Chemical Solution Synthesis Equipment

Abstract

To provide a chemical liquid synthesis device for feeding chemical liquid in a non-contact state with atmosphere, capable of enhancing synthesis efficiency between a carrier and chemical liquid in a reaction vessel part.SOLUTION: A chemical liquid synthesis device comprises: a chemical liquid storage part storing chemical liquid; and a reaction vessel part for reacting, the chemical liquid and the carrier, the chemical liquid synthesis device capable of feeding the chemical liquid from the chemical liquid storage part to the reaction vessel part without contacting to the atmosphere. The chemical liquid synthesis device further comprises: a first chemical liquid supply part for supplying the chemical liquid to the reaction vessel part; and a chemical liquid discharge part provided at a vertically upper side relative to the first chemical liquid supply part; and a second chemical liquid supply part for, after discharging the chemical liquid from the chemical liquid discharge part, falling the carrier adhered to an inner wall of the reaction vessel part.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to a chemical liquid synthesizer that synthesizes a chemical liquid that is delivered without being exposed to the atmosphere, and more particularly to a chemical liquid synthesizer that can suppress a decrease in synthesis efficiency. [Background technology]

[0002] In a chemical synthesis apparatus for chemically synthesizing proteins, peptides, polymers, nucleic acids, etc., chemical synthesis is performed by supplying multiple chemical solutions (reagents) to a reaction vessel. For example, when synthesizing nucleic acids, a large number of carriers (porous beads) are placed in the reaction vessel, and while chemical solutions are sequentially supplied to this reaction vessel, processes such as detritylation, coupling, oxidation, and capping are repeatedly performed to sequentially bind bases to the beads.

[0003] 7, a typical chemical solution synthesis apparatus includes a reaction vessel section 100 that accommodates a carrier 110 (see FIG. 8) and to which a chemical solution is supplied, a chemical solution storage section such as a chemical solution tank 101 that stores the chemical solution to be supplied to the reaction vessel section 100, and a drainage tank 102 that stores the drainage solution discharged from the reaction vessel section 100. Each of these sections is connected by piping 103, and the chemical solution is pumped by pressure from a pressure supply source 107, so that the chemical solution and the carrier 110 can undergo a synthesis reaction without the chemical solution coming into contact with the atmosphere (see, for example, Patent Document 1 listed below). Specifically, the reaction vessel section 100 has a chemical solution supply section 106 at the lower vertical end to which the chemical solution is supplied, and a chemical solution discharge section 105 at the upper vertical end to which the chemical solution is discharged. When the chemical solution is supplied from the selected chemical solution tank through piping 103 from the chemical solution supply section 106 at the lower end, the chemical solution and the carrier undergo a synthetic reaction in the reaction vessel section 100, and then the chemical solution after the reaction is discharged from the chemical solution discharge section 105 at the upper end through piping 103 to the drain tank 102 (see Figure 8(a)).

[0004] As described above, the chemical solution is supplied to the reaction vessel section 100 from the chemical solution supply section 106 at the lower end in the vertical direction. That is, the chemical solution from the chemical solution supply section 106 at the lower end is accumulated while spreading in the radial direction of the reaction vessel section 2 due to the influence of gravity. Therefore, the chemical solution can be distributed throughout the reaction vessel section 2, and the efficiency of synthesis with the carrier 110 is improved compared to when the chemical solution is supplied from the upper end side, and chemical synthesis can be performed efficiently between the carrier 110 and the chemical solution in the reaction vessel section 2. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Japanese Patent Publication No. 2020-093236 Summary of the Invention [Problem to be solved by the invention]

[0006] However, in the above-described chemical solution synthesizing apparatus, there was a risk of a decrease in synthesis efficiency in the reaction vessel section 100. That is, after a chemical solution is stored in the reaction vessel section 100 and a synthesis reaction is performed, when the chemical solution is discharged from the chemical solution discharge section 105 at the upper end as shown in Fig. 8(a), a phenomenon occurs in which a part of the carrier 110 remains attached to the upper part of the reaction vessel section 100 as shown in Fig. 8(b). In this state, when it is desired to store a small amount of chemical solution in the reaction vessel section 100 and perform a reaction, if the chemical solution is supplied from the chemical solution supply section 106, the chemical solution does not reach the attached carrier 110, and the reaction cannot be performed sufficiently.

[0007] Furthermore, immediately after the chemical solution is supplied, some of the carriers may float on the surface of the chemical solution in the reaction vessel section 100, and due to the fluctuation of the liquid surface when the chemical solution is supplied, they may adhere to the wall surface of the reaction vessel section 100. In such cases, the same problem as described above occurs, and there is a problem that the reaction cannot be carried out sufficiently if the chemical solution after supply has been completed does not reach the height position where the carriers are attached.

[0008] The present invention has been made in consideration of the above-mentioned problems, and aims to provide a chemical solution synthesis apparatus that can improve the synthesis efficiency between a carrier and a chemical solution in a reaction vessel section, in a chemical solution synthesis apparatus that delivers a chemical solution without contacting the atmosphere. [Means for solving the problem]

[0009] In order to solve the above problems, the chemical solution synthesizing apparatus of the present invention is a chemical solution synthesizing apparatus comprising a chemical solution storage section in which a chemical solution is stored, and a reaction vessel section in which the chemical solution and a carrier are reacted, and in which the chemical solution is sent from the chemical solution storage section to the reaction vessel section without coming into contact with the atmosphere, and further comprising a first chemical solution supply section connected to the reaction vessel section and supplying the chemical solution to the reaction vessel section, and a chemical solution discharge section provided vertically above the first chemical solution supply section, and a second chemical solution supply section that prevents the carrier from adhering to the reaction vessel section, The reaction vessel section has an exhaust section for discharging gas from the reaction vessel section, which is disposed at a height position equal to or higher than the height position of the chemical solution discharge section. It is characterized by:

[0010] The chemical solution synthesis apparatus described above includes a second chemical solution supply unit, which can prevent the carrier from adhering to the inner wall of the reaction vessel. That is, even if the surface of the chemical solution sways and causes the carrier to adhere to the inner wall of the reaction vessel, the chemical solution is supplied from the second chemical solution supply unit located above the surface of the chemical solution, which prevents the carrier from adhering. Even if the carrier does adhere to the inner wall of the reaction vessel, the chemical solution can be washed back into the chemical solution. This facilitates contact with the chemical solution supplied from the first chemical solution supply unit located at the lower end, thereby improving the synthesis efficiency of the carrier and the chemical solution. Furthermore, by providing the exhaust part, gas inside the reaction vessel part can be exhausted, and therefore the chemical can be easily supplied from the second chemical supply part.

