Biochip and Method for Manufacturing the Same

Abstract

To provide a biochip and a manufacturing method in which the problem of overflow of a liquid specimen is avoided, and which can deal with a large amount of the liquid specimen.SOLUTION: A biochip comprises a substrate 110, an insulator layer IL, a semiconductor layer 120, a dielectric layer 130, a metal layer 140, and a protective layer 150. The semiconductor layer is disposed on the insulator layer, and has a reaction zone 121. The dielectric layer is disposed on the semiconductor layer, and has a first aperture O1. The metal layer is disposed on the dielectric layer, and has a source, a drain and a wall structure. The wall structure 141 surrounds the first aperture, the source and the drain. The protective layer is disposed on the metal layer, and has a flat part 151, a protruding part 152, a second aperture O2, and a third aperture O3. The flat part surrounds and defines the second aperture. The protruding part is disposed to correspond with the wall structure. The protruding part surrounds and defines the third aperture. The second aperture connects the third aperture and the first aperture, and allows the reaction zone to be exposed.SELECTED DRAWING: Figure 6

Description

Technical Field

[0001] The present invention relates to a semiconductor chip and a method for manufacturing the same, and more particularly to a biochip and a method for manufacturing the same.

Background Art

[0002] In a general biochip, usually, since the space for containing the test solution is limited by the size of the reaction region, if the amount of the test solution increases or the addition of the test solution is incorrect, the problem of overflow of the test solution is likely to occur.

Summary of the Invention

Problems to be Solved by the Invention

[0003] The present invention provides a biochip and a method for manufacturing the same that avoid the problem of overflow of the test solution and can handle a large amount of the test solution. Thereby, when a plurality of reaction regions are arranged in the biochip, the reaction regions can be used for detecting different types of biological substances, and there is no need to worry about the problem of cross-contamination due to overflow of the test solution between different reaction regions. Therefore, the effect of simultaneously detecting a plurality of biological substances can be achieved.

Means for Solving the Problems

[0004] The biochip of the present invention may be configured to detect biological substances in a test solution. The biochip includes a substrate, an insulating layer, a semiconductor layer, a dielectric layer, a metal layer, and a protective layer. The insulating layer is disposed on the substrate. The semiconductor layer is disposed on the insulating layer and has a reaction region. The dielectric layer is disposed on the semiconductor layer and has a first opening. The metal layer is disposed on the dielectric layer and includes a source, a drain, and a wall structure. The source and the drain are electrically connected to the semiconductor layer, respectively. The wall structure surrounds the first opening, the source, and the drain. The protective layer is disposed on the metal layer and has a flat portion, a protruding portion, a second opening, and a third opening. The flat portion surrounds and defines the second opening. The protruding portion is disposed corresponding to the wall structure, and the protruding portion surrounds and defines the third opening. The second opening connects the third opening and the first opening to expose the reaction region.

[0005] In one embodiment of the present invention, the source, the drain, and the wall structure are separated from each other, and the source and the drain are electrically insulated from the wall structure.

[0006] In one embodiment of the present invention, in the three-dimensional view of the biochip, the wall structure does not completely surround the first opening.

[0007] In one embodiment of the present invention, in the three-dimensional view of the biochip, the wall structure completely surrounds the first opening.

[0008] In one embodiment of the present invention, the minimum distance between the wall structure and the source is from 0.1 micrometer to 5 micrometers.

[0009] In one embodiment of the present invention, in the three-dimensional view of the biochip, the third opening is larger than the second opening.

[0010] In one embodiment of the present invention, the protruding portion completely surrounds the first opening and the second opening.

[0011] In one embodiment of the present invention, the test liquid is disposed within the first opening, and the upper surface of the test liquid is positioned between the upper surface of the protruding portion and the upper surface of the flat portion.

[0012] In one embodiment of the present invention, the metal layer further includes a source extension pad and a drain extension pad, and the biochip further includes a first transfer pad and a second transfer pad. The first transfer pad and the second transfer pad are respectively disposed on the insulating layer. The source is electrically connected to the source extension pad via the first transfer pad, and the drain is electrically connected to the drain extension pad via the second transfer pad.

