Analysis device

Abstract

To allow a user to grasp a surface state of an object to be analyzed to improve usability in component analysis.SOLUTION: An analysis observation device A comprises: an electromagnetic wave emitting unit 71 that emits primary electromagnetic waves; a reflection type objective lens 74 that collects secondary electromagnetic waves; a first detector 77A that receives the secondary electromagnetic waves and generates an intensity distribution spectrum; and a control unit 21 that performs component analysis of a sample SP on the basis of, the intensity distribution spectrum. The analysis observation device A further comprises: a lateral irradiation illumination 84 that irradiates the sample SP with illumination light from an oblique lateral side; a first camera 81 that collects reflected light and detects a quantity of received light; and a spectroscopic element 75 that divides a light path to guide the secondary electromagnetic waves to the first detector 77A and guide the reflected light to the first camera 81. The control unit 21 performs the component analysis of the sample SP on the basis of, the intensity distribution spectrum, and generates image data of the sample on the basis of, the quantity of received reflected light detected by the first camera 81.SELECTED DRAWING: Figure 8A

Description

Technical Field

[0001] The technology disclosed herein relates to an analytical device.

Background Art

[0002] For example, Patent Document 1 discloses an analytical device (spectroscopic device) for performing component analysis of a sample. Specifically, the spectroscopic device disclosed in Patent Document 1 includes a condenser lens for condensing primary electromagnetic waves (ultraviolet laser light) in order to perform component analysis using laser-induced breakdown spectroscopy (LIBS), and a collection head for collecting secondary electromagnetic waves (plasma) generated on the sample surface corresponding to the primary electromagnetic waves. According to Patent Document 1, by measuring the peak of the spectrum of the sample from the signal of the secondary electromagnetic wave, chemical analysis of the sample based on the measured peak can be performed.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] By the way, in order to improve the usability in component analysis, it is necessary to let the user grasp the surface state of the object to be analyzed, such as unevenness formed on the surface of the object to be analyzed. The configuration according to Patent Document 1 is inconvenient for improving usability because it cannot meet such needs.

[0005] The technology disclosed herein has been made in view of such points, and its object is to improve the usability in component analysis by letting the user grasp the surface state of the object to be analyzed.

Means for Solving the Problem

[0006] A first aspect of the present disclosure relates to an analytical apparatus including an electromagnetic wave emitting unit that emits primary electromagnetic waves for analyzing an object to be analyzed, a collection head that collects secondary electromagnetic waves generated in the object to be analyzed when the primary electromagnetic waves are emitted from the electromagnetic wave emitting unit, a detector that receives the secondary electromagnetic waves generated in the object to be analyzed and collected by the collection head and generates an intensity distribution spectrum that is the intensity distribution for each wavelength of the secondary electromagnetic waves, and a processing unit that performs component analysis of the object to be analyzed based on the intensity distribution spectrum generated by the detector. This analytical apparatus is arranged so as to surround the collection head, and includes side illumination that irradiates illumination light from an oblique side of the object to be analyzed, an imaging unit that collects reflected light reflected by the object to be analyzed via the collection head and detects the amount of received light of the collected reflected light, and a spectroscopic element that receives the secondary electromagnetic waves collected by the collection head and the reflected light collected by the collection head via a common optical path, and guides the secondary electromagnetic waves to the detector while splitting the common optical path so as to guide the reflected light to the imaging unit.

[0007] According to the first aspect of the present disclosure, the processing unit performs component analysis of the object to be analyzed based on the intensity distribution spectrum, and generates image data of the object to be analyzed based on the amount of received light of the reflected light detected by the imaging unit.

[0008] According to the first aspect, the analytical apparatus includes an imaging unit, and as an illumination device used for imaging by the imaging unit, includes side illumination that irradiates illumination light from an oblique upper side of the object to be analyzed. By providing side illumination around the collection head in this way, it is possible to allow the user to grasp the surface state that is difficult to capture when using other illuminations such as coaxial illumination. Thereby, the usability in component analysis can be improved.

[0009] Further, according to a second aspect of the present disclosure, the collection head has an opening provided at a radially central portion thereof, and has a primary mirror provided around the opening with a primary reflection surface that reflects the secondary electromagnetic wave generated in the object to be analyzed corresponding to the emission of the primary electromagnetic wave, and a secondary mirror provided with a secondary reflection surface that receives and further reflects the secondary electromagnetic wave reflected by the primary reflection surface. The collection head is constituted by a reflective objective lens that condenses the secondary electromagnetic wave by the primary mirror and the secondary mirror and guides it to the opening. The side illumination may be arranged so as to surround the outer periphery of the reflective objective lens.

[0010] According to the second aspect, by arranging the side illumination on the outer periphery of the reflective objective lens, it is possible to irradiate illumination light over a wider area without impairing the compactness of the reflective objective lens. As a result, it becomes possible to generate image data with excellent visibility and enable the user to more clearly grasp the surface state of the object to be analyzed. Thus, the second aspect is particularly effective when a reflective objective lens is used as the collection head.

[0011] Further, according to a third aspect of the present disclosure, the side illumination may be constituted by an annular illumination that annularly surrounds the reflective objective lens, and the central axis of the circle corresponding to the side illumination may be arranged to be coaxial with the optical axis of the reflective objective lens.

[0012] According to the third aspect, it is possible to irradiate illumination light so as to be rotationally symmetric about the optical axis of the reflective objective lens. This is advantageous for irradiating sufficient illumination light to the area imaged by the imaging unit.

[0013] Further, according to a fourth aspect of the present disclosure, the side illumination may include a light source that emits the illumination light, and a diffusion member that transmits the illumination light emitted from the light source and diffuses the illumination light in a radial direction orthogonal to the optical axis of the reflective objective lens.

[0014] According to the fourth aspect, by emitting illumination light through the diffusion member, the illumination light can be irradiated over a wider area. Thereby, the occurrence of separation that may be caused by the secondary mirror can be suppressed. By suppressing the occurrence of separation, image data with better visibility can be generated, and the surface state of the analysis object can be more clearly grasped by the user.

[0015] Also, according to the fifth aspect of the present disclosure, the side illumination may have a housing that covers the outer periphery of the reflective objective lens, and the light source may be supported by the housing while being separated from the outer peripheral surface of the reflective objective lens.

[0016] According to the fifth aspect, the thermal connection between the light source, the primary mirror, and the secondary mirror is suppressed. Thereby, the thermal influence on the primary mirror and the secondary mirror due to heat generation from the light source can be suppressed. By suppressing the thermal influence on the primary mirror and the secondary mirror, the displacement of both mirrors can be suppressed. This is effective in ensuring the accuracy of component analysis by the processing unit and improving the image resolution.

[0017] Also, according to the sixth aspect of the present disclosure, the light source may be arranged to be separated from the analysis object more than the secondary mirror in the optical axis direction of the reflective objective lens.

[0018] According to the sixth aspect, by configuring the light source not to approach the mounting surface more than necessary, a mounting space for the diffusion member in the optical axis direction can be secured. Also, by configuring the light source not to be separated from the mounting surface more than necessary, the inclination angle formed by the side illumination with respect to the reflective objective lens can be sufficiently secured without excessively increasing the diameter of the side illumination. Thereby, the illumination light can be irradiated onto an appropriate area, and image data with excellent visibility can be generated. As a result, the surface state of the analysis object can be more clearly grasped by the user.

[0019] Further, according to a seventh aspect of the present disclosure, the side illumination may be divided into a plurality of blocks along the circumferential direction around the optical axis of the reflective objective lens, and each block may be configured to be individually lit.

[0020] According to the seventh aspect, the side illumination can irradiate illumination light from various angles. As a result, the surface state of the analysis object can be more clearly grasped by the user.

[0021] Further, according to an eighth aspect of the present disclosure, the analysis apparatus includes coaxial illumination that irradiates illumination light through an optical path coaxial with the primary electromagnetic wave emitted from the electromagnetic wave emission unit, and the processing unit inputs a control signal to at least one of the side illumination and the coaxial illumination so as to irradiate illumination light from at least one of the side illumination and the coaxial illumination.

[0022] According to the eighth aspect, the analysis apparatus can selectively use two types of illumination devices with different irradiation directions. As a result, more diverse image data can be generated, which is advantageous for the user to grasp the surface state of the analysis object.

[0023] Further, according to a ninth aspect of the present disclosure, the analysis apparatus includes an analysis housing that houses the electromagnetic wave emission unit, the collection head, the detector, and the imaging unit, an objective lens that condenses the reflected light from the analysis object, and a second imaging unit that collects the reflected light condensed through the objective lens and detects the amount of received light of the collected reflected light, and an observation housing held by the analysis housing. The observation housing is provided with at least one of a second side illumination that is arranged so as to surround the objective lens and irradiates illumination light from an oblique side of the analysis object, and a second coaxial illumination that irradiates illumination light through an optical path common to the reflected light condensed through the objective lens, and the processing unit inputs a control signal to at least one of the second side illumination and the second coaxial illumination so as to irradiate illumination light from at least one of the second side illumination and the second coaxial illumination.

[0024] According to the ninth aspect, the analyzer can selectively use two types of illumination devices with different irradiation directions not only in the optical system for analysis but also in the optical system for observation. As a result, more diverse image data can be generated, which is advantageous for enabling the user to grasp the surface state of the object to be analyzed.

[0025] Further, according to the tenth aspect of the present disclosure, the analyzer includes a slide mechanism for sliding the analysis housing and the observation housing between a first state in which the collection head faces the object to be analyzed and a second state in which the objective lens faces the object to be analyzed. The processing unit sets the illumination conditions after switching so as to reproduce the illumination conditions referred to before switching, among the illumination conditions related to the side illumination and the coaxial illumination in the first state and the illumination conditions related to the second side illumination and the second coaxial illumination in the second state, before and after the switching between the first state and the second state.

[0026] According to the tenth aspect, image data can be generated under as identical conditions as possible when observing and analyzing the object to be analyzed. As a result, it becomes possible to switch between the image data generated during observation and the image data generated during analysis without giving the user a sense of discomfort, which is advantageous for improving usability.

[0027] Further, according to the eleventh aspect of the present disclosure, the distance between the object to be analyzed and the central portion of the collection head in the first state may be set to be equal to the distance between the object to be analyzed and the central portion of the objective lens in the second state.

[0028] According to the 11th aspect described above, the analysis apparatus is configured to match the working distance during the observation and analysis of the object to be analyzed. As a result, image data can be generated under as identical conditions as possible during the observation and analysis of the object to be analyzed. Consequently, it becomes possible to switch between the image data generated during observation and the image data generated during analysis without giving the user a sense of discomfort, which is advantageous for improving usability.

[0029] Further, according to the 12th aspect of the present disclosure, the electromagnetic wave emitting unit may be constituted by a laser light source that emits laser light as the primary electromagnetic wave, the collection head may collect the light generated in the object to be analyzed in response to the irradiation of the laser light emitted from the electromagnetic wave emitting unit, and the detector may generate an intensity distribution spectrum that is the intensity distribution for each wavelength of the light generated in the object to be analyzed and collected by the collection head.

Advantages of the Invention

[0030] As described above, according to the present disclosure, by allowing the user to grasp the surface state of the object to be analyzed, the usability in component analysis can be improved.

Brief Description of the Drawings

[0031]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8A

Figure 8B

Figure 9

Figure 10

Figure 11

Figure 12

Figure 13

Figure 14

Figure 15

Figure 16A

Figure 16B

Figure 17A

Figure 17B

Figure 18

Figure 19

Figure 20

Figure 21

Figure 22

Figure 23

Figure 24

Figure 25

Figure 26

Figure 27

Figure 28

Embodiments for Carrying Out the Invention

[0032] Hereinafter, embodiments of the present disclosure will be described based on the drawings. Note that the following description is illustrative.

[0033] <Overall Configuration of Analysis Observation Apparatus A> Figure 1 is a schematic diagram illustrating the overall configuration of an analysis observation apparatus A as an analysis apparatus according to an embodiment of the present disclosure. The analysis observation apparatus A illustrated in Figure 1 can perform magnified observation of a sample SP as an object to be observed and an object to be analyzed, and can also perform component analysis of the sample SP.

[0034] Specifically, the analysis and observation apparatus A according to the present embodiment can, for example, magnify and image a sample SP such as a minute object, an electronic component, a workpiece, etc., search for a site where component analysis should be performed in the sample SP, or perform inspection, measurement, etc. of its appearance. When focusing on its observation function, the analysis and observation apparatus A can be referred to as a magnifying observation apparatus, simply as a microscope, or as a digital microscope.

[0035] The analysis and observation apparatus A can also perform a method called Laser Induced Breakdown Spectroscopy (LIBS), Laser Induced Plasma Spectroscopy (LIPS), etc. when performing component analysis of the sample SP. When focusing on its analysis function, the analysis and observation apparatus A can be referred to as a component analysis apparatus, simply as an analysis apparatus, or as a spectroscopic apparatus.

[0036] As shown in FIG. 1, the analysis and observation apparatus A according to the present embodiment includes, as main components, an optical system assembly (optical system body) 1, a controller body 2, and an operation unit 3.

[0037] Among these, the optical system assembly 1 can image and analyze the sample SP and output an electrical signal corresponding to the imaging result and the analysis result to the outside.

[0038] The controller body 2 has a control unit 21 for controlling various components constituting the optical system assembly 1, such as a first camera 81. The controller body 2 can cause the optical system assembly 1 to observe and analyze the sample SP via the control unit 21. The controller body 2 also has a display unit 22 capable of displaying various information. Images captured by the optical system assembly 1, data indicating the analysis result of the sample SP, etc. can be displayed on this display unit 22.

[0039] The operation unit 3 includes a mouse 31, a console 32, and a keyboard 33 (the keyboard 33 is shown only in FIG. 18) for receiving operation inputs from the user. The console 32 can instruct the controller main body 2 to capture image data, adjust brightness, focus the first camera 81, etc. by operating buttons, adjustment knobs, etc.

[0040] Note that the operation unit 3 does not necessarily have all three of the mouse 31, the console 32, and the keyboard 33, and may have any one or two of them. Also, in addition to or instead of the mouse 31, the console 32, and the keyboard 33, a touch panel type input device, a voice type input device, etc. may be used. In the case of a touch panel type input device, it can be configured to detect any position on the screen displayed on the display unit 22.

[0041] <Details of the optical system assembly 1> FIGS. 2 to 4 are a perspective view, a side view, and a front view respectively illustrating the optical system assembly 1. FIG. 5 is an exploded perspective view of the optical system assembly 1, and FIG. 6 is a side view schematically showing the configuration of the optical system assembly 1.

[0042] As shown in FIGS. 1 to 6, the optical system assembly 1 includes a stage 4 that supports various devices and on which the sample SP is placed, and a head unit 6 attached to the stage 4. Here, the head unit 6 is formed by mounting an observation housing 90 in which an observation optical system 9 is housed on an analysis housing 70 in which an analysis optical system 7 is housed. Here, the analysis optical system 7 is an optical system for performing component analysis of the sample SP. The observation optical system 9 is an optical system for performing magnified observation of the sample SP. The head unit 6 is configured as a group of devices having both the analysis function and the magnified observation function of the sample SP.

[0043] In the following description, as shown in FIGS. 1 to 4, the front-rear direction and left-right direction of the optical system assembly 1 are defined. That is, the side facing the user is the front side of the optical system assembly 1, and the opposite side is the rear side of the optical system assembly 1. When the user and the optical system assembly 1 face each other, the right side as viewed from the user is the right side of the optical system assembly 1, and the left side as viewed from the user is the left side of the optical system assembly 1. Note that the definitions of the front-rear direction and left-right direction are for assisting in understanding the description and do not limit the actual usage state. Any direction can be used as the front.

[0044] Also, in the following description, the left-right direction of the optical system assembly 1 is defined as the "X direction", the front-rear direction of the optical system assembly 1 is defined as the "Y direction", the up-down direction of the optical system assembly 1 is defined as the "Z direction", and the direction of rotation about an axis parallel to this Z axis is defined as the "φ direction". The X direction and the Y direction are orthogonal to each other on the same horizontal plane, and the direction along that horizontal plane is defined as the "horizontal direction". The Z axis is the direction of the normal line orthogonal to that horizontal plane. These definitions can also be changed as appropriate.

[0045] Although details will be described later, the head portion 6 can move along the central axis Ac shown in FIGS. 2 to 6 or swing around this central axis Ac. This central axis Ac is configured to extend along the aforementioned horizontal direction, particularly the front-rear direction, as shown in FIG. 6 and the like.

[0046] (Stage 4) The stage 4 includes a base 41 installed on a workbench or the like, a stand 42 connected to the base 41, and a mounting table 5 supported by the base 41 or the stand 42. This stage 4 is a member for defining the relative positional relationship between the mounting table 5 and the head portion 6, and is configured to be able to mount at least the observation optical system 9 and the analysis optical system 7 of the head portion 6.

[0047] The base 41 constitutes approximately the lower half of the stage 4, and as shown in Fig. 2, it is formed in a pedestal shape with a longer dimension in the front-rear direction than in the left-right direction. The base 41 has a bottom surface that is installed on a workbench or the like. A mounting table 5 is attached to the front portion of the base 41.

[0048] Also, as shown in Fig. 6 and the like, on the rear portion of the base 41 (particularly, the portion located behind the mounting table 5), a first support portion 41a and a second support portion 41b are provided in a state arranged in order from the front side. Both the first and second support portions 41a, 41b are provided so as to protrude upward from the base 41. Circular bearing holes (not shown) are formed in the first and second support portions 41a, 41b so as to be concentric with the central axis Ac.

[0049] The stand 42 constitutes the upper half of the stage 4, and as shown in Figs. 2 to 3, Fig. 6 and the like, it is formed in a columnar shape extending in the vertical direction perpendicular to the base 41 (particularly, the bottom surface of the base 41). The head portion 6 is attached to the front surface of the upper portion of the stand 42 via a separate fixture 43.

