apparatus performs a series of processes described below. The above program controls the operation of each unit in this way, and incorporates commands (each step) to proceed with the processing of the wafer W described below. The program is stored in a storage medium, such as a compact disc, a hard disk, a memory card, or a DVD, and installed in the control unit 100.

[0059] As described above, the control unit 100 monitors the detection signal output from the light receiving unit 74 of the transport unit 6 and the detection signals output from each detection mechanism 9. The control unit 100 also includes an alarm output unit that outputs an alarm by voice output or screen display when an abnormality occurs, indicating the occurrence of the abnormality. For example, when a detection signal indicating that the container nozzle 20 is not being held by the transport unit 6 is output during a period when the container nozzle 20 should be held by the transport unit 6, an alarm is output. Also, for example, when the container nozzle 20 is being held by the transport unit 6, a detection signal indicating that the container nozzle 20 is present at a position to which the container nozzle 20 is to be returned is output from the detection mechanism 9, and the detection signal indicates that the container nozzle 20 is present at that position, an alarm is output.

[0060] Next, the processing procedure of the wafer W in the resist coating apparatus 1 will be described with reference to Fig. 19 to Fig. 23. The arm 63 is not holding the container nozzle 20, the solvent supply nozzle 60 is positioned in the waiting area above the drainage port 111, and the supply and exhaust from the supply and exhaust pipe 68 constituting the supply and exhaust part 64 of the arm 63 is stopped (Fig. 19). The claw part 71 of the arm 63 is positioned in the open position, and a dummy dispense from the solvent supply nozzle 60 is performed.

[0061] Then, information on the lot of wafers W to be transferred to the resist coating apparatus 1 is transmitted from a host computer (not shown) to the control unit 100. The arm 63 constituting the transfer unit 6 moves up and down, moves in the left and right directions, and rotates in a coordinated manner, so that the supply and exhaust unit 64 of the arm 63 is positioned at a predetermined height above the container 2 in which the resist for processing the above-mentioned lot is stored in the container placement unit 8. When exhaust from the supply and exhaust pipe 68 constituting the supply and exhaust unit 64 starts, the arm 63 descends, and the container nozzle 20 constituting the container 2 is connected to the mounting position below the arm 63 as described in FIG. 7, and the storage space 54 in the container nozzle 20 is sealed from the outside. When the container nozzle 20 is positioned at the mounting position, the optical path between the irradiation unit 73 and the light receiving unit 74 provided on the arm 63 described in FIG. 4 and FIG. 9 is blocked. In addition, the storage space 54 is depressurized by exhaust from the supply and exhaust pipe 68. Then, the claw portion 71 moves to the gripping position and grips the container nozzle 20 (FIG. 20).

[0062] Next, the arm 63 rises, and as described in Fig. 16, the container nozzle 20 rises together with the arm 63, whereby the bottom cover 31 is removed and the detection body 91 of the detection mechanism 9 corresponding to the container nozzle 20 moves from a lower position to an upper position. Then, when the grasped container nozzle 20 is positioned in the waiting area above the liquid drainage port 111 by the coordinated actions of the arm 63, which are vertical movement, left-right movement, and rotation, the exhaust from the supply and exhaust pipe 68 stops and the supply of air starts, pressurizing the storage space 54. This causes a dummy dispense from the container nozzle 20. In other words, the resist is discharged into the liquid drainage port 111 (Fig. 21).

[0063] When a predetermined amount of resist is discharged into the drain port 111, the supply of air from the supply and exhaust pipe 68 is stopped and exhaust is started to reduce the pressure in the storage space 54, and the discharge of the resist is stopped. In other words, the dummy dispensing is stopped. Thereafter, the wafer W is transported to the resist coating device 1 by the transport mechanism, and the central part of the back surface of the wafer W is suction-held by the spin chuck 12. The arm 63 is raised and lowered, moved left and right, and rotated, and the solvent supply nozzle 60 is positioned above the center of the wafer W. Then, the solvent is discharged onto the center of the wafer W, the wafer W is rotated, and the solvent is applied to the entire front surface of the wafer W by spin coating.

