Semiconductor Device

Abstract

To provide a semiconductor device that has reduced cross talk.SOLUTION: A semiconductor device has: a substrate; a plurality of first electrodes 131 that are arranged on the substrate separated with a space from each other; first intermediate layers 132A that are arranged respectively on the plurality of first electrodes 131; second intermediate layers 132B that are at least partially arranged on the spaces between the plurality of first electrodes 131; a photoelectric conversion layer 133 that is arranged on the first intermediate layers 132A and the second intermediate layers 132B; and a second electrode 134 that is arranged on the photoelectric conversion layer 133. A molar basis content of oxygen in the second intermediate layers 132B is higher than a molar basis content of oxygen in the first intermediate layers 132A.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a semiconductor device. [Background technology]

[0002] In the photoelectric conversion section of a photodetector, a photodiode including an impurity diffusion layer formed on a single crystal silicon substrate is widely used. In contrast to this, in recent years, a photodetector having a photoelectric conversion layer using an organic material or colloidal quantum dots has been proposed. These materials have higher photosensitivity in the long wavelength region than silicon. For this reason, a photodetector using a photoelectric conversion layer has a small area and a high light utilization efficiency. Patent Document 1 discloses an example of a photodetector using a photoelectric conversion layer. One of the photodetectors disclosed in Patent Document 1 has an adhesive layer between an electrode and a photoelectric conversion layer. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] U.S. Patent No. 8,203,195 Summary of the Invention [Problem to be solved by the invention]

[0004] When the structure disclosed in Patent Document 1 is applied to a semiconductor device such as a photodetector having multiple pixels, crosstalk may occur between the pixels via the adhesive layer. Therefore, an object of the present invention is to provide a semiconductor device in which crosstalk is reduced. [Means for solving the problem]

[0005] According to one aspect of the present invention, a method for manufacturing a semiconductor device comprising the steps of: a substrate; a plurality of first electrodes arranged on the substrate with gaps between each other; a first intermediate layer arranged on each of the plurality of first electrodes; and a first intermediate layer arranged on the gaps between the plurality of first electrodes and between the first intermediate layers. All overThe present invention provides a semiconductor device having a first intermediate layer and a second intermediate layer at least partially disposed on the first intermediate layer, a photoelectric conversion layer disposed on the first intermediate layer and on the second intermediate layer, and a second electrode disposed on the photoelectric conversion layer, wherein the first intermediate layer and the second intermediate layer are carrier injection blocking layers, the molar oxygen content in the second intermediate layer is higher than the molar oxygen content in the first intermediate layer, and the film thickness of the second intermediate layer is smaller than the film thickness of the first intermediate layer. Effect of the Invention

[0006] According to the present invention, it is possible to provide a semiconductor device with reduced crosstalk. [Brief description of the drawings]

[0007] [Figure 1] 1 is a schematic cross-sectional view of a semiconductor device according to a first embodiment. [Diagram 2] 2 is an enlarged schematic cross-sectional view of the vicinity of an intermediate layer of the semiconductor device according to the first embodiment. FIG. [Diagram 3] 2 is a schematic plan view showing the arrangement of an intermediate layer of the semiconductor device according to the first embodiment. FIG. [Figure 4] 1A to 1C are schematic cross-sectional views illustrating a method for manufacturing a semiconductor device according to a first embodiment. [Diagram 5] 4 is a graph showing the external quantum efficiency of the quantum dot film according to the first embodiment. [Figure 6] 2 is a graph showing the measurement results of the titanium oxide film according to the first embodiment by X-ray photoelectron spectroscopy (XPS). [Figure 7] 10 is an enlarged schematic cross-sectional view of the vicinity of an intermediate layer of a semiconductor device according to a second embodiment. FIG. [Figure 8] 13 is an enlarged schematic cross-sectional view of the vicinity of an intermediate layer of a semiconductor device according to a third embodiment. FIG. [Figure 9] 13 is an enlarged schematic cross-sectional view of the vicinity of an intermediate layer of a semiconductor device according to a fourth embodiment. FIG. [Figure 10] 13 is an enlarged schematic cross-sectional view of the vicinity of an intermediate layer of a semiconductor device according to a fifth embodiment. FIG. [Figure 11] FIG. 13 is a diagram illustrating an example of the configuration of an imaging system according to a sixth embodiment. [Figure 12] FIG. 13 is a diagram illustrating an example of the configuration of an imaging system and a moving object according to a seventh embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0008] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. Each of the following embodiments shows one configuration example of the present invention, and the present invention is not limited by the numerical values, shapes, materials, components, arrangement of the components, connection relationships between the components, etc. For example, in the following embodiments, a photodetector is mainly shown as an example of a semiconductor device to which the present invention can be applied, but the present invention can also be applied to a light-emitting device. In addition, the conductivity types of the transistors, semiconductor regions, etc. shown in the following embodiments can be changed as appropriate.

[0009] In addition, the same elements or corresponding elements in multiple drawings are given the same reference numerals, and the description thereof may be omitted or simplified. In addition, when the same elements are arranged multiple times in a drawing, the reference numerals and the description thereof may be omitted.

[0010] [First embodiment] FIG. 1 is a schematic cross-sectional view of a semiconductor device according to this embodiment. FIG. 1 shows a cross-section of the semiconductor device in a plane including the Z direction (upward in the figure) and the X direction (rightward in the figure). The semiconductor device of this embodiment is a photodetector that photoelectrically converts incident light to generate charges according to the amount of incident light. FIG. 1 shows three unit cells 120 of the semiconductor device. The unit cells 120 are also called pixels or subpixels. Each of the three unit cells 120 has a similar circuit configuration. The unit cells 120 have at least one photodetector element.

[0011] When the semiconductor device is a light-emitting device, the unit cell 120 has at least one light-emitting element. The semiconductor device functions as a photodetector or a light-emitting device depending on the material of the functional layer included in the unit cell 120.

[0012] The semiconductor device has a substrate 100. In this embodiment, the substrate 100 is a semiconductor substrate such as a silicon single crystal substrate, but may be an insulating substrate such as glass or ceramic. The substrate 100 has a main surface P1. The substrate 100 has a transistor 101 and an element isolation portion 113 in the vicinity of the main surface P1.

[0013] The transistor 101 is, for example, an N-type MOS transistor, and includes a source / drain region 102, a gate insulating film 103, a gate electrode 104, and a source / drain region 105. The gate insulating film 103 and the gate electrode 104 are disposed on a main surface P1. The gate insulating film 103 is disposed between the gate electrode 104 and the main surface P1. The source / drain region 102 and the source / drain region 105 are disposed inside the substrate 100. When the transistor 101 is an N-type MOS transistor, the source / drain regions 102 and 105 are N-type semiconductor regions. The element isolation portion 113 has, for example, an STI (Shallow Trench Isolation) structure.

[0014] A wiring structure 106 is disposed on a main surface P1 of the substrate 100. The wiring structure 106 has a contact plug 107, a wiring layer 108, a via plug 109, a wiring layer 110, a via plug 111, and an insulating layer 112. Although not shown in detail in FIG. 1, the insulating layer 112 may be a multi-layer film. These members can be formed using materials such as metals and insulators that are commonly used in semiconductor processes.

[0015] The contact plug 107 and the via plugs 109 and 111 may be made of a material selected from, for example, aluminum, copper, tungsten, titanium, titanium nitride, etc. Typically, the contact plug 107 and the via plugs 109 and 111 may have a laminated structure of titanium, titanium nitride, and tungsten. The wiring layers 108 and 110 may be made of a material selected from, for example, aluminum, copper, tungsten, titanium, titanium nitride, tantalum, etc. Typically, the wiring layers 108 and 110 may have a laminated structure of tantalum and copper. The insulating layer 112 may be made of, for example, silicon oxide, silicon nitride, etc.