[0050] Also, as shown in Fig. 6 and the like, on the lower portion of the stand 42, a first attachment portion 42a and a second attachment portion 42b are provided in a state arranged in order from the front side. The first and second attachment portions 42a, 42b have a configuration corresponding to the aforementioned first and second support portions 41a, 41b. Specifically, the first and second support portions 41a, 41b and the first and second attachment portions 42a, 42b are laid out such that the first support portion 41a is sandwiched between the first attachment portion 42a and the second attachment portion 42b, and the second attachment portion 42b is sandwiched between the first support portion 41a and the second support portion 41b.

[0051] In addition, circular bearing holes (not shown) that are concentric and have the same diameter as the bearing holes formed in the first and second support portions 41a and 41b are formed in the first and second attachment portions 42a and 42b. A shaft member 44 is inserted into these bearing holes via a bearing (not shown) such as a cross roller bearing. The shaft member 44 is arranged such that its axis is concentric with the aforementioned central axis Ac. By inserting the shaft member 44, the base 41 and the stand 42 are connected so as to be relatively swingable. The shaft member 44, together with the first and second support portions 41a and 41b and the first and second attachment portions 42a and 42b, constitutes the inclination mechanism 45 in the present embodiment.

[0052] By connecting the base 41 and the stand 42 via the inclination mechanism 45, the stand 42 is supported by the base 41 in a state where it can swing around the central axis Ac. By swinging around the central axis Ac, the stand 42 inclines in the left - right direction with respect to a predetermined reference axis As (see FIGS. 17A and 17B). This reference axis As can be an axis extending perpendicular to the upper surface (mounting surface 51a) of the mounting table 5 in the non - inclined state shown in FIG. 4 and the like. Also, the central axis Ac functions as the central axis (rotation center) of the swing by the inclination mechanism 45.

[0053] Specifically, the inclination mechanism 45 according to the present embodiment is capable of inclining the stand 42 about 90° to the right side with respect to the reference axis As or about 60° to the left side with respect to the reference axis As. As described above, since the head portion 6 is attached to the stand 42, this head portion 6 can also be inclined in the left - right direction with respect to the reference axis As. Inclining the head portion 6 is equivalent to inclining the analysis optical system 7 and the observation optical system 9, and thus, is equivalent to inclining the analysis optical axis Aa and the observation optical axis Ao described later.

[0054] The mounting device 43 has a rail portion 43a that guides the head portion 6 along the longitudinal direction of the stand 42 (which coincides with the vertical direction in the non-inclined state. Hereinafter, this is referred to as the "substantially vertical direction"), and a lock lever 43b for locking the relative position of the head portion 6 with respect to the rail portion 43a. Among these, the rear surface portion of the head portion 6 (specifically, the head mounting member 61) is inserted into the rail portion 43a and can be moved along the substantially vertical direction. Then, by operating the lock lever 43b with the head portion 6 set at a desired position, the head portion 6 can be fixed at the desired position. Also, the position of the head portion 6 can be adjusted by operating the first operation dial 46 shown in FIGS. 2 to 3.

[0055] Furthermore, a head drive unit 47 for moving the head portion 6 in the substantially vertical direction is incorporated in the stage 4 or the head portion 6. This head drive unit 47 includes an actuator (for example, a stepping motor) not shown that is controlled by the controller main body 2, and a motion conversion mechanism that converts the rotation of the output shaft of the stepping motor into a linear motion in the substantially vertical direction, and moves the head portion 6 based on the drive pulses input from the controller main body 2. By the head drive unit 47 moving the head portion 6, the head portion 6, and thus the analysis optical axis Aa and the observation optical axis Ao, can be moved along the substantially vertical direction.

[0056] The mounting table 5 is disposed in front of the center in the front-rear direction of the base 41 and is attached to the upper surface of this base 41. The mounting table 5 is configured as an electric mounting table provided in an open space, and can move the sample SP placed on its mounting surface 51a along the horizontal direction, move it up and down along the vertical direction, or rotate it along the φ direction.

[0057] Specifically, the mounting table 5 according to the present embodiment has a mounting table main body 51 having a mounting surface 51a for mounting the sample SP, a mounting table support portion 52 disposed between the base 41 and the mounting table main body 51 and displacing the mounting table main body 51, and a mounting table drive unit 53 shown in FIG. 18 described later.

[0058] The mounting table body 51 has an upper surface that constitutes a mounting surface 51a. This mounting surface 51a is formed to extend along a substantially horizontal direction. On the mounting surface 51a, the sample SP is placed in an air-open state, that is, a state where it is not housed in a vacuum chamber or the like.

[0059] The mounting table support portion 52 is a member that connects the base 41 and the mounting table body 51, and is formed in a substantially columnar shape extending along the vertical direction. The mounting table support portion 52 can accommodate the mounting table drive portion 53.

[0060] The mounting table drive portion 53 includes a plurality of actuators (for example, stepping motors), not shown, that are controlled by the controller main body 2, and a motion conversion mechanism that converts the rotation of the output shaft of the stepping motor into linear motion, and moves the mounting table body 51 based on drive pulses input from the controller main body 2. By the mounting table drive portion 53 moving the mounting table body 51, the mounting table body 51, and thus the sample SP placed on its mounting surface 51a, can be moved along the horizontal and vertical directions.

[0061] Similarly, the mounting table drive portion 53 can also rotate the mounting table body 51 along the φ direction based on drive pulses input from the controller main body 2. By the mounting table drive portion 53 rotating the mounting table body 51, the sample SP placed on the mounting surface 51a can also be rotated in the φ direction.

[0062] Also, by operating the second operation dial 54 and the like illustrated in FIG. 2, the mounting table body 51 can be manually moved and rotated. Details of the second operation dial 54 are omitted.

[0063] Returning to the descriptions of the base 41 and the stand 42, the aforementioned base 41 incorporates a first tilt sensor Sw3. This first tilt sensor Sw3 can detect the tilt of a reference axis As perpendicular to the mounting surface 51a with respect to the direction of gravity. On the other hand, a second tilt sensor Sw4 is attached to the stand 42. This second tilt sensor Sw4 can detect the tilt of the analysis optical system 7 with respect to the direction of gravity (more specifically, the tilt of the analysis optical axis Aa with respect to the direction of gravity). The detection signals of the first tilt sensor Sw3 and the second tilt sensor Sw4 are both input to the control unit 21.

[0064] (Head unit 6) The head unit 6 includes an analysis optical system 7 housed in an analysis housing 70, an observation optical system 9 housed in an observation housing 90, a head mounting member 61, a housing connector 64, and a slide mechanism (horizontal drive mechanism) 65. The head mounting member 61 is a member for connecting the analysis housing 70 to the stand 42. The housing connector 64 is a member for connecting the observation housing 90 to the analysis housing 70. The slide mechanism 65 is a mechanism for sliding the analysis housing 70 with respect to the stand 42.

[0065] Specifically, the head mounting member 61 according to the present embodiment is disposed on the rear side of the head unit 6 and is configured as a plate-like member for attaching the head unit 6 to the stand 42. As described above, the head mounting member 61 is fixed to the fixture 43 of the stand 42.

[0066] The head mounting member 61 has a plate body 61a extending substantially parallel to the rear surface of the head unit 6 and a cover member 61b protruding forward from the lower end of the plate body 61a. The plate body 61a is spaced apart from the rear surface of the head unit 6 in the front-rear direction in a first mode (first state) described later in which the reflection objective lens 74 faces the sample SP. The plate body 61a is in close contact with or close to the rear surface of the head unit 6 in a second mode (second state) described later in which the objective lens 92 faces the sample SP.

[0067] Further, as shown in FIG. 15, a guide rail 65a that constitutes a slide mechanism 65 is attached to the left end portion of the head attachment member 61. The guide rail 65a connects the head attachment member 61 and other elements in the head portion 6 (specifically, the analysis optical system 7, the observation optical system 9, and the housing coupler 64) so as to be relatively displaceable in the horizontal direction.

[0068] Hereinafter, the configurations of the analysis optical system 7 and the analysis housing 70, the observation optical system 9 and the observation housing 90, the housing coupler 64, and the slide mechanism 65 will be described in order.

[0069] -Analysis Optical System 7- FIG. 7 is a schematic diagram illustrating the configuration of the analysis optical system 7. FIGS. 8A and 8B are longitudinal sectional views illustrating the configurations of the reflection objective lens 74 and the side illumination 84. FIG. 10 is a bottom view illustrating the configurations of the reflection objective lens 74 and the side illumination 84.

[0070] Further, FIG. 11 is a perspective view illustrating the configuration of the secondary mirror 12, FIG. 12 is a perspective view illustrating the configuration of the deflection element 73, FIG. 13 is a plan view illustrating the positional relationship between the secondary mirror 12 and the deflection element 73, and FIG. 14 is a longitudinal sectional view illustrating the positional relationship between the primary mirror 11, the secondary mirror 12, and the deflection element 73.

[0071] The analysis optical system 7 is a set of components for analyzing a sample SP as an analysis object, and each component is accommodated in an analysis housing 70. The components constituting the analysis optical system 7 include an electromagnetic wave emitting unit 71, a collection head constituted by a reflection objective lens 74, and a detector constituted by a first detector 77A and a second detector 77B. At least these components are accommodated in the analysis housing 70. Further, elements for analyzing the sample SP also include a control unit 21 as a processing unit.

[0072] The analysis optical system 7 can perform analysis using, for example, the LIBS method. A communication cable C1 for transmitting and receiving electrical signals to and from the controller main body 2 is connected to the analysis optical system 7. This communication cable C1 is not essential, and the analysis optical system 7 and the controller main body 2 may be connected by wireless communication.

[0073] Note that the term "optical system" as used here is used in a broad sense. That is, the analysis optical system 7 is defined as a system that includes a light source, an imaging element, etc. in addition to optical elements such as lenses. The same applies to the observation optical system 9.

[0074] As shown in FIG. 7, the analysis optical system 7 according to the present embodiment includes an electromagnetic wave emission unit 71, an output adjustment means 72, a deflection element 73, a reflective objective lens 74 as a collection head, a spectroscopic element 75 as a wavelength selection element, a first parabolic mirror 76A, a first detector 77A, a first beam splitter 78A, a second parabolic mirror 76B, a second detector 77B, a second beam splitter 78B, a coaxial illumination 79, an imaging lens 80, a first camera 81 as an imaging unit, and a side illumination 84. Some of the components of the analysis optical system 7 are also shown in FIG. 6. The side illumination 84 is shown only in FIGS. 8A, 8B, and 10 (not shown in FIG. 7).

[0075] The electromagnetic wave emission unit 71 emits a primary electromagnetic wave for analyzing the sample SP. In particular, the electromagnetic wave emission unit 71 according to the present embodiment is composed of a laser light source that emits laser light as the primary electromagnetic wave.

[0076] Although detailed illustration is omitted, the electromagnetic wave emission unit 71 according to the present embodiment includes an excitation light source composed of a laser diode (LD) or the like, a focusing lens that condenses the laser output from the excitation light source and emits it as laser excitation light, a laser medium that generates a fundamental wave based on the laser excitation light, a Q switch for pulse oscillation of the fundamental wave, a rear mirror and an output mirror for resonating the fundamental wave, and a wavelength conversion element for converting the wavelength of the laser light output from the output mirror.

[0077] Here, as the laser medium, in order to increase the energy per pulse, it is preferable to use, for example, rod-shaped Nd:YAG. In this embodiment, the wavelength (so-called fundamental wavelength) of the photons emitted from the laser medium by stimulated emission is set to 1064 nm in the infrared region in this embodiment.

[0078] Also, as the Q-switch, a passive Q-switch whose transmittance increases when the intensity of the fundamental wave exceeds a predetermined threshold can be used. The passive Q-switch is composed of, for example, a saturable absorber such as Cr:YAG. By using the passive Q-switch, it becomes possible to automatically generate pulses at the timing when energy equal to or more than a predetermined amount is accumulated in the laser medium. Also, a so-called active Q-switch whose attenuation rate can be controlled from the outside can be used.

[0079] Also, as the wavelength conversion element, a configuration using two nonlinear optical crystals such as LBO (LiB3O3) is adopted. By using two crystals, the third harmonic wave can be generated from the fundamental wave. The wavelength of the third harmonic wave is set to 355 nm in the ultraviolet region in this embodiment.

[0080] That is, the electromagnetic wave emitting unit 71 according to this embodiment can output laser light composed of ultraviolet rays as the primary electromagnetic wave. Thereby, analysis by the LIBS method can be performed even on a sample SP that is optically transparent like glass. In addition, the laser light in the ultraviolet region has a very low rate of reaching the human retina. By configuring so that the laser light does not form an image on the retina, the safety of the device can be enhanced.

[0081] The output adjustment means 72 is disposed on the optical path connecting the electromagnetic wave emitting unit 71 and the deflection element 73, and can adjust the output of the laser beam (primary electromagnetic wave). Specifically, the output adjustment means 72 according to the present embodiment includes a half-wave plate 72a and a polarization beam splitter 72b. The half-wave plate 72a is configured to rotate relative to the polarization beam splitter 72b, and by controlling the rotation angle, the amount of light passing through the polarization beam splitter 72b can be adjusted.

[0082] The laser beam (primary electromagnetic wave) whose output is adjusted by the output adjustment means 72 is reflected by a mirror (not shown) and enters the optical base 700.

[0083] As shown in FIG. 7, the optical base 700 is disposed inside the analysis housing 70 and partitions the accommodation space for the optical elements constituting the analysis optical system 7. Specifically, the optical base 700 according to the present embodiment houses a deflection element 73, a spectroscopic element 75, a first parabolic mirror 76A, a first beam splitter 78A, a second parabolic mirror 76B, a second beam splitter 78B, an optical element 79b constituting the coaxial illumination 79, and an imaging lens 80. Further, the optical base 700 is disposed adjacent to the electromagnetic wave emitting unit 71 in the internal space of the analysis housing 70. The optical base 700 corresponds to the "second housing" provided inside the analysis housing 70.

[0084] When the laser beam (primary electromagnetic wave) emitted from the electromagnetic wave emitting unit 71 is incident on the deflection element 73, the deflection element 73 deflects the laser beam (primary electromagnetic wave) in the optical axis direction of the reflective objective lens 74 (the direction along the analysis optical axis Aa).

[0085] Specifically, the deflection element 73 reflects the primary electromagnetic wave output from the electromagnetic wave emitting unit 71 and passing through the output adjustment means 72, and guides it to the sample SP via the reflective objective lens 74. On the other hand, the secondary electromagnetic wave generated in the sample SP corresponding to this primary electromagnetic wave (light emitted along with the plasma generation on the surface of the sample SP, hereinafter also referred to as "plasma light") is allowed to pass through, and is laid out to be guided to the first detector 77A and the second detector 77B. The deflection element 73 is also laid out to allow the visible light condensed for imaging to pass through and guide most of it to the first camera 81.

[0086] The reflective objective lens 74 functions as a collection head that collects the secondary electromagnetic wave generated in the sample SP corresponding to the emission of the primary electromagnetic wave from the electromagnetic wave emitting unit 71. In particular, the reflective objective lens 74 according to this embodiment condenses the laser light as the primary electromagnetic wave and irradiates the sample SP, and is configured to collect the plasma light (secondary electromagnetic wave) generated in the sample SP corresponding to the laser light (primary electromagnetic wave) irradiated on the sample SP. In this case, the secondary electromagnetic wave corresponds to the electromagnetic wave emitted along with the plasma generation on the surface of the sample SP.

[0087] The reflective objective lens 74 is configured to coaxialize the optical system related to the emission of the primary electromagnetic wave from the electromagnetic wave emitting unit 71 and the optical systems related to the reception of the reflected light by the first camera 81 and the reception of the secondary electromagnetic wave by the first and second detectors 77A and 77B. In other words, the reflective objective lens 74 is shared by two types of optical systems.

[0088] In this embodiment, with one reflective objective lens 74, it is possible to realize three functions, namely, the irradiation of the sample SP with the primary electromagnetic wave, the collection of the secondary electromagnetic wave from the sample SP, and the imaging of the sample SP by the first camera 81, without interfering with each other.

[0089] In addition, in the present embodiment, the depth of focus at which the primary electromagnetic wave emitted from the analysis optical system 7 is focused is deeper than the depth of field in focus of the first camera 81. By configuring in this way, even if the sample SP is irradiated with the primary electromagnetic wave from the observation state in which the sample SP is observed using the first camera 81 of the analysis optical system 7, there is no need to readjust the focus of the primary electromagnetic wave. As a result, the focus of the primary electromagnetic wave emitted from the analysis optical system 7 can be automatically adjusted to the position observed by the first camera 81.

[0090] Furthermore, the depth of focus at which the primary electromagnetic wave is focused may be deeper than the depth of focus at which the secondary electromagnetic waves guided to the detectors 77A and 77B are focused. That is, in order to increase the light collection efficiency of the secondary electromagnetic wave, the numerical aperture of the light collection optical system of the reflective objective lens 74 may be increased so that the depth is shallower than the depth of focus of the primary electromagnetic wave.

[0091] The reflective objective lens 74 has an analysis optical axis Aa extending along the substantially vertical direction described above. The analysis optical axis Aa is provided to be parallel to the observation optical axis Ao of the objective lens 92 of the observation optical system 9. In the following description, the "radial direction" refers to a direction perpendicular to the unit vector extending along the analysis optical axis Aa and radially extending from the analysis optical axis Aa. Similarly, the "circumferential direction" refers to a direction perpendicular to the unit vector extending along the analysis optical axis Aa and the radial direction and circulating around the analysis optical axis Aa. Further, the "optical axis direction" related to the analysis optical system 7 refers to the direction extending along the analysis optical axis Aa.

[0092] Specifically, the reflective objective lens 74 according to the present embodiment is a Schwarzschild type objective lens composed of two mirrors. As shown in FIGS. 7, 8A, and 8B, this reflective objective lens 74 includes a connection member 74a attached to the analysis housing 70, a mirror housing 74b connected to the analysis housing 70 via the connection member 74a, a primary mirror 11 having an annular shape and a relatively large diameter, a secondary mirror 12 having a disk shape and a relatively small diameter, and a support member 14 for connecting the secondary mirror 12 to the mirror housing 74b.