[0064] Next, the arm 63 rotates and moves left and right, and the container nozzle 20 is placed at the processing position above the center of the wafer W, instead of the solvent supply nozzle 60. As in the case of performing the dummy dispense, the exhaust from the supply and exhaust pipe 68 is stopped and the air supply is started, so that the storage space 54 is pressurized, and the resist R is discharged to the center of the rotating wafer W, and the resist R is applied to the entire surface of the wafer W by spin coating (FIG. 22). When a predetermined amount of resist is discharged, the air supply from the supply and exhaust pipe 68 is stopped and the exhaust is started, so that the storage space 54 is depressurized, and the discharge of the resist R from the container nozzle 20 is stopped, as in the case of stopping the dummy dispense. The resist R applied to the wafer W is dried to form a resist film. As the arm 63 moves, the container nozzle 20 returns to the standby area above the drain port 111 (FIG. 23). A solvent is supplied to the peripheral portion of the rotating wafer W from the peripheral portion nozzle 14 that has moved above the peripheral portion of the wafer W, and after the resist film is removed from the peripheral portion, the rotation of the wafer W is stopped. Thereafter, the wafer W is carried out of the resist coating apparatus 1 by the transfer mechanism.

[0065] Next, a wafer W belonging to the same lot as the previously processed wafer W is transported to the resist coating apparatus 1 and held on the spin chuck 12. The movement of the arm 63 causes the solvent supply nozzle 60 and the container nozzle 20 to move again above the wafer W, and a process similar to that performed on the previous wafer W is performed. In this manner, the solvent supply nozzle 60 and the container nozzle 20 move between the waiting area and above the wafer W, and the process is repeatedly performed on the wafers W of the same lot that are transported successively.

[0066] Then, when the processing of the last wafer W of the lot is completed, the container nozzle 20 is positioned on the lower cover 31 that was attached to the container nozzle 20. Next, the transfer unit 6 performs the reverse operation to that performed when the lower cover 31 was removed, and the lower cover 31 is attached to the container nozzle 20, the grip of the container nozzle 20 is released, the container nozzle 20 is released from the mounting position of the arm 63, and exhaust from the supply and exhaust pipe 68 is stopped, and the arm 63 moves so that the solvent supply nozzle 60 is positioned at the standby position. That is, the state returns to that shown in FIG. 19. When processing the wafers W of the subsequent lot, the same operation as that of the processing of the previous lot is performed, except that the container nozzle 20 of the container 2 corresponding to that lot is gripped by the arm 63.

[0067] Incidentally, when applying resist to the wafer W, as described in Patent Document 1, it is conceivable to configure the apparatus so that a nozzle and a resist supply source (tank) are connected by a pipe, and the resist is discharged from the nozzle by a pump installed in the pipe. However, if a process is performed using a plurality of types of resist with such an apparatus configuration, when switching the resist to be used, the tank is replaced with one that stores the necessary resist, which requires the trouble of connecting the tank to the pipe. Furthermore, when replacing the tank in this way, in order to prevent the resist supplied to the wafer W from being contaminated by other resists or from being mixed with air bubbles, it is necessary to perform operations such as cleaning the pipe with a cleaning liquid, removing the cleaning liquid from the pipe, and filling the pipe with resist. Therefore, there is a risk that a great deal of effort will be required for preparations (operations associated with the process) before the process is performed.

[0068] In addition to replacing the tank, it is possible to provide multiple piping systems that connect nozzles and tanks and have valves and pumps interposed therebetween, and supply various types of resist to the wafer W by switching the piping system to be used. However, since such piping systems require a relatively large space, the number that can be installed in the equipment is limited. Therefore, the types of resist that can be used in the equipment are limited by the number of piping systems, and there is a risk that a sufficient number of types of resist cannot be used. Alternatively, it is possible for an operator to manually supply resist to the wafer W. That is, it is possible for an operator to tilt a bottle containing a desired resist over the wafer W and supply it each time processing is performed. However, in this case, when processing multiple wafers W in succession, the operator must always be on standby near the equipment, which increases the operator's time and burden.

