Exposure equipment Exposure method

Abstract

To provide an exposure apparatus and an exposure method that, by pressing a part of an exposure mask against an outer peripheral surface of an object, restrain the exposure mask from sliding on the outer peripheral surface of the object, compared with wrapping a part of the exposure mask around the outer peripheral surface of the object, and can suppress widening of an exposure area, compared with the case where at least a part of a first exposure area and at least a part of a last exposure area overlap.SOLUTION: In an exposure mask wrapped around a part of an outer peripheral surface of an object with circular cross section, a distance from an edge of a transmission section at a most end of a width direction to an edge of the transmission section at a most other end of the width direction is shorter than the circumference of the object. In addition, a circumferential tension of the object is applied to the exposure mask.SELECTED DRAWING: Figure 4

Description

[Technical field]

[0001] The present invention relates to an exposure apparatus and an exposure method. [Background technology]

[0002] In the method of forming dynamic pressure generating grooves described in Patent Document 1, a cylindrical mask having the desired shape of dynamic pressure generating grooves is fixed around a cylindrical shaft having a photoresist applied to its outer periphery, and the shaft and cylindrical mask are rotated together while being exposed to light, and then etching is performed to form the dynamic pressure generating grooves on the outer periphery of the shaft. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Publication No. 130490 / 1983 Summary of the Invention [Problem to be solved by the invention]

[0004] Conventionally, a sheet-like exposure mask is pressed against the outer peripheral surface of an object to be exposed, so that a part of the exposure mask is wrapped around the outer peripheral surface of the object and brought into contact with the outer peripheral surface of the object. In this configuration, the exposure mask may slip relative to the outer peripheral surface of the object.

[0005] Furthermore, when forming an elongated exposed portion (portion to be exposed) extending in the axial direction on the outer peripheral surface of an object having a circular cross section with the same width all around the object, an exposure mask is used in which a plurality of elongated transparent portions through which the light to be exposed (hereinafter "exposure light") passes are formed at intervals. Then, the exposure mask is wrapped around a part of the object, and the exposure light is irradiated onto the part around which the exposure mask is wrapped. Furthermore, the exposure mask is moved while the object is rotated and the exposure light is irradiated, thereby forming an elongated exposed portion with the same width all around the outer peripheral surface of the object. However, a part of the exposed portion to be exposed first and a part of the exposed portion to be exposed last may overlap on the object. In such a case, the width of the exposed portion of this part becomes wider.

[0006] The object of the present invention is to prevent the exposure mask from slipping against the outer peripheral surface of the object by pressing a portion of the exposure mask against the outer peripheral surface of the object, compared to a case in which a portion of the exposure mask is wrapped around the outer peripheral surface of the object, and to prevent the width of the exposure portion from increasing, compared to a case in which at least a portion of the exposure portion that is exposed first and at least a portion of the exposure portion that is exposed last overlap. [Means for solving the problem]

[0007] The exposure apparatus according to a first aspect of the present invention comprises a pair of rotatable shafts arranged with their axes parallel to each other, an exposure mask having one widthwise end fixed to and partially wrapped around one of the shafts and the other widthwise end fixed to and partially wrapped around the other shaft, the exposure mask extending in the axial direction and having a plurality of light-transmitting sections lined up in the width direction at similar intervals and partially wrapped around the outer peripheral surface of an object having a circular cross section, the distance from the edge of the light-transmitting section at the furthest end in the width direction to the edge of the light-transmitting section at the furthest end in the width direction being shorter than the circumference of the object, and an irradiation section that irradiates the portion of the object where the light-transmitting section of the exposure mask is located with light to expose the object, and is characterized in that by rotating the shafts, tension in the circumferential direction of the object is applied to the exposure mask, and the object rotates as the exposure mask moves, while the object is exposed by the irradiation section.

[0008] An exposure apparatus according to a second aspect of the present invention is the exposure apparatus described in the first aspect, characterized in that when the exposure mask is wrapped around an object, the exposure mask, when viewed from the axial direction, is U-shaped in which the width of an opening formed between a pair of shaft bodies is narrower than the width of a base end formed by protruding outward from between the pair of shaft bodies.

[0009] An exposure apparatus according to a third aspect of the present invention is characterized in that, in the exposure apparatus described in the second aspect, the exposure mask passes between the center of one of the shaft bodies and the center of the object, and between the center of the other shaft body and the center of the object, when viewed from the axial direction.

[0010] An exposure method according to a fourth aspect of the present invention is an exposure method for exposing an outer peripheral surface of an object having a circular cross section using the exposure apparatus according to any one of the first to third aspects, comprising: an attachment step of attaching the object such that the exposure mask, one end in the width direction of which is fixed to one of the shaft bodies and the other end in the width direction of which is fixed to the other shaft body, is wrapped around a part of the object; an application step of applying a circumferential tension of the object to the exposure mask by rotating at least one of the pair of shaft bodies; an irradiation step of irradiating a part of the exposure mask to which the circumferential tension of the object is applied, where the transparent part is located, with light for exposing the object; and a movement step of rotating the object while moving the exposure mask by rotating the pair of shaft bodies, so that the exposure mask to which the tension is applied is wrapped around an unexposed part of the object, and the irradiation step and the movement step are repeated to expose the entire circumference of the object.