[0013] The method for manufacturing the biochip of the present invention includes the following. A substrate is provided. An insulating layer is formed on the substrate. A semiconductor layer is formed on the insulating layer. The semiconductor layer has a reaction region. A dielectric layer is formed on the semiconductor layer. The dielectric layer has a first opening. A metal layer is formed on the dielectric layer. The metal layer includes a source, a drain, and a wall structure. The source and the drain are respectively electrically connected to the semiconductor layer, and the wall structure surrounds the first opening, the source, and the drain. A protective layer is formed on the metal layer. The protective layer has a flat portion, a protruding portion, a second opening, and a third opening. The flat portion surrounds and defines the second opening. The protruding portion is disposed corresponding to the wall structure, and the protruding portion surrounds and defines the third opening. The second opening connects the third opening and the first opening to expose the reaction region.

Effects of the Invention

[0014] Based on the above, in the biochip and its manufacturing method according to the present invention, by setting the wall structure, a protruding portion can be formed simultaneously with the formation of the protective layer, so that the process can be simplified. Since the protruding portion may be a closed pattern surrounding the first opening, the test liquid can be limited within the third opening, and it is possible to prevent the test liquid from overflowing outside the third opening. Compared with a general biochip, the biochip of the present invention can increase the volume of the biochip capable of holding the test liquid by setting the third opening, thus avoiding the overflow of the test liquid, coping with a large amount of test liquid, and improving the operating margin and convenience of the biochip. In this way, when a plurality of reaction regions are arranged in the biochip of the present invention, the reaction regions can be used for detecting different types of biological substances, and there is no need to worry about the problem of cross-contamination due to the overflow of the test liquid between different reaction regions. Therefore, the effect of simultaneously detecting a plurality of biological substances can be achieved.

[0015] To make the above content easier to understand, several embodiments will be described in detail below with reference to the drawings.

Brief Description of the Drawings

[0016] The accompanying drawings are included to provide a further understanding of the present invention, are incorporated herein, and constitute a part hereof. The drawings illustrate exemplary embodiments of the present invention and, together with the description, serve to explain the principles of the present invention.

Figure 1

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Figure 11

Mode for Carrying Out the Invention

[0017] FIGS. 1 to 4 are schematic perspective views of a method for manufacturing a biochip according to an embodiment of the present invention. FIG. 5 is a schematic cross-sectional view taken along the cutting line I-I' of the biochip in FIG. 4. FIG. 6 is a schematic cross-sectional view taken along the cutting line II-II' of the biochip in FIG. 4. In order to clarify the drawings and facilitate the illustration, in FIG. 4, the semiconductor layer 120, the metal layer 140, and the test liquid 200 inside the biochip 100 are omitted.

[0018] First, referring to FIGS. 4 to 6, the biochip 100 of the present embodiment may include a substrate 110, an insulating layer IL, a semiconductor layer 120, a dielectric layer 130, a metal layer 140, and a protective layer 150. The semiconductor layer 120 is disposed on the insulating layer IL and has a reaction region 121. The dielectric layer 130 is disposed on the semiconductor layer 120 and has a first opening O1. The metal layer 140 is disposed on the dielectric layer 130 and includes a source SD1, a drain SD2, and a wall structure 141. The source SD1 and the drain SD2 are electrically connected to the semiconductor layer 120, respectively. The wall structure 141 surrounds the first opening O1, the source SD1, and the drain SD2. The protective layer 150 is disposed on the metal layer 140 and has a flat portion 151, a protruding portion 152, a second opening O2, and a third opening O3. The flat portion 151 defines by surrounding the second opening O2. The protruding portion 152 is disposed corresponding to the wall structure 141, and the protruding portion 152 defines by surrounding the third opening O3. The second opening O2 connects the third opening O3 and the first opening O1 and exposes the reaction region 121. Also, the biochip 100 of the present embodiment may be configured to detect the biological substance 210 in the test solution 200.