[0069] As described above, the container nozzle 20 constituting the container 2 is provided with the discharge port 25, the resist storage space 54, and the opening 46. According to the resist coating apparatus 1, the supply and exhaust pipe 68 constituting the transport section 6 can advance and retreat into the container nozzle 20 through the opening 46, and the storage space 54 can be pressurized and depressurized by supply and exhaust in the container nozzle 20. Therefore, the resist can be discharged from the discharge port 25 only when necessary, and leakage of the resist from the discharge port 25 is prevented in other cases. The holding part 7 provided in the transport section 6 can freely switch between holding the container nozzle 20 to the transport section 6 and releasing the holding. In addition, since the processing liquid (resist in this example) in the container nozzle 20 is pressurized and supplied by the supply and exhaust pipe 68 as described above, it is sufficient to provide the transport section 6 with a gas pipe for pressurization and depressurization, and there is no need to provide a pipe for passing the processing liquid. Therefore, in the resist coating apparatus 1, as described above, an arbitrary container 2 can be selected, and the container nozzle 20 constituting the container 2 can be transported onto the wafer W to perform resist coating. Therefore, compared to the above-mentioned manual work, the labor of the workers is reduced, and the labor of the work accompanying the above-mentioned processing such as cleaning of the pipes is also reduced. Furthermore, according to the resist coating device 1, it is not necessary to install a piping system for each type of resist, and the number of types of resist that can be used can be increased simply by increasing the number of containers 2 to be installed. Therefore, there is an advantage that a large number of containers 2 can be installed in the container arrangement section 8 as shown in the example, and processing can be performed by selecting from a large number of types of resist.

[0070] The container 2 is provided with a lower cover 31 that is attached and detached by raising and lowering the container nozzle 20, and when the lower cover 31 is attached, the discharge port 25 of the container nozzle 20 is blocked, thereby preventing the resist from flowing out from the discharge port 25. Since the lower cover 31 is provided, it is not necessary to reduce the pressure inside the container nozzle 20 except when the container is being transported by the transport unit 6. In other words, the container arrangement unit 8 in which the container 2 is arranged does not need to be provided with a mechanism for reducing the pressure inside the container nozzle 20, which is advantageous in that the device configuration can be simplified. Since the lower cover 31 is configured to be freely attached and detached to the container arrangement unit 8, the container 2 can be easily replaced with respect to the container arrangement unit 8 while maintaining a state in which the resist does not flow out from the discharge port 25. Therefore, in combination with the configuration of the container arrangement unit 8 that is movable and detachable from the device as described above, the container 2 in the resist coating device 1 can be easily replaced. As mentioned above, the container placement section 8 can be moved back and forth using the slider 102 and can be removed from the device when positioned in the forward position. However, even if the configuration only allows movement, rather than back and forth movement and removal, this is advantageous because it reduces the burden on the worker when attaching and detaching the container 2.

[0071] In addition, the container nozzle 20 is provided with a first protrusion 28 for fitting the container nozzle 20 with the bottom lid 31, and the first protrusion 28 is also used to form an engagement with the bottom lid 31. Since the first protrusion 28 is configured to serve each role in this way, the configuration of the outer periphery of the container nozzle 20 is prevented from becoming complicated. As a result, the outer periphery is prevented from becoming large, and a large number of container nozzles 20 can be densely arranged in the container arrangement section 8, which contributes to improving the selectivity of usable resist. In addition, the container nozzle 20 is provided with a handle 26 along its circumferential direction, and an upper lid 41 is provided above the handle 26, and the upper surface of the upper lid 41 is configured as a sealing surface that comes into close contact with an O-ring 67 of the conveying section 6 to seal the inside of the container nozzle 20. Therefore, when the handle 26 is gripped by the claw portion 71 and the support portion 72 constituting the claw portion 71 supports the handle 26 from below, the upper lid 41 is pressed relatively toward the container body 21 by the O-ring 67, which is an elastic body. Therefore, the top lid 41 is unlikely to come loose from the container body 21, which has the advantage that a high level of sealing is achieved within the container nozzle 20 during transportation. The handle 26 of the container nozzle 2 need only be configured to be able to grip the container nozzle 20, and is not limited to being annular, and may be, for example, protrusions formed at intervals in the circumferential direction of the outer circumferential surface of the container body 21. Even in this case, the container nozzle 20 can be gripped so that the top lid 41 is relatively pressed toward the container body 21 by using the O-ring 64 as described above.

[0072] Incidentally, the container 2 may be disposable, but may also be refilled with resist after use and reused. In such a case of reuse, since the top cover 41 is detachable from the container body 21 as described above, it is advantageous that the refilling can be easily performed. In addition, the partition member 51 is provided in the container 2 as described above, and the adhesion of resist to the supply and exhaust pipe 68 caused by the pressure change in the container 2 and the vibration during transportation is prevented as described above. However, such contamination can be prevented by adjusting the supply and exhaust volume or suppressing the vibration by adjusting the speed during transportation. Therefore, the container 2 may be configured without the partition member 51.