[0011] An exposure method according to a fifth aspect of the present invention is the exposure method according to the fourth aspect, characterized in that in the application step, one of the shaft bodies is rotated in one direction and the other of the shaft bodies is rotated in the other direction. Effect of the Invention

[0012] According to the exposure apparatus of the first aspect of the present invention, by pressing a portion of the exposure mask against the outer peripheral surface of the object, it is possible to prevent the exposure mask from slipping relative to the outer peripheral surface of the object, compared to the case where a portion of the exposure mask is wrapped around the outer peripheral surface of the object, and it is possible to prevent the width of the exposed portion from increasing, compared to the case where at least a portion of the exposed portion that is exposed first and at least a portion of the exposed portion that is exposed last overlap.

[0013] According to the exposure apparatus of the second aspect of the present invention, the amount by which the exposure mask wraps around the object can be increased, compared to when the exposure mask is U-shaped with the opening width wider than the base end width when viewed in the axial direction.

[0014] According to the exposure apparatus of the third aspect of the present invention, the outer diameter of the shaft can be increased while ensuring the amount of wrapping of the exposure mask around the object, compared to when the exposure mask is arranged so as to cover the pair of shafts and the object from the outside when viewed in the axial direction.

[0015] According to the exposure method of the fourth aspect of the present invention, by pressing a portion of the exposure mask against the outer peripheral surface of the object, it is possible to prevent the exposure mask from slipping relative to the outer peripheral surface of the object, compared to the case where a portion of the exposure mask is wrapped around the outer peripheral surface of the object.

[0016] According to the exposure method of the fifth aspect of the present invention, tension can be applied to the exposure mask more effectively than when tension is applied to the exposure mask by rotating only one shaft body. [Brief description of the drawings]

[0017] [Figure 1] 1 is a perspective view showing an exposure apparatus according to an embodiment of the present invention. [Diagram 2] 1 is a perspective view showing an exposure mask provided in an exposure apparatus according to an embodiment of the present invention. [Diagram 3] 2 is a development view of an exposure mask provided in the exposure apparatus according to the embodiment of the present invention, which is developed into a plane. [Figure 4]1A and 1B are process diagrams showing a process of exposing an object using an exposure apparatus according to an embodiment of the present invention. [Diagram 5] 1A and 1B are process diagrams showing a process of exposing an object using an exposure apparatus according to an embodiment of the present invention. [Figure 6] 3A and 3B are enlarged process views showing a process of exposing an object using an exposure apparatus according to an embodiment of the present invention. [Figure 7] 3A and 3B are enlarged process views showing a process of exposing an object using an exposure apparatus according to an embodiment of the present invention. [Figure 8] 1A and 1B are process diagrams showing a process for removing an unexposed portion from an object that has been exposed using an exposure apparatus according to an embodiment of the present invention. [Figure 9] 1 is a schematic diagram showing the configuration of an etching apparatus used to etch an object exposed using an exposure apparatus according to an embodiment of the present invention. [Figure 10] 4 is a cross-sectional view showing a state in which an object exposed using the exposure apparatus according to the embodiment of the present invention is etched. [Figure 11] 1 is a schematic diagram showing a developing device having, as a component thereof, an object exposed using an exposure device according to an embodiment of the present invention; [Figure 12] 1 is a schematic diagram showing the bristles of a sleeve produced from an object exposed using an exposure apparatus according to an embodiment of the present invention. FIG. [Figure 13] 13 is a schematic diagram showing the bristles of a sleeve produced from an object exposed using an exposure apparatus according to a comparative example of an embodiment of the present invention. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0018] An example of an exposure apparatus and an exposure method according to an embodiment of the present invention will be described with reference to Figures 1 to 13. Note that in the figures, arrow H indicates the up-down direction (vertical direction) of the apparatus, arrow W indicates the width direction (horizontal direction) of the apparatus, and arrow D indicates the depth direction (horizontal direction) of the apparatus. The width direction and the depth direction of the apparatus are perpendicular to each other.

[0019] (Exposure device 10) The exposure device 10 is a device that exposes the outer peripheral surface of an object 100 that has a circular cross section and is coated with photoresist on its outer peripheral surface. In this embodiment, the object 100 is a member that becomes a cylindrical sleeve used in a developing device of a xerographic image forming apparatus.

[0020] 1, this exposure apparatus 10 includes a pair of shaft bodies 12 whose axes are arranged in parallel, and a frame 40 that supports the shaft bodies 12. The exposure apparatus 10 also includes an exposure mask 20 having one end in the width direction fixed to one of the shaft bodies 12 and the other end in the width direction fixed to the other shaft body 12, and an irradiation unit 50 that irradiates the object 100 with light that exposes the object 100 (hereinafter referred to as "exposure light").