[0016] The wiring structure 106 further includes a plurality of lower electrodes 131 (first electrodes) arranged with gaps between each other. Each of the plurality of lower electrodes 131 is arranged in a corresponding unit cell 120. The gaps between the plurality of lower electrodes 131 form isolation regions 130. The isolation regions 130 may be the insulating layer 112 of the wiring structure 106. Each of the plurality of lower electrodes 131 is connected to a corresponding via plug 111. The lower electrodes 131 may be made of a material selected from copper, aluminum, and the like.

[0017] The semiconductor device has an intermediate layer 132, a functional layer 133, and an upper electrode 134 (second electrode). The intermediate layer 132, the functional layer 133, and the upper electrode 134 are arranged in this order on the wiring structure 106. The upper electrode 134 is provided continuously across the three unit cells 120. In this embodiment, the upper and lower surfaces of the upper electrode 134 are flat.

[0018] The functional layer 133 is disposed between a plurality of lower electrodes 131 and an upper electrode 134. The functional layer 133 is a photoelectric conversion layer and has a function of detecting light. The lower electrode 131 can be used to read out a signal based on charges generated by photoelectric conversion.

[0019] In addition, when the semiconductor device is a light-emitting device, the functional layer 133 has a light-emitting function. In this case, the lower electrode 131 can be used to supply the functional layer 133 with a control signal for controlling light emission or non-light emission and light emission intensity.

[0020] The intermediate layer 132 is disposed between each of the lower electrodes 131 and the functional layer 133. The intermediate layer 132 is a layer that ensures electrical insulation between each of the lower electrodes 131 and the functional layer 133 for one of the carriers, holes or electrons, and ensures conduction for the other. Therefore, the intermediate layer 132 can also be said to be a carrier injection blocking layer. When the lower electrodes 131 are electrodes (cathode) that collect holes, the intermediate layer 132 can be a layer (electron blocking layer) that blocks electrons and conducts holes. When the lower electrodes 131 are electrodes (anode) that collect electrons, the intermediate layer 132 can be a layer (hole blocking layer) that blocks holes and conducts electrons. When the intermediate layer 132 is an electron blocking layer, a hole blocking layer (not shown) can be disposed between the functional layer 133 and the upper electrode 134. Furthermore, when the intermediate layer 132 is a hole blocking layer, an electron blocking layer (not shown) may be disposed between the functional layer 133 and the upper electrode 134 .

[0021] The intermediate layer 132 can also function as an adhesive layer between each of the multiple lower electrodes 131 and the functional layer 133. By disposing the intermediate layer 132 between the lower electrode 131 and the functional layer 133, film peeling caused by poor wettability between the lower electrode 131 and the functional layer 133 can be reduced. The intermediate layer 132 is preferably formed on the entire surface. In this case, the contact area between the intermediate layer 132 and the functional layer 133 can be increased, and the effect of reducing film peeling can be further improved.

[0022] The semiconductor device includes an insulating layer 136, a color filter layer 137, a planarization layer 138, and a microlens layer 139. The insulating layer 136, the color filter layer 137, the planarization layer 138, and the microlens layer 139 are arranged on the upper electrode 134 in this order. The insulating layer 136 can function as a protective layer and a sealing layer. The color filter layer 137 has a color filter of one of a plurality of colors. Each of the plurality of unit cells 120 includes a color filter of a corresponding color. The planarization layer 138 has a flat upper surface suitable for forming the microlens layer 139. The microlens layer 139 includes a plurality of microlenses. One unit cell 120 includes one microlens.

[0023] FIG. 2 is a schematic cross-sectional view showing an enlarged view of the vicinity of the intermediate layer 132 of the semiconductor device according to the first embodiment. FIG. 3 is a schematic plan view showing the arrangement of the intermediate layer 132 of the semiconductor device according to the present embodiment. As shown in FIG. 2 and FIG. 3, the intermediate layer 132 has a first portion 132A (first intermediate layer) and a second portion 132B (second intermediate layer). The first portion 132A is a portion of the intermediate layer 132 arranged on the lower electrode 131. The second portion 132B is a portion of the intermediate layer 132 arranged on the separation region 130, which is a gap between the two lower electrodes 131. In the photodetector, the unit cells 120 are arranged in a matrix shape having a plurality of rows and a plurality of columns, so that the plurality of first portions 132A are also arranged in a matrix shape similar to the unit cells 120. The second portion 132B is arranged in a region between the plurality of first portions 132A.

[0024] Here, the molar content of oxygen in the second portion 132B is higher than the molar content of oxygen in the first portion 132A. In the following description, the molar content of oxygen may be referred to as the oxidation degree. For example, when the material of the intermediate layer 132 is titanium oxide (TiOx), the larger the value of x, the higher the valence of titanium and the greater the oxidation degree, so the value of x can be an index of the oxidation degree. The oxidation degree can be measured by observing the constituent elements or electronic state of the intermediate layer 132 by XPS (X-ray photoelectron spectroscopy) or the like.

[0025] The intermediate layer 132 is formed continuously over the upper part of the lower electrode 131 and the upper part of the separation region 130. Therefore, as described above, the contact area between the intermediate layer 132 and the functional layer 133 can be increased, and the effect of reducing film peeling can be improved. At this time, since the second part 132B of the intermediate layer 132 is arranged on the upper part of the separation region 130, crosstalk may occur between the lower electrode 131 through the second part 132B. The crosstalk is reduced as the electrical conductivity of the second part 132B of the intermediate layer 132 is lower. However, when the electrical conductivity of the first part 132A of the intermediate layer 132 is low, the movement of carriers between the lower electrode 131 and the functional layer 133 may be hindered. When the movement of carriers between the lower electrode 131 and the functional layer 133 is hindered, the accuracy of reading out the charge generated in the functional layer 133 decreases. As such, since the characteristics required for the first portion 132A and the characteristics required for the second portion 132B are different, it may be difficult to achieve both the reduction of crosstalk and the ensuring of carrier movement between the lower electrode 131 and the functional layer 133.

[0026] Therefore, in this embodiment, the intermediate layer 132 is formed so that the oxidation degree of the second portion 132B is higher than the oxidation degree of the first portion 132A. Generally, the higher the oxidation degree of the intermediate layer 132, the lower the electrical conductivity. Therefore, by forming the intermediate layer 132 as described above, the electrical conductivity of the second portion 132B can be made lower than the electrical conductivity of the first portion 132A. With this configuration, the low electrical conductivity of the second portion 132B reduces crosstalk, and the high electrical conductivity of the first portion 132A maintains a state in which carriers can freely move between the lower electrode 131 and the functional layer 133.

[0027] It should be noted that a configuration in which the second portion 132B of the intermediate layer 132 is removed may be considered, but in this configuration, the contact area between the intermediate layer 132 and the functional layer 133 is reduced, and therefore film peeling may occur between the intermediate layer 132 and the functional layer 133. Film peeling may be reduced by using a material for the functional layer 133 that strengthens the adhesion between the functional layer 133 and the lower electrode 131. However, in this case, the type of material that can be used for the functional layer 133 is limited, and the photosensitivity characteristics of the functional layer 133 may be reduced. Therefore, the configuration in which the second portion 132B is removed may not be able to achieve both the quality and performance required for the photodetector, and therefore the configuration of this embodiment is preferable to the configuration in which the second portion 132B is removed.

[0028] In this embodiment, as shown in FIG. 2, the right end of the first portion 132A is located to the right of the right end of the lower electrode 131, and the left end of the first portion 132A is located to the left of the left end of the lower electrode 131. In other words, the intermediate layer 132 is formed so that the outer edge of the first portion 132A is located outside the outer edge of the lower electrode 131 in a plan view. This reduces the influence of manufacturing variations in the positions of the lower electrode 131 and the first portion 132A. The separation distance between the outer edge of the lower electrode 131 and the outer edge of the first portion 132A can be set to 0.01 μm or more and 5.0 μm or less, taking into account the size of the unit cell 120. In order to more effectively reduce crosstalk, it is preferable to reduce this separation distance and widen the region of the second portion 132B, which has a high oxidation degree and low electrical conductivity. Therefore, taking into account the reduction of crosstalk, it is preferable to set the separation distance to 0.01 μm or more and 0.1 μm or more.