[0093] The connecting member 74a is formed in a pedestal shape provided with a through hole coaxial with the analysis optical axis Aa. The connecting member 74a is fastened to the lower end of the optical base 700 in a state fixed in the circumferential direction (non-rotatable state). By this fastening, the angular position of the reflective objective lens 74 is fixed. Further, the connecting member 74a is arranged such that the through hole of the connecting member 74a and the through hole provided at the lower end of the optical base 700 communicate with each other.

[0094] The mirror housing 74b is formed in a cylindrical shape whose diameter decreases in a tapered shape downward. The mirror housing 74b is fixed to the lower surface of the connecting member 74a in a state fixed in the circumferential direction. The inner peripheral surface of the mirror housing 74b supports the primary mirror 11 and the secondary mirror 12, respectively.

[0095] Both the primary mirror 11 and the secondary mirror 12 are formed to be rotationally symmetric about the analysis optical axis Aa. The reflective objective lens 74 is configured to collect the secondary electromagnetic wave by the primary mirror 11 and the secondary mirror 12 and guide the collected secondary electromagnetic wave to the opening 11a of the primary mirror 11.

[0096] The primary mirror 11 has a central axis coaxial with the analysis optical axis Aa and is constituted by a cylindrical member provided with a through hole at the central portion in the radial direction. As shown in FIGS. 8A and 8B, the through hole of the primary mirror 11 constitutes an opening 11a for passing the primary electromagnetic wave and the secondary electromagnetic wave. A mirror finish is applied to the lower end face of the primary mirror 11 to constitute a primary reflection surface 11b. The cylindrically formed primary mirror 11 is supported by the mirror housing 74b.

[0097] Specifically, the primary mirror 11 is provided with an opening 11a at the central portion in the radial direction, and a primary reflection surface 11b for reflecting the secondary electromagnetic wave generated in the sample SP corresponding to the emission of the primary electromagnetic wave is provided. The primary reflection surface 11b is provided around the opening 11a.

[0098] The secondary mirror 12 is composed of a lens having an optical axis coaxial with the analysis optical axis Aa. As shown in FIGS. 8A, 8B, and 11, the lens constituting the secondary mirror 12 is provided with a secondary reflecting surface 12b formed by mirror-finishing its upper end surface, and a transmission region 12a configured to transmit the primary electromagnetic wave without mirror-finishing. Further, a support member 14 that supports the lens in the secondary mirror 12 defines a hollow space for passing the secondary electromagnetic wave. The secondary mirror 12 is supported by a mirror housing 74b via the support member 14. The secondary mirror 12 is connected to the analysis housing 70 via the support member 14, the mirror housing 74b, the connection member 74a, and the optical base 700.

[0099] Specifically, the secondary reflecting surface 12b is provided at the outer edge of the secondary mirror 12, receives the secondary electromagnetic wave reflected by the primary reflecting surface 11b of the primary mirror 11, and further reflects it. The secondary reflecting surface 12b is formed in a substantially donut shape. The transmission region 12a is provided at the central portion of the secondary mirror 12 and is arranged so that the primary electromagnetic wave passes through. The transmission region 12a is formed in a substantially disk shape.

[0100] As shown in FIGS. 8A and 8B, as the lens constituting the secondary mirror 12, a concave meniscus lens with its convex surface facing upward and its concave surface facing downward can be used. The secondary reflecting surface 12b is provided at the periphery of the lens, and its mirror surface is formed in an annular shape facing substantially upward.

[0101] The transmission region 12a is provided at the central portion in the radial direction of the lens (for example, a concave meniscus lens). The primary electromagnetic wave passing through the transmission region 12a will propagate while expanding the beam diameter.

[0102] As shown in FIG. 11, the support member 14 has an annular mirror support member 14a and a second support leg portion 14b connected to the mirror support member 14a. The support member 14 supports the secondary mirror 12 constituted by the transmission region 12a and the secondary reflection surface 12b provided around the transmission region 12a, and the secondary mirror 12 can be connected to the inner wall portion of the mirror housing 74b.

[0103] The mirror support member 14a is disposed around the secondary reflection surface 12b and is formed in an annular shape coaxial with the analysis optical axis Aa. The mirror support member 14a is attached to the inner peripheral surface of the mirror housing 74b in a non-rotatable state. The mirror support member 14a is attached to the analysis housing 70 via the mirror housing 74b and the connecting member 74a. A space through which the secondary electromagnetic wave passes is defined by the inner peripheral surface of the mirror support member 14a and the outer peripheral surface of the cylindrical body that houses the concave meniscus lens and the tertiary lens 13 described later.

[0104] The second support leg portion 14b extends radially from the outer edge portion of the secondary reflection surface 12b and is connected to the inner peripheral surface of the mirror housing 74b. Specifically, the second support leg portion 14b is configured to extend radially from the cylindrical body. In the present embodiment, three second support leg portions 14b are provided at approximately 120° intervals in the circumferential direction.

[0105] Further, a tertiary lens 13 is disposed between the transmission region 12a and the mounting surface 51a in the substantially vertical direction. The tertiary lens 13 transmits the primary electromagnetic wave that has passed through the transmission region 12a and condenses it.

[0106] The tertiary lens 13 has a lens body 13a and an optical thin film 13b. The tertiary lens 13 is disposed coaxially with the primary mirror 11 and the secondary mirror 12.

[0107] The lens body 13a may be composed of a biconvex lens that is smaller in outer diameter than the entire concave meniscus lens forming the secondary mirror 12 and larger in outer diameter than the outer diameter of the transmission region 12a alone in the concave meniscus lens. The primary electromagnetic wave passing through the lens body 13a will propagate while converging in the radial direction.

[0108] The focal position of the optical system composed of the transmission region 12a and the lens body 13a coincides with the focal position of the optical system composed of the primary mirror 11 and the secondary mirror 12 (see the black dot f in FIGS. 8A and 8B).

[0109] The optical thin film 13b is provided on the lower surface of the lens body 13a and is interposed between the transmission region 12a and the mounting surface 51a. The optical thin film 13b blocks the reflected light such as visible light reflected by the sample SP. As a result, the first camera 81 as the imaging unit will collect the reflected light reflected by the primary reflection surface 11b and the secondary reflection surface 12b. Note that the optical thin film 13b may be provided on the concave surface located on the opposite side of the transmission region 12a in the concave meniscus lens forming the secondary mirror 12. The optical thin film 13b may be arranged between the transmission region 12a and the mounting surface 51a in the optical axis direction. Instead of providing the optical thin film 13b on the tertiary lens 13, or in addition to this optical thin film 13b, the visible light may be blocked by the deflection element 73, or a light shielding member that blocks the visible light may be provided in the optical path connecting the deflection element 73 and the tertiary lens 13.

[0110] In the reflective objective lens 74 configured as described above, the primary mirror 11 allows the primary electromagnetic wave to pass through its opening 11a. The primary electromagnetic wave passing through the opening 11a sequentially passes through the transmission region 12a of the secondary mirror 12 and the lens body 13a of the tertiary lens 13 and irradiates the sample SP (see the optical path L1 in FIGS. 8A and 14).

[0111] At this time, the secondary mirror 12 expands the beam diameter of the laser beam (primary electromagnetic wave) that passes through its transmission region 12a, and the tertiary lens 13 condenses the laser beam whose diameter has been expanded by the transmission region 12a to a predetermined focal position f. The laser beam condensed by the tertiary lens 13 converges at a focal length corresponding to the focal position f. This laser beam diffuses in a conical shape as it moves away from the predetermined focal length. If the reflective objective lens 74 is not fastened to the optical base 700, the laser beam will propagate without converging as parallel light shown by the optical path L1 in FIG. 14.

[0112] Note that the tertiary lens 13 is not essential. Instead of providing the tertiary lens 13, the secondary mirror 12 may be configured by a convex lens.

[0113] When the sample SP is irradiated with a laser beam (primary electromagnetic wave), plasma light (secondary electromagnetic wave) corresponding to the primary electromagnetic wave is generated and returns toward the reflective objective lens 74. The plasma light collected by the reflective objective lens 74 is guided to the primary mirror 11.

[0114] The primary mirror 11 reflects the secondary electromagnetic wave returning from the sample SP by its primary reflection surface 11b. The secondary electromagnetic wave reflected by the primary reflection surface 11b is guided to the secondary reflection surface 12b of the secondary mirror 12.

[0115] The secondary mirror 12 receives the secondary electromagnetic wave reflected by the primary reflection surface 11b by its secondary reflection surface 12b and emits it substantially upward. The secondary electromagnetic wave reflected by the secondary reflection surface 12b propagates along a cylindrical (hollow cylindrical) optical path. At this time, the optical path formed by the secondary electromagnetic wave is configured to surround the optical path of the primary electromagnetic wave that propagates in a cylindrical shape, as shown in FIG. 8A. In other words, the primary electromagnetic wave propagates through the hollow portion of the cylinder in the optical path of the secondary electromagnetic wave so as to be coaxial with the secondary electromagnetic wave.

[0116] Then, the secondary electromagnetic wave propagating along the cylindrical optical path is emitted from the opening 11a of the primary mirror 11 in a state coaxial with the primary electromagnetic wave. The secondary electromagnetic wave emitted from the opening 11a is guided to the deflection element 73 as shown in FIG. 14 (see the optical path L2 in FIGS. 8A and 14).

[0117] Both the primary electromagnetic wave input to the reflective objective lens 74 and the secondary electromagnetic wave output from the reflective objective lens 74 are optically connected to other elements via the deflection element 73. This deflection element 73 has a configuration suitable for the reflective objective lens 74 described above.

[0118] Specifically, the deflection element 73 according to the present embodiment is constituted by a partial mirror having a reflection region 731 and a hollow region 732. Among these, the reflection region 731 is disposed to face the transmission region 12a so as to reflect the primary electromagnetic wave along the optical axis direction of the reflective objective lens 74. The hollow region 732 allows the secondary electromagnetic wave condensed by the reflective objective lens 74 to pass through.

[0119] More specifically, the deflection element 73 includes a plate-shaped element support member 73a provided with a through hole 73b, a mirror member 73c disposed at the center of the through hole 73b and constituting the reflection region 731, and a first support leg portion 73d that extends radially from the outer surface of the mirror member 73c and is connected to the inner surface of the through hole 73b. The through hole 73b penetrates the element support member 73a in the optical axis direction.

[0120] Among these, the element support member 73a is formed in a rectangular thin plate shape and is disposed between the spectroscopic element 75 and the opening 11a of the reflective objective lens 74 in the optical axis direction. The element support member 73a is attached to the analysis housing 70 in a posture in which its plate thickness direction is inclined with respect to the optical axis direction.

[0121] As shown in FIG. 14, the through hole 73b is formed so as to penetrate the element support member 73a along the optical axis direction of the reflective objective lens 74. That is, the through hole 73b extends in a direction inclined with respect to the plate thickness direction of the element support member 73a.

[0122] And, as shown in FIG. 13, the through-hole 73b is formed so as to have a circular cross-section with a constant inner diameter when viewed along the optical axis direction of the reflective objective lens 74. In this case, the central axis of the through-hole 73b coincides with the optical axis of the reflective objective lens 74, that is, the analysis optical axis Aa. That is, this through-hole 73b is formed so as to appear elliptical when viewed along the plate thickness direction of the element support member 73a, and is configured to have a substantially circular projection surface when projected onto a plane perpendicular to the analysis optical axis Aa.

[0123] The mirror member 73c is constituted by an optical mirror arranged with its mirror surface facing obliquely downward. The mirror surface of the mirror member 73c constitutes a reflection region 731. This reflection region 731 is arranged side by side with the transmission region 12a in the optical axis direction, and can reflect the primary electromagnetic wave and guide it to the transmission region 12a.

[0124] And, as shown in FIG. 13, the mirror member 73c is formed so as to have a circular shape with a constant inner diameter when viewed along the optical axis direction of the reflective objective lens 74. In this case, the central axis of the mirror member 73c coincides with the central axis of the through-hole 73b and the analysis optical axis Aa. That is, this mirror member 73c is formed elliptical when viewed along the direction perpendicular to its mirror surface, and is configured to have a substantially circular projection surface when projected onto a plane perpendicular to the analysis optical axis Aa.

[0125] The hollow region 732 is defined by the inner surface of the through-hole 73b and the outer surface of the mirror member 73c. This hollow region 732 is arranged radially outside the reflection region 731 and allows the secondary electromagnetic wave to pass through.

[0126] Here, as shown in FIG. 13, when the secondary mirror 12, the support member 14, and the deflection element 73 are viewed in a plan view along the analysis optical axis Aa, the outer diameter of the mirror member 73c is formed to be smaller than the inner diameter of the secondary reflection surface 12b. Therefore, as shown by the optical path L2 in FIG. 14, the secondary electromagnetic wave that is reflected by the secondary reflection surface 12b and propagates in a cylindrical shape passes through the hollow region 732 without being blocked by the reflection region 731.

[0127] The first support leg 73d extends radially from the outer surface of the mirror member 73c and is connected to the inner surface of the through hole 73b. Specifically, three first support legs 73d are provided at approximately 120° intervals in the circumferential direction.

[0128] As shown in FIG. 13, the first and second support legs 73d, 14b are arranged so as to overlap each other when viewed along the optical axis direction. Here, the thickness of the first support leg 73d in the circumferential direction substantially coincides with the thickness of the second support leg 14b in the circumferential direction. The secondary electromagnetic wave output so as to sew between the second support legs 14b can pass through the hollow region 732 without being blocked by the first support leg 73d.

[0129] The secondary electromagnetic wave that has passed through the hollow region 732 without being blocked by the reflection region 731 and the first support leg 73d reaches the spectroscopic element 75. The spectroscopic element 75 is arranged between the deflection element 73 and the first beam splitter 78A in the optical axis direction of the reflective objective lens 74, and guides a part of the secondary electromagnetic wave generated by the sample SP to the first detector 77A, while guiding the other part to the second detector 77B and the like. Most of the latter plasma light is guided to the second detector 77B, and the rest reaches the first camera 81.

[0130] Specifically, the secondary electromagnetic wave returning from the sample SP contains various wavelength components in addition to the wavelength corresponding to the laser light as the primary electromagnetic wave. Therefore, the spectroscopic element 75 according to the present embodiment reflects the electromagnetic wave in the short wavelength band among the secondary electromagnetic waves returning from the sample SP and guides it to the first detector 77A. The spectroscopic element 75 also transmits the electromagnetic wave in other bands and guides it to the second detector 77B.

[0131] More specifically, the spectroscopic element 75 is composed of a material having a higher transmittance of the second component in the infrared region belonging to the wavelength region equal to or longer than the predetermined wavelength than the first component on the ultraviolet side belonging to the wavelength region less than the predetermined wavelength. Such materials include glass materials, synthetic resins, and the like.

[0132] For example, when a glass material is used, since the glass itself has a low reflectivity of electromagnetic waves, an optical thin film that reflects the electromagnetic wave belonging to the first component is deposited on the glass surface to reflect the electromagnetic wave belonging to the ultraviolet wavelength region and guide it to the first detector 77A.

[0133] The spectroscopic element 75 according to the present embodiment receives the secondary electromagnetic wave condensed by the reflective objective lens 74. This spectroscopic element 75 is a so-called dichroic mirror, which reflects the secondary electromagnetic wave corresponding to the first component on the ultraviolet side among the incident secondary electromagnetic waves, while transmitting the secondary electromagnetic wave corresponding to the second component on the infrared side. As described above, the material that is the main body of the spectroscopic element 75 has a relatively low transmittance of the first component and a relatively high transmittance of the second component. Therefore, the spectroscopic element 75 can minimize the loss of the entire secondary electromagnetic wave caused by absorption into a material such as glass as compared with the case where the first component on the ultraviolet side is transmitted.

[0134] The first parabolic mirror 76A is a so-called parabolic mirror and is disposed between the spectroscopic element 75 and the first detector 77A. The first parabolic mirror 76A condenses the secondary electromagnetic wave reflected by the spectroscopic element 75 and makes the condensed secondary electromagnetic wave incident on the first detector 77A.

[0135] Specifically, after the first parabolic mirror 76A is condensed by the reflective objective lens 74 and passes through the deflection element 73, it reflects the secondary electromagnetic waves on the ultraviolet side including the visible light band reflected by the spectroscopic element 75. The first parabolic mirror 76A is configured to condense the secondary electromagnetic waves reflected by the first parabolic mirror 76A onto the first detector 77A.

[0136] Here, the first detector 77A generates an intensity distribution spectrum that is the intensity distribution for each wavelength of the plasma light (secondary electromagnetic wave) generated in the sample SP. In particular, the first detector 77A is configured such that the secondary electromagnetic waves on the ultraviolet side reflected by the spectroscopic element 75 are incident thereon, and has an incident slit 77a for receiving the secondary electromagnetic waves.

[0137] Note that the focal position of the first parabolic mirror 76A may be arranged to coincide with the incident slit 77a, or may be arranged to not coincide with the incident slit 77a. The latter arrangement corresponds to a layout shifted from just in focus. This layout is effective in cases where the energy of the return light of the laser is strong and can damage the incident slit 77a.

[0138] Also, the first detector 77A is supported by the first plate 701 shown in FIGS. 7 and 9. This first plate 701 is connected to the upper surface of the optical base 700. The first detector 77A is connected to the optical base 700 via the first plate 701. By this connection, the positioning of the incident slit 77a with respect to the light guiding optical system 7a such as the first parabolic mirror 76A can be stabilized.

[0139] Also, near the first detector 77A, a first adjustment mechanism 771 for adjusting the relative position of the first detector 77A with respect to the first plate 701 is provided (only shown in FIG. 7). By using this first adjustment mechanism 771, the relative position of the incident slit 77a with respect to the light guiding optical system 7a can be adjusted.

[0140] Note that the configuration for connecting the first plate 701 to the optical base 700 is not essential. For example, the first plate 701 may be configured to be connected to the inner wall portion of the analysis housing 70. In such a configuration, the first adjustment mechanism 771 will adjust the relative position of the first detector 77A with respect to the analysis housing 70.

