Photosensitive resin composition, partition structure for color-converting pixels produced using the same, and display device including the same

Abstract

To provide a partition-forming photosensitive resin composition which allows for easily forming a forward taper when forming partitions and efficiently blocking blue light to improve color conversion characteristics of color conversion pixels.SOLUTION: The present invention provides a partition-forming photosensitive resin composition comprising a colorant (A), alkali-soluble resin (B), photopolymerizable compound (C), photopolymerization initiator (D), and solvent (E), the colorant (A) containing one, or two or more pigments selected from a group consisting of the C.I.Pigment red, C.I.Pigment yellow, and C.I.Pigment orange. A color conversion pixel partition structure produced using the photosensitive resin composition, and a display device having the same are also provided.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present invention relates to a photosensitive resin composition for forming a partition wall, a partition wall structure for color-converting pixels produced using the same, and a display device including the same. [Background technology]

[0002] Usually, a display device including a color conversion panel using a blue light source has a light blocking characteristic for the blue light used as a light source, and in order to prevent color mixing of each color conversion pixel, a partition wall is formed between each color conversion pixel. In this case, for the conversion efficiency of the color conversion pixels, the partition wall between each color conversion pixel is formed with a film thickness of about 7 μm to 15 μm.

[0003] Conventionally used photosensitive resin compositions for black matrices have no problem in forming patterns when the film thickness is 1 μm to 1.5 μm as in the past. However, the partition walls of color conversion pixels must be formed to a film thickness of 7 μm to 15 μm. When thick partition walls are formed using conventionally used black matrices, it is difficult to form a forward tapered cured film due to a decrease in the transmittance of ultraviolet light in the exposure process, and not only does a reverse taper occur, but the line width of the pattern changes significantly depending on the development time in the development process. In the same area, if the line width of the partition walls of the color conversion pixels is large, the size of the color conversion pixels decreases, resulting in a problem of reduced color conversion performance.

[0004] In addition, when a photosensitive resin composition for black matrix is ​​used to manufacture the partition wall of the color conversion pixel, it is difficult to form the pattern at an accurate position because it is difficult to recognize the alignment key at the bottom when aligning the mask pattern in the exposure process after the coating process. Therefore, the photosensitive resin composition for black matrix that has been used conventionally as a material for forming the partition wall of the color conversion pixel has limitations.

[0005] In addition, after the barrier ribs of the color conversion pixels are manufactured, a thermal process is performed in a subsequent process. If the reliability of the barrier ribs is low, gas may be generated inside the barrier ribs during the thermal process performed after the barrier ribs are manufactured, which may shorten the life of the color conversion pixels.

[0006] Meanwhile, in the prior art, a colored pattern is produced using organic pigments to produce a color filter, in which case CI red pigment (CI Pigment Red) to CI orange pigment (CI Pigment Orange) are used for a pattern in which red is desired, and CI green pigment (CI Pigment Green) to CI yellow pigment (CI Pigment Yellow) are used for a pattern in which green is desired, in order to realize each desired hue.

[0007] Generally, the color filter coating film is manufactured to have a thickness of 2 μm to 3 μm, which differs from the manufacturing technique for the partition walls of the color conversion pixels, which are manufactured to have a thickness of 7 μm to 15 μm, as described above.

[0008] Also, from an optical point of view, color filters are intended to achieve a specific hue on the color coordinate system, and characteristics such as brightness and light-to-dark ratio are important, whereas color conversion pixel partitions are a display device technology manufactured by combining a display including a color conversion panel and a blue light source.

[0009] Korean Patent Publication No. 10-2007-0094460 aims to provide a photosensitive resin composition for forming partition walls that has excellent shape stability against heat, but the above-mentioned problems have not yet been overcome. [Prior art documents] [Patent documents]

[0010] [Patent Document 1] Korean Patent Publication No. 10-2007-0094460 Summary of the Invention [Problem to be solved by the invention]

[0011] The present invention has been made to improve the problems of the conventional art as described above, and has an object to provide a photosensitive resin composition for forming partition walls, which prevents the formation of a reverse taper and easily forms a forward taper when producing a cured film having a thickness of 7 μm to 15 μm, and which can efficiently block bluish light and improve the color conversion characteristics of color conversion pixels.

[0012] Another object of the present invention is to provide a photosensitive resin composition which causes little change in line width of a pattern due to development time in a development step.

[0013] It is yet another object of the present invention to provide a photosensitive resin composition which can suppress gas generation during a thermal process after the production of partition walls and can produce highly reliable partition walls.

[0014] Another object of the present invention is to provide a partition structure for color-converting pixels produced using the above photosensitive resin composition, and a display device including a color-converting panel including the above partition structure. [Means for solving the problem]

[0015] The present invention provides a photosensitive resin composition for forming a partition wall, comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polymerizable compound, (D) a photopolymerization initiator, and (E) a solvent, wherein the (A) colorant comprises one or more pigments selected from the group consisting of CI red pigment (CI Pigment Red), CI yellow pigment (CI Pigment Yellow), and CI orange pigment (CI Pigment Orange).

[0016] The present invention also provides a partition structure for color-converting pixels, which is manufactured from the photosensitive resin composition.

[0017] The present invention further provides a display device including a color conversion panel including the color conversion pixel barrier structure. Effect of the Invention

[0018] The photosensitive resin composition for forming partition walls of the present invention prevents the formation of a reverse taper in a thick film after the formation of partition walls, easily forms a forward taper, and reduces changes in the line width of a pattern due to changes in the development time in a development step, thereby providing the effect of efficiently blocking blue light.

[0019] In addition, the photosensitive resin composition contains one or more colorants selected from the group consisting of red pigments, yellow pigments, and orange pigments, and thus the present invention can form a structure in which the line width of a pattern changes little depending on the development time in the development step.

[0020] In addition, the photosensitive resin composition may further include a white pigment as a colorant to impart red and / or green light reflection properties to the barrier rib structure, thereby minimizing color mixing between pixels and imparting light reflection properties toward the barrier rib, thereby improving light efficiency.

[0021] Furthermore, the partition structure manufactured from the photosensitive resin composition can maintain the performance of the color conversion pixel since the amount of gas generated from the partition is reduced by an additional heat process after the manufacture of the partition.

[0022] In addition, a barrier rib structure manufactured from the photosensitive resin composition can exhibit excellent characteristics in a display device including a color conversion panel using a blue light source. [Brief description of the drawings]

[0023] [Figure 1] FIG. 2 is a diagram showing the transmission spectra of cured films produced using the photosensitive resin compositions according to Example 2 and Comparative Example 1 of the present invention. [Diagram 2]1 shows photographs of cross sections of cured films produced using the photosensitive resin compositions of Examples 1, 2, and 14 of the present invention and Comparative Example 4 taken with a scanning electron microscope, and photographs of the minimum mask size that can be formed taken with an optical microscope. [Diagram 3] FIG. 2 is a diagram relating to the standard for measuring the taper angle of a cured film produced using the photosensitive resin composition of the present invention. [Figure 4] 1 is a transmission spectrum of a cured film produced using a photosensitive resin composition according to an embodiment of the present invention. [Diagram 5] 1 is a reflectance spectrum of a cured film produced using a photosensitive resin composition according to an embodiment of the present invention. [Figure 6] 1 is a diagram showing a structure of a color conversion panel including a partition structure for color conversion pixels according to the present invention; DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0024] The present invention provides a photosensitive resin composition for forming a partition wall, the photosensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polymerizable compound, (D) a photopolymerization initiator, and (E) a solvent, wherein the (A) colorant comprises one or more pigments selected from the group consisting of CI red pigment (CI Pigment Red), CI yellow pigment (CI Pigment Yellow), and CI orange pigment (CI Pigment Orange); a partition wall structure for a color-converting pixel produced from the photosensitive resin composition; and a display device including the same.