[0011] Furthermore, in order to solve the above-mentioned problems, the chemical solution synthesizing apparatus of the present invention is a chemical solution synthesizing apparatus comprising a chemical solution storage section in which a chemical solution is stored, and a reaction vessel section in which the chemical solution and a carrier are reacted, and in which the chemical solution is sent from the chemical solution storage section to the reaction vessel section without coming into contact with the atmosphere, and further comprising a first chemical solution supply section connected to the reaction vessel section and supplying the chemical solution to the reaction vessel section, and a chemical solution discharge section provided vertically above the first chemical solution supply section, and a second chemical solution supply section that drops the carrier adhering to the inner wall of the reaction vessel section after discharging the chemical solution from the chemical solution discharge section, The reaction vessel section has an exhaust section for discharging gas from the reaction vessel section, which is disposed at a height position equal to or higher than the height position of the chemical solution discharge section.It is characterized by:

[0012] The chemical solution synthesis apparatus described above includes a second chemical solution supply unit, and therefore, after the chemical solution is discharged from the chemical solution discharge unit located vertically above, the carriers attached to the inner wall of the reaction vessel unit can be dropped. That is, the chemical solution supplied from the second chemical solution supply unit comes into contact with the carriers attached to the inner wall of the reaction vessel unit, causing the carriers to drop together with the supplied chemical solution and return to the lower end of the reaction vessel unit. This facilitates contact with the chemical solution supplied from the first chemical solution supply unit located at the lower end, thereby improving the synthesis efficiency of the carriers and the chemical solution. Furthermore, by providing the exhaust part, gas inside the reaction vessel part can be exhausted, and therefore the chemical can be easily supplied from the second chemical supply part.

[0013] The second chemical liquid supply unit may be connected to the chemical liquid discharge unit, and the chemical liquid may be supplied by causing a reverse flow through the chemical liquid discharge unit.

[0014] With this configuration, the chemical can be supplied using the chemical discharge part, eliminating the need to form an independent port in the reaction vessel part exclusively for the second chemical supply part, and therefore the second chemical supply part can be provided without making the piping more complicated than necessary.

[0015] The chemical liquid supplied from the second chemical liquid supply unit may be supplied along the side wall of the reaction vessel unit.

[0016] According to this configuration, carriers that are about to adhere to the side walls of the reaction vessel section or carriers that have already adhered can be washed back, thereby preventing the carriers from adhering to the side walls of the reaction vessel section and reducing the synthesis efficiency.

[0017] The chemical solution in the reaction vessel section may be discharged by flowing backward through the first chemical solution supply section.

[0018] According to this configuration, since the first chemical liquid supply section is located vertically lower than the chemical liquid discharge section, adhesion of the carrier to the wall surface of the reaction vessel section can be suppressed compared to when the chemical liquid is discharged from the chemical liquid discharge section.

[0021] The reaction vessel section may be provided with a guide member that guides the chemical solution supplied through the second chemical solution supply section to a side wall of the reaction vessel section.

[0022] According to this configuration, the liquid chemical delivered from the second liquid chemical delivery unit is guided to the side wall of the reaction vessel unit by the guide member, which makes it easier for the guided liquid chemical to flow along the side wall, thereby efficiently allowing the carrier stuck to the side wall to fall together with the liquid chemical.

[0023] As a specific embodiment of the guide member, the structure can be simplified by using the guide member in common with the filter.

[0024] The above-mentioned chemical solution may be a cleaning solution, and the same effect can be obtained by using a cleaning solution instead of the chemical solution. [Effects of the Invention]

[0025] According to the chemical solution synthesizer of the present invention, in a chemical solution synthesizer that delivers a chemical solution without contacting the atmosphere, it is possible to increase the efficiency of synthesis between the carrier and the chemical solution in the reaction vessel section. [Brief explanation of the drawings]

[0026] [Figure 1] 1 is a schematic piping diagram of a chemical solution synthesizing apparatus according to the present invention. [Figure 2] FIG. 2 is a diagram showing a reaction vessel portion of the chemical solution synthesis apparatus. [Figure 3] FIG. 10 is a piping diagram showing a normal mode in which a chemical is supplied from a first chemical supply unit to a reaction vessel unit. [Figure 4] 1A and 1B are diagrams showing the state in which the chemical solution is discharged from the reaction vessel section, where (a) is a diagram showing the state in which the carrier has moved upward when the chemical solution is being discharged from the chemical solution discharge section, and (b) is a diagram showing the state in which the carrier has stuck to the upper part after the chemical solution has been discharged from the chemical solution discharge section. [Figure 5] FIG. 10 is a piping diagram showing a carrier return mode in which the chemical is supplied to the reaction vessel section by causing a reverse flow from the second chemical supply section to the chemical discharge section. [Figure 6] FIG. 10 is a diagram showing a state in which another guide member is provided in the reaction vessel section. [Figure 7] FIG. 1 is a schematic piping diagram of a conventional chemical liquid synthesizing apparatus. [Figure 8] 1A and 1B are diagrams showing the state in which a chemical solution is discharged from a conventional reaction vessel section, in which (a) shows the state in which the carrier has moved upward when the chemical solution is being discharged from the chemical solution discharge section at the upper end, and (b) shows the state in which the carrier has stuck to the upper part after the chemical solution has been discharged from the chemical solution discharge section. [Figure 9] FIG. 10 is a diagram showing a state in which the carrier floating in the reaction vessel section sinks into the chemical solution due to the supplied chemical solution. [Figure 10] 1A and 1B are diagrams showing a configuration for transmitting the supplied chemical solution along the side wall of the reaction vessel section, in which (a) shows a state in which the piping is stored within the wall surface of the lid section, and (b) shows a state in which the piping protrudes from the wall surface of the lid section. DETAILED DESCRIPTION OF THE INVENTION

[0027] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a chemical solution synthesizing apparatus according to the present invention will be described with reference to the drawings.

[0028] 1 is a piping diagram showing a chemical liquid synthesizing apparatus according to one embodiment of the present invention. Note that, although this embodiment describes an example in which a chemical liquid (reagent) is used as the fluid, the present invention is not limited to chemical liquids and can also be applied to chemical synthesis, mixing, etc. of liquids other than chemical liquids.