[0141] The first detector 77A receives the secondary electromagnetic wave generated in the sample SP and condensed by the reflective objective lens 74, and generates an intensity distribution spectrum which is the intensity distribution for each wavelength of the secondary electromagnetic wave. The first detector 77A is configured to receive the secondary electromagnetic wave spectroscopically upstream of the second detector 77B in the optical path of the secondary electromagnetic wave starting from the reflective objective lens 74. Among the plasma light generated in the sample SP, the first component on the ultraviolet side is guided to the first detector 77A by being reflected a plurality of times without passing through a lens or the like. That is, the first component on the ultraviolet side is guided to the first detector 77A through a reflective optical system such as the reflective objective lens 74 and the first parabolic mirror 76A without passing through a transmission optical system. Since chromatic aberration does not occur, the analysis accuracy can be improved.

[0142] In particular, when the electromagnetic wave emitting unit 71 is constituted by a laser light source and the reflective objective lens 74 is configured to condense the light generated corresponding to the irradiation of the laser light, the first detector 77A separates the light by reflecting the light at different angles for each wavelength, and makes each of the separated lights incident on an image sensor having a plurality of pixels. Thereby, the wavelength of the light received by each pixel can be made different, and the received light intensity can be obtained for each wavelength. In this case, the intensity distribution spectrum corresponds to the intensity distribution for each wavelength of the light.

[0143] As the first detector 77A, for example, a detector based on a Czerny-Turner type detector can be used. The first detector 77A is configured to be suitable for detecting the first component on the ultraviolet side. The entrance slit of the first detector 77A is aligned so as to coincide with the focal position of the first parabolic mirror 76A. The intensity distribution spectrum generated by the first detector 77A is input to the control unit 21 of the controller main body 2.

[0144] The first beam splitter 78A reflects a part of the light transmitted through the spectroscopic element 75 (the infrared secondary electromagnetic wave including the visible light band) and guides it to the second detector 77B, while transmitting the other part (a part of the visible light band) and guiding it to the second beam splitter 78B. Among the plasma light belonging to the visible light band, a relatively large amount of plasma light is guided to the second detector 77B, and a relatively small amount of plasma light is guided to the first camera 81 via the second beam splitter 78B.

[0145] The second parabolic mirror 76B is a so-called parabolic mirror and is disposed between the first beam splitter 78A and the second detector 77B. The second parabolic mirror 76B condenses the secondary electromagnetic wave reflected by the first beam splitter 78A and makes the condensed secondary electromagnetic wave incident on the second detector 77B.

[0146] Specifically, the second parabolic mirror 76B reflects the infrared secondary electromagnetic wave that has passed through the deflection element 73 and transmitted through the spectroscopic element 75 and is then reflected by the first beam splitter 78A. The second parabolic mirror 76B is configured to condense the secondary electromagnetic wave reflected by the second parabolic mirror 76B onto the second detector 77B.

[0147] Here, similar to the first detector 77A, when the sample SP placed on the mounting table 5 from the analysis housing 70 as the housing is irradiated with laser light (primary electromagnetic wave), the second detector 77B generates an intensity distribution spectrum that is the intensity distribution for each wavelength of the plasma light (secondary electromagnetic wave) generated in the sample SP. In particular, this second detector 77B is configured such that infrared plasma light transmitted through the spectroscopic element 75 is incident thereon, and has an incident slit 77a for receiving the plasma light.

[0148] Note that the focal position of the second parabolic mirror 76B may be arranged to coincide with the incident slit 77a of the second detector 77B, or may be arranged not to coincide with the incident slit 77a. The latter arrangement corresponds to a layout shifted from just focus. This layout is effective in a case where the energy of the return light of the laser is strong and can damage the incident slit 77a.

[0149] Also, the second detector 77B is supported by a second plate 702 shown in FIGS. 7 and 9. This second plate 702 is connected to the upper surface of the optical base 700. The second detector 77B is connected to the optical base 700 via the second plate 702. By this connection, the positioning of the incident slit 77a with respect to the light guiding optical system 7a, such as the second parabolic mirror 76B, can be stabilized.

[0150] Also, a second adjustment mechanism 772 for adjusting the relative position of the second detector 77B with respect to the second plate 702 is provided near the second detector 77B. By using this second adjustment mechanism 772, the relative position of the incident slit 77a with respect to the light guiding optical system 7a can be adjusted.

[0151] Note that the configuration of connecting the second plate 702 to the optical base 700 is not essential. For example, the second plate 702 may be configured to be connected to the inner wall portion of the analysis housing 70. In such a configuration, the second adjustment mechanism 772 adjusts the relative position of the second detector 77B with respect to the analysis housing 70.

[0152] The second detector 77B receives the secondary electromagnetic waves generated in the sample SP and condensed by the reflective objective lens 74, and generates an intensity distribution spectrum which is the intensity distribution for each wavelength of the secondary electromagnetic waves. The second detector 77B is configured to receive the secondary electromagnetic waves dispersed on the downstream side of the first detector 77A in the optical path of the secondary electromagnetic waves starting from the reflective objective lens 74. Among the plasma light generated in the sample SP, the second infrared component is guided to the second detector 77B through multiple reflections except for passing through the spectroscopic element 75. That is, the second infrared component is guided to the first detector 77A through a reflective optical system such as the reflective objective lens 74 and the first parabolic mirror 76A. Since the occurrence of chromatic aberration can be minimized, the analysis accuracy can be improved.

[0153] In particular, when the electromagnetic wave emitting unit 71 is constituted by a laser light source and the reflective objective lens 74 is constituted to condense the light generated corresponding to the irradiation of the laser light, the second detector 77B separates the light by reflecting the light at different angles for each wavelength, and makes each of the separated lights incident on an image sensor having a plurality of pixels. Thereby, the wavelength of the light received by each pixel can be made different, and the received light intensity can be acquired for each wavelength. In this case, the intensity distribution spectrum corresponds to the intensity distribution for each wavelength of the light.

[0154] As the second detector 77B, for example, one based on a Czerny-Turner type detector can be used. The second detector 77B is configured to be suitable for detecting the second infrared component. The entrance slit of the second detector 77B is aligned to coincide with the focal position of the second parabolic mirror 76B. The intensity distribution spectrum generated by the second detector 77B is input to the control unit 21 of the controller main body 2 in the same manner as the intensity distribution spectrum generated by the first detector 77A.

[0155] The control unit 21 receives the intensity distribution spectrum on the ultraviolet side generated by the first detector 77A and the intensity distribution spectrum on the infrared side generated by the second detector 77B. Based on these intensity distribution spectra, the control unit 21 performs component analysis of the sample SP using the basic principle described below. By combining and using the intensity distribution spectrum on the ultraviolet side and the intensity distribution spectrum on the infrared side, the control unit 21 can perform component analysis using a wider frequency range.

[0156] The second beam splitter 78B reflects the illumination light (visible light) emitted from the LED light source 79a and passing through the optical element 79b, and irradiates the sample SP through the first beam splitter 78A, the spectroscopic element 75, the deflection element 73, and the reflective objective lens 74. The reflected light (visible light) reflected by the sample SP returns to the analysis optical system 7 through the reflective objective lens 74.

[0157] The second beam splitter 78B further transmits the reflected light that has returned to the analysis optical system 7 and has passed through the first beam splitter 78A, and the plasma light that has passed through the first beam splitter 78A without reaching the first and second detectors 77A and 77B, and makes it incident on the first camera 81 through the imaging lens 80.

[0158] The coaxial illumination 79 includes an LED light source 79a that emits illumination light and an optical element 79b through which the illumination light emitted from the LED light source 79a passes. The coaxial illumination 79 functions as so-called "coaxial epi-illumination". The illumination light irradiated from the LED light source 79a propagates coaxially with the laser light (primary electromagnetic wave) output from the electromagnetic wave output unit 71 and irradiated to the sample SP, and the light (secondary electromagnetic wave) returning from the sample SP.

[0159] Specifically, the coaxial illumination 79 irradiates illumination light through an optical path that is coaxial with the primary electromagnetic wave emitted from the electromagnetic wave emitting unit 71. Specifically, the portion of the optical path of the illumination light that connects the deflection element 73 and the reflective objective lens 74 is coaxial with the optical path of the primary electromagnetic wave. Also, the portion of the optical path of the illumination light that connects the first beam splitter 78A and the reflective objective lens 74 is coaxial with the optical path of the secondary electromagnetic wave.

[0160] The coaxial illumination 79 is built into the analysis housing 70 in the example shown in FIG. 7, but the present disclosure is not limited to such a configuration. For example, a light source may be laid out outside the analysis housing 70, and the light source and the analysis optical system 7 may be optically coupled to the optical system via an optical fiber cable.

[0161] The side illumination 84 is arranged so as to surround the reflective objective lens 74 as a collection head. The side illumination 84 irradiates illumination light from the side of the sample SP (in other words, in a direction inclined with respect to the analysis optical axis Aa).

[0162] Specifically, the side illumination 84 is arranged so as to surround the outer periphery of the reflective objective lens 74. More specifically, the side illumination 84 is constituted by an annular illumination that surrounds the reflective objective lens 74 in an annular shape. The central axis of the circle corresponding to the side illumination 84 (the central axis when the side illumination 84 is regarded as a ring) is arranged to be coaxial with the analysis optical axis Aa.

[0163] Specifically, the side illumination 84 according to the present embodiment includes a housing 84a, an LED light source (light source) 84b that emits illumination light, a light guide member 84c that transmits the illumination light emitted from the LED light source 84b, and a diffusion plate 84d.

[0164] The housing 84a is formed in a substantially cylindrical shape with a diameter larger than that of the connecting member 74a and the mirror housing 74b that constitute the reflective objective lens 74. The housing 84a covers the outer periphery (the connecting member 74a and the mirror housing 74b) of the reflective objective lens 74. As shown in FIGS. 8A and 8B, the housing 84a according to the present embodiment is supported by the analysis housing 70 instead of the reflective objective lens 74. The inner peripheral surface of the housing 84a is radially spaced from the outer peripheral surface of the reflective objective lens 74.

[0165] The housing 84a houses the LED light source 84b, the light guide member 84c, and the diffusion plate 84d. The LED light source 84b, the light guide member 84c, and the diffusion plate 84d are arranged between the outer peripheral surface of the reflective objective lens 74 and the inner peripheral surface of the housing 84a in the radial direction.

[0166] The LED light source 84b is supported by the inner peripheral surface of the housing 84a. The LED light source 84b is arranged in an annular shape along the circumferential direction and can emit annular illumination light. Further, as shown in FIG. 10, when the reflective objective lens 74 is viewed from the bottom along the analysis optical axis Aa, the LED light source 84b is divided into a plurality of blocks (four blocks in the illustrated example) along the circumferential direction. The LED light source 84b is configured to be able to individually light each of the divided blocks. In the example shown in FIG. 10, illumination light can be emitted from one block located at the 3 o'clock position when the circumferential direction is regarded as a clock, or illumination light can be emitted from a plurality of blocks such as the 6 o'clock direction and the 9 o'clock direction. The illumination light emitted from the LED light source 84b is irradiated onto the sample SP through the light guide member 84c and the diffusion plate 84d.

[0167] Specifically, the LED light source 84b according to the present embodiment is arranged closer to the inner peripheral surface of the housing 84a than the outer peripheral surface of the reflective objective lens 74 in the radial direction. The LED light source 84b is arranged radially outward of the primary mirror 11 and the secondary mirror 12. The LED light source 84b can also be arranged, for example, between the primary mirror 11 and the secondary mirror 12 so as to be closer to the analysis housing 70 than the secondary mirror 12 (in other words, to be separated from the sample SP more than the secondary mirror 12) in the direction along the analysis optical axis Aa (the optical axis direction of the reflective objective lens 74).

[0168] Also, as shown in FIGS. 8A and 8B, the LED light source 84b is positioned in a state of being separated from the outer peripheral surface of the reflective objective lens 74, in other words, in a non-contact state with respect to the reflective objective lens 74. The side illumination 84 is configured to be connected to the reflective objective lens 74 via the optical base 700 and is not configured to be directly connected to the reflective objective lens 74. Further, as shown in FIGS. 8A and 8B, a ventilation port 84e is provided above the LED light source 84b. This ventilation port 84e opens to the side surface of the housing 84a.

[0169] The reflective objective lens 74 is configured by combining a plurality of lenses as one objective lens and is more sensitive to temperature changes than an objective lens composed of a single lens. Therefore, it is desirable to take measures to suppress heat transfer to the reflective objective lens 74 so that the measurement accuracy does not decrease due to temperature changes.

[0170] Therefore, as described above, by connecting the LED light source 84b to the reflective objective lens 74 in a non-contact state and providing the ventilation port 84e in the housing 84a, heat transfer from the LED light source 84b to the reflective objective lens 74 can be suppressed.

[0171] The light guide member 84c diffuses the illumination light emitted from the LED light source 84b in the radial direction. The illumination light diffused by the light guide member 84c is emitted while expanding in the radial direction (see the optical path L3 in FIG. 8B).

[0172] Specifically, the light guide member 84c according to the present embodiment is formed of an annular member having an inner peripheral surface that continuously decreases in diameter in the radial direction and an outer peripheral surface that also continuously decreases in diameter in the radial direction as it extends along the analysis optical axis Aa toward the mounting surface 51a.

[0173] Here, the inner peripheral surface of the light guide member 84c decreases in diameter more steeply than the outer peripheral surface as it extends along the analysis optical axis Aa toward the mounting surface 51a. Therefore, the thickness of the light guide member 84c in the radial direction is formed so as to gradually increase as it extends along the analysis optical axis Aa toward the mounting surface 51a.

[0174] Then, the illumination light that has passed through the light guide member 84c expands according to the angle θl between the inner peripheral surface and the outer peripheral surface of the light guide member 84c. By adjusting the magnitude of the angle θl, the spread of the illumination light emitted from the side illumination 84 can be controlled. In particular, the angle θl according to the present embodiment is configured such that the illumination light that has passed through the light guide member 84c is irradiated onto a region including at least the focal position f of the primary electromagnetic wave. The illumination light expanded by the light guide member 84c passes through the diffusion plate 84d and is irradiated onto the mounting surface 51a.

[0175] The side illumination 84 irradiates illumination light through an optical path inclined with respect to the primary electromagnetic wave emitted from the electromagnetic wave emitting unit 71, as compared with the coaxial illumination 79 described above. The analysis and observation apparatus A can selectively use the coaxial illumination 79 and the side illumination 84.

[0176] Therefore, the control unit (specifically, the illumination control unit 27 described later) 21 as a processing unit inputs a control signal to at least one of the side illumination 84 and the coaxial illumination 79 so as to irradiate illumination light from at least one of the side illumination 84 and the coaxial illumination 79.

[0177] By adjusting the control signal generated by the control unit 21, as described above, each block constituting the LED light source 84b can be individually lit. In addition, the lighting state of each lighting, such as the light quantity of the coaxial illumination 79 or the side illumination 84, can be controlled by the control unit 21.

[0178] The first camera 81 is housed in the analysis housing 70 and is connected to the upper end of the optical base 700 as shown in FIGS. 7 and 9. The first camera 81 collects the reflected light reflected by the sample SP via the reflective objective lens 74. The first camera 81 images the sample SP by detecting the amount of received light of the collected reflected light. The optical axis of the first camera 81 is coaxial with the primary electromagnetic wave, the secondary electromagnetic wave, and the illumination light. Note that the reflected light collected by the first camera 81 includes both the reflected light caused by the illumination light irradiated from the side illumination 84 and the reflected light caused by the illumination light irradiated from the coaxial illumination 79. That is, the first camera 81 as the imaging unit is shared by the coaxial illumination 79 and the side illumination 84.

[0179] Specifically, the first camera 81 as the imaging unit receives the reflected light collected by the reflective objective lens 74 as the collection head. Here, the first camera 81 collects the reflected light through an optical path common to the secondary electromagnetic wave condensed by the reflective objective lens 74. Here, the common optical path corresponds to the optical path connecting the reflective objective lens 74 and the spectroscopic element 75 among the optical paths of the reflected light. This optical path is spectroscopically separated by the spectroscopic element 75.

[0180] That is, the spectroscopic element 75 according to the present embodiment can receive the secondary electromagnetic wave and the reflected light through a common optical path, and while guiding the secondary electromagnetic wave to the detector (first detector 77A), the common optical path can be spectroscopically separated so as to guide the reflected light to the imaging unit (first camera 81). Here, the first optical path corresponds to the optical path connecting the spectroscopic element 75, the first parabolic mirror 76A, and the incident slit 77a. The second optical path corresponds to the optical path connecting the spectroscopic element 75 and the first camera 81.

[0181] Thus, the portion of the optical path of the reflected light that connects the first beam splitter 78A and the reflective objective lens 74 is coaxial with the optical path of the secondary electromagnetic wave. Also, the portion of the optical path of the reflected light that connects the deflection element 73 and the reflective objective lens 74 is coaxial with the optical path of the primary electromagnetic wave. Further, the portion of the optical path of the reflected light that connects the second beam splitter 78B and the reflective objective lens 74 is coaxial with the optical path of the illumination light.

[0182] The first camera 81 according to the present embodiment photoelectrically converts the light incident through the imaging lens 80 by a plurality of pixels arranged on its light receiving surface, and converts it into an electrical signal corresponding to the optical image of the subject (sample SP).

[0183] The first camera 81 may be configured by arranging a plurality of light receiving elements along the light receiving surface. In this case, each light receiving element corresponds to a pixel, and an electrical signal based on the amount of light received by each light receiving element can be generated. Specifically, the first camera 81 according to the present embodiment is configured by an image sensor made of CMOS (Complementary Metal Oxide Semiconductor), but is not limited to this configuration. As the first camera 81, for example, an image sensor made of CCD (Charged-Coupled Device) can also be used.

[0184] Then, the first camera 81 inputs an electrical signal generated by detecting the amount of light received by each light receiving element to the control unit 21 of the controller main body 2. The control unit 21 generates image data corresponding to the optical image of the subject based on the input electrical signal.

[0185] The light returning from the sample SP is split and incident on the first detector 77A, the second detector 77B, and the first camera 81. Therefore, the amount of received light in the first camera 81 is smaller than that in the second camera 93 (to be described later) in the observation optical system 9. As a result, the image data (second image data I2) based on the electrical signal input from the first camera 81 tends to have a different brightness from the image data (first image data I1) based on the electrical signal input from the second camera 93. Therefore, in the first camera 81, the exposure time is adjusted to ensure the same brightness as the image data generated by the second camera 93.

