Substrate processing apparatus, plasma generating apparatus, semiconductor device manufacturing method and program

Abstract

To provide a technology that can reduce variations in substrate processing performance for a plurality of substrates.SOLUTION: A substrate processing device includes a processing chamber for processing a substrate, a plasma generation portion that forms plasma, at least two application electrodes with different lengths to which high-frequency power is applied to the plasma generation portion, and a reference electrode to which a reference potential is applied, and the at least two application electrodes are arranged in the plasma generation portion. The lengths of the at least two application electrodes that commonly use the reference electrode are different from each other, and the upper ends of the at least two application electrodes are at different heights.SELECTED DRAWING: Figure 4

Description

[Technical field]

[0001] The present disclosure relates to a substrate processing apparatus, a plasma generating apparatus, a method for manufacturing a semiconductor device, and a program. [Background technology]

[0002] As one step in the manufacturing process of a semiconductor device, substrate processing may be performed in which raw material gases, reactive gases, etc. are activated by plasma and supplied to a substrate accommodated in a processing chamber of a substrate processing apparatus, and various films, such as insulating films, semiconductor films, and conductor films, are formed on the substrate, or various films are removed.

[0003] In mass-produced devices in which fine patterns are formed, lower processing temperatures are required to suppress the diffusion of impurities and to enable the use of materials with low heat resistance, such as organic materials. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] JP 2015-92637 A Summary of the Invention [Problem to be solved by the invention]

[0005] To solve these problems, it is common to use plasma for substrate processing, but when processing multiple substrates simultaneously, the plasma and the activated species generated through it must be supplied in equal amounts to each substrate. When plasma is confined in a space called a buffer chamber and activated species are supplied to multiple substrates through holes, the supply of activated species is likely to be insufficient for substrates that are close to each other in a large space, and processing performance may differ between substrates.

[0006] An object of the present disclosure is to provide a technique capable of reducing variations in substrate processing performance for a plurality of substrates. [Means for solving the problem]

[0007] According to one aspect of the present disclosure, a processing chamber for processing a substrate; A plasma generating unit for generating plasma; The plasma generating unit is provided with at least two application electrodes having different lengths to which high frequency power is applied, and a reference electrode to which a reference potential is applied, The at least two application electrodes, which share the reference electrode, are arranged in the plasma generating unit such that the lengths of the at least two application electrodes are different from each other and the upper ends of the at least two application electrodes are at different heights. Technology is provided. Effect of the Invention

[0008] According to the present disclosure, it is possible to provide a technique that can simultaneously exert the same substrate processing performance on a plurality of substrates. [Brief description of the drawings]

[0009] [Figure 1] 1 is a schematic configuration diagram of a vertical processing furnace of a substrate processing apparatus suitably used in an embodiment of the present disclosure, showing a vertical cross section of a processing furnace portion. [Diagram 2] 2 is a cross-sectional view of the substrate processing apparatus shown in FIG. [Diagram 3] 1 is an enlarged cross-sectional view for explaining a buffer structure of a substrate processing apparatus suitably used in an embodiment of the present disclosure. [Figure 4] 1A and 1B are schematic diagrams for explaining a buffer structure of a substrate processing apparatus suitably used in an embodiment of the present disclosure. [Diagram 5] 1A is a schematic diagram illustrating a buffer structure of a substrate processing apparatus that can be preferably used in another embodiment of the present disclosure, and FIG. 1B is a longitudinal cross-sectional view of the schematic diagram illustrating a buffer structure of a substrate processing apparatus that can be preferably used in another embodiment of the present disclosure. [Figure 6]FIG. 2 is a schematic configuration diagram of a controller in the substrate processing apparatus shown in FIG. 1, and is a block diagram showing an example of a control system of the controller. [Figure 7] 2 is a flowchart showing an example of a substrate processing process using the substrate processing apparatus shown in FIG. [Figure 8] 1 is a schematic cross-sectional view for explaining a first modified example of a vertical processing furnace of a substrate processing apparatus that can be suitably used in an embodiment of the present disclosure. [Figure 9] 11 is a schematic cross-sectional view for explaining a second modified example of a vertical processing furnace of a substrate processing apparatus preferably used in an embodiment of the present disclosure. FIG. [Figure 10] 11 is a schematic cross-sectional view for explaining a third modified example of a vertical processing furnace of a substrate processing apparatus that is preferably used in an embodiment of the present disclosure. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0010] Hereinafter, an embodiment of the present disclosure will be described with reference to FIGS. (1) Configuration of the substrate processing device (heating device) 1, the process furnace 202 has a heater 207 as a heating device (heating mechanism). The heater 207 has a cylindrical shape and is installed vertically by being supported by a heater base (not shown) as a holding plate. The heater 207 also functions as an activation mechanism (excitation unit) that activates (excites) gas by heat, as described later.

[0011] (Processing room) A reaction tube 203 is disposed concentrically with the heater 207 inside the heater 207. The reaction tube 203 is made of a heat-resistant material such as quartz (SiO2) or silicon carbide (SiC) and is formed in a cylindrical shape with a closed upper end and an open lower end. A manifold 209 is disposed concentrically with the reaction tube 203 below the reaction tube 203. The manifold 209 is made of a metal such as stainless steel (SUS) and is formed in a cylindrical shape with an open upper end and a closed lower end. The upper end of the manifold 209 engages with the lower end of the reaction tube 203 and is configured to support the reaction tube 203. An O-ring 220a is provided between the manifold 209 and the reaction tube 203 as a seal member. The manifold 209 is supported by the heater base, so that the reaction tube 203 is installed vertically. The reaction tube 203 and the manifold 209 mainly constitute a processing vessel (reaction vessel). A processing chamber 201 is formed in a cylindrical hollow portion of the processing vessel. The processing chamber 201 is configured to be capable of accommodating a plurality of substrates, i.e., wafers 200. Note that the processing vessel is not limited to the above configuration, and in some cases, only the reaction tube 203 is referred to as the processing vessel.

[0012] (Gas supply section) Nozzles 249a and 249b are provided in the processing chamber 201 so as to penetrate the sidewall of the manifold 209. Gas supply pipes 232a and 232b are connected to the nozzles 249a and 249b, respectively. In this manner, the processing vessel is provided with two nozzles 249a and 249b and two gas supply pipes 232a and 232b, and it is possible to supply a plurality of types of gases into the processing chamber 201. Note that, when only the reaction tube 203 is used as the processing vessel, the nozzles 249a and 249b may be provided so as to penetrate the sidewall of the reaction tube 203.

[0013] Gas supply pipes 232a and 232b are provided with mass flow controllers (MFCs) 241a and 241b, which are flow rate controllers (flow rate control parts), and valves 243a and 243b, which are on-off valves, in order from the upstream direction. Gas supply pipes 232c and 232d, which supply inert gas, are connected to the gas supply pipes 232a and 232b downstream of the valves 243a and 243b. Gas supply pipes 232c and 232d are provided with MFCs 241c and 241d and valves 243c and 243d, respectively, in order from the upstream direction.

[0014] As shown in FIG. 2, the nozzle 249a is provided in the space between the inner wall of the reaction tube 203 and the wafers 200, rising from the lower part to the upper part of the inner wall of the reaction tube 203 toward the upper part in the loading direction of the wafers 200. That is, the nozzle 249a is provided in the area horizontally surrounding the wafer arrangement area (mounting area) on the side of the wafer arrangement area (mounting area) where the wafers 200 are arranged (mounted), so as to be along the wafer arrangement area. That is, the nozzle 249a is provided in the direction perpendicular to the surface (flat surface) of the wafer 200 on the side of the end (periphery) of each wafer 200 carried into the processing chamber 201. A gas supply hole 250a for supplying gas is provided on the side of the nozzle 249a. The gas supply hole 250a opens toward the center of the reaction tube 203, and is capable of supplying gas toward the wafers 200. A plurality of gas supply holes 250a are provided from the lower part to the upper part of the reaction tube 203, each having the same opening area, and further provided at the same opening pitch.

