Electrochromic glass and its manufacturing method

Abstract

An electrochromic glass related to the field of electrochromic glass is provided. The electrochromic glass includes a first transparent substrate, a second transparent substrate, and a functional laminate layer. The functional laminate layer includes a first conductive layer, an electrochromic laminate layer, and a second conductive layer, which are sequentially arranged on the first transparent substrate and located between the first transparent substrate and the second transparent substrate. The first conductive layer has a first exposed region, a first conductive material disposed within the first exposed region, and a first conductive material disposed at an end of the second conductive layer remote from the first exposed region. A second conductive material is disposed between the first transparent substrate and the second transparent substrate. The second conductive material is disposed along the periphery of the functional laminate layer, contacts the first conductive material, and is sealed to both the first transparent substrate and the second transparent substrate.

Description

[Technical field]

[0001] The present disclosure relates to the field of electrochromic glass, and in particular to electrochromic glass and methods for making same. [Background technology]

[0002] Electrochromism refers to the phenomenon that optical attributes (such as reflectance, transmittance, absorptance, etc.) undergo stable and reversible color changes under the action of an external electric field. Electrochromic technology has been developed for more than 40 years. Due to the characteristics of continuous tunability of transmitted light intensity, low energy loss, open circuit memory function, etc., electrochromic devices (ECDs) have extensive application potential in smart windows, displays, spacecraft temperature control modulation, glare-free rearview mirrors for vehicles, weapon equipment stealth and other fields. ECD-based glass as a new type of smart window can adjust the intensity of incident solar light according to the requirements of comfort to effectively reduce energy consumption, which shows great energy-saving effects. With the continuous improvement of people's requirements for product consumption, ECDs have shown great market potential and application value in the fields of automobiles, home appliances and furniture, aerospace, rail transportation, environmentally friendly buildings and other fields. Recently, electrochromic products have attracted more and more attention at home and abroad, and are an efficient new generation of energy-saving building products following heat-absorbing glass, heat-reflective coating glass and low-emissivity glass.

[0003] Vacuum glass is a highly processed novel type of glass product and is the most advanced product in our country's glass industry with almost no proprietary intellectual property rights. The development and promotion of vacuum glass conforms to our country's unique innovation policy, and also conforms to our country's strongly advocated energy conservation policy. Vacuum glass has great effects on energy saving and sound insulation, and therefore has high development potential and a bright future. By combining these two advantages, vacuum glass is a new generation of curtain wall glass for future buildings with very high performance and user experience.

[0004] However, the electrodes of most existing electrochromic vacuum glass are directly extended into the electrochromic element and connected to the conductive layer, and then the glass is sealed after the electrodes are led out using leads. This method reduces the vacuum degree and sealing performance of the vacuum glass, affecting the quality of the product. Summary of the Invention [Problem to be solved by the invention]

[0005] In view of the above-mentioned deficiencies in the prior art, the problem that the present disclosure seeks to solve is to modify the method of arranging electrodes on an electrochromic element, thereby simplifying the manufacturing process and reducing the manufacturing complexity without introducing leads inside the electrochromic device. [Means for solving the problem]

[0006] In order to achieve the above object, the present disclosure provides an electrochromic glass comprising a first transparent substrate, a second transparent substrate, and a functional laminate layer, the functional laminate layer comprising a first conductive layer, an electrochromic laminate layer, and a second conductive layer.

[0007] The first conductive layer, the electrochromic stack layer and the second conductive layer are sequentially disposed on the first transparent substrate and are located between the first transparent substrate and the second transparent substrate.

[0008] The first conductive layer has a first exposed region with a first conductive material disposed within the first exposed region, and an end of the second conductive layer remote from the first exposed region has the first conductive material disposed thereon.

[0009] A second conductive material is disposed between the first transparent substrate and the second transparent substrate, the second conductive material is disposed along the periphery of the functional laminate layer, the second conductive material is in contact with the first conductive material, and the second conductive material is sealed and connected to both the first transparent substrate and the second transparent substrate.

[0010] Also, the resistance of the electrochromic laminate layer<the resistance of the first conductive material<the resistance of the second conductive material<the resistance of the first conductive layer and the resistance of the second conductive layer.