[0029] As shown in FIG. 1, the chemical solution synthesizer includes a chemical solution tank 1, which is a chemical solution storage section for storing the chemical solution, a measuring section 3 for measuring the chemical solution, a reaction vessel section 2 that stores carrier S (porous beads; see FIG. 2), and a drainage tank 11, which is a storage vessel section for storing drainage discharged from the reaction vessel section 2, all of which are connected by piping 4. The chemical solution supplied from the chemical solution tank 1 is measured by the measuring section 3 and then supplied to the reaction vessel section 2, where the carrier S and the chemical solution come into contact with each other in the reaction vessel section 2, resulting in chemical synthesis. The chemical solution after chemical synthesis is then discharged by being pumped to the drainage tank 11. For example, when synthesizing nucleic acids, a certain amount of porous carrier S is contained in the reaction vessel section 2, and while measuring the chemical solution, detritylation, coupling, oxidation, capping, and other processes are repeatedly performed to bind bases to the beads one after another while sequentially supplying the measured chemical solution to the reaction vessel section 2.

[0030] The chemical tanks 1 are used to store reagents used in chemical synthesis. In the example of FIG. 1, three chemical tanks 1 are shown, but in reality, many chemical tanks 1 are provided, and each chemical tank 1 is connected to the measuring unit 3 by a pipe 42. In other words, the chemical liquid stored in each chemical tank 1 is sent to the measuring unit 3 without being mixed with the other chemical liquids.

[0031] Pressure adjustment means 6 is connected to the liquid chemical tank 1, and is configured so that the liquid chemical in the liquid chemical tank 1 is delivered by pressure delivery using this pressure adjustment means 6. The pressure adjustment means 6 has a gas tank 61 filled with gas and a pipe 41 connecting the gas tank 61 to the liquid chemical tank 1, and the gas in the gas tank 61 can be supplied to the liquid chemical tank 1 through this pipe 41. That is, by supplying gas from the gas tank 61, the pressure in the liquid chemical tank 1 is adjusted to the pressure of the gas tank 61, and a pressure difference with the pressure in the metering unit 3 is formed, so that the liquid chemical in the liquid chemical tank 1 is delivered to the metering unit 3. Then, by adjusting the pressure of the gas tank 61, the flow rate of the liquid chemical delivered from the liquid chemical tank 1 can be adjusted. In other words, by increasing the pressure difference between the pressure in the liquid chemical tank 1 and the measuring unit 3, the liquid chemical delivery speed from the liquid chemical tank 1 increases, allowing the amount of liquid chemical to be increased, and by decreasing the pressure difference between the pressure in the liquid chemical tank 1 and the measuring unit 3, the liquid chemical delivery speed from the liquid chemical tank 1 decreases, allowing the amount of liquid chemical to be reduced.

[0032] In this embodiment, a cleaning liquid is stored in one of the chemical liquid tanks 1. When a specific chemical liquid is to be delivered, if it cannot be mixed with a previously delivered chemical liquid, this cleaning liquid is delivered after the previous chemical liquid has been delivered and before the subsequent chemical liquid is delivered, to clean the reaction vessel section 2 and the piping 4. This cleaning liquid is also stored in a chemical liquid tank 1 (chemical liquid tank 1a in FIG. 1) having the same configuration as the above-mentioned chemical liquid, and the delivery of the cleaning liquid is also performed with the same configuration as the above-mentioned chemical liquid.

[0033] Furthermore, pipes 41 and 42 are provided with valves 51. These valves 51 selectively connect the target liquid chemical tank 1 to the metering unit 3. That is, when the valve 51 of the liquid chemical tank 1 selected as the supply target is opened (open state), gas is supplied from the gas tank 61 to pressurize the liquid chemical tank 1, thereby controlling the pressure of the liquid chemical tank 1 to be greater than the pressure of the metering unit 3, and the liquid chemical in the selected liquid chemical tank 1 is sent to the metering unit 3 through pipe 42. Note that pipes 41, 42, ... will simply be referred to as pipe 4 unless there is a particular need to distinguish between them.

[0034] In addition, in this embodiment, an example in which the gas tank 61 is used as the pressure adjustment means 6 will be described, but a gas supply source provided in the building in which the chemical solution synthesis apparatus is installed may be used instead of the gas tank 61. The gas used in this gas tank 61 is a gas (such as argon gas) that does not react with the chemical solution in the chemical solution tank 1.

[0035] The measuring unit 3 measures the supplied chemical solution with high precision. In this embodiment, the mass of the supplied chemical solution is measured, and the amount of chemical solution to be reacted with the carrier S in the reaction vessel section 2 can be measured with high precision. That is, the measuring unit 3 has a measuring vessel 31 and a load cell (not shown) connected to the measuring vessel 31, and the chemical solution stored in the measuring vessel 31 is measured by the load cell.

[0036] Measuring vessel 31 has piping 42 connected to its upper end and piping 43 connected to its lower end, so that the liquid chemical sent from liquid chemical tank 1 is supplied through piping 42 and the measured liquid chemical is discharged through piping 43. Specifically, when valve 51 of piping 4 connecting selected liquid chemical tank 1 and measuring vessel 31 is in an open state, selected liquid chemical tank 1 is pressurized by gas tank 61, and the liquid chemical is supplied to measuring vessel 31 through piping 42. Then, in reaction vessel section 2, the amount of liquid chemical required for one synthesis reaction is measured and at the same time the liquid transfer is stopped, so that the liquid chemical required for the synthesis reaction is stored in measuring vessel 31. Then, the measured liquid chemical is transferred from measuring vessel 31 to reaction vessel section 2 through piping 43.

[0037] The liquid is sent from the measuring unit 3 by a gas tank 62 (pressure adjusting means 6). That is, a gas tank 62 is connected to the measuring container 31 separately from the gas tank 62, and gas can be supplied from the gas tank 62 to the measuring container 31. The pressure of the measuring container 31 is adjusted by supplying gas from the gas tank 62 to the measuring container 31, and the differential pressure between the measuring unit 3 and the reaction container section 2 is adjusted, so that the liquid chemical in the measuring container 31 is sent to the reaction container section 2. In the example of FIG. 1, the liquid chemical after metering is supplied to the reaction container section 2 through piping 43 and piping 44. Note that a gas supply source installed in the building may also be used for the gas tank 62.