[0186] The optical components described so far are housed in the aforementioned analysis housing 70. A through-hole 70a is provided in the lower surface of the analysis housing 70. The reflective objective lens 74 faces the placement surface 51a through this through-hole 70a.

[0187] A shielding member 83 shown in FIG. 7 may be arranged in the analysis housing 70. This shielding member 83 is arranged between the through-hole 70a and the reflective objective lens 74 and can be inserted into the optical path of the laser light based on the electrical signal input from the controller main body 2 (see the dotted line part in FIG. 7). The shielding member 83 is configured to be at least non-transmissive to the laser light.

[0188] By inserting the shielding member 83 into the optical path, the emission of the laser light from the analysis housing 70 can be restricted. The shielding member 83 may be arranged between the electromagnetic wave emission unit 71 and the output adjustment means 72.

[0189] As shown in FIG. 15, the analysis housing 70 demarcates, in addition to the accommodation space for the analysis optical system 7, the accommodation space for the slide mechanism 65. In that sense, the analysis housing 70 can also be regarded as an element of the slide mechanism 65.

[0190] Specifically, the analysis housing 70 according to the present embodiment is formed in a box shape with a shorter dimension in the front-rear direction than in the left-right direction. And, the left side portion of the front surface 70b of the analysis housing 70 protrudes forward in order to secure the movement allowance of the guide rail 65a in the front-rear direction. Hereinafter, this protruding portion is referred to as a "protrusion", and this is denoted by reference numeral 70c. This protrusion 70c is disposed in the lower half of the front surface 70b in the vertical direction (in other words, only the lower half of the left side portion of the front surface 70b protrudes).

[0191] -Regarding the relationship between the optical paths- The analysis optical system 7 causes the primary electromagnetic wave to be incident on the sample SP through the output adjustment means 72, the reflection region 731 of the deflection element 73, the opening 11a of the primary mirror 11, and the transmission region 12a of the secondary mirror 12. Here, as shown in FIG. 14, the reflection region 731, the opening 11a, and the transmission region 12a are arranged in order along the analysis optical axis Aa. Therefore, the transmission region 12a according to the present embodiment can transmit the primary electromagnetic wave that has been emitted from the electromagnetic wave emission unit 71 and passed through the opening 11a, and emit the primary electromagnetic wave along the analysis optical axis Aa.

[0192] The primary electromagnetic wave emitted along the analysis optical axis Aa is irradiated onto the sample SP and scattered or absorbed. In the sample SP, a secondary electromagnetic wave is generated by the irradiation of the primary electromagnetic wave. The generated secondary electromagnetic wave returns to the analysis optical system 7 via the reflective objective lens 74. Generally, the secondary electromagnetic wave that has returned in this way contains various wavelengths.

[0193] Therefore, the analysis optical system 7 causes the secondary electromagnetic wave on the ultraviolet side to be incident on the first detector 77A through the first reflection surface 11b of the primary mirror 11, the second reflection surface 12b of the secondary mirror 12, the opening 11a of the primary mirror 11, the hollow region 732 of the deflection element 73, the spectroscopic element 75, and the first parabolic mirror 76A.

[0194] The analysis optical system 7 also causes the infrared secondary electromagnetic wave to enter the second detector 77B through the primary reflection surface 11b of the primary mirror 11, the secondary reflection surface 12b of the secondary mirror 12, the opening 11a of the primary mirror 11, the hollow region 732 of the deflection element 73, the spectroscopic element 75, the first beam splitter 78A, and the second parabolic mirror 76B.

[0195] In this way, the analysis optical system 7 causes the secondary electromagnetic wave to enter the detectors 77A and 77B without passing through the optical fiber. In other words, the analysis optical system 7 according to the present embodiment guides the secondary electromagnetic wave to the detectors 77A and 77B without passing through the optical fiber. The analysis optical system 7 has a so-called fiberless configuration with respect to the optical path of the secondary electromagnetic wave.

[0196] In addition, the analysis optical system 7 according to the present embodiment guides the ultraviolet secondary electromagnetic wave to the first detector 77A by using only the reflection of the electromagnetic wave without passing through the glass material. The analysis optical system 7 has a fiberless and all-reflection system (an optical system that uses only the reflection of the electromagnetic wave) configuration with respect to the optical path of the ultraviolet secondary electromagnetic wave.

[0197] When the analysis optical system 7 also guides the infrared secondary electromagnetic wave to the second detector 77B, it passes only through the spectroscopic element 75. The analysis optical system 7 has a fiberless configuration and is configured to suppress the transmission of the electromagnetic wave as much as possible with respect to the optical path of the infrared secondary electromagnetic wave.

[0198] In addition, the analysis optical system 7 according to the present embodiment irradiates the first electromagnetic wave straight by passing through the reflection region 731, the opening 11a, and the transmission region 12a arranged along the analysis optical axis Aa in this order. On the other hand, the secondary reflection surface 12b is arranged closer to the mounting surface 51a than the primary reflection surface 11b in the optical axis direction of the reflective objective lens 74.

[0199] Therefore, the secondary electromagnetic wave generated in the sample SP, after being reflected by the primary reflecting surface 11b and propagating from the primary reflecting surface 11b toward the secondary reflecting surface 12b, will once propagate in a direction approaching the placement surface 51a. Thereafter, the secondary electromagnetic wave reflected by the secondary reflecting surface 12b will reverse its propagation direction and propagate in a direction away from the placement surface 51a.

[0200] In this way, the secondary electromagnetic wave is propagated through multiple reflections. The optical path of the secondary electromagnetic wave becomes longer compared to the case where it is propagated straight like the primary electromagnetic wave, by the amount corresponding to the turns caused by multiple reflections.

[0201] Also, when a concave meniscus lens is used as the secondary mirror 12 and a convex lens is used as the tertiary lens 13 as described above, or when a convex lens is used as the secondary mirror 12 without using the tertiary lens 13, the ultraviolet laser light incident on the reflective objective lens 74 is focused by one of the convex lenses and reaches a focus at a predetermined focal length Df. In any configuration, the reflective objective lens 74 can diffuse the ultraviolet laser light in a conical shape by gradually decreasing the energy density of the ultraviolet laser light as the distance from the focal length Df increases.

[0202] -Basic principle of analysis by the analysis optical system 7- The control unit 21, particularly the spectrum analysis unit 213 described later, performs component analysis of the sample SP based on the intensity distribution spectra input from the first detector 77A and the second detector 77B as detectors. As a specific analysis method, the LIBS method can be used as described above. The LIBS method is a method for analyzing the components contained in the sample SP at the elemental level (so-called elemental analysis method).

[0203] Generally, when a substance is given high energy, electrons are separated from the atomic nucleus, and the substance becomes a plasma state. Although the electrons separated from the atomic nucleus are temporarily in a high-energy and unstable state, by losing energy from that state, they are recaptured by the atomic nucleus again and transition to a low-energy and stable state (in other words, return from the plasma state to the non-plasma state).

[0204] Here, the energy lost by the electrons is emitted from the electrons as electromagnetic waves, and the magnitude of the energy of the electromagnetic waves is defined by the energy levels based on the shell structure unique to each element. That is, the energy of the electromagnetic waves emitted when electrons return from the plasma state to the non-plasma state has a unique value for each element (more precisely, the orbit of the electrons bound to the atomic nucleus). The magnitude of the energy of the electromagnetic waves is defined by the wavelength of the electromagnetic waves. Therefore, by analyzing the wavelength distribution of the electromagnetic waves emitted from the electrons, that is, the wavelength distribution of the light emitted from the substance during plasma formation, the components contained in the substance can be analyzed at the elemental level. Such a technique is generally called Atomic Emission Spectroscopy (AES).

[0205] The LIBS method is an analytical technique belonging to this AES method. Specifically, in the LIBS method, a laser (primary electromagnetic wave) is irradiated onto a substance (sample SP), thereby giving energy to the substance. Here, since the irradiated part of the laser is locally plasma-formed, by analyzing the intensity distribution spectrum of the light (secondary electromagnetic wave) emitted accompanying the plasma formation, the component analysis of the substance can be performed.

[0206] That is, as described above, since the wavelength of each plasma light (secondary electromagnetic wave) has a unique value for each element, when the intensity distribution spectrum forms a peak at a specific wavelength, the element corresponding to the peak becomes a component of the sample SP. And when the intensity distribution spectrum contains multiple peaks, by comparing the intensities (light reception amounts) of each peak, the component ratio of each element can be calculated.

[0207] According to the LIBS method, evacuation is not required, and component analysis can be performed in an open-air state. Also, although it is a destructive test of the sample SP, processing such as dissolving the entire sample SP is not required, and the position information of the sample SP remains (it is only a local destructive test).

[0208] -Observation optical system 9- The observation optical system 9 is a collection of components for observing the sample SP as an observation object, and each component is accommodated in the observation housing 90. The components constituting the observation optical system 9 include an objective lens 92 and a second camera 93 as a second imaging unit. At least these components are accommodated in the observation housing 90. Also, an element for observing the sample SP includes a control unit 21 as a processing unit.

[0209] The observation optical system 9 includes an observation unit 9a having an objective lens 92. This observation unit 9a corresponds to a cylindrical lens barrel disposed on the lower end side of the observation housing 90 as shown in FIG. 3 and the like. The observation unit 9a is held by the analysis housing 70. The observation unit 9a can be removed from the observation housing 90 alone.

[0210] A communication cable C2 for transmitting and receiving electrical signals to and from the controller main body 2 and an optical fiber cable C3 for guiding illumination light from the outside are connected to the observation housing 90. Note that the communication cable C2 is not essential, and the observation optical system 9 and the controller main body 2 may be connected by wireless communication.

[0211] Specifically, as shown in FIG. 6, the observation optical system 9 includes a mirror group 91, an objective lens 92, a second camera 93 as a second imaging unit, a second coaxial illumination 94, and a second side illumination 95.

[0212] The objective lens 92 has an observation optical axis Ao extending substantially along the vertical direction, condenses illumination light and irradiates the sample SP placed on the stage main body 51, and also condenses the light (reflected light) from the sample SP. The observation optical axis Ao is provided to be parallel to the analysis optical axis Aa of the reflection type objective lens 74 of the analysis optical system 7. The reflected light collected by the objective lens 92 is received by the second camera 93.

[0213] The mirror group 91 transmits the reflected light collected by the objective lens 92 and guides it to the second camera 93. The mirror group 91 according to the present embodiment can be configured using a total reflection mirror, a beam splitter, etc. as illustrated in FIG. 6. The mirror group 91 also reflects the illumination light irradiated from the second coaxial illumination 94 and guides it to the objective lens 92.

[0214] The second camera 93 collects the reflected light condensed by the objective lens 92, and images the sample SP by detecting the amount of received light of the collected reflected light. Specifically, the second camera 93 according to the present embodiment photoelectrically converts the light incident from the sample SP through the objective lens 92 by a plurality of pixels arranged on its light receiving surface, and converts it into an electrical signal corresponding to the optical image of the subject (sample SP).

[0215] The second camera 93 may be such that a plurality of light receiving elements are arranged along the light receiving surface. In this case, each light receiving element corresponds to a pixel, and an electrical signal based on the amount of received light at each light receiving element can be generated. The second camera 93 according to the present embodiment is composed of an image sensor made of CMOS, similar to the first camera 81, but an image sensor made of CCD can also be used.

[0216] Then, the second camera 93 inputs the electrical signal generated by detecting the amount of received light at each light receiving element to the control unit 21 of the controller main body 2. The control unit 21 generates image data corresponding to the optical image of the subject based on the input electrical signal.

[0217] The second coaxial illumination 94 emits illumination light guided from the optical fiber cable C3. The second coaxial illumination 94 irradiates the illumination light through a common optical path with the reflected light condensed through the objective lens 92. That is, the second coaxial illumination 94 functions as "coaxial epi-illumination" coaxially aligned with the observation optical axis Ao of the objective lens 92. Instead of guiding illumination light from the outside through the optical fiber cable C3, a light source may be built into the observation unit 9a. In that case, the optical fiber cable C3 becomes unnecessary.

[0218] As schematically illustrated in FIG. 6, the second side illumination 95 is constituted by a ring illumination arranged to surround the objective lens 92. Similar to the side illumination 84 in the analytical optical system 7, the second side illumination 95 irradiates illumination light from obliquely above the sample SP. Although detailed illustration is omitted, when the second side illumination 95 is regarded as an annulus, the central axis thereof coincides with the observation optical axis Ao. Also, similar to the side illumination 84, the second side illumination 95 is divided into a plurality of blocks in the circumferential direction, and each block is configured to be individually lightable.

[0219] In the example shown in FIG. 10, similar to the side illumination 84 of the analytical optical system 7, the second side illumination 95 is divided into four blocks arranged at the 0 o'clock position, 3 o'clock position, 6 o'clock position, and 9 o'clock position when the circumferential direction is regarded as a clock, and illumination light can be emitted from one block located in the 3 o'clock direction, or illumination light can be emitted from a plurality of blocks such as the 6 o'clock direction and the 9 o'clock direction.

[0220] The analytical observation device A can selectively use the second coaxial illumination 94 and the second side illumination 95. For this purpose, the control unit 21 as a processing unit (specifically, the illumination control unit 216 described later) inputs a control signal to at least one of the second side illumination 95 and the second coaxial illumination 94 so as to irradiate illumination light from at least one of the second side illumination 95 and the second coaxial illumination 94.

[0221] By adjusting the control signal generated by the control unit 21, as described above, each block constituting the second side illumination 95 can be individually lit. In addition, the lighting state of each illumination, such as the light quantity of the second coaxial illumination 94 or the second side illumination 95, can be controlled by the control unit 21.

[0222] - Housing coupler 64- The housing coupler 64 is a member for connecting the observation housing 90 to the analysis housing 70. By connecting the housing coupler 64 to both housings 70 and 90, the analysis optical system 7 and the observation optical system 9 move integrally.

[0223] The housing coupler 64 can be attached inside or outside the analysis housing 70, that is, inside or outside the analysis housing 70, or to the stand 42. In particular, in this embodiment, the housing coupler 64 is configured to be attached to the outer surface of the analysis housing 70.

[0224] Specifically, the housing coupler 64 according to this embodiment is configured to be attachable to the aforementioned protruding portion 70c in the analysis housing 70, and is configured to hold the observation unit 9a on the right side of the protruding portion 70c.

[0225] Also, as shown in FIG. 3, in the state where the observation housing 90 is connected to the analysis housing 70 by the housing coupler 64, the front surface of the protruding portion 70c protrudes forward from the front side portions of the housing coupler 64 and the observation housing 90. Thus, in this embodiment, when the housing coupler 64 holds the observation housing 90, when viewed from the side (when viewed from a direction orthogonal to the moving direction of the observation optical system 9 and the analysis optical system 7 by the slide mechanism 65), at least a part of the observation housing 90 and the analysis housing 70 (the protruding portion 70c in this embodiment) are laid out so as to overlap.

[0226] The housing coupler 64 according to this embodiment can fix the relative position of the analysis optical axis Aa with respect to the observation optical axis Ao by fixing the observation housing 90 to the analysis housing 70.

[0227] Specifically, as shown in FIG. 15, by the housing connector 64 holding the observation housing 90, the observation optical axis Ao and the analysis optical axis Aa are arranged so as to be aligned along the direction in which the observation optical system 9 and the analysis optical system 7 move relative to the mounting table 5 by the slide mechanism 65 (the front-rear direction in this embodiment). In particular, in this embodiment, the observation optical axis Ao is arranged on the front side compared to the analysis optical axis Aa.

[0228] Also, as shown in FIG. 15, by the housing connector 64 holding the observation housing 90, the observation optical axis Ao and the analysis optical axis Aa are arranged such that their positions in the non-moving direction (the left-right direction in this embodiment) along the horizontal direction and orthogonal to the aforementioned moving direction (the front-rear direction in this embodiment) coincide.

[0229] - Slide mechanism 65 - FIG. 15 is a schematic diagram for explaining the configuration of the slide mechanism 65. FIGS. 16A and 16B are diagrams for explaining the horizontal movement of the head portion 6.

[0230] The slide mechanism 65 is configured to move the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table main body 51 along the horizontal direction so that imaging of the sample SP by the observation optical system 9 and irradiation of electromagnetic waves (laser light) in the case of generating an intensity distribution spectrum by the analysis optical system 7 (in other words, irradiation of electromagnetic waves by the electromagnetic wave emission unit 71 of the analysis optical system 7) can be performed on the same location of the sample SP as the observation object.

[0231] The moving direction of the relative position by the slide mechanism 65 can be the arrangement direction of the observation optical axis Ao and the analysis optical axis Aa. As shown in FIG. 15, the slide mechanism 65 according to this embodiment moves the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table main body 51 along the front-rear direction.

[0232] The slide mechanism 65 according to this embodiment displaces the analysis housing 70 relative to the stand 42 and the head attachment member 61. Since the analysis housing 70 and the observation unit 9a are connected by the housing connector 64, displacing the analysis housing 70 causes the observation unit 9a to be displaced integrally.

[0233] Specifically, the slide mechanism 65 according to this embodiment includes a guide rail 65a and an actuator 65b. Among these, the guide rail 65a is configured to protrude forward from the front surface of the head attachment member 61.

[0234] More specifically, the base end portion of the guide rail 65a is fixed to the head attachment member 61. On the other hand, the tip side portion of the guide rail 65a is inserted into the accommodation space partitioned within the analysis housing 70 and is attached to the analysis housing 70 in a state where it can be inserted and removed. The insertion and removal direction of the analysis housing 70 with respect to the guide rail 65a is equal to the direction in which the head attachment member 61 and the analysis housing 70 are separated or approached (the front-rear direction in this embodiment).

[0235] The actuator 65b can be, for example, a linear motor or a stepping motor that operates based on an electrical signal from the control unit 21. By driving this actuator 65b, the analysis housing 70, and thus the observation optical system 9 and the analysis optical system 7, can be displaced relative to the stand 42 and the head attachment member 61. When a stepping motor is used as the actuator 65b, a motion conversion mechanism for converting the rotational motion of the output shaft of the stepping motor into linear motion in the front-rear direction is further provided.