[0019] Next, a method for manufacturing the biochip 100 of the present embodiment will be described. The method for manufacturing the biochip 100 of the present embodiment may include the following steps.

[0020] First, referring to FIG. 1, the substrate 110 is provided. In the present embodiment, the substrate 110 may be a silicon substrate or a silicon wafer. For example, the substrate 110 may be a P-type silicon substrate, but is not limited thereto.

[0021] Next, referring to FIG. 1, the insulating layer IL is formed on the substrate 110. In the present embodiment, the insulating layer IL is, for example, a gate oxide layer, but is not limited thereto.

[0022] Next, referring to FIG. 1, a semiconductor layer 120 is formed on the insulating layer IL. In the present embodiment, the semiconductor layer 120 has a reaction region 121, a source region 122, and a drain region 123. The reaction region 121 is located between the source region 122 and the drain region 123. In the present embodiment, the material of the semiconductor layer 120 may include polysilicon or other suitable semiconductor materials, but is not limited thereto. In some embodiments, the semiconductor layer 120 can be regarded as a channel in a transistor structure. Therefore, when the threshold voltage of the semiconductor layer 120 is exceeded, the channel opens and current can flow.

[0023] In some embodiments, in order to specifically identify and bind the biological substance 210 in the test liquid 200, an identification portion (not shown) may be provided on the reaction region 121 of the semiconductor layer 120. Specifically, one end of the identification portion may be connected and fixed to the reaction region 121, and the other end of the identification portion may be used to recognize and bind the biological substance 210. The identification portion may be a chemical molecule or a biological molecule. For example, the identification portion may be an antibody, an antigen, a nucleic acid, a carbohydrate, or a combination thereof, but is not limited thereto as long as the identification portion can specifically recognize and bind the biological substance 210.

[0024] Next, referring to FIG. 2, a dielectric layer 130 is formed on the semiconductor layer 120. The dielectric layer 130 has a first opening O1, an opening 131, and an opening 132. The first opening O1 can expose the reaction region 121 and a part of the insulating layer IL, and the first opening O1 has a sidewall O11. The opening 131 can expose a part of the source region 122, and the opening 132 can expose a part of the drain region 123.

[0025] Next, referring to FIG. 3, a metal layer 140 is formed on the dielectric layer 130. In the present embodiment, the metal layer 140 can cover a part of the dielectric layer 130 and expose another part of the dielectric layer 130. The metal layer 140 may include a source SD1, a drain SD2, and a wall structure 141. The source SD1 may be disposed on the dielectric layer 130 and within the opening 131, and the drain SD2 may be disposed on the dielectric layer 130 and within the opening 131. Thereby, the source SD1 and the drain SD2 can be electrically connected to the source region 122 and the drain region 123 of the semiconductor layer 120, respectively. The source SD1, the drain SD2, and the wall structure 141 are disposed on the same layer, and the source SD1, the drain SD2, and the wall structure 141 are physically separated from each other. The source SD1 and the drain SD2 are electrically insulated from the wall structure 141.

[0026] In this embodiment, in the three-dimensional view of the biochip 100, the wall structure 141 may surround the first opening O1, the source SD1, and the drain SD2, and the wall structure 141 does not necessarily completely surround the first opening O1. Specifically, in this embodiment, the wall structure 141 may include a first portion 1411 and a second portion 1412. The first portion 1411 has end points P1 and P2, and the second portion 1412 has end points P3 and P4. There is a minimum distance G1 between the end point P1 and the source SD1, between the end point P3 and the source SD1, between the end point P2 and the drain SD2, and between the end point P4 and the drain SD2. The minimum distance G1 may be, for example, from 0.1 micrometer (μm) to 5 micrometers, and the minimum distance G1 may be filled and laminated as part of the protrusion 152 by the subsequently formed protective layer 150, but is not limited thereto. If the minimum distance G1 is less than 0.1 micrometer, there is a risk of short circuit or bridge connection between the wall structure 141 and the source SD1 (or drain SD2). If the minimum distance G1 exceeds 5 μm, the subsequently formed protective layer may not be able to fill the gap, and there is a risk of notch formation in the annular protrusion 152. For example, when the thickness T1 of the protective layer 150 is 1 micrometer, the minimum distance G1 is 1.2 micrometers, and the subsequently formed protective layer 150 can fill the minimum distance G1. Also, in this embodiment, the outer shape of the first portion 1411 and the second portion 1412 is U-shaped, but is not limited thereto.