[0025] The cured film produced from the photosensitive resin composition may have a maximum transmittance of less than 5% at a wavelength of 450 nm or more and 470 nm or less, and an average transmittance of more than 25% at a wavelength of 640 nm or more and 680 nm or less, preferably a maximum transmittance of less than 4% at a wavelength of 450 nm or more and 470 nm or less, and an average transmittance of more than 30% at a wavelength of 640 nm or more and 680 nm or less, more preferably a maximum transmittance of less than 3% at a wavelength of 450 nm or more and 470 nm or less, and an average transmittance of more than 35% at a wavelength of 640 nm or more and 680 nm or less, and most preferably a maximum transmittance of less than 5% at a wavelength of 450 nm or more and 470 nm or less, and an average transmittance of more than 40% at a wavelength of 640 nm or more and 680 nm or less.

[0026] When the cured film satisfies the specific transmittance condition in the specific wavelength range described above, it can efficiently block blue light used as a light source on the rear surface. Therefore, in a display device using a blue light source and including the cured film as a partition structure, it is possible to provide a partition structure that exhibits excellent light blocking properties, is advantageous for forming a fine pattern, and has little change in line width of the pattern during a development process.

[0027] In addition, the cured film prepared from the photosensitive resin composition may further include a white pigment as a colorant in the photosensitive resin composition, thereby imparting a reflective property to red and / or green light to the barrier structure, thereby minimizing color mixing between pixels and imparting a reflective property to light directed toward the barrier, thereby improving light efficiency.

[0028] Specifically, when the thickness of the cured film is 7 μm to 15 μm, the reflectance may be 20% or more at a wavelength of 550 nm or more and 570 nm or less and a wavelength of 640 nm or more and 680 nm or less, more preferably, the reflectance may be 10% or less at a wavelength of 450 nm or more and 20% or more at a wavelength of 640 nm or more and 680 nm or less, and most preferably, the reflectance at a wavelength of 450 nm or more and 470 nm or less may be 50% or less of the reflectance at a wavelength of 640 nm or more and 680 nm or less.

[0029] When the cured film satisfies the specific reflectance condition in the specific wavelength range described above, the light generated from the color conversion element and traveling toward the partition wall is reflected, thereby improving the brightness.

[0030] The photosensitive resin composition of the present invention contains one or more colorants selected from the group consisting of CI red pigment (CI Pigment Red), CI yellow pigment (CI Pigment Yellow), and CI orange pigment (CI Pigment Orange) as the colorant, and can efficiently block light from a light source when a partition structure is formed.

[0031] In addition, the photosensitive resin composition according to the present invention may further include a white pigment as a colorant, thereby maximizing the reflective properties of the barrier rib structure with respect to red and / or green light, thereby improving light efficiency.

[0032] A display device including a color conversion panel uses quantum dots for color conversion pixels, and these quantum dots convert blue (high energy) light into green (low energy) to red (low energy) light energy to realize an image, and the partition structure used in this case has a very important technical purpose in that it blocks the interference of the blue light source used as a light source between pixels and prevents color mixing of blue, green, and red pixels generated in each pixel. Therefore, it is technically different from a color filter that realizes colors by transmitting light of a specific wavelength using a white light source.

[0033] In addition, the barrier rib structure according to the prior art is generally formed in black, but the thickness of 7 μm to 15 μm, instead of the commonly used thickness of 1 μm to 2 μm, is too thick, and the ultraviolet transmittance is reduced in the exposure process, so that photocuring cannot be induced to the deep part. If photocuring is not performed deep in the coating film, a problem occurs in that the line width of the pattern changes depending on the development time in the development process, or in some cases, the lower end of the pattern is developed in its entirety and the pattern is washed away. Therefore, if a problem occurs in photocuring in the exposure process, it is difficult to form a forward tapered cured film, and there is a problem that a reverse tapered film is generated. Therefore, there is a limit to the use of black photosensitive resin compositions such as conventional photosensitive resin compositions for black matrices as a material for forming a barrier rib structure.

[0034] The photosensitive resin composition according to the present invention has an advantage that it is easy to form a forward taper since it forms a red partition structure and prevents the formation of a reverse taper when a thick, cured film is formed later.

[0035] The present invention will be described in detail below. <Photosensitive resin composition for forming partition walls> The photosensitive resin composition for forming partition walls according to the present invention contains (A) a colorant, (B) an alkali-soluble resin, (C) a polymerizable compound, and (D) a photopolymerization initiator, and may further contain (E) a solvent.

[0036] The partition walls formed from the photosensitive resin composition of the present invention have a taper angle of less than 90°.

[0037] The photosensitive resin composition according to the present invention is characterized in that it is used for forming partition walls of color conversion pixels that use a blue light source.

[0038] (A) Colorant The (A) colorant preferably contains one or more pigments selected from the group consisting of CI red pigment (CI Pigment Red), CI yellow pigment (CI Pigment Yellow), and CI orange pigment (CI Pigment Orange), more preferably contains a white pigment, and may further contain a dye as necessary.

[0039] In one embodiment, the colorant may include one or more pigments selected from the group consisting of CI red pigment (CI Pigment Red), CI yellow pigment (CI Pigment Yellow), and CI orange pigment (CI Pigment Orange) as a first pigment, and thus the partition structure for color-converting pixels manufactured from the photosensitive resin composition according to the present invention may be formed in a red color. The partition structure for color-converting pixels in a red color absorbs blue light and transmits red light, and therefore exhibits excellent light-shielding properties and improves light-emitting properties in a display device using a blue light source.

[0040] Preferably, the CI red pigment (CI Pigment Red) is one or more selected from diketopyrrole-based, anthraquinone-based, perylene-based, and azo-based pigments, the CI yellow pigment (CI Pigment Yellow) is one or more selected from anthraquinone-based, isoindolinone-based, and azo-based pigments, and the CI orange pigment (CI Pigment Orange) may be one or more selected from quinophthalone-based, isoindolinone-based, and diketopyrrole-based pigments.