[0236] The slide mechanism 65 further includes a movement amount sensor Sw2 for detecting the movement amount of the observation optical system 9 and the analysis optical system 7. The movement amount sensor Sw2 can be configured by, for example, a linear scale (linear encoder) or a photo interrupter.

[0237] The displacement sensor Sw2 detects the relative distance between the analysis housing 70 and the head mounting member 61, and inputs an electrical signal corresponding to the relative distance to the controller main body 2. The controller main body 2 determines the displacement amounts of the observation optical system 9 and the analysis optical system 7 by calculating the change amount of the relative distance input from the displacement sensor Sw2.

[0238] As shown in FIGS. 16A and 16B, when the slide mechanism 65 operates, the head unit 6 slides along the horizontal direction, and the relative positions of the observation optical system 9 and the analysis optical system 7 with respect to the mounting table 5 move (horizontal movement). Due to this horizontal movement, the head unit 6 switches between a first mode in which the reflective objective lens 74 faces the sample SP and a second mode in which the objective lens 92 faces the sample SP. The slide mechanism 65 can slide the analysis housing 70 and the observation housing 90 between the first mode and the second mode.

[0239] As shown in FIGS. 16A and 16B, in the first mode, the head unit 6 is in a relatively advanced state, and in the second mode, the head unit 6 is in a relatively retracted state. The first mode is an operation mode for performing component analysis of the sample SP by the analysis optical system 7, and the second mode is an operation mode for performing magnified observation of the sample SP by the observation optical system 9.

[0240] In particular, the analysis and observation apparatus A according to the present embodiment is configured such that the location where the reflective objective lens 74 points in the first mode and the location where the objective lens 92 points in the second mode are the same location. Specifically, the analysis and observation apparatus A is configured such that the location where the analysis optical axis Aa intersects the sample SP in the first mode and the location where the observation optical axis Ao intersects the sample SP in the second mode are the same (see FIG. 16B).

[0241] In order to realize such a configuration, the moving amount D2 of the head unit 6 when the slide mechanism 65 operates is set to be the same as the distance D1 between the observation optical axis Ao and the analysis optical axis Aa (see Fig. 15). In addition, as shown in Fig. 15, the arrangement direction of the observation optical axis Ao and the analysis optical axis Aa is set to be parallel to the moving direction of the head unit 6.

[0242] Also, in this embodiment, by adjusting the dimensions of the housing connector 64 in the substantially vertical direction, the distance between the sample SP and the central portion of the reflective objective lens 74 (more specifically, the portion where the analysis optical axis Aa intersects the reflective objective lens 74) in the first mode (the first state) is set to be the same as the distance between the sample SP and the central portion of the objective lens 92 (more specifically, the portion where the observation optical axis Ao intersects the objective lens 92) in the second mode (the second state). This setting can also be performed by obtaining the focusing position through autofocus. By setting it in this way, the focal positions can be made to coincide between the first mode when analyzing the sample SP and the second mode when observing the sample SP. By making the focal positions coincide in both modes, it becomes possible to maintain a focused state before and after switching the modes.

[0243] Note that by adjusting the dimensions of the housing connector 64, it may be designed such that the focal positions approximately coincide between the first mode and the second mode, and the focal position may be adjusted more precisely by autofocus when switching the mode. By doing so, since it is designed such that the focal positions approximately coincide in advance, the time required for autofocus can be shortened.

[0244] Normally, the WD of the reflective objective lens 74 is shorter than that of a general objective lens such as the objective lens 92. Therefore, in this embodiment, the lens diameter of the reflective objective lens 74 is set to be larger than that of the objective lens 92, so that the WD of the reflective objective lens 74 is configured to be longer than normal.

[0245] By configuring as described above, before and after switching between the first mode and the second mode, at the timings before and after the switching, image generation of the sample SP by the observation optical system 9 and generation of the intensity distribution spectrum by the analysis optical system 7 (specifically, irradiation of primary electromagnetic waves by the analysis optical system 7 when the intensity distribution spectrum is generated by the analysis optical system 7) can be executed in the same direction with respect to the same location in the sample SP.

[0246] Further, as shown in FIG. 16B, the aforementioned cover member 61b in the head attachment member 61 is arranged to cover (in a shielding state) the reflective objective lens 74 that forms the analysis optical system 7 in the first mode in which the head unit 6 is in a relatively retracted state, and is arranged to be separated from (in a non-shielding state) the reflective objective lens 74 in the second mode in which the head unit 6 is in a relatively advanced state.

[0247] In the former shielding state, even if the laser light is emitted unintentionally, the laser light can be shielded by the cover member 61b. Thus, the safety of the apparatus can be improved.

[0248] (Details of the tilting mechanism 45) FIGS. 17A and 17B are diagrams for explaining the operation of the tilting mechanism 45. Hereinafter, with reference to FIGS. 17A and 17B, the tilting mechanism 45 will be further described, including its relationship with the housing coupler 64 and the like.

[0249] The tilting mechanism 45 is a mechanism constituted by the aforementioned shaft member 44 and the like, and can tilt at least the observation optical system 9 among the analysis optical system 7 and the observation optical system 9 with respect to the reference axis As perpendicular to the mounting surface 51a.

[0250] As described above, in the present embodiment, the housing connector 64 integrally connects the analysis housing 70 and the observation housing 90, so that the relative position of the observation optical axis Ao with respect to the analysis optical axis Aa is maintained. Therefore, when the observation optical system 9 having the observation optical axis Ao is tilted, the analysis optical system 7 having the analysis optical axis Aa will be tilted integrally with the observation optical system 9 as shown in FIGS. 17A and 17B.

[0251] Thus, the tilting mechanism 45 according to the present embodiment is configured to tilt the analysis optical system 7 and the observation optical system 9 integrally while maintaining the relative position of the observation optical axis Ao with respect to the analysis optical axis Aa.

[0252] Also, the operation of the slide mechanism 65 and the operation of the tilting mechanism 45 are independent of each other, and a combination of both operations is allowed. Therefore, the slide mechanism 65 can move the relative positions of the observation optical system 9 and the analysis optical system 7 while maintaining the posture in which at least the observation optical system 9 is tilted by the tilting mechanism 45. That is, the analysis and observation apparatus A according to the present embodiment is slidable back and forth with the head portion 6 while the observation optical system 9 is tilted as shown by the double-headed arrow A1 in FIG. 17B.

[0253] Particularly in the present embodiment, since the analysis optical system 7 and the observation optical system 9 are configured to tilt integrally, the slide mechanism 65 moves the relative positions of the observation optical system 9 and the analysis optical system 7 while maintaining the state in which both the observation optical system 9 and the analysis optical system 7 are tilted by the tilting mechanism 45.

[0254] In addition, the analysis and observation apparatus A is configured to enable user-centric observation. That is, in the analysis and observation apparatus A, a device-specific three-dimensional coordinate system formed by three axes parallel to the X direction, Y direction, and Z direction respectively is defined. In the storage device 21b of the control unit 21, the coordinates of the intersection position described later in the three-dimensional coordinate system of the analysis and observation apparatus A are further stored. The coordinate information of the intersection position may be stored in the storage device 21b in advance when the analysis and observation apparatus A is shipped from the factory. Further, the coordinate information of the intersection position stored in the storage device 21b may be updatable by the user of the analysis and observation apparatus A.

[0255] As shown in FIGS. 17A and 17B, when the angle of the analysis optical axis Aa with respect to the reference axis As is referred to as "tilt θ", the analysis and observation apparatus A is configured to allow the emission of laser light when the tilt θ is, for example, less than a predetermined first threshold value θmax. In order to keep the tilt θ less than the first threshold value θmax, a hard constraint can be imposed on the tilting mechanism 45. For example, a brake mechanism (not shown) may be provided in the tilting mechanism 45 to physically limit the operating range of the tilting mechanism 45.

[0256] The observation optical axis Ao, which is the optical axis of the objective lens 92, intersects the central axis Ac. When the objective lens 92 swings around the central axis Ac, the intersection position of the observation optical axis Ao and the central axis Ac is maintained constant while the angle (tilt θ) of the observation optical axis Ao with respect to the reference axis As changes. In this way, when the user swings the objective lens 92 around the central axis Ac by the tilting mechanism 45, for example, when the observation target portion of the sample SP is at the above intersection position, even if the objective lens 92 is in a tilted state, a user-centric relationship is maintained in which the center of the field of view of the second camera 93 does not move from the same observation target portion. Therefore, it is possible to prevent the observation target portion of the sample SP from deviating from the field of view of the second camera 93 (the field of view of the objective lens 92).

[0257] Particularly in the present embodiment, since the analysis optical system 7 and the observation optical system 9 are configured to incline integrally, the analysis optical axis Aa, which is the optical axis of the reflective objective lens 74, intersects the central axis Ac in the same way as the observation optical axis Ao. When the reflective objective lens 74 swings around the central axis Ac, the intersection position of the analysis optical axis Aa and the central axis Ac is maintained constant, while the angle (inclination θ) of the analysis optical axis Aa with respect to the reference axis As changes.

[0258] Also, as described above, the inclination mechanism 45 can incline the stand 42 about 90° to the right with respect to the reference axis As or about 60° to the left with respect to the reference axis As. However, when the analysis optical system 7 and the observation optical system 9 are configured to incline integrally, if the stand 42 is inclined excessively, there is a possibility that the laser light emitted from the analysis optical system 7 may be irradiated toward the user.

[0259] Therefore, assuming that the inclinations of the observation optical axis Ao and the analysis optical axis Aa with respect to the reference axis As are θ, it is desirable that the inclination θ be within a range that satisfies a predetermined safety standard, at least in situations where laser light can be emitted. Specifically, as described above, the inclination θ according to the present embodiment can be adjusted within a range below a predetermined first threshold value θmax.

[0260] <Details of the controller main body 2> FIG. 18 is a block diagram illustrating the configuration of the controller main body 2. Further, FIG. 19 is a block diagram illustrating the configuration of the control unit 21. In the present embodiment, the controller main body 2 and the optical system assembly 1 are configured separately, but the present disclosure is not limited to such a configuration. At least a part of the controller main body 2 may be provided in the optical system assembly 1.

[0261] As described above, the controller main body 2 according to the present embodiment includes a control unit 21 that performs various processes, and a display unit 22 that displays information related to the processes performed by the control unit 21. Among these, the control unit 21 includes a processing device 21a composed of a CPU, a system LSI, a DSP, etc., a storage device 21b composed of a volatile memory, a non-volatile memory, etc., and an input / output bus 21c.

[0262] The control unit 21 is configured to be capable of executing both generation of image data of the sample SP based on the amount of light received from the sample SP and analysis of the contained substances of the sample SP based on the intensity distribution spectrum.

[0263] Specifically, as illustrated in FIG. 18, at least a mouse 31, a console 32, a keyboard 33, a head drive unit 47, a stage drive unit 53, an electromagnetic wave emission unit 71, an output adjustment means 72, an LED light source 79a, a first camera 81, a shielding member 83, an LED light source 84b, a second camera 93, a second coaxial illumination (second coaxial illumination) 94, a second side illumination (second side illumination) 95, an actuator 65b, a lens sensor Sw1, a movement amount sensor Sw2, a first inclination sensor Sw3, and a second inclination sensor Sw4 are electrically connected to the control unit 21.

[0264] The head drive unit 47, the stage drive unit 53, the electromagnetic wave emission unit 71, the output adjustment means 72, the LED light source 79a, the first camera 81, the shielding member 83, the LED light source 84b, the second camera 93, the second coaxial illumination 94, the second side illumination 95, and the actuator 65b are electrically controlled by the control unit 21.

[0265] In addition, the output signals of the first camera 81, the second camera 93, the lens sensor Sw1, the movement amount sensor Sw2, the first inclination sensor Sw3, and the second inclination sensor Sw4 are input to the control unit 21. The control unit 21 executes operations etc. based on the input output signals, and executes processes based on the operation results.

[0266] For example, based on the detection signal of the first inclination sensor Sw3 and the detection signal of the second inclination sensor Sw4, the control unit 21 calculates the inclination θ of the analysis optical system 7 with respect to the reference axis As perpendicular to the placement surface 51a. When the inclination exceeds a predetermined threshold value, the control unit 21 notifies the user with a warning or the like.

[0267] In addition, the control unit 21 can identify at least the type of the objective lens 92 among the types of the observation optical system 9 corresponding to the observation unit 9a fixed to the analysis optical system 7 by the housing coupler 64, and execute the process related to the imaging of the sample SP based on the identification result. Here, the identification of the type of the objective lens 92 can be performed based on the detection signal of the lens sensor Sw1. As the process related to the imaging of the sample SP, the control unit 21 can execute, for example, adjustment of the exposure time of the second camera 93 and adjustment of the brightness of the illumination light.

[0268] Specifically, as shown in FIG. 19, the control unit 21 according to the present embodiment includes a mode switching unit 211, a spectrum acquisition unit 212, a spectrum analysis unit 213, an image processing unit 214, an illumination setting unit 215, and an illumination control unit 216. These elements may be realized by a logic circuit or may be realized by executing software.

[0269] - Mode switching unit 211 - The mode switching unit 211 switches from the first mode to the second mode or switches from the second mode to the first mode by moving the analysis optical system 7 and the observation optical system 9 forward and backward along the horizontal direction (the front-rear direction in the present embodiment).

[0270] Specifically, the mode switching unit 211 according to the present embodiment reads in advance the distance between the observation optical axis Ao and the analysis optical axis Aa stored in the storage device 21b in advance. Next, the mode switching unit 211 operates the actuator 65b of the slide mechanism 65 to move the analysis optical system 7 and the observation optical system 9 forward and backward.

[0271] Here, the mode switching unit 211 compares the displacement amounts of the observation optical system 9 and the analysis optical system 7 detected by the displacement sensor Sw2 with the previously read distance, and determines whether or not the former displacement amount has reached the latter distance. Then, at the timing when the displacement amount reaches a predetermined distance, the forward and backward movement of the analysis optical system 7 and the observation optical system 9 is stopped. Note that the predetermined distance may be determined in advance, or may be configured such that the predetermined distance coincides with the maximum movable range by the actuator 65b.

[0272] Note that after switching to the second mode by the mode switching unit 211, the head unit 6 can also be tilted.

[0273] -Spectrum acquisition unit 212- The spectrum acquisition unit 212 acquires an intensity distribution spectrum by emitting laser light from the analysis optical system 7 in the first mode. Specifically, the spectrum acquisition unit 212 according to the present embodiment emits laser light (ultraviolet laser light) as a primary electromagnetic wave from the electromagnetic wave emission unit 71, and irradiates the sample SP with this via the reflective objective lens 74. When the sample SP is irradiated with the laser light, the surface of the sample SP is locally plasmaized, and when returning from the plasma state to a gas or the like, light (secondary electromagnetic wave) having energy corresponding to the width between the energy levels is emitted from the electrons. The secondary electromagnetic wave thus emitted returns to the analysis optical system 7 through the reflective objective lens 74 and reaches the first camera 81, the first detector 77A, and the second detector 77B.

[0274] Based on the light that has returned to the first camera 81, the image processing unit 214 generates image data. Also, based on the light that has returned to the first and second detectors 77A and 77B, the spectrum acquisition unit 212 spectrally analyzes the received light amount for each wavelength to generate an intensity distribution spectrum. The intensity distribution spectrum generated by the spectrum acquisition unit 212 is input to the spectrum analysis unit 213.

[0275] Note that the spectrum acquisition unit 212 synchronizes the light reception timings by the first and second detectors 77A and 77B with the emission timing of the laser light. By setting it in this way, the spectrum acquisition unit 212 can acquire the intensity distribution spectrum in accordance with the emission timing of the laser light.

[0276] -Spectrum analysis unit 213- The spectrum analysis unit 213 performs component analysis of the sample SP based on the intensity distribution spectrum generated by the spectrum acquisition unit 212. As already described, when the LIBS method is used, the surface of the sample SP is locally plasmaized, and the peak wavelength of the light emitted when returning from the plasma state to a gas or the like has a unique value for each element (more precisely, the electron orbit of the electrons bound to the atomic nucleus). Therefore, by specifying the peak position of the intensity distribution spectrum, it can be determined that the element corresponding to the peak position is a component contained in the sample SP, and by comparing the magnitudes (peak heights) of the peaks, the component ratio of each element can be determined, and based on the determined component ratio, the composition of the sample SP can also be estimated.

[0277] The analysis result by the spectrum analysis unit 213 can be displayed on the display unit 22 or stored in the storage device 21b in a predetermined format.

[0278] -Image processing unit 214- The image processing unit 214 can control the display mode on the display unit 22 based on the image data (first image data I1 described later) generated by the second camera 93 in the observation optical system 9, the image data (second image data I2 described later) generated by the first camera 81 in the analysis optical system 7, and the analysis result by the spectrum analysis unit 213 and the like.

[0279] In particular, the image processing unit 214 according to the present embodiment makes the area imaged by the second camera 93 (for example, the center position of the area) coincide with the area imaged by the first camera 81 (for example, the center position of the area) before and after the switching between the first mode and the second mode. The image processing unit 214 can adjust the display modes of the first and second cameras 81 and 93, and thus the first and second image data I1 and I2 generated by the respective cameras 81 and 93, so that the respective areas coincide with each other.

[0280] In addition, as shown in FIGS. 26 and 27 described later, the image processing unit 214 can also superimpose and display an index P1 indicating the irradiation position of the laser light (more generally, the area irradiated with electromagnetic waves) on the second image data I2.

[0281] -Illumination setting unit 215- When switching from the first mode to the second mode or from the second mode to the first mode, the illumination setting unit 215 stores the illumination conditions before the mode switch and sets the illumination conditions after the mode switch based on the stored illumination conditions.

[0282] Specifically, the illumination setting unit 215 according to the present embodiment sets the illumination conditions after the switch so as to reproduce the illumination conditions referred to before the switch among the illumination conditions related to the coaxial illumination 79 and the side illumination 84 in the first mode and the illumination conditions related to the second coaxial illumination 94 and the second side illumination 95 in the second mode before and after the switch between the first mode and the second mode.