[0027] Next, referring to FIGS. 4 to 6, a protective layer 150 is formed on the metal layer 140. In the present embodiment, the protective layer 150 has a flat portion 151, a protruding portion 152, a second opening O2, and a third opening O3. The flat portion 151 may cover other portions of the dielectric layer 130 exposed by the metal layer 140, and the flat portion 151 may be disposed adjacent to the metal layer 140. The flat portion 151 surrounds and defines the second opening O2. The flat portion 151 has an upper surface 1511 facing away from the dielectric layer 130. In the present embodiment, the thickness T1 of the protective layer 150 may be, for example, from 1 micrometer to 3 micrometers, but is not limited thereto.

[0028] The second opening O2 may connect the third opening O3 and the first opening O1 to expose the reaction region 121. The second opening O2 may overlap and correspond to the first opening O1 in the normal direction Z of the substrate 110. The second opening O2 has a side wall O21. The side wall O21 of the second opening O2 may be substantially flush with the side wall O11 of the first opening O1, but is not limited thereto.

[0029] The protruding portion 152 is disposed on the metal layer 140 and the flat portion 151, and the protruding portion 152 may be disposed so as to overlap and correspond to the wall structure 141, the source SD1, and the drain SD2 in the normal direction Z of the substrate 110. The protruding portion 152 may surround and define the third opening O3, and the protruding portion 152 may be disposed so as to form the third opening O3. The protruding portion 152 may completely surround the first opening O1 and the second opening O2. The protruding portion 152 has an upper surface 1521 facing away from the metal layer 140. In the normal direction Z of the substrate 110, the upper surface 1521 of the protruding portion 152 may be higher than the upper surface 1511 of the flat portion 151.

[0030] In some embodiments, the protrusion 152 can be regarded as a continuous three-dimensional structure in which the protective layer 150 protrudes in a direction away from the metal layer 140 from the upper surface 142 of the metal (i.e., the surface of the metal layer 140 on the side opposite to the dielectric layer 130). The layer 140 is continuous in the direction away from the metal layer 140. In some embodiments, in the top view of the biochip 100, the shape of the protrusion 152 can be regarded as an annular shape without a closed notch in order to prevent the outflow of the test liquid 200.

[0031] The third opening O3 may be connected to the second opening O2, and the third opening O3 may overlap with the second opening O2 corresponding thereto in the normal direction Z of the substrate 110. The third opening O3 has a side wall O31. The side wall O31 of the third opening O3 is not flush with the side wall O21 of the second opening O2. Further, in the perspective view of the biochip 100, the third opening O3 may be larger than the first opening O1, the second opening O2, and the reaction region 121.

[0032] Next, referring to FIGS. 5 and 6, the test liquid 200 may contain the biological substance 210 and the liquid 220. The test liquid 200 may contain, for example, a body fluid such as serum, and the biological substance 210 may contain, for example, a microorganism or a biomolecule, but is not limited thereto. Examples of the microorganism include bacteria, viruses, or combinations thereof, and examples of the biomolecule include nucleic acids (including deoxyribonucleic acid, ribonucleic acid, or combinations thereof), nucleotides, proteins, carbohydrates, lipids, or combinations thereof, but are not limited thereto.