[0029] When focusing on the oxidation number, the photoelectric conversion device according to one embodiment of the present invention can also be described as follows. The photoelectric conversion device has a first lower electrode, a second lower electrode, a second electrode, and a photoelectric conversion layer disposed between the first lower electrode and the second electrode, and has an insulating layer between the first lower electrode and the second lower electrode in a plan view. The photoelectric conversion device has a first metal and a second metal having a higher oxidation number than the first metal in a region between the first lower electrode, the second lower electrode, the insulating layer, and the photoelectric conversion layer. In a plan view, the molar ratio of the first metal to the sum of the first metal and the second metal in a region overlapping with the first lower electrode is defined as a first molar ratio. In a plan view, the molar ratio of the first metal to the sum of the first metal and the second metal in a region overlapping with the insulating layer between the first lower electrode and the second lower electrode is defined as a second molar ratio. At this time, the first molar ratio is greater than the second molar ratio.

[0030] The first metal and the second metal may be the same metal, for example, the first metal may be titanium in titanium monoxide and the second metal may be titanium in titanium dioxide.

[0031] Next, materials of the functional layer 133 that can be applied to the semiconductor device of this embodiment will be described. As described above, the functional layer 133 may be any material that functions as a photoelectric conversion layer, and the material and manufacturing method thereof are not particularly limited. The functional layer 133 may be an inorganic material or an organic material. For example, quantum dots, which are an aggregate of nanoparticles such as amorphous silicon, organic semiconductors, and compound semiconductors, can be used for the functional layer 133. Examples of organic semiconductors that can be used for the nanoparticles include fullerene (C60), coumarin 6 (C6), rhodamine 6G (R6G), quinacridone, phthalocyanine compounds, and naphthalocyanine compounds.

[0032] A configuration example in which the functional layer 133 is a colloidal quantum dot containing semiconductor nanoparticles will be described. The colloidal quantum dot contains nanoparticles with an average particle diameter of 0.5 nm or more and less than 100 nm. A single element semiconductor (group IV semiconductor) or a compound semiconductor can be used as the material of the nanoparticles. The compound semiconductor may be a group III-V semiconductor, a group II-VI semiconductor, or a semiconductor consisting of a combination of three or more elements of groups II, III, IV, V, and VI. Specifically, semiconductors such as PbS, PbSe, PbTe, InN, InAs, InP, InSb, InAs, InGaAs, CdS, CdSe, CdTe, Ge, CuInS, CuInSe, CuInGaSe, and Si can be mentioned. These are semiconductor materials with a relatively narrow band gap. The colloidal quantum dot may contain only one type of nanoparticles of the above-mentioned materials, or may contain two or more types of nanoparticles. Colloidal quantum dots containing these materials are also called semiconductor quantum dots. The nanoparticles may have a core-shell structure that includes a core containing the above-mentioned semiconductor and a coating material that coats the core.

[0033] The size of the nanoparticles can be set to a size equal to or smaller than the exciton Bohr radius specific to each semiconductor material. In this case, the quantum size effect is exerted, and a desired band gap according to the size can be obtained. In other words, the optical absorption wavelength or emission wavelength can be controlled by controlling the size of the nanoparticles to a predetermined value and manufacturing them.

[0034] The material used for the nanoparticles is preferably PbS or PbSe from the viewpoint of ease of synthesis. Since the exciton Bohr radius of PbS is approximately 18 nm, the average particle size of the nanoparticles is preferably in the range of 2 nm to 15 nm from the viewpoint of controlling crystal growth and manifesting the quantum size effect. By making the average particle size of the nanoparticles 2 nm or more, it becomes easier to control the crystal growth in the synthesis of the nanoparticles. A transmission electron microscope can be used to measure the particle size of the nanoparticles.

[0035] The thickness of the functional layer 133 is not particularly limited, but from the viewpoint of obtaining high light absorption characteristics, it is preferably 10 nm or more, and more preferably 50 nm or more. Moreover, from the viewpoint of ease of manufacture, the thickness of the functional layer 133 is preferably 800 nm or less.

[0036] Next, a description will be given of the material of the intermediate layer 132 that can be applied to the semiconductor device of this embodiment. As described above, the intermediate layer 132 can be an electron blocking layer or a hole blocking layer depending on the type of carriers collected by the lower electrode 131. The intermediate layer 132 also functions as an adhesion layer to suppress peeling of the functional layer 133.

[0037] First, the case where the intermediate layer 132 is an electron blocking layer will be described. The material of the electron blocking layer is preferably one that can efficiently transport holes generated in the functional layer 133, which is a photoelectric conversion layer, to the positive electrode. The material preferably has properties such as high hole mobility, high electrical conductivity, a small hole injection barrier between the positive electrode and the material, and a small hole injection barrier from the photoelectric conversion layer to the electron blocking layer. Furthermore, when light is taken into the photoelectric conversion layer through the electron blocking layer, it is preferable to use a highly transparent material for the material of the electron blocking layer. The visible light transmittance of the transparent electron blocking layer is preferably 60% or more, and more preferably 80% or more. From this viewpoint, specific examples of the material of the electron blocking layer include P-type inorganic semiconductors such as molybdenum oxide (MoO3) and nickel oxide (NiO) and P-type organic semiconductors such as PEDOT:PSS.

[0038] Next, the case where the intermediate layer 132 is a hole blocking layer will be described. The function required for the hole blocking layer is to block holes generated in the photoelectric conversion layer and transport electrons to the negative electrode, which is the opposite of the electron blocking layer. Therefore, in the above description of the electron blocking layer, the positive electrode is replaced with a negative electrode, and the P-type semiconductor is replaced with an N-type semiconductor, which is a preferable property of the hole blocking layer. When light is irradiated from the negative electrode side, or when light reflected on the negative electrode side is utilized, it is preferable to use a highly transparent material for the hole blocking layer. From this viewpoint, specific examples of the material for the hole blocking layer include N-type wide gap semiconductors such as titanium oxide (TiO2) and zinc oxide (ZnO), or N-type semiconductors such as fullerene (C60). In particular, oxide-based inorganic semiconductors are more preferable because the electrical conductivity can be easily changed by controlling the degree of oxidation through film formation conditions or post-film formation treatment.

[0039] The thickness of the intermediate layer 132 is not particularly limited, but is, for example, about 1 nm to 100 nm. When the thickness of the intermediate layer 132 is thin, the voltage applied to the functional layer 133 can be reduced. On the other hand, when the thickness of the intermediate layer 132 is thick, the possibility that electrons or holes pass through the intermediate layer 132 due to the tunnel effect can be reduced. In addition, when the thickness of the intermediate layer 132 is thick, the occurrence of film defects due to pinholes or the like can be reduced. For example, when the thickness of the intermediate layer 132 is thicker than the unevenness of the surface of the lower electrode 131, defects in the first portion 132A of the intermediate layer 132 can be reduced. Taking these points into consideration, the thickness of the intermediate layer 132 can be appropriately set.

[0040] The intermediate layer 132 is a layer in which the injection of charges can be controlled by applying an electric field in the film thickness direction. However, charges can also move freely in the direction horizontal to the film thickness in the intermediate layer 132. Therefore, when the electrical conductivity of the intermediate layer 132 is high as described above, the horizontal charge movement described above can be a cause of crosstalk.