[0015] A nozzle 249b is connected to the tip of the gas supply pipe 232b. The nozzle 249b is provided in a buffer chamber 237, which is a gas dispersion space. As shown in FIG. 2, the buffer chamber 237 is provided in a space having an annular shape in a plan view between the inner wall of the reaction tube 203 and the wafers 200, and in a portion extending from the lower part to the upper part of the inner wall of the reaction tube 203 along the loading direction of the wafers 200. That is, the buffer chamber 237 is formed by a buffer structure (partition wall) 300 in a region horizontally surrounding the wafer arrangement region on the side of the wafer arrangement region, so as to be aligned with the wafer arrangement region. The buffer structure 300 is made of an insulating material that is a heat-resistant material such as quartz or SiC, and gas supply ports 302, 304, and 306 for supplying gas are formed on the wall surface of the buffer structure 300 formed in an arc shape. 2 and 3, the gas supply ports 302, 304, and 306 are opened toward the center of the reaction tube 203 at opposing wall positions in a plasma generation region 224a between rod-shaped electrodes 269 and 270, a plasma generation region 224b between rod-shaped electrodes 270 and 271, and a region between the rod-shaped electrode 271 and the nozzle 249b, as described below, and are capable of supplying gas toward the wafers 200. A plurality of gas supply ports 302, 304, and 306 are provided from the lower part to the upper part of the reaction tube 203, each having the same opening area, and further provided at the same opening pitch.

[0016] The nozzle 249b is provided so as to rise upward in the stacking direction of the wafers 200 along the inner wall of the reaction tube 203 from the lower part to the upper part. That is, the nozzle 249b is provided inside the buffer structure 300, in a region horizontally surrounding the wafer arrangement region on the side of the wafer arrangement region in which the wafers 200 are arranged, along the wafer arrangement region. That is, the nozzle 249b is provided in a direction perpendicular to the surface of the wafer 200 on the side of the end of the wafer 200 carried into the processing chamber 201. A gas supply hole 250b for supplying gas is provided on the side of the nozzle 249b. The gas supply hole 250b opens toward a wall surface formed in a radial direction with respect to the wall surface formed in an arc shape of the buffer structure 300, and it is possible to supply gas toward the wall surface. As a result, the reaction gas is dispersed in the buffer chamber 237 and is not directly sprayed onto the rod-shaped electrodes 269 to 271, suppressing the generation of particles. Similar to the gas supply holes 250a, a plurality of gas supply holes 250b are provided from the lower part to the upper part of the reaction tube 203.

[0017] In this embodiment, the gas is transported through the nozzles 249a, 249b and the buffer chamber 237 arranged in a vertically elongated space that is annular in plan view and is defined by the inner wall of the side wall of the reaction tube 203 and the ends of the multiple wafers 200 arranged in the reaction tube 203, that is, the cylindrical space. Then, the gas is ejected into the reaction tube 203 for the first time near the wafer 200 from the gas supply holes 250a, 250b and the gas supply ports 302, 304, 306 that are opened in the nozzles 249a, 249b and the buffer chamber 237, respectively. Then, the main flow of the gas in the reaction tube 203 is parallel to the surface of the wafer 200, that is, the horizontal direction. With this configuration, the gas can be uniformly supplied to each wafer 200, and the uniformity of the film thickness of the film formed on each wafer 200 can be improved. The gas flowing over the surface of the wafer 200, i.e., the residual gas after the reaction, flows toward the exhaust port, i.e., toward the exhaust pipe 231 described below. However, the direction of the flow of this residual gas is appropriately determined depending on the position of the exhaust port, and is not limited to the vertical direction.

[0018] From the gas supply pipe 232a, as a raw material containing a predetermined element, for example, a silane raw material gas containing silicon (Si) as the predetermined element, is supplied into the processing chamber 201 via the MFC 241a, the valve 243a, and the nozzle 249a.

[0019] The silane raw material gas refers to a gaseous silane raw material, for example, a gas obtained by vaporizing a silane raw material that is in a liquid state at room temperature and normal pressure, a silane raw material that is in a gaseous state at room temperature and normal pressure, etc. In this specification, the term "raw material" may mean "a liquid raw material that is in a liquid state", "a raw material gas that is in a gaseous state", or both.

[0020] As the silane precursor gas, for example, a precursor gas containing Si and an amino group (amine group), i.e., an aminosilane precursor gas, can be used. The aminosilane precursor is a silane precursor having an amino group, and also a silane precursor having an alkyl group such as a methyl group, an ethyl group, or a butyl group, and is a precursor containing at least Si, nitrogen (N), and carbon (C). In other words, the aminosilane precursor referred to here can be called an organic precursor, or an organic aminosilane precursor.

[0021] As the aminosilane source gas, for example, bis-tertiary butyl aminosilane (SiH2[NH(C4H9)]2, abbreviated as BTBAS) gas can be used. BTBAS is a source gas that contains one Si in one molecule, has Si-N bonds and NC bonds, and does not have Si-C bonds. BTBAS gas acts as a Si source.

[0022] When using a liquid source that is in a liquid state at room temperature and pressure, such as BTBAS, the liquid source is vaporized using a vaporization system such as a vaporizer or bubbler and supplied as a silane source gas (such as BTBAS gas).

[0023] From the gas supply pipe 232b, a reactant having a different chemical structure from the source material, for example, an oxygen (O)-containing gas, is supplied into the processing chamber 201 via the MFC 241b, the valve 243b, and the nozzle 249b.

[0024] The O-containing gas acts as an oxidizing agent (oxidizing gas), i.e., an O source. For example, oxygen (O2) gas or water vapor (HO gas) can be used as the O-containing gas. When O2 gas is used as the oxidizing agent, the gas is excited into plasma using a plasma source described later, and an excited gas (O2 * It will be supplied as gas.

[0025] From the gas supply pipes 232c and 232d, an inert gas such as nitrogen (N2) gas is supplied into the processing chamber 201 via the MFCs 241c and 241d, the valves 243c and 243d, and the nozzles 249a and 249b, respectively.

[0026] A raw material supply system as a first gas supply system is mainly composed of the gas supply pipe 232a, the MFC 241a, and the valve 243a. A reactant supply system as a second gas supply system is mainly composed of the gas supply pipe 232b, the MFC 241b, and the valve 243b. An inert gas supply system is mainly composed of the gas supply pipes 232c and 232d, the MFCs 241c and 241d, and the valves 243c and 243d. The raw material supply system, the reactant supply system, and the inert gas supply system are also simply referred to as a gas supply system (gas supply section).

[0027] (Substrate support) As shown in FIG. 1, the boat 217 as a substrate support (substrate support part) is configured to support a plurality of wafers 200, for example, 25 to 200, in a horizontal position and aligned vertically with their centers aligned, in multiple stages, that is, arranged at intervals. The boat 217 is made of a heat-resistant material such as quartz or SiC. At the bottom of the boat 217, heat insulating plates 218 made of a heat-resistant material such as quartz or SiC are supported in multiple stages. This configuration makes it difficult for heat from the heater 207 to be transmitted to the seal cap 219. However, this embodiment is not limited to this form. For example, instead of providing the heat insulating plate 218 at the bottom of the boat 217, a heat insulating cylinder configured as a cylindrical member made of a heat-resistant material such as quartz or SiC may be provided.

[0028] (Plasma generation section) Next, the plasma generating unit will be described with reference to FIGS.

[0029] As shown in FIG. 2, a capacitively coupled plasma (CCP) is used to generate plasma inside a buffer chamber 237, which is a vacuum partition made of quartz or the like, when a reactive gas is supplied.