[0011] Furthermore, the functional laminate layer further includes an inert gas layer located between the functional laminate layer and the second transparent substrate.

[0012] Further, a column array is disposed between the first transparent substrate and the second transparent substrate, the column array including uniformly distributed columns, the columns being vertically connected to the first transparent substrate and the second transparent substrate.

[0013] Additionally, the pillar includes a third conductive material.

[0014] Additionally, the functional laminate layer further includes a vacuum layer located between the functional laminate layer and the second transparent substrate.

[0015] Furthermore, the functional laminate layer further includes an ion-blocking layer.

[0016] The ion-blocking layer comprises silicon oxide or silicon aluminum oxide, the ion-blocking layer is disposed on the second conductive layer, an end of the second conductive layer remote from the first exposed region is provided with a second exposed region, and the first conductive material is disposed in the second exposed region.

[0017] Furthermore, the functional laminate layer further includes an insulating layer.

[0018] An insulating layer is disposed on the ion-blocking layer, and components of the insulating layer include at least one of titanium nitride, aluminum nitride, silicon nitride, and boron nitride.

[0019] Further, the first conductive material and the second conductive material include a conductive slurry or a conductive adhesive, and the conductive slurry and the conductive adhesive include one or more of silver powder, nickel powder, copper powder, silver-plated copper powder, and carbon powder.

[0020] The present disclosure also provides a method for producing electrochromic glass, comprising: depositing an electrochromic laminate layer on a first transparent substrate having a first conductive layer and depositing a second conductive layer on the electrochromic laminate layer to form a functional laminate layer; forming a first exposed area on the first conductive layer; coating the first exposed area with a first conductive material; coating an end of the second conductive layer remote from the first exposed area with a first conductive material; coating a second conductive material along a periphery of the functional laminate layer, the second conductive material being in contact with the first conductive material; aligning, heating and sealing a second transparent substrate to the first transparent substrate; A method is also provided, including:

[0021] Furthermore, when the second transparent substrate and the first transparent substrate are aligned, heated and sealed, the heating and sealing are performed in an inert gas atmosphere.

[0022] Furthermore, before the functional laminate layer is formed, the method further comprises: The method further includes attaching an array of posts onto the first transparent substrate, the array of posts including uniformly distributed posts, the posts being perpendicularly connected to the first transparent substrate and the second transparent substrate.

[0023] Furthermore, when the second transparent substrate and the first transparent substrate are aligned, heated and sealed, the heating is vacuum heating.

[0024] Furthermore, forming the functional laminate layer includes: after the second conductive layer is deposited on the electrochromic stack layer, depositing an ion blocking layer on the second conductive layer by incorporating silicon or a mixture of silicon and aluminum as a target material; Coating the end of the second conductive layer remote from the first exposed area with the first conductive material may in particular forming a second exposed region at an end of the second conductive layer remote from the first exposed region; coating the second exposed area with a first conductive material; Includes.

[0025] Furthermore, forming the functional laminate layer includes: After the ion-blocking layer is deposited on the second conductive layer, the method further includes depositing an insulating layer on the ion-blocking layer in a nitrogen atmosphere by incorporating pure titanium, aluminum, silicon and boron or mixtures thereof as target materials.

[0026] The preparation method of the present disclosure is simple, has low investment cost, high controllability of the quality of the final product, good color change uniformity, and the product structure is simple and thin, with excellent performances of sound insulation and low thermal conductivity, so that large-scale industrial production can be realized.

[0027] The concepts, specific structures and resulting effects of the present disclosure are further described below in conjunction with drawings for a complete understanding of the objectives, features and effects of the present disclosure.

[0028] Other features, objects and advantages of the present disclosure will become more apparent from reading the following detailed description of non-limiting embodiments, taken in conjunction with the drawings, in which: [Brief description of the drawings]

[0029] [Figure 1] FIG. 1 is a structural schematic diagram of one embodiment of the present disclosure. [Diagram 2] FIG. 2 is a structural schematic diagram of another embodiment of the present disclosure. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0030] Legend: 100 - first transparent substrate; 200 - second transparent substrate; 300 - support; 105 - first conductive layer; 110 - electrochromic laminate layer; 115 - second conductive layer; 120 - ion blocking layer; 125 - insulating layer; 150 - vacuum layer; 130 - first conductive material; 135 - second conductive material.