[0041] Next, materials of the lower electrode 131 and the upper electrode 134 that can be applied to the semiconductor device of this embodiment will be described. The lower electrode 131 and the upper electrode 134 can be formed of any material having electrical conductivity. Specific examples of the material of the lower electrode 131 and the upper electrode 134 include metals such as platinum, gold, silver, aluminum, chromium, nickel, copper, titanium, and magnesium, and alloys containing these metals. Alternatively, the material of the lower electrode 131 and the upper electrode 134 may be a metal oxide such as indium oxide or tin oxide, or a composite oxide containing these (for example, ITO or IZO). In addition, the material of the lower electrode 131 and the upper electrode 134 may be a material using conductive particles such as carbon black, fullerene, carbon nanotube, and graphene, or a composite material in which these are dispersed in a matrix such as a polymer binder. The material of the lower electrode 131 and the upper electrode 134 may be one of the above-mentioned examples used alone, or two or more of them may be used in a predetermined combination and ratio.

[0042] Here, it is preferable that at least one of the lower electrode 131 and the upper electrode 134 is transparent. In this case, the transparent electrode can transmit light absorbed by the functional layer 133. In the case where the semiconductor device is a light emitting device, the transparent electrode can transmit light emitted from the functional layer 133.

[0043] The lower electrode 131 and the upper electrode 134 have the function of collecting electrons or holes generated inside the functional layer 133. Therefore, it is more preferable to use materials suitable for collecting electrons or holes as the materials for the lower electrode 131 and the upper electrode 134. Examples of electrode materials suitable for collecting holes include materials with a high work function such as gold and ITO. Examples of materials suitable for collecting electrons include materials with a low work function such as aluminum.

[0044] The thicknesses of the lower electrode 131 and the upper electrode 134 are not particularly limited, but can be appropriately determined in consideration of the required electrical conductivity, transparency, etc. Typically, these thicknesses are about 10 nm to 10 μm.

[0045] Figures 4(a) to 4(c) are schematic cross-sectional views showing the method for manufacturing the semiconductor device of this embodiment. The method for manufacturing the semiconductor device will be described with reference to Figures 4(a) to 4(c).

[0046] First, the process of forming the wiring structure 106 and the first portion 132A of the intermediate layer 132 will be described with reference to FIG. 4(a). First, the substrate 100 is prepared. Next, the element isolation portion 113 and the transistor 101 are formed in the substrate 100. Next, the wiring structure 106 is formed on the substrate 100. Next, the lower electrode 131 is formed on the via plug 111. After the lower electrode 131 is formed, a process of forming the insulating layer 112 again may be performed. In this case, a planarization process is performed so that the upper surface height of the insulating layer 112 and the upper surface height of the lower electrode 131 coincide with each other. The planarization process may be performed by etching or a chemical mechanical polishing (CMP) method. A general semiconductor process may be applied to the manufacture of each of the above-mentioned layers. Then, the intermediate layer 132 is formed on the insulating layer 112 and the lower electrode 131 by a deposition method, a sputtering method, or the like, and the first portion 132A of the intermediate layer 132 is formed by patterning the intermediate layer 132. In this manner, the structure of FIG. 4(a) is completed.

[0047] The film formation conditions for forming the first portion 132A of the intermediate layer 132 will be described using an example in which the material of the intermediate layer 132 is titanium oxide. Titanium oxide can be formed by a sputtering device using a TiO2 target. The film formation conditions at this time are, for example, RF power of 500 W, flow rate of argon gas introduced of 100 sccm, and pressure in the chamber of 0.5 Pa. Under these conditions, oxygen is not mixed into the gas introduced during film formation. As a result, many oxygen defects are generated in the formed titanium oxide film, so the degree of oxidation of the first portion 132A is low and the valence of titanium is also low.

[0048] Next, a process for forming the second portion 132B of the intermediate layer 132 will be described with reference to Fig. 4(b). After the structure of Fig. 4(a) is completed, the second portion 132B of the intermediate layer 132 is formed by depositing and patterning the intermediate layer 132, for example, by a lift-off process. Here, deposition, sputtering, etc. may be used for the deposition process. In this manner, the structure of Fig. 4(b) is completed.

[0049] The film formation conditions for forming the second portion 132B of the intermediate layer 132 will be described below using the case where the material of the intermediate layer 132 is titanium oxide as an example. The film formation conditions at this time may be the above-mentioned conditions for forming the first portion 132A, but with the introduced gas conditions changed so that oxygen gas is mixed at a flow rate of 5 sccm in addition to argon gas at a flow rate of 100 sccm. By mixing oxygen gas into the introduced gas, oxygen defects in the titanium oxide film to be formed are reduced, so that the oxidation degree of the second portion 132B is increased and the valence of titanium is also increased.

[0050] Although FIG. 4(a) and FIG. 4(b) show an example in which the first portion 132A and the second portion 132B of the intermediate layer 132 are formed separately, the first portion 132A and the second portion 132B may be formed by oxidizing a part of the intermediate layer 132. First, a film of titanium oxide with a low degree of oxidation is formed on the entire surface, and then a resist mask is formed by photolithography on the area where the first portion 132A is to be formed. Then, by performing an oxidation process using this resist mask as a protective layer, it is possible to oxidize only the area of ​​the second portion 132B that is not protected by the resist mask. This method can also form a structure similar to that shown in FIG. 4(b). For the oxidation process, plasma oxidation, UV ozone oxidation, etc. can be used.

[0051] Next, a process for forming the functional layer 133 will be described with reference to Fig. 4(c). After the structure of Fig. 4(b) is completed, quantum dots and the like are formed to form the functional layer 133. Below, an example of the creation of quantum dots of lead sulfide (PbS) will be described as an example of a method for forming the functional layer 133. Note that the specific creation conditions shown below are merely examples and are not particularly limited.

[0052] First, an example of the synthesis process of lead sulfide (PbS) quantum dots will be described. First, 892 mg of lead oxide (PbO), 40 mL of octadecene, and 4 mL of oleic acid are placed in a three-neck flask, and the three-neck flask is set in an oil bath. The temperature of the oil bath is set to 90°C. At this time, in order to prevent the oxidation of the quantum dots during the reaction, a nitrogen atmosphere is created inside the three-neck flask by flowing nitrogen at a flow rate of 0.5 L / min. When the solution is placed in the oil bath, it is stirred for 30 minutes or more until the pale yellow solution turns transparent.

[0053] In parallel with this, 20 mL of a 1.9 mM bistrimethylsilyl sulfide solution in octadecene is prepared in a syringe in a nitrogen atmosphere glove box. This solution is the sulfur source. This sulfur source solution is quickly added to the now transparent solution in the three-neck flask. One minute after the addition, the three-neck flask is removed from the oil bath and allowed to cool naturally for two hours. After the solution has reached room temperature, it is moved onto the next purification step. The solution after the synthesis step is black, and the production of lead sulfide (PbS) quantum dots with their surfaces protected by oleic acid can be confirmed.

[0054] Next, we will explain the purification process. The octadecene dispersion of quantum dots obtained in the synthesis process is transferred from the three-neck flask to a centrifuge tube. When acetone, a polar solvent, is added to this, it becomes difficult for the quantum dots to stably disperse in the octadecene solution. The centrifuge tube to which acetone has been added is placed in a centrifuge and centrifuged to precipitate the quantum dots. The centrifugation conditions at this time are 17,000 rpm for 20 minutes.

[0055] After that, the tube is removed from the centrifuge, the clear supernatant acetone is discarded, and toluene, a non-polar solvent, is added to the quantum dots that have precipitated at the bottom of the tube. After adding toluene, the tube is shaken to redisperse the quantum dots in toluene. Acetone is added again to this toluene dispersion, and the tube is placed in the centrifuge. The quantum dots are precipitated again by centrifuging at 15,000 rpm for 5 minutes.

