Coating device, film forming method, and method for manufacturing solid oxide electrochemical cell

Abstract

To provide a coater which can coat a substrate rotating around a predetermined axis, particularly, a flexed substrate rotating circumferentially, with slurry in a predetermined dimension, a deposition method and a method of manufacturing a solid oxide type electric chemical cell.SOLUTION: A coater 1 can determine a first eccentric amount on the basis of a first distance measured by a first distance measurement instrument 37, and a second eccentric amount on the basis of a second distance measured by a second distance measurement instrument 39. Since the position of a nozzle 53 is moved on the basis of the first eccentric amount and the second eccentric amount, slurry can be discharged out of the nozzle 53 with the distance between a substrate 3 and the nozzle 53 approximately constant. Thus, the substrate 3 can be coated with slurry so as to make a desired thickness or width even when the substrate 3 is flexed in the second axial direction or the third axial direction as viewed from the first axial direction, for example.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The present disclosure relates to a coating apparatus, a film forming method, and a method for manufacturing a solid oxide electrochemical cell. [Background technology]

[0002] Conventionally, a known solid oxide fuel cell is one in which a large number of unit cells, which are structural units each having a fuel electrode, a solid electrolyte membrane, and an air electrode, are arranged side by side on the outer surface of a porous cylindrical substrate, with adjacent unit cells connected by an interconnector or the like.

[0003] When manufacturing this type of solid oxide fuel cell, it is necessary to apply the material of the fuel cell unit cell (i.e., slurry) to the surface of the substrate, and the slurry is applied using a dedicated application device (see Patent Document 1).

[0004] Specifically, a nozzle was placed facing a substrate, and the substrate was rotated while the nozzle was applying the slurry to the surface of the substrate. During application of the slurry, the distance between the substrate and the nozzle was adjusted using a rotating roller, which is a contact sensor, in order to ensure a uniform thickness of the slurry.

[0005] Specifically, a rotating roller is attached to the fixed member to which the nozzle is fixed so as to extend toward the substrate, and the fixed member (and therefore the rotating roller) is biased toward the substrate. The tip of the rotating roller is in contact with the surface of the substrate, so the distance between the nozzle (specifically, the discharge port) and the tip of the rotating roller is constant.

[0006] Therefore, when the substrate rotates, the rotating roller moves following the surface of the substrate, thereby keeping the distance between the nozzle and the surface of the substrate constant, thereby making the thickness of the coating film formed by the slurry discharged from the nozzle constant. [Prior art documents] [Patent documents]

[0007] [Patent Document 1] JP 2016-213144 A Summary of the Invention [Problem to be solved by the invention]

[0008] However, in a contact sensor such as the rotating roller described above, the distance ΔZ between the base P1 and the nozzle P2 in the vertical direction (Z-axis direction) can be adjusted to some extent as shown in Fig. 16A, but if the base P1 is curved not only in the Z-axis direction but also in the Y-axis direction as shown in Fig. 16B, the distance ΔZ between the base P1 and the nozzle P2 in the Z-axis direction changes as the base P1 rotates. Also, the distance ΔY between the axis center (X) of the base P1 and the nozzle P2 in the Y-axis direction changes.

[0009] Specifically, when the base P1 is curved in not only one direction (e.g., Z-axis direction) but also another direction (e.g., Y-axis direction) as viewed from the axial direction (X-axis direction), even if the rotating roller P3 is in contact with the base P1, the distance ΔZ from the discharge port of the nozzle P2 to the surface of the base P1 (i.e., the uppermost surface of the base P1) changes as the base P1 rotates. In addition, the distance ΔY in the Y-axis direction between the axial center of the base P1 and the nozzle P2 also changes. This causes a problem in that it is difficult to apply the slurry to the surface of the base P1 with the same thickness.

[0010] The present disclosure has been made to solve the above-mentioned problems, and an object of the present disclosure is to provide an application device, a film formation method, and a method for manufacturing a solid oxide electrochemical cell that are capable of applying a slurry in a desired size onto a substrate that rotates around a predetermined axis, in particular onto a curved substrate that rotates in a circumferential direction. [Means for solving the problem]

[0011] (1) A first aspect of the present disclosure relates to a coating device that rotates a substrate extending in a first axial direction about a first axis to coat a slurry on an outer peripheral surface of the substrate. Note that the outer peripheral surface of the substrate may be a radial outer peripheral surface of the substrate (hereinafter the same).

[0012] The coating device includes a support mechanism, a nozzle, a detection unit, and a movement mechanism. The support mechanism is a mechanism capable of rotating the base body in a circumferential direction while supporting both ends of the base body in the first axial direction. Note that the circumferential direction is the direction around the first axis (hereinafter the same).

[0013] The nozzle is a member that ejects the slurry to be applied to the substrate, that is, the nozzle is a member that ejects and applies the slurry to the outer peripheral surface of the substrate. The detection unit detects a first amount of eccentricity of the base in a second axial direction perpendicular to the first axis, and a second amount of eccentricity of the base in a third axial direction that passes through the intersection of the first axis and the second axis and is perpendicular to the first axis.

[0014] The movement mechanism is a mechanism capable of moving the position of the nozzle based on the first amount of eccentricity and the second amount of eccentricity so that the slurry is discharged from the nozzle while keeping the distance between the base and the nozzle approximately constant.

[0015] In this first aspect, since the position of the nozzle can be moved based on the first amount of eccentricity and the second amount of eccentricity, the slurry can be discharged from the nozzle while keeping the distance between the base and the nozzle substantially constant.

[0016] This allows the slurry to be applied to a desired dimension (e.g., thickness or width) even when the substrate is curved in the second axis direction or the third axis direction as viewed from the first axis direction. For example, the slurry can be applied to a desired thickness (e.g., uniform thickness) and a desired width (e.g., uniform width). In other words, when forming a film using a slurry, a remarkable effect is achieved in that the desired film formation dimensions (e.g., film width and film thickness) can be achieved more stably than before.

[0017] In this disclosure, the first axis direction refers to the direction in which the first axis extends (i.e., the axial direction), the second axis direction refers to the direction in which the second axis extends, and the third axis direction refers to the direction in which the third axis extends (same below).

[0018] The substrate refers to an object to which the slurry is applied (hereinafter the same). Therefore, the substrate may be, for example, a single member (for example, the base in the 18th and 24th aspects described below) or a member having a layer of a fired or unfired material on the outer peripheral surface of the base. In other words, the substrate is not limited to a single fired material, but may be one having other components (for example, a coating film or a fired coating film) on the surface of a base member such as a fired material.

[0019] Therefore, coating onto the outer peripheral surface of a substrate not only includes direct coating onto the outer peripheral surface of a substrate made of a fired product or the like, but also includes, when there is another component (such as a coating film or a fired product of a coating film) on the surface of a base member (e.g., a base), coating the slurry onto this component to form a coating film (the same applies below).

[0020] Moreover, the term "approximately constant distance" means that some degree of error is permitted when the distance is constant, and it is sufficient if the error is within a range of, for example, 500 μm or less (the same applies below). (2) In a second aspect of the present disclosure, a configuration for maintaining a substantially constant peripheral speed of the outer peripheral surface of the base relative to the nozzle when the base is rotating may include a nozzle arranged to apply slurry along the second axial direction, and a configuration for driving a moving mechanism to control the position of the nozzle so that a portion of the nozzle that ejects the slurry faces the vertex of the outer peripheral surface of the base that is closest to the nozzle.

[0021] With this configuration, even if the base body is curved, for example, in the second axis direction or the third axis direction when viewed from the first axis direction, the slurry can be easily applied to obtain the desired dimensions (e.g., thickness and width).

[0022] Note that an approximately constant circumferential speed means that some degree of error is allowed when the circumferential speed is constant; for example, the circumferential speed variation should be within 20% of the target circumferential speed, and the error in terms of rotational angle position should be within R15° (same below).

[0023] (3) In a third aspect of the present disclosure, the detection unit may include a first detection unit that detects the first amount of eccentricity and a second detection unit that detects the second amount of eccentricity. Here, it is illustrated that separate detectors (that is, first and second detectors) may be used as the detectors to detect different amounts of eccentricity (that is, first and second amounts of eccentricity).

[0024] This makes it possible to detect the first amount of eccentricity and the second amount of eccentricity simultaneously when the base body is rotated. (4) In the fourth aspect of the present disclosure, a detection control unit may be provided that detects the first amount of eccentricity and the second amount of eccentricity when the slurry is applied to the base body while the base body is rotated in the circumferential direction.

[0025] In this way, by simultaneously carrying out the process of applying the slurry and the process of detecting the first amount of eccentricity and the second amount of eccentricity, the work can be carried out efficiently. (5) In the fifth aspect of the present disclosure, the first amount of eccentricity and the second amount of eccentricity may be detected for each predetermined rotation angle of the base body.

[0026] In this way, by detecting the first amount of eccentricity and the second amount of eccentricity for each predetermined rotation angle, the curved state of the base body can be obtained with high accuracy with the minimum necessary amount of information processing. (6) A sixth aspect of the present disclosure relates to an application device that applies a slurry to a radially outer peripheral surface of a base extending in a first axial direction.

[0027] The coating device includes a support mechanism, a nozzle, a detection unit, a calculation unit, and a movement mechanism. The support mechanism is a mechanism capable of rotating the base body in the circumferential direction while supporting both end portions of the base body in the first axial direction.

[0028] The nozzle is a member that ejects the slurry to be applied to the substrate. The detector detects a first eccentricity of the base body in a second axial direction perpendicular to the first axis at a first phase in rotation.

[0029] The calculation unit determines, based on the first amount of eccentricity in the first phase, a second amount of eccentricity of the base in the third axial direction corresponding to a second phase obtained by shifting the first phase by an angle between the second axis and a third axis that passes through the intersection of the first axis and the second axis and is perpendicular to the first axis.

[0030] The movement mechanism is a mechanism capable of moving the position of the nozzle based on the first amount of eccentricity and the second amount of eccentricity so that the slurry is discharged from the nozzle while keeping the distance between the base and the nozzle approximately constant.

[0031] In this sixth aspect, the position of the nozzle can be moved based on the first eccentricity amount and the second eccentricity amount (calculated from the first eccentricity amount), so that the slurry can be ejected from the nozzle while keeping the distance between the base and the nozzle approximately constant.

[0032] As a result, even if the substrate is curved in the second or third axis direction as viewed from the first axis direction, the slurry can be applied to a desired thickness (e.g., uniform thickness) and a desired width (e.g., uniform width). In other words, when forming a film using a slurry, a remarkable effect is achieved in that the desired film dimensions (e.g., film width and film thickness) can be achieved more stably than before.

[0033] Furthermore, since the first amount of eccentricity is detected by the detection section and the second amount of eccentricity can be calculated from the first amount of eccentricity, there is an advantage in that the configuration for detecting the amount of eccentricity can be simplified. (7) In a seventh aspect of the present disclosure, a configuration for maintaining a substantially constant peripheral speed of the outer peripheral surface of the base relative to the nozzle when the base is rotating may include a nozzle arranged to apply slurry along the second axial direction, and a configuration for driving a moving mechanism to control the position of the nozzle so that a portion of the nozzle that ejects the slurry faces the vertex of the outer peripheral surface of the base that is closest to the nozzle.

[0034] With this configuration, as in the second aspect, even if the base is curved, for example, in the second axis direction or the third axis direction when viewed from the first axis direction, the slurry can be easily applied to obtain the desired dimensions (e.g., thickness and width).

[0035] (8) In an eighth aspect of the present disclosure, a detection control unit may be provided that detects the first amount of eccentricity when the slurry is applied to the base body while the base body is rotated in the circumferential direction. In this way, by simultaneously performing the process of applying the slurry and the process of detecting the first amount of eccentricity, the work can be performed efficiently.

[0036] (9) In a ninth aspect of the present disclosure, the detection control unit may detect the first amount of eccentricity for each rotation angle of the base body. In this way, by detecting the first amount of eccentricity for each predetermined rotation angle using the detection control unit, the curved state of the base body can be found with high accuracy with the minimum necessary amount of information processing.

[0037] (10) In a tenth aspect of the present disclosure, the second axis (i.e., the second axial direction) and the third axis (i.e., the third axial direction) may be approximately perpendicular to each other. Here, a preferred positional relationship between the second axis and the third axis is illustrated, which allows the curvature of the base body to be easily understood when the base body is viewed from the first axial direction.

[0038] In this case, "approximately perpendicular" means that some degree of error is allowed other than perpendicular, and for example, the angle of deviation from perpendicular may be within a range of ±1°. In other words, the range of 90°±1° can be adopted as "approximately perpendicular."

[0039] (11) In an eleventh aspect of the present disclosure, the detection unit may include a non-contact sensor. Here, a sensor suitable for the detection unit is exemplified. A non-contact sensor is suitable because it is less likely to affect the substrate.

[0040] Here, when the detection unit includes a first detection unit and a second detection unit, at least one non-contact sensor can be used as the detection unit. Note that both the first detection unit and the second detection unit may include a non-contact sensor. Also, when there is only one detection unit, one non-contact sensor can be used as the detection unit.

[0041] (12) In a twelfth aspect of the present disclosure, the non-contact sensor may include a light-projecting unit arranged opposite the base, which irradiates the base with a laser, and a light-receiving unit which receives light reflected by the base from the laser.

[0042] Here, a suitable configuration for a non-contact sensor is shown. The light projecting unit irradiates the substrate with a laser (i.e., laser light), and the light receiving unit receives the light reflected by the substrate. This makes it possible to determine the distance between the non-contact sensor and the substrate.

[0043] (13) In a thirteenth aspect of the present disclosure, the non-contact sensor may include a light-projecting unit that is disposed on either side of the base and that irradiates the base and its surroundings with a laser, and a light-receiving unit that receives transmitted light of the laser that has passed through the surroundings of the base.

[0044] Here, a suitable configuration for a non-contact sensor is shown. The light projecting unit irradiates a laser onto the substrate and its surroundings, and the light receiving unit receives the transmitted light of the laser that has passed through the surroundings of the substrate. This makes it possible to determine the position of the substrate and its outer diameter within the detection range of the non-contact sensor.

[0045] (14) In the fourteenth aspect of the present disclosure, the detection range of the non-contact sensor may be equal to or greater than a maximum amplitude of the base body when the base body is rotated. Here, the detection range of a non-contact sensor is shown as an example. With this detection range, even if the curvature of the base body is large, the curvature of the base body can be reliably detected.

[0046] Here, "maximum swing width of the base body" means the dimension of deviation between a pair of base bodies located at the farthest position when the base body is rotated around a first axis and viewed from a direction perpendicular to the first axis and the base body swings to the maximum about the first axis.

[0047] For example, when a non-contact sensor of the 12th aspect is used, when the base body is swung left and right (maximum swing) as shown in Figure 6, it is the distance (ΔH) from the top end of the outer circumference circle of the base body on the left side of Figure 6 to the top end of the outer circumference circle of the base body on the right side.

[0048] Furthermore, for example, in the case where a non-contact sensor of the 13th aspect is used, when the base body swings up and down (when swinging to the maximum) as shown in FIG. 15, it is the distance (ΔD) from the upper end of the outer circumference of the upper base body in FIG. 15 to the upper end of the outer circumference of the lower base body.

[0049] (15) In a fifteenth aspect of the present disclosure, the coating apparatus may further include a nozzle control unit that controls the position of the nozzle to coat the slurry so that a tip direction of the nozzle is perpendicular to a tangent line on the coating surface of the substrate.

[0050] In this way, by controlling the position of the nozzle so that the tip direction of the nozzle (i.e., the direction in which the slurry is discharged) and the tangent line on the coating surface of the substrate are perpendicular to each other, it is possible to keep the coating state of the slurry constant. Therefore, it is easy to make the thickness and width of the coating film of the slurry to the desired thickness and width (for example, a constant thickness and width).

[0051] (16) A sixteenth aspect of the present disclosure relates to a film formation method including rotating a substrate extending in a first axial direction about the first axis and applying a slurry from a nozzle onto an outer peripheral surface of the substrate to form a film on the outer peripheral surface.

[0052] This film forming method includes a coating step. In the coating step, the slurry is discharged from a nozzle onto the outer circumferential surface of the base while the base is supported at both ends in the first axial direction so that the base can rotate in the circumferential direction, thereby coating the slurry.

[0053] Furthermore, in this coating process, the position of the nozzle is moved to form a film based on a first eccentricity amount of the substrate in a second axial direction perpendicular to the first axis and a second eccentricity amount of the substrate in a third axial direction passing through the intersection of the first axis and the second axis and perpendicular to the first axis, so that the slurry is ejected from the nozzle while maintaining a substantially constant distance between the substrate and the nozzle.

[0054] With such a film formation method, a film having a desired dimension (for example, thickness or width) can be formed even when the substrate is curved in the second axis direction or the third axis direction when viewed from the first axis direction.

[0055] (17) In a seventeenth aspect of the present disclosure, in order to maintain a substantially constant peripheral speed of the outer peripheral surface of the base relative to the nozzle when the base is rotating, the nozzle may be positioned to apply the slurry along the second axial direction, and the position of the nozzle may be controlled so that the portion of the nozzle that ejects the slurry faces the vertex of the outer peripheral surface of the base that is closest to the nozzle.

[0056] With this configuration, as in the second aspect, even if the base is curved, for example, in the second axis direction or the third axis direction when viewed from the first axis direction, the slurry can be easily applied to obtain the desired dimensions (e.g., thickness and width).

[0057] (18) An eighteenth aspect of the present disclosure relates to a method for producing a solid oxide electrochemical cell, using the film formation method of the sixteenth or seventeenth aspect, to produce a solid oxide electrochemical cell including a plurality of unit cells, each unit cell including a fuel electrode, a solid electrolyte membrane, and an air electrode, and an interconnector electrically connecting adjacent unit cells, on an outer peripheral surface side of a tubular base extending in a first axial direction.

[0058] This method for manufacturing a solid oxide electrochemical cell includes a coating step of rotating a substrate consisting of a base or a substrate having a fired layer on the outer peripheral surface side of the base in a circumferential direction and coating the outer peripheral surface side of the substrate with a slurry for forming at least one of a plurality of components that constitute a solid oxide electrochemical cell, including a fuel electrode, a solid electrolyte membrane, an air electrode, and an interconnector, and a firing step of firing the slurry coated on the outer peripheral surface of the substrate after the coating step.

[0059] In this coating process, for example, each of the slurries for forming the fuel electrode, the solid electrolyte membrane, and the interconnector can be coated on the base (i.e., the object to which the slurry is applied). Then, by firing these slurries, the fuel electrode, the solid electrolyte membrane, and the interconnector, which are fired layers, can be formed on the surface of the base.

[0060] In addition, in this coating step, the slurry for forming, for example, an air electrode can be applied to a substrate (i.e., a substrate to which the slurry is applied) that has layers (e.g., layers of an anode, a solid electrolyte membrane, and an interconnector) that have been fired on the outer peripheral surface of the base. Thereafter, by firing the slurry, an air electrode can be formed on the outer peripheral surface side of the substrate that has, for example, an anode, a solid electrolyte membrane, and an interconnector, so as to be in contact with, for example, the solid electrolyte membrane and the interconnector.

[0061] Furthermore, in the coating process, a first eccentricity amount of the substrate in a second axial direction perpendicular to the first axis, and a second eccentricity amount of the substrate in a third axial direction passing through an intersection of the first axis and the second axis and perpendicular to the first axis are detected.

[0062] Then, with both ends of the base in the first axial direction supported and the base rotated in the circumferential direction, the position of the nozzle that ejects the slurry is moved based on the first amount of eccentricity and the second amount of eccentricity, and the slurry is ejected from the nozzle while maintaining a substantially constant distance between the base and the nozzle, and the slurry is applied to the outer peripheral surface of the base to form a film.

[0063] With this configuration, a coating film made of the slurry can be formed on the outer peripheral surface of the substrate to a desired thickness (e.g., uniform thickness) and a desired width (e.g., uniform width). In other words, when forming a film using a slurry, a remarkable effect is achieved in that the desired film dimensions (e.g., film width and film thickness) can be achieved more stably than before.

[0064] Then, when the substrate on which the coating film thus formed is formed is fired, the dimensions (e.g., thickness and width) of each component of the single cell are stabilized, which has the advantage that the performance of power generation, electrolysis, etc. are stabilized. Note that a single cell is a structural unit including a fuel electrode, a solid electrolyte membrane, and an air electrode (hereinafter the same).

[0065] (19) In a nineteenth aspect of the present disclosure, in the coating process, while a slurry for forming components of one unit cell is being coated based on a first eccentricity amount and a second eccentricity amount of a substrate at a position where one unit cell among a plurality of unit cells is to be formed, the first eccentricity amount and the second eccentricity amount of a substrate at a position where another unit cell is to be formed may be detected.

[0066] In this way, by simultaneously carrying out the process of applying the slurry and the process of detecting the first amount of eccentricity and the second amount of eccentricity, the work can be carried out efficiently. (20) In a twentieth aspect of the present disclosure, the first amount of eccentricity and the second amount of eccentricity may be detected for each predetermined rotation angle of the base body.

[0067] In this way, by detecting the first amount of eccentricity and the second amount of eccentricity for each predetermined rotation angle, the curved state of the base body can be obtained with high accuracy with the minimum necessary amount of information processing. (21) In a twenty-first aspect of the present disclosure, in the coating step, at least one of the first amount of eccentricity and the second amount of eccentricity may be detected using a non-contact sensor.

[0068] This makes it possible to detect at least one of the first amount of eccentricity and the second amount of eccentricity when the base body is rotated. (22) In a twenty-second aspect of the present disclosure, in the coating process, at least one of the first amount of eccentricity and the second amount of eccentricity may be detected using a non-contact sensor that is arranged opposite the substrate and includes a light-projecting unit that irradiates the substrate with a laser and a light-receiving unit that receives light reflected by the substrate from the laser.

[0069] In this manner, at least one of the first amount of eccentricity and the second amount of eccentricity can be detected by the non-contact sensor using a laser. (23) In a twenty-third aspect of the present disclosure, in the coating process, at least one of the first amount of eccentricity and the second amount of eccentricity may be detected using a non-contact sensor including a light-projecting unit that irradiates the base and its surroundings with a laser, and a light-receiving unit that receives transmitted light from the laser that has passed through the surroundings of the base, and are disposed on either side of the base.

[0070] In this manner, at least one of the first amount of eccentricity and the second amount of eccentricity can be detected by the non-contact sensor using a laser. (24) A twenty-fourth aspect of the present disclosure relates to a method for producing a solid oxide electrochemical cell, using the film formation method of the sixteenth or seventeenth aspect, to produce a solid oxide electrochemical cell including a plurality of unit cells, each unit cell including a fuel electrode, a solid electrolyte membrane, and an air electrode, and an interconnector electrically connecting adjacent unit cells, on an outer peripheral surface side of a tubular base extending in a first axial direction.

[0071] This method for manufacturing a solid oxide electrochemical cell includes a coating step of rotating a substrate consisting of a base or a substrate having a fired layer on the outer peripheral surface side of the base in a circumferential direction and coating the outer peripheral surface side of the substrate with a slurry for forming at least one of a plurality of components that constitute a solid oxide electrochemical cell, including a fuel electrode, a solid electrolyte membrane, an air electrode, and an interconnector, and a firing step of firing the slurry coated on the substrate after the coating step.

[0072] In this coating process, for example, each of the slurries for forming the fuel electrode, the solid electrolyte membrane, and the interconnector can be coated on the base (i.e., the object to which the slurry is applied). Then, by firing these slurries, the fuel electrode, the solid electrolyte membrane, and the interconnector, which are fired layers, can be formed on the surface of the base.

[0073] In addition, in this coating step, the slurry for forming, for example, an air electrode can be applied to a substrate (i.e., a substrate to which the slurry is applied) that has layers (e.g., layers of an anode, a solid electrolyte membrane, and an interconnector) that have been fired on the outer peripheral surface of the base. Thereafter, by firing the slurry, an air electrode can be formed on the outer peripheral surface side of the substrate that has, for example, an anode, a solid electrolyte membrane, and an interconnector, so as to be in contact with, for example, the solid electrolyte membrane and the interconnector.

[0074] Furthermore, in the coating process, a first eccentricity amount of the substrate in a second axial direction perpendicular to the first axis is detected in a first phase of rotation, and a second eccentricity amount of the substrate in the third axial direction corresponding to a second phase obtained by shifting the first phase by an angle between the second axis and a third axis passing through an intersection of the first axis and the second axis and perpendicular to the first axis is determined based on the first eccentricity amount in the first phase.

[0075] Then, with both ends of the base in the first axial direction supported and the base rotated in the circumferential direction, the position of the nozzle that ejects the slurry is moved based on the first amount of eccentricity and the second amount of eccentricity, and the slurry is ejected from the nozzle while maintaining a substantially constant distance between the base and the nozzle, and the slurry is applied to the base.

[0076] With this configuration, a coating film made of the slurry can be formed on the outer peripheral surface of the substrate to a desired thickness (e.g., uniform thickness) and a desired width (e.g., uniform width). In other words, when forming a film using a slurry, a remarkable effect is achieved in that the desired film dimensions (e.g., film width and film thickness) can be achieved more stably than before.

[0077] Furthermore, when the substrate on which the coating film thus formed is formed is fired, the dimensions (e.g., thickness and width) of each component of the single cell become stable, which has the advantage that performance such as power generation performance and electrolysis performance becomes stable.

[0078] (25) In a twenty-fifth aspect of the present disclosure, the first eccentricity amount may be detected for each predetermined rotation angle of the base body. In this way, by detecting the first eccentricity amount for each predetermined rotation angle, the curved state of the base body can be obtained with high accuracy with a small amount of information processing.

[0079] (26) In a twenty-sixth aspect of the present disclosure, in the applying step, the first amount of eccentricity may be detected using a non-contact sensor. This makes it possible to detect the first amount of eccentricity when the base body is rotated.

[0080] (27) In a twenty-seventh aspect of the present disclosure, the detection range of the non-contact sensor may be equal to or greater than a maximum amplitude of the base body when the base body is rotated. Within this detection range, even if the curvature of the base body is large, the curvature of the base body can be reliably detected. Note that the meaning of "maximum deflection width of the base body" is the same as in the fourteenth aspect.

[0081] (28) In a twenty-eighth aspect of the present disclosure, the slurry may be applied by controlling a position of the nozzle so that a tip direction of the nozzle is perpendicular to a tangent line on the coating surface of the substrate. This brings about an effect similar to that of the fifteenth aspect.

[0082] <Each configuration of the present disclosure will be described below> The base may be a long member extending in one direction, such as a cylindrical member or a columnar member.

[0083] The substrate material may be, for example, ceramic, a material containing ceramic as the main component (i.e., the maximum content), or metal. Examples of ceramic types include alumina, zirconia, mullite, spinel, etc. In addition to ceramic, the substrate may contain other components such as glass.

[0084] The solid oxide electrochemical cell may be a solid oxide fuel cell (SOFC) or a solid oxide electrolysis cell (SOEC). The solid oxide electrochemical cell may be a device that includes a plurality of cells (single cells) that are a single unit that includes a fuel electrode, a solid electrolyte membrane, and a cathode. [Brief description of the drawings]

[0085] [Figure 1] FIG. 1 is a front view showing a coating device according to a first embodiment. [Diagram 2] 1 is a side view (left side view) of a coating apparatus according to a first embodiment as viewed from the X-axis direction. [Diagram 3] FIG. 3A is a front view showing the substrate, and FIG. 3B is a front view showing a state in which a coating film has been formed on the outer peripheral surface of the substrate. [Figure 4] FIG. 2 is a block diagram showing an electrical configuration of the coating device. [Diagram 5] 1 is an explanatory diagram showing the arrangement of a first distance measuring device and a second distance measuring device when the film coating apparatus is viewed from the X-axis direction. FIG. [Figure 6] 1 is an explanatory diagram showing the detection ranges of a first distance measuring device and a second distance measuring device when the coating apparatus is viewed from the X-axis direction. FIG. [Figure 7] FIG. 2 is an explanatory diagram showing a cross section of the dispenser taken vertically along the nozzle. [Figure 8] FIG. 4 is an explanatory diagram showing the relationship between the rotation angle and the first and second amounts of eccentricity when the base body is rotated in the first embodiment. [Figure 9] 5A to 5C are explanatory views showing a coating operation in the first embodiment in comparison with a comparative example. [Figure 10] 4 is a flowchart showing a coating process performed by the coating apparatus of the first embodiment. [Figure 11] 13 is a graph showing the relationship between the rotation angle of the base body, the first eccentricity amount, and the position of the nozzle in the Z-axis direction (second axis direction). [Figure 12] 13 is a graph showing the relationship between the rotation angle of the base body, the second eccentricity amount, and the position of the nozzle in the Y-axis direction (third axis direction). [Figure 13] FIG. 13A is a front view showing a solid oxide fuel cell according to a second embodiment, and FIG. 13B is an enlarged cross-sectional view showing a cross section of the solid oxide fuel cell taken along the X-axis. [Figure 14] FIG. 11 is an explanatory diagram showing the relationship between the rotation angle and the first and second amounts of eccentricity when the base body is rotated in the third embodiment. [Figure 15] FIG. 13 is an explanatory diagram showing an arrangement of a first distance measuring device and a second distance measuring device when the film coating apparatus is viewed from the X-axis direction in the fourth embodiment. [Figure 16] FIG. 1 is an explanatory diagram of a conventional technique. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0086] Next, embodiments of the coating apparatus, the film forming method, and the method for manufacturing a solid oxide electrochemical cell according to the present disclosure will be described. [1. First embodiment] Here, a coating device for coating a slurry onto the surface of a substrate, which is a cylindrical ceramic body (tube), will be described. [1-1. Overall configuration of coating device] As shown in Figures 1 and 2, the coating device 1 of the first embodiment is a device that rotates a substrate 3 (i.e., an object to be coated with slurry) and coats a slurry on an outer peripheral surface 3a, which is the radially outer surface of the substrate 3, to form a coating film 5 (see Figure 3).

[0087] This coating device 1 mainly comprises a support mechanism 7 that supports and rotates the base 3, a support 9 that supports the base 3 from below, a camera 11 that photographs the end of the base 3, a head unit 13 that detects the distance to the base 3 and coats the base 3, and an electronic control device 15 that controls the operation of the coating device 1.

[0088] 1, 2, etc., X, Y, and Z indicate the X-axis direction (i.e., the first axis direction), the Y-axis direction (i.e., the third axis direction), and the Z-axis direction (i.e., the second axis direction) in an orthogonal coordinate system in which the X-axis, Y-axis, and Z-axis are perpendicular to each other. Here, the Z-axis is an axis that extends in the vertical direction, and the Y-axis is an axis that extends in the horizontal direction.

[0089] Each component will be described in detail below. <Base> 3A, the base 3 is a cylindrical ceramic molded body (i.e., a tube) extending in a first axis direction (X-axis direction). The base 3 is made of ceramic such as alumina, and has dimensions, for example, a length in the X-axis direction in the range of 100 mm to 3000 mm, an outer diameter φ in the range of 2 mm to 50 mm, and an inner diameter φ in the range of 1 mm to 48 mm. The thickness (i.e., wall thickness) of the base 3 is preferably 5 mm or less, and more preferably 3 mm or less. The dimensions (e.g., outer diameter and inner diameter) of the base 3 are approximately uniform in the X-axis direction.

[0090] 3B, as described below, a coating film 5 of approximately uniform thickness is formed by a slurry on the outer peripheral surface 3a of the substrate 3. The coating film 5 is formed in an annular shape along the circumferential direction, and multiple coating films 5 are formed at intervals along the X-axis direction.

[0091] In addition, near one end of the base 3 (the left side in FIG. 3), a position mark 17 indicating the reference (X coordinate) in the X-axis direction of the base 3 is provided. <Support mechanism> As shown in FIG. 1, the support mechanism 7 includes a first gripping portion 7a on the left side in the X-axis direction in FIG. 1 and a second gripping portion 7b on the right side.

[0092] The first gripping portion 7a grips one end side (hereinafter referred to as the tip side) of the base body 3, and rotates the base body 3 in the circumferential direction (the direction of arrow A in FIG. 2) around the X-axis, which is the central axis, by a base rotation driving portion 21 (see FIG. 4) equipped with a motor (not shown) or the like.

[0093] The second gripping portion 7b rotatably holds the other end side (hereinafter referred to as the rear end side) of the base body 3. Note that the second gripping portion 7b simply supports the rear end side of the base body 3 so that it can freely rotate.

[0094] That is, the base body 3 rotates around one rotation axis (i.e., the central axis) while both ends in the X-axis direction are held by the first and second holding parts 7a and 7b. This rotation axis coincides with the first axis of the base body 3 (see X in FIG. 2).

[0095] <Support> As shown in Fig. 1, a pair of supports 9 are provided in the left-right direction of Fig. 1. The supports 9 are disposed so as to extend upward from a base 23.

[0096] As shown in FIG. 2, the upper end of the support 9 is branched into a Y shape, and rollers 25a and 25b are provided on the upper surface sides of the branched portions 9a and 9b, respectively. Therefore, the substrate 3 placed on the rotating rollers 25a and 25b is rotatable in the direction of the arrow A.

[0097] <Camera> As shown in FIG. 1, a camera (eg, a CCD camera) 11 is disposed so as to capture an image of the tip side of the substrate 3 from above.

[0098] Since the position of the camera 11 is fixed, the position (X coordinate) of the position mark 17 can be obtained from the image captured by the camera 11. Therefore, using this position mark 17 as a reference, it is possible to determine the position (X coordinate) in the X-axis direction for detecting the amount of eccentricity of the substrate 3, the position (X coordinate) for forming the coating film 5, and the like.

[0099] <Head section> 1, the head unit 13 is equipped with an X-axis driving unit 29. The head unit 13 is moved in the X-axis direction along a guide rail 27 arranged along the X-axis direction by the X-axis driving unit 29. In other words, the X-axis driving unit 29 is equipped with a motor and gears (not shown), and the head unit 13 itself can be moved in the X-axis direction by the motor and gears.

[0100] As shown in FIG. 2, the head portion 13 includes a base 31 extending in the Y-axis direction (i.e., the third axis direction) and an extension portion 33 extending downward from an end portion of the base 31 (the right end portion in FIG. 2). Furthermore, as described in detail later, the head unit 13 is equipped with a dispenser 35 for applying slurry, a first distance measuring device 37 for measuring the distance in a vertical direction (here, the Z-axis direction; the second axis direction) relative to the base 3, and a second distance measuring device 39 for measuring the distance in a horizontal direction (here, the Y-axis direction) relative to the base 3.

[0101] The first distance measuring device 37 is disposed above the rotation axis in the vertical direction, and the second distance measuring device 39 is disposed to the right of the rotation axis in the horizontal direction. <Electronic control device> As shown in FIG. 4, the electronic control device 15 is a calculation device that includes a well-known microcomputer as its main component.

[0102] To this electronic control device 15, the camera 11, a first distance measuring device 37, a second distance measuring device 39, an X-axis driving unit 29, and a base body rotation driving unit 21 are connected. Furthermore, as described later, a dispenser moving mechanism 41 that moves the dispenser 35 in the Z-axis direction and the Y-axis direction, and a dispenser application driving unit 43 that causes the dispenser 35 to eject slurry are connected.

[0103] In addition, the electronic control device 15 functionally comprises a calculation unit 45 that performs various calculations, a control unit 47 that controls the driving of actuators such as motors based on the results of the calculations, etc., and a memory 49 that stores various data, etc.

[0104] As described below, the control unit 47 functionally includes a detection control unit 51 that detects the distance from the base 3, and a nozzle control unit 55 that controls the position of a nozzle 53 of the dispenser 35 (see FIG. 7).

[0105] A personal computer (PC) 57 is connected to the electronic control device 15, and application position data stored in the PC 57 can be read and application can be performed as described below. [1-2. Head section] Next, the configuration of the head unit 13 will be described in detail.

[0106] As shown in FIGS. 1 and 2, the head unit 13 includes a dispenser 35, a first distance measuring device 37, and a second distance measuring device 39. <First distance measuring device and second distance measuring device> The first distance measuring device 37 and the second distance measuring device 39 are non-contact sensors that use a laser to measure the distance between themselves and an object to be measured.

[0107] This non-contact sensor is a reflective sensor that irradiates a laser (i.e., laser light) onto the surface of the measurement target and measures the distance between the sensor and the surface using the light reflected by the surface. This will be explained in detail below.

[0108] 4, the first distance measuring device 37 is provided with a light projecting unit 37a that irradiates a laser and a light receiving unit 37b that receives the laser light reflected by the surface of the base 3, both of which are disposed opposite the base 3. Similarly, the second distance measuring device 39 is provided with a light projecting unit 39a and a light receiving unit 39b.

[0109] As shown in Fig. 5, first distance measuring device 37 and second distance measuring device 39 are arranged so that the irradiation directions of their lasers are perpendicular to each other. That is, θ shown in Fig. 5 is 90°. In detail, the first distance measuring device 37 is disposed above the base 3, and irradiates the base 3 with a laser in the direction of the rotation axis at the bottom of Fig. 5, i.e., downward in the vertical direction (Z-axis direction). This makes it possible to obtain the distance (first distance) between the first distance measuring device 37 and the position on the top of the base 3 where the laser is irradiated.

[0110] The direction of irradiation of the laser from first distance measuring device 37 is a second axis direction (the direction of the vertical arrow in FIG. 5) perpendicular to the first axis. On the other hand, the second distance measuring device 39 is disposed on the side of the base 3 (to the right of the base 3 in the Y-axis direction) and irradiates the base 3 with a laser in the direction of the rotation axis on the left side of Fig. 5, i.e., to the left in the horizontal direction (Y-axis direction). This makes it possible to obtain the distance (second distance) between the second distance measuring device 39 and the position on the side of the base 3 where the laser is irradiated.

[0111] The direction of irradiation of the laser from second distance measuring device 39 is a third axis direction (the direction of the horizontal arrow in FIG. 5) that passes through the intersection of the first axis and the second axis and is perpendicular to the first axis. Therefore, the laser irradiation direction of the first distance measuring device 37 and the laser irradiation direction of the second distance measuring device 39 are on the same plane, and the extension line of the laser of the first distance measuring device 37 and the extension line of the laser of the second distance measuring device 39 intersect at one point.

[0112] In addition, the detection range in which the first distance measuring device 37 and the second distance measuring device 39 can measure distance is greater than or equal to the maximum swing width of the base body 3 when the base body 3 is rotated, for example, when the base body 3 is curved.

[0113] That is, for example, in the case of the first distance measuring device 37, when the base body 3 is rotated as shown in Fig. 6, if the base body 3 is shifted by ΔH in the left-right direction (Y-axis direction) in Fig. 6, the detection range of the first distance measuring device 37 is equal to or greater than ΔH. Note that the detection range of the second distance measuring device 39 is also the same if the angle is shifted by 90°, so a description thereof will be omitted.

[0114] <Dispenser> The dispenser 35 is, for example, a known jet dispenser, and is configured to eject the slurry vertically downward (in the Z-axis direction) as shown in FIG.

[0115] The dispenser 35 includes an inner chamber 61 at the tip side that contains the slurry (S) supplied from a tank (not shown), a nozzle 53 that is disposed so as to protrude downward in the vertical direction so as to apply the slurry downward from the inner chamber 61, and an opening / closing member 63 that opens and closes the flow path from the inner chamber 61 to the nozzle 53. In other words, the nozzle 53 is disposed along the vertical direction and is configured to eject the slurry downward in the vertical direction.

[0116] The opening / closing member 63 is biased upward by a spring (not shown). Therefore, by adjusting, for example, air pressure applied to the opening / closing member 63 to move the opening / closing member 63 up and down, the slurry can be discharged downward from the tip (discharge port 53a) of the nozzle 53.

[0117] In this manner, the mechanism for discharging the slurry in the dispenser 35 is the dispenser application driving unit 43. As shown in FIG. 2, the dispenser 35 is attached to the base 31 of the head unit 13 so as to be movable in the vertical direction (Z-axis direction) and the left-right direction (Y-axis direction).

[0118] That is, the dispenser 35 can be controlled to move up, down, left, and right in Fig. 2 by a dispenser moving mechanism 41 equipped with a motor or the like. This allows the position of the nozzle 53 of the dispenser 35 (more specifically, the position of the discharge port 53a at the tip of the nozzle 53) to be set to a desired position up, down, left, and right. [1-3. How to form a coating of uniform thickness] Next, a method (principle) for forming the coating film 5 to a uniform thickness in the first embodiment will be described.

[0119] In this first embodiment, when forming (i.e., depositing) a coating film 5 on the outer peripheral surface 3a of the substrate 3 using a slurry, the slurry is applied from a nozzle 53 onto the outer peripheral surface 3a in the radial direction of the substrate 3 extending in the first axial direction, to deposit a film on the outer peripheral surface 3a.

[0120] This method for forming a film (that is, a film forming method) includes a coating step and a detection step. In the coating process, both ends of the base 3 in the first axial direction are clamped by the first and second gripping portions 7a, 7b to support the base 3 so that it can rotate in the circumferential direction, and the slurry is then ejected from the nozzle 53 onto the outer peripheral surface 3a of the base 3 to coat the slurry.

[0121] In the detection step, a first eccentricity amount of the base 3 in a second axial direction (here, vertical direction) perpendicular to the first axis and a second eccentricity amount of the base 3 in a third axial direction (here, horizontal direction) passing through an intersection of the first axis and the second axis and perpendicular to the first axis are detected when the base 3 is rotated. The first eccentricity amount is the amount of eccentricity (i.e., the amount of deviation) in the radial direction due to curvature, etc. of the base 3 (specifically, the central axis) in the second axial direction, and the second eccentricity amount is the amount of eccentricity in the radial direction due to curvature, etc. of the base 3 (specifically, the central axis) in the third axial direction.

[0122] In the coating process, the position of the nozzle 53 is moved based on the first eccentricity amount and the second eccentricity amount so that the slurry is ejected from the nozzle 53 while maintaining the distance between the substrate 3 and the nozzle 53 at a substantially constant value, thereby forming a film.

[0123] In particular, in this first embodiment, when forming a film as described above, the slurry is ejected from the nozzle 53 while the substrate 3 is rotating so that the peripheral speed (i.e., the speed in the circumferential direction) of the outer peripheral surface 3a of the substrate 3 relative to the nozzle 53 is kept approximately constant.

[0124] That is, the nozzle 53 is disposed so as to apply the slurry to the outer peripheral surface 3a of the base 3 along the second axial direction. The dispenser moving mechanism 41 is driven to control the position of the nozzle 53 so that the portion of the nozzle 53 that ejects the slurry faces the vertex of the outer peripheral surface 3a of the base 3 that is closest to the nozzle 53.

[0125] This film forming method (that is, coating method) will be described in detail below. First, in this first embodiment, as shown in FIG. 5, when the base 3 is rotated in the direction of arrow A, a first distance is measured by a first distance measuring device 37 and a second distance is measured by a second distance measuring device 39 at every predetermined rotation angle (e.g., 15°).

[0126] Note that the X-axis direction (i.e., the direction of the rotation axis), Z-axis direction, and Y-axis direction shown in FIG. 5 correspond to the direction of the first axis (first axis direction), the direction of the second axis (second axis direction) for obtaining the first amount of eccentricity, and the direction of the third axis (third axis direction) for obtaining the second amount of eccentricity, respectively, in this disclosure.

[0127] Here, for example, when the reference position in the rotation direction of the base body 3 is set to point k, consider the case where the reference point k is at the upper end in the vertical direction. In this case, the angle of point k, which is the laser irradiation position of first distance measuring device 37, is set to 0°, and by setting the angle clockwise, the laser irradiation position of second distance measuring device 39 becomes 90°.

[0128] In other words, the first distance measuring device 37 measures the first distance at an angle (i.e., rotation angle) of 0°, i.e., the upper distance in the Z-axis direction, and the second distance measuring device 39 measures the second distance at an angle of 90°, i.e., the right distance in the Y-axis direction.

[0129] Since the first distance is the distance between the first distance measuring device 37 and the top of the base 3 (i.e., the position where the laser hits), if the base 3 is curved in the Z-axis direction, the first distance will fluctuate. Therefore, this fluctuated distance is found as the first amount of eccentricity.

[0130] In other words, the original first distance (i.e., the reference distance) when the base 3 is not curved is registered in advance, so the first eccentricity amount can be calculated from the difference between the registered first distance and the measured first distance.

[0131] Similarly, since the second distance is the distance between the second distance measuring device 39 and the right side of the base 3 (i.e., the position where the laser hits), if the base 3 is curved in the Y-axis direction, the second distance varies. Therefore, this varied distance is found as the second amount of eccentricity.

[0132] In other words, the original second distance (i.e., the reference distance) when the base 3 is not curved is registered in advance, and the second eccentricity amount can be calculated from the difference between the registered second distance and the measured second distance.

[0133] The first and second eccentric amounts for each predetermined angle (for example, 15°) thus determined are stored in the memory 49 as data for each predetermined angle, as shown in FIG. The angle in Fig. 8 is an angle indicating how much the k point has rotated from the 0° position shown in Fig. 5 (i.e., the angle at which the k point is located: the rotation angle). When the k point has rotated 90° from the 0° position, it coincides with the position for measuring the second amount of eccentricity.

[0134] In addition, since the head unit 13 gradually moves in the X-axis direction depending on the coating film to be formed, in practice, a map such as that shown in Fig. 8 is stored for each predetermined distance (e.g., 5 mm to 20 mm) in the X-axis direction. This makes it possible to grasp the degree of curvature in the Z-axis direction and Y-axis direction at each position (X coordinate) in the X-axis direction.

[0135] Next, since the first and second eccentricity amounts are known as described above, the first and second eccentricity amounts are used to control the position (up, down, left, right) of the nozzle 53 so that the distance between the tip of the nozzle 53 and the outer peripheral surface 3a of the base 3 is constant when the base 3 rotates.

[0136] More specifically, as shown in FIG. 5, when the base 3 is curved in the Z-axis direction by a first eccentricity amount, the dispenser 35 is moved in the Z-axis direction so as to eliminate this first eccentricity amount.

[0137] That is, when the base body 3 rotates, the nozzle 53 is moved in the Z-axis direction so as to maintain a constant distance between the nozzle 53 and the base body 3. For example, if the base body 3 is curved downward by 0.1 mm, the nozzle 53 is moved downward by 0.1 mm.

[0138] In detail, since the first eccentricity amount when the base 3 is at a certain rotation angle (e.g., 15°) is known, the position of the nozzle 53 is adjusted so that the first eccentricity amount is eliminated when the base 3 is at the same rotation angle (e.g., 15°).

[0139] The first eccentricity amount is calculated based on the first distance for every 15°, but the first eccentricity amount between the predetermined angles is calculated by known interpolation. For example, the first eccentricity amount at a rotation angle of 1° can be calculated by using the first eccentricity amount at a rotation angle of 0° and the first eccentricity amount at a rotation angle of 15°, and by interpolating the first eccentricity amount at 0° and the first eccentricity amount at 15° such that the first eccentricity amount at 0° and the first eccentricity amount at 15° change on a straight line.

[0140] Similarly, when the base 3 is curved in the Y-axis direction by a second eccentricity amount, the dispenser 35 is moved in the Y-axis direction so as to eliminate this second eccentricity amount. That is, the nozzle 53 is moved in the Y-axis direction so as to keep the distance between the nozzle 53 and the base 3 constant. For example, when the base 3 is curved 0.1 mm to the left in FIG. 5, the nozzle 53 is moved 0.1 mm to the left.

[0141] As described above, when the substrate 3 rotates once, the position of the nozzle 53 is controlled, for example, at every rotation angle (for example, 15°), and the slurry is continuously ejected from the nozzle 53, thereby forming a narrow coating film that goes around the substrate once.

[0142] This operation is continuously performed by moving the head portion 13 (and therefore the nozzle 53) in the X-axis direction by a predetermined distance (e.g., 5 mm to 20 mm) by the width of one coating film 5, thereby forming one coating film 5. In other words, one coating film 5 is formed in a shape in which thin coating films are continuously connected in the X-axis direction.

[0143] By such control, the distance between the nozzle 53 and the base 3 can be kept constant. That is, the distance between the tip of the nozzle 53 (i.e., the discharge port 53a) and the upper vertex in the vertical direction of the outer peripheral surface 3a of the base 3 (i.e., the vertex closest to the discharge port 53a), i.e., the distance on the normal to the vertex, can be kept constant. As a result, at the vertex of the base 3 that the tip of the nozzle 53 faces, the peripheral speed on the outer peripheral surface 3a of the base 3 is constant.

[0144] Then, the slurry can be discharged from the nozzle 53 perpendicular to the apex rotating at the peripheral speed, that is, perpendicular to the tangent to the apex when viewed from the X-axis direction. Therefore, even if the curved substrate 3 rotates, the coating state on the substrate 3 can be kept constant (provided other conditions are the same). In other words, the thickness and width of the coating film 5 formed on the surface of the substrate 3 can be made constant. [1-4. Summary of main parts of coating operation] Next, the main parts of the above-mentioned coating operation will be collectively described in comparison with the prior art (Comparative Examples 1 and 2).

[0145] Here, as shown in FIG. 9, an example will be described in which a cylindrical substrate 3 is rotated around the central axis (i.e., rotation axis) X of the gripping parts 7a, 7b, and a slurry is ejected from the tip of a nozzle 53 downward in the Z-axis direction (i.e., downward in the vertical direction) onto the outer peripheral surface 3a of the substrate 3 to form a coating film 5.

[0146] The base 3 is curved in the radial direction along the central axis X. The nozzle 53 extends along the Z-axis direction, and when the gripper rotation angle (i.e., the rotation angle) is 0°, the apex, which is the upper end (upper part in FIG. 9) of the base 3, and the central axis X are located vertically below the nozzle 53.

[0147] Comparative Example 1 Comparative Example 1 is an example in which the position of the nozzle 53 is not corrected in the Z-axis direction (second axis direction) and the Y-axis direction (third axis direction).

[0148] In the case of Comparative Example 1, when the rotation angle is 0° (see the left diagram in FIG. 9), if the distance between the nozzle 53 and the outer peripheral surface 3a (i.e., the vertex) of the base 3 is C, then when the gripping parts 7a, 7b rotate by a predetermined angle θ (see the right diagram in FIG. 9), the distance between the nozzle 53 and the outer peripheral surface 3a (but not the vertex) of the base 3 in the YZ plane including the nozzle 53 becomes C+ΔC. Note that ΔC is the amount of change in distance due to the curvature of the base 3.

[0149] Furthermore, if the vertex of the base 3 (i.e., the position on the YX plane) is m when the rotation angle is 0° (see the left diagram in FIG. 9), when the gripping portions 7a and 7b rotate by θ, the m moves to a position rotated by θ+Δθ (see the right diagram in FIG. 9), and the vertex of the base 3 moves to the right (rotation side) in the right diagram in FIG. 9 from before the rotation. Note that θ+Δθ is the angle when the center of the base 3 on the YZ plane is the center of the angle, and Δθ is the amount of change in angle due to the curvature of the base 3.

[0150] In this way, in Comparative Example 1, the position of the nozzle 53 is not corrected in the Z-axis direction and the Y-axis direction, so that when the gripping parts 7a, 7b rotate by θ, the distance between the nozzle 53 and the apex of the outer peripheral surface 3a of the base 3 below the nozzle 53 varies in the Z-axis direction and the Y-axis direction, and the positional relationship between the nozzle 53 and the apex of the outer peripheral surface 3a of the base 3 varies by Δθ. Therefore, the peripheral speed at the outer peripheral surface 3a of the base 3 below the nozzle 53 also varies. This makes the thickness of the coating film 5 more likely to vary.

[0151] Comparative Example 2 Comparative Example 2 is an example in which only the position of the nozzle 53 is corrected in the Z-axis direction (an example in which correction in the Y-axis direction is not performed).

[0152] In the case of Comparative Example 2, when the gripping portions 7a, 7b rotate by θ (see the right diagram in Figure 9), the distance between the nozzle 53 and the outer peripheral surface 3a of the base 3 in the YZ plane remains C and does not change.

[0153] Furthermore, when the gripping portions 7a, 7b rotate by θ, the distance between the nozzle 53 and the apex of the outer peripheral surface 3a of the base 3 below the nozzle 53 changes in the Y-axis direction, and the m moves to a position rotated by θ+Δθ (see the right diagram in Figure 9), and a deviation of Δθ occurs from the apex of the base 3, causing the circumferential speed to change.

[0154] In this way, in Comparative Example 2, the position of the nozzle 53 is not corrected in the Y-axis direction, so when the gripping parts 7a, 7b rotate by θ, the positional relationship between the nozzle 53 and the apex of the outer circumferential surface 3a of the base 3 varies by Δθ in the Y-axis direction. Therefore, the peripheral speed of the outer circumferential surface 3a of the base 3 below the nozzle 53 also varies. This makes the thickness, etc. of the coating film 5 more likely to vary.

[0155] (First embodiment) The first embodiment is an example in which the position of the nozzle 53 is corrected in the Z-axis direction and the Y-axis direction. In the first embodiment, when the gripping portions 7a, 7b rotate by θ (see the right diagram in Figure 9), the distance between the nozzle 53 and the outer peripheral surface 3a of the base 3 in the YZ plane remains C and does not change.

[0156] Furthermore, when the gripping portions 7a, 7b are rotated by θ, the m moves to a position of the same angle θ (see the right diagram in Figure 9), and the apex of the outer peripheral surface 3a of the base 3 is positioned below the nozzle 53, just as it was before the rotation.

[0157] In this way, in the first embodiment, the position of the nozzle 53 is corrected in the Z-axis direction and the Y-axis direction, so that the distance between the nozzle 53 and the apex of the outer peripheral surface 3a of the base 3 can be maintained even after the gripping parts 7a, 7b are rotated by θ. Moreover, the apex of the outer peripheral surface 3a of the base 3 can be kept positioned below the nozzle 53 (in the direction of discharging the slurry). Therefore, the peripheral speed of the outer peripheral surface 3a of the base 3 below the nozzle 53 can be maintained. In addition, the slurry can be applied perpendicular to the apex. As a result, the thickness of the coating film 5 can be prevented from fluctuating. [1-5. Coating method] Next, the overall configuration of the coating method performed by the coating apparatus will be described.

[0158] As shown in FIG. 10, in step (S) 100, the base 3 is rotated in the direction of arrow A (see FIG. 2) by the base rotation drive unit 21. In the next step 110, an image of the end of the substrate 3 rotatably attached to the coating apparatus 1 as shown in FIG.

[0159] The position of the position mark 17 can be seen from the image of the camera 11. In other words, since the position of the camera 11 is fixed, it is possible to see from the image of the camera 11 where the position mark 17 is located in the X-axis direction (the position indicated by the X coordinate).

[0160] Furthermore, the application positions of the slurry, i.e., the start and end positions of application on each coating film 5, are measured in advance in a previous process as the distance from the position mark 17. Therefore, if the X coordinate of the position mark 17 is known, the application start position (its X coordinate) and end position (its X coordinate) on each coating film 5 can be known.

[0161] In the next step 120, the head unit 13 is moved in the X-axis direction by the X-axis driving unit 29 and placed at a predetermined position. This head unit 13 is initially placed at an initial position on the left side in Fig. 1. Note that this initial position is to the left of the position (X coordinate) where the first distance measuring device 37 and the second distance measuring device 39 start measuring the first distance and the second distance, and is also to the left of the application start position of the coating film 5 at the left end by the nozzle 53.

[0162] When the first distance or the second distance is measured for the first time (first measurement), the head unit 13 (thus the first distance measuring device 37 and the second distance measuring device 39) is moved to a position where the nozzle 53 first applies (i.e., the application start position). In other words, before application, the first distance measuring device 37 and the second distance measuring device 39 are moved to the application start position.

[0163] In the next step 130, a first distance is obtained by the first distance measuring device 37 at every predetermined rotation angle (e.g., 15°), and a first amount of eccentricity is calculated based on this first distance. At the same time, a second distance is obtained by the second distance measuring device 39 at every predetermined rotation angle (e.g., 15°), and a second amount of eccentricity is calculated based on this second distance.

[0164] At this stage, the current position (X coordinate) of the nozzle 53 has not reached the coating start position of the coating film 5 at the left end, so the head portion 13 is shifted by a predetermined distance (coating interval in the X-axis direction: for example, 5 mm to 20 mm), and the first eccentricity amount and the second eccentricity amount are obtained in the same manner as in step 130.

[0165] The process of determining the first eccentricity amount and the second eccentricity amount is continued until the position of the nozzle 53 reaches the coating start position of the leftmost coating film 5. As a result, before coating starts, the first eccentricity amount and the second eccentricity amount during multiple rotations of the substrate 3 are already accumulated between the coating position (i.e., the position of the nozzle 53) and the positions of the distance measuring devices 37, 39.

[0166] Then, when the position of the nozzle 53 reaches the coating start position of the coating film 5 at the left end, the process proceeds to the subsequent step. In step 150, the dispenser moving mechanism 41 is driven, and the dispenser 35 is moved using the first eccentricity amount and the second eccentricity amount accumulated as described above so that the distance between the nozzle 53 and the base 3 becomes constant.

[0167] In detail, when the position of the nozzle 53 is controlled when the base 3 is at a certain rotation angle, the position of the nozzle 53 is controlled using the known first and second eccentricities at the same rotation angle so that the first and second eccentricities are eliminated.

[0168] If the first and second eccentric amounts are not values ​​for every predetermined angle (for example, 15°), then interpolated values ​​are used as described above. By this control, the tip direction of the nozzle 53 (ie, the direction in which the slurry is discharged) and the tangent line on the coating surface of the substrate 3 (ie, the uppermost surface of the substrate 3) become perpendicular.

[0169] In the next step 160, the dispenser application driving unit 43 is driven to eject the slurry downward from the nozzle 53, and the slurry is applied to the outer circumferential surface 3a of the base 3 (specifically, the application surface at the uppermost part (i.e. the apex) of the base 3).

[0170] The slurry is discharged during one rotation of the substrate 3, so that a coating film 5 of approximately the same thickness is formed in a ring shape on the outer peripheral surface 3a of the substrate 3. The process of applying the slurry to form the coating film 5 in this manner is continued by sequentially moving the head unit 13 in the X-axis direction until the position of the nozzle 53 reaches the application end position of the coating film 5 at the left end. When the application end position of the coating film 5 is reached, application of the slurry is temporarily stopped.

[0171] Thereafter, the head unit 13 is moved rightward (to the right in FIG. 1 ) to move the nozzle 53 to the coating start position for the coating film 5 immediately to the right of the formed coating film 5, and the slurry is applied in the same manner as for the coating film 5 on the left end to form the coating film 5. Thereafter, similar processing is performed until the coating film 5 on the right end is formed, thereby completing the formation of all the coating films 5.

[0172] Thereafter, the base 3 on which all the coating films 5 have been formed is fired, so that the surface layer (that is, the layer of the coating films 5 after firing) is formed, and the base 3 can be obtained. [1-6. Effects] Next, the effects of the first embodiment will be described.

[0173] (1) In the first embodiment, the position of the nozzle 53 can be moved based on the first amount of eccentricity and the second amount of eccentricity. Therefore, the slurry can be ejected from the nozzle 53 while keeping the distance between the base 3 and the nozzle 53 substantially constant so that the first amount of eccentricity and the second amount of eccentricity are eliminated.

[0174] As a result, even if the base 3 is curved in the second axis direction or the third axis direction when viewed from the first axis direction, the slurry can be applied to a desired thickness (for example, uniform thickness) and a desired width. In other words, when forming a film using a slurry, a remarkable effect is achieved in that a desired film formation dimension (for example, film width and film thickness) can be realized more stably than before.

[0175] (2) In this first embodiment, when the base 3 is rotating, the slurry is ejected vertically downward from the nozzle 53 while the peripheral speed (i.e., the speed in the circumferential direction) of the outer peripheral surface 3a of the base 3 at the position opposite the nozzle 53 is approximately constant.

[0176] That is, the nozzle 53 is disposed in the vertical direction, and the slurry is discharged vertically downward from the tip of the nozzle 53 toward the upper vertex on the outer circumferential surface 3a of the base 3, i.e., the vertex that is the shortest distance from the tip of the nozzle 53 (in other words, the vertex in the vertical direction where the nozzle 53 is disposed). In this case, the peripheral speed at the vertex of the base 3 that the nozzle 53 faces is approximately constant. Therefore, even if the base 3 is curved as described above, the coating state of the slurry can be made constant, and the desired film dimensions can be easily achieved.

[0177] (3) In the first embodiment, the first amount of eccentricity can be obtained based on the first distance measured by the first distance measuring device 37, and the second amount of eccentricity can be obtained based on the second distance measured by the second distance measuring device 39. Therefore, when the base body 3 is rotated, the first amount of eccentricity and the second amount of eccentricity can be obtained at the same time.

[0178] (4) In the first embodiment, the second axis (that is, the second axial direction) and the third axis (that is, the third axial direction) are substantially perpendicular to each other, so that the curved state of the base body 3 can be appropriately grasped. (5) In the first embodiment, the detection range (i.e., detection width) of the first distance measuring device 37 and the second distance measuring device 39 is equal to or larger than the maximum swing width of the base body 3 when the base body 3 is rotated. Therefore, even if the base body 3 is greatly curved, the curved state of the base body 3 can be reliably detected.

[0179] (6) In the first embodiment, when the slurry is applied while rotating the base 3 in the circumferential direction, the first eccentricity amount and the second eccentricity amount are detected. This makes it possible to perform the work more efficiently than when application and detection are performed separately.

[0180] (7) In the first embodiment, the first and second eccentricities are detected for each predetermined rotation angle. This makes it possible to accurately determine the curved state of the base body 3 with a minimum necessary amount of information processing. (8) In the first embodiment, the position of the nozzle 53 is controlled so that the tip direction of the nozzle 53 (i.e., the direction in which the slurry is discharged) and the tangent line of the coating surface of the substrate 3 (the surface to which the slurry is applied) are perpendicular to each other, so that the coating state of the slurry can be kept constant. Therefore, it is easy to adjust the thickness and width of the coating film of the slurry to a desired thickness and width (for example, a constant thickness and width). [1-7. Correspondence of Wording] Here, the correspondence between the wording in the first embodiment and this disclosure will be described.

[0181] The base 3, coating device 1, support mechanism 7, nozzle 53, dispenser moving mechanism 41, first distance measuring device 37 and second distance measuring device 39, light projecting units 37a, 39a, light receiving units 37b, 39b, detection control unit 51, and nozzle control unit 55 of this first embodiment correspond to examples of the base, coating device, support mechanism, nozzle, moving mechanism, non-contact sensor, light projecting unit, light receiving unit, detection control unit, and nozzle control unit of the present disclosure, respectively.

[0182] The first distance measuring device 37, the second distance measuring device 39 and the electronic control device 15 implement the function of a detection unit. [1-8. Experimental Example] Next, an experimental example for confirming the effects of the first embodiment will be described.

[0183] (Experimental Example 1) In this Experimental Example 1, a cylindrical base body 3 having a predetermined length (for example, 1800 mm) and a predetermined diameter (for example, φ20 mm) and an eccentricity of 2 mm was used as the workpiece used in the experiment.

[0184] In addition, both ends of the base body 3 in the axial direction (first axial direction) were gripped by the two gripping parts 7a, 7b, and the rotation speed of the two gripping parts 7a, 7b was set to a constant rotation speed (e.g., 20 rpm) and the base body 3 was rotated in the right direction (clockwise direction) in Figure 9.

[0185] Then, when the base body 3 rotates, the relationship between the rotation angle of the base body 3, the first eccentricity amount which is the eccentricity amount in the Z-axis direction (second axial direction), and the position of the nozzle 53 was examined. The result is shown in Fig. 11. The position of the nozzle 53 was obtained from the control value when the dispenser 35 equipped with the nozzle 53 was moved by the dispenser moving mechanism 41. The same applies to Fig. 12 below.

[0186] In Fig. 11, the first eccentricity amount on the left vertical axis is shown as a percentage (%) of the maximum eccentricity amount in the process. Also, the position of the nozzle 53 on the right vertical axis is shown as a percentage (%) of the value corresponding to the maximum eccentricity amount in the process. The same is true for Fig. 12.

[0187] 11, it can be seen that the first eccentricity amount changes in a sine curve shape with the rotation of the base 3. It can also be seen that there is little deviation between the first eccentricity amount and the position of the nozzle 53 (position in the second axial direction). Note that the position of the upper end of the base 3 when the base 3 is not curved (so-called reference distance) is registered in advance.

[0188] (Experimental Example 2) In this Experimental Example 2, an experiment was performed under the same conditions as in the Experimental Example 1, and the relationship between the rotation angle of the base body 3, the second eccentricity amount which is the eccentricity amount in the Y-axis direction (third axis direction), and the position of the nozzle 53 was examined when the base body 3 was rotated. The results are shown in FIG.

[0189] 12, it can be seen that the second eccentricity amount changes in a sine curve shape with the rotation of the base 3. It can also be seen that there is little deviation between the second eccentricity amount and the position of the nozzle 53 (the position in the third axial direction). [2. Second embodiment] Next, a second embodiment will be described, but the description of the same contents as those of the first embodiment will be omitted. Note that the same numbers as those of the first embodiment will be used for the same components.

[0190] The second embodiment relates to a method for producing a solid oxide fuel cell, which is a type of solid oxide electrochemical cell. Here, the method of applying the slurry when manufacturing a solid oxide fuel cell is the same as in the first embodiment, so the following description will focus on the differences. [2-1. Structure of solid oxide fuel cells] 13A, the solid oxide fuel cell 71 of the second embodiment is a long cylindrical type, and includes a plurality of single fuel cell cells 81 on a tubular base 73 extending in a first axial direction (X-axis direction). That is, in the solid oxide fuel cell 71, one single fuel cell 81 is formed in the circumferential direction of the base 73, and a plurality of such single fuel cell cells 81 are arranged in parallel along the axial direction of the base 73. The single fuel cell 81 is a power generation unit corresponding to a single cell in the present disclosure.

[0191] 13B , each single fuel cell 81 has, on the base 73, a fuel electrode 75, a solid electrolyte membrane 77, and an air electrode 79, in that order from the outer circumferential surface 73a side, and adjacent single fuel cell cells 81 are electrically connected by interconnectors 83. In addition, a portion of the solid electrolyte membrane 77 and a portion of the interconnector 83 are in contact with the base 73.

[0192] In addition to the fuel electrode 75, solid electrolyte membrane 77, air electrode 79, and interconnector 83, Figure 13B also shows the coatings 75a, 77a, 79a, and 83a of the fuel electrode 75, solid electrolyte membrane 77, air electrode 79, and interconnector 83 as the configuration before firing.

[0193] In this solid oxide fuel cell 71, fuel (hydrogen gas, etc.) flows inside the base 73, and air flows outside the base 73. The base 73 is porous, allowing hydrogen gas as fuel to flow from the inside to the outside (fuel electrode 4 side) of the base 73. The diameter of the base 73 is approximately uniform in the X-axis direction.

[0194] The material of the base 73 may be, for example, a porous material mainly made of calcia stabilized zirconia (CSZ) or a mixture of CSZ and nickel oxide (NiO) (CSZ+NiO).

[0195] For example, a composite material of nickel oxide (NiO) and a zirconia-based electrolyte material can be used as the material of the fuel electrode 75. For example, a mixture of NiO and yttria-stabilized zirconia (YSZ) can be used as the composite material.

[0196] The material of the solid electrolyte membrane 77 may be, for example, Y2O3 stabilized ZrO2 (YSZ). Examples of the material that can be used for the interconnector 83 include LaCrO3, (La,Sr)CrO3, La(Cr,Mg)O3, (La,Ca)CrO3, and (Sr,La)TiO3.

[0197] Examples of materials that can be used for the air electrode 79 include materials whose main component is a perovskite-type oxide, such as LaMnO3-based materials such as (La,Sr)MnO3, (La,Ca)MnO3, and (La,Sr,Ca)MnO3, LaFeO3-based materials such as (La,Sr)FeO3 and (La,Sr,Ca)FeO3, and LaCoO3-based materials such as (La,Sr)CoO3 and (La,Sr,Ca)CoO3. [2-2. Manufacturing method of solid oxide fuel cells] Next, a method for manufacturing the solid oxide fuel cell 71 will be described.

[0198] First, using the material for the base 73 described above, a molded body is produced by, for example, an extrusion molding method, as is well known, and the molded body is sintered to manufacture the base 73. 13B, coating film 75a of fuel electrode 75 is formed on outer peripheral surface 73a of base 73. Coating film 75a is formed in the same manner for each of a plurality of fuel cell units 81 (the same applies to other coating films 77a, 79a, 83a described below).

[0199] Specifically, as a material for producing the fuel electrode 75, for example, a mixed powder of Ni+YSZ and an aqueous vehicle (water to which a dispersant, binder, and antifoaming agent have been added) are mixed to prepare a slurry for the fuel electrode.

[0200] As in the first embodiment, this slurry for the anode is applied in the circumferential direction on the outer peripheral surface 73a of the base 73 by the application device 1. This forms the coating film 75a of the anode 75. Note that in this embodiment, the base 73 on which the coating film 75a is formed corresponds to the substrate of the present disclosure.

[0201] Here, a method of applying the slurry in the second embodiment will be described. In the second embodiment, the material of the slurry used is different from that in the first embodiment, but the coating device 1 and the coating method, for example, the method of coating the slurry by controlling the position of the dispenser 35 using the first eccentricity amount and the second eccentricity amount (i.e., the above-mentioned film formation method), are similar to those in the first embodiment, and therefore will be briefly described with reference to FIG. 10.

[0202] As shown in FIG. 10, in step 100, the base 73 is rotated by the base body rotation drive unit 21. In the next step 110 , the end of the base 73 , i.e., the end where the position mark 17 is located, is photographed by the camera 11 .

[0203] In the next step 120, the head unit 13 is moved in the X-axis direction by the X-axis driving unit 29 and placed at a predetermined position. In the next step 130, a first distance is obtained by a first distance measuring device 37 having a light projecting unit 37a and a light receiving unit 37b for each predetermined angle (for example, 15°), and a first amount of eccentricity is calculated based on the first distance.

[0204] At the same time, a second distance is obtained for each predetermined angle by a second distance measuring device 39 having a light projecting portion 39a and a light receiving portion 39b, and a second amount of eccentricity is calculated based on the second distance. The detection ranges of the first and second distance measuring devices 37, 39 are equal to or greater than the maximum swing width of the base portion 73 when the base portion 73 is rotated.

[0205] The process of determining the first and second eccentricities is repeated until the position of the nozzle 53 reaches the coating start position of the coating film 5 on the left edge. Here, the first and second eccentricities are calculated for each predetermined angle (e.g., 15°) of the base 73, but the first and second eccentricities can be calculated approximately for each angle smaller than the predetermined angle (e.g., 1°) by the interpolation described above.

[0206] Then, when the position of the nozzle 53 reaches the coating start position of the coating film 5 at the left end, the process proceeds to the subsequent step. In step 140, the dispenser moving mechanism 41 is driven to move the dispenser 35 using the first eccentricity amount and the second eccentricity amount according to the angle (for example, in 1° increments) at the time of actual application so that the distance between the nozzle 53 and the base 73 is constant.

[0207] By this control, the tip direction of the nozzle 53 (ie, the direction in which the slurry is discharged) and the tangent line to the coating surface of the base 73 (ie, the uppermost surface of the base 73) become perpendicular. In the next step 150, the dispenser application driving unit 43 is driven to discharge the slurry from the nozzle 53, and the slurry is applied to the outer circumferential surface 73a of the base 73 (more specifically, the application surface at the uppermost part (i.e., the apex) of the base 73).

[0208] As a result, a coating film 75a of approximately the same thickness is formed in an annular shape on the outer peripheral surface 73a of the base portion 73. In the coating step described above, while the slurry for forming components of one unit fuel cell 81 (e.g., coating film 75a of fuel electrode 75) is being coated based on the first eccentricity amount and second eccentricity amount of base 73 at a position where one unit fuel cell 81 is to be formed among the plurality of unit fuel cell cells 81, the first eccentricity amount and second eccentricity amount of base 73 at a position where another unit fuel cell 81 is to be formed are detected. The same applies to the other coating films 77a, 79a, 83a described below.

[0209] The process of applying the slurry to form the coating film 75a in this manner is continued until the nozzle 53 reaches the application end position of the coating film 75a at the left end, and when the application end position of the coating film 75a is reached, application of the slurry is temporarily stopped. In this way, the coating film 75a of the fuel electrode 75 corresponding to one single fuel cell 81 is formed.

[0210] Thereafter, the head unit 13 is moved rightward (to the right in FIG. 13), and when the nozzle 53 reaches the coating start position for the coating film 75a immediately to the right of the coating film 75a that has been formed, the slurry is applied in the same manner as for the coating film 75a at the left end to form the coating film 75a. Thereafter, the same process is performed similarly until the coating film 75a at the right end is formed, thereby completing the formation of all the coating films 75a.

[0211] Next, after forming coating film 75a of fuel electrode 75, coating film 77a of solid electrolyte membrane 77 is formed on the outer circumferential side of base 73 so that part of coating film 75a of fuel electrode 75 is in contact with base 73, as shown in FIG. 13B.

[0212] In this case, the target on which the coating film 77a is formed, that is, the base 73 provided with the coating film 75a, corresponds to the substrate of the present disclosure. Specifically, a slurry for the solid electrolyte membrane is prepared by mixing YSZ powder and an aqueous vehicle. This slurry for the solid electrolyte membrane is applied in the circumferential direction on the outer circumferential surface side of the base 73 by the application device 1, as in the first embodiment. This forms the coating film 77a of the solid electrolyte membrane 77.

[0213] Next, after forming the coating film 77a of the solid electrolyte membrane 77, the coating film 83a of the interconnector 83 is formed on the outer peripheral surface side of the base 73 so that it is in partial contact with the coating film 75a of the fuel electrode 75, the coating film 77a of the solid electrolyte membrane 77, and the base 73, as shown in Figure 13B.

[0214] In this case, the target on which the coating film 83a is formed, that is, the base 73 provided with the coating films 75a and 77a, corresponds to the substrate of the present disclosure. Specifically, a powder of the interconnector material is mixed with an aqueous vehicle to prepare a slurry for the interconnector. This slurry for the interconnector is applied in the circumferential direction on the outer peripheral surface side of the base 73 by the application device 1, as in the first embodiment. That is, the slurry for the interconnector is applied in the circumferential direction on the outer peripheral surface side of the base 73 at positions corresponding to between adjacent fuel cell unit cells 81. As a result, a coating film 83a of the interconnector 83 is formed.

[0215] Next, the base 73 on which the coating 75a of the fuel electrode 75, the coating 77a of the solid electrolyte membrane 77, and the coating 83a of the interconnector 83 are formed is fired (i.e., co-sintered) in the air. The firing temperature is, for example, 1350° C. to 1450° C. As a result, the fuel electrode 75, the solid electrolyte membrane 77, and the interconnector 83 are formed.

[0216] Next, the coating film 79a of the air electrode 79 is formed on the co-sintered solid electrolyte film 77 and the interconnector 83 at the position shown in FIG. 13B. In this case, the object on which the coating film 79a is formed, that is, the base 73 on which the fuel electrode 75, the solid electrolyte membrane 77, and the interconnector 83 are formed, corresponds to the substrate of the present disclosure.

[0217] Specifically, for example, a slurry for the air electrode is prepared by mixing a water-based vehicle with a (La,Sr,Ca)MnO3 powder, which is the main component of the material for the air electrode 79 described above. This slurry for the air electrode is applied in the circumferential direction on the outer circumferential surface side of the base 73 by the application device 1, as in the first embodiment.

[0218] Next, the base 73 on which the coating film 79a of the air electrode 79 is formed, i.e., the base 73 on which the fuel electrode 75, the solid electrolyte membrane 77, and the interconnector 83 are formed, is fired in the air to be sintered. The firing temperature is, for example, 1100°C to 1250°C.

[0219] In this way, the solid oxide fuel cell 71 is obtained. [2-3. Effects] (1) In the second embodiment, the respective slurries used to fabricate the fuel electrode 75, the solid electrolyte membrane 77, and the interconnector 83 are applied to the outer peripheral surface of the base 73 in a manner similar to that of the first embodiment, and after these are fired, the slurry used to fabricate the air electrode 79 is applied in the same manner as in the first embodiment.

[0220] That is, when each slurry is applied, a first eccentricity of the base 73 (or a structure corresponding to the base) in a second axis direction perpendicular to the first axis and a second eccentricity of the base 73 (or a structure corresponding to the base) in a third axis direction passing through the intersection of the first axis and the second axis and perpendicular to the first axis are detected, as in the first embodiment. Note that hereinafter, a structure corresponding to a base to which the slurry is applied, such as the base 73, will be simply referred to as a base K.

[0221] Then, with both ends of the base K in the first axial direction, such as the base 73, supported and the base K rotated in the circumferential direction, the position of the nozzle 53 that ejects the slurry is moved based on the first eccentricity amount and the second eccentricity amount, and the slurry is ejected from the nozzle 53 while keeping the distance between the base K and the nozzle 53 approximately constant, and the slurry is applied onto the base K.

[0222] With this configuration, the coating films 75a, 77a, 79a, and 81a made of each slurry can be formed to a desired thickness (e.g., uniform thickness) and a desired width on the substrate K. In other words, when forming a film using a slurry, a remarkable effect is achieved in that the film dimensions (e.g., film width and film thickness) can be formed more stably than before.

[0223] Then, by firing the substrate K on which the coating films 75a, 77a, 79a, 81a are formed in this manner, the dimensions (e.g., thickness and width) of each component of the fuel cell unit cell 81 (i.e., the fuel electrode 75, the solid electrolyte membrane 77, the air electrode 79, and the interconnector 83) are stabilized, which has the advantage of stabilizing the power generation performance.

[0224] (2) In the second embodiment, the first and second eccentricities can be detected by using a non-contact sensor using a laser similar to that in the first embodiment, i.e., first and second distance measuring devices 37, 39 equipped with light-projecting portions 37a, 39a and light-receiving portions 37b, 39b.

[0225] (3) In the second embodiment, the detection range of the non-contact sensor is greater than or equal to the maximum swing amplitude of the base body K when the base body K is rotated, so that the curvature of the base body K can be reliably detected even if the curvature of the base body K is large.

[0226] (4) In the second embodiment, in the application process, while a slurry for forming components of one fuel cell unit 81 is applied based on a first eccentricity amount and a second eccentricity amount of the substrate K at a position where one of a plurality of fuel cell unit cells 81 is to be formed, the first eccentricity amount and the second eccentricity amount of the substrate K at a position where another fuel cell unit cell 81 is to be formed are detected.

[0227] In this way, by simultaneously carrying out the process of applying the slurry and the process of detecting the first amount of eccentricity and the second amount of eccentricity, the work can be carried out efficiently. (5) In the second embodiment, the first eccentricity amount and the second eccentricity amount are detected for each predetermined rotation angle of the base body K, so that the curved state of the base body K can be accurately determined with a minimum necessary amount of information processing.

[0228] (6) In the second embodiment, the position of the nozzle 53 is controlled so that the tip direction of the nozzle 53 and the tangent line to the coating surface of the substrate K are perpendicular to each other, and the slurry is applied. This process allows the coating state of the slurry to be kept constant, making it easy to make the thickness and width of each of the coating films 75a, 77a, 79a, and 81a made of the slurry a desired thickness and width (for example, a constant thickness and width). [3. Third embodiment] Next, a third embodiment will be described, but the description of the same contents as those of the first embodiment will be omitted. Note that the same numbers as those of the first embodiment will be used for the same components.

[0229] The third embodiment differs from the first embodiment in that a first amount of eccentricity is detected using one non-contact sensor and a second amount of eccentricity is calculated from this first amount of eccentricity, so the following description will focus on the differences. [3-1. Configuration of coating equipment] In the third embodiment, as shown in FIG. 1 and the like, a coating apparatus 1 having a basically similar configuration to that of the first embodiment is used.

[0230] However, while in the first embodiment, the coating device 1 includes the first distance measuring device 37 and the second distance measuring device 39, in this third embodiment, only one distance measuring device (for example, the first distance measuring device 37) is included. Alternatively, only the first distance measuring device 37 may be used. [3-2. Method for determining the second eccentricity] In the third embodiment, the first amount of eccentricity is measured by the first distance measuring device 37, but the second amount of eccentricity is calculated using the first amount of eccentricity.

[0231] A method for determining this second amount of eccentricity will be described below. As shown in FIG. 5, when the base 3 rotates, for example, 90° in the direction of arrow A (i.e., rotates to the right), point k, which was at 0° (first phase), moves to 90° (second phase).

[0232] Therefore, the curved state of the base 3 at the 0° position of the k point when measured from above in the Z-axis direction is considered to be similar to the curved state of the base 3 at the 90° position of the k point when measured from the right in the Y-axis direction after the base 3 is rotated 90°.

[0233] Therefore, in the third embodiment, a first amount of eccentricity detected at a first phase (eg, 0°) is used as a second amount of eccentricity detected at a second phase (eg, 90°). Specifically, as shown in FIG. 14, first eccentricity amounts h1, h2, etc. obtained at intervals of 15° from the 0° position are set as second eccentricity amounts h1, h2, etc. at intervals of 15° from a position where the phase is shifted by 90° in the A direction (i.e., the 90° position).

[0234] As a result, even if only the first distance measuring device 37 is provided, not only the first amount of eccentricity but also the second amount of eccentricity can be obtained. [3-3. Coating method] In this third embodiment, similarly to the first embodiment, a first distance measuring device 37 is used to determine a first eccentricity amount corresponding to a first phase in the Z-axis direction (see Figure 5) every 15° when the base body 3 rotates.

[0235] Then, using the first eccentricity amounts at intervals of 15°, second eccentricity amounts corresponding to the second phase are set at intervals of 15°, as shown in FIG. Thereafter, the first eccentricity amount and the second eccentricity amount are used to apply the slurry in the same manner as in the first embodiment.

[0236] The third embodiment has the same effects as the first embodiment. In addition, the third embodiment does not use the second distance measuring device 39, and therefore has the advantage of being able to simplify the device configuration. It should be noted that the third embodiment can be applied to the second embodiment. [4. Fourth embodiment] Next, a fourth embodiment will be described, but the description of the same contents as those of the first embodiment will be omitted. Note that the same numbers as those of the first embodiment will be used for the components.

[0237] In the fourth embodiment, the configuration of the non-contact sensor is different from that of the first embodiment, so the following description will focus on the differences. [4-1. Non-contact sensors] In the fourth embodiment, as shown in FIG. 15, a transmission type sensor is used as the non-contact sensor.

[0238] That is, the non-contact sensor in the fourth embodiment is a transmission type sensor that irradiates a laser onto a measurement object and its surroundings, and measures the positional deviation of the measurement object and the like using the transmitted light that passes through (i.e., penetrates) the surroundings of the measurement object. This will be described in detail below.

[0239] As shown in FIG. 15, in the fourth embodiment, a first distance measuring device 91 and a second distance measuring device 93 are provided as non-contact sensors. The first distance measuring device 91 includes a light projecting unit 91a that projects a laser beam downward in the Z-axis direction onto the base 3, and a light receiving unit 91b that receives the transmitted light of the laser that has passed through the periphery of the base 3.

[0240] The light-projecting unit 91a and the light-receiving unit 91b are disposed opposite each other in the Z-axis direction with the base 3 in between. The range in which the light-projecting unit 91a irradiates a laser and the light-receiving unit 91b receives the transmitted light, i.e., the detection range in the Y-axis direction, is set to be wider than the maximum amplitude of the base 3 so as to include the entire base 3.

[0241] Similarly, the second distance measuring device 93 includes a light projecting unit 93a that projects a laser beam onto the base 3 to the left in the Y-axis direction, and a light receiving unit 93b that receives the transmitted laser light that has passed through the periphery of the base 3.

[0242] The light-projecting unit 93a and the light-receiving unit 93b are disposed opposite each other in the Y-axis direction with the base 3 in between. The range in which the light-projecting unit 93a irradiates a laser and the light-receiving unit 93b receives the transmitted light, i.e., the detection range in the Z-axis direction, is set to be wider than the maximum amplitude of the base 3 so as to include the entire base 3. [4-2. Non-contact sensor measurement method] In the fourth embodiment, the curved state of the base body 3, and therefore the first and second deviation amounts, can be obtained by the above-mentioned non-contact sensor.

[0243] For example, as shown in FIG. 15, when the base 3 is curved in the vertical direction, the second distance measuring device 93 can determine the vertical position of the base 3, for example the position of the upper end or lower end of the base 3, as the first position.

[0244] Note that instead of the first position, the distance (first distance) from a reference position (for example, a position where the base body 3 is pivotally supported) to the upper end or lower end of the base body 3 may be obtained. And since the original first position (i.e., the reference position) when the base body 3 is not curved is registered in advance, the first eccentricity amount can be obtained from the difference between the registered first position and the measured first position.

[0245] Similarly, if the base 3 is curved in the left-right direction, the first distance measuring device 91 can determine the position of the base 3 in the left-right direction, for example the position of the right end or left end of the base 3, as the second position.

[0246] Instead of the second position, the distance (second distance) from a reference position (for example, a position where the base body 3 is pivotally supported) to the right end or left end of the base body 3 may be obtained. Since the original second position (i.e., the reference position) when the base 3 is not curved is registered in advance, the second eccentricity amount can be calculated from the difference between the registered second position and the measured second position.

[0247] The fourth embodiment provides the same effects as the first embodiment. Moreover, the fourth embodiment can be applied to the second embodiment. Furthermore, in the fourth embodiment, similarly to the third embodiment, the first deviation amount and the second deviation amount can be obtained by using only one of the first distance measuring device 91 and the second distance measuring device 93. 5. Other embodiments It goes without saying that the present disclosure is not limited to the above-described embodiment, and can be embodied in various forms without departing from the scope of the present disclosure.

[0248] (1) For example, various configurations may be adopted for the configuration of the coating device without departing from the scope of this disclosure. (2) In addition, various configurations can be adopted for the materials of the substrate and the slurry without departing from the scope of the present disclosure.

[0249] (3) The base body may have various configurations within the scope of the present disclosure. For example, the base body may have a polygonal or curved cylindrical shape (as viewed from the X-axis direction) in addition to a cylindrical shape. The base body may have a cylindrical shape in addition to a cylindrical shape (as viewed from the X-axis direction), or may have a polygonal or curved columnar shape in addition to a cylindrical shape.

[0250] (4) The present disclosure can be applied, for example, to the fields of slurry film formation on the outer peripheral surface of solid oxide fuel cells (SOFCs) and solid oxide electrolysis cells (SOECs), slurry film formation on the outer peripheral surface of cylindrical products, and slurry film formation on the outer peripheral surface of cylindrical products.

[0251] (5) Note that the function of one component in each of the above embodiments may be shared by multiple components, or the functions of multiple components may be performed by one component. Also, a part of the configuration of each of the above embodiments may be omitted. Also, at least a part of the configuration of each of the above embodiments may be added to or substituted for the configuration of the other of the above embodiments. Note that all aspects included in the technical idea specified by the wording described in the claims are embodiments of the present disclosure. [Explanation of symbols]

[0252] 1... Coating device 3, K...substrate 7...Support mechanism 13...Head section 15...Electronic control device 35…Dispenser 37, 91…1st distance measuring device 37a, 39a, 91a, 93a...Light projecting section 37b, 39b, 91b, 93b...light receiving section 39, 93…Second distance measuring device 41...Dispenser moving mechanism 45...Arithmetic section 47...Control section 51...Detection control unit 53…Nozzle 55...Nozzle control section 73...Base 81...Single cell (single fuel cell cell) 3a, 73a...outer surface

Claims

1. 1. A coating apparatus for use in the manufacture of a solid oxide electrochemical cell, the coating apparatus comprising: a substrate extending in a first axial direction, the substrate being rotated about the first axis, and a slurry being coated on an outer peripheral surface of the substrate, the coating apparatus comprising: a support mechanism capable of rotating the base body in a circumferential direction while supporting both end portions of the base body in the first axial direction; a nozzle for ejecting the slurry to be applied to the substrate; a detection unit that detects a first eccentricity amount of the base body in a second axial direction perpendicular to the first axis and a second eccentricity amount of the base body in a third axial direction that passes through an intersection of the first axis and the second axis and is perpendicular to the first axis; a moving mechanism capable of moving a position of the nozzle based on the first amount of eccentricity and the second amount of eccentricity so that the slurry is discharged from the nozzle while keeping the distance between the base and the nozzle substantially constant; The coating device comprises:

2. The coating device according to claim 1 , As a configuration for keeping the peripheral speed of the outer peripheral surface of the base relative to the nozzle substantially constant when the base is rotating, the nozzle positioned to apply the slurry along the second axial direction; a configuration in which the moving mechanism is driven to control a position of the nozzle so that a portion of the nozzle from which the slurry is discharged faces a vertex of the outer circumferential surface of the base that is closest to the nozzle; Equipped with a coating device.

3. The coating device according to claim 1 or 2, The coating apparatus, wherein the detection unit includes a first detection unit that detects the first amount of eccentricity and a second detection unit that detects the second amount of eccentricity.

4. The coating device according to any one of claims 1 to 3, a detection control unit that detects the first amount of eccentricity and the second amount of eccentricity when the slurry is applied to the base body while the base body is rotated in the circumferential direction.

5. The coating device according to any one of claims 1 to 4, a coating apparatus that detects the first amount of eccentricity and the second amount of eccentricity for each predetermined rotation angle of the substrate.

6. 1. A coating apparatus used in the manufacture of a solid oxide electrochemical cell, the coating apparatus comprising: a substrate extending in a first axial direction, the substrate being rotated about the first axis, and a slurry being coated on an outer peripheral surface of the substrate, the coating apparatus comprising: a support mechanism capable of rotating the base body in a circumferential direction while supporting both end portions of the base body in the first axial direction; a nozzle for ejecting the slurry to be applied to the substrate; a detection unit that detects a first eccentricity amount of the base body in a second axial direction perpendicular to the first axis at a first phase in the rotation; a calculation unit that calculates, based on the first eccentricity amount in the first phase, a second eccentricity amount of the base body in the third axial direction, which corresponds to a second phase obtained by shifting the first phase by an angle between the second axis and a third axis that passes through an intersection point of the first axis and the second axis and is perpendicular to the first axis; and a moving mechanism capable of moving a position of the nozzle based on the first amount of eccentricity and the second amount of eccentricity so that the slurry is discharged from the nozzle while keeping the distance between the base and the nozzle substantially constant; The coating device comprises:

7. The coating device according to claim 6, As a configuration for keeping the peripheral speed of the outer peripheral surface of the base relative to the nozzle substantially constant when the base is rotating, the nozzle positioned to apply the slurry along the second axial direction; a configuration in which the moving mechanism is driven to control a position of the nozzle so that a portion of the nozzle from which the slurry is discharged faces a vertex of the outer circumferential surface of the base that is closest to the nozzle; Equipped with a coating device.

8. The coating device according to claim 6 or 7, a detection control unit that detects the first amount of eccentricity when the slurry is applied to the substrate while the substrate is rotated in the circumferential direction.

9. The coating device according to claim 8, The detection control unit detects the first eccentricity amount for each rotation angle of the substrate.

10. The coating device according to any one of claims 1 to 9, The second axis and the third axis are substantially perpendicular.

11. The coating device according to any one of claims 1 to 10, The application device, wherein the detection unit includes a non-contact sensor.

12. The coating device according to claim 11, The non-contact sensor is a coating device that includes a light-projecting unit that is arranged opposite the base and that irradiates the base with a laser, and a light-receiving unit that receives light reflected by the base from the laser.

13. The coating device according to claim 11, The non-contact sensor is a coating device that includes a light-projecting unit that irradiates the base and its surroundings with a laser, and a light-receiving unit that receives transmitted light from the laser that passes through the surroundings of the base, the light-projecting unit being disposed on either side of the base.

14. The coating device according to any one of claims 11 to 13, A coating apparatus, wherein the detection range of the non-contact sensor is equal to or greater than a maximum amplitude of the substrate when the substrate is rotated.

15. The coating device according to any one of claims 1 to 14, a nozzle control unit that controls the position of the nozzle to apply the slurry so that a tip direction of the nozzle is perpendicular to a tangent line on the coating surface of the substrate.

16. A film forming method used in the manufacture of a solid oxide electrochemical cell, comprising: rotating a substrate extending in a first axial direction about the first axis; and applying a slurry from a nozzle onto an outer peripheral surface of the substrate to form a film on the outer peripheral surface, the method comprising the steps of: a coating step of discharging the slurry from the nozzle onto an outer circumferential surface of the base while supporting both end portions of the base in the first axial direction so that the base can be rotated in a circumferential direction, In the coating step, a film is formed by moving a position of the nozzle based on a first eccentricity amount of the substrate in a second axial direction perpendicular to the first axis and a second eccentricity amount of the substrate in a third axial direction passing through an intersection of the first axis and the second axis and perpendicular to the first axis, so that the slurry is ejected from the nozzle while maintaining a substantially constant distance between the substrate and the nozzle.

17. The film forming method according to claim 16, In order to keep the peripheral speed of the outer peripheral surface of the base relative to the nozzle substantially constant when the base is rotating, The nozzle is positioned to apply the slurry along the second axial direction; and A film forming method comprising controlling a position of the nozzle so that a portion of the nozzle that ejects the slurry faces a vertex of an outer circumferential surface of the substrate that is closest to the nozzle.

18. A method for producing a solid oxide electrochemical cell, comprising the steps of: using the film-forming method according to claim 16 or 17 to produce a solid oxide electrochemical cell including a plurality of unit cells, each unit cell including a fuel electrode, a solid electrolyte membrane, and a cathode, and an interconnector that electrically connects adjacent unit cells, on an outer circumferential surface side of a tubular base portion extending in the first axial direction, the method comprising the steps of: a coating step of rotating the substrate made of the base portion or the substrate having a fired layer on an outer peripheral surface side of the base portion in the circumferential direction and coating the outer peripheral surface side of the substrate with the slurry for forming at least one of a plurality of components constituting the solid oxide electrochemical cell, the components including the fuel electrode, the solid electrolyte membrane, the air electrode, and the interconnector; a firing step of firing the slurry applied to the outer peripheral surface of the base body after the coating step; Equipped with In the coating step, detecting a first eccentricity of the base body in the second axial direction perpendicular to the first axis, and a second eccentricity of the base body in the third axial direction passing through an intersection of the first axis and the second axis and perpendicular to the first axis; a position of the nozzle that ejects the slurry is moved based on the first eccentricity amount and the second eccentricity amount while both end portions of the base in the first axial direction are supported and the base is rotated in the circumferential direction, and the slurry is ejected from the nozzle while keeping the distance between the base and the nozzle substantially constant, and the slurry is applied to the outer peripheral surface of the base to form a film. A method for manufacturing a solid oxide electrochemical cell.

19. 20. A method for producing a solid oxide electrochemical cell according to claim 18, comprising the steps of: In the coating step, detecting the first eccentricity and the second eccentricity of the base at a position where another unit cell is to be formed while the slurry for forming the components of the one unit cell is being applied based on the first eccentricity and the second eccentricity of the base at a position where one unit cell is to be formed among the plurality of unit cells; A method for manufacturing a solid oxide electrochemical cell.

20. A method for producing a solid oxide electrochemical cell according to claim 18 or 19, comprising the steps of: detecting the first amount of eccentricity and the second amount of eccentricity for each predetermined rotation angle of the base body; A method for manufacturing a solid oxide electrochemical cell.

21. A method for producing a solid oxide electrochemical cell according to any one of claims 18 to 20, comprising the steps of: In the coating step, at least one of the first eccentricity amount and the second eccentricity amount is detected using a non-contact sensor. A method for manufacturing a solid oxide electrochemical cell.

22. A method for producing a solid oxide electrochemical cell according to any one of claims 18 to 21, comprising the steps of: In the coating step, at least one of the first amount of eccentricity and the second amount of eccentricity is detected using a non-contact sensor including a light projecting unit that is disposed opposite to the base and that irradiates the base with a laser and a light receiving unit that receives light reflected by the base from the laser. A method for manufacturing a solid oxide electrochemical cell.

23. A method for producing a solid oxide electrochemical cell according to any one of claims 18 to 21, comprising the steps of: In the coating step, at least one of the first amount of eccentricity and the second amount of eccentricity is detected using a non-contact sensor including a light projecting unit that irradiates the base and its periphery with a laser and a light receiving unit that receives transmitted light of the laser that has passed through the periphery of the base, the non-contact sensor being disposed on either side of the base. A method for manufacturing a solid oxide electrochemical cell.

24. A method for producing a solid oxide electrochemical cell, comprising the steps of: using the film-forming method according to claim 16 or 17 to produce a solid oxide electrochemical cell including a plurality of unit cells, each unit cell including a fuel electrode, a solid electrolyte membrane, and a cathode, and an interconnector that electrically connects adjacent unit cells, on an outer circumferential surface side of a tubular base portion extending in the first axial direction, the method comprising the steps of: a coating step of rotating the substrate made of the base portion or the substrate having a fired layer on an outer peripheral surface side of the base portion in the circumferential direction and coating the outer peripheral surface side of the substrate with the slurry for forming at least one of a plurality of components constituting the solid oxide electrochemical cell, the components including the fuel electrode, the solid electrolyte membrane, the air electrode, and the interconnector; a firing step of firing the slurry applied to the outer peripheral surface of the base body after the coating step; Equipped with In the coating step, detecting a first eccentricity of the base body in a second axial direction perpendicular to the first axis at a first phase of the rotation; determining, based on the first eccentricity amount in the first phase, a second eccentricity amount of the base body in the third axial direction, which corresponds to a second phase obtained by shifting the first phase by an angle between the second axis and the third axis that passes through an intersection point between the first axis and the second axis and is perpendicular to the first axis; a position of the nozzle that ejects the slurry is moved based on the first eccentricity amount and the second eccentricity amount while both end portions of the base in the first axial direction are supported and the base is rotated in the circumferential direction, and the slurry is ejected from the nozzle while keeping the distance between the base and the nozzle substantially constant, and the slurry is applied to the outer peripheral surface of the base to form a film. A method for manufacturing a solid oxide electrochemical cell.

25. 25. A method for producing a solid oxide electrochemical cell according to claim 24, comprising the steps of: detecting the first eccentricity for each predetermined rotation angle of the base body; A method for manufacturing a solid oxide electrochemical cell.

26. A method for producing a solid oxide electrochemical cell according to claim 24 or 25, comprising the steps of: In the coating step, the first eccentricity amount is detected by using a non-contact sensor. A method for manufacturing a solid oxide electrochemical cell.

27. 27. A method for producing a solid oxide electrochemical cell according to claim 26, comprising the steps of: The detection range of the non-contact sensor is equal to or greater than the maximum swing width of the base when the base is rotated. A method for manufacturing a solid oxide electrochemical cell.

28. A method for producing a solid oxide electrochemical cell according to any one of claims 24 to 27, comprising the steps of: The position of the nozzle is controlled so that the tip direction of the nozzle is perpendicular to a tangent line on the coating surface of the substrate, and the slurry is applied. A method for manufacturing a solid oxide electrochemical cell.

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