[0073] The conveying unit 6 of the resist coating apparatus 1 is not limited to being provided with the gripping unit 7 described above to hold the container nozzle 20, and may be provided with a mechanism for sucking the top lid 41 of the container 2 to hold the container nozzle 20, and may be configured to be freely attached and detached to the above-mentioned mounting position. Alternatively, a groove may be formed on the inner peripheral side surface of the recess 45 in the top lid 41 of the container 2, and a protrusion that can freely protrude and retract may be provided on the side peripheral surface of the container connection unit 66 of the conveying unit 6. When the container connection unit 66 is recessed into the recess 45, the protrusion protrudes from the side peripheral surface of the container connection unit 66 and engages with the groove of the recess 45, so that the conveying unit 6 holds the container nozzle 20. The mechanism for attaching and detaching the container nozzle 20 provided in the conveying unit 6 in this way is not limited to being configured with the gripping unit 7.

[0074] Further, the arm 63 constituting the transport unit 6 can move left and right, and can also rotate, so that the gripper 7 at the tip end of the arm 63 can move back and forth in addition to left and right movement. However, the arm 63 may not rotate, and the containers 2 may be arranged in a line in the left and right direction according to the left and right movement range of the arm 63. However, since the gripper 7 can move back and forth as described above, it is advantageous because a large number of containers 2 can be installed. The layout of the containers 2 in the container arrangement unit 8 is not limited to the above-mentioned example as long as the arm 63 can receive each container 2, and can be arbitrarily set according to the movement range of the gripper 7 and the supply and exhaust unit 64. Furthermore, the container arrangement unit 8 is not limited to a configuration in which a plurality of containers 2 are arranged, and only one container 2 may be arranged. For example, the container arrangement unit 8 may be provided with a lid connected to a drive mechanism so as to be movable between a position above the container 2 that blocks the opening 46 and the outside of the container 2. Therefore, the opening 46 of the container nozzle 20 is not limited to being open all the time, and the entry path forming portion that constitutes the container 2 need only be configured to allow the entry portion, exemplified as the supply and exhaust pipe 48, to enter the interior.

[0075] The substrate processing apparatus of the present disclosure is not limited to a configuration in which a resist is applied to form a resist film. For example, various processing liquids such as a processing liquid for coating an anti-reflection film, a processing liquid for coating an insulating film, a developing liquid, a cleaning liquid for the wafer W, and an adhesive for bonding the wafer W can be stored in the container 2 and used for processing.

[0076] It should be noted that the embodiments disclosed herein should be considered to be illustrative and not restrictive in all respects. The above-described embodiments may be omitted, substituted, modified, and combined in various forms without departing from the scope and spirit of the appended claims. [Explanation of symbols]

[0077] W wafer 2 containers 20 Container Nozzle 25 Outlet 46 Opening 54 Storage space

Claims

1. a storage space forming portion having a storage space formed therein for storing a processing liquid for processing a substrate; a discharge port for the treatment liquid provided in the storage space forming portion; an entry path forming portion provided in the storage space forming portion to form an entry path through which an entry portion that is located inside the storage space forming portion and pressurizes the storage space can enter into the storage space forming portion so that the treatment liquid is discharged from the discharge port; Equipped with The discharge port opens downward, a lower cover that is detachable from the storage space forming portion and that closes the discharge port from below when the lower cover is attached to the storage space forming portion; The container has an engaging portion on the lower lid for detachably engaging the lower lid with a container placement portion in which the container is placed.

2. A container as described in claim 1, wherein a protrusion that is detected by a detection mechanism provided on the container placement portion when the storage space forming portion is positioned at a position where the lower lid engaged with the container placement portion is attached is provided on the storage space forming portion.

3. The lower cover is provided with a groove into which the protrusion fits, 3. The container according to claim 2, wherein the bottom cover is attached to the storage space forming portion by fitting the projection into the groove.

4. A partition member is provided to partition the space surrounded by the storage space forming portion into an upper space facing the access path and a lower space forming the storage space, 4. The container according to claim 1, wherein the partition member is provided with a through hole that communicates between the upper space and the lower space, at a position that does not overlap with the entrance path in a plan view.

5. 5. The container according to claim 1, wherein the storage space forming portion comprises: a container body in which the discharge port is formed; and an upper lid which is detachable from the container body and includes the storage space forming portion.