[0041] More preferably, the CI Red pigment is one or more selected from the group consisting of CI Red Pigment 9, 97, 81, 105, 122, 123, 144, 149, 150, 155, 166, 168, 171, 175, 176, 177, 179, 180, 185, 192, 202, 208, 209, 214, 215, 216, 220, 222, 224, 242, 254, 255, 264, 269, 270, and 272, and the CI Yellow pigment is one or more selected from the group consisting of CI Yellow Pigment 11, 13, 20, 24, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 85, 86, 87, 88, 89, 90, 91, 92, 93, 94, 95, 96, 97, 98, 99, 100, 105, 1 53, 83, 86, 93, 94, 95, 99, 108, 109, 110, 117, 125, 128, 129, 138, 139, 147, 148, 150, 151, 154, 155, 166, 167, 173, 180, 185, and 199, and the CI Orange pigment may be one or more selected from the group consisting of CI Orange pigments 13, 15, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, and 71.

[0042] Most preferably, the CI Red pigment is one or more selected from the group consisting of CI Red Pigment 179, 254, 264, and 269; the CI Yellow pigment is one or more selected from the group consisting of CI Yellow Pigment 138, 139, 150, and 185; and the CI Orange pigment may be one or more selected from the group consisting of CI Orange Pigment 64 and 71.

[0043] The content of the colorant may be 0.5 to 30% by weight, preferably 2.7 to 30% by weight, based on the total weight of the solid content in the photosensitive resin composition. When the content of the colorant is within the above range, the light blocking property for blue light is improved, and the light emitting property of the display device can be improved.

[0044] In addition, the first pigment in the colorant is preferably contained in an amount of 2.7 to 20 wt % based on the total weight of the solid content in the photosensitive resin composition. Specifically, if the content of the first pigment is less than the above range, when the thickness of the cured film produced from the photosensitive resin composition is 7 μm to 15 μm, the maximum transmittance exceeds 5% at a wavelength of 450 nm to 470 nm, and the light-shielding property and light-emitting property of a display device using a blue light source may be deteriorated, and if the content of the first pigment exceeds the above range, there is a problem that an inverse taper occurs, and there is a limit to its use as a material for forming partition walls.

[0045] In addition, the colorant preferably further includes a white pigment as a second pigment in addition to one or more first pigments selected from the group consisting of CI red pigment, CI yellow pigment, and CI orange pigment. For example, the white pigment may include titanium oxide (TiO2).

[0046] Moreover, the colorant preferably contains a first pigment and a second pigment (white pigment) in a weight ratio of 1:0.5 to 1:2. When the weight ratio is within the range, it can be adjusted to satisfy specific conditions of absorptance and reflectance in a specific wavelength range.

[0047] The white pigment is for the reflection characteristics of the barrier rib structure, specifically, it can improve the reflectance of the barrier rib structure for red wavelengths and can improve brightness by reflecting light in a specific wavelength range toward the barrier rib among the light generated from the color conversion element. Specifically, when the white pigment is added, the reflectance may be 20% or less, more preferably 10% or less, at a wavelength of 450 nm to 470 nm. The reflectance may be 20% or more at a wavelength of 640 nm to 680 nm, and most preferably, the reflectance at a wavelength of 450 nm to 470 nm may be 50% or less of the reflectance at a wavelength of 640 nm to 680 nm.

[0048] The white pigment preferably has an average particle size of 150 nm to 300 nm. If the average particle size is less than 150 nm, there is a problem of weakened reflective properties in the visible light region of 380 nm to 780 nm, while if the average particle size exceeds 300 nm, there is a problem of poor dispersibility and storage stability.

[0049] As the white pigment, a white pigment (CI Pigment White) known in this field may be used as long as it satisfies the above-mentioned conditions. In one or more embodiments, CI white pigments 4, 5, 6, 6:1, 7, 18, 18:1, 19, 20, 22, 25, 26, 27, 28, 32, etc. may be used, and from the viewpoints of reflection efficiency and whiteness, CI white pigment 6 or 22 is preferred, and CI white pigment 6 is more preferred. These may be used alone or in combination of two or more kinds.

[0050] Titanium oxide (TiO2) contained in CI white pigment 6 is inexpensive and has a high refractive index and excellent reflectance, so it can be used as an effective white colorant, and from the standpoint of whiteness, it is preferable that it has a rutile structure.

[0051] The white pigment, titanium oxide (TiO2), may be subjected, as necessary, to a resin treatment, a surface treatment using a pigment derivative having an acidic or basic group introduced therein, a grafting treatment onto the pigment surface using a polymer compound or the like, a micronization treatment using a sulfuric acid micronization method or the like, a washing treatment using an organic solvent or water to remove impurities, or a treatment to remove ionic impurities using an ion exchange method or the like.

[0052] The titanium oxide (TiO2) may be surface-treated with one or more selected from the group consisting of silicon oxide (SiO2), aluminum oxide (Al2O3), zirconium oxide (ZrO2), and organic substances, preferably with silicon oxide (SiO2), aluminum oxide (Al2O3), and zirconium oxide (ZrO2) in that order, and more preferably with the outermost surface of the surface-treated titanium oxide (TiO2) surface-treated with an organic substance. The organic substance is not particularly limited as long as it is a substance that reduces the energy required for dispersing titanium oxide (TiO2) and prevents titanium oxide (TiO2) from being compressed and agglomerated by coating titanium oxide (TiO2) with a monomolecular layer of low polarity for surface treatment, and in one or more embodiments, stearic acid, trimethylpropane (TMP), pentaerythritol, etc. may be used.

[0053] By performing the surface treatment of titanium oxide (TiO2) as described above, the photocatalytic activity of titanium oxide (TiO2) can be reduced and the reflective brightness characteristics can be improved, and in particular, according to a preferred embodiment of the surface treatment, there is an advantage in that reliability such as heat resistance and chemical resistance is improved. The surface treatment may be a treatment by encapsulation.

[0054] The content of the titanium oxide (TiO2) core contained in the surface-treated titanium oxide (TiO2) is preferably 85 to 95% by weight based on the total weight of the surface-treated titanium oxide (TiO2). When the surface of the titanium oxide (TiO2) core is treated within the above range, the titanium oxide (TiO2) exhibits excellent whiteness and reflective brightness.

[0055] Commercially available titanium oxide (TiO2) products that can be used include DuPont's "R-101", "R-102", "R-103", "R-104", "R-105", "R-350", "R-706", "R-794", "R-796", "TS-6200", "R-900", "R-902", "R-902+", "R-906", "R-931", "R-960", and "R-6200", Huntsman's "R-FC5", "TR81", and "TR88", and ISK's "CR-57", etc.

[0056] The present invention is also characterized in that it can have an effect of efficiently blocking blue light even without including a black colorant. Therefore, the colorant of the present invention preferably does not include a black colorant, but may contain up to 20% by weight based on the total weight of the colorant as necessary. If the colorant contains an excessive amount of the black colorant, it is not preferable because insufficient curing in the deep part may cause an inverse taper, and the light emitting efficiency of the display may decrease due to a decrease in reflectance. Specifically, the black colorant may include black organic / inorganic pigments and dyes such as carbon black, titanium black, aniline black, lactam black, and perylene black, and may be understood as a concept including a combination that contains multiple colorants and can exhibit black color.