[0038] The reaction vessel section 2 provides a reaction field where the carrier S contained in the reaction vessel section 2 is brought into contact with a supplied chemical solution or the like to cause chemical synthesis. In this embodiment, the reaction vessel section 2 is a cylindrical glass tube extending in one direction, and the carrier S is accommodated in the reaction vessel section 2 (see FIG. 2). A first chemical solution supply section 71 to which the chemical solution is supplied and a chemical solution discharge section 72 to which the chemical solution is discharged are connected to both vertical ends of the reaction vessel section 2. That is, the reaction vessel section 2 is supplied with the chemical solution through the first chemical solution supply section 71, and is discharged with the chemical solution through the chemical solution discharge section 72. In this embodiment, the chemical solution discharge section 72 is provided on the vertical upper side, and the first chemical solution supply section 71 is provided on the vertical lower side.

[0039] The first chemical liquid supply unit 71 supplies the chemical liquid to the vertically lower side of the reaction vessel section 2, and in this embodiment, is formed by the first port 21a and the piping 44. That is, as shown in FIG. 2 , the reaction vessel section 2 has the first port 21a on the vertically lower side, and the piping 44 is connected to this first port 21a. Therefore, the chemical liquid sent from the metering section 3 through the piping 43 is supplied to the reaction vessel section 2 through the three-way valve 53 and the piping 44. Then, when the chemical liquid is supplied from the first chemical liquid supply unit 71, the supplied chemical liquid spreads in the radial direction of the reaction vessel section 2 due to the influence of gravity and is stored. Therefore, the chemical liquid can be distributed throughout the reaction vessel section 2, and the chemical liquid can be chemically synthesized with the carrier S contained in the reaction vessel section 2 without waste.

[0040] The chemical solution discharge section 72 discharges the chemical solution at the vertically upper side of the reaction vessel section 2, and in this embodiment, is formed by the second port 21b and the piping 45. That is, as shown in Fig. 2, the reaction vessel section 2 has the second port 21b at the vertically upper side, and the piping 45 is connected to this second port 21b.

[0041] Furthermore, a drainage tank 11, which will be described later, is provided downstream of the reaction vessel section 2, and the reaction vessel section 2 and the drainage tank 11 are connected by a pipe 45. That is, the chemical solution in the reaction vessel section 2 can be discharged from the chemical solution discharge section 72 through the pipe 45.

[0042] Further, downstream of the reaction vessel section 2, a drainage tank 11 is provided as a storage vessel section for storing chemical liquids and the like drained from the reaction vessel section 2 after completion of the reaction. The drainage tank 11 is formed to have a larger capacity than the reaction vessel section 2, and is formed to have a capacity that can store chemicals even when discharged from the reaction vessel section 2 multiple times. In this embodiment, the chemical liquid after the reaction is discharged to the drainage tank 11 via the chemical liquid discharge section 72. That is, the reaction vessel section 2 is pressurized by supplying gas from the gas tank 62, and the chemical liquid after the reaction is discharged to the drainage tank 11 through the chemical liquid discharge section 72. In this way, the chemical liquid synthesis apparatus of the present invention is configured to transport the chemical liquid from the chemical liquid tank 1 to the drainage tank 11 without coming into contact with the atmosphere.

[0043] The chemical solution synthesizing apparatus is also provided with a second chemical solution supply unit 73 (see FIG. 1 ) in addition to the first chemical solution supply unit 71. The second chemical solution supply unit 73 prevents the carrier S from adhering to the reaction vessel section 2 and allows the carrier S adhering to the reaction vessel section 2 to fall. In this embodiment, the second chemical solution supply unit 73 is formed by piping 46 connected to piping 43 by three-way valve 53, and this piping 46 is connected to piping 45 by three-way valve 55. The second chemical solution supply unit 73 then sends the measured chemical solution from piping 43 via the three-way valve 53 through piping 46, and then sends the chemical solution to the reaction vessel section 2 via the three-way valve 55 and piping 45. That is, the second chemical solution supply unit 73 supplies the chemical solution to the reaction vessel section 2 by causing the chemical solution discharge unit 72 to flow backward. When the chemical liquid is supplied from the second chemical liquid supply unit 73, the chemical liquid flows along the side wall 22a of the reaction vessel unit 2, and the carriers adhering to the reaction vessel unit 2 can be dropped.

[0044] Furthermore, the chemical solution supplied from the second chemical solution supply unit 73 flows along the side wall 22a of the reaction vessel section 2, thereby flowing back the carriers S that would otherwise adhere to the side wall 22a of the reaction vessel section 2, thereby preventing the carriers S from adhering to the side wall 22a. Furthermore, as shown in FIG. 9 , when the chemical solution is supplied from the second chemical solution supply unit 73, the flow of the chemical solution directly hits the carriers S floating on the liquid surface, sinking the carriers, thereby preventing the carriers S from adhering to the side wall 22a of the reaction vessel section 2. In particular, when the chemical solution flows along the side wall 22a of the reaction vessel section 2, the flow of the chemical solution directly hits the carriers S floating on the liquid surface near the side wall 22a. This makes it easier for the chemical solution to blend with the carriers S than when the chemical solution is supplied from the lower first chemical solution supply unit 71. Furthermore, the swaying of the liquid surface caused by the supply of the chemical solution can sink the carriers S that would otherwise adhere to the side wall 22a. This prevents the carriers S from adhering to the side wall 22a.

[0045] Furthermore, pipe 44 is connected to pipe 45 via pipe 48 by valve 58, and reaction vessel section 2 is connected to drain tank 11 via pipes 44, 48, and 45. That is, the chemical liquid in reaction vessel section 2 supplied from second chemical liquid supply section 73 can be discharged by causing it to flow backward through first chemical liquid supply section 71.

[0046] In the above explanation, the subject was a chemical liquid, but the subject can also be a cleaning liquid instead of a chemical liquid, and even when a cleaning liquid is used, the measurement and delivery are carried out in the same manner as for a chemical liquid.

[0047] 2, the reaction vessel section 2 has a reaction vessel body 22 that accommodates carriers S (beads), and lid sections 23 that are provided at both axial ends of the reaction vessel body 22. The lid section 23 is provided with a first port 21a and a second port 21b, and the chemical solution is supplied from the first port 21a and discharged from the second port 21b.

[0048] Furthermore, a filter 24 is provided at the inlet / outlet of the reaction vessel body 22 so as to block the flow path leading from the reaction vessel body 22 to the first port 21a and the second port 21b. This makes it possible to remove impurities if they are contained in the chemical solution supplied through the first port 21a or the second port 21b. Furthermore, when the chemical solution after the reaction is discharged from the reaction vessel section 2, the filter 24 prevents the carrier S from being discharged, thereby preventing the carrier S in the reaction vessel section 2 from leaking to the outside.