[0031] In order to make the contents clearer and easier to understand, several preferred embodiments of the present disclosure are described below with reference to the drawings in the specification. The present disclosure can be embodied in various forms of embodiments, and the scope of protection of the present disclosure is not limited to the embodiments described in the specification.

[0032] In the drawings, the same reference numerals denote components having the same structure, and similar reference numerals denote assemblies having similar structure or function throughout. The size and thickness of each assembly shown in the figures are shown arbitrarily, and the present disclosure does not define the size and thickness of each assembly. In order to make the figures clearer, the thickness of the components in some parts of the figures is appropriately exaggerated.

[0033] EMBODIMENT 1 Figure 1 is a cross-sectional view of the structure of electrochromic glass. As shown in Figure 1, the present disclosure has a first transparent substrate 100 and a second transparent substrate 200, which are flat glass in this embodiment. In one embodiment, the first transparent substrate 100 and the second transparent substrate 200 can also be curved glass.

[0034] Between the first transparent substrate 100 and the second transparent substrate 200, a functional stack layer including a first conductive layer 105, an electrochromic stack layer 110 and a second conductive layer 115 is sequentially deposited. The thickness of the first conductive layer 105 and the second conductive layer 115 is 20-400 nanometers (nm), in one embodiment 20 nm-50 nm, in one embodiment 50 nm-100 nm, in one embodiment 100 nm-250 nm, in one embodiment 300 nm-400 nm, the sheet resistance should be 5 ohms-25 ohms, and the average visible light transmittance is greater than 85 percent. The first conductive layer 105 and the second conductive layer 115 are one or more selected from indium tin oxide (ITO), aluminum doped zinc oxide (AZO), boron doped zinc oxide (BZO) and fluorine doped tin oxide (FTO). The deposition mode can be selected from processes such as vacuum coating, evaporation coating, sol-gel coating, etc. In another embodiment of the present disclosure, the first conductive layer 105 is not deposited, and a coating glass coated with the above-mentioned materials can be directly used as the first transparent substrate 100.

[0035] The electrochromic stack 110 is a conventional electrochromic element including an electrochromic layer, an ion conducting layer and an ion storage layer. When a forward voltage and a reverse voltage are applied, the electrochromic stack cooperates with the first conductive layer 105 and the second conductive layer 115, and can be reversibly switched between a colored state and a bleached state, and the overall resistance of the electrochromic stack is about 2 ohms to 10 ohms.

[0036] The bottom layer of the electrochromic laminated layer 110 is an electrochromic layer, which is deposited on the first conductive layer 105 by a method such as vacuum coating or deposition coating, and has a film thickness of 200 nm to 600 nm. The material is one or more selected from tungsten oxide (WO3), molybdenum oxide (MoO3), niobium oxide (Nb2O5), and titanium oxide (TiO2).

[0037] An ion conducting layer is then deposited on the electrochromic layer and is used to transfer ions between the electrochromic layer and the ion storage layer. The material is preferably lithium metal, and the thickness is 10 nm to 300 nm. Materials such as tantalum, niobium, cobalt, aluminum, silicon, phosphorus, and boron can be doped into the lithium thin film layer to improve the stability of lithium ions and increase the ion porosity to improve the transmittance.

[0038] Finally, an ion storage layer is deposited on the ion conducting layer and is used to store the lithium ions transferred from the electrochromic layer under the action of voltage. The thickness of the layer is 150 nm to 650 nm. The material of the ion storage layer is nickel oxide (NiO x ) and iridium oxide (IrO2).

[0039] Thus, the ion storage layer can include electrochromic or non-electrochromic materials. When both the ion storage layer and the electrochromic layer are made of electrochromic materials, one of them is a cathodic coloring material and the other is an anodic coloring material. For example, the electrochromic layer can be made of a cathodic coloring material such as tungsten oxide. The ion storage layer can be made of an anodic coloring material such as nickel oxide. That is, after the lithium ions leave the ion storage layer, the ion storage layer also becomes colored. In this way, the electrochromic layer and the ion storage layer combine to reduce the amount of light transmitted through the laminate layers together.