[0021] [Frame 40, shaft body 12] 1, a pair of frames 40 are provided, and are disposed on one side and the other side of the shaft body 12 in the device depth direction. Each pair of frames 40 has two semicircular notches 40a that are open at the top and aligned in the device width direction.

[0022] A pair of shaft bodies 12 are provided, with the axial direction being the depth direction of the device, and the pair of shaft bodies 12 are arranged side by side in the width direction of the device, with the axes being parallel to each other.

[0023] Further, each of the pair of shaft bodies 12 includes a cylindrical main body 14 and a shaft 16 penetrating the main body 14. The main body 14 is joined to the shaft 16 by a bonding agent (such as an adhesive). In other words, the main body 14 rotates when the shaft 16 is rotated. Both end portions of the shaft 16 in the device depth direction (axial direction) are placed on notches 40a formed in the frame 40 protruding from the main body 14. This allows the pair of shaft bodies 12 to rotate. In this embodiment, the shaft body 12 does not rotate unless an external force that rotates the shaft body 12 is applied to the shaft body 12 due to a frictional force generated between the end face of the notch 40a and the outer circumferential surface of the shaft 16.

[0024] For ease of explanation, one shaft body 12 will be referred to as shaft body 12a, and the members constituting shaft body 12a will be referred to as main body 14a and shaft 16a. The other shaft body 12 will be referred to as shaft body 12b, and the members constituting shaft body 12b will be referred to as main body 14b and shaft 16b. When shaft body 12a and shaft body 12b are not particularly distinguished from each other, the alphabet at the end of the name may be omitted. Shaft body 12a is an example of one shaft body, and shaft body 12b is an example of the other shaft body.

[0025] [Exposure mask 20] The exposure mask 20 is in the form of a sheet as shown in Fig. 1, and has alternating transparent portions 20a that transmit the exposure light and shielding portions 20b that shield the exposure light as shown in Fig. 2 and Fig. 3. Note that the thickness of the exposure mask 20 shown in each figure may be exaggerated so that the shape of the exposure mask 20 can be easily understood.

[0026] As shown in FIG. 3, when the exposure mask 20 is developed in a plane, a pair of edges (right and left edges in the figure) extend in the device depth direction, and a pair of edges (upper and lower edges in the figure) extend in the device width direction, forming a rectangular shape. The transmission parts 20a formed in the exposure mask 20 extend in the device depth direction (axial direction) and are arranged in the width direction at the same, similar or equivalent intervals in the device width direction. Here, the interval in the device width direction refers to the width (length in the device width direction) of the shielding part 20b sandwiched between the adjacent transmission parts 20a. In addition, the width (length in the device width direction) of each transmission part 20a is set to be the same, similar or equivalent. Note that, as shown in FIG. 3, the shielding parts 20b are also formed at both ends of the exposure mask 20, and the width of the shielding parts 20b at both ends is larger than the width of the other shielding parts 20b.

[0027] The distance (L1 in the figure) from the edge 21a of the transmitting portion 20a at the most one end side in the device width direction (left side in the figure) to the edge 21b of the transmitting portion 20a at the most other end side in the device width direction (right side in the figure) is shorter than the circumferential length R1 (see FIG. 1) of the object 100. In other words, when the exposure mask 20 is wrapped around the object 100, the transmitting portion 20a at the most one end side and the transmitting portion 20a at the most other end side are spaced apart in the circumferential direction of the object 100.

[0028] 1 and 4(A), one end in the width direction of the exposure mask 20 is fixed to the shaft body 12a and a portion of the mask is wound around the shaft body 12a, and the other end in the width direction of the exposure mask 20 is fixed to the shaft body 12b and a portion of the mask is wound around the shaft body 12b. The length of the portion of the exposure mask 20 wound around the shaft body 12b is longer than the length of the portion of the mask 20 wound around the shaft body 12a.

[0029] Furthermore, when viewed from the device depth direction, the shape of the portion of the exposure mask 20 that is not wound around the shaft body 12 is U-shaped with an opening at the bottom. Specifically, the exposure mask 20 is U-shaped (C-shaped) in which the width of the opening (W1 shown in FIG. 4(A)) formed between the pair of shaft bodies 12 is narrower than the width (W2 shown in FIG. 4(A)) of the base end formed by protruding outward from between the pair of shaft bodies 12. Here, W1 is the distance between two surfaces of the exposure mask 20 that face each other on a line segment connecting the axis (center of rotation) of the shaft body 12a and the axis (center of rotation) of the shaft body 12b when viewed from the device depth direction. Moreover, W2 is the maximum distance between two surfaces of the exposure mask 20 that face each other in the device width direction when viewed from the device depth direction and protruding outward from the pair of shaft bodies 12.