[0030] In one example of this embodiment, as shown in Figs. 3 and 4, three rod-shaped electrodes 269, 270, and 271 made of a conductor and having an elongated structure are arranged in the buffer chamber 237 from the lower part to the upper part of the reaction tube 203 along the loading direction of the wafers 200. Each of the rod-shaped electrodes 269, 270, and 271 is provided in parallel with the nozzle 249b. Each of the rod-shaped electrodes 269, 270, and 271 is protected by being covered from the upper part to the lower part by an electrode protection tube 275. The electrode protection tube 275 protects both the rod-shaped electrodes 269 and 271, and is made of a quartz tube having a U-shape at the upper part in the buffer chamber 237 and a quartz tube that protects the rod-shaped electrode 270. In this embodiment, in the buffer chamber 237, the two quartz tubes are connected at their upper portions to be integrated, but they may be separated from each other, or may have a constricted shape at their connection portion to act as a stopper for the rod electrode 270 so that the rod electrodes 269 and 270 do not come into contact with each other. The rod electrode 269 is inserted from the lower portion of the electrode protection tube 275 and folded back at the bent portion of the U-shape so that its tip is located at the upper portion of the electrode protection tube 275. That is, the U-shape is formed in the direction opposite to the insertion direction of the rod electrode 269. The rod electrode 270 is arranged so that its tip is located at the upper portion of the electrode protection tube 275, and the rod electrode 271 is arranged so that its tip is located at the lower portion of the electrode protection tube 275. The rod-shaped electrodes 269 and 271 have different lengths, more specifically, their lengths in the loading direction of the wafer 200 are different. For example, the rod-shaped electrode 269 is longer than the rod-shaped electrode 271. The tip of the rod-shaped electrode 269 and the tip of the rod-shaped electrode 271 are arranged with a gap between them. The tip of the rod-shaped electrode 269 is located on the upper side of the electrode protection tube 275, but the length can be adjusted by moving the tip upward to shorten it or moving it downward to lengthen it. The tip of the rod-shaped electrode 271 is located on the lower side of the electrode protection tube 275, but the length can be adjusted by moving the tip upward to lengthen it or moving it downward to shorten it. That is, the lengths of the rod-shaped electrodes 269 and 271 can be adjusted within a range where the rod-shaped electrodes 269 and 271 do not come into contact with each other.

[0031] In another example of this embodiment, as shown in FIG. 3 and FIG. 5, three rod-shaped electrodes 269, 270, 271 made of a conductor and having an elongated structure are arranged in the buffer chamber 237 from the lower part to the upper part of the reaction tube 203 along the loading direction of the wafers 200. Each of the rod-shaped electrodes 269, 270, 271 is provided in parallel with the nozzle 249b. Each of the rod-shaped electrodes 269, 270, 271 is protected by being covered from the upper part to the lower part by an electrode protection tube 275. The electrode protection tube 275 is made of a quartz tube that protects the rod-shaped electrode 269 and has a U-shape from the inside to the outside of the upper part of the buffer chamber 237, and a quartz tube that protects each of the rod-shaped electrodes 270, 271. In this embodiment, the above-mentioned multiple quartz tubes are connected at their upper parts and integrated in the buffer chamber 237, but they may be individually separated. The rod-shaped electrode 269 is inserted from the lower part of the electrode protection tube 275 outside the reaction tube 203, bent back at the bent part of the U-shape, and disposed so that its tip is located at the upper part of the electrode protection tube 275. That is, the rod-shaped electrode 269 is formed into a U-shape in the direction opposite to the insertion direction of the rod-shaped electrode 269. The rod-shaped electrode 270 is disposed so that its tip is located at the upper part of the electrode protection tube 275, and the rod-shaped electrode 271 is disposed so that its tip is located at the lower part of the electrode protection tube 275. The rod-shaped electrode 269 and the rod-shaped electrode 271 have different lengths, more specifically, their lengths in the loading direction of the wafers 200 are different. For example, the rod-shaped electrode 269 is longer than the rod-shaped electrode 271. The tip of the rod-shaped electrode 269 is disposed at the upper part of the electrode protection tube 275, but the length can be adjusted by moving the tip upward to shorten it or moving it downward to lengthen it. The tip of rod-shaped electrode 271 is located on the lower side of electrode protection tube 275, but the length can be adjusted by moving the tip upward to make it longer or downward to shorten it. In this embodiment, only one rod-shaped electrode 269 is inserted, but another electrode that is shorter than the lower part of electrode protection tube 275 may be inserted and arranged so that its tip is located at the lower part of electrode protection tube 275.

[0032] In both of the above-mentioned embodiments, as shown in Fig. 2, the rod-shaped electrodes 269, 271 as application electrodes arranged at both ends of the rod-shaped electrodes 269, 270, 271 are connected to a high-frequency power source 273 via a matching unit 272 to apply high-frequency power, and the rod-shaped electrode 270 as a reference electrode is connected to the earth which is a reference potential and is grounded to be given a reference potential. That is, the rod-shaped electrodes connected to the high-frequency power source 273 and the grounded rod-shaped electrodes are alternately arranged, and the rod-shaped electrode 270 arranged between the rod-shaped electrodes 269, 271 connected to the high-frequency power source 273 is used as a grounded rod-shaped electrode in common with the rod-shaped electrodes 269, 271. In other words, the grounded rod-shaped electrode 270 is arranged so as to be sandwiched between the rod-shaped electrodes 269, 271 connected to the adjacent high-frequency power source 273, and the rod-shaped electrodes 269 and 270, and similarly the rod-shaped electrodes 271 and 270 are configured to be paired, respectively, to generate plasma. That is, the grounded rod electrode 270 is used in common for the rod electrodes 269, 271 connected to two high frequency power supplies 273 adjacent to the rod electrode 270. This allows the number of reference electrodes to be reduced. Then, by applying radio frequency (RF) power from the high frequency power supply 273 to the rod electrodes 269, 271, plasma is generated in the plasma generation region 224a between the rod electrodes 269, 270 and the plasma generation region 224b between the rod electrodes 270, 271. The rod electrodes 269, 270, 271 and the electrode protection tube 275 mainly constitute a plasma generation section (plasma generation device) as a plasma source. The matching box 272 and the high frequency power supply 273 may be considered to be included in the plasma source. As described later, the plasma source functions as a plasma excitation section (activation mechanism) that excites a gas into plasma, that is, excites (activates) it into a plasma state. Although an example in which two application electrodes, rod-shaped electrodes 269 and 271, are used, it is sufficient that there are at least two application electrodes.

[0033] The electrode protection tube 275 is structured so that each of the rod-shaped electrodes 269, 270, and 271 can be inserted into the buffer chamber 237 while being isolated from the atmosphere in the buffer chamber 237. If the O2 concentration inside the electrode protection tube 275 is approximately the same as the O2 concentration in the outside air (atmosphere), the rod-shaped electrodes 269, 270, and 271 inserted into the electrode protection tube 275 will be oxidized by the heat from the heater 207. For this reason, the O2 concentration inside the electrode protection tube 275 can be reduced and the oxidation of the rod-shaped electrodes 269, 270, and 271 can be prevented by filling the inside of the electrode protection tube 275 with an inert gas such as N2 gas or purging the inside of the electrode protection tube 275 with an inert gas such as N2 gas using an inert gas purge mechanism.

[0034] (Exhaust section) As shown in FIG. 1, the reaction tube 203 is provided with an exhaust pipe 231 for exhausting the atmosphere in the processing chamber 201. A vacuum pump 246 as a vacuum exhaust device is connected to the exhaust pipe 231 via a pressure sensor 245 as a pressure detector (pressure detection unit) for detecting the pressure in the processing chamber 201 and an APC (Auto Pressure Controller) valve 244 as an exhaust valve (pressure adjustment unit). The APC valve 244 is a valve configured to be able to perform evacuation and stop evacuation in the processing chamber 201 by opening and closing the valve while the vacuum pump 246 is in operation, and further, to adjust the pressure in the processing chamber 201 by adjusting the valve opening based on pressure information detected by the pressure sensor 245 while the vacuum pump 246 is in operation. An exhaust system is mainly configured by the exhaust pipe 231, the APC valve 244, and the pressure sensor 245. The vacuum pump 246 may be included in the exhaust system. The exhaust pipe 231 is not limited to being provided in the reaction tube 203, but may be provided in the manifold 209 in the same manner as the nozzles 249a and 249b.

[0035] (Peripheral Devices) Below the manifold 209, a seal cap 219 is provided as a furnace port cover capable of air-tightly closing the lower end opening of the manifold 209. The seal cap 219 is configured to abut against the lower end of the manifold 209 from below in the vertical direction. The seal cap 219 is made of a metal such as SUS and is formed in a disk shape. An O-ring 220b is provided on the upper surface of the seal cap 219 as a seal member that abuts against the lower end of the manifold 209.

[0036] A rotation mechanism 267 for rotating the boat 217 is installed on the opposite side of the seal cap 219 from the processing chamber 201. A rotation shaft 255 of the rotation mechanism 267 is connected to the boat 217 through the seal cap 219. The rotation mechanism 267 is configured to rotate the wafers 200 by rotating the boat 217. The seal cap 219 is configured to be raised and lowered in the vertical direction by a boat elevator 115 as a lifting mechanism vertically installed outside the reaction tube 203. The boat elevator 115 is configured to be able to load and unload the boat 217 into and out of the processing chamber 201 by lifting and lowering the seal cap 219.