[0057] It is preferable to use a pigment dispersion in which the pigment particles are uniformly dispersed as the pigment. Examples of a method for uniformly dispersing the pigment particles include a method in which a pigment dispersant is added to the pigment and a dispersion treatment is performed. By using the method, a pigment dispersion in which the pigment particles are uniformly dispersed in the solution can be obtained.

[0058] The pigment dispersant is added to deflocculate the pigment and maintain its stability, and any dispersant commonly used in the art can be used without limitation. Specific examples of the pigment dispersant include surfactants such as cationic, anionic, nonionic, amphoteric, polyester, and polyamine surfactants, which may be used alone or in combination of two or more.

[0059] The pigment dispersant preferably contains an acrylate-based dispersant containing butyl methacrylate (BMA) or N,N-dimethylaminoethyl methacrylate (DMAEMA), and other resin-type pigment dispersants may be used in addition to the acrylate-based dispersants. The resin-type pigment dispersants may be used alone or in combination with two or more of the acrylate-based dispersants.

[0060] In the present invention, the total weight of the solid content in the photosensitive resin composition means the total weight of the remaining components excluding the solvent in the photosensitive resin composition.

[0061] (B) Alkali-soluble resin The alkali-soluble resin can be selected from resins known in this field without any particular limitation, so long as it has reactivity due to the action of light or heat, is alkali-soluble, acts as a dispersion medium for solids including the colorant, and functions as a binder resin.

[0062] Specifically, the alkali-soluble resin is preferably a copolymer of an unsaturated carboxyl group-containing monomer and another monomer copolymerizable therewith.

[0063] Examples of the unsaturated carboxyl group-containing monomer include unsaturated carboxylic acids having one or more carboxyl groups in the molecule, such as unsaturated monocarboxylic acids, unsaturated dicarboxylic acids, and unsaturated polycarboxylic acids.

[0064] Examples of the unsaturated monocarboxylic acid include acrylic acid, methacrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid.

[0065] Examples of the unsaturated dicarboxylic acid include maleic acid, fumaric acid, itaconic acid, citraconic acid, and mesaconic acid.

[0066] The unsaturated polycarboxylic acid may be an acid anhydride, specifically, maleic anhydride, itaconic anhydride, citraconic anhydride, etc. The unsaturated polycarboxylic acid may be a mono(2-methacryloyloxyalkyl)ester thereof, such as mono(2-acryloyloxyethyl) succinate, mono(2-methacryloyloxyethyl) succinate, mono(2-acryloyloxyethyl) phthalate, mono(2-methacryloyloxyethyl) phthalate, etc. The unsaturated polycarboxylic acid may be a mono(meth)acrylate of a dicarboxy polymer at both ends thereof, such as ω-carboxypolycaprolactone monoacrylate, ω-carboxypolycaprolactone monomethacrylate, etc.

[0067] The unsaturated carboxyl group-containing monomers may be used alone or in combination of two or more.

[0068] Examples of other monomers copolymerizable with the unsaturated carboxyl group-containing monomer include aromatic vinyl compounds such as styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, and indene;Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 2-hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, silyl unsaturated carboxylic acid esters such as cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol methacrylate, methoxypropylene glycol acrylate, methoxypropylene glycol methacrylate, methoxydipropylene glycol acrylate, methoxydipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadienyl acrylate, dicyclopentadiethyl methacrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, and glycerol monomethacrylate;Unsaturated carboxylic acid aminoalkyl esters such as 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethylaminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate, and 3-dimethylaminopropyl methacrylate; unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate; carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate, and vinyl benzoate; vinyl methyl ether, vinyl ethyl ether, and allyl glycidyl ether unsaturated ethers such as ethers; vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile, and vinylidene cyanide; unsaturated amides such as acrylamide, methacrylamide, α-chloroacrylamide, N-2-hydroxyethyl acrylamide, and N-2-hydroxyethyl methacrylamide; unsaturated imides such as maleimide, N-benzylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide; aliphatic conjugated dienes such as 1,3-butadiene, isoprene, and chloroprene; and macromonomers having a monoacryloyl group or a monomethacryloyl group at the end of the polymer molecular chain of polystyrene, polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, and polysiloxane. These monomers may be used alone or in combination of two or more.

[0069] The content of the alkali-soluble resin may be 20 to 70% by weight, preferably 30 to 60% by weight, based on the total weight of the solid content in the photosensitive resin composition. When the content of the alkali-soluble resin is within the above range, the solubility in the developer is sufficient, the formation of a cured film is easy, the reduction in the film thickness in the pixel portion of the exposed portion during development is prevented, and the non-pixel portion has good removability, which is preferable.

[0070] (C) Polymerizable compound The polymerizable compound is a compound that can be polymerized by light and heat, and any polymerizable compound known in this field can be selected and used without any particular limitation as long as it can be polymerized by light and heat. Specifically, monofunctional monomers, bifunctional monomers, other polyfunctional monomers, etc. can be used.

[0071] The types of the monofunctional monomer, the bifunctional monomer, and the polyfunctional monomer are not particularly limited. For example, the polyfunctional monomer may be trimethylolpropane tri(meth)acrylate, ethoxylated trimethylolpropane tri(meth)acrylate, propoxylated trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, ethoxylated dipentaerythritol hexa(meth)acrylate, propoxylated dipentaerythritol hexa(meth)acrylate, dipentaerythritol hexa(meth)acrylate, or the like.

[0072] The content of the polymerizable compound may be 5 to 50% by weight, preferably 10 to 40% by weight, based on the total weight of the solid content in the photosensitive resin composition. When the content of the polymerizable compound is within the above range, it is preferable from the viewpoint of strength and smoothness of the pixel portion.

[0073] (D) Photopolymerization initiator The photopolymerization initiator may be selected from among photopolymerization initiators known in the art without any particular limitation, for example, acetophenone-based, benzophenone-based, triazine-based, thioxanthone-based, oxime-based, benzoin-based, biimidazole-based compounds, etc.

[0074] For example, the oxime compound may be o-ethoxycarbonyl-α-oxyimino-1-phenylpropan-1-one, and representative commercially available products include OXE-01 and OXE-02 from Ciba.

[0075] The photopolymerization initiators may be used alone or in combination of two or more. The content of the photopolymerization initiator may be 0.01 to 10 wt%, preferably 0.01 to 5 wt%, based on the total weight of the solid content in the photosensitive resin composition. When the photopolymerization initiator is contained within the above range, the rate of the photopolymerization reaction is appropriate, the increase in the total process time is prevented, and the deterioration of the physical properties of the final cured film due to overreaction is prevented, which is preferable.

[0076] The photosensitive resin composition according to the present invention may further contain a photopolymerization initiator assistant in addition to the photopolymerization initiator. When the photopolymerization initiator and the photopolymerization initiator assistant are used together, the photosensitive resin composition has a higher sensitivity and the productivity is improved, which is preferable.

[0077] The photopolymerization initiator aid is a compound used to promote polymerization of a polymerizable compound whose polymerization has been initiated by the photopolymerization initiator, and one or more compounds selected from the group consisting of amines and carboxylic acid compounds can be preferably used.