[0056] By repeating this precipitation with acetone and redispersion with toluene three times, the quantum dot dispersion liquid can be purified, and a toluene dispersion liquid of quantum dots can be obtained. Note that the polar solvent used for the precipitation of the quantum dots may be methanol, ethanol, etc. instead of acetone, but it is preferable that the polar solvent has little effect on the oleic acid protecting the quantum dots, that is, that the oleic acid is less likely to be removed from the surface of the quantum dots.

[0057] Next, the process of preparing the quantum dot coating solution used for coating to form a quantum dot film on a substrate will be described. Acetone is added to the toluene dispersion of quantum dots obtained in the above purification process, and the quantum dots are precipitated by centrifuging. Finally, the quantum dots are redispersed in octane instead of toluene to prepare a solution with a concentration of 80 mg / mL, which will be used as the quantum dot coating solution in the process described below.

[0058] Next, the process of forming the quantum dot film will be described. First, the quantum dot coating solution described above is dropped onto the center of the substrate placed in the spin coater and spin coated. The spin coat conditions are 2500 rpm and 30 seconds. The quantum dot film after spin coating is an aggregate of quantum dots protected by oleic acid, which has a long molecular length, so the particle spacing is large. Therefore, these quantum dots have poor conductivity of photocarriers generated when irradiated with light, and have low photoelectric conversion function. Here, this film is called an oleic acid-protected quantum dot film.

[0059] Therefore, a process of exchanging the ligand is performed by replacing the oleic acid coordinated to the atoms near the surface of the nanoparticles contained in the oleic acid-protected quantum dot film with a substance having a shorter molecular length. Hereinafter, this process is called ligand exchange, and the substance used for the ligand exchange may be simply called the ligand. Also, the solution containing the substance used for the ligand exchange may be called the ligand solution. Hereinafter, 1,4-benzenedithiol is used as the organic ligand. As a comparative example, an example using 4-methylbenzoic acid will be described. 1,4-benzenedithiol has only a thiol group as a functional group, whereas 4-methylbenzoic acid has a methyl group and a carboxyl group. The carboxyl group of 4-methylbenzoic acid forms a chemical bond with titanium oxide, improving the adhesion with titanium oxide. As the ligand solution for the ligand exchange, a 3 mM acetonitrile solution of 1,4-benzenedithiol is used. In addition, in the comparative example, a methanol solution of 10 mM 4-methylbenzoic acid is used. In addition, halogens (iodine, chlorine, bromine) can be added as inorganic ligands after ligand exchange with these organic ligands. For example, a 10 mM solution of lead iodide in N,N-dimethylformamide can be used.

[0060] The ligand exchange process is carried out by applying the above-mentioned ligand solution onto the oleic acid-protected quantum dot film formed on the substrate. Specifically, the ligand solution is applied to the entire surface of the oleic acid-protected quantum dot film, and the ligand exchange reaction is carried out for a predetermined time. The reaction time is 30 seconds in both the ligand exchange reactions of 1,4-benzenedithiol and 4-methylbenzoic acid. However, this reaction time may be appropriately changed in consideration of the concentration of the ligand solution, etc. After the predetermined reaction time has elapsed, the substrate is rotated at 200 rpm for 60 seconds to remove the ligand solution from the substrate and dried. Then, in order to remove excess ligand remaining on the quantum dots, the substrate is rinsed with acetonitrile or methanol, which is a solvent used to dissolve the ligand. Then, the substrate is rinsed with octane to remove the oleic acid that has been released from the quantum dots.

[0061] Through the above steps, oleic acid bound to atoms near the surface of the nanoparticles of the oleic acid-protected quantum dot film is released and exchanged with a specific ligand to form a 1,4-benzenedithiol quantum dot film or a 4-methylbenzoic acid quantum dot film. The thickness of the 1,4-benzenedithiol quantum dot film and the 4-methylbenzoic acid quantum dot film after the ligand exchange is 40 nm to 60 nm. After the ligand exchange with these organic ligands, a halogen can be added as an inorganic ligand by the same ligand exchange procedure as described above. A specific example of halogen addition is iodine addition using a lead iodide solution. The reaction time for this iodine addition is 3 minutes.

[0062] The organic ligand that can be used in this embodiment is not limited to 1,4-benzenedithiol. For example, it may be an organic compound ligand including ethanedithiol, 1,3-benzenedithiol, benzenediamine, and dibenzenediamine. In particular, the boiling point of a ligand including a benzene ring, such as 1,4-benzenedithiol or 1,3-benzenedithiol, exceeds 200°C. Therefore, even at high temperatures of 140°C or higher, the decomposition and volatilization of the ligand from the quantum dot surface is reduced, and the effect of improving the heat resistance of the quantum dot is obtained. In addition to 4-methylbenzoic acid, a ligand such as 3-mercaptopropionic acid having a thiol group and a carboxyl group can also be selected from the viewpoint of adhesion, but there is a problem in heat resistance compared to a ligand having a benzene ring.

[0063] On the quantum dot film after the ligand exchange, an oleic acid protected quantum dot film is formed again, and the steps of ligand exchange and rinsing are repeated to form the quantum dot film multiple times. In this way, a 1,4-benzenedithiol quantum dot film or a 4-methylbenzoic acid quantum dot film of a desired film thickness can be formed. In this embodiment, the formation of the quantum dot film is repeated seven times to form seven layers of quantum dot films (film thickness 420 nm).

[0064] Then, the upper electrode 134 is formed. As described above, an electron blocking layer may be formed between the functional layer 133 and the upper electrode 134, and if the electron blocking layer is molybdenum oxide, this step may be vacuum deposition. Then, the insulating layer 136, the color filter layer 137, the planarization layer 138, and the microlens layer 139 are formed in sequence. Since general semiconductor device manufacturing methods can be applied to the manufacture of these layers, detailed explanations of the manufacturing methods will be omitted. In this manner, the semiconductor device shown in FIG. 2 can be manufactured.

[0065] Fig. 5 is a graph showing the wavelength dependence of the external quantum efficiency of the quantum dot film according to the present embodiment. Fig. 5 shows a comparison between 1,4-benzenedithiol according to the present embodiment and 4-methylbenzoic acid according to a comparative example. Two types of 1,4-benzenedithiol are shown, one with iodine added and one without iodine added.

[0066] As shown in Figure 5, the quantum dot film using 1,4-benzenedithiol has a higher external quantum efficiency than the quantum dot film using 4-methylbenzoic acid. 4-Methylbenzoic acid has an advantage in terms of adhesion because it has a carboxyl group that strongly bonds with titanium oxide. However, in terms of photoelectric conversion properties, 1,4-benzenedithiol is more effective than 4-methylbenzoic acid.

[0067] In addition, as shown in FIG. 5, 1,4-benzenedithiol to which iodine has been added has a higher external quantum efficiency than 1,4-benzenedithiol to which iodine has not been added. This is considered to be due to the passivation of surface defects present on the surface of the quantum dots by iodine. The presence or absence of added iodine can be confirmed by TOF-SIMS analysis or XPS analysis. Although 1,4-benzenedithiol does not have a carboxyl group, even if an adhesive layer is not provided on the titanium oxide intermediate layer 132, the film does not peel off. This is because the titanium oxide intermediate layer 132 is formed on the entire surface, and the contact area between the 1,4-benzenedithiol functional layer 133 and the titanium oxide film intermediate layer 132 is sufficiently large.

[0068] Fig. 6 is a graph showing the results of XPS measurement of the titanium oxide film according to this embodiment. Fig. 6 shows a comparison between a case where no oxygen was mixed into the gas introduced during film formation (oxygen mixing ratio 0%) and a case where oxygen was mixed into the gas (oxygen mixing ratio 5%). As can be seen from Fig. 6, the peaks present over the binding energy range from about 456 eV to 459 eV indicate titanium oxide.