[0049] Furthermore, filter 24 is formed in a circular, flat plate shape, and is provided so that its outer edge abuts against a wall surface continuous with side wall 22a of reaction vessel body 22. That is, reaction vessel body 22 is formed with a protruding portion that connects to lid portion 23, and filter 24 is disposed so as to contact the wall surface of the protruding portion. As a result, the chemical solution supplied from second port 21b flows down side wall 22a of reaction vessel body 22 and is supplied into reaction vessel body 22. That is, when the chemical solution is supplied from second port 21b, that is, when the chemical solution is supplied from second chemical solution supply portion 73 and then flows back through chemical solution discharge portion 72, the chemical solution permeates filter 24 and moves across the entire surface of filter 24, as shown by the arrows in FIG. 2 . As the chemical solution continues to be supplied, it becomes impossible for the chemical solution to be retained within filter 24, and because the outer edge of filter 24 is continuous with side wall 22a of reaction vessel section main body 22, the chemical solution that cannot be retained within filter 24 is pulled by the surface tension with side wall 22a, and flows down side wall 22a. In other words, filter 24 functions as guide member 8 that guides the chemical solution to side wall 22a of reaction vessel section 2.

[0050] Furthermore, the reaction vessel section 2 is provided with an exhaust port 91 as the exhaust section 9, in addition to the second port 21b. This exhaust section 9 is for discharging gas (including gas and air bubbles) inside the reaction vessel section 2. This exhaust port 91 is connected to a pipe 49 connected to a drainage tank 11, and the fluid discharged from the exhaust port 91 is discharged to the drainage tank 11 through this pipe 49. This pipe 49 is provided with a valve 59, which is capable of controlling the flow of the fluid discharged from the exhaust port 91. That is, when the valve 59 is in an open state, the reaction vessel body 22 is pressurized, so that the fluid inside the reaction vessel body 22 is discharged through the pipe 49, and when the valve 59 is in a closed state, the flow of the fluid discharged from the exhaust port 91 can be stopped.

[0051] Like the second port 21b, the exhaust port 91 is provided in the lid 23 and is positioned at a height equal to or higher than the height of the chemical solution discharge portion 72. In this embodiment, the chemical solution discharge portion 72 is formed by the second port 21b and the piping 45, and is formed so that the piping 45 extends until it abuts against the filter 24. That is, the exhaust port 91 is positioned at a lower end of the chemical solution discharge portion 72, i.e., higher than the position P at which the piping 45 abuts against the filter 24. This allows the chemical solution to be smoothly supplied from the second port 21b. That is, when the chemical solution is supplied from the second port 21b, the pressure inside the reaction vessel body 22 increases. However, by opening the exhaust port 91, the exhaust port 91 is positioned higher than the piping 45, so that the chemical solution supplied from the second port 21b is prevented from being directly discharged from the exhaust port 91. Therefore, gas inside the reaction vessel body 22 is efficiently discharged from the exhaust port 91, and the chemical solution can be smoothly supplied from the second port 21b.

[0052] Furthermore, since pipe 45 of chemical solution discharge unit 72 abuts against filter 24, the chemical solution pumped from second chemical solution supply unit 73 through pipe 45 passes through filter 24 and is directly introduced into reaction vessel body 22. That is, if pipe 45 were separated from filter 24, there is a risk that the chemical solution pumped from pipe 45 would flow over the surface of filter 24 and attempt to flow directly into exhaust port 91, but since pipe 45 abuts against filter 24, the supplied chemical solution flows through filter 24 and enters reaction vessel body 22, and therefore it is possible to prevent the chemical solution from being directly discharged from exhaust port 91 before entering reaction vessel body 22.

[0053] The nucleic acid synthesizer also has a control device (not shown) that controls the valves and pressure adjusting means 6, thereby controlling the flow of the chemical solution. That is, the control device also controls the supply and discharge of the chemical solution to and from the reaction vessel section 2, and controls the normal supply mode and carrier return mode, which will be described later.

[0054] In the normal supply mode, the chemical solution is supplied from the first chemical solution supply unit 71. Specifically, as shown in FIG. 3 , three-way valve 53 is set to an open state in the direction of flow from pipe 43 to pipe 44, valve 52 is set to an open state, and three-way valve 55 is set to an open state in the direction of flow to pipe 45, so that the chemical solution measured by the metering unit 3 is supplied to the reaction vessel unit 2 through the first chemical solution supply unit 71. Here, the open / closed state of each valve is indicated by white, and black, by black. Then, as the metering vessel 31 is pressurized by the gas tank 62, a pressure difference is generated with respect to the reaction vessel unit 2, and the chemical solution is sent from the metering vessel 31. The chemical solution supplied to the reaction vessel unit 2 comes into contact with the carrier S in the reaction vessel unit 2, causing a synthesis reaction.

[0055] This normal supply mode is the main chemical supply mode and allows efficient synthesis reactions. Specifically, by supplying chemical from the first chemical supply unit 71, the chemical is introduced from below the reaction vessel section 2, allowing the chemical to be distributed throughout the reaction vessel section 2. The chemical introduced into the reaction vessel section 2 from the lower piping 44 is affected by gravity and spreads radially within the reaction vessel section 2, where it undergoes chemical synthesis with the entire carrier S contained in the reaction vessel section 2. If the chemical were introduced from above, gravity would cause the chemical supplied from the second port 21b to proceed directly to the first port 21a, preventing it from spreading radially. Therefore, while the chemical introduced from above undergoes chemical synthesis with the carrier S located axially directly below the second port 21b, it is less likely to react with the carrier S located radially outward, potentially leaving unreacted carriers S in some locations. Therefore, the normal supply mode allows the chemical to react with the carrier S in the reaction vessel section 2 without waste, and is used as a normal chemical supply path.

[0056] Then, when the reaction between the chemical solution supplied to the reaction vessel section 2 and the carrier S is completed, the chemical solution is discharged. That is, by pressurizing with the gas tank 62, the chemical solution is discharged from the second port 21b and is discharged into the drain tank 11 through the piping 45 (see FIG. 4(a)).