[0283] Here, the illumination conditions refer to the control parameters related to the first camera 81, the coaxial illumination 79, and the side illumination 84, and the control parameters related to the second camera 93, the second coaxial illumination 94, and the second side illumination 95. The illumination conditions include the light amount of each illumination, the lighting state of each illumination, etc. The illumination conditions consist of a plurality of items that can be set and changed.

[0284] Control parameters related to the light quantity of each illumination include the magnitude of the current flowing through the LED light source 79a, the timing of energizing the current, the energization time, and the like. For example, the light quantity of the coaxial illumination 79 can be controlled through the magnitude of the current flowing through the LED light source 79a. This control parameter also includes the exposure times of the first camera 81, the second camera 93, and the like.

[0285] Control parameters related to the lighting state of each illumination include, for example, information indicating which block among the blocks constituting the side illumination 84 and the second side illumination 95 is to be lit.

[0286] The illumination setting unit 215 compares the current illumination conditions, that is, the items referred to before mode switching, with the items that can be set after mode switching among the illumination conditions consisting of a plurality of setting items, and extracts common items.

[0287] For the extracted common items, the illumination setting unit 215 sets the illumination conditions so that the setting content before mode switching is diverted, and stores it in the storage device 21b. For example, when switching from the second mode to the first mode, consider the case where the second side illumination 95 is used in the second mode before switching, and the side illumination 84 is used in the first mode after switching. In this case, the illumination setting unit 215 stores the light quantity of the second side illumination 95 and the block that was in the lit state in the second mode before switching among the second side illumination 95 consisting of four blocks. The illumination setting unit 215 sets the illumination conditions including the light quantity and the block that was in the lit state, and stores it in the storage device 21b.

[0288] Incidentally, if there is an item unique to one of the lighting conditions before and after the switching, for example, if there is an item that can only be set in the state after the switching and the setting items before the switching cannot be referred to, the lighting setting unit 215 can set the current lighting conditions by reading the initial settings of the lighting conditions or by reading the lighting conditions used at the previous use. That is, in the storage device 21b, the lighting conditions referred to at the past use are stored in the order of their use, and the lighting setting unit 215 can set the items that cannot be diverted among the lighting conditions based on the stored content.

[0289] Also, after the mode switching, the lighting conditions can be manually changed through the operation unit 3.

[0290] Also, when performing the initial setting and adjustment of the lighting conditions, the visible light transmittance of the optical elements of the analysis optical system 7 through which the light reflected by the sample SP passes when returning to the first camera 81, such as the spectroscopic element 75 and the imaging lens 80, and the light reception sensitivity of the imaging element constituting the first camera 81, and the visible light transmittance of the optical elements constituting the observation optical system 9, such as the mirror group 91, and the light reception sensitivity of the imaging element constituting the second camera 93, may be considered.

[0291] Also, when switching from the first mode to the second mode or from the second mode to the first mode, by adjusting the light amount of the lighting so as to make the brightness of the image data displayed on the display unit 22 constant, the exposure times of the first camera 81 and the second camera 93 can be made common.

[0292] Thereby, the frame rates of the first camera 81 and the second camera 93 can be made common. Note that the brightness of the image data can be made constant, for example, by controlling so that the product of the visible light transmittance and the light reception sensitivity related to each of the first camera 81 and the second camera 93 becomes constant.

[0293] - Lighting control unit 216 - The illumination control unit 216 reads the illumination conditions set by the illumination setting unit 215 from the storage device 21b, and controls the coaxial illumination 79, the side illumination 84, the second coaxial illumination 94, or the second side illumination 95 so as to reflect the read illumination conditions. By this control, one or both of the coaxial illumination 79 and the side illumination 84 can be turned on, or one or both of the second coaxial illumination 94 and the second side illumination 95 can be turned on.

[0294] Also, when the laser beam is emitted in the first mode, the illumination control unit 216 temporarily turns off all of the coaxial illumination 79 and the side illumination 84 regardless of the content of the illumination conditions.

[0295] Before turning off the coaxial illumination 79 or the side illumination 84, the illumination control unit 216 causes the storage device 21b to store the illumination conditions that were being referred to at the time of execution of the turn-off.

[0296] At the timing after the emission of the laser beam is completed (for example, the timing before and after the analysis by the spectral analysis unit 213), the illumination control unit 216 cancels the turn-off of the coaxial illumination 79 and the side illumination 84. At that time, the illumination control unit 216 reads the illumination conditions stored in the storage device 21b before the turn-off and reflects them in the turning on of the coaxial illumination 79 or the side illumination 84.

[0297] <Specific Example of Control Flow> FIG. 20 is a flowchart illustrating the basic operation of the analysis and observation apparatus A. FIG. 21 is a flowchart illustrating the procedure for setting the illumination conditions by the illumination setting unit 215, and FIG. 22 is a flowchart illustrating the analysis procedure of the sample SP by the analysis optical system 7 and the control procedure of the lighting state by the illumination control unit 216. Further, FIG. 23 is a diagram illustrating the display screen of the analysis and observation apparatus A.

[0298] First, in step S1 of FIG. 20, in the second mode, the search for the analysis target by the observation optical system 9 is executed. In this step S1, based on the operation input by the user, the control unit 21 adjusts the conditions such as the exposure time of the second camera 93 and the brightness of the illumination light guided by the optical fiber cable C3 while adjusting the conditions such as the brightness of the image data (first image data I1) generated by the second camera 93, and searches for the portion (analysis target) to be analyzed by the analysis optical system 7 among the respective parts of the sample SP. At this time, the control unit 21 stores the first image data I1 generated by the second camera 93 as necessary.

[0299] Note that the adjustment of the exposure time of the second camera 93 and the adjustment of the brightness of the illumination light can also be configured such that the control unit 21 automatically executes based on the detection signal of the lens sensor Sw1 without the operation input by the user.

[0300] FIG. 23 illustrates a display screen when the sample SP placed on the placement surface 51a is imaged from obliquely above in the second mode. As shown in FIG. 23, a groove M1 indicating the character "A" is provided on the upper surface of the sample SP.

[0301] Further, FIG. 24 illustrates a display screen when the sample SP is imaged from directly above (θ = ±0°) while using the second side illumination 95 in the second mode. In this case, the first image data I1 generated by the image processing unit 214 based on the detection signal of the second camera 93 is displayed on the display unit 22.

[0302] On the other hand, FIG. 25 illustrates a display screen when the sample SP is imaged from directly above (θ = ±0°) while using the second coaxial illumination 94 in the second mode. In this case, the first image data I1 generated by the image processing unit 214 based on the detection signal of the second camera 93 is displayed on the display unit 22.

[0303] As illustrated in FIGS. 24 and 25, when the second side illumination 85 is used and when the second coaxial illumination 94 is used, an image is obtained as if the contrast of light and dark of the first image data I1 is inverted. Specifically, for example, when a sample SP with a uniform surface such as metal is used, since a large amount of specularly reflected light is emitted from the metal surface, when the second coaxial illumination 94 is used, a relatively large amount of reflected light is collected by the objective lens 92, resulting in a relatively bright image. On the other hand, when the second side illumination 85 is used for the same sample SP, since a relatively small amount of specularly reflected light is collected by the objective lens 92, a relatively dark image is obtained.

[0304] Thus, by making the light and dark of the image different depending on the type of illumination, information that is difficult to visually recognize when using one type of illumination (for example, the surface state of the sample SP) may become easier to visually recognize when using the other type of illumination.

[0305] For example, in the examples shown in FIGS. 24 and 25, in addition to the groove M1, the light and dark of minute uneven structures such as scratches Sc1 and Sc2 existing on the surface of the sample SP change. In FIG. 24, although the groove M1 is easy to visually recognize, the scratches Sc1 and Sc2 are difficult to visually recognize. Also, the scratch Sc3 is even more difficult to visually recognize in FIG. 24. On the other hand, in FIG. 25, although the groove M1 becomes difficult to visually recognize, the scratches Sc1 and Sc2 become easy to visually recognize. Also, the scratch Sc3 is clearly visible in FIG. 25. Thus, by changing the illumination according to the type of the sample SP, the user can more appropriately grasp the surface state of the sample SP.

[0306] In the subsequent step S2, the control unit 21 receives an instruction to switch from the second mode to the first mode based on an operation input by the user. At this point, the operation of the slide mechanism 65 by the mode switching unit 211 has not been executed.

[0307] Subsequently, in step S3, before performing the mode switching, the illumination conditions are set by the illumination setting unit 215. The process performed in step S3 is as shown in FIG. 21. That is, step S3 in FIG. 20 is composed of steps S31 to S40 in FIG. 21.

[0308] First, in step S31 of FIG. 21, the lighting setting unit 215 acquires each item constituting the current lighting condition (the lighting condition being referred to in the second mode).

[0309] In the subsequent step S32, the lighting setting unit 215 acquires items that can be used in the first mode among the items constituting the lighting condition to be referred to in the first mode.

[0310] In the subsequent step S33, the lighting setting unit 215 compares each item of the current lighting condition acquired in step S31 with the available items acquired in step S32, and extracts common items between the two.

[0311] In the subsequent step S34, the lighting setting unit 215 determines whether common items were extracted in step S33 (whether common items exist). If this determination is YES, it proceeds to step S35, and if NO, it proceeds to step S36.

[0312] In step S35, for the common items (items that can be diverted between the first mode and the second mode, such as which block in which direction to light in the side illumination 84 and the second side illumination 95) extracted in step S33 among the lighting conditions consisting of a plurality of items, the lighting setting unit 215 diverts the current lighting condition. On the other hand, for items not extracted in step S33 (for example, setting items specific to the first mode related to the configuration of the analysis optical system 7), it reads the previously used settings, initial settings, etc. When the setting of each item is completed, the lighting setting unit 215 advances the control process to step S39 and stores it in the storage device 21b as the lighting condition for the first mode.

[0313] On the other hand, in step S36, the lighting setting unit 215 determines whether there is a setting used last time. If the determination is YES, it proceeds to step S37, while if NO, it proceeds to step S38. In step S37, the lighting setting unit 215 reads the setting used last time as the lighting condition and proceeds to step S39, and stores the read lighting condition in the storage device 21b as the lighting condition for the first mode. Also, in step S38, the lighting setting unit 215 reads the initial setting as the lighting condition and proceeds to step S39, and stores the read lighting condition in the storage device 21b as the lighting condition for the first mode.

[0314] In step S40 following step S39, the lighting control unit 216 turns off the observation lighting (the second coaxial lighting 94 or the second side illumination 95) and ends the flow shown in FIG. 21. After that, the control process proceeds from step S3 to step S4 in FIG. 20.

[0315] In step S4, the mode switching unit 211 operates the slide mechanism 65 to integrally slide-move the observation optical system 9 and the analysis optical system 7, thereby executing the switching from the second mode to the first mode.

[0316] In the subsequent step S5, after the mode switching is completed, lighting control by the lighting control unit 216 and component analysis of the sample SP by the spectrum acquisition unit 212 and the spectrum analysis unit 213 are executed. The processing performed in step S5 is as shown in FIG. 22. That is, step S5 in FIG. 20 is composed of steps S51 to S61 in FIG. 22.

[0317] First, in step S51, the illumination control unit 216 reads the illumination conditions set by the illumination setting unit 215 from the storage device 21b. In the subsequent step S52, the illumination control unit 216 turns on the illumination for analysis (coaxial illumination 79 or side illumination 84) so as to reflect the illumination conditions read in step S51. As a result, each control parameter related to the illumination for analysis, such as the exposure time of the first camera 81 and the amount of illumination light emitted from the LED light source 79a, will reproduce the control parameters in the second mode as much as possible.

[0318] In the present embodiment, the reflective objective lens 74 for component analysis has a shallower depth of field of the subject during observation than the objective lens 92 for observation. Therefore, in step S53 following step S52, the illumination control unit 216 performs autofocus at various locations in the second image data I2 and generates a full-focus image.

[0319] Also, when the magnification of the objective lens 92 is lower than that of the reflective objective lens 74, the image processing unit 214 uses the first image data I1 saved when switching from the second mode to the first mode as a mapping image, and can display on the display unit 22 which location in the mapping image is imaged as the second image data I2.

[0320] FIG. 25 illustrates a display screen when the sample SP is imaged from directly above (θ = ± 0°) while using the coaxial illumination 79 in the first mode. In this case, the second image data I2 generated by the image processing unit 214 based on the detection signal of the first camera 81 is displayed on the display unit 22.

[0321] On the other hand, FIG. 26 illustrates a display screen when the sample SP is imaged from directly above (θ = ± 0°) while using the side illumination 84 in the second mode. In this case, the second image data I2 generated by the image processing unit 214 based on the detection signal of the first camera 81 is displayed on the display unit 22.

[0322] When comparing the case of using coaxial illumination 79 and the case of using side illumination 84, similar to the comparison between the second side illumination 95 and the second coaxial illumination 94, an image is obtained in which the contrast between light and dark of the second image data I2 seems to be inverted. By properly using the two types of illumination, as described above, in addition to the groove M1, the light and dark of minute uneven structures such as scratches Sc1, Sc2, etc. existing on the surface of the sample SP change. By changing the illumination according to the type of the sample SP, the user can more appropriately grasp the surface state of the sample SP.

[0323] In addition, the image processing unit 214 can also perform an overlay display of a mark P1 indicating the irradiation position (laser irradiation point) of the laser beam on the second image data I2. This mark P1 indicates the aiming of the laser beam. The user can check whether the analysis target is appropriately set by checking the position of the mark P1. The image processing unit 214 can proceed with the control process based on an operation input (for example, manual input by the user) indicating the confirmation result.

[0324] Here, when the analysis target is not appropriately set, the head unit 6 drives the stage driving unit 53 to adjust the position of the stage main body 51 based on, for example, an operation input by the user. Thereby, the relative position of the sample SP with respect to the mark P1 can be corrected.

[0325] In the subsequent step S54, the control unit 21 determines whether an irradiation instruction for the laser beam has been received. This determination is executed based on, for example, an operation input by the user. The control unit 21 repeats step S54 until this determination becomes YES.

[0326] In the subsequent step S55, the image processing unit 214 saves the second image data I2 immediately before the irradiation of the laser light in the storage device 21b. In the subsequent step S56, the illumination control unit 216 causes the storage device 21b to store the lighting state at that time (the illumination condition at the timing immediately before the emission of the laser light). In the subsequent step S57, the illumination control unit 216 turns off the illumination for analysis (coaxial illumination 79 or side illumination 84).

[0327] Then, in step S58, the spectrum acquisition unit 212 emits the laser light from the analysis optical system 7 to the sample SP. In this step S58, the first and second detectors 77A and 77B receive the light (secondary electromagnetic wave) emitted due to the plasma generation of the sample SP. At this time, the light reception timings by the first and second detectors 77A and 77B are set to be synchronized with the emission timing of the laser light. The spectrum acquisition unit 212 acquires the intensity distribution spectrum in accordance with the emission timing of the laser light.

[0328] In the subsequent step S59, the illumination control unit 216 turns on the illumination for analysis (coaxial illumination 79 or side illumination 84). In the subsequent step S60, the illumination control unit 216 reads the illumination condition stored in the storage device 21b and controls the illumination for analysis so as to reflect the illumination condition. Thereby, the lighting state immediately before the emission of the laser light is reproduced. Note that steps S59 and S60 may be swapped in order, or may be configured to execute both steps simultaneously.

[0329] In the subsequent step S61, the spectrum analysis unit 213 analyzes the intensity distribution spectrum to perform analysis of the components and component ratios of the elements contained in the sample SP, and estimation of the material based on the component ratios. The estimation result of the material is displayed, for example, on the display unit 22. Thereby, step S5 in FIG. 20 is completed, and the flow shown in FIG. 20 ends.

[0330] <Main Feature Parts of the Analytical Observation Apparatus A> (Feature Parts Contributing to Improvement of Measurement Accuracy) As described above, as illustrated in FIGS. 8A and 14, the transmission region 12a according to the present embodiment transmits the primary electromagnetic wave emitted from the electromagnetic wave emitting unit 71 and passing through the opening 11a, and emits the primary electromagnetic wave along the analysis optical axis Aa of the reflective objective lens 74. The primary electromagnetic wave is irradiated onto the sample SP in a state coaxial with the analysis optical axis Aa. Thereby, it becomes possible to collect the secondary electromagnetic wave generated in the sample SP as sufficiently as possible by the primary mirror 11. As a result, the intensity of the secondary electromagnetic wave reaching the first and second detectors 77A and 77B can be increased, and thus the detection accuracy of the analysis observation apparatus A can be improved.

[0331] Also, as shown in FIG. 7, the secondary electromagnetic wave collected by the reflective objective lens 74 reaches the first or second detector 77A or 77B via the first or second parabolic mirror 76A or 76B. By configuring to guide the secondary electromagnetic wave using only the reflection system in this way, a fiberless configuration that does not require an optical fiber can be realized. Thereby, the loss of the secondary electromagnetic wave can be suppressed as much as possible, which is advantageous for improving the detection accuracy of the analysis observation apparatus A.

[0332] Also, as shown in FIG. 7, by aligning the focal positions of the first and second parabolic mirrors 76A and 76B with the incident slits 77a and 77a of the first and second detectors 77A and 77B respectively, the gain of the secondary electromagnetic wave received by the first and second detectors 77A and 77B can be maximally increased. This is effective for improving the detection accuracy of the analysis observation apparatus A.

[0333] Further, as shown in FIG. 7, for the first component on the ultraviolet side where loss due to transmission of the glass material is a concern, the analysis and observation apparatus A guides it to the first detector 77A without passing through the spectroscopic element 75 mainly composed of the glass material. On the other hand, for the second component on the infrared side where the influence of loss is smaller compared to the first component, it is configured to pass through the spectroscopic element 75 and be guided to the second detector 77B. By configuring it in this way, detection by a plurality of detectors can be realized while suppressing the loss of the secondary electromagnetic wave as much as possible. Detection by a plurality of detectors contributes to an improvement in wavelength resolution. Therefore, such a configuration contributes to an improvement in measurement accuracy due to suppression of the loss of the secondary electromagnetic wave and improvement in wavelength resolution.