[0030] Also, even when the object 100 is placed inside the base end portion of the U-shaped exposure mask 20, as shown in FIG. 4B, the exposure mask 20 is U-shaped with an opening at the bottom. Specifically, the exposure mask 20 is U-shaped (C-shaped) in which the width of the opening (W3 shown in FIG. 4B) formed between the pair of shaft bodies 12 is narrower than the width of the base end (W4 shown in FIG. 4B) formed by protruding outward from between the pair of shaft bodies 12. In other words, the exposure mask 20 is U-shaped (C-shaped) in which the opening width is narrower than the width of the curved side. Here, W3 is the distance between two surfaces of the exposure mask 20 that face each other on the line segment connecting the axis (center of rotation) of the shaft body 12a and the axis (center of rotation) of the shaft body 12b when viewed from the device depth direction. Moreover, W4 is the maximum distance between two surfaces of the exposure mask 20 protruding outward from the pair of shafts 12 that face each other in the width direction of the apparatus when viewed from the depth direction of the apparatus.

[0031] In addition, the portion of the exposure mask 20 wound around the object 100 and the portion wound around the shaft 12 pass between the center of the shaft 12a and the center of the object 100, and also pass between the center of the shaft 12b and the center of the object 100, when viewed from the device depth direction. In other words, the portion of the exposure mask 20 wound around the object 100 and the portion wound around the shaft 12a intersects with a line segment connecting the axis of the shaft 12a and the axis of the object 100, when viewed from the device depth direction. In addition, the portion of the exposure mask 20 wound around the object 100 and the portion wound around the shaft 12b intersects with a line segment connecting the axis of the shaft 12b and the axis of the object 100, when viewed from the device depth direction. In other words, when viewed from the device depth direction, the portion of the exposure mask 20 wrapped around the object 100 and the portion wrapped around the shaft 12a are sandwiched between the outer circumferential surface of the shaft 12a and the outer circumferential surface of the object 100. Also, when viewed from the device depth direction, the portion of the exposure mask 20 wrapped around the object 100 and the portion wrapped around the shaft 12b are sandwiched between the outer circumferential surface of the shaft 12b and the outer circumferential surface of the object 100.

[0032] [Irradiation unit 50] 1, the irradiation unit 50 is disposed above the base end of the exposure mask 20 formed to protrude outward from between the pair of shaft bodies 12, and extends in the depth direction of the device. The irradiation unit 50 is configured to irradiate the exposure mask 20 with exposure light. Specifically, the irradiation unit 50 includes a box-shaped housing whose downward surface is open and which extends in the depth direction of the device, and two lamps (not shown) disposed inside the box-shaped housing and which extend in the depth direction of the device. The two lamps are disposed parallel to each other and spaced apart in the width direction of the device.

[0033] (Exposure Method) Next, an explanation will be given of an exposure method for exposing the outer peripheral surface of the object 100 coated with the photoresist 102 using the exposure apparatus 10. This exposure method includes an attachment step of attaching the object 100 to the exposure apparatus 10, an applying step of applying tension to the exposure mask 20, an irradiation step of irradiating the object 100 with exposure light for exposing the object 100, and a movement step of moving the exposure mask 20.

[0034] [Installation process] In the attachment step, as shown in Figures 4(A) and (B), the object 100 is attached to the exposure apparatus 10. Specifically, the object 100, supported by some means (for example, held by an operator's hands), is inserted into the inside of the base end of the exposure mask 20, which is U-shaped with an open bottom when viewed from the depth direction of the apparatus. When the support of the object 100 is then released, the object 100 falls downward due to its own weight and is supported by the pair of shafts 12 via (sandwiching) the exposure mask 20. In other words, the attachment step is a step of attaching the object 100 to the exposure apparatus 10 so that the exposure mask 20 is wrapped around a part of the object 100.

[0035] [Application step] 5(A), the shafts 16a and 16b are rotated to apply tension to the exposure mask 20 in the circumferential direction of the object 100. In other words, a force is applied to the exposure mask 20 to press the exposure mask 20 against the outer circumferential surface of the object 100.

[0036] Specifically, the shaft 16a is rotated in one direction (clockwise direction in the figure), and the shaft 16b is rotated in the other direction (counterclockwise direction in the figure), thereby applying tension in the circumferential direction of the object 100 to the exposure mask 20, and bringing a part of the exposure mask 20 into contact with the outer circumferential surface of the object 100.

[0037] As for the portion of the tensioned exposure mask 20 that is to be brought into contact with the outer peripheral surface of the object 100, the exposure mask 20 in a portion where a plurality of transmission portions 20a are formed, including the transmission portion 20a at the extreme end side in the device width direction (left side in the figure) shown in Fig. 3, is brought into contact with the outer peripheral surface of the object 100. Specifically, as shown in Fig. 6(A), in an irradiation region (region E1 shown in the figure) where the exposure light is irradiated, the exposure mask 20 in a portion where a plurality of transmission portions 20a are formed, including the transmission portion 20a at the extreme end side in the device width direction (left side in the figure) shown in Fig. 3 (tensioned exposure mask 20) ​​is brought into contact with the outer peripheral surface of the object 100.

[0038] [Irradiation process] In the irradiation process, as shown in Figures 5(A) and 6(A), the irradiation unit 50 is used to irradiate the portion of the tensioned exposure mask 20 where the transparent portion 20a is located with exposure light that exposes the object 100 for a predetermined period of time.