[0057] The carrier return mode is a mode for dropping carriers adhering to the sidewall of the reaction vessel section 2 and returning the carriers to their original position (the lower end of the reaction vessel section 2). This carrier return mode is a chemical solution supply mode in the opposite direction to the normal supply mode, in which the chemical solution is delivered from the upper end side of the reaction vessel section 2. In this embodiment, the chemical solution is delivered from the second chemical solution supply section 73 through the chemical solution discharge section 72. Typically, in a chemical solution synthesis apparatus in which each processing section is connected by piping and a synthesis reaction is performed without exposing the chemical solution to the atmosphere, the above-mentioned normal supply mode alone can efficiently perform a synthesis reaction with the carrier S, so there is no need to provide a separate path for supplying the chemical solution from the upper side of the reaction vessel section 2. However, when the carrier S is contained in the reaction vessel section 2, if the chemical solution is discharged from the upper second port 21b as in the normal supply mode, the chemical solution may remain attached to the sidewall 22a (particularly the upper part) of the reaction vessel body 22 and the upper filter 24 (see FIG. 4(b)). In this way, when the amount of the next chemical solution to be used in the synthesis reaction is small while the carrier S is still attached, it is difficult for the chemical solution to come into contact with the attached carrier S even when the chemical solution is supplied to the reaction vessel section 2, making it difficult to carry out the synthesis reaction efficiently. To solve this problem, the carrier return mode is executed, and the chemical solution introduced from above washes off the attached carrier S, thereby increasing the synthesis efficiency of the chemical solution and the carrier S.

[0058] In the carrier return mode, the chemical solution is supplied from second chemical solution supply unit 73. Specifically, as shown in Fig. 5, three-way valve 53 is set to an open state in the direction of flow from pipe 43 to pipe 46, and three-way valve 55 is set to an open state in the direction of flow from pipe 46 to reaction vessel section 2, whereby the chemical solution measured in metering section 3 is supplied from second chemical solution supply unit 73 to reaction vessel section 2 through chemical solution discharge unit 72. That is, as in the normal supply mode, metering vessel 31 is pressurized by gas tank 62, causing a pressure difference with respect to reaction vessel section 2, and the chemical solution is sent from metering vessel 31.

[0059] When the chemical solution is supplied to the reaction vessel section 2, the chemical solution supplied through the first port 21a is guided by the filter 24 (guiding member 8) to the side wall 22a of the reaction vessel section main body 22. That is, the chemical solution that has permeated the filter 24 penetrates into the filter 24 as shown by the arrows in FIG. 2, and moves across the entire surface of the filter 24. Then, because the outer edge of the filter 24 is continuous with the side wall 22a of the reaction vessel section main body 22, the chemical solution that cannot be retained within the filter 24 is pulled by the surface tension with the side wall 22a and flows down the side wall 22a. As a result, the chemical solution flowing down the side wall 22a lifts the carriers S (see FIG. 4(b)) attached to the side wall 22a from the side wall 22a, and causes the carriers S to fall toward the lower end of the reaction vessel section 2 along with the flow of the chemical solution. This allows the carriers S attached to the side wall 22a of the reaction vessel part 2 to return to their original position (the lower end of the reaction vessel part), thereby improving the efficiency of synthesis between the carriers S and the chemical solution. That is, compared to a state in which the carriers S remain attached to the side wall 22a, the chemical solution can come into contact with all of the carriers, and the synthesis reaction can be carried out more efficiently.

[0060] Furthermore, as described above, this carrier return mode not only washes down the carriers S already adhered to the side wall 22a of the reaction vessel section 2, but also prevents the carriers S floating in the chemical solution from adhering to the side wall 22a. That is, the chemical solution supplied from the second chemical solution supply section 73 flows along the side wall 22a of the reaction vessel section 2, and the flow of this chemical solution directly hits the carriers S floating on the liquid surface, causing the carriers to sink. That is, even before the chemical solution in the reaction vessel section 2 is discharged, it is possible to prevent the carriers S from adhering to the side wall 22a of the reaction vessel section 2. Furthermore, even if the liquid surface is disturbed by the supply of the chemical solution, causing the carriers S to adhere to the side wall 22a, the chemical solution flowing along the side wall 22a washes back the carriers S, thereby preventing the carriers S from adhering to the side wall 22a.

[0061] In this carrier return mode, the chemical solution supplied from the second chemical solution supply unit 73 flows along the side wall 22a of the reaction vessel section 2 by the guide member 8 (filter 24 in this embodiment) that guides the chemical solution to the side wall 22a of the reaction vessel section 2, so that the chemical solution can be supplied directly from the vertically upper side of the reaction vessel section 2 (chemical solution discharge unit 72 in this embodiment). As described above, the chemical solution introduced from above does not easily spread in the radial direction and therefore does not easily react with the carriers S located on the radially outer side. However, in this embodiment, the chemical solution is supplied along the side wall 22a of the reaction vessel section 2, so that the chemical solution can be supplied to the carriers S located on the radially outer side as well. Therefore, this carrier return mode can also be used as a normal chemical solution supply means for the reaction vessel section 2. In this carrier return mode, the chemical solution can be supplied to the reaction vessel section 2 while preventing the carriers S from adhering to the side wall 22a of the reaction vessel section 2.

[0062] Here, in order to store the chemical liquid in the reaction vessel section 2 in the carrier return mode, the valve 52 is set to a closed state, and therefore the inside of the reaction vessel section 2 is pressurized as the chemical liquid is supplied, and thus the chemical liquid cannot be sent in excess of a certain amount. Therefore, in the carrier return mode, the exhaust section 9 is set to an open state, which allows gas (mainly gas, including bubbles) inside the reaction vessel section 2 to escape to the drain tank 11, making it possible to store the chemical liquid regardless of the chemical liquid being sent.

[0063] However, if exhaust unit 9 is set to a constantly open state, the fluid (mainly gas) inside reaction vessel section 2 is discharged, and depending on the type of filter 24 (fluid resistance due to filter 24), there is a risk that the chemical solution will be discharged from exhaust unit 9 without passing through filter 24. Therefore, in the carrier return mode, the chemical solution is supplied by alternately switching between a chemical solution supply state and a container discharge state. Here, the chemical solution supply state is a state in which exhaust unit 9 is closed, and the second chemical solution supply unit 73 and chemical solution discharge unit 72 are in a liquid delivery state, and the chemical solution is supplied. Furthermore, the container discharge state is a state in which the second chemical solution supply unit 73 and chemical solution discharge unit 72 are in a liquid delivery stop state, and exhaust unit 9 is open.