[0040] Then, the functional laminate layer covering the first conductive layer 110 is removed to expose a portion of the first conductive layer 110, forming a first exposed area. The first conductive material 130 is coated in the first exposed area, and is preferably a conductive silver slurry with a silver content higher than 50%. The coating thickness is 0.1 mm to 0.5 mm, and the width of the first exposed area is about 90 micrometers to 120 micrometers (μm), so that the resistance of the first conductive material 130 is strictly controlled to about 5 ohms, which is smaller than the resistance of the first conductive layer 110 and the second conductive layer 115. Indeed, the conductive slurry or conductive adhesive can also be silver powder, nickel powder, copper powder, silver-plated copper powder, carbon powder, etc. Depending on the material used, both the coating thickness of the first conductive material 130 and the width of the exposed area can be adjusted according to the required resistance.

[0041] To enable the electrochromic stack layers to form a loop, it is also necessary to coat the second conductive layer 115 with a first conductive material 130, preferably at the end remote from the first exposed area.

[0042] Next, a second conductive material 135 is disposed along the periphery of the functional laminate layer between the first transparent substrate 100 and the second transparent substrate 200. The second conductive material 135 must be in contact with the first conductive material 130, and the resistance of the second conductive material must be greater than that of the first conductive material 130 and less than that of the first conductive layer 105 and the second conductive layer 115. The second conductive material is preferably a conductive silver slurry with a silver content of 30% or less. The coating thickness is 0.3 mm to 0.8 mm. Furthermore, the second conductive material 135 seals the first transparent substrate 100 and the second transparent substrate 200, so that the functional laminate layer is not affected by external environments such as water vapor, thereby extending the life of the functional laminate layer and improving its suitability for the usage environment.

[0043] After the device is powered on, the current flows from one side of the second conductive material 135 through the first conductive material 130 into the first conductive layer 105, then returns to the second conductive layer 115 through the electrochromic element 110, and enters the other side of the first conductive material 130 and the second conductive material 135 to form a loop. Since the resistance inside the electrochromic element<the resistance of the first conductive material<the resistance of the second conductive material<the resistance of the first conductive layer 105 and the second conductive layer 115, the current cannot escape and must pass through the electrochromic layer 110. In addition, since the leads are connected outside the device rather than inside the device, there is no need to lead the leads out of the device, and there is no need to seal the positions of the leads, thereby simplifying the procedure and ensuring the sealing performance in the vacuum glass.

[0044] Therefore, as long as the second conductive material 135 is in contact with the first conductive material 130, the location of the first exposed area can be anywhere since current will always flow toward the first conductive material 130 and the electrochromic stack layer 110 due to the resistance difference.

[0045] EMBODIMENT 2 2 shows a schematic diagram of the structure of the electrochromic vacuum glass. As shown in FIG. 2, based on FIG. 1, the structure further includes a support 300, and the functional laminate layer further includes an ion blocking layer 120, an insulating layer 125, and a vacuum layer 150.

[0046] In order to prevent the first transparent substrate 100 and the second transparent substrate 200 from being destroyed by the difference between the internal and external air pressure due to the presence of the vacuum layer 150, the support columns 300 are introduced. The support columns 300 are attached in an array shape uniformly distributed on the first transparent substrate 100, and the support columns 300 are connected vertically to both the first transparent substrate 100 and the second transparent substrate 200. The height of the support columns 300 is preferably 0.2 mm to 0.5 mm depending on the thickness of the vacuum layer 150 and the functional laminated layer.

[0047] In addition, the introduction of the vacuum layer 150 can greatly extend the service life and improve the reliability of the electrochromic film layer, which can also provide the effects of energy saving, heat insulation, sound insulation and noise reduction, and condensation-free vacuum glass. Similarly, the vacuum layer 150 can be replaced with an inert gas protective layer, such as an argon protective layer, to achieve the same effects as those mentioned above.

[0048] In addition, the pillars 300 include a third conductive material, preferably a metal or conductive polymer, such as silver, platinum, copper or conductive ceramic. The pillars act as good electrical conductors. When the device is powered on, a portion of the current passes through the first conductive layer 105 and is transferred to the second conductive layer 115 through the multiple pillars 300, and the pillars spread the current more quickly, thus improving the uniformity of the color change.