[0069] In the titanium oxide film formed with an oxygen mixing ratio of 0%, a small peak is observed near 456 eV at the base of the spectrum, which is attributable to low valence components of titanium oxide, i.e., components with a low degree of oxidation. The area ratio of the small peak to the main peak near 458 eV is 6%. On the other hand, no small peak is observed in the titanium oxide film formed with an oxygen mixing ratio of 5%. This shows that titanium oxide with an oxygen mixing ratio of 0% has many oxygen defects and is a titanium oxide film with a low degree of oxidation, while titanium oxide with an oxygen mixing ratio of 5% has few oxygen defects and is a titanium oxide film with a high degree of oxidation.

[0070] The volume resistivity of a titanium oxide film with a 0% oxygen mixture is approximately 8×10 2 The volume resistivity of a titanium oxide film with an oxygen mixture ratio of 5% is 1×10 13In this way, the conductivity of the titanium oxide film caused by oxygen defects can be greatly changed depending on the degree of oxidation. It is also possible to increase the oxygen mixture ratio to 5% or more during film formation. For example, when the oxygen mixture ratio is 10%, the volume resistivity is 3×10 13 Ωcm.

[0071] Thus, in this embodiment, even if an adhesive layer made of an organic bifunctional molecule or an organic substance is not provided on the intermediate layer 132 such as titanium oxide, a sufficient contact area can be secured between the intermediate layer 132 formed on the entire surface and the functional layer 133 of the quantum dot film. Therefore, even if a material that does not have a functional group that generates high adhesion to the ligand of the atoms on the surface of the quantum dot film is selected, there is little risk of film peeling, and since the degree of freedom in selecting the ligand is high, high photoelectric conversion characteristics can be obtained. Since the intermediate layer 132 with a low oxidation degree has a high electrical conductivity, it has the advantage of reducing the series resistance component in the film thickness direction, but it may deteriorate the crosstalk in the lateral direction. In contrast, in this embodiment, the first portion 132A of the intermediate layer 132 on the lower electrode 131 is formed to have a low oxidation degree, and the second portion 132B between the electrodes is formed to have a high oxidation degree. As a result, in addition to the effects of reducing film peeling and high photoelectric conversion characteristics described above, crosstalk caused by carriers generated in the unit cell 120 moving laterally through the intermediate layer 132 can be reduced.

[0072] In the above example, titanium oxide is used as an example of the intermediate layer 132, but the same effect can be obtained even if the intermediate layer 132 is made of other oxide semiconductors such as zinc oxide. The degree of oxidation can be determined using the results of surface analysis by XPS, the results of measurement of volume resistivity, and the like. When the results of surface analysis by XPS are used, for example, the area ratio of peaks derived from low valence components can be used as an indicator of the degree of oxidation. Although the oxygen mixture ratios of 0% and 5% are exemplified as the film formation conditions of the first portion 132A and the second portion 132B of the intermediate layer 132, this is merely an example. As long as the condition that the oxidation degree of the second portion 132B is higher than the oxidation degree of the first portion 132A is satisfied, the effect of reducing crosstalk can be obtained compared to the case where the oxidation degree of the intermediate layer 132 is uniform.

[0073] [Second embodiment] 7 is a schematic cross-sectional view of a semiconductor device according to the second embodiment. The difference between the second embodiment and the first embodiment is that a part of the second portion 132B of the intermediate layer 132 is disposed on the first portion 132A. The following description will mainly focus on the differences from the first embodiment, and descriptions of parts common to the first embodiment may be omitted.

[0074] The first portion 132A of the intermediate layer 132 is disposed in a convex shape on the lower electrode 131. The second portion 132B of the intermediate layer 132 extends from above the separation region 130 to above the first portion 132A so as to cover the convex first portion 132A. In this shape, it is not necessary to make the film thicknesses of the first portion 132A and the second portion 132B close to each other as in the first embodiment.

[0075] Therefore, by making the first portion 132A sufficiently thicker than the roughness (unevenness) of the surface of the lower electrode 131, defects in the first portion 132A caused by the roughness can be reduced. Also, the film thickness of the second portion 132B can be thinned to the extent that the insulating layer 112 is not exposed. This increases the resistance between the multiple lower electrodes 131, inhibiting the movement of carriers, thereby further reducing crosstalk. Also, since the intermediate layer 132 is convex, the contact area between the intermediate layer 132 and the functional layer 133 increases, further improving adhesion. The total film thickness of the first portion 132A and the second portion 132B of the intermediate layer 132 may be about 1 nm to 100 nm. Also, in order to fully obtain the above-mentioned effect, it is preferable that the film thickness of the second portion 132B of the intermediate layer 132 is smaller than the film thickness of the first portion 132A.

[0076] [Third embodiment] 8 is a schematic cross-sectional view of a semiconductor device according to the third embodiment. The present embodiment differs from the first embodiment in that a part of the second portion 132B of the intermediate layer 132 is disposed between the lower electrode 131 and the first portion 132A. The following description will mainly focus on the differences from the first embodiment, and descriptions of parts common to the first embodiment may be omitted.

[0077] The second portion 132B of the intermediate layer 132 extends from above the separation region 130 to above the lower electrode 131. The first portion 132A of the intermediate layer 132 is disposed on the second portion 132B of the intermediate layer 132 that is on the lower electrode 131. In this shape, it is not necessary to make the film thicknesses of the first portion 132A and the second portion 132B close to each other as in the first embodiment.

[0078] In this embodiment, as in the second embodiment, the film thickness of the second portion 132B can be made thin to the extent that the insulating layer 112 is not exposed. This increases the resistance between the multiple lower electrodes 131, inhibiting the movement of carriers, thereby further reducing crosstalk. Furthermore, by making the first portion 132A sufficiently thick, the total film thickness of the intermediate layer 132 on the lower electrode 131 can be increased, and defects in the first portion 132A caused by the roughness of the surface of the lower electrode 131 can be reduced. Furthermore, since the intermediate layer 132 is convex, the contact area between the intermediate layer 132 and the functional layer 133 is increased, and the adhesion is further improved. The total film thickness of the first portion 132A and the second portion 132B of the intermediate layer 132 may be about 1 nm to 100 nm. Furthermore, in order to fully obtain the above-mentioned effect, it is preferable that the film thickness of the second portion 132B of the intermediate layer 132 is smaller than the film thickness of the first portion 132A.

[0079] [Fourth embodiment] 9 is a schematic cross-sectional view of a semiconductor device according to the fourth embodiment. The present embodiment differs from the first embodiment in that the upper surface of the lower electrode 131 is located above the upper surface of the insulating layer 112. The following description will mainly focus on the differences from the first embodiment, and descriptions of parts common to the first embodiment may be omitted.

[0080] The lower electrode 131 is disposed on the insulating layer 112 and the via plug 111. In this embodiment, the process of forming the insulating layer 112 after the formation of the lower electrode 131 and the planarization process for matching the upper surface of the lower electrode 131 with the upper surface of the insulating layer 112 are omitted. As a result, in this embodiment, the upper surface of the lower electrode 131 is located above the upper surface of the insulating layer 112. A first portion 132A of the intermediate layer 132 is formed on the upper surface and side surface of the lower electrode 131. A second portion 132B of the intermediate layer 132 is formed on the separation region 130 between the multiple lower electrodes 131. In this embodiment, as in the second and third embodiments, the intermediate layer 132 is convex, so that the contact area between the intermediate layer 132 and the functional layer 133 is increased, and the adhesion is further improved.

[0081] [Fifth embodiment] 10 is a schematic cross-sectional view of a semiconductor device according to the fifth embodiment. The present embodiment differs from the first embodiment in that a first portion 132A of an intermediate layer 132 is formed by surface oxidation of a lower electrode 131. The following description will be centered mainly on the differences from the first embodiment, and a description of parts common to the first embodiment may be omitted.