[0334] Further, as shown in FIG. 14, the deflection element 73 reflects the primary electromagnetic wave by the reflection region 731 and guides it to the reflective objective lens 74, while allowing the secondary electromagnetic wave to pass through the hollow region 732. By allowing the secondary electromagnetic wave to pass through the hollow region 732, the loss of the secondary electromagnetic wave can be suppressed. Therefore, such a configuration is effective in achieving both the coaxialization of the primary electromagnetic wave by the reflection region 731 and the improvement in measurement accuracy due to suppression of the loss of the secondary electromagnetic wave.

[0335] Further, as shown in FIG. 12, the reflection region 731 and the hollow region 732 can be established simultaneously by one deflection element 73. Such a configuration is effective in achieving both the coaxialization of the primary electromagnetic wave by the reflection region 731 and the improvement in measurement accuracy due to suppression of the loss of the secondary electromagnetic wave.

[0336] Further, as shown in FIG. 14, the secondary electromagnetic wave that has passed through the region near the first support leg 73d can pass through the deflection element 73 without being blocked by the second support leg 14b. This is effective in suppressing the loss of the secondary electromagnetic wave and thus improving the measurement accuracy in the analysis and observation apparatus A.

[0337] Also, as shown in FIG. 13, the through-hole 73b that partitions the hollow region 732 is formed to extend along the analysis optical axis Aa direction of the reflective objective lens 74. By forming it in this way, when the through-hole 73b is rotated by a predetermined angle around the analysis optical axis Aa, the through-hole 73b can be configured to be rotationally symmetric in plan view (3-fold symmetry in the illustrated example). Thereby, the distance between the inner peripheral surface of the through-hole 73b and the secondary electromagnetic wave passing through the hollow region 732 can be ensured, and the interference between the through-hole 73b and the secondary electromagnetic wave can be suppressed. This is effective in suppressing the loss of the secondary electromagnetic wave and contributes to an improvement in measurement accuracy.

[0338] Also, as shown in FIG. 7, in addition to the primary electromagnetic wave, the optical axis of the first camera 81 is also coaxialized with the reflective objective lens 74. Thereby, with one reflective objective lens 74, the three functions of irradiating the sample SP with the primary electromagnetic wave, collecting the secondary electromagnetic wave from the sample SP, and imaging the sample SP with the first camera 81 can be realized without interfering with each other.

[0339] Also, by interposing the optical thin film 13b between the transmission region 12a and the placement surface 51a, the collection of the reflected light passing through the transmission region 12a can be suppressed, and the reflected light can be collected only by the primary reflection surface 11b and the secondary reflection surface 12b. Thereby, the possibility that the reflected light is double-imaged in the first camera 81 is suppressed, and this is advantageous for improving the measurement accuracy.

[0340] Also, as shown in FIG. 7, in addition to the optical axis of the first camera 81, the coaxial illumination 79 is also coaxialized with the reflective objective lens 74. Thereby, with one reflective objective lens 74, the four functions of irradiating the sample SP with the primary electromagnetic wave, collecting the secondary electromagnetic wave from the sample SP, imaging the sample SP with the first camera 81, and irradiating the sample SP with the illumination light can be realized without interfering with each other.

[0341] (Features contributing to improved usability) In addition, the analysis and observation apparatus A according to the present embodiment includes a first camera 81 as an imaging unit for analysis, and as an illumination device used for imaging by the first camera 81, as shown in FIGS. 8A and 8B, it is provided with a side illumination 84 that irradiates illumination light obliquely upward from above the object to be analyzed. In this way, by providing the side illumination 84 around the reflective objective lens 74 as the collection head, the user can grasp the surface state that is difficult to capture with other illuminations such as coaxial illumination. Thereby, the usability in component analysis can be improved.

[0342] In addition, by arranging the side illumination 84 on the outer periphery of the reflective objective lens 74, it is possible to irradiate illumination light over a wider area without impairing the compactness of the reflective objective lens 74. Thereby, image data with excellent visibility can be generated, and the surface state of the sample SP can be made more clearly understood by the user.

[0343] In addition, as shown in FIG. 10, for example, the side illumination 84 according to the present embodiment can irradiate illumination light so as to be rotationally symmetric about the analysis optical axis Aa of the reflective objective lens 74. This is advantageous for sufficiently irradiating the area imaged by the first camera 81 with illumination light.

[0344] In addition, as shown in FIG. 8B, by emitting illumination light through the light guide member 84c, it is possible to irradiate illumination light over a wider area. Thereby, it is possible to suppress the occurrence of flare that may be caused by the secondary mirror 12 and the second support leg portion 14b or the like. By suppressing the occurrence of flare, it is possible to suppress the occurrence of shading in the image data. Thereby, image data with more excellent visibility can be generated, and the surface state of the sample SP can be made more clearly understood by the user.

[0345] Also, as shown in FIGS. 8A and 8B, by configuring such that the side illumination 84 and the reflective objective lens 74 are not directly connected, the thermal connection between the LED light source 84b, the primary mirror 11, and the secondary mirror 12 is suppressed. Thereby, the thermal influence on the primary mirror 11 and the secondary mirror 12 caused by the heat generation from the LED light source 84b can be suppressed. By suppressing the thermal influence on the primary mirror 11 and the secondary mirror 12, the displacement of both mirrors 11, 12 can be suppressed. This is effective in ensuring the accuracy of component analysis by the control unit 21.

[0346] Also, as shown in FIGS. 8A and 8B, by arranging the LED light source 84b between the primary mirror 11 and the secondary mirror 12 in the optical axis direction, it is possible to configure such that the LED light source 84b does not approach the mounting surface 51a more than necessary. Thereby, a sufficient accommodation space for the light guide member 84c in the optical axis direction can be secured. Also, by configuring such that the LED light source 84b is not separated from the mounting surface 51a more than necessary, it is possible to sufficiently secure the inclination angle formed by the side illumination 84 with respect to the reflective objective lens 74 without excessively increasing the diameter of the side illumination 84. Thereby, it is possible to irradiate the illumination light to an appropriate region and generate image data with excellent visibility. As a result, the user can more clearly grasp the surface state of the sample SP.

[0347] Also, as shown in FIG. 10, the side illumination 84 composed of a plurality of blocks can irradiate illumination light from various angles by lighting each of them individually. Thereby, the user can more clearly grasp the surface state of the sample SP.

[0348] Also, the analysis and observation apparatus A according to the present embodiment can selectively use two types of illumination devices having different irradiation directions. Thereby, it is possible to generate more diverse image data, which is advantageous for the user to grasp the surface state of the sample SP.

[0349] In addition, the analysis and observation apparatus A can selectively use two types of illumination devices with different irradiation directions not only in the analysis optical system 7 but also in the observation optical system 9. As a result, it is possible to generate more diverse image data, which is advantageous for enabling the user to grasp the surface state of the sample SP.

[0350] Also, as described with reference to FIGS. 21 and 22, the control unit 21 as the processing unit can generate image data under the same conditions as much as possible when observing and analyzing the sample SP. As a result, it becomes possible to switch between the image data (first image data I1) generated during observation and the image data (second image data I2) generated during analysis without giving the user a sense of discomfort, which is advantageous for improving usability.

[0351] In addition, the analysis and observation apparatus A according to the present embodiment is configured to match the focal lengths when observing and analyzing the sample SP. As a result, it becomes possible to generate image data under the same conditions as much as possible when observing and analyzing the sample SP. Consequently, it becomes possible to switch between the image data (first image data I1) generated during observation and the image data (first image data I1) generated during analysis without giving the user a sense of discomfort, which is advantageous for improving usability.

[0352] <<Other Embodiments>> (Modification Example Regarding Hardware Configuration) FIG. 28 is a bottom view showing a modification example of side illumination.

[0353] In the above-described embodiment, the side illumination 84 was constituted by an annular illumination capable of emitting annular illumination light. However, the present disclosure is not limited to such a configuration. The side illumination according to the present disclosure generally includes an illumination device that is arranged so as to surround the reflective objective lens 74 as a collection head and irradiates illumination light obliquely upward with respect to the sample SP. That is, the side illumination is not limited to the side illumination 84 as the annular illumination illustrated in the upper part of FIG. 28, and the rectangular illumination 84' illustrated in the middle part of FIG. 28 may be used as the side illumination, or the cross-shaped illumination 84" illustrated in the lower part of FIG. 28 may be used as the side illumination.

[0354] Further, in the above-described embodiment, the observation housing 90 was configured to be supported by the outer surface of the analysis housing 70. However, the present disclosure is not limited to such a configuration. The observation housing 90 or the observation unit 9a may be configured to be supported by the inner surface of the analysis housing 70. In this case, the observation housing 90 or the observation unit 9a will be housed in the analysis housing 70, similarly to the analysis optical system 7.

[0355] Further, in the above-described embodiment, the observation optical axis Ao and the analysis optical axis Aa were configured to be parallel to each other. However, the present disclosure is not limited to such a configuration. The analysis optical system 7 and the observation optical system 9 may be arranged such that the observation optical axis Ao and the analysis optical axis Aa are in a twisted position.

[0356] (Modification of the analysis method) The analysis and observation apparatus A according to the above-described embodiment was configured to perform component analysis by the LIBS method by emitting laser light as primary electromagnetic waves from the electromagnetic wave emitting unit 71. However, the present disclosure is not limited to such a configuration.

[0357] For example, by using infrared light as the primary electromagnetic wave, analysis by infrared spectroscopy may be performed instead of the LIBS method. Specifically, the chemical structure of molecules contained in the object to be observed may be analyzed by irradiating the object to be observed with infrared light and measuring the transmitted or reflected light (secondary electromagnetic wave). Analysis by Raman spectroscopy may be performed, in which monochromatic light is used as the electromagnetic wave, and the physical properties such as the crystallinity of the object to be observed are examined using Raman scattered light generated by irradiating the object to be observed with the monochromatic light. Also, analysis by ultraviolet-visible-near-infrared spectroscopy may be performed by using light in the ultraviolet region, visible region, and infrared region of about 180 to 3000 nm as the electromagnetic wave. Specifically, qualitative and quantitative analysis of the target component contained in the object to be observed may be performed by irradiating the object to be observed with the electromagnetic wave and measuring the transmitted or reflected light. Further, spectroscopic analysis in the X-ray region may be performed by using X-rays as the electromagnetic wave. Specifically, fluorescence X-ray analysis may be performed, in which the object to be observed (sample) is irradiated with X-rays, and the elements of the object to be observed are analyzed based on the energy and intensity of the fluorescence X-rays, which are the characteristic X-rays generated thereby. Instead of the electromagnetic wave, an electron beam may be used, and the surface of the object to be observed may be analyzed based on the energy and intensity of the reflected electrons generated by irradiating the object to be observed with the electron beam. The configuration according to the present disclosure is also applicable when performing those spectroscopies.

Explanation of Signs

[0358] A Analysis and Observation Apparatus (Analysis Apparatus) 1 Optical System Assembly 2 Controller Main Body 21 Control Unit (Processing Unit) 215 Lighting Setting Unit 216 Lighting Control Unit 64 Housing Connector 65 Slide Mechanism 7 Analysis Optical System 70 Analysis Housing 71 Electromagnetic Wave Emission Unit 73 Deflection Element 731 Reflection Region 732 Hollow Region 73a Element Support Member 73b Through-Hole 73c Mirror member 73d First support leg 74 Reflective objective lens (collection head) 11 Primary mirror 11a Opening 11b Primary reflection surface 12 Secondary mirror 12a Transmission region 12b Secondary reflection surface 13 Tertiary lens 13b Optical thin film 14 Support member 14a Mirror support member 14b Second support leg 75 Spectroscopic element 76A First parabolic mirror (parabolic mirror) 76B Second parabolic mirror (parabolic mirror) 77A First detector (detector) 77B Second detector (detector) 77a Incident slit (light receiving part) 79 Coaxial illumination 81 First camera (imaging part) 84 Side illumination 84a Housing 84b LED light source (light source) 84d Diffusion plate 9 Observation optical system 90 Observation housing 92 Objective lens 93 Second camera (second imaging part) 94 Second coaxial illumination (second coaxial illumination) 95 Second side illumination (second side illumination) Aa Analysis optical axis (optical axis of reflective objective lens) Ao Observation optical axis I1 First image data I2 Second image data SP Sample (object to be analyzed)

Claims

1. An electromagnetic wave emitting unit that emits primary electromagnetic waves for analyzing an object to be analyzed; A collection head that collects secondary electromagnetic waves generated in the object to be analyzed when the primary electromagnetic waves are emitted from the electromagnetic wave emitting unit; A detector that receives the secondary electromagnetic waves generated in the object to be analyzed and collected by the collection head, and generates an intensity distribution spectrum that is the intensity distribution for each wavelength of the secondary electromagnetic waves; An analysis apparatus comprising a processing unit that performs component analysis of the object to be analyzed based on the intensity distribution spectrum generated by the detector, A first coaxial illumination that irradiates the object to be analyzed with illumination light through an optical path coaxial with the optical path of the primary electromagnetic waves; A first side illumination that is arranged so as to surround the collection head and irradiates the object to be analyzed with illumination light from an oblique side thereof; A first imaging unit that collects reflected light reflected by the object to be analyzed through the collection head and detects the amount of received light of the collected reflected light; A spectroscopic element that receives the secondary electromagnetic waves collected by the collection head and the reflected light collected by the collection head through a common optical path, and splits the common optical path so as to guide the secondary electromagnetic waves to the detector while guiding the reflected light to the first imaging unit; An observation optical system including a second coaxial illumination that irradiates the object to be analyzed with illumination light, a second side illumination that irradiates the object to be analyzed with illumination light from an oblique side thereof, an objective lens that condenses reflected light from the object to be analyzed, and a second imaging unit that receives the reflected light condensed by the objective lens and detects the amount of received light; An illumination setting unit that sets at least one illumination condition of the second coaxial illumination and the second side illumination and stores it in a storage unit; An illumination control unit that reads the illumination condition set by the illumination setting unit from the storage unit and controls at least one of the first coaxial illumination and the first side illumination so as to reflect the illumination condition; and further comprising, The processing unit, Performs component analysis of the object to be analyzed based on the intensity distribution spectrum, Generates first image data of the object to be analyzed based on the amount of received light detected by the second imaging unit under the illumination condition set by the illumination setting unit, Generates second image data of the object to be analyzed based on the amount of received light detected by the first imaging unit under the illumination condition read from the storage unit by the illumination control unit An analysis apparatus characterized by the above.

2. In the analyzer according to claim 1, the collection head has a primary mirror provided with an opening at the central portion in the radial direction, and a primary reflecting surface that reflects the secondary electromagnetic wave generated in the object to be analyzed corresponding to the emission of the primary electromagnetic wave is provided around the opening, and has a secondary mirror provided with a secondary reflecting surface that receives and further reflects the secondary electromagnetic wave reflected by the primary reflecting surface, and is composed of a reflective objective lens that condenses the secondary electromagnetic wave by the primary mirror and the secondary mirror and guides it to the opening, wherein the first side illumination is arranged so as to surround the outer periphery of the reflective objective lens Analyzer characterized by the above.

3. In the analyzer according to claim 2, the first side illumination is constituted by an annular illumination that surrounds the reflective objective lens in an annular shape, and the central axis of the circle corresponding to the first side illumination is arranged to be coaxial with the optical axis of the reflective objective lens. Analyzer characterized by the above.

4. In the analyzer according to claim 2 or 3, the first side illumination has a light source that emits the illumination light, and a diffusing member that transmits the illumination light emitted from the light source and diffuses the illumination light in the radial direction orthogonal to the optical axis of the reflective objective lens. Analyzer characterized by the above.

5. In the analyzer according to claim 4, the first side illumination has a housing that covers the outer periphery of the reflective objective lens, and the light source is supported by the housing in a state of being separated from the outer peripheral surface of the reflective objective lens. Analyzer characterized by the above.

6. In the analyzer according to claim 4 or 5, the light source is arranged to be separated from the object to be analyzed more than the secondary mirror in the optical axis direction of the reflective objective lens. Analyzer characterized by the above.

7. In the analyzer according to any one of claims 2 to 6, the first side illumination is divided into a plurality of blocks along the circumferential direction around the optical axis of the reflective objective lens, and each block is configured to be individually lit. Analyzer characterized by the above.

8. In the analyzer according to any one of claims 1 to 7, the processing unit inputs a control signal to at least one of the first side illumination and the first coaxial illumination so as to irradiate illumination light from at least one of the first side illumination and the first coaxial illumination. An analyzer characterized by the above.

9. In the analyzer according to claim 8, an analysis housing that houses the electromagnetic wave emitting unit, the collection head, the detector, and the first imaging unit; an observation housing that houses the observation optical system and is held by the analysis housing, and the processing unit inputs a control signal to at least one of the second side illumination and the second coaxial illumination so as to irradiate illumination light from at least one of the second side illumination and the second coaxial illumination. An analyzer characterized by the above.

10. In the analyzer according to claim 9, a first state in which the collection head faces the analysis object; a second state in which the objective lens faces the analysis object; a slide mechanism for sliding the analysis housing and the observation housing between them, and the processing unit, before and after switching between the first state and the second state, the illumination conditions of the first side illumination and the illumination conditions related to the first coaxial illumination in the first state; the illumination conditions of the second side illumination and the illumination conditions related to the second coaxial illumination in the second state; Among them, the illumination conditions after switching are set so as to reproduce the illumination conditions referred to before switching. An analyzer characterized by the above.

11. In the analyzer according to claim 10, the distance between the central part of the analysis object and the collection head in the first state is set to be the same as the distance between the central part of the analysis object and the objective lens in the second state. An analyzer characterized by the above.

12. In the analyzer according to any one of claims 1 to 11, the electromagnetic wave emitting unit is constituted by a laser light source that emits laser light as the primary electromagnetic wave, the collection head condenses the light generated in the analysis object in response to the irradiation of the laser light emitted from the electromagnetic wave emitting unit, the detector generates an intensity distribution spectrum that is the intensity distribution for each wavelength of the light generated in the analysis object and condensed by the collection head. An analyzer characterized by the above.

Images