[0078] The photopolymerization initiation assistant may be contained in an amount of typically more than 0 mole to 10 moles or less, preferably 0.01 mole to 5 moles, relative to 1 mole of the photopolymerization initiator. When the photopolymerization initiation assistant is contained within the above range, the efficiency of photopolymerization can be improved, and the effect of improving productivity can be expected.

[0079] (E) Solvent The solvent is not particularly limited, and various organic solvents known in the field of photosensitive resin compositions can be used.

[0080] From the viewpoint of coatability and drying property, it is preferable to use an organic solvent having a boiling point of 100° C. to 200° C. as the solvent, and more preferably, alkylene glycol alkyl ether acetates, ketones, esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate may be used, and more preferably, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, etc. The solvents may be used alone or in combination of two or more kinds.

[0081] The content of the solvent may be 60 to 90% by weight, preferably 70 to 85% by weight, based on the total weight of the photosensitive resin composition. When the content of the solvent is within the above range, it is preferable because it provides an effect of improving coatability when applied by a coating device such as a roll coater, a spin coater, a slit and spin coater, a slit coater (sometimes called a die coater), or an inkjet.

[0082] Additives The photosensitive resin composition of the present invention may further contain additives as necessary. The type of additives can be determined according to the needs of the user and is not particularly limited in the present invention, but examples thereof include fillers, other polymer compounds, surfactants, adhesion promoters, antioxidants, and anti-aggregation agents.

[0083] The antioxidant may include one or more selected from the group consisting of phosphorus-based antioxidants, sulfur-based antioxidants, and phenol-based antioxidants, and in this case, color change that may occur at high temperatures during the process and yellowing that may be caused by a light source after the display is manufactured can be suppressed. The antioxidant may include one or more selected from the group consisting of phenolic compounds, phosphorus-based compounds, and sulfur-based compounds, and these may be used in combination as phenolic-phosphorus compounds, phenolic-sulfur compounds, phosphorus-sulfur compounds, or phenolic-phosphorus-sulfur compounds.

[0084] The content of the antioxidant may be 0.1 to 30 wt %, preferably 0.5 to 20 wt %, based on the total weight of the solid content in the photosensitive resin composition. When the antioxidant is contained within the above range, it is preferable in terms of solving the problem of the decrease in luminescence intensity, and has the advantage that it can be expected to have the effect of preventing aging due to heat and preserving color when performing post-baking in the process of forming a cured product.

[0085] Among the additives, additives whose contents are not exemplified can be appropriately added and used by those skilled in the art within the range that does not impair the effects of the present invention. For example, the additives may be used in an amount of 0.05 to 10% by weight, preferably 0.1 to 10% by weight, more preferably 0.1 to 5% by weight, based on the total weight of the photosensitive resin composition, but are not limited thereto.

[0086] The photosensitive resin composition of the present invention may be prepared by a conventional method known in the art, and is not particularly limited in the present invention. For example, the photosensitive resin composition may be prepared by the following method.

[0087] The colorant is mixed with a solvent in advance, and dispersed using a bead mill or the like until the average particle size of the colorant becomes about 200 nm or less. At this time, a pigment dispersant may be used as necessary, and a part or all of the alkali-soluble resin may be mixed. The remaining alkali-soluble resin, the polymerizable compound, the photopolymerization initiator, and additional additives as necessary are added to the obtained dispersion, and then, as necessary, additional solvent is further added to a predetermined concentration to obtain the desired photosensitive resin composition.

[0088] Partition structure for color conversion pixels and display device The present invention provides a color-converting pixel partition structure produced from a photosensitive resin composition, and a display device including a color-converting panel including the same.

[0089] FIG. 6 is a diagram showing the structure of a color conversion panel including a partition structure for color conversion pixels according to the present invention. Below, the partition structure for color conversion pixels, color conversion panel, and display device according to the present application will be described with reference to FIG. 6.

[0090] A color conversion panel including a partition structure for color conversion pixels has RGB pixel regions and partition structures arranged between each pixel region on a substrate 10, with blue light sources 20 arranged in each of the RGB pixel regions, and color conversion substrates 31, 33, and 35 that convert blue light to red (R), green (G), and blue (B) being arranged on each of the blue light sources 20.

[0091] In a display device including a color conversion panel, each pixel is driven to form a color, so that a color conversion pixel partition structure 40 capable of distinguishing each pixel from the other pixels should be formed.

[0092] The color conversion pixels include quantum dots, which absorb blue (high energy) light and convert it to green (low energy) to red (low energy) light to realize the color. In this case, the barrier structure formed between the color conversion pixels serves to block the blue light source used as the light source and prevent the mixture of blue, green, and red realized by each color conversion pixel. The cured film for forming the barrier structure can be formed to have a film thickness of 7 μm to 15 μm and a pattern line width of 10 μm to 50 μm.

[0093] A display device including a color conversion panel including a barrier rib structure 40 for color conversion pixels formed using the photosensitive resin composition of the present invention is advantageous in forming fine patterns by preventing color mixing between pixels, and allows the manufacture of barrier ribs with little change in line width due to changes in the development process. When the line width of the barrier ribs is narrow, there is an advantage in that the color conversion pixels can secure sufficient space, thereby realizing a high quality image. In addition, after the manufacture of the barrier ribs, gas may be generated due to various heat processes, which also has a significant effect on the performance of the color conversion pixels.

[0094] Examples of the display device include, but are not limited to, a liquid crystal display device, an organic light emitting diode, a flexible display, and the like, and any applicable display device known in the art may be used.

[0095] The color-converting pixel partition structure 40 can be produced by applying the above-mentioned photosensitive resin composition of the present invention onto a substrate, followed by photocuring and development to form a cured film.

[0096] First, a photosensitive resin composition is applied onto a substrate, and then the composition is dried by heating to remove volatile components such as a solvent, thereby obtaining a smooth coating film.

[0097] The coating method may be, for example, a spin coating method, a flexible coating method, a roll coating method, a slit and spin coating method, or a slit coating method. After coating, the coating is dried by heating (pre-baking), or dried under reduced pressure and then heated to volatilize volatile components such as a solvent. The heating temperature is usually 70 to 150°C, preferably 80 to 130°C. The thickness of the coating film after drying by heating is usually about 7 to 15 μm. The coating film thus obtained is irradiated with ultraviolet light through a mask for forming a desired pattern. At this time, it is preferable to use a device such as a mask aligner or a stepper so that the entire exposed area is uniformly irradiated with parallel light and the mask and the substrate are accurately aligned. When ultraviolet light is irradiated, radicals are formed by the photopolymerization initiator at the site irradiated with ultraviolet light, which reacts with the polymerizable compound to cause photocuring.

[0098] The ultraviolet rays may be g-rays (wavelength: 436 nm), h-rays, i-rays (wavelength: 365 nm), etc. The amount of ultraviolet rays may be appropriately selected as necessary, and is not limited in the present invention. The photocured coating film is brought into contact with a developer to dissolve the unexposed areas and develop the film, thereby obtaining the desired pattern shape.