[0037] The boat elevator 115 is configured as a transfer device (transfer mechanism) that transfers the boat 217, i.e., the wafers 200, into and out of the processing chamber 201. A shutter 219s is provided below the manifold 209 as a furnace port cover that can airtightly close the lower end opening of the manifold 209 while the seal cap 219 is lowered by the boat elevator 115. The shutter 219s is made of a metal such as SUS and is formed in a disk shape. An O-ring 220c is provided on the upper surface of the shutter 219s as a seal member that contacts the lower end of the manifold 209. The opening and closing operation (lifting and lowering operation, rotating operation, etc.) of the shutter 219s is controlled by a shutter opening and closing mechanism 115s.

[0038] A temperature sensor 263 serving as a temperature detector is installed inside the reaction tube 203. By adjusting the power supply to the heater 207 based on temperature information detected by the temperature sensor 263, the temperature distribution in the process chamber 201 becomes a desired one. The temperature sensor 263 is installed along the inner wall of the reaction tube 203, similar to the nozzles 249a and 249b.

[0039] (Control device) Next, the control device will be described with reference to Fig. 7. As shown in Fig. 67, the controller 121, which is a control unit (control device), is configured as a computer equipped with a CPU (Central Processing Unit) 121a, a RAM (Random Access Memory) 121b, a storage device 121c, and an I / O port 121d. The RAM 121b, the storage device 121c, and the I / O port 121d are configured to be able to exchange data with the CPU 121a via an internal bus 121e. An input / output device 122 configured as, for example, a touch panel, is connected to the controller 121.

[0040] The storage device 121c is composed of, for example, a flash memory, an HDD (Hard Disk Drive), etc. A control program for controlling the operation of the substrate processing apparatus, a process recipe in which a procedure and conditions of a film formation process described later are written, etc. are readably stored in the storage device 121c. The process recipe is a combination of procedures in various processes (film formation processes) described later that are executed by the controller 121 to obtain a predetermined result, and functions as a program. Hereinafter, the process recipe, the control program, etc. are collectively referred to simply as a program. In addition, the process recipe is also simply referred to as a recipe. In this specification, when the word program is used, it may include only a recipe, only a control program, or both. The RAM 121b is configured as a memory area (work area) in which the programs and data read by the CPU 121a are temporarily stored.

[0041] The I / O port 121d is connected to the above-mentioned MFCs 241a to 241d, valves 243a to 243d, pressure sensor 245, APC valve 244, vacuum pump 246, heater 207, temperature sensor 263, rotation mechanism 267, boat elevator 115, shutter opening / closing mechanism 115s, high frequency power supply 273, and the like.

[0042] The CPU 121a is configured to read and execute a control program from the storage device 121c, and to read a recipe from the storage device 121c in response to an input of an operation command from the input / output device 122, etc. The CPU 121a is configured to control the rotation mechanism 267, the flow rate adjustment operation of various gases by the MFCs 241a to 241d, the opening and closing operations of the valves 243a to 243d, the opening and closing operation of the APC valve 244 and the pressure adjustment operation by the APC valve 244 based on the pressure sensor 245, the start and stop of the vacuum pump 246, the temperature adjustment operation of the heater 207 based on the temperature sensor 263, the forward and reverse rotation, rotation angle and rotation speed adjustment operation of the boat 217 by the rotation mechanism 267, the lifting and lowering operation of the boat 217 by the boat elevator 115, the opening and closing operation of the shutter 219s by the shutter opening and closing mechanism 115s, the power supply of the high frequency power source 273, etc., in accordance with the contents of the read recipe.

[0043] The controller 121 can be configured by installing the above-mentioned program stored in an external storage device (for example, a magnetic disk such as a hard disk, an optical disk such as a CD, a magneto-optical disk such as an MO, or a semiconductor memory such as a USB memory) 123 into a computer. The storage device 121c and the external storage device 123 are configured as computer-readable recording media. Hereinafter, these are collectively referred to simply as recording media. When the term recording media is used in this specification, it may include only the storage device 121c alone, only the external storage device 123 alone, or both. The program may be provided to the computer using a communication means such as the Internet or a dedicated line, without using the external storage device 123.

[0044] (2) Substrate processing An example of a process for forming a film on a substrate as one step of a manufacturing process of a semiconductor device using the above-mentioned substrate processing apparatus will be described with reference to Fig. 7. In the following description, the operation of each part constituting the substrate processing apparatus is controlled by a controller 121.

[0045] 7 may be expressed as follows for convenience in this specification. Similar notations will be used in the following explanations of modified examples and other embodiments.

[0046] (BTBAS→O2 * )×n ⇒ SiO

[0047] In this specification, the term "wafer" may mean "the wafer itself" or "a laminate of a wafer and a predetermined layer, film, etc. formed on its surface." In this specification, the term "surface of a wafer" may mean "the surface of the wafer itself" or "the surface of a predetermined layer, etc. formed on the wafer." In this specification, the phrase "forming a predetermined layer on a wafer" may mean "forming a predetermined layer directly on the surface of the wafer itself" or "forming a predetermined layer on a layer, etc. formed on the wafer."

[0048] In addition, the term "substrate" used in this specification is synonymous with the term "wafer."

[0049] (Loading step: S1) When a plurality of wafers 200 are loaded into the boat 217 (wafer charge), the shutter 219s is moved by the shutter opening / closing mechanism 115s to open the lower end opening of the manifold 209 (shutter open). Thereafter, as shown in Fig. 1, the boat 217 supporting the plurality of wafers 200 is lifted by the boat elevator 115 and carried into the processing chamber 201 (boat load). In this state, the seal cap 219 seals the lower end of the manifold 209 via the O-ring 220b.

[0050] (Pressure and temperature adjustment step: S2) The inside of the processing chamber 201, i.e., the space in which the wafer 200 exists, is evacuated (reduced pressure exhaust) by the vacuum pump 246 so that the pressure becomes a desired pressure (vacuum level). At this time, the pressure inside the processing chamber 201 is measured by a pressure sensor 245, and the APC valve 244 is feedback-controlled based on the measured pressure information. The vacuum pump 246 is kept in a constantly operating state at least until the film formation step described later is completed.

[0051] Furthermore, the wafers 200 in the processing chamber 201 are heated by the heater 207 to a desired temperature. At this time, the power supply to the heater 207 is feedback-controlled based on temperature information detected by the temperature sensor 263 so that the processing chamber 201 has a desired temperature distribution. The heating of the processing chamber 201 by the heater 207 continues at least until a film formation step, which will be described later, is completed. However, when the film formation step is performed under a temperature condition below room temperature, the heating of the processing chamber 201 by the heater 207 may not be performed. Note that when only processing is performed under such a temperature, the heater 207 is unnecessary and does not need to be installed in the substrate processing apparatus. In this case, the configuration of the substrate processing apparatus can be simplified.

[0052] Next, the rotation mechanism 267 starts to rotate the boat 217 and the wafers 200. The rotation mechanism 267 continues to rotate the boat 217 and the wafers 200 at least until the film forming step, which will be described later, is completed.

[0053] (Deposition steps: S3, S4, S5, S6) Thereafter, the film forming step is performed by sequentially executing steps S3, S4, S5, and S6.

[0054] (Source gas supply steps: S3, S4) In step S3, the BTBAS gas is supplied to the wafer 200 in the processing chamber 201.

[0055] The valve 243a is opened to allow the BTBAS gas to flow into the gas supply pipe 232a. The BTBAS gas has its flow rate adjusted by the MFC 241a, is supplied into the processing chamber 201 from the gas supply hole 250a via the nozzle 249a, and is exhausted from the exhaust pipe 231. At this time, the BTBAS gas is supplied to the wafer 200. At the same time, the valve 243c is opened to allow the N2 gas to flow into the gas supply pipe 232c. The N2 gas has its flow rate adjusted by the MFC 241c, is supplied into the processing chamber 201 together with the BTBAS gas, and is exhausted from the exhaust pipe 231.