[0033] In the present embodiment, the test liquid 200 may be disposed in the first opening O1, the second opening O2, and the third opening O3, and the upper surface 200a of the test liquid 200 may cover the upper surface 1511 of the flat portion 151 in the third opening O3. In the normal direction Z of the substrate 110, the upper surface 200a of the test liquid 200 may be higher than the upper surface 1511 of the flat portion 151, or the upper surface 200a of the test liquid 200 may be between the upper surface 1521 of the protrusion 152 and the upper surface 1511 of the flat portion 151.

[0034] In this embodiment, by setting the wall structure 141, the protruding portion 152 can be formed simultaneously with the formation of the protective layer 150. Therefore, no additional process is required to manufacture the protruding portion 152 used to form the third opening O3, and the process is simplified.

[0035] In this embodiment, since the wall structure 141 can surround the first opening O1, the source SD1, and the drain SD2, the protruding portion 152 installed on the upper portion of the wall structure 141 may be a closed pattern (for example, a closed rectangle) surrounding the first opening O1. Thus, as shown in FIGS. 5 and 6, the test liquid 200 is limited within the third opening O3, and the test liquid 200 is prevented from overflowing outside the third opening O3. For example, when the test liquid 200 added to the first opening O1 exceeds the second opening O2 (or when the upper surface 200a of the test liquid 200 added to the first opening O1 is higher than the upper surface 1511 of the flat portion 151), due to the setting of the protruding portion 152, the test liquid 200 can be limited within the third opening O3, and the test liquid 200 can be prevented from overflowing. Thereby, it is possible to avoid the test liquid from overflowing into another adjacent reaction region and interfering with the results of another biological substance. Therefore, the biochip 100 of this embodiment can increase the volume of the biochip 100 that can hold the test liquid 200 compared with a general biochip by setting the third opening O3. Thereby, it can cope with a larger amount of the test liquid 200, and the operating margin and convenience of the biochip 100 can be improved. In this way, in the biochip 100 of this embodiment, a plurality of reaction regions can be arranged to simultaneously detect different biological substances, and there is no need to worry about the problem of cross-contamination due to the overflow of the test liquid between different reaction regions. Therefore, the effect of simultaneously detecting a plurality of biological substances can be achieved.

[0036] Other embodiments are listed below for the purpose of explanation. Note that in the following embodiments, the reference numerals and some of the content of the foregoing embodiments are continued to be used, and the same reference numerals are used to indicate the same or similar components, and the description of the same technical content is omitted. It should be noted that for the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.

[0037] FIGS. 7 to 10 are schematic perspective views of a method for manufacturing a biochip according to another embodiment of the present invention. FIG. 11 is a schematic cross-sectional view taken along the cutting line III-III' of the biochip in FIG. 10. For clarity of the drawings and ease of illustration, in FIG. 10, the semiconductor layer 120, the first transfer pad 120a, the second transfer pad 120b, the metal layer 140a, and the test liquid 200 in the biochip 100a are omitted.

[0038] Referring to FIGS. 1 to 6 and FIGS. 7 to 11 together, since the biochip 100a of the present embodiment is similar to the biochip 100 in FIGS. 1 to 6, the components of the present embodiment that are the same as or similar to those of the embodiment in FIGS. 1 to 6 can be implemented using the same materials or methods. Therefore, the same and similar descriptions in the two embodiments will not be repeated below, and the focus will mainly be on the differences between the two embodiments.

[0039] Specifically, the method for manufacturing the biochip 100a of the present embodiment may include the following steps.

[0040] First, referring to FIG. 7, a substrate 110 is provided, and a semiconductor layer 120, a first transfer pad 120a, and a second transfer pad 120b are formed on an insulating layer IL. The semiconductor layer 120, the first transfer pad 120a, and the second transfer pad 120b are arranged in the same layer, and the semiconductor layer 120, the first transfer pad 120a, and the second transfer pad 120b are physically separated from each other. In the present embodiment, the materials of the first transfer pad 120a and the second transfer pad 120b may include, but are not limited to, polysilicon or other suitable semiconductor materials.