[0099] The pattern thus obtained can be hardened by a step of post-curing the shape of the pattern, and the heating temperature is usually 150 to 250° C., and preferably 180 to 230° C. The heating time is usually 5 to 30 minutes, and preferably 15 to 20 minutes. EXAMPLES

[0100] The present invention will be described in more detail below based on examples, but the examples of the present invention disclosed below are merely illustrative and the scope of the present invention is not limited to these examples. The scope of the present invention is set forth in the claims, and includes all modifications within the scope and meaning equivalent to the claims. In the following examples and comparative examples, the "%" and "parts" indicating the content are based on mass unless otherwise specified.

[0101] Synthesis Example 1: Synthesis of alkali-soluble resin (B-1) A flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, and a nitrogen inlet tube were prepared. On the one hand, 15 parts by weight of N-benzylmaleimide, 30 parts by weight of acrylic acid, 50 parts by weight of cyclohexyl methacrylate, 5 parts by weight of methyl methacrylate, 4 parts by weight of t-butylperoxy-2-ethylhexanoate, and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter also referred to as PGMEA) were added and stirred and mixed to prepare a monomer dropping funnel, and 6 parts by weight of n-dodecanediol and 24 parts by weight of PGMEA were added and stirred and mixed to prepare a chain transfer agent dropping funnel.

[0102] Then, 395 parts by weight of PGMEA was charged into the flask, and the air in the flask was replaced with nitrogen, and the flask was heated to 90° C. while stirring. Then, the dropping of the monomer and the chain transfer agent was started from the dropping funnel. The dropping was continued for 2 hours while maintaining the temperature at 90° C., and after 1 hour, the temperature was raised to 110° C. and maintained for 3 hours. Then, a gas inlet tube was introduced, and bubbling of a mixed gas of oxygen / nitrogen=5 / 95 (v / v) was started.

[0103] Next, 20 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-t-butylphenol), and 0.8 parts by weight of triethylamine were added to the flask, and the mixture was allowed to react at 110°C for 6 hours. After that, the mixture was cooled to room temperature to obtain an alkali-soluble resin (B-1) having a weight average molecular weight of 3,800 and an acid value based on the solid content of 83 mgKOH / g.

[0104] Synthesis Example 2: Synthesis of alkali-soluble resin (B-2) A flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, and a nitrogen inlet tube were prepared. On the one hand, 10 parts by weight of N-benzylmaleimide, 70 parts by weight of acrylic acid, 20 parts by weight of vinyl toluene, 4 parts by weight of t-butylperoxy-2-ethylhexanoate, and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter also referred to as PGMEA) were added and stirred and mixed to prepare a monomer dropping funnel, and 6 parts by weight of n-dodecanediol and 24 parts by weight of PGMEA were added and stirred and mixed to prepare a chain transfer agent dropping funnel.

[0105] Then, 395 parts by weight of PGMEA was charged into the flask, and the air in the flask was replaced with nitrogen, and the flask was heated to 90° C. while stirring. Then, the dropping of the monomer and the chain transfer agent was started from the dropping funnel. The dropping was continued for 2 hours while maintaining the temperature at 90° C., and after 1 hour, the temperature was raised to 110° C. and maintained for 3 hours. Then, a gas inlet tube was introduced, and bubbling of a mixed gas of oxygen / nitrogen=5 / 95 (v / v) was started.

[0106] Next, 50 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-t-butylphenol), and 0.8 parts by weight of triethylamine were added to the flask, and the mixture was allowed to react at 110°C for 6 hours. After that, the mixture was cooled to room temperature to obtain an alkali-soluble resin (B-2) having a weight average molecular weight of 8,000 and an acid value based on the solid content of 135 mgKOH / g.

[0107] Synthesis Example 3: Synthesis of alkali-soluble resin (B-3) A flask equipped with a stirrer, a thermometer, a reflux condenser, and a dropping funnel, and a nitrogen inlet tube were prepared. On the one hand, 40 parts by weight of acrylic acid, 40 parts by weight of cyclohexyl methacrylate, 10 parts by weight of vinyl toluene, 10 parts by weight of methyl methacrylate, 4 parts by weight of t-butyl peroxy-2-ethylhexanoate, and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter also referred to as PGMEA) were added and stirred and mixed to prepare a monomer dropping funnel, and 6 parts by weight of n-dodecanediol and 24 parts by weight of PGMEA were added and stirred and mixed to prepare a chain transfer agent dropping funnel.

[0108] Then, 395 parts by weight of PGMEA was charged into the flask, and the air in the flask was replaced with nitrogen, and the flask was heated to 90° C. while stirring. Then, the dropping of the monomer and the chain transfer agent was started from the dropping funnel. The dropping was continued for 2 hours while maintaining the temperature at 90° C., and after 1 hour, the temperature was raised to 110° C. and maintained for 3 hours. Then, a gas inlet tube was introduced, and bubbling of a mixed gas of oxygen / nitrogen=5 / 95 (v / v) was started.

[0109] Next, 30 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2'-methylenebis(4-methyl-6-t-butylphenol), and 0.8 parts by weight of triethylamine were added to the flask, and the mixture was allowed to react at 110°C for 6 hours. After that, the mixture was cooled to room temperature to obtain an alkali-soluble resin (B-3) having a weight average molecular weight of 6,900 and an acid value based on the solid content of 90 mgKOH / g.

[0110] The weight average molecular weight (Mw) of the alkali-soluble resin was measured by the GPC method using an HLC-8120GPC (manufactured by Tosoh Corporation).

[0111] The measurement conditions were as follows: TSK-GELG4000HXL and TSK-GELG2000HXL columns were connected in series, and the column temperature was set to 40°C. Tetrahydrofuran was used as the mobile phase solvent, and the measurement was performed at a flow rate of 1.0 mL / min. The concentration of the measurement sample was 0.6 wt%, the injection amount was 50°C, and the analysis was performed using an RI detector. TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, and A-500 (manufactured by Tosoh Corporation) were used as calibration standards, and the weight average molecular weight of the alkali-soluble resin obtained under the above conditions was measured.

[0112] Production of photosensitive resin compositions according to examples and comparative examples With reference to Table 1 below, resin compositions according to Production Examples 1 to 3 containing an alkali-soluble resin, a polymerizable compound, a photopolymerization initiator, a dispersant as an additive, an antioxidant, and a solvent were produced.

[0113] [Table 1]

[0114] (C) Polymerizable compound: dipentaerythritol hexaacrylate (Kayarad DPHA, manufactured by Nippon Kagaku Co., Ltd.) (D) Photopolymerization initiator: Irgacure OXE02 (manufactured by Basf) Pigment dispersant: DISPERBYK-110 (BYK) Antioxidant: Summilizer GP (Sumitomo Chemical) (E) Solvent: Propylene glycol monomethyl ether acetate (PGMEA) With reference to Table 2 below, photosensitive resin compositions according to Examples and Comparative Examples were produced by mixing a colorant with the resin compositions according to Production Examples 1 to 3.