6. a storage space forming portion having a storage space formed therein for storing a processing liquid for processing a substrate; a discharge port for the treatment liquid provided in the storage space forming portion; an entry path forming portion provided in the storage space forming portion to form an entry path through which an entry portion that is located inside the storage space forming portion and pressurizes the storage space can enter into the storage space forming portion so that the treatment liquid is discharged from the discharge port; Equipped with The discharge port opens downward, a lower cover that is detachable from the storage space forming portion and that closes the discharge port from below when the lower cover is attached to the storage space forming portion; A partition member is provided to partition the space surrounded by the storage space forming portion into an upper space facing the access path and a lower space forming the storage space, A container in which the partition member has a through hole communicating the upper space with the lower space at a position that does not overlap with the entrance path in a plan view.

7. a storage space forming portion having a storage space formed therein for storing a processing liquid for processing a substrate; a discharge port for the treatment liquid provided in the storage space forming portion; an entry path forming portion provided in the storage space forming portion to form an entry path through which an entry portion that is located inside the storage space forming portion and pressurizes the storage space can enter into the storage space forming portion so that the treatment liquid is discharged from the discharge port; Equipped with The discharge port opens downward, a lower cover that is detachable from the storage space forming portion and that closes the discharge port from below when the lower cover is attached to the storage space forming portion; The storage space forming portion is a container comprising a container body in which the discharge port is formed, and an upper lid which is detachable from the container body and has the storage space forming portion.

8. a placement section for placing a substrate; a container arrangement section in which a container is arranged, the container comprising: a storage space forming section having a storage space formed therein for storing a processing liquid for processing the substrate; and an access path forming section for forming an access path into the storage space forming section and a discharge port for the processing liquid provided in the storage space forming section; a transport unit including an attachment / detachment mechanism for the storage space forming unit, the transport unit transporting the storage space forming unit between a processing position where the processing liquid is discharged from the discharge port onto the substrate and the container arrangement unit; an entry section provided on the transport section to enter the inside of the storage space forming section attached to the transport section through the entry path and to perform pressurization and depressurization of the storage space in order to switch between discharging the treatment liquid from the discharge port and stopping the discharge; Equipped with A plurality of the containers are arranged in the container arrangement section, the transport unit is configured to mount a container selected from the plurality of containers; The transport unit is rotatable, and the plurality of containers are provided in a band-shaped area that forms an arc around a rotation axis of the transport unit.

9. a placement section for placing a substrate; a container arrangement section in which a container is arranged, the container comprising: a storage space forming section having a storage space formed therein for storing a processing liquid for processing the substrate; and an access path forming section for forming an access path into the storage space forming section and a discharge port for the processing liquid provided in the storage space forming section; a transport unit including an attachment / detachment mechanism for the storage space forming unit, the transport unit transporting the storage space forming unit between a processing position where the processing liquid is discharged from the discharge port onto the substrate and the container arrangement unit; an entry section provided on the transport section to enter the inside of the storage space forming section attached to the transport section through the entry path and to perform pressurization and depressurization of the storage space in order to switch between discharging the treatment liquid from the discharge port and stopping the discharge; Equipped with The discharge port opens downward, the container includes a lower lid that closes the discharge port from below when the container is attached to the storage space forming portion, the transport unit moves up and down with the storage space forming unit attached thereto, and attaches and detaches the lower lid arranged on the container arrangement unit to and from the storage space forming unit; The substrate processing apparatus further comprises a first detection mechanism provided in the container placement section for detecting the presence or absence of the storage space forming section at a position where the lower lid is attached.

10. The substrate processing apparatus according to claim 9 , wherein the container placement part is provided with an engaged part that engages with an engaging part provided on the lower lid, so that the lower lid can be detachably engaged with the container placement part.

11. 11. The substrate processing apparatus according to claim 9, wherein the transport section is provided with a sealing section that is located above a lower end of the entrance section, surrounds the entrance section in a plan view, and is in close contact with an outer periphery of the entrance path of the storage space forming section in order to seal the storage space when the storage space forming section is attached to the transport section.

12. a cup is provided surrounding the substrate placed on the placement portion, 12. The substrate processing apparatus according to claim 9, further comprising a waiting area for allowing the container held by the transport section to wait between the container and the cup arranged in the container arrangement section in a plan view.

13. 13. The substrate processing apparatus according to claim 9, further comprising a slide member for changing the relative front-to-rear position of the container placement section with respect to the placement section, the slide member being arranged in a left-to-right direction in which the container placement section and the placement section are aligned.