[0041] Next, referring to FIG. 8, a dielectric layer 130a is formed on the semiconductor layer 120, the first transfer pad 120a, and the second transfer pad 120b. The dielectric layer 130a has a first opening O1, openings 131, 132, 133, 134, 135, and 136. The openings 133 and 134 can respectively expose another portion of the first transfer pad 120a, and the openings 135 and 136 can respectively expose another portion of the second transfer pad 120b.

[0042] Next, referring to FIG. 9, a metal layer 140a is formed on the dielectric layer 130a. In this embodiment, the metal layer 140a may include a source SD1, a drain SD2, a wall structure 141a, a source extension pad SD1a, and a drain extension pad SD2a. The source SD1 may be disposed on the dielectric layer 130a and within the openings 134 and 131, whereby the source SD1 can be electrically connected to the first transfer pad 120a and the source region 122 of the semiconductor layer 120, respectively. Since the source extension pad SD1a is disposed on the dielectric layer 130a and within the opening 133, the source extension pad SD1a can be electrically connected to the first transfer pad 120a. The drain SD2 may be disposed on the dielectric layer 130a and within the openings 132 and 135, whereby the drain SD2 can be electrically connected to the drain region 123 and the second transfer pad 120b of the semiconductor layer 120, respectively. The drain extension pad SD2a may be disposed on the dielectric layer 130a and within the opening 136, whereby the drain extension pad SD2a can be electrically connected to the second transfer pad 120b. That is, the source SD1 can be electrically connected to the source extension pad SD1a via the first transfer pad 120a, and the drain SD2 can be electrically connected to the drain extension pad SD2a via the second transfer pad 120b.

[0043] In this embodiment, in the three-dimensional view of the biochip 100, the wall structure 141a may completely surround the first opening O1. There is a minimum distance G2 between the wall structure 141a and the source SD1, between the wall structure 141a and the source extension pad SD1a, between the wall structure 141a and the drain SD2, and between the wall structure 141a and the drain extension pad SD2a. The minimum distance G2 may be, for example, greater than 0 micrometers, but is not limited thereto. Further, in this embodiment, the outer shape of the wall structure 141a is rectangular, but is not limited thereto.

[0044] Next, referring to FIGS. 10 and 11, a protective layer 150 is formed on the metal layer 140a. In this embodiment, the protective layer 150 has a flat portion 151, a protruding portion 152a, a second opening O2, and a third opening O3. The protruding portion 152a may be arranged corresponding to the wall structure 141a, the source SD1, the drain SD2, the source extension pad SD1a, and the drain extension pad SD2a in the normal direction Z of the substrate 110. The protruding portion 152a may surround and define the third opening O3, and the protruding portion 152a may be arranged to form the third opening O3. The protruding portion 152a may completely surround the first opening O1 and the second opening O2.

[0045] In the biochip 100a of this embodiment, since the wall structure 141a is a closed annular structure without a notch, it is guaranteed that the protruding portion 152a of the protective layer 150 formed on the wall structure 141a is also a closed annular structure without a notch.

[0046] In the biochip 100a of this embodiment, since the source SD1 and the drain SD2 need to transmit and receive signals through the settings of the first transfer pad 120a and the second transfer pad 120b respectively, the signal strength decays. In contrast, for the source SD1 and the drain SD2 of the biochip 100 shown in FIGS. 1 to 6, since there is no need to transmit and receive signals through the settings of the transfer pads, the risk of signal attenuation can be avoided.

[0047] In summary, in the biochip and its manufacturing method according to the present invention, by setting the wall structure, it is possible to form the protruding portion simultaneously with the formation of the protective layer, so that there is an effect of simplifying the process. Since the protruding portion may be a closed pattern surrounding the first opening, the test liquid is limited within the third opening, and it is possible to prevent the test liquid from overflowing outside the third opening. Compared with a general biochip, the biochip of the present invention can increase the volume of the biochip capable of holding the test liquid by setting the third opening, so as to avoid overflow of the test liquid, cope with a large amount of test liquid, and improve the operating margin and convenience of the biochip. In this way, when a plurality of reaction regions are arranged in the biochip of the present invention, the reaction regions can be used for detecting different types of biological substances, and there is no need to worry about the problem of cross-contamination due to overflow of the test liquid between different reaction regions. Therefore, the effect of simultaneously detecting a plurality of biological substances can be achieved.