[0115] [Table 2]

[0116] Experimental Example (1) Manufacturing of bulkhead substrates A barrier rib substrate was manufactured using the photosensitive resin composition prepared in the examples and comparative examples. That is, each of the photosensitive resin compositions was applied onto a glass substrate by spin coating, and then placed on a heating plate and maintained at 100° C. for 3 minutes to remove the solvent, thereby forming a coating film.

[0117] Next, a test photomask having a square transmission pattern of width x length (30 mm x 30 mm) and a line pattern of 1 to 100 μm was placed on the coating film, and ultraviolet rays were irradiated with a distance of 100 μm from the test photomask.

[0118] In this case, an ultra-high pressure mercury lamp (product name USH-250D) manufactured by Ushio Inc. was used as the ultraviolet light source, and the irradiation was performed under an atmospheric condition at 100 mJ / cm. 2 The sample was irradiated with light at an exposure dose of 100 nm (based on 365 nm), and no special optical filters were used.

[0119] The coating film irradiated with ultraviolet light as described above was developed by immersing it in a developing solution of a pH 10.5 KOH aqueous solution for a predetermined time. The development was carried out for two periods of 80 seconds and 160 seconds. The glass substrate on which the coating film was formed was washed with distilled water, dried by blowing in nitrogen gas, and heated in a heating oven at 230°C for 20 minutes to produce a cured film of a barrier rib pattern. The coating thickness of the cured film of the barrier rib pattern produced as described above was 10 μm.

[0120] (2) Measurement of line width change The line width of the 50 μm line mask pattern was measured using an optical microscope (ECLIPSE LV100POL, Nikon Corporation) for the substrate developed for 80 seconds and the substrate developed for 160 seconds in the manufacturing of the partition wall described above in (1). The change in the pattern line width of the substrate developed for 80 seconds and the substrate developed for 160 seconds was measured, and the results are shown in Table 3 below.

[0121] (3) Determination of transmittance and reflectance The transmittance and reflectance of the barrier rib patterns prepared using the photosensitive resin compositions prepared in the Examples and Comparative Examples, which had a square pattern of 30 mm x 30 mm, were measured using an ultraviolet-visible spectrophotometer.

[0122] The transmittance is shown in Table 3 below. When the maximum transmittance at a wavelength of 450 nm or more and 470 nm or less was less than 5%, it was marked as O. When it was 5% or more, it was marked as X. When the average transmittance at a wavelength of 640 nm or more and 680 nm or less was more than 25%, it was marked as O. When it was 25% or more, it was marked as X.

[0123] In addition, the reflectance is shown in Table 3 below. When the reflectance is 20% or less at a wavelength of 450 nm or more and 470 nm or less, it is marked with an O, and when it is more than 20%, it is marked with an X. When the reflectance is 20% or more at a wavelength of 640 nm or more and 680 nm or less, it is marked with an O, and when it is less than 20%, it is marked with an X.

[0124] Moreover, the transmission spectra of the cured films of the partition pattern produced using the photosensitive resin compositions of Example 2 and Comparative Example 1 are shown in FIG. 1, and the transmission and reflection spectra of the cured films of the partition pattern produced using the photosensitive resin compositions of Examples 4, 11, and 16 to 18 are shown in FIGS. 4 and 5, respectively.

[0125] (4) Taper angle In the cured film of the partition wall pattern produced using the photosensitive resin composition produced in the above Examples and Comparative Examples, a 100 μm line pattern was cut and the cross section was observed. The taper angle in the cross section was measured using a scanning electron microscope (SEM, SU-8200, Hitachi Ltd.), and the measurement results are shown in Table 3 below.

[0126] Moreover, photographs of Examples 1, 2, and 14 and Comparative Example 4 taken with a scanning electron microscope are shown in FIG.

[0127] Referring to FIG. 3, the criteria for determining whether a taper is forward taper or reverse taper by measuring the taper angle can be confirmed.

[0128] (5) Minimum mask size that can be formed The partition wall patterns prepared using the photosensitive resin compositions prepared in the Examples and Comparative Examples were formed using a line mask of 1 to 100 μm, and the minimum size of the mask capable of forming the partition wall pattern was measured and shown in Table 3 below.

[0129] Moreover, the evaluation results of the fine patterns of the partition wall patterns produced using the photosensitive resin compositions according to Examples 1, 2, and 14, and Comparative Example 4 are shown in Fig. 2. In Fig. 2, the evaluation result of the fine pattern of Example 1 was judged to be "20", and the evaluation result of Example 2 was judged to be "15".

[0130] The smaller the mask size, the finer the pattern can be formed, but there is a problem that the pattern is easily left unpatterned, making it difficult to form a fine pattern. Therefore, the formation of a fine pattern was evaluated by measuring the minimum size of the mask that allows the formation of a fine pattern without causing pattern leave.

[0131] (6) Evaluation of outgassing The cured films of the partition patterns prepared from the photosensitive resin compositions according to the Examples and Comparative Examples were cut into square patterns of 30 mm x 30 mm (developing time: 80 seconds), and were pyrolyzed by Py-GC / FID at 230° C. for 30 minutes to analyze the collected compounds. The outgassing values ​​are shown in Table 3 below.

[0132] The outgassing measurement value is expressed as a percentage with the value of Example 1 being 100% as the standard, and the lower the value, the better in the sense that less outgassing is generated at high temperatures.

[0133] (7) Luminance evaluation A pattern was formed on a glass substrate using each of the photosensitive resin compositions prepared in the Examples and Comparative Examples, and the brightness was measured above a light source including a blue LED light source (100 LEDs horizontally and 100 LEDs vertically (total of 10,000 LEDs)). The blue LED light source emits light with a power consumption of 50 mW and has a light-emitting area of ​​10 cm horizontally and 10 cm vertically.

[0134] The luminance emitted from the color conversion element was measured using Instrument System's CAS 140CT equipment (luminance, cd / mm 2 ) was filled out.

[0135] The luminance measured for the substrate having the black barrier rib pattern of Comparative Example 4 was 3.8 lux, and each result was evaluated according to the following criteria. The results are shown in Table 4 below.

[0136] <Evaluation criteria> ◎: Increased by 30% or more ○○: Increase of 20% or more but less than 30% ○: Increase of 10% or more but less than 20% △: Increase of 1% or more but less than 10% X: Increase of more than 0% but less than 1% XX: Decrease

[0137] [Table 3]

[0138] The cured film of the partition wall pattern prepared using the photosensitive resin composition according to the embodiment of the present invention has a maximum transmittance of less than 15% at a wavelength of 450 nm to 470 nm and an average transmittance of more than 25% at a wavelength of 640 nm to 680 nm, and thus it can be confirmed that the cured film effectively blocks blue light and has high transmittance to red light.

[0139] Therefore, when the photosensitive resin composition according to the present invention is used to manufacture a partition structure for a color-converting pixel included in a display device that uses a blue light source as a light source, it is possible to prevent light loss and improve color conversion performance.

[0140] In particular, the cured films of the partition wall patterns produced in Examples 16 to 18, which further contained a white pigment, had a reflectance of 20% or less at a wavelength of 50 nm or more and 470 nm or less, and a reflectance of 20% or more at a wavelength of 640 nm or more and 680 nm or less, and were confirmed to have improved reflectance to red light and significantly improved brightness.