[0039] As a result, as shown in Fig. 6(A), the exposure light is transmitted through the transmitting portion 20a located in the irradiation region E1. As a result, in the photoresist 102 formed on the object 100, a plurality of exposed portions 102a, which are portions exposed to the exposure light, are formed lined up in the circumferential direction of the object 100. Note that in each figure, the exposed portions 102a are indicated by hatching. Furthermore, on the outer peripheral surface of the object 100, a plurality of unexposed portions 102b are formed, which are sandwiched between a pair of adjacent exposed portions 102a and are not exposed by the shielding portions 20b. The exposed portion 102a exposed to the exposure light becomes harder than the unexposed portion 102b, and is less soluble in a removal solution in the removal step described below.

[0040] [Moving process] 5(B), while maintaining the state in which tension is applied to the exposure mask 20, the shafts 16a and 16b are rotated in one direction to move the exposure mask 20 in the circumferential direction of the object 100 while rotating the object 100. Specifically, the rotation of the shafts 16a and 16b in one direction moves the exposure mask 20, to which tension is applied, by an integer multiple of the pitch (center-to-center distance) of the transmission portions 20a formed on the exposure mask 20.

[0041] Then, as shown in Fig. 6(B), after the shafts 16a and 16b position the unexposed portion adjacent to the exposed portion (exposed portion) of the object 100 in the irradiation area E1, they stop rotating in one direction and maintain the stopped state. That is, the exposure mask 20 maintains a state in which tension is applied by stopping the shafts 16a and 16b. For example, when five transmission portions 20a are positioned in the irradiation area E1, the shafts 16a and 16b rotate in one direction to move the tensioned exposure mask 20 by a distance five times the pitch of the transmission portions 20a.

[0042] Since the exposure mask 20 is moved by rotating the shafts 16a and 16b in one direction while maintaining a tensioned state, slippage is suppressed between the tensioned exposure mask 20 and the object 100. This suppresses the occurrence of a situation in which the exposed portion 102a cannot be formed at a desired position on the outer circumferential surface of the object 100. Here, an example of a means for rotating the shafts 16a and 16b in one direction is to rotate the shaft 16a with high torque and to rotate the shaft 16b while applying a load (a load that makes it difficult to rotate) to the shaft 16b.

[0043] Then, after applying tension to the exposure mask 20 by the above-mentioned application process, the irradiation process and the movement process are repeated multiple times while maintaining the application of tension to the exposure mask 20, thereby forming the exposed portion 102a around the entire circumference of the object 100.

[0044] Here, the final moving step and irradiation step will be described. The final step is the last step executed to form the exposed portion 102a over the entire circumference of the object 100.

[0045] In the final movement step, the shafts 16a and 16b are rotated in one direction to move the tensioned exposure mask 20 while maintaining the tension, and rotate the object 100. Then, as shown in Fig. 7(A), the unexposed portion of the object 100 is positioned in the irradiation area E1.

[0046] In the final tension application step, tension in the circumferential direction of the object 100 is applied to the exposure mask 20 , and a portion of the exposure mask 20 is in contact with the outer circumferential surface of the object 100 .

[0047] As for the portion of the tensioned exposure mask 20 that is to be brought into contact with the outer peripheral surface of the object 100, the exposure mask 20 in a portion where a plurality of transmission portions 20a are formed, including the transmission portion 20a at the other end side (right side in the figure) in the device width direction shown in Fig. 3, is brought into contact with the outer peripheral surface of the object 100. Specifically, as shown in Fig. 7(A), in the irradiation region (region E1 shown in the figure) where the exposure light is irradiated, the exposure mask 20 in a portion where a plurality of transmission portions 20a are formed, including the transmission portion 20a at the other end side (right side in the figure) in the device width direction shown in Fig. 3 (tensioned exposure mask 20) ​​is brought into contact with the outer peripheral surface of the object 100.

[0048] Furthermore, in the final irradiation step, as shown in Fig. 7(B), using the irradiation unit 50 (see Fig. 5), exposure light is irradiated toward the part of the object 100 where the transparent portion 20a of the tensioned exposure mask 20 is located. Then, in the photoresist 102 applied to the outer circumferential surface of the object 100, an exposed portion 102a (102a-2 in Fig. 7(B)) is formed by the exposure light that has passed through the transparent portion 20a.

[0049] Here, in the exposure mask 20, as shown in FIG. 3, the distance L1 from the edge 21a of the transparent portion 20a at the one end side in the device width direction to the edge 21b of the transparent portion 20a at the other end side in the device width direction is shorter than the circumference R1 of the target object 100.

[0050] Therefore, the exposed portion 102a exposed by the exposure light passing through the transmitting portion 20a on the most one end side is called the exposed portion 102a-1, and the exposed portion 102a exposed by the exposure light passing through the transmitting portion 20a on the most other end side is called the exposed portion 102a-2. An unexposed portion 102b (hereinafter, "unexposed portion 102b-1") is formed between the exposed portion 102a-1 and the exposed exposed portion 102a-2, as shown in FIG. 7(B).