[0049] Optionally, an ion blocking layer 120 and an insulating layer 125 are also sequentially disposed under the second conductive layer 115 to function as additional functional layers. The ion blocking layer 120 uses silicon (Si) or silicon-aluminum (SiAl) target material, has a thickness of 20 nm to 80 nm, and is composed of silicon oxide (SiO x ) and silicon-aluminum oxide (SiAlO x ) Aluminum has good density, which can effectively prevent the migration of sodium and magnesium in the glass, improves the adhesion of the electrochromic thin film to the glass, and prevents the electrochromic thin film from peeling off.

[0050] The insulating layer 125 has a thickness of 100 nm to 1000 nm, and can be one or more of titanium nitride, aluminum nitride, silicon nitride, and boron nitride. These materials have higher transparency and higher resistance, which allows the current to escape less easily after the device is turned on, and can also protect the functional layer deposited under the material, thereby reducing the physical and chemical loss of the functional layer.

[0051] Since the ion blocking layer 120 and the insulating layer 125 further cover the second conductive layer 115, it is necessary to remove the functional laminate layer covering the second conductive layer 115, preferably at an end of the second conductive layer 115 remote from the first exposed area, to expose a portion of the second conductive layer 115 to form a second exposed area. The first conductive material 130 is coated in the second exposed area and is in contact with the second conductive material 135.

[0052] During operation, the device can reversibly and cyclically enter a bleached state and a colored state. In the bleached state, a voltage is applied to the first conductive layer 105 and the second conductive layer 115 such that the lithium ions in the electrochromic stack are primarily in the ion storage layer. If the electrochromic layer then contains a cathodic electrochromic material, the device is in the bleached state. When the potential of the electrochromic stack 110 is reversed, the lithium ions cross the ion conducting layer and enter the electrochromic layer, resulting in the colored state of the device.

[0053] When the voltage applied to the device is reversed again, the ions leave the electrochromic layer and return to the ion storage layer through the ion conducting layer. Thus, the device is converted to a bleached state. By controlling different voltages, the electrochromic device can not only be switched between the bleached and colored states, but also converted to one or more intermediate color states between the bleached and colored states.

[0054] EMBODIMENT 3 The present disclosure also provides a method for producing electrochromic glass, the method comprising the steps of:

[0055] In step S101, a column array is attached to a first transparent substrate.

[0056] After cleaning, a high-temperature resistant adhesive is applied onto the first transparent substrate 100 via an adhesive dispenser to form a regular and uniform array, and then the posts are bonded to the glass via the high-temperature resistant adhesive.

[0057] In step S102, a functional lamination layer is formed by depositing an electrochromic lamination layer on a first transparent substrate provided with a first conductive layer, and depositing a second conductive layer on the electrochromic lamination layer.

[0058] The first conductive layer 105 can be deposited directly on the first transparent substrate 100 by using a process such as vacuum coating, evaporation coating, or sol-gel coating, and it is also possible to deposit the electrochromic stack layer 110 directly on the first transparent substrate 100 together with the first conductive layer 105.

[0059] The electrochromic laminate layer 110 is provided with an electrochromic layer, an ion conducting layer, and an ion storage layer. First, an electrochromic layer is formed on the first conductive layer 105 by using a method such as vacuum coating, deposition coating, etc. Reactive sputtering can be performed by doping oxygen into argon through a metal target material such as tungsten, molybdenum, niobium, titanium, etc. The oxygen doping rate is 2%-50% to effectively control the oxidation valence state to achieve the optimal color changing effect. It is also possible to perform sputtering directly through a ceramic target material of metal oxide.

[0060] A metallic lithium ion conducting layer is then formed over the electrochromic layer using a method such as vacuum coating.

[0061] Finally, an ion storage layer is formed on the ion conducting layer by using methods such as vacuum coating, vapor deposition coating, and electrochemical deposition. A nickel or iridium metal target can be selected, and reactive sputtering can be performed by doping argon with oxygen, with the oxygen doping rate being 0.5% to 20%. For the metal oxide obtained at this time, such as nickel oxide, the nickel is divalent, the color is lighter, and the light transmittance of the transparent substrate is maintained as much as possible. In addition, it is also possible to directly sputter through the ceramic target material of the metal oxide.

[0062] The deposition mode of the second conductive layer 115 is similar to that of the first conductive layer 105, so the description is omitted here.