[0056] In addition, in order to prevent the BTBAS gas from entering the nozzle 249b, the valve 243d is opened to allow N2 gas to flow into the gas supply pipe 232d. The N2 gas is supplied into the processing chamber 201 via the gas supply pipe 232d and the nozzle 249b, and is exhausted from the exhaust pipe 231.

[0057] The supply flow rate of the BTBAS gas controlled by the MFC 241a is, for example, 1 sccm or more and 2000 sccm or less, preferably 10 sccm or more and 1000 sccm or less. The supply flow rates of the N2 gas controlled by the MFCs 241c and 241d are, for example, 100 sccm or more and 10000 sccm or less. As described above, the pressure in the process chamber 201 is, for example, 1 to 2666 Pa or less, preferably 67 Pa or more and 1333 Pa or less. The time for which the BTBAS gas is supplied to the wafer 200 is, for example, 1 second or more and 100 seconds or less, preferably 1 second or more and 50 seconds or less.

[0058] The temperature of the heater 207 is set so that the temperature of the wafer 200 is within a range of, for example, 0° C. to 150° C., preferably room temperature (25° C.) to 100° C., and more preferably 40° C. to 90° C. The BTBAS gas is a gas that is easily adsorbed to the wafer 200 and has high reactivity. Therefore, even at a low temperature, for example, around room temperature, the BTBAS gas can be chemically adsorbed onto the wafer 200, and a practical film formation rate can be obtained. By setting the temperature of the wafer 200 to 150° C. or less, further 100° C. or less, or further 90° C. or less, as in this embodiment, the amount of heat applied to the wafer 200 can be reduced, and the thermal history of the wafer 200 can be well controlled. Furthermore, if the temperature is 0° C. or more, the BTBAS can be sufficiently adsorbed onto the wafer 200, and a sufficient film formation rate can be obtained. Therefore, the temperature of the wafer 200 is preferably set within a range of 0° C. to 150° C., preferably room temperature to 100° C., and more preferably 40° C. to 90° C.

[0059] By supplying the BTBAS gas to the wafer 200 under the above-mentioned conditions, a Si-containing layer having a thickness of, for example, less than one atomic layer (one molecular layer) to several atomic layers (several molecular layers) is formed on the wafer 200 (underlying film on the surface). The Si-containing layer may be a Si layer, an adsorption layer of BTBAS, or may include both.

[0060] The Si layer is a general term that includes not only a continuous layer made of Si, but also discontinuous layers and thin Si films formed by overlapping these. The Si that makes up the Si layer includes Si whose bonds with amino groups and H are not completely broken.

[0061] The adsorption layer of BTBAS includes not only a continuous adsorption layer composed of BTBAS molecules, but also a discontinuous adsorption layer. The BTBAS molecules constituting the adsorption layer of BTBAS include those in which the bond between Si and the amino group is partially broken, those in which the bond between Si and H is partially broken, those in which the bond between N and C is partially broken, etc. In other words, the adsorption layer of BTBAS may be a physical adsorption layer of BTBAS, a chemical adsorption layer of BTBAS, or it may include both.

[0062] Here, a layer with a thickness of less than one atomic layer (one molecular layer) means an atomic layer (molecular layer) that is formed discontinuously, and a layer with a thickness of one atomic layer (one molecular layer) means an atomic layer (molecular layer) that is formed continuously. The Si-containing layer may include both a Si layer and an adsorption layer of BTBAS. However, as described above, expressions such as "one atomic layer" and "several atomic layers" are used for the Si-containing layer, and "atomic layer" is used synonymously with "molecular layer."

[0063] Under conditions where BTBAS self-decomposes (thermally decomposes), i.e., under conditions where a thermal decomposition reaction of BTBAS occurs, Si is deposited on the wafer 200 to form a Si layer. Under conditions where BTBAS does not self-decompose (thermally decompose), i.e., under conditions where a thermal decomposition reaction of BTBAS does not occur, BTBAS is adsorbed onto the wafer 200 to form an adsorption layer of BTBAS. However, in this embodiment, since the temperature of the wafer 200 is set to a low temperature of, for example, 150° C. or less, thermal decomposition of BTBAS is unlikely to occur. As a result, an adsorption layer of BTBAS is more likely to be formed on the wafer 200 than a Si layer.

[0064] If the thickness of the Si-containing layer formed on the wafer 200 exceeds several atomic layers, the modification effect in the modification process described later will not reach the entire Si-containing layer. In addition, the minimum thickness of the Si-containing layer that can be formed on the wafer 200 is less than one atomic layer. Therefore, it is preferable that the thickness of the Si-containing layer is less than one atomic layer to about several atomic layers. By making the thickness of the Si-containing layer one atomic layer or less, that is, one atomic layer or less than one atomic layer, the modification effect in the modification process described later can be relatively increased, and the time required for the modification reaction in the modification process can be shortened. In addition, the time required for forming the Si-containing layer in the film formation process can also be shortened. As a result, the processing time per cycle can be shortened, and the total processing time can also be shortened. In other words, the film formation rate can also be increased. In addition, by making the thickness of the Si-containing layer one atomic layer or less, it is also possible to improve the controllability of the film thickness uniformity.

[0065] After the Si-containing layer is formed, the valve 243a is closed to stop the supply of the BTBAS gas into the processing chamber 201. At this time, the APC valve 244 is left open, and the processing chamber 201 is evacuated by the vacuum pump 246 to remove the unreacted BTBAS gas remaining in the processing chamber 201 or the BTBAS gas that has contributed to the formation of the Si-containing layer, reaction by-products, and the like from the processing chamber 201 (S4). The valves 243c and 243d are left open to maintain the supply of N2 gas into the processing chamber 201. The N2 gas acts as a purge gas (inert gas). Note that this step S4 may be omitted and may be a source gas supply step.

[0066] As the raw material gas, in addition to BTBAS gas, tetrakisdimethylaminosilane (Si[N(CH3)2]4, abbreviated as 4DMAS) gas, trisdimethylaminosilane (Si[N(CH3)2]3H, abbreviated as 3DMAS) gas, bisdimethylaminosilane (Si[N(CH3)2]2H2, abbreviated as BDMAS) gas, bisdiethylaminosilane (Si[N(C2H5)2]2H2, abbreviated as BDEAS) gas, etc. can be suitably used. Other raw material gases include various aminosilane raw material gases such as dimethylaminosilane (DMAS) gas, diethylaminosilane (DEAS) gas, dipropylaminosilane (DPAS) gas, diisopropylaminosilane (DIPAS) gas, butylaminosilane (BAS) gas, and hexamethyldisilazane (HMDS) gas, as well as monochlorosilane (SiH3Cl, abbreviated as MCS) gas, dichlorosilane (SiH2Cl2, abbreviated as DCS) gas, and trichlorosilane (SiHCl3, abbreviated as Suitable examples of halosilane precursor gases that can be used include inorganic halosilane precursor gases such as silicon tetrachloride (SiCl4, abbreviated as STC) gas, tetrachlorosilane, i.e., silicon tetrachloride (SiCl4, abbreviated as STC) gas, hexachlorodisilane (Si2Cl6, abbreviated as HCDS) gas, and octachlorotrisilane (Si3Cl8, abbreviated as OCTS) gas, and inorganic silane precursor gases that do not contain halogen groups, such as monosilane (SiH4, abbreviated as MS) gas, disilane (Si2H6, abbreviated as DS) gas, and trisilane (Si3H8, abbreviated as TS) gas.

[0067] As the inert gas, in addition to N2 gas, rare gases such as Ar gas, He gas, Ne gas, and Xe gas can be used.

[0068] (Reaction gas supply steps: S5, S6) After the film formation process is completed, plasma-excited O2 gas is supplied as a reactive gas to the wafer 200 in the process chamber 201 (S5).

[0069] In this step, the valves 243b to 243d are controlled to open and close in the same manner as the valves 243a, 243c, and 243d in step S3. The O2 gas has its flow rate adjusted by the MFC 241b and is supplied into the buffer chamber 237 via the nozzle 249b. At this time, high-frequency power (frequency of 13.56 MHz in this embodiment) is supplied (applied) from the high-frequency power source 273 to the rod-shaped electrodes 269, 270, and 271. The O2 gas supplied into the buffer chamber 237 is excited to a plasma state inside the processing chamber 201, and activated species (O * , O2 * , O3) is supplied to the wafer 200 and exhausted from the exhaust pipe 231. Note that the O2 gas excited into a plasma state is also called oxygen plasma.