[0141] In contrast, Comparative Examples 3 to 8 did not meet the transmittance requirements at wavelengths of 450 nm to 470 nm and 640 nm to 680 nm, or had an inverse taper (taper angle of 90° or more) and a large mask size, making it difficult to form a stable pattern, reducing the area of ​​the color conversion pixels and resulting in poor color conversion performance. Also, a large amount of outgas was generated from the partition, deteriorating the performance of the color conversion pixels.

[0142] Also, referring to Comparative Examples 7 and 8, when a blue pigment or a black pigment was used as the first pigment, the reflection properties were not improved even when a white pigment was added.

[0143] In Examples 2, 5, and 6, CI Red Pigment 179 was used at 2.50% by weight as a colorant, and the characteristics of the resin composition, i.e., the type of alkali-soluble resin, were confirmed. When Preparation Example 1 containing the alkali-soluble resin (B-2) was used, a pattern of a fine mask size could be formed, and the amount of outgassing generated from the partition wall due to the additional heat process after the partition wall was manufactured was small. This allows the manufacture of color conversion pixels with a large area, which is advantageous for maintaining the life of the manufactured color conversion pixels.

[0144] In addition, it can be confirmed that the minimum mask size capable of forming the partition wall manufactured using the photosensitive resin composition according to the embodiment of the present invention is 20 μm or less, and the measurement result of the line width change is less than 4.0 μm.

[0145] Therefore, the partition wall produced using the photosensitive resin composition of the present invention can form a pattern of a fine mask size, and can maintain a stable color conversion pixel size even when there are changes in the development process.

[0146] In contrast, in Comparative Examples 1 to 8, the minimum mask size that can be formed exceeds 20 μm, and the measured line width change is 4.0 μm or more, making it difficult to form patterns with fine mask sizes. In addition, there is a problem in that the color conversion performance is not uniform because the size of the color conversion pixels is unstable due to changes in the development process.

[0147] In Examples 1 to 4 and Comparative Examples 1 and 2, CI Red Pigment 179 was used as the colorant and Production Example 2 was used as the resin composition, and the characteristics according to the content of the colorant were confirmed. Comparative Example 1, in which the content of the first pigment was too low, did not reach the target level in the wavelength range of 450 nm to 470 nm, and Comparative Example 2, in which the content of the first pigment was too high, showed a result in which the taper had a high taper angle with an inverted taper shape. It is therefore understood that the content of the first pigment among the colorants is preferably 2.7 to 20 wt % with respect to the total weight of the solid content in the composition.

[0148] In addition, referring to FIG. 1, the transmission spectra of the cured films of the partition patterns produced using the photosensitive resin compositions of Example 2 and Comparative Example 1 can be seen, and it can be seen that Example 2 satisfies the above-mentioned transmittance value, but Comparative Example 1 does not satisfy the above-mentioned transmittance value. [Explanation of symbols]

[0149] 10 Base material 20 Blue light source 31, 33, 35 Color conversion substrate 40 Bulkhead structure

Claims

1. A photosensitive resin composition for forming a partition wall, comprising: (A) a colorant; (B) an alkali-soluble resin; (C) a polymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, The (A) colorant includes one or more first pigments selected from the group consisting of C.I. red pigment (C.I. Pigment Red), C.I. yellow pigment (C.I. Pigment Yellow), and C.I. orange pigment (C.I. Pigment Orange); the colorant (A) contains a first pigment in an amount of 2.7% by weight or more and 20% by weight or less based on the total weight of the solid content in the photosensitive resin composition for forming a partition wall, The photosensitive resin composition for forming a partition wall does not contain a black colorant, a cured film having a thickness of 7 μm to 15 μm produced from the photosensitive resin composition for forming a partition wall has a maximum transmittance of less than 5% at a wavelength of 450 nm or more and 470 nm or less and an average transmittance of more than 25% at a wavelength of 640 nm or more and 680 nm or less; The photosensitive resin composition for forming a partition wall is used for forming a partition wall of a color conversion pixel using a blue light source.

2. 2. The photosensitive resin composition for forming partition walls according to claim 1, wherein the colorant (A) further comprises a white pigment as a second pigment.

3. The photosensitive resin composition for forming partition walls according to claim 2, wherein the first pigment and the second pigment are contained in a weight ratio of 1:0.5 to 1:

2.

4. The white pigment is titanium oxide (TiO ２ 3. The photosensitive resin composition for forming partition walls according to claim 2, comprising:

5. The titanium oxide (TiO ２ ) is silicon oxide (SiO ２ ), aluminum oxide (Al ２ O ３ ), zirconium oxide (ZrO ２ 5. The photosensitive resin composition for forming partition walls according to claim 4, which has been surface-treated with at least one selected from the group consisting of fluorine-containing polymers, fluorine-containing polymers, and organic substances.

6. The titanium oxide (TiO ２ 6. The photosensitive resin composition for forming partition walls according to claim 5, wherein the outermost surface of the first insulating layer is treated with an organic substance.

7. The surface-treated titanium oxide (TiO ２ Titanium oxide (TiO ２ The content of the core is surface-treated titanium oxide (TiO ２ 6. The photosensitive resin composition for forming partition walls according to claim 5, wherein the content of the polyvinyl chloride in the composition is 85 to 95% by weight based on the total weight of the polyvinyl chloride.

8. The photosensitive resin composition for forming partition walls according to claim 1, wherein the C.I. Pigment Red is at least one selected from the group consisting of diketopyrrole-based, anthraquinone-based, perylene-based, and azo-based pigments.

9. The photosensitive resin composition for forming partition walls according to claim 1, wherein the C. I. Pigment Yellow is at least one selected from anthraquinone-based, isoindolinone-based, and azo-based pigments.

10. The photosensitive resin composition for forming partition walls according to claim 1, wherein the C. I. Pigment Orange is at least one selected from the group consisting of quinophthalones, isoindolinones, and diketopyrroles.

11. The C.I. red pigment is one or more selected from the group consisting of C.I. red pigments 179, 254, 264, and 269; The C.I. yellow pigment is one or more selected from the group consisting of C.I. yellow pigments 138, 139, 150, and 185; The photosensitive resin composition for forming partition walls according to claim 1, wherein the C.I. orange pigment is at least one selected from the group consisting of C.I. orange pigments 64 and 71.

12. Relative to the total weight of the solid content in the photosensitive resin composition for forming partition walls, 0.5 to 30% by weight of the colorant (A); (B) 20 to 70% by weight of an alkali-soluble resin; 5 to 50% by weight of the (C) polymerizable compound; 0.01 to 10% by weight of the (D) photopolymerization initiator; and 2. The photosensitive resin composition for forming partition walls according to claim 1, further comprising 60 to 90% by weight of a solvent (E) based on the total weight of the photosensitive resin composition for forming partition walls.

13. A color-converting pixel partition wall structure produced from the photosensitive resin composition for forming partition walls according to any one of claims 1 to 12.

14. A display device comprising a color conversion panel including the partition structure of claim 13.

Images