[0063] Optionally, one ion blocking layer 120 is deposited on the second conductive layer 115 by using methods such as vacuum coating and deposition coating that incorporate silicon or a mixture of silicon and aluminum as the target material to act as an additional functional layer.

[0064] Furthermore, an insulating layer 125 is deposited on the ion blocking layer 120 in a nitrogen atmosphere by taking pure titanium, aluminum, silicon and boron or a mixture thereof as target materials, which serves as an additional functional layer.

[0065] In one embodiment, the first conductive layer 105, the electrochromic stack layer 110, the second conductive layer 115, the ion blocking layer 120 and the insulating layer 125 function as functional stack layers and are formed one at a time on a deposition system. The first transparent substrate 100 does not leave the deposition system when the functional layers are being deposited.

[0066] In step S103, a first exposed area is formed in the first conductive layer, and a second exposed area is formed at an end of the second conductive layer remote from the first exposed area.

[0067] After the deposition of the functional laminate layer is completed, the electrochromic glass device on which the deposition is completed needs to be subjected to an electrode scribe to remove a portion of the functional layer covering the first conductive layer 105 and the second conductive layer 115 to form a first exposed area of ​​the first conductive layer 105 and a second exposed area of ​​the second conductive layer 115, respectively. The second exposed area is preferably at an end of the second conductive layer 115 away from the first exposed area. The electrode scribe can use guided and focused energy with a wavelength of one of 248 nm, 355 nm (ultraviolet laser (UV)), 1030 nm (infrared laser (IR), e.g., disk laser), 1064 nm (e.g., neodymium-doped yttrium-aluminum garnet (Nd:YAG) laser) and 532 nm (e.g., green laser) to remove a portion of the functional layer. A laser with a wavelength of 1064nm or 532nm is preferred because under the above-mentioned wavelengths, the absorption of the functional layer is better, high-quality scribing can be performed on the functional layer, and there is no residual by-product at the scribing position after removal of the functional layer.

[0068] In step S104, the first exposed area and the second exposed area are coated with a first conductive material.

[0069] A first conductive material 130, preferably a conductive silver slurry, is coated onto the surfaces of the first exposed area and the second exposed area by using an adhesive dispensing process.

[0070] In step S105, a second conductive material is coated along the periphery of the functional laminate layer, so that the second conductive material contacts the first conductive material.

[0071] A second conductive material 135 is coated along the periphery of the functional laminate layer by using a process such as adhesive dispensing, screen printing, etc., and a preliminary edge seal is performed on the glass.

[0072] In step S106, the second transparent substrate and the first transparent substrate are aligned, then heated and sealed in a vacuum.

[0073] For the device after preliminary edge sealing, vacuum evacuation and sinter bonding are carried out by using a vacuum sintering furnace, and the vacuum pressure is 6 kPa to 105 kPa. During the evacuation process, the glass is heated, and the heating temperature is 280 to 350°C. The time of heating, sheet bonding and evacuation is 60 minutes to 120 minutes, after which the finished electrochromic vacuum glass can be obtained.

[0074] In another embodiment, in step S106, after the second transparent substrate and the first transparent substrate are aligned, an inert gas is filled, and heating and sealing are performed in an inert gas atmosphere, and the inert gas is preferably argon.

[0075] Finally, the electrochromic functionality of the electrochromic vacuum glass can be implemented after leads and a low voltage power supply are connected to the second conductive material layer in the completed device.

[0076] The preferred embodiments of the present disclosure have been described in detail above. It should be understood that those skilled in the art can make various modifications and variations according to the concept of the present disclosure without any inventive efforts. Therefore, any solution that those skilled in the art can obtain according to the concept of the present disclosure based on the prior art through logical analysis, reasoning, or limited trial shall be included in the scope of protection of the claims.

Claims

1. An electrochromic glass comprising a first transparent substrate, a second transparent substrate, and a functional laminate layer, the functional laminate layer comprising a first conductive layer, an electrochromic laminate layer, and a second conductive layer; the first conductive layer, the electrochromic stack layer and the second conductive layer are sequentially disposed on the first transparent substrate and are located between the first transparent substrate and the second transparent substrate; the first conductive layer having a first exposed region, a first conductive material disposed within the first exposed region, and an end of the second conductive layer remote from the first exposed region having the first conductive material disposed thereon; An electrochromic glass, wherein a second conductive material is disposed between the first transparent substrate and the second transparent substrate, the second conductive material is disposed along a periphery of the functional laminate layer, the second conductive material is in contact with the first conductive material, and the second conductive material is sealed and connected to both the first transparent substrate and the second transparent substrate.