14. 14. The substrate processing apparatus according to claim 9, wherein the transport section is provided with a second detection mechanism for detecting the presence or absence of the reservoir space forming section at a mounting position where the reservoir space forming section is mounted on the transport section.

15. a placement section for placing a substrate; a container arrangement section in which a container is arranged, the container comprising: a storage space forming section having a storage space formed therein for storing a processing liquid for processing the substrate; and an access path forming section for forming an access path into the storage space forming section and a discharge port for the processing liquid provided in the storage space forming section; a transport unit including an attachment / detachment mechanism for the storage space forming unit, the transport unit transporting the storage space forming unit between a processing position where the processing liquid is discharged from the discharge port onto the substrate and the container arrangement unit; an entry section provided on the transport section to enter the inside of the storage space forming section attached to the transport section through the entry path and to perform pressurization and depressurization of the storage space in order to switch between discharging the treatment liquid from the discharge port and stopping the discharge; Equipped with The substrate processing apparatus is provided with a slide member for changing a relative front-to-rear position of the container placement section with respect to the placement section, assuming that the direction in which the container placement section and the placement section are aligned is the left-to-right direction.

16. a placement section for placing a substrate; a container arrangement section in which a container is arranged, the container comprising: a storage space forming section having a storage space formed therein for storing a processing liquid for processing the substrate; and an access path forming section for forming an access path into the storage space forming section and a discharge port for the processing liquid provided in the storage space forming section; a transport unit including an attachment / detachment mechanism for the storage space forming unit, the transport unit transporting the storage space forming unit between a processing position where the processing liquid is discharged from the discharge port onto the substrate and the container arrangement unit; an entry section provided on the transport section to enter the inside of the storage space forming section attached to the transport section through the entry path and to perform pressurization and depressurization of the storage space in order to switch between discharging the treatment liquid from the discharge port and stopping the discharge; Equipped with The substrate processing apparatus, wherein the transport section is provided with a second detection mechanism for detecting the presence or absence of the reservoir space forming section at a mounting position where the reservoir space forming section is mounted on the transport section.

17. The substrate processing apparatus according to claim 9 , wherein the attachment / detachment mechanism includes a gripping portion that grips the storage space forming portion.

18. a placement section for placing a substrate; a container arrangement section in which a container is arranged, the container comprising: a storage space forming section having a storage space formed therein for storing a processing liquid for processing the substrate; and an access path forming section for forming an access path into the storage space forming section and a discharge port for the processing liquid provided in the storage space forming section; a transport unit including an attachment / detachment mechanism for the storage space forming unit, the transport unit transporting the storage space forming unit between a processing position where the processing liquid is discharged from the discharge port onto the substrate and the container arrangement unit; an entry section provided on the transport section to enter the inside of the storage space forming section attached to the transport section through the entry path and to perform pressurization and depressurization of the storage space in order to switch between discharging the treatment liquid from the discharge port and stopping the discharge; A method for operating a substrate processing apparatus comprising: The discharge port opens downward, the container includes a lower lid that closes the discharge port from below when the container is attached to the storage space forming portion, a step of lifting and lowering the conveying unit in a state in which the storage space forming unit is attached, and attaching and detaching the lower lid arranged on the container arrangement unit to and from the storage space forming unit; detecting the presence or absence of the storage space forming portion at a position where the lower lid is attached by a first detection mechanism provided in the container placement portion; A method of operating an apparatus comprising:

19. a placement section for placing a substrate; a container arrangement section in which a container is arranged, the container comprising: a storage space forming section having a storage space formed therein for storing a processing liquid for processing the substrate; and an access path forming section for forming an access path into the storage space forming section and a discharge port for the processing liquid provided in the storage space forming section; a transport unit including an attachment / detachment mechanism for the storage space forming unit, the transport unit transporting the storage space forming unit between a processing position where the processing liquid is discharged from the discharge port onto the substrate and the container arrangement unit; an entry section provided on the transport section to enter the inside of the storage space forming section attached to the transport section through the entry path and to perform pressurization and depressurization of the storage space in order to switch between discharging the treatment liquid from the discharge port and stopping the discharge; A method for operating a substrate processing apparatus comprising: A method for operating an apparatus comprising the step of detecting, by a second detection mechanism provided in the transport section, the presence or absence of the storage space forming part at a mounting position where the storage space forming part is mounted on the transport section.

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