[0051] The above-mentioned distance L1 (see FIG. 3) is determined so that the width of this unexposed portion 102b-1 is equal to or greater than the widths of the other unexposed portions 102b. In other words, the distance L1 (see FIG. 3) is determined so that the length in the circumferential direction of the object 100 in the unexposed portion 102b-1 formed in only one place in the photoresist 102 applied to the outer circumferential surface of the object 100 is equal to or greater than, equal to or similar to, the other unexposed portions 102b formed in the photoresist 102 in plurality and having the same, equivalent or similar circumferential lengths of the object 100.

[0052] Furthermore, since the distance L1 from the edge 21a of the transmitting portion 20a on the furthest side in the device width direction to the edge 21b of the transmitting portion 20a on the furthest side in the device width direction is shorter than the perimeter R1 of the object 100, the exposed portion 102a-1 exposed by the exposure light passing through the transmitting portion 20a on the furthest side and the exposed portion 102a-2 exposed by the exposure light passing through the transmitting portion 20a on the furthest side do not overlap (overlap). Therefore, the widths of all the exposed portions 102a formed on the object 100 are the same, equivalent or similar.

[0053] (others) Next, a method for manufacturing a cylindrical sleeve constituting a developing device using the object 100 whose outer circumferential surface has been exposed by the exposure device 10, and a developing device including this sleeve will be described.

[0054] [Method of manufacturing the sleeve] The method for manufacturing the sleeve includes a removing step of removing the unexposed portion 102b from the object 100 on which the exposed portion 102a and the unexposed portion 102b are formed, an etching step of etching the object 100, and a peeling step of peeling off the photoresist 102. The removing step, the etching step, and the peeling step are performed in this order.

[0055] [Removal process] In the removal step, a removal liquid is used to dissolve the unexposed portion 102b of the photoresist 102 and remove it from the outer peripheral surface of the object 100. As a result, the exposed portion 102a of the photoresist 102 remains on the outer peripheral surface of the object 100, as shown in Figures 8(A) and (B).

[0056] [Etching process, peeling process] In the etching step, an etching device 200 is used to etch the portion of the target object 100 from which the unexposed portion 102b has been removed.

[0057] 9, the etching device 200 includes a plurality of cylindrical rollers 202 arranged at intervals in the horizontal direction, an upper shower 204a arranged above the rollers 202, and a lower shower 204b arranged below the rollers 202. The length of the rollers 202 in the axial direction (the direction from the front to the rear of the paper in FIG. 9) is set to a length that allows the target object 100 to be placed between two rollers 202 adjacent to each other in the left-right direction of the paper in FIG. 9.

[0058] Then, a plurality of objects 100 are placed on adjacent rollers 202. In this state, the rollers 202 are rotated, so that the objects 100 are rotated in conjunction with the rollers 202. Furthermore, an etching solution is discharged from the upper shower 204a and the lower shower 204b toward the rotating objects 100 for a predetermined period of time.

[0059] In the peeling step, the exposed portion 102a remaining on the outer circumferential surface of the object 100 is peeled off from the outer circumferential surface of the object 100 and removed.

[0060] 10, a plurality of axially extending groove portions 104 formed by etching are formed side by side in the circumferential direction of the target object 100 on the outer peripheral surface of the target object 100. Furthermore, a non-groove portion 106 is formed on the outer peripheral surface of the target object 100, the non-groove portion 106 being sandwiched between a pair of adjacent groove portions 104 and extending in the axial direction. In this manner, a cylindrical sleeve for use in a developing device is manufactured.

[0061] As described above, the widths of the exposed portions 102a formed on the target object 100 are all the same, equivalent, or similar (see FIG. 7(B)). Therefore, the widths of the non-groove portions 106 formed on the outer circumferential surface of the sleeve 136 are also all the same, equivalent, or similar.

[0062] As described above, the width of the unexposed portion 102b-1 formed between the first exposed portion 102a-1 and the last exposed portion 102a-2 is equal to or greater than the width of the other unexposed portions 102b. Therefore, among the grooves 104 formed on the outer circumferential surface of the sleeve 136, the width of the groove 104 (groove 104-1 shown in the figure) corresponding to the unexposed portion 102b-1 is equal to or greater than the width of the other grooves 104.

[0063] [Developing device] -Developing device configuration- 11, the developing device 130 includes a developing roll 132 disposed opposite an image carrier 160. The developing device 130 also includes an agitating and conveying auger 140 disposed below the developing roll 132 and conveying the developer G supplied to the developing roll 132, and an agitating and conveying auger 142 disposed adjacent to the agitating and conveying auger 140. The developing device 130 also includes a housing 144 that accommodates the agitating and conveying auger 140, the agitating and conveying auger 142, and the developer G therein.

[0064] The developing roll 132 also includes a magnetic roll 134 and a sleeve 136 that is manufactured using the object 100 and has a cylindrical shape in which the magnetic roll 134 is housed and that rotates in the circumferential direction of the magnetic roll 134 .

[0065] - Function of the developing device - When the electrostatic latent image formed on the image carrier 160 is developed using the developing device 130, the developer G stands up in the grooves 104 of the sleeve 136 as shown in Fig. 12. Then, the electrostatic latent image formed on the image carrier 160 is developed into a toner image by the toner contained in the standing developer G.