[0070] The supply flow rate of O2 gas controlled by the MFC 241b is, for example, within a range of 100 sccm or more and 10000 sccm or less. The high frequency power applied from the high frequency power source 273 to the rod-shaped electrodes 269, 270, 271 is, for example, within a range of 50 W or more and 1000 W or less. The pressure in the processing chamber 201 is, for example, within a range of 10 Pa or more and 300 Pa or less. By using plasma, it is possible to activate the O2 gas even if the pressure in the processing chamber 201 is in such a relatively low pressure range. The time for which the activated species obtained by plasma excitation of the O2 gas is supplied to the wafer 200 is, for example, within a range of 1 second or more and 100 seconds or less, preferably 1 second or more and 50 seconds or less. Other processing conditions are the same as those in step S3 described above.

[0071] The ions and electrically neutral active species generated in the oxygen plasma perform an oxidation process, which will be described later, on the Si-containing layer formed on the surface of the wafer 200 .

[0072] By supplying O2 gas to the wafer 200 under the above-mentioned conditions, the Si-containing layer formed on the wafer 200 is plasma oxidized. At this time, the Si-N bonds and Si-H bonds of the Si-containing layer are broken by the energy of the plasma-excited O2 gas. N, H, and C bonded to N that have been cut off from the bond with Si are desorbed from the Si-containing layer. Then, Si in the Si-containing layer that has dangling bonds due to the desorption of N, etc. is bonded to O contained in the O2 gas, and Si-O bonds are formed. As this reaction progresses, the Si-containing layer is changed (modified) into a layer containing Si and O, that is, a silicon oxide layer (SiO layer).

[0073] To convert the Si-containing layer into a SiO layer, it is necessary to supply plasma-excited O2 gas. Even if O2 gas is supplied in a non-plasma atmosphere, the energy required to oxidize the Si-containing layer is insufficient in the above-mentioned temperature range, and it is difficult to sufficiently remove N and C from the Si-containing layer or to sufficiently oxidize the Si-containing layer to increase the Si-O bonds.

[0074] After the Si-containing layer is changed into a SiO layer, the valve 243b is closed to stop the supply of O2 gas. Also, the supply of high frequency power to the rod-shaped electrodes 269, 270, and 271 is stopped. Then, the O2 gas and reaction by-products remaining in the process chamber 201 are removed from the process chamber 201 by the same process procedure and process conditions as in step S4 (S6). Note that this step S6 may be omitted and may be a reaction gas supply step.

[0075] As the oxidant, i.e., the O-containing gas to be excited into plasma, in addition to O2 gas, nitrous oxide (N2O) gas, nitric oxide (NO) gas, nitrogen dioxide (NO2) gas, ozone (O3) gas, hydrogen peroxide (H2O2) gas, water vapor (H2O), ammonium hydroxide (NH4(OH)) gas, carbon monoxide (CO) gas, carbon dioxide (CO2) gas, etc. may be used.

[0076] As the inert gas, in addition to N2 gas, for example, various rare gases exemplified in step S4 can be used.

[0077] (Performed a set number of times: S7) The above-mentioned steps S3, S4, S5, and S6 are performed in this order non-simultaneously, i.e., without synchronization, forming one cycle, and this cycle is performed a predetermined number of times (n times), i.e., one or more times, to form a SiO film of a predetermined composition and a predetermined thickness on the wafer 200. It is preferable to repeat the above-mentioned cycle multiple times. That is, it is preferable to make the thickness of the SiO layer formed per cycle smaller than the desired thickness, and to repeat the above-mentioned cycle multiple times until the thickness of the SiO film formed by stacking the SiO layers reaches the desired thickness.

[0078] (Atmospheric pressure recovery step: S8) When the above-mentioned film formation process is completed, N2 gas as an inert gas is supplied into the processing chamber 201 from each of the gas supply pipes 232c and 232d, and exhausted from the exhaust pipe 231. As a result, the processing chamber 201 is purged with the inert gas, and O2 gas and the like remaining in the processing chamber 201 are removed from the processing chamber 201 (inert gas purge). Thereafter, the atmosphere in the processing chamber 201 is replaced with the inert gas (inert gas replacement), and the pressure in the processing chamber 201 is returned to normal pressure (return to atmospheric pressure: S8).

[0079] (Exit step: S9) Thereafter, the seal cap 219 is lowered by the boat elevator 115 to open the lower end of the manifold 209, and the processed wafers 200 supported by the boat 217 are unloaded from the lower end of the manifold 209 to the outside of the reaction tube 203 (boat unloading). After the boat unloading, the shutter 219s is moved and the lower end opening of the manifold 209 is sealed by the shutter 219s via the O-ring 220c (shutter close). After being unloaded to the outside of the reaction tube 203, the processed wafers 200 are taken out of the boat 217 (wafer discharging). After the wafer discharging, an empty boat 217 may be loaded into the processing chamber 201.

[0080] Here, the pressure inside the furnace during substrate processing is preferably controlled in the range of 10 Pa or more and 300 Pa or less. This is because, when the pressure inside the furnace is lower than 10 Pa, the mean free path of the gas molecules becomes longer than the Debye length of the plasma, and the plasma directly hitting the furnace wall becomes prominent, making it difficult to suppress the generation of particles. Also, when the pressure inside the furnace is higher than 300 Pa, the plasma generation efficiency becomes saturated, so that even if a reactive gas is supplied, the amount of plasma generation does not change, resulting in wasteful consumption of the reactive gas, and at the same time, the mean free path of the gas molecules becomes shorter, which reduces the transport efficiency of the plasma active species to the wafer.

[0081] (3) Effects of this embodiment According to this embodiment, one or more of the following advantages can be obtained. (a) Since the rod-shaped electrodes 269 and 271 have different lengths, the amount of activated species generated in the buffer chamber 237 and supplied to the processing chamber 201 can be made uniform among a plurality of substrates. (b) By adjusting the length of the rod-shaped electrodes 269 and 271, it is possible to adjust the supply amount of the activated species generated in the buffer chamber 237 and supplied to the processing chamber 201 so that it is uniform among a plurality of substrates. (c) By adjusting the length of the rod-shaped electrodes 269 and 271, it becomes possible to adjust the supply amount of the activated species generated in the buffer chamber 237 and supplied to the processing chamber 201 symmetrically above and below.

[0082] (Variation 1) Next, a modified example of this embodiment will be described with reference to Fig. 8. In this modified example, only the parts that differ from the above-described embodiment will be described below, and a description of the same parts will be omitted.

[0083] In the above-described embodiment, a buffer structure 300 is provided on the inner wall of the reaction tube 203, and rod-shaped electrodes 269, 270, 271 covered with an electrode protection tube 275 and a nozzle 249b are provided inside the buffer structure 300. In this modified example, a buffer structure 400 having a similar configuration to the buffer structure 300 is further provided on the inner wall of the reaction tube 203.

[0084] Inside the buffer structure 400, rod-shaped electrodes 369, 370, 371 and a nozzle 249c are provided, each covered with an electrode protection tube 275. The rod-shaped electrodes 369, 370, 371, which are disposed at both ends of the rod-shaped electrodes 369, 370, 371, are connected to a high-frequency power source 373 via a matching unit 372, and the rod-shaped electrode 370, which is a reference electrode, is connected to earth, which is a reference potential, and is grounded. The nozzle 249c is connected to a gas supply pipe 232b, and is capable of supplying the same gas as the nozzle 249b. A plurality of gas supply holes 250c for supplying gas are provided on the side surface of the nozzle 249c from the lower part to the upper part of the reaction tube 203. The gas supply holes 250c are opened so as to face a wall surface formed in a radial direction with respect to the wall surface formed in an arc shape of the buffer structure 400, and are capable of supplying gas toward the wall surface. Gas supply ports 402, 404, and 406 are provided on the arc-shaped wall surface of the buffer structure 400 to supply gas into the buffer chamber 237. The gas supply ports 402, 404, and 406 are opened to face the center of the reaction tube 203 at positions facing the plasma generation regions 324a and 324b between the rod-shaped electrodes 369 and 370, between the rod-shaped electrodes 370 and 371, and between the rod-shaped electrode 371 and the nozzle 249c, and are provided in plurality from the lower part to the upper part of the reaction tube 203, each of which has the same opening area and is provided at the same opening pitch.