[0064] That is, when the chemical liquid is supplied from the second port 21b while the exhaust port 9 is closed due to the chemical liquid supply state, the pressure in the reaction vessel section 2 increases. However, because the exhaust port 9 is closed, the chemical liquid is introduced into the reaction vessel section body against the fluid resistance of the filter 24. If this state continues, the pressure in the reaction vessel section 2 increases, and the chemical liquid supplied from the chemical liquid discharge port 72 cannot enter. When the pressure in the reaction vessel section 2 increases above a certain level, the valve 59 is opened, and the three-way valve 55 is closed to stop the chemical liquid supply and switch to the container discharge state. This discharges the fluid from the reaction vessel section 2, and the increased pressure can be restored. The chemical liquid is then supplied again by switching to the chemical liquid supply state and the container discharge state in this way. By switching between the chemical liquid supply state and the container discharge state in this way, the chemical liquid can be supplied without passing through the filter 24 and being discharged from the exhaust port 9. The timing for switching between the chemical supply state and the vessel discharge state can be set to a predetermined timing that allows the chemical to be introduced smoothly by controlling the pressure of the reaction vessel section 2 or by controlling the time.

[0065] The control device is also set to perform a residual liquid transfer operation so that all of the liquid chemical after metering is supplied to the reaction vessel section 2. In this embodiment, the residual liquid transfer operation can be performed by the gas-liquid sensor 32a, and after the gas-liquid sensor 32a turns OFF, an additional liquid transfer operation is performed to transfer the residual liquid. Specifically, the gas-liquid sensor 32a is provided in the pipe 45, and is capable of detecting whether or not the liquid chemical is present in the pipe 45. This gas-liquid sensor 32a turns ON as the liquid chemical passes through, and then turns OFF, thereby detecting that the passage of the liquid chemical has been completed. Then, by determining in advance, from the installation position of the gas-liquid sensor 32a, how much of the liquid chemical in the pipe 45 needs to be transferred to the reaction vessel section 2 by performing the liquid transfer operation, the residual liquid in the pipe 45 can be transferred. For example, if the liquid chemical remaining in second port 21b from the mounting position of gas-liquid sensor 32a is completely flowed into reaction vessel section 2 by alternately switching between the liquid chemical supply state and the vessel discharge state three times, the remaining liquid in piping 45 can be reliably transferred by alternately switching between the liquid chemical supply state and the vessel discharge state three times each from the point at which gas-liquid sensor 32a is turned from ON to OFF as a residual liquid transfer operation. This residual liquid transfer operation allows the sensor mounting position to be freely set. That is, normally, to detect the completion of liquid transfer, it is preferable to mount the sensor near the reaction vessel to minimize the amount of residual liquid in piping 4. However, by performing the residual liquid transfer operation described above, the liquid chemical remaining in piping 4 after the sensor reaction can be transferred without leaving any liquid in piping 4, without affecting the sensor mounting position, so the sensor can be mounted at a desired position.

[0066] Similarly, in the normal supply mode, the residual liquid transfer operation is also performed. That is, in the normal supply mode, the gas-liquid sensor 32b is provided in the pipe 44, and after the gas-liquid sensor 32b changes from ON to OFF, the measuring container 31 is pressurized by the gas tank 62 for a predetermined time, so that the liquid chemical remaining in the first port 21a is transferred from the gas-liquid sensor 32b to the reaction container section 2 without leaving any liquid chemical remaining therein. Note that, in the above embodiment, an example has been described in which the residual liquid transfer operation in the carrier return mode is controlled by the number of times the liquid chemical supply state and the container discharge state are repeated, but it may also be controlled by the time the liquid chemical supply state is continued.

[0067] In the above explanation, the chemical liquid was used as the target, but the cleaning liquid can be used instead of the chemical liquid, and even when the cleaning liquid is used as the target, the flow of the cleaning liquid is controlled by the above-mentioned control device.

[0068] As described above, the chemical solution synthesis apparatus is provided with second chemical solution supply unit 73, and therefore can prevent carrier S from adhering to the inner wall of reaction vessel section 2. That is, even if carrier S attempts to adhere to the inner wall of reaction vessel section 2 due to fluctuations in the liquid level of the chemical solution, the carrier S is prevented from adhering by being supplied from second chemical solution supply unit 73 provided above the liquid level of the chemical solution, and even if carrier S does adhere to the inner wall of reaction vessel section 2, it can be washed back to the chemical solution side. Note that, although the above embodiment has mainly described side wall 22a, the inner wall of reaction vessel section 2 refers to the inner wall of reaction vessel section 2 formed by reaction vessel section main body 22 and lid section 23.

[0069] Furthermore, according to the chemical solution synthesis apparatus of the above embodiment, since the second chemical solution supply unit 73 is provided in addition to the first chemical solution supply unit 71, the carriers attached to the inner wall of the reaction vessel section 2 can be dropped after the chemical solution is discharged from the chemical solution discharge unit 72 on the vertically upper side. That is, the chemical solution supplied from the second chemical solution supply unit 73 comes into contact with the attached carriers, causing the carriers to drop together with the supplied chemical solution, and the carriers can be returned to the lower end of the reaction vessel section 2. This makes it easier for the carriers to come into contact with the chemical solution supplied from the first chemical solution supply unit 71 on the lower end side, thereby improving the reaction efficiency between the carriers and the chemical solution.

[0070] Furthermore, in the above embodiment, an example has been described in which second chemical liquid supply unit 73 is connected to chemical liquid discharge unit 72, and the chemical liquid sent from second chemical liquid supply unit 73 is supplied to reaction vessel section 2 through chemical liquid discharge unit 72, but the chemical liquid may be supplied directly from second chemical liquid supply unit 73 to reaction vessel section 2. Specifically, in Fig. 2, a third port (not shown) may be provided in addition to second port 21b and discharge port 91 in the upper end side lid of reaction vessel section 2, and piping 46 may be connected to this third port, so that the chemical liquid and cleaning liquid after measurement are supplied to reaction vessel section 2 through piping 46 and the third port.

[0071] In the above embodiment, an example has been described in which the chemical solution is supplied to the reaction vessel section 2 by alternately switching between the chemical solution supply state and the vessel discharge state in the carrier return mode, but the chemical solution may be supplied only in the chemical solution supply state. That is, if the carriers S adhering to the reaction vessel body 22 can be removed in one chemical solution supply state, the chemical solution may be supplied only in one chemical solution supply state to perform the synthesis reaction.

[0072] In the above embodiment, the gas-liquid sensors 32a and 32b are used to detect whether or not the liquid transfer is complete, but other sensors may be used as long as they are capable of detecting the chemical liquid in the pipe 4. For example, a capacitance-type proximity sensor, a transmission-type photomicrosensor, or the like may be used.