[0082] The first portion 132A of the intermediate layer 132 is disposed on the lower electrode 131. The second portion 132B of the intermediate layer 132 extends from above the separation region 130 to above the first portion 132A so as to cover the first portion 132A. The first portion 132A of the intermediate layer 132 is formed by oxidizing the surface of the lower electrode 131. In other words, the first portion 132A of the intermediate layer 132 includes an oxide of the material that constitutes the lower electrode 131.

[0083] For example, when the material of the lower electrode 131 is titanium nitride (TiN), the first portion 132A of the intermediate layer 132 can be formed by oxidizing the surface of the lower electrode 131 by an oxidation process such as plasma oxidation in an oxygen atmosphere. In this case, the material of the first portion 132A of the intermediate layer 132 is titanium oxynitride (TiON). The oxynitride film is a titanium oxide film with a low oxidation number, and therefore has a low degree of oxidation.

[0084] By using the oxidation process as described above, the first portion 132A of the intermediate layer 132 becomes a conformal film compared to the case where it is formed by sputtering as in the first embodiment. This makes it possible to reduce defects in the first portion 132A caused by roughness. In addition, by using the oxidation process, the first portion 132A of the intermediate layer 132 can be formed in a self-aligned manner on the lower electrode 131, making it possible to omit an additional patterning step. The manufacturing process is simplified.

[0085] [Sixth embodiment] The semiconductor device according to the first to fifth embodiments described above can be used in a photoelectric conversion element that outputs a signal according to incident light by photoelectric conversion. The photoelectric conversion element can be used, for example, in a light receiving element that detects light. The light receiving element has a photoelectric conversion element including the semiconductor device according to the first to fifth embodiments described above, a readout circuit that reads out a signal according to the charge generated by the photoelectric conversion element, and a signal processing circuit that processes the signal output from the readout circuit.

[0086] The above-mentioned photoelectric conversion element may be used in an imaging system that generates an image according to incident light. The imaging system includes an optical system having a plurality of lenses and an imaging device that receives light that has passed through the optical system. The imaging device includes the above-mentioned photoelectric conversion element. The imaging system may specifically be a digital still camera or a digital video camera. Devices that include photoelectric conversion elements such as the above-mentioned light receiving elements and imaging systems are sometimes collectively called photoelectric conversion devices.

[0087] An example of the configuration of an imaging system according to the sixth embodiment of the present invention will be described below. Fig. 11 is a diagram showing an example of the configuration of an imaging system 500 according to this embodiment. The imaging system 500 includes an imaging device 530, an imaging optical system 502, a CPU 510, a lens control unit 512, an imaging device control unit 514, an image processing unit 516, an aperture shutter control unit 518, a display unit 520, an operation switch 522, and a recording medium 524.

[0088] The imaging optical system 502 is an optical system for forming an optical image of a subject by guiding incident light to the imaging device 530, and includes a lens group, an aperture 504, etc. The aperture 504 has a function of adjusting the amount of light during shooting by adjusting its opening diameter, and also has a function as a shutter for adjusting exposure time during still image shooting. The lens group and the aperture 504 are held so as to be movable forward and backward along the optical axis direction, and their linked operations realize a variable magnification function (zoom function) and a focus adjustment function. The imaging optical system 502 may be integrated into the imaging system 500, or may be an imaging lens that can be attached to the imaging system 500.

[0089] An imaging device 530 is disposed in the image space of the imaging optical system 502. The imaging device 530 is configured to include a CMOS sensor (pixel section) including the semiconductor device according to the first to fifth embodiments described above, and its peripheral circuit (peripheral circuit region). The imaging device 530 has a structure in which a plurality of unit cells 120 are arranged two-dimensionally. Each of the plurality of unit cells 120 has a color filter of a predetermined color. This allows the imaging device 530 to configure a two-dimensional single-plate color sensor. The imaging device 530 photoelectrically converts the subject image formed by the imaging optical system 502, and outputs it as an image signal or a focus detection signal.

[0090] The lens control unit 512 controls the forward and backward movement of the lens group of the imaging optical system 502 to perform variable magnification and focus adjustment. The lens control unit 512 is composed of a circuit and a processing device configured to realize these functions. The aperture / shutter control unit 518 adjusts the amount of photographing light by changing the aperture diameter (aperture value) of the aperture 504. The lens control unit 512 and the aperture / shutter control unit 518 are composed of a circuit or a processing device configured to realize these functions.

[0091] The CPU 510 is a control device within the camera that handles various controls of the camera body, and includes an arithmetic unit, a ROM, a RAM, an A / D converter, a D / A converter, a communication interface circuit, etc. The CPU 510 controls the operation of each unit within the camera in accordance with a computer program stored in the ROM or the like, and executes a series of photographing operations such as AF, imaging, image processing, and recording. The AF operation that the CPU 510 can execute includes detection of the focus state of the imaging optical system 502 (focus detection). The CPU 510 can also function as a signal processing unit.

[0092] The imaging device control section 514 is for controlling the operation of the imaging device 530, and for A / D converting a signal output from the imaging device 530 and transmitting it to the CPU 510. The imaging device control section 514 is constituted by a circuit or a control device configured to realize these functions. The A / D conversion function may be provided in the imaging device 530, instead of in the imaging device control section 514. The image processing section 516 is for performing image processing such as gamma conversion and color interpolation on the A / D converted signal to generate an image signal.

[0093] The image processing unit 516 is composed of a circuit or a control device configured to realize these functions. The display unit 520 is a display device such as a liquid crystal display (LCD), and displays information about the shooting mode of the camera, a preview image before shooting, a confirmation image after shooting, a focus state at the time of focus detection, etc. The operation switches 522 include a power switch, a release (shooting trigger) switch, a zoom operation switch, a shooting mode selection switch, etc. The recording medium 524 is for recording shot images, etc. The recording medium 524 may be built into the imaging system 500, or may be a removable one such as a memory card.

[0094] As described above, according to this embodiment, a high-performance imaging system 500 can be realized by applying the semiconductor device according to the first to fifth embodiments.

[0095] [Seventh embodiment] The semiconductor device according to the first to fifth embodiments described above may be used in a moving object. The moving object has a main body provided with a photoelectric conversion element including the semiconductor device according to the first to fifth embodiments described above, and a moving means for moving the main body. Specific examples of the moving object include automobiles, aircraft, ships, drones, etc. The photoelectric conversion element can capture an image of the surroundings of the main body. The captured image can be used to support the operation of the moving object. The main body may be made of materials such as metal and carbon fiber. The carbon fiber may be, for example, polycarbonate. Specific examples of the moving means include tires, a magnetic levitation device, and a mechanism for vaporizing and spraying fuel.

[0096] FIG. 12(a) and FIG. 12(b) are diagrams showing an example of the configuration of an imaging system and a moving body according to the present embodiment. FIG. 12(a) shows an example of an imaging system 400 related to an in-vehicle camera. The imaging system 400 includes an imaging device 410, an image processing unit 412, a parallax acquisition unit 414, a distance acquisition unit 416, and a collision determination unit 418. The imaging device 410 includes the semiconductor device according to the first to fifth embodiments described above, and generates image data according to incident light. The image processing unit 412 is a processing device that performs image processing on a plurality of image data acquired by the imaging device 410. The parallax acquisition unit 414 is a processing device that calculates parallax (phase difference of parallax images) from a plurality of image data acquired by the imaging device 410. The distance acquisition unit 416 is a processing device that calculates a distance to an object based on the calculated parallax. The collision determination unit 418 is a processing device that determines whether or not there is a possibility of a collision based on the calculated distance. Here, the parallax acquisition unit 414 and the distance acquisition unit 416 are an example of an information acquisition unit that acquires information such as distance information to an object. That is, the distance information is information related to the parallax, the defocus amount, the distance to the object, and the like.

[0097] The collision determination unit 418 may determine the possibility of a collision using any of these pieces of distance information. The above-mentioned various processing devices may be realized by dedicated hardware, or may be realized by general-purpose hardware that performs calculations based on software modules. The processing devices may also be realized by FPGAs (Field Programmable Gate Arrays), ASICs (Application Specific Integrated Circuits), or the like. The processing devices may also be realized by a combination of these.