[0066] However, the amount of developer G that stands up (the height of the bristles from the surface of the sleeve 136) is smaller in the non-groove portions 106 than in the groove portions 104. Moreover, the widths of the non-groove portions 106 formed on the outer peripheral surface of the sleeve 136 according to this embodiment are all the same, equivalent or similar. In other words, the widths of the non-groove portions 106 that have a smaller amount of bristles are all the same, equivalent or similar. Moreover, the width of groove portion 104-1 formed on the outer peripheral surface of the sleeve 136 is the same or greater, equivalent or similar or greater than the widths of the other groove portions 104.

[0067] Here, the sleeve 236 according to the comparative embodiment will be described. In the sleeve 236 according to the comparative embodiment, as shown in FIG. 13, the width of one non-groove portion 206-1 (the length in the circumferential direction of the sleeve 236) is wider than the width of the other non-groove portions 206. Therefore, the distance between one developer G standing up in the two groove portions across the non-groove portion 206-1 and the other developer G (the length in the circumferential direction of the sleeve 236) is longer than the other portions. In other words, the width of the non-groove portion 206 with a small amount of standing up is wider in a part. Therefore, when the sleeve 236 according to the comparative embodiment is used, density unevenness occurs in the toner image formed on the image carrier 160.

[0068] In contrast, when the sleeve 136 according to the present embodiment is used, the widths of the non-groove portions 106, which have a small amount of bristles, are all the same, equivalent, or similar, as shown in Fig. 12. Therefore, when the sleeve 136 according to the present embodiment is used, the occurrence of density unevenness in the toner image formed on the image carrier 160 is suppressed compared to when the sleeve 236 according to the comparative embodiment is used.

[0069] Among the grooves 104 formed on the outer peripheral surface of the sleeve 136, the width of the groove 104-1 corresponding to the unexposed portion 102b-1 is equal to or greater than, equal to or similar to, the other grooves 104. As described above, the developer G has a large amount of spikes in the grooves 104 of the sleeve 136. Therefore, the deterioration of the toner transport performance is suppressed compared to the case where the width of the groove 104-1 corresponding to the unexposed portion 102b-1 is narrower than the width of the other grooves 104.

[0070] Here, from the viewpoint of suppressing a decrease in the toner transport performance, the width of groove portion 104-1 may be the same or greater than the width of the other groove portions 104, or similar or greater than the width of the other groove portions 104. From the viewpoint of suppressing a variation in the toner transport performance, the width of groove portion 104-1 may be no more than twice the width of the other groove portions 104, and preferably no more than 1.5 times the width.

[0071] (summary) As described above, in the exposure apparatus 10, tension in the circumferential direction of the object 100 is applied to the exposure mask 20. Therefore, by pressing a part of the exposure mask against the outer peripheral surface of the object, the exposure mask 20 is prevented from slipping relative to the outer peripheral surface of the object 100, compared to the case where a part of the exposure mask is wrapped around the outer peripheral surface of the object. Therefore, it is possible to prevent a deviation between the positional relationship of the transmission portions 20a in the exposure mask 20 and the positional relationship of the exposure portions 102a in the object 100. In other words, the exposure portions 102a can be formed in the object 100 in correspondence with the positions of the transmission portions 20a in the exposure mask 20.

[0072] In the exposure device 10, the distance L1 from the edge 21a of the transmission portion 20a on the most one end side in the width direction formed on the exposure mask 20 to the edge 21b of the transmission portion 20a on the most other end side in the width direction is shorter than the circumferential length R1 of the object 100. As a result, the exposed portion 102a exposed by passing through the transmission portion 20a on the most one end side in the width direction and the exposed portion 102a exposed by passing through the transmission portion 20a on the most other end side in the width direction are spaced apart in the circumferential direction of the object 100. As a result, the width of the exposed portion 102a is prevented from becoming wider than when at least a part of the exposed portion exposed first and at least a part of the exposed portion exposed last overlap. In other words, it is possible to prevent the variation in the width of the exposed portion 102a formed on the exposure mask 20 from becoming large.

[0073] Furthermore, in the exposure tool 10, with the object 100 disposed inside the exposure mask 20, the exposure mask 20 is U-shaped with a width W3 of the opening formed between the pair of shaft bodies 12 narrower than a width W4 of the base end formed protruding outward from between the pair of shaft bodies 12. This increases the amount of wrapping of the exposure mask 20 around the object 100 compared to when the exposure mask is U-shaped with the opening width wider than the base end width when viewed from the depth direction of the tool. In other words, the contact area of ​​the exposure mask 20 with respect to the outer circumferential surface of the object 100 can be increased, thereby suppressing slippage between the object 100 and the exposure mask 20.