[0073] Furthermore, in the above embodiment, an example was described in which the guide member 8 was the filter 24, but any member that guides the delivered chemical solution to the side wall 22a of the reaction vessel section 2 may be used. For example, as shown in Fig. 6, a conical member may be provided near the entrance / exit of the reaction vessel section 2, with its outer edge being guided to a wall surface that is continuous with the side wall 22a of the reaction vessel body 22. Even with such a member, the chemical solution supplied from the second port 21b flows down the side wall 22a of the reaction vessel body 22 and is supplied into the reaction vessel body 22, so that the carriers S adhering to the side wall 22a can be washed away.

[0074] In the above embodiment, the filter 24 is provided in the reaction vessel section 2, but the filter 24 may be provided in the chemical solution discharge section 72. For example, as shown in FIG. 6, the filter 24 may be provided in the piping 4 connected to the first port section 21a and the exhaust port 91.

[0075] Furthermore, in the above embodiment, an example has been described in which the chemical solution supplied from the second chemical solution supply unit 73 (in the above embodiment, the piping 45 inserted into the second port 21b) is guided to the side wall 22a of the reaction vessel section 2 by the guide member 8 (filter 24). However, even without the guide member 8, the lid section 23 may be configured to have a wall surface continuous with the side wall 22a of the reaction vessel section 2, and the supplied chemical solution may be configured to flow along that wall surface. Specifically, as shown in FIG. 10(a), the lid section 23 is formed with an insertion hole 23b that penetrates all the way to the bottom surface section 23a, and the piping 45 is inserted through the insertion hole 23b. The tip of the piping 45 is provided in contact with the inner wall of the insertion hole 23b. This allows the chemical solution f supplied from the piping 45 to flow to the side wall 22a of the reaction vessel section 2. That is, the chemical solution f supplied from the pipe 45 flows along the inner wall of the insertion hole 23b due to surface tension because the tip of the pipe 45 is in contact with the inner wall of the insertion hole 23b. The inner wall of the insertion hole 23b is continuous with the side wall 22a of the reaction vessel section 2 via the bottom surface 23a of the lid section 23, so the chemical solution f flowing along the inner wall of the insertion hole 23b flows from the bottom surface 23a along the side wall 22a. By configuring the pipe 45 so that it is continuous from the opening to the side wall 22a of the reaction vessel section 2, the supplied chemical solution f can flow along the side wall 22a of the reaction vessel section 2.

[0076] 10(a) illustrates an example in which the opening of the pipe 45 is housed within the insertion hole 23b. However, as shown in FIG. 10(b), the opening of the pipe 45 may be provided so as to protrude beyond the bottom surface 23a of the lid. Even in this case, the chemical solution f discharged from the opening of the pipe 45 can flow to the side wall 22a of the reaction vessel section 2 through the bottom surface 23a due to surface tension. That is, the configuration in which the pipe 45 is formed continuously on the side wall 22a of the reaction vessel section 2 includes a configuration in which the chemical solution f discharged from the opening of the pipe 45 finally flows to the side wall 22a due to surface tension. This prevents the carriers S from adhering to the inner wall of the reaction vessel section 2 (the inner wall of the reaction vessel section 2, including the side wall 22a of the reaction vessel section main body 22 and the bottom surface 23a of the lid section 23). Even if the carriers S do adhere, the adhering carriers S can be dropped and returned to the chemical solution side. [Explanation of symbols]

[0077] 1. Chemical solution storage section 2. Reaction vessel section 3 Measuring part 4 Piping 8 Guiding member 9 Discharge section 11 Drainage tank (container section) 21a Port 1 21b Second port 24 filters 31 Measuring container 32 Gas-liquid sensor 71 First chemical supply unit 72 Chemical solution discharge section 73 Second chemical supply unit 91 Exhaust port S Support (beads)

Claims

1. a medicinal solution storage section in which a medicinal solution is stored; a reaction vessel section in which the chemical solution and the carrier are reacted; A chemical solution synthesis apparatus comprising: a chemical solution storage unit; ... reaction vessel unit; and a chemical solution synthesis device for synthesizing a chemical solution, the chemical solution being transferred from the chemical solution storage unit to the reaction vessel unit without being exposed to the atmosphere. a second chemical solution supply unit that includes a first chemical solution supply unit connected to the reaction vessel unit and through which a chemical solution is supplied to the reaction vessel unit, and a chemical solution discharge unit that is provided vertically above the first chemical solution supply unit, and that prevents the carrier from adhering to the reaction vessel unit; The chemical solution synthesis apparatus is characterized in that the reaction vessel section has an exhaust section for discharging gas from the reaction vessel section, which is arranged at a height position equal to or higher than the height position of the chemical solution discharge section.

2. a medicinal solution storage section in which a medicinal solution is stored; a reaction vessel section in which the chemical solution and the carrier are reacted; A chemical solution synthesis apparatus comprising: a chemical solution storage unit; ... reaction vessel unit; and a chemical solution synthesis device for synthesizing a chemical solution, the chemical solution being transferred from the chemical solution storage unit to the reaction vessel unit without being exposed to the atmosphere. a first chemical liquid supply unit connected to the reaction vessel unit and supplying a chemical liquid to the reaction vessel unit; and a chemical liquid discharge unit provided vertically above the first chemical liquid supply unit, a second chemical solution supply unit that drops the carrier adhering to the inner wall of the reaction vessel unit after the chemical solution is discharged from the chemical solution discharge unit; The chemical solution synthesis apparatus is characterized in that the reaction vessel section has an exhaust section for discharging gas from the reaction vessel section, which is arranged at a height position equal to or higher than the height position of the chemical solution discharge section.

3. 3. The chemical solution synthesizing apparatus according to claim 1, wherein the second chemical solution supply unit is connected to the chemical solution discharge unit, and the chemical solution is supplied by causing a reverse flow through the chemical solution discharge unit.

4. 4. The chemical supply device according to claim 1, wherein the chemical supplied from the second chemical supply unit is supplied along a side wall of the reaction vessel unit.

5. 5. The chemical solution synthesizing apparatus according to claim 1, wherein the chemical solution in the reaction vessel section is discharged by causing it to flow backward through the first chemical solution supply section.

6. The chemical solution synthesis apparatus according to any one of claims 1 to 5, characterized in that the reaction vessel section is provided with a guide member that guides the chemical solution supplied through the second chemical solution supply section to a side wall of the reaction vessel section.

7. 7. The chemical solution synthesizing apparatus according to claim 6, wherein the guide member is also used as a filter.

8. 8. The chemical liquid synthesizing apparatus according to claim 1, wherein a cleaning liquid is used instead of the chemical liquid.

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