[0098] The imaging system 400 is connected to a vehicle information acquisition device 420, and can acquire vehicle information such as vehicle speed, yaw rate, and steering angle. The imaging system 400 is also connected to a control ECU 430, which is a control device that outputs a control signal to generate a braking force for the vehicle based on the judgment result of the collision judgment unit 418. That is, the control ECU 430 is an example of a moving body control means that controls a moving body based on distance information. The imaging system 400 is also connected to an alarm device 440 that issues an alarm to the driver based on the judgment result of the collision judgment unit 418. For example, when the collision judgment unit 418 outputs a judgment result indicating that a collision is highly likely, the control ECU 430 performs vehicle control to avoid a collision and reduce damage by applying the brakes, releasing the accelerator, suppressing engine output, etc. The alarm device 440 warns the user by sounding an alarm, displaying alarm information on the screen of a car navigation system, etc., and vibrating a seat belt, steering wheel, etc.

[0099] In this embodiment, the surroundings of the vehicle, for example, the front or rear, are captured by the imaging system 400. Fig. 12(b) shows the configuration of the imaging system 400 when capturing an image of the area in front of the vehicle (imaging range 450). The vehicle information acquisition device 420 sends an instruction to the imaging system 400 to perform imaging.

[0100] As described above, according to this embodiment, by applying the semiconductor device according to the first to fifth embodiments, it is possible to realize an imaging system and a moving object with improved accuracy in distance measurement.

[0101] In the above description, an example of control to avoid collision with other vehicles has been described, but the configuration of this embodiment can also be applied to control to automatically drive following other vehicles, control to automatically drive not to go out of a lane, etc. Furthermore, the imaging system 400 is not limited to vehicles such as automobiles, but can also be applied to moving bodies (transportation equipment) such as ships, aircraft, industrial robots, etc. The moving devices in moving bodies (transportation equipment) are various types of moving means such as engines, motors, wheels, propellers, etc. Furthermore, the imaging system 400 of this embodiment can also be applied to devices that use object recognition widely, such as intelligent transport systems (ITS), and not limited to moving bodies.

[0102] [Modified embodiment] The present invention is not limited to the above-described embodiments, and various modifications are possible. For example, a form in which a part of the configuration of any of the embodiments is added to another embodiment, or a form in which a part of the configuration of another embodiment is replaced with the other embodiment is also an embodiment of the present invention.

[0103] Furthermore, the imaging systems shown in the above-described embodiments are examples of imaging systems to which the semiconductor device of the present invention can be applied, and imaging systems to which the semiconductor device of the present invention can be applied are not limited to the configurations shown in Figures 11, 12(a) and 12(b).

[0104] It should be noted that the above-mentioned embodiments are merely examples of the implementation of the present invention, and the technical scope of the present invention should not be interpreted as being limited by these embodiments. In other words, the present invention can be implemented in various forms without departing from its technical concept or main features.

[0105] The present invention can also be realized by a process in which a program for implementing one or more of the functions of the above-described embodiments is supplied to a system or device via a network or a storage medium, and one or more processors in a computer of the system or device read and execute the program. The present invention can also be realized by a circuit (e.g., ASIC) for implementing one or more of the functions. [Explanation of symbols]

[0106] 100 substrates 130 Separation Field 131 Lower electrode 132 Middle Layer 132A Part 1 132B Part 2 133 Functional Layer 134 Upper electrode

Claims

1. A substrate; a plurality of first electrodes disposed on the substrate with gaps between them; a first intermediate layer disposed on each of the plurality of first electrodes; a second intermediate layer, at least a portion of which is disposed on the gaps between the first electrodes and on the entire surface between the first intermediate layers; a photoelectric conversion layer disposed on the first intermediate layer and on the second intermediate layer; A second electrode disposed on the photoelectric conversion layer; having the first intermediate layer and the second intermediate layer are carrier injection blocking layers, The molar content of oxygen in the second intermediate layer is higher than the molar content of oxygen in the first intermediate layer, and the thickness of the second intermediate layer is smaller than the thickness of the first intermediate layer. A semiconductor device comprising:

2. A portion of the second intermediate layer is disposed so as to cover the entire upper surface and side surfaces of the first intermediate layer.

2. The semiconductor device according to claim 1,

3. A part of the second intermediate layer is disposed over the entire area between each of the plurality of first electrodes and the first intermediate layer.

2. The semiconductor device according to claim 1,

4. The semiconductor device further includes an insulating layer disposed in the gaps between the first electrodes.

4. The semiconductor device according to claim 1, wherein the first insulating layer is a first insulating layer.

5. the lower surfaces of the first electrodes and the lower surface of the second intermediate layer are on the same line; The semiconductor device further includes an insulating layer disposed under the first electrodes.

2. The semiconductor device according to claim 1,

6. The second intermediate layer is disposed on the first intermediate layer, and an upper surface of each of the plurality of first electrodes is in contact with a lower surface of the first intermediate layer.

5. The semiconductor device according to claim 4.

7. The first intermediate layer contains an oxide of the material that constitutes the first electrode.

7. The semiconductor device according to claim 1, wherein the first insulating layer is a conductive layer.

8. In a plan view, an outer edge of the first intermediate layer is located outside an outer edge of the first electrode.

8. The semiconductor device according to claim 1, wherein the first insulating layer is a conductive layer.

9. At least one of the first intermediate layer and the second intermediate layer is an N-type wide gap semiconductor.

9. The semiconductor device according to claim 1, wherein the first insulating layer is a conductive layer.

10. At least one of the first intermediate layer and the second intermediate layer contains at least one of titanium oxide and zinc oxide.

10. The semiconductor device according to claim 1, wherein the first insulating layer is a conductive layer.

11. A semiconductor device having a first lower electrode, a second lower electrode, a second electrode, and a photoelectric conversion layer disposed between the first lower electrode and the second electrode, and having an insulating layer between the first lower electrode and the second lower electrode in a plan view, a carrier injection blocking layer including a first metal and a second metal that is the same as the first metal and has a higher oxidation number than the first metal, in a region between the first lower electrode, the second lower electrode, and the insulating layer, and the photoelectric conversion layer; a molar ratio of the first metal to the sum of the first metal and the second metal in a portion of a region overlapping with the first lower electrode in a plan view is greater than a molar ratio of the first metal to the sum of the first metal and the second metal in a portion of a region overlapping with the insulating layer between the first lower electrode and the second lower electrode in a plan view; In a plan view, an oxygen mixing ratio in a region overlapping with the first lower electrode is smaller than an oxygen mixing ratio in a region overlapping with the insulating layer between the first lower electrode and the second lower electrode. A semiconductor device comprising:

12. The first metal and the second metal are Ti.

12. The semiconductor device according to claim 11.

13. The photoelectric conversion layer includes quantum dots.

13. The semiconductor device according to claim 1, wherein the first insulating layer is a conductive layer.

14. The photoelectric conversion layer includes nanoparticles including at least one of PbS, PbSe, PbTe, InP, InAs, CdS, CdSe, and CdTe.

14. The semiconductor device according to claim 13.

15. The nanoparticles have at least one of 1,4-benzenedithiol and 1,3-benzenedithiol on the surface thereof.

15. The semiconductor device according to claim 14.

16. The nanoparticles have at least one of chlorine, bromine, and iodine on the surface thereof.

16. The semiconductor device according to claim 14, wherein the first and second electrodes are electrically connected to each other.

17. A semiconductor device according to any one of claims 1 to 16, an optical system for guiding incident light to the semiconductor device; A photoelectric conversion device comprising:

18. The main body, 17. The semiconductor device according to claim 1, further comprising: a semiconductor device provided on the body; A moving means for moving the main body; A moving object comprising:

Images