[0074] In the exposure apparatus 10, the exposure mask 20 passes between the center of the shaft body 12a and the center of the object 100 as viewed from the depth direction of the apparatus, and passes between the center of the shaft body 12b and the center of the object 100. Therefore, compared to a case where the exposure mask is arranged so as to cover the pair of shaft bodies 12 and the object 100 from the outside, the outer diameter of the shaft body 12 can be increased while ensuring the amount of winding of the exposure mask 20 around the object 100. In other words, since the outer diameter of the shaft body 12 can be increased, the winding tendency of the exposure mask 20 wound around the shaft body 12 can be reduced. Furthermore, since the outer diameter of the shaft body 12 can be increased, the amount of movement of the exposure mask 20 per rotation of the shaft body 12 can be increased.

[0075] Furthermore, in the exposure method using the exposure apparatus 10, tension in the circumferential direction of the object 100 is applied to the exposure mask 20. Therefore, by pressing a part of the exposure mask against the outer peripheral surface of the object, slippage of the exposure mask 20 relative to the outer peripheral surface of the object is suppressed compared to the case where a part of the exposure mask is wrapped around the outer peripheral surface of the object.

[0076] Although the present invention has been described in detail with respect to a specific embodiment, it is clear to those skilled in the art that the present invention is not limited to the embodiment, and various other embodiments are possible within the scope of the present invention. For example, in the above embodiment, the exposure mask 20 has a U-shaped opening with a width W3 formed between the pair of shaft bodies 12 that is narrower than the width W4 of the base end formed by protruding outward from between the pair of shaft bodies 12, but the width W3 may be wider than the width W4. In this case, the effect of the width W3 being narrower than the width W4 is not achieved.

[0077] In the above embodiment, the exposure mask 20 passes between the center of the shaft body 12a and the center of the object 100, and between the center of the shaft body 12b and the center of the object 100, as viewed from the device depth direction, but the exposure mask may be arranged so as to cover the pair of shaft bodies and the object from the outside. In this case, the effect of the exposure mask 20 passing between the center of the shaft body 12a and the center of the object 100, and between the center of the shaft body 12b and the center of the object 100, is not achieved.

[0078] In addition, in the above embodiment, in the tension application process, shaft 16a is rotated in one direction and shaft 16b is rotated in the other direction to apply tension to exposure mask 20, but tension may also be applied to exposure mask 20 by rotating only shaft 16a.

[0079] In the above embodiment, a cylindrical sleeve member is used as an example of the object 100 having a circular cross section and a photoresist applied to the outer peripheral surface, but the present invention is not limited to this. In other words, the object 100 may be cylindrical as long as it has a circular cross section. [Explanation of symbols]

[0080] 10 Exposure equipment 12 Axial body 12a Shaft body (an example of one shaft body) 12b Shaft (an example of another shaft) 20 Exposure mask 20a Transparent part 21a Edge 21b Edge 50 Irradiation unit 100 Objects

Claims

1. A pair of shaft bodies whose axes are arranged in parallel and are rotatable; an exposure mask having one end in the width direction fixed to one of the shafts and a portion wrapped around the other shaft, the other end in the width direction fixed to the other shaft and a portion wrapped around the other shaft, the exposure mask having a plurality of axially extending light-transmitting portions arranged in the width direction at similar intervals, the exposure mask being partially wrapped around the outer peripheral surface of an object having a circular cross section, the distance from the edge of the light-transmitting portion closest to one end in the width direction to the edge of the light-transmitting portion closest to the other end in the width direction being shorter than the circumference of the object; an irradiation unit that irradiates a portion of the object where the transmission portion of the exposure mask is located with light for exposing the object; Equipped with By rotating the shaft, tension in the circumferential direction of the object is applied to the exposure mask, and the object is rotated while the exposure mask moves, and the object is exposed by the irradiation section.

2. When the exposure mask is wrapped around an object, the exposure mask has a U-shape, as viewed in the axial direction, in which a width of an opening formed between the pair of shaft bodies is narrower than a width of a base end formed by protruding outward from between the pair of shaft bodies.

2. The exposure apparatus according to claim 1.

3. the exposure mask passes between a center of one of the shaft bodies and a center of the object, and passes between a center of the other of the shaft bodies and a center of the object, when viewed from the axial direction; The exposure apparatus according to claim 2 .

4. An exposure method for exposing an outer peripheral surface of an object having a circular cross section using the exposure apparatus according to any one of claims 1 to 3, comprising the steps of: a mounting step of mounting the exposure mask, the exposure mask having one end in a width direction fixed to one of the shaft bodies and the other end in a width direction fixed to the other shaft body, on the object so that the exposure mask is wrapped around a part of the object; an applying step of applying tension in a circumferential direction of the object to the exposure mask by rotating at least one of the pair of shaft bodies; an irradiation step of irradiating a portion of the exposure mask to which tension in the circumferential direction of the object is applied, where the transmission portion is located, with light for exposing the object; a moving step of rotating the pair of shaft bodies to move the exposure mask and rotate the object, thereby winding the exposure mask, to which tension has been applied, around an unexposed portion of the object, The exposure method includes repeating the irradiation step and the moving step to expose the entire circumference of the object.

5. In the application step, one of the shaft bodies is rotated in one direction, and the other of the shaft bodies is rotated in the other direction. The exposure method according to claim 4.

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