[0085] 8, in a plan view, the buffer structure 300 and the buffer structure 400 are provided symmetrically with respect to a line passing through the centers of the exhaust pipe 231 and the reaction tube 203, sandwiching the exhaust pipe 231. In addition, in a plan view, the nozzle 249a is provided at a position on the exhaust pipe 231 facing each other with the wafer 200 in between. In addition, the nozzle 249b and the nozzle 249c are each provided at a position far from the exhaust pipe 231 in the buffer chamber 237.

[0086] In this modification, two buffer structures each having a plasma generating unit are provided, and each buffer structure 300, 400 is provided with a high-frequency power supply 273, 373 and a matching device 272, 372. Each high-frequency power supply 273, 373 is connected to the controller 121, and plasma control is possible for each buffer chamber 237 of the buffer structure 300, 400. That is, the controller 121 monitors the impedance of each plasma generating unit and independently controls each high-frequency power supply 273, 373 so that the amount of active species is not biased for each buffer chamber 237, and controls the power of the high-frequency power supply to be high when the impedance is large. As a result, a sufficient amount of active species can be supplied to the wafer even if the high-frequency power of each plasma generating unit is reduced, compared to the case where there is only one plasma generating unit, and the in-plane uniformity of the wafer can be improved. In addition, while plasma control is performed by one high-frequency power supply for two plasma generating units, by providing a high-frequency power supply for each plasma generating unit, it becomes easier to grasp when an abnormality such as a disconnection occurs in each plasma generating unit. Furthermore, since the distance between the high frequency power supply and each electrode can be easily adjusted, it is possible to easily suppress differences in RF power application caused by differences in the distance between each electrode and the high frequency power supply.

[0087] (Variation 2) Next, a second modification of this embodiment will be described with reference to Fig. 9. In this second modification, three buffer structures each equipped with a plasma generating unit are provided on the inner wall of the reaction tube 203, and two nozzles for supplying raw material gas are provided.

[0088] Similar to the buffer structures 300 and 400, the buffer structure 500 is provided with rod-shaped electrodes 469, 470, and 471 covered with electrode protection tubes 275 and a nozzle 249d inside the buffer structure 500. The rod-shaped electrodes 469 and 471 as application electrodes are connected to a high-frequency power source via a matching unit (not shown), and the rod-shaped electrode 470 as a reference electrode is connected to earth, which is a reference potential, and is grounded. The nozzle 249d is connected to a gas supply pipe 232b, and is capable of supplying the same gas as the nozzle 249b. Gas supply ports 502, 504, and 506 for supplying gas are provided between the electrodes on the wall surface of the buffer structure 500 formed in an arc shape. Gas supply ports 502, 504, and 506 are provided at positions facing the plasma generation region between the rod electrodes 469 and 470, between the rod electrodes 470 and 471, and between the rod electrode 471 and the nozzle 249d, respectively, so as to face the center of the reaction tube 203, and are provided in plurality from the lower part to the upper part of the reaction tube 203, each having the same opening area and being provided at the same opening pitch. The nozzle 249e is connected to the gas supply pipe 232a, and is capable of supplying the same gas as the nozzle 249a.

[0089] The buffer structure 300 and the buffer structure 400 are provided in line symmetry with respect to a straight line passing through the centers of the exhaust pipe 231 and the reaction tube 203, sandwiching the exhaust pipe 231. The buffer mechanism 500 is provided at a position facing the exhaust pipe 231 with the wafer 200 sandwiched therebetween. Nozzles 249a and 249e for supplying raw material gases are provided between the buffer structure 300 and the buffer structure 500, and between the buffer structure 400 and the buffer structure 500, respectively. Nozzles 249b, 249c, and 249d for supplying reactive gases are each disposed on the same side in the buffer chamber 237, and the gas supply holes of the nozzles 249b, 249c, and 249d are opened so as to face wall surfaces formed in a radial direction with respect to the arc-shaped wall surfaces of the buffer structures 300, 400, and 500, respectively.

[0090] The present modified example 2 also provides the same effects as those of the above-described embodiment and modified example 1.

[0091] (Variation 3) Next, a third modification of this embodiment will be described with reference to Fig. 10. In this third modification, four buffer structures each having a plasma generating portion are provided on the inner wall of the reaction tube 203.

[0092] The inside of the buffer structure 600 is provided with rod-shaped electrodes 569, 570, 571 and a nozzle 249f, each covered with an electrode protection tube 275, as in the buffer structures 300, 400, 500. The rod-shaped electrodes 569, 571 as application electrodes are connected to a high-frequency power source via a matching unit (not shown), and the rod-shaped electrode 570 as a reference electrode is connected to earth, which is a reference potential, and is grounded. The nozzle 249f is connected to a gas supply pipe 232b, and is capable of supplying the same gas as the nozzle 249b. Gas supply ports 602, 604, 606 for supplying gas are provided between the electrodes on the wall surface of the buffer structure 600 formed in an arc shape. The gas supply ports 602, 604, 606 are opened toward the center of the reaction tube 203 at positions facing the plasma generation region between the rod-shaped electrodes 569, 570, between the rod-shaped electrodes 570, 571, and between the rod-shaped electrode 571 and the nozzle 249f, and are provided in plurality from the lower part to the upper part of the reaction tube 203, each having the same opening area and being provided at the same opening pitch.

[0093] The buffer structures 300, 400, 500, and 600 are provided at equal intervals. The nozzle 249a is provided at a position facing the exhaust pipe 231 across the wafer 200. The nozzles 249b and 249c are provided on the side of the buffer chamber 237 farther from the exhaust pipe 231. The nozzles 249d and 249f are provided on the exhaust pipe 231 side of the buffer chamber 237, and the gas supply holes of the nozzles 249b, 249c, 249d, and 249f open toward wall surfaces formed in a radial direction with respect to the arc-shaped wall surfaces of the buffer structures 300, 400, 500, and 600.

[0094] The third modification also provides the same effects as those of the above-described embodiment and the first modification.

[0095] Although the embodiments of the present disclosure have been specifically described above, the present disclosure is not limited to the above-described embodiments and can be modified in various ways without departing from the spirit and scope of the present disclosure.

[0096] Also, for example, in the above embodiment, an example has been described in which the gas is excited (activated) into a plasma state in one buffer structure 300, and the active species are supplied to the wafer. The present disclosure is not limited to such an embodiment, and may have a configuration in which a plasma state is created in multiple buffer structures, and the active species are supplied to the wafer. In other words, by having multiple buffer structures, it is possible to increase the amount of active species supplied and increase the film formation speed.

[0097] Also, for example, in the above embodiment, an example in which the reactants are supplied after the raw materials are supplied has been described. The present disclosure is not limited to such an embodiment, and the order in which the raw materials and reactants are supplied may be reversed. In other words, the raw materials may be supplied after the reactants are supplied. By changing the supply order, it is possible to change the film quality and composition ratio of the film to be formed.

[0098] In the above-mentioned embodiment, an example has been described in which a SiO film is formed on the wafer 200. The present disclosure is not limited to such an embodiment, and can be suitably applied to a case in which a Si-based oxide film, such as a silicon oxycarbide film (SiOC film), a silicon oxycarbonitride film (SiOCN film), or a silicon oxynitride film (SiON film), is formed on the wafer 200.

[0099] For example, other than or in addition to the above-mentioned gases, nitrogen (N)-containing gas such as ammonia (NH3) gas, carbon (C)-containing gas such as propylene (C3H6) gas, boron (B)-containing gas such as boron trichloride (BCl3) gas, etc. can be used to form, for example, a SiN film, a SiON film, a SiOCN film, a SiOC film, a SiCN film, a SiBN film, a SiBCN film, a BCN film, etc. The order in which each gas is flowed can be changed as appropriate. Even when forming these films, the films can be formed under the same processing conditions as in the above-mentioned embodiment, and the same effects as in the above-mentioned embodiment can be obtained. In these cases, the above-mentioned reactive gas can be used as the oxidizing agent as the reactive gas.