2. 2. The electrochromic glass of claim 1, wherein the resistance of the electrochromic stack layer < the resistance of the first conductive material < the resistance of the second conductive material < the resistance of the first conductive layer and the resistance of the second conductive layer.

3. The electrochromic glass of claim 1 , wherein the functional laminate layer further comprises an inert gas layer located between the functional laminate layer and the second transparent substrate.

4. 2. The electrochromic glass of claim 1, wherein an array of posts is disposed between the first transparent substrate and the second transparent substrate, the array of posts including uniformly distributed posts, the posts being connected perpendicularly to the first transparent substrate and the second transparent substrate.

5. The electrochromic glass of claim 4 , wherein the posts comprise a third conductive material.

6. The electrochromic glass of claim 4 , wherein the functional laminate layer further comprises a vacuum layer located between the functional laminate layer and the second transparent substrate.

7. The functional laminate layer further comprises an ion-blocking layer, 7. The electrochromic glass of claim 1, wherein the ion-blocking layer comprises silicon oxide or silicon aluminum oxide, the ion-blocking layer is disposed on the second conductive layer, the end of the second conductive layer remote from the first exposed area is provided with a second exposed area, and the first conductive material is disposed within the second exposed area.

8. The functional laminate layer further comprises an insulating layer, 8. The electrochromic glass of claim 7, wherein the insulating layer is disposed on the ion blocking layer, and the components of the insulating layer include at least one of titanium nitride, aluminum nitride, silicon nitride, and boron nitride.

9. 7. The electrochromic glass of claim 1, wherein the first conductive material and the second conductive material comprise a conductive slurry or a conductive adhesive, and the conductive slurry and the conductive adhesive comprise one or more of silver powder, nickel powder, copper powder, silver-plated copper powder, and carbon powder.

10. 1. A method for producing electrochromic glass, comprising: depositing an electrochromic laminate layer on a first transparent substrate having a first conductive layer and depositing a second conductive layer on the electrochromic laminate layer to form a functional laminate layer; forming a first exposed area on the first conductive layer; coating the first exposed area with a first conductive material; coating an end of the second conductive layer remote from the first exposed area with the first conductive material; coating a second conductive material along a periphery of the functional laminate layer, the second conductive material being in contact with the first conductive material; aligning, heating and sealing a second transparent substrate to the first transparent substrate; A method comprising:

11. 11. The method for producing electrochromic glass according to claim 10, wherein when the second transparent substrate and the first transparent substrate are aligned, heated and sealed, the heating and sealing are performed under an inert gas atmosphere.

12. Before the functional laminate layer is formed, the method further comprises:

11. The method for making electrochromic glass of claim 10, further comprising attaching an array of posts onto the first transparent substrate, the array of posts including uniformly distributed posts, the posts being vertically connected to the first transparent substrate and the second transparent substrate.

13. 13. The method for making electrochromic glass of claim 12, wherein when the second transparent substrate and the first transparent substrate are aligned, heated and sealed, the heating is vacuum heating.

14. The formation of the functional laminate layer includes: after the second conductive layer is deposited on the electrochromic stack layer, depositing an ion blocking layer on the second conductive layer by incorporating silicon or a mixture of silicon and aluminum as a target material; Coating the end of the second conductive layer remote from the first exposed region with a first conductive material includes: forming a second exposed region at the end of the second conductive layer remote from the first exposed region; coating the second exposed area with the first conductive material; A method for producing an electrochromic glass according to any one of claims 10 to 13, comprising:

15. The formation of the functional laminate layer includes:

15. The method for making electrochromic glass according to claim 14, further comprising depositing an insulating layer on the ion-blocking layer in a nitrogen atmosphere by incorporating pure titanium, aluminum, silicon and boron or mixtures thereof as target materials after the ion-blocking layer is deposited on the second conductive layer.

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