[0048] It will be apparent to those skilled in the art that various modifications and variations can be made to the disclosed embodiments without departing from the scope or spirit of the invention. Considering the above, the invention is intended to cover modifications and variations as long as they come within the scope of the claims and their equivalents.

Industrial Applicability

[0049] The biochip and its manufacturing method of the present invention can avoid the problem of overflow of the test liquid and simultaneously detect a plurality of biological substances while coping with a large amount of test liquid.

Explanation of Reference Numerals

[0050] 100: Biochip 110: Substrate 120: Semiconductor layer 121: Reaction region 130: Dielectric layer 140: Metal layer 141: Wall structure 142, 1511, 1521, 200a: Above 150: Protective layer 151: Flat part 152: Protruding part 200: Test liquid 210: Biomass 220: Liquid IL: Insulating layer O1: First opening O11, O21, O31: Side wall O2: Second opening O3: Third opening T1: Thickness Z: Normal direction

Claims

1. A biochip configured to detect a biological substance in a test liquid, comprising: A substrate; an insulating layer disposed on the substrate; a semiconductor layer disposed on the insulating layer and having a reaction region; a dielectric layer disposed over the semiconductor layer and having a first opening exposing the reaction region of the semiconductor layer; disposed on the dielectric layer; a source and a drain, each electrically connected to the semiconductor layer; a wall structure surrounding the first opening, the source, and the drain; A metal layer comprising: a protective layer disposed on the metal layer, the protective layer having a flat portion, a protruding portion, a second opening, and a third opening; Equipped with the flat portion defines the second opening, the protrusion is disposed in correspondence with the wall structure, and the protrusion defines the third opening, the second opening connects the third opening and the first opening to expose the reaction region; Biochip.

2. the source, the drain, and the wall structure are isolated from each other, and the source and the drain are electrically insulated from the wall structure; The biochip of claim 1 .

3. In a three-dimensional view of the biochip, the wall structure does not completely surround the first opening. The biochip of claim 1 .

4. In a three-dimensional view of the biochip, the wall structure completely surrounds the first opening. The biochip of claim 1 .

5. the minimum distance between the wall structure and the source is between 0.1 micrometers and 5 micrometers; The biochip of claim 1 .

6. In a three-dimensional view of the biochip, the third opening is larger than the second opening. The biochip of claim 1 .

7. The protrusion completely surrounds the first opening and the second opening. The biochip of claim 1 .

8. The test liquid is placed in the first opening, and an upper surface of the test liquid is located between an upper surface of the protruding portion and an upper surface of the flat portion. The biochip of claim 1 .

9. the metal layer further comprises a source extension pad and a drain extension pad; The biochip comprises: a first transfer pad and a second transfer pad respectively disposed on the insulating layer; the source is electrically connected to the source extension pad via the first transfer pad, and the drain is electrically connected to the drain extension pad via the second transfer pad; The biochip of claim 1 .

10. 1. A method for manufacturing a biochip configured to detect a biological substance in a test liquid, comprising the steps of: Providing a substrate; forming an insulating layer on the substrate; forming a semiconductor layer having a reaction region on the insulating layer; forming a dielectric layer over the semiconductor layer having a first opening exposing the reaction region of the semiconductor layer; a source and a drain, each electrically connected to the semiconductor layer; a wall structure surrounding the first opening, the source, and the drain; forming a metal layer on the dielectric layer comprising: forming a protective layer on the metal layer, the protective layer having a flat portion, a protruding portion, a second opening, and a third opening; Equipped with the flat portion defines the second opening, the protrusion is disposed in correspondence with the wall structure, and the protrusion defines the third opening, the second opening connects the third opening and the first opening to expose the reaction region; A method for producing a biochip.

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