[0100] In addition, the present disclosure can also be suitably applied to the case of forming a metal oxide film or a metal nitride film containing a metal element such as titanium (Ti), zirconium (Zr), hafnium (Hf), tantalum (Ta), niobium (Nb), aluminum (Al), molybdenum (Mo), or tungsten (W) on the wafer 200. That is, the present disclosure relates to a method for forming a TiO film, a TiOC film, a TiOCN film, a TiON film, a TiN film, a TiSiN film, a TiBN film, a TiBCN film, a ZrO film, a ZrOC film, a ZrOCN film, a ZrON film, a ZrN film, a ZrSiN film, a ZrBN film, a ZrBCN film, a HfO film, a HfOC film, a HfOCN film, a HfON film, a HfN film, a HfSiN film, a HfBN film, a HfBCN film, a TaO film, a TaOC film, a TaOCN film, a TaON film, a TaN film, a TaSiN film, a TaBN film, a TaBCN film, The present invention can also be suitably applied to the formation of a NbO film, a NbOC film, a NbOCN film, a NbON film, a NbN film, a NbSiN film, a NbBN film, a NbBCN film, an AlO film, an AlOC film, an AlOCN film, an AlON film, an AlN film, an AlSiN film, an AlBN film, an AlBCN film, a MoO film, a MoOC film, a MoOCN film, a MoON film, a MoN film, a MoSiN film, a MoBN film, a MoBCN film, a WO film, a WOC film, a WOCN film, a WON film, a WN film, a WSiN film, a WBN film, a WBCN film, and the like.

[0101] In these cases, for example, the raw material gas may be tetrakis(dimethylamino)titanium (Ti[N(CH3)2]4, abbreviated as TDMAT) gas, tetrakis(ethylmethylamino)hafnium (Hf[N(C2H5)(CH3)]4, abbreviated as TEMAH) gas, tetrakis(ethylmethylamino)zirconium (Zr[N(C2H5)(CH3)]4, abbreviated as TEMAZ) gas, trimethylaluminum (Al(CH3)3, abbreviated as TMA) gas, titanium tetrachloride (TiCl4) gas, hafnium tetrachloride (HfCl4) gas, etc.

[0102] That is, the present disclosure can be suitably applied to the case of forming a metalloid film containing a metalloid element or a metal film containing a metal element. The process steps and process conditions of these film formation processes can be the same as the process steps and process conditions of the film formation processes shown in the above-mentioned embodiment and modified examples. In these cases, the same effects as those of the above-mentioned embodiment can be obtained.

[0103] It is preferable that the recipes used in the film forming process are prepared individually according to the process contents and stored in the storage device 121c via an electric communication line or an external storage device 123. Then, when starting various processes, it is preferable that the CPU 121a appropriately selects an appropriate recipe according to the process contents from among the multiple recipes stored in the storage device 121c. This makes it possible to form thin films of various film types, composition ratios, film qualities, and thicknesses in a versatile and reproducible manner using a single substrate processing device. It is also possible to reduce the burden on the operator and quickly start various processes while avoiding operational errors.

[0104] The above-mentioned recipes may not only be newly created, but may also be prepared by modifying an existing recipe that has already been installed in the substrate processing apparatus. When modifying a recipe, the modified recipe may be installed in the substrate processing apparatus via an electric communication line or a recording medium on which the recipe has been recorded. Also, an existing recipe that has already been installed in the substrate processing apparatus may be directly modified by operating the input / output device 122 provided in the existing substrate processing apparatus. [Explanation of symbols]

[0105] 200...wafer (substrate), 201...processing chamber, 203...reaction tube, 207...heater (heating device), 269, 271...rod-shaped electrodes (applying electrodes), 270...rod-shaped electrodes (reference electrodes), 275...electrode protection tube, 237...buffer chamber

Claims

1. A processing chamber for processing a plurality of substrates loaded vertically; A plasma generating unit for generating plasma; The plasma generating unit includes a first application electrode and a second application electrode to which high frequency power is applied, and a reference electrode to which a reference potential is applied, the first application electrode and the second application electrode which share the reference electrode are covered by an electrode protection tube having a bent portion, the first application electrode is inserted from a lower portion of the electrode protection tube so as to be bent back at the bent portion, and a tip portion of the first application electrode is moved in the vertical direction to adjust its length.

2. The substrate processing apparatus according to claim 1 , further comprising a substrate holder for stacking and holding a plurality of the substrates in the vertical direction.

3. 2 . The substrate processing apparatus according to claim 1 , wherein the first application electrode and the second application electrode are disposed so that their lengths are different in a direction in which the substrates are loaded.

4. A substrate processing apparatus as described in claim 1, wherein the reference electrode is protected by the electrode protection tube.

5. 2. The substrate processing apparatus according to claim 1, wherein the electrode protecting tube is U-shaped at an upper portion of the plasma generating unit, and the lengths of the first application electrode and the second application electrode can be adjusted within the U-shaped electrode protecting tube.

6. The substrate processing apparatus according to claim 1 , wherein the electrode protection tube is configured so that the first application electrode and the second application electrode do not come into contact with each other.

7. The substrate processing apparatus according to claim 6 , wherein the electrode protection tube has a constricted shape so that the first application electrode and the second application electrode do not come into contact with each other.

8. 5 . The substrate processing apparatus according to claim 4 , wherein an electrode protection tube protecting the first and second application electrodes and an electrode protection tube protecting the reference electrode are connected to each other at an upper portion in the plasma generating section.

9. The substrate processing apparatus according to claim 1 , wherein the reference electrode is disposed between the first application electrode and the second application electrode.

10. The substrate processing apparatus according to claim 1 , wherein the plasma generating unit is provided in the processing chamber.

11. The substrate processing apparatus according to claim 1 , wherein a plurality of the plasma generating units are provided in the processing chamber.

12. The substrate processing apparatus according to claim 1 , wherein the plasma generating unit is provided along an inner wall of a reaction tube that defines the processing chamber.

13. The substrate processing apparatus according to claim 1 , further comprising a heating device for heating the substrate.

14. The substrate processing apparatus according to claim 1 , further comprising a high frequency power source for supplying the high frequency power to the first application electrode and the second application electrode.

15. The substrate processing apparatus according to claim 1 , wherein one of the first application electrode and the second application electrode is shorter than the reference electrode.

16. The substrate processing apparatus according to claim 1 , wherein in the plasma generating section, one of the first application electrode and the second application electrode is shorter than the reference electrode in the vertical direction.

17. a plasma generating unit that forms plasma includes a first application electrode and a second application electrode to which high frequency power is applied, and a reference electrode to which a reference potential is applied, the first application electrode and the second application electrode that share the reference electrode are covered by an electrode protection tube having a bent portion, The first application electrode is inserted from the lower part of the electrode protection tube so as to be folded back at the bent portion, and the length of the first application electrode can be adjusted by moving a tip portion of the first application electrode in the vertical direction.

18. A processing chamber for processing a plurality of substrates loaded in a vertical direction, a plasma generating unit for generating plasma, carrying the substrate into a substrate processing apparatus including a first application electrode and a second application electrode to which high frequency power is applied, and a reference electrode to which a reference potential is applied, in the plasma generating unit, the first application electrode and the second application electrode sharing the reference electrode being covered by an electrode protection tube having a bent portion, the first application electrode being inserted from a lower portion of the electrode protection tube so as to be bent back at the bent portion, and a tip portion of the first application electrode being moved in the up and down direction to adjust its length; generating the plasma in the processing chamber to process the substrate; and transporting the substrate from the processing chamber; A method for manufacturing a semiconductor device having the above structure.

19. A processing chamber for processing a plurality of substrates loaded vertically, a plasma generating unit for generating plasma, carrying the substrate into a substrate processing apparatus including a first application electrode and a second application electrode to which high frequency power is applied, and a reference electrode to which a reference potential is applied, in the plasma generating unit, the first application electrode and the second application electrode sharing the reference electrode being covered by an electrode protecting tube having a bent portion, the first application electrode being inserted from a lower portion of the electrode protecting tube so as to be bent back at the bent portion, and a tip portion of the first application electrode being moved in the up and down direction to adjust its length; generating the plasma in the processing chamber to process the substrate; and transporting the substrate from the processing chamber; A program for causing a computer to execute the above in a substrate